Ultra-narrow line colorful marking system and method for non-mirror metal material

Abstract

The invention discloses an ultra-narrow line colorful marking system and method for a non-mirror metal material, and the system comprises a marble seat stand, an infrared femtosecond laser, a blue laser, a light path system, a Z-axis motion platform, a CCD camera, an XY-axis motion platform, and a constant-temperature carrying platform. A marble base and a water marble platform are formed on the marble seat stand; the optical path system comprises an infrared beam expander, an infrared reflector, a multiband beam mirror, a first multiband reflector, an optical filter, an infrared beam monitor, a second multiband reflector, a third multiband reflector, a multiband laser scanning galvanometer and a multiband focus lens; the XY-axis motion platform is installed at the front end of the top face of the marble base, and the constant-temperature carrying table is installed at the driving end of the XY-axis motion platform. According to the invention, ultra-narrow line colorful marking can be carried out on the non-mirror metal material.

Description

Technical Field

[0001] The present invention relates to the technical field of colorful marking systems, and in particular to an ultra-narrow line colorful marking system and method for non-mirror metal materials. Background Art

[0002] The existing colorful technology mainly uses infrared picosecond as the laser light source, and adopts the filling line method to mark and form regular micron-level diffraction patterns to achieve a colorful effect.

[0003] Although this technology is currently widely used, there are several problems. First, the colorful effect of infrared picosecond is extremely dependent on the surface state of the material. Generally, the metal surface must achieve a mirror effect, that is, Ra≤0.01um, in order to produce a colorful structure. Second, the colorful microstructure of infrared picosecond is at the micron level, and a filling process must be used to achieve a colorful marking effect. Because the number of lines that need to be processed is significantly increased, the processing efficiency is greatly limited. It is not suitable for some companies that require efficient production. Third, using the filling line method, the single line width must be at least 100um, and the processing line width cannot be effectively controlled, and the processing precision is limited. Summary of the invention

[0004] The object of the present invention is to provide a system and method for ultra-narrow line colorful marking of non-mirror metal materials.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] An ultra-narrow line colorful marking system for non-mirror metal materials, comprising a marble base, an infrared femtosecond laser, a blue laser, an optical path system, a Z-axis motion platform, a CCD camera, an XY-axis motion platform and a constant temperature stage;

[0007] The marble pedestal is formed with a marble base and a marble platform horizontally arranged above the rear end of the top surface of the marble base;

[0008] The marble platform has a first launch position and a second launch position formed on the top surface of the middle section, one behind the other, and a marking area and a Z-axis motion area formed on both sides of the front end of the middle section;

[0009] The marble platform is provided with a main body section parallel to the middle section and an outer edge section extending forward from the main body section on the top surface of one side adjacent to the marking position, a first light receiving position opposite to the first emitting position and a second light receiving position opposite to the second emitting position are formed on the main body section, and an external emitting position, a filtering position and a monitoring position are formed in sequence from back to front on the outer edge section, and the external emitting position is opposite to the top of the marking area;

[0010] The infrared femtosecond laser is arranged at a first emission position, and the blue light laser is arranged at a second emission position;

[0011] The optical path system includes an infrared beam expander and an infrared reflector, one inside and one outside, arranged at a first light receiving position, a multi-band beam mirror arranged at a second light receiving position, a first multi-band reflector arranged at an external emission position, a filter arranged at a filter position, an infrared beam monitor arranged at a monitoring position, a second multi-band reflector arranged at the top of a marking area, a third multi-band reflector arranged at the bottom of the marking area, a multi-band laser scanning galvanometer arranged at one side of the third multi-band reflector adjacent to a Z-axis motion area, and a multi-band focusing mirror arranged at the bottom of the multi-band laser scanning galvanometer;

[0012] The Z-axis motion platform is installed in the Z-axis motion area, and the lifting drive end of the Z-axis motion platform is connected to the multi-band laser scanning galvanometer on one side and the CCD camera on the other side;

[0013] The XY axis motion platform is installed on the top front end of the marble base, and the constant temperature carrier is installed on the driving end of the XY axis motion platform.

[0014] As a further technical solution of the present invention: the constant temperature carrier is heated to 50-60° C. to preliminarily preheat the pre-processed non-mirror metal material placed thereon.

[0015] As a further technical solution of the present invention: the constant temperature carrier is a copper or brass base.

[0016] As a further technical solution of the present invention: the infrared femtosecond laser has a wavelength range of 1030±3nm, a pulse width of ≤450fs, an adjustable frequency of 1k~400khz, and a power of ≤10w.

[0017] As a further technical solution of the present invention: the infrared femtosecond laser is set to have a light output frequency of 100-200k and a power of 1.0-2.0w.

[0018] As a further technical solution of the present invention: the wavelength range of the blue laser is 430-460nm, and the power is ≤5w.

[0019] As a further technical solution of the present invention: the light output power of the blue laser is set to 2-4w.

[0020] As a further technical solution of the present invention: the scanning speed of the multi-band laser scanning galvanometer is 200-500 mm / s.

[0021] As a further technical solution of the present invention: the marble base is formed with two marble support blocks which are relatively arranged on both sides of the rear end of the top surface of the marble base, and the marble platform connects the tops of the two marble support blocks.

[0022] In addition, the present invention is necessary to provide an ultra-narrow line dazzling color marking method for an ultra-narrow line dazzling color marking system of a non-mirror metal material.

[0023] An ultra-narrow line colorful marking method for an ultra-narrow line colorful marking system for non-mirror metal materials comprises the following steps: in the first step, a constant temperature stage is heated to a preset temperature, and a pre-processed non-mirror metal material is placed on the constant temperature stage for preliminary preheating; in the second step, the system controls the Z-axis motion platform to adjust the focus of the multi-band focusing mirror to the workpiece surface +0.2mm to +0.3mm; in the third step, a CCD camera is used to find feature points of the workpiece and determine the processing position of the pattern; in the fourth step, the infrared femtosecond laser output frequency and power, the blue light laser output power and the multi-band laser scanning galvanometer scanning speed are set; in the fifth step, the system controls the multi-band laser scanning galvanometer to swing The infrared femtosecond laser and the blue light laser emit light at the same time. The blue light laser emits blue light, which reaches the surface of the workpiece through the multi-band beam combiner, the first multi-band reflector, the second multi-band reflector, the third multi-band reflector, the multi-band laser scanning galvanometer and the multi-band focusing field mirror, thereby realizing secondary preheating during the workpiece processing; the infrared femtosecond laser emits an infrared laser with a femtosecond pulse width, which reaches the surface of the workpiece through the infrared beam expander, the infrared reflector, the multi-band beam combiner, the first multi-band reflector, the second multi-band reflector, the third multi-band reflector, the multi-band laser scanning galvanometer and the multi-band focusing field mirror, and colorfully marks the single line pattern on the surface of the non-mirror metal workpiece according to the planned path.

[0024] Compared with the prior art, the beneficial effects of the present invention are as follows: the present invention proposes a system and method for colorful marking of ultra-narrow lines of non-mirror metal materials, which realizes preliminary preheating of non-mirror metal materials through the coordination among a marble base, an infrared femtosecond laser, a blue light laser, an optical path system, a Z-axis motion platform, a CCD camera, an XY-axis motion platform and a constant temperature stage at a specific constant temperature stage temperature, thereby reducing the power output of the blue light laser processing process and improving the energy utilization rate of the system; and by adjusting the output power and scanning speed of the blue light laser to control and stabilize the secondary preheating temperature during the processing process, ensuring that the infrared femtosecond laser processing process stably induces the metal inside the narrow line to produce regular nano-scale diffraction patterns; and by adjusting the infrared femtosecond laser defocus, laser frequency, laser power and scanning speed, a rapid marking effect of ultra-narrow line width within 20um is achieved, and regular nano-diffraction patterns are generated to achieve colorful marking effect on the surface of non-mirror metal. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 Schematic diagram of the ultra-narrow line colorful marking system for non-mirror metal materials.

[0026] Figure 2 A partial view of the ultra-narrow line colorful marking system for non-mirror metal materials.

[0027] Figure 3 Schematic diagram of the ultra-narrow line colorful marking system for non-mirror metal materials. DETAILED DESCRIPTION

[0028] The specific implementation of the present invention is described in detail below in conjunction with the accompanying drawings. It should be understood that the specific implementation described here is only used to illustrate and explain the present invention, and is not used to limit the protection scope of the present invention.

[0029] See also Figure 1 , Figure 2 and Figure 3 , an ultra-narrow line colorful marking system for non-mirror metal materials, comprising a marble base 10, an infrared femtosecond laser 20, a blue laser 30, an optical path system 40, a Z-axis motion platform 50, a CCD camera 60, an XY-axis motion platform 70 and a constant temperature stage 80;

[0030] The marble base 10 is formed with a marble base 11, two marble support blocks 12 disposed oppositely on both sides of the rear end of the top surface of the marble base 11, and a marble platform 13 disposed horizontally above the rear end of the top surface of the marble base 11 to connect the tops of the two marble support blocks 12;

[0031] The marble platform 13 has a first launch position 131 and a second launch position 132 formed on the top surface of the middle section, and a marking area 133 and a Z-axis motion area 134 formed on both sides of the front end of the middle section;

[0032] The marble platform 13 is provided with a main body section 101 parallel to the middle section and an outer edge section 102 extending forward from the main body section 101 on the top surface of one side adjacent to the marking position. The main body section 101 is formed with a first light receiving position 91 opposite to the first emission position 131 and a second light receiving position 92 opposite to the second emission position 132. The outer edge section 102 is formed with an external emission position 93, a filter position 94 and a monitoring position 95 in sequence from back to front, and the external emission position 93 is opposite to the top of the marking area 133.

[0033] The infrared femtosecond laser 20 is arranged at the first emission position 131, and the blue light laser 30 is arranged at the second emission position 132;

[0034] The optical path system 40 includes an infrared beam expander 41 and an infrared reflector 42, which are arranged at a first light receiving position 91, one inside and one outside, a multi-band beam mirror 43, which is arranged at a second light receiving position 92, a first multi-band reflector 44, which is arranged at an external emission position 93, a filter 45, which is arranged at a filter position 94, an infrared beam monitor 46, which is arranged at a monitoring position 95, a second multi-band reflector 47, which is arranged at the top of the marking area 133, a third multi-band reflector 48, which is arranged at the bottom of the marking area 133, a multi-band laser scanning galvanometer 49, which is arranged at one side of the third multi-band reflector 48 adjacent to the Z-axis motion area 134, and a multi-band focusing mirror 491, which is arranged at the bottom of the multi-band laser scanning galvanometer 49;

[0035] The Z-axis motion platform 50 is installed in the Z-axis motion area 134, and the lifting drive end of the Z-axis motion platform 50 is connected to the multi-band laser scanning galvanometer 49 on one side and the CCD camera 60 on the other side;

[0036] The XY-axis motion platform 70 is installed on the top front end of the marble base 11, and the constant temperature stage 80 is installed on the driving end of the XY-axis motion platform 70. After the pre-processed non-mirror metal material is placed on the constant temperature stage 80 for preliminary preheating, the system controls the Z-axis motion platform 50 to adjust the focus of the multi-band focusing mirror 491 to +0.2mm~+0.3mm on the workpiece surface, and searches for the workpiece feature points with the CCD camera 60. After determining the processing position of the pattern, the system controls the multi-band laser scanning galvanometer 49 to swing and emit light simultaneously with the infrared femtosecond laser 20 and the blue light laser 30, and colorfully marks the single-line pattern on the surface of the non-mirror metal workpiece according to the planned path.

[0037] Furthermore, in this embodiment, the constant temperature stage 80 is heated to 50-60° C. during the initial preheating to improve the absorption rate of the blue laser.

[0038] Furthermore, in this embodiment, the constant temperature carrier 80 is a copper or brass base.

[0039] Furthermore, in this embodiment, the infrared femtosecond laser 20 has a wavelength range of 1030±3nm, a pulse width ≤450fs, an adjustable frequency of 1k~400khz, and a power ≤10w; specifically, the infrared femtosecond laser 20 has a set light output frequency of 100~200k and a power of 1.0~2.0w.

[0040] Furthermore, in this embodiment, the wavelength range of the blue laser 30 is 430-460 nm, and the power is ≤5 W. Specifically, the output power of the blue laser 30 is set to be 2-4 W.

[0041] Furthermore, in this embodiment, the scanning speed of the multi-band laser scanning galvanometer 49 is 200-500 mm / s.

[0042] It can be understood that an ultra-narrow line colorful marking method of an ultra-narrow line colorful marking system for non-mirror metal materials includes the following steps: the first step is to heat the constant temperature stage 80 to a preset temperature, and place the pre-processed non-mirror metal material on the constant temperature stage 80 for preliminary preheating; the second step is that the system controls the Z-axis motion platform 50 to adjust the focus of the multi-band focusing mirror 491 to the workpiece surface +0.2mm~+0.3mm; the third step is to use the CCD camera 60 to find the feature points of the workpiece and determine the processing position of the pattern; the fourth step is to set the light frequency and power of the infrared femtosecond laser 20, set the light power of the blue light laser 30 and set the scanning speed of the multi-band laser scanning galvanometer 49; the fifth step is to control the swing of the multi-band laser scanning galvanometer 49 The infrared femtosecond laser 20 and the blue laser 30 emit light at the same time. The blue laser 30 emits blue light, which passes through the multi-band beam combiner, the first multi-band reflector 44, the second multi-band reflector 47, the third multi-band reflector 48, the multi-band laser scanning galvanometer 49 and the multi-band focusing field mirror to reach the surface of the workpiece, realizing secondary preheating during the workpiece processing process; the infrared femtosecond laser 20 emits infrared laser with a femtosecond pulse width, which passes through the infrared beam expander 41, the infrared reflector 42, the multi-band beam combiner, the first multi-band reflector 44, the second multi-band reflector 47, the third multi-band reflector 48, the multi-band laser scanning galvanometer 49 and the multi-band focusing field mirror to reach the surface of the workpiece, and the single line pattern is colorfully engraved on the surface of the non-mirror metal workpiece according to the planned path. In this way, the ultra-narrow line colorful marking of the non-mirror metal workpiece is completed.

[0043] In summary, the ultra-narrow line colorful marking system and method of non-mirror metal materials of the present invention realizes the initial preheating of non-mirror metal materials through the cooperation between the marble base 10, the infrared femtosecond laser 20, the blue laser 30, the optical path system 40, the Z-axis motion platform 50, the CCD camera 60, the XY-axis motion platform 70 and the constant temperature stage 80 at a specific constant temperature stage 80 temperature, which can reduce the power output of the blue laser 30 during the processing process and improve the energy utilization rate of the system; and by adjusting the output power and scanning speed of the blue laser 30 to control and stabilize the secondary preheating temperature during the processing process, ensure that the infrared femtosecond laser processing process stably induces the metal inside the narrow line to produce regular nano-level diffraction patterns; and by adjusting the infrared femtosecond laser defocus, laser frequency, laser power and scanning speed, the rapid marking effect of ultra-narrow line width within 20um is achieved, and regular nano-diffraction patterns are generated to achieve the colorful marking effect of non-mirror metal surface.

[0044] As long as it does not violate the creative ideas of the present invention, any combination of the various embodiments of the present invention shall be regarded as the contents disclosed by the present invention; within the technical concept of the present invention, any combination of various simple modifications of the technical scheme and different embodiments that does not violate the creative ideas of the present invention shall be within the protection scope of the present invention.

Claims

1. An ultra-narrow line colorful marking system for non-mirror metal materials, characterized by: It comprises a marble base (10), an infrared femtosecond laser (20), a blue laser (30), an optical path system (40), a Z-axis motion platform (50), a CCD camera (60), an XY-axis motion platform (70) and a constant temperature stage (80); The marble base (10) is formed with a marble pedestal (11) and a marble platform (13) horizontally arranged above the rear end of the top surface of the marble pedestal (11); The marble platform (13) is provided with a first emitting position (131) and a second emitting position (132) on the top surface of the middle section, one behind the other, and a marking area (133) and a Z-axis motion area (134) are formed on both sides of the front end of the middle section; The marble platform (13) is provided with a main body section (101) parallel to the middle section and an outer edge section (102) extending forward from the main body section (101) on the top surface of one side adjacent to the marking position. A first light receiving position (91) opposite to the first emitting position (131) and a second light receiving position (92) opposite to the second emitting position (132) are formed on the main body section (101). An external emitting position (93), a filtering position (94) and a monitoring position (95) are sequentially formed on the outer edge section (102) from back to front, and the external emitting position (93) is opposite to the top of the marking area (133). The infrared femtosecond laser (20) is arranged at a first emission position (131), and the blue light laser (30) is arranged at a second emission position (132); The optical path system (40) comprises an infrared beam expander (41) and an infrared reflector (42) arranged at a first light receiving position (91), one inside and one outside, a multi-band beam mirror (43) arranged at a second light receiving position (92), a first multi-band reflector (44) arranged at an external emission position (93), a filter (45) arranged at a filter position (94), an infrared beam monitor (46) arranged at a monitoring position (95), a second multi-band reflector (47) arranged at the top of a marking area (133), a third multi-band reflector (48) arranged at the bottom of the marking area (133), a multi-band laser scanning galvanometer (49) arranged at one side of the third multi-band reflector (48) adjacent to a Z-axis motion area (134), and a multi-band focusing mirror (491) arranged at the bottom of the multi-band laser scanning galvanometer (49); The Z-axis motion platform (50) is installed in the Z-axis motion area (134), and the lifting drive end of the Z-axis motion platform (50) is connected to the multi-band laser scanning galvanometer (49) on one side and to the CCD camera (60) on the other side; The XY axis motion platform (70) is mounted on the front end of the top surface of the marble base (11), and the constant temperature carrier (80) is mounted on the driving end of the XY axis motion platform (70).

2. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The constant temperature carrier (80) is heated to 50-60°C to preliminarily preheat the pre-processed non-mirror metal material placed thereon.

3. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The constant temperature carrier (80) is a copper or brass base.

4. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The infrared femtosecond laser (20) has a wavelength range of 1030±3nm, a pulse width of ≤450fs, an adjustable frequency of 1k-400khz, and a power of ≤10w.

5. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The infrared femtosecond laser (20) is set to have a light output frequency of 100-200 k and a power of 1.0-2.0 w.

6. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The blue laser (30) has a wavelength range of 430-460 nm and a power of ≤5 W.

7. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The blue laser (30) is set to have an output light power of 2-4 W.

8. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The scanning speed of the multi-band laser scanning galvanometer (49) is 200-500 mm / s.

9. The ultra-narrow line colorful marking system for non-mirror metal materials according to claim 1, characterized in that: The marble base (10) is formed with two marble support blocks (12) which are arranged oppositely on both sides of the rear end of the top surface of the marble base (11), and the marble platform (13) connects the tops of the two marble support blocks (12).

10. An ultra-narrow line dazzling color marking method of an ultra-narrow line dazzling color marking system for non-mirror metal materials according to any one of claims 1 to 9, characterized in that: The following steps are involved: In the first step, the constant temperature carrier (80) is heated to a preset temperature, and the pre-processed non-mirror metal material is placed on the constant temperature carrier (80) for preliminary preheating; in the second step, the system controls the Z-axis motion platform (50) to adjust the focus of the multi-band focusing mirror (491) to the workpiece surface +0.2mm~+0.3mm; in the third step, the CCD camera (60) is used to find the feature points of the workpiece and determine the processing position of the pattern; in the fourth step, the infrared femtosecond laser (20) light output frequency and power, the blue light laser (30) light output power and the multi-band laser scanning galvanometer (49) scanning speed are set; in the fifth step, the system controls the multi-band laser scanning galvanometer (49) to swing and the infrared femtosecond laser (20) and the blue light laser (30) to emit light simultaneously, and the blue light laser (30) is controlled to rotate and rotate. The optical laser (30) emits blue light, which passes through a multi-band beam combining mirror, a first multi-band reflecting mirror (44), a second multi-band reflecting mirror (47), a third multi-band reflecting mirror (48), a multi-band laser scanning galvanometer (49) and a multi-band focusing field mirror to reach the surface of the workpiece, thereby realizing secondary preheating during the workpiece processing process; the infrared femtosecond laser (20) emits infrared laser with a femtosecond pulse width, which passes through an infrared beam expanding mirror (41), an infrared reflecting mirror (42), a multi-band beam combining mirror, a first multi-band reflecting mirror (44), a second multi-band reflecting mirror (47), a third multi-band reflecting mirror (48), a multi-band laser scanning galvanometer (49) and a multi-band focusing field mirror to reach the surface of the workpiece, thereby performing colorful marking on the surface of the non-mirror metal workpiece according to a planned path.

Images