Ion source detection system and ion source detection method

Abstract

The application provides an ion source detection system and an ion source detection method, wherein the ion source detection system comprises a vacuum device configured to provide a preset vacuum environment for an ion source; n ion sources are connected to the vacuum device; wherein each ion source is further provided with a first communication valve configured to control the communication of the vacuum environment; each ion source detection device is arranged in one-to-one correspondence with each ion source, and each ion source detection device is electrically connected to the corresponding ion source; and each ion source detection device is configured to provide a working voltage for the ion source and collect an ion intensity electrical signal output by the ion source during operation. The application provides an independent detection system for the ion source to be detected by arranging the vacuum device and the ion source detection device.

Description

Technical Field

[0001] This invention relates to the field of detection, and in particular to an ion source detection system and ion source detection method. Background Technology

[0002] The ion source is a core component in mass spectrometry. Its function is to convert the gas molecules to be analyzed into charged particles, store and focus these ions, forming a beam of ions with specific energy and shape. Therefore, the quality of the ion source directly determines the detection performance of the mass spectrometer.

[0003] However, current technologies lack measures for the independent detection of the ion source. A common approach is to troubleshoot by replacing multiple components, including the ion source, when the mass spectrometer's detection performance is poor, its performance is insufficient, or it is abnormal, in order to determine whether the ion source is the problem. However, this method is time-consuming, labor-intensive, and not always accurate. Furthermore, it is difficult to determine the cause of poor performance due to incompatibility between the ion source and other components, making it difficult to control batch variations in system-level products. Another common approach is to adjust some parameters of the mass spectrometer to restore its detection performance. However, if the problem lies in the ion source hardware, it is difficult to detect and identify, and this method is not suitable for batch detection and production.

[0004] It should be noted that the above introduction to the technical background is only for the purpose of providing a clear and complete explanation of the technical solutions of this application and facilitating understanding by those skilled in the art. It should not be assumed that these technical solutions are known to those skilled in the art simply because they have been described in the background section of this application. Summary of the Invention

[0005] In view of the shortcomings of the prior art described above, the purpose of this invention is to provide an ion source detection system and ion source detection method to solve the problems in the prior art, such as the difficulty in troubleshooting and poor results due to the lack of an independent ion source detection device, and the difficulty in mass production of ion sources.

[0006] To achieve the above and other related objectives, the present invention provides an ion source detection system, comprising: a vacuum device, n ion sources, and n ion source detection devices; where n is an integer greater than or equal to 1;

[0007] The vacuum device is used to provide a preset vacuum environment for the ion source;

[0008] The n ion sources are connected to the vacuum device; each ion source is further provided with a first connecting valve for controlling the connection to the vacuum environment;

[0009] Each of the ion source detection devices is arranged in one-to-one correspondence with each of the ion sources, and each of the ion source detection devices is electrically connected with the corresponding ion source; each ion source detection device is configured to provide a working voltage for the ion source and collect an ion intensity electrical signal output by the ion source during operation.

[0010] Optionally, the vacuum device comprises a pump group, a first chamber, and n second chambers; the pump group is connected to the first chamber and is configured to adjust the vacuum degree in the first chamber; each of the second chambers is arranged in one-to-one correspondence with each of the ion sources; a first end of each of the second chambers is connected to the first chamber, and a second end of each of the second chambers is connected to the corresponding ion source; wherein a second communication valve is further arranged on each of the second chambers and is connected to the first chamber; the volume of each of the second chambers is less than the volume of the first chamber.

[0011] Optionally, the pump group comprises a molecular pump and a backing pump; a first end of the molecular pump is in communication with the first chamber, and a second end of the molecular pump is connected to the backing pump; a vacuum valve is further arranged between the backing pump and the molecular pump.

[0012] Optionally, the vacuum device further comprises a vacuum degree adjusting assembly; the vacuum degree adjusting assembly comprises n third communication valves and n sample gas cylinders; the sample gas cylinders, the third communication valves, and the second chambers are arranged in one-to-one correspondence; the sample gas cylinders are connected to the corresponding second chambers through the third communication valves and are configured to adjust the vacuum degree of the vacuum device.

[0013] Optionally, the vacuum degree adjusting assembly further comprises a leak hole; the leak hole is arranged between the third communication valve and the corresponding sample gas cylinder; the third communication valve is arranged as a bellows valve.

[0014] Optionally, the vacuum device further comprises a vacuum degree measuring assembly; the vacuum degree measuring assembly is arranged on at least one of the first chamber and the second chambers and is configured to measure the vacuum degree of the vacuum device.

[0015] Optionally, the ion source comprises at least one of an electron impact source, a chemical ionization source, and a field ionization source.

[0016] Optionally, the ion source detection device comprises an acquisition module, a power supply module, and a comparison module; the power supply module is connected to the ion source, the acquisition module, and the comparison module, respectively, and is configured to provide a working voltage for the ion source, the acquisition module, and the comparison module, respectively; the acquisition module is connected to the ion source and is configured to collect ion intensity generated by the ion source and perform magnetic-electric conversion to obtain an ion intensity electrical signal; the comparison module is connected to the acquisition module and receives the ion intensity electrical signal, and is configured to compare the ion intensity electrical signal with a preset ion intensity electrical signal to obtain a comparison result.

[0017] Optionally, the acquisition module comprises a Faraday cup, a feedthrough, an operational amplifier and an acquisition card; the first end of the Faraday cup is connected to the output end of the ion source, and the second end is connected to the first input end of the operational amplifier through the feedthrough; the second input end of the operational amplifier is connected to a reference ground, and the output end outputs the ion intensity electrical signal; the output end of the operational amplifier is also connected to the first input end through a feedback resistor; the acquisition card is connected to the output end of the operational amplifier, and is used for analog-digital conversion and amplification output of the ion intensity electrical signal.

[0018] Optionally, an adapter pipe is arranged between the ion source and the vacuum device, and is used for dismounting each ion source located on the vacuum device.

[0019] To achieve the above object and other related objects, the present application provides an ion source detection method, which is realized based on the ion source detection system, and comprises the following steps:

[0020] a preset vacuum environment is provided; at least m first communication valves are opened so that the corresponding connected ion sources are connected to the preset vacuum environment; m ion sources are used as ion sources to be detected; m is an integer greater than or equal to 1 and less than or equal to n;

[0021] a working voltage is provided for each ion source to be detected, and an ion intensity electrical signal output by each ion source to be detected during working is acquired.

[0022] Optionally, when the vacuum device comprises a pump group, a first chamber, n second chambers and a vacuum degree adjusting assembly, after each of the m second communication valves is closed, the vacuum degree of each second chamber connected to each ion source to be detected is adjusted based on the pump group and the vacuum degree adjusting assembly, so as to obtain a linear relationship between the corresponding vacuum degree and the ion intensity electrical signal of each ion source to be detected.

[0023] Optionally, the amplitude of the working voltage of each ion source to be detected is adjusted, and the ion intensity electrical signal output by each ion source to be detected during working is acquired, so as to obtain the amplitude of the working voltage corresponding to the maximum amplitude of the ion intensity electrical signal.

[0024] As described above, the ion source detection system and the ion source detection method of the present application have the following beneficial effects:

[0025] The application provides an independent detection system for the ion source to be detected by arranging a vacuum device and an ion source detection device, which can efficiently provide more convenient detection means for the performance of various ion sources and evaluate the performance of the ion source more conveniently. In addition, the batch consistency and yield of the batch production of the ion source can be efficiently improved, and the ion source with fixed parameters can be avoided from being adjusted, discarded or re-made, thereby greatly improving the efficiency of the batch production of the ion source and mass spectrometer.

[0026] In addition, the batch consistency and stability of the mass spectrometer including the ion source can be effectively reduced, the maintainability of the ion source component can be ensured, and the service life of the ion source is prolonged. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 The structure diagram of the ion source detection system is shown.

[0028] Figure 2 The structure diagram of the ion source detection probe is shown.

[0029] Figure 3 The circuit diagram of the ion source detection device is shown.

[0030] Figure 4 The circuit diagram of the ion source provided by the application is shown.

[0031] Figure 5 The circuit diagram of another ion source provided by the application is shown.

[0032] Figure 6 The sensitivity fold line diagram of the ion source detection system for detecting the ion source to be detected is shown.

[0033] Figure 7 The relationship diagram between the pressure and the ion intensity electrical signal of the ion source to be detected is shown.

[0034] ELEMENT NUMBER EXPLANATION

[0035] 1 ion source detection system

[0036] 11 vacuum device

[0037] 111 pump group

[0038] 1111 molecular pump

[0039] 1112 backing pump

[0040] 1113 vacuum valve

[0041] 112 first chamber

[0042] 113 second chamber

[0043] 1131 second communication valve

[0044] 114 vacuum degree adjusting assembly

[0045] 1141 third communication valve

[0046] 1142 sample gas cylinder

[0047] 1143 leak hole

[0048] 115 vacuum degree measuring assembly

[0049] 1151 pirani gauge

[0050] 1152 hot cathode gauge

[0051] 12 ion source

[0052] 121 repeller electrode

[0053] 122 cathode

[0054] 123 dissociation chamber outer wall electrode

[0055] 124 extraction electrode

[0056] 125 focusing electrode

[0057] 13 ion source detection device

[0058] 130 circuit control box

[0059] 1301 control module

[0060] 131 acquisition module

[0061] 1311 faraday cup

[0062] 1311' shielding sleeve

[0063] 1312 feedthrough

[0064] 1312' electrode part

[0065] 1313 operational amplifier

[0066] 1314 acquisition card

[0067] 132 power supply module

[0068] 1321 power board

[0069] 1322 collector

[0070] 14 host computer Detailed Implementation

[0071] The following specific examples illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0072] Please see Figures 1-7 It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of the present invention. Therefore, the drawings only show the components related to the present invention and are not drawn according to the actual number, shape and size of the components in the actual implementation. In the actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and the layout of the components may also be more complex.

[0073] like Figure 1 As shown, this embodiment provides an ion source detection system 1, including: a vacuum device 11, n ion sources 12 and n ion source detection devices 13; n is an integer greater than or equal to 1.

[0074] like Figure 1 As shown, the vacuum device 11 is used to provide a preset vacuum environment for the ion source 12.

[0075] Specifically, the vacuum device includes a pump assembly 111, a first chamber 112, and n second chambers 113.

[0076] As an example, pump unit 111 is connected to first chamber 112 for adjusting the vacuum level in first chamber 112.

[0077] In this embodiment, the pump assembly 111 includes a molecular pump 1111 and a backing pump 1112; the first end of the molecular pump 1111 is connected to the first chamber 112, and the second end is connected to the backing pump 1112; a vacuum valve 1113 is also provided between the backing pump 1112 and the molecular pump 1111, and the molecular pump 1111 and the backing pump 1112 are connected by the vacuum valve 1113.

[0078] In this system, the molecular pump 1111 primarily utilizes a high-speed rotating impeller to extract gas molecules from the first chamber 112, thereby achieving a vacuum state. The backing pump 1112 ionizes gas molecules through an electric field and thermal collisions, then removes them through electrostatic adsorption or squeezes the gas out of the chamber through a peristaltic diaphragm pump. In this embodiment, after opening the vacuum valve 1113, the backing pump 1112 is started first. When the system vacuum level is monitored to be better than 100 Pa, the molecular pump 1111 is started, and the vacuum environment is considered stable after the molecular pump 1111's rotation speed stabilizes for 5 minutes.

[0079] As an example, each second chamber 113 is arranged in one-to-one correspondence with each ion source 12; the first end of each second chamber 113 is respectively connected to the first chamber 112, and the second end is respectively connected to the corresponding ion source 12; wherein, a second communication valve 1131 is further arranged on each second chamber 113 to connect the first chamber 112; the volume of the second chamber 113 is smaller than the volume of the first chamber 112, that is, when vacuum is extracted, the vacuum degree of the second chamber 113 is easy to be adjusted to form a high vacuum environment, thereby improving the working efficiency; the vacuum degree of the first chamber 112 is more stable. In the embodiment, it is preferred that the volume of the second chamber 113 is less than 1000 mL.

[0080] It should be noted that only the second chamber 113 can be arranged for measurement, as long as the ion source 12 is provided with a preset vacuum environment, which is within the protection scope of the embodiment.

[0081] As an example, the vacuum device 11 further comprises a vacuum degree adjusting assembly 114; the vacuum degree adjusting assembly comprises n third communication valves 1141 and n sample gas cylinders 1142; the sample gas cylinder 1142, the third communication valve 1141 and the second chamber 113 are arranged in one-to-one correspondence; the sample gas cylinder 1142 is connected to the corresponding second chamber 113 through the third communication valve 1141, and is used for adjusting the vacuum degree of the vacuum device.

[0082] In the embodiment, the sample gas cylinder 1142 can be arranged to include but not limited to nitrogen, oxygen, argon, and can also be arranged as clean air. Any gas as long as it does not affect the working process of the ion source is within the protection scope of the embodiment.

[0083] In the embodiment, the vacuum degree adjusting assembly further comprises a leak hole 1143; the leak hole 1143 is arranged between the third communication valve 1141 and the corresponding sample gas cylinder 1142; the third communication valve 1141 is arranged as a bellows valve. In the embodiment, by arranging the leak hole 1143 and the bellows valve, the gas injected into the second chamber 113 is limited to flow stably, thereby avoiding the problem of inaccurate detection caused by the steep rise of the subsequent adjustment of the vacuum degree. In the embodiment, a pressure reducing valve is further arranged between the leak hole 1143 and the sample gas cylinder 1142, which is used to reduce the sudden increase in pressure when the sample gas is provided.

[0084] In the embodiment, by arranging the pump group 111 and the vacuum degree adjusting assembly 114, the vacuum degree in the vacuum environment is within the range of 1.0E-5Pa~100Pa.

[0085] Specifically, the vacuum device 11 further comprises a vacuum degree measuring assembly 115.

[0086] As an example, a vacuum degree measuring component 115 is disposed on at least one of the first chamber 112 and the second chamber 113 for measuring the vacuum degree of the vacuum device.

[0087] As a further example, the vacuum degree measuring component 115 is simultaneously disposed on both the first chamber 112 and the second chamber 113. In actual testing, to ensure the accuracy of the measurement by the ion source detection system 1, the vacuum degree measuring component 115 is preferably positioned close to the ion source for detection.

[0088] In this embodiment, the vacuum measurement component 115 includes a Pirani vacuum gauge 1151 and a hot cathode gauge 1152, and their applicable detection ranges are not completely consistent in order to further ensure the broadening of the detection range.

[0089] Specifically, a connecting pipe (not shown in the figure) is provided between each ion source 12 and the vacuum device 11 for disassembling each ion source 12 located on the vacuum device 11. The connecting pipe is a short CF to KF connecting pipe, and the KF interface of the connecting pipe is efficiently and quickly sealed to the vacuum device 11 with the KF interface on the second chamber 113 using high-temperature resistant fluororubber O-rings and clamps. Different ion sources to be tested can be repeatedly replaced for detection.

[0090] like Figure 1 As shown, n ion sources 1212 are connected to a vacuum device 11; each ion source 12 is also equipped with a first connecting valve (not shown in the figure) to control the connecting vacuum environment.

[0091] Specifically, the ion source 12 includes at least one of the following: electron impact source (EI), chemical ionization source (CI), and field ionization source (FI).

[0092] In this embodiment, an electron impact source is used; the EI source is a mature ion source for mass spectrometers. Although the structural morphology of EI sources varies for different applications, EI sources (using...) are generally... Figure 3 The equivalent circuit diagram example includes: a repulsion electrode 121, a cathode 122, an ionization chamber (outer wall electrode 123 of the ionization chamber), an extraction electrode 124, and a focusing electrode 125. The basic working principle of the EI source is as follows: after the filament (cathode 122) is lit, it emits thermionic electrons. These thermionic electrons enter the ionization chamber under the influence of the electric field force of the repulsion electrode 121 and the ionization chamber relative to the filament, and collide with neutral atoms / molecules within the ionization chamber to form ions. The formed ions are then focused via the ionization chamber, the extraction electrode 124, and the focusing electrode 125 and introduced into the analyzer at the rear end.

[0093] In the embodiment, the ion source is configured as a single-cathode ion source and a double-cathode ion source; the two cathodes in the double-cathode ion source are independent of each other, so that when one cathode fails, the other ion source can be switched to, thereby realizing continuous mass spectrum detection / monitoring without stopping.

[0094] It should be noted that the ion source detection system 1 provided in the embodiment can detect multiple ion sources, and preferably each ion source 12 is configured as the same batch to ensure the batch consistency and realize rapid detection; or different ion sources can be configured for detection, and the ion source detection system 1 provided in the embodiment can improve the detection efficiency, and the detection of multiple ion sources respectively is also conducive to the industrialized detection.

[0095] It should be noted that the specific structure of the ion source 12 is not limited to Figure 3 , and Figure 4 and Figure 5 provide other EI source structures, which differ in the positional relationship between the ionization chamber, the repelling electrode 121 and the cathode 122, such as Figure 4 , the position of the ionization chamber cover of which is different from that of Figure 3 ; Figure 5 , the repelling electrode 121 of which is arranged at the bottom of the ionization chamber. However, the ion source detection system 1 of the embodiment is applicable to any structure of the ion source 12, and is not limited to the embodiment.

[0096] As shown in Figures 1-3 , each ion source detection device 13 is arranged in one-to-one correspondence with each ion source 12, and each ion source detection device 13 is electrically connected to the corresponding ion source 12; each ion source detection device 13 is configured to provide a working voltage for the ion source 12 and collect an ion intensity electrical signal output by the ion source 12 during operation.

[0097] Specifically, the ion source detection device 13 includes a collection module 131, a power supply module 132 and a comparison module (not shown in the figure).

[0098] As an example, the power supply module 132 is connected with the ion source 12, the collection module 131 and the comparison module respectively, for providing working voltage for the ion source 12, the collection module 131 and the comparison module respectively. When the ion source is an EI source, the power supply module 132 is arranged to provide one current signal and four voltage signals (U1-U4). The one current signal is connected to the cathode 122, and the four voltage signals are connected to the repeller electrode 121, the wall electrode 123 of the ionization chamber (in fact, a voltage signal is loaded between the ionization chamber and the filament), the extraction electrode 124 and the focusing electrode 125 respectively. In the embodiment, the power supply module 132 at least includes a power board 1321. In the embodiment, the current signal is adjustable, and the range is 0.5A-8A, preferably 1A-5A, such as 3A, 4A, etc., and the voltage signal is adjustable, and the range is ±500V, preferably ±300V, such as -100V, 50V, etc.

[0099] Specifically, the power supply module 132 is also used to feed back the working voltage, current and power actually consumed by the cathode during working to the ion detection system 1 for subsequent processing. In the embodiment, the feedback parameters are provided to the host computer for subsequent data storage, data comparison and the like.

[0100] It should be noted that the power supply module 132 also provides one power source loaded on the collector 1322 for collecting the anode voltage change of the ion source 12, for feeding back the voltage change when the ions are excited (i.e., the detection of the cathode emission current and the cathode power supply current). Figure 3 In the embodiment, the collector includes a first resistor R1 and an ammeter connected in parallel with the first resistor R1, and the detection current range is 0.1-5mA.

[0101] As an example, the collection module 131 is connected with the ion source 12, for collecting the ion intensity generated by the ion source 12 and performing magnetic-electric conversion to obtain an ion intensity electric signal.

[0102] As a further example, as shown in Figure 2 and Figure 3 The collection module 131 includes a Faraday cup 1311, a feedthrough 1312, an operational amplifier 1313 and a collection card 1314. The first end of the Faraday cup 1311 is connected to the output end of the ion source 12, and the second end is connected to the first input end of the operational amplifier 1313 through the feedthrough 1312 (the electrode part 1312' of the feedthrough 1312 is connected to the first input end of the operational amplifier 1313). The second input end of the operational amplifier 1313 is connected to the reference ground, and the output end outputs the ion intensity electric signal. The output end of the operational amplifier 1313 is also connected to the first input end through a feedback resistor. The collection card 1314 is connected to the output end of the operational amplifier 1313, for analog-digital conversion and amplification output of the ion intensity electric signal.

[0103] In the embodiment, the Faraday cup 1311 is used to collect the ion signal output by the ion source and convert it into a magnetic signal; the feedthrough 1312 is used to seal and realize electrical connection, and convert the magnetic signal collected by the Faraday cup 1311 into an analog electrical signal. The Faraday cup 1311 and the feedthrough 1312 are connected together as a hardware connection part to constitute an ion source detection probe part, and subsequent detection of different ion sources can be realized by only replacing the ion source thereon.

[0104] In the embodiment, the acquisition module 131 preferably further comprises a shielding sleeve 1311'; the shielding sleeve 1311' is arranged at the periphery of the Faraday cup 1311 and is used to exclude external magnetic interference. Since the Faraday cup 1311 converts the ion signal into a magnetic signal and has magnetic sensitivity, the shielding sleeve 1311' can further improve the accuracy of measurement.

[0105] In the embodiment, the operational amplifier 1313 and the acquisition card 1314 are equivalent to two amplifications, which can effectively improve the detection range of the electrical signal, and ensure that the nA-uA level ion signal entering the Faraday cup 1311 from the end of the ion source can be detected and used subsequently.

[0106] As an example, the comparison module is connected to the acquisition module 131 and receives the ion intensity electrical signal, and is used to compare the ion intensity electrical signal with a preset ion intensity electrical signal to obtain a comparison result.

[0107] In the embodiment, the comparison module is arranged in the host computer 14, and the host computer processes the comparison result of the ion intensity electrical signal and the preset ion intensity electrical signal. In the embodiment, the preset ion intensity electrical signal is set as the data measured by the standard ion source 12. In addition, in the embodiment, the preset ion intensity electrical signal can be set as a preset value of an ion intensity under a certain vacuum degree, and when the acquired ion intensity electrical signal does not reach the preset value, the ion source does not meet the working condition. Therefore, subsequent adjustment or replacement and maintenance of the ion source 12 are required. In another embodiment, since the actual ion source 12 needs to be arranged to work under different vacuum degrees, it is required to work normally within the preset vacuum degree range, and therefore, the preset ion intensity electrical signal can be set as each corresponding ion intensity electrical signal within the preset vacuum degree range. In the embodiment, the host computer 14 is also used to receive the vacuum degree data measured by the vacuum degree measurement assembly 115.

[0108] It should be noted that in the embodiment, the acquisition card 1314 and the power board 1321 are integrated in the same circuit control box 130; the circuit control box 130 further includes a control module 1301 for controlling the power board 1321 to adjust the value of the working voltage, controlling the power-on sequence of each module, and processing the output signal of the acquisition card 1314 received and transmitted to the upper computer 14.

[0109] The embodiment also provides an ion source detection method, which is realized based on the ion source detection system 1.

[0110] In step S1, a preset vacuum environment is provided; at least m first communication valves are opened to connect the corresponding connected ion sources 12 to the preset vacuum environment; the m ion sources 12 are ion sources to be detected; and m is an integer greater than or equal to 1 and less than or equal to n.

[0111] In the embodiment, when the preset vacuum environment is provided, the molecular pump 1111 and the backing pump 1112 are used for vacuumizing. Specifically, the vacuum valve 1113 and the second communication valve 1131 are opened first, so that the first chamber 112 and the second chamber 113 are in space communication with the molecular pump 1111 and the backing pump 1112, then the backing pump 1112 is started to start vacuumizing, and after the Pirani vacuum gauge detects that the vacuum degree is better than 100 Pa, the molecular pump 1111 is started; after the molecular pump 111 is stable for 5 minutes, the hot cathode gauge is started, and after the vacuum degree is detected to be better than 1.0E-5 Pa.

[0112] In step S2, working voltages are provided for the ion sources to be detected, and ion intensity electrical signals output by the ion sources to be detected during working are collected.

[0113] Specifically, when the vacuum device includes the pump group 111, the first chamber 112, the n second chambers 113, and the vacuum degree adjusting assembly 114, after the m second communication valves 1131 are closed, the vacuum degree of each second chamber 113 connected with each ion source to be detected is adjusted based on the pump group 111 and the vacuum degree adjusting assembly 114, so as to obtain a linear relationship between the corresponding vacuum degree and the ion intensity electrical signal of each ion source to be detected.

[0114] In the embodiment, the ion source cathode is turned on (the current signal is provided) after the vacuum degree is detected to be better than 1.0E-5 Pa, and the ion intensity electrical signal at this time can be directly detected. If it is required to detect the ion intensity electrical signal in a preset vacuum degree range, the vacuum degree is adjusted by the pump group 111 to increase the vacuum degree and by the vacuum degree adjusting assembly 114 to decrease the vacuum degree to detect the ion intensity electrical signal in the range. Specifically, when the ion source performance is evaluated, the vacuum degree after the previous step is recorded, and then the ion intensity electrical signal is detected, and then the second communication valve 1131 is closed to disconnect the first chamber 112 and the second chamber 113, and at this time, the second chamber 113 is connected to the ion source 12, and the vacuum degree is slowly decreased by the vacuum degree adjusting assembly 114, and when the second chamber 113 is stably decreased from the order of 1.0E-5 Pa to the order of 1 Pa, the second communication valve 1131 is closed, and the measurement process is ended. The linear relationship corresponding to the vacuum degree and the ion intensity electrical signal in the process is detected. The linear relationship of the measurement can be retained in the upper computer 14, and can be compared with data of any batch of ion sources of the same type to analyze and evaluate the performance difference of the batch and the individual.

[0115] As shown in Figure 6 and Figure 7 , the higher the vacuum degree (the smaller the pressure), the lower the ionization intensity should be; similarly, the vacuum degree and the ionization intensity electrical signal change in a linear relationship to ensure the detection accuracy of the subsequent mass spectrometer. Therefore, the data of Figure 7 are further processed to obtain the sensitivity value of the device under each vacuum degree (the sensitivity of the detected ion intensity electrical signal under each vacuum degree).

[0116] Specifically, the amplitude of the working voltage of the ion source 12 to be measured is adjusted, and the ion intensity electrical signal output by each ion source 12 to be measured is collected to obtain the amplitude of the working voltage corresponding to the maximum amplitude of the ion intensity electrical signal.

[0117] In the embodiment, the ion source detection method is also used to correct the working voltage of the ion source 12. Because in actual use, part of the ion source 12 is not set in the optimal working range due to the voltage setting, and the final output ion intensity is insufficient, and therefore the voltage is adjusted to ensure that the intensity of this part of the ion source is increased. Specifically, the amplitude of each voltage in the ion source 12 is adjusted until the amplitude of the ion intensity electrical signal reaches a preset value, and the ion source is considered to be debugged for subsequent use. Preferably, the amplitude of the working voltage at this time is adjusted until the amplitude of the ion intensity electrical signal is maximum.

[0118] It should be noted that after the steps S1 and S2 of the embodiment are completed, the detected ion source 12 can be disassembled and replaced with a new ion source 12 to be detected through the adapter pipe, at this time, the second chamber 113 is in contact with the outside to return to the normal pressure state, but the first chamber 112 is still in the preset vacuum environment. Because the volume difference between the first chamber 112 and the second chamber 113 is large, after the new ion source 12 is replaced, the second chamber 113 is readjusted based on the first chamber 112 which has been adjusted, and when the first chamber 112 and the second chamber 113 both need to be adjusted, the adjustment efficiency is higher, and the detection efficiency can be improved.

[0119] In summary, the present application provides an ion source detection system and an ion source detection method, wherein the ion source detection system comprises a vacuum device for providing a preset vacuum environment for the ion source; n ion sources are connected to the vacuum device; wherein each ion source is further provided with a first communication valve for controlling the communication of the vacuum environment; each ion source detection device is correspondingly arranged with each ion source, and each ion source detection device is electrically connected with the corresponding ion source; each ion source detection device is used to provide a working voltage for the ion source and collect the ion intensity electrical signal output by the ion source during work. The present application provides an independent detection system for the ion source to be detected by setting the vacuum device and the ion source detection device. Therefore, the present application effectively overcomes the shortcomings of the prior art and has high industrial utilization value.

[0120] The above embodiments only exemplarily illustrate the principles and effects of the present application, and are not used to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought disclosed by the present application should be covered by the claims of the present application.

Claims

1. An ion source detection system, characterized by, The ion source detection system comprises at least a vacuum device, n ion sources and n ion source detection devices; n is an integer greater than or equal to 1; The vacuum device is configured to provide a preset vacuum environment for the ion sources; The n ion sources are connected to the vacuum device; each ion source is further provided with a first communication valve for controlling the communication of the vacuum environment; Each ion source detection device is arranged in one-to-one correspondence with each ion source, and each ion source detection device is electrically connected to the corresponding ion source; each ion source detection device is configured to provide a working voltage for the ion source and collect an ion intensity electrical signal output by the ion source during operation.

2. The ion source detection system of claim 1, wherein: The vacuum device comprises a pump group, a first chamber and n second chambers; The pump group is connected to the first chamber and is configured to adjust the vacuum degree in the first chamber; Each second chamber is arranged in one-to-one correspondence with each ion source; a first end of each second chamber is connected to the first chamber, and a second end of each second chamber is connected to the corresponding ion source; each second chamber is further provided with a second communication valve connected to the first chamber; the volume of each second chamber is smaller than the volume of the first chamber.

3. The ion source detection system of claim 2, wherein: The pump group comprises a molecular pump and a backing pump; A first end of the molecular pump is in communication with the first chamber, and a second end of the molecular pump is connected to the backing pump; a vacuum valve is further arranged between the backing pump and the molecular pump.

4. The ion source detection system of claim 2, wherein: The vacuum device further comprises a vacuum degree adjusting assembly; the vacuum degree adjusting assembly comprises n third communication valves and n sample gas cylinders; the sample gas cylinders, the third communication valves and the second chambers are arranged in one-to-one correspondence; the sample gas cylinders are connected to the corresponding second chambers through the third communication valves and are configured to adjust the vacuum degree of the vacuum device.

5. The ion source detection system of claim 4, wherein: The vacuum degree adjusting assembly further comprises a leak hole; the leak hole is arranged between the third communication valve and the corresponding sample gas cylinder; the third communication valve is arranged as a bellows valve.

6. The ion source detection system of claim 2, wherein: The vacuum device further comprises a vacuum degree measuring assembly; the vacuum degree measuring assembly is arranged on at least one of the first chamber and the second chamber and is configured to measure the vacuum degree of the vacuum device.

7. The ion source detection system of claim 1, wherein: The ion source comprises at least one of an electron impact source, a chemical ionization source and a field ionization source.

8. The ion source detection system of claim 1, wherein: The ion source detection device comprises a collection module, a power supply module and a comparison module; The power supply module is connected to the ion source, the collection module and the comparison module, respectively, and is configured to provide a working voltage for the ion source, the collection module and the comparison module, respectively; The collection module is connected to the ion source and is configured to collect ion intensity generated by the ion source and perform magnetic-electric conversion to obtain an ion intensity electrical signal; The comparison module is connected to the collection module and receives the ion intensity electrical signal, and is configured to compare the ion intensity electrical signal with a preset ion intensity electrical signal to obtain a comparison result.

9. The ion source detection system of claim 8, wherein: The collection module comprises a Faraday cup, a feedthrough, an operational amplifier and a collection card; A first end of the Faraday cup is connected to an output end of the ion source, and a second end of the Faraday cup is connected to a first input end of the operational amplifier through the feedthrough; A second input end of the operational amplifier is connected to a reference ground, and an output end outputs the ion intensity electrical signal; the output end of the operational amplifier is also connected to the first input end through a feedback resistor; The acquisition card is connected to the output end of the operational amplifier, and is used for analog-digital conversion and amplification output of the ion intensity electrical signal.

10. The ion source detection system of claim 9, wherein: The acquisition module further comprises a shielding sleeve; The shielding sleeve is arranged at the periphery of the Faraday cup, and is used for excluding external magnetic interference.

11. The ion source detection system of claim 1, wherein: An adapter pipe is arranged between the ion source and the vacuum device, and is used for dismounting the ion source on the vacuum device.

12. An ion source detection method, realized based on the ion source detection system according to any one of claims 1-11, characterized in that, The ion source detection method at least comprises: providing a preset vacuum environment; opening at least m first communication valves to enable the corresponding connected ion source to connect the preset vacuum environment; m ion sources are used as ion sources to be detected; m is an integer greater than or equal to 1 and less than or equal to n; providing working voltages for each of the ion sources to be detected and collecting ion intensity electrical signals output by each of the ion sources to be detected when working.

13. The ion source detection method of claim 12, wherein: When the vacuum device comprises a pump group, a first chamber, n second chambers, and a vacuum degree adjusting assembly, after closing each of the m second communication valves, the vacuum degree of each of the second chambers connected to the ion sources to be detected is adjusted based on the pump group and the vacuum degree adjusting assembly, to obtain a linear relationship between the corresponding vacuum degree and the ion intensity electrical signal of each of the ion sources to be detected.

14. The ion source detection method of claim 12, wherein: the amplitude of the working voltage of the ion source to be detected is adjusted, and the ion intensity electrical signal output by each of the ion sources to be detected when working is collected, to obtain the amplitude of the working voltage corresponding to the maximum amplitude of the ion intensity electrical signal.

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