Hollowed-out mask electrode deposition sample holder and method

Abstract

The invention discloses a hollow mask electrode deposition sample holder and a method. The hollow mask electrode deposition sample holder comprises a connecting tray, a movable sample table and a mask plate clamp, the bottom of the slide rail connecting piece is slidably connected with the X linear slide rail in the X direction; the bottom of the sample table is slidably connected with the top of the slide rail connecting piece in the Y direction; the slide rail connecting piece is provided with an X-direction through screw hole, one threaded end of the X adjusting screw rod is mounted in the X-direction through screw hole of the slide rail connecting piece, and the other end of the X adjusting screw rod is arranged in the X clamping device; a Y-direction through screw hole is formed in the sample table, one threaded end of the Y adjusting screw rod is mounted in the Y-direction through screw hole of the sample table, and the other end of the Y adjusting screw rod is arranged in the Y clamping device; the mask plate clamp fixing stud is higher than the sample table, and the mask plate clamp is connected with the top of the mask plate clamp fixing stud. Therefore, the precision requirement when the photoetching-free process is used for transferring the single crystal island two-dimensional material and growing the single crystal island two-dimensional material to deposit the electrode is met.

Description

Technical Field

[0001] The invention belongs to the field of two-dimensional materials and relates to a hollow mask electrode deposition sample rack and method. Background Art

[0002] In the process of manufacturing two-dimensional material devices, there are two main methods for defining electrode patterns: photolithography using a photomask to expose the pattern, and a photolithography-free process in which the electrode pattern is defined and the electrode is deposited in an ultra-high vacuum by using a hollow mask. Among them, photolithography-defined patterns require spin coating of photoresist on the substrate. After development, there will inevitably be residual photoresist, which will lead to device performance degradation, such as difficulty in forming good contact between the electrode and the device, affecting carrier mobility, etc. The photolithography-free process of depositing electrodes in an ultra-vacuum using a hollow mask can directly process the device process on the hollowed-out part of the mask. There are few impurities in the ultra-high vacuum and no chemical substances are contacted during the process, which can ensure good contact between the electrode and the device.

[0003] However, when using the photolithography-free process to deposit electrodes on two-dimensional materials, the alignment problem between the electrode pattern of the hollow mask and the two-dimensional material is inevitable, especially in the transfer of single crystal island two-dimensional materials and the growth of single crystal island two-dimensional materials. Because the single crystal islands of such two-dimensional materials are extremely small, with a size of only tens of microns to hundreds of microns, it is difficult to accurately position the electrode pattern on the hollow mask on a single single crystal island.

[0004] Moreover, the traditional alignment method is relatively rough, requiring the experimenter to manually position the hollow electrode pattern on the mask on a single single crystal island under a light microscope. Not only is the accuracy low, but after positioning, when the mask and the sample are fixed and subsequently transferred to the vacuum chamber, relative displacement between the electrode pattern of the hollow mask and the single crystal island is inevitable, causing secondary errors and further reducing the success rate. Summary of the invention

[0005] The purpose of the present invention is to overcome the shortcomings of the above-mentioned prior art and provide a hollow mask electrode deposition sample rack and method to avoid secondary errors so as to meet the accuracy requirements when depositing electrodes on transferred single crystal island two-dimensional materials and grown single crystal island two-dimensional materials using a photolithography-free process.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions: A hollow mask electrode deposition sample holder, comprising a connection tray, a movable sample stage and a mask clamp; The connecting tray is provided with a vacuum chamber connecting piece, an X linear slide rail, a mask clamp fixing stud and an X clamping device, and the movable sample stage includes a slide rail connecting piece, an X adjusting screw, a Y adjusting screw, a Y clamping device and a sample stage; The bottom of the slide rail connector is slidably connected with the X linear slide rail in the X direction, and the bottom of the sample stage is slidably connected with the top of the slide rail connector in the Y direction; the slide rail connector is provided with an X-direction through screw hole, one end of the X adjustment screw thread is installed in the X-direction through screw hole of the slide rail connector, and the other end is arranged in the X clamping device; the sample stage is provided with a Y-direction through screw hole, one end of the Y adjustment screw thread is installed in the Y-direction through screw hole of the sample stage, and the other end is arranged in the Y clamping device; The mask clamp fixing stud is higher than the sample stage, and the mask clamp is connected to the top of the mask clamp fixing stud.

[0007] Preferably, a sample limiting baffle is provided at one end of the sample stage and a sample clamp is provided at the other end. The sample limiting baffle is higher than the sample stage. The sample clamp is L-shaped, with the horizontal side being used to fix the sample and the vertical side being connected to the side of the sample stage.

[0008] Furthermore, the horizontal side edge of the sample holder is provided with an oblique chamfer.

[0009] Furthermore, the sample limiting baffle is 50-200 microns higher than the sample, and the thickness of one end of the sample clamp fixing the sample is the same as the sample limiting baffle.

[0010] Preferably, the vacuum chamber connecting piece is located on the side of the connecting tray, and the vacuum chamber connecting piece is provided with a through hole in the horizontal direction and two threaded holes in the vertical direction.

[0011] Preferably, the mask clamp includes a mask clamp top, a mask clamp bottom and a mask base, the center of the mask clamp bottom has a hollow of the same size as the mask, the hollowed-out portion of the mask base is smaller than the size of the mask, the mask base is fixed at the center of the bottom of the mask clamp bottom, and the center of the mask clamp top has a hollow of the same size as the mask base.

[0012] Furthermore, the mask clamp top is provided with symmetrical pressure strips on both sides of the hollowing.

[0013] Preferably, the X clamping device includes an X upper limit block and an X lower limit block, the X upper limit block and the X lower limit block are correspondingly provided with two vertical threaded holes, and the bottom of the X upper limit block and the top of the X lower limit block are both provided with semicircular limit grooves, and the radius of the limit grooves is smaller than the radius of the X adjusting screw.

[0014] Preferably, the Y clamping device includes a Y upper limit block and a Y lower limit block, the limit block and the Y lower limit block are correspondingly provided with two vertical threaded holes, and the bottom of the Y upper limit block and the top of the Y lower limit block are both provided with semicircular limit grooves, and the radius of the limit grooves is smaller than the radius of the Y adjusting screw.

[0015] A method for depositing a hollow mask electrode of the sample holder includes the following steps: S1, fix the sample on the sample stage; S2, installing the required mask in the mask clamp, and fixing the mask clamp on the mask clamp fixing studs on the connection tray; S3, placing the mounted sample holder under a microscope, focusing the microscope on the electrode pattern of the hollow mask, and adjusting the X adjustment screw and the Y adjustment screw until the electrode pattern on the hollow mask is positioned on the single crystal island two-dimensional material somewhere on the sample; S4, fixing the X upper limit block and the Y upper limit block by the X clamping device and the Y clamping device respectively; S5, installing the positioned sample holder on the spiral rod of the ultra-vacuum chamber through the vacuum chamber connector, and finally depositing electrodes on the single crystal island two-dimensional material.

[0016] Compared with the prior art, the present invention has the following beneficial effects: The present invention ingeniously utilizes the fixed rotation of the XY adjusting screw to drive the XY displacement of the sample stage carrying the sample, so as to realize the precise positioning of the electrode pattern on the hollow mask and the single crystal island at any position on the sample, and avoids the secondary errors that may be generated in the process of fixing and transferring the mask and the sample after positioning, thereby greatly improving the success rate of depositing electrodes on the single crystal island two-dimensional material using the photolithography-free process, so as to achieve the accuracy requirement when depositing electrodes on the transferred single crystal island two-dimensional material and the grown single crystal island two-dimensional material using the photolithography-free process. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a design principle diagram of a hollow mask electrode deposition sample holder of the present invention; Figure 2 This is a schematic diagram of the overall structure of a hollow mask electrode deposition sample holder of the present invention; Figure 3 It is a structural schematic diagram of a connecting tray of the present invention; Figure 4 It is a structural schematic diagram of the movable sample stage of the present invention; Figure 5 It is a structural schematic diagram of the mask clamp of the present invention; Figure 6 A schematic diagram of loading the sample and the mask of the present invention; Figure 7 A partial enlarged view of the hollowed-out mask electrode pattern area for demonstrating the operation example of the present invention; Figure 8 This is an example of a device made using the sample holder of the present invention.

[0018] Among them: 1. connecting tray; 2. movable sample stage; 3. mask clamp; 111. vacuum chamber connector; 112. X linear slide rail; 113. mask clamp fixing stud; 121. X upper limit block; 122. X lower limit block; 211. slide rail connector; 212. X adjustment screw; 213. Y adjustment screw; 214. sample stage; 221. sample limit baffle; 222. sample clamp; 231. Y upper limit block; 232. Y lower limit block; 20. sample; 30. hollow mask; 31. mask clamp top; 32. mask clamp bottom; 33. mask base; 311. pressure strip. DETAILED DESCRIPTION

[0019] The embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0020] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "multiple" is two or more, unless otherwise clearly and specifically defined.

[0021] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by technicians in the technical field to which the present invention belongs. The terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. The term "and / or" used in this article includes any and all combinations of one or more related listed items. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to the specific circumstances. The terms used in the specification of the present invention herein are only for the purpose of describing specific embodiments and are not intended to limit the present invention.

[0022] The disclosure below provides many different embodiments or examples to realize different structures of the present invention. In order to simplify the disclosure of the present invention, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present invention. In addition, the present invention can repeat reference numbers and / or reference letters in different examples, and this repetition is for the purpose of simplicity and clarity, which itself does not indicate the relationship between the various embodiments and / or settings discussed. In addition, the present invention provides various specific examples of processes and materials, but those of ordinary skill in the art can be aware of the application of other processes and / or the use of other materials.

[0023] like Figure 1 As shown, the electrode deposition sample holder envisioned by the present invention requires that the mask electrode pattern can be accurately positioned on the single crystal island two-dimensional material, and the sample stage needs to be moved in the X and Y directions so that the electrode pattern on the hollow mask is accurately positioned on the single crystal island two-dimensional material somewhere in the sample 20 and remains stable without being moved with the sample stage. like Figure 2 , which is a schematic diagram of the overall structure of the hollow mask electrode deposition sample holder of the present invention, including a connecting tray 1, a movable sample stage 2 and a mask clamp 3.

[0024] Among them, the connection tray 1 is provided with a connection mechanism and an X-adjusting screw 212 fixing mechanism, the movable sample stage 2 is provided with a moving system, a sample fixing mechanism and a Y-adjusting screw 213 fixing mechanism, which can realize the displacement of the sample stage in the XY direction and the fixation of the sample, and the mask clamp 3 is provided with a clamping and fixing mechanism, which can realize the clamping and fixing of the mask. The connection tray 1 carries the movable sample stage 2, the mask clamp 3 can be fixed on the connection tray 1, and the movable sample stage 2 is located between the connection tray 1 and the mask clamp 3.

[0025] like Figure 3As shown, it is a schematic diagram of the structure of the connection tray 1 of the present invention, including a vacuum chamber connection 111, an X linear slide rail 112, a mask clamp fixing stud 113, an X upper limit block 121 and an X lower limit block 122. The vacuum chamber connection 111 is located on one side of the connection tray 1 in the X direction, the X upper limit block 121 and the X lower limit block 122 are located on the other side of the connection tray 1 in the X direction, and the mask clamp fixing stud 113 is four in number, which are respectively located at the four corners of the connection tray 1.

[0026] The vacuum chamber connector 111 is provided with a through hole in the horizontal direction and two threaded holes in the vertical direction. The vacuum chamber connector 111 is installed on the spiral rod in the ultra-vacuum chamber of the deposition electrode. The top of the mask clamp fixing stud 113 is provided with a threaded hole. The X upper limit block 121 and the X lower limit block 122 are correspondingly provided with two vertical threaded holes for connecting and fixing the X upper limit block 121 and the X lower limit block 122. The bottom of the X upper limit block 121 and the top of the X lower limit block 122 are both provided with semicircular limiting grooves, and the radius of the limiting grooves is smaller than the radius of the X adjusting screw 212. The bottom of the movable sample stage 2 is slidably installed on the X linear slide rail 112, and the mask clamp 3 is fixed to the mask clamp fixing stud 113 by screws.

[0027] like Figure 4 , which is a schematic diagram of the structure of the movable sample stage 2 according to the present invention, includes a slide rail connector 211, an X adjustment screw 212, a Y adjustment screw 213, a sample stage 214, a sample limit baffle 221, a sample clamp 222, a Y upper limit block 231 and a Y lower limit block 232. The bottom of the slide rail connector 211 is slidably connected to the X linear slide rail 112, and the sample stage 214 is slidably connected to the top of the slide rail connector 211 in the Y direction. The slide rail connector 211 is provided with an X-direction through screw hole, and one end of the thread of the X adjusting screw 212 is installed in the X-direction through screw hole of the slide rail connector 211. One end of the limit baffle of the X adjusting screw 212 is installed in the limit groove between the X upper limit block 121 and the X lower limit block 122, and is fixed by screws. The limit baffle is clamped between the slide rail connector 211 and the limit groove; the Y clamping device includes a Y upper limit block 231 and a Y lower limit block 232, and the limit block 231 and the Y lower limit block 232 correspond to Two vertical threaded holes are provided, and semicircular limit grooves are provided at the bottom of the Y upper limit block 231 and the top of the Y lower limit block 232. The radius of the limit groove is smaller than the radius of the Y adjusting screw 213. The sample stage 214 is provided with a Y-direction through screw hole. One end of the thread of the Y adjusting screw 213 is installed in the Y-direction through screw hole of the sample stage 214. One end of the limit baffle of the Y adjusting screw 213 is installed between the Y upper limit block 231 and the Y lower limit block 232 and fixed by screws. The limit baffle is stuck between the sample stage 214 and the limit groove, so that the fixed rotation of the X adjusting screw 212 and the Y adjusting screw 213 can be used to drive the sample stage 214XY movement.

[0028] The sample stage 214 is provided with a sample limiting baffle 221 at one end and a sample clamp 222 at the other end. The sample limiting baffle 221 is higher than the sample stage 214. The sample clamp 222 is L-shaped, and the horizontal side is used to fix the sample 20. The horizontal side edge is provided with an oblique chamfer, and the vertical side is used to connect the side of the sample stage 214. The sample 20 is placed on the platform of the sample stage 214, with one end pressed against the sample limiting baffle 221. The oblique chamfer of the sample clamp 222 clamps the edge of the other end of the sample, and the sample clamp 222 is fixed to one side of the sample stage 214 by screws, so as to fix the sample. The size and shape of the sample limiting baffle 221 and the sample clamp 222 can be changed according to the actual situation of the sample.

[0029] The mask clamp fixing stud 113 is 50 microns higher than the sample limiting baffle 221, which prevents the mask from directly contacting the sample 20 and abrading the mask and the sample within the range allowed by the accuracy.

[0030] The sample limiting baffle 221 is about 100 microns higher than the sample 20 , and the thickness of one end of the sample clamp 222 fixing the sample 20 is the same as that of the sample limiting baffle 211 .

[0031] like Figure 5 As shown, it is a schematic diagram of the structure of the mask clamp 3 of the present invention, including a mask clamp top 31, a mask clamp bottom 32, a mask bottom 33 and a pressure strip 311. The center of the mask clamp bottom 32 has a hollow of the same size as the mask, and the hollowed-out portion of the mask bottom 33 is slightly smaller than the size of the mask, which is welded to the center of the bottom of the mask clamp bottom 32 to receive the mask. The electrode pattern on the hollowed-out mask is exposed in the center of the mask bottom 33. The center of the mask clamp top 31 has a hollow of the same size as the mask bottom 33, and symmetrical pressure strips 311 are provided on both sides of the hollow to press the mask; the mask top 31 and the mask bottom 32 are provided with pressure strips 311 of the same size as the mask bottom 33. Figure 3 The mask clamp fixing studs 113 shown in the figure match the screw holes and are fixed to the connecting tray 1 by screws to achieve the clamping and fixing of the mask.

[0032] Combination Figure 6 and Figure 7 , apply the above technical solution to practice, the specific installation and use process is: First, the sample 20 is fixed on the sample stage 214 so that the sample 20 does not move relative to the sample stage 214 , and the Y adjustment screw 213 is installed on the sample stage 214 .

[0033] In the second step, the sample table 214 with the sample 20 is installed above the slide rail connector 211, and the X adjustment screw 212 is installed on the slide rail connector 211, and one end of the Y adjustment screw 213 with a limit baffle is stuck in the Y lower limit block 232.

[0034] In the third step, the above-mentioned installed device is installed as a whole on the connecting tray 1, and one end of the limit baffle of the X-adjusting screw 214 is stuck in the X-lower limit block 122.

[0035] The fourth step is Figure 5 As shown in , the required mask is installed in the mask holder 3.

[0036] Step 5: Figure 6 As shown in , the installed mask clamp 3 is fixed to the mask clamp fixing studs 113 on the connection tray 1 by screws.

[0037] Step 6: Figure 8 As shown in , the mounted sample holder is placed under a microscope, the microscope is focused on the electrode pattern of the hollow mask, and the X adjustment screw 212 and the Y adjustment screw 213 are adjusted until the electrode pattern on the hollow mask is accurately positioned on the single crystal island two-dimensional material somewhere in the sample 20.

[0038] Step 7: Figure 6 As shown in , the X upper limit block 121 and the Y upper limit block 231 are respectively fixed to the X lower limit block 122 and the Y lower limit block 232 by screws to fix the X adjusting screw 212 and the Y adjusting screw 213 to prevent them from rotating again.

[0039] In the eighth step, the sample holder positioned above is installed on the spiral rod of the ultra-vacuum chamber through the vacuum chamber connector 111, and finally the electrode is deposited on the single crystal island two-dimensional material.

[0040] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0041] It should be understood that the above description is for illustration and not for limitation. Many embodiments and many applications beyond the examples provided will be apparent to those skilled in the art upon reading the above description. Therefore, the scope of this patent should not be determined with reference to the above description, but rather with reference to the preceding claims and the full scope of equivalents to which such claims are entitled. For the purpose of comprehensiveness, all articles and references, including disclosures of patent applications and publications, are incorporated herein by reference. The omission of any aspect of the subject matter disclosed herein in the preceding claims is not intended to be a waiver of such subject matter, nor should it be considered that the applicant has not considered such subject matter to be part of the disclosed inventive subject matter.

Claims

1. A hollow mask electrode deposition sample holder, characterized in that: It comprises a connecting tray (1), a movable sample stage (2) and a mask clamp (3); A vacuum chamber connecting piece (111), an X linear slide rail (112), a mask clamp fixing stud (113) and an X clamping device are provided on the connecting tray (1), and the movable sample stage (2) comprises a slide rail connecting piece (211), an X adjusting screw rod (212), a Y adjusting screw rod (213), a Y clamping device and a sample stage (214); The bottom of the slide rail connector (211) is slidably connected to the X linear slide rail (112) in the X direction, and the bottom of the sample stage (214) is slidably connected to the top of the slide rail connector (211) in the Y direction; the slide rail connector (211) is provided with an X-direction through-screw hole, one end of the X adjustment screw (212) is installed in the X-direction through-screw hole of the slide rail connector (211), and the other end is arranged in the X clamping device; the sample stage (214) is provided with a Y-direction through-screw hole, one end of the Y adjustment screw (213) is installed in the Y-direction through-screw hole of the sample stage (214), and the other end is arranged in the Y clamping device; The mask clamp fixing stud (113) is higher than the sample stage (214), and the mask clamp (3) is connected to the top of the mask clamp fixing stud (113).

2. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: A sample limiting baffle (221) is provided at one end of the sample stage (214), and a sample clamp (222) is provided at the other end. The sample limiting baffle (221) is higher than the sample stage (214). The sample clamp (222) is L-shaped, with a horizontal side used to fix the sample (20) and a vertical side connected to a side surface of the sample stage (214).

3. The hollow mask electrode deposition sample holder according to claim 2, characterized in that: The horizontal side edge of the sample holder (222) is provided with an oblique chamfer.

4. The hollow mask electrode deposition sample holder according to claim 2, characterized in that: The sample limiting baffle (221) is 50-200 microns higher than the sample (20), and the thickness of one end of the sample clamp (222) fixing the sample (20) is the same as that of the sample limiting baffle (211).

5. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The vacuum chamber connecting piece (111) is located on the side of the connecting tray (1), and the vacuum chamber connecting piece (111) is provided with a through hole in the horizontal direction and two threaded holes in the vertical direction.

6. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The mask clamp (3) comprises a mask clamp top (31), a mask clamp bottom (32) and a mask base (33); the center of the mask clamp bottom (32) has a hollow portion of a size equivalent to the mask; the hollow portion of the mask base (33) is smaller than the size of the mask; the mask base (33) is fixed at the center of the bottom of the mask clamp bottom (32); and the center of the mask clamp top (31) has a hollow portion of the same size as the mask base (33).

7. The hollow mask electrode deposition sample holder according to claim 6, characterized in that: The mask clamp top (31) is provided with symmetrical pressure strips (311) on both sides of the hollowing.

8. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The X clamping device comprises an X upper limit block (121) and an X lower limit block (122), the X upper limit block (121) and the X lower limit block (122) are respectively provided with two vertical threaded holes, the bottom of the X upper limit block (121) and the top of the X lower limit block (122) are both provided with semicircular limit grooves, and the radius of the limit grooves is smaller than the radius of the X adjusting screw rod (212).

9. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The Y clamping device comprises a Y upper limit block (231) and a Y lower limit block (232), the limit block (231) and the Y lower limit block (232) are respectively provided with two vertical threaded holes, the bottom of the Y upper limit block (231) and the top of the Y lower limit block (232) are both provided with semicircular limit grooves, the radius of the limit grooves being smaller than the radius of the Y adjusting screw (213).

10. A hollow mask electrode deposition method based on the sample holder according to any one of claims 1 to 9, characterized in that: The process includes: S1, fixing the sample (20) on the sample stage (214); S2, installing the required mask in the mask clamp (3), and fixing the mask clamp (3) on the mask clamp fixing studs (113) on the connection tray (1); S3, placing the mounted sample holder under a microscope, focusing the microscope on the electrode pattern of the hollow mask, and adjusting the X adjustment screw (212) and the Y adjustment screw (213) until the electrode pattern on the hollow mask is positioned on the single crystal island two-dimensional material somewhere on the sample (20); S4, fixing the X upper limit block (121) and the Y upper limit block (231) by means of an X clamping device and a Y clamping device respectively; S5, installing the positioned sample holder on the spiral rod of the ultra-vacuum chamber through the vacuum chamber connector (111), and finally depositing electrodes on the single crystal island two-dimensional material.

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