Edge passivation vacuum apparatus

Abstract

The application discloses an edge type passivation vacuum equipment, which comprises a cavity assembly, a driving assembly, an exhaust assembly and a gas assembly. The cavity assembly comprises a vacuum reaction cavity with a furnace door on the side, a rotating disc arranged in the vacuum reaction cavity and used for uniformly placing a plurality of material boxes, and a waste gas channel arranged around the rotating disc in the vacuum reaction cavity and isolated from the vacuum reaction cavity. The driving assembly drives the rotating disc to rotate. The exhaust assembly is arranged on the bottom of the vacuum reaction cavity and used for exhausting. The gas assembly comprises a plurality of radial waste gas channels communicated with the waste gas channel, a layer structure arranged below the radial waste gas channels and used for air inlet and air uniformization, and waste gas holes arranged on the layer structure and communicated with the corresponding radial waste gas channels. The gas assembly is arranged on the top of the vacuum reaction cavity, and the distance between the gas assembly and a solar cell in the material box is less than or equal to a preset distance. The preset distance is the distance for enabling process gas to enter the vacuum reaction cavity, react with the cutting surface of the solar cell and directly enter the waste gas holes. The patent can be used for large-batch uniform passivation and coating.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of solar cell processing equipment, and in particular to an edge type passivation vacuum equipment. BACKGROUND

[0002] With the rapid development of the photovoltaic industry, the market demand for power enhancement and capacity improvement of solar modules is increasing. In order to reduce the series resistance and power loss of the module, laser splitting technology is widely used to cut the whole solar cell into two or more small pieces. This technology can effectively reduce the current load in the module and improve the conversion efficiency. However, during the laser cutting process, the cutting section of the silicon wafer is prone to produce micro cracks and fragments. These cutting defects become the aggregation area of carriers, which seriously affects the performance stability of the cell.

[0003] In order to solve these defects, the industry usually adopts a process of passivation coating film treatment on the silicon wafer section. By forming a protective film on the cutting section, the adverse effects of carriers can be effectively reduced, and the electrical performance of the cell can be improved. However, the existing passivation coating film equipment has many problems:

[0004] The existing coating film equipment has low passivation treatment efficiency for half silicon wafers, and cannot uniformly passivate and coat film on the section in large quantities. A new type of reaction chamber is needed to adapt to the process requirements of edge coating.

[0005] In the existing equipment, after the process gas enters the vacuum chamber, it is easy to form a disturbed airflow. This irregular airflow further exacerbates the uneven distribution of gas during the coating process, affecting the passivation effect. Especially at the edge part, the instability of the airflow makes it difficult to control the thickness and uniformity of the coating layer.

[0006] The existing equipment cannot ensure that the process gas can uniformly cover the surface of the silicon wafer, especially when coating a large number of silicon wafers. The uniformity and consistency of the surface coating are poor, which directly affects the quality of the final product. SUMMARY

[0007] The present application proposes an edge type passivation vacuum equipment to solve the technical problem that the existing edge coating film equipment cannot passivate and coat film on the section in large quantities.

[0008] The edge type passivation vacuum equipment proposed by the present application comprises:

[0009] The cavity assembly comprises a vacuum reaction chamber with a furnace door on the side, a turntable for uniformly placing a plurality of boxes in the vacuum reaction chamber, and a waste gas channel around the turntable in the vacuum reaction chamber and isolated from the vacuum reaction chamber.

[0010] a driving assembly configured to drive the rotary disc to rotate;

[0011] an exhaust assembly configured to exhaust the exhaust channel;

[0012] a gas assembly comprising a plurality of radial exhaust channels in communication with the exhaust channel, a layer structure arranged below the radial exhaust channels for air intake and air uniformization, the layer structure being provided with exhaust holes in communication with the corresponding radial exhaust channels; the gas assembly is arranged at the top of the vacuum reaction chamber, and the distance between the gas assembly and the solar cell in the tray is less than or equal to a preset distance; the preset distance is the distance for the process gas to enter the vacuum reaction chamber and react with the cutting surface of the solar cell and then directly enter the exhaust holes.

[0013] Further, the layer structure comprises:

[0014] at least one air uniformization plate, each air uniformization plate being provided with a plurality of radial air intake holes and exhaust holes, and the air intake holes and the exhaust holes being arranged alternately;

[0015] an air intake ring plate arranged around the air uniformization plate and provided with at least one annular air intake channel in communication with the air intake assembly;

[0016] an air intake base plate arranged above the air uniformization plate and provided with a plurality of radial air intake holes and exhaust holes arranged alternately;

[0017] a gas guide plate arranged above the air intake base plate and provided with a plurality of radial exhaust holes, and a plurality of radial gas guide grooves in communication with the corresponding annular air intake channels and arranged on the side of the gas guide plate facing the air intake base plate, the gas guide grooves and the exhaust holes being arranged alternately.

[0018] Further, the air intake assembly comprises:

[0019] at least one in-cavity air intake pipe arranged horizontally, one end of each in-cavity air intake pipe being in one-to-one correspondence with one annular air intake channel, and the other end being provided with a sleeve in vertical communication therewith;

[0020] a movable connecting rod comprising a connecting pipe closed at the bottom and inserted into the sleeve, a bellows connected to the top end of the connecting pipe, a pressing block arranged at the top end of the bellows, an inner limiting ring arranged on the outer peripheral wall of the bottom end of the connecting pipe and located in the sleeve, an outer limiting ring arranged on the outer peripheral wall of the top end of the connecting pipe and located outside the sleeve, and an air intake port arranged on the side of the bottom end of the connecting pipe facing the annular air intake channel;

[0021] at least one out-of-cavity air intake pipe, each out-of-cavity air intake pipe being in communication with the corresponding bellows.

[0022] Further, the heating assembly comprises:

[0023] a bottom heater assembly comprising a mounting plate fixedly connected with the bottom of the vacuum reaction chamber below the rotating disc, and a plurality of heaters uniformly distributed on the mounting plate; a gap is provided between the rotating disc and the bottom heater;

[0024] a side heater assembly fixedly connected with the inner sidewall of the vacuum reaction chamber;

[0025] a top heater assembly in contact with the top of the gas assembly to achieve heat conduction effect on the process gas.

[0026] Further, the bottom center of the vacuum reaction chamber is concave downward to form a mounting groove; the driving assembly comprises:

[0027] a motor assembly;

[0028] a shaft sleeve, the bottom end of which is fixedly connected with the inner bottom surface of the mounting groove, and the top end of which is fixedly connected with the mounting plate;

[0029] a connecting shaft, which penetrates through the shaft sleeve, the top end of which is connected with the rotating disc, and the bottom end of which is connected with the output end of the motor through the coupling, and the middle part of the connecting shaft in the shaft sleeve is provided with a support ring;

[0030] two conical roller bearings, which are installed on the upper and lower sides of the support ring in back-to-back manner;

[0031] a magnetic fluid transmission member, which comprises a magnetic fluid rotating shaft connected with the connecting shaft and rotating coaxially, a sleeve connected with the outer bottom surface of the mounting groove and sleeved on the magnetic fluid rotating shaft, and a magnetic fluid bearing connected between the magnetic fluid rotating shaft and the sleeve;

[0032] a coupling, which connects the magnetic fluid transmission member with the motor assembly;

[0033] a support sleeve, which connects the motor assembly with the outer bottom surface of the mounting groove, and encapsulates the magnetic fluid transmission member and the coupling inside.

[0034] Further, the magnetic fluid transmission member is provided with a detection device for detecting the rotation angle of the magnetic fluid rotating shaft of the magnetic fluid transmission member.

[0035] Further, the vacuum reaction chamber comprises a chamber seat and a top cover mechanism, wherein the sealing cover is arranged above the chamber seat, the top cover mechanism comprises a top cover and at least two lifters for driving the top cover to lift and lower.

[0036] Further, an annular sealing groove is arranged on the upper surface of the upper flange connected with the top cover of the chamber seat, and a sealing ring is arranged in the annular sealing groove.

[0037] Further, a square wave-shaped cooling pipeline is arranged on the outer wall of the cavity assembly.

[0038] Further, an upper flange cooling pipeline is arranged at the position of the annular sealing groove opposite to the upper flange.

[0039] The present application can meet the process capacity of multiple silicon wafer carriers, and adjusting the rotating disc speed can coat different film thicknesses in the same time, and the waste gas generated after the reaction can be sucked back in time without escaping; and the present application adopts a full coverage heating system, and the space around the cavity can be uniformly heated; the present application adopts a liftable top cover, and the top cover can be lifted by a cylinder structure for maintenance. BRIEF DESCRIPTION OF DRAWINGS

[0040] The present application will be described in detail below with reference to the embodiments and drawings, in which:

[0041] Figure 1 is a perspective view of an embodiment of the present application.

[0042] Figure 2 is a main structure sectional view of an embodiment of the present application.

[0043] Figure 3 is a cavity seat top view of a vacuum reaction cavity of an embodiment of the present application.

[0044] Figure 4 is a whole structure schematic view of a gas assembly of an embodiment of the present application.

[0045] Figure 5 is a local enlarged schematic view of a gas distribution plate of an embodiment of the present application.

[0046] Figure 6 is an explosion view of a gas assembly of an embodiment of the present application.

[0047] Figure 7 is a sectional schematic view of a gas assembly of an embodiment of the present application.

[0048] Figure 8 is a structure schematic view of a gas assembly of an embodiment of the present application.

[0049] Figure 9 is a local structure schematic view of a heating assembly of an embodiment of the present application.

[0050] Figure 10 is a position schematic view of a top surface assembly of an embodiment of the present application.

[0051] Figure 11 is a partial enlarged view of the upper flange of an embodiment of the present application.

[0052] Figure 12 is a structural schematic view of a square wave cooling pipeline of an embodiment of the present application.

[0053] Legend of reference signs:

[0054] 10, cavity assembly; 20, driving assembly; 40, gas assembly; 50, rack; 60, air inlet assembly;

[0055] 101, vacuum reaction cavity; 102, exhaust gas channel; 103, furnace door; 104, rotary disc; 105, furnace door mechanism; 106, mounting groove; 107, top cover; 108, lifter; 109, upper flange; 110, annular sealing groove; 111, square wave cooling pipeline; 112, upper flange cooling pipeline;

[0056] 201, motor assembly; 202, shaft sleeve; 203, connecting shaft; 204, tapered roller bearing; 205, magnetic fluid transmission member; 206, shaft coupling; 207, support sleeve; 208, light-shielding electric baffle;

[0057] 401, radial exhaust gas channel; 402, exhaust gas hole; 403, air inlet hole; 404, air uniformizing plate; 405, air inlet ring plate; 406, air inlet base plate; 407, air guide flow plate; 408, exhaust gas cover plate; 409, exhaust gas partition rib; 410, annular air inlet channel; 411, air guide groove;

[0058] 501, bottom surface heater assembly; 502, side surface heater assembly; 503, top surface heater assembly; 504, wiring flange;

[0059] 601, cavity inner air inlet pipe; 602, sleeve pipe; 603, connecting pipe; 604, corrugated pipe; 605, pressing block; 606, cavity outer air inlet pipe; 607, inner limiting ring; 608, outer limiting ring. DETAILED DESCRIPTION

[0060] In order to make the technical problems to be solved by the present application, technical solutions and beneficial effects more clearly understood, the present application will be further described in detail below in combination with the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, and are not used to limit the present application.

[0061] Therefore, a feature pointed out in this specification is used to describe one feature of one embodiment of the invention, and does not imply that every embodiment of the invention must have the described feature. Furthermore, it should be noted that this specification describes many features. Although certain features may be combined to illustrate possible system designs, these features may also be used in other combinations not explicitly stated. Therefore, unless otherwise stated, the described combinations are not intended to be limiting.

[0062] The edge passivation vacuum device proposed in this invention includes a cavity assembly 10, a drive assembly 20, a pumping assembly, and a gas assembly 40.

[0063] The cavity assembly 10 includes a vacuum reaction chamber 101, an exhaust duct 102, a furnace door 103, and a turntable 104. Figure 1 A cavity assembly 10 according to an embodiment of the present invention is shown, which is placed on a frame 50. The vacuum reaction chamber 101 has a cylindrical body with welded upper and lower flanges. The lower flange ensures that the cavity is horizontal, and the upper flange is provided with a sealing ring and cooling water channel to ensure airtightness. The vacuum reaction chamber 101 has an opening at the front for placing / removing silicon wafer cassettes (carriers).

[0064] The furnace door 103 is located on the side of the vacuum reaction chamber 101, and is driven to open or close by the furnace door mechanism 105 located on the frame 50.

[0065] like Figure 2 As shown, the turntable 104 is located at the center of the vacuum reaction chamber 101 and close to the inner bottom surface of the vacuum reaction chamber 101. Multiple material boxes can be evenly placed along the circumference of the turntable 104. Each material box contains multiple cut solar cells. These solar cells are compressed in a direction parallel to the tangent of the turntable 104 so that the cut surfaces of all the solar cells in a material box can form a whole surface, minimizing the gaps between adjacent solar cells. The whole surface formed by the cut surfaces of the solar cells faces the top surface of the vacuum reaction chamber 101, that is, towards the top cover of the vacuum reaction chamber 101.

[0066] The exhaust duct 102 is located around the turntable 104 and is isolated from the vacuum reaction chamber 101. That is, without the connection provided by the gas assembly 40, the space of the vacuum reaction chamber 101 containing the turntable 104 is not connected to the exhaust duct 102. Since material needs to be fed into the furnace door 103, no exhaust duct 102 is provided at the furnace door 103. Figure 3 A top view of a vacuum reaction chamber 101 according to an embodiment is shown. It can be seen that a pipe-type sheet metal part is provided at the bottom of the exhaust duct 102 for connecting the exhaust assembly.

[0067] The drive assembly 20 is connected from the bottom of the vacuum reaction chamber 101 to the bottom surface of the turntable 104, driving the turntable 104 to rotate.

[0068] The exhaust assembly is used to extract air from the exhaust duct 102.

[0069] like Figure 4 As shown, the gas assembly 40 includes a radial exhaust duct 401 located at the top layer and a layered structure located below the radial exhaust duct 401.

[0070] Radial exhaust duct 401 is connected to exhaust duct 102.

[0071] The shelf structure is located below the exhaust duct 102 for air intake and uniform air distribution. The shelf structure is provided with exhaust holes 402 that communicate with the corresponding radial exhaust duct 401. The exhaust holes 402 connect the radial exhaust duct 401 and the vacuum reaction chamber 101. Figure 5 The diagram shows that the shelf structure has three types of air inlets 403, which are used to deliver different process gases to the vacuum reaction chamber.

[0072] The gas assembly 40 is positioned at the top of the vacuum reaction chamber 101, with a distance from the cut surface of the solar cells inside the material box less than or equal to a preset distance. This preset distance is the distance at which the process gas, after entering the vacuum reaction chamber 101 and contacting the cut surface of the solar cells, can directly enter the exhaust gas port 402. In practice, the preset distance can be 2-15mm depending on the specific circumstances. After the process gas is ejected from the gas assembly, it is drawn away by the exhaust gas channel 102 around the vacuum reaction chamber and discharged from the chamber, without affecting the subsequent gas flow.

[0073] This invention employs multiple material boxes evenly placed on a turntable 104, each containing multiple solar cells with their cut surfaces facing upwards. The solar cells within a single material box are closely arranged, creating a large cut surface almost the same size as the opening on the top surface of the material box. By releasing process gas at the top, reacting with the cut surface, and then rapidly removing it from the top, turbulence in the vacuum reaction chamber 101 caused by the process gas is avoided. This allows the invention to achieve large-scale, uniform cross-section passivation coating, improving production capacity and efficiency, and effectively avoiding other factors that affect product yield.

[0074] In one embodiment, the layer structure includes at least one air distribution plate 404, an air intake ring plate 405 disposed around one or more air distribution plates 404, an air intake base plate 406 disposed above the air distribution plate 404, the upper surface of the air intake ring plate 405 being in close contact with the lower surface of the air intake base plate 406, and an airflow guide plate 407 disposed above the air intake base plate 406. Figure 6As shown, the layer structure of the embodiment sets two layers of the uniform gas plate 404 (the lowermost layer can be called the shower plate), the gas inlet ring plate 405 arranged around the uniform gas plate 404, the gas inlet base plate 406, and the gas flow guide plate 407. The gas flow guide plate 407, the exhaust gas cover plate 408, and the exhaust gas partition rib 409 form the radial exhaust gas channel 401.

[0075] As shown, the gap is arranged between the two layers of the uniform gas plate 404, the gas inlet base plate 406 is provided with a groove on the side facing the uniform gas plate 404, the groove forms the gap between the gas inlet base plate 406 and the uniform gas plate 404, and the gas flow guide plate 407 is provided with a gas guide groove 411 on the side facing the gas inlet base plate 406. Figure 7

[0076] The uniform gas plate 404 can adopt one layer or two or more layers to uniformly distribute the process gas. Each layer of the uniform gas plate 404 is provided with a plurality of radial gas inlet holes 403 and exhaust holes 402, and the gas inlet holes 403 and the exhaust holes 402 are arranged alternately. For example, one or more gas inlet holes 403 on one side of the radial direction are provided with exhaust holes 402 arranged in the radial direction on both sides.

[0077] The gas inlet ring plate 405 is arranged around the uniform gas plate 404 and is provided with at least one annular gas inlet channel 410 in communication with the gas inlet assembly 60. The number of the annular gas inlet channels 410 is related to the types of process gas required. For example, when three types of process gas are required, three annular gas inlet channels 410 are arranged, and each annular gas inlet channel 410 can be connected with a corresponding gas inlet assembly 60 to introduce the process gas from the outside to the cutting surface of the solar cell in the equipment.

[0078] The gas inlet base plate 406 is arranged above the uniform gas plate 404. When the uniform gas plate 404 has a multi-layer structure, it is arranged on the uppermost layer of the multi-layer structure. The gas inlet base plate 406 is provided with a plurality of radial gas inlet holes 403 and exhaust holes 402 arranged alternately. The gas inlet holes 403 of the gas inlet base plate 406 are in communication with the gas inlet holes 403 at the corresponding positions of the uniform gas plate 404, and the exhaust holes 402 of the gas inlet base plate 406 are in communication with the exhaust holes 402 at the corresponding positions of the uniform gas plate 404.

[0079] The gas flow guide plate 407 is arranged above the gas inlet base plate 406 and is provided with a plurality of radial exhaust holes 402. The side facing the gas inlet base plate 406 is provided with a plurality of radial gas guide grooves 411 in communication with the corresponding annular gas inlet channels 410. The gas guide grooves 411 and the exhaust holes 402 are arranged alternately.

[0080] ​The process gas passes through the corresponding gas inlet assembly 60, enters the corresponding annular gas inlet channel 410, flows into the corresponding plurality of radially arranged gas guide grooves 411, then passes through the gas inlet holes 403 of the gas inlet base plate 406, and finally reaches the vacuum reaction cavity 101, approaches the cutting surface of the solar cell, reacts with the cutting surface, and then rapidly enters the exhaust holes 402 of the gas distribution plate 404, passes through the exhaust holes 402 of the gas inlet base plate 406 and the exhaust gas flow plate 407, reaches the radial exhaust gas channel 401, and then reaches the exhaust gas channel 102, and is finally recycled.

[0081] According to the arrangement, the process gas can react with the cutting surface of the solar cell, and the exhaust gas will not flow randomly and affect the flow direction of the subsequent gas in the vacuum reaction cavity 101.

[0082] In one embodiment, the gas inlet assembly 60 comprises an intracavity gas inlet pipe 601, a movable connecting rod, and an extracavity gas inlet pipe 606.

[0083] The number of intracavity gas inlet pipes 601 is the same as the number of annular gas inlet channels 410, and one or more are provided. The intracavity gas inlet pipes 601 are arranged horizontally, one end of each intracavity gas inlet pipe 601 is in one-to-one correspondence with one annular gas inlet channel 410, and the other end is provided with a sleeve 602 in vertical communication therewith.

[0084] The movable connecting rod comprises a connecting pipe 603, a bellows 604, and a pressing block 605 from bottom to top.

[0085] The bottom end of the connecting pipe 603 is closed and inserted into the sleeve 602, the gas inlet is arranged on the side of the bottom end of the connecting pipe 603 facing the annular gas inlet channel 410, and the gas inlet direction is the connecting pipe 603 facing the intracavity gas inlet pipe 601.

[0086] The bellows 604 is connected to the top end of the connecting pipe 603, the pressing block 605 is arranged at the top end of the bellows 604, an inner limiting ring 607 is arranged on the outer peripheral wall of the bottom end of the connecting pipe 603 and located inside the sleeve 602, and an outer limiting ring is arranged on the outer peripheral wall of the top end of the connecting pipe 603 and located outside the sleeve 602. The bellows 604 has a certain elasticity, when the corresponding part of the vacuum reaction cavity 101 presses down the pressing block 605, the bellows 604 will contract and press the connecting pipe 603 downward, so that the connecting pipe 603 enters the sleeve 602 to reach the limiting position of the outer limiting ring and communicate with the intracavity gas inlet pipe 601. When the corresponding part releases the pressing block 605, the bellows 604 restores and drives the connecting pipe 603 to move upward to reach the limiting position of the inner limiting ring 607, so that the gas inlet on the connecting pipe 603 is blocked by the inner wall of the sleeve 602, thereby disconnecting the communication between the connecting pipe 603 and the intracavity gas inlet pipe 601.

[0087] The cavity-out gas inlet pipe 606 is arranged in one-to-one correspondence with the cavity-in gas inlet pipe 601, and the cavity-out gas inlet pipe 606 is in communication with the corresponding bellows 604.

[0088] Figure 8 The specific structure of one process gas inlet structure of the gas inlet assembly 60 is shown. The gas inlet assembly of the present application can cooperate with other components to control the disconnection or formation of the passage of the gas inlet assembly. In this embodiment, the skilled person in the art can select a button to cooperate with the gas inlet assembly, or some up-and-down movable components of the vacuum reaction chamber to cooperate with the gas inlet assembly.

[0089] In one embodiment, the edge type passivation vacuum device of the present application comprises a chamber assembly 10, a driving assembly 20, a pumping assembly, a gas assembly 40 and a heating assembly.

[0090] The chamber assembly 10, the driving assembly 20, the pumping assembly and the gas assembly 40 are the same as in other embodiments, and the heating assembly is described in detail below.

[0091] As shown in Figure 9 , Figure 10 , the heating assembly comprises a bottom surface heater assembly 501, a side surface heater assembly 502 and a top surface heater assembly 503.

[0092] The bottom surface heater assembly 501 comprises a mounting plate fixedly connected to the bottom surface of the vacuum reaction chamber 101 below the turntable 104, and a plurality of heaters uniformly distributed on the mounting plate; a gap is provided between the turntable 104 and the bottom surface heater;

[0093] The side surface heater assembly 502 is fixed to the inner side wall of the vacuum reaction chamber 101;

[0094] Both the bottom surface heater and the side surface heater heat the vacuum reaction chamber 101 by heat radiation.

[0095] The top surface heater assembly 503 is in contact with the top surface of the gas assembly 40 to realize the heat conduction effect on the process gas. The heating effect of heat conduction is higher than that of heat radiation, which is more conducive to the process temperature requirement in the vacuum reaction chamber 101.

[0096] The corresponding terminal is welded on the wiring flange 504 of the heating assembly, so that the vacuum reaction chamber 101 is not affected by the wiring in the vacuum sealing environment.

[0097] In one embodiment, the bottom center of the vacuum reaction chamber 101 is recessed downward to form a mounting groove 106.

[0098] The driving assembly 20 comprises a motor assembly 201, a shaft sleeve 202, a connecting shaft 203, a tapered roller bearing 204, a magnetic fluid transmission 205, a shaft coupling 206 and a supporting sleeve 207.

[0099] The bottom end of the shaft sleeve 202 is fixedly connected with the inner bottom surface of the mounting groove 106, and the top end is fixedly connected with the mounting plate; the shaft sleeve 202 shares most of the pressure of the connecting shaft 203, and at the same time, plays a sealing role for the movable connection between the connecting shaft 203 and the vacuum reaction cavity 101.

[0100] The connecting shaft 203 penetrates through the shaft sleeve 202, the top end is connected with the rotating disc 104, and the bottom end is connected with the output end of the motor through the shaft coupling 206; the middle part of the connecting shaft 203 located in the shaft sleeve 202 is provided with a supporting ring.

[0101] The two tapered roller bearings 204 are installed in back-to-back distribution on the upper and lower sides of the supporting ring; the two tapered roller bearings 204 installed in back-to-back distribution can bear axial force and radial force, and ensure the stability of the horizontal rotation of the rotating disc 104; when the rotating disc carries only half the number or less, the two tapered roller bearings 204 in back-to-back distribution ensure the parallelism of the rotating disc relative to the shower head during the whole process, that is, ensure uniform contact with the spraying gas during rotation.

[0102] The magnetic fluid transmission 205 comprises a magnetic fluid rotating shaft connected with the connecting shaft 203 and rotating coaxially, a sleeve set sleeved on the magnetic fluid rotating shaft and fixedly connected with the outer bottom surface of the mounting groove 106, and a magnetic fluid bearing connected between the magnetic fluid rotating shaft and the sleeve set.

[0103] The shaft coupling 206 connects the magnetic fluid transmission 205 and the motor assembly 201;

[0104] The supporting sleeve 207 connects the motor assembly 201 and the outer bottom surface of the mounting groove, and encapsulates the magnetic fluid transmission 205 and the shaft coupling 206.

[0105] The structure of the magnetic fluid-shaft coupling between the shaft system and the motor is used to ensure the sealing performance of the cavity when the motor transmits torque; the sealing performance of the vacuum reaction cavity 101 when the motor transmits torque can be ensured by the above-mentioned components.

[0106] In a further embodiment, a detection device for detecting the rotation angle of the magnetic fluid rotating shaft of the magnetic fluid transmission 205 is installed on the magnetic fluid transmission 205; the type and specific installation position of the detection device can be set by those skilled in the art as needed; in a specific embodiment, the present application adopts a light shielding electric baffle 208 and a photoelectric sensor to detect.

[0107] In one embodiment, the vacuum reaction chamber of the present invention includes a chamber seat and a top cover mechanism with a sealing cover disposed above the chamber seat. The top cover mechanism includes a top cover 107 and at least two lifters 108 for driving the top cover to rise and fall. The entire top cover 107 can be opened for easy maintenance and can be used to open the top cover for cleaning the interior and gas components during maintenance.

[0108] Air enters through the top side wall of the vacuum reaction chamber, and pressure blocks are installed on the top cover to press and deliver the air. The height of the jet assembly is changed by altering the height of the jet assembly hoisting stud (by adding or removing shims). Using a bellows to deliver the air allows for adjustment of the relative height between the jet assembly and the silicon wafer coating surface.

[0109] like Figure 11 As shown, in one embodiment, an annular sealing groove 110 is provided on the upper surface of the upper flange 109 connecting the cavity seat and the top cover 107, and a sealing ring is provided in the annular sealing groove to ensure that the vacuum sealing performance of the vacuum reaction chamber meets the standard.

[0110] like Figure 12 As shown, in one embodiment, a square-wave cooling pipe 111 is provided on the outer wall of the cavity assembly. The cooling pipes are evenly arranged outside the cavity, which helps to prevent the cavity assembly from deforming due to heating by the heater. Multiple cooling pipes can be provided; for example, cooling pipes can be provided on the top cover of the cavity to ensure that the top cover does not heat up and deform; cooling pipes can be provided at the upper flange to ensure that the top cover sealing ring is at a suitable temperature and does not melt due to heat; cooling pipes can be provided on the side wall of the cavity to ensure that the cavity body does not deform due to heat; and cooling pipes can be provided at the bottom of the cavity to ensure that the bottom flange does not deform due to heat.

[0111] In one embodiment, a cooling pipe 112 is provided at the position of the annular sealing groove directly opposite the upper flange 109. The sealing ring can be cooled through part of the cooling pipe, thus extending the service life of the sealing ring.

[0112] This invention employs a magnetohydrodynamic (MHD) linkage turntable with six material boxes. Rotating the turntable ensures that each material box can evenly contact the process gas ejected by the jet assembly. The side heater assembly of this invention has heaters evenly distributed on the inner side of the cavity wall, ensuring uniform heating of the solar cells inside the material boxes. The top heater assembly is attached to the upper surface of the spray head and is located between the top cover and the spray head. It utilizes the characteristic that thermal conduction is much more efficient than thermal radiation in a vacuum environment to improve heating efficiency.

[0113] By adopting the above-mentioned technical solution of the present invention, the vacuum sealing performance of the cavity can meet the standards, with a bottom pressure of <1Pa and a leakage rate of <1×10^-9Pa•m^3 / s;

[0114] The heating element can maintain the internal temperature within the range of 120℃~150℃;

[0115] The rotating speed of the rotating disc can be in the range of 1 r / min to 5 r / min under vacuum state;

[0116] The exhaust gas groove can effectively guide the exhaust gas, so that the exhaust gas after the process does not flow disorderly and affect the subsequent gas flow direction.

[0117] The above only describes the preferred embodiments of the present application and is not intended to limit the present application. Any modification, equivalent replacement and improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. An edge-passivation vacuum device, characterized in that, include: The cavity assembly includes a vacuum reaction chamber with a furnace door on the side, a turntable disposed in the vacuum reaction chamber for evenly placing multiple material boxes, and an exhaust gas duct disposed around the turntable in the vacuum reaction chamber and isolated from the vacuum reaction chamber. The drive component drives the turntable to rotate; An exhaust assembly is used to extract air from the exhaust duct. The gas assembly includes multiple radial exhaust channels communicating with the exhaust channel, and a layered structure disposed below the radial exhaust channels for gas intake and uniform distribution. The layered structure has exhaust holes communicating with the corresponding radial exhaust channels. The gas assembly is disposed at the top of the vacuum reaction chamber, and the distance between it and the solar cells in the material box is less than or equal to a preset distance. The preset distance is the distance that allows the process gas to enter the vacuum reaction chamber, react with the cut surface of the solar cells, and then directly enter the exhaust holes. The preset distance is 2-15mm.

2. The edge passivation vacuum device as described in claim 1, characterized in that, The layer structure includes: At least one air distribution plate, each air distribution plate is provided with multiple radially opened air inlets and exhaust outlets, and the air inlets and exhaust outlets are alternately arranged; An air intake ring plate is arranged around the air distribution plate and has at least one annular air intake channel communicating with the air intake assembly. An air intake base plate is disposed above the air distribution plate and has multiple radially arranged alternating air intake holes and exhaust holes. An airflow guide plate is disposed above the air intake base plate. It has multiple radially opened exhaust gas holes and multiple radially opened airflow guide grooves on one side facing the air intake base plate, which are connected to the corresponding annular air intake channel. The airflow guide grooves and the exhaust gas holes are alternately arranged.

3. The edge passivation vacuum device as described in claim 2, characterized in that, The air intake assembly includes: At least one in-cavity air inlet pipe is horizontally arranged, with one end of each in-cavity air inlet pipe connected to a corresponding annular air inlet channel, and the other end provided with a sleeve that is vertically connected to it. The movable connecting rod includes a connecting pipe with its bottom closed and inserted into the sleeve, a corrugated pipe connected to the top of the connecting pipe, a pressure block disposed at the top of the corrugated pipe, an inner limiting ring disposed on the outer peripheral wall of the bottom end of the connecting pipe and located inside the sleeve, an outer limiting ring disposed on the outer peripheral wall of the top end of the connecting pipe and located outside the sleeve, and an air inlet disposed on the side of the bottom end of the connecting pipe facing the annular air inlet. At least one external air inlet pipe, each external air inlet pipe being connected to the corresponding bellows.

4. The edge passivation vacuum device as described in any one of claims 1 to 3, characterized in that, It also includes a heating component; the heating component includes: The bottom heater assembly includes a mounting plate fixedly connected to the bottom surface of the vacuum reaction chamber below the turntable, and a plurality of heaters evenly distributed on the mounting plate; a gap is provided between the turntable and the bottom heaters; A side heater assembly, which is fixed to the inner wall of the vacuum reaction chamber; A top surface heater assembly that contacts the top surface of the gas assembly to achieve heat conduction of the process gas.

5. The edge passivation vacuum device as described in claim 4, characterized in that, The bottom center of the vacuum reaction chamber is recessed downwards to form a mounting groove; the drive assembly includes: Motor assembly; The bushing has its bottom end fixedly connected to the inner bottom surface of the mounting groove and its top end fixedly connected to the mounting plate. A connecting shaft passes through the bushing, with its top end connected to the turntable and its bottom end connected to the output end of the motor via a coupling. A support ring is provided in the middle of the connecting shaft inside the bushing. Two tapered roller bearings are mounted back-to-back on the upper and lower sides of the support ring. A magnetohydrodynamic transmission component includes a magnetohydrodynamic rotating shaft connected to the connecting shaft and rotating coaxially, a kit fitted on the magnetohydrodynamic rotating shaft and fixedly connected to the outer bottom surface of the mounting groove, and a magnetohydrodynamic bearing connected between the magnetohydrodynamic rotating shaft and the kit. A coupling connecting the magnetohydrodynamic transmission component and the motor assembly; A support sleeve connects the motor assembly to the outer bottom surface of the mounting slot and encapsulates the magnetohydrodynamic transmission component and coupling within it.

6. The edge passivation vacuum device as described in claim 5, characterized in that, The magnetohydrodynamic transmission component is equipped with a detection device for detecting the rotation angle of the magnetohydrodynamic rotating shaft of the magnetohydrodynamic transmission component.

7. The edge passivation vacuum device as described in any one of claims 1 to 3, characterized in that, The vacuum reaction chamber includes a chamber seat and a top cover mechanism with a sealing cover disposed above the chamber seat. The top cover mechanism includes a top cover and at least two lifters that drive the top cover to rise and fall.

8. The edge passivation vacuum device as described in claim 7, characterized in that, An annular sealing groove is provided on the upper surface of the upper flange connecting the cavity seat and the top cover, and a sealing ring is provided in the annular sealing groove.

9. The edge passivation vacuum device as described in claim 8, characterized in that, The outer wall of the cavity assembly is provided with square-wave cooling pipes.

10. The edge passivation vacuum device as described in claim 8, characterized in that, The upper flange cooling pipe is located at the position of the annular sealing groove directly opposite the upper flange.

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