Surface treatment method for hot stamping part in vacuum environment

Abstract

The invention provides a surface treatment method for a hot stamping part in a vacuum environment. The surface treatment method comprises the following steps that a workpiece for surface treatment is provided; the workpiece is conveyed to a feeding chamber; the workpiece is conveyed from the feeding chamber to the feeding buffer chamber, and the workpiece is cleaned in the feeding buffer chamber; the workpiece is conveyed from the feeding buffer chamber to the feeding transition chamber; the workpiece is conveyed to the coating chamber from the feeding transition chamber, and the coating chamber is set to be in a high-vacuum state and used for coating the workpiece; the discharging chamber is used for sequentially conveying the coated workpieces according to the sequence of the discharging transition chamber, the discharging buffer chamber and the discharging chamber and is used for discharging the workpieces; the feeding transition chamber and the discharging transition chamber are set to be in a high-vacuum state; the feeding buffer chamber and the discharging buffer chamber are set to be in a medium vacuum state; therefore, in the process of continuously conveying a plurality of workpieces, the vacuum degree resetting time in the feeding transition chamber and the discharging transition chamber is shortened.

Description

Technical Field

[0001] The present application belongs to the technical field of heat treatment, and in particular, relates to a surface treatment method for hot stamping parts under a vacuum environment. Background Art

[0002] In the existing technology, the hot stamping industry generally adopts several processes, including bare plate hot stamping, aluminum silicon coating hot stamping, galvanized plate hot stamping and bare plate hot stamping followed by electrogalvanizing. Among them, bare plate hot stamping has thick oxide scale and no corrosion resistance. Aluminum silicon galvanized hot stamping parts have good oxidation resistance, but poor corrosion resistance. Indirect hot stamping of galvanized plate has LME problem, high cost and narrow application range.

[0003] At present, most traditional magnetron sputtering coating in the vacuum coating industry generally adopts intermittent (periodic structure) equipment, which is suitable for coating products with small output and small workpiece size. In addition, the door cover needs to be opened after each coating. When processing the next batch of workpieces, it is necessary to evacuate from normal pressure to high vacuum state, which consumes more time and electricity. There is no magnetron sputtering coating technology used in the market to coat the surface of automobile body stamping parts for corrosion protection. The existing continuous magnetron sputtering vacuum coating equipment in the market is also mainly used for coating the surface of a single flat plane, such as glass, plastic film, steel strip and other relatively flat surfaces, which cannot meet the requirements of uniform coating thickness on the surface of complex 3D automobile body parts.

[0004] To address the above problems, no effective solution has been proposed yet.

[0005] It should be noted that the above introduction to the technical background is only for the convenience of providing a clear and complete description of the technical solutions of the present invention and for the convenience of understanding by those skilled in the art. It cannot be considered that the above technical solutions are well known to those skilled in the art simply because these solutions are described in the background technology section of the present invention. Summary of the invention

[0006] The purpose of the present application is to provide a surface treatment method for hot stamping parts under a vacuum environment to solve the problem that intermittent (periodic structure) equipment cannot meet the requirements for uniform coating thickness on the surface of complex-shaped 3D automobile body parts.

[0007] The present application provides a surface treatment method for hot stamping parts under vacuum environment, comprising the following steps:

[0008] providing a workpiece for surface treatment;

[0009] conveying the workpiece to a feed chamber;

[0010] transporting the workpiece from the feed chamber to a feed buffer chamber, and cleaning the workpiece in the feed buffer chamber;

[0011] Transporting the workpiece from the feed buffer chamber to the feed transition chamber;

[0012] The workpiece is transported from the feeding transition chamber to a coating chamber, wherein the coating chamber is set to a high vacuum state for coating the workpiece;

[0013] The workpiece after coating is sequentially conveyed in the order of the discharging transition chamber, the discharging buffer chamber and the discharging chamber to complete the unloading of the workpiece;

[0014] Among them, the feed transition chamber and the discharge transition chamber are set to a high vacuum state; the feed buffer chamber and the discharge buffer chamber are set to a medium vacuum state; the feed chamber and the discharge chamber are set to a low vacuum state.

[0015] Preferably, the vacuum degree of the low vacuum state is 10 5 ~10 -1 Pa; the vacuum degree of the medium vacuum state is 10 -1 ~10 -3 The vacuum degree of the high vacuum state is 10 -3 ~10 -5 Pa.

[0016] Preferably, magnetron sputtering cathodes and targets are installed on both sides of the inner wall of the coating chamber for coating the workpiece.

[0017] Preferably, a vacuum partition door is provided between the feed buffer chamber and the adjacent feed chamber and the feed transition chamber; a vacuum partition door is provided between the discharge buffer chamber and the adjacent discharge chamber and the discharge transition chamber.

[0018] Preferably, the workpiece is placed on a material rack, and the workpiece is transported by the material rack.

[0019] Preferably, the bottom of the material rack has an upper part and a lower part, the lower part is arranged as a guide rail for conveying the workpiece; the upper part is provided with a fixing device for positioning and fixing the workpiece.

[0020] Preferably, the material rack also has a side bracket, and the side bracket and the bottoms of the feed transition chamber, the feed buffer chamber and the feed chamber as well as the discharge transition chamber, the discharge buffer chamber and the discharge chamber are all provided with independent roller driving parts for conveying the material rack.

[0021] Preferably, in the step of "cleaning the workpiece in the feed buffer chamber", a plasma cleaning device is used to clean the workpiece.

[0022] Preferably, before the step of "transporting the workpiece from the feed buffer chamber to the feed transition chamber" is completed, the coating chamber is in an inert gas atmosphere.

[0023] Preferably, the target material is made of zinc, and the target material is configured as a cylindrical structure so that the path of the sputtered target ions diverges in a fan-shaped direction.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] 1. The present invention arranges a feeding transition chamber and a discharging transition chamber in a high vacuum state on both sides of a coating chamber in a high vacuum state, thereby shortening the vacuum resetting time in the feeding transition chamber and the discharging transition chamber in the process of continuously conveying multiple workpieces, allowing the coating chamber to always maintain a high vacuum environment state to achieve continuous coating. Since the coating chamber is always in a vacuum state and the vacuum is not destroyed, the vacuum pumping time of the coating chamber is saved and the electric energy consumption is saved.

[0026] 2. The present invention provides a vacuum partition door between the feed buffer chamber and the adjacent feed chamber and feed transition chamber; a vacuum partition door is provided between the discharge buffer chamber and the adjacent discharge chamber and discharge transition chamber; a vacuum partition door is provided between the coating chamber and the adjacent feed transition chamber and discharge transition chamber, so that the vacuum degree in each structure can be stably maintained, making the processing environment in the coating chamber more stable. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0028] Figure 1 This is an overall structural diagram of a surface treatment method for hot stamping parts under a vacuum environment provided in an embodiment of the present application;

[0029] Figure 2 It is a detailed structural diagram of the feeding part of a surface treatment method for hot stamping parts under vacuum environment provided in an embodiment of the present application;

[0030] Figure 3 Detailed structural diagram of the discharge part of a surface treatment method for hot stamping parts under vacuum environment provided in an embodiment of the present application

[0031] Figure 4 A material rack structure diagram of a surface treatment method for hot stamping parts under vacuum environment provided in an embodiment of the present application;

[0032] Figure 5 A surface treatment method for hot stamping parts under vacuum environment provided by an embodiment of the present application shows a structure diagram of the material rack and the workpiece.

[0033] Figure 6 A vacuum partition door structure diagram of a surface treatment method for hot stamping parts under a vacuum environment provided in an embodiment of the present application.

[0034] In the figure: 1. workpiece; 2. feeding chamber; 3. feeding buffer chamber; 4. feeding transition chamber; 5. coating chamber; 6. discharging transition chamber; 7. discharging buffer chamber; 8. discharging chamber; 9. target material; 10. magnetron sputtering cathode; 11. material rack; 12. independent roller drive unit; 13. vacuum partition door. DETAILED DESCRIPTION

[0035] In order to enable those skilled in the art to better understand the technical solutions in this application, the technical solutions in the embodiments of this application will be clearly and completely described below in conjunction with the drawings in the embodiments of this application. Obviously, the described embodiments are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of this application.

[0036] In the description of the present invention, it should be noted that the orientations or positional relationships indicated by the terms "upper", "middle", "lower", "inner", "outer", "front", "back", etc. are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or component referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. The terms "first", "second", and "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances. The following describes an implementation method of the present invention based on its overall structure.

[0037] Reference Figure 1 As shown, the embodiment of the present application provides a surface treatment method for hot stamping parts in a vacuum environment, comprising the following steps:

[0038] Providing a workpiece 1 for surface treatment;

[0039] Transporting the workpiece 1 to the feed chamber 2;

[0040] The workpiece 1 is transported from the feed chamber 2 to the feed buffer chamber 3, and the workpiece 1 is cleaned in the feed buffer chamber 3;

[0041] Transporting the workpiece 1 from the feed buffer chamber 3 to the feed transition chamber 4;

[0042] The workpiece 1 is transported from the feeding transition chamber 4 to the coating chamber 5, and the coating chamber 5 is set to a high vacuum state for coating the workpiece 1;

[0043] The workpieces that have been coated are transported in the order of the discharging transition chamber 6, the discharging buffer chamber 7 and the discharging chamber 8 to complete the unloading of the workpiece 1;

[0044] Among them, the feed transition chamber 4 and the discharge transition chamber 6 are set to a high vacuum state; the feed buffer chamber 3 and the discharge buffer chamber 7 are set to a medium vacuum state; the feed chamber 2 and the discharge chamber 8 are set to a low vacuum state.

[0045] According to the above steps, those skilled in the art can arrange to perform surface treatment on the workpiece. Specifically, the workpiece 1 can be arranged to be transported to the coating chamber 5 for coating.

[0046] First, a person skilled in the art arranges to convey the workpiece 1 to the feeding chamber 2, and prepares to continue to load the workpiece. Then, the workpiece 1 is further conveyed to the feeding buffer chamber 3, and then the workpiece 1 is conveyed from the feeding buffer chamber 3 to the feeding transition chamber 4. When the workpiece 1 is conveyed to the feeding buffer chamber 3, the workpiece 1 can be cleaned.

[0047] Through the above process, the workpiece 1 is cleaned when it is conveyed to the material buffer chamber 3 , so that the surface of the workpiece 1 can be cleaned, and dirt such as dust and oil on the surface of the workpiece 1 can be effectively removed.

[0048] Preferably, in the step of "cleaning the workpiece in the feed buffer chamber", a plasma cleaning device is used to clean the workpiece. The plasma cleaning device can significantly improve the effect of removing dirt such as dust and oil on the outer wall of the workpiece 1.

[0049] Furthermore, the workpiece 1 in the feeding transition chamber 4 can be continuously transported to the coating chamber 5. The coating chamber 5 can be set to a high vacuum state, so that the coating process can be stably performed on the workpiece 1.

[0050] In the above process, the workpiece 1 is coated in the coating chamber 5. After the coating process is completed, the technicians in this field can arrange for the workpiece 1 to be transported to the discharge transition chamber 6, and then transport the workpiece 1 from the discharge transition chamber 6 through the discharge buffer chamber 7 and the discharge chamber 8 in sequence.

[0051] It is worth noting that in the above process, the workpiece 1 passes through the feed chamber 2, the feed buffer chamber 3, the feed transition chamber 4, the coating chamber 5, the discharge buffer chamber 7 and the discharge chamber 8 in sequence, and, in the above setting, the coating chamber 5 is set to a high vacuum state. Further, those skilled in the art can set the feed transition chamber 4 and the discharge transition chamber 6 to a high vacuum state; the feed buffer chamber 3 and the discharge buffer chamber 7 to a medium vacuum state; and the feed chamber 2 and the discharge chamber 8 to a low vacuum state.

[0052] According to the above settings, those skilled in the art set the feeding transition chamber 4 and the discharging transition chamber 6 adjacent to the coating chamber 5 to a high vacuum state, so that the coating chamber 5 can be kept in a high vacuum state during the transportation of the workpiece 1.

[0053] It is worth noting that in the above process, the workpiece 1 first passes through the feed chamber 2, and the feed chamber 2 is set to a low vacuum state. Then the workpiece 1 is transported from the feed chamber 2 to the feed buffer chamber 3, and the feed buffer chamber 3 is set to a medium vacuum state. That is, the workpiece 1 is transported from a low vacuum state environment to a medium vacuum state environment, and then from a medium vacuum state environment to a high vacuum state environment. The above process allows the workpiece 1 to be stably transported to the coating chamber 5.

[0054] Corresponding to the above-mentioned feeding, after the workpiece 1 is coated, the workpiece 1 is transported from the discharge transition chamber 6 to the discharge buffer chamber 7 in the medium vacuum state, and then transported from the discharge buffer chamber 7 in the medium vacuum state to the discharge chamber 8 in the low vacuum state. The above-mentioned process allows the workpiece 1 to be discharged stably after coating. Moreover, the workpiece 1 is transported from the high vacuum state environment to the medium vacuum state environment and the low vacuum state environment in sequence, so that the coating layer formed on the workpiece 1 can be kept stable during the discharge process.

[0055] From the above process, the technicians in this field set the two sides of the coating chamber 5 in a high vacuum state as the feeding transition chamber 4 and the discharging transition chamber 6 in a high vacuum state, so that in the process of continuously conveying multiple workpieces 1, the vacuum resetting time in the feeding transition chamber 4 and the discharging transition chamber 6 can be shortened, so that the coating chamber can always maintain a high vacuum environment state to achieve continuous coating.

[0056] according to Figure 1In this embodiment, the volume of the coating chamber 5 is larger than the volume of the feeding transition chamber 4 and the discharging transition chamber 6. It can be understood that the volume of the coating chamber 5 is relatively large, and the coating chamber 5 needs to be opened when the workpiece 1 is transported into and out of the coating chamber 5. The opening of the coating chamber 5 will cause the vacuum to be destroyed, and it takes more time for the coating chamber 5 with a larger volume to restore the vacuum. In this embodiment, the two sides of the coating chamber 5 in a high vacuum state are the feeding transition chamber 4 and the discharging transition chamber 6 in a high vacuum state, so that the vacuum in the coating chamber 5 can be kept unchanged.

[0057] By means of the above arrangement, when the workpiece 1 is transported to the coating chamber 5, the vacuum degree in the coating chamber 5 does not change, so that the coating process can be immediately performed on the workpiece 1. That is, during the process of transporting the workpiece 1 to the coating chamber 4, the change in vacuum degree is transferred to the feeding transition chamber 4; after the workpiece 1 is transported out of the coating chamber 4, the change in vacuum degree is transferred to the discharging transition chamber 6. The above process enables the coating chamber 5 to perform continuous coating processing on the workpiece 1, thereby significantly improving the efficiency of coating the workpiece 1.

[0058] In the above embodiment, the coating chamber 5 is set to a high vacuum state, the feeding transition chamber 4 and the discharging transition chamber 6 are set to a high vacuum state; the feeding buffer chamber 3 and the discharging buffer chamber 7 are set to a medium vacuum state; the feeding chamber 2 and the discharging chamber 8 are set to a low vacuum state. Preferably, the vacuum degree of the low vacuum state is 10 5 ~10 -1 Pa; the vacuum degree of the medium vacuum state is 10 -1 ~10 -3 ; The vacuum degree of high vacuum state is 10 -3 ~10 -5 Pa.

[0059] By means of the above arrangement, the workpiece 1 can be transported stably and the coating process can be carried out continuously and stably.

[0060] In an optional embodiment, preferably, magnetron sputtering cathodes 10 and target materials 9 are installed on both sides of the inner wall of the coating chamber 5 for coating the workpiece. That is, magnetron sputtering cathodes 10 and target materials are arranged on both sides of the inner wall of the coating chamber 5, and after the workpiece 1 is transported into the coating chamber 5, the magnetron sputtering cathodes 10 and target materials 9 are arranged on both sides for coating.

[0061] More preferably, the target material 9 is made of zinc, and the target material 9 is configured as a cylindrical structure so that the path of the sputtered target ions diverges in a fan-shaped direction.

[0062] By virtue of the above structure, the cylindrical target material 9 can make the range of sputtered target ions fan-shaped during the process of sputtering target ions, thereby significantly improving the coating effect of the workpiece 1.

[0063] In the above-mentioned arrangement structure, a feed chamber 2, a feed buffer chamber 3, a feed transition chamber 4, a coating chamber 5, a discharge buffer chamber 7 and a discharge chamber 8 are sequentially arranged. Preferably, a vacuum isolation door 13 is arranged between the feed buffer chamber 3 and the adjacent feed chamber 2 and feed transition chamber 4; a vacuum isolation door 13 is arranged between the discharge buffer chamber 7 and the adjacent discharge chamber 8 and discharge transition chamber 6; and a vacuum isolation door 13 is arranged between the coating chamber 5 and the adjacent feed transition chamber 4 and discharge transition chamber 6.

[0064] By means of the above structure, the feed chamber 2, the feed buffer chamber 3, the feed transition chamber 4, the coating chamber 5, the discharge buffer chamber 7 and the discharge chamber 8 are arranged in sequence, and vacuum partition doors 13 are provided between adjacent ones, so that the vacuum degree in each structure can be stably maintained, making the processing environment in the coating chamber 5 more stable.

[0065] In the above process, preferably, the workpiece 1 is placed on the rack 11, and the workpiece 1 is transported by the rack 11. Specifically, those skilled in the art can set the workpiece 1 to be fixed on the rack 11 on the loading side, and then translate the rack 11 with the workpiece 1 to the side of the feed chamber 2 through a lateral translation trolley. In one embodiment, the rack 11 is transported to the feed chamber 2, and the partition door is closed to perform low vacuum, and the rack 11 with the workpiece 1 enters the feed buffer chamber 3 to perform medium vacuum.

[0066] Through the above process, the coating process of the workpiece 1 can be realized by fully automatic feeding and unloading under the action of the material rack 11 and the translation trolley, thereby significantly improving the processing efficiency of the workpiece 1.

[0067] More preferably, the rack 11 has an upper part and a lower part, the lower part is provided with a guide rail for conveying the workpiece, and the upper part is provided with a fixing device for positioning and fixing the workpiece. In this embodiment, those skilled in the art can set the guide rail and the fixing device on the rack 11, fix the relative position of the workpiece 1 by the fixing device, and then convey the rack by the guide rail.

[0068] In an optional embodiment, the material rack 11 further has a side bracket, and the side bracket and the bottoms of the feed transition chamber 4, the feed buffer chamber 3 and the feed chamber 2, and the discharge transition chamber 6, the discharge buffer chamber 7 and the discharge chamber 8 are all provided with independent roller driving parts 12 for conveying the material rack 11. According to the above embodiment, the material rack 11 is provided with a guide rail, and the material rack 11 can be stably conveyed by the independent roller driving part 12.

[0069] In this embodiment, preferably, before the workpiece 1 is transported from the feed buffer chamber 3 to the feed transition chamber 4, the coating chamber 5 is in an inert gas atmosphere. That is, those skilled in the art can arrange that an inert gas, such as an argon atmosphere and a condensation pipeline are passed through the coating chamber 5.

[0070] The above structure can keep the environment in the coating room stable, so that a stable processing environment can be maintained during the continuous processing of multiple workpieces 1, which significantly improves the processing effect during the continuous processing and avoids the risk of hydrogen embrittlement.

[0071] In summary, by setting, the coating chamber 5 is set to a high vacuum state, and the feeding transition chamber 4 and the discharging transition chamber 6 are set to a high vacuum state, so that the film layer on the outer wall of the workpiece 1 has high quality, strong adhesion and uniform thickness. Since the coating chamber 5 is always in a vacuum state and the vacuum is not broken, the vacuum pumping time of the coating chamber is saved, the power consumption is saved, the manual pushing and pushing steps of the material rack of the periodic coating machine are reduced, and the labor intensity of the operator is reduced; and it can meet the continuous production of high-yield batch parts, especially suitable for the surface galvanizing of hot-formed stamping parts in the automotive industry.

[0072] Although different specific embodiments are mentioned in the content of this application, this application is not limited to the situations described in the industry standards or embodiments, etc. Some industry standards or slightly modified implementation plans based on the implementation of the custom methods or embodiments can also achieve the same, equivalent or similar, or predictable implementation effects after deformation of the above embodiments. The embodiments of data acquisition, processing, output, judgment methods, etc. after these modifications or deformations can still fall within the scope of the optional implementation plans of this application.

[0073] Although the present application has been described through embodiments, those skilled in the art will appreciate that there are many modifications and changes to the present application without departing from the spirit of the present application. It is intended that the attached embodiments include these modifications and changes without departing from the present application.

Claims

1. A surface treatment method for hot stamping parts under vacuum environment, characterized in that: The following steps are involved: providing a workpiece for surface treatment; conveying the workpiece to a feed chamber; transporting the workpiece from the feed chamber to a feed buffer chamber, and cleaning the workpiece in the feed buffer chamber; Transporting the workpiece from the feed buffer chamber to the feed transition chamber; The workpiece is transported from the feeding transition chamber to a coating chamber, wherein the coating chamber is set to a high vacuum state for coating the workpiece; The workpiece after coating is transported in the order of the discharging transition chamber, the discharging buffer chamber and the discharging chamber, so as to complete the unloading of the workpiece; Among them, the feed transition chamber and the discharge transition chamber are set to a high vacuum state; the feed buffer chamber and the discharge buffer chamber are set to a medium vacuum state; the feed chamber and the discharge chamber are set to a low vacuum state.

2. The surface treatment method of hot stamping parts under vacuum environment according to claim 1 is characterized in that: The vacuum degree of the low vacuum state is 10 5 ~10 -1 Pa; the vacuum degree of the medium vacuum state is 10 -1 ~10 -3 The vacuum degree of the high vacuum state is 10 -3 ~10 -5 Pa.

3. The surface treatment method of hot stamping parts under vacuum environment according to claim 1, characterized in that: Magnetron sputtering cathodes and targets are installed on both sides of the inner wall of the coating chamber for coating the workpiece.

4. The surface treatment method of hot stamping parts under vacuum environment according to claim 1, characterized in that: A vacuum partition door is provided between the feed buffer chamber and the adjacent feed chamber and the feed transition chamber; a vacuum partition door is provided between the discharge buffer chamber and the adjacent discharge chamber and the discharge transition chamber; a vacuum partition door is provided between the coating chamber and the adjacent feed transition chamber and the discharge transition chamber.

5. The surface treatment method of hot stamping parts under vacuum environment according to claim 1, characterized in that: The workpiece is placed on a material rack, and the workpiece is transported through the material rack.

6. The surface treatment method of hot stamping parts under vacuum environment according to claim 5, characterized in that: The bottom of the material rack has an upper part and a lower part, the lower part is arranged as a guide rail for conveying the workpiece; the upper part is arranged with a fixing device for positioning and fixing the workpiece.

7. The surface treatment method of hot stamping parts under vacuum environment according to claim 6, characterized in that: The material rack also has a side bracket, and the side bracket and the bottoms of the feed transition chamber, the feed buffer chamber and the feed chamber, as well as the discharge transition chamber, the discharge buffer chamber and the discharge chamber are all provided with independent roller driving parts for conveying the material rack.

8. The surface treatment method of hot stamping parts under vacuum environment according to claim 1, characterized in that: In the step of "cleaning the workpiece in the feed buffer chamber", a plasma cleaning device is used to clean the workpiece.

9. The surface treatment method of hot stamping parts under vacuum environment according to claim 1, characterized in that: Before "transporting the workpiece from the feed buffer chamber to the feed transition chamber" is completed, the coating chamber is in an inert gas atmosphere.

10. The surface treatment method of hot stamping parts under vacuum environment according to claim 3, characterized in that: The target material is made of zinc, and the target material is arranged in a cylindrical structure so as to make the path of the sputtered target ions diverge in a fan-shaped direction.

Images