Mask structure capable of improving yield and reducing scratch occurrence rate

Abstract

The invention discloses a mask structure capable of improving yield and reducing scratch occurrence rate, and belongs to the technical field of mask structures, the height H of an 8-shaped supporting layer is 5-20 microns, the 8-shaped supporting layer is higher than an opening part of a mask sheet, a seam filling piece is of a capsule structure, the seam filling piece is filled with a repairing agent, a material receiving groove is formed in the outer ring of the 8-shaped supporting layer in a surrounding mode, and the material receiving groove is communicated with the opening part of the mask sheet. The material receiving groove is used for receiving overflowing materials of the seam repairing piece, the four edges of each opening part of the mask sheet are prevented from making contact with the surface of the substrate film layer, the area where the supporting layer is located is a non-film-coating area and is a certain distance away from the film layer, and each opening part is provided with four supporting columns so that it can be guaranteed that the periphery of each opening can not be concaved or protruded; the design of the '8'-shaped structure can reduce the contact area with the substrate without influencing the supporting effect and shadow influence, so that the four edges of the opening of the mask plate are not in contact with the film layer area, the scratch rate of the four edges of the opening of the mask plate to the film layer is reduced, and the occurrence rate that the substrate is polluted by the mask plate is also greatly reduced.

Description

Technical Field

[0001] The invention relates to a mask structure for improving yield and reducing scratch incidence, belonging to the technical field of mask structures. Background Art

[0002] For example, the mask plate structure disclosed in application number: CN107904553A provides a plurality of mask plates that are all arranged on a frame, a plurality of first embedding grooves are opened on the upper side of the mask plate, and a display area is formed in the area adjacent to the first embedding grooves on each mask plate; the mask plate structure also includes an upper support bar, both ends of the upper support bar are connected to the frame, and a plurality of second embedding grooves are opened on the lower side of the upper support bar, the first embedding grooves correspond to the second embedding grooves, so that the first embedding grooves and the second embedding grooves are embedded in each other, and the upper side of the upper support bar is flush with the upper side of the mask plate.

[0003] The above-mentioned mask plate structure is provided with a plurality of first embedding grooves on the upper side of the mask plate, and an upper support bar is provided, and a plurality of second embedding grooves are provided on the lower side of the upper support bar. When the second embedding grooves of the lower support bar are correspondingly embedded in the first embedding grooves of the mask plate, the wrinkles on the mask plate can be flattened to a certain extent, thereby reducing the wrinkles on the mask plate and improving product quality.

[0004] In the sputtering process used in the silicon-based OLED (OLEDoS) microdisplay industry, metal materials are formed into high-energy particles through sputtering. The high-energy particles are deposited on the substrate through a metal pattern mask to form a metal film layer. Since the distance between the pattern mask and the substrate is very close, the edge of the metal mask is easily scratched during the alignment and film formation process, resulting in poor film formation.

[0005] The structure in the prior art cannot adjust the height during use, resulting in low adaptability and irreparable scratches, which will lead to a shorter life of the equipment, and the repair agent cannot prevent overflow. Therefore, a mask structure that improves the yield and reduces the incidence of scratches is needed to improve the above-mentioned deficiencies. Summary of the invention

[0006] The main purpose of the present invention is to provide a mask structure that improves yield and reduces scratch incidence.

[0007] The purpose of the present invention can be achieved by adopting the following technical solutions:

[0008] A mask structure for improving yield and reducing scratch incidence, comprising a mask frame, a mask sheet and an 8-shaped support layer;

[0009] One side of the mask plate frame is covered with a mask sheet, a mask sheet opening is distributed on the mask sheet, and an 8-shaped support layer is distributed at the four corners of the mask sheet opening;

[0010] The 8-shaped support layer is composed of a lower mask piece and an upper mask piece, the lower mask piece is provided with a snap-fitting splicing plate, and the upper mask piece is provided with snap-fitting pieces;

[0011] The snap-fitting splicing plate and the snap-fitting piece are snap-fitted and connected to each other;

[0012] Seam-filling pieces are distributed on the outer surface of the font support layer.

[0013] Preferably, the mask frame is provided with connection positioning holes and connection holes;

[0014] The four corners of the mask frame are provided with connection positioning holes, and the middle of the mask frame is provided with a connection hole.

[0015] Preferably, a connecting post is installed on one side of the mask sheet, and the connecting post is inserted into the connecting hole and rotated to be fixedly connected.

[0016] Preferably, the mask sheet is formed into a uniformly distributed 8-type resin support network structure by photolithography.

[0017] Preferably, the mask sheet includes a single or multiple opening portions and shielding portions.

[0018] Preferably, the opening portion of the mask sheet is sputtered onto the silicon-based substrate of the silicon-based display panel to form a sputtered layer.

[0019] Preferably, the height H of the 8-shaped support layer is between 5-20 um, and the 8-shaped support layer is higher than the opening of the mask sheet.

[0020] Preferably, the seam-seaming patch is a capsule structure, and is filled with a repairing agent.

[0021] Preferably, a material receiving groove is installed around the outer ring of the 8-shaped support layer, and the material receiving groove is used to receive the overflow of the seam-seaming piece.

[0022] Beneficial technical effects of the present invention:

[0023] The present invention provides a mask structure for improving yield and reducing scratch incidence. When a substrate is attached to a mask assembly for sputtering film formation, the substrate and the mask support mesh structure are in contact with an 8-shaped support layer to prevent the four sides of each opening portion of the mask from contacting the film layer of the substrate. The area where the support layer is located is a non-film-coating area and is at a certain distance from the film layer, which will not affect the film coating. The entire support mesh structure is evenly distributed in an array, and each opening portion has four support columns to ensure that there will be no problems such as concave protrusions around the opening. The design of the "8"-shaped structure does not affect the support effect and the shadow effect. At the same time, the contact area with the substrate can be reduced, so that the four sides of the mask plate opening do not contact the film layer area, the scratch rate of the four sides of the mask plate opening on the film layer is reduced, and the incidence rate of the substrate being contaminated by the mask plate is greatly reduced. The 8-shaped support layer is a splicing structure. The 8-shaped support layer is spliced ​​and connected by the lower mask piece and the upper mask piece. A clamping splicing plate is installed around one side of the lower mask piece. Clamping pieces are distributed at the connection between the upper mask piece and the lower mask piece. The clamping piece and the lower mask piece are spliced ​​and connected. Seam filling pieces are distributed on the outside of the 8-shaped support layer, and a material receiving groove is opened around the outer circle of the 8-shaped support layer.

[0024] The seam-filling piece is a capsule structure filled with polymer materials. When tiny scratches appear on the surface of the 8-shaped support layer, the microcapsules rupture to release the repair agent, which can automatically fill the scratches and repair the damage under certain conditions (such as heating, light, etc.), so that the mask can continue to maintain good anti-scratch performance, extend its service life, and improve the overall production yield;

[0025] The outer ring receiving groove of the 8-shaped support layer is an inward-recessed structure, which effectively prevents the problem of filling material flowing out;

[0026] The lower mask piece and the upper mask piece on the 8-shaped support layer are inserted into the snap-fitting splicing plate through the snap-fitting pieces for positioning and connection. The height of the 8-shaped support layer can be increased by splicing to achieve a height-adjustable function. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a schematic diagram of the overall three-dimensional structure of a device according to a preferred embodiment of a mask structure for improving yield and reducing scratch incidence of the present invention;

[0028] Figure 2 A top view of a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention;

[0029] Figure 3 A side view of a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention;

[0030] Figure 4 A schematic diagram of the back side of a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention;

[0031] Figure 5 A schematic diagram of the surface structure of 220 of a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention;

[0032] Figure 6 A schematic diagram of the joint structure of 220 of a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention;

[0033] Figure 7 A schematic diagram of a card block structure of a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention;

[0034] Figure 8 The figure is a schematic diagram of the structure of a splicing method according to a preferred embodiment of a mask structure for improving yield and reducing scratch incidence according to the present invention.

[0035] In the figure: 100, mask plate frame; 200, mask sheet; 210 mask sheet opening; 220, 8-shaped support layer; 300, connection positioning hole; 310, connection hole; 320, connection column; 230, material receiving groove; 240, filling piece; 250, lower mask piece; 260, snap-fitting splicing plate; 270, snap-fitting piece; 280, upper mask piece. DETAILED DESCRIPTION

[0036] In order to make the technical solution of the present invention more clear and specific to those skilled in the art, the present invention is further described in detail below in conjunction with embodiments and drawings, but the implementation manner of the present invention is not limited thereto.

[0037] like Figure 1 - Figure 4 As shown, the present embodiment provides a mask structure for improving yield and reducing scratch incidence, comprising a mask plate frame 100, a mask sheet 200 and an 8-shaped support layer 220;

[0038] One side of the mask plate frame 100 is covered with a mask sheet 200 , and a mask sheet opening 210 is distributed on the mask sheet 200 , and an 8-shaped support layer 220 is distributed at the four corners of the mask sheet opening 210 ;

[0039] The 8-shaped support layer 220 is composed of a lower mask piece 250 and an upper mask piece 280. The lower mask piece 250 is provided with a snap-fitting splicing plate 260, and the upper mask piece 280 is provided with snap-fitting pieces 270.

[0040] The snap-fitting splicing plate 260 and the snap-fitting member 270 are snap-fitted and connected to each other;

[0041] Seam-sealing members 240 are distributed on the outer surface of the 8-shaped supporting layer 220 .

[0042] The mask frame 100 is provided with a connection positioning hole 300 and a connection hole 310;

[0043] The four corners of the mask frame 100 are provided with connection positioning holes 300 , and the middle of the mask frame 100 is provided with a connection hole 310 .

[0044] A connection post 320 is installed on one side of the mask sheet 200 , and the connection post 320 is inserted into the connection hole 310 to be rotated and fixedly connected.

[0045] The mask sheet 200 is formed into an evenly distributed 8-type resin support network structure by photolithography.

[0046] The mask sheet 200 includes a single or multiple opening portions and shielding portions.

[0047] The mask opening 210 is for forming a sputtered layer on the silicon-based substrate of the silicon-based display panel by sputtering.

[0048] The height H of the 8-shaped support layer 220 is between 5 μm and 20 μm, and the 8-shaped support layer 220 is higher than the mask opening 210 .

[0049] The seam-seaming member 240 is a capsule structure, and the seam-seaming member 240 is filled with a repairing agent.

[0050] A material receiving groove 230 is installed around the outer circle of the 8-shaped supporting layer 220, and the material receiving groove 230 is used to receive the overflow of the seam-sealing member 240.

[0051] like Figure 1 - Figure 4 As shown, the working process of a mask structure for improving yield and reducing scratch incidence provided by this embodiment is as follows:

[0052] Step 1: Use 420 stainless steel SUS420 to make a mask frame 100 according to the size of the sputtering process substrate;

[0053] Step 2: Use a coating machine to spin-coat a layer of photoresist with a thickness of 15um on the unopened mask sheet original material 200

[0054] Step 3: photolithography an “8”-shaped pattern 220 on the photoresist layer of the mask through exposure and development;

[0055] Step 4: etching a corresponding opening pattern on the mask sheet by an etching method to form a processed mask sheet 200;

[0056] Step 5: The mask sheet with the "8" pattern is stretched onto the mask frame by high-precision stretching technology to obtain a mask assembly;

[0057] Step 6: The patching member 240 is a capsule structure filled with polymer material. When a tiny scratch appears on the surface of the 8-shaped support layer 220, the microcapsule ruptures to release a repair agent, which can automatically fill the scratch and repair the damage under certain conditions such as heating and light, so that the mask can continue to maintain good anti-scratch performance, extend its service life, and improve the overall production yield;

[0058] Step 7: The outer ring receiving groove 230 of the 8-shaped support layer 220 is an inward-recessed structure, which effectively prevents the filling material from flowing out;

[0059] Step eight: The lower mask piece 250 and the upper mask piece 280 on the 8-shaped support layer 220 are placed into the snap-fitting splicing plate 260 for positioning and connection via the snap-fitting piece 270. The height of the 8-shaped support layer 220 can be increased by splicing to achieve a height-adjustable function.

[0060] Example

[0061] like Figure 1 - Figure 4 As shown, the mask plate frame 100 is penetrated with a connection positioning hole 300 and a connection hole 310, a connection column 320 is installed on one side of the mask sheet 200, and the connection column 320 is inserted into the connection hole 310 and fixedly connected by threads, the mask sheet 200 is distributed with a mask sheet opening 210, and 8-shaped support layers 220 are distributed at the four corners of the mask 201;

[0062] A mask frame 100 is made of stainless steel according to the size of the sputtering process substrate;

[0063] Use a coating machine to spin-coat a layer of photoresist with a thickness of 15um on the unopened mask sheet original material 200

[0064] An "8"-shaped pattern 220 is photolithographically formed on the photoresist layer of the mask by exposure and development;

[0065] A corresponding opening pattern is etched on the mask sheet by an etching method to form a processed mask sheet 200;

[0066] The mask sheet with the "8" pattern is stretched onto the mask frame by high-precision stretching technology to obtain a mask assembly;

[0067] When the substrate is attached to the mask assembly for sputtering film formation, the substrate and the mask support mesh structure are in contact with the 8-shaped support layer 220 to prevent the four sides of each opening portion of the mask sheet 200 from contacting the film layer of the substrate, and the area where the support layer is located is a non-film-coating area and is at a certain distance from the film layer, which will not affect the film coating. The entire support mesh structure is evenly distributed in an array, and each opening portion has four support columns to ensure that there will be no problems such as concave protrusions around the opening. The design of the "8"-shaped structure can reduce the contact area with the substrate without affecting the support effect and shadow effect, so that the four sides of the mask opening do not contact the film layer area, reduce the scratch rate of the four sides of the mask opening on the film layer, and greatly reduce the incidence of substrate contamination by the mask;

[0068] The 8-shaped support layer 220 is a splicing structure. The 8-shaped support layer 220 is spliced ​​and connected by a lower mask piece 250 and an upper mask piece 280. A snap-fit ​​splicing plate 260 is installed around one side of the lower mask piece 250. A snap-fit ​​piece 270 is distributed at the connection between the upper mask piece 280 and the lower mask piece 250. The snap-fit ​​piece 270 and the lower mask piece 250 are snap-fitted and spliced. A seam-filling piece 240 is distributed on the outside of the 8-shaped support layer 220. A material receiving groove 230 is opened around the outer circle of the 8-shaped support layer 220.

[0069] The patching member 240 is a capsule structure filled with polymer material. When a micro-scratch appears on the surface of the 8-shaped support layer 220, the micro-capsule ruptures to release a repair agent, which can automatically fill the scratch and repair the damage under certain conditions such as heating and light, so that the mask can continue to maintain good anti-scratch performance, extend its service life, and improve the overall production yield;

[0070] The outer ring receiving groove 230 of the 8-shaped support layer 220 is an inward-recessed structure, which effectively prevents the problem of outflow of the filling material;

[0071] The lower mask piece 250 and the upper mask piece 280 on the 8-shaped support layer 220 are inserted into the snap-fitting splicing plate 260 for positioning and connection via the snap-fitting piece 270. The height of the 8-shaped support layer 220 can be increased by splicing to achieve a height-adjustable function.

[0072] The above description is only a further embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical solutions and concepts of the present invention within the scope disclosed by the present invention, which belong to the protection scope of the present invention.

Claims

1. A mask structure for improving yield and reducing scratch incidence, characterized in that: It comprises a mask plate frame (100), a mask sheet (200) and an 8-shaped support layer (220); One side of the mask plate frame (100) is covered with a mask sheet (200), a mask sheet opening (210) is distributed on the mask sheet (200), and 8-shaped support layers (220) are distributed at the four corners of the mask sheet opening (210); The 8-shaped support layer (220) is composed of a lower mask piece (250) and an upper mask piece (280); a snap-fitting splicing plate (260) is installed on the lower mask piece (250), and snap-fitting pieces (270) are distributed on the upper mask piece (280); The snap-fitting splicing plate (260) and the snap-fitting member (270) are snap-fitted and connected to each other; Seam-filling members (240) are distributed on the outer surface of the 8-shaped support layer (220).

2. A mask structure for improving yield and reducing scratch incidence according to claim 1, characterized in that: A connection positioning hole (300) and a connection hole (310) are provided on the mask frame (100); The four corners of the mask frame (100) are provided with connection positioning holes (300), and the middle of the mask frame (100) is provided with a connection hole (310).

3. The mask structure for improving yield and reducing scratch incidence according to claim 2, characterized in that: A connecting post (320) is installed on one side of the mask sheet (200), and the connecting post (320) is inserted into the connecting hole (310) for rotation and fixed connection.

4. The mask structure for improving yield and reducing scratch incidence according to claim 3, characterized in that: The mask sheet (200) is formed into an evenly distributed 8-type resin support network structure by photolithography.

5. The mask structure for improving yield and reducing scratch incidence according to claim 4, characterized in that: The mask sheet (200) comprises a single or multiple opening portions and a shielding portion.

6. The mask structure for improving yield and reducing scratch incidence according to claim 5, characterized in that: The mask sheet opening (210) is used to form a sputtered layer on a silicon-based substrate of a silicon-based display panel by sputtering.

7. The mask structure for improving yield and reducing scratch incidence according to claim 6, characterized in that: The height H of the 8-shaped support layer (220) is between 5 and 20 μm, and the 8-shaped support layer (220) is higher than the mask opening (210).

8. The mask structure for improving yield and reducing scratch incidence according to claim 1, characterized in that: The seam repairing piece (240) is a capsule structure, and a repairing agent is filled in the seam repairing piece (240).

9. The mask structure for improving yield and reducing scratch incidence according to claim 1, characterized in that: A material receiving groove (230) is installed around the outer ring of the 8-shaped support layer (220), and the material receiving groove (230) is used to receive the overflow of the seam repairing member (240).

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