Efficient tail gas recovery device

Abstract

The invention relates to the technical field of tail gas recovery, and discloses an efficient tail gas recovery device which comprises a buffer tank and a krypton-xenon raw material tank. According to the efficient tail gas recovery device, the tail gas recovery requirements of two chromatographic instruments and one moisture meter can be met at the same time through the arranged prefabricated four-way pipe, so that the requirement that each device is independently provided with a tail gas treatment device is avoided, the purchase and operation cost is reduced, the device can flexibly treat different types of tail gas, and the tail gas recovery efficiency is improved. Nitrogen, argon, helium, hydrogen, oxygen and other common inert gases can be directly connected into a normal-pressure emptying pipe to be discharged into the atmospheric environment, krypton, xenon and other product gases are conveyed into the buffer tank through the first-stage booster pump to be temporarily stored, when the pressure in the buffer tank reaches the preset upper limit, the first isolation valve at the bottom of the buffer tank is closed, and the first-stage booster pump is started to stop the first-stage booster pump. And a fourth isolating valve at the top of the buffer tank is opened, and then the gas is pumped into the krypton-xenon raw material tank by using a secondary booster pump.

Description

Technical Field

[0001] The present application relates to the technical field of tail gas recovery, and in particular to a high-efficiency tail gas recovery device. Background Art

[0002] As the core component of industrial gases, high-purity bulk gases are widely used in various fields. The analysis of moisture content is a key link to ensure product quality. Since moisture has strong adsorption, its analysis principle is different from the analysis method of other impurities, and the analysis of trace moisture also has certain difficulties.

[0003] Among them, krypton and xenon are a kind of natural rare inert gas, which is pollution-free, non-toxic, colorless and odorless, and its content in the atmosphere is extremely small. Although the amount of krypton and xenon obtained is very small, they are widely used in many industries, such as: electronics and electrical appliances, optoelectronic power industry, medical treatment, space and satellite industry, electronic chip manufacturing industry, etc.

[0004] In recent years, with the continuous development of the electronics industry, krypton and xenon have gradually been used in many high-end products. Therefore, the industry has very strict requirements on the purity of krypton and xenon. The analysis loss of krypton and xenon products is relatively large. If the exhaust gas generated by the analysis of krypton and xenon products cannot be effectively recovered, it will cause waste of resources and significantly increase production costs. In order to solve the above problems, an efficient exhaust gas recovery device is proposed. Summary of the invention

[0005] In view of the deficiencies of the prior art, the present application provides a high-efficiency tail gas recovery device that can efficiently recover and process krypton and xenon gases, thereby avoiding waste of resources.

[0006] To achieve the above-mentioned purpose, the present application provides the following technical solutions: a high-efficiency exhaust gas recovery device, comprising a buffer tank and a krypton-xenon raw material tank, the bottoms of the buffer tank and the krypton-xenon raw material tank are connected with access pipes, a first isolation valve is installed inside each of the access pipes, the output end of the access pipe located below the buffer tank among the two access pipes is connected with a transfer pipe, a first one-way valve is installed inside the transfer pipe, a first-stage booster pump is installed at the input end of the transfer pipe, the output end of the first-stage booster pump is connected with a prefabricated four-way pipe, and the tops of the three connecting pipes of the prefabricated four-way pipe are all connected with a normal pressure exhaust pipe.

[0007] A transfer pipe is provided between the buffer tank and the krypton-xenon raw material tank, and both ends of the transfer pipe are respectively connected to the top of the buffer tank and the top of the krypton-xenon raw material tank. A fourth isolation valve, a secondary booster pump and a second one-way valve are installed inside the transfer pipe, and the secondary booster pump is a medium-pressure nitrogen driven diaphragm pump.

[0008] Through the above scheme, the prefabricated four-way pipe can meet the simultaneous recovery of tail gas from two chromatographs and a moisture meter, which can reduce the need for each device to be equipped with a separate tail gas treatment device, thereby saving procurement and operating costs. For the tail gas of all equipment, ordinary inert gases, such as nitrogen, argon, helium, hydrogen, and oxygen, can be directly connected to the normal pressure exhaust pipe to discharge the gas into the atmosphere. For example, krypton and xenon products enter the buffer tank through a primary booster pump. When the pressure of the buffer tank reaches the set upper limit, the first isolation valve at the bottom of the buffer tank is closed and the fourth isolation valve at the top of the buffer tank is opened. The secondary booster pump is connected to the krypton-xenon raw material tank. In this way, the analytical gas can be effectively recovered, which greatly reduces the loss of product analysis. To a certain extent, it will further ensure the accuracy and stability of product analysis data.

[0009] Furthermore, second isolation valves are installed inside the three connecting pipes of the prefabricated four-way pipe.

[0010] Through the above scheme, the flow of gas inside the three connecting pipes of the prefabricated four-way pipe can be controlled separately.

[0011] Furthermore, a third isolation valve is installed inside each of the normal-pressure exhaust pipes, and a first high-efficiency filter element is fixedly connected to the output end of each of the normal-pressure exhaust pipes.

[0012] Through the above scheme, the circulation of gas inside the atmospheric pressure exhaust pipe can be conveniently controlled. By setting the first high-efficiency filter element, impurities in the exhaust gas can be filtered out, so that ordinary inert gas tail gas can be directly discharged into the atmosphere through the atmospheric pressure exhaust pipe.

[0013] Furthermore, pressure sensors are installed on the top of the buffer tank and the krypton-xenon raw material tank, and the top of each pressure sensor is electrically connected to a buzzer.

[0014] Through the above scheme, the gas pressure inside the buffer tank and the krypton-xenon raw material tank can be monitored in real time respectively. When the gas pressure is abnormal, a buzzer can be used to give a warning, which is convenient for the staff to make corresponding treatment in time and improves the safety factor of the device.

[0015] Furthermore, pressure gauges are installed on the front of the buffer tank and the krypton-xenon raw material tank, and the pressure gauges are electrically connected to the pressure sensors.

[0016] Through the above scheme, the internal gas pressure conditions of the buffer tank and the krypton-xenon raw material tank can be displayed in real time respectively.

[0017] Furthermore, the bottoms of the buffer tank and the krypton-xenon raw material tank are both connected with a discharge pipe, and a fifth isolation valve is installed inside each of the discharge pipes.

[0018] Through the above solution, the discharge of gas in the buffer tank and the krypton-xenon raw material tank can be facilitated, and the flow of gas inside the discharge pipe can be controlled by setting the fifth isolation valve.

[0019] Furthermore, a second high-efficiency filter element is fixedly connected to the output end of each of the discharge pipes.

[0020] Through the above scheme, impurities in the exhaust gas flow can be removed, equipment can be protected and gas quality can be improved.

[0021] Furthermore, the bottom surfaces of the buffer tank and the krypton-xenon raw material tank are fixedly connected with four support columns, and the bottom surface of each support column is fixedly connected with an anti-slip pad.

[0022] Through the above solution, the buffer tank and the krypton-xenon raw material tank can be placed more stably on the contact surface, so that the exhaust gas can be recovered more stably.

[0023] Compared with the prior art, the technical solution of this application has the following beneficial effects: The invention discloses a high-efficiency tail gas recovery device, which can meet the tail gas recovery requirements of two chromatographs and one moisture meter at the same time. This is achieved by setting a prefabricated four-way pipe, thereby avoiding the need to equip each device with a tail gas treatment device separately, reducing the purchase and operation costs. The device can flexibly handle different types of tail gases. For common inert gases such as nitrogen, argon, helium, hydrogen, oxygen, etc., it can be directly connected to the normal pressure exhaust pipe to discharge the gas into the atmosphere. For product gases such as krypton and xenon, they are transported to a buffer tank for temporary storage through a primary booster pump. When the pressure in the buffer tank reaches a preset upper limit, the first isolation valve at the bottom of the buffer tank is closed, and the fourth isolation valve at the top of the buffer tank is opened. Then, the gas is pumped into the krypton-xenon raw material tank by a secondary booster pump. This process can effectively recover the gas for analysis, reduce the gas loss in product analysis, and improve the accuracy and stability of the product analysis data. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is a schematic diagram of the overall structure of this application; Figure 2 A schematic diagram of a four-way pipe structure of the present application; Figure 3 This is a schematic diagram of the overall structure of this application; Figure 4 This is a schematic diagram of the overall structure of this application.

[0025] In the figure: 1. Buffer tank; 2. Krypton-xenon raw material tank; 3. Access pipe; 4. First isolation valve; 5. Transfer pipe; 6. First non-return valve; 7. Primary booster pump; 8. Prefabricated four-way pipe; 9. Support column; 10. Second isolation valve; 11. Normal pressure exhaust pipe; 12. Third isolation valve; 13. First high-efficiency filter element; 14. Transfer pipe; 15. Fourth isolation valve; 16. Secondary booster pump; 17. Second non-return valve; 18. Pressure sensor; 19. Buzzer; 20. Pressure gauge; 21. Discharge pipe; 22. Fifth isolation valve; 23. Second high-efficiency filter element. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0027] See also Figure 1 , Figure 2 and Figure 4In the present embodiment, a high-efficiency tail gas recovery device comprises a buffer tank 1 and a krypton-xenon raw material tank 2. The buffer tank 1 and the krypton-xenon raw material tank 2 are both made of stainless steel, with polished inner walls and designed in accordance with the gas volume. The bottoms of the buffer tank 1 and the krypton-xenon raw material tank 2 are both connected with access pipes 3, each of which is internally provided with a first isolation valve 4. By providing the first isolation valve 4, the flow of gas inside the access pipes 3 can be controlled. The output end of the access pipe 3 located below the buffer tank 1 of the two access pipes 3 is connected with a transfer pipe 5, the interior of the transfer pipe 5 is provided with a first non-return valve 6, and the input end of the transfer pipe 5 is provided with a primary booster pump 7. The primary booster pump 7 is a diaphragm pump suitable for low-pressure boosting and has strong corrosion resistance. By providing the primary booster pump 7, krypton and xenon products can be pressurized, which facilitates the stable recovery of krypton and xenon products. The output end of the primary booster pump 7 is connected with a prefabricated four-way pipe 8. The three connecting pipes of the prefabricated four-way pipe 8 can be respectively connected with two chromatographs and a water The exhaust gas generated by the two gas analyzers can be simultaneously recovered to avoid the waste of gas resources and low recovery rate caused by separate treatment. The first one-way valve 6 is set to allow the gas to flow in only one direction to prevent backflow and avoid countercurrent damage to the first-stage booster pump 7. The three connecting pipes of the prefabricated four-way pipe 8 are each installed with a second isolation valve 10. By setting the second isolation valve 10, the flow of gas inside the three connecting pipes of the prefabricated four-way pipe 8 can be controlled respectively. The tops of the three connecting pipes of the prefabricated four-way pipe 8 are connected to a normal pressure exhaust pipe 11, and a third isolation valve 12 is installed inside each normal pressure exhaust pipe 11. The output end of each normal pressure exhaust pipe 11 is fixedly connected to a first high-efficiency filter element 13. By setting the third isolation valve 12, the circulation of gas inside the normal pressure exhaust pipe 11 can be conveniently controlled. By setting the first high-efficiency filter element 13, impurities in the filtered exhaust gas can be discharged, so that ordinary inert gas exhaust can be directly discharged to the atmosphere through the normal pressure exhaust pipe 11.

[0028] See also Figure 1 , Figure 3 and Figure 4A transfer pipe 14 is provided between the buffer tank 1 and the krypton-xenon raw material tank 2. The two ends of the transfer pipe 14 are respectively connected to the top of the buffer tank 1 and the krypton-xenon raw material tank 2. A fourth isolation valve 15, a secondary booster pump 16 and a second one-way valve 17 are installed inside the transfer pipe 14. The secondary booster pump 16 is a medium-pressure nitrogen-driven diaphragm pump to meet the high-pressure demand. The fourth isolation valve 15 can control the flow of gas inside the transfer pipe 14. The second one-way valve 17 can make the gas unidirectionally transported to avoid backflow causing damage to the secondary booster pump 16. To prevent damage, the bottoms of the buffer tank 1 and the krypton-xenon raw material tank 2 are connected with a discharge pipe 21, and a fifth isolation valve 22 is installed inside each discharge pipe 21. The discharge pipe 21 can facilitate the discharge of gases in the buffer tank 1 and the krypton-xenon raw material tank 2, and the fifth isolation valve 22 can control the flow of gases inside the discharge pipe 21. The output end of each discharge pipe 21 is fixedly connected with a second high-efficiency filter element 23. The second high-efficiency filter element 23 can remove impurities in the exhaust gas flow, protect the equipment and improve the gas quality.

[0029] It should be noted that krypton and xenon products enter the buffer tank 1 through the primary booster pump 7. When the pressure in the buffer tank 1 reaches the set upper limit, which is less than 0.3 MPa, the first isolation valve 4 below the buffer tank 1 is closed, and the fourth isolation valve 15 above the buffer tank 1 is opened. The krypton and xenon products are input into the krypton-xenon raw material tank 2 through the secondary booster pump 16. The process requires a pressure greater than 0.5 MPa, and the first high-efficiency filter element 13 and the second high-efficiency filter element 23 can filter out particles larger than 0.1 μm. See also Figure 1 , Figure 3 and Figure 4 , pressure sensors 18 are installed on the tops of the buffer tank 1 and the krypton-xenon raw material tank 2, and the accuracy of the pressure sensor 18 is higher than 0.01MPa. A buzzer 19 is electrically connected to the top of each pressure sensor 18. By setting two pressure sensors 18, the internal gas pressure of the buffer tank 1 and the krypton-xenon raw material tank 2 can be monitored in real time respectively. When the air pressure is abnormal, a buzzer warning can be issued through the buzzer 19, which is convenient for the staff to make corresponding treatment in time, thereby improving the safety factor of the device. Pressure gauges 20 are installed on the fronts of the buffer tank 1 and the krypton-xenon raw material tank 2. The pressure gauges 20 are electrically connected to the pressure sensors 18. By setting two pressure gauges 20, the internal gas pressure of the buffer tank 1 and the krypton-xenon raw material tank 2 can be displayed in real time respectively. The bottom surfaces of the buffer tank 1 and the krypton-xenon raw material tank 2 are fixedly connected with four support columns 9, and the bottom surface of each support column 9 is fixedly connected with an anti-skid pad. By setting the support columns 9 and the anti-skid pad, the buffer tank 1 and the krypton-xenon raw material tank 2 can be placed more stably on the contact surface, thereby being able to more stably recover the exhaust gas.

[0030] In this embodiment, the prefabricated four-way pipe 8 can meet the simultaneous recovery of tail gas from two chromatographs and a moisture meter, which can reduce the need for each device to be equipped with a separate tail gas treatment device, thereby saving procurement and operating costs. For the tail gas of all equipment, ordinary inert gases, such as nitrogen, argon, helium, hydrogen, oxygen, etc., can be directly connected to the normal pressure exhaust pipe 11 to discharge the gas into the atmosphere, while the krypton gas and xenon gas products enter the buffer tank 1 through the first-level booster pump 7. When the pressure of the buffer tank 1 reaches the set upper limit, the first isolation valve 4 at the bottom of the buffer tank 1 is closed, and the fourth isolation valve 15 at the top of the buffer tank 1 is opened, and the second-level booster pump 16 is connected to the krypton xenon raw material tank 2. In this way, the analytical gas can be effectively recovered, which greatly reduces the loss of product analysis. To a certain extent, it will further ensure the accuracy and stability of the product analysis data.

[0031] The working principle of the above embodiment is: the three connecting pipes of the prefabricated four-way pipe 8 are respectively connected to two chromatographs and a moisture meter. When the chromatograph and the moisture meter produce common inert tail gas such as nitrogen, argon, helium, hydrogen and oxygen, the three second isolation valves 10 can be directly closed and the three third isolation valves 12 can be opened to discharge the gas into the atmosphere. In the process of discharge, the impurities in the tail gas can also be removed by the first high-efficiency filter element 13, so that the tail gas can be discharged in a more environmentally friendly way. For krypton and xenon products, the three third isolation valves 12 need to be closed, and the three second isolation valves 10 and the first isolation valve 4 need to be opened to discharge the gas. The pressure is increased by the primary booster pump 7 and then input into the buffer tank 1 through the transfer pipe 5 and the first one-way valve 6. When the internal pressure of the buffer tank 1 reaches the set upper limit, the first isolation valve 4 at the bottom of the buffer tank 1 is closed, and the fourth isolation valve 15 at the top of the buffer tank 1 is opened. In this way, the krypton and xenon products can be input into the krypton-xenon raw material tank 2 through the secondary booster pump 16. The second one-way valve 17 is set to avoid the backflow from affecting the equipment, and the krypton and xenon gases used for analysis are effectively recovered and processed, avoiding waste of resources. The recovery rate can reach more than 80%, which greatly reduces the loss of product analysis.

[0032] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0033] Although the embodiments of the present application have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A high-efficiency tail gas recovery device, comprising a buffer tank (1) and a krypton-xenon raw material tank (2), characterized in that: The bottoms of the buffer tank (1) and the krypton-xenon raw material tank (2) are both connected with access pipes (3), each of which is internally installed with a first isolation valve (4), the output end of the access pipe (3) located below the buffer tank (1) of the two access pipes (3) is connected with a transfer pipe (5), the interior of the transfer pipe (5) is installed with a first non-return valve (6), the input end of the transfer pipe (5) is installed with a primary booster pump (7), the output end of the primary booster pump (7) is connected with a prefabricated four-way pipe (8), and the tops of the three connecting pipes of the prefabricated four-way pipe (8) are all connected with a normal pressure exhaust pipe (11); A transfer pipe (14) is provided between the buffer tank (1) and the krypton-xenon raw material tank (2), the two ends of the transfer pipe (14) being respectively connected to the top of the buffer tank (1) and the top of the krypton-xenon raw material tank (2), and a fourth isolation valve (15), a secondary booster pump (16) and a second non-return valve (17) are installed inside the transfer pipe (14), and the secondary booster pump (16) is a medium-pressure nitrogen driven diaphragm pump.

2. A high-efficiency tail gas recovery device according to claim 1, characterized in that: Second isolation valves (10) are installed inside the three connecting pipes of the prefabricated four-way pipe (8).

3. The high-efficiency tail gas recovery device according to claim 1, characterized in that: A third isolation valve (12) is installed inside each of the atmospheric pressure exhaust pipes (11), and a first high-efficiency filter element (13) is fixedly connected to the output end of each of the atmospheric pressure exhaust pipes (11).

4. The high-efficiency tail gas recovery device according to claim 1, characterized in that: Pressure sensors (18) are installed on the top of the buffer tank (1) and the krypton-xenon raw material tank (2), and the top of each pressure sensor (18) is electrically connected to a buzzer (19).

5. A high-efficiency tail gas recovery device according to claim 4, characterized in that: Pressure gauges (20) are installed on the front sides of the buffer tank (1) and the krypton-xenon raw material tank (2), and the pressure gauges (20) are electrically connected to the pressure sensor (18).

6. The high-efficiency tail gas recovery device according to claim 1, characterized in that: The bottoms of the buffer tank (1) and the krypton-xenon raw material tank (2) are both connected to a discharge pipe (21), and a fifth isolation valve (22) is installed inside each of the discharge pipes (21).

7. A high-efficiency tail gas recovery device according to claim 6, characterized in that: The output end of each discharge pipe (21) is fixedly connected to a second high-efficiency filter element (23).

8. The high-efficiency tail gas recovery device according to claim 1, characterized in that: The bottom surfaces of the buffer tank (1) and the krypton-xenon raw material tank (2) are both fixedly connected with four support columns (9), and the bottom surface of each support column (9) is fixedly connected with an anti-slip pad.

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