Display device

Abstract

The invention relates to a display device. The display device includes: a light emitting element layer disposed on a substrate; a thin film encapsulation layer disposed on the light emitting element layer; a bank disposed on the thin film encapsulation layer and separating the emission region and the non-emission region; a capping layer disposed on the bank; a low refractive layer disposed on the capping layer and including an aperture; a passivation layer disposed on the low refractive layer and defining a plurality of openings; and a color filter layer disposed on the passivation layer, in which the low refractive layer overlaps the plurality of openings and includes a first region and a second region different from the first region, and the first region contacts the color filter layer.

Description

Technical Field

[0001] The present disclosure relates to a display device. Background Art

[0002] With the development of information society, more and more requirements are put forward for display devices for displaying images in various ways. For example, display devices are used in various electronic devices such as smart phones, digital cameras, laptop computers, navigation devices, and smart TVs.

[0003] The display device may be a flat panel display device such as a liquid crystal display device, a field emission display device, and a light-emitting display device. Examples of the light-emitting display device include an organic light-emitting display device composed of an organic light-emitting element, an inorganic light-emitting display device composed of an inorganic light-emitting element such as an inorganic semiconductor, and a micro light-emitting display device composed of a micro light-emitting element.

[0004] The organic light emitting element may include two opposing electrodes and a light emitting layer interposed therebetween. The light emitting layer receives electrons and holes from the two electrodes and recombines the electrons and holes to generate excitons, and the generated excitons change from an excited state to a ground state, thereby emitting light.

[0005] Organic light-emitting display devices including organic light-emitting elements are attracting attention as next-generation display devices because they can meet high display quality conditions such as wide viewing angle, high brightness and high contrast, and fast response speed, and because they do not require a power source such as a backlight unit and can be manufactured to have low power consumption, be light weight and be thin. Summary of the invention

[0006] Features of the present disclosure provide a display device with improved reliability by overcoming delamination of a low-refractive layer.

[0007] However, the features of the present disclosure are not limited to the features set forth herein. The above and other features of the present disclosure will become more apparent to those of ordinary skill in the art to which the present disclosure pertains by referring to the detailed description of the present disclosure given below.

[0008] In an embodiment of the present disclosure, a display device includes: a light emitting element layer, which is arranged on a substrate; a thin film encapsulation layer, which is arranged on the light emitting element layer; a dam, which is arranged on the thin film encapsulation layer and separates an emission area and a non-emission area; a capping layer, which is arranged on the dam; a low refractive layer, which is arranged on the capping layer and includes pores; a passivation layer, which is arranged on the low refractive layer and defines a plurality of openings; and a color filter layer, which is arranged on the passivation layer, wherein the low refractive layer overlaps with the plurality of openings and includes a first region and a second region different from the first region, and the first region contacts the color filter layer.

[0009] In an embodiment, the first region may overlap with the non-emitting region, and the second region may overlap with the emitting region.

[0010] In an embodiment, the first region may not include pores and the second region may include pores.

[0011] In an embodiment, the first region may have a number of pores that is less than the number of pores of the second region.

[0012] In embodiments, the color filter layer may include a first color filter overlapping one of the emission regions and a first color pattern overlapping the non-emission region, and the first region may contact at least one of the first color filter and the first color pattern.

[0013] In embodiments, the first region may include an organic material and / or a colorant of at least one of the first color filter and the first color pattern.

[0014] In an embodiment, the plurality of openings of the passivation layer may overlap the non-emission region.

[0015] In an embodiment, the plurality of openings may be defined in a dot shape or a grid shape in a plan view.

[0016] In an embodiment of the present disclosure, a display device includes: a light emitting element layer disposed on a substrate; a thin film encapsulation layer disposed on the light emitting element layer; a dam disposed on the thin film encapsulation layer and separating an emission area from a non-emission area; a capping layer disposed on the dam; a low refractive layer disposed on the capping layer and including pores; a passivation layer disposed on the low refractive layer and including a first passivation portion and a second passivation portion having a thickness greater than that of the first passivation portion; and a color filter layer disposed on the passivation layer, wherein the low refractive layer overlaps with the first passivation portion and includes a first region not including pores and a second region including pores as a remaining region except the first region.

[0017] In an embodiment, the first passivation portion may overlap the non-emission region, and the second passivation portion may overlap the emission region.

[0018] In an embodiment, the thickness of the first passivation portion may be in a range of about 10 nanometers (nm) to about 100 nm.

[0019] In embodiments, the color filter layer may include a first color filter overlapping one of the emission regions and a first color pattern overlapping the non-emission region, and the first region may overlap at least one of the first color filter and the first color pattern.

[0020] According to the features of the present disclosure, a display device includes: a light-emitting element layer, which is arranged on a substrate; a thin-film encapsulation layer, which is arranged on the light-emitting element layer; a dam, which is arranged on the thin-film encapsulation layer and separates an emission area and a non-emission area; a capping layer, which is arranged on the dam; a low-refractive layer, which is arranged on the capping layer and includes pores; a first passivation layer, which is arranged on the low-refractive layer and defines a plurality of openings; an outer coating layer, which is arranged on the first passivation layer; and a color filter layer, which is arranged on the outer coating layer, wherein the low-refractive layer overlaps with the plurality of openings and includes a first region and a second region different from the first region, and the first region contacts the outer coating layer.

[0021] In an embodiment, the first region may not include pores and the second region may include pores.

[0022] In an embodiment, the first region may have a number of pores that is less than the number of pores of the second region.

[0023] In an embodiment, the first region may include an organic material of an overcoat.

[0024] In an embodiment, the display device may further include: a second passivation layer disposed between the overcoat layer and the color filter layer.

[0025] In an embodiment of the present disclosure, a display device includes: a substrate including a display area and a non-display area; a light-emitting element layer disposed in the display area of ​​the substrate; a thin film encapsulation layer disposed on the light-emitting element layer; a dam disposed on the thin film encapsulation layer and separating an emission area and a non-emission area; a capping layer disposed on the dam and extending to the non-display area; a low-refractive layer disposed on the capping layer, extending from the display area to the non-display area and including pores; a passivation layer disposed on the low-refractive layer and including a plurality of openings defined in the non-display area; and a color filter layer disposed on the passivation layer in the display area and the non-display area, wherein the low-refractive layer overlaps with the plurality of openings and includes a first area and a second area different from the first area, and the first area contacts the color filter layer.

[0026] In an embodiment, a plurality of openings may surround the display area and be defined in a line shape or a dot shape in a plan view.

[0027] In an embodiment, the first region may not include pores and the second region includes pores.

[0028] In an embodiment, the first region may have a number of pores that is less than the number of pores of the second region.

[0029] In an embodiment, the first region may include an organic material of a color filter layer.

[0030] In the display device of the embodiment, the opening of the first passivation layer can be formed on the low refractive layer to make the low refractive layer contact with the color filter layer or the overcoat layer, thereby removing the pores in the low refractive layer and improving the interface adhesion performance with the capping layer.

[0031] In addition, in the display device of the embodiment, a first passivation portion having a relatively small thickness can be formed in the first passivation layer to remove the pores in the first region of the low-refractive layer overlapping the first color filter and the first color pattern, thereby improving the interfacial adhesion performance with the capping layer. Accordingly, the reliability of the display device can be improved by overcoming the delamination of the low-refractive layer.

[0032] However, the effects in the embodiments of the present disclosure are not limited to the above-exemplified effects, and various other effects are also included herein. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] The above and other advantages and features of the present disclosure will become more apparent by describing in detail embodiments of the present disclosure with reference to the accompanying drawings, in which:

[0034] Figure 1A is a schematic plan view of an embodiment of a display device, and Figure 1B yes Figure 1A An enlarged view of the dashed portion of ;

[0035] Figure 2 is a cross-sectional view schematically illustrating an embodiment of a display device;

[0036] Figure 3 is a cross-sectional view schematically illustrating an embodiment of a display device;

[0037] Figure 4 is a cross-sectional view schematically illustrating an embodiment of a low-refractive layer;

[0038] Figures 5 to 7 are plan views illustrating embodiments of various arrangements of openings in a passivation layer;

[0039] Figures 8 to 10 are cross-sectional views showing embodiments of various structures of the low-refractive layer;

[0040] Fig.11 is a cross-sectional view of another embodiment of a display device;

[0041] Fig.12 yes Fig.11 An enlarged cross-sectional view of an embodiment of a partial area of ​​a display device;

[0042] Fig.13 is a scanning electron microscope (“SEM”) image of the passivation layer;

[0043] Fig.14 is a cross-sectional view showing another embodiment of a display device;

[0044] Fig.15 is a cross-sectional view showing another embodiment of a display device;

[0045] Fig.16 is a cross-sectional view showing another embodiment of a display device;

[0046] Fig.17 and Fig.18 are plan views showing various embodiments of a display device;

[0047] Fig.19 is a cross-sectional view showing another embodiment of a display device;

[0048] Fig. 20 is a SEM image of a low refractive layer manufactured according to a comparative example; and

[0049] Fig.21 is a SEM image of a low-refractive layer manufactured according to a test example. DETAILED DESCRIPTION

[0050] Embodiments of the present disclosure will now be described more fully below with reference to the accompanying drawings, in which preferred embodiments of the present invention are shown. However, the present invention can be implemented in many different forms and should not be construed as being limited to the embodiments set forth herein. On the contrary, these embodiments are provided so that the present disclosure is thorough and complete, and these embodiments will fully convey the scope of the present invention to those skilled in the art.

[0051] It will also be understood that when a layer is referred to as being “on” another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may also be present. Like reference numerals refer to like components throughout the specification.

[0052] It will be understood that although the terms "first", "second", etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another element. For example, without departing from the teachings of the present invention, the first element discussed below may be referred to as the second element. Similarly, the second element may also be referred to as the first element.

[0053] The terms used in this article are only used for the purpose of describing specific embodiments and are not intended to be limiting. As used in this article, unless the content clearly indicates otherwise, the singular forms "one", "an" and "the / said" are intended to include plural forms, including "at least one". "Or" means "and / or". As used in this article, the term "and / or" includes any and all combinations of one or more related listed items. It will be further understood that when used in this specification, the terms "comprises" and / or "comprising" or "includes" and / or "including" indicate the presence of narrated features, regions, wholes, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, regions, wholes, steps, operations, elements, components and / or combinations thereof.

[0054] In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used to describe the relationship of one element to another element as illustrated in the accompanying drawings. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the accompanying drawings. For example, if the device in one figure is turned over, the element described as being on the "lower" side of the other elements will then be oriented on the "upper" side of the other elements. Therefore, depending on the specific orientation of the figure, the exemplary term "lower" can include both "lower" and "upper" orientations. Similarly, if the device in one figure is turned over, the element described as being "below" or "below" the other elements will then be oriented "above" the other elements. Therefore, the exemplary terms "below" or "below" can include both "upper" and "lower" orientations.

[0055] As used herein, "about" or "approximately" includes the recited value and means within an acceptable range of deviation of the particular value determined by one of ordinary skill in the art taking into account the measurement in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system). For example, a term such as "about" may mean within one or more standard deviations, or within ±30%, ±20%, ±10%, or ±5% of the recited value.

[0056] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as those commonly understood by those skilled in the art to which the present disclosure belongs. It will be further understood that terms defined in commonly used dictionaries, for example, should be interpreted as having a meaning consistent with their meaning in the context of the relevant art and the present disclosure, and, unless explicitly defined as such herein, will not be interpreted in an idealized or overly formal sense.

[0057] Each of the features of the various embodiments of the present disclosure can be combined in part or in whole or in combination with each other, and various interlocks and drives are technically possible. Each embodiment can be implemented independently of each other, or can be implemented together in combination.

[0058] Hereinafter, embodiments will be described with reference to the accompanying drawings.

[0059] Figure 1A is a schematic plan view of an embodiment of a display device, and Figure 1B yes Figure 1A Magnified view of the dashed portion of .

[0060] refer to Figure 1A , the display device 10 displays a moving image or a still image. The display device 10 may refer to any electronic device that provides a display screen. In an embodiment, the display device 10 may include a television, a laptop computer, a monitor, a billboard, an Internet of Things device, a mobile phone, a smart phone, a tablet personal computer (“PC”), an electronic watch, a smart watch, a watch phone, a head-mounted display, a mobile communication terminal, an electronic notebook, an electronic book, a portable multimedia player (“PMP”), a navigation device, a game console, a digital camera or a video camera, etc. that provides a display screen.

[0061] The display device 10 may include a display panel that provides a display screen. In an embodiment, the display panel may include an inorganic light emitting diode display panel, an organic light emitting diode display panel, a quantum dot light emitting display panel, a plasma display panel, and a field emission display panel. In the following description, an organic light emitting diode display panel or an inorganic light emitting diode display panel is used as a display panel as an example, but the present disclosure is not limited thereto, and other display panels may be applied within the same scope of the technical spirit.

[0062] Hereinafter, a first direction DR1, a second direction DR2, and a third direction DR3 are defined in the drawings describing the embodiment of the display device 10. The first direction DR1 and the second direction DR2 may be directions perpendicular to each other in one plane. The third direction DR3 may be a direction perpendicular to such a plane on which the first direction DR1 and the second direction DR2 extend. The third direction DR3 is perpendicular to each of the first direction DR1 and the second direction DR2. In describing the embodiment of the display device 10, the third direction DR3 indicates the thickness direction of the display device 10.

[0063] The display device 10 may have a quadrilateral shape, for example, a rectangular shape including long sides and short sides such that the sides in the first direction DR1 are longer than the sides in the second direction DR2 in a plan view. In a plan view, a corner portion where the long side and the short side of the display device 10 intersect may be a right angle. However, the present disclosure is not limited thereto, and the corner portion may be rounded to have a curved shape. The planar shape of the display device 10 is not limited to the illustrated example, and may be other shapes such as a square shape, a quadrilateral shape with rounded corners (vertices), other polygonal shapes, and a circular shape.

[0064] The display surface of the display device 10 may be disposed on one side of a third direction DR3 as a thickness direction. In the embodiment describing the display device 10, unless otherwise specified, the term "upward" refers to one side of the third direction DR3, which is a display direction, and the term "top surface" refers to a surface facing one side of the third direction DR3. In addition, the term "downward" refers to the opposite side of the third direction DR3, which is a direction opposite to the display direction, and the term "bottom surface" refers to a surface facing the opposite side of the third direction DR3. In addition, "left", "right", "upper" and "lower" indicate directions when the display device 10 is observed from above. In the embodiment, the "right side" indicates one side of the first direction DR1, the "left side" indicates the opposite side of the first direction DR1, the "upper side" indicates one side of the second direction DR2, and the "lower side" indicates the opposite side of the second direction DR2.

[0065] The display device 10 may include a display area DPA and a non-display area NDA. The display area DPA is an area where a picture can be displayed, and the non-display area NDA is an area where a picture is not displayed. The display area DPA may also be referred to as an active area, and the non-display area NDA may also be referred to as a non-active area.

[0066] The shape of the display area DPA may follow the shape of the display device 10. In an embodiment, for example, the display area DPA may have a quadrilateral shape in a plan view, such as a rectangular shape similar to the overall shape of the display device 10. The display area DPA may substantially occupy the center of the display device 10.

[0067] like Figure 1B As explained in the above, the display area DPA may include a plurality of pixels PX. The plurality of pixels PX may be defined in a matrix. In a plan view, the shape of each pixel PX may be a quadrilateral shape such as a rectangular shape or a square shape. However, the present disclosure is not limited thereto, and the shape of each pixel PX may be a rhombus shape in which each side is inclined relative to one direction. The pixels PX may be arranged in a stripe type or In addition, each of the pixels PX may include one or more light emitting elements that emit light of a predetermined wavelength band to display a predetermined color.

[0068] The non-display area NDA may be disposed around the display area DPA. The non-display area NDA may surround the display area DPA in whole or in part. In a plan view, the display area DPA may have a quadrilateral shape such as a rectangular shape, and the non-display area NDA may be disposed adjacent to four sides of the display area DPA. The non-display area NDA may form a frame of the display device 10. Wiring or circuit drivers included in the display device 10 may be disposed in the non-display area NDA, or an external device may be disposed (e.g., installed) in the non-display area NDA.

[0069] Figure 2 is a cross-sectional view schematically illustrating an embodiment of a display device. Figure 3 is a cross-sectional view schematically illustrating an embodiment of a display device. Figure 4 is a schematic cross-sectional view of an embodiment of a low-refractive layer. Figures 5 to 7 are plan views illustrating embodiments of various arrangements of openings in a passivation layer.

[0070] Figure 3 A cross-sectional structure of a plurality of emission areas LA1 , LA2 , and LA3 of the display device 10 is shown.

[0071] refer to Figures 2 to 4 , the display device 10 may include a substrate SUB, a light emitting element layer EML, a thin film encapsulation layer TFEL, a wavelength conversion layer WCL, a color filter layer CFL, and an optical function layer LFL.

[0072] The substrate SUB may be an insulating substrate. The substrate SUB may include a transparent material. In an embodiment, for example, the substrate SUB may include a transparent insulating material such as glass or quartz. The substrate SUB may be a rigid substrate. However, the substrate SUB is not limited thereto. The substrate SUB may include a plastic such as polyimide, and may be flexible so that the substrate SUB may be twisted, bent, folded, or curled. A plurality of emission areas LA1, LA2, and LA3 and a non-emission area NLA may be defined in the substrate SUB.

[0073] The emission areas LA1, LA2, and LA3 may be areas that emit light generated by the light emitting elements ED1, ED2, and ED3 to the outside, and the non-emission area NLA may be an area that does not emit light to the outside. In an embodiment, in the display area DPA, the first emission area LA1, the second emission area LA2, and the third emission area LA3 may be sequentially and repeatedly arranged along the first direction DR1. The widths of the first emission area LA1, the second emission area LA2, and the third emission area LA3 measured in the first direction DR1 may be the same as or different from each other.

[0074] The emission areas LA1, LA2, and LA3 may emit light of different colors. In an embodiment, the first emission area LA1 may emit light of a first color, the second emission area LA2 may emit light of a second color, and the third emission area LA3 may emit light of a third color. In an embodiment, the light of the first color may be blue light having a peak wavelength in the range of about 440 nanometers (nm) to about 480nm, and the light of the second color may be red light having a peak wavelength in the range of about 610nm to about 650nm. In addition, the light of the third color may be green light having a peak wavelength in the range of about 510nm to about 550nm. However, the present disclosure is not limited thereto, and the light of the second color may be green light and the light of the third color may be red light.

[0075] The switching elements T1, T2, and T3 may be disposed on the substrate SUB. In an embodiment, the first switching element T1 may be disposed in the first emission area LA1 of the substrate SUB, the second switching element T2 may be disposed in the second emission area LA2 thereof, and the third switching element T3 may be disposed in the third emission area LA3 thereof. However, the present disclosure is not limited thereto, and in another embodiment, at least one of the first switching element T1, the second switching element T2, and the third switching element T3 may be disposed in the non-emission area NLA.

[0076] In an embodiment, each of the first switching element T1, the second switching element T2, and the third switching element T3 may be a thin film transistor including amorphous silicon, polycrystalline silicon, or an oxide semiconductor. In addition, although not shown in the figure, a plurality of signal lines (e.g., gate lines, data lines, or power lines, etc.) for transmitting signals to the switching elements may be further provided on the substrate SUB. In addition, each of the switching elements T1, T2, and T3 may include a first insulating layer 120. In an embodiment, for example, the first insulating layer 120 may be a gate insulating layer or an interlayer insulating layer of a thin film transistor. The gate insulating layer or the interlayer insulating layer may be formed to include silicon oxide (SiO x ), silicon oxynitride (SiO x N y ) and silicon nitride (SiN x ) or silicon oxide (SiO x ), silicon oxynitride (SiO x N y ) and silicon nitride (SiN x ) or a plurality of layers thereof.

[0077] The second insulating layer 130 may be disposed on the first switching element T1, the second switching element T2, and the third switching element T3. In an embodiment, the second insulating layer 130 may be a planarization layer. In an embodiment, the second insulating layer 130 may include an organic layer or be composed of an organic layer. In an embodiment, the second insulating layer 130 may include an acrylic resin, an epoxy resin, a polyimide resin, a polyester resin, or the like. In an embodiment, for example, the second insulating layer 130 may include a positive photosensitive material or a negative photosensitive material.

[0078] The first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may be disposed on the second insulating layer 130. The first anode electrode AE1 may be disposed in the first emission area LA1, but at least a portion thereof may extend to the non-emission area NLA. The second anode electrode AE2 may be disposed in the second emission area LA2, but at least a portion thereof may extend to the non-emission area NLA. The third anode electrode AE3 may be disposed in the third emission area LA3, but at least a portion thereof may extend to the non-emission area NLA. The first anode electrode AE1 may be connected to the first switching element T1 through the second insulating layer 130, the second anode electrode AE2 may be connected to the second switching element T2 through the second insulating layer 130, and the third anode electrode AE3 may be connected to the third switching element T3 through the second insulating layer 130.

[0079] In an embodiment, the widths or areas of the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may be different from each other. In an embodiment, for example, the width of the first anode electrode AE1 may be smaller than the width of the second anode electrode AE2, and the width of the third anode electrode AE3 may be smaller than the width of the second anode electrode AE2 and larger than the width of the first anode electrode AE1. In an alternative embodiment, the area of ​​the first anode electrode AE1 may be smaller than the area of ​​the second anode electrode AE2, and the area of ​​the third anode electrode AE3 may be smaller than the area of ​​the second anode electrode AE2 and larger than the area of ​​the first anode electrode AE1. In an alternative embodiment, the area of ​​the first anode electrode AE1 may be smaller than the area of ​​the second anode electrode AE2, and the area of ​​the third anode electrode AE3 may be larger than the area of ​​the second anode electrode AE2 and the area of ​​the first anode electrode AE1. However, the present disclosure is not limited to the above embodiment. In another embodiment, the widths or areas of the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may be substantially the same.

[0080] Each of the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may be a reflective electrode. Each of the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may have a structure formed by stacking indium tin oxide (“ITO”), indium zinc oxide (“IZO”), zinc oxide (ZnO), and indium oxide (In 2 O 3 ) and a reflective material layer such as silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), lead (Pb), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca) or any combination thereof. The material layer with a relatively high work function may be disposed above the reflective material layer and disposed closer to the light emitting layer OL. Each of the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may have ITO / Mg, ITO / MgF 2 , ITO / Ag, and ITO / Ag / ITO multilayer structures, but the present disclosure is not limited thereto.

[0081] The pixel defining layer 150 may be disposed on the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3. The pixel defining layer 150 may define an opening exposing the first anode electrode AE1, an opening exposing the second anode electrode AE2, and an opening exposing the third anode electrode AE3, and may define a first emission area LA1, a second emission area LA2, a third emission area LA3, and a non-emission area NLA. That is, the area of ​​the first anode electrode AE1 that is exposed and not covered by the pixel defining layer 150 may be the first emission area LA1. The area of ​​the second anode AE2 that is exposed and not covered by the pixel defining layer 150 may be the second emission area LA2. The area of ​​the third anode AE3 that is exposed and not covered by the pixel defining layer 150 may be the third emission area LA3. In addition, the area in which the pixel defining layer 150 is disposed may be the non-emission area NLA.

[0082] The pixel defining layer 150 may include an organic insulating material such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenylene resin, polyphenylene sulfide resin, or benzocyclobutene (“BCB”).

[0083] In an embodiment, the pixel defining layer 150 may overlap with a bank 180 of a wavelength conversion layer WCL to be described later. The light emitting layer OL may be disposed on the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3. In an embodiment in which the display device 10 is an organic light emitting display, the light emitting layer OL may include an organic layer containing an organic material. The organic layer may include an organic light emitting layer, and in some cases, may further include at least one of a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer as an auxiliary layer for light emission. In an embodiment, the light emitting layer OL may have a series structure in which a plurality of organic light emitting layers are superimposed in a thickness direction and a charge generation layer is disposed between the organic light emitting layers. The superimposed organic light emitting layers may emit light of the same wavelength, or may emit light of different wavelengths.

[0084] In an embodiment, the light emitting layer OL may have a shape of a continuous film formed throughout the plurality of emission regions LA1, LA2, and LA3 and the non-emission region NLA. In this case, the wavelength of light emitted from the light emitting layer OL in the plurality of emission regions LA1, LA2, and LA3 may be the same. In an embodiment, for example, the light emitting layer OL may emit blue light or ultraviolet light in the plurality of emission regions LA1, LA2, and LA3.

[0085] The cathode electrode CE may be disposed on the light emitting layer OL. In an embodiment, the cathode electrode CE may have a semi-transmissive characteristic or a transmissive characteristic. When the cathode electrode CE has a semi-transmissive characteristic, the cathode electrode CE may include Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF / Ca, LiF / Al, Mo, Ti, or a compound or combination thereof (such as a combination of Ag and Mg). In addition, when the cathode electrode CE has a thickness of tens to hundreds of angstroms, the cathode electrode CE may have a semi-transmissive characteristic.

[0086] When the cathode electrode CE has a transmissive characteristic, the cathode electrode CE may include a transparent conductive oxide ("TCO"). In an embodiment, for example, the cathode electrode CE may include a tungsten oxide (W x O y ), titanium oxide (TiO 2 ), indium tin oxide ("ITO"), indium zinc oxide ("IZO"), zinc oxide (ZnO), indium tin zinc oxide ("ITZO") or magnesium oxide (MgO), etc.

[0087] The first anode electrode AE1, the light emitting layer OL, and the cathode electrode CE may form a first light emitting element ED1. The second anode electrode AE2, the light emitting layer OL, and the cathode electrode CE may form a second light emitting element ED2. The third anode electrode AE3, the light emitting layer OL, and the cathode electrode CE may form a third light emitting element ED3. The first light emitting element ED1, the second light emitting element ED2, and the third light emitting element ED3 may each emit source light, and the source light may be provided to the wavelength conversion layer WCL. For example, the light source may be blue light, but is not limited thereto. Each of the first light emitting element ED1, the second light emitting element ED2, and the third light emitting element ED3 may be an organic light emitting diode.

[0088] The thin film encapsulation layer TFEL may be disposed on the cathode electrode CE. The thin film encapsulation layer TFEL is commonly disposed in the first emission area LA1, the second emission area LA2, the third emission area LA3, and the non-emission area NLA. In an embodiment, the thin film encapsulation layer TFEL may directly cover the cathode electrode CE.

[0089] In an embodiment, the thin film encapsulation layer TFEL may include a first encapsulation inorganic layer 171 , an encapsulation organic layer 173 , and a second encapsulation inorganic layer 175 sequentially stacked on the cathode electrode CE.

[0090] Each of the first encapsulation inorganic layer 171 and the second encapsulation inorganic layer 175 may include one or more of silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, cerium oxide, silicon oxynitride, and lithium fluoride, or may consist thereof. The encapsulation organic layer 173 may include acrylic resin (e.g., methacrylic resin), polyisoprene resin, vinyl resin, epoxy resin, urethane resin, cellulose resin, or perylene resin, etc.

[0091] However, the structure of the thin film encapsulation layer TFEL is not limited to the above example. In addition, the stacking structure of the thin film encapsulation layer TFEL may be variously changed.

[0092] The wavelength conversion layer WCL may be disposed on the light emitting element layer EML on which the thin film encapsulation layer TFEL is disposed.

[0093] The wavelength conversion layer WCL may include a bank 180 , a light-transmitting pattern 230 , a first wavelength conversion pattern 240 , a second wavelength conversion pattern 250 , a capping layer 300 , a low-refractive layer 320 , and a first passivation layer 340 .

[0094] The embankment 180 may be disposed on the thin film encapsulation layer TFEL. The embankment 180 may separate the emission areas LA1, LA2, and LA3 and the non-emission area NLA. The embankment 180 may be disposed to overlap the non-emission area NLA and may block the transmission of light. More specifically, the embankment 180 may be disposed between the light-transmitting pattern 230 and the first wavelength conversion pattern 240 and between the first wavelength conversion pattern 240 and the second wavelength conversion pattern 250 to prevent color mixing between adjacent emission areas.

[0095] The bank 180 may include an organic light-shielding material and may be formed by an inkjet method or a coating and exposure process of the organic light-shielding material. In an embodiment, for example, the bank 180 may include an organic material and a dye or pigment having a light-shielding property mixed in the organic material. The organic material may include an acrylic resin (e.g., a methacrylic resin), a polyisoprene resin, a vinyl resin, an epoxy resin, a urethane resin, a cellulose resin, or a perylene resin, etc. The dye or pigment may include carbon black, etc.

[0096] The light-transmitting pattern 230 may be disposed on the thin film encapsulation layer TFEL. In an embodiment, the light-transmitting pattern 230 may be formed by applying a photosensitive material and exposing and developing the photosensitive material. However, the present disclosure is not limited thereto, and the light-transmitting pattern 230, the first wavelength conversion pattern 240, and the second wavelength conversion pattern 250 may be formed using an inkjet method.

[0097] The light-transmitting pattern 230 may overlap the first emission area LA1. The light-transmitting pattern 230 may transmit incident light. As described above, the source light provided from the first light emitting element ED1 may be blue light. The source light being blue light may pass through the light-transmitting pattern 230.

[0098] In an embodiment, the light-transmitting pattern 230 may include a first base resin 231 , and may further include a first scatterer 233 dispersed in the first base resin 231 .

[0099] The first base resin 231 may include a material having a relatively high light transmittance, or may consist of it. In an embodiment, the first base resin 231 may include an organic material, or may consist of it. In an embodiment, for example, the first base resin 231 may include an organic material such as epoxy resin, acrylic resin, cardo resin, or polyimide resin.

[0100] The first scatterer 233 may have a refractive index different from that of the first base resin 231, and may form an optical interface with the first base resin 231. In an embodiment, for example, the first scatterer 233 may be light scattering particles. The first scatterer 233 is not particularly limited as long as the first scatterer 233 is a material capable of scattering at least a portion of the transmitted light, but may be, for example, metal oxide particles or organic particles. In an embodiment, the metal oxide may include titanium oxide (TiO 2 ), zirconium oxide (ZrO 2 ), aluminum oxide (Al 2 O 3 ), indium oxide (In 2 O 3 ), zinc oxide (ZnO) or tin oxide (SnO 2 ) etc. In an embodiment, the material of the organic particles may include acrylic resin or urethane resin etc. Regardless of the incident direction of the incident light, the first scatterer 233 may scatter the light in random directions without substantially converting the wavelength of the light passing through the light-transmitting pattern 230.

[0101] The first wavelength conversion pattern 240 and the second wavelength conversion pattern 250 may be disposed on the thin film encapsulation layer TFEL.

[0102] The first wavelength conversion pattern 240 may be disposed on the thin film encapsulation layer TFEL and may overlap the second emission area LA2. The first wavelength conversion pattern 240 may emit light by converting or shifting the peak wavelength of the incident light to another predetermined peak wavelength. In an embodiment, the first wavelength conversion pattern 240 may convert the source light provided from the second light emitting element ED2 into red light having a peak wavelength in the range of about 610 nm to about 650 nm and emit red light.

[0103] The first wavelength conversion pattern 240 may include a second base resin 241 and a first wavelength shifter 245 dispersed in the second base resin 241 , and may further include a second scatterer 243 dispersed in the second base resin 241 .

[0104] The second base resin 241 may include a material having a relatively high light transmittance or may consist of the same material. In an embodiment, the second base resin 241 may include an organic material or may consist of the same material as the first base resin 231, or may include at least one of the constituent materials exemplified as the first base resin 231.

[0105] The first wavelength shifter 245 may convert or shift the peak wavelength of the incident light to another predetermined peak wavelength. In an embodiment, the first wavelength shifter 245 may convert the first color light of blue light provided from the second light emitting element ED2 into red light having a peak wavelength in the range of about 610 nm to about 650 nm, and may emit it.

[0106] In an embodiment, the first wavelength shifter 245 may include quantum dots, quantum rods, or phosphors, etc. In an embodiment, for example, the quantum dots may be a particle material that emits light of a predetermined color when electrons transition from a conduction band to a valence band.

[0107] The quantum dot may be a semiconductor nanocrystal material. The quantum dot may have a predetermined band gap according to its composition and size. Therefore, the quantum dot may absorb light and then emit light having an intrinsic wavelength. In an embodiment, the semiconductor nanocrystal of the quantum dot may include a nanocrystal formed by a Group IV element, a Group IV compound, a Group II-VI compound, a Group III-V compound, a Group IV-VI compound, or any combination thereof.

[0108] The II-VI group compound may be selected from the group consisting of binary compounds, ternary compounds and quaternary compounds, wherein the binary compound is selected from the group consisting of CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS and combinations thereof, and the ternary compound is selected from the group consisting of InZnP, AgInS, CuInS, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeT e, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, MgZnSe, MgZnS and combinations thereof, and the quaternary compound is selected from the group consisting of HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and combinations thereof.

[0109] The III-V compound can be selected from the group consisting of binary compounds, ternary compounds and quaternary compounds, wherein the binary compound is selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb and combinations thereof, the ternary compound is selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InGaP, InNP, InAlP, InNAs, InNSb, InPAs, InPSb and combinations thereof, and the quaternary compound is selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, GaAlNP and combinations thereof.

[0110] The IV-VI group compound may be selected from the group consisting of binary compounds, ternary compounds and quaternary compounds, wherein the binary compound is selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and combinations thereof, the ternary compound is selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe and combinations thereof, and the quaternary compound is selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe and combinations thereof. The IV group element may be selected from the group consisting of Si, Ge and combinations thereof. The IV group compound may be a binary compound selected from the group consisting of SiC, SiGe and combinations thereof.

[0111] As another example, the semiconductor nanocrystals of quantum dots may include InZnP, AgInS, CuInS, and the like.

[0112] In this case, the binary compound, ternary compound or quaternary compound may be present in the particle at a uniform concentration, or may be present in the same particle with the concentration distribution partially divided into different states. In addition, the particle may have a core / shell structure in which one quantum dot surrounds another quantum dot. The interface between the core and the shell may have a concentration gradient in which the concentration of the element in the shell decreases toward the center of the core.

[0113] In an embodiment, the quantum dot may have a core-shell structure including a core comprising the above-mentioned semiconductor nanocrystal and a shell surrounding the core. The shell of the quantum dot may serve as a protective layer for maintaining semiconductor properties by preventing chemical denaturation of the core and / or a charging layer for imparting electrophoretic properties to the quantum dot. The shell may be a single layer or multiple layers. In an embodiment, the shell of the quantum dot may include a metal oxide or a non-metal oxide, a semiconductor compound, or any combination thereof.

[0114] In an embodiment, for example, the metal oxide or non-metal oxide may be SiO 2 、Al 2 O 3 、TiO 2 、ZnO、MnO、Mn 2 O 3 , Mn 3 O 4 , CuO, FeO, Fe 2 O 3 , Fe 3 O 4 , CoO, Co 3 O 4 Binary compounds such as MgAl 2 O 4 、CoFe 2 O 4 、NiFe 2 O 4 and CoMn 2 O 4 ternary compound, but the present disclosure is not limited thereto.

[0115] In addition, for example, the semiconductor compound can be CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnSeS, ZnTeS, GaAs, GaP, GaSb, HgS, HgSe, HgTe, InAs, InP, InGaP, InSb, AlAs, AlP or AlSb, etc., but is not limited thereto.

[0116] The light emitted from the first wavelength shifter 245 may have a full width at half maximum ("FWHM") of an emission wavelength spectrum of about 45 nm or less, about 40 nm or less, or about 30 nm or less. Thus, the purity and reproducibility of the color displayed by the display device 10 may be further improved. In addition, the light emitted from the first wavelength shifter 245 may be emitted in various directions regardless of the incident direction of the incident light. Accordingly, the side visibility of the light of the second color displayed in the second emission area LA2 may be improved.

[0117] A portion of the source light provided from the second light emitting element ED2 may not be converted into red light by the first wavelength shifter 245. However, the source light that has not been converted into red light may be blocked by the color filter layer CFL disposed thereover. The source light that has been converted into red light by the first wavelength conversion pattern 240 passes through the color filter layer CFL and is emitted to the outside.

[0118] The second scatterer 243 may have a refractive index different from that of the second base resin 241 and form an optical interface with the second base resin 241. In an embodiment, for example, the second scatterer 243 may be light scattering particles. A more detailed description of the second scatterer 243 is substantially the same or similar to the description of the first scatterer 233 and will therefore be omitted.

[0119] The second wavelength conversion pattern 250 may be disposed on the thin film encapsulation layer TFEL and may overlap the third emission area LA3. The second wavelength conversion pattern 250 may emit light by converting or shifting the peak wavelength of the incident light to another predetermined peak wavelength. In an embodiment, the second wavelength conversion pattern 250 may convert the source light provided from the third light emitting element ED3 into green light having a peak wavelength in the range of about 510 nm to about 550 nm, and emit green light.

[0120] The second wavelength conversion pattern 250 may include a third base resin 251 and a second wavelength shifter 255 dispersed in the third base resin 251 , and may further include a third scatterer 253 dispersed in the third base resin 251 .

[0121] The third base resin 251 may include a material having a relatively high light transmittance or may consist of the same material. In an embodiment, the third base resin 251 may include an organic material or may consist of the same material as the first base resin 231, or may include at least one of the constituent materials exemplified as the first base resin 231.

[0122] The second wavelength shifter 255 may convert or shift the peak wavelength of the incident light to another predetermined peak wavelength. In an embodiment, the second wavelength shifter 255 may convert blue light having a peak wavelength in the range of about 440nm to about 480nm to green light having a peak wavelength in the range of about 510nm to about 550nm.

[0123] In an embodiment, the second wavelength shifter 255 may include quantum dots, quantum rods, or phosphors, etc. A more detailed description of the second wavelength shifter 255 is substantially the same as or similar to the description of the first wavelength shifter 245, and thus will be omitted. In an embodiment, each of the first wavelength shifter 245 and the second wavelength shifter 255 may include quantum dots, or be composed of quantum dots. In this case, the particle size of the quantum dots forming the first wavelength shifter 245 may be greater than the particle size of the quantum dots forming the second wavelength shifter 255.

[0124] The third scatterer 253 may have a refractive index different from that of the third base resin 251 and form an optical interface with the third base resin 251. In an embodiment, for example, the third scatterer 253 may be light scattering particles. A more detailed description of the third scatterer 253 is substantially the same as or similar to the description of the second scatterer 243 and will therefore be omitted.

[0125] Source light emitted from the third light emitting element ED3 may be provided to the second wavelength conversion pattern 250 , and the second wavelength shifter 255 may convert the source light provided from the third light emitting element ED3 into green light having a peak wavelength in the range of about 510 nm to about 550 nm and emit the green light.

[0126] A portion of the source light being blue light may not be converted into green light by the second wavelength shifter 255 and may pass through the second wavelength conversion pattern 250. However, the source light that has not been converted into green light may be blocked by the color filter layer CFL. The source light that has been converted into green light by the second wavelength conversion pattern 250 passes through the color filter layer CFL and is emitted to the outside.

[0127] The capping layer 300 may be disposed on the dam 180, the light-transmitting pattern 230, the first wavelength conversion pattern 240, and the second wavelength conversion pattern 250 to cover them. Accordingly, the capping layer 300 may prevent contamination or damage to the dam 180, the light-transmitting pattern 230, the first wavelength conversion pattern 240, and the second wavelength conversion pattern 250 due to penetration of impurities such as moisture or air from the outside.

[0128] The capping layer 300 may include an inorganic material or be composed of an inorganic material. In an embodiment, for example, the capping layer 300 may include silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, or silicon oxynitride.

[0129] The low refractive layer 320 may be disposed on the capping layer 300. The low refractive layer 320 may be disposed directly on the capping layer 300. The low refractive layer 320 may be disposed entirely in the display area DPA (refer to FIG. 1 ) of the display device 10. Figure 1A). In an embodiment, for example, the low-refractive layer 320 may be disposed in the emission areas LA1, LA2, and LA3 and the non-emission area NLA in the display area. The low-refractive layer 320 may have a relatively lower refractive index than the light-transmitting pattern 230, the first wavelength conversion pattern 240, the second wavelength conversion pattern 250, and the capping layer 300, and due to the difference in refractive index, may be used to improve light output efficiency by refracting light emitted from its lower portion to its upper portion.

[0130] The low refractive layer 320 may include a transparent resin PR and pores PO dispersed in the transparent resin PR. The transparent resin PR may include one or more selected from the group consisting of acrylic, polysiloxane, polyurethane, polyurethane acrylate, polyimide, polymethylsilsesquioxane ("PMSSQ"), and polymethylmethacrylate ("PMMA").

[0131] The pores PO may be holes containing or consisting of air, and may be randomly dispersed in the transparent resin PR. The top and bottom surfaces of the low-refractive layer 320 may include a flat area, and may also include an uneven area due to the pores PO. Since air has a refractive index of 1, the pores PO may play a role in reducing the refractive index of the low-refractive layer 320.

[0132] In addition, the low-refractive layer 320 may further include hollow particles. The hollow particles may include a material selected from silicon dioxide (SiO 2 ), magnesium fluoride (MgF 2 ) and iron oxide (Fe 3 O 4 ). In an embodiment, for example, the hollow particle may include a shell comprising or consisting of one or more of the above materials and a hollow portion in the shell. In an embodiment, the diameter of the hollow particle may be in the range of about 20 nm to about 200 nm, but is not limited thereto.

[0133] The first passivation layer 340 may be disposed on the low-refractive layer 320. The first passivation layer 340 may be disposed directly on the low-refractive layer 320 to cover the low-refractive layer 320. The first passivation layer 340 may cover the low-refractive layer 320 to prevent damage or contamination to the low-refractive layer 320.

[0134] The first passivation layer 340 may include an inorganic material, or be composed of an inorganic material. In an embodiment, for example, the capping layer 300 may include silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, or silicon oxynitride, etc. The thickness of the first passivation layer 340 may be in the range of about 100 nm to about 1000 nm, but is not limited thereto.

[0135] In an embodiment, a plurality of openings 345 may be defined in the first passivation layer 340. The plurality of openings 345 may penetrate the first passivation layer 340 to expose the low refractive layer 320 thereunder. The plurality of openings 345 may not overlap the first to third emission areas LA1, LA2, and LA3, and may be defined to overlap the non-emission area NLA. The plurality of openings 345 may be defined to overlap the dam 180 of the wavelength conversion layer WCL.

[0136] like Figure 5 As shown in , a plurality of openings 345 may be defined so as not to overlap with the first to third emission regions LA1, LA2, and LA3 in the region overlapping with the non-emission region NLA and the bank 180. The plurality of openings 345 may be spaced apart from each other to form an island shape. In an embodiment, for example, the plurality of openings 345 may be defined to be spaced apart from each other on the left and right sides of the first emission region LA1.

[0137] In addition, if Figure 6 As shown in FIG. 1 , a plurality of openings 345 may be defined to be spaced apart from each other at one side of the second emission area LA2, between the second emission area LA2 and the third emission area LA3, and at one side of the third emission area LA3.

[0138] like Figure 7 As shown in , the plurality of openings 345 may have a grid shape. In this case, the plurality of openings 345 may have substantially the same shape as that of the bank 180 in a plan view.

[0139] Return to reference Figure 3 The color filter layer CFL may be disposed on the wavelength conversion layer WCL. The color filter layer CFL may include a first color filter 350, a second color filter 360, and a third color filter 370. In addition, the color filter layer CFL may further include a first color pattern 355, a second color pattern 365, and a third color pattern 375.

[0140] The first color filter 350 may be disposed on the first passivation layer 340 to overlap the third emission area LA3. The first color filter 350 may be disposed to overlap the third light emitting element ED3 and the second wavelength conversion pattern 250. The first color pattern 355 may be spaced apart from the first color filter 350 and overlap the non-emission area NLA. The first color filter 350 and the first color pattern 355 may be in direct contact with the low refractive layer 320 exposed by the opening 345 of the first passivation layer 340.

[0141] The first color filter 350 and the first color pattern 355 can selectively allow light of a third color (e.g., green light) to pass therethrough, and can block or absorb light of a first color (e.g., blue light) and light of a second color (e.g., red light). In an embodiment, the first color filter 350 can be a green color filter, and can include a green colorant such as a green dye or a green pigment. In the specification, a colorant is a concept including both a dye and a pigment.

[0142] The second color filter 360 may overlap the second emission area LA2, and may overlap the second light emitting element ED2 and the first wavelength conversion pattern 240. In an embodiment, one side of the second color filter 360 may overlap the non-emission area NLA, and may overlap the first color filter 350 adjacent thereto. An opposite side of the second color filter 360 may overlap the non-emission area NLA and the first color pattern 355. The second color pattern 365 may be spaced apart from the second color filter 360 and overlap the non-emission area NLA. The second color pattern 365 may be arranged to overlap the first color filter 350 in the non-emission area NLA.

[0143] The second color filter 360 and the second color pattern 365 can selectively allow the second color light (e.g., red light) to pass therethrough, and can block or absorb the first color light (e.g., blue light) and the third color light (e.g., green light). In an embodiment, for example, the second color filter 360 can be a red color filter and can include a red colorant such as a red dye or a red pigment.

[0144] The third color filter 370 may overlap the first emission area LA1, and may overlap the first light emitting element ED1 and the light-transmitting pattern 230. In an embodiment, one side of the third color filter 370 may overlap the non-emission area NLA, and may overlap the second color filter 360 adjacent thereto. In addition, the opposite side of the third color filter 370 may overlap the non-emission area NLA, and may overlap the second color pattern 365 and the first color filter 350 adjacent thereto. The third color pattern 375 may be spaced apart from the third color filter 370 and overlap the non-emission area NLA. The third color pattern 375 may be arranged to overlap the second color filter 360 in the non-emission area NLA.

[0145] The third color filter 370 can selectively allow light of a first color (e.g., blue light) to pass therethrough, and block or absorb light of a second color (e.g., red light) and light of a third color (e.g., green light). In an embodiment, for example, the third color filter 370 can be a blue color filter and can include a blue colorant such as a blue dye or a blue pigment.

[0146] As described above, the first to third color filters 350, 360, and 370 and the first to third color patterns 355, 365, and 375 may overlap in the non-emission area NLA to block or absorb light. In an embodiment, for example, the first color pattern 355, the second color filter 360, and the third color filter 370 may overlap in the non-emission area NLA disposed on one side of the second emission area LA2, and the first color filter 350, the second color filter 360, and the third color pattern 375 may overlap in the non-emission area NLA disposed on the opposite side of the second emission area LA2.

[0147] The first overcoat layer 380 may be disposed on the first to third color filters 350, 360, and 370 and the first to third color patterns 355, 365, and 375. The first overcoat layer 380 may improve adhesion reliability of an optical function layer LFL to be described later by planarizing an upper portion of the color filter layer CFL.

[0148] The first outer coating 380 may include an organic material or be composed of an organic material. In an embodiment, for example, the first outer coating 380 may include an acrylic resin (e.g., a methacrylic resin), a polyisoprene resin, a polyimide resin, a vinyl resin, an epoxy resin, a urethane resin, a cellulose resin, or a perylene resin.

[0149] The optical function layer LFL may be disposed on the first outer coating layer 380. The optical function layer LFL may be an anti-reflection layer that prevents reflection of external light. The optical function layer LFL may be attached in the form of a film, or may be formed by a coating method. However, the present disclosure is not limited thereto, and an anti-fingerprint layer or the like may also be provided.

[0150] The above-mentioned low-refractive layer 320 may include a plurality of pores PO and thus has a relatively low adhesion performance to the capping layer 300 thereunder, which may cause delamination at the interface. In the illustrated embodiment, the first passivation layer 340 disposed on the low-refractive layer 320 may include a plurality of openings 345 so that the low-refractive layer 320 and the first color filter 350 as well as the low-refractive layer 320 and the first color pattern 355 may directly contact each other.

[0151] Figures 8 to 10 are cross-sectional views showing examples of various structures of the low-refractive layer.

[0152] Combination Figure 3 For reference Figures 8 to 10, the low-refractive layer 320 may include a first area 322 and a second area 324. The first area 322 of the low-refractive layer 320 may be an area overlapping with the opening 345 of the first passivation layer 340, and the second area 324 may be a remaining area except the first area 322. The first area 322 may overlap with the embankment 180 and the non-emission area NLA, and may not overlap with the first to third emission areas LA1, LA2, and LA3. The second area 324 may overlap with the first to third emission areas LA1, LA2, and LA3. In addition, the first area 322 of the low-refractive layer 320 may be in direct contact with the first color filter 350 or the first color pattern 355, and the second area 324 thereof may be spaced apart from the first color filter 350 or the first color pattern 355 so as not to contact them.

[0153] The first region 322 of the low-refractive layer 320 may not include the pores PO, and the second region 324 may include the pores PO. In another embodiment, the first region 322 of the low-refractive layer 320 may have a smaller number of pores PO than that of the second region 324.

[0154] The first color filter 350 and the first color pattern 355 may be formed by applying a color filter solution to the first passivation layer 340 in which a plurality of openings 345 are defined through a solution process such as an inkjet method. In this case, the color filter solution may diffuse into the first region 322 of the low-refractive layer 320 exposed by the plurality of openings 345. That is, the color filter solution may diffuse into the first region 322 of the low-refractive layer 320 to fill the pores PO, thereby removing the pores PO in the first region 322. The color filter solution diffused in the first region 322 of the low-refractive layer 320 is cured during the curing process of the color filter layer CFL, and serves as a part of the low-refractive layer 320. Accordingly, the pores PO in the first region 322 of the low-refractive layer 320 may be removed, thereby improving the adhesion performance with the capping layer 300 thereunder.

[0155] Since the color filter solution diffuses, the first area 322 of the low refractive layer 320 may include a component of the color filter solution, or be composed of a component of the color filter solution. For example, the first area 322 of the low refractive layer 320 may include the same material as the first color filter 350 and the first color pattern 355, and may include the organic material and the colorant (i.e., green colorant) of the first color filter 350 and the first color pattern 355. For example, the organic material of the first color filter 350 and the first color pattern 355 is a base resin constituting the first color filter 350 and the first color pattern 355, and the colorant of the first color filter 350 and the first color pattern 355 is a colorant dispersed in the base resin.

[0156] like Figure 8, the side of the first region 322 of the low-refractive layer 320 may be aligned with the side of the opening 345 of the first passivation layer 340. In an embodiment, for example, the side of the first region 322 and the side of the opening 345 of the first passivation layer 340 may be perpendicular to the substrate SUB along the third direction DR3.

[0157] like Fig. 9 As shown in, in another embodiment, the width of the first area 322 of the low-refractive layer 320 may increase toward the substrate SUB. As the amount of the color filter solution increases, the amount of the color filter solution that penetrates the low-refractive layer 320 increases, so in this structure, the width of the first area 322 may increase toward the bottom of the first area 322. The width of the top surface of the first area 322 may be the same as the width of the opening 345 of the first passivation layer 340, and the width of the bottom surface of the first area 322 may be greater than the width of the opening 345 of the first passivation layer 340. In addition, the width of the top surface of the first area 322 may be less than the width of the bottom surface of the first area 322. Since the width of the bottom surface of the first area 322 increases, the pores PO in the low-refractive layer 320 can be removed from a larger area at the interface in contact with the capping layer 300, so that the interface adhesion performance can be improved.

[0158] like Fig.10 As shown in , in another embodiment, the width of the first area 322 of the low-refractive layer 320 may decrease toward the substrate SUB. Since the amount of the color filter solution decreases, the amount of the color filter solution that penetrates the low-refractive layer 320 also decreases, so in this structure, the width of the first area 322 may decrease toward the bottom of the first area 322. The width of the top surface of the first area 322 may be the same as the width of the opening 345 of the first passivation layer 340, and the width of the bottom surface of the first area 322 may be less than the width of the opening 345 of the first passivation layer 340. In addition, the width of the top surface of the first area 322 may be greater than the width of the bottom surface of the first area 322.

[0159] As described above, in the illustrated embodiment, the opening 345 of the first passivation layer 340 can be formed on the low-refractive layer 320 so that the low-refractive layer 320 contacts the first color filter 350 and the first color pattern 355, thereby removing the pores PO in the low-refractive layer 320 and improving the interface adhesion performance with the capping layer 300.

[0160] Fig.11 is a cross-sectional view of another embodiment of a display device. Fig.12 yes Fig.11 FIG. 1 is an enlarged cross-sectional view of an embodiment of a partial area of ​​a display device. Fig.13 is a scanning electron microscope ("SEM") image of the passivation layer.

[0161] refer to Fig.11 and Fig.12 , the embodiments explained are similar to those described above Figures 3 to 10 The embodiment is different in that the first passivation layer 340 includes a first passivation portion 342 (instead of a plurality of openings 345) and a second passivation portion 344. In the following description, redundant descriptions of the above embodiment will be omitted and the differences will be focused on.

[0162] The first passivation layer 340 may include a first passivation portion 342 and a second passivation portion 344. The first passivation portion 342 may have a relatively small thickness, and the second passivation portion 344 may have a thickness greater than the thickness TT1 of the first passivation portion 342. The first passivation portion 342 may overlap the bank 180 and the non-emission area NLA, and may not overlap the first to third emission areas LA1, LA2, and LA3. The second passivation portion 344 may overlap the first to third emission areas LA1, LA2, and LA3. The arrangement of the first passivation portion 342 is the same as that of the plurality of openings 345 in the above-described embodiment, and thus a description thereof will be omitted.

[0163] The thickness TT1 of the first passivation portion 342 may be in the range of about 10 nm to about 100 nm. The thickness TT2 of the second passivation portion 344 may be in the range of about 150 nm to about 1000 nm. Due to the properties of the inorganic layer, a fine seam may be included in the first passivation layer 340. When the thickness of the first passivation layer 340 is equal to or greater than 100 nm, no seam is formed, but when the thickness of the first passivation layer 340 is less than about 100 nm, a seam may be formed. Fig.13 As shown in FIG. , when the first passivation layer 340 is formed to have a thickness of about 452 angstroms When the thickness is greater than 100%, a seam can be formed.

[0164] In the illustrated embodiment, the thickness TT1 of the first passivation portion 342 can be formed in the range of about 10nm to about 100nm, allowing a seam to be formed in the first passivation portion 342. The seam of the first passivation portion 342 can serve as such a path through which a color filter solution for forming a first color filter 350 disposed on the first passivation portion 342 can penetrate. In this case, the color filter solution can diffuse into the low-refractive layer 320 below it through the seam of the first passivation portion 342 of the first passivation layer 340. That is, the color filter solution can diffuse into the pores PO of the low-refractive layer 320 to fill the pores PO, thereby removing the pores PO of the low-refractive layer 320. The color filter solution diffused in the low-refractive layer 320 is cured during the curing process of the color filter layer CFL and serves as a part of the low-refractive layer 320. Accordingly, the pores PO of the low-refractive layer 320 can be removed, thereby improving the adhesion performance with the capping layer 300 below it.

[0165] The low-refractive layer 320 disposed under the first passivation layer 340 may include a first region 322 and a second region 324. The first region 322 of the low-refractive layer 320 may be a region overlapping the first passivation portion 342 of the first passivation layer 340, and the second region 324 may be a remaining region except the first region 322 and may overlap the second passivation portion 344.

[0166] Since the color filter solution penetrates the first area 322 through the first passivation portion 342 of the first passivation layer 340 to remove the pores PO, the first area 322 of the low-refractive layer 320 may not include the pores PO. The second area 324 of the low-refractive layer 320 may include the pores PO. In another embodiment, the first area 322 of the low-refractive layer 320 may have a number of pores PO less than the number of pores PO of the second area 324.

[0167] As described above, in the illustrated embodiment, a first passivation portion 342 having a relatively small thickness can be formed in the first passivation layer 340, and the pores PO in the first region 322 of the low refractive layer 320 overlapping with the first color filter 350 and the first color pattern 355 in the non-emission area NLA can be removed, thereby improving the interface adhesion performance with the capping layer 300.

[0168] Fig.14 is a cross-sectional view showing another example of a display device.

[0169] refer to Fig.14 , the embodiments explained are similar to those described above Figures 5 to 13 The embodiment of FIG. 4 is different in that it further includes a second outer coating layer 400 .

[0170] The second overcoat layer 400 may be disposed between the first passivation layer 340 and the color filter layer CFL. The second overcoat layer 400 may be disposed on the first passivation layer 340 to cover the first passivation layer 340. The second overcoat layer 400 may be in direct contact with the low-refractive layer 320 through the plurality of openings 345 of the first passivation layer 340. The second overcoat layer 400 may be used to flatten the step portion of the first passivation layer 340 and diffuse into the low-refractive layer 320 to remove pores.

[0171] The second outer coating layer 400 can be formed by applying an outer coating solution to the first passivation layer 340 in which a plurality of openings 345 are defined through a solution process such as an inkjet method. In this case, the outer coating solution can diffuse into the first area 322 of the low-refractive layer 320 exposed by the plurality of openings 345. The outer coating solution may include an acrylic resin (e.g., methacrylic resin), a polyisoprene resin, a polyimide resin, a vinyl resin, an epoxy resin, a urethane resin, a cellulose resin, or a perylene resin, etc. That is, the outer coating solution can diffuse into the first area 322 of the low-refractive layer 320 to fill the pores PO, thereby removing the pores PO in the first area 322. The outer coating solution diffused in the first area 322 of the low-refractive layer 320 is cured during the curing process of the second outer coating layer 400 and serves as a part of the low-refractive layer 320. Accordingly, the pores PO in the first area 322 of the low-refractive layer 320 can be removed, thereby improving the adhesion performance with the capping layer 300 thereunder.

[0172] Due to the diffusion of the outer coating solution, the first area 322 of the low-refractive layer 320 may include or be composed of the components of the outer coating solution. The first area 322 of the low-refractive layer 320 may include the same material as the material of the second outer coating 400. For example, the first area 322 of the low-refractive layer 320 may include the organic material of the second outer coating 400. For example, the organic material of the second outer coating 400 is a base resin constituting the second outer coating 400. For example, the organic material of the second outer coating 400 may include acrylic resin (e.g., methacrylic resin), polyisoprene resin, polyimide resin, vinyl resin, epoxy resin, urethane resin, cellulose resin or perylene resin, etc.

[0173] For the above Fig.11 and Fig.12 In the embodiment of the present invention, a second overcoat layer 400 may be further applied between the first passivation layer 340 and the color filter layer CFL.

[0174] As described above, in the illustrated embodiment, the second overcoat layer 400 may be further included and brought into contact with the low-refractive layer 320 , thereby removing the voids PO in the low-refractive layer 320 and improving the interfacial adhesion performance with the capping layer 300 .

[0175] Fig.15 is a cross-sectional view showing another example of a display device.

[0176] refer to Fig.15 , the embodiments explained are similar to those described above Fig.14 The embodiment is different in that it further includes a second passivation layer 410 on the second overcoat layer 400 .

[0177] The second passivation layer 410 may be disposed between the second overcoat layer 400 and the color filter layer CFL. The second passivation layer 410 may cover the second overcoat layer 400 to prevent contamination and damage to the second overcoat layer 400.

[0178] Fig.16 is a cross-sectional view showing another example of a display device. Fig.17 and Fig.18 are plan views showing various embodiments of a display device. Fig.16 A display area DPA and a non-display area NDA of the display device 10 are shown.

[0179] refer to Figures 16 to 18 , the embodiments explained are similar to those described above Figures 3 to 15 The embodiment of the present invention is different in that a plurality of openings 345 are provided in the first passivation layer 340 in the non-display area NDA, and the first and second regions 322 and 324 are provided in the low-refractive layer 320. Hereinafter, redundant description will be omitted and the differences will be described.

[0180] In the non-display area NDA of the display device 10 , a plurality of partition walls BR1 and BR2 and a support member 135 may be formed in addition to a plurality of layers extending from the display area DPA.

[0181] Specifically, the first insulating layer 120 extending from the display area DPA may be disposed on the substrate SUB in the non-display area NDA. The first insulating layer 120 may be disposed to extend to the side of the substrate SUB. The side of the substrate SUB and the side of the first insulating layer 120 may be aligned with each other.

[0182] A plurality of partition walls BR1 and BR2 may be disposed on the first insulating layer 120. The plurality of partition walls BR1 and BR2 may prevent overflow of the encapsulation organic layer 173 of the thin film encapsulation layer TFEL extending from the display area DPA.

[0183] The plurality of partition walls BR1 and BR2 may include a first partition wall BR1 adjacent to the display area DPA and a second partition wall BR2 spaced apart from the first partition wall BR1 in a direction toward a side of the substrate SUB away from the display area DPA.

[0184] The first partition wall BR1 may have a multilayer structure in which a first lower layer 131 and a first upper layer 151 are stacked. The first lower layer 131 may include the same material as that of the second insulating layer 130 of the display area DPA. The first lower layer 131 may be formed by the same mask process as the second insulating layer 130. The first lower layer 131 may be directly disposed on the first insulating layer 120. The first upper layer 151 may be disposed on the first lower layer 131 and may include the same material as that of the pixel defining layer 150. The first upper layer 151 may be formed using the same mask process as the pixel defining layer 150.

[0185] The second partition wall BR2 may have a multilayer structure in which a second lower layer 132 and a second upper layer 152 are stacked. The second lower layer 132 may include the same material as the second insulating layer 130 and the first lower layer 131 of the display area DPA. The second lower layer 132 may be formed by the same mask process as the second insulating layer 130 and the first lower layer 131. The second lower layer 132 may be directly disposed on the first insulating layer 120. The second upper layer 152 may be disposed on the second lower layer 132, and may include the same material as the pixel defining layer 150 and the first upper layer 151. The second upper layer 152 may be formed by the same mask process as the pixel defining layer 150 and the first upper layer 151.

[0186] The support member 135 may be disposed on the first insulating layer 120. The support member 135 may be disposed between the second partition wall BR2 and the side of the substrate SUB away from the display area DPA. The support member 135 may be used to support a mask for forming the first encapsulation inorganic layer 171 and the second encapsulation inorganic layer 175 of the thin film encapsulation layer TFEL so that the mask may be supported on the substrate SUB. The support member 135 may include the same material as that of the second insulating layer 130 of the display area DPA, and may be formed by the same mask process as the second insulating layer 130. However, the support member 135 may be omitted.

[0187] The plurality of partition walls BR1 and BR2 and the support member 135 may be arranged to overlap the color filter layer CFL in the non-display area NDA.

[0188] In the drawings, the dam 180 is shown as being disposed in the display area DPA, but the present disclosure is not limited thereto, and the dam 180 may be disposed to extend to the non-display area NDA. In an embodiment, the dam 180 may extend to the first partition wall BR1. In addition, when a dummy pixel is disposed in the non-display area NDA, the dam 180 may also be disposed on top of the dummy pixel.

[0189] The thin film encapsulation layer TFEL of the display area DPA may extend and be disposed in the non-display area NDA. The first encapsulation inorganic layer 171 of the thin film encapsulation layer TFEL may extend to the non-display area NDA and may be disposed on the first partition wall BR1 and the second partition wall BR2. The first encapsulation inorganic layer 171 may cover the first partition wall BR1 and the second partition wall BR2. The first encapsulation inorganic layer 171 may extend to the side of the support member 135, but is not limited thereto and may cover the support member 135. In addition, the encapsulation organic layer 173 of the thin film encapsulation layer TFEL may extend to the non-display area NDA and be disposed adjacent to the first partition wall BR1. The encapsulation organic layer 173 may be disposed on the first encapsulation inorganic layer 171 to be spaced apart from the first partition wall BR1. The second encapsulation inorganic layer 175 of the thin film encapsulation layer TFEL may extend to the non-display area NDA and be disposed on the first partition wall BR1 and the second partition wall BR2. The second encapsulation inorganic layer 175 may be disposed on the first partition wall BR1 and the second partition wall BR2 and cover them. The second encapsulating inorganic layer 175 may extend to the side of the support 135 , but is not limited thereto and may cover the support 135 .

[0190] Some layers of the wavelength conversion layer WCL may extend from the display area DPA and be disposed on the substrate SUB in the non-display area NDA.

[0191] The capping layer 300 may extend from the display area DPA and be disposed on the substrate SUB in the non-display area NDA. The capping layer 300 may be disposed to extend from the display area DPA to the support 135. The capping layer 300 may protect the display area DPA from moisture or oxygen that may penetrate from the outside.

[0192] The low refractive layer 320, the first passivation layer 340, the color filter layer CFL, and the first overcoat layer 380 may extend from the display area DPA and be disposed on the substrate SUB in the non-display area NDA. The low refractive layer 320 may be disposed to extend to the first partition wall BR1, and the first passivation layer 340 may be disposed to extend to the support 135. The color filter layer CFL may extend to be adjacent to the side of the substrate SUB close to the support 135. The first overcoat layer 380 may extend to be adjacent to the side of the substrate SUB close to the support 135 while covering the color filter layer CFL. The first passivation layer 340 may be disposed on the low refractive layer 320, the first color pattern 355 of the color filter layer CFL may be disposed on the first passivation layer 340, and the first overcoat layer 380 may be disposed on the color filter layer CFL. Although the first color pattern 355 is shown in the drawings, the present disclosure is not limited thereto, and the first color filter 350 may be disposed instead of the first color pattern 355.

[0193] In an embodiment, the first passivation layer 340 may include a plurality of openings 345. The plurality of openings 345 may penetrate the first passivation layer 340 to expose the low refractive layer 320 thereunder. The plurality of openings 345 may be disposed in the non-display area NDA of the display device 10. In an embodiment, for example, the plurality of openings 345 may be disposed between the side of the bank 180 and the plurality of partition walls BR1 and BR2.

[0194] like Fig.17 As shown in , a plurality of openings 345 may be formed in the non-display area NDA to surround the display area DPA. In an embodiment, the plurality of openings 345 may be defined in a line shape in a plan view, for example, the plurality of openings 345 may form a closed loop shape in a plan view. In the drawings, two closed loop-shaped openings 345 are shown, but the present disclosure is not limited thereto, and three or more closed loop-shaped openings 345 may be formed.

[0195] In addition, if Fig.18 As shown in FIG. 1 , a plurality of openings 345 may be formed in the non-display area NDA in a dot shape surrounding the display area DPA. In this case, the plurality of openings 345 may be defined to be spaced apart from each other.

[0196] The low-refractive layer 320 may include a first region 322 and a second region 324. The first region 322 of the low-refractive layer 320 may be a region overlapping with the opening 345 of the first passivation layer 340, and the second region 324 may be a remaining region except the first region 322. The first region 322 and the second region 324 may be disposed in the non-display area NDA. In addition, the first region 322 of the low-refractive layer 320 may be in direct contact with the first color pattern 355 of the color filter layer CFL, and the second region 324 may be spaced apart from the first color pattern 355 of the color filter layer CFL so as not to contact it.

[0197] The first region 322 of the low-refractive layer 320 may not include the pores PO, and the second region 324 may include the pores PO. In another embodiment, the first region 322 of the low-refractive layer 320 may have a smaller number of pores PO than that of the second region 324.

[0198] The color filter layer CFL may be formed by applying a color filter solution to the first passivation layer 340 in which a plurality of openings 345 are defined through a solution process such as an inkjet method. In this case, the color filter solution may diffuse into the first region 322 of the low-refractive layer 320 exposed by the plurality of openings 345. That is, the color filter solution may diffuse into the first region 322 of the low-refractive layer 320 to fill the pores PO, thereby removing the pores PO in the first region 322. The color filter solution diffused in the first region 322 of the low-refractive layer 320 is cured during the curing process of the first color pattern 355, and serves as a part of the low-refractive layer 320. Accordingly, the pores PO in the first region 322 of the low-refractive layer 320 may be removed, thereby improving the adhesion performance with the capping layer 300 thereunder.

[0199] Since the color filter solution diffuses, the first area 322 of the low refractive layer 320 may include or consist of a component of the color filter solution. For example, the first area 322 of the low refractive layer 320 may include the same material as the first color pattern 355, and may include an organic material of the first color pattern 355.

[0200] As described above, in the illustrated embodiment, the opening 345 of the first passivation layer 340 may be formed on the low-refractive layer 320 in the non-display area NDA to bring the low-refractive layer 320 into contact with the first color pattern 355 of the color filter layer CFL, thereby removing the pores PO in the low-refractive layer 320 and improving the interfacial adhesion performance with the capping layer 300. Specifically, it is possible to further prevent delamination of the interface between the low-refractive layer 320 and the capping layer 300 from starting in the non-display area NDA which is the outer edge of the display device 10.

[0201] Although not shown in the drawings, as shown in the reference Figures 3 to 10 As in the described embodiment, a plurality of openings 345 may also be defined in the first passivation layer 340 in the display area DPA.

[0202] Fig.19 is a cross-sectional view showing another example of a display device.

[0203] refer to Fig.19 , the embodiments explained are similar to those described above Figures 16 to 18 The embodiment of the present invention is different in that the first passivation layer 340 includes a first passivation portion 342 (instead of a plurality of openings 345 in the non-display area NDA) and a second passivation portion 344. In the following description, redundant descriptions of the above-mentioned embodiment will be omitted and the differences will be focused on.

[0204] The first passivation layer 340 may include a first passivation portion 342 and a second passivation portion 344. The first passivation portion 342 may have a relatively small thickness, and the second passivation portion 344 may have a thickness greater than the thickness TT1 of the first passivation portion 342. The first passivation portion 342 and the second passivation portion 344 may be disposed in the non-display area NDA. The arrangement of the first passivation portion 342 is similar to that described above. Figures 16 to 18 The arrangement of the plurality of openings 345 in the embodiments is the same, and thus a description thereof will be omitted.

[0205] The thickness TT1 of the first passivation portion 342 may be in the range of about 10nm to about 100nm, and the thickness TT2 of the second passivation portion 344 may be in the range of about 100nm to about 1000nm. In the illustrated embodiment, the thickness TT1 of the first passivation portion 342 may be formed in the range of about 10nm to about 100nm, allowing a seam to be formed in the first passivation portion 342. The seam of the first passivation portion 342 may serve as such a path through which a color filter solution of a first color pattern 355 for forming a color filter layer CFL disposed on the first passivation portion 342 may penetrate. In this case, the color filter solution may diffuse into the low refractive layer 320 below it through the seam of the first passivation portion 342 of the first passivation layer 340. That is, the color filter solution may diffuse into the pores PO of the low refractive layer 320 to fill the pores PO, thereby removing the pores PO of the low refractive layer 320. Accordingly, the pores PO of the low-refractive layer 320 may be removed, thereby improving adhesion performance with the capping layer 300 thereunder.

[0206] The low-refractive layer 320 disposed under the first passivation layer 340 may include a first region 322 and a second region 324. The first region 322 of the low-refractive layer 320 may be a region overlapping the first passivation portion 342 of the first passivation layer 340, and the second region 324 may be a remaining region except the first region 322 and may overlap the second passivation portion 344.

[0207] Since the color filter solution penetrates the first area 322 through the first passivation portion 342 of the first passivation layer 340 to remove the pores PO, the first area 322 of the low-refractive layer 320 may not include the pores PO. The second area 324 of the low-refractive layer 320 may include the pores PO. In another embodiment, the first area 322 of the low-refractive layer 320 may have a number of pores PO less than the number of pores PO of the second area 324.

[0208] As described above, in the illustrated embodiment, a first passivation portion 342 having a relatively small thickness can be formed in the first passivation layer 340, and the pores PO in the first region 322 of the low refractive layer 320 overlapping with the first color pattern 355 of the color filter layer CFL in the non-display area NDA can be removed, thereby improving the interface adhesion performance with the capping layer 300.

[0209] Fig. 20 is a SEM image of a low-refractive layer manufactured according to a comparative example. Fig.21 is a SEM image of a low-refractive layer manufactured according to a test example.

[0210] In the comparative example, a sample was manufactured by forming a low refractive layer 320 including the voids PO on a substrate SUB, forming a first passivation layer 340 on the low refractive layer 320 , and applying an organic coating layer ORL formed by coating an organic material on the first passivation layer 340 .

[0211] In the test example, samples were manufactured under the same conditions as those of the comparative example, except that the first passivation layer 340 was omitted.

[0212] refer to Fig. 20 In the sample according to the comparative example, many pores were observed in the low-refractive layer 320. Fig.21 , in the sample according to the test example, it was confirmed that the voids in the low-refractive layer 320 were removed.

[0213] Through this result, it can be seen that when the organic material is coated on the low-refractive layer 320, the organic material diffuses into the low-refractive layer 320 to remove the voids PO.

[0214] At the end of the detailed description, those skilled in the art will appreciate that many changes and modifications may be made to the preferred embodiment without substantially departing from the principles of the present invention. Therefore, the disclosed preferred embodiments of the present invention are used only in a general and descriptive sense and not for the purpose of limitation.

Claims

1. A display device, comprising: A light emitting element layer is disposed on the substrate; A thin film encapsulation layer, disposed on the light emitting element layer; a bank disposed on the thin film encapsulation layer and separating an emission region and a non-emission region; a capping layer, disposed on the dike; a low-refractive layer disposed on the capping layer and comprising pores; a passivation layer disposed on the low-refractive layer and defining a plurality of openings; as well as a color filter layer, disposed on the passivation layer, wherein the low-refractive layer overlaps with the plurality of openings and includes a first region and a second region different from the first region, and The first region contacts the color filter layer.

2. The display device according to claim 1, wherein: The first region overlaps the non-emitting region, and the second region overlaps the emitting region.

3. The display device according to claim 1, wherein: The first region does not include the pores, and the second region includes the pores.

4. The display device according to claim 1, wherein: The first region has a number of pores that is less than the number of pores of the second region.

5. The display device according to claim 1, wherein: The color filter layer includes a first color filter overlapping one of the emission regions and a first color pattern overlapping the non-emission region, and The first region contacts at least one of the first color filter and the first color pattern.

6. The display device according to claim 5, wherein: The first region includes an organic material and / or a colorant of the at least one of the first color filter and the first color pattern.

7. The display device according to claim 1, wherein: The plurality of openings of the passivation layer overlap the non-emission region.

8. The display device according to claim 7, wherein: The plurality of openings are defined in a dot shape or a grid shape in a plan view.

9. A display device, comprising: A light emitting element layer is disposed on the substrate; A thin film encapsulation layer, disposed on the light emitting element layer; a bank disposed on the thin film encapsulation layer and separating an emission region and a non-emission region; a capping layer, disposed on the dike; a low-refractive layer disposed on the capping layer and comprising pores; a passivation layer disposed on the low-refractive layer and including a first passivation portion and a second passivation portion having a thickness greater than that of the first passivation portion; as well as a color filter layer, disposed on the passivation layer, The low-refractive layer overlaps the first passivation portion and includes a first region that does not include the pores and a second region that is a remaining region other than the first region and includes the pores.

10. The display device according to claim 9, wherein: The first passivation portion overlaps the non-emission region, and the second passivation portion overlaps the emission region.

11. The display device according to claim 9, wherein: The thickness of the first passivation portion is in the range of 10 nm to 100 nm.

12. The display device according to claim 9, wherein: The color filter layer includes a first color filter overlapping one of the emission regions and a first color pattern overlapping the non-emission region, and The first region overlaps at least one of the first color filter and the first color pattern.

13. A display device, comprising: A light emitting element layer is disposed on the substrate; A thin film encapsulation layer, disposed on the light emitting element layer; a bank disposed on the thin film encapsulation layer and separating an emission region and a non-emission region; a capping layer, disposed on the dike; a low-refractive layer disposed on the capping layer and comprising pores; a first passivation layer, disposed on the low-refractive layer and defining a plurality of openings; an outer coating layer disposed on the first passivation layer; as well as a color filter layer disposed on the outer coating layer, wherein the low-refractive layer overlaps with the plurality of openings and includes a first region and a second region different from the first region, and The first region contacts the outer coating.

14. The display device according to claim 13, wherein: The first region does not include the pores, and the second region includes the pores.

15. The display device according to claim 13, wherein: The first region has a number of pores that is less than the number of pores of the second region.

16. The display device according to claim 13, wherein: The first region includes the organic material of the overcoat layer.

17. The display device according to claim 13, further comprising: The second passivation layer is disposed between the overcoat layer and the color filter layer.

18. A display device comprising: A substrate including a display area and a non-display area; A light emitting element layer is arranged in the display area of ​​the substrate; A thin film encapsulation layer, disposed on the light emitting element layer; a bank disposed on the thin film encapsulation layer and separating an emission region and a non-emission region; a capping layer disposed on the bank and extending to the non-display area; a low-refractive layer, disposed on the cover layer, extending from the display area to the non-display area and comprising pores; a passivation layer disposed on the low-refractive layer and including a plurality of openings defined in the non-display area; as well as a color filter layer disposed on the passivation layer in the display area and the non-display area, wherein the low-refractive layer overlaps with the plurality of openings and includes a first region and a second region different from the first region, and The first region contacts the color filter layer.

19. The display device according to claim 18, wherein: The plurality of openings surround the display area and are defined in a line shape or a dot shape in a plan view.

20. The display device according to claim 18, wherein: The first region does not include the pores, and the second region includes the pores.

21. The display device according to claim 18, wherein: The first region has a number of pores that is less than the number of pores of the second region.

22. The display device according to claim 18, wherein: The first region includes an organic material of the color filter layer.

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