Display panel, manufacturing method thereof and display device

Abstract

The invention relates to a display panel and a manufacturing method of the display panel. The display panel includes a substrate; the isolation structure is arranged on one side of the substrate; the isolation structure comprises an isolation part and a blocking part which are stacked in the direction away from the substrate, and the orthographic projection of the isolation part on the substrate is located in the orthographic projection of the blocking part on the substrate; the distance between the edge of the orthographic projection of the blocking part on the substrate and the closest edge in the orthographic projection of the isolation part on the substrate in the first direction is a first length; the distance between the edge of the orthographic projection of the blocking part on the substrate and the closest edge in the orthographic projection of the isolation part on the substrate in the second direction is a second length; the first direction intersects with the second direction, and the first length is not equal to the second length. And the display effect of the display panel can be improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] OLED (Organic Light Emitting Diode) display panel is one of the hot topics in the current display panel research field. OLED display panel has the advantages of low energy consumption, low cost, self-luminescence, wide viewing angle and fast response speed. However, the display effect of traditional display panels is poor. Summary of the invention

[0003] Based on this, it is necessary to provide a display panel and a manufacturing method thereof, and a display device to address the problem of poor display effect of traditional display panels.

[0004] According to a first aspect of the present application, a display panel is provided, comprising:

[0005] substrate; and

[0006] An isolation structure, disposed on one side of the substrate;

[0007] The isolation structure comprises an isolation portion and a blocking portion stacked in a direction away from the substrate, wherein the orthographic projection of the isolation portion on the substrate is located within the orthographic projection of the blocking portion on the substrate;

[0008] The distance between the edge of the orthographic projection of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate in the first direction is a first length;

[0009] The distance in the second direction between the orthographic projection edge of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate is a second length;

[0010] The first direction intersects with the second direction, and the first length is not equal to the second length.

[0011] In some embodiments, the display panel further includes a plurality of pixel openings disposed on the same side of the substrate as the isolation structure, the isolation structure being disposed outside the corresponding pixel openings in a direction parallel to the plane where the substrate is located, and the first electrode, the light-emitting portion, and the second electrode are sequentially stacked in the pixel openings in a direction away from the substrate;

[0012] Optionally, the second electrode is electrically connected to the isolation portion;

[0013] Optionally, the first length>the second length, and the first direction is configured as a vapor deposition scanning direction of the second electrode;

[0014] Optionally, the second length is greater than the first length, and the second direction is configured as an evaporation scanning direction of the second electrode.

[0015] In some embodiments, the display panel further includes a plurality of pixel openings disposed on the same side of the substrate as the isolation structure, and the isolation structure is disposed outside the corresponding pixel openings in a direction parallel to the plane where the substrate is located;

[0016] The isolation structure encloses a plurality of isolation openings, and the plurality of isolation openings are arranged in one-to-one correspondence with the plurality of pixel openings;

[0017] Optionally, the orthographic projection of the pixel opening on the substrate is located within the orthographic projection range of the corresponding isolation opening on the substrate;

[0018] Optionally, the first direction and the second direction are both perpendicular to the thickness direction of the substrate, and the first direction is perpendicular to the second direction;

[0019] Optionally, a dimension of the isolation portion at an end away from the substrate is smaller than a dimension of the end close to the substrate.

[0020] In some embodiments, the blocking portion includes a first blocking portion and a second blocking portion;

[0021] The blocking portion includes two first blocking portions arranged opposite to each other along the first direction, and two second blocking portions arranged opposite to each other along the second direction;

[0022] Optionally, the first blocking portion has a first outer contour edge, and along the first outer contour edge from one end to the other end, the distance between the orthographic projection of the first outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a first length;

[0023] Optionally, the second blocking portion has a second outer contour edge, and along the second outer contour edge from one end to the other end, the distance between the orthographic projection of the second outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a second length.

[0024] In some embodiments, the second outer contour edge includes two sub-contour edges connected at one end, and the two sub-contour edges are located on opposite sides of a target plane, wherein the target plane is a plane perpendicular to the first direction; the distance between the orthographic projection of the sub-contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is the second length, and the second length gradually increases from one end of the sub-contour edge close to another sub-contour edge to the other end;

[0025] Optionally, the two sub-contour edges are arranged symmetrically with the target plane as a reference object;

[0026] Optionally, the second outer contour edge is arc-shaped;

[0027] Optionally, the first length is greater than a maximum value of the second length.

[0028] In some embodiments, the blocking portion further includes a third blocking portion, and the third blocking portion is connected between the first blocking portion and the adjacent second blocking portion;

[0029] The orthographic projection of the third blocking portion on the substrate is an arc;

[0030] Optionally, the orthographic projection of the second blocking portion on the substrate is in the shape of a straight line;

[0031] Optionally, along the first direction, a length by which the first blocking portion protrudes from the isolation portion is a first length;

[0032] Along the second direction, the length of the second blocking portion protruding from the isolation portion is a second length;

[0033] Optionally, the first length is greater than the second length.

[0034] In some embodiments, the material of the isolation portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum;

[0035] Optionally, the material of the isolation portion includes molybdenum or titanium;

[0036] Optionally, the material of the blocking portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum;

[0037] Optionally, the material of the blocking portion includes molybdenum or titanium.

[0038] In some embodiments, the material of the barrier portion includes multiple inorganic film layers stacked in layers; in any two adjacent inorganic film layers, the oxygen content of the inorganic film layer away from the substrate is greater than the oxygen content of the inorganic film layer close to the substrate;

[0039] Optionally, the multilayer inorganic film layer comprises a first inorganic film layer and a second inorganic film layer sequentially arranged in a direction away from the substrate, the material of the first inorganic film layer comprises silicon oxynitride, and the material of the second inorganic film layer comprises silicon oxide;

[0040] Optionally, the first inorganic film layer includes a first sub-film layer and a second sub-film layer sequentially arranged in a direction away from the substrate, and the oxygen content of the second sub-film layer is higher than that of the first sub-film layer.

[0041] According to a second aspect of the present application, a display panel is provided, comprising:

[0042] substrate; and

[0043] An isolation structure, disposed on the substrate;

[0044] A plurality of pixel openings are arranged on the same side of the substrate as the isolation structure, and the isolation structure is arranged outside the corresponding pixel openings in a direction parallel to the plane where the substrate is located;

[0045] The isolation structure encloses a plurality of isolation openings, and the plurality of isolation openings are arranged in one-to-one correspondence with the plurality of pixel openings;

[0046] The isolation structure comprises an isolation portion and a blocking portion stacked in a direction away from the substrate, wherein the orthographic projection of the isolation portion on the substrate is located within the orthographic projection of the blocking portion on the substrate;

[0047] The distance between the edge of the orthographic projection of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate in the first direction is a first length;

[0048] The distance in the second direction between the orthographic projection edge of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate is a second length;

[0049] The first direction intersects with the second direction, and the first length is not equal to the second length.

[0050] In some embodiments, the blocking portion includes a first blocking portion and a second blocking portion arranged annularly around the pixel opening, and the first blocking portion and the second blocking portion both protrude from a side of the isolation portion close to the isolation opening;

[0051] Optionally, the first direction and the second direction are both perpendicular to the thickness direction of the substrate, and the first direction is perpendicular to the second direction;

[0052] Optionally, in the first direction or the second direction and in an extending direction perpendicular to the isolating portion, a dimension of the isolating portion away from an end of the substrate is smaller than a dimension of the isolating portion close to an end of the substrate;

[0053] Optionally, the blocking portion includes two first blocking portions arranged opposite to each other along the first direction, and two second blocking portions arranged opposite to each other along the second direction;

[0054] Optionally, the first blocking portion has a first outer contour edge, and along the first outer contour edge from one end to the other end, the distance between the orthographic projection of the first outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a first length;

[0055] Optionally, the second blocking portion has a second outer contour edge, and along the second outer contour edge from one end to the other end, the distance between the orthographic projection of the second outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a second length.

[0056] In some embodiments, the material of the isolation portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum;

[0057] Optionally, the material of the isolation portion includes molybdenum or titanium;

[0058] Optionally, the material of the blocking portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum;

[0059] Optionally, the material of the blocking portion includes molybdenum or titanium.

[0060] In some embodiments, the material of the barrier portion includes multiple inorganic film layers stacked in layers; in any two adjacent inorganic film layers, the oxygen content of the inorganic film layer away from the substrate is greater than the oxygen content of the inorganic film layer close to the substrate;

[0061] Optionally, the multilayer inorganic film layer comprises a first inorganic film layer and a second inorganic film layer sequentially arranged in a direction away from the substrate, the material of the first inorganic film layer comprises silicon oxynitride, and the material of the second inorganic film layer comprises silicon oxide;

[0062] Optionally, the first inorganic film layer includes a first sub-film layer and a second sub-film layer sequentially arranged in a direction away from the substrate, and the oxygen content of the second sub-film layer is higher than that of the first sub-film layer.

[0063] According to a third aspect of the present application, a method for manufacturing a display panel is provided, comprising:

[0064] providing a substrate;

[0065] forming an isolation portion on one side of the substrate;

[0066] forming a blocking portion on a side of the isolation portion away from the substrate;

[0067] The distance between the edge of the orthographic projection of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate in the first direction is a first length;

[0068] The distance in the second direction between the orthographic projection edge of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate is a second length;

[0069] The first direction intersects with the second direction, and the first length is not equal to the second length.

[0070] In some embodiments, the first length is greater than the second length; the method for manufacturing the display panel further includes: forming a second electrode by evaporation along the first direction; or

[0071] The second length is greater than the first length; the method for manufacturing the display panel further includes: forming a second electrode by evaporation along the second direction.

[0072] In some embodiments, forming an isolation portion on one side of the substrate specifically includes:

[0073] forming a first isolation material layer on the substrate;

[0074] Etching the first isolation material layer to obtain the isolation portion;

[0075] Optionally, etching the first isolation material layer to obtain the isolation portion specifically includes:

[0076] The first isolation material layer is dry-etched to obtain the isolation portion.

[0077] In some embodiments, forming a blocking portion on a side of the isolation portion away from the substrate specifically includes:

[0078] forming a sacrificial layer on a side of the isolation portion away from the substrate;

[0079] Etching the sacrificial layer to expose the isolation portion;

[0080] forming a second isolation material layer on a side of the sacrificial layer away from the substrate, wherein the second isolation material layer covers the isolation portion;

[0081] The second isolation material layer is etched to obtain the blocking portion.

[0082] In some embodiments, after etching the second isolation material layer to obtain the blocking portion, the method further includes:

[0083] removing the sacrificial layer;

[0084] Optionally, the material of the sacrificial layer includes an organic material;

[0085] Optionally, the removing the sacrificial layer specifically includes: treating the sacrificial layer with an oxygen-containing gas to remove the sacrificial layer;

[0086] Optionally, etching the second isolation material layer to obtain the blocking portion specifically includes: performing dry etching on the second isolation material layer to obtain the blocking portion.

[0087] In some embodiments, forming the isolation portion on one side of the substrate specifically includes:

[0088] forming a first isolation material layer on the substrate;

[0089] Etching the first isolation material layer to obtain the isolation portion;

[0090] The forming of the blocking portion on a side of the sacrificial layer away from the substrate specifically includes:

[0091] forming a second isolation material layer on a side of the sacrificial layer away from the substrate;

[0092] The second isolation material layer is etched to obtain the blocking portion.

[0093] In some embodiments, before forming the isolation portion on one side of the substrate, the method further includes: forming a plurality of first electrodes arranged at intervals on one side of the substrate and a pixel definition layer covering the plurality of first electrodes;

[0094] After forming the isolation portion on one side of the substrate, the method further includes: forming a plurality of pixel openings on the pixel definition layer, wherein the pixel openings at least partially expose the first electrode;

[0095] After forming the blocking portion on the side of the isolation portion away from the substrate, the method further includes: forming a light-emitting portion on the side of the first electrode away from the substrate; and forming a second electrode on the side of the light-emitting portion away from the substrate.

[0096] Optionally, the isolation portion and the blocking portion constitute an isolation structure, and an orthographic projection of the isolation portion on the substrate is located within an orthographic projection of the blocking portion on the substrate;

[0097] Optionally, the isolation structure encloses a plurality of isolation openings, and the plurality of isolation openings are arranged in one-to-one correspondence with the plurality of pixel openings;

[0098] Optionally, an orthographic projection of the pixel opening on the substrate is located within a range of an orthographic projection of the corresponding isolation opening on the substrate.

[0099] According to a fourth aspect of the present application, a display device is provided, comprising any one of the display panels described above.

[0100] In the technical solution of the present application, since the first length is not equal to the second length, the direction corresponding to the smaller one of the first length and the second length is defined as the first target direction. Therefore, in the subsequent process of forming the second electrode on one side of the substrate, the climbing effect of the side wall of the second electrode along the first target direction can be improved, which is beneficial to reduce the poor overlap between the second electrode and the isolation structure, and is beneficial to improve the display effect of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0101] Figure 1 A cross-sectional schematic diagram of a display panel in an embodiment of the present application is shown.

[0102] Figure 2 A partial top view of an isolation structure in an embodiment of the present application is shown.

[0103] Figure 3 A partial top view of an isolation structure in another embodiment of the present application is shown.

[0104] Figure 4 A schematic cross-sectional view of an isolation structure according to an embodiment of the present application in a direction perpendicular to the first direction and the second direction is shown ( Figure 4 Figure (a) is a schematic cross-sectional view of the isolation structure in a direction perpendicular to the second direction. Figure 4 (b) is a schematic cross-sectional view of the isolation structure perpendicular to the first direction).

[0105] Figure 5-Figure 12 A schematic diagram of a manufacturing process of a display panel in an embodiment of the present application is shown.

[0106] Fig.13 A schematic diagram of a display device provided in some embodiments of the present application.

[0107] Figure numerals: 1000, display device; 10, display panel; 100, substrate; 200, isolation structure; 210, isolation part; 220, blocking part; 221, first blocking part; 222, second blocking part; L1, first outer contour edge; L2, second outer contour edge; L0, sub-contour edge; 223, third blocking part; S, target plane; 2100, first isolation material layer; 2200, second isolation material layer; K1, isolation opening; 300, sub-pixel; 310, first electrode; 320, light-emitting part; 330, second electrode; 400, pixel definition layer; K2, pixel opening; 500, sacrificial layer; 610, first encapsulation layer; 611, encapsulation unit; 620, second encapsulation layer; 630, third encapsulation layer. DETAILED DESCRIPTION

[0108] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0109] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0110] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0111] In this application, unless otherwise clearly specified and limited, if the terms "installed", "connected", "connected", "fixed" and the like appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0112] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0113] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0114] The composition, preparation and other contents of the isolation structure mentioned below are further described in patents CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 100935, PCT / CN2024 / 102785, PCT / CN2024 / 099419, PCT / CN2024 / 099072, and CN116685174A for reference.

[0115] After research, it was found that in traditional display panels, there is a problem of poor overlap between sub-pixels and isolation structures, such as causing lateral leakage of the cathode of the sub-pixel, and causing poor packaging effect of the packaging material covering the sub-pixel, which in turn leads to poor display effect of traditional display panels.

[0116] Based on this, the present application designs a display panel, aiming to solve the problem of poor overlap between sub-pixels and isolation structures, thereby improving the display effect of the display panel.

[0117] Figure 1 FIG. 1 shows a cross-sectional schematic diagram of a display panel 10 in an embodiment of the present application. Figure 2 A partial top view of an isolation structure 200 in an embodiment of the present application is shown.

[0118] See also Figure 1 and Figure 2 According to the first aspect of the present application, an embodiment of the present application provides a display panel 10, which includes a substrate 100 and an isolation structure 200; the isolation structure 200 includes an isolation portion 210 and a blocking portion 220 stacked in a direction away from the substrate 100, and the orthographic projection of the isolation portion 210 on the substrate 100 is located within the orthographic projection of the blocking portion 220 on the substrate 100; the distance between the orthographic projection edge of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolation portion 210 on the substrate 100 in the first direction F1 is a first length D1; the distance between the orthographic projection edge of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolation portion 210 on the substrate 100 in the second direction F2 is a second length D2; the first direction F1 intersects with the second direction F2, and the first length D1 is not equal to the second length D2.

[0119] For example, the isolation structure 200 is disposed on the substrate 100, and multiple sub-pixels 300 are disposed on the substrate 100. The sub-pixels 300 are disposed corresponding to the pixel openings K2, wherein the isolation structure 200 encloses multiple isolation openings K1, and the multiple isolation openings K1 are disposed one-to-one correspondingly to the multiple sub-pixels 300.

[0120] For example, the sub-pixel 300 is arranged in the corresponding isolation opening K1. In this way, the isolation structure 200 can be used to separate at least part of the adjacent sub-pixels. In the process of forming multiple sub-pixels 300 by evaporation, the expensive fine metal mask plate (FMM) can be discarded, and the pixel material of the sub-pixel 300 (the pixel material at least includes the material of the light-emitting portion 320, which can be that the pixel material includes the material of the light-emitting portion 320 and the material of the second electrode 330; which can be that the pixel material includes the material of the light-emitting portion 320) is evaporated in the isolation opening K1, and then multiple sub-pixels 300 can be formed on one side of the substrate 100, and the structural design of the sub-pixel 300 is no longer limited by the fine metal mask plate (FMM). The isolation structure 200 and the sub-pixel 300 can be designed according to the demand for improving the aperture ratio of the display panel 10, which is beneficial to improving the aperture ratio of the display panel 10 while reducing the manufacturing cost of the display panel 10.

[0121] By way of example, the isolation structure 200 includes an isolation portion 210 and a blocking portion 220 which are stacked in a direction away from the substrate 100, the orthographic projection of the isolation portion 210 on the substrate 100 is located within the orthographic projection of the blocking portion 220 on the substrate 100, the blocking portion 220 includes a first blocking portion 221 and a second blocking portion 222, the first blocking portion 221 protrudes from a side of the isolation portion 210 close to the isolation opening K1 along the first direction F1, and the second blocking portion 222 protrudes from a side of the isolation portion 210 close to the isolation opening K1 along the second direction F2.

[0122] For example, the distance between the orthographic projection edge of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolating portion 210 on the substrate 100 in the first direction F1 is a first length D1, which can be understood as: along the first direction F1, the length of at least a portion of the first blocking portion 221 protruding from the isolating portion 210 is the first length D1. The distance between the orthographic projection edge of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolating portion 210 on the substrate 100 in the second direction F2 is a second length D2, which can be understood as: along the second direction F2, the length of at least a portion of the second blocking portion 222 protruding from the isolating portion 210 is the second length D2, and the first length D1 and the second length D2 are not equal.

[0123] For example, “along the first direction F1, the length of at least part of the first blocking portion 221 protruding from the isolation portion 210 is the first length D1” may mean that along the first direction F1, the length of the first blocking portion 221 protruding from the isolation portion 210 is the first length D1; or, along the first direction F1, the length of a part of the first blocking portion 221 protruding from the isolation portion 210 is the first length D1.

[0124] For example, “at least a portion of the second blocking portion 222 protrudes from the isolation portion 210 by the second length D2” may mean that the length of the second blocking portion 222 protruding from the isolation portion 210 is the second length D2; or that a portion of the second blocking portion 222 protrudes from the isolation portion 210 by the second length D2.

[0125] For example, Figure 1 As shown, along the first direction F1, the length of the first blocking portion 221 protruding from the isolation portion 210 is a first length D1, and the length of a portion of the second blocking portion 222 protruding from the isolation portion 210 is a second length D2. Figure 3 As shown, along the first direction F1 , the length of the first blocking portion 221 protruding from the isolation portion 210 is a first length D1 , and the length of the second blocking portion 222 protruding from the isolation portion 210 is a second length D2 .

[0126] Since the first length D1 is not equal to the second length D2, the direction corresponding to the smaller one of the first length D1 and the second length D2 is defined as the first target direction. Therefore, in the subsequent process of forming the sub-pixel 300 on the substrate 100, the climbing effect of the side wall of the sub-pixel 300 along the first target direction can be improved, which is beneficial to reduce the poor overlap between the sub-pixel 300 and the isolation structure 200, and is beneficial to improve the display effect of the display panel 10.

[0127] In some embodiments, the display panel 10 also includes a plurality of pixel openings K2, and the pixel openings K2 and the isolation structure 200 are arranged on the same side of the substrate 100. In a direction parallel to the plane where the substrate 100 is located, the isolation structure 200 is arranged on the outer side of the corresponding pixel opening K2, and the first electrode 310, the light-emitting portion 320 and the second electrode 330 are stacked in sequence in the pixel opening K2 along a direction away from the substrate 100.

[0128] By way of example, the sub-pixel 300 includes a first electrode 310 , a light emitting portion 320 , and a second electrode 330 which are sequentially stacked in a direction away from the substrate 100 .

[0129] Optionally, the second electrode 330 is electrically connected to the isolation structure 200 .

[0130] In this way, it is convenient to provide corresponding low-level voltage signals to the second electrodes 330 of the plurality of sub-pixels 300 through the isolation structure 200, thereby facilitating the layout of cathode wiring.

[0131] Optionally, the isolation structure 200 is mesh-shaped. While providing corresponding low-level voltage signals to multiple sub-pixels 300 through the mesh-shaped isolation structure 200, the voltage drop difference at different positions can be improved, thereby improving the display uniformity of the display panel 10.

[0132] In some embodiments, the first length D1 is greater than the second length D2 , and the first direction F1 is configured as an evaporation scanning direction of the second electrode 330 .

[0133] Considering that the evaporation angle in the target direction perpendicular to the evaporation scanning direction is smaller than the evaporation angle in the evaporation scanning direction, the first direction F1 is configured as the evaporation scanning direction of the second electrode 330, that is, the evaporation angle corresponding to the side wall of the second electrode 330 along the second direction F2 is smaller than the evaporation angle corresponding to the side wall of the second electrode 330 along the first direction F1. Combined with D1>D2, this is beneficial to improving the climbing effect of the side wall of the second electrode 330 along the second direction F2, so that the climbing height of the side wall of the second electrode 330 along the second direction F2 tends to be equal to the climbing height of the side wall of the second electrode 330 along the first direction F1, which is beneficial to improving the uniformity of the second electrode 330 overlapping the isolation structure 200 in various directions, and further helps to improve the overlapping effectiveness of the second electrode 330, and further helps to better improve the display effect of the display panel 10.

[0134] Specific to Figure 4 In the illustrated embodiment, the evaporation angle corresponding to the side wall of the second electrode 330 along the first direction F1 is ɑ, and the evaporation angle corresponding to the side wall of the second electrode 330 along the second direction F2 is β, ɑ>β, and when D1>D2, the climbing height of the side wall of the sub-pixel 300 along the first direction F1 and the climbing height of the side wall of the sub-pixel 300 along the second direction F2 are both equal to H.

[0135] In this embodiment, the first direction F1 is configured as the evaporation scanning direction of the second electrode 330, which can make the climbing height of the side wall of the second electrode 330 along the second direction F2 tend to be equal to the climbing height of the side wall of the second electrode 330 along the first direction F1, which is beneficial to improve the uniformity of the second electrode 330 overlapping the isolation structure 200 in various directions, and can greatly reduce the probability of lateral leakage problems in the sub-pixel 300, which is beneficial to better improve the display effect of the display panel 10.

[0136] In some other embodiments, the second length D2 is greater than the first length D1 , and the second direction F2 is configured as the evaporation scanning direction of the second electrode 330 .

[0137] Similarly, the evaporation angle corresponding to the side wall of the second electrode 330 along the first direction F1 is smaller than the evaporation angle corresponding to the side wall of the second electrode 330 along the second direction F2. Combined with D2>D1, this is beneficial to improving the climbing effect of the side wall of the second electrode 330 along the first direction F1, so that the climbing height of the side wall of the second electrode 330 along the first direction F1 tends to be equal to the climbing height of the side wall of the second electrode 330 along the second direction F2, which is beneficial to improving the uniformity of the overlap of the second electrode 330 on the isolation structure 200 in various directions, and further helps to improve the overlap effectiveness of the second electrode 330, and further helps to better improve the display effect of the display panel 10.

[0138] In this embodiment, the second direction F2 is configured as the evaporation scanning direction of the second electrode 330, which can make the climbing height of the side wall of the second electrode 330 along the first direction F1 tend to be equal to the climbing height of the side wall of the second electrode 330 along the second direction F2, which is beneficial to improve the uniformity of the second electrode 330 overlapping the isolation structure 200 in various directions, and can greatly reduce the probability of lateral leakage problems in the sub-pixel 300, which is beneficial to better improve the display effect of the display panel 10.

[0139] In some embodiments, the display panel 10 also includes a plurality of pixel openings K2, the pixel openings K2 and the isolation structure 200 are arranged on the same side of the substrate 100, and the isolation structure 200 is arranged on the outer side of the corresponding pixel opening K2 in a direction parallel to the plane where the substrate 100 is located; the isolation structure 200 encloses a plurality of isolation openings K1, and the plurality of isolation openings K1 are arranged one-to-one correspondingly to the plurality of pixel openings K1.

[0140] Optionally, the orthographic projection of the pixel opening K2 on the substrate 100 is located within the orthographic projection range of the corresponding isolation opening K1 on the substrate 100, so that the isolation opening K1 is connected to the corresponding pixel opening K2, and the isolation opening K1 exposes the corresponding pixel opening K2.

[0141] For example, the orthographic projection of the pixel opening K2 region on the substrate 100 is located within the orthographic projection range of the corresponding isolation opening K1 region on the substrate 100 , so that the isolation structure 200 is disposed outside the corresponding pixel opening K2 .

[0142] Optionally, both the first direction F1 and the second direction F2 are perpendicular to the thickness direction of the substrate 100 , and the first direction F1 is perpendicular to the second direction F2 .

[0143] For example, since the first length D1 and the second length D2 are not equal, the direction corresponding to the smaller one of the first length D1 and the second length D2 is defined as the first target direction. Then, in the subsequent process of forming the sub-pixel 300 on the substrate 100, the climbing effect of the side wall of the sub-pixel 300 (second electrode 330) along the first target direction can be improved, which is beneficial to reduce the poor overlap between the sub-pixel 300 (second electrode 330) and the isolation structure 200, which is beneficial to improve the display effect of the display panel 10.

[0144] Optionally, the dimension of the isolating portion 210 away from the substrate 100 is smaller than the dimension of the end close to the substrate 100. For example, the cross section of the isolating portion 210 is trapezoidal, so that the first blocking portion 221 is more likely to protrude from the isolating portion 210, and the second blocking portion 222 is more likely to protrude from the isolating portion 210.

[0145] In some embodiments, the blocking portion 220 includes a first blocking portion 221 and a second blocking portion 222 , and the blocking portion 220 includes two first blocking portions 221 disposed opposite to each other along the first direction F1 , and two second blocking portions 222 disposed opposite to each other along the second direction F2 .

[0146] In this way, within the isolation opening K1, the climbing effect of the side wall of the sub-pixel 300 (second electrode 330) close to the first blocking portion 221 can be improved, or the climbing effect of the side wall of the sub-pixel 300 (second electrode 330) close to the second blocking portion 222 can be improved, which is beneficial to reduce the occurrence of poor overlap between the sub-pixel 300 (second electrode 330) and the isolation structure 200, and is beneficial to improve the display effect of the display panel 10.

[0147] Optionally, in some embodiments, the first blocking portion 221 has a first outer contour edge L1, and along the first outer contour edge L1, the distance between the orthographic projection of the first outer contour edge L1 on the substrate 100 and the orthographic projection of the closest isolation portion 210 on the substrate 100 is a first length D1.

[0148] For example, in some embodiments, along the first outer contour side L1 from one end to the other end, the spacing between the orthographic projection of the first outer contour side L1 on the substrate 100 and the orthographic projection of the closest isolation portion 210 on the substrate 100 remains the same, and both are the first length D1.

[0149] In this way, the climbing effect of the sub-pixel 300 at the side wall close to the first blocking portion 221 can be made consistent, thereby improving the uniformity of the second electrode 330 overlapping the isolation structure 200, which is beneficial to improving the overlapping effectiveness of the second electrode 330, and can also greatly reduce the probability of lateral leakage problems in the second electrode 330, which is beneficial to better improve the display effect of the display panel 10.

[0150] Optionally, the second blocking portion 222 has a second outer contour edge L2, and along the second outer contour edge L2, the distance between the orthographic projection of the second outer contour edge L2 on the substrate 100 and the orthographic projection of the closest isolation portion 210 on the substrate 100 is a second length D2.

[0151] In some embodiments, the second blocking portion 222 has a second outer contour edge L2, and the second outer contour edge L2 includes two sub-contour edges L0 connected at one end, and the two sub-contour edges L0 are separated on opposite sides of a target plane S, wherein the target plane S is a plane perpendicular to the first direction F1; the distance between the orthographic projection of the sub-contour edge L0 on the substrate 100 and the orthographic projection of the closest isolation portion 210 on the substrate 100 is a second length D2, and the second length D2 gradually increases from one end of the sub-contour edge L0 close to another sub-contour edge L0 to the other end.

[0152] Optionally, the first length D1 is greater than a maximum value of the second length D2.

[0153] It can be understood that the spacing between the orthographic projections of the first blocking portion 221 and the isolating portion 210 on the substrate 100 is greater than the spacing between the orthographic projections of the second blocking portion 222 and the isolating portion 210 on the substrate 100. If the first direction F1 is set as the evaporation scanning direction of the second electrode 330, on the one hand, the evaporation angle corresponding to the side wall of the second electrode 330 along the first direction F1 is larger, and the climbing effect of the side wall of the second electrode 330 along the first direction F1 is better. On the other hand, the evaporation angle corresponding to the side wall of the second electrode 330 along the second direction F2 is smaller, but it can be used. The smaller D2 improves the climbing effect of the side wall of the second electrode 330 in the second direction F2. Combined with the gradually increasing distance between the sub-contour edge L0 and the positive projection of the isolation portion 210 on the substrate 100, the climbing effect of the sub-pixel 300 along the circumference of the isolation opening K1 can be made consistent, thereby improving the uniformity of the overlap of the sub-pixel 300 on the isolation structure 200, which is beneficial to improving the overlap effectiveness of the second electrode 330, and can also greatly reduce the probability of lateral leakage problems in the second electrode 330, which is beneficial to better improve the display effect of the display panel 10.

[0154] Optionally, the two sub-contour edges L0 are arranged symmetrically with the target plane S as a reference object.

[0155] In this way, the climbing effect of the second electrode 330 along the circumference of the isolation opening K1 can be better made consistent, thereby improving the uniformity of the overlap of the second electrode 330 on the isolation structure 200, which is beneficial to improving the overlap effectiveness of the second electrode 330, and can also greatly reduce the probability of lateral leakage problems in the sub-pixel 300, which is beneficial to better improve the display effect of the display panel 10.

[0156] Optionally, the second outer contour edge L2 is arc-shaped, so that the toughness and strength of the second blocking portion 222 can be improved, thereby improving the toughness and strength of the isolation structure 200.

[0157] In other embodiments, Figure 3 As shown, the blocking portion 220 further includes a third blocking portion 223 , which is connected between the first blocking portion 221 and the adjacent second blocking portion 222 , and the orthographic projection of the third blocking portion 223 on the substrate 100 is arc-shaped.

[0158] That is to say, there is an arc-shaped transition between the first blocking portion 221 and the adjacent second blocking portion 222 , which is beneficial to improving the toughness and strength of the isolation structure 200 .

[0159] Optionally, the orthographic projection of the second blocking portion 222 on the substrate 100 is in a straight line shape, so that the climbing height of the side wall (the side wall of the second blocking portion 222 ) of the sub-pixel 300 (the second electrode 330 ) along the second direction F2 is uniform.

[0160] Optionally, in some embodiments, Figure 3 As shown, along the first direction F1 , the length of the first blocking portion 221 protruding from the isolation portion 210 is a first length D1 , and along the second direction F2 , the length of the second blocking portion 222 protruding from the isolation portion 210 is a second length D2 .

[0161] Optionally, the first length D1 is greater than the second length D2.

[0162] In this way, a smaller D2 can be used to improve the climbing effect of the side walls of the light-emitting portion 320 and the second electrode 330 in the second direction F2, thereby making the climbing effect of the side walls of the second electrode 330 in the second direction F2 consistent with the climbing effect of the side walls of the second electrode 330 in the first direction F1, thereby improving the uniformity of the overlap of the second electrode 330 on the isolation structure 200, which is beneficial to improving the overlap effectiveness of the second electrode 330, and can also greatly reduce the probability of lateral leakage problems in the sub-pixel 300, which is beneficial to better improve the display effect of the display panel 10.

[0163] In some embodiments, the material of the isolation portion 210 includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum.

[0164] The isolation portion 210 uses a conductive material with stronger oxidation resistance than aluminum, which is beneficial to reducing the etching amount of the isolation portion 210 in the etching process, thereby improving the overlapping effect between the isolation portion 210 and the second electrode 330 of the sub-pixel 300, improving the dark spots or increased display power consumption caused by poor overlapping, and improving the display effect of the display panel 10.

[0165] By way of example, the material of the isolation portion 210 includes molybdenum or titanium.

[0166] In this way, the oxidation resistance of the isolation part 210 can be improved, and the etching amount of the isolation part 210 in the etching process can be greatly reduced, thereby improving the overlapping effect between the isolation part 210 and the second electrode 330 of the sub-pixel 300, improving the dark spots or increased display power consumption caused by poor overlapping, and improving the display effect of the display panel 10.

[0167] In some embodiments, the material of the barrier portion 220 includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum.

[0168] The barrier 220 is made of a conductive material with stronger oxidation resistance than aluminum, which is beneficial to reducing the etching amount of the barrier 220 in the etching process, improving problems such as dark spots caused by etching, and improving the display effect of the display panel 10.

[0169] Illustratively, the material of the blocking portion 220 includes molybdenum or titanium.

[0170] In this way, the oxidation resistance of the barrier 220 can be improved, thereby reducing the etching amount of the barrier 220 in the etching process, thereby improving the dark spots and other problems caused by etching, and improving the display effect of the display panel 10.

[0171] In some embodiments, the material of the barrier 220 includes multiple stacked inorganic film layers; in any two adjacent inorganic film layers, the oxygen content of the inorganic film layer away from the substrate 100 is greater than the oxygen content of the inorganic film layer close to the substrate 100.

[0172] Specifically, the multilayer inorganic film layer includes a first inorganic film layer and a second inorganic film layer sequentially arranged in a direction away from the substrate 100 , the material of the first inorganic film layer includes silicon oxynitride, and the material of the second inorganic film layer includes silicon oxide.

[0173] Since the oxygen content of the inorganic film layer close to the substrate 100 is lower than that of the inorganic film layer far from the substrate 100, the oxygen content of the inorganic film layer close to the substrate 100 is lower, and the oxygen content of the inorganic film layer far from the substrate 100 is higher, in the process of etching to form the blocking portion 220, the bottom may be etched faster than the top, and the blocking portion 220 may be adjusted to an inverted T-shaped top structure. On the one hand, the climbing height of the evaporated sub-pixel 300 may be increased, and on the other hand, the leveling ability of the subsequently formed organic encapsulation layer (i.e., the second encapsulation layer 620 described below) may be improved, thereby reducing the film thickness of the organic encapsulation layer.

[0174] Optionally, the first inorganic film layer includes a first sub-film layer and a second sub-film layer sequentially arranged in a direction away from the substrate 100 , and the oxygen content of the second sub-film layer is higher than that of the first sub-film layer.

[0175] In this way, on the one hand, the climbing height of the evaporated sub-pixel 300 can be better improved, and on the other hand, the leveling ability of the subsequently formed organic encapsulation layer (ie, the second encapsulation layer 620 described below) can be better improved, and the film thickness of the organic encapsulation layer can be reduced.

[0176] In some embodiments, the display panel 10 also includes a pixel definition layer 400, a pixel opening K2 connected to the isolation opening K1 is provided on the pixel definition layer 400, and the sub-pixel 300 includes a first electrode 310, a light-emitting portion 320 and a second electrode 330 stacked in a direction away from the substrate 100, and the pixel opening K2 is used to at least partially expose the first electrode 310, a portion of the light-emitting portion 320 and a portion of the second electrode 330 are located in the pixel opening K2, and another portion of the light-emitting portion 320 and another portion of the second electrode 330 are located in the isolation opening K1.

[0177] Optionally, the pixel openings K2 correspond to the isolation openings K1 one by one.

[0178] It is convenient to form a corresponding sub-pixel 300 in the pixel opening K2 and the corresponding isolation opening K1, so that the structural design of the sub-pixel 300 is no longer limited by the fine metal mask (FMM), and the isolation structure 200 and the sub-pixel 300 can be designed according to the demand for improving the aperture ratio of the display panel 10, which is beneficial to improving the aperture ratio of the display panel 10 while reducing the production cost of the display panel 10.

[0179] According to the second aspect of the present application, an embodiment of the present application provides a display panel 10, the display panel 10 includes a substrate 100, an isolation structure 200 and a plurality of pixel openings K2; the pixel openings K2 and the isolation structure 200 are arranged on the same side of the substrate 100, and in a direction parallel to the plane where the substrate 100 is located, the isolation structure 200 is arranged on the outer side of the corresponding pixel opening K2; the isolation structure 200 encloses a plurality of isolation openings K1, and the plurality of isolation openings K1 are arranged one by one corresponding to the plurality of pixel openings K1; the isolation structure 200 includes an isolation portion 210 stacked and arranged in a direction away from the substrate 100 and the blocking portion 220, the orthographic projection of the isolation portion 210 on the substrate 100 is located within the orthographic projection of the blocking portion 220 on the substrate 100; the distance between the edge of the orthographic projection of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolation portion 210 on the substrate 100 in the first direction F1 is a first length D1; the distance between the edge of the orthographic projection of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolation portion 210 on the substrate 100 in the second direction F2 is a second length D2; the first direction F1 intersects with the second direction F2, and the first length D1 is not equal to the second length D2.

[0180] For example, the isolation structure 200 is disposed on the substrate 100, and multiple sub-pixels 300 are disposed on the substrate 100, wherein the isolation structure 200 encloses multiple isolation openings K1, and the multiple isolation openings K1 are arranged corresponding to the multiple sub-pixels 300, that is, the isolation structure 200 is used to separate at least some adjacent sub-pixels 300.

[0181] For example, since the first length D1 is not equal to the second length D2, in the subsequent process of forming the sub-pixel 300 on the substrate 100, under the same evaporation angle, the climbing effect of the second electrode 330 at the smaller protruding length of the first blocking portion 221 and the second blocking portion 222 is better than the climbing effect of the second electrode 330 at the larger protruding length of the first blocking portion 221 and the second blocking portion 222. Therefore, the smaller one of D1 and D2 can be used to improve the climbing effect of the second electrode 330 at the smaller protruding length of the first blocking portion 221 and the second blocking portion 222, which is beneficial to reduce the occurrence of poor overlap between the sub-pixel 300 and the isolation structure 200, and is beneficial to improve the display effect of the display panel 10.

[0182] In some embodiments, the blocking portion 220 includes a first blocking portion 221 and a second blocking portion 222 arranged in an annular manner around the pixel opening K2 , and both the first blocking portion 221 and the second blocking portion 222 protrude from a side of the isolation portion 210 close to the isolation opening K1 .

[0183] For example, the first blocking portion 221 protrudes from a side wall of the isolation portion 210 close to the isolation opening K1 along the first direction F1 , and the second blocking portion 222 protrudes from a side wall of the isolation portion 210 close to the isolation opening K1 along the second direction F2 .

[0184] For example, in some embodiments, Figure 1 and Figure 2 As shown, the two opposite sides of the isolation portion 210 are respectively close to different isolation openings K1 or pixel openings K2, and the first blocking portion 221 and the second blocking portion 222 can both protrude from the side of the isolation portion 210 close to one isolation opening K1. At the same time, the first blocking portion 221 and the second blocking portion 222 can both protrude from the side of the isolation portion 210 close to the other isolation opening K1, that is, in the direction of the isolation portion 210 toward the pixel opening K2, the first blocking portion 221 and the second blocking portion 222 can both protrude toward different two pixel openings K2 or isolation openings K1 on both sides.

[0185] Optionally, both the first direction F1 and the second direction F2 are perpendicular to the thickness direction of the substrate 100 , and the first direction F1 is perpendicular to the second direction F2 .

[0186] Optionally, in the first direction F1 or the second direction F2, and in the extending direction perpendicular to the isolating portion 210, the dimension of the isolating portion 210 at the end away from the substrate 100 is smaller than the dimension of the end close to the substrate 100. For example, the cross section of the isolating portion 210 is in a trapezoidal shape, so that the first blocking portion 221 is more likely to protrude from the isolating portion 210, and the second blocking portion 222 is more likely to protrude from the isolating portion 210.

[0187] Optionally, the blocking portion 220 includes a first blocking portion 221 and a second blocking portion 222 , and the blocking portion 220 includes two first blocking portions 221 disposed opposite to each other along the first direction F1 , and two second blocking portions 222 disposed opposite to each other along the second direction F2 .

[0188] In some embodiments, the first blocking portion 221 has a first outer contour edge L1, and along the first outer contour edge L1, the distance between the orthographic projection of the first outer contour edge L1 on the substrate 100 and the orthographic projection of the closest isolation portion 210 on the substrate 100 is a first length D1.

[0189] Optionally, the second blocking portion 222 has a second outer contour edge L2, and along the second outer contour edge L2, the distance between the orthographic projection of the second outer contour edge L2 on the substrate 100 and the orthographic projection of the closest isolation portion 210 on the substrate 100 is a second length D2.

[0190] In some embodiments, the material of the isolation portion 210 includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum.

[0191] Optionally, the material of the isolation portion 210 includes molybdenum or titanium.

[0192] Optionally, the material of the barrier 220 includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum.

[0193] Optionally, the material of the blocking portion 220 includes molybdenum or titanium.

[0194] In some embodiments, the material of the barrier 220 includes multiple stacked inorganic film layers; in any two adjacent inorganic film layers, the oxygen content of the inorganic film layer away from the substrate 100 is greater than the oxygen content of the inorganic film layer close to the substrate 100.

[0195] Optionally, the multilayer inorganic film layer includes a first inorganic film layer and a second inorganic film layer sequentially arranged in a direction away from the substrate 100 , the material of the first inorganic film layer includes silicon oxynitride, and the material of the second inorganic film layer includes silicon oxide.

[0196] Optionally, the first inorganic film layer includes a first sub-film layer and a second sub-film layer sequentially arranged in a direction away from the substrate 100 , and the oxygen content of the second sub-film layer is higher than that of the first sub-film layer.

[0197] According to the third aspect of the present application, some embodiments of the present application provide a method for manufacturing a display panel. Any of the above-mentioned display panels 10 can be manufactured using the method for manufacturing a display panel of the embodiment of the present application. The method for manufacturing a display panel includes the following steps S10 to S30.

[0198] S10 , providing a substrate 100 .

[0199] S20 , forming an isolation portion 210 on one side of the substrate 100 .

[0200] S30, forming a blocking portion 220 on a side of the isolation portion 210 away from the substrate 100; wherein, the distance between the orthographic edge of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolation portion 210 on the substrate 100 in the first direction F1 is a first length D1; the distance between the orthographic edge of the blocking portion 220 on the substrate 100 and the closest edge of the orthographic projection of the isolation portion 210 on the substrate 100 in the second direction F2 is a second length D2; the first direction F1 intersects with the second direction F2, and the first length D1 is not equal to the second length D2.

[0201] For example, in combination with the introduction in the display panel 10, the isolation structure 200 is provided with a plurality of isolation openings K1, and includes an isolation portion 210 and a blocking portion 220 stacked in a direction away from the substrate 100, and the orthographic projection of the isolation portion 210 on the substrate 100 is located within the orthographic projection of the blocking portion 220 on the substrate 100. The isolation opening K1 passes through the isolation portion 210 and the blocking portion 220, and the blocking portion 220 includes a first blocking portion 221 and a second blocking portion 222, the first blocking portion 221 protrudes from a side of the isolation portion 210 close to the isolation opening K1 along the first direction F1, and the second blocking portion 222 protrudes from a side of the isolation portion 210 close to the isolation opening K1 along the second direction F2. Along the first direction F1, at least a portion of the first blocking portion 221 protrudes from the isolation portion 210 by a first length D1, and along the second direction F2, at least a portion of the second blocking portion 222 protrudes from the isolation portion 210 by a second length D2, and D1 and D2 are not equal. The first direction F1 and the second direction F2 intersect each other, and are both perpendicular to the thickness direction of the substrate 100. Optionally, the first direction F1 and the second direction F2 are perpendicular to each other.

[0202] Since the first length D1 is not equal to the second length D2, the direction corresponding to the smaller one of the first length D1 and the second length D2 is defined as the first target direction, and the direction corresponding to the larger one of the first length D1 and the second length D2 is defined as the second target direction. Then, in the subsequent process of forming the sub-pixel 300 on the substrate 100, the climbing effect of the side wall of the second electrode 330 along the first target direction can be improved, which is beneficial to reduce the poor overlap between the second electrode 330 and the isolation structure 200, and is beneficial to improve the display effect of the display panel 10.

[0203] In some embodiments, the first length D1>the second length D2. The method for manufacturing the display panel 10 further includes: S41, forming a second electrode 330 by evaporation along the first direction F1.

[0204] By way of example, the second electrodes 330 of the plurality of sub-pixels 300 corresponding to the plurality of isolation openings K1 are formed on the substrate 100 by means of the first evaporation source moving along the first direction F1 .

[0205] Specifically, the sub-pixel 300 is disposed in the corresponding isolation opening K1 .

[0206] Optionally, the first evaporation source has a plurality of evaporation outlets arranged at intervals along the second direction F2.

[0207] When the evaporation angle of the first evaporation source in the first direction F1 (at this time, the first direction F1 is the evaporation scanning direction, i.e., the scan direction) is greater than the evaporation angle of the first evaporation source in the second direction F2 (at this time, the second direction F2 is the arrangement direction of the evaporation outlets, i.e., the nozzle direction), since the first length D1>the second length D2, the climbing effect of the side wall of the second electrode 330 along the second direction F2 can be made to be equivalent to the climbing effect of the side wall of the second electrode 330 along the first direction F1, which is beneficial to improving the uniformity of the second electrode 330 overlapping the isolation structure 200 in various directions, thereby helping to improve the overlapping effectiveness of the second electrode 330, and can also greatly reduce the probability of lateral leakage problems occurring in the sub-pixel 300, thereby helping to better improve the display effect of the display panel 10.

[0208] In some other embodiments, the second length D2 is greater than the first length D1. The method for manufacturing the display panel 10 further includes: S42, forming a second electrode 330 by evaporation along the second direction F2.

[0209] By way of example, a second evaporation source moving along the second direction F2 is used to form a plurality of sub-pixels 300 corresponding to the plurality of isolation openings K1 on the substrate 100 .

[0210] Specifically, the sub-pixel 300 is disposed in the corresponding isolation opening K1 .

[0211] Optionally, the second evaporation source has a plurality of evaporation outlets arranged at intervals along the first direction F1.

[0212] Similarly, the climbing effect of the side wall of the second electrode 330 along the first direction F1 can be made equivalent to the climbing effect of the side wall of the second electrode 330 along the second direction F2, which is beneficial to improving the uniformity of the second electrode 330 overlapping the isolation structure 200 in various directions, thereby helping to improve the overlapping effectiveness of the second electrode 330, and can also greatly reduce the probability of lateral leakage problems in the second electrode 330, thereby helping to better improve the display effect of the display panel 10.

[0213] In some embodiments, forming an isolation portion 210 on one side of the substrate 100 (step S20 ) specifically includes: step S211 and step S212 .

[0214] S211, forming a first isolation material layer 2100 (such as Figure 5 as shown).

[0215] S212, etching the first isolation material layer 2100 to obtain the isolation portion 210 (eg Figure 6 as shown).

[0216] The first isolation material layer 2100 can be etched by dry etching or wet etching to obtain the isolation portion 210. The isolation portion 210 and the blocking portion 220 are etched separately. The isolation portion 210 can be made of suitable materials (such as conductive materials with oxidation resistance greater than that of aluminum) according to process requirements. In order to obtain the isolation structure 200 of the present application, the side etching amount of the isolation portion 210 and the blocking portion 220 can be reduced, thereby improving the overlap effectiveness of the isolation structure 200 and the second electrode 330, and thereby improving the display effect of the display panel 10.

[0217] Optionally, the first isolation material layer 2100 is etched to obtain the isolation portion 210 (step S212 ), which specifically includes: S2121 , dry-etching the first isolation material layer 2100 to obtain the isolation portion 210 .

[0218] Specifically, the first etching gas may be used to perform dry etching on the first isolation material layer 2100 to obtain the isolation portion 210 .

[0219] For example, the material of the isolation portion 210 includes titanium, and the first etching gas may be boron trichloride. Compared with the wet etching process, the dry etching process has better process controllability, which is beneficial to improve the accuracy of D1 and D2. In this way, it is beneficial to improve the uniformity of the light-emitting portion 320 and the second electrode 330 overlapping the isolation structure 200 in all directions, which is beneficial to improve the overlapping effectiveness of the sub-pixel 300, and can also greatly reduce the probability of lateral leakage problems in the sub-pixel 300, which is beneficial to better improve the display effect of the display panel 10.

[0220] In some embodiments, forming the blocking portion 220 on a side of the isolation portion 210 away from the substrate 100 (step S30 ) specifically includes: step S311 , step S312 , step S133 , and step S314 .

[0221] S311 , forming a sacrificial layer 500 on a side of the isolation portion 210 away from the substrate 100 .

[0222] S312, etching the sacrificial layer 500 to expose the isolation portion 210;

[0223] For example, a sacrificial layer 500 (eg, Figure 8 as shown).

[0224] S313 , forming a second isolation material layer 2200 on a side of the sacrificial layer 500 away from the substrate 100 , wherein the second isolation material layer 2200 covers the isolation portion 210 .

[0225] S314 , etching the second isolation material layer 2200 to obtain the blocking portion 220 .

[0226] For example, the blocking portion 220 covers the exposed isolation portion 210 (which may be combined with Fig. 9 and Fig.10 to understand).

[0227] For example, in the process of forming the blocking portion 220, the sacrificial layer 500 can be used to protect the side wall of the isolation portion 210, and can also protect the material between the isolation portion 210 and the substrate 100, such as the first electrode 310 of the sub-pixel 300, and the pixel definition layer 400. This is beneficial to reduce the etching of the side wall of the isolation portion 210 by the etching solution corresponding to the blocking portion 220, and is also beneficial to reduce the etching of the side wall of the first electrode 310 and the pixel opening K2 by the etching solution corresponding to the blocking portion 220, thereby reducing the packaging failure caused by the etching of the pixel definition layer 400, and thus helping to improve the display effect of the display panel 10.

[0228] In some embodiments, after etching the second isolation material layer 2200 to obtain the blocking portion 220 (step 314 ), the method further includes: step S315 .

[0229] Step S315: removing the sacrificial layer 500 (such as Fig.10 as shown).

[0230] Optionally, the material of the sacrificial layer 500 includes an organic material;

[0231] Optionally, etching the second isolation material layer 2200 to obtain the blocking portion 220 specifically includes: dry etching the second isolation material layer 2200 to obtain the blocking portion 220 .

[0232] In this way, an isolation portion 210 and a blocking portion 220 can be formed respectively. The isolation portion 210 can be made of a suitable material (such as a conductive material with greater oxidation resistance than aluminum) according to process requirements, and the blocking portion 220 can also be made of a suitable material (such as a conductive material with greater oxidation resistance than aluminum) according to process requirements.

[0233] Specifically, the second etching gas may be used to perform dry etching on the second isolation material layer 2200 to obtain the blocking portion 220 .

[0234] It may be that the blocking portion 220 includes stacked silicon oxynitride, silicon oxide with a lower oxygen content (such as silicon monoxide) and silicon oxide with a higher oxygen content (such as silicon dioxide), and the second etching gas may include a reaction gas and an auxiliary gas; it may also be that the material of the blocking portion 220 includes titanium, and the second etching gas may be boron trichloride.

[0235] The auxiliary gas refers to a gas that does not participate in the reaction in the second etching gas.

[0236] Optionally, the reaction gas includes fluorine gas, and the auxiliary gas includes oxygen and / or an inert gas.

[0237] Compared with the wet etching process, the dry etching process has better process controllability, which is beneficial to improve the accuracy of D1 and D2. This is beneficial to improve the uniformity of the overlap of the light-emitting portion 320 and the second electrode 330 on the isolation structure 200 in all directions, which is beneficial to improve the overlap effectiveness of the sub-pixel 300. It can also greatly reduce the probability of lateral leakage problems in the sub-pixel 300, which is beneficial to better improve the display effect of the display panel 10.

[0238] In some embodiments, forming the isolation part 210 on one side of the substrate 100 (step S20) specifically includes: step S221 and step S222. Forming the blocking part 220 on the side of the isolation part 210 away from the substrate 100 (step S30) specifically includes: step S321 and step S322.

[0239] S221 , forming a first isolation material layer 2100 on the substrate 100 .

[0240] S222 , etching the first isolation material layer 2100 to obtain the isolation portion 210 .

[0241] For example, the first isolation material layer 2100 is etched with the help of a first mask to obtain the isolation portion 210 .

[0242] S223, forming a second isolation material layer 2200 on a side of the sacrificial layer 500 away from the substrate 100;

[0243] S224 , etching the second isolation material layer 2200 to obtain the blocking portion 220 .

[0244] For example, the second isolation material layer 2200 is etched with the aid of a second mask to obtain the blocking portion 220 .

[0245] In this way, different masks may be used to form the isolation portion 210 and the blocking portion 220 respectively, so as to facilitate differentiation of the first length D1 and the second length D2.

[0246] In some embodiments, before forming the isolation portion 210 on one side of the substrate 100 (before step S20 ), the process further includes: step S20 a .

[0247] In step S20 a , a plurality of first electrodes 310 arranged at intervals and a pixel definition layer 400 covering the plurality of first electrodes 310 are formed on one side of the substrate 100 .

[0248] After the isolation portion 210 is formed on one side of the substrate 100 (after step S20 ), the method further includes: step S20 b .

[0249] Step S20 b , forming a plurality of pixel openings K2 on the pixel definition layer 400 , wherein the pixel openings K2 at least partially expose the first electrode 310 .

[0250] For example, a plurality of first electrodes 310 are arranged on the substrate 100 at intervals, a pixel definition layer 400 covers the plurality of first electrodes 310, and a plurality of pixel openings K2 (eg, Figure 7 As shown in FIG. 4 ), the pixel opening K2 is used to at least partially expose the first electrode 310, and the sacrificial layer 500 is used to cover the pixel definition layer 400. In this way, the pixel opening K2 is formed after the isolation portion 210, which can reduce the influence of the etching solution corresponding to the isolation portion 210 on the side wall of the pixel opening K2, thereby reducing the situation of packaging failure caused by etching of the pixel definition layer 400.

[0251] In some embodiments, after forming the blocking portion 220 on the side of the isolation portion 210 away from the substrate 100 (after step S30), the method further includes: forming a light emitting portion 320 on the side of the first electrode 310 away from the substrate 100 (such as Fig.11 ); a second electrode 330 is formed on a side of the light emitting portion 320 away from the substrate 100 (as shown); Fig.12 as shown).

[0252] For example, in some embodiments, after removing the sacrificial layer 500 (after step S315), a light emitting portion 320 (eg, Fig.11 as shown).

[0253] Optionally, the isolation portion 210 and the blocking portion 220 constitute the isolation structure 200 , and the orthographic projection of the isolation portion 210 on the substrate 100 is located within the orthographic projection of the blocking portion 220 on the substrate 100 .

[0254] Optionally, the isolation structure 200 encloses a plurality of isolation openings K1 , and the plurality of isolation openings K1 are arranged in one-to-one correspondence with the plurality of pixel openings K2 .

[0255] Optionally, the orthographic projection of the pixel opening K2 on the substrate 100 is located within the orthographic projection range of the corresponding isolation opening K1 on the substrate 100 .

[0256] In some embodiments, the step S315 of removing the sacrificial layer 500 specifically includes: treating the sacrificial layer 500 with an oxygen-containing gas to remove the sacrificial layer 500 .

[0257] For example, the oxygen-containing gas is oxygen; and for another example, the oxygen-containing gas is oxygen and argon.

[0258] Compared with stripping the sacrificial layer 500 with a stripping solution, dry etching the sacrificial layer 500 with an oxygen-containing gas can more thoroughly remove the sacrificial layer 500 .

[0259] The manufacturing method of the display panel 10 may further include: forming a first encapsulation layer 610 on the isolation structure 200, the first encapsulation layer 610 includes a plurality of encapsulation units 611 corresponding to the plurality of sub-pixels 300, the encapsulation units 611 cover the corresponding sub-pixels 300 and are located in the corresponding isolation openings K1.

[0260] Optionally, the material of the first encapsulation layer 610 includes inorganic material.

[0261] In this way, the packaging unit 611 can be used to form an independent package for the sub-pixel 300 , thereby improving the display effect of the display panel 10 .

[0262] The method for manufacturing the display panel 10 may further include: sequentially forming a second encapsulation layer 620 and a third encapsulation layer 630 on a side of the first encapsulation layer 610 away from the substrate 100 .

[0263] Optionally, the second encapsulation layer 620 is an organic encapsulation layer, and the third encapsulation layer 630 is an inorganic encapsulation layer.

[0264] In this way, multiple packaging can be formed for the sub-pixels 300 , thereby improving the display effect of the display panel 10 .

[0265] See also Fig.13 , Fig.13 A schematic diagram of a display device 1000 provided in some embodiments of the present application.

[0266] Fourth, please refer to Fig.13 The present application provides a display device 1000, which includes a display panel 10 of any one of the above features, or a display panel 10 having any combination of the above features.

[0267] For example, the display device 1000 may be a mobile phone, a notebook computer, a television, etc., but is not limited thereto.

[0268] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0269] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A display panel, characterized in that: include: substrate; and An isolation structure, disposed on one side of the substrate; The isolation structure comprises an isolation portion and a blocking portion stacked in a direction away from the substrate, wherein the orthographic projection of the isolation portion on the substrate is located within the orthographic projection of the blocking portion on the substrate; The distance between the edge of the orthographic projection of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate in the first direction is a first length; The distance in the second direction between the orthographic projection edge of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate is a second length; The first direction intersects with the second direction, and the first length is not equal to the second length.

2. The display panel according to claim 1, characterized in that: The display panel further comprises a plurality of pixel openings arranged on the same side of the substrate as the isolation structure, the isolation structure being arranged outside the corresponding pixel openings in a direction parallel to the plane where the substrate is located, and the first electrode, the light emitting portion and the second electrode being sequentially stacked in the pixel openings in a direction away from the substrate; Optionally, the second electrode is electrically connected to the isolation portion; Optionally, the first length>the second length, and the first direction is configured as a vapor deposition scanning direction of the second electrode; Optionally, the second length is greater than the first length, and the second direction is configured as an evaporation scanning direction of the second electrode.

3. The display panel according to claim 1, characterized in that: The display panel further comprises a plurality of pixel openings disposed on the same side of the substrate as the isolation structure, and the isolation structure is disposed outside the corresponding pixel openings in a direction parallel to the plane where the substrate is located; The isolation structure encloses a plurality of isolation openings, and the plurality of isolation openings are arranged in one-to-one correspondence with the plurality of pixel openings; Optionally, the orthographic projection of the pixel opening on the substrate is located within the orthographic projection range of the corresponding isolation opening on the substrate; Optionally, the first direction and the second direction are both perpendicular to the thickness direction of the substrate, and the first direction is perpendicular to the second direction; Optionally, a dimension of the isolation portion at an end away from the substrate is smaller than a dimension of the end close to the substrate.

4. The display panel according to claim 1, characterized in that: The blocking portion includes a first blocking portion and a second blocking portion; The blocking portion includes two first blocking portions arranged opposite to each other along the first direction, and two second blocking portions arranged opposite to each other along the second direction; Optionally, the first blocking portion has a first outer contour edge, and along the first outer contour edge from one end to the other end, the distance between the orthographic projection of the first outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a first length; Optionally, the second blocking portion has a second outer contour edge, and along the second outer contour edge from one end to the other end, the distance between the orthographic projection of the second outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a second length.

5. The display panel according to claim 4, characterized in that: The second outer contour edge includes two sub-contour edges connected at one end, and the two sub-contour edges are located on opposite sides of a target plane, wherein the target plane is a plane perpendicular to the first direction; the distance between the orthographic projection of the sub-contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is the second length, and the second length gradually increases from one end of the sub-contour edge close to another sub-contour edge to the other end; Optionally, the two sub-contour edges are arranged symmetrically with the target plane as a reference object; Optionally, the second outer contour edge is arc-shaped; Optionally, the first length is greater than a maximum value of the second length.

6. The display panel according to claim 4, characterized in that: The blocking portion further includes a third blocking portion, and the third blocking portion is connected between the first blocking portion and the adjacent second blocking portion; The orthographic projection of the third blocking portion on the substrate is an arc; Optionally, the orthographic projection of the second blocking portion on the substrate is in the shape of a straight line; Optionally, along the first direction, a length by which the first blocking portion protrudes from the isolation portion is a first length; Along the second direction, the length of the second blocking portion protruding from the isolation portion is a second length; Optionally, the first length is greater than the second length.

7. The display panel according to claim 1, characterized in that: The material of the isolation portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum; Optionally, the material of the isolation portion includes molybdenum or titanium; Optionally, the material of the blocking portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum; Optionally, the material of the blocking portion includes molybdenum or titanium.

8. The display panel according to claim 1, characterized in that: The material of the barrier portion includes multiple inorganic film layers stacked in layers; in any two adjacent inorganic film layers, the oxygen content of the inorganic film layer away from the substrate is greater than the oxygen content of the inorganic film layer close to the substrate; Optionally, the multilayer inorganic film layer comprises a first inorganic film layer and a second inorganic film layer sequentially arranged in a direction away from the substrate, the material of the first inorganic film layer comprises silicon oxynitride, and the material of the second inorganic film layer comprises silicon oxide; Optionally, the first inorganic film layer includes a first sub-film layer and a second sub-film layer sequentially arranged in a direction away from the substrate, and the oxygen content of the second sub-film layer is higher than that of the first sub-film layer.

9. A display panel, characterized in that: include: substrate; and An isolation structure, disposed on the substrate; A plurality of pixel openings are arranged on the same side of the substrate as the isolation structure, and the isolation structure is arranged outside the corresponding pixel openings in a direction parallel to the plane where the substrate is located; The isolation structure encloses a plurality of isolation openings, and the plurality of isolation openings are arranged in one-to-one correspondence with the plurality of pixel openings; The isolation structure comprises an isolation portion and a blocking portion stacked in a direction away from the substrate, wherein the orthographic projection of the isolation portion on the substrate is located within the orthographic projection of the blocking portion on the substrate; The distance between the edge of the orthographic projection of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate in the first direction is a first length; The distance in the second direction between the orthographic projection edge of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate is a second length; The first direction intersects with the second direction, and the first length is not equal to the second length.

10. The display panel according to claim 9, characterized in that: The blocking portion comprises a first blocking portion and a second blocking portion which are arranged in an annular direction around the pixel opening, wherein the first blocking portion and the second blocking portion both protrude from a side of the isolation portion close to the isolation opening; Optionally, the first direction and the second direction are both perpendicular to the thickness direction of the substrate, and the first direction is perpendicular to the second direction; Optionally, a dimension of the isolation portion away from an end of the substrate is smaller than a dimension of an end of the isolation portion close to the substrate; Optionally, the blocking portion includes two first blocking portions arranged opposite to each other along the first direction, and two second blocking portions arranged opposite to each other along the second direction; Optionally, the first blocking portion has a first outer contour edge, and along the first outer contour edge from one end to the other end, the distance between the orthographic projection of the first outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a first length; Optionally, the second blocking portion has a second outer contour edge, and along the second outer contour edge from one end to the other end, the distance between the orthographic projection of the second outer contour edge on the substrate and the orthographic projection of the closest isolation portion on the substrate is a second length.

11. The display panel according to claim 10, characterized in that: The material of the isolation portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum; Optionally, the material of the isolation portion includes molybdenum or titanium; Optionally, the material of the blocking portion includes a conductive material, and the oxidation resistance of the conductive material is greater than that of aluminum; Optionally, the material of the blocking portion includes molybdenum or titanium.

12. The display panel according to claim 10, characterized in that: The material of the barrier portion includes multiple inorganic film layers stacked in layers; in any two adjacent inorganic film layers, the oxygen content of the inorganic film layer away from the substrate is greater than the oxygen content of the inorganic film layer close to the substrate; Optionally, the multilayer inorganic film layer comprises a first inorganic film layer and a second inorganic film layer sequentially arranged in a direction away from the substrate, the material of the first inorganic film layer comprises silicon oxynitride, and the material of the second inorganic film layer comprises silicon oxide; Optionally, the first inorganic film layer includes a first sub-film layer and a second sub-film layer sequentially arranged in a direction away from the substrate, and the oxygen content of the second sub-film layer is higher than that of the first sub-film layer.

13. A method for manufacturing a display panel, characterized in that: include: providing a substrate; forming an isolation portion on one side of the substrate; forming a blocking portion on a side of the isolation portion away from the substrate; The distance between the edge of the orthographic projection of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate in the first direction is a first length; The distance in the second direction between the orthographic projection edge of the blocking portion on the substrate and the closest edge of the orthographic projection of the isolation portion on the substrate is a second length; The first direction intersects with the second direction, and the first length is not equal to the second length.

14. The method for manufacturing a display panel according to claim 13, characterized in that: The first length is greater than the second length; the method for manufacturing the display panel further comprises: forming a second electrode by evaporation along the first direction; or The second length is greater than the first length; the method for manufacturing the display panel further includes: forming a second electrode by evaporation along the second direction.

15. The method for manufacturing a display panel according to claim 13, characterized in that: The step of forming an isolation portion on one side of the substrate specifically includes: forming a first isolation material layer on the substrate; Etching the first isolation material layer to obtain the isolation portion; Optionally, etching the first isolation material layer to obtain the isolation portion specifically includes: The first isolation material layer is dry-etched to obtain the isolation portion.

16. The method for manufacturing a display panel according to claim 13, characterized in that: The forming of a blocking portion on a side of the isolation portion away from the substrate specifically includes: forming a sacrificial layer on a side of the isolation portion away from the substrate; Etching the sacrificial layer to expose the isolation portion; forming a second isolation material layer on a side of the sacrificial layer away from the substrate, wherein the second isolation material layer covers the isolation portion; The second isolation material layer is etched to obtain the blocking portion.

17. The method for manufacturing a display panel according to claim 16, characterized in that: After etching the second isolation material layer to obtain the blocking portion, the method further includes: removing the sacrificial layer; Optionally, the material of the sacrificial layer includes an organic material; Optionally, the removing the sacrificial layer specifically includes: treating the sacrificial layer with an oxygen-containing gas to remove the sacrificial layer; Optionally, etching the second isolation material layer to obtain the blocking portion specifically includes: performing dry etching on the second isolation material layer to obtain the blocking portion.

18. The method for manufacturing a display panel according to claim 16, wherein: The step of forming the isolation portion on one side of the substrate specifically includes: forming a first isolation material layer on the substrate; Etching the first isolation material layer to obtain the isolation portion; The forming of the blocking portion on a side of the sacrificial layer away from the substrate specifically includes: forming a second isolation material layer on a side of the sacrificial layer away from the substrate; The second isolation material layer is etched to obtain the blocking portion.

19. The method for manufacturing a display panel according to claim 13, characterized in that Before forming the isolation portion on one side of the substrate, the method further includes: forming a plurality of first electrodes arranged at intervals on one side of the substrate and a pixel definition layer covering the plurality of first electrodes; After forming the isolation portion on one side of the substrate, the method further includes: forming a plurality of pixel openings on the pixel definition layer, wherein the pixel openings at least partially expose the first electrode; After forming the blocking portion on the side of the isolation portion away from the substrate, the method further includes: forming a light-emitting portion on the side of the first electrode away from the substrate; and forming a second electrode on the side of the light-emitting portion away from the substrate. Optionally, the isolation portion and the blocking portion constitute an isolation structure, and an orthographic projection of the isolation portion on the substrate is located within an orthographic projection of the blocking portion on the substrate; Optionally, the isolation structure encloses a plurality of isolation openings, and the plurality of isolation openings are arranged in one-to-one correspondence with the plurality of pixel openings; Optionally, an orthographic projection of the pixel opening on the substrate is located within a range of an orthographic projection of the corresponding isolation opening on the substrate.

20. A display device, characterized in that: The invention comprises the display panel as claimed in any one of claims 1 to 12.

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