Display panel, display device and preparation method of display panel

Abstract

The invention relates to a display panel, a display device and a preparation method of the display panel. The display panel comprises a substrate, an isolation structure and a touch electrode, the isolation structure layer is arranged on one side of the substrate and comprises an isolation structure and an isolation gap, and the isolation structure is used for being connected with a fixed potential; the touch electrode is arranged on one side of the substrate, the orthographic projection of the touch electrode on the substrate is located in the orthographic projection of the isolation gap on the substrate, and the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate. According to the display panel, mutual interference between the isolation structure and the touch electrodes can be reduced, and the touch performance and the display effect of the display panel are improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel, a display device, and a method for manufacturing a display panel. Background Art

[0002] With the development of society and the advancement of technology, touch screen displays have become an indispensable part of modern electronic devices. In order to make the display screen thinner and lighter, incell technology is usually used to set the touch screen traces and the cathode on the same layer. However, the existence of mutual interference between the touch screen traces and the cathode leads to poor touch performance. Summary of the invention

[0003] Based on this, it is necessary to provide a display panel, a display device and a method for manufacturing a display panel that can improve touch performance in order to solve the above technical problems.

[0004] In a first aspect, an embodiment of the present application provides a display panel, including:

[0005] substrate;

[0006] The isolation structure layer is arranged on one side of the substrate, the isolation structure layer comprises an isolation structure and an isolation gap, and the isolation structure is connected to a fixed potential;

[0007] A touch electrode is disposed on one side of the substrate; the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate;

[0008] Along the thickness direction of the display panel, the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate.

[0009] In one embodiment, the display panel further comprises:

[0010] The insulating structure layer is provided between the isolation structure layer and the substrate, and the insulating structure layer includes a first insulating portion and a second insulating portion; the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first insulating portion on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second insulating portion on the substrate;

[0011] The size of the first insulating portion in the first direction is different from the size of the second insulating portion in the first direction, and the first direction is parallel to the thickness direction of the substrate;

[0012] Optionally, a size of the first insulating portion in the first direction is greater than a size of the second insulating portion in the first direction;

[0013] Optionally, a size of the first insulating portion in the first direction is smaller than a size of the second insulating portion in the first direction;

[0014] Optionally, the distance between one end of the isolation structure close to the substrate and one end of the isolation structure away from the substrate is the same as the distance between one end of the touch electrode close to the substrate and one end of the touch electrode away from the substrate.

[0015] In one of the embodiments, the insulating structure layer includes a planarization layer, which is disposed between the isolation structure and the substrate, the planarization layer includes a first planarization portion and a second planarization portion, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first planarization portion on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second planarization portion on the substrate;

[0016] A size of the first planarized portion in the first direction is different from a size of the second planarized portion in the first direction;

[0017] Optionally, a size of the first planarized portion in the first direction is greater than a size of the second planarized portion in the first direction;

[0018] Optionally, a size of the first planarized portion in the first direction is smaller than a size of the second planarized portion in the first direction.

[0019] In one embodiment, the insulating structure layer includes a plurality of planarization layers, and a size of a first planarization portion in at least one planarization layer in the first direction is different from a size of a second planarization portion in the first direction;

[0020] Optionally, a size of a first planarized portion in at least one planarized layer in the first direction is larger than a size of a second planarized portion in the first direction;

[0021] Optionally, a size of a first planarized portion in at least one planarized layer in the first direction is smaller than a size of a second planarized portion in the first direction;

[0022] Optionally, a size in the first direction of the first planarized portion of the planarized layers other than at least one planarized layer among the plurality of planarized layers is the same as a size in the first direction of the second planarized portion.

[0023] In one of the embodiments, the insulating structure layer includes a pixel definition layer, which is disposed between the isolation structure and the substrate, the pixel definition layer includes a first pixel definition portion and a second pixel definition portion, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first pixel definition portion on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second pixel definition portion on the substrate;

[0024] A size of the first pixel definition portion in the first direction is different from a size of the second pixel definition portion in the first direction;

[0025] Optionally, a size of the first pixel definition portion in the first direction is larger than a size of the second pixel definition portion in the first direction;

[0026] Optionally, a size of the first pixel definition portion in the first direction is smaller than a size of the second pixel definition portion in the first direction.

[0027] In one embodiment, the isolation structure layer further includes: a plurality of isolation openings formed by the isolation structure; the display panel further includes a plurality of light-emitting functional parts, and the light-emitting functional parts are correspondingly arranged in the isolation openings.

[0028] In one embodiment, the isolation structure includes a first isolation layer and a second isolation layer, and the first isolation layer is arranged on a side of the second isolation layer away from the substrate; the touch electrode includes a first electrode layer and a second electrode layer, and the first electrode layer is arranged on a side of the second electrode layer away from the substrate;

[0029] The distance between one end of the second isolation layer close to the first isolation layer and one end of the second isolation layer away from the first isolation layer is the same as the distance between one end of the second electrode layer close to the first electrode layer and one end of the second electrode layer away from the first electrode layer;

[0030] Optionally, the first isolation layer and the first electrode layer are arranged in the same layer;

[0031] Optionally, the second isolation layer is provided in the same layer as the second electrode layer;

[0032] Optionally, the distance between one end of the first isolation layer close to the second isolation layer and one end of the first isolation layer away from the second isolation layer is the same as the distance between one end of the first electrode layer close to the second electrode layer and one end of the first electrode layer away from the second electrode layer.

[0033] In one embodiment, the orthographic projection of the second isolation layer on the substrate is within the orthographic projection range of the first isolation layer on the substrate;

[0034] The orthographic projection of the second electrode layer on the substrate is located within the orthographic projection range of the first electrode layer on the substrate.

[0035] In a second aspect, an embodiment of the present application provides a method for preparing a display panel, the method comprising:

[0036] providing a substrate;

[0037] An isolation structure layer and a touch electrode are formed on one side of the substrate, wherein the isolation structure layer includes an isolation structure and an isolation gap; the isolation structure is connected to a fixed potential, the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate, and the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate.

[0038] In one embodiment, before forming the isolation structure layer and the touch electrode on one side of the substrate, the preparation method further includes:

[0039] An insulating structure layer is formed on one side of the substrate, the insulating structure layer comprising a first insulating portion and a second insulating portion; an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within the range of an orthographic projection of the first insulating portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within the range of an orthographic projection of the second insulating portion on the substrate;

[0040] The size of the first insulating portion in the first direction is different from the size of the second insulating portion in the first direction, and the first direction is parallel to the thickness direction of the substrate;

[0041] Optionally, a size of the first insulating portion in the first direction is greater than a size of the second insulating portion in the first direction;

[0042] Optionally, a size of the first insulating portion in the first direction is smaller than a size of the second insulating portion in the first direction;

[0043] Optionally, the distance between one end of the isolation structure close to the substrate and one end of the isolation structure away from the substrate is the same as the distance between one end of the touch electrode close to the substrate and one end of the touch electrode away from the substrate.

[0044] In one embodiment, forming an insulating structure layer on one side of a substrate includes:

[0045] A planarization layer is formed on one side of the substrate, the planarization layer includes a first planarization portion and a second planarization portion, an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within the range of an orthographic projection of the first planarization portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within the range of an orthographic projection of the second planarization portion on the substrate;

[0046] A size of the first planarized portion in the first direction is different from a size of the second planarized portion in the first direction;

[0047] Optionally, a size of the first planarized portion in the first direction is greater than a size of the second planarized portion in the first direction;

[0048] Optionally, a size of the first planarized portion in the first direction is smaller than a size of the second planarized portion in the first direction.

[0049] In one embodiment, forming a planarization layer on one side of a substrate includes:

[0050] A planarization layer is formed on one side of the substrate using a half-tone mask process.

[0051] In one embodiment, after forming a planarization layer on one side of the substrate, the preparation method further comprises:

[0052] forming a pixel definition layer on one side of the planarization layer;

[0053] Optionally, the pixel definition layer includes a first pixel definition portion and a second pixel definition portion, an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within a range of an orthographic projection of the first pixel definition portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within a range of an orthographic projection of the second pixel definition portion on the substrate;

[0054] A size of the first pixel definition portion in the first direction is different from a size of the second pixel definition portion in the first direction;

[0055] Optionally, a size of the first pixel definition portion in the first direction is larger than a size of the second pixel definition portion in the first direction;

[0056] Optionally, a size of the first pixel definition portion in the first direction is smaller than a size of the second pixel definition portion in the first direction.

[0057] In one embodiment, forming a pixel definition layer on one side of the planarization layer includes:

[0058] forming a first sub-definition layer on one side of the planarization layer; the first sub-definition layer includes a first region and a second region;

[0059] A second sub-definition material layer is formed on one side of the first sub-definition layer, and the second sub-definition material layer is patterned to form a second sub-definition layer on the first area in the first sub-definition layer; the first area and the second sub-definition layer form a first pixel definition part, and the second area forms a second pixel definition part.

[0060] In a third aspect, an embodiment of the present application further provides a display device, comprising a display panel as provided in the first aspect above.

[0061] The embodiment of the present application provides a display panel, a display device and a method for preparing a display panel, wherein the display panel includes a substrate, an isolation structure layer and a touch electrode; the isolation structure layer is arranged on one side of the substrate, the isolation structure layer includes an isolation structure and an isolation gap, and the isolation structure is connected to a fixed potential; the touch electrode is arranged on one side of the substrate, and the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate; the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate. In this embodiment, the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate, which can reduce the mutual interference between the touch electrode and the isolation structure, that is, it can reduce the influence of the isolation structure on the touch electrode, improve the touch signal-to-noise ratio, thereby improving the touch performance, and can also reduce the influence of the touch electrode on the isolation structure, which can improve the display effect of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0062] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the conventional technology, the drawings required for use in the embodiments or the conventional technology descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For different technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0063] Figure 1 A schematic diagram of a cross-sectional structure of a display panel provided by an embodiment;

[0064] Figure 2 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0065] Figure 3 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0066] Figure 4 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0067] Figure 5 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0068] Figure 6 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0069] Figure 7 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0070] Figure 8 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0071] Fig. 9A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0072] Fig.10 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0073] Fig.11 A schematic diagram of a cross-sectional structure of a display panel provided in another embodiment;

[0074] Fig.12 A schematic diagram of a planar distribution of a display panel provided by an embodiment;

[0075] Fig.13 A schematic flow chart of steps of a method for preparing a display panel in one embodiment;

[0076] Fig.14 is a schematic flow chart of steps of a method for preparing a display panel in another embodiment;

[0077] Fig.15 FIG. 1 is a schematic flow chart of steps of a method for preparing a display panel in another embodiment.

[0078] Description of reference numerals:

[0079] 1. TP routing; 2. cathode; 10. display panel; 11. substrate; 12. isolation structure layer; 121. isolation structure; 121a. first isolation layer; 121b. second isolation layer; 122. isolation gap; 123. isolation opening; 13. touch electrode; 13a. first electrode layer; 13b. second electrode layer; 14. insulation structure layer; 141. first insulation part; 142. second insulation part; 143. planarization layer; 143a. first planarization part; 143b. second planarization part; 143c. metal layer; 144. pixel definition layer; 144a. first pixel definition part; 144b. second pixel definition part; 15. light-emitting functional part. DETAILED DESCRIPTION

[0080] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. The preferred embodiments of the present application are provided in the drawings. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present application more thorough and comprehensive.

[0081] It should be understood that although the terms "first", "second", etc. may be used herein to describe various elements, they do not represent any order, quantity or importance, but are only used to distinguish different components. These terms are only used to distinguish one element from another. For example, without departing from the scope of the present application, the first element may be referred to as the second element, and similarly, the second element may be referred to as the first element. "Include" or "comprising" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0082] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0083] In addition, in the specification, the phrase "planar distribution schematic diagram" refers to a drawing when the target part is observed from above, and the phrase "cross-sectional schematic diagram" or "cross-sectional structure schematic diagram" refers to a drawing when a section obtained by vertically cutting the target part is observed from the side.

[0084] In addition, the drawings are not drawn to a 1:1 scale, and the relative sizes of the elements in the drawings are drawn only as examples and not necessarily according to the true scale.

[0085] Organic Light-Emitting Diode (OLED) display devices have been listed as a display technology with great development prospects due to their advantages such as thinness, lightness, wide viewing angle, active light emission, continuously adjustable light emission color, low cost, fast response speed, low energy consumption, low driving voltage, wide operating temperature range, simple production process, high light emission efficiency and flexible display. There is an increasing demand to add touch panels to OLED display devices to send information to the OLED display device by touching a part of the panel with the hand or a separate input member. Figure 1 As shown, in order to make the display screen thinner and lighter, incell technology is usually used, and isolation column metal is used to set the touch screen (TP) trace 1 and cathode 2 on the same layer. However, there is mutual interference between TP trace 1 and cathode 2, and the noise generated between TP trace and cathode cannot be completely filtered out in the later debugging stage, resulting in low touch signal-to-noise ratio, poor touch performance and display effect.

[0086] In view of this, the embodiments of the present application provide a display panel, a display device and a method for preparing a display panel. The display panel includes a substrate and an isolation structure layer, the isolation structure layer is arranged on one side of the substrate; the isolation structure layer includes an isolation structure and an isolation gap, the isolation structure is connected to a fixed potential; a touch electrode is arranged on one side of the substrate, the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate; the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate. In the display panel provided by the present application, the touch electrodes and isolation structures located on the same layer, the distance between the touch electrodes and the substrate is different from the distance between the isolation structure and the substrate, which can reduce the mutual interference between the touch electrodes and the isolation structure, thereby improving the touch signal-to-noise ratio, and improving the touch performance and display effect.

[0087] The composition, preparation and other contents of the isolation structure mentioned below are further described in patents CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 100935, PCT / CN2024 / 102785, PCT / CN2024 / 099419, PCT / CN2024 / 099072, and CN116685174A for reference.

[0088] See also Figure 2 The embodiment of the present application provides a display panel 10 including: a substrate 11, an isolation structure layer 12 and a touch electrode 13; the isolation structure layer 12 is disposed on one side of the substrate 11, the isolation structure layer 12 includes an isolation structure 121 and an isolation gap 122, and the isolation structure 121 is used to connect a fixed potential;

[0089] The touch electrode 13 is disposed on one side of the substrate 11; the orthographic projection of the touch electrode 13 on the substrate 11 is located within the orthographic projection of the isolation gap 122 on the substrate 11; along the thickness direction of the display panel 10, the distance between the isolation structure 121 and the substrate 11 is different from the distance between the touch electrode 13 and the substrate 11.

[0090] The display panel 10 may be an organic light emitting diode display panel (Organic Light Emitting Diode, OLED for short), a quantum dot electroluminescent display panel (Quantum Dot Light Emitting Diodes, QLED for short), or the like.

[0091] The substrate 11 may be a substrate of an inorganic material, a substrate of an organic material, or a composite substrate formed by stacking an inorganic material substrate and an organic material substrate. A driving circuit layer may be provided on one side of the substrate 11 close to the touch electrode 13, and the driving circuit layer includes a pixel driving circuit, and the pixel driving circuit includes a thin film transistor.

[0092] The isolation structure layer 12 refers to a functional layer that can isolate adjacent light-emitting functional parts. The isolation structure layer 12 includes an isolation structure 121, and an isolation gap 122 opened on the isolation structure 121. The touch electrode 13 included in the display panel 10 is arranged in the same layer as the isolation structure 121, and the orthographic projection of the touch electrode 13 on the substrate 11 is located within the orthographic projection range of the isolation gap 122 on the substrate 11. It can be understood that the touch electrode 13 and the isolation structure 121 are both formed by the isolation structure layer 12. That is to say, after the isolation structure material layer is formed on the substrate 11, the isolation structure material layer is patterned to form the isolation structure 121 and the touch electrode 13 in the isolation gap 122 of the isolation structure 121.

[0093] The isolation structure 121 in the isolation structure layer 12 is used to connect a fixed potential. It can be understood that the isolation structure 121 can transmit cathode signals, and the touch electrode 13 can include at least one of a TX electrode (transmitting electrode) and a RX electrode (receiving electrode).

[0094] The distance between the isolation structure 121 and the substrate 11 may refer to the distance between one end of the isolation structure 121 close to the substrate 11 and one end of the substrate 11 close to the isolation structure 121, or between one end of the isolation structure 121 away from the substrate 11 and one end of the substrate 11 close to the isolation structure 121, or between one end of the isolation structure 121 away from the substrate 11 and one end of the substrate 11 away from the isolation structure 121. The distance between the touch electrode 13 and the substrate 11 may refer to the distance between one end of the touch electrode 13 close to the substrate 11 and one end of the substrate 11 close to the touch electrode 13, or between one end of the touch electrode 13 away from the substrate and one end of the substrate 11 away from the touch electrode 13.

[0095] The distance between the isolation structure 121 and the substrate 11 is different from the distance between the touch electrode 13 and the substrate 11. It can be understood that the distance between the end of the isolation structure 121 close to the substrate 11 and the end of the substrate 11 close to the isolation structure 121 is different from the distance between the end of the touch electrode 13 close to the substrate 11 and the end of the substrate 11 close to the touch electrode 13; or the distance between the end of the isolation structure 121 away from the substrate 11 and the end of the substrate 11 close to the isolation structure 121 is different from the distance between the end of the touch electrode 13 away from the substrate 11 and the end of the substrate 11 close to the touch electrode 13; or the distance between the end of the isolation structure 121 away from the substrate 11 and the end of the substrate 11 away from the isolation structure 121 is different from the distance between the end of the touch electrode 13 away from the substrate 11 and the end of the substrate 11 away from the touch electrode 13.

[0096] In this embodiment, the orthographic projection of the touch electrode 13 on the substrate 11 is located within the orthographic projection of the isolation gap 122 on the substrate 11, and the distance between the isolation structure 121 and the substrate 11 is different from the distance between the touch electrode 13 and the substrate. This can reduce the mutual interference between the touch electrode 13 and the isolation structure 121, that is, it can reduce the influence of the isolation structure 121 on the touch electrode 13, improve the touch signal-to-noise ratio, and thus improve the touch performance; it can also reduce the influence of the touch electrode 13 on the isolation structure 121, and improve the display effect of the display panel 10.

[0097] In one embodiment, Figure 2 As shown, the display panel 10 further includes an insulating structure layer 14. The insulating structure layer 14 is disposed between the isolation structure layer 12 and the substrate 11, and includes a first insulating portion 141 and a second insulating portion 142; the orthographic projection of one end of the touch electrode 13 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the first insulating portion 141 on the substrate 11, and the orthographic projection of one end of the isolation structure 121 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the second insulating portion 142 on the substrate 11.

[0098] In the second direction, the insulating structure layer 14 may include a first insulating portion 141 and a second insulating portion 142. The second direction is perpendicular to the first direction. The touch electrode 13 has an end close to the substrate 11 and an end away from the substrate 11. The first insulating portion 141 corresponds to the touch electrode 13, that is, the orthographic projection of the end of the touch electrode 13 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the first insulating portion 141 on the substrate 11. The isolation structure 121 has an end close to the substrate 11 and an end away from the substrate 11. The second insulating portion 142 corresponds to the isolation structure 121, that is, the orthographic projection of the end of the isolation structure 121 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the second insulating portion 142 on the substrate 11.

[0099] The size of the first insulating portion 141 in the first direction is different from the size of the second insulating portion 142 in the first direction, and the first direction is parallel to the thickness direction of the substrate 11. Figure 3 As shown, the first direction is the Y direction, and the second direction is the X direction.

[0100] It is understandable that the distance between one end of the first insulating portion 141 close to the touch electrode 13 and one end close to the substrate 11 is different from the distance between one end of the second insulating portion 142 close to the isolation structure 121 and one end close to the substrate 11 .

[0101] In an optional embodiment, a size of the first insulating portion 141 in the first direction is greater than a size of the second insulating portion 142 in the first direction.

[0102] In another optional embodiment, Figure 3 As shown, the size of the first insulating portion 141 in the first direction is smaller than the size of the second insulating portion 142 in the first direction.

[0103] In an optional embodiment, the distance between one end of the isolation structure 121 close to the substrate 11 and the end of the isolation structure 121 away from the substrate 11 is the same as the distance between one end of the touch electrode 13 close to the substrate 11 and the end of the touch electrode 13 away from the substrate 11.

[0104] It can be understood that, in the display panel 10 , along the thickness direction of the display panel 10 , the size of the overall structure of the isolation structure 121 is the same as the size of the overall structure of the touch electrode 13 .

[0105] In this embodiment, an insulating structure layer 14 is provided between the isolation structure layer 12 and the substrate 11, and the insulating structure layer 14 includes a first insulating portion 141 and a second insulating portion 142. The size of the first insulating portion 141 in the first direction is different from the size of the second insulating portion 142 in the first direction, so that the distance between the isolation structure 121 and the substrate 11 and the distance between the touch electrode 13 and the substrate 11 are different, thereby reducing the mutual interference between the touch electrode 13 and the isolation structure 121, thereby improving the touch signal-to-noise ratio, improving the touch performance, and the display effect of the display panel 10.

[0106] In one embodiment, Figure 4 As shown, the insulating structure layer 14 includes a planarization layer 143, which is arranged between the isolation structure 121 and the substrate 11. The planarization layer 143 includes a first planarization portion 143a and a second planarization portion 143b. The orthographic projection of one end of the touch electrode 13 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the first planarization portion 143a on the substrate 11, and the orthographic projection of one end of the isolation structure 121 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the second planarization portion 143b on the substrate 11.

[0107] A planarization layer 143 is included between the substrate 11 and the isolation structure layer 12. In the second direction, the planarization layer 143 may include a first planarization portion 143a and a second planarization portion 143b. The first planarization portion 143a corresponds to the touch electrode 13, that is, the orthographic projection of one end of the touch electrode 13 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the first planarization portion 143a on the substrate 11. The second planarization portion 143b corresponds to the isolation structure 121, that is, the orthographic projection of one end of the isolation structure 121 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the second planarization portion 143b on the substrate 11.

[0108] A size of the first planarized portion 143 a in the first direction is different from a size of the second planarized portion 143 b in the first direction.

[0109] It is understandable that the distance between one end of the first planarized portion 143a close to the touch electrode 13 and one end close to the substrate 11 is different from the distance between one end of the second planarized portion 143b close to the isolation structure 121 and one end close to the substrate 11 .

[0110] In an optional embodiment, if Figure 4 As shown, the size of the first planarized portion 143 a in the first direction is greater than the size of the second planarized portion 143 b in the first direction.

[0111] In another optional embodiment, Figure 5 As shown, the size of the first planarized portion 143 a in the first direction is smaller than the size of the second planarized portion 143 b in the first direction.

[0112] In this embodiment, a planarization layer 143 is provided between the isolation structure layer 12 and the substrate 11, and the planarization layer 143 includes a first planarization portion 143a and a second planarization portion 143b. The size of the first planarization portion 143a in the first direction is different from the size of the second planarization portion 143b in the first direction, so that the distance between the isolation structure 121 and the substrate 11 and the distance between the touch electrode 13 and the substrate 11 are different, thereby reducing the mutual interference between the touch electrode 13 and the isolation structure 121, thereby improving the touch signal-to-noise ratio, improving the touch performance, and the display effect of the display panel 10.

[0113] In one embodiment, Figure 6 As shown, the insulating structure layer 14 includes a plurality of planarization layers 143 , and a size of a first planarization portion 143 a in at least one planarization layer 143 in the first direction is different from a size of a second planarization portion 143 b in the first direction.

[0114] A plurality of planarization layers 143 may be included between the substrate 11 and the isolation structure layer 12. Among the plurality of planarization layers 143, a first planarization portion 143a of one planarization layer 143 may have a size in the first direction different from a size of a second planarization portion 143b in the first direction. Alternatively, a first planarization portion 143a of a plurality of planarization layers 143 may have a size in the first direction different from a size of a second planarization portion 143b in the first direction.

[0115] In an optional embodiment, if Figure 6 As shown, the size of the first planarization portion 143 a in the at least one planarization layer 143 in the first direction is greater than the size of the second planarization portion 143 b in the first direction.

[0116] Among the multiple planarization layers 143, there may be a planarization layer 143 whose first planarization portion 143a has a size in the first direction that is larger than the size of the second planarization portion 143b in the first direction, or there may be multiple planarization layers 143 whose first planarization portion 143a has a size in the first direction that is larger than the size of the second planarization portion 143b in the first direction.

[0117] In another optional embodiment, Figure 7 As shown, the size of the first planarization portion 143 a in the at least one planarization layer 143 in the first direction is smaller than the size of the second planarization portion 143 b in the first direction.

[0118] In an optional embodiment, the size of the first planarization portion 143 a of the planarization layers 143 other than at least one planarization layer 143 among the plurality of planarization layers 143 in the first direction is the same as the size of the second planarization portion 143 b in the first direction.

[0119] It can be understood that, assuming that the insulating structure layer 14 includes three planarization layers, the size of the first planarization portion 143a of one planarization layer 143 in the first direction is larger than or smaller than the size of the second planarization portion 143b in the first direction, and the size of the first planarization portion 143a of the other two planarization layers 143 in the first direction is the same as the size of the second planarization portion 143b in the first direction.

[0120] In an optional embodiment, if Figure 6 As shown, the display panel 10 further includes a plurality of metal layers 143 c , and a metal layer 143 c is disposed between adjacent planarization layers 143 .

[0121] In this embodiment, there may be a plurality of planarization layers 143 between the isolation structure 121 and the substrate 11, and the size of the first planarization portion 143a of at least one planarization layer 143 in the first direction is different from the size of the second planarization portion 143b in the first direction. In this way, the user can select the number of planarization layers 143 in which the size of the first planarization portion 143a in the first direction is different from the size of the second planarization portion 143b in the first direction according to actual needs, so as to change the distance between the isolation structure 121 and the substrate 11 and the distance between the touch electrode 13 and the substrate 11, thereby improving the applicability of the display panel 10.

[0122] In one embodiment, Figure 8 As shown, the insulating structure layer 14 includes a pixel definition layer 144, which is arranged between the isolation structure 121 and the substrate 11, and the pixel definition layer 144 includes a first pixel definition part 144a and a second pixel definition part 144b. The orthographic projection of one end of the touch electrode 13 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the first pixel definition part 144a on the substrate 11, and the orthographic projection of one end of the isolation structure 121 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the second pixel definition part 144b on the substrate 11.

[0123] A pixel definition layer 144 is included between the substrate 11 and the isolation structure 121. In the second direction, the pixel definition layer 144 may include a first pixel definition portion 144a and a second pixel definition portion 144b. The first pixel definition portion 144a corresponds to the touch electrode 13, that is, the orthographic projection of one end of the touch electrode 13 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the first pixel definition portion 144a on the substrate 11. The second pixel definition portion 144b corresponds to the isolation structure 121, that is, the orthographic projection of one end of the isolation structure 121 close to the substrate 11 on the substrate 11 is located within the range of the orthographic projection of the second pixel definition portion 144b on the substrate 11.

[0124] A size of the first pixel defining portion 144 a in the first direction is different from a size of the second pixel defining portion 144 b in the first direction.

[0125] It is understandable that the distance between one end of the first pixel defining portion 144a close to the touch electrode 13 and one end close to the substrate 11 is different from the distance between one end of the second pixel defining portion 144b close to the isolation structure 121 and one end close to the substrate 11 .

[0126] In an optional embodiment, if Figure 8 As shown, the size of the first pixel definition portion 144a in the first direction is greater than the size of the second pixel definition portion 144b in the first direction.

[0127] In another optional embodiment, Fig. 9 As shown, the size of the first pixel definition portion 144a in the first direction is smaller than the size of the second pixel definition portion 144b in the first direction.

[0128] In this embodiment, a pixel definition layer 144 including a first pixel definition portion 144a and a second pixel definition portion 144b is provided between the isolation structure 121 and the substrate 11. The size of the first pixel definition portion 144a in the first direction is different from the size of the second pixel definition portion 144b in the first direction, so that the distance between the isolation structure 121 and the substrate 11 and the distance between the touch electrode 13 and the substrate 11 are different, thereby reducing the mutual interference between the touch electrode 13 and the isolation structure 121, thereby improving the touch signal-to-noise ratio, the touch performance, and the display effect of the display panel 10.

[0129] In an optional embodiment, when the display panel 10 includes a planarization layer 143 and a pixel definition layer 144, that is, the planarization layer 143 is provided on one side of the substrate 11, and the pixel definition layer 144 is provided on the side of the planarization layer 143 close to the isolation structure layer 12. Figure 4As shown, the first example is that the planarization layer 143 includes a first planarization portion 143a and a second planarization portion 143b, the size of the first planarization portion 143a in the first direction is larger than the size of the second planarization portion 143b in the first direction, and the size of the pixel definition layer 144 in the first direction remains unchanged. Figure 5 As shown in the second example, the planarization layer 143 includes a first planarization portion 143a and a second planarization portion 143b, the size of the first planarization portion 143a in the first direction is smaller than the size of the second planarization portion 143b in the first direction, and the size of the pixel definition layer 144 in the first direction remains unchanged. Figure 8 As shown, the third example is: the pixel definition layer 144 includes a first pixel definition portion 144a and a second pixel definition portion 144b, the size of the first pixel definition portion 144a in the first direction is larger than the size of the second pixel definition portion 144b in the first direction, and the size of the planarization layer 143 in the first direction remains unchanged. Fig. 9 As shown, the fourth example is: the pixel definition layer 144 includes a first pixel definition portion 144a and a second pixel definition portion 144b, the size of the first pixel definition portion 144a in the first direction is smaller than the size of the second pixel definition portion 144b in the first direction, and the size of the planarization layer 143 in the first direction remains unchanged. Fig.10 As shown, the fifth example is: the planarization layer 143 includes a first planarization portion 143a and a second planarization portion 143b, and the size of the first planarization portion 143a in the first direction is larger than the size of the second planarization portion 143b in the first direction. The pixel definition layer 144 includes a first pixel definition portion 144a and a second pixel definition portion 144b, and the size of the first pixel definition portion 144a in the first direction is larger than the size of the second pixel definition portion 144b in the first direction. Fig.11 As shown, the sixth example is: the planarization layer 143 includes a first planarization portion 143a and a second planarization portion 143b, and the size of the first planarization portion 143a in the first direction is smaller than the size of the second planarization portion 143b in the first direction. The pixel definition layer 144 includes a first pixel definition portion 144a and a second pixel definition portion 144b, and the size of the first pixel definition portion 144a in the first direction is smaller than the size of the second pixel definition portion 144b in the first direction.

[0130] In the above embodiment, six examples of the planarization layer 143 and the pixel definition layer 144 are provided when the display panel 10 includes the planarization layer 143 and the pixel definition layer 144. The user can choose according to the actual application, which can improve the applicability of the display panel 10.

[0131] See also Figure 2 In one embodiment, the isolation structure layer 12 further includes: a plurality of isolation openings 123 formed by the isolation structure 121 ; the display panel 10 further includes a plurality of light-emitting functional parts 15 , and the light-emitting functional parts 15 are correspondingly arranged in the isolation openings 123 .

[0132] It is understood that the light-emitting functional part 15 includes at least a light-emitting layer (Emission layer, EML), and may also include one or more of a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer (ETL), a hole blocking layer (HBL) and an electron blocking layer (EBL). Alternatively, the light-emitting functional part 15 may also be a laminated light-emitting layer, that is, including at least two light-emitting layers and a charge generation layer (CGL) located between each adjacent light-emitting layer.

[0133] In this embodiment, adjacent light-emitting functional parts 15 can be separated by the isolation structure 121, so as to avoid crosstalk between adjacent light-emitting functional parts 15 and improve the display effect of the display panel 10. In addition, by providing an isolation structure layer 12, the isolation structure layer 12 is provided with an isolation structure 121, and a plurality of isolation openings 123 formed by the isolation structure 121, the light-emitting functional part 15 can be prepared by a material patterning lithography process, thereby eliminating the need to use FMM and improving the pixel aperture ratio.

[0134] In an optional embodiment, the display panel 10 further includes an encapsulation layer, which is disposed on a side of the isolation structure layer 12 away from the substrate 11. The encapsulation layer is formed by inkjet printing (IJP) technology.

[0135] See also Figure 2 In one embodiment, the isolation structure 121 includes a first isolation layer 121a and a second isolation layer 121b, and the first isolation layer 121a is arranged on the side of the second isolation layer 121b away from the substrate 11; the touch electrode 13 includes a first electrode layer 13a and a second electrode layer 13b, and the first electrode layer 13a is arranged on the side of the second electrode layer 13b away from the substrate 11.

[0136] Along the first direction, the isolation structure 121 includes a second isolation layer 121b and a first isolation layer 121a sequentially disposed on one side of the substrate 11. Along the first direction, the touch electrode 13 includes a second electrode layer 13b and a first electrode layer 13a sequentially disposed on the substrate 11.

[0137] The distance between one end of the second isolation layer 121b close to the first isolation layer 121a and one end of the second isolation layer 121b away from the first isolation layer 121a is the same as the distance between one end of the second electrode layer 13b close to the first electrode layer 13a and one end of the second electrode layer 13b away from the first electrode layer 13a.

[0138] That is, the size of the second isolation layer 121 b in the first direction is the same as the size of the second electrode layer 13 b in the first direction.

[0139] In an optional embodiment, the first isolation layer 121a and the first electrode layer 13a are provided in the same layer. In other words, the first isolation layer 121a and the second electrode layer 13b can be prepared on the substrate 11 at the same time.

[0140] In an optional embodiment, the second isolation layer 121 b and the second electrode layer 13 b are disposed in the same layer. In other words, the second isolation layer 121 b and the second electrode layer 13 b can be prepared on the substrate 11 at the same time.

[0141] In an optional embodiment, the distance between one end of the first isolation layer 121a close to the second isolation layer 121b and one end of the first isolation layer 121a away from the second isolation layer 121b is the same as the distance between one end of the first electrode layer 13a close to the second electrode layer 13b and one end of the first electrode 13b away from the second electrode 13b.

[0142] That is, the size of the first isolation layer 121 a in the first direction is the same as the size of the first electrode layer 13 a in the first direction; the first direction is parallel to the thickness direction of the substrate 11 .

[0143] In this embodiment, the first isolation layer 121a and the first electrode layer 13a can be prepared by the same process, and the second isolation layer 121b and the second electrode layer 13b can be prepared by the same process. Such a display panel 10 has a simple preparation process and is easy to implement.

[0144] In one embodiment, Figure 2 As shown, the orthographic projection of the second isolation layer 121 b on the substrate 11 is located within the orthographic projection range of the first isolation layer 121 a on the substrate 11 .

[0145] The first isolation layer 121a and the second isolation layer 121b included in the isolation structure 121 can form an undercut structure with a "large top and small bottom", so that adjacent light-emitting functional parts 15 can be isolated during the evaporation process, thereby avoiding crosstalk between light-emitting functional parts 15 of different colors, thereby improving the display effect of the display panel 10.

[0146] The orthographic projection of the second electrode layer 13 b on the substrate 11 is located within the orthographic projection range of the first electrode layer 13 a on the substrate 11 .

[0147] The first electrode layer 13 a and the second electrode layer 13 b included in the touch electrode 13 may form an undercut structure with a “large upper portion and small lower portion”, which can improve the display effect of the display panel 10 .

[0148] In an optional embodiment, the planar distribution diagram of the display panel 10 is as follows: Fig.12 As shown, the isolation structure layer 12 in the display panel 10 is distributed in a grid shape.

[0149] See also Fig.13 One embodiment of the present application provides a method for preparing a display panel, the method comprising:

[0150] Step 1301: Provide a substrate.

[0151] Step 1302: forming an isolation structure layer and a touch electrode on one side of the substrate, wherein the isolation structure layer includes an isolation structure and an isolation gap; the isolation structure is connected to a fixed potential, the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate, and the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate.

[0152] An isolation structure material layer is formed on one side of the substrate, and the isolation structure material layer is patterned to form the isolation structure layer and the touch electrode. In other words, the isolation structure material layer can be exposed, developed, and etched using a mask to form the isolation structure layer and the touch electrode.

[0153] The isolation structure layer refers to a structure that can isolate adjacent light-emitting functional parts. The isolation structure layer includes an isolation structure and an isolation gap opened on the isolation structure. The touch electrode is arranged in the same layer as the isolation structure. The isolation structure in the isolation structure layer is used to connect a fixed potential. The touch electrode can be a TP trace in the display panel.

[0154] For the description of the isolation structure and the touch electrodes in the isolation structure layer, reference may be made to the specific description in the above embodiments, which will not be repeated here.

[0155] The method for preparing a display panel provided in the present embodiment forms an isolation structure layer and a touch electrode on one side of a substrate, wherein the isolation structure layer includes an isolation structure and an isolation gap, the isolation structure is connected to a fixed potential, the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate, and the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate. In the display panel prepared using the method for preparing a display panel provided in the present embodiment, the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate, which can reduce the mutual interference between the touch electrode and the isolation structure, that is, can reduce the influence of the isolation structure on the touch electrode, improve the touch signal-to-noise ratio, and thus improve the touch performance; it can also reduce the influence of the touch electrode on the isolation structure, and improve the display effect of the display panel. Moreover, the method for preparing a display panel provided in the present embodiment can form an isolation structure layer and a touch electrode using the same mask plate, which has a low preparation cost and higher practicality.

[0156] In one embodiment, Fig.14 As shown, before forming the isolation structure layer and the touch electrode on one side of the substrate, the preparation method further includes:

[0157] Step 1401, forming an insulating structure layer on one side of the substrate, the insulating structure layer comprising a first insulating portion and a second insulating portion; an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within the range of an orthographic projection of the first insulating portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within the range of an orthographic projection of the second insulating portion on the substrate;

[0158] A size of the first insulating portion in a first direction is different from a size of the second insulating portion in the first direction, and the first direction is parallel to a thickness direction of the substrate.

[0159] After providing the substrate, an insulating structure layer is first formed on one side of the substrate, and then an isolation structure layer and a touch electrode are formed on the insulating structure layer. The formed insulating structure layer may include a first insulating portion and a second insulating portion in the second direction. The second direction is perpendicular to the first direction. The first insulating portion corresponds to the touch electrode, that is, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is within the range of the orthographic projection of the first insulating portion on the substrate. The second insulating portion corresponds to the isolation structure, that is, the orthographic projection of one end of the isolation structure close to the substrate on the substrate is within the range of the orthographic projection of the second insulating portion on the substrate. The distance between one end of the first insulating portion close to the touch electrode and one end close to the substrate is different from the distance between one end of the second insulating portion close to the isolation structure and one end close to the substrate.

[0160] In an optional embodiment, a size of the first insulating portion in the first direction is greater than a size of the second insulating portion in the first direction.

[0161] In another optional embodiment, a dimension of the first insulating portion in the first direction is smaller than a dimension of the second insulating portion in the first direction.

[0162] In an optional embodiment, the distance between one end of the isolation structure close to the substrate and one end of the isolation structure away from the substrate is the same as the distance between one end of the touch electrode close to the substrate and one end of the touch electrode away from the substrate.

[0163] It can be understood that, in the display panel, along the thickness direction of the display panel, the size of the overall structure of the isolation structure is the same as the size of the overall structure of the touch electrode.

[0164] The materials of the insulating structure layer are different, and the processes used to form the insulating structure layer on one side of the substrate are different.

[0165] In an optional embodiment, if the insulating structure layer is made of an organic material, a half-tone mask process may be used to pattern the insulating structure material layer to form the insulating structure layer.

[0166] In this embodiment, before preparing the isolation structure layer, an insulating structure layer is first formed on one side of the substrate, and the insulating structure layer includes a first insulating part and a second insulating part. The size of the first insulating part in the first direction is different from the size of the second insulating part in the first direction, so that the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate, thereby reducing the mutual interference between the touch electrode and the isolation structure, thereby improving the touch signal-to-noise ratio, improving the touch performance, and the display effect of the display panel, thereby improving the practicability and reliability of the preparation method.

[0167] In one embodiment, an implementation method of forming an insulating structure layer on one side of a substrate includes:

[0168] A planarization layer is formed on one side of the substrate, the planarization layer includes a first planarization portion and a second planarization portion, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first planarization portion on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second planarization portion on the substrate; the size of the first planarization portion in the first direction is different from the size of the second planarization portion in the first direction.

[0169] In this embodiment, the material of the insulating structure layer is an organic material, which is a planarization layer. After providing a substrate, a planarization layer is formed on one side of the substrate. The formed planarization layer includes a first planarization portion and a second planarization portion in the second direction. The first planarization portion corresponds to the touch electrode, that is, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first planarization portion on the substrate. The second planarization portion corresponds to the isolation structure, that is, the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second planarization portion on the substrate.

[0170] The distance between one end of the first planarized portion close to the touch electrode and one end close to the substrate is different from the distance between one end of the second planarized portion close to the isolation structure and one end close to the substrate.

[0171] In an optional embodiment, a size of the first planarized portion in the first direction is greater than a size of the second planarized portion in the first direction.

[0172] In another optional embodiment, a size of the first planarized portion in the first direction is smaller than a size of the second planarized portion in the first direction.

[0173] In this embodiment, before preparing the isolation structure layer, a planarization layer is first formed on one side of the substrate, and the planarization layer includes a first planarization portion and a second planarization portion. The size of the first planarization portion in the first direction is different from the size of the second planarization portion in the first direction, so that the distance between the isolation structure and the substrate and the distance between the touch electrode and the substrate are different, thereby reducing the mutual interference between the touch electrode and the isolation structure, thereby improving the touch signal-to-noise ratio, improving the touch performance, and the display effect of the display panel, so that the practicality and reliability of the preparation method can be improved.

[0174] In an optional embodiment, a metal layer and a planarization layer are sequentially formed on one side of the substrate. A size of a first planarization portion of at least one of the plurality of planarization layers in the first direction is different from a size of a second planarization portion in the first direction.

[0175] For the description of the multiple planarization layers formed in the display panel, reference may be made to the specific description in the above embodiments, which will not be repeated here.

[0176] In one embodiment, a method for forming a planarization layer on one side of a substrate includes:

[0177] A planarization layer is formed on one side of the substrate using a half-tone mask process.

[0178] Halftone mask process, namely halftone mask. Halftone mask forms two different film thicknesses through the partial light transmittance of a specific area, and controls the transmittance of different areas by controlling the thickness of the chromium film in different areas on the mask substrate. In other words, using halftone mask on one side of the substrate can be partially thickened, that is, the first flattening part of the flattening layer is thickened to form a flattening layer.

[0179] In this embodiment, the planarization layer can be formed on one side of the substrate by directly using a half-tone mask process. The preparation process for forming the planarization layer is simple and low in cost, and the practicability of the preparation method of the display panel can be improved.

[0180] In one embodiment, after forming a planarization layer on one side of the substrate, the preparation method further comprises:

[0181] A pixel definition layer is formed on one side of the planarization layer.

[0182] After forming a planarization layer on a substrate, a pixel definition layer is formed on the planarization layer.

[0183] In an optional embodiment, a plurality of pixel openings are provided on the pixel definition layer, that is, a plurality of isolation openings formed by the isolation structure, and a plurality of light-emitting functional parts are provided on the plurality of pixel openings.

[0184] In this embodiment, by preparing a planarization layer, the distance between the isolation structure and the substrate and the distance between the touch electrode and the substrate are made different, thereby reducing the mutual interference between the touch electrode and the isolation structure, thereby improving the touch signal-to-noise ratio, improving the touch performance, and the display effect of the display panel, thereby improving the practicability and reliability of the preparation method.

[0185] In an optional embodiment, the formed pixel definition layer includes a first pixel definition part and a second pixel definition part, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first pixel definition part on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second pixel definition part on the substrate.

[0186] The pixel definition layer includes a first pixel definition portion and a second pixel definition portion in the second direction. The first pixel definition portion corresponds to the touch electrode, that is, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first pixel definition portion on the substrate. The second pixel definition portion corresponds to the isolation structure, that is, the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second pixel definition portion on the substrate.

[0187] A size of the first pixel definition portion in the first direction is different from a size of the second pixel definition portion in the first direction.

[0188] The distance between one end of the first pixel definition portion close to the touch electrode and one end close to the substrate is different from the distance between one end of the second pixel definition portion close to the isolation structure and one end close to the substrate.

[0189] In an optional embodiment, a size of the first pixel definition portion in the first direction is greater than a size of the second pixel definition portion in the first direction.

[0190] In another optional embodiment, a size of the first pixel definition portion in the first direction is smaller than a size of the second pixel definition portion in the first direction.

[0191] In this embodiment, the pixel definition layer formed on one side of the planarization layer includes a first pixel definition part and a second pixel definition part. The size of the first pixel definition part in the first direction is different from the size of the second pixel definition part in the first direction, so that the distance between the isolation structure and the substrate and the distance between the touch electrode and the substrate can be different, thereby reducing the mutual interference between the touch electrode and the isolation structure, thereby improving the touch signal-to-noise ratio, improving the touch performance, and the display effect of the display panel.

[0192] In one embodiment, when the material of the pixel definition layer is an inorganic material, such as Fig.15 As shown, the implementation method of forming a pixel definition layer on one side of the planarization layer includes:

[0193] Step 1501 , forming a first sub-definition layer on one side of a planarization layer; the first sub-definition layer includes a first region and a second region.

[0194] Step 1502, forming a second sub-definition material layer on one side of the first sub-definition layer, and patterning the second sub-definition material layer to form a second sub-definition layer on the first area in the first sub-definition layer; the first area and the second sub-definition layer form a first pixel definition part, and the second area forms a second pixel definition part.

[0195] The first sub-definition layer is formed by vapor deposition on the entire surface of the planarization layer. The first sub-definition layer may include a first area and a second area in the second direction. The second sub-definition material layer is formed by vapor deposition on the first sub-definition layer, and the second sub-definition material layer is patterned using a mask plate to form the second sub-definition layer on the first area in the first sub-definition layer. That is, the second sub-definition layer is formed on the first area in the first sub-definition layer. The orthographic projection of the second sub-definition layer on the substrate may be within the orthographic projection range of the first area on the substrate, or may coincide with the orthographic projection of the first area on the substrate. The formed second sub-definition layer and the first area are the first pixel definition part in the pixel definition layer, and the second area in the first sub-definition layer is the second pixel definition part in the pixel definition layer.

[0196] In this embodiment, a first sub-definition layer is first formed on one side of the planarization layer, the first sub-definition layer including a first region and a second region; a second sub-definition material layer is then formed on the first sub-definition layer, and the second sub-definition material layer is patterned to form the second sub-definition layer on the first region of the first sub-definition layer, so that the second sub-definition layer and the first region form a first pixel definition portion of the pixel definition layer, and the second region in the first sub-definition layer forms a second pixel definition portion of the pixel definition layer. The preparation process for preparing the pixel definition layer including the first pixel definition portion and the second pixel definition portion provided in this embodiment is simple and easy to implement, so that the preparation method of the display panel has higher practicality.

[0197] In one embodiment, when the material of the pixel definition layer is an organic material, the implementation method of forming the pixel definition layer on one side of the planarization layer includes:

[0198] A pixel definition layer is formed on the planarization layer using a halftone mask process. The pixel definition layer includes a first pixel definition portion and a second pixel definition portion in the second direction. The size of the first pixel definition portion in the first direction is different from the size of the second pixel definition portion in the first direction.

[0199] For the description of the half-tone mask process, reference may be made to the specific description in the above embodiments, which will not be repeated here.

[0200] In an optional embodiment, a size of the first pixel definition portion in the first direction is greater than a size of the second pixel definition portion in the first direction.

[0201] In another optional embodiment, a size of the first pixel definition portion in the first direction is smaller than a size of the second pixel definition portion in the first direction.

[0202] In this embodiment, the pixel definition layer can be formed on the flattened side by directly using a half-tone mask process, which has a simple preparation process and low cost, and can improve the practicability of the method for preparing the display panel.

[0203] It should be noted that in the method for preparing the display panel provided in the embodiment of the present application, each film layer can be prepared by sputtering, chemical vapor deposition (CVD), vacuum deposition, pulsed laser deposition (PLD), atomic layer deposition (ALD), etc. The CVD method includes plasma enhanced chemical vapor deposition (PECVD), laser chemical vapor deposition (LCVD), low pressure chemical vapor deposition (LPCVD), etc.

[0204] An embodiment of the present application further provides a display device, comprising the display panel 10 described in any of the above embodiments.

[0205] The display device can be a laptop computer, a mobile phone, a wireless device, a personal digital assistant (PDA), a handheld or portable computer, a GPS receiver / navigator, a camera, an MP4 video player, a camcorder, a game console, a watch, a clock, a calculator, a television monitor, a flat-panel display, a computer monitor, a car display (e.g., an odometer display, etc.), a navigator, a cockpit controller and / or display, a display of a camera view (e.g., a display of a rearview camera in a vehicle), an electronic photo, an electronic billboard or sign, a projector, etc.

[0206] The display device provided in the present application includes the display panel 10 , and the display device has all the beneficial effects of the display panel 10 , which will not be described in detail herein.

[0207] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0208] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the present application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the present application shall be subject to the attached claims.

Claims

1. A display panel, characterized in that: include: substrate; An isolation structure layer, disposed on one side of the substrate, the isolation structure layer comprising an isolation structure and an isolation gap, the isolation structure being connected to a fixed potential; A touch electrode, disposed on one side of the substrate; The orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate; Along the thickness direction of the display panel, the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate.

2. The display panel according to claim 1, characterized in that: The display panel further includes: an insulating structure layer, provided between the isolation structure layer and the substrate, the insulating structure layer comprising a first insulating portion and a second insulating portion; an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within the range of an orthographic projection of the first insulating portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within the range of an orthographic projection of the second insulating portion on the substrate; A size of the first insulating portion in a first direction is different from a size of the second insulating portion in the first direction, and the first direction is parallel to a thickness direction of the substrate; Optionally, a size of the first insulating portion in the first direction is greater than a size of the second insulating portion in the first direction; Optionally, a size of the first insulating portion in the first direction is smaller than a size of the second insulating portion in the first direction; Optionally, the distance between one end of the isolation structure close to the substrate and one end of the isolation structure away from the substrate is the same as the distance between one end of the touch electrode close to the substrate and one end of the touch electrode away from the substrate.

3. The display panel according to claim 2, characterized in that: The insulating structure layer includes a planarization layer, which is disposed between the isolation structure and the substrate, the planarization layer includes a first planarization portion and a second planarization portion, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first planarization portion on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second planarization portion on the substrate; The size of the first planarized portion in the first direction is different from the size of the second planarized portion in the first direction; Optionally, a size of the first planarized portion in the first direction is greater than a size of the second planarized portion in the first direction; Optionally, a size of the first planarized portion in the first direction is smaller than a size of the second planarized portion in the first direction.

4. The display panel according to claim 3, characterized in that: The insulating structure layer comprises a plurality of the planarization layers, and a size of the first planarization portion in at least one of the planarization layers in the first direction is different from a size of the second planarization portion in the first direction; Optionally, a size of the first planarized portion in at least one of the planarized layers in the first direction is greater than a size of the second planarized portion in the first direction; Optionally, a size of the first planarized portion in at least one of the planarized layers in the first direction is smaller than a size of the second planarized portion in the first direction; Optionally, a size of the first planarized portion of other planarized layers among the plurality of planarized layers except the at least one planarized layer in the first direction is the same as a size of the second planarized portion in the first direction.

5. The display panel according to claim 2 or 3, characterized in that: The insulating structure layer includes a pixel definition layer, which is arranged between the isolation structure and the substrate, the pixel definition layer includes a first pixel definition part and a second pixel definition part, the orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within the range of the orthographic projection of the first pixel definition part on the substrate, and the orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within the range of the orthographic projection of the second pixel definition part on the substrate; The size of the first pixel definition portion in the first direction is different from the size of the second pixel definition portion in the first direction; Optionally, a size of the first pixel definition portion in the first direction is greater than a size of the second pixel definition portion in the first direction; Optionally, a size of the first pixel definition portion in the first direction is smaller than a size of the second pixel definition portion in the first direction.

6. The display panel according to claim 1, characterized in that: The isolation structure layer further includes: a plurality of isolation openings formed by the isolation structure; the display panel further includes a plurality of light-emitting functional parts, and the light-emitting functional parts are correspondingly arranged in the isolation openings.

7. The display panel according to claim 1, characterized in that: The isolation structure comprises a first isolation layer and a second isolation layer, wherein the first isolation layer is disposed on a side of the second isolation layer away from the substrate; the touch electrode comprises a first electrode layer and a second electrode layer, wherein the first electrode layer is disposed on a side of the second electrode layer away from the substrate; The distance between one end of the second isolation layer close to the first isolation layer and one end of the second isolation layer away from the first isolation layer is the same as the distance between one end of the second electrode layer close to the first electrode layer and one end of the second electrode layer away from the first electrode layer; Optionally, the first isolation layer and the first electrode layer are arranged in the same layer; Optionally, the second isolation layer and the second electrode layer are arranged in the same layer; Optionally, the distance between one end of the first isolation layer close to the second isolation layer and one end of the first isolation layer away from the second isolation layer is the same as the distance between one end of the first electrode layer close to the second electrode layer and one end of the first electrode layer away from the second electrode layer.

8. The display panel according to claim 7, characterized in that: The orthographic projection of the second isolation layer on the substrate is within the range of the orthographic projection of the first isolation layer on the substrate; The orthographic projection of the second electrode layer on the substrate is located within the orthographic projection range of the first electrode layer on the substrate.

9. A method for preparing a display panel, characterized in that: The preparation method comprises: providing a substrate; An isolation structure layer and a touch electrode are formed on one side of the substrate, wherein the isolation structure layer includes an isolation structure and an isolation gap; the isolation structure is connected to a fixed potential, the orthographic projection of the touch electrode on the substrate is located within the orthographic projection of the isolation gap on the substrate, and the distance between the isolation structure and the substrate is different from the distance between the touch electrode and the substrate.

10. The preparation method according to claim 9, characterized in that: Before forming the isolation structure layer and the touch electrode on one side of the substrate, the preparation method further includes: An insulating structure layer is formed on one side of the substrate, the insulating structure layer comprising a first insulating portion and a second insulating portion; an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within the range of an orthographic projection of the first insulating portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within the range of an orthographic projection of the second insulating portion on the substrate; A size of the first insulating portion in a first direction is different from a size of the second insulating portion in the first direction, and the first direction is parallel to a thickness direction of the substrate; Optionally, a size of the first insulating portion in the first direction is greater than a size of the second insulating portion in the first direction; Optionally, a size of the first insulating portion in the first direction is smaller than a size of the second insulating portion in the first direction; Optionally, the distance between one end of the isolation structure close to the substrate and one end of the isolation structure away from the substrate is the same as the distance between one end of the touch electrode close to the substrate and one end of the touch electrode away from the substrate.

11. The preparation method according to claim 10, characterized in that: The insulating structure layer is formed on one side of the substrate, comprising: A planarization layer is formed on one side of the substrate, the planarization layer includes a first planarization portion and a second planarization portion, an orthographic projection of an end of the touch electrode close to the substrate on the substrate is located within the range of an orthographic projection of the first planarization portion on the substrate, and an orthographic projection of an end of the isolation structure close to the substrate on the substrate is located within the range of an orthographic projection of the second planarization portion on the substrate; The size of the first planarized portion in the first direction is different from the size of the second planarized portion in the first direction; Optionally, a size of the first planarized portion in the first direction is greater than a size of the second planarized portion in the first direction; Optionally, a size of the first planarized portion in the first direction is smaller than a size of the second planarized portion in the first direction.

12. The preparation method according to claim 11, characterized in that: The step of forming a planarization layer on one side of the substrate comprises: The planarization layer is formed on one side of the substrate by using a half-tone mask process.

13. The preparation method according to claim 9, characterized in that: After forming a planarization layer on one side of the substrate, the preparation method further includes: forming a pixel definition layer on one side of the planarization layer; Optionally, the pixel definition layer includes a first pixel definition portion and a second pixel definition portion, an orthographic projection of one end of the touch electrode close to the substrate on the substrate is located within a range of an orthographic projection of the first pixel definition portion on the substrate, and an orthographic projection of one end of the isolation structure close to the substrate on the substrate is located within a range of an orthographic projection of the second pixel definition portion on the substrate; a size of the first pixel definition portion in a first direction is different from a size of the second pixel definition portion in the first direction; Optionally, a size of the first pixel definition portion in the first direction is greater than a size of the second pixel definition portion in the first direction; Optionally, a size of the first pixel definition portion in the first direction is smaller than a size of the second pixel definition portion in the first direction.

14. The preparation method according to claim 13, characterized in that: The forming of a pixel definition layer on one side of the planarization layer comprises: forming a first sub-definition layer on one side of the planarization layer; the first sub-definition layer includes a first region and a second region; A second sub-definition material layer is formed on one side of the first sub-definition layer, and the second sub-definition material layer is patterned to form a second sub-definition layer on a first area in the first sub-definition layer; the first area and the second sub-definition layer form the first pixel definition part, and the second area forms the second pixel definition part.

15. A display device, characterized in that: The invention comprises a display panel as claimed in any one of claims 1 to 8.

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