Photoelectric glass material with high stray light elimination function and preparation method and application thereof

Abstract

The invention provides a photoelectric glass material with a high stray light elimination function and a preparation method and application of the photoelectric glass material with the high stray light elimination function. The invention discloses a high-temperature-resistant glass which comprises or is composed of the following components: 53% to 65% of SiO2, 0% to 3% of Bi2O3, 0.1% to 4% of In2O3, 0.1% to 5% of SnO2, 12% to 18% of Na2O, 1% to 5% of K2O, 0% to 4% of B2O3, 10% to 15% of Al2O3, 0% to 6% of ZrO2, 0% to 2% of MgO, 0% to 2% of CaO, 0% to 1% of Sb2O3 and 1% to 2% of As2O3. The photoelectric glass material has the advantages of excellent spectrum transmittance, efficient stray light elimination area, excellent glass internal quality and good chemical strengthening property. The material can be used for preparing optical input window materials or optical lenses, and has important market prospects in the fields of high-performance cameras, space vision imaging, low-light night vision, information display systems and the like.

Description

Technical Field

[0001] The present application relates to the field of glass technology, and in particular to a photoelectric glass material with high stray light elimination, a preparation method thereof, and an application thereof. Background Art

[0002] Any discussion of the prior art throughout the specification should not be considered as an admission that such prior art is widely known or forms part of the common general knowledge in the field.

[0003] As a new type of special glass material, optoelectronic glass is widely used in high-performance cameras, space visual imaging, low-light night vision and information display systems. Its core function is to improve the performance and imaging quality of optoelectronic systems through efficient light absorption and transmission characteristics. There are many optoelectronic glass materials on the market, but they are still insufficient in terms of stray light elimination, spectral transmittance, glass internal quality, chemical strengthening characteristics and mechanical strength, which restricts its widespread use in high-end applications.

[0004] Existing optoelectronic glass has certain limitations in eliminating stray light. Although doping with metal ions can improve light absorption capacity to a certain extent, it is often unable to completely eliminate stray light, and the thickness and uniformity of the light absorption layer are difficult to control, resulting in unstable effects. In addition, while current optoelectronic glass achieves high light absorption, the spectral transmittance is often affected. High concentrations of doped ions may cause the transparency of the glass to decrease, affecting the overall performance of the optoelectronic system. The balance between spectral transmittance and light absorption capacity has not yet been fully resolved, limiting its application in optical input window materials and optical lenses.

[0005] The intrinsic quality of glass, that is, the uniformity and purity of the internal structure, has an important influence on the optoelectronic performance. Existing manufacturing processes make it difficult to maintain the excellent intrinsic quality of glass at high doping concentrations, which directly affects the optical uniformity and mechanical properties, and limits its use in high-precision optical systems. Chemical strengthening treatment is an important means to improve the mechanical strength of optoelectronic glass, but at high doping ion concentrations, the chemical strengthening effect is often not ideal. Doped ions may interfere with the exchange of strengthening ions, resulting in insufficient surface compressive stress, affecting the mechanical properties and durability of the glass. In addition, high-performance optoelectronic glass needs to have higher mechanical strength to adapt to harsh use environments, but high doping concentrations and complex processing techniques often lead to increased internal stress in the glass, affecting its impact resistance and wear resistance.

[0006] Achieving high-concentration doping, uniform distribution, and ideal reduction effects requires precise process control, which increases production difficulty and cost. In addition, the environmental and health safety issues of certain doping ions require special attention and management. While improving light absorption capacity, maintaining a balance between high spectral transmittance and good mechanical properties remains a major challenge.

[0007] The purpose of the present invention is to overcome or improve at least one disadvantage of the prior art, or to provide a useful alternative. Unless the context clearly requires otherwise, throughout the specification and claims, the words "include", "comprises", etc. should be interpreted from an inclusive perspective rather than an exclusive or exhaustive perspective; that is, from the perspective of "including, but not limited to". Summary of the invention

[0008] The purpose of the present invention is to provide a photoelectric glass material with high stray light elimination, and a preparation method and application thereof. The photoelectric glass material provided by the present invention has excellent spectral transmittance, efficient stray light elimination area, excellent glass internal quality, good chemical strengthening properties and high mechanical strength, and can be used to prepare optical input window materials or optical lenses, and has important market prospects in the fields of high-performance cameras, space visual imaging, low-light night vision and information display systems.

[0009] In order to achieve the above object, the present invention provides the following technical solutions:

[0010] In a first aspect of the present invention, a glass composition is provided, which comprises or consists of the following components, in mass percentage: 53-65% SiO2, 0-3% Bi2O3, 0.1-4% In2O3, 0.1-5% SnO2, 12-18% Na2O, 1-5% K2O, 0-4% B2O3, 10-15% Al2O3, 0-6% ZrO2, 0-2% MgO, 0-2% CaO, 0-1% Sb2O3 and 1-2% As2O3.

[0011] In the embodiment of the present invention, SiO2, as a glass former oxide, is the main component of the glass skeleton network structure and exists in the glass structure in the form of [SiO4] tetrahedrons. The amount of SiO2 not only affects the melting point and viscosity of the glass, but may also affect the redox reaction balance of the glass, the solubility and reactivity of the clarifier and other additives, and thus indirectly affect the formation and thickness of the absorption layer during the reduction treatment. In particular, under a reducing atmosphere, the content of SiO2 may affect the redox reaction in the glass melt, and then affect the formation and distribution of the absorption material in the absorption layer, and then affect the properties and thickness of the absorption layer. Therefore, in the present invention, the content of SiO2 is 53-65% by mass.

[0012] In some embodiments of the present invention, the content of SiO2 can be selected from the following ranges or values ​​within the range, by mass percentage: 53-56%, 53-58%, 53-63%, 53-65%, 53.5-56%, 53.5-58%, 53.5-63%, 53.5-65%, 56-58%, 56-63%, 56-65%, 56.5-58%, 57-58%, 57.5-58%, 58-62.9%, 58-62.5%, 58- 62.3%, 58-62%, 58-61.8%, 58-61.5%, 58-61.3%, 58-61%, 58-60.8%, 58-60.5%, 58-60.3%, 58-60%, 58-59.9%, 58-59.6%, 58-59.3%, 58-59%, 58-58.9%, 58-58.7%, 58-58.5%, 58-58.3%, 58-63%, 58-65%, 63-65%, and so on.

[0013] In an embodiment of the present invention, Bi2O3 will be reduced to bismuth in a low oxidation state or even metallic bismuth in a high-temperature reducing atmosphere. This reduction process will cause a change in the color of the glass material, such as appearing black or gray. This color change significantly increases the light absorption capacity of the glass and enhances the material's absorption of light. The present invention controls the reduction process to produce bismuth particles, thereby adjusting the light absorption characteristics of the entire glass, avoiding the increase in weight and cost caused by the formation of a light absorption layer by coating in traditional optoelectronic glass materials, while improving the light transmission efficiency. In an embodiment of the present invention, an efficient light absorption area can be formed in a thinner glass layer, thereby improving the overall light absorption efficiency without significantly increasing the thickness of the material. In the present invention, the content of Bi2O3 is 0-3% by mass. In some optional embodiments, the content of Bi2O3 can be further selected from the following ranges or values ​​within the following ranges, measured by mass percentage: 0, 0-0.8%, 0-1%, 0-1.5%, 0-3%, 0.8-1%, 0.8-1.5%, 0.8-3%, 1-1.5%, 1-3%, 1.5-3%, 0.85-1%, 0.9-1%, 1-1.2%, 1-1.3%, 1-1.4%, and the like.

[0014] In an embodiment of the present invention, the addition of In2O3 can improve the thermal conductivity and mechanical properties of the glass material. When the indium content is low, the thermal stability and heat resistance of the glass can be effectively improved, and an appropriate increase in the indium content can increase the density and refractive index of the glass. However, excessive In2O3 content can cause serious discoloration of the glass. Therefore, the present invention can improve the performance of the glass while maintaining the stability of its optical properties by controlling the addition amount of In2O3. In the present invention, the content of In2O3 is 0.1-4% by mass. In some optional embodiments, the content of In2O3 can be further selected from the following ranges or values ​​within the following ranges, measured by mass percentage: 0.1-0.4%, 0.1-0.5%, 0.1-1%, 0.1-2%, 0.1-4%, 0.4-0.5%, 0.4-1%, 0.4-2%, 0.4-4%, 0.5-1%, 0.5-2%, 0.5-4%, 1-2%, 1-4%, 2-4%, 0.2-0.4%, 0.3-0.4%, 0.4-0.49%, and the like.

[0015] In the embodiment of the present invention, the transparency and heat resistance of the glass are enhanced by introducing and regulating the amount of SnO2, and the introduction of SnO2 causes it to react with other glass components during the glass melting process to form hard crystals distributed in the glass, which can increase the hardness and flexural strength of the glass and reduce the possibility of scratches on the glass surface, thereby improving the durability of the glass. In the present invention, the content of SnO2 is 0.1-5% by mass. In some optional embodiments, the content of SnO2 can be further selected from the following ranges or values ​​within the following ranges, measured by mass percentage: 0.1-1%, 0.1-1.5%, 0.1-3%, 0.1-5%, 1-1.5%, 1-3%, 1-5%, 1.5-3%, 1.5-5%, 3-5%, 3.1-5%, 3.8-5%, 3.5-5%, 4-5%, 4.1-5%, 4.3-5%, 4.5-5%, 4.8-5%, and the like.

[0016] In addition, in the embodiment of the present invention, Bi2O3, In2O3 and SnO2 are important additives. Among them, Bi2O3, In2O3 and SnO2 play a synergistic role in the optoelectronic glass of the present invention, and jointly improve the overall performance of the material. Bi2O3 is reduced to bismuth or metallic bismuth in a low oxidation state under a high temperature reducing atmosphere, producing a black or gray color, which significantly increases the light absorption capacity of the glass. By adjusting the content and reduction process of Bi2O3, the light absorption characteristics of the glass can be accurately controlled to achieve efficient absorption of light of different wavelengths. The addition of In2O3 and SnO2 helps to evenly distribute bismuth particles, avoid local over-reduction or uneven coloring, and ensure that the glass has a consistent light absorption effect. In2O3 can improve the thermal conductivity of the glass, so that it has better thermal stability under high temperature conditions. At the same time, an appropriate amount of In2O3 improves the mechanical strength and heat resistance of the glass, and increases the density and refractive index of the glass. The reduction process of Bi2O3 requires high temperature, and the thermal conductivity of In2O3 ensures that the glass will not produce excessive internal stress due to the temperature gradient during the reduction process, avoiding thermal cracking and deformation of the glass. In addition, SnO2 reacts with other components during the melting process of glass to form hard crystals. These crystals are distributed in the glass, increasing the hardness and flexural strength of the glass. Together with In2O3, they significantly improve the flexural strength and wear resistance of the glass. SnO2 not only improves the transparency of the glass, giving it better light transmission performance in optical applications, but also enhances the durability of the glass by forming hard crystals. Through the synergistic effect with Bi2O3 and In2O3, SnO2 ensures that the light absorption characteristics of the glass are not affected while enhancing transparency, achieving dual optimization of optical and mechanical properties. The thermal stability of In2O3 and the hard crystals of SnO2 work together to significantly improve the durability of the glass and reduce the possibility of damage during use.

[0017] In some embodiments of the present invention, the sum of the contents of Bi2O3, In2O3 and SnO2 is 3.5-6.4%. In some optional embodiments, the sum of the contents of Bi2O3, In2O3 and SnO2 is 3.5-4.1%, 3.5-3.8%, 4-6.4%, 4.6-6.4% or 5-6.4%.

[0018] In some embodiments of the present invention, the content ratio of Bi2O3, In2O3 and SnO2 is 0-3:0.1-4:0.1-5. In some optional embodiments, the content ratio of Bi2O3, In2O3 and SnO2 is 0-2.5:0.1-4:0.1-5, 1-2.5:0.1-3:1-5, 1-1.5:0.1-0.4:3-5, 1.5:0.1:3 or 1:0.4:5.

[0019] In some embodiments of the present invention, the content of Bi2O3 is 0 or 0.18-2 times the sum of the contents of In2O3 and SnO2, preferably 0.18-0.5 times. In some optional embodiments, the content of Bi2O3 is 0.18-0.4 times, 0.18-0.3 times or 0.18-0.27 times the sum of the contents of In2O3 and SnO2.

[0020] In some embodiments of the present invention, the sum of the contents of In2O3 and SnO2 is 1.5-5.4%. In some optional embodiments, the sum of the contents is 2-5.4%, 2.5-5.4%, 3-5.4%, 3.1-5.4%, 4-5.4%, 4.1-5.4% or 4.5-5.4%.

[0021] In some embodiments of the present invention, the content of Bi2O3 is 0.4-15 times the content of In2O3, preferably 1-15 times, more preferably 2.5-15 times, and most preferably 2.5-5 times.

[0022] In some embodiments of the present invention, the content of Bi2O3 is 0.2-3 times the content of SnO2, preferably 0.2-1 times, more preferably 0.2-0.5 times, and most preferably 0.2-0.3 times.

[0023] In the embodiment of the present invention, Na2O and K2O are the network outer oxides of the glass, and the alkali metal ions are easy to move and diffuse in the glass body, and can reduce the viscosity of the glass at high temperature melting, making the glass easy to melt, and are good fluxing agents. + It is a necessary condition for achieving chemical strengthening. Therefore, in the present invention, the content of Na2O is 12-18% by mass. In some optional embodiments of the present invention, the content of Na2O is selected from the following ranges or values ​​in the following ranges by mass: 12-13%, 12-14.1%, 12-15.4%, 12-18%, 13-14.1%, 13-15.4%, 13-18%, 14.1-15.4%, 15.5-18%, 14.1-18%, 15-18%, 16-18%, 17-18%, etc. The content of K2O is 1-5%. In some optional embodiments of the present invention, the content of K2O is selected from the following ranges or values ​​within the following ranges, measured by mass percentage: 1-1.5%, 1-2%, 1-3%, 1-4%, 1-5%, 2-3%, 2-4%, 2-5%, 3-4%, 3-5%, 4-5%, and the like.

[0024] In some embodiments of the present invention, the content of Na2O is at least 3 times the content of K2O. In some optional embodiments, the content of Na2O is at least 4 times, 5 times, 6 times, 7 times, 8 times, 9 times, 10 times, 11 times, 12 times, 13 times, 14 times, 15 times, 16 times, 17 times, 18 times the content of K2O. Preferably, the content of Na2O is 3-18 times, preferably 5-18 times, and more preferably 15-18 times the content of K2O.

[0025] In an embodiment of the present invention, B2O3 is a glass-forming oxide, and B can partially replace Si in silicate glass to form a network structure. In addition, B2O3 has a fluxing effect in glass, which can reduce the high-temperature viscosity of glass, save costs, and facilitate production. However, as the content of B2O3 increases, the devitrification range of glass increases, and B2O3 is volatile and can pollute the environment, so the amount should be strictly controlled during the production process. Therefore, in the present invention, the content of B2O3 is 0-4% by mass. In some optional embodiments, the content of B2O3 can be selected from the following ranges or values ​​within the following ranges by mass: 0, 0-1%, 0-1.3%, 0-2%, 0-4%, 1-1.3%, 1.4-2%, 2-3.9%, 2-3.6%, 2-3%, 1-2%, 1.5-2%, 1-4%, 1.3-2%, 1.3-4%, 2-4%.

[0026] In the embodiment of the present invention, Al2O3 is a glass intermediate oxide, and its content affects the thermal expansion coefficient and chemical and thermal stability of the glass. Al2O3 can increase the mechanical processing performance of the glass, but too much will reduce the material properties. In addition, the volume of [AlO4] in the glass is 41cm 3 / mol, the volume of [SiO4] is 27cm 3 / mol, [AlO4] is 52% larger in volume than [SiO4], so [AlO4] will increase the voids in the glass structure, which is beneficial to improving the ion exchange efficiency and making the glass material have excellent chemical strengthening properties. Therefore, in the present invention, the content of Al2O3 is 10-15% by mass percentage. In some optional embodiments, the content of Al2O3, measured by mass percentage, can be selected from the following ranges or values ​​within the following ranges: 10-10.5%, 10-11.5%, 10-14%, 10-14.5%, 10-15%, 10.5-11.5%, 10.5-14%, 10.5-14.5%, 10.5-15%, 11.5-14%, 11.5-14.5%, 11.5-15%, 14-14.5%, 14-15%, 14.5-15%, 10-11%, 10-10.4%, and the like.

[0027] In an embodiment of the present invention, ZrO2 is a glass intermediate oxide, which has the effect of improving chemical stability and preventing alkali metal and alkaline earth metal ions from being exposed. It is also an important component for improving the tensile elastic modulus, and is very helpful for improving the hardness of glass after chemical strengthening. Therefore, in the present invention, the content of ZrO2 is 0-6% by mass percentage. In some optional embodiments, the content of ZrO2 can be selected from the following ranges or values ​​within the following ranges by mass percentage: 0, 0-0.5%, 0-1%, 0-1.2%, 0-2%, 0-3%, 0-6%, 1.2-2%, 1.5-2%, 1.2-3%, 1.2-6%, 2-3%, 2-6%, 3-6%, and the like.

[0028] In the embodiment of the present invention, MgO and CaO are alkaline earth metal oxides, and the addition of alkaline earth metal oxides can greatly reduce the phase separation tendency of glass. At the same time, MgO is added on the basis of alkali-aluminosilicate glass, which has a network breaking and fluxing effect on the glass, and does not cause the substantial disconnection of the network, and can promote the formation of multi-rings in the network structure, including ternary rings, quaternary rings, pentacyclic rings and hexacyclic rings, etc., which not only meets the integrity of the glass connection, but also helps to create gaps between glass structural units, creates exchange channels for ion exchange, and is conducive to the increase of the depth of the compressive stress layer (DOL) after chemical strengthening, thereby improving the bending strength and overall impact resistance of the glass. Therefore, in the present invention, the content of MgO is 0-2% by mass. In some optional embodiments, the content of MgO can be selected from the following ranges or values ​​in the following ranges by mass percentage: 0, 0-0.6%, 0-1%, 0-1.5%, 0-2%, 0.6-0.8%, 0.6-1%, 0.6-0.9%, 0.6-0.8%, 0.6-1.5%, 0.6-2%, 1-1.5%, 1-2%, 1.5-2%, etc. The content of CaO is 0-2%. In some optional embodiments, the content of CaO can be selected from the following ranges or values ​​in the following ranges by mass percentage: 0, 0-1%, 0-1.5%, 0-2%, 1-1.5%, 1-2%, 1.5-2%, 1.6-2%, etc.

[0029] In an embodiment of the present invention, Sb2O3 and As2O3 play an important role in the glass manufacturing process as glass clarifiers. Sb2O3 is reduced to Sb2O2 under high temperature conditions, while oxidizing impurities in the glass. This process causes the impurities to be continuously oxidized and removed, thereby improving the clarity of the glass. Sb2O2 is then oxidized to Sb2O3, forming a redox cycle, continuously removing impurities in the glass, and significantly improving transparency and optical quality. In addition, Sb2O3 can also reduce oxides or impurities to prevent bubble formation, thereby improving the quality and optical properties of the glass. However, too high a Sb2O3 content may lead to excessive clarification, forming antimony oxide crystals, affecting the uniformity and transparency of the glass, and increasing toxicity risks and environmental pollution. Too low a content will result in insufficient clarification, and impurities and bubbles cannot be completely removed. Therefore, in the present invention, the content of Sb2O3 is 0-1% by mass. In some optional embodiments, the content of Sb2O3, measured by mass percentage, can be selected from the following ranges or values ​​within the following ranges: 0, 0-0.5%, 0-0.8%, 0-1%, 0.5-0.8%, 0.5-1%, 0.8-1%, 0.9-1%, and the like.

[0030] In the present invention, As2O3 also has a similar clarifying effect, removing impurities in the glass through redox reactions at high temperatures. As2O3 forms volatile As2O5 at high temperatures, further oxidizing impurities in the glass to make them escape, thereby achieving a clarifying effect. In addition, As2O3 can reduce the surface tension of the glass melt, reduce the formation of bubbles, and thus improve the uniformity and transparency of the glass. However, if the As2O3 content is too high, it will significantly increase the toxicity risk and environmental pollution, cause the glass color to change, and affect the optical properties. If the content is too low, the clarifying effect is not good and the bubbles increase. Therefore, in the present invention, the content of As2O3 is 1-2% by mass. In some optional embodiments, the content of As2O3 can be selected from the following ranges or values ​​within the following ranges by mass: 1-1.2%, 1-1.5%, 1-2%, 1.2-1.5%, 1.2-2%, 1.5-2%, and so on.

[0031] In the present invention, by introducing and regulating the amount of Sb2O3 and As2O3, the synergistic effect of the glass is enhanced and the formation of bubbles is inhibited. The redox cycle of Sb2O3 and the volatility of As2O3 are combined, which is more conducive to removing impurities and significantly improving the transparency and optical quality of the glass. Sb2O3 reduces oxides or impurities to prevent bubble formation, while As2O3 reduces the surface tension of the melt and reduces the number and size of bubbles. The combination of the two can more effectively prevent bubble formation, improve the uniformity and transparency of the glass, and thus significantly improve the optical properties and quality of the glass.

[0032] In some embodiments of the present invention, the sum of the contents of Sb2O3 and As2O3 is preferably 1-3%. In some optional embodiments, the sum of the contents of Sb2O3 and As2O3 can be 1.5-3%, 2-3%, 1.5-2% or 2-2.5%.

[0033] In some embodiments of the present invention, when the content of Sb2O3 is not 0, the content of As2O3 is at least 1, 1.5, 2, 2.5 or 3 times the content of Sb2O3. Preferably, the content of As2O3 is 1-3 times the content of Sb2O3, preferably 1-2 times, more preferably 1-1.5 times, and most preferably 1.5 times.

[0034] For example, in some embodiments of the present invention, the glass composition of the present invention comprises, by mass percentage, 53.5-65% SiO2, 0-2.5% Bi2O3, 0.1-4% In2O3, 0.1-5% SnO2, 14-18% Na2O, 1-5% K2O, 0-3.5% B2O3, 10-14.5% Al2O3, 0-6% ZrO2, 0-1.5% MgO, 0.1-2% CaO, 0-1% Sb2O3 and 1-2% As2O3.

[0035] For example, in some embodiments of the present invention, the glass composition of the present invention comprises, by mass percentage, 53.5-63% SiO2, 0.8-1.5% Bi2O3, 0.4-3.5% In2O3, 1-5% SnO2, 12-18% Na2O, 1-5% K2O, 0-2% B2O3, 10-14.5% Al2O3, 0-2% ZrO2, -0.6-1.5% MgO, 1-2% CaO, 0.5-1% Sb2O3 and 1-2% As2O3.

[0036] For example, in some embodiments of the present invention, the glass composition of the present invention comprises, by mass percentage, 54-58% SiO2, 1-1.5% Bi2O3, 0.1-0.4% In2O3, 3-5% SnO2, 15-18% Na2O, 1-3% K2O, 0-2% or 1.5-2% B2O3, 10-14.5% Al2O3, 0-2% ZrO2, 0.6-1% MgO, 1.5-2% CaO, 0.8-1% Sb2O3 and 1-1.2% As2O3.

[0037] In a second aspect of the present invention, a photovoltaic glass blank is provided, which is made of the glass composition described in the first aspect.

[0038] The preparation method of the optoelectronic glass blank comprises: mixing the raw materials, melting at a high temperature of 1500-1600° C., stirring, clarifying, cooling to 1320-1430° C. for forming, and annealing at 480-580° C. after forming to obtain the photoelectric glass blank.

[0039] The raw materials may also be selected from the following materials as needed: quartz sand, bismuth oxide (or bismuth nitrate pentahydrate), indium oxide, tin oxide, sodium carbonate (or sodium nitrate), potassium carbonate (or potassium nitrate), boron oxide (or boric acid), aluminum hydroxide (or aluminum oxide), zirconium oxide, calcium oxide (or calcium carbonate), magnesium oxide (or basic magnesium carbonate), antimony trioxide and white arsenic.

[0040] In an embodiment of the present invention, the spectral transmittance of the optoelectronic glass blank to 500nm light is ≥92.00%, preferably ≥93%. For example, the spectral transmittance of the optoelectronic glass blank to 500nm light can be controlled to be 92-93.15%, 92.22-93.15%, 92.38-93.15%, 92.57-93.15% or 92.86-93.15%.

[0041] In the embodiment of the present invention, the photovoltaic glass blank has good glass internal quality, and its bubble degree is A0 level, which means that the total cross-sectional area of ​​bubbles with a diameter of Φ≥0.05mm in the glass internal quality is greater than 0.03-0.10mm. 2 / 100cm 2 .

[0042] In a third aspect of the present invention, a photoelectric glass material is provided, which comprises a light-transmitting glass substrate and a light-absorbing layer disposed on the surface of the light-transmitting glass substrate.

[0043] The light absorbing layer covers part of the surface of the light-transmitting base glass, dividing the surface of the light-transmitting base glass into a low-light-transmittance area and at least one light-transmittance effective area, wherein the light-transmittance effective area does not cover the light absorbing layer and allows the target light to pass through; and the low-light-transmittance area covers the light absorbing layer to absorb or block the passage of the target light.

[0044] The light-transmitting substrate glass has the composition of the glass composition described in the first aspect, or is made of the optoelectronic glass blank described in the second aspect, for example, obtained by mechanical processing.

[0045] In an embodiment of the present invention, the mechanical processing includes changing at least one of the physical form, surface quality and appearance of glass, such as glass blank. The physical form, for example, is to cut the glass blank into a desired shape and size by cutting, such as to drill a desired hole diameter and hole position on the glass blank by drilling. The surface quality, for example, is to improve the smoothness and transparency of the surface of the glass blank by polishing (for example, mechanical polishing), such as to grind the edge of the glass by edge grinding to remove sharp edges and improve safety. The appearance, for example, is to make various patterns or logos on the surface of the glass blank by engraving (for example, mechanical engraving).

[0046] The reduction treatment is carried out in a reducing atmosphere, the time of the reduction treatment is 5000-18000 min, the pressure is 0.02-0.5 MPa, and the temperature is 580-760°C.

[0047] In an embodiment of the present invention, the spectral transmittance of the effective light transmission area to 500nm light is ≥92.00%, preferably ≥93%. For example, the spectral transmittance of the effective light transmission area to 500nm light can be controlled to be 92-93.15%, 92.22-93.15%, 92.38-93.15%, 92.57-93.15% or 92.86-93.15%. In an embodiment of the present invention, the photoelectric glass material has good glass internal quality, and its bubble degree is A0 level, which means that the total cross-sectional area of ​​bubbles with a diameter of Φ≥0.05mm in the glass internal quality is greater than 0.03-0.10mm 2 / 100cm 2 The high-quality glass internal quality of the present invention can ensure the stability and consistency of the optoelectronic glass in the optical system and reduce optical defects and distortion.

[0048] In an embodiment of the present invention, the spectral transmittance of the absorption layer (low light transmittance area) to 500nm light is ≤0.2%, preferably ≤0.15, and more preferably ≤0.12. For example, the spectral transmittance of the absorption layer to 500nm light can be controlled at 0.11-0.2%, 0.11-0.18%, 0.11-0.16%, 0.11-0.15%, 0.11-0.14%, 011-0.13% or 0.11-0.12%. The absorption layer with low spectral transmittance of the present invention can effectively reduce stray light and reflected light, and improve the contrast and imaging clarity of the optical system. The high spectral transmittance of the present invention enables the optoelectronic glass to transmit light to the maximum extent in the optical system, thereby improving the imaging quality and efficiency of the optical device.

[0049] In an embodiment of the present invention, the thickness of the absorption layer is ≥854 μm, preferably ≥900 μm, and more preferably ≥940 μm. For example, the thickness of the absorption layer can be controlled at 854-972 μm, 867-972 μm, 880-972 μm, 911-972 μm or 944-972 μm. The thickness of the absorption layer of the present invention can optimize the light absorption effect and mechanical properties of the optical system, and ensure the reliability and durability of the optoelectronic glass in the application.

[0050] In an embodiment of the present invention, the bending strength of the photoelectric glass material after strengthening of the present invention is ≥200MPa, preferably ≥210MPa. For example, the bending strength of the photoelectric glass material after strengthening can be controlled at 200-215MPa, 204-215MPa, 207-215MPa, 211-215MPa or 214-215MPa. The high bending strength of the present invention enables the photoelectric glass to withstand greater mechanical stress during use, thereby increasing its service life and stability.

[0051] Among them, the strengthening is chemical strengthening, which means placing the glass in a salt bath for single or multiple chemical ion exchange. The salt bath used for ion exchange can be lithium salt, sodium salt, potassium salt or a mixed molten salt of any two or three. The temperature of the chemical strengthening is 300-500°C and the time is 200-800min.

[0052] In a fourth aspect of the present invention, a method for preparing the optoelectronic glass material described in the third aspect is provided, comprising:

[0053] A photoelectric glass blank is mechanically processed to obtain a light-transmitting glass substrate; the photoelectric glass blank is made of the photoelectric glass composition described in the first aspect or as described in the second aspect;

[0054] Performing reduction treatment on the light-transmitting glass substrate to form a light-absorbing layer on the surface thereof;

[0055] The light absorbing layer is surface treated so that the glass surface has at least one light-transmitting effective area, thereby obtaining a photoelectric glass material.

[0056] Continuing to perform chemical strengthening treatment on the photovoltaic glass material can obtain a chemically strengthened photovoltaic glass material.

[0057] The method for preparing the optoelectronic glass blank comprises: mixing the raw materials, melting them at a high temperature of 1500-1600°C, stirring, clarifying, cooling them to 1320-1430°C for forming, and annealing them at 480-580°C after forming to obtain the optoelectronic glass blank; machining the optoelectronic glass blank;

[0058] Then, a reduction treatment is performed to form an absorption layer on the surface of the glass material, wherein the reduction treatment is performed in a reducing atmosphere (such as hydrogen), the reduction treatment time is 5000-18000 min, the pressure is 0.02-0.5 MPa, and the temperature is 580-760° C.;

[0059] The photovoltaic glass material with an absorption layer formed on the surface is subjected to surface treatment.

[0060] The purpose of the mechanical processing described in the present invention is mainly to accurately modify the shape, size and surface state of the glass blank to meet specific application requirements. Such operations include but are not limited to cutting and edge grinding. A suitable processing method can be selected according to needs. For example, the glass blank can be rounded or sliced.

[0061] The surface treatment of the present invention includes but is not limited to grinding, polishing, cutting, polishing, etc., to adjust the surface state of the glass, such as flatness and smoothness, etc. A suitable treatment method can be selected according to needs. For example, a part of the light absorption layer on the surface can be polished to expose the light-transmitting effective area.

[0062] Furthermore, the method further comprises the step of chemically strengthening the surface-treated photovoltaic glass material, wherein the temperature of the chemical strengthening is 300-500° C., the time is 200-800 min, and the salt bath used for chemical strengthening can be at least one molten salt of lithium salt, sodium salt, and potassium salt. For example, in some embodiments, the molten salt is molten potassium nitrate.

[0063] The optoelectronic glass material of the present invention can be further processed precisely to obtain target parts.

[0064] The goal of precision machining described in the present invention is to produce parts with precise dimensions, tolerances or surface roughness, and appropriate operations can be selected according to the needs.

[0065] In a fifth aspect of the present invention, an optical input window material or an optical lens prepared from the glass composition described in the first aspect or the optoelectronic glass material described in the third aspect is provided.

[0066] In the sixth aspect of the present invention, there is provided a glass composition as described in the first aspect or a photoelectric glass material as described in the third aspect, and its application in the fields of high-performance cameras, space visual imaging, low-light night vision and information display systems.

[0067] The various specific technical features described in the above embodiments of the present invention can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further explain various possible combinations.

[0068] Unless otherwise specified, the numerical range described in the present invention includes all the numerical values ​​within this range, and includes the range value composed of any two numerical values ​​within this range. For example, 0.1-2%, this numerical range includes all the numerical values ​​between 0.1-2%, and includes the range value (0.11-0.19%) composed of any two numerical values ​​within this range (for example: 0.11%, 0.19%); different numerical values ​​of the same indicator appearing in all embodiments of the present invention can be arbitrarily combined to form a range value.

[0069] Through one or more of the above technical means, the following beneficial effects can be achieved:

[0070] The present invention provides a photoelectric glass material with high stray light elimination, a preparation method and application thereof. The photoelectric glass material with high stray light elimination provided by the present invention is a strengthened glass after chemical strengthening treatment, and the strengthened glass has excellent spectral transmittance, effective area spectral transmittance ≥ 92.00% (@500nm), efficient stray light elimination area, light absorption layer transmittance ≤ 0.2% (@500nm), excellent glass internal quality, bubble degree meets A0 level, good chemical strengthening characteristics, and chemically strengthened glass bending strength ≥ 200MPa. It can be used to prepare optical input window materials or optical lenses, and has important market prospects in the fields of high-performance cameras, space visual imaging, low-light night vision and information display systems. BRIEF DESCRIPTION OF THE DRAWINGS

[0071] The drawings constituting part of the present application are used to provide a further understanding of the present application. The illustrative embodiments and descriptions of the present application are used to explain the present application and do not constitute an improper limitation on the present application. The implementation scheme of the present application is described in detail below in conjunction with the drawings, wherein:

[0072] Figure 1 A comparison chart of the effective area transmittance (@2mm) and the absorption layer transmittance value (@500nm) of Examples 1-6 of the present invention and Comparative Examples 1-10 before and after glass reduction treatment is shown.

[0073] Figure 2 The comparison of the thickness of the light absorption layer after the glass reduction treatment of Examples 1-6 of the present invention and Comparative Examples 1-10 is shown.

[0074] Figure 3 A comparison chart of the bending strength values ​​of the glass of Examples 1-6 of the present invention and Comparative Examples 1-10 after chemical strengthening is shown. DETAILED DESCRIPTION

[0075] The present application is further described below in conjunction with specific examples. It should be understood that these examples are only used to illustrate the present application and are not intended to limit the scope of the present application. The experimental methods in the following examples without specifying specific conditions are usually carried out under conventional conditions or according to the conditions recommended by the manufacturer.

[0076] Unless otherwise defined, all professional and scientific terms used herein have the same meanings as those familiar to those skilled in the art. The reagents or raw materials used in this application can be purchased through conventional channels. Unless otherwise specified, the reagents or raw materials used in this application are used in a conventional manner in the art or in accordance with the product instructions. In addition, any method and material similar to or equivalent to the content described herein can be applied to the method of this application. The preferred implementation methods and materials described in the text are for demonstration purposes only.

[0077] The invention provides a photoelectric glass material with high stray light elimination. The glass material comprises or has the following components, measured by mass percentage: 53-65% of SiO2, 0-3% of Bi2O3, 0.1-4% of In2O3, 0.1-5% of SnO2, 12-18% of Na2O, 1-5% of K2O, 0-4% of B2O3, 10-15% of Al2O3, 0-6% of ZrO2, 0-2% of MgO, 0-2% of CaO, 0-1% of Sb2O3 and 1-2% of As2O3.

[0078] In particular, when the glass material of the present invention is composed of the above components, in some embodiments of the present invention, the glass material of the present invention has excellent spectral transmittance, effective area spectral transmittance ≥ 92.00% (@500nm), has an efficient stray light elimination area after high-temperature reduction treatment, light absorption layer transmittance ≤ 0.2% (@500nm), excellent glass internal quality, bubble degree meets A0 level, good chemical strengthening characteristics, and glass bending strength after chemical strengthening ≥ 200MPa. It can be used to prepare optical input window materials or optical lenses, and has important market prospects in the fields of high-performance cameras, space visual imaging, low-light night vision and information display systems.

[0079] Furthermore, the present invention provides a method for preparing a photoelectric glass material with high stray light elimination, comprising: mixing the raw materials, melting them at a high temperature of 1500-1600°C, stirring, clarifying, then cooling to 1320-1430°C for molding, and annealing at 480-580°C after molding to obtain a photoelectric glass blank.

[0080] The raw materials may also be selected from the following materials as needed: quartz sand, bismuth oxide (or bismuth nitrate pentahydrate), indium oxide, tin oxide, sodium carbonate (or sodium nitrate), potassium carbonate (or potassium nitrate), boron oxide (or boric acid), aluminum hydroxide (or aluminum oxide), zirconium oxide, calcium oxide (or calcium carbonate), magnesium oxide (or basic magnesium carbonate), antimony trioxide and white arsenic.

[0081] The photoelectric glass blank is mechanically processed to obtain a light-transmitting glass substrate with a certain size and shape; then the light-transmitting glass substrate is subjected to a reduction treatment to form a light absorption layer on the surface of the glass material, wherein the reduction treatment is carried out in a reducing atmosphere, the reduction treatment time is 5000-18000 min, the pressure is 0.02-0.5 MPa, and the temperature is 580-760° C. The photoelectric glass material with the absorption layer formed on the surface is subjected to a surface treatment to expose at least one light-transmitting effective area on the glass surface so that the target light can pass through, thereby obtaining the photoelectric glass material.

[0082] The purpose of the mechanical processing is mainly to accurately modify the shape, size and surface state of the glass blank to meet specific application requirements. Such operations include but are not limited to cutting and edge grinding. Appropriate processing methods can be selected according to needs. For example, the glass blank can be rounded or sliced.

[0083] The surface treatment includes but is not limited to grinding, polishing, cutting, polishing, etc., to adjust the surface state of the glass, such as flatness and smoothness, etc. A suitable treatment method can be selected according to needs. For example, a part of the light absorption layer on the surface can be polished to expose the light-transmitting effective area.

[0084] The method further includes a step of chemically strengthening the surface-treated photovoltaic glass material, wherein the temperature of the chemical strengthening is 300-500° C., the time is 200-800 min, and the salt bath used for chemical strengthening can be at least one molten salt of lithium salt, sodium salt, and potassium salt. For example, in some embodiments, the molten salt is molten potassium nitrate.

[0085] The above-mentioned preparation method of the invention has process stability, and the glass material prepared under this method can maintain its excellent performance characteristics. Specifically, within the range of process parameters described in the present invention (such as temperature, time, pressure, etc.), appropriate adjustment of these parameters will not cause significant fluctuations in glass performance, thereby ensuring the consistency and reliability of the product. It is worth noting that within the range of process parameters disclosed in the present invention, appropriately increasing the temperature can accelerate the process, thereby shortening the preparation time. However, when selecting a higher temperature for operation, those skilled in the art know that it is necessary to comprehensively consider the equipment capacity, energy consumption cost and glass quality control to ensure that the excellent performance of the product is maintained while improving production efficiency. Specifically, the embodiments and comparative examples of the present invention are carried out according to the above method, wherein the raw materials used in the embodiments and comparative examples are selected from: quartz sand, bismuth oxide, indium oxide, tin oxide, sodium carbonate, potassium carbonate, boron oxide, aluminum hydroxide, zirconium oxide, calcium oxide, magnesium oxide, antimony trioxide and white arsenic, cerium oxide, sodium chloride. Among them, the glass sample compositions of Examples 1-6 and Comparative Examples 1-10 are shown in Tables 1 and 2, respectively.

[0086] The specific preparation method of the glass of the embodiment and the comparative example includes: mixing the raw materials, melting them at a high temperature of 1500°C, stirring, clarifying, and then cooling to 1320°C for forming, and annealing them at 480°C after forming to obtain a photoelectric glass blank; and mechanically processing the photoelectric glass blank into a glass product of a certain size and shape.

[0087] Then, the glass product is subjected to a reduction treatment to form an absorption layer on the surface of the glass product. The reduction treatment is performed in a hydrogen atmosphere, the reduction treatment time is 7200 minutes, the pressure is 0.02 MPa, and the temperature is 580° C. The glass product with the absorption layer formed on the surface is subjected to a surface treatment of grinding and polishing to obtain a photovoltaic glass material having both an absorption layer and an exposed effective area. The obtained photovoltaic glass material is subjected to a chemical strengthening treatment to obtain a strengthened photovoltaic glass material. The chemical strengthening treatment uses molten potassium nitrate, the temperature is 350° C., and the time is 480 minutes.

[0088] The properties of the glass samples of Examples 1-6 and Comparative Examples 1-10 of the present invention are shown in Table 3 and Table 4.

[0089] Among them, the performance detection method is as follows:

[0090] The transmittance of the glass sample was measured using a Shimadzu UV-Vis spectrophotometer (UV-3600Plus). The test wavelength range was 350nm-1000nm, the surface of the tested glass sample was optically polished, and the test sample thickness was 2mm. (GB / T7962.12-2010).

[0091] The bending strength of the glass sample is measured using a three-point bending tester. The sample size is 3mm×4mm×40mm. The four long sides of the tested glass sample are optically polished, the long edges are chamfered, and the end surface of the test sample does not require special treatment. (GB / T 6569-2006)

[0092] The bubble density is defined as the volume per 100 cm 3 The degree of inclusions such as bubbles and stones contained in the glass, including their diameter and the total cross-sectional area of ​​all bubbles, stones and other inclusions. (GB / T 7962.8-2010)

[0093] Among them, the bubble degree A0 means the total cross-sectional area of ​​bubbles with a diameter of Φ≥0.05mm>0.03-0.10mm 2 / 100cm 2 ;

[0094] The bubble degree A means that the total cross-sectional area of ​​the bubble with diameter Φ≥0.05mm is greater than 0.1-0.25mm 2 / 100cm 2 ;

[0095] Bubble degree B means the total cross-sectional area of ​​bubbles with diameter Φ≥0.05mm>0.25-0.5mm 2 / 100cm 2 .

[0096] Table 1 Composition of glass samples of Examples 1-6

[0097]

[0098]

[0099] Table 2 Glass sample composition of comparative examples 1-10

[0100]

[0101] Table 3 Performance test results of glass samples of Examples 1-6

[0102]

[0103]

[0104] Table 4 Performance test results of glass samples of Comparative Examples 1-10

[0105]

[0106] It can be seen from the above table and the accompanying drawings that the optoelectronic glass materials of the embodiments of the present invention have an effective area spectral transmittance of ≥92.00% (@500nm), have a high-efficiency stray light elimination area after high-temperature reduction treatment, a light absorption layer transmittance of ≤0.2% (@500nm), excellent glass internal quality, a bubble degree that meets the A0 level, good chemical strengthening properties, and a glass bending strength of ≥200Mpa after chemical strengthening, and chemical strengthening has basically no effect on transmittance and bubble degree.

[0107] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. Although the present application is described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A photovoltaic glass composition with high stray light elimination, characterized in that: In terms of mass percentage, it contains the following components: 53-65% SiO2, 0-3% Bi2O3, 0.1-4% In2O3, 0.1-5% SnO2, 12-18% Na2O, 1-5% K2O, 0-4% B2O3, 10-15% Al2O3, 0-6% ZrO2, 0-2% MgO, 0-2% CaO, 0-1% Sb2O3 and 1-2% As2O3.

2. The glass composition according to claim 1, characterized in that In terms of mass percentage, the content of SiO2 is 53.5-65%, preferably 53.5-63%, more preferably 54-58%; Preferably, the content of Bi2O3 is 0 or -0.8-3%, preferably 0.8-2.5%, more preferably 0.8-1.5% by mass percentage; Preferably, the content of In2O3 is 0.1-0.4% or 0.5-4%, preferably 0.5-2%, more preferably 1-2% by mass percentage; Preferably, the content of SnO2 is 1-5%, preferably 1.5-5%, more preferably 3-5%, by mass percentage; Preferably, the content of Na2O is 13-18% by mass, preferably 14-18%, more preferably 15-18%; Preferably, the content of K2O is 1-4%, preferably 1-3%, more preferably 1-1.5%, by mass percentage; Preferably, the content of B2O3 is 0 or 1-4%, preferably 1-3%, more preferably 1.5-2% by mass percentage; Preferably, in terms of mass percentage, the content of Al2O3 is 10-14.5%, preferably 10-14%, more preferably 10-10.5%; Preferably, the content of ZrO2 is 0-2% or 1.2-6% by mass, preferably 0-1% or 1.2-2%; Preferably, the content of MgO is 0-1.5% by mass, preferably 0 or 0.6-1.5%, more preferably 0.6-1%; Preferably, the content of CaO is 0 or 1-2%, preferably 1.5-2%, by mass percentage; Preferably, the content of Sb2O3 is 0- or 0.5-1%, preferably 0.8-1% or 0.5-0.8% by mass percentage; Preferably, the content of As2O3 is -1-1.5% or 1.2-2% by mass, preferably 1-1.2%; Preferably, the sum of the contents of Bi2O3, In2O3 and SnO2 is 3.5-6.4% by mass, preferably 4.6-6.4%; Preferably, in terms of mass percentage, the content ratio of Bi2O3, In2O3 and SnO2 is 0-3:0.1-4:0.1-5, preferably 1-1.5:0.1-0.4:3-5; Preferably, the content of Bi2O3 is 0 or 0.18-2 times the sum of the contents of In2O3 and SnO2, preferably 0.18-0.5 times, in terms of mass percentage; Preferably, in terms of mass percentage, the content of Bi2O3 is 0.2-3 times, preferably 0.2-1 times, and more preferably 0.2-0.5 times the content of SnO2; Preferably, the content of Na2O is at least 3 times the content of K2O in terms of mass percentage; Preferably, the sum of the contents of Sb2O3 and As2O3 is 1-3% by mass, preferably 2-3%; Preferably, in terms of mass percentage, when the content of Sb2O3 is not 0, the content of As2O3 is at least 1 times the content of Sb2O3, preferably 1-3 times, and more preferably 1-1.5 times.

3. The glass composition according to claim 1 or 2, characterized in that: In terms of mass percentage, it contains: 53.5-65% SiO2, 0-2.5% Bi2O3, 0.1-4% In2O3, 0.1-5% SnO2, 14-18% Na2O, 1-5% K2O, 0-3.5% B2O3, 10-14.5% Al2O3, 0-6% ZrO2, 0-1.5% MgO, 0.1-2% CaO, 0-1% Sb2O3 and 1-2% As2O3; Preferably, in terms of mass percentage, it comprises: 53.5-63% SiO2, 0.8-1.5% Bi2O3, 0.4-3.5% In2O3, 1-5% SnO2, 12-18% Na2O, 1-5% K2O, 0-2% B2O3, 10-14.5% Al2O3, 0-2% ZrO2, -0.6-1.5% MgO, 1-2% CaO, 0.5-1% Sb2O3 and 1-2% As2O3; Preferably, it contains, by mass percentage: 54-58% SiO2, 1-1.5% Bi2O3, 0.1-0.4% In2O3, 3-5% SnO2, 15-18% Na2O, 1-3% K2O, 0-2% or 1.5-2% B2O3, 10-14.5% Al2O3, 0-2% ZrO2, 0.6-1% MgO, 1.5-2% CaO, 0.8-1% Sb2O3 and 1-1.2% As2O3.

4. A photoelectric glass blank, characterized in that: It is made of the glass composition according to any one of claims 1 to 3; Preferably, the preparation method comprises: mixing the raw materials, melting at a high temperature of 1500-1600°C, stirring, clarifying, then cooling to 1320-1430°C for molding, and annealing at 480-580°C after molding to obtain a photoelectric glass blank.

5. A photoelectric glass material with high stray light elimination, characterized in that, It comprises a light-transmitting glass substrate and a light-absorbing layer arranged on the surface of the light-transmitting glass substrate. Wherein, the light absorbing layer covers part of the surface of the light-transmitting base glass, and the surface of the light-transmitting base glass is divided into a low light-transmitting area and at least one light-transmitting effective area, wherein the light-transmitting effective area does not cover the light-absorbing layer, allowing the target light to pass through; the low light-transmitting area covers the light-absorbing layer to absorb or block the passage of the target light, wherein the light-transmitting base glass constitutes the optoelectronic glass composition with high stray light elimination as described in any one of claims 1 to 3, or is made of the glass blank as described in claim 4; Preferably, the light absorbing layer is obtained by reducing the light-transmitting substrate glass; Preferably, the reduction treatment is carried out in a reducing atmosphere, the time of the reduction treatment is 5000-18000 min, the pressure is 0.02-0.5 MPa, and the temperature is 580-760°C.

6. The optoelectronic glass material with high stray light elimination according to claim 5, characterized in that: The spectral transmittance of the effective light transmission area to 500nm light is ≥92.00%; Preferably, the spectral transmittance of the light absorbing layer to 500nm light is ≤0.2%; Preferably, the bubble degree of the photovoltaic glass material with high stray light elimination meets the A0 level; Preferably, the photoelectric glass material with high stray light elimination has a bending strength of ≥200MPa after chemical strengthening; Preferably, the temperature of the chemical strengthening is 300-500° C., the time is 200-800 min, and the salt bath used for chemical strengthening is at least one molten salt selected from lithium salt, sodium salt and potassium salt.

7. A method for preparing the optoelectronic glass material with high stray light elimination as claimed in any one of claims 5 to 6, characterized in that: It includes: Using the optoelectronic glass composition according to any one of claims 1 to 3 to prepare an optoelectronic glass blank or directly using the optoelectronic glass blank according to claim 4; The method for preparing the photoelectric glass blank comprises: mixing the raw materials, melting at a high temperature of 1500-1600°C, stirring, clarifying, cooling to 1320-1430°C for forming, and annealing at 480-580°C after forming to obtain the photoelectric glass blank; Mechanically processing the photoelectric glass blank to obtain a light-transmitting glass substrate, and then performing a reduction treatment to form a light-absorbing layer on the surface of the glass material; The glass material with the absorption layer formed on the surface is subjected to surface treatment so that the glass surface has at least one effective light-transmitting area, thereby obtaining a photoelectric glass material; Alternatively, the photovoltaic glass material is subjected to chemical strengthening treatment to obtain a strengthened photovoltaic glass material; Preferably, the reduction treatment is carried out in a reducing atmosphere, the reduction treatment time is 5000-18000 min, the pressure is 0.02-0.5 MPa, and the temperature is 580-760° C.; Preferably, the temperature of the chemical strengthening is 300-500° C., the time is 200-800 min, and the salt bath used for chemical strengthening is one or more molten salts of lithium salt, sodium salt and potassium salt.

8. An optical element, characterized in that: Made of the glass composition according to any one of claims 1 to 3 or the glass blank according to claim 4, or comprising the photovoltaic glass material with high stray light elimination according to claim 5 or 6; Preferably, the optical element is an optical input window material or an optical lens.

9. Use of the glass composition according to claims 1 to 3, or the glass blank according to claim 4, or the optoelectronic glass material with high stray light elimination according to claim 5 or 6 in the optical field or intelligent technology application field.

10. The use according to claim 9, characterized in that: The application areas of the intelligent technology include high-performance cameras, space visual imaging, low-light night vision and information display systems.

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