Display device, display substrate and manufacturing method thereof

Abstract

The invention discloses a display device, a display substrate and a manufacturing method of the display substrate. The display substrate sequentially comprises a substrate, a middle layer provided with a light-emitting structure, a first insulation protection layer and a second insulation protection layer in the first direction. In the direction parallel to a first direction, the display substrate comprises a punching area, a display area surrounding the punching area, a middle area arranged between the punching area and the display area and a hollowed-out area, and the hollowed-out area is partially overlapped with the middle area in the first direction. The second insulation protection layer is cut off by the hollow area in the first direction; the first direction is perpendicular to one surface of the substrate and points to the direction of the second insulation protection layer. The second insulation protection layer is hollowed out in the hollowed-out area, pulling on the edge of the AA Hole when the second insulation protection layer shrinks and warps is reduced, and the situation that a film layer is Peelled, a water vapor invasion channel is formed, and GDSH is caused is prevented.

Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to a display device, a display substrate and a manufacturing method thereof. Background Art

[0002] Display screens are moving towards the full-screen era. In order to increase the screen-to-body ratio, most products are designed as AA (Active Area) Hole products, and the camera is punched in the AA area to increase the screen-to-body ratio. In order to improve the light extraction efficiency, the existing AMOLED (Active Matrix Organic Light Emitting Diode) is designed with two layers of OC (over coating) with different refractive indices on the top layer, which causes the OC layer in the AA Hole area to be too thick. When the display screen is heated, the OC layer shrinks and warps, pulling the edge of the AA Hole, causing the film layer to peel, forming a water vapor intrusion channel, and triggering GDSH (water vapor oxidation in the opening area caused by cracks, scratches, top injuries, etc. caused by packaging or external forces).

[0003] Therefore, it is necessary to provide an improved display panel, a display device, a display substrate and a manufacturing method thereof to solve the above problems. Summary of the invention

[0004] The purpose of the present application is to provide a display device, a display substrate and a manufacturing method thereof that prevent the induction of GDSH.

[0005] The present application discloses a display substrate, which in a first direction sequentially comprises:

[0006] substrate;

[0007] An intermediate layer, wherein the intermediate layer is provided with a light-emitting structure;

[0008] a first insulating protective layer;

[0009] A second insulating protective layer;

[0010] The display substrate includes, in parallel with the first direction:

[0011] Punch area;

[0012] A display area, the display area surrounding the punching area;

[0013] A middle area, the middle area is arranged between the perforated area and the display area;

[0014] a hollowed-out area, wherein the hollowed-out area partially overlaps with the middle area in a first direction, and the hollowed-out area cuts off the second insulating protection layer in the first direction;

[0015] The first direction is perpendicular to one side of the substrate and points to the second insulating protection layer.

[0016] Optionally, a projection of the punching area in the first direction falls into the hollowing area.

[0017] Optionally, a projection of a boundary of the hollowed-out area in the first direction falls into the middle area.

[0018] Optionally, the hollowed-out area includes a first hollowed-out area in an annular shape, the projection of an inner boundary of the first hollowed-out area in the first direction falls into the punching area; the projection of an outer boundary of the first hollowed-out area in the first direction falls into the middle area.

[0019] Optionally, the hollowed-out area includes a second hollowed-out area in an annular shape, and projections of an inner boundary and an outer boundary of the second hollowed-out area in the first direction both fall into the middle area.

[0020] Optionally, the portion covered by the middle area includes, in sequence from the perforated area to the display area, a plurality of outer isolation columns, a retaining wall, a plurality of inner isolation columns and a display peripheral area.

[0021] Optionally, the projection of the hollowed-out area in the first direction covers the perforated area; the projection of the hollowed-out area in the first direction covers the middle area from the edge of the perforated area to the outer isolation column closest to the perforated area.

[0022] Optionally, the projection of the hollowed-out area in the first direction covers the perforated area; the projection of the hollowed-out area in the first direction covers the middle area from the edge of the perforated area to the inner isolation column farthest from the perforated area.

[0023] Optionally, the projection of the hollowed-out area in the first direction covers the perforated area; the projection of the hollowed-out area in the first direction covers the middle area from the edge of the perforated area to a portion of the display peripheral area.

[0024] Optionally, the portion of the second insulating protection layer truncated by the hollowed-out area is filled with the third insulating protection layer.

[0025] Optionally, the hollowed-out area includes a first annular hollowed-out area, the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area; the projection of the outer boundary of the first hollowed-out area in the first direction falls between the outer isolation column farthest from the perforated area and the outer isolation column second farthest from the perforated area.

[0026] Optionally, the hollowed-out area includes:

[0027] A first hollowed-out area in an annular shape, wherein the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area; and the projection of the outer boundary of the first hollowed-out area in the first direction falls between two middle outer isolation pillars of the plurality of outer isolation pillars;

[0028] A second hollowed-out area is in an annular shape, and the projection of the inner boundary of the second hollowed-out area in the first direction falls between the inner isolation column closest to the retaining wall and the second inner isolation column closest to the retaining wall among the plurality of inner isolation columns; the projection of the outer boundary of the second hollowed-out area in the first direction falls between the display peripheral area and the inner isolation column closest to the display peripheral area.

[0029] Optionally, the hollowed-out area includes:

[0030] A first hollowed-out area in an annular shape, wherein the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area; and the projection of the outer boundary of the first hollowed-out area in the first direction falls between two middle outer isolation pillars of the plurality of outer isolation pillars;

[0031] A second hollowed-out area is annular, and the projection of the inner boundary of the second hollowed-out area in the first direction falls between the inner isolation column closest to the retaining wall and the second inner isolation column closest to the retaining wall among the plurality of inner isolation columns; the projection of the outer boundary of the second hollowed-out area in the first direction falls within the display peripheral area of ​​the middle area.

[0032] Optionally, in the display area, the middle layer includes a plurality of pixel units, the first insulating protective layer is in a prism shape surrounding the pixel openings of the pixel units, the second insulating protective layer covers the first insulating protective layer, and the refractive index of the second insulating protective layer is greater than that of the first insulating protective layer.

[0033] Optionally, in the display area, the intermediate layer further includes an inductive capacitor, and the first insulating protection layer covers the inductive capacitor.

[0034] The present application also discloses a method for manufacturing a display substrate, which comprises:

[0035] forming an intermediate layer on one side of the substrate, wherein the intermediate layer includes a light-emitting layer and a touch-control layer;

[0036] forming a first insulating protective layer on a side of the intermediate layer away from the substrate;

[0037] forming a second insulating protective layer on a side of the first insulating protective layer away from the intermediate layer;

[0038] The display substrate is divided into a perforated area, a display area, a middle area and a hollowed-out area; the display area surrounds the perforated area; the middle area is arranged between the perforated area and the display area; the hollowed-out area partially overlaps with the middle area in a first direction, and the second insulating protective layer covering the hollowed-out area in the first direction is removed.

[0039] Optionally, the projection of the hollowed-out area in the first direction covers the perforated area, and the projection of the boundary of the hollowed-out area in the first direction falls within the middle area which is greater than or equal to 30 μm away from the boundary of the perforated area.

[0040] Optionally, the method for manufacturing the display substrate further includes:

[0041] The removed second insulating protection layer portion covering the hollowed-out area in the first direction is filled to form a third insulating protection layer.

[0042] Optionally, a retaining wall is provided in the middle area, and the hollowed-out area includes a first annular hollowed-out area, and the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area which is greater than or equal to 30 μm away from the boundary of the perforated area; the projection of the outer boundary of the first hollowed-out area in the first direction falls within the range from greater than or equal to 30 μm away from the boundary of the perforated area to the side of the retaining wall close to the perforated area.

[0043] Optionally, a plurality of inner isolation columns are provided on the side of the retaining wall away from the perforated area; the hollowed-out area includes a second annular hollowed-out area, and the projection of the inner boundary of the second hollowed-out area in the first direction falls between the side of the retaining wall away from the perforated area and the inner isolation columns closest to the display area; the projection of the outer boundary of the second hollowed-out area in the first direction falls between the inner isolation columns closest to the display area and the boundary of the display area.

[0044] The present application also discloses a display device, which includes the above-mentioned display substrate.

[0045] Compared with the related art, the hollowed-out area of ​​the present application hollows out the second insulating protective layer, reducing the pulling on the edge of the AA Hole when the second insulating protective layer shrinks and warps, preventing peeling of the film layer, forming a water vapor intrusion channel, and triggering GDSH.

[0046] It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present specification. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the specification and, together with the description, serve to explain the principles of the specification.

[0048] Figure 1 It is a schematic top view showing an embodiment of a substrate in the present application.

[0049] Figure 2 It is a schematic diagram of the hierarchical structure of the display area in one embodiment of the display substrate of the present application.

[0050] Figure 3 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0051] Figure 4 It is a schematic top view of a touch layer in an embodiment of a substrate structure of the present application.

[0052] Figure 5 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0053] Figure 6 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0054] Figure 7 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0055] Figure 8 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0056] Fig. 9 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0057] Fig.10 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0058] Fig.11 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application.

[0059] Fig.12 This is a schematic diagram showing the hierarchical structure of the middle area and the perforated area in an embodiment of the substrate of the present application. DETAILED DESCRIPTION

[0060] Exemplary embodiments will be described in detail herein, examples of which are shown in the accompanying drawings. When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The implementations described in the following exemplary embodiments do not represent all implementations consistent with this specification. Instead, they are merely examples of devices and methods consistent with some aspects of this specification as detailed in the appended claims.

[0061] The terms used in this application are only for the purpose of describing specific embodiments and are not intended to limit the present disclosure. Unless otherwise defined, the technical terms or scientific terms used in this specification should be understood by people with ordinary skills in the field to which this application belongs. The words "first", "second" and similar words used in this specification and claims do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, words such as "one" or "one" do not indicate a quantitative limit, but indicate the existence of one. "Multiple" or "several" means two or more. Unless otherwise specified, words such as "front", "rear", "lower" and / or "upper" are only for the convenience of explanation and are not limited to one position or one spatial orientation. Words such as "include" or "comprise" mean that the elements or objects appearing in front of "include" or "comprise" include the elements or objects listed after "include" or "comprise" and their equivalents, and do not exclude other elements or objects. Words such as "connect" or "connected" are not limited to physical or mechanical connections, and can include electrical connections, whether direct or indirect.

[0062] The terms used in this specification are for the purpose of describing specific embodiments only and are not intended to limit the present disclosure. The singular forms of "a", "the" and "the" used in this specification and the appended claims are also intended to include plural forms unless the context clearly indicates otherwise. It should also be understood that the term "and / or" used herein refers to and includes any or all possible combinations of one or more associated listed items.

[0063] like Figures 1 to 3 As shown, the present application provides a display substrate, and the display substrate includes in sequence in a first direction F1:

[0064] Base 10;

[0065] An intermediate layer 20, wherein the intermediate layer 20 is provided with a light-emitting structure;

[0066] A first insulating protective layer 31;

[0067] A second insulating protective layer 32;

[0068] The display substrate includes:

[0069] Punch area 100;

[0070] A display area 300, wherein the display area 300 surrounds the punching area 100;

[0071] A middle area 200, wherein the middle area 200 is disposed between the punching area 100 and the display area 300;

[0072] A hollow area 400 , wherein the hollow area 400 partially overlaps with the middle area 200 in the first direction F1 , and the hollow area 400 cuts off the second insulating protection layer 32 in the first direction F1 ;

[0073] The first direction F1 is perpendicular to one side of the substrate 10 and points to the second insulating protection layer 32 .

[0074] The present application sets a hollow area 400 on the display substrate, and the hollow area 400 partially overlaps with the middle area 200 in the first direction F1. The second insulating protective layer 32 covering the hollow area 400 is removed to reduce the pulling of the insulating protective layer on the edge of the perforated area 100 when the display substrate is heated, thereby preventing the peeling of the film layer and thus preventing the initiation of GDSH.

[0075] The following will describe in detail various embodiments of the present application that are consistent with the above-mentioned creative concepts.

[0076] The first direction F1 of the present application is a direction perpendicular to the display surface and directed from the display substrate to the display side.

[0077] like Figures 1 to 3 As shown, the present application discloses a display substrate.

[0078] The display substrate can be divided into a perforated area 100, a display area 300 and a middle area 200 located between the display area 300 and the perforated area 100 in the display plane. The middle area 200 surrounds the perforated area 100, and the display area 300 surrounds the perforated area 100. The area covered by the perforated area 100 corresponds to the AA Hole.

[0079] The display substrate can be divided into a base 10, an intermediate layer 20 and an insulating protective layer 30 in the first direction F1. The base can be a rigid base. The rigid base can be, for example, a glass base or a PMMA (Polymethyl methacrylate) base. The base 10 can also be a flexible base. For example, the flexible base can be, for example, a PET (Polyethylene terephthalate) base, a PI (Polyimide) base or a PEN (Polyethylene naphthalate two formic acid glycol ester) base. The base can also be a composite base composed of multiple layers of material. It can be understood that the base 10 includes a variety of types, which can be selected and set according to actual needs, and the embodiments of the present disclosure do not limit this.

[0080] like Figures 1 to 4 As shown, in an optional embodiment, the display area 300 is in the area covered by the orthographic projection in the first direction F1, and the intermediate layer 20 of the display substrate includes a control layer 40, a light-emitting layer 50 and a touch layer 60 in the first direction F1. The control layer 40, the light-emitting layer 50 and the touch layer 60 are arranged in sequence from the substrate 10 to the insulating protection layer 30.

[0081] The control layer 40 includes a control structure of the display substrate (not shown in the figure). The control structure controls the operation of the light-emitting layer 50. Optionally, the control structure can be a pixel control circuit or other control structure. The pixel control circuit includes a plurality of transistors and capacitors and metal wires. The pixel control circuit can be a 2T1C control circuit, a 7T1C control circuit or a 16T3C control circuit, etc., as long as it can realize the control of the operation of the light-emitting layer 50.

[0082] The transistor includes a control electrode, a first electrode and a second electrode. The transistors used in the present application can be triodes, thin film transistors or field effect transistors or other devices with the same characteristics. In actual operation, when the transistor is a triode, the control electrode can be the base, the first electrode can be the collector, and the second electrode can be the emitter; or, the control electrode can be the base, the first electrode can be the emitter, and the second electrode can be the collector. In actual operation, when the transistor is a thin film transistor or a field effect transistor, the control electrode can be the gate, the first electrode can be the drain, and the second electrode can be the source; or, the control electrode can be the gate, the first electrode can be the source, and the second electrode can be the drain.

[0083] The control layer 40 is connected to the light-emitting layer 50 through a conductive structure. The light-emitting layer 50 includes a pixel defining layer 51, and the pixel defining layer 51 includes a plurality of opening areas 511. An anode 52, a light-emitting structure layer 53 and a cathode 54 are arranged in the opening area 511, and the anode 52, the light-emitting structure layer 53 and the cathode 54 are stacked in the opening area 511. The structure of the anode 52 can be a composite structure composed of a transparent conductive oxide film / metal film / transparent conductive oxide film stacked in sequence. Among them, the material of the above-mentioned transparent conductive oxide film is, for example, any one of ITO (Indiumtin oxide) and IZO (Indium zinc oxide), and the material of the above-mentioned metal film is, for example, any one of gold (Au), silver (Ag), nickel (Ni) and platinum (Pt). In some examples, the structure of the anode 52 can be a composite structure of ITO / Ag / ITO. For another example, the structure of the anode 52 can also be a single-layer structure, and the material of the single-layer structure can be any one of ITO, IZO, Au, Ag, Ni, and Pt. The material of the cathode 54 can be any one of aluminum (Al), silver (Ag) and magnesium (Mg), or any one of magnesium-silver alloy and aluminum-lithium alloy. The light-emitting structure layer 53 can be a light-emitting structure layer 53 that emits green light, a light-emitting structure layer 53 that emits blue light, or a light-emitting structure layer 53 that emits red light. The three light-emitting structure layers 53 that emit different light are regularly distributed in a plane in a number of opening areas 511 on the pixel defining layer 51. The three light-emitting structure layers 53 that emit different light in a specific array are controlled by the control structure of the control layer 40 to realize the display function. An encapsulation layer 55 is provided on the side of the cathode 54 away from the light-emitting structure layer 53. The encapsulation layer 55 can be composed of only one layer of inorganic material, or only one layer of organic material, or can be formed by stacking several layers of inorganic material and organic material. In this embodiment, the encapsulation layer 55 includes a first inorganic encapsulation layer 551 disposed on the side of the cathode 54 away from the light-emitting structure layer 53, the encapsulation layer 55 also includes an organic encapsulation layer 552 disposed on the side of the first inorganic encapsulation layer 551 away from the cathode 54, and the encapsulation layer 55 also includes a second inorganic encapsulation layer 553 disposed on the side of the organic encapsulation layer 552 away from the first inorganic encapsulation layer 551. The first inorganic encapsulation layer 551 and the second inorganic encapsulation layer 553 can be made of inorganic insulating materials such as nitrides, oxides, nitrogen oxides, nitrates, carbides or any combination thereof. The organic encapsulation layer 552 can be made of organic insulating materials such as acrylic, hexamethyldisiloxane, polyacrylates, polycarbonates or polystyrene. Among them, the organic encapsulation layer 552 can be formed of organic materials by an inkjet printing process. The first inorganic encapsulation layer 551 and the second inorganic encapsulation layer 553 can be formed by a chemical vapor deposition process.

[0084] The touch layer 60 is disposed on the side of the light emitting layer 50 away from the control layer 40. The touch layer 60 includes a buffer layer 61 disposed on the side of the light emitting layer 50 away from the control layer 40, and the buffer layer 61 can be formed of an insulating material such as silicon nitride. In this embodiment, the buffer layer 61 is disposed on the side of the second inorganic encapsulation layer 553 away from the organic encapsulation layer 552. The touch layer 60 also includes a first electrode layer 62 disposed on the side of the buffer layer 61 away from the second inorganic encapsulation layer 553. The touch layer 60 also includes a touch insulating layer 63 disposed on the side of the first electrode layer 62 away from the buffer layer 61 and covering the first electrode layer 62. The touch layer 60 also includes a second electrode layer 65 disposed on the side of the touch insulating layer 63 away from the first electrode layer 62. The second electrode layer 65 includes a plurality of first electrodes 651 arranged along the second direction F2, and the second electrode layer 65 also includes a plurality of second electrodes 652 arranged along the third direction F3. The second direction F2 intersects with the third direction F3. The plurality of first electrodes 651 arranged along the second direction F2 are directly connected in the second electrode layer 65. The plurality of second electrodes 652 arranged along the third direction F3 are disconnected in the second electrode layer 65 at the position intersecting with the first electrode 651. The plurality of second electrodes 652 arranged along the third direction F3 are connected through the first electrode layer 62 at the position intersecting with the first electrode 651. The touch layer 60 includes a bridge layer 64 penetrating the touch insulating layer 63, and the bridge layer 64 is a conductive structure. The bridge layer 64 connects the second electrode 652 and the first electrode layer 62, so that the adjacent second electrodes 652 are connected through the first electrode layer 62. In this way, the plurality of first electrodes 651 arranged along the second direction F2 and the plurality of second electrodes 652 arranged along the third direction F3 form a sensing capacitor at the intersection to realize the touch function. The orthographic projections of the intersections of the plurality of first electrodes 651 arranged along the second direction F2 and the plurality of second electrodes 652 arranged along the third direction F3 in the first direction F1 have no overlapping areas with the plurality of opening areas 511 on the pixel defining layer 51 , that is, the projections of the sensing capacitors in the first direction F1 have no overlapping areas with the opening areas 511 .

[0085] An insulating protective layer 30 is disposed on the side of the touch layer 60 away from the light-emitting layer 50. The insulating protective layer 30 includes a first insulating protective layer 31 disposed on the side of the second electrode layer 65 away from the touch insulating layer 63. The projection of the first insulating protective layer 31 in the first direction F1 has no overlapping area with the plurality of opening areas 511 on the pixel defining layer 51. The projection of the first insulating protective layer 31 in the first direction F1 surrounds the plurality of opening areas 511 on the pixel defining layer 51. The first insulating protective layer 31 covers the intersection area of ​​the plurality of first electrodes 651 arranged along the second direction F2 and the plurality of second electrodes 652 arranged along the third direction F3. That is, an insulating protective layer 31 covers the sensing capacitor. The first insulating protective layer 31 has a prism morphology. A second insulating protective layer 32 is disposed on the side of the first insulating protective layer 31 away from the touch layer 60. The second insulating protective layer 32 covers the first insulating protective layer 31 and the touch insulating layer 63. The refractive index of the second insulating protective layer 32 is higher than that of the first insulating protective layer 31. Such an arrangement enables the light emitted from the light emitting structure layer 53 in the opening area 511 to be totally reflected on the surface of the first insulating protection layer 31 , thereby improving the light extraction efficiency of the display substrate.

[0086] like Figures 1 to 4 As shown, in an optional embodiment, the middle area 200 is in the area covered by the positive projection of the first direction F1, in a plane perpendicular to the first direction F1, from the perforated area 100 to the display area 300, including a plurality of outer isolation columns 210, a retaining wall 220, a plurality of inner isolation columns 230 and a display peripheral area 240.

[0087] The display peripheral area 240 includes a portion of the structure extending from the display area 300 , such as the pixel defining layer 51 , the anode 52 , the light emitting structure layer 53 , the cathode 54 and the encapsulation layer 55 in the light emitting layer 50 (not all of which are shown in the figure).

[0088] The number of the plurality of inner isolation columns 230 can be determined according to the requirements. Optionally, the number of the plurality of inner isolation columns 230 can be two, three, four, five, six, etc. In the present embodiment, the number of the plurality of inner isolation columns 230 is three. The inner isolation column 230 includes an extended light-emitting structure layer 53 and a first inorganic encapsulation layer 551. The inner isolation column 230 also includes a pad 231, which is disposed below the light-emitting structure layer 53, thereby raising the light-emitting structure layer 53 in the inner isolation column 230 in the first direction F1, so that the light-emitting structure layer 53 in the inner isolation column 230 is disconnected from the light-emitting structure layer 53 in the non-inner isolation column 230. In this way, pollution such as water vapor is blocked at the inner isolation column 230 and cannot spread into the display substrate along the light-emitting structure layer 53. The first inorganic encapsulation layer 551 covers the light-emitting structure layer 53, thereby forming the structure of the inner isolation column 230. The pad 231 may be a single metal structure or a structure composed of multiple metals. For example, the pad 231 may be a laminated structure of titanium / aluminum / titanium.

[0089] The number of retaining walls 220 can be determined according to demand. Optionally, the retaining walls 220 can be one, two or three, etc. The main part of the retaining wall 220 can be formed together when the pixel defining layer 51 is formed. When preparing the pixel defining layer 51, a protrusion can be prepared at the position of the retaining wall 220. The length of the protrusion in the first direction F1 is greater than the length of the inner isolation column 230 and the outer isolation column 210 in the first direction F1. When the display area 300 prepares the organic encapsulation layer 552 by inkjet printing, the organic substance will flow. The setting of the retaining wall 220 blocks the organic substance on the side of the retaining wall 220 away from the perforated area 100, preventing the overflow of the organic substance. The protrusion is sequentially covered with the light-emitting structure layer 53, the first inorganic encapsulation layer 551, the organic encapsulation layer 552 and the second inorganic encapsulation layer 553.

[0090] The number of the plurality of outer spacer columns 210 can be determined according to the requirements. Optionally, the number of the plurality of outer spacer columns 210 can be two, three, four, five, six, etc. In the present embodiment, the number of the plurality of outer spacer columns 210 is three. The outer spacer columns 210 include an extended light-emitting structure layer 53, a first inorganic encapsulation layer 551, an organic encapsulation layer 552, and a second inorganic encapsulation layer 553. The outer spacer columns 210 also include a pad 231, which is disposed below the light-emitting structure layer 53, thereby raising the light-emitting structure layer 53 in the outer spacer columns 210 in the first direction F1, so that the light-emitting structure layer 53 in the outer spacer columns 210 is disconnected from the light-emitting structure layer 53 in the non-external spacer columns 210. In this way, pollution such as water vapor is blocked at the outer spacer columns 210 and cannot spread along the light-emitting structure layer 53 to the display substrate. The first inorganic encapsulation layer 551 covers the light emitting structure layer 53, the organic encapsulation layer 552 covers the first inorganic encapsulation layer 551, and the second inorganic encapsulation layer 553 covers the organic encapsulation layer 552, thereby forming the outer isolation column 210 structure. The pad 231 can be a single metal structure or a structure of multiple metals. For example, the pad 231 can be a stacked structure of titanium / aluminum / titanium.

[0091] The perforated area 100 includes, from bottom to top, a substrate 10, a light emitting structure layer 53, a first inorganic encapsulation layer 551, an organic encapsulation layer 552, and a second inorganic encapsulation layer 553. The insulating protective layer 30 covers the entire display substrate, and the first insulating protective layer 31 located in the middle area 200 and the perforated area 100 is not set to a prism morphology, but covers the middle area 200 and the perforated area 100 in an entire layer, and the second insulating protective layer 32 also covers the middle area 200 and the perforated area 100 in an entire layer.

[0092] The display substrate further includes a hollow area 400, which partially overlaps the middle area 200 in the first direction F1 and cuts off the second insulating protection layer 32 in the first direction F1. That is, the second insulating protection layer 32 covered by the hollow area 400 in the first direction F1 is removed.

[0093] like Figure 3 As shown, in an optional embodiment, the projection of the perforated area 100 in the first direction F1 falls into the hollowed-out area 400. That is, the hollowed-out area 400 covers the entire perforated area 100, and the hollowed-out area 400 covers part of the middle area 200 around the perforated area 100. Optionally, the projection of the boundary of the hollowed-out area 400 in the first direction F1 falls into the middle area 200. That is, the hollowed-out area 400 covers the entire perforated area 100, and the hollowed-out area 400 covers a circle of the middle area 200 around the perforated area 100.

[0094] like Figure 3As shown, in an optional embodiment, the projection of the hollow area 400 in the first direction F1 covers the perforated area 100. The projection of the hollow area 400 in the first direction F1 covers the middle area 200 from the edge of the perforated area 100 to the outer isolation column 210 closest to the perforated area 100.

[0095] like Figure 5 As shown, in an optional embodiment, the projection of the hollow area 400 in the first direction F1 covers the perforated area 100. The projection of the hollow area 400 in the first direction F1 covers the middle area 200 from the edge of the perforated area 100 to the inner isolation column 230 farthest from the perforated area 100.

[0096] like Figure 6 As shown, in an optional embodiment, the projection of the hollow area 400 in the first direction F1 covers the perforated area 100. The projection of the hollow area 400 in the first direction F1 covers the middle area 200 from the edge of the perforated area 100 to a portion of the display peripheral area 240.

[0097] like Figures 7 to 9 As shown, in an optional embodiment, the portion of the second insulating protection layer 32 cut off by the hollowing area 400 is filled with a third insulating protection layer 33. The third insulating protection layer 33 can be filled by an inkjet printing process or an etching process.

[0098] like Fig.10 As shown, in an optional embodiment, the hollow area 400 includes a first hollow area 410 in an annular shape, and the projection of the inner boundary of the first hollow area 410 in the first direction F1 falls into the punching area 100. The projection of the outer boundary of the first hollow area 410 in the first direction F1 falls into the middle area 200. In this way, the cutting line when the punching area 100 is punched can be avoided, and the influence of the film sticking / tearing process on the punching area 100 during cutting can be prevented. The hollow area 400 includes a second hollow area 420 in an annular shape, and the projections of the inner boundary and the outer boundary of the second hollow area 420 in the first direction F1 both fall into the middle area 200. In this way, the second hollow area 420 can release the internal stress of the film layer, reduce the pulling of the edge of the AA Hole caused by the contraction of the second insulating protective layer 32, cause the peeling of the film layer, form a water vapor intrusion channel, and trigger GDSH.

[0099] like Fig.10 As shown, in an optional embodiment, the hollowed-out area 400 includes a first hollowed-out area 410 in an annular shape, and the projection of the inner boundary of the first hollowed-out area 410 in the first direction F1 falls into the punching area 100. The projection of the outer boundary of the first hollowed-out area 410 in the first direction F1 falls between the outer isolation column 210 farthest from the punching area 100 and the outer isolation column 210 second farthest from the punching area 100.

[0100] like Fig.11As shown, in an optional embodiment, the hollow area 400 includes a first hollow area 410 in an annular shape, and the projection of the inner boundary of the first hollow area 410 in the first direction F1 falls into the punching area 100. The projection of the outer boundary of the first hollow area 410 in the first direction F1 falls between the middle two outer isolation pillars 210 of the plurality of outer isolation pillars 210.

[0101] The hollowed-out area 400 further includes a second hollowed-out area 420 in an annular shape, and the projection of the inner boundary of the second hollowed-out area 420 in the first direction F1 falls between the inner isolation column 230 closest to the retaining wall 220 and the inner isolation column 230 second closest to the retaining wall 220 among the plurality of inner isolation columns 230. The projection of the outer boundary of the second hollowed-out area 420 in the first direction F1 falls between the display peripheral area 240 and the inner isolation column closest to the display peripheral area 240.

[0102] like Fig.12 As shown, in an optional embodiment, the hollow area 400 includes a first hollow area 410 in an annular shape, and the projection of the inner boundary of the first hollow area 410 in the first direction F1 falls into the punching area 100. The projection of the outer boundary of the first hollow area 410 in the first direction F1 falls between the middle two outer isolation pillars 210 of the plurality of outer isolation pillars 210.

[0103] The hollowed-out area 400 further includes a second hollowed-out area 420 in an annular shape, and the projection of the inner boundary of the second hollowed-out area 420 in the first direction F1 falls between the inner isolation column 230 closest to the retaining wall 220 and the inner isolation column 230 second closest to the retaining wall 220 among the plurality of inner isolation columns 230. The projection of the outer boundary of the second hollowed-out area 420 in the first direction F1 falls within the display peripheral area 240 of the middle area 200.

[0104] The present application also discloses a method for manufacturing a display substrate, comprising:

[0105] An intermediate layer 20 is formed on one side of the substrate 10 , and the intermediate layer 20 includes a light emitting layer 50 and a touch control layer 60 .

[0106] A first insulating protection layer 31 is formed on a side of the intermediate layer 20 away from the substrate 10 .

[0107] The second insulating protection layer 32 is formed on a side of the first insulating protection layer 31 away from the intermediate layer 20 .

[0108] The display substrate is divided into a punching area 100, a display area 300, a middle area 200 and a hollowing area 400. The display area 300 surrounds the punching area 100. The middle area 200 is disposed between the punching area 100 and the display area 300. The hollowing area 400 partially overlaps with the middle area 200 in the first direction F1, and the second insulating protection layer 32 covering the hollowing area 400 in the first direction F1 is removed.

[0109] like Figures 3 to 6 As shown, in an optional embodiment, the projection of the hollow area 400 in the first direction F1 covers the punching area 100 , and the projection of the boundary of the hollow area 400 in the first direction F1 falls into the middle area 200 which is greater than or equal to 30 μm away from the boundary of the punching area 100 .

[0110] like Figures 7 to 9 As shown, in an optional embodiment, the removed second insulating protection layer 32 portion covering the hollow area 400 in the first direction F1 is filled to form a third insulating protection layer 33 .

[0111] like Figures 10 to 12 As shown, in an optional embodiment, the middle area is provided with a retaining wall 220, and the hollowing area 400 includes a first hollowing area 410 in an annular shape, and the projection of the inner boundary of the first hollowing area 410 in the first direction F1 falls within the perforated area 100 which is greater than or equal to 30 μm from the boundary of the perforated area 100. The projection of the outer boundary of the first hollowing area 410 in the first direction F1 falls within the range from greater than or equal to 30 μm from the boundary of the perforated area 100 to the side of the retaining wall 220 close to the perforated area 100.

[0112] like Figures 10 to 12 As shown, in an optional embodiment, a plurality of inner isolation columns 230 are disposed on the side of the retaining wall 220 away from the perforated area 100. The hollowed-out area 400 includes a second hollowed-out area 420 in an annular shape, and the projection of the inner boundary of the second hollowed-out area 420 in the first direction F1 falls between the side of the retaining wall 220 away from the perforated area 100 and the inner isolation column 230 closest to the display area 300. The projection of the outer boundary of the second hollowed-out area 420 in the first direction F1 falls between the inner isolation column 230 closest to the display area 300 and the boundary of the display area 300.

[0113] The present application also discloses a display device, which includes the above-mentioned display substrate.

[0114] The hollowed-out area of ​​the present application hollows out the second insulating protective layer, thereby reducing the pulling on the edge of the AA Hole when the second insulating protective layer shrinks and warps, preventing peeling of the film layer, forming a water vapor intrusion channel, and inducing GDSH.

[0115] Those skilled in the art will readily appreciate other embodiments of the specification after considering the specification and practicing the invention claimed herein. The specification is intended to cover any variations, uses or adaptations of the specification that follow the general principles of the specification and include common knowledge or customary techniques in the art that are not claimed in the specification. The specification and examples are to be considered exemplary only, and the true scope and spirit of the specification are indicated by the following claims.

[0116] It should be understood that the present description is not limited to the precise structures that have been described above and shown in the drawings, and that various modifications and changes may be made without departing from the scope thereof. The scope of the present description is limited only by the appended claims.

[0117] The above description is only a preferred embodiment of this specification and is not intended to limit this specification. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of this specification should be included in the scope of protection of this specification.

Claims

1. A display substrate, characterized in that: In the first direction, the display substrate includes: substrate; An intermediate layer, wherein the intermediate layer is provided with a light-emitting structure; A first insulating protective layer; A second insulating protective layer; The display substrate includes, in parallel with the first direction: Punch area; A display area, the display area surrounding the punching area; A middle area, the middle area is arranged between the perforated area and the display area; a hollowed-out area, wherein the hollowed-out area partially overlaps with the middle area in a first direction, and the hollowed-out area cuts off the second insulating protection layer in the first direction; The first direction is perpendicular to one side of the substrate and points to the second insulating protection layer.

2. The display substrate according to claim 1, characterized in that: The projection of the punching area in the first direction falls into the hollowing area.

3. The display substrate according to claim 2, characterized in that: A projection of a boundary of the hollowed-out area in the first direction falls into the middle area.

4. The display substrate according to claim 1, characterized in that: The hollowed-out area includes a first hollowed-out area in an annular shape, the projection of the inner boundary of the first hollowed-out area in the first direction falls into the punching area; the projection of the outer boundary of the first hollowed-out area in the first direction falls into the middle area.

5. The display substrate according to claim 4, characterized in that: The hollowed-out area includes a second hollowed-out area in an annular shape, and projections of an inner boundary and an outer boundary of the second hollowed-out area in the first direction both fall into the middle area.

6. The display substrate according to claim 1, characterized in that: The portion covered by the middle area, which points from the perforated area to the display area, includes a plurality of outer spacer columns, a retaining wall, a plurality of inner spacer columns and a display peripheral area in sequence.

7. The display substrate according to claim 6, characterized in that: The projection of the hollowed-out area in the first direction covers the perforated area; the projection of the hollowed-out area in the first direction covers the middle area from the edge of the perforated area to the outer isolation column closest to the perforated area.

8. The display substrate according to claim 6, characterized in that: The projection of the hollowed-out area in the first direction covers the perforated area; the projection of the hollowed-out area in the first direction covers the middle area from the edge of the perforated area to the inner isolation column farthest from the perforated area.

9. The display substrate according to claim 6, characterized in that: The projection of the hollowed-out area in the first direction covers the perforated area; the projection of the hollowed-out area in the first direction covers the middle area from the edge of the perforated area to a portion of the display peripheral area.

10. The display substrate according to any one of claims 1 to 3 or claims 6 to 9, characterized in that: The portion of the second insulating protection layer truncated by the hollowed-out area is filled with a third insulating protection layer.

11. The display substrate according to claim 6, characterized in that: The hollowed-out area includes a first annular hollowed-out area, the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area; the projection of the outer boundary of the first hollowed-out area in the first direction falls between the outer isolation column farthest from the perforated area and the outer isolation column second farthest from the perforated area.

12. The display substrate according to claim 6, characterized in that: The hollowed-out area includes: A first hollowed-out area in an annular shape, wherein the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area; and the projection of the outer boundary of the first hollowed-out area in the first direction falls between two middle outer isolation pillars of the plurality of outer isolation pillars; A second hollowed-out area is in an annular shape, and the projection of the inner boundary of the second hollowed-out area in the first direction falls between the inner isolation column closest to the retaining wall and the second inner isolation column closest to the retaining wall among the plurality of inner isolation columns; the projection of the outer boundary of the second hollowed-out area in the first direction falls between the display peripheral area and the inner isolation column closest to the display peripheral area.

13. The display substrate according to claim 6, characterized in that: The hollowed-out area includes: A first hollowed-out area in an annular shape, wherein the projection of the inner boundary of the first hollowed-out area in the first direction falls into the perforated area; and the projection of the outer boundary of the first hollowed-out area in the first direction falls between two middle outer isolation pillars of the plurality of outer isolation pillars; A second hollowed-out area is annular, and the projection of the inner boundary of the second hollowed-out area in the first direction falls between the inner isolation column closest to the retaining wall and the second inner isolation column closest to the retaining wall among the plurality of inner isolation columns; the projection of the outer boundary of the second hollowed-out area in the first direction falls within the display peripheral area of ​​the middle area.

14. The display substrate according to claim 1, characterized in that: In the display area, the middle layer includes a plurality of pixel units, the first insulating protective layer is in a prism shape surrounding the pixel openings of the pixel units, the second insulating protective layer covers the first insulating protective layer, and the refractive index of the second insulating protective layer is greater than that of the first insulating protective layer.

15. The display substrate according to claim 14, characterized in that: In the display area, the middle layer further includes an inductive capacitor, and the first insulating protection layer covers the inductive capacitor.

16. A method for manufacturing a display substrate, characterized in that: include: forming an intermediate layer on one side of the substrate, wherein the intermediate layer includes a light-emitting layer and a touch-control layer; forming a first insulating protective layer on a side of the intermediate layer away from the substrate; forming a second insulating protective layer on a side of the first insulating protective layer away from the intermediate layer; The display substrate is divided into a perforated area, a display area, a middle area and a hollowed-out area; the display area surrounds the perforated area; the middle area is arranged between the perforated area and the display area; the hollowed-out area partially overlaps with the middle area in a first direction, and the second insulating protective layer covering the hollowed-out area in the first direction is removed.

17. The method for manufacturing a display substrate according to claim 16, wherein: The projection of the hollowed-out area in the first direction covers the perforated area, and the projection of the boundary of the hollowed-out area in the first direction falls within the middle area which is greater than or equal to 30 μm away from the boundary of the perforated area.

18. The method for manufacturing a display substrate according to claim 16 or 17, characterized in that: The method for manufacturing the display substrate further includes: The removed second insulating protection layer portion covering the hollowed-out area in the first direction is filled to form a third insulating protection layer.

19. The method for manufacturing a display substrate according to claim 16, wherein: The middle area is provided with a retaining wall, and the hollowed-out area includes a first hollowed-out area in a ring shape, and the projection of the inner boundary of the first hollowed-out area in the first direction falls into the punching area which is greater than or equal to 30 μm away from the boundary of the punching area; the projection of the outer boundary of the first hollowed-out area in the first direction falls within the range from greater than or equal to 30 μm away from the boundary of the punching area to the side of the retaining wall close to the punching area.

20. The method for manufacturing a display substrate according to claim 19, wherein: A plurality of inner isolation columns are arranged on the side of the retaining wall away from the perforated area; the hollowed-out area includes a second annular hollowed-out area, and the projection of the inner boundary of the second hollowed-out area in the first direction falls between the side of the retaining wall away from the perforated area and the inner isolation columns closest to the display area; the projection of the outer boundary of the second hollowed-out area in the first direction falls between the inner isolation columns closest to the display area and the boundary of the display area.

21. A display device, characterized in that: The display device comprises the display substrate according to any one of claims 1-15.

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