Display panel, preparation method thereof and display device

Abstract

The invention provides a display panel, a preparation method thereof and a display device. The display panel includes: a substrate; the isolation structure is located on one side of the substrate, and the isolation structure is provided with a plurality of first openings; the light-emitting device comprises a light-emitting functional layer, an auxiliary electrode layer and a second electrode layer which are stacked in sequence; the light-emitting functional layer, the auxiliary electrode layer and the second electrode layer are located in the first opening; the orthographic projection of at least part of the auxiliary electrode layer on the substrate is connected or overlapped with the orthographic projection of the isolation structure on the substrate. At least part of the auxiliary electrode layer fills the gap between the isolation structure and the light-emitting functional layer, so that the film continuity of the second electrode layer is improved, the lap resistance of the isolation structure and the second electrode layer is reduced, and the optical efficiency or brightness of the display panel is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a method for preparing the same, and a display device. Background Art

[0002] A display panel is a device with a display function. Current display panels, such as organic light emitting diodes (OLED) and display panels based on technologies such as light emitting diodes (LED), have the advantages of high image quality, power saving, thin body and wide range of applications. They are widely used in various consumer electronic products such as mobile phones, televisions, laptops, desktop computers, etc. and have become the mainstream in display panels. In the preparation process of traditional display panels, the graphicization of luminous pixels is usually achieved through a fine metal mask (FMM). FMM technology is mature and has rich experience in mass production. However, FMM technology also has problems such as limited accuracy, high development cost, and long development cycle. The non-fine metal mask technology eliminates the limitations of traditional OLED processes on display screen size, resolution and other screen performance, and has the advantages of high performance, full-domain size, and agile delivery. Patents CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A, and CN118660589A record relevant content of the non-fine metal mask technology for reference.

[0003] However, the performance of current display panels still needs to be improved. Summary of the invention

[0004] In view of this, embodiments of the present application provide a display panel, a method for manufacturing the same, and a display device.

[0005] In a first aspect, the present application provides a display panel, comprising:

[0006] substrate;

[0007] An isolation structure, located on one side of the substrate, the isolation structure having a plurality of first openings;

[0008] A light emitting device, the light emitting device comprising a light emitting functional layer, an auxiliary electrode layer and a second electrode layer which are stacked in sequence, wherein the light emitting functional layer, the auxiliary electrode layer and the second electrode layer are located in the first opening;

[0009] An orthographic projection of at least part of the auxiliary electrode layer on the substrate is connected to or overlapped with an orthographic projection of the isolation structure on the substrate.

[0010] In one embodiment, the orthographic projection of the auxiliary electrode layer on the substrate is connected to or overlaps with the orthographic projection of the isolation structure on the substrate;

[0011] Preferably, the orthographic projection of the auxiliary electrode layer on the substrate is located within the range of the orthographic projection of the second electrode layer on the substrate.

[0012] In one embodiment, a portion of the second electrode layer is located on a sidewall of the isolation structure;

[0013] Preferably, the second electrode layer located on the side wall of the isolation structure is a continuous film layer.

[0014] In one embodiment, the thickness of the auxiliary electrode layer is

[0015] Preferably, the thickness of the auxiliary electrode layer is

[0016] In one embodiment, the auxiliary electrode layer and the second electrode layer are made of different materials;

[0017] Preferably, the material of the auxiliary electrode layer includes at least one of ytterbium, titanium and aluminum;

[0018] Preferably, the material of the second electrode layer includes at least one of magnesium, aluminum and silver.

[0019] In one embodiment, along a direction parallel to the plane where the substrate is located, a distance between an orthographic projection of the light-emitting functional layer on the substrate and an orthographic projection of the isolation structure on the substrate is 0.2 μm-0.5 μm.

[0020] In one embodiment, the auxiliary electrode layer extends from the first opening to a sidewall of the isolation structure.

[0021] Preferably, the height of the auxiliary electrode layer located on the sidewall of the isolation structure is 0.1 μm-0.3 μm.

[0022] In one embodiment, the isolation structure includes a first portion and a second portion stacked together, the first portion is located on a side of the second portion facing away from the substrate, and an orthographic projection of the second portion on the substrate is located within the orthographic projection range of the first portion on the substrate;

[0023] Preferably, the orthographic projection of the auxiliary electrode layer on the substrate is connected to or overlaps with the orthographic projection of the second portion on the substrate;

[0024] Preferably, the isolation structure further comprises a third portion, which is located on a side of the second portion close to the substrate, and the orthographic projection of the second portion on the substrate is located within the orthographic projection range of the third portion on the substrate;

[0025] Preferably, an orthographic projection of the auxiliary electrode layer on the substrate is connected to or overlaps with an orthographic projection of the third portion on the substrate.

[0026] In one embodiment, the light emitting device further includes a first electrode layer, the first electrode layer is located between the substrate and the isolation structure, and the first electrode layer is at least partially exposed to the first opening.

[0027] In one embodiment, the device further comprises: a pixel defining layer located between the substrate and the isolation structure, the pixel defining layer comprising a plurality of second openings; preferably, the light emitting device further comprises a first electrode layer located between the substrate and the pixel defining layer, the first electrode layer being at least partially exposed to the second openings, and the light emitting functional layer being located in the first opening and the second opening being connected to each other;

[0028] Preferably, the orthographic projection of the second opening on the substrate is located within the orthographic projection range of the first opening on the substrate.

[0029] In one embodiment, the invention further comprises: a first encapsulation layer, located on a side of the second electrode layer away from the substrate, the first encapsulation layer comprising a plurality of encapsulation parts, the encapsulation parts corresponding to the first openings, and the orthographic projections of the encapsulation parts on the substrate covering the orthographic projections of the second electrode layer on the substrate;

[0030] Preferably, an orthographic projection of the first encapsulation layer on the substrate at least partially overlaps with an orthographic projection of the pixel defining layer on the substrate.

[0031] In one embodiment, it further includes: a second encapsulation layer located on a side of the first encapsulation layer facing away from the substrate;

[0032] Preferably, it further comprises a third encapsulation layer, which is located on a side of the second encapsulation layer away from the substrate;

[0033] Preferably, the materials of the first encapsulation layer and the third encapsulation layer include inorganic materials, and / or the material of the second encapsulation layer includes organic materials.

[0034] A second aspect of the present application provides a display panel, including:

[0035] substrate;

[0036] An isolation structure, located on one side of the substrate, the isolation structure having a plurality of first openings;

[0037] A light emitting device, the light emitting device comprising a light emitting functional layer, an auxiliary electrode layer and a second electrode layer which are stacked in sequence; the light emitting functional layer, the auxiliary electrode layer and the second electrode layer are located in the first opening;

[0038] At least a portion of the auxiliary electrode layer overlaps the sidewall of the isolation structure.

[0039] In one embodiment, a portion of the second electrode layer is located on a sidewall of the isolation structure;

[0040] Preferably, the second electrode layer located on the side wall of the isolation structure is a continuous film layer;

[0041] Preferably, the auxiliary electrode layer extends from the first opening to a sidewall of the isolation structure.

[0042] In one embodiment, the auxiliary electrode layer and the second electrode layer are made of different materials;

[0043] Preferably, the material of the auxiliary electrode layer includes at least one of ytterbium, titanium and aluminum;

[0044] Preferably, the material of the second electrode layer includes at least one of magnesium, aluminum and silver;

[0045] Preferably, the thickness of the auxiliary electrode layer is

[0046] Preferably, the thickness of the auxiliary electrode layer is

[0047] A third aspect of the present application provides a method for preparing a display panel, comprising:

[0048] Preparing an isolation structure having a plurality of first openings on one side of the substrate;

[0049] A light-emitting functional layer, an auxiliary electrode layer and a second electrode layer are sequentially prepared in the first opening; the orthographic projection of at least part of the auxiliary electrode layer on the substrate is connected to or overlapped with the orthographic projection of the isolation structure on the substrate.

[0050] In one embodiment, preparing the auxiliary electrode layer and the second electrode layer in the first opening includes:

[0051] Under a first evaporation angle condition, evaporating an auxiliary electrode layer on a side of the light-emitting functional layer facing away from the substrate;

[0052] Under a second evaporation angle condition, evaporating a second electrode layer on a side of the auxiliary electrode layer facing away from the substrate;

[0053] The second evaporation angle is greater than or equal to the first evaporation angle;

[0054] Preferably, the second evaporation angle is 0-10° greater than the first evaporation angle.

[0055] In one embodiment, sequentially preparing a light-emitting functional layer, an auxiliary electrode layer, and a second electrode layer in the first opening includes:

[0056] Sequentially preparing a light-emitting functional material layer, an auxiliary electrode material layer, a second electrode material layer and a first packaging material layer in the first opening;

[0057] The light-emitting functional material layer, the auxiliary electrode material layer, the second electrode material layer and the first packaging material layer are patterned to obtain the light-emitting functional layer, the auxiliary electrode layer, the second electrode layer and the first packaging layer.

[0058] In one embodiment, the step of preparing an isolation structure having a plurality of first openings on one side of a substrate includes:

[0059] A second partition material layer and a first partition material layer are sequentially prepared on one side of the substrate; the first partition material layer and the second partition material layer are patterned to obtain a plurality of first openings and a first portion and a second portion stacked, wherein the first portion is located on a side of the second portion away from the substrate, and an orthographic projection of the second portion on the substrate is located within an orthographic projection of the first portion on the substrate; or,

[0060] A third partition material layer, a second partition material layer and a first partition material layer are prepared in sequence on one side of the substrate; the first partition material layer, the second partition material layer and the third partition material layer are patterned to obtain a plurality of first openings and a first part, a second part and a third part stacked in sequence, the first part is located on the side of the second part facing away from the substrate, the orthographic projection of the second part on the substrate is located within the orthographic projection range of the first part on the substrate, and the orthographic projection of the second part on the substrate is located within the orthographic projection range of the third part on the substrate.

[0061] A fourth aspect of the present application provides a display device, comprising the aforementioned display panel, or comprising a display panel prepared by the aforementioned preparation method.

[0062] According to the display panel provided by the embodiment of the present application, at least part of the auxiliary electrode layer's orthographic projection on the substrate is connected to or overlaps with the orthographic projection of the isolation structure on the substrate, and at least part of the auxiliary electrode layer fills the gap between the isolation structure and the light-emitting functional layer, which is beneficial to improving the film continuity of the second electrode layer, reducing the lap resistance between the isolation structure and the second electrode layer, and improving the optical efficiency or brightness of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0063] Figure 1 This is a schematic diagram of the structure of a display panel in one embodiment of the present application.

[0064] Figure 2 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0065] Figure 3 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0066] Figure 4 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0067] Figure 5This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0068] Figure 6 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0069] Figure 7 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0070] Figure 8 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0071] Fig. 9 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0072] Fig.10 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0073] Fig.11 This is a schematic diagram of the structure of a display panel in another embodiment of the present application.

[0074] Fig.12 The figure is a schematic flow chart of a method for preparing a display panel in one embodiment of the present application.

[0075] Figures 13 to 16 The figure is a schematic diagram of the preparation process of a display panel in one embodiment of the present application. DETAILED DESCRIPTION

[0076] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0077] In addition, in order to better illustrate the present application, numerous specific details are provided in the following specific embodiments. It should be understood by those skilled in the art that the present application can also be implemented without certain specific details. In some examples, methods and means well known to those skilled in the art are not described in detail in order to highlight the subject matter of the present application.

[0078] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0079] In addition, the terms “first”, “second”, etc., if used, are merely used to distinguish between the descriptions and should not be understood as indicating or implying relative importance.

[0080] The present application provides a display panel according to a first aspect. Figure 1 The structural schematic diagram of the display panel shown in the figure, the display panel includes: a substrate 100; an isolation structure 200, which is located on one side of the substrate 100, and the isolation structure 200 has a plurality of first openings 210; a light-emitting device 300, the light-emitting device 300 includes a light-emitting functional layer 320, an auxiliary electrode layer 330 and a second electrode layer 340 which are stacked in sequence; the light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340 are located in the first opening 210; the orthographic projection of at least part of the auxiliary electrode layer 330 on the substrate 100 is connected to or overlapped with the orthographic projection of the isolation structure 200 on the substrate 100.

[0081] According to the display panel provided by the embodiment of the present application, at least part of the auxiliary electrode layer 330 is connected to or overlapped with the orthographic projection of the isolation structure 200 on the substrate 100, and at least part of the auxiliary electrode layer 330 fills the gap between the isolation structure 200 and the light-emitting functional layer 320, which is beneficial to improving the film continuity of the second electrode layer 340, reducing the lap resistance between the isolation structure 200 and the second electrode layer 340, and improving the optical efficiency or brightness of the display panel.

[0082] It can be understood that the meaning of at least part of the auxiliary electrode layer 330's orthographic projection on the substrate 100 being in contact with the orthographic projection of the isolation structure 200 on the substrate 100 is that at least part of the auxiliary electrode layer 330's orthographic projection on the substrate 100 is in contact with the edge where the orthographic projection of the isolation structure 200 on the substrate 100 is in contact.

[0083] For example, along the direction parallel to the plane of the substrate 100, the spacing between the orthographic projection of the light-emitting functional layer 320 on the substrate 100 and the orthographic projection of the isolation structure 200 on the substrate 100 is 0.2 μm-0.5 μm. Specifically, it can be 0.2, 0.3, 0.4 or 0.5 μm.

[0084] The inventor discovered in the process of realizing the present invention that in the prior art, the second electrode layer 340 is located on the side of the light-emitting functional layer 320 away from the substrate 100. Since there is a gap between the light-emitting functional layer 320 and the isolation structure 200, and the thickness of the second electrode layer 340 is relatively thin, the second electrode layer 340 is not continuously formed at the gap, which increases the lap resistance between the second electrode layer 340 and the isolation structure 200, resulting in low optical efficiency or brightness of the display panel. In the present application, an auxiliary electrode layer 330 is provided between the light-emitting functional layer 320 and the second electrode layer 340. The auxiliary electrode layer 330 will fill part of the gap between the light-emitting functional layer 320 and the isolation structure 200. When the second electrode layer 340 is formed, the auxiliary electrode layer 330 can be used as a substrate to facilitate the formation of the second electrode layer 340, so that the second electrode layer 340 has strong film continuity, and the second electrode layer 340 can be smoothly overlapped with the isolation structure 200, and the lap resistance is relatively low, thereby improving the optical efficiency or brightness of the display panel.

[0085] It can be understood that the auxiliary electrode layer 330 is located between the light-emitting functional layer 320 and the second electrode layer 340, the orthographic projection of the auxiliary electrode layer 330 on the substrate 100 covers the orthographic projection of the light-emitting functional layer 320 on the substrate 100, and at least a portion of the auxiliary electrode layer 330 located outside the orthographic projection range of the light-emitting functional layer 320 on the substrate 100 is connected to or overlapped with the orthographic projection of the isolation structure 200 on the substrate 100. Thus, the auxiliary electrode layer 330 can fill a portion of the gap between the isolation structure 200 and the light-emitting functional layer 320, so that the second electrode layer 340 can be smoothly formed, the second electrode layer 340 film layer is continuous, so that the second electrode layer 340 and the isolation structure 200 have excellent overlap effect, reduce the overlap resistance between the second electrode layer 340 and the isolation structure 200, and improve the optical efficiency or brightness of the display panel.

[0086] In one embodiment, the orthographic projection of the auxiliary electrode layer 330 on the substrate 100 is connected to or overlapped with the orthographic projection of the isolation structure 200 on the substrate 100. As a result, the contact area between the auxiliary electrode layer 330 and the isolation structure 200 is large, and the auxiliary electrode layer 330 fills the gap between the isolation structure 200 and the light-emitting functional layer 320, which is more conducive to the smooth and continuous film formation of the second electrode layer 340, so that the second electrode layer 340 and the isolation structure 200 have excellent overlapping effects, and the overlapping resistance between the second electrode layer 340 and the isolation structure 200 is reduced.

[0087] In one embodiment, the orthographic projection of the auxiliary electrode layer 330 on the substrate 100 is within the range of the orthographic projection of the second electrode layer 340 on the substrate 100. Thus, the second electrode layer 340 can directly overlap the isolation structure 200, and the second electrode layer 340 can protect the auxiliary electrode layer 330, which helps to prevent the auxiliary electrode layer 330 from being corroded.

[0088] In one embodiment, referring to Figure 2 In the structural diagram of the display panel shown, part of the second electrode layer 340 is located on the side wall of the isolation structure 200. Therefore, the second electrode layer 340 can be directly overlapped with the isolation structure 200, and the second electrode layer 340 can protect the auxiliary electrode layer 330, which is conducive to preventing the auxiliary electrode layer 330 from being corroded; in addition, the second electrode layer 340 can also protect the light-emitting functional layer 320 from being corroded by the etching solution in the subsequent etching process, thereby improving the yield of the display panel.

[0089] In one embodiment, the second electrode layer 340 on the sidewall of the isolation structure 200 is a continuous film layer. Therefore, the lap resistance between the second electrode layer 340 and the isolation structure 200 is low, the lap yield is high, and the optical efficiency or brightness of the display panel is improved.

[0090] In one embodiment, referring to Figure 3 As shown in the structural schematic diagram of the display panel, the auxiliary electrode layer 330 extends from the first opening 210 to the side wall of the isolation structure 200, that is, part of the auxiliary electrode layer 330 is located on the side wall of the auxiliary electrode layer 330, thereby being more conducive to the continuous film formation of the second electrode layer 340 located on the side wall of the isolation structure 200.

[0091] In one embodiment, the height of the auxiliary electrode layer 330 located on the sidewall of the isolation structure 200 is 0.1 μm-0.3 μm. Specifically, it can be 0.1, 0.2 or 0.3 μm. This is more conducive to the continuous film formation of the second electrode layer 340 located on the sidewall of the isolation structure 200.

[0092] In one embodiment, the second electrode layer 340 located in the first opening 210 is a continuous film layer, thereby facilitating the realization of a full-surface cathode.

[0093] In one embodiment, the thickness of the auxiliary electrode layer 330 is For example, it can be or As a result, the auxiliary electrode layer 330 has an appropriate thickness, and has an excellent effect of filling the gap between the isolation structure 200 and the light-emitting functional layer 320, and can serve as a substrate when the second electrode layer 340 is formed, which is beneficial to the smooth and continuous film formation of the second electrode layer 340, so that the second electrode layer 340 and the isolation structure 200 have an excellent overlap effect, thereby reducing the overlap resistance between the second electrode layer 340 and the isolation structure 200; and the auxiliary electrode layer 330 has an excellent conductive effect within the above-mentioned thickness range, and a better transparency effect.

[0094] In one embodiment, the thickness of the auxiliary electrode layer 330 is For example, it can be or The auxiliary electrode layer 330 has excellent conductivity and better transparency within the above thickness range; it is also conducive to the smooth and continuous film formation of the second electrode layer 340, so that the second electrode layer 340 and the isolation structure 200 have excellent overlap effect, and reduce the overlap resistance between the second electrode layer 340 and the isolation structure 200.

[0095] In one embodiment, the auxiliary electrode layer 330 and the second electrode layer 340 are made of different materials. Exemplarily, the material of the auxiliary electrode layer 330 includes at least one of ytterbium, titanium and aluminum; the material of the second electrode layer 340 includes at least one of magnesium, aluminum and silver. Thus, the auxiliary electrode layer 330 and the second electrode layer 340 both have excellent effects, and the auxiliary electrode layer 330 also has an excellent effect of assisting carrier injection, which is beneficial to improving the luminous efficiency of the display panel.

[0096] Exemplarily, the material of the auxiliary electrode layer 330 is ytterbium, and the material of the second electrode layer 340 is an alloy of magnesium and silver. The auxiliary electrode layer 330 and the second electrode layer 340 have excellent coordination effect. The auxiliary electrode layer 330 can fill the gap between the isolation structure 200 and the light-emitting functional layer 320. The second electrode layer 340 has excellent film continuity. The auxiliary electrode layer 330 also has an excellent auxiliary carrier injection effect, which is beneficial to improving the luminous efficiency of the display panel.

[0097] In one embodiment, referring to Figure 4 The structural diagram of the display panel shown in the figure, the display panel also includes: a first encapsulation layer 400, located on the side of the second electrode layer 340 away from the substrate 100, the first encapsulation layer 400 includes a plurality of encapsulation parts 410, the encapsulation parts 410 correspond to the first openings 210, and the orthographic projections of the encapsulation parts 410 on the substrate 100 cover the orthographic projections of the second electrode layer 340 on the substrate 100. Therefore, the encapsulation parts 410 correspond to the first openings 210, which is conducive to realizing pixel-level encapsulation and improving the encapsulation effect of the display panel.

[0098] Exemplarily, the light emitting device 300 includes light emitting devices of different colors, such as a red light emitting device R, a green light emitting device G, a blue light emitting device B, etc. For ease of preparation, a light emitting device of one color may be prepared first, and a corresponding encapsulation portion 410 may be prepared on the side of the light emitting device 300 away from the substrate 100, and then a light emitting device of another color and a corresponding encapsulation portion 410 may be prepared, until light emitting devices of all colors are prepared. For example, the preparation may be carried out in the order of the red light emitting device R, the green light emitting device G, and the blue light emitting device B, or in the order of arrangement of light emitting devices of other colors.

[0099] Exemplarily, when manufacturing a light-emitting device of one color, the light-emitting functional layer 320, the auxiliary electrode layer 330, the second electrode layer 340 and the packaging part 410 can be evaporated throughout the layer, and then the light-emitting functional layer 320, the auxiliary electrode layer 330, the second electrode layer 340 and the packaging part 410 at the first opening 210 corresponding to the light-emitting devices of the remaining colors are etched away. The packaging part 410 can protect the light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340, and prevent the light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340 of the light-emitting device of the previous color from being etched away by the etching process used in preparing the light-emitting device of the latter color.

[0100] In one embodiment, referring to Figure 5 and Figure 6 The schematic diagram of the structure of the isolation structure shown in the figure, the isolation structure 200 includes a first part 201 and a second part 202 stacked, the first part 201 is located on the side of the second part 202 away from the substrate 100, and the orthographic projection of the second part 202 on the substrate 100 is located within the orthographic projection range of the first part 201 on the substrate 100. Exemplarily, the second part 202 can be designed as an independent film layer, that is, there is no physical interface inside the second part 202, and each part is composed of the same material, for example, the material of the second part 202 is aluminum. Alternatively, the second part 202 can be designed to be composed of at least two film layers stacked. For example, the second part 202 is formed by stacking two conductive film layers, the materials of the two conductive film layers can be molybdenum and aluminum, respectively, and the conductive film layer composed of molybdenum is located between the substrate 100 and the conductive film layer composed of aluminum. Exemplarily, the second part 202 includes a conductive sub-part, or the second part 202 itself is a conductive structure. The second part 202 overlaps the first electrode layer 310 of the light emitting device 300 so that the first electrode layers 310 of adjacent light emitting devices 300 are electrically connected to each other, thereby realizing a full-surface cathode. The material of the first part 201 can be an organic material, an inorganic material, or a metal material. When the first part 201 is a metal material, the material of the second part 202 can be titanium. In this case, the cross-section of the isolation structure 200 is T-shaped or inverted trapezoidal.

[0101] In one embodiment, referring to Figure 7 In the structural schematic diagram of the display panel shown, the orthographic projection of the auxiliary electrode layer 330 on the substrate 100 is connected or overlapped with the orthographic projection of the second portion 202 on the substrate 100. The auxiliary electrode layer 330 and the second portion 202 can be effectively overlapped, and then the auxiliary electrode layer 330 can fill part of the gap between the light-emitting functional layer 320 and the isolation structure 200, which is conducive to the continuous film formation of the second electrode layer 340.

[0102] In one embodiment, referring to Figure 81 , the isolation structure 200 further includes a third portion 203, which is located on the side of the second portion 202 close to the substrate 100, and the orthographic projection of the second portion 202 on the substrate 100 is located within the orthographic projection range of the third portion 203 on the substrate 100. Exemplarily, the second portion 202 is a conductive film layer composed of aluminum, and the third portion 203 is a conductive film layer composed of molybdenum. In this case, the cross-section of the isolation structure 200 is an I-shaped.

[0103] In one embodiment, referring to Fig. 9 In the structural schematic diagram of the display panel shown in FIG. 1 , the orthographic projection of the auxiliary electrode layer 330 on the substrate 100 is connected to or overlapped with the orthographic projection of the third portion 203 on the substrate 100. Thus, the auxiliary electrode layer 330 and the third portion 203 can be effectively overlapped, and then the auxiliary electrode layer 330 can fill part of the gap between the light-emitting functional layer 320 and the isolation structure 200, which is conducive to the continuous film formation of the second electrode layer 340.

[0104] In one embodiment, referring to Figure 1 The light emitting device 300 further includes a first electrode layer 310 located between the substrate 100 and the isolation structure 200 , and the first electrode layer 310 is at least partially exposed to the first opening 210 .

[0105] It is understood that one of the first electrode layer 310 and the second electrode layer 340 is an anode, and the other of the first electrode layer 310 and the second electrode layer 340 is a cathode. Exemplarily, the second electrode layer 340 is a cathode, and the auxiliary electrode layer 330 is conducive to assisting electron injection into the light-emitting functional layer 320, which is conducive to improving the light-emitting efficiency of the light-emitting device 300.

[0106] Exemplarily, the light-emitting functional layer 320 includes an emitting layer (Emitting Layer, EML), and may also include at least one of a hole injection layer (HIL), a hole transport layer (HTL), and an electron blocking layer (EBL) located between the anode and the emitting layer (EML), and at least one of an electron injection layer (EIL), an electron transport layer (ETL), and a hole blocking layer (HBL) located between the cathode and the emitting layer (EML).

[0107] In one embodiment, referring to Figure 1The structural diagram of the display panel shown in the figure, the display panel also includes: a pixel defining layer 500, located between the substrate 100 and the isolation structure 200, the pixel defining layer 500 includes a plurality of second openings 510; a first electrode layer 310 is located between the substrate 100 and the pixel defining layer 500, the first electrode layer 310 is at least partially exposed to the second openings 510, and the light-emitting functional layer 320 is located in the first opening 210 and the second opening 510 that are connected. It should be noted that the pixel defining layer 500 is a conventional pixel defining layer, which is not an improvement of the present application and will not be described in detail here.

[0108] In one embodiment, the orthographic projection of the second opening 510 on the substrate 100 is located within the orthographic projection range of the first opening 210 on the substrate 100 .

[0109] For example, in the preparation process of the display panel of the present application, the first electrode layer 310 is first prepared on one side of the substrate 100, and then the stacked pixel defining layer 500 and the isolation structure 200 are prepared in sequence, and then the stacked light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340 are prepared in sequence in the first opening 210 and the second opening 510 enclosed by the isolation structure 200 to obtain the light-emitting device 300, and then the first encapsulation layer 400 is prepared in the first opening 210 corresponding to the light-emitting device 300. Among them, the auxiliary electrode layer 330 fills part of the gap between the light-emitting functional layer 320 and the isolation structure 200, reduces the gap between the surface of the light-emitting functional layer 320 away from the substrate and the above-mentioned gap during the preparation of the second electrode layer 340, is conducive to improving the film formation continuity of the second electrode layer 340, and improving the overlap efficiency between the second electrode layer 340 and the isolation structure 200, so that the light-emitting efficiency of the light-emitting device 300 is higher.

[0110] In one embodiment, the orthographic projection of the first encapsulation layer 400 on the substrate 100 at least partially overlaps with the orthographic projection of the pixel defining layer 500 on the substrate 100. This helps to improve the encapsulation effect of the display panel.

[0111] In one embodiment, referring to Fig.10 As shown in the structural schematic diagram of the display panel, the display panel further includes: a second encapsulation layer 600 located on a side of the first encapsulation layer 400 away from the substrate 100 .

[0112] In one embodiment, referring to Fig.11 As shown in the structural schematic diagram of the display panel, the display panel further includes: a third encapsulation layer 700 located on a side of the second encapsulation layer 600 away from the substrate 100 .

[0113] Exemplarily, the materials of the first encapsulation layer 400 and the third encapsulation layer 700 include inorganic materials, and the material of the second encapsulation layer 600 includes organic materials. Exemplarily, the first encapsulation layer 400 and the third encapsulation layer 700 are formed by deposition (CVD) and the like. The second encapsulation layer 600 is formed by inkjet printing (IJP).

[0114] In one embodiment, the display panel may further include an organic glue layer, a touch film layer, a filter layer or a cover plate located on a side of the third encapsulation layer 70 away from the second encapsulation layer 600 .

[0115] In one embodiment, the substrate 100 may be an array substrate, and the substrate 100 includes an array circuit to drive the light-emitting device 300 to emit light. Exemplarily, the substrate 100 may be a substrate substrate. In some embodiments, the substrate substrate may be a glass-based substrate. In one embodiment, the substrate substrate may include an organic resin material such as epoxy resin, triazine, silicone resin or polyimide. For example, the substrate substrate may be an FR4 type printed circuit board (Printed circuit board, PCB), or may be a flexible PCB that is easily deformed. In one embodiment, the substrate substrate may include a ceramic material such as silicon nitride, aluminum nitride or aluminum oxide, or may include a metal or a metal compound. For example, the substrate substrate may be a metal core printed circuit board (Metal Core PCB, MCPCB) or a metal copper clad laminate (Metal Copper Clad Laminate, MCCL).

[0116] A second aspect of the present application provides a display panel, referring to Figure 1 , the display panel includes: a substrate 100; an isolation structure 200; the isolation structure 200 is located at one side of the substrate 100, and the isolation structure 200 has a plurality of first openings 210; a light emitting device 300, the light emitting device 300 includes a light emitting functional layer 320, an auxiliary electrode layer 330, and a second electrode layer 340 which are stacked in sequence; the light emitting functional layer 320, the auxiliary electrode layer 330, and the second electrode layer 340 are located in the first opening 210; at least part of the auxiliary electrode layer 330 overlaps with the side wall of the isolation structure 200. Thus, the auxiliary electrode layer 330 fills the gap between the isolation structure 200 and the light emitting functional layer 320, which is conducive to improving the film continuity of the second electrode layer 340, reducing the overlap resistance between the isolation structure 200 and the second electrode layer 340, and improving the optical efficiency or brightness of the display panel.

[0117] It should be noted that the substrate, isolation structure and light-emitting device of this embodiment are consistent with the previous description and will not be elaborated herein.

[0118] In one embodiment, referring to Figure 2, part of the second electrode layer 340 is located on the side wall of the isolation structure 200. Therefore, the second electrode layer 340 can be directly overlapped with the isolation structure 200, and the second electrode layer 340 can protect the auxiliary electrode layer 330, which is conducive to preventing the auxiliary electrode layer 330 from being corroded; in addition, the second electrode layer 340 can also protect the light-emitting functional layer 320 from being corroded by the etching solution in the subsequent etching process, thereby improving the yield of the display panel.

[0119] In one embodiment, the second electrode layer 340 on the sidewall of the isolation structure 200 is a continuous film layer. Therefore, the lap resistance between the second electrode layer 340 and the isolation structure 200 is low, the lap yield is high, and the optical efficiency or brightness of the display panel is improved.

[0120] In one embodiment, referring to Figure 3 The auxiliary electrode layer 330 extends from the first opening 210 to the side wall of the isolation structure 200 , that is, part of the auxiliary electrode layer 330 is located on the side wall of the auxiliary electrode layer 330 , thereby being more conducive to the continuous film formation of the second electrode layer 340 located on the side wall of the isolation structure 200 .

[0121] In one embodiment, the second electrode layer 340 located in the first opening 210 is a continuous film layer, thereby facilitating the realization of a full-surface cathode.

[0122] In one embodiment, the thickness of the auxiliary electrode layer 330 is For example, it can be or As a result, the auxiliary electrode layer 330 has an appropriate thickness, and has an excellent effect of filling the gap between the isolation structure 200 and the light-emitting functional layer 320, and can serve as a substrate when the second electrode layer 340 is formed, which is beneficial to the smooth and continuous film formation of the second electrode layer 340, so that the second electrode layer 340 and the isolation structure 200 have an excellent overlap effect, thereby reducing the overlap resistance between the second electrode layer 340 and the isolation structure 200; and the auxiliary electrode layer 330 has an excellent conductive effect within the above-mentioned thickness range, and a better transparency effect.

[0123] In one embodiment, the thickness of the auxiliary electrode layer 330 is The auxiliary electrode layer 330 has excellent conductivity and better transparency within the above thickness range; it is also conducive to the smooth and continuous film formation of the second electrode layer 340, so that the second electrode layer 340 and the isolation structure 200 have excellent overlapping effects, thereby reducing the overlapping resistance between the second electrode layer 340 and the isolation structure 200.

[0124] In one embodiment, the auxiliary electrode layer 330 and the second electrode layer 340 are made of different materials. Exemplarily, the material of the auxiliary electrode layer 330 includes at least one of ytterbium, titanium and aluminum; the material of the second electrode layer 340 includes at least one of magnesium, aluminum and silver. Thus, the auxiliary electrode layer 330 and the second electrode layer 340 both have excellent effects, and the auxiliary electrode layer 330 also has an excellent effect of assisting carrier injection, which is beneficial to improving the luminous efficiency of the display panel.

[0125] Exemplarily, the material of the auxiliary electrode layer 330 is ytterbium, the material of the second electrode layer 340 is an alloy of magnesium and silver, the auxiliary electrode layer 330 and the second electrode layer 340 have excellent coordination effects, the auxiliary electrode layer 330 can fill the gap between the isolation structure 200 and the light-emitting functional layer 320, the film continuity of the second electrode layer 340 is excellent, and the auxiliary electrode layer 330 also has an excellent auxiliary carrier injection effect, which is beneficial to improving the luminous efficiency of the display panel. It should be noted that the display panel of this embodiment can be combined with the previous display panel in whole or in part, which will not be described in detail here.

[0126] A third aspect of the present application provides a method for preparing a display panel, referring to Fig.12 The schematic flow chart of the method for preparing a display panel is shown, and the method for preparing a display panel includes the following steps.

[0127] S100: preparing an isolation structure having a plurality of first openings on one side of a substrate.

[0128] It should be noted that the isolation structure is consistent with the previous description and will not be elaborated here.

[0129] S200: sequentially preparing a light-emitting functional layer, an auxiliary electrode layer and a second electrode layer in the first opening.

[0130] The orthographic projection of at least part of the auxiliary electrode layer on the substrate is connected to or overlapped with the orthographic projection of the isolation structure on the substrate.

[0131] It should be noted that the light-emitting functional layer, the auxiliary electrode layer and the second electrode layer are consistent with the above description and will not be described in detail here.

[0132] In one embodiment, preparing the auxiliary electrode layer and the second electrode layer in the first opening includes: under a first evaporation angle condition, evaporating the auxiliary electrode layer on the side of the light-emitting functional layer facing away from the substrate; under a second evaporation angle condition, evaporating the second electrode layer on the side of the auxiliary electrode layer facing away from the substrate, and the second evaporation angle is greater than or equal to the first evaporation angle.

[0133] It should be noted that the evaporation angle refers to the maximum angle between the evaporation beam and the plane where the substrate is located.

[0134] Exemplarily, the second evaporation angle is equal to the first evaporation angle. At this time, the orthographic projection of the second electrode layer on the substrate completely overlaps with the orthographic projection of the auxiliary electrode layer on the substrate, and the second electrode layer is overlapped with the isolation structure through the auxiliary electrode layer; moreover, the auxiliary electrode layer can be filled into the gap between the light-emitting functional layer and the isolation structure, so that the second electrode layer can be continuously formed into a film when the second electrode layer is evaporated, thereby improving the overlapping performance between the second electrode layer and the isolation structure.

[0135] Exemplarily, the second evaporation angle is greater than the first evaporation angle. At this time, the positive projection of the auxiliary electrode layer on the substrate is within the range of the positive projection of the second electrode layer on the substrate, and the second electrode layer can directly overlap with the isolation structure; moreover, the auxiliary electrode layer can be filled into the gap between the light-emitting functional layer and the isolation structure, so that the second electrode layer can be continuously formed when the second electrode layer is evaporated, thereby improving the overlap performance between the second electrode layer and the isolation structure. In one embodiment, the second evaporation angle is 0 to 10° greater than the first evaporation angle, for example, it can be 1°, 2°, 4°, 6°, 8° or 10°, etc.

[0136] In one embodiment, sequentially preparing a light-emitting functional layer, an auxiliary electrode layer, a second electrode layer in the first opening includes: sequentially preparing a light-emitting functional material layer, an auxiliary electrode material layer, a second electrode material layer and a first packaging material layer in the first opening; patterning the light-emitting functional material layer, the auxiliary electrode material layer, the second electrode material layer and the first packaging material layer to obtain a light-emitting functional layer, an auxiliary electrode layer, a second electrode layer and a first packaging layer.

[0137] Illustratively, the method further includes preparing a first electrode layer, the material of the first electrode layer includes a metal material, and the preparation method of the first electrode layer includes but is not limited to evaporation, magnetron sputtering, etc.

[0138] Exemplarily, the method for preparing the first electrode layer includes the following steps: forming an entire first electrode material layer on one side of the substrate, and simultaneously patterning the entire first electrode material layer by wet etching to obtain the first electrode layer.

[0139] It should be noted that the light-emitting functional layer, the second electrode layer and the light-emitting device are consistent with the above description and will not be described in detail here.

[0140] Illustratively, in the process of preparing the light-emitting functional layer, the auxiliary electrode layer, and the second electrode layer, evaporation or magnetron sputtering can be used, and the isolation structure will separate the light-emitting functional layer, the auxiliary electrode layer, and the second electrode layer to obtain the required light-emitting functional layer, the auxiliary electrode layer, and the second electrode layer located in the first opening.

[0141] Exemplarily, the light-emitting device includes light-emitting devices of different colors, such as a red light-emitting device R, a green light-emitting device G, a blue light-emitting device B, etc. For the convenience of preparation, a light-emitting device of one color may be prepared first, and then a light-emitting device of another color may be prepared until light-emitting devices of all colors are prepared. For example, the preparation may be carried out in the order of the red light-emitting device R, the green light-emitting device G, and the blue light-emitting device B, or in the order of arrangement of light-emitting devices of other colors.

[0142] Taking the preparation order of the light-emitting devices as red light-emitting device R, green light-emitting device G, and blue light-emitting device B as an example, the preparation process of the display panel is as follows: the light-emitting functional material layer 31, the auxiliary electrode material layer 32, the second electrode material layer 33 and the first packaging material layer 41 of the red light-emitting device R are sequentially prepared on the side of the isolation structure 200 away from the substrate 100 (see Fig.13 ), and the first packaging material layer 41 is patterned to obtain the packaging part 410, and the light-emitting functional material layer 31, the auxiliary electrode material layer 32 and the second electrode material layer 33 corresponding to the positions of the green light-emitting device G and the blue light-emitting device B are removed to obtain the light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340 of the red light-emitting device R (see for details) Fig.14 ); Repeat the above steps to sequentially prepare the light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340 of the green light-emitting device G (refer to Fig.15 ), and the light-emitting functional layer 320, the auxiliary electrode layer 330 and the second electrode layer 340 of the blue light-emitting device B (see specifically Fig.16 ).

[0143] In one embodiment, the step of preparing an isolation structure having a plurality of first openings on one side of a substrate includes: sequentially preparing a second isolation material layer and a first isolation material layer on one side of the substrate; patterning the first isolation material layer and the second isolation material layer to obtain a plurality of first openings and a first portion and a second portion stacked thereon, wherein the first portion is located on a side of the second portion facing away from the substrate, and an orthographic projection of the second portion on the substrate is located within the orthographic projection of the first portion on the substrate.

[0144] Exemplarily, the isolation structure may use a stacked material with different etching rates, the isolation structure includes a first part and a second part stacked, the first part is located on the side of the second part facing away from the substrate, the orthographic projection of the second part on the substrate is located within the orthographic projection of the first part on the substrate, the first part and the second part have different etching rates, for example, the material of the first part is titanium, the material of the second part is aluminum, and the etching rate of the second part is greater than the etching rate of the first part. The preparation method of the isolation structure includes the following steps: preparing a first material layer (first partition material layer) and a second material layer (second partition material layer) stacked on one side of the substrate, in the same etching environment, more material is etched away from the second material layer to form the second part of the isolation structure, while less material is etched away from the first material layer to form the first part of the isolation structure.

[0145] In another embodiment, a third partition material layer, a second partition material layer and a first partition material layer are sequentially prepared on one side of the substrate; the first partition material layer, the second partition material layer and the third partition material layer are patterned to obtain a plurality of first openings and a first part, a second part and a third part stacked in sequence, the first part is located on the side of the second part facing away from the substrate, the orthographic projection of the second part on the substrate is located within the orthographic projection range of the first part on the substrate, and the orthographic projection of the second part on the substrate is located within the orthographic projection range of the third part on the substrate.

[0146] Exemplarily, the isolation structure may use stacked materials with different etching rates, the isolation structure includes a stacked first part, a second part, and a third part, the first part is located on the side of the second part facing away from the substrate, the third part is located on the side of the second part close to the substrate, the orthographic projection of the second part on the substrate is located within the orthographic projection of the first part on the substrate, and the orthographic projection of the second part on the substrate is located within the range of the orthographic projection of the third part on the substrate, the etching rates of the first part, the third part, and the second part are different, for example, the material of the first part and the third part is titanium, the material of the second part is aluminum, and the etching rate of the second part is greater than the etching rate of the first part and the third part. The preparation method of the isolation structure includes the following steps: preparing a stacked first material layer (first partition material layer), a second material layer (second partition material layer), and a third material layer (third partition material layer) on one side of the substrate, in the same etching environment, more material is etched from the second material layer to form the second part of the isolation structure, while less material is etched from the first material layer and the third material layer to form the first part and the third part of the isolation structure.

[0147] Exemplarily, after preparing the first encapsulation layer on the side of the second electrode layer facing away from the substrate, the method further includes: sequentially preparing a second encapsulation layer and a third encapsulation layer stacked on the side of the first encapsulation layer facing away from the substrate, the second encapsulation layer and the third encapsulation layer being consistent with the previous description and not described in detail here. Optionally, the second encapsulation layer is formed by inkjet printing (IJP), and the third encapsulation layer is formed by deposition or the like.

[0148] In a specific embodiment, in the display panel, the light-emitting device includes a red light-emitting device R, a green light-emitting device G, and a blue light-emitting device B, and the light-emitting device is prepared in the order of the red light-emitting device R, the green light-emitting device G, and the blue light-emitting device B. The preparation method of the display panel includes the following steps:

[0149] 1. Provide a glass-based substrate.

[0150] 2. Prepare a first electrode material layer on the entire surface of one side of the substrate, and simultaneously pattern the first electrode material layer on the entire surface by wet etching to obtain a first electrode layer.

[0151] 3. Prepare a pixel defining layer on the side of the first electrode layer facing away from the substrate, wherein the pixel defining layer has a plurality of second openings.

[0152] 4. Prepare a first material layer (first partition material layer), a second material layer (second partition material layer) and a third material layer (third partition material layer) in a stacked arrangement on the side of the pixel defining layer facing away from the substrate, wherein the materials of the first material layer and the third material layer are titanium, and the material of the second material layer is aluminum. In the same etching environment, more material is etched away from the second material layer to form the second part of the isolation structure, while less material is etched away from the first material layer and the third material layer to form the first part and the third part of the isolation structure, thereby obtaining an isolation structure. A plurality of first openings are formed in the isolation structure by etching, wherein the first opening is connected to the second opening, and the orthographic projection of the first opening on the array covers the orthographic projection of the second opening on the substrate, and the first electrode layer is exposed to the connected first opening and second opening.

[0153] 5. Prepare a whole layer of red light-emitting functional material layer, auxiliary electrode material layer, second electrode layer material layer and first packaging material layer by an evaporation method, wherein the evaporation angle of the evaporation auxiliary electrode material layer is smaller than the evaporation angle of the evaporation second electrode layer material layer; etch away the red light-emitting functional material layer, auxiliary electrode material layer, second electrode layer material layer and first packaging material layer in the first opening corresponding to the green light-emitting device G and the blue light-emitting device B to obtain the light-emitting functional layer, auxiliary electrode layer, second electrode layer and packaging part of the red light-emitting device.

[0154] 6. Prepare the light-emitting functional layer, auxiliary electrode layer, second electrode layer and packaging part of the green light-emitting device G and the blue light-emitting device B according to the operating steps of step 5 to obtain a first packaging layer.

[0155] 7. On the side of the first encapsulation layer facing away from the substrate, a second encapsulation layer and a third encapsulation layer are sequentially stacked.

[0156] A fourth aspect of the present application provides a display device, comprising the aforementioned display panel, or comprising a display panel prepared by the aforementioned preparation method.

[0157] It should be noted that the display panel is consistent with the previous description and will not be elaborated here.

[0158] It is understandable that the display device, in addition to the display panel, may also include structures that a conventional display device should have, such as a chip, a cover plate, a touch panel, a housing, etc., which will not be elaborated here.

[0159] Exemplarily, the display device can be used for color display or black and white display; the display device can be used for dynamic display or static display.

[0160] Exemplarily, the display device may include any device or product having a display function. For example, the display device may be a smart phone, a mobile phone, an e-book reader, a desktop computer (PC), a laptop PC, a netbook PC, a personal digital assistant (PDA), a portable multimedia player (PMP), a digital audio player, a mobile medical device, a camera, a wearable device (such as a head-mounted device, an electronic clothing, an electronic bracelet, an electronic necklace, an electronic accessory, an electronic tattoo, or a smart watch), a television, etc. Since the display device includes the display panel in the present application, the overlap effect between the second electrode layer and the isolation structure in the display device is excellent, and the luminous efficiency of the light-emitting device is high.

[0161] The basic principles of the present application are described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, strengths, effects, etc. are required by each embodiment of the present application. In addition, the specific details disclosed above are only for the purpose of illustration and ease of understanding, not for limitation, and the above details do not limit the present application to being implemented by adopting the above specific details.

[0162] The above description has been given for the purpose of illustration and description. In addition, this description is not intended to limit the embodiments of the present application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, changes, additions and sub-combinations thereof.

Claims

1. A display panel, characterized in that: include: substrate; An isolation structure, located on one side of the substrate, the isolation structure having a plurality of first openings; A light emitting device, the light emitting device comprising a light emitting functional layer, an auxiliary electrode layer and a second electrode layer stacked in sequence, wherein the light emitting functional layer, the auxiliary electrode layer and the second electrode layer are located in the first opening; An orthographic projection of at least a portion of the auxiliary electrode layer on the substrate is connected to or overlaps with an orthographic projection of the isolation structure on the substrate.

2. The display panel according to claim 1, characterized in that: The orthographic projection of the auxiliary electrode layer on the substrate is connected to or overlapped with the orthographic projection of the isolation structure on the substrate; Preferably, the orthographic projection of the auxiliary electrode layer on the substrate is located within the range of the orthographic projection of the second electrode layer on the substrate.

3. The display panel according to claim 2, characterized in that: A portion of the second electrode layer is located on a side wall of the isolation structure; Preferably, the second electrode layer located on the side wall of the isolation structure is a continuous film layer.

4. The display panel according to claim 1, characterized in that: The thickness of the auxiliary electrode layer is Preferably, the thickness of the auxiliary electrode layer is 5. The display panel according to any one of claims 1 to 4, characterized in that: The auxiliary electrode layer and the second electrode layer are made of different materials; Preferably, the material of the auxiliary electrode layer includes at least one of ytterbium, titanium and aluminum; Preferably, the material of the second electrode layer includes at least one of magnesium, aluminum and silver.

6. The display panel according to claim 1, characterized in that: Along a direction parallel to the plane where the substrate is located, a distance between an orthographic projection of the light-emitting functional layer on the substrate and an orthographic projection of the isolation structure on the substrate is 0.2 μm-0.5 μm.

7. The display panel according to claim 1, characterized in that: The auxiliary electrode layer extends from the first opening to the sidewall of the isolation structure; Preferably, the auxiliary electrode layer located on the sidewall of the isolation structure has a height of 0.1 μm-0.3 μm.

8. The display panel according to claim 1, characterized in that: The isolation structure comprises a first portion and a second portion stacked together, the first portion is located on a side of the second portion away from the substrate, and an orthographic projection of the second portion on the substrate is located within the orthographic projection range of the first portion on the substrate; Preferably, the orthographic projection of the auxiliary electrode layer on the substrate is connected to or overlaps with the orthographic projection of the second portion on the substrate; Preferably, the isolation structure further comprises a third portion, which is located on a side of the second portion close to the substrate, and the orthographic projection of the second portion on the substrate is located within the orthographic projection range of the third portion on the substrate; Preferably, an orthographic projection of the auxiliary electrode layer on the substrate is connected to or overlaps with an orthographic projection of the third portion on the substrate.

9. The display panel according to claim 1, characterized in that: The light emitting device further includes a first electrode layer, the first electrode layer is located between the substrate and the isolation structure, and the first electrode layer is at least partially exposed to the first opening.

10. The display panel according to claim 1, characterized in that: Also includes: a pixel defining layer, located between the substrate and the isolation structure, the pixel defining layer comprising a plurality of second openings; preferably, the light emitting device further comprises a first electrode layer, the first electrode layer being located between the substrate and the pixel defining layer, the first electrode layer being at least partially exposed to the second openings, and the light emitting functional layer being located in the first opening and the second opening being connected to each other; Preferably, the orthographic projection of the second opening on the substrate is located within the orthographic projection range of the first opening on the substrate.

11. The display panel according to claim 10, characterized in that: Also includes: A first encapsulation layer is located on a side of the second electrode layer away from the substrate, the first encapsulation layer comprises a plurality of encapsulation parts, the encapsulation parts correspond to the first openings, and the orthographic projections of the encapsulation parts on the substrate cover the orthographic projections of the second electrode layer on the substrate; Preferably, an orthographic projection of the first encapsulation layer on the substrate at least partially overlaps with an orthographic projection of the pixel defining layer on the substrate.

12. The display panel according to claim 11, characterized in that: Also includes: a second encapsulation layer, located on a side of the first encapsulation layer away from the substrate; Preferably, it further comprises a third encapsulation layer, which is located on a side of the second encapsulation layer away from the substrate; Preferably, the materials of the first encapsulation layer and the third encapsulation layer include inorganic materials, and / or the material of the second encapsulation layer includes organic materials.

13. A display panel, characterized in that: include: substrate; An isolation structure, located on one side of the substrate, the isolation structure having a plurality of first openings; A light emitting device, the light emitting device comprising a light emitting functional layer, an auxiliary electrode layer and a second electrode layer stacked in sequence; the light emitting functional layer, the auxiliary electrode layer and the second electrode layer are located in the first opening; At least a portion of the auxiliary electrode layer overlaps the sidewall of the isolation structure.

14. The display panel according to claim 13, characterized in that: A portion of the second electrode layer is located on a side wall of the isolation structure; Preferably, the second electrode layer located on the side wall of the isolation structure is a continuous film layer; Preferably, the auxiliary electrode layer extends from the first opening to a sidewall of the isolation structure.

15. The display panel according to claim 13, characterized in that: The auxiliary electrode layer and the second electrode layer are made of different materials; Preferably, the material of the auxiliary electrode layer includes at least one of ytterbium, titanium and aluminum; Preferably, the material of the second electrode layer includes at least one of magnesium, aluminum and silver; Preferably, the thickness of the auxiliary electrode layer is Preferably, the thickness of the auxiliary electrode layer is 16. A method for preparing a display panel, characterized in that: include: Preparing an isolation structure having a plurality of first openings on one side of the substrate; sequentially preparing a light-emitting functional layer, an auxiliary electrode layer and a second electrode layer in the first opening; An orthographic projection of at least a portion of the auxiliary electrode layer on the substrate is connected to or overlaps with an orthographic projection of the isolation structure on the substrate.

17. The preparation method according to claim 16, characterized in that: Preparing an auxiliary electrode layer and a second electrode layer in the first opening includes: Under a first evaporation angle condition, evaporating the auxiliary electrode layer on a side of the light-emitting functional layer away from the substrate; Under a second evaporation angle condition, evaporating the second electrode layer on a side of the auxiliary electrode layer away from the substrate; The second evaporation angle is greater than or equal to the first evaporation angle; Preferably, the second evaporation angle is 0-10° greater than the first evaporation angle.

18. The preparation method according to claim 16, characterized in that: The step of sequentially preparing a light-emitting functional layer, an auxiliary electrode layer and a second electrode layer in the first opening comprises: Sequentially preparing a light-emitting functional material layer, an auxiliary electrode material layer, a second electrode material layer and a first packaging material layer in the first opening; The light-emitting functional material layer, the auxiliary electrode material layer, the second electrode material layer and the first packaging material layer are patterned to obtain the light-emitting functional layer, the auxiliary electrode layer, the second electrode layer and the first packaging layer.

19. The preparation method according to claim 16, characterized in that: The step of preparing an isolation structure having a plurality of first openings on one side of the substrate comprises: A second partition material layer and a first partition material layer are sequentially prepared on one side of the substrate; the first partition material layer and the second partition material layer are patterned to obtain a plurality of first openings and overlapping first and second portions, wherein the first portion is located on a side of the second portion away from the substrate, and an orthographic projection of the second portion on the substrate is located within an orthographic projection of the first portion on the substrate; or, A third partition material layer, a second partition material layer and a first partition material layer are prepared in sequence on one side of the substrate; the first partition material layer, the second partition material layer and the third partition material layer are patterned to obtain a plurality of first openings and a first part, a second part and a third part stacked in sequence, wherein the first part is located on a side of the second part away from the substrate, the orthographic projection of the second part on the substrate is located within the orthographic projection range of the first part on the substrate, and the orthographic projection of the second part on the substrate is located within the orthographic projection range of the third part on the substrate.

20. A display device, characterized in that: A display panel comprising any one of claims 1 to 15, or a display panel prepared by the preparation method according to any one of claims 16 to 19.

Images