Magnetron sputtering device for preparing coating on inner surface of air cylinder

Abstract

The invention provides a magnetron sputtering device for preparing a coating on the inner surface of a cylinder. The magnetron sputtering device comprises a mounting bracket; a first connecting part is arranged on one side, located on the driving shaft, of the rotary driving part and used for connecting the rotary driving part with one end of the air cylinder; the target material is of a cylindrical hollow structure, and one end of the target material is connected with a driving shaft of the rotary driving part; the two ends of the target material are connected with a liquid inlet pipe and a liquid outlet pipe respectively, and cooling liquid is arranged in the target material; the magnet is cylindrical and is arranged in the target material, and one end of the magnet is connected with a driving shaft of the rotary driving part; the magnet is soaked in the cooling liquid; the chamber is provided with a second connecting part and is used for connecting the chamber with the other end of the air cylinder; the cavity is connected with a vacuumizing device and an air supply device, and a through hole for vacuumizing or supplying air to the interior of the air cylinder is formed in the cavity; and the power supply is connected with the target and the cylinder. The magnetron sputtering device can perform uniform magnetron sputtering on the inner surface of the air cylinder, deposit a nano coating and improve the film coating effect, and can be suitable for film coating of the air cylinder with a large length-diameter ratio.

Description

Technical Field

[0001] The invention belongs to the technical field of nano coating preparation, and in particular relates to a magnetron sputtering device for preparing coating on the inner surface of a cylinder. Background Art

[0002] Liquid-driven piston hydrogen compressors are the core equipment of hydrogen refueling stations. Currently, liquid-driven piston hydrogen compressors generally have shortcomings such as short maintenance cycle, high maintenance and replacement costs, and large hydrogen leakage. The main reason is that oil cannot be used to lubricate the piston and the inner wall of the cylinder. The reciprocating motion of the piston under high temperature and high pressure can easily damage the inner surface of the cylinder, causing the cylinder to fail and be replaced.

[0003] In order to improve the hardness and wear resistance of the cylinder of the liquid-driven piston hydrogen compressor, the inner surface is usually nitrided after forging finishing, so that the depth of the nitrided layer is 0.5~0.6mm and the hardness is HV900-1100. Nitriding treatment is a technology that changes the chemical composition and structure of the workpiece surface to obtain excellent surface properties. Depending on the nitriding method and conditions, the friction coefficient after nitriding may be different. For example, in a vacuum environment, the formation of a nitriding layer can significantly reduce the friction coefficient and wear volume of the material, thereby effectively reducing friction and resisting wear. However, under atmospheric conditions, the formation of a nitriding layer will instead lead to a significant increase in the friction coefficient and wear resistance of the material. Therefore, the friction coefficient may increase after nitriding treatment, reducing the service life of the cylinder piston.

[0004] Preparing a nano coating with high hardness and high wear resistance on the inner surface of the cylinder can improve the self-lubricating performance of the inner surface of the cylinder and reduce the friction coefficient. Magnetron sputtering technology is a physical vapor deposition technology that uses a magnetic field to enhance the sputtering rate and deposition rate, and is an effective method for preparing nanolayers. A magnetron sputtering device is usually composed of a vacuum chamber, a target material, a magnet, a power supply, a vacuum system, a cooling system, etc. The existing magnetron sputtering devices usually use a planar target material for sputtering. For example, a Chinese patent document with publication number CN107779836B discloses a magnetron sputtering device and a method for adjusting the magnetic field distribution thereof. The magnetron sputtering device includes: a sputtering chamber and a planar target material arranged in the sputtering chamber, three sets of electromagnetic coils, a drive unit, and a connecting line. The sputtering effect of the flat target material can meet the requirements of general workpieces, but for the inner wall of the cylinder, this type of target material can only sputter on both ends of the cylinder. The sputtering amount for the middle part of the inner wall of the cylinder is insufficient, and the sputtering effect of the entire cylinder is uneven, especially for the thinner cylinder with a larger length-to-diameter ratio, the sputtering effect is extremely poor.

[0005] Therefore, it is necessary to provide a magnetron sputtering device that can prepare a nano coating on the inner surface of a cylinder by magnetron sputtering, which is particularly suitable for a cylinder with a large aspect ratio. Summary of the invention

[0006] The technical problem solved by the present invention is to provide a magnetron sputtering device for preparing cylinder inner surface coating, which can perform uniform magnetron sputtering on the inner surface of the cylinder to deposit nano coating, improve the coating effect, and is suitable for coating cylinders with large aspect ratios.

[0007] In order to solve the above problems, the present invention provides a magnetron sputtering device for preparing a coating on the inner surface of a cylinder, comprising: Mounting bracket; A rotary drive unit is disposed on the mounting bracket; a first connecting portion is disposed on one side of the rotary drive unit located on the driving shaft, and the first connecting portion is used to connect the rotary drive unit to one end of the cylinder; A target material, wherein the target material is a cylindrical hollow structure; one end of the target material is connected to the driving shaft of the rotating driving unit; both ends of the target material are respectively connected to a liquid inlet pipe and a liquid outlet pipe, and a coolant is provided inside the target material; A magnet, the magnet is cylindrical and is disposed in the target material, one end of the magnet is connected to the driving shaft of the rotating driving unit; the magnet is immersed in the cooling liquid inside the target material; A chamber, wherein the chamber is provided with a second connecting portion, and the second connecting portion is used to connect the chamber with the other end of the cylinder; the chamber is connected with a vacuum pumping device and an air supply device, and the chamber is provided with a through hole, which is used to vacuum or supply air to the inside of the cylinder through the through hole; A power source, wherein two poles of the power source are respectively connected to the target material and the cylinder.

[0008] Preferably, the magnetron sputtering device further comprises a liner tube, which is arranged between the target material and the magnet; the liquid inlet pipe and the liquid outlet pipe are respectively connected to two ends of the liner tube, and the coolant is arranged inside the liner tube.

[0009] Preferably, the liquid inlet pipe is connected to the bottom end of the liner; and the liquid outlet pipe is connected to the top end of the liner.

[0010] Preferably, the magnet is composed of a plurality of cylindrical sub-magnets; the plurality of sub-magnets are connected end to end in sequence through magnetic adsorption.

[0011] Preferably, the magnetron sputtering device further comprises: The longitudinal moving mechanism is arranged on the mounting bracket, the rotary driving part is arranged at the moving end of the longitudinal moving mechanism, and the longitudinal moving mechanism is used to drive the rotary driving part to move up and down.

[0012] Preferably, the first connecting portion includes a first flange, a first annular groove and a first sealing ring; the first flange is arranged on the rotary drive portion, the first annular groove is arranged on the end surface of the first flange, and the first sealing ring is arranged in the first annular groove.

[0013] Preferably, the second connecting portion includes an annular fixing seat and a second sealing ring; the annular fixing seat is detachably connected to the outer wall of the chamber by a fastener, the second sealing ring is arranged between the outer wall of the chamber and the annular fixing seat, and the middle of the annular fixing seat is suitable for fixing the end of the cylinder.

[0014] Preferably, the magnetron sputtering device further comprises a connecting shaft, which is detachably arranged between the rotary drive part and the cylinder; the first connecting part is arranged between the rotary drive part and the connecting shaft; and a third sealing ring is also arranged between the connecting shaft and the cylinder.

[0015] Preferably, a target material fixing bracket is provided in the chamber, a conical groove is provided on the target material fixing bracket, and an end of the target material can be rotatably disposed in the conical groove.

[0016] Preferably, the magnetron sputtering device also includes a support seat; the chamber is disposed in the support seat, the top open end of the chamber is connected to the support seat, the end of the cylinder is located above the support seat, and the second connecting portion is used to connect the cylinder and the support seat.

[0017] Compared with the prior art, the present invention has the following beneficial effects: The magnetron sputtering device of the present invention: 1. A cylindrical hollow target is used, and the hollow target is inserted into the cylinder to be processed for sputtering. Compared with the sputtering of the flat target set at both ends of the cylinder, the uniform deposition of the coating on the inner surface of the cylinder can be achieved, and the uniform deposition of the nano coating at all places on the inner surface of the cylinder is ensured. 2. The two ends of the cylinder to be processed are directly connected to the rotating drive unit and the chamber to form a closed space, and the interior of the cylinder is directly used as a vacuum chamber. Compared with the existing magnetron sputtering device, there is no need to set a vacuum chamber outside the workpiece to be processed, which greatly saves space and improves the convenience of cylinder installation and disassembly. 3. The magnet is directly immersed in the coolant inside the target, and there is no need to set a cooling pipe inside the cylinder, inside the target, and outside the magnet, which greatly saves space. In the magnetron sputtering device of the present invention, a hollow target with a thinner tube diameter can be used, so it is suitable for coating the inner wall of a tube with a large aspect ratio, and is suitable for a cylinder with an inner wall radius of 15 mm at the minimum. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a cross-sectional view of a target material and a workpiece in a magnetron sputtering device for preparing a coating on the inner surface of a cylinder according to an embodiment of the present invention; Figure 2 It is a schematic structural diagram of a magnetron sputtering device for preparing a coating on the inner surface of a cylinder according to an embodiment of the present invention; Figure 3It is a schematic structural diagram of an annular fixing seat in a magnetron sputtering device for preparing a coating on the inner surface of a cylinder according to an embodiment of the present invention; Figure 4 It is a schematic structural diagram of a target material fixing bracket in a magnetron sputtering device for preparing a cylinder inner surface coating according to an embodiment of the present invention.

[0019] Among them: 1-installing bracket; 2-rotating drive part; 3-first connecting part; 31-first flange; 4-cylinder; 5-target material; 6-magnet; 61-sub-magnet; 7-chamber; 8-second connecting part; 81-annular fixing seat; 82-second sealing ring; 9-liner; 11-liquid outlet pipe; 12-longitudinal moving mechanism; 13-connecting shaft; 14-target fixing bracket; 15-support seat. DETAILED DESCRIPTION

[0020] The following will be combined with the embodiments of the present invention to clearly and completely describe the technical solution of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0021] Example 1

[0022] like Figure 1 , Figure 2 As shown, a magnetron sputtering device for preparing a coating on the inner surface of a cylinder in this embodiment includes: Mounting bracket 1; The rotary drive unit 2 is disposed on the mounting bracket 1; a first connecting portion 3 is disposed on one side of the rotary drive unit 2 located on the driving shaft, and the first connecting portion 3 is used to connect the rotary drive unit 2 with one end of the cylinder 4; The target material 5 is a cylindrical hollow structure; one end of the target material 5 is connected to the driving shaft of the rotating driving part 2; the two ends of the target material 5 are respectively connected to a liquid inlet pipe and a liquid outlet pipe, and a coolant is provided inside the target material 5; The magnet 6 is cylindrical and is disposed in the target material 5. One end of the magnet 6 is connected to the driving shaft of the rotating driving unit 2. The magnet 6 is immersed in the cooling liquid inside the target material 5. The chamber 7 is provided with a second connecting portion 8, and the second connecting portion 8 is used to connect the chamber 7 with the other end of the cylinder 4; the chamber 7 is connected with a vacuum pumping device and an air supply device, and the chamber 7 is provided with a through hole, which is used to vacuum or supply air to the inside of the cylinder 4 through the through hole; A power supply, wherein two poles of the power supply are respectively connected to the target material and the cylinder.

[0023] The magnetron sputtering device for preparing the coating on the inner surface of the cylinder of the embodiment of the present invention, when the coating is prepared by magnetron sputtering on the inner surface of the cylinder, the cylinder to be processed is inserted outside the cylindrical hollow target material 5, and the two ends are respectively connected to the rotating drive part and the chamber through the first connecting part and the second connecting part, so that the rotating drive part, the cylinder, and the chamber form a closed space. Before magnetron sputtering, during the vacuum treatment, the vacuum device realizes the vacuuming of the inside of the cylinder to be processed through the chamber. During magnetron sputtering, the gas can be fed into the cylinder through the chamber through the gas supply device. During magnetron sputtering, the rotating drive part drives the target material and the magnet to rotate, and the target material and the cylinder to be processed are energized. The gas ions evenly bombard the target material under the action of the high pressure drop, sputtering the target material particles and evenly depositing them on the inner surface of the cylinder to form a nano film. At the same time, the coolant cools the target material and the magnet workpiece to prevent overheating.

[0024] The magnetron sputtering device of the embodiment of the present invention: 1. A cylindrical hollow target is used, and the hollow target is inserted into the cylinder to be processed for sputtering. Compared with the sputtering of the flat target set at both ends of the cylinder, the uniform deposition of the coating on the inner surface of the cylinder can be achieved, and the uniform deposition of the nano coating at all places on the inner surface of the cylinder can be ensured. 2. The two ends of the cylinder to be processed are directly connected to the rotating drive unit and the chamber to form a closed space, and the interior of the cylinder is directly used as a vacuum chamber. Compared with the existing magnetron sputtering device, there is no need to set a vacuum chamber outside the workpiece to be processed, which greatly saves space and improves the convenience of cylinder installation and disassembly. 3. The magnet is directly immersed in the coolant inside the target, and there is no need to set a cooling pipe inside the cylinder, inside the target, and outside the magnet, which greatly saves space. In the magnetron sputtering device of the present invention, a hollow target with a thinner tube diameter can be used, so it is suitable for inner wall coating with a large aspect ratio, and is suitable for cylinders with an inner wall radius of 15 mm at the minimum.

[0025] The rotary drive mechanism may adopt a motor, and the output shaft of the motor is connected with the magnet and the target material.

[0026] In some embodiments, the magnetron sputtering device further includes a liner 9, which is disposed between the target material 5 and the magnet 6; the liquid inlet pipe and the liquid outlet pipe are respectively connected to both ends of the liner 9, and the coolant is disposed inside the liner 9. The liner can protect and support the target material.

[0027] In some embodiments, the liquid inlet pipe 10 is connected to the bottom end of the liner 9; the liquid outlet pipe 11 is connected to the top end of the liner 9. The cooling liquid enters the liner from the bottom end, and the cooling effect is higher.

[0028] In some embodiments, the magnet 6 is composed of a plurality of cylindrical sub-magnets 61; the plurality of sub-magnets 61 are connected end to end in sequence by magnetic attraction. The length of the target material and the number of magnets can be adjusted according to the length of the cylinder to be deposited, so as to be suitable for coating cylinders of different lengths.

[0029] In some embodiments, the magnetron sputtering device further comprises: The longitudinal moving mechanism 12 is arranged on the mounting bracket 1, and the rotary drive unit 2 is arranged at the moving end of the longitudinal moving mechanism 12. The longitudinal moving mechanism 12 is used to drive the rotary drive unit to move up and down. The bottom of the rotary drive unit can be adjusted by adjusting the moving end of the longitudinal moving mechanism 12 to adapt to cylinders of different lengths to be processed. First, the moving end of the longitudinal moving mechanism is moved up, and after the cylinder is placed at the corresponding position of the chamber, the moving end is adjusted to move down, so that the first connection part on the rotary drive unit presses the cylinder against the second connection part of the chamber, and the two ends of the cylinder are pressed together by the first connection part and the second connection part, so that the cylinder, the rotary drive unit, and the chamber form a closed space.

[0030] Specifically, the longitudinal movement mechanism may be implemented by a longitudinal movement motor, or by a lead screw nut pair combined with a guide rail.

[0031] In some embodiments, the first connection part 3 includes a first flange 31, a first annular groove and a first sealing ring; the first flange 31 is provided on the rotary drive part 2, the first annular groove is provided on the end surface of the first flange 31, and the first sealing ring is provided in the first annular groove. The first sealing ring is squeezed by the longitudinal moving motor to tighten the cylinder, thereby achieving sealing between the rotary drive motor housing and the cylinder.

[0032] like Figure 3 As shown, in some embodiments, the second connection part 8 includes an annular fixing seat 81 and a second sealing ring 82; the annular fixing seat 81 is detachably connected to the outer wall of the chamber 7 by a fastener, and the second sealing ring 82 is arranged between the outer wall of the chamber 7 and the annular fixing seat 81, and the middle of the annular fixing seat 81 is suitable for fixing the end of the cylinder. The end position of the cylinder is fixed by the annular fixing seat, and then the cylinder is pressed against the outer wall of the chamber by the longitudinal moving motor, and the sealing between the cylinder and the chamber is ensured by the action of the sealing ring.

[0033] In some embodiments, the magnetron sputtering device further includes a connecting shaft 13, which is detachably disposed between the rotary drive unit 2 and the cylinder; the first connecting unit 3 is disposed between the rotary drive unit 2 and the connecting shaft 13; and a third sealing ring is also disposed between the connecting shaft 13 and the cylinder. The connecting shaft can extend the length of the cylinder and expand the applicable scope of the device. A detachable connecting shaft is further provided. When the cylinder length is sufficient, there is no need to add a connecting shaft. When the cylinder length is too small, a connecting shaft can be added to extend the length of the cylinder to ensure the tightening effect of both ends on the cylinder and improve the sealing performance.

[0034] like Figure 4As shown, in some embodiments, a target material fixing bracket is provided in the chamber 7, and a conical groove is provided on the target material fixing bracket 14, and the end of the target material 5 can be rotatably arranged in the conical groove. The target material fixing bracket can fix the end of the target material so that it rotates around a stable rotation axis during rotation without deviation.

[0035] In some embodiments, the magnetron sputtering device further includes a support seat 15; the chamber 7 is disposed in the support seat 15, the top open end of the chamber 7 is connected to the support seat 15, the end of the cylinder is located above the support seat 15, and the second connecting portion is used to connect the cylinder and the support seat. The support seat can provide better support for the bottom end of the cylinder.

[0036] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection of the invention.

Claims

1. A magnetron sputtering device for preparing a coating on the inner surface of a cylinder, characterized in that: include: Mounting bracket; A rotary drive unit is disposed on the mounting bracket; a first connecting portion is disposed on one side of the rotary drive unit located on the driving shaft, and the first connecting portion is used to connect the rotary drive unit to one end of the cylinder; A target material, wherein the target material is a cylindrical hollow structure; one end of the target material is connected to the driving shaft of the rotating driving unit; both ends of the target material are respectively connected to a liquid inlet pipe and a liquid outlet pipe, and a coolant is provided inside the target material; A magnet, the magnet is cylindrical and is disposed in the target material, one end of the magnet is connected to the driving shaft of the rotating driving unit; the magnet is immersed in the cooling liquid inside the target material; A chamber, wherein the chamber is provided with a second connecting portion, and the second connecting portion is used to connect the chamber with the other end of the cylinder; the chamber is connected with a vacuum pumping device and an air supply device, and the chamber is provided with a through hole, which is used to vacuum or supply air to the inside of the cylinder through the through hole; A power supply, wherein two poles of the power supply are respectively connected to the target material and the cylinder.

2. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 1 is characterized in that: It also includes a liner tube, which is arranged between the target material and the magnet; the liquid inlet pipe and the liquid outlet pipe are respectively connected to the two ends of the liner tube, and the coolant is arranged inside the liner tube.

3. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 2, characterized in that: The liquid inlet pipe is communicated with the bottom end of the liner; the liquid outlet pipe is communicated with the top end of the liner.

4. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 1, characterized in that: The magnet is composed of a plurality of cylindrical sub-magnets; the plurality of sub-magnets are connected end to end in sequence through magnetic adsorption.

5. The magnetron sputtering device for preparing cylinder inner surface coating according to claim 1, characterized in that: Also includes: The longitudinal moving mechanism is arranged on the mounting bracket, the rotary driving part is arranged at the moving end of the longitudinal moving mechanism, and the longitudinal moving mechanism is used to drive the rotary driving part to move up and down.

6. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 5, characterized in that: The first connecting portion includes a first flange, a first annular groove and a first sealing ring; the first flange is arranged on the rotary drive portion, the first annular groove is arranged on the end surface of the first flange, and the first sealing ring is arranged in the first annular groove.

7. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 5, characterized in that: The second connecting portion includes an annular fixing seat and a second sealing ring; the annular fixing seat is detachably connected to the outer wall of the chamber by a fastener, the second sealing ring is arranged between the outer wall of the chamber and the annular fixing seat, and the middle of the annular fixing seat is suitable for fixing the end of the cylinder.

8. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 5, characterized in that: It also includes a connecting shaft, which is detachably arranged between the rotating drive part and the cylinder; the first connecting part is arranged between the rotating drive part and the connecting shaft; and a third sealing ring is also arranged between the connecting shaft and the cylinder.

9. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 1, characterized in that: A target material fixing bracket is arranged in the chamber, a conical groove is arranged on the target material fixing bracket, and the end of the target material can be rotatably arranged in the conical groove.

10. The magnetron sputtering device for preparing the inner surface coating of the cylinder according to claim 5, characterized in that: It also includes a support seat; the chamber is arranged in the support seat, the top open end of the chamber is connected to the support seat, the end of the cylinder is located above the support seat, and the second connecting part is used to connect the cylinder and the support seat.

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