Display panel, preparation method thereof and display device

Abstract

The invention provides a display panel, a preparation method thereof and a display device. The problem that in the prior art, the yield of display products is low is solved. The preparation method comprises the following steps: preparing the first electrode on the substrate; preparing a middle protection layer on one side, deviating from the substrate, of the first electrode, wherein the orthographic projection of the middle protection layer on the substrate is overlapped with the orthographic projection of the first electrode on the substrate; preparing an insulating layer on one side, deviating from the first electrode, of the middle protection layer, wherein the insulating layer is provided with a first opening; and removing the middle protection layer in the first opening, so that at least part of the first electrode is exposed to the first opening.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a method for preparing the same, and a display device. Background Art

[0002] With the advancement of terminal display technology such as mobile phones, organic light-emitting diode (AMOLED) display has gradually become mainstream.

[0003] However, the yield of current display products still needs to be improved. Summary of the invention

[0004] In view of this, the embodiments of the present application provide a display panel and a method for manufacturing the same, and a display device, which solve the problem of low yield of display products in the prior art.

[0005] In a first aspect, the present application provides a display panel, comprising a substrate, a first electrode, a protective layer and an insulating layer, wherein the first electrode is located on the substrate; at least part of the protective layer is located on the side of the first electrode away from the substrate; the insulating layer is provided with a first opening, and at least part of the first electrode is exposed to the first opening.

[0006] In combination with the first aspect, in some possible implementations, at least part of the insulating layer is located on the side of the protective layer and the first electrode facing away from the substrate, the orthographic projection of the insulating layer on the substrate covers at least part of the orthographic projection of the protective layer on the substrate, the orthographic projection of the protective layer on the substrate partially overlaps with the orthographic projection of the first opening on the substrate, or the side wall of the protective layer close to the first opening is flush with the side wall of the insulating layer close to the first opening, or the orthographic projection of the side wall of the protective layer close to the first opening on the substrate is located on the side of the orthographic projection of the side wall of the insulating layer close to the first opening on the substrate away from the orthographic projection of the first opening on the substrate.

[0007] In combination with the first aspect, in some possible implementations, the orthographic projection of the protective layer on the substrate is located within the range of the orthographic projection of the first electrode on the substrate; preferably, the outer contour line of the orthographic projection of the protective layer on the substrate coincides with or is spaced apart from the outer contour line of the orthographic projection of the first electrode on the substrate.

[0008] In combination with the first aspect, in some possible implementations, the protective layer is provided with a second opening, and the second opening is connected to the first opening; at least part of the first electrode is exposed to the second opening; preferably, the orthographic projection of the first opening on the substrate coincides with the orthographic projection of the second opening on the substrate; or, the orthographic projection of the first opening on the substrate is located within the orthographic projection of the second opening on the substrate, and the orthographic projection area of ​​the first opening on the substrate is smaller than the orthographic projection area of ​​the second opening on the substrate; or, the orthographic projection of the second opening on the substrate is located within the orthographic projection of the first opening on the substrate, and the orthographic projection area of ​​the second opening on the substrate is smaller than the orthographic projection area of ​​the first opening on the substrate; preferably, the orthographic projection of the protective layer on the substrate is annular; preferably, the outer contour line of the orthographic projection of the protective layer on the substrate is the same as the shape of the outer contour line of the orthographic projection of the first electrode on the substrate; preferably, the inner contour line and the outer contour line of the orthographic projection of the protective layer on the substrate are the same in shape.

[0009] In combination with the first aspect, in some possible implementations, the thickness of the protective layer on a side close to the first opening is greater than the thickness of the protective layer on a side away from the first opening; preferably, the thickness of the protective layer gradually decreases in the direction from the first opening to the insulating layer; preferably, the protective layer includes a first surface close to the substrate, and the first surface is parallel to the substrate; preferably, the protective layer includes a second surface facing away from the substrate, and the second surface is a curved surface or an arc surface or a plane, and the second surface is inclined relative to the substrate; preferably, the angle between at least a part of the second surface and the substrate is greater than 0° and less than or equal to 20°, or the angle between the tangent plane of the second surface and the substrate is greater than 0° and less than or equal to 20°; preferably, the cross-sectional shape of the protective layer includes a triangle, and the cross-section of the protective layer is perpendicular to the substrate and parallel to the direction from the first opening to the insulating layer.

[0010] In combination with the first aspect, in some possible implementations, in the direction from the first opening to the insulating layer, the width of the protective layer is greater than 0 microns and less than or equal to 2 microns; and / or at least a portion of the insulating layer is located in the first gap between the multiple first electrodes.

[0011] In combination with the first aspect, in some possible implementations, the material of the protective layer includes organic glue, or metal; preferably, the material of the protective layer includes polyimide, or molybdenum, or aluminum.

[0012] In combination with the first aspect, in some possible implementations, the insulating layer includes a pixel definition layer; preferably, the material of the insulating layer includes an inorganic material, or the material of the pixel definition layer is an inorganic material.

[0013] In combination with the first aspect, in some possible implementations, the display panel further includes a partition structure layer, the partition structure layer encloses an isolation opening, and the orthographic projection of the isolation opening on the substrate covers the orthographic projection of the first opening on the substrate; preferably, the orthographic projection of the protective layer on the substrate is located outside the orthographic projection of the partition structure layer on the substrate; the orthographic projection of the protective layer on the substrate is located within the orthographic projection of the isolation opening on the substrate; preferably, the partition structure layer is located on the side of the insulating layer away from the substrate; or, the insulating layer is provided with a clearance opening, and the partition structure layer is located at the clearance opening; preferably, the partition structure layer includes a first and a second overlapping part, the first part is located on the side of the second part close to the substrate, and the orthographic projection of the side of the first part away from the substrate on the substrate is located within the orthographic projection area of ​​the second part on the substrate; preferably, the orthographic projection area of ​​the side of the first part away from the substrate on the substrate is smaller than the orthographic projection area of ​​the second part on the substrate; preferably, the first part includes a conductive part; preferably, the partition structure layer further includes a third part, located on the side of the first part close to the substrate, and the orthographic projection of the first part on the substrate is located within the orthographic projection area of ​​the third part on the substrate; preferably, the orthographic projection area of ​​the first part on the substrate is smaller than the orthographic projection area of ​​the third part on the substrate.

[0014] In combination with the first aspect, in some possible implementations, it also includes a light-emitting unit, the light-emitting unit includes a first electrode, a light-emitting functional layer and a second electrode, the light-emitting functional layer and the second electrode are sequentially stacked on the side of the first electrode facing away from the substrate, at least a portion of the second electrode is located in the isolation opening and overlaps with the first portion; preferably, the display panel also includes a packaging portion, located on the side of the second electrode facing away from the substrate, and the orthographic projection of the packaging portion on the substrate covers the orthographic projection of the second electrode on the substrate; preferably, adjacent packaging portions are disconnected at the side of the partition structure layer facing away from the substrate; preferably, the display panel also includes an organic packaging layer, located on the side of the packaging portion facing away from the substrate, and the orthographic projection of the organic packaging layer on the substrate covers the orthographic projection of the packaging portion on the substrate; preferably, the display panel also includes an inorganic packaging layer, located on the side of the organic packaging layer facing away from the substrate, and the orthographic projection of the inorganic packaging layer on the substrate covers the orthographic projection of the organic packaging layer on the substrate.

[0015] According to a second aspect of the present application, a display panel is provided, comprising a substrate, a first electrode and an insulating layer, wherein the first electrode is located on the substrate; at least a portion of the insulating layer is located on a side of the first electrode facing away from the substrate; the insulating layer is provided with a first opening, and at least a portion of the first electrode is exposed to the first opening; and a second gap is provided between a side wall of the insulating layer close to the first opening and a side of the first electrode facing away from the substrate.

[0016] In combination with the second aspect, in some possible implementations, the orthographic projection of the second gap on the substrate is located within the orthographic projection of the first electrode on the substrate; and / or, along the thickness direction of the substrate, the depth of the second gap on the side close to the first opening is greater than the depth of the second gap on the side away from the first opening; and / or, in a direction parallel to the substrate, the width of the second gap is greater than 0 microns and less than or equal to 2 microns; and / or, the display panel also includes a partition structure layer, the partition structure layer encloses an isolation opening, and the orthographic projection of the isolation opening on the substrate covers the orthographic projection of the first opening on the substrate; the orthographic projection of the second gap on the substrate is located within the orthographic projection of the isolation opening on the substrate, and the orthographic projection of the second gap on the substrate is located outside the orthographic projection of the partition structure layer on the substrate; and / or, the display panel also includes a light-emitting unit, the light-emitting unit includes a first electrode, a light-emitting functional layer and a second electrode, the light-emitting functional layer and the second electrode are sequentially stacked on the side of the first electrode facing away from the substrate, and at least a portion of the second electrode is located in the isolation opening.

[0017] According to a second aspect of the present application, there is provided a display panel, comprising a substrate, a first electrode, a protective layer and an insulating layer, wherein the first electrode is located on the substrate, and the first electrode comprises a first sub-portion and a second sub-portion; the insulating layer is provided with a first opening, the first sub-portion and the second sub-portion are exposed to the first opening, the second sub-portion is located between the first sub-portion and the side wall of the insulating layer close to the first opening, the roughness of the surface of the second sub-portion away from the substrate is greater than the roughness of the surface of the first sub-portion away from the substrate; and / or, the surface of the second sub-portion away from the substrate is rough, and the surface of the first sub-portion away from the substrate is smooth; and / or, the thickness of the second sub-portion is less than the thickness of the first sub-portion.

[0018] In combination with the third aspect, in some possible implementations, at least part of the insulating layer is located on the side of the first electrode facing away from the substrate; and / or, the spacing between the outer contour line of the orthographic projection of the first opening on the substrate and the outer contour line of the orthographic projection of the first sub-section on the substrate is greater than 0 microns and less than or equal to 2 microns; and / or, the width of the orthographic projection of the second sub-section on the substrate is greater than 0 microns and less than or equal to 2 microns; and / or, the second sub-section surrounds the first sub-section; and / or, the second sub-section is annular; preferably, the display panel also includes a partition structure layer, the partition structure layer encloses the isolation opening, and the orthographic projection of the isolation opening on the substrate covers the orthographic projection of the first opening on the substrate; the orthographic projection of the second sub-section on the substrate is located within the orthographic projection of the isolation opening on the substrate, and the orthographic projection of the second sub-section on the substrate is located outside the orthographic projection of the partition structure layer on the substrate; and / or, the display panel also includes a light-emitting unit, the light-emitting unit includes a first electrode, a light-emitting functional layer and a second electrode, the light-emitting functional layer and the second electrode are sequentially stacked on the side of the first electrode facing away from the substrate, and at least part of the second electrode is located in the isolation opening.

[0019] The fourth aspect of the present application provides a method for preparing a display panel, including preparing a first electrode on a substrate; preparing an intermediate protective layer on a side of the first electrode facing away from the substrate, wherein the orthographic projection of the intermediate protective layer on the substrate overlaps with the orthographic projection of the first electrode on the substrate; preparing an insulating layer on a side of the intermediate protective layer facing away from the first electrode, wherein the insulating layer is provided with a first opening; and removing the intermediate protective layer in the first opening to expose at least a portion of the first electrode to the first opening.

[0020] In combination with the fourth aspect, in some possible implementations, preparing an intermediate protective layer on the side of the first electrode facing away from the substrate includes: preparing a protective material layer on the side of the first electrode facing away from the substrate; patterning the protective material layer to obtain an intermediate protective layer; preferably, the orthographic projection of the intermediate protective layer on the substrate is located within the orthographic projection range of the first electrode on the substrate; the orthographic projection area of ​​the intermediate protective layer on the substrate is less than or equal to or greater than the orthographic projection area of ​​the first electrode on the substrate; preferably, the material of the protective material layer includes photoresist or metal; patterning the protective material layer to obtain the intermediate protective layer includes: exposing and developing the protective material layer to obtain the intermediate protective layer; wherein the protective material layer includes a central area and an edge area surrounding the central area, and during the exposure process, the central area corresponds to a preset exposure amount; when the photoresist is a positive photoresist, in the direction from the central area to the edge area, the exposure amount corresponding to the protective material layer in the edge area gradually increases from the preset exposure amount; when the photoresist is a negative photoresist, in the direction from the central area to the edge area, the exposure amount corresponding to the protective material layer in the edge area gradually decreases from the preset exposure amount.

[0021] In combination with the fourth aspect, in some possible implementations, preparing an insulating layer on the side of the intermediate protective layer facing away from the first electrode includes: preparing an insulating material layer on the side of the intermediate protective layer facing away from the first electrode; patterning the insulating material layer to obtain an insulating layer provided with a first opening; wherein the orthographic projection of the intermediate protective layer on the substrate is located within the orthographic projection range of the first opening on the substrate, or the orthographic projection of the first opening on the substrate is located within the orthographic projection range of the intermediate protective layer on the substrate; preferably, the orthographic projection area of ​​the intermediate protective layer on the substrate is less than or equal to or greater than the orthographic projection area of ​​the first opening on the substrate.

[0022] In combination with the fourth aspect, in some possible implementations, before patterning the insulating material layer, the preparation method also includes: preparing a photoresist pattern on the side of the insulating material layer facing away from the substrate; patterning the insulating material layer includes: patterning the insulating material layer based on the photoresist pattern; preferably, the preparation method also includes: removing the photoresist pattern when removing the intermediate protective layer in the first opening.

[0023] In combination with the fourth aspect, in some possible implementations, after removing the intermediate protective layer in the first opening, the preparation method further includes: preparing a light-emitting functional layer and a second electrode on a side of the first electrode exposed to the first opening away from the substrate; after preparing an insulating material layer on a side of the intermediate protective layer away from the first electrode, before patterning the insulating layer to form the first opening, the method further includes: preparing a partition structure layer on a side of the insulating material layer away from the substrate, the partition structure layer being provided with an isolation opening, wherein the orthographic projection of the first opening on the substrate is located within the orthographic projection of the isolation opening on the substrate; the orthographic projection of the intermediate protective layer on the substrate is located outside the orthographic projection of the partition structure layer on the substrate.

[0024] A fifth aspect of the present application provides a display device, comprising the above-mentioned display panel, or a display panel obtained according to the above-mentioned preparation method.

[0025] According to the display panel, preparation method thereof and display device provided by the embodiments of the present application, an intermediate protective layer is prepared on the side of the first electrode facing away from the substrate, the orthographic projection of the intermediate protective layer on the substrate overlaps with the orthographic projection of the first electrode on the substrate, an insulating layer is prepared on the side of the intermediate protective layer facing away from the first electrode, the insulating layer is provided with a first opening, and the intermediate protective layer in the first opening is removed to expose at least part of the first electrode to the first opening. Before the above preparation method etches the insulating material layer to prepare the insulating layer provided with the first opening, the first electrode is protected by the intermediate protective layer to avoid damage to the first electrode of the display product during the etching of the insulating material layer, thereby avoiding a decrease in the hole injection performance of the OLED display panel and an increase in voltage, thereby improving the yield of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1a A schematic diagram of a partial cross-sectional structure of a display panel provided in the first embodiment of the present application.

[0027] Figure 1b A schematic diagram of a partial cross-sectional structure of a display panel provided in the second embodiment of the present application.

[0028] Figure 1c A schematic diagram of a partial cross-sectional structure of a display panel provided in the third embodiment of the present application.

[0029] Figure 2a for Figure 1a The diagram is a schematic diagram of a partially enlarged cross-sectional structure of region A of the display panel.

[0030] Figure 2b for Figure 1b The diagram is a schematic diagram of a partially enlarged cross-sectional structure of region B of the display panel shown.

[0031] Figure 2c for Figure 1cA partial enlarged cross-sectional structural diagram of the C region of the display panel shown in FIG.

[0032] Figure 3a FIG. 1 is a schematic diagram of the cross-sectional structure of the protective layer of the display panel shown in FIG. 1 .

[0033] Figure 3b A schematic diagram of the cross-sectional structure of a protective layer of a display panel provided in the fourth embodiment of the present application.

[0034] Figure 4 FIG. 1 is a partial top view of the display panel shown in FIG. 1 .

[0035] Figure 5 A schematic diagram of a partial cross-sectional structure of a display panel provided in the fifth embodiment of the present application.

[0036] Figure 6a It is a schematic diagram of a partial cross-sectional structure of a display panel provided in the sixth embodiment of the present application.

[0037] Figure 6b It is a schematic diagram of a partial cross-sectional structure of a display panel provided in the seventh embodiment of the present application.

[0038] Figure 6c It is a schematic diagram of a partial cross-sectional structure of a display panel provided in the eighth embodiment of the present application.

[0039] Figure 7a It is a schematic diagram of a partial cross-sectional structure of a display panel provided in the ninth embodiment of the present application.

[0040] Figure 7b It is a schematic diagram of a partial cross-sectional structure of a display panel provided in the tenth embodiment of the present application.

[0041] Figure 8a It is a schematic diagram of a partial cross-sectional structure of a display panel provided in the eleventh embodiment of the present application.

[0042] Figure 8b yes Figure 8a The schematic diagram of the cross-sectional structure of the layout of the first electrode of the display panel is shown.

[0043] Figure 8c It is a schematic diagram of the partial cross-sectional structure of the display panel provided in the twelfth embodiment of the present application.

[0044] Fig. 9 A flow chart of a method for preparing a display panel provided in one embodiment of the present application.

[0045] Fig.10 A schematic diagram of the structure of an intermediate product obtained during the execution of the preparation method provided in one embodiment of the present application.

[0046] Fig.11A schematic structural diagram of an intermediate product obtained during the execution of a preparation method provided in another embodiment of the present application.

[0047] Fig.12 A schematic diagram of the structure of a display device provided in one embodiment of the present application. DETAILED DESCRIPTION

[0048] As mentioned in the background technology, with the advancement of terminal display technology such as mobile phones, organic light-emitting diode (AMOLED) displays have gradually become mainstream. At present, the main methods for making OLED display panels are vacuum evaporation, inkjet printing, photolithography, etc. Vacuum evaporation is mainly used in the field of small and medium-sized display panels. Inkjet printing is still in the laboratory stage due to the limitations of materials and equipment. Therefore, photolithography of OLED display panels has received more and more attention. However, in the process of etching the pixel definition layer, it is easy to damage the anode of the display product, resulting in a decrease in the hole injection performance of the OLED display panel, an increase in voltage, and an impact on the product yield.

[0049] In view of this, the display panel, preparation method thereof and display device provided in the embodiments of the present application prepare an intermediate protective layer on the side of the first electrode facing away from the substrate, the orthographic projection of the intermediate protective layer on the substrate overlaps with the orthographic projection of the first electrode on the substrate, and an insulating layer is prepared on the side of the intermediate protective layer facing away from the first electrode, the insulating layer is provided with a first opening, and the intermediate protective layer in the first opening is removed to expose at least part of the first electrode to the first opening. The above preparation method protects the first electrode by the intermediate protective layer before etching the insulating material layer to prepare the insulating layer provided with the first opening, so as to avoid damage to the first electrode of the display product during the etching of the insulating material layer, avoid the decrease in hole injection performance and voltage increase of the OLED display panel, and improve the yield of the display panel.

[0050] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0051] In the accompanying drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. It is understood that when a structure is referred to as being "on or under" another structure, the structure may be directly on or under the other structure, or there may be intermediate structures. The same reference numerals always indicate the same structure. The structures mentioned herein include any of a film layer, an element, a device, a component, and an assembly.

[0052] When a structure is referred to as being “connected” to another structure, the structure may be directly connected to the other structure or indirectly connected to the other structure with one or more intermediate structures interposed therebetween.

[0053] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units that are clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0054] Figure 1a This is a schematic diagram of a partial cross-sectional structure of a display panel provided in the first embodiment of the present application. Figure 1b This is a schematic diagram of a partial cross-sectional structure of a display panel provided in the second embodiment of the present application. Figure 1c This is a schematic diagram of a partial cross-sectional structure of a display panel provided in the third embodiment of the present application. Figure 2a for Figure 1a The partially enlarged cross-sectional structure diagram of the A region of the display panel shown in FIG. Figure 2b for Figure 1b The partially enlarged cross-sectional structure diagram of the B area of ​​the display panel shown in FIG. Figure 2c for Figure 1c FIG. 1 is a schematic diagram of a partially enlarged cross-sectional structure of a C region of a display panel. Figure 1a-Figure 1c and Figure 2a-2c As shown, the display panel includes a substrate 11, a first electrode 121, a protective layer 13 and an insulating layer 14. The first electrode 121 is located on the substrate 11, at least a portion of the protective layer 13 is located on the side of the first electrode 121 away from the substrate 11, and the insulating layer 14 is provided with a first opening Q, and at least a portion of the first electrode 121 is exposed to the first opening Q.

[0055] In some embodiments, at least a portion of the insulating layer 14 is located on the side of the protective layer 13 and the first electrode 121 away from the substrate 11, for example, the orthographic projection of the insulating layer 14 on the substrate 11 covers at least a portion (partially or entirely) of the orthographic projection of the protective layer 13 on the substrate 11. For example, the orthographic projection of the protective layer 13 on the substrate 11 partially overlaps with the orthographic projection of the first opening Q on the substrate 11 (e.g., Figure 1a and Figure 2aAlternatively, the side wall 135 of the protection layer 13 close to the first opening Q is flush with the side wall 141 of the insulation layer 13 close to the first opening Q (as shown in FIG. Figure 1b and Figure 2b ), or the positive projection of the side wall 135 of the protective layer 13 close to the first opening Q on the substrate 11 is located on the side where the positive projection of the side wall 141 of the insulating layer 14 close to the first opening Q on the substrate 11 is away from the positive projection of the first opening Q on the substrate 11 (as shown in FIG. Figure 1c and Figure 2c shown).

[0056] Among them, the substrate 11 can be a substrate substrate. In some embodiments, the substrate substrate can be a glass-based substrate. In some embodiments, the substrate substrate can include an organic resin material such as epoxy resin, triazine, silicone resin or polyimide. For example, the substrate substrate can be an FR4 type printed circuit board (Printed circuit board, PCB), or it can be a flexible PCB that is easy to deform. In some embodiments, the substrate substrate can include a ceramic material such as silicon nitride, aluminum nitride or aluminum oxide, or include a metal or a metal compound. For example, the substrate substrate can be a metal core printed circuit board (Metal Core PCB, MCPCB) or a metal copper clad laminate (Metal Copper Clad Laminate, MCCL).

[0057] Furthermore, in some embodiments, the substrate 11 may have a driving circuit, which is used to drive multiple light-emitting devices to emit light of corresponding colors. For example, the substrate 11 may include a substrate layer, a barrier layer (Barrier), a buffer layer (Buffer), a gate insulating layer (Gate Insulator, GI), a capacitor insulating layer (Capacitance Insulator, CI), a gate, a source and drain, an interlayer dielectric layer (Interlayer Dielectric, ILD), a planarization layer (Planarization Layer, PLN), etc.

[0058] In some embodiments, the insulating layer 14 is a pixel definition layer, and the material of the insulating layer 14 includes an inorganic material or the material of the pixel definition layer is an inorganic material.

[0059] In some embodiments, the first electrode 121 may include a reflective metal layer and a light-transmitting conductive layer stacked along the substrate thickness direction Z. For example, the first electrode 121 may include a first light-transmitting conductive layer, a reflective metal layer, and a second light-transmitting conductive layer stacked along the substrate thickness direction Z. The reflective metal layer may include silver, etc. The light-transmitting conductive layer may include indium tin oxide, etc.

[0060] In some embodiments, at least a portion of the insulating layer 14 is located in the first gaps between the plurality of first electrodes 121 .

[0061] Optionally, in some embodiments, the pixel definition layer may be made of a light-transmitting material.

[0062] Optionally, in some embodiments, the pixel definition layer may be made of an opaque material, which can improve the light absorption of the pixel definition layer and reduce the reflectivity of the display panel.

[0063] In some embodiments, the material of the protective layer 13 includes organic glue. In subsequent processes, a solvent may be used to remove the protective layer 13 to avoid damage to the first electrode 121 during the removal of the protective layer 13. For example, the material of the protective layer 13 may be polyimide, such as photosensitive polyimide.

[0064] In some embodiments, the material of the protective layer 13 includes a metal material. In subsequent processes, a solvent may be used to remove the protective layer 13 to avoid damage to the first electrode 121 during the removal of the protective layer 13. For example, the material of the protective layer 13 may be molybdenum, aluminum, etc.

[0065] In some embodiments, the orthographic projection of the protection layer 13 on the substrate 11 is located within the orthographic projection range of the first electrode 121 on the substrate 11 .

[0066] In some embodiments, the protection layer 13 is provided with a second opening O, the second opening O is connected to the first opening Q, and at least a portion of the first electrode 121 is exposed to the second opening O.

[0067] In some embodiments, the orthographic projection of the first opening Q on the substrate 11 coincides with the orthographic projection of the second opening O on the substrate (eg, Figure 1b or, the orthographic projection of the first opening Q on the substrate 11 is located within the orthographic projection of the second opening O on the substrate, and the orthographic projection area of ​​the first opening Q on the substrate 11 is smaller than the orthographic projection area of ​​the second opening O on the substrate 11 (as shown in FIG. Figure 1c or, the orthographic projection of the second opening O on the substrate 11 is located within the orthographic projection of the first opening Q on the substrate 11, and the orthographic projection area of ​​the second opening O on the substrate 11 is smaller than the orthographic projection area of ​​the first opening P on the substrate 11 (as shown in FIG. Figure 1a shown).

[0068] Figure 3a is a schematic diagram of the cross-sectional structure of the protective layer of the display panel shown in FIG1 , Figure 3b This is a schematic diagram of the cross-sectional structure of the protective layer of the display panel provided in the fourth embodiment of the present application. Figure 3a and Figure 3bAs shown, the protective layer 13 includes a first surface 131 close to the substrate 11, and the first surface 131 is parallel to the substrate 11. The protective layer 13 includes a second surface 132 away from the substrate 11, and the second surface 132 is inclined relative to the substrate 11, that is, an inclined surface. Figure 3a Can Figure 2a , Figure 2b , Figure 2c A partial enlarged view of . Figure 3b Can Figure 2a , Figure 2b , Figure 2c A partial enlarged view of .

[0069] In some embodiments, the second surface 132 is a curved surface or an arc surface (eg Figure 3b as shown) or plane (as Figure 3a shown).

[0070] Furthermore, the angle a between at least a portion of the second surface 132 and the substrate 11 is greater than 0° and less than or equal to 20°, for example, the angle a between the second surface 132 and the substrate 11 can be 0.1°, 1°, 10°, 20°, etc., or, the angle b between the cut surface of the second surface 132 and the substrate 11 is greater than 0° and less than or equal to 20°, for example, the angle b between the cut surface of the second surface 132 and the substrate 11 can be 0.1°, 1°, 10°, 20°, etc.

[0071] In some embodiments, a thickness T1 of the protective layer 13 close to the first opening Q is greater than a thickness T2 of the protective layer 13 away from the first opening Q.

[0072] In some embodiments, the thickness of the protection layer 13 gradually decreases in a direction Y pointing from the first opening Q to the insulating layer 14 .

[0073] In some embodiments, the cross-sectional shape of the protection layer 13 includes a triangle, and the cross-sectional shape of the protection layer 13 is perpendicular to the substrate and parallel to the direction Y pointing from the first opening Q to the insulating layer 14 .

[0074] In some embodiments, in the direction Y from the first opening Q to the insulating layer 14 , the width W1 of the protective layer 13 is greater than 0 μm and less than or equal to 2 μm. For example, the width W1 of the protective layer 13 is 0.1 μm, 1 μm, 2 μm, etc.

[0075] Figure 4 FIG. 1 is a partial top view of the display panel shown in FIG. Figure 4 As shown, in some embodiments, the orthographic projection of the protection layer 13 on the substrate 11 is a ring.

[0076] Specifically, the outer contour line 133 of the orthographic projection of the protection layer 13 on the substrate 11 and the outer contour line 1213 of the orthographic projection of the first electrode 121 on the substrate 11 have the same shape.

[0077] In some embodiments, an inner contour line 134 of an orthographic projection of the protection layer 13 on the substrate 11 and an outer contour line 133 of an orthographic projection of the protection layer 13 on the substrate 11 have the same shape.

[0078] In some embodiments, an outer contour line 133 of an orthographic projection of the protection layer 13 on the substrate 11 coincides with or is spaced apart from an outer contour line 1213 of an orthographic projection of the first electrode on the substrate.

[0079] Optionally, the orthographic projection of the first electrode 121 on the substrate 11 is located within the orthographic projection of the protective layer 13 on the substrate 11. For example, an outer contour line 133 of the orthographic projection of the protective layer 13 on the substrate 11 is spaced from an outer contour line 1213 of the orthographic projection of the first electrode 121 on the substrate 11. The protective layer 13 may wrap the side wall of the first electrode 121.

[0080] Figure 5 FIG. 5 is a schematic diagram of a partial cross-sectional structure of a display panel provided in the fifth embodiment of the present application. Figure 5 As shown, in some embodiments, the display panel further includes a light emitting unit 12, which may be an organic light emitting diode (OLED), a micro light emitting diode (MicroLED), a quantum dot light emitting diode (QLED), etc. The light emitting unit 12 may be a light emitting unit of various colors, such as a red light emitting unit R, a green light emitting unit G, a blue light emitting unit B, etc.

[0081] The light-emitting unit 12 includes a first electrode 121, a light-emitting functional layer 122, and a second electrode 123, and the light-emitting functional layer 122 and the second electrode 123 are sequentially stacked on the side of the first electrode 121 away from the substrate 11. For example, the first electrode 121 may be an anode, and the second electrode 123 may be a cathode. The light-emitting functional layer 122 includes an emitting layer (Emitting Layer, EML), and may also include at least one of a hole injection layer (HIL), a hole transport layer (HTL), and an electron blocking layer (EBL) located between the anode and the light-emitting layer (EML), and at least one of an electron injection layer (EIL), an electron transport layer (ETL), and a hole blocking layer (HBL) located between the cathode and the light-emitting layer (EML).

[0082] In some embodiments, the display panel further includes an encapsulation portion 16, which is located on the side of the second electrode 123 away from the substrate 11, and the orthographic projection of the encapsulation portion 16 on the substrate 11 covers the orthographic projection of the second electrode 123 on the substrate 11. Exemplarily, the material of the encapsulation portion 16 is an inorganic material, such as silicon oxide, silicon oxynitride or silicon nitride, etc. The encapsulation portion 16 can be a single layer, a multi-layer, a composite layer, etc.

[0083] In some embodiments, adjacent packaging portions 16 are spaced apart from each other.

[0084] In some embodiments, there are multiple packaging parts 16 and multiple light-emitting units 12, and the multiple packaging parts 16 and the multiple light-emitting units 12 are arranged correspondingly.

[0085] In some embodiments, the display panel further includes an organic encapsulation layer 17, which is located on the side of the encapsulation portion 16 away from the substrate 11. The orthographic projection of the organic encapsulation layer 17 on the substrate 11 covers the orthographic projection of the encapsulation portion 16 on the substrate 11. Exemplarily, the material of the organic encapsulation layer 17 is a fiber material, a resin material, or a material for a laminated multilayer board, etc. The organic encapsulation layer 17 can be a single layer, a multilayer, a composite layer, etc.

[0086] In some embodiments, the display panel further includes an inorganic encapsulation layer 18, which is located on the side of the organic encapsulation layer 17 away from the substrate 11, and the orthographic projection of the inorganic encapsulation layer 18 on the substrate 11 covers the orthographic projection of the organic encapsulation layer 17 on the substrate. Exemplarily, the material of the inorganic encapsulation layer 18 is silicon oxide, silicon oxynitride or silicon nitride, etc. The inorganic encapsulation layer 18 can be a single layer, a multi-layer, a composite layer, etc.

[0087] According to the display panel provided in the embodiment of the present application, a protective layer is set between the insulating layer and the first electrode to avoid damage to the first electrode of the display product during the etching of the insulating layer, thereby avoiding the reduction of the hole injection performance and the increase of the voltage of the OLED display panel, and improving the yield of the display panel.

[0088] Figure 6a is a schematic diagram of a partial cross-sectional structure of a display panel provided in a sixth embodiment of the present application, Figure 6b FIG. 1 is a schematic diagram of a partial cross-sectional structure of a display panel provided in the seventh embodiment of the present application. Figure 6a and Figure 6b As shown, the display panel further includes a partition structure layer 15, which can partition at least part of the light-emitting functional layer 122 and the second electrode 123 of the adjacent light-emitting unit 12. The partition structure layer 15 encloses an isolation opening P, the orthographic projection of the isolation opening P on the substrate 11 covers the orthographic projection of the first opening Q on the substrate 11, and at least part of the second electrode 123 is located in the isolation opening P.

[0089] In some embodiments, the orthographic projection of the protective layer 13 on the substrate 11 is outside the orthographic projection of the partition structure layer 15 on the substrate 11, that is, the orthographic projections of the two do not overlap and are staggered. Optionally, the orthographic projection of the protective layer 13 on the substrate 11 is inside the orthographic projection of the isolation opening P on the substrate 11.

[0090] In some embodiments, the partition structure layer 15 is located on the side of the insulating layer 14 facing away from the substrate 11 (eg Figure 6a shown).

[0091] In some embodiments, the insulating layer 14 is provided with a clearance opening 142, for example, the clearance opening 142 is located between adjacent first openings Q, and the partition structure layer 15 is located in the clearance opening 142 (eg, Figure 6b shown).

[0092] In some embodiments, the partition structure layer 15 includes a first portion 151 and a second portion 152, the first portion 151 is located on a side of the second portion 152 close to the substrate 11, and the orthographic projection of the side of the first portion 151 away from the substrate 11 on the substrate 11 is located within the orthographic projection of the second portion 152 on the substrate 11. Further, the orthographic projection area of ​​the side of the first portion 151 away from the substrate 11 on the substrate 11 is smaller than the orthographic projection area of ​​the second portion 152 on the substrate 11.

[0093] Exemplarily, the first part 151 can be designed as an independent film layer, that is, there is no physical interface inside the first part 151, and each part is composed of the same material, for example, the material of the first part 151 is aluminum. Alternatively, the first part 151 can be designed to be composed of at least two film layers stacked. For example, the first part 151 is formed by stacking two conductive film layers. The materials of the two conductive film layers can be molybdenum and aluminum, respectively, and the conductive film layer composed of molybdenum is located between the substrate 11 and the conductive film layer composed of aluminum. Exemplarily, the first part 151 includes a conductive part, or the first part 151 itself is a conductive structure. The first part 151 and the second electrode 123 of the light-emitting unit 12 are overlapped so that the second electrodes 123 of adjacent light-emitting units 12 are electrically connected to each other, thereby realizing a full-surface cathode. The material of the second part 152 can be an organic material, an inorganic material, or a metal material. In the case where the second part 152 is a metal material, the material of the second part 152 can be titanium.

[0094] In some embodiments, the orthographic projection of the protective layer 13 on the substrate 11 is located outside the orthographic projection of the partition structure layer 15 on the substrate 11, and the orthographic projection of the protective layer 13 on the substrate 11 and the orthographic projection of the partition structure layer 15 on the substrate 11 do not overlap or are staggered, so as to avoid the protective layer 13 affecting the flatness of the partition structure layer 15, thereby affecting the overlapping effect of the second electrode 123 and the partition structure layer 15.

[0095] Figure 6c FIG. 8 is a schematic diagram of a partial cross-sectional structure of a display panel provided in the eighth embodiment of the present application. Figure 6c As shown, in some embodiments, the partition structure layer 15 further includes a third portion 153, which is located on the side of the first portion 151 close to the substrate 11, and the orthographic projection of the first portion 151 on the substrate 11 is located within the orthographic projection range of the third portion 153 on the substrate 11. Further, the orthographic projection area of ​​the first portion 151 on the substrate 11 is smaller than the orthographic projection area of ​​the third portion 153 on the substrate 11.

[0096] Exemplarily, the first part 151 is a conductive film layer including aluminum, and the third part 153 is a conductive film layer including molybdenum. In this case, the cross-section of the partition structure layer 15 is I-shaped. Patent applications CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 099419, and PCT / CN2024 / 099072 record relevant technical solutions of the partition structure layer (or isolation structure or isolation column), and their contents are incorporated into this application by reference for reference.

[0097] In some embodiments, adjacent encapsulation portions 16 are disconnected at a side of the partition structure layer facing away from the substrate.

[0098] In some embodiments, the packaging portion 16 has a recess 161 on a side away from the substrate 11 , and an orthographic projection of the recess 161 on the substrate 11 at least partially overlaps with an orthographic projection of the partition structure layer 15 on the substrate 11 .

[0099] In some embodiments, the organic encapsulation layer 17 fills the recess 161 , which improves the flatness of the film layer and can also improve the encapsulation effect of the display panel.

[0100] According to the display panel provided by the embodiment of the present application, a protective layer is provided between the insulating layer and the first electrode to avoid damage to the first electrode of the display product during etching of the insulating layer, thereby avoiding a decrease in hole injection performance and a rise in voltage of the OLED display panel, and improving the yield of the display panel. Furthermore, the light-emitting functional layer 122 and the second electrode 123 of the light-emitting unit are isolated by the isolation structure layer, so that the preparation process of the display panel does not need to use a fine metal mask plate, and the limitation of the fine metal mask plate on the panel size is removed.

[0101] The embodiment of the present application further provides a display panel, Figure 7a is a schematic diagram of a partial cross-sectional structure of a display panel provided in the ninth embodiment of the present application, Figure 7b FIG. 1 is a schematic diagram of a partial cross-sectional structure of a display panel provided in the tenth embodiment of the present application. Figure 7a and Figure 7b As shown, the display panel includes a substrate 11, a first electrode 121 and an insulating layer 14, the first electrode 121 is located on the substrate 11, at least part of the insulating layer 14 is located on the side of the first electrode 121 away from the substrate 11, the insulating layer 14 is provided with a first opening Q, at least part of the first electrode 121 is exposed to the first opening Q, and a second gap 143 is provided between the side wall of the insulating layer 14 close to the first opening Q and the side of the first electrode 121 away from the substrate 11.

[0102] By providing the protective layer 13 between the insulating layer 14 and the first electrode 121, damage to the first electrode 121 of the display product is avoided during the etching of the insulating layer 14, and the hole injection performance of the display panel is avoided to be reduced and the voltage is avoided to be increased, thereby improving the yield of the display panel. After the insulating layer 14 is etched to form the first opening Q, the protective layer 13 is completely removed during the removal process, and a second gap 143 is formed between the insulating layer 14 and the first electrode 121.

[0103] In some embodiments, an orthographic projection of the second gap 143 on the substrate 11 is located within an orthographic projection of the first electrode 121 on the substrate 11 .

[0104] In some embodiments, along the thickness direction Z of the substrate 11 , a depth of the second gap 143 close to the first opening Q is greater than a depth of the second gap 143 far from the first opening Q.

[0105] In some embodiments, in the direction X parallel to the substrate 11 , the width of the second gap 143 is greater than 0 micrometers and less than or equal to 2 micrometers. For example, the width of the second gap 143 is 0.1 micrometers, 1 micrometer, 2 micrometers, etc.

[0106] In some embodiments, the display panel further includes a partition structure layer 15 , the partition structure layer 15 encloses an isolation opening P, and the orthographic projection of the isolation opening P on the substrate 11 covers the orthographic projection of the first opening Q on the substrate 11 .

[0107] In some embodiments, the orthographic projection of the second gap 143 on the substrate 11 is outside the orthographic projection of the partition structure layer 15 on the substrate 11, that is, the orthographic projections of the two do not overlap and are staggered. Optionally, the orthographic projection of the second gap 143 on the substrate 11 is inside the orthographic projection of the isolation opening P on the substrate 11.

[0108] In some embodiments, the display panel also includes a light-emitting unit 12, which includes a first electrode 121, a light-emitting functional layer 122 and a second electrode 123, the light-emitting functional layer 122 and the second electrode 123 are sequentially stacked on the side of the first electrode 121 away from the substrate 11, and at least a portion of the second electrode 123 is located in the isolation opening.

[0109] In some embodiments, the light emitting functional layer 122 may fill at least a portion of the second gap 143 .

[0110] The display panel provided according to the embodiment of the present application and the display panel provided in the aforementioned embodiment of the present application belong to the same inventive concept, and have corresponding film layer structures and beneficial effects. Details not fully described in the embodiment of the display panel can be found in the embodiment of the aforementioned display panel, and will not be repeated here.

[0111] The features of this embodiment may be combined with some or all of the features of the above embodiments, which will not be described in detail here.

[0112] The present application also provides a display panel, Figure 8a is a schematic diagram of a partial cross-sectional structure of a display panel provided in the eleventh embodiment of the present application, Figure 8b yes Figure 8a The schematic diagram of the cross-sectional structure of the layout of the first electrode of the display panel is shown in FIG. Figure 8c FIG. 1 is a schematic diagram of a partial cross-sectional structure of a display panel provided in the twelfth embodiment of the present application. Figures 8a to 8cAs shown, the display panel includes a substrate 11, a first electrode 121 and an insulating layer 14, the first electrode 121 includes a first sub-portion 1211 and a second sub-portion 1212, the insulating layer 14 is provided with a first opening Q, the first sub-portion 1211 and the second sub-portion 1212 are exposed to the first opening Q, the second sub-portion 1212 is located between the first sub-portion 1211 and the side wall of the insulating layer 14 close to the first opening Q, the roughness of the surface of the second sub-portion 1212 away from the substrate 11 is greater than the roughness of the surface of the first sub-portion 1211 away from the substrate 11; and / or the surface of the second sub-portion 1212 away from the substrate 11 is rough, and the surface of the first sub-portion 1211 away from the substrate 11 is smooth; and / or the thickness T3 of the second sub-portion 1212 is less than the thickness T4 of the first sub-portion 1211.

[0113] By providing a protective layer 13 between the insulating layer 14 and the first electrode 121, damage to the first electrode 121 of the display product during the etching of the insulating layer 14 is avoided, the hole injection performance of the display panel is avoided to be reduced and the voltage is avoided to be increased, and the yield of the display panel is improved. However, due to the precision problem of the preparation process, the protective layer 13 may not be able to completely cover the first electrode 121, resulting in partial exposure of the first electrode (for example, the second sub-portion 1212). Compared with the first sub-portion 1211, the second sub-portion 1212 is more damaged during the etching of the insulating layer 14, so the roughness of the surface of the second sub-portion 1212 away from the substrate 11 is greater than the roughness of the surface of the first sub-portion 1211 away from the substrate 11; and / or the surface of the second sub-portion 1212 away from the substrate 11 is rough, and the surface of the first sub-portion 1211 away from the substrate 11 is smooth; and / or the thickness T3 of the second sub-portion 1212 is less than the thickness T4 of the first sub-portion 1211.

[0114] In some embodiments, at least a portion of the insulating layer 14 is located on a side of the first electrode 121 facing away from the substrate 11 .

[0115] In some embodiments, the spacing between the outer contour line of the orthographic projection of the first opening Q on the substrate 11 and the outer contour line of the orthographic projection of the first sub-portion 1211 on the substrate 11 is greater than 0 microns and less than or equal to 2 microns. For example, the spacing between the outer contour line of the orthographic projection of the first opening Q on the substrate 11 and the outer contour line of the orthographic projection of the first sub-portion 1211 on the substrate 11 is 0.1 microns, 1 micron, 2 microns, etc.

[0116] In some embodiments, the width of the orthographic projection of the second sub-portion 1212 on the substrate 11 is greater than 0 micrometers and less than or equal to 2 micrometers. For example, the width of the orthographic projection of the second sub-portion 1212 on the substrate 11 is 0.1 micrometers, 1 micrometer, 2 micrometers, etc.

[0117] In some embodiments, the second sub-portion 1212 surrounds the first sub-portion 1211 .

[0118] In some embodiments, the second sub-portion 1212 is annular.

[0119] In some embodiments, the display panel further includes a partition structure layer 15 , the partition structure layer 15 encloses an isolation opening P, and the orthographic projection of the isolation opening P on the substrate 11 covers the orthographic projection of the first opening Q on the substrate 11 .

[0120] In some embodiments, the orthographic projection of the second sub-portion 1212 on the substrate 11 is outside the orthographic projection of the partition structure layer 15 on the substrate 11, that is, the orthographic projections of the two do not overlap and are staggered. Optionally, the orthographic projection of the second sub-portion 1212 on the substrate 11 is inside the orthographic projection of the isolation opening P on the substrate 11.

[0121] In some embodiments, the display panel also includes a light-emitting unit 12, which includes a first electrode 121, a light-emitting functional layer 122 and a second electrode 123. The first electrode 121, the light-emitting functional layer 122 and the second electrode 123 are stacked in sequence in a direction away from the substrate. The light-emitting functional layer 122 and the second electrode 123 are stacked in sequence on the side of the first electrode 121 away from the substrate 11, and at least a portion of the second electrode 123 is located in the isolation opening P.

[0122] In some embodiments, the first electrode 121 may further include a third sub-portion 1213, and the second sub-portion 1212 is located between the first sub-portion 1211 and the third sub-portion 1213. The insulating layer 14 may be located on a side of the third sub-portion 1213 away from the substrate 11. The thickness T5 of the third sub-portion 1213 may be equal to the thickness T4 of the first sub-portion 1211. The thickness T5 of the third sub-portion 1213 may be greater than the thickness T3 of the second sub-portion 1212. The display panel provided according to the embodiment of the present application and the display panel provided in the aforementioned embodiment of the present application belong to the same inventive concept, and have corresponding film layer structures and beneficial effects. For details not fully described in the embodiment of the display panel, please refer to the embodiment of the aforementioned display panel, and will not be repeated here.

[0123] The features of this embodiment may be combined with some or all of the features of the above embodiments, which will not be described in detail here.

[0124] The embodiment of the present application also provides a method for preparing a display panel. Fig. 9 This is a flow chart of a method for preparing a display panel provided in one embodiment of the present application. The preparation method is used to prepare a display panel provided in any of the above embodiments. Fig. 9 As shown, the preparation method comprises:

[0125] Step S910, preparing a first electrode on a substrate.

[0126] Step S920: preparing an intermediate protective layer on the side of the first electrode facing away from the substrate, wherein the orthographic projection of the intermediate protective layer on the substrate overlaps with the orthographic projection of the first electrode on the substrate.

[0127] Step S930: preparing an insulating layer on a side of the intermediate protective layer away from the first electrode, wherein the insulating layer is provided with a first opening.

[0128] Step S940 , removing the intermediate protection layer in the first opening, so that at least a portion of the first electrode is exposed in the first opening.

[0129] Fig.10 A schematic diagram of the structure of an intermediate product obtained during the execution of the preparation method provided in an embodiment of the present application, Fig.11 This is a schematic diagram of the structure of an intermediate product obtained during the execution of the preparation method provided in another embodiment of the present application. Fig.10 and Fig.11 , the preparation method specifically comprises:

[0130] According to step S910 , a first electrode 121 is formed on the substrate 11 .

[0131] According to step S920 , first, a protective material layer 130 is prepared on a side of the first electrode 121 facing away from the substrate 11 .

[0132] Next, the protective material layer 130 is patterned to obtain an intermediate protective layer 1311 .

[0133] The orthographic projection of the intermediate protection layer 1311 on the substrate 11 is located within the orthographic projection range of the first electrode 121 on the substrate 11 .

[0134] In some embodiments, the orthographic projection area of ​​the intermediate protection layer 1311 on the substrate 11 is less than or equal to the orthographic projection area of ​​the first electrode 121 on the substrate 11 , which is not limited in the present application.

[0135] Optionally, the orthographic projection of the first electrode 121 on the substrate 11 is within the orthographic projection range of the intermediate protective layer 1311 on the substrate 11. For example, the orthographic projection area of ​​the intermediate protective layer 1311 on the substrate 11 is larger than the orthographic projection area of ​​the first electrode 121 on the substrate 11.

[0136] In some embodiments, the material of the intermediate protection layer 1311 includes photoresist.

[0137] In some embodiments, the material of the intermediate protection layer 1311 includes metal, such as molybdenum, aluminum, etc.

[0138] In some embodiments, patterning the protective material layer 130 to obtain the intermediate protective layer 1311 includes: exposing and developing the protective material layer 130 to obtain the intermediate protective layer 1311 .

[0139] The middle protection layer 1311 includes a central region 1301 and an edge region 1302 surrounding the central region 1301 . During the exposure process, the central region 1301 corresponds to a preset exposure amount.

[0140] As a method, when the photoresist is a positive photoresist, the exposure amount corresponding to the protective material layer 130 of the edge area 1302 gradually increases from a preset exposure amount in the direction from the central area 1301 to the edge area 1302, so that the middle protective layer 1311 of the edge area 1302 is inclined relative to the substrate 11.

[0141] As a method, when the photoresist is a negative photoresist, the exposure amount corresponding to the protective material layer 130 of the edge area 1302 gradually decreases from a preset exposure amount in the direction from the central area 1301 to the edge area 1302, so that the middle protective layer 1311 of the edge area 1302 is inclined relative to the substrate 11.

[0142] According to step S930 , first, an insulating material layer 140 is prepared on a side of the intermediate protection layer 1311 away from the first electrode 121 .

[0143] Next, the insulating layer material layer 121 is patterned to obtain an insulating layer 14 having a first opening Q.

[0144] As a method, the orthographic projection of the first opening Q on the substrate 11 is located within the orthographic projection range of the intermediate protective layer 1311 on the substrate 11. For example, the orthographic projection area of ​​the intermediate protective layer on the substrate is greater than or equal to the orthographic projection area of ​​the first opening on the substrate. Further, the orthographic projection of the intermediate protective layer 1311 on the substrate 11 and the orthographic projection of the insulating layer 14 provided with the first opening on the substrate 11 partially overlap, and the width of the overlapping area of ​​the orthographic projection of the intermediate protective layer 1311 on the substrate 11 and the orthographic projection of the insulating layer 14 provided with the first opening on the substrate 11 (corresponding to the width of the protective layer 13, or, corresponding to the width of the second gap 143) is greater than 0 microns and less than or equal to 2 microns, for example, the width of the overlapping area is 0.1 microns, 1 micron, 2 microns, etc., to avoid the first electrode 121 from being exposed and causing damage to the first electrode 121 when the insulating material layer 140 is patterned.

[0145] As a method, the orthographic projection of the intermediate protection layer 1311 on the substrate 11 is within the orthographic projection range of the first opening Q on the substrate 11. For example, the orthographic projection area of ​​the intermediate protection layer on the substrate is less than or equal to the orthographic projection area of ​​the first opening on the substrate.

[0146] In some embodiments, before patterning the insulating material layer 121, the preparation method further includes: preparing a photoresist pattern on the side of the insulating material layer 140 facing away from the substrate 11. Patterning the insulating material layer 121 includes: patterning the insulating material layer based on the photoresist pattern.

[0147] In some embodiments, after preparing the insulating material layer 140 on the side of the intermediate protective layer 1311 facing away from the substrate 11, and before patterning the insulating material layer 104 to form the first opening Q, the preparation method also includes: preparing a partition structure layer on the side of the insulating material layer 140 facing away from the substrate 11, the partition structure layer being provided with an isolation opening, and the orthographic projection of the first opening Q on the substrate 11 being located within the orthographic projection of the isolation opening on the substrate 11.

[0148] Specifically, a film forming process is used to prepare the isolation material layer, and then the isolation material layer is patterned to obtain the isolation structure layer. Exemplarily, a dry etching process can be used to form a groove on the isolation material layer, and then a wet etching process can be used to further etch the sidewall of the groove to form an undercut structure.

[0149] According to step S940 , the middle protection layer 1311 in the first opening Q is removed.

[0150] As one approach, the intermediate protective layer 1311 remaining between the insulating layer 14 and the first electrode forms the protective layer 13 .

[0151] The angle between the surface of the protective layer 13 facing away from the substrate 11 and the substrate 11 is greater than 0° and less than or equal to 20°. For example, the angle may be 0.1°, 1°, 10°, 20°, etc.

[0152] When the intermediate protection layer 1311 is removed, part or all of the intermediate protection layer 1311 is also removed, and a second gap 143 is formed between the sidewall of the insulating layer 14 facing the first opening and the first electrode.

[0153] As a method, the first electrode 121 includes a first sub-portion 1211 and a second sub-portion 1212, and the second sub-portion 1212 is located between the first sub-portion 1211 and the side wall of the insulating layer 14 close to the first opening Q, for example, see Fig.11 .

[0154] Among them, the roughness of the surface of the second sub-section 1212 away from the substrate 11 is greater than the roughness of the surface of the first sub-section 1211 away from the substrate 11; and / or the surface of the second sub-section 1212 away from the substrate 11 is rough, and the surface of the first sub-section 1211 away from the substrate 11 is smooth; and / or the thickness of the second sub-section 1212 is less than the thickness of the first sub-section 1211.

[0155] In some embodiments, when removing the intermediate protection layer 1311 within the first opening Q, the photoresist pattern is removed.

[0156] In some embodiments, the preparation method S9 further includes preparing a light-emitting functional layer 122 and a second electrode 123 on a side of the first electrode 121 exposed to the first opening Q away from the substrate 11 .

[0157] In some embodiments, the preparation method further includes the step of preparing a packaging portion on a side of the second electrode 123 facing away from the substrate 11 .

[0158] In some embodiments, the preparation method further includes the step of preparing an organic encapsulation layer and an encapsulation layer on a side of the encapsulation portion 16 facing away from the substrate 11 .

[0159] According to the display panel, preparation method thereof and display device provided by the embodiments of the present application, an intermediate protective layer is prepared on the side of the first electrode facing away from the substrate, the orthographic projection of the intermediate protective layer on the substrate overlaps with the orthographic projection of the first electrode on the substrate, an insulating layer is prepared on the side of the intermediate protective layer facing away from the first electrode, the insulating layer is provided with a first opening, and the intermediate protective layer in the first opening is removed to expose at least part of the first electrode to the first opening. Before etching the insulating material layer, the above preparation method protects the first electrode by the intermediate protective layer to avoid damage to the first electrode of the display product during the etching of the insulating material layer, thereby avoiding a decrease in the hole injection performance of the OLED display panel and an increase in voltage, thereby improving the yield of the display panel.

[0160] Fig.12 This is a schematic diagram of the structure of a display device provided in one embodiment of the present application. Fig.12 As shown, the display device is a product with an image display function. For example, the display device can be used to display static images, such as pictures or photos. The display device can also be used to display dynamic images, such as videos.

[0161] The display device can be a laptop computer, a mobile phone, a handheld or portable computer, a camera, a camcorder, a vehicle-mounted intelligent central control screen, a calculator, a smart watch, a GPS navigator, an electronic photo, an electronic billboard or sign, a projector, etc.

[0162] The display device includes the display panel 100 provided by any of the above embodiments. The display panel 100 may be an organic light emitting diode display substrate or a quantum dot electroluminescent display substrate.

[0163] In addition, the display device may also have functions such as taking photos, recording videos, fingerprint recognition, and face recognition. Accordingly, the display device also includes at least one functional module for realizing the above functions, such as an under-screen camera, an under-screen fingerprint recognition sensor, and the like.

[0164] The basic principles of the present application are described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, strengths, effects, etc. are required by each embodiment of the present application. In addition, the specific details disclosed above are only for the purpose of illustration and ease of understanding, not for limitation, and the above details do not limit the present application to being implemented by adopting the above specific details.

[0165] The above description has been given for the purpose of illustration and description. In addition, this description is not intended to limit the embodiments of the present application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, changes, additions and sub-combinations thereof.

Claims

1. A display panel, characterized in that: include: substrate; A first electrode, located on the substrate; a protective layer, at least a portion of which is located on a side of the first electrode facing away from the substrate; as well as The insulating layer is provided with a first opening, and at least a portion of the first electrode is exposed in the first opening.

2. The display panel according to claim 1, characterized in that: At least a portion of the insulating layer is located on a side of the protective layer and the first electrode away from the substrate, and an orthographic projection of the insulating layer on the substrate covers at least a portion of an orthographic projection of the protective layer on the substrate; The orthographic projection of the protective layer on the substrate partially overlaps with the orthographic projection of the first opening on the substrate, Alternatively, the side wall of the protection layer close to the first opening is flush with the side wall of the insulation layer close to the first opening. Alternatively, an orthographic projection of a side wall of the protection layer close to the first opening on the substrate is located on a side away from an orthographic projection of the first opening on the substrate by an orthographic projection of the side wall of the insulation layer close to the first opening on the substrate.

3. The display panel according to claim 1 or 2, characterized in that: The orthographic projection of the protective layer on the substrate is located within the orthographic projection range of the first electrode on the substrate; Preferably, an outer contour line of an orthographic projection of the protective layer on the substrate coincides with or is spaced apart from an outer contour line of an orthographic projection of the first electrode on the substrate.

4. The display panel according to claim 1, characterized in that: The protective layer is provided with a second opening, the second opening is connected to the first opening; at least a portion of the first electrode is exposed to the second opening; Preferably, the orthographic projection of the first opening on the substrate coincides with the orthographic projection of the second opening on the substrate; Alternatively, the orthographic projection of the first opening on the substrate is located within the orthographic projection of the second opening on the substrate, and the orthographic projection area of ​​the first opening on the substrate is smaller than the orthographic projection area of ​​the second opening on the substrate; Alternatively, the orthographic projection of the second opening on the substrate is located within the orthographic projection of the first opening on the substrate, and the orthographic projection area of ​​the second opening on the substrate is smaller than the orthographic projection area of ​​the first opening on the substrate; Preferably, the orthographic projection of the protective layer on the substrate is a ring; Preferably, an outer contour line of an orthographic projection of the protective layer on the substrate and an outer contour line of an orthographic projection of the first electrode on the substrate have the same shape; Preferably, the inner contour line and the outer contour line of the orthographic projection of the protective layer on the substrate have the same shape.

5. The display panel according to claim 1, characterized in that: The thickness of the protective layer on a side close to the first opening is greater than the thickness of the protective layer on a side away from the first opening; Preferably, in a direction from the first opening to the insulating layer, the thickness of the protective layer gradually decreases; Preferably, the protective layer comprises a first surface close to the substrate, and the first surface is parallel to the substrate; Preferably, the protective layer includes a second surface facing away from the substrate, the second surface is a curved surface or an arc surface or a flat surface, and the second surface is inclined relative to the substrate; Preferably, the angle between at least a portion of the second surface and the substrate is greater than 0° and less than or equal to 20°, or the angle between a cut surface of the second surface and the substrate is greater than 0° and less than or equal to 20°; Preferably, the cross-sectional shape of the protective layer comprises a triangle, and the cross-sectional shape of the protective layer is perpendicular to the substrate and parallel to a direction from the first opening to the insulating layer.

6. The display panel according to claim 1, characterized in that: The width of the protective layer in the direction from the first opening to the insulating layer is greater than 0 micrometers and less than or equal to 2 micrometers; And / or, at least a portion of the insulating layer is located in a first gap between the plurality of first electrodes.

7. The display panel according to claim 1, characterized in that: The material of the protective layer includes organic glue or metal; Preferably, the material of the protective layer includes polyimide, or molybdenum, or aluminum.

8. The display panel according to claim 1, characterized in that: The insulating layer includes a pixel definition layer; Preferably, the material of the insulating layer includes an inorganic material, or the material of the pixel definition layer is an inorganic material.

9. The display panel according to claim 1, characterized in that: It also includes a partition structure layer, wherein the partition structure layer encloses an isolation opening, and the orthographic projection of the isolation opening on the substrate covers the orthographic projection of the first opening on the substrate; Preferably, the orthographic projection of the protective layer on the substrate is outside the orthographic projection of the partition structure layer on the substrate; the orthographic projection of the protective layer on the substrate is inside the orthographic projection of the isolation opening on the substrate; Preferably, the partition structure layer is located on the side of the insulating layer away from the substrate; or, the insulating layer is provided with a clearance opening, and the partition structure layer is located in the clearance opening; Preferably, the partition structure layer comprises a first portion and a second portion stacked together, the first portion is located on a side of the second portion close to the substrate, and an orthographic projection of a side of the first portion away from the substrate on the substrate is located within the orthographic projection range of the second portion on the substrate; Preferably, the orthographic projection area of ​​the side of the first portion away from the substrate on the substrate is smaller than the orthographic projection area of ​​the second portion on the substrate; Preferably, the first portion comprises a conductive portion; Preferably, the partition structure layer further includes a third portion, which is located on a side of the first portion close to the substrate, and the orthographic projection of the first portion on the substrate is located within the orthographic projection range of the third portion on the substrate; Preferably, an orthographic projection area of ​​the first portion on the substrate is smaller than an orthographic projection area of ​​the third portion on the substrate.

10. The display panel according to claim 9, characterized in that: Also includes a light-emitting unit, the light-emitting unit includes the first electrode, a light-emitting functional layer and a second electrode, the light-emitting functional layer and the second electrode are sequentially stacked on a side of the first electrode away from the substrate, at least a portion of the second electrode is located in the isolation opening and overlaps the first portion; Preferably, the display panel further comprises a packaging portion, which is located on a side of the second electrode away from the substrate, and the orthographic projection of the packaging portion on the substrate covers the orthographic projection of the second electrode on the substrate; Preferably, adjacent packaging parts are disconnected at a side of the partition structure layer away from the substrate; Preferably, the display panel further comprises an organic encapsulation layer, which is located on a side of the encapsulation portion away from the substrate, and the orthographic projection of the organic encapsulation layer on the substrate covers the orthographic projection of the encapsulation portion on the substrate; Preferably, the display panel further comprises an inorganic encapsulation layer located on a side of the organic encapsulation layer away from the substrate, and an orthographic projection of the inorganic encapsulation layer on the substrate covers an orthographic projection of the organic encapsulation layer on the substrate.

11. A display panel, characterized in that: include: substrate; A first electrode, located on the substrate; as well as an insulating layer, wherein at least a portion of the insulating layer is located on a side of the first electrode facing away from the substrate, the insulating layer is provided with a first opening, and at least a portion of the first electrode is exposed to the first opening; A second gap is formed between a side wall of the insulating layer close to the first opening and a side of the first electrode facing away from the substrate.

12. The display panel according to claim 11, characterized in that: The orthographic projection of the second gap on the substrate is located within the orthographic projection of the first electrode on the substrate; and / or, along the thickness direction of the substrate, a depth of the second gap on a side close to the first opening is greater than a depth of the second gap on a side away from the first opening; and / or, in a direction parallel to the substrate, a width of the second gap is greater than 0 micrometers and less than or equal to 2 micrometers; And / or, the display panel further comprises a partition structure layer, the partition structure layer encloses an isolation opening, and an orthographic projection of the isolation opening on the substrate covers an orthographic projection of the first opening on the substrate; The orthographic projection of the second gap on the substrate is located within the orthographic projection of the isolation opening on the substrate, and the orthographic projection of the second gap on the substrate is located outside the orthographic projection of the partition structure layer on the substrate; And / or, the display panel also includes a light-emitting unit, the light-emitting unit includes the first electrode, a light-emitting functional layer and a second electrode, the light-emitting functional layer and the second electrode are sequentially stacked on a side of the first electrode away from the substrate, and at least a portion of the second electrode is located in the isolation opening.

13. A display panel, characterized in that: include: substrate; A first electrode, located on the substrate, the first electrode comprising a first sub-portion and a second sub-portion; as well as An insulating layer, wherein the insulating layer is provided with a first opening, the first sub-portion and the second sub-portion are exposed to the first opening, the second sub-portion is located between the first sub-portion and the side wall of the insulating layer close to the first opening, the roughness of the surface of the second sub-portion away from the substrate is greater than the roughness of the surface of the first sub-portion away from the substrate; and / or, the surface of the second sub-portion away from the substrate is rough, and the surface of the first sub-portion away from the substrate is smooth; and / or, the thickness of the second sub-portion is less than the thickness of the first sub-portion.

14. The display panel according to claim 13, characterized in that: At least a portion of the insulating layer is located on a side of the first electrode facing away from the substrate; and / or, a distance between an outer contour line of an orthographic projection of the first opening on the substrate and an outer contour line of an orthographic projection of the first sub-portion on the substrate is greater than 0 micrometer and less than or equal to 2 micrometers; and / or, a width of an orthographic projection of the second sub-portion on the substrate is greater than 0 micrometers and less than or equal to 2 micrometers; and / or, the second subsection surrounds the first subsection; and / or, the second sub-section is annular; And / or, the display panel further comprises a partition structure layer, the partition structure layer encloses an isolation opening, the orthographic projection of the isolation opening on the substrate covers the orthographic projection of the first opening on the substrate; the orthographic projection of the second sub-portion on the substrate is located within the orthographic projection of the isolation opening on the substrate, and the orthographic projection of the second sub-portion on the substrate is located outside the orthographic projection of the partition structure layer on the substrate; And / or, the display panel also includes a light-emitting unit, the light-emitting unit includes the first electrode, a light-emitting functional layer and a second electrode, the light-emitting functional layer and the second electrode are sequentially stacked on a side of the first electrode away from the substrate, and at least a portion of the second electrode is located in the isolation opening.

15. A method for preparing a display panel, characterized in that: include: preparing a first electrode on a substrate; An intermediate protective layer is prepared on a side of the first electrode facing away from the substrate, wherein an orthographic projection of the intermediate protective layer on the substrate overlaps with an orthographic projection of the first electrode on the substrate; An insulating layer is prepared on the side of the intermediate protective layer away from the first electrode, and the insulating layer is provided with a first opening. The intermediate protection layer in the first opening is removed to expose at least a portion of the first electrode through the first opening.

16. The preparation method according to claim 15, characterized in that: Preparing an intermediate protective layer on a side of the first electrode facing away from the substrate comprises: Preparing a protective material layer on a side of the first electrode facing away from the substrate; Patterning the protective material layer to obtain the intermediate protective layer; Preferably, the orthographic projection of the intermediate protective layer on the substrate is located within the orthographic projection range of the first electrode on the substrate; the orthographic projection area of ​​the intermediate protective layer on the substrate is less than or equal to the orthographic projection area of ​​the first electrode on the substrate; Preferably, the material of the protective material layer includes photoresist or metal; The protective material layer is patterned to obtain the intermediate protective layer, comprising: exposing and developing the protective material layer to obtain the intermediate protective layer; Wherein, the protective material layer includes a central area and an edge area surrounding the central area, and during the exposure process, the central area corresponds to a preset exposure amount; When the photoresist is a positive photoresist, in a direction from the central area to the edge area, the exposure amount corresponding to the protective material layer in the edge area gradually increases from the preset exposure amount; When the photoresist is a negative photoresist, in a direction from the central area to the edge area, the exposure amount corresponding to the protective material layer in the edge area gradually decreases from the preset exposure amount.

17. The preparation method according to claim 15, characterized in that: Preparing an insulating layer on a side of the intermediate protective layer away from the first electrode comprises: preparing an insulating material layer on a side of the intermediate protective layer away from the first electrode; Patterning the insulating material layer to obtain the insulating layer provided with the first opening; The orthographic projection of the intermediate protective layer on the substrate is located within the orthographic projection range of the first opening on the substrate, or the orthographic projection of the first opening on the substrate is located within the orthographic projection range of the intermediate protective layer on the substrate; Preferably, an orthographic projection area of ​​the intermediate protective layer on the substrate is smaller than, equal to, or larger than an orthographic projection area of ​​the first opening on the substrate.

18. The preparation method according to claim 17, characterized in that: Before patterning the insulating material layer, the preparation method further comprises: Preparing a photoresist pattern on a side of the insulating material layer facing away from the substrate; The patterning of the insulating material layer comprises: patterning the insulating material layer based on the photoresist pattern; Preferably, the preparation method further comprises: When removing the intermediate protection layer in the first opening, the photoresist pattern is removed.

19. The preparation method according to claim 17, characterized in that: After removing the intermediate protective layer in the first opening, the preparation method further includes: Prepare a light-emitting functional layer and a second electrode on a side of the first electrode exposed to the first opening away from the substrate; After preparing an insulating material layer on a side of the intermediate protective layer away from the first electrode and before patterning the insulating material layer to form the first opening, the method further includes: A partition structure layer is prepared on a side of the insulating material layer away from the substrate, wherein the partition structure layer is provided with an isolation opening, The orthographic projection of the first opening on the substrate is located within the orthographic projection of the isolation opening on the substrate; the orthographic projection of the intermediate protection layer on the substrate is located outside the orthographic projection of the partition structure layer on the substrate.

20. A display device, characterized in that: A display panel comprising any one of claims 1-14, or a display panel obtained by executing any one of the preparation methods of claims 15-19.

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