Manufacturing method of display panel, display panel and display device

Abstract

The invention discloses a manufacturing method of a display panel, the display panel and a display device.The manufacturing method comprises the steps that a display substrate is provided, a first isolation structure is formed on the display panel, and the first isolation structure comprises a first opening; a second isolation structure and an auxiliary structure are formed in the same manufacturing process, the second isolation structure is located in the display area, and the auxiliary structure is located in the non-display area and close to the first opening. According to the manufacturing method of the display panel provided by the invention, the second isolation structure and the auxiliary structure which are used for different functions are formed in the same manufacturing process, so that the manufacturing procedures of the display panel are reduced, and the cost is reduced.

Description

Technical Field

[0001] The present application relates to the technical field of touch display panels, and in particular to a method for manufacturing a display panel, a display panel, and a display device. Background Art

[0002] Touch screen (full name in English: Touch Panel), also known as touch screen or touch panel, is an inductive display device that can receive input signals such as contacts, and is widely used in various electronic products. At present, electroluminescent device display screens with integrated touch functions have been widely adopted by current high-end smart products. Among them, the type in which the touch element is directly made on the inner surface of the display panel is called an embedded touch display panel. The existing touch display panel has a complex manufacturing process and a high manufacturing cost. Summary of the invention

[0003] The present application discloses a method for manufacturing a display panel and a display panel, so as to solve the problems of complex manufacturing process and high manufacturing cost of existing touch display panels.

[0004] In a first aspect, the present application discloses a method for manufacturing a display panel, the manufacturing method comprising:

[0005] Providing a display substrate, the display substrate comprising a display area and a non-display area located at least on one side of the display area;

[0006] forming a first isolation structure, wherein the first isolation structure comprises a first opening, the first isolation structure extends from the display area to the non-display area, and the first opening is located in the non-display area;

[0007] A second isolation structure and an auxiliary structure are formed in the same process, wherein the second isolation structure is located in the display area, the auxiliary structure is located in the non-display area, and the auxiliary structure is close to the first opening.

[0008] In some exemplary embodiments, the steps of forming the second isolation structure and the auxiliary structure in the same process include:

[0009] forming a first material layer, wherein the first material layer covers the first isolation structure and the first opening, patterning the first material layer, and simultaneously forming the second isolation structure and the auxiliary structure;

[0010] The projection area of ​​the second isolation structure located above the first isolation structure in the display area is smaller than the projection area of ​​the first isolation structure, and the projection of the auxiliary structure partially overlaps with the projection of the first isolation structure;

[0011] Preferably, the second isolation structure and the auxiliary structure are made of the same material;

[0012] Preferably, the cross-sections of the second isolation structure and the auxiliary structure are both regular trapezoidal structures;

[0013] Preferably, the first material layer is exposed using a half-tone mask process to simultaneously form the second isolation structure and the auxiliary structure;

[0014] Preferably, the top surface of the second isolation structure is lower than the top surface of the auxiliary structure;

[0015] Preferably, the first material layer comprises a positive photoresist layer.

[0016] In some exemplary embodiments, after the step of forming the second isolation structure and the auxiliary structure in the same process, the method further comprises:

[0017] Forming a display function layer to form a plurality of sub-pixel regions in the display region, wherein the second isolation structure is located between some of the plurality of sub-pixel regions, and the second isolation structure is used to isolate the display substrate when depositing the light-emitting layer in the display function layer;

[0018] Preferably, a display substrate is provided, comprising:

[0019] Providing an array substrate, wherein a planarization layer is formed on the array substrate, and the planarization layer extends from the display area to the non-display area;

[0020] A pixel definition layer is formed on the planarization layer, and the pixel definition layer defines a plurality of sub-pixel areas in the display area, wherein the first isolation structure is located above the pixel definition layer, and a projection of the first isolation structure is smaller than a projection of the pixel definition layer.

[0021] In some exemplary embodiments, the manufacturing method further comprises:

[0022] forming a second opening in the pixel definition layer below the first opening, wherein the second opening exposes a portion of the metal interconnection layer;

[0023] A touch electrode layer is formed and located above the first isolation structure. The touch electrode layer covers the surface of the auxiliary structure and extends to the second opening to contact and connect with the metal interconnection layer.

[0024] In some exemplary embodiments, the material of the first isolation structure includes a negative photoresist layer;

[0025] Preferably, a cross section of the first isolation structure comprises an inverted trapezoidal structure.

[0026] In a second aspect, the present application discloses a display panel, the display panel comprising:

[0027] A display substrate, the display substrate comprising a display area and a non-display area located at at least one side of the display area;

[0028] A first isolation structure, the first isolation structure comprising a first opening, the first isolation structure extending from the display area to the non-display area, and the first opening being located in the non-display area;

[0029] A second isolation structure and an auxiliary structure, wherein the second isolation structure is located in the display area, the auxiliary structure is located in the non-display area, and the auxiliary structure is close to the first opening.

[0030] In some exemplary embodiments, at least part of the second isolation structure is located on a side of the first isolation structure away from the display substrate, a projection area of ​​the second isolation structure on the display substrate is smaller than a projection area of ​​the first isolation structure on the display substrate, and a projection of the auxiliary structure on the display substrate partially overlaps with a projection of the first isolation structure on the display substrate;

[0031] Preferably, the second isolation structure and the auxiliary structure are made of the same material;

[0032] Preferably, the cross-sections of the second isolation structure and the auxiliary structure are both regular trapezoidal structures;

[0033] Preferably, the top surface of the second isolation structure is lower than the top surface of the auxiliary structure;

[0034] Preferably, the material of the second isolation structure and the auxiliary structure includes positive photoresist.

[0035] In some exemplary embodiments, the display panel further includes:

[0036] A display function layer, the display function layer comprising a plurality of sub-pixel regions, the plurality of sub-pixel regions being located in the display region; wherein the second isolation structure is located between some of the plurality of sub-pixel regions, and the second isolation structure is used to isolate the display substrate when depositing the light-emitting layer in the display function layer;

[0037] Preferably, the display substrate further includes:

[0038] An array substrate;

[0039] A planarization layer, located on the light-emitting side of the array substrate, the planarization layer extending from the display area to the non-display area;

[0040] A pixel definition layer is located above the planarization layer, and the pixel definition layer includes a plurality of sub-pixel areas; wherein the first isolation structure is located above the pixel definition layer, and a projection of the first isolation structure is smaller than a projection of the pixel definition layer.

[0041] In some exemplary embodiments, the display panel further includes:

[0042] a second opening, located in the pixel definition layer below the first opening, the second opening exposing a portion of the metal interconnection layer;

[0043] The touch electrode layer is located on a side of the first isolation structure away from the display substrate. The touch electrode layer covers the surface of the auxiliary structure and extends to the second opening to contact and connect with the metal interconnection layer.

[0044] In some exemplary embodiments, the material of the first isolation structure includes a negative photoresist layer;

[0045] Preferably, a cross section of the first isolation structure comprises an inverted trapezoidal structure.

[0046] In a third aspect, the present application discloses a display device, comprising the display panel as described above.

[0047] In the manufacturing method of the display panel and the display panel provided in the present application, the second isolation structure and the auxiliary structure for different functions are formed in the same process, thereby reducing the manufacturing process of the display panel and lowering the cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the background technology, the drawings required for use in the embodiments of the present application or the background technology will be described below.

[0049] Figure 1 The present invention is a flowchart of a method for manufacturing a display panel exemplarily shown in an embodiment of the present application.

[0050] Figure 2 The figure is a top view of a display substrate provided in a process of a method for manufacturing a display panel exemplarily shown in an embodiment of the present application.

[0051] Figure 3 for Figure 2 Schematic diagram of the cross section of the M region along the BB' direction.

[0052] Figure 4 The present invention is a schematic structural diagram after a first isolation structure and a first opening are formed in a process of a method for manufacturing a display panel exemplarily shown in an embodiment of the present application.

[0053] Figure 5The present invention is a schematic structural diagram of a method for manufacturing a display panel after a first material layer is formed in an exemplary embodiment of the present application.

[0054] Figure 6 The present invention is a schematic structural diagram after a second isolation structure and an auxiliary structure are formed in a process of a method for manufacturing a display panel exemplarily shown in an embodiment of the present application.

[0055] Figure 7 The top view is a diagram showing a method for manufacturing a display panel after a second isolation structure and an auxiliary structure are formed in an exemplary embodiment of the present application.

[0056] Figure 8 for Figure 7 Schematic diagram of the cross section along CC' direction.

[0057] Fig. 9 for Figure 8 Schematic diagram of the structure after the display function layer and the metal layer are formed on the structure shown.

[0058] Fig.10 The present invention is a schematic diagram of a structure of a display panel exemplarily shown in an embodiment of the present application.

[0059] Fig.11 The present invention is a schematic structural diagram of patterning a first material layer in another method for manufacturing a display panel according to an embodiment of the present application.

[0060] Fig.12 The schematic diagram is a structural diagram after a second isolation structure and an auxiliary structure are formed in a process of another method for manufacturing a display panel according to an embodiment of the present application.

[0061] Fig.13 The present invention is a schematic diagram of the structure of another display panel exemplarily shown in an embodiment of the present application. DETAILED DESCRIPTION

[0062] The technical solutions in the embodiments of the present application will be described below in conjunction with the drawings in the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0063] As an optional implementation of the disclosure of the present application, the embodiment of the present application discloses a method for manufacturing a display panel to reduce the manufacturing process of a touch display panel and reduce costs. The display panel can be used for an organic light emitting diode (OLED) display screen, such as a touch display screen, and can be used as an OLED touch display panel. Exemplarily, the display panel is an embedded touch display panel.

[0064] like Figure 1 As shown, Figure 1 This is a flow chart of a method for manufacturing a display panel disclosed in an embodiment of the present application, the manufacturing method comprising:

[0065] Step S110 , providing a display substrate, wherein the display substrate comprises a display area and a non-display area located at least on one side of the display area.

[0066] like Figure 2 As shown, the display substrate 100 is, for example, a base substrate, which mainly plays the role of supporting and bearing. The display substrate 100 can be a rigid substrate or a flexible substrate, which is not limited here. When the display substrate 100 is a flexible substrate, the material of the flexible substrate can be a polyimide film or polyethylene terephthalate, etc., which is not limited here. The flexible substrate can be a structure including a single-layer flexible base layer, or a structure including multiple layers of flexible base layers, such as a structure with two layers of flexible base layers, or a structure with three layers of base layers, which is not limited here.

[0067] like Figure 2 As shown, the non-display area B surrounds the display area A as an example. The display substrate 100 is divided into the display area A and the non-display area B. The non-display area B may also be located on at least one side of the display area A. The non-display area B may be a frame area for wiring. For example, the non-display area B is arranged with a metal interconnect layer 140 (refer to FIG. 1 ) for connecting to a touch chip (not shown in the figure). Figure 3 ).

[0068] refer to Figure 3 , showing an example Figure 2 Schematic diagram of the cross section of the middle M region along the BB' direction. Figure 3 As shown, the display substrate 100 includes an array substrate 110, a planarization layer 120 and a pixel definition layer 130 arranged in sequence from bottom to top, Figure 3 , exemplarily, the method for forming the display substrate 100 may include the following steps:

[0069] Step S111: providing an array substrate.

[0070] Step S112 : forming a planarization layer 120 (PLN) on the array substrate 110 , wherein the planarization layer 120 extends from the display area A to the non-display area B.

[0071] Step S113 , forming a pixel definition layer 130 (Photo Define Layer, PDL) on the planarization layer 120 .

[0072] refer to Figure 3As shown, the array substrate 110 is, for example, a TFT array substrate, and the array substrate 110 also includes a device for driving light emission (not shown in the figure), such as an OLED pixel driving circuit, and the pixel driving circuit includes multiple transistors, such as a thin film transistor (TFT) and a storage capacitor.

[0073] refer to Figure 3 and Figure 8 The pixel definition layer 130 has an array of openings in the display area A, and the openings define a plurality of sub-pixel areas 800 in the display area A (refer to Figure 8 ), the sub-pixel region 800 is, for example, a light-emitting region of a display panel. Exemplarily, the material of the pixel definition layer 130 includes an organic material.

[0074] Step S120 , forming a first isolation structure, the first isolation structure comprising a first opening, the first isolation structure extending from the display area to the non-display area, and the first opening being located in the non-display area.

[0075] refer to Figure 4 As shown, an isolation material layer (not shown in the figure) can be formed on the pixel definition layer 130, and the isolation material layer extends from the display area A to the non-display area B. The isolation material layer is then patterned to form a patterned isolation material layer on the pixel definition layer 130. The remaining isolation material layer forms a first isolation structure 200, and a first opening 210 is formed in the non-display area B.

[0076] refer to Figure 4 As shown, the sidewall of the first opening 210 is the sidewall of the first isolation structure 200 in the non-display area B. The first isolation structure 200 is located above the pixel definition layer 130, and the projection of the first isolation structure 200 is smaller than the projection of the pixel definition layer 130. The first isolation structure 200 and the pixel definition layer 130 are in a step structure in a direction perpendicular to the display substrate 100, so that the first isolation structure 200 is used to disconnect the subsequently formed metal layer (not shown in the figure), thereby forming a patterned cathode layer 600 and a touch electrode layer 700 located on the first isolation structure 200 (refer to Fig. 9 ) The first opening 210 located in the non-display area B is used to prepare for the touch electrode layer 700 extending to the non-display area B later.

[0077] refer to Figure 4The first isolation structure 200 may be a convex structure, and the material of the first isolation structure 200 may be, for example, an inorganic material or an insulating material. The first isolation structure 200 and the pixel definition layer 130 are made of different materials, and therefore, the two need to be made in different process steps. Exemplarily, the material of the first isolation structure 200 is a negative photoresist layer, so that the cross-section of the first isolation structure 200 is an inverted trapezoidal structure, so that the subsequently formed metal layer can be patterned.

[0078] Step S130 , forming a second isolation structure and an auxiliary structure in the same process, wherein the second isolation structure is located in the display area, the auxiliary structure is located in the non-display area, and the auxiliary structure is adjacent to the first opening.

[0079] refer to Figure 6 As shown, the second isolation structure 300 and the auxiliary structure 400 are arranged in the same layer, that is, the second isolation structure 300 and the auxiliary structure 400 are made in the same process. Optionally, the second isolation structure 300 and the auxiliary structure 400 are obtained by patterning the material layer of the same material, and in other embodiments, they can also be formed by other processes.

[0080] refer to Figure 6 , wherein the second isolation structure 300 and the auxiliary structure 400 have the same or different shapes and structures. Exemplarily, in this embodiment, the second isolation structure 300 and the auxiliary structure 400 have different cross-sectional structures. Figure 7 As shown, an example is shown in Figure 1 The top view of the M region after the second isolation structure 300 and the auxiliary structure 400 are formed, the top surface shape of the second isolation structure 300 is different from the top surface shape of the auxiliary structure 400, for example, the top surface of the second isolation structure 300 is elliptical, and the shape of the auxiliary structure 400 is rectangular, and the shapes of the top surfaces of the two are not specifically limited here.

[0081] Combination Figure 5 and Figure 6 Specifically, forming the second isolation structure 300 and the auxiliary structure 400 includes: forming a first material layer 30 on the surface of the first isolation structure 200 and in the first opening 210, the first material layer 30 covers the first isolation structure 200 and fills the first opening 210, patterning the first material layer 30, and simultaneously forming the second isolation structure 300 and the auxiliary structure 400.

[0082] refer to Figure 6 As shown, the first material layer 30 is a positive photoresist layer or other insulating material layer, and the second isolation structure 300 and the auxiliary structure 400 can both be convex structures. Exemplarily, the cross-sections of the second isolation structure 300 and the auxiliary structure 400 are both regular trapezoidal structures.

[0083] Combination Figure 7As shown, there may be multiple second isolation structures 300 formed in the display area A, some of the second isolation structures 300 may be located above the first isolation structure 200 in the display area A, some of the second isolation structures 300 may also be located on the pixel definition layer 130 adjacent to the first isolation structure 200, and some of the second isolation structures 300 may also be located on the pixel definition layer 130 between adjacent sub-pixel areas 800. The second isolation structure is used to isolate the display substrate when the light-emitting layer in the display function layer is subsequently deposited.

[0084] refer to Figure 8 , the second isolation structure 300 located on the first isolation structure 200 in the display area A is exemplarily shown, and the projection area of ​​the second isolation structure 300 is smaller than the projection area of ​​the first isolation structure 200 thereunder. Figure 8 In the direction perpendicular to the display panel, a plurality of step structures are formed between the second isolation structure 300, the first isolation structure 200 and the pixel definition layer 130. The first isolation structure 200 can pattern the metal layer to be subsequently formed, so that the metal layer retained above the pixel definition layer 130 is used as the cathode layer 600 (refer to Fig. 9 ), the metal layer remaining on the first isolation structure 200 is used as the touch electrode layer 700. Fig. 9 The first isolation structure 200 is an inverted trapezoidal structure, and the step structure between the first isolation structure 200 and the pixel definition layer 130 makes the cathode layer 600 and the touch electrode layer 700 formed subsequently not connected.

[0085] refer to Figure 6 and Figure 7 As shown, the auxiliary structure 400 is formed on the side of the first opening 210 adjacent to the display area A, and the projection of the auxiliary structure 400 partially overlaps with the projection of the first isolation structure 200. Exemplarily, the auxiliary structure 400 covers one end of the first isolation structure 200 located in the non-display area B, so that the auxiliary structure 400 forms a first climbing area 410 on the side adjacent to the display area A, and forms a second climbing area 420 on the side away from the display area A, referring to Fig.10 , thereby maintaining the climbing effect of the subsequently formed touch electrode layer 700 in the non-display area B, which is beneficial for the touch electrode layer 700 to extend from the display area A to the first opening 210 in the non-display area B.

[0086] refer to Figure 6 The top surface of the second isolation structure 300 is flush with the top surface of the auxiliary structure 400. In order to prevent the second isolation structure 300 from being too high, the top surface of the second isolation structure 300 can be lower than the top surface of the auxiliary structure 400 through an exposure process.

[0087] In the method for manufacturing the display panel provided in this embodiment, the second isolation structure and the auxiliary structure for different functions are formed in the same process, thereby reducing the manufacturing steps of the display panel and lowering the cost.

[0088] As an optional implementation of the disclosure of the present application, the present application embodiment discloses a method for manufacturing a display panel. The manufacturing method of this embodiment is different from the manufacturing method in the above embodiment in that: Figure 1 On the basis of the manufacturing method of the display panel shown, after the steps of forming the second isolation structure and the auxiliary structure in the same process, it also includes: forming a display function layer, the display function layer includes multiple sub-pixel areas, and the multiple sub-pixel areas are located in the display area; wherein the second isolation structure is located between some of the multiple sub-pixel areas, and the second isolation structure is used to isolate the display substrate when depositing the light-emitting layer in the display function layer.

[0089] Combination Figures 7 to 9 As shown, the display function layer 500 is located in the display area A, and the display function layer 500 is also formed in the light-emitting area (not shown in the figure) between the pixel definition layers 130 to form a plurality of sub-pixel areas 800 in the light-emitting area. Among them, the display function layer 500 at least includes a hole transporting layer (HTL), a light-emitting layer, an electron transporting layer (ETL) and an electron injection layer (EIL) (not shown in the figure). In the process of preparing an OLED display panel, a vapor deposition mask plate is used to evaporate the light-emitting material on the display substrate 100 to be evaporated, thereby forming a pixel area. Among them, the pixel area is formed by a plurality of sub-pixel areas 800, and the plurality of sub-pixel areas 800 are arranged in a certain arrangement.

[0090] refer to Figure 7 As shown, the second isolation structure 300 is located between some of the plurality of sub-pixel regions 800 in the display region A. Figure 7 As shown in FIG. 1 , the second isolation structure 300 is exemplarily shown to be located between two adjacent sub-pixel regions adjacent to the non-display region A. Figure 7 As shown, a plurality of second isolation structures 300 may be disposed in the display area A, and each second isolation structure 300 is located between a portion of the plurality of sub-pixel areas 800. Fig. 9As shown, each sub-pixel includes an anode layer 900, a cathode layer 600, and a display function layer 500 located between the anode layer 900 and the cathode layer 600. The display function layer 500 includes a light-emitting layer. The light-emitting layers of different colors make the sub-pixels present light-emitting states of different colors. When making a light-emitting layer pattern of one color on the display substrate 100, it is necessary to use an OLED evaporation mask plate. In order to prevent the OLED evaporation mask plate from rubbing against the display substrate 100 during the evaporation process, in this embodiment, a second isolation structure 300 is used to provide a gap between the OLED evaporation mask plate and the display substrate 100, so that the display substrate 100 will not be damaged by electrostatic adsorption due to the close fit between the OLED evaporation mask plate and the display substrate 100.

[0091] The second isolation structure 300 in the present application isolates the OLED evaporation mask plate from the display substrate 100 to reduce damage to the display substrate 100 during the evaporation process, thereby effectively improving the packaging performance of the display panel.

[0092] As an optional implementation of the disclosure of the present application, an embodiment of the present application discloses a method for manufacturing a display panel. The manufacturing method of this embodiment is different from the manufacturing method in the above embodiment in that the manufacturing method of the display panel further includes: forming a second opening in the pixel definition layer below the first opening, the second opening exposing a portion of the metal interconnection layer;

[0093] Combination Figure 4 As shown, in this embodiment, after forming the first opening 210, the manufacturing method further includes: forming a second opening 220 in the pixel definition layer 130 located below the first opening 210, and the second opening 220 exposes a portion of the metal interconnection layer 140. The second opening 220 can be formed in other steps after the first opening 210, or in the same process. A metal interconnection layer 140 for connecting to a touch chip (not shown in the figure) can be arranged in the planarization layer 120 below the second opening 220 position in the non-display area B.

[0094] The manufacturing method of the display panel also includes: forming a touch electrode layer located above the first isolation structure, the touch electrode layer covers the surface of the auxiliary structure and extends to the second opening to contact and connect with the metal interconnection layer.

[0095] refer to Fig. 9 and Fig.10 After forming the display function layer 500, a metal layer (not shown in the figure) is formed in the display area A and the non-display area B. Fig. 9 As shown, since the first isolation structure 200 plays a role in patterning the metal layer, the metal layer located below the first isolation structure 200 serves as the cathode layer 600 of the sub-pixel. Fig.10The metal layer located above the first isolation structure 200 can be used as the touch electrode layer 700 , and the auxiliary structure 400 in the non-display area B can assist the touch electrode layer 700 to extend from the display area A to the second opening 220 .

[0096] like Fig.10 As shown, the touch electrode layer 700 extending from the display area A to the non-display area B passes through the climbing area of ​​the auxiliary structure 400 and extends into the second opening 220 through the first opening 210, so as to be electrically connected to the metal interconnection layer 140 at the bottom thereof through the second opening 220, and further electrically connected to the touch chip through the metal interconnection layer 140 to realize the touch function.

[0097] Combination Figure 6 and Fig.10 As shown, after the touch electrode layer 700 is formed, the touch electrode layer 700 covers the first climbing area 410 and the second climbing area 420 of the auxiliary structure 400, and extends to the first opening 210, and then extends from the first opening 210 to the second opening 220, and contacts and connects with the metal interconnection layer 140. The height of the metal interconnection layer 140 penetrates the thickness of the planarization layer 120 and is electrically connected to the array substrate 110. The first opening 210 may also include the structure of the second opening 220. Exemplarily, the touch chip can be arranged in the array substrate 110, and the touch electrode layer 700 is electrically connected to the touch chip in the array substrate 110 through the metal interconnection layer 140 in the second opening 220, so as to realize the touch function.

[0098] In the method for manufacturing the display panel provided in this embodiment, not only the second isolation structure and the auxiliary structure for different functions are formed in the same process, but also in the manufacturing process of the touch electrode layer of the OLED, the metal layer is isolated by using the insulating first isolation structure, and the metal layer above the first isolation structure is used as the touch electrode layer, thereby reducing the manufacturing process of the display panel and reducing the cost.

[0099] As an optional implementation of the disclosure of the present application, the embodiment of the present application discloses a method for manufacturing a display panel. The manufacturing method of this embodiment differs from the manufacturing method in the above embodiment in that it mainly describes another optional implementation method for forming a second isolation structure and an auxiliary structure. In this manufacturing method, forming the second isolation structure and the auxiliary structure includes: exposing the first material layer using a halftone mask process to simultaneously form the second isolation structure and the auxiliary structure, wherein the top surface of the second isolation structure is lower than the top surface of the auxiliary structure.

[0100] For example, the first material layer is, for example, a positive photoresist layer. After the first material layer is patterned, the top surface of the second isolation structure and the top surface of the auxiliary structure may be flush. Figures 11 to 13, exemplarily, in this embodiment, in order to reduce the thickness of the second isolation structure 300 and ensure the extension effect of the touch electrode layer 700 from the display area A to the non-display area B, the first material layer 30 is patterned by a half-tone mask process. The half-tone mask plate 10 has a semi-transparent area 11, a light-shielding area 12 and a light-transmitting area, and the light-transmitting area is the area other than the semi-transparent area 11 and the light-shielding area 12. The light-transmitting area exposes and removes the first material layer 30 at a position other than the pre-formed second isolation structure 300 and the auxiliary structure 400. The semi-transparent area 11 corresponds to the position of the pre-formed second isolation structure 300, and the light-shielding area 12 corresponds to the position of the pre-formed auxiliary structure 400, thereby forming a second isolation structure 300 and an auxiliary structure 400 with inconsistent top surface heights, thereby reducing the thickness of the second isolation structure 300 while retaining the thickness of the auxiliary structure 400. Reference Fig.13 After the cathode layer and the touch electrode layer 700 are formed, the thickness of the display area A is lower than the thickness of the non-display area B.

[0101] As an optional implementation of the content disclosed in the present application, the embodiment of the present application discloses a display panel, which can also be prepared by the manufacturing method of the display panel provided in any of the above embodiments, or by other methods. Fig.10 or Fig.13 As shown, the display panel includes: a display substrate 100, a first isolation structure 200, a second isolation structure 300 and an auxiliary structure 400, and a display function layer 500 arranged in sequence from bottom to top.

[0102] A display substrate 100, the display substrate 100 includes a display area A and a non-display area B located at at least one side of the display area A;

[0103] A first isolation structure 200 is located above the display substrate 100. The first isolation structure 200 includes a first opening 210. The first isolation structure 200 extends from the display area A to the non-display area B. The first opening 210 is located in the non-display area B.

[0104] The second isolation structure 300 is located in the display area A, and the auxiliary structure 400 is partially located in the first opening 210 ; wherein the auxiliary structure 400 is located in the non-display area B, and the auxiliary structure 400 is adjacent to the first opening 21 .

[0105] The display panel further includes a display function layer 500 located on the display substrate 100, wherein the display function layer 500 forms a plurality of sub-pixel regions 800 in the display region A (see FIG. Figure 7); wherein the second isolation structure 300 is located between some of the plurality of sub-pixel regions 800, and the second isolation structure 300 is used to isolate the display substrate 100 when depositing the light-emitting layer in the display function layer 500. wherein the second isolation structure 300 and the auxiliary structure 400 are made of the same material, for example, the material of the second isolation structure 300 and the auxiliary structure 400 includes positive photoresist, and the cross-sections of the second isolation structure 300 and the auxiliary structure 400 are both positive trapezoidal structures.

[0106] refer to Fig.12 In order to make the thickness of the display area A smaller than the thickness of the non-display area B, the top surface of the second isolation structure 300 can be made lower than the top surface of the auxiliary structure 400.

[0107] refer to Figure 7-10 , wherein the display substrate 100 comprises: an array substrate 110, a planarization layer 120 and a pixel definition layer 130 stacked in sequence from bottom to top, wherein the planarization layer 120 is located on the light-emitting side of the array substrate 110 and extends from the display area A to the non-display area B; the pixel definition layer 130 is located above the planarization layer 120, and the pixel definition layer 130 comprises a plurality of sub-pixel areas 800; wherein the first isolation structure 200 is located above the pixel definition layer 130, and the projection of the first isolation structure 200 is smaller than the projection of the pixel definition layer 130; and a step structure is also formed between the first isolation structure 200 and the pixel definition layer 130. For example, the first isolation structure 200 is an inverted trapezoidal structure.

[0108] refer to Figure 7 and Figure 8 As shown, there are a plurality of second isolation structures 300 in the display area A, wherein some of the second isolation structures 300 are located on the side of the first isolation structure 200 away from the display substrate 100. In the direction perpendicular to the display panel, the projection area of ​​the second isolation structure 300 is smaller than the projection area of ​​the first isolation structure 200 thereunder, so that the second isolation structure 300 and the first isolation structure 200 form a step structure.

[0109] refer to Figure 4 and Fig.10 The display panel further includes: a second opening 220 located at the bottom of the first opening 210, the second opening 220 extending into the display substrate 100, the second opening 220 exposing the metal interconnection layer 140 located in the display substrate 100, and the metal interconnection layer 140 is used to connect with the touch chip;

[0110] refer to Fig.10The display panel also includes: a touch electrode layer 700 located on the side of the first isolation structure 200 away from the display substrate 100, the touch electrode layer 700 is formed by a metal layer patterned by the first isolation structure 200, the touch electrode layer 700 covers the surface of the auxiliary structure 400, and extends into the second opening 220 to contact and connect with the metal interconnection layer 140.

[0111] As an optional implementation of the contents disclosed in the present application, the present application discloses a display device, including the display panel as described above.

[0112] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0113] The above embodiments only express several implementation methods of this specification, and the descriptions are relatively specific and detailed, but they cannot be understood as limiting the scope of the patent application. It should be pointed out that for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of this specification, which all belong to the protection scope of this specification. Therefore, the protection scope of the patent of this specification shall be based on the attached claims.

Claims

1. A method for manufacturing a display panel, characterized in that: The production method comprises: Providing a display substrate, the display substrate comprising a display area and a non-display area located at least on one side of the display area; forming a first isolation structure, wherein the first isolation structure comprises a first opening, the first isolation structure extends from the display area to the non-display area, and the first opening is located in the non-display area; A second isolation structure and an auxiliary structure are formed in the same process, wherein the second isolation structure is located in the display area, the auxiliary structure is located in the non-display area, and the auxiliary structure is close to the first opening.

2. The method for manufacturing a display panel according to claim 1, characterized in that: The steps of forming the second isolation structure and the auxiliary structure in the same process include: forming a first material layer, wherein the first material layer covers the first isolation structure and the first opening, patterning the first material layer, and simultaneously forming the second isolation structure and the auxiliary structure; The projection area of ​​the second isolation structure located above the first isolation structure in the display area is smaller than the projection area of ​​the first isolation structure, and the projection of the auxiliary structure partially overlaps with the projection of the first isolation structure; Preferably, the second isolation structure and the auxiliary structure are made of the same material; Preferably, the cross-sections of the second isolation structure and the auxiliary structure are both regular trapezoidal structures; Preferably, the first material layer is exposed using a half-tone mask process to simultaneously form the second isolation structure and the auxiliary structure; Preferably, the top surface of the second isolation structure is lower than the top surface of the auxiliary structure; Preferably, the first material layer comprises a positive photoresist layer.

3. The method for manufacturing a display panel according to claim 1, wherein: The step of forming the second isolation structure and the auxiliary structure in the same process includes: Forming a display function layer to form a plurality of sub-pixel regions in the display region, wherein the second isolation structure is located between some of the plurality of sub-pixel regions, and the second isolation structure is used to isolate the display substrate when depositing the light-emitting layer in the display function layer; Preferably, a display substrate is provided, comprising: Providing an array substrate, wherein a planarization layer is formed on the array substrate, and the planarization layer extends from the display area to the non-display area; A pixel definition layer is formed on the planarization layer, and the pixel definition layer defines a plurality of sub-pixel areas in the display area, wherein the first isolation structure is located above the pixel definition layer, and a projection of the first isolation structure is smaller than a projection of the pixel definition layer.

4. The method for manufacturing a display panel according to claim 3, characterized in that: The production method further comprises: forming a second opening in the pixel definition layer below the first opening, wherein the second opening exposes a portion of the metal interconnection layer; A touch electrode layer is formed and located above the first isolation structure. The touch electrode layer covers the surface of the auxiliary structure and extends to the second opening to contact and connect with the metal interconnection layer.

5. A display panel, characterized in that: The display panel comprises: A display substrate, the display substrate comprising a display area and a non-display area located at least on one side of the display area; A first isolation structure, the first isolation structure comprising a first opening, the first isolation structure extending from the display area to the non-display area, and the first opening being located in the non-display area; A second isolation structure and an auxiliary structure, wherein the second isolation structure is located in the display area, the auxiliary structure is located in the non-display area, and the auxiliary structure is close to the first opening.

6. The display panel according to claim 5, characterized in that: At least part of the second isolation structure is located on a side of the first isolation structure away from the display substrate, a projection area of ​​the second isolation structure on the display substrate is smaller than a projection area of ​​the first isolation structure on the display substrate, and a projection of the auxiliary structure on the display substrate partially overlaps with a projection of the first isolation structure on the display substrate; Preferably, the second isolation structure and the auxiliary structure are made of the same material; Preferably, the cross-sections of the second isolation structure and the auxiliary structure are both regular trapezoidal structures; Preferably, the top surface of the second isolation structure is lower than the top surface of the auxiliary structure; Preferably, the material of the second isolation structure and the auxiliary structure includes positive photoresist.

7. The display panel according to claim 5, characterized in that: The display panel further includes: A display function layer, the display function layer comprising a plurality of sub-pixel regions, the plurality of sub-pixel regions being located in the display region; wherein the second isolation structure is located between some of the plurality of sub-pixel regions, and the second isolation structure is used to isolate the display substrate when depositing the light-emitting layer in the display function layer; Preferably, the display substrate further includes: An array substrate; A planarization layer, located on the light-emitting side of the array substrate, the planarization layer extending from the display area to the non-display area; A pixel definition layer is located above the planarization layer, and the pixel definition layer includes a plurality of sub-pixel areas; wherein the first isolation structure is located above the pixel definition layer, and a projection of the first isolation structure is smaller than a projection of the pixel definition layer.

8. The display panel according to claim 7, characterized in that: The display panel further includes: a second opening, located in the pixel definition layer below the first opening, the second opening exposing a portion of the metal interconnection layer; The touch electrode layer is located on a side of the first isolation structure away from the display substrate. The touch electrode layer covers the surface of the auxiliary structure and extends to the second opening to contact and connect with the metal interconnection layer.

9. The display panel according to any one of claims 5 to 8, characterized in that: The material of the first isolation structure includes a negative photoresist layer; Preferably, a cross section of the first isolation structure comprises an inverted trapezoidal structure.

10. A display device, characterized in that: Comprising a display panel as claimed in any one of claims 5 to 9.

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