Display panel and display module

Abstract

The invention provides a display panel and a display module. The display panel comprises a substrate, light-emitting units, first electrodes and isolation structures, the isolation structures are arranged on one side of the substrate and define a plurality of isolation openings, the light-emitting units are at least partially located in the isolation openings, the light-emitting units are covered with the first electrodes, the first electrodes comprise thinning parts and main body parts, and the thinning parts are arranged on the main body parts. The main body part covers the central area of the isolation opening and extends outwards to form the thinning part, at least part of the thinning part is electrically connected with the isolation structure, and the thickness of the thinning part is smaller than that of the main body part. By controlling the morphology of the first electrode, the effective lap joint with the isolation structure is realized, meanwhile, the lap joint resistance can be reduced, and the subsequent display abnormity can be reduced.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display panel and a display module. Background Art

[0002] Organic Light-Emitting Diode (OLED) is an organic thin film electroluminescent unit. It has attracted great attention and is widely used in electronic display products due to its advantages such as simple preparation process, low cost, low power consumption, high brightness, wide viewing angle, high contrast and flexible display.

[0003] However, current electronic display products are limited by their own structural design and are prone to display anomalies. Summary of the invention

[0004] In view of this, an object of the present disclosure is to provide a display panel and a display module, wherein the display panel can reduce display abnormality.

[0005] Based on the above objectives, the present disclosure discloses a display panel in a first aspect, comprising:

[0006] substrate, first electrode, light emitting unit and isolation structure,

[0007] The isolation structure layer is disposed on the substrate, includes a plurality of isolation structures, and encloses a plurality of isolation openings.

[0008] The light emitting unit is at least partially located in the isolation opening,

[0009] The first electrode covers the light-emitting unit and includes a thinned portion and a main portion. The main portion covers the central area of ​​the isolation opening and extends outward to form the thinned portion. At least part of the thinned portion is electrically connected to the isolation structure, and the thickness of the thinned portion is less than the thickness of the main portion.

[0010] In one embodiment, the first electrode includes a thinned portion and a main portion, the edge of the thinned portion overlaps the isolation structure and the thickness of the thinned portion decreases as it approaches the isolation structure.

[0011] Preferably, the thinned portion includes an overlapping region and a transition region, and the overlapping region is electrically connected to the isolation structure.

[0012] In one embodiment, the edges of the first electrode on opposite sides respectively include thinned portions, and the thinned portions are respectively electrically connected to the matching isolation structures.

[0013] Preferably, the thinned portions of the edges of the first electrode on opposite sides respectively include an overlap region and a transition region, and the overlap region is electrically connected to the matching isolation structure.

[0014] Preferably, the transition zone is located between the main body and the overlapping zone, and includes a first transition zone and a second transition zone, the first transition zone is close to the overlapping zone, the second transition zone is close to the main body, and the overlapping zone is electrically connected to the isolation structure.

[0015] In one embodiment, the isolation structure includes a support portion, a base portion and a crown portion, wherein the base portion is disposed on one side of the support portion, the base portion is disposed on the substrate, the crown portion is disposed on a side of the support portion away from the substrate, and both sides of the crown portion have ends, and the thickness of the end portions in the region corresponding to the orthographic projection of the first electrode is less than or equal to 70% of the thickness of the main body of the first electrode.

[0016] Preferably, the support portion is made of aluminum, the base portion is made of molybdenum or titanium nitride, and the crown portion is made of titanium.

[0017] In one embodiment, the orthographic projection of the end portion on the first electrode is located in the transition region, and the ratio of the thickness of the transition region to the thickness of the main body is less than or equal to 0.7.

[0018] Preferably, the ratio of the thickness of the transition zone to the thickness of the main body film layer is in the range of 0.3 to 0.7.

[0019] Preferably, the orthographic projection of the end portion on the first electrode is located in a first transition region of the first electrode, and the ratio of the thickness of the first transition region to the thickness of the main body portion is less than or equal to 0.7.

[0020] Preferably, the orthographic projection of the end portion on the first electrode coincides with a first transition region of the first electrode, and a ratio of a thickness of the first transition region to a thickness of the main body portion is in a range of 0.3 to 0.7.

[0021] In one embodiment, the thickness ratio of the main body to the base is less than 2.

[0022] Preferably, the thickness ratio of the main body to the base is less than or equal to 1.5.

[0023] Preferably, a thickness ratio of the main body portion to the base portion is in a range of 1.01 to 1.4.

[0024] In one embodiment, the first electrode is overlapped on a part of the side surface of the support portion and the base or overlapped on the base.

[0025] Preferably, the thinned portion overlaps part of the side surface of the supporting portion and the base or overlaps the base.

[0026] In one embodiment, a pixel defining layer is further included, and the pixel defining layer is disposed on the substrate.

[0027] The isolation structure is disposed on a side of the pixel definition layer away from the substrate.

[0028] In one embodiment, the display panel further comprises a planar layer disposed on one side of the substrate, the pixel defining layer is disposed on a side of the planar layer away from the substrate, and a second electrode is disposed on the side of the planar layer away from the substrate.

[0029] Preferably, the planar layer covers the display area or covers the display area and a non-display area outside the display area.

[0030] In one embodiment, the pixel defining layer is provided with a pixel opening, the main body portion is projected on the substrate to cover the pixel opening and a portion of the pixel defining layer around the pixel opening, and the pixel opening corresponds to the position of the isolation opening and has an inclined surface;

[0031] Preferably, an angle α between the inclined surface and a plane where the substrate is located or an angle α between the inclined surface and a plane where the second electrode is located is between 30° and 75°.

[0032] Based on the same concept, the present application proposes a display module, which includes the display panel as described above.

[0033] Compared with the prior art, the present disclosure provides a first electrode (cathode) and optimizes its structure. A thinning portion is provided on the overlapping isolation structure side of the first electrode, at least part of the thinning portion is electrically connected to the isolation structure, and the thickness of the thinning portion is less than the thickness of other areas of the first electrode. In this way, the first electrode can reduce the overlapping resistance while realizing an effective overlapping isolation structure, thereby avoiding potential display abnormalities. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions in the present disclosure or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0035] Figure 1 is a schematic diagram of a display panel according to an embodiment of the present disclosure;

[0036] Figure 2 for Figure 1Schematic diagram of the cross section at A in the middle;

[0037] Figure 2a for Figure 2 A schematic diagram of an isolation structure overlapped on one side of the first electrode;

[0038] Figure 3 This is a schematic diagram of an electrode covered on an insulating layer according to an embodiment of the present disclosure;

[0039] Figure 4 is a schematic diagram of an electrode preparation system according to an embodiment of the present disclosure;

[0040] Figure 5 The figure is a schematic diagram of a process for preparing an electrode according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0041] In order to make the objectives, technical solutions and advantages of the present disclosure more clearly understood, the present disclosure is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0042] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the embodiments of the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0043] The manufacturing process of OLED (Organic Light-Emitting Diode) display products is roughly divided into the array substrate stage, the light-emitting layer preparation stage and the module stage.

[0044] During the preparation stage of the light-emitting layer, the light-emitting unit is vapor-deposited on the entire surface of the array substrate with an isolation structure, and then the cathode layer is vapor-deposited on the light-emitting unit and the packaging layer is deposited. The light-emitting layer (sub-pixel) is made on the array substrate by etching. Only when the cathode can be normally connected to the isolation structure (also called auxiliary cathode) can the sub-pixel be turned on after power is applied and light up normally.

[0045] The applicant conducted further research on the cathode and found that the morphology of the cathode has an important influence on whether the cathode is normally overlapped with the auxiliary cathode. If the cathode overlap is abnormal, the resistance value at the overlap is higher than the preset value, and there is a hidden danger of causing abnormal display of the corresponding sub-pixel in subsequent use.

[0046] To this end, the applicant proposes a display panel and a display module. The display panel includes a substrate, a light-emitting unit, a first electrode and an isolation structure, wherein the isolation structure is disposed on one side of the substrate and encloses a plurality of isolation openings, wherein the light-emitting unit is at least partially located in the isolation openings, and the first electrode covers the light-emitting unit and includes a thinning portion, wherein at least part of the thinning portion is electrically connected to the isolation structure, and the thickness of the thinning portion is less than the thickness of other regions of the first electrode, and the morphology of the first electrode is designed in this way, wherein the first electrode has a thinning portion, which can be reliably overlapped with the isolation structure / auxiliary cathode, and can reduce display abnormalities caused by poor overlap.

[0047] Next, the electrode preparation method, display panel and display module proposed in the present application are described in conjunction with the accompanying drawings.

[0048] like Figure 1 Shown is a schematic diagram of a display panel according to an embodiment of the present application.

[0049] The display panel 100 includes a light emitting area 110 and a non-light emitting area 120 (also called a frame area) located outside the light emitting area 110 .

[0050] The light-emitting area 110 includes regularly arranged light-emitting devices 111, each of which includes a plurality of sub-pixels, such as red sub-pixels, green sub-pixels and blue sub-pixels (not shown) or red sub-pixels, green sub-pixels, blue sub-pixels and white sub-pixels.

[0051] In this embodiment, the sub-pixels of the light-emitting area are obtained by full-surface evaporation and etching, and the preparation process does not require a mask plate. For example, the array substrate is evaporated and etched to prepare red sub-pixels, and the array substrate is evaporated and etched to prepare green sub-pixels. In this way, a high PPI (Pixels Per Inch, also called pixel density unit) display panel can be obtained. If the sub-pixels are prepared by full-surface evaporation and etching on the array substrate, there is no restriction on the order of preparing red / green / blue sub-pixels.

[0052] Next, combine Figure 2 Take a pixel as an example to describe the structure of the pixel. Figure 2 for Figure 1 The structure of the cross section at point A is shown in the figure, with the packaging layer hidden.

[0053] The display panel includes a substrate 130 , an insulating layer 140 , a second electrode 141 , a light emitting unit 160 , a first electrode 170 and an isolation function layer.

[0054] The substrate 130 is a flexible substrate, and its material can be selected from polyimide (PI), polyethylene naphthalate (PEN) or polyethylene terephthalate (PET), etc., and the material can also be a mixture of the above materials, or the substrate 130 can be a hard substrate, which can be selected from glass. Preferably, one side of the substrate has a driving circuit for driving pixels, and the topology of the driving circuit can be a 7T1C circuit, a 7T2C circuit, an 8T1C circuit, an 8T2C circuit, etc., which is not limited here, so as to achieve driving pixels. The material of the substrate can be selected from polyimide (PI), polyethylene naphthalate (PEN) or polyethylene terephthalate (PET), etc., and it can also be a mixture of the above materials, or it can be formed by materials such as glass.

[0055] The second electrode 141 is disposed on the substrate 130. In the same light-emitting device, the second electrodes 141 of multiple sub-pixels can be connected to each other, and the cathodes / second electrodes are physically isolated from each other to achieve independent control of the sub-pixels. That is, the cathodes of different sub-pixels are not directly or indirectly electrically connected together. Preferably, the cathodes corresponding to the sub-pixels can be connected to the external circuit through a separately arranged wiring, or connected to the external circuit through an auxiliary electrode.

[0056] The insulating layer 140 (also called a pixel defining layer) is disposed on the substrate 130, and defines a pixel opening. The pixel defining layer is configured to cover the gap between adjacent second electrodes 141. The pixel defining opening exposes at least a portion of the second electrode 141 to be electrically connected to the light emitting unit 160 above it. The pixel defining layer can be prepared by a patterning process, and is used to define a pixel opening of a pixel in the light emitting region. The shape of the pixel opening matches the shape of the pixel, such as a square, a diamond, a circle, or an ellipse, etc., which is not limited here.

[0057] Preferably, a flat layer is disposed on one side of the substrate 130, and the pixel defining layer is disposed on the side of the flat layer away from the substrate 130. A second electrode 141 is disposed on the side of the flat layer away from the substrate 130, and the flat layer covers the display area. Preferably, the flat layer covers the display area and the non-display area. In other embodiments, the second electrode 141 is embedded in the flat layer away from the substrate 130, and the top surface is exposed to be electrically connected to the light-emitting unit 160 above it.

[0058] The isolation functional layer includes a plurality of isolation structures 150, and the isolation structures enclose a plurality of isolation openings 154. The isolation structure 150 includes a support portion 151, a base portion 152 and a crown portion 153 (roof), wherein the base portion 152 is disposed on one side of the support portion 151, the base portion 152 is disposed on the pixel defining layer 140, and the crown portion 153 is disposed on the side of the support portion 151 away from the pixel defining layer 140. The crown portion 153 has end portions 153a (edge ​​points of the roof) on both sides respectively. The orthographic projection of the end portion 153a of the crown portion 153 on the substrate corresponds to 70% or less of the thickness h2 of the film layer (transition zone) of the first electrode / cathode region and the thickness h1 of the film layer of the main body (such as the main flat area). Preferably, the support portion 151 is made of aluminum. The base portion 152 is made of molybdenum or titanium nitride. The crown portion 153 is made of titanium. The composition, preparation, etc. of the isolation structure (also called partition structure or isolation column) are further described in patents CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 099419, and PCT / CN2024 / 099072 for reference.

[0059] The light emitting unit 160 is at least partially located in the isolation opening, and a side thereof close to the substrate is electrically connected to the second electrode 141 (anode), and a side thereof away from the second electrode 141 (anode) covers the first electrode.

[0060] The first electrode covers the light-emitting unit 160, and at least part of it overlaps the isolation structure 150 (auxiliary electrode). The first electrode has a thinned portion, the thickness of which is less than the thickness of other regions of the first electrode. Preferably, the edge of the thinned portion overlaps the isolation structure and the thickness is thinner as it is closer to the isolation structure. In this way, the isolation structure is effectively overlapped while reducing the overlap resistance, avoiding potential display abnormality problems.

[0061] In one embodiment, one side of the first electrode overlaps the side surface of the partial support portion 151 and the base 152 or overlaps the base 152. In one embodiment, the edges of the first electrode on opposite sides have thinning portions, respectively, and the thinning portions overlap the side surface of the partial support portion 151 and the base 152 or overlap the base 152. The first electrode is a cathode, and the first electrode includes a thinning portion and a main body, and the thinning portion is configured to have a thickness less than the thickness of other regions (such as the main body). Preferably, the thinning portion may include an overlapping area and a transition area. The first electrode is obtained by full-surface evaporation during production, and within the isolation opening, a circle of the edge is the thinning portion, which satisfies at least part of the thinning portion to be electrically connected to the isolation structure.

[0062] Take a cross section of a sub-pixel as an example (taken along the thickness direction of the substrate 130), and continue to refer to Figure 2 (the edges of the first electrode on the two corresponding sides overlap the isolation structure respectively) and Figure 2a , Figure 2a for Figure 2 The enlarged diagram on the left side of the middle dotted line (the isolation structure overlaps one side of the first electrode). The first electrode has a thinned portion, and the thickness / film thickness of the cathode (in the y direction) is less than the thickness of other areas of the first electrode. Preferably, the edge of the thinned portion overlaps the isolation structure and the thickness is thinner as it is closer to the isolation structure. This allows the cathode to effectively overlap the isolation structure while reducing the overlap resistance, avoiding potential display abnormalities. The thinned portion can be obtained by single evaporation source (also called single souece) evaporation during preparation. In this embodiment, the total height h3 (see Figure 2 ) is between 7000 and 15000 angstroms. In this embodiment, one side of the cathode is overlapped with the isolation structure, and the structure of the other side of the cathode overlapping with the isolation structure is the same or substantially the same (a completely symmetrical structure cannot be produced due to process limitations). In the x direction, the width of the crown 153 is wider than the width of the base 152, that is, the projection of the crown 153 on the pixel defining layer covers the projection of the base 152 on the pixel defining layer. The positive projection a of the end 153a of one side of the crown 153 on the first electrode is located in the transition zone.

[0063] The pixel defining layer 140 is provided with a pixel opening, and the main body is projected on the substrate to cover the pixel opening and the part of the pixel defining layer 140 around the pixel opening. The pixel opening has an inclined surface 142, and the angle between the inclined surface 142 and the plane where the substrate 130 is located / the angle between the plane where the second electrode 141 is located is α (sometimes also called the slope angle), and α is between 30° and 75° (30°, 45°, 60°, 75°). One side of the inclined surface 142 covers the second electrode 141 (covering part of the surface of the second electrode), and the other side of the inclined surface 142 has a flat portion 142a, and the isolation structure 150 is arranged on the flat portion 142a. The second electrode is an anode, which can be made of ITO material and is used to electrically connect the light-emitting unit thereon. In this embodiment, the combination of the inclined surfaces 142 encloses a pixel opening, and the pixel opening is interconnected with the isolation. In this embodiment, some film layers in the light-emitting unit, such as the light-emitting layer, can be prepared by non-evaporation methods such as inkjet printing. Specifically, the materials of the film layers can be selected. For example, when the film layers are polymer materials and are not suitable for evaporation, inkjet printing can be used for preparation. The first electrode, i.e., the cathode, can be prepared by evaporation. In this embodiment, when preparing the cathode, a conductive layer is evaporated on the light-emitting unit in a coordinated manner using an evaporation device, and then the first electrode (cathode) is obtained by etching (removing the conductive layer in irrelevant areas). The evaporation device includes a first evaporation chamber CTD1 and a second evaporation chamber CTD2.

[0064] During evaporation, the evaporation angle is limited by the evaporation sources in the first evaporation chamber CTD1 and the second evaporation chamber CTD2.

[0065] Next, combine Figure 3 and Figure 4 Taking the cathode covering the pixel definition layer (omitting the light-emitting unit below it) as an example, the structure / morphology of the first electrode (cathode) deposited by the first evaporation chamber CTD1 and the second evaporation chamber CTD2 is described, and the isolation structure / auxiliary cathode (see FIG. Figure 4 ).

[0066] The first electrode 170 includes a thinning portion and a main body portion. The thinning portion includes an overlapping region 171 and a transition region. The transition region includes a first transition region 172 and a second transition region 173 .

[0067] The first transition zone 172 is close to the overlapping zone 171, and the second transition zone 173 is close to the main body. The overlapping zone overlaps the isolation structure, and (in the y direction) the overlapping zone overlaps the isolation structure and the closer to the isolation structure, the thinner the overlapping zone. The overlapping zone can be obtained by single evaporation source (also called single souece) evaporation during preparation. The film thickness of the main body is greater than the film thickness of the transition zone, and the film thickness of the transition zone is greater than the film thickness of the overlapping zone. The main body includes a main flat area 174 and a main climbing area 175. In this embodiment, the film thickness in the main flat area is the same or approximately the same. The film thickness of the main climbing area 175 is the same or approximately the same as the film thickness of the main flat area 174.

[0068] Preferably, the film thickness h2 of the first transition region 172 (ie, the region where the first electrode / cathode is located corresponding to the orthographic projection of the end of the crown portion on the first electrode) is less than 70% of the film thickness h1 of the main flat region 174 of the main body.

[0069] In one embodiment, the ratio of the thickness h2 of the film layer (first transition zone 172) corresponding to the orthographic projection of the end 153a of the crown 153 on the first electrode to the thickness h1 of the film layer of the main flat zone 174 is less than or equal to 0.7 (i.e., less than 0.7 times), that is, the orthographic projection of the end on the first electrode is located in the first transition zone of the transition zone, the main body includes the main flat zone, and the ratio of the thickness of the first transition zone to the thickness of the film layer of the main flat zone is less than or equal to 0.7. Preferably, the ratio of the thickness h2 of the first transition zone 172 to the thickness h1 of the film layer of the main flat zone 174 is between 0.3 and 0.7 (e.g., 0.3, 0.35, 0.4, 0.45, 0.5, 0.55, 0.6, 0.65, etc.), that is, the thickness h2 of the first transition zone 172 corresponding to the orthographic projection of the end 153a of the crown 153 on the first electrode is less than 0.7 times the thickness h1 of the main flat zone 174.

[0070] Preferably, the film thickness h1 of the main flat area 174 is less than 2 times the thickness (y direction) of the base 152. Further, the film thickness h1 of the main flat area 174 is less than or equal to 1.5 times (e.g., 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, 1.1, 1.2, 1.3, 1.4, 1.5) the thickness (y direction) of the base 152, such as the film thickness h1 of the main flat area 174 is 1.01 to 1.4 times the thickness of the base 152. For example, the film thickness h1 of the main flat area 174 is 0.5 to 1.4 times the thickness of the base 152.

[0071] In one embodiment, the first electrode / cathode overlap region 171 and the first transition region 172 are evaporated by the second evaporation chamber CTD2 (see Figure 3The second transition area 173, the main body flat area 174 and the main body climbing area 175 are double-deposited by the first evaporation chamber CTD1 and the second evaporation chamber CTD2 (see Figure 3 In the middle area A), the area corresponding to the inclined surface 142 covers the main climbing area 175, so as to realize the morphology control of the prepared cathode and prepare a cathode of a predetermined shape (thickness). In this method, the first electrode of the cooperative evaporation of the first evaporation chamber CTD1 and the second evaporation chamber CTD2 is used. There is an area on the overlapping side of the first electrode and the isolation structure. The thickness of the first electrode is thinned by single souece evaporation in the first evaporation chamber CTD1 or the second evaporation chamber CTD2. The morphology of the prepared / evaporated electrode can be controlled to prepare a predetermined shape (thickness), so that the first electrode can effectively overlap the isolation structure while reducing the overlap resistance, avoiding potential display abnormalities.

[0072] It should be noted that the display panel can also be configured to include other functional structures, for example, the display panel can also include a touch structure to have a touch function. For example, the touch structure can be a touch panel or a touch layer, and the touch panel can be arranged in the display panel by laminating, for example, the touch layer can be directly prepared on the encapsulation layer of the display panel, so as to facilitate the thin and light design of the display panel.

[0073] like Figure 4 Shown is a schematic diagram of the electrode (cathode) preparation system proposed in the present disclosure.

[0074] The preparation system includes an evaporation device having two evaporation chambers, namely a first evaporation chamber CTD1 and a second evaporation chamber CTD2. Preferably, the evaporation angle of the first evaporation chamber CTD1 is symmetrical to the evaporation angle of the second evaporation chamber CTD2.

[0075] The first evaporation chamber CTD1 and the second evaporation chamber CTD2 are respectively provided with evaporation sources. The evaporation source is a Mg-containing evaporation source, an Ag-containing evaporation source or a combination thereof. In this embodiment, the first evaporation chamber CTD1 has a first evaporation source and a second evaporation source, and the second evaporation chamber CTD2 has a third evaporation source and a fourth evaporation source, wherein the material of the first evaporation source is the same as that of the third evaporation source, such as an Mg-containing evaporation source. The material of the second evaporation source is the same as that of the fourth evaporation source, such as an Ag-containing evaporation source. The evaporation angle of the Ag-containing evaporation source in the first evaporation chamber CTD1 is between 0 and 70°, and the evaporation angle of the Ag-containing evaporation source in the second evaporation chamber CTD1 is between 0 and -70°. The evaporation angle of 0° is the perpendicular direction between the evaporation source and the substrate, the evaporation angle in the clockwise direction is positive, and the evaporation angle in the counterclockwise direction is negative. The plating rate ratio of Mg to Ag in the same evaporation chamber is between 1:7 and 1:10. Preferably, the plating rate ratio of Mg to Ag is 1:9. The plating rate ratio of the second evaporation chamber CTD2 to the first evaporation chamber CTD1 is 1:1-2:1.

[0076] When preparing the cathode, the substrate to be evaporated is suspended above the first evaporation chamber CTD1 and the second evaporation chamber CTD2, and moves from the first evaporation chamber CTD1 side to the second evaporation chamber CTD2 side to evaporate a conductive layer on the substrate (after patterning, the cathode is obtained). If a carrier is used to suspend above the first evaporation chamber CTD1 and the second evaporation chamber CTD2, the substrate, the first evaporation chamber CTD1 and the second evaporation chamber CTD2 are all in a closed environment.

[0077] like Figure 5 The figure shows a schematic process of the method for preparing the electrode proposed in the present disclosure.

[0078] The preparation method utilizes the above-mentioned preparation system and comprises the following steps:

[0079] The substrate to be evaporated is moved. In this step, the carrier is used to move the substrate to be evaporated. Specifically, the substrate is moved from the first evaporation chamber CTD1 to the second evaporation chamber CTD2. In other embodiments, the substrate may also be moved from the second evaporation chamber CTD2 to the first evaporation chamber CTD1.

[0080] While the substrate is being moved, the first vapor deposition chamber CTD1 and the second vapor deposition chamber CTD2 symmetrically arranged at the vapor deposition angle below the substrate are used to sequentially vapor deposit the surface of the substrate to form a conductive layer on the substrate.

[0081] The conductive layer is patterned to form a cathode.

[0082] Among them, the plating rate ratio of the second evaporation chamber CTD2 to the first evaporation chamber CTD1 is between 1:1 and 2:1, the evaporation angle of the Ag evaporation source in the first evaporation chamber CTD1 is between 0 and 70° (0° is perpendicular to the substrate), and the evaporation angle of the Ag evaporation source in the second evaporation chamber CTD1 is between 0 and -70°. The preparation method uses the symmetrical or nearly symmetrical first evaporation chamber CTD1 and the second evaporation chamber CTD2 to adjust the morphology of the cathode film, obtain a cathode with a specific morphology (thinning the thickness of the overlapping area), and achieve effective overlap between the cathode and the isolation structure / auxiliary electrode while reducing the overlap resistance and reducing the abnormality caused by the overlap. The evaporation angle of 0° is the perpendicular direction between the evaporation source and the substrate, the clockwise evaporation angle is positive, and the counterclockwise evaporation angle is negative.

[0083] Preferably, the cathode of the preparation method is used in an LED display panel to prepare a cathode. Furthermore, the conductive layer deposited by the preparation method is stacked on the light-emitting layer, and a cathode of a light-emitting device / sub-pixel with a specific morphology is obtained in this way, which reduces the overlap resistance while achieving reliable overlap, and can reduce subsequent display abnormalities.

[0084] Some other embodiments of the present application provide a display device, which includes the display panel in the above embodiment. The pixel density range of the display device is 400PPI to 7000PPI, which is suitable for scenes such as televisions and laptops, and can also make the product suitable for use in micro-display products (such as AR, VR, etc.). Furthermore, the display device can be any product or component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop computer, a navigator, a console, etc.

[0085] It should be noted that the above describes some embodiments of the present disclosure. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in an order different from that in the above embodiments and still achieve the desired results. In addition, the processes depicted in the accompanying drawings do not necessarily require the specific order or continuous order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0086] The embodiments of the present disclosure are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present disclosure should be included in the scope of protection of the present disclosure.

Claims

1. A display panel, characterized in that: include: substrate, light-emitting unit, first electrode and isolation structure, The isolation structure is disposed on one side of the substrate and encloses a plurality of isolation openings. The light emitting unit is at least partially located in the isolation opening, The first electrode covers the light-emitting unit and includes a thinned portion and a main portion. The main portion covers the central area of ​​the isolation opening and extends outward to form the thinned portion. At least part of the thinned portion is electrically connected to the isolation structure, and the thickness of the thinned portion is less than the thickness of the main portion.

2. The display panel according to claim 1, wherein: The edge of the thinned portion overlaps the isolation structure and the thickness becomes thinner as it approaches the isolation structure. Preferably, the thinned portion includes an overlapping region and a transition region, and the overlapping region is electrically connected to the isolation structure.

3. The display panel according to claim 1, wherein: The edges of the first electrode on opposite sides are electrically connected to the isolation structure respectively, Preferably, the thinned portions of the edges of the first electrode on opposite sides respectively include an overlap region and a transition region, and the overlap region is electrically connected to the isolation structure. Preferably, the transition zone is located between the main body and the overlapping zone, and includes a first transition zone and a second transition zone, the first transition zone is close to the overlapping zone, the second transition zone is close to the main body, and the overlapping zone is electrically connected to the isolation structure.

4. The display panel according to claim 1, wherein: The isolation structure includes a support portion, a base portion and a crown portion, the base portion is disposed on one side of the support portion, the base portion is disposed on the substrate, the crown portion is disposed on a side of the branch portion away from the substrate, and the crown portion has ends on both sides, and the thickness of the end portions in the region corresponding to the orthographic projection of the first electrode is less than or equal to 70% of the thickness of the main body of the first electrode. Preferably, the material of the support portion contains aluminum, the material of the base portion contains molybdenum or titanium nitride, and the material of the crown portion contains titanium.

5. The display panel according to claim 4, wherein: The orthographic projection of the end portion on the first electrode is located in the transition region, and the ratio of the thickness of the transition region to the thickness of the main body portion is less than or equal to 0.7, Preferably, the ratio of the thickness of the transition zone to the thickness of the main body is in the range of 0.3 to 0.

7. Preferably, the orthographic projection of the end portion on the first electrode is located in a first transition zone of the transition zone, and the ratio of the thickness of the first transition zone to the thickness of the main body portion is less than or equal to 0.

7. Preferably, the orthographic projection of the end portion on the first electrode coincides with a first transition region of the first electrode, and a ratio of a thickness of the first transition region to a thickness of the main body portion is in a range of 0.3 to 0.

7.

6. The display panel according to claim 4, wherein: The thickness ratio of the main body to the base is less than 2, Preferably, the thickness ratio of the main body to the base is less than or equal to 1.

5. Preferably, a thickness ratio of the main body portion to the base portion is in a range of 1.01 to 1.

4.

7. The display panel according to claim 4, wherein: The first electrode overlaps part of the side surface of the support portion and the base or overlaps the base, Preferably, the thinned portion overlaps part of the side surface of the supporting portion and the base or overlaps the base.

8. The display panel according to claim 1, wherein: It also includes a pixel defining layer, wherein the pixel defining layer is disposed on the substrate. The isolation structure is disposed on a side of the pixel definition layer away from the substrate.

9. The display panel according to claim 8, wherein: The device further comprises a planar layer, which is arranged on one side of the substrate, the pixel defining layer is arranged on a side of the planar layer away from the substrate, and a second electrode is arranged on the side of the planar layer away from the substrate. Preferably, the planar layer covers the display area or covers the display area and a non-display area outside the display area.

10. The display panel according to claim 8, wherein: The pixel defining layer is provided with a pixel opening, the main body portion is projected on the substrate to cover the pixel opening and a portion of the pixel opening surrounding the pixel opening, the pixel defining layer is projected on the substrate, the pixel opening corresponds to the position of the isolation opening and has an inclined surface; Preferably, an angle α between the inclined surface and a plane where the substrate is located or an angle α between the inclined surface and a plane where the second electrode is located is between 30° and 75°.

11. A display module, characterized in that: The display module comprises a display panel as described in any one of claims 1-10.

Images