Vacuum magnetic-assisted nanoimprint device

Abstract

The invention discloses a vacuum magnetic force assisted nanoimprint device, which comprises a supporting unit, a positioning unit and a vacuum magnetic force unit, and is characterized in that the supporting unit comprises a supporting table and a fixing block and is used for adjusting the position of a lower substrate during imprint; the positioning unit comprises a guide rail, a positioning block and a sliding block, and is used for adjusting the position of the upper soft film substrate during imprinting and ensuring the imprinting accuracy; the vacuum magnetic unit comprises a vacuum box and magnets inside and outside the vacuum box, and is used for maintaining a vacuum environment during imprinting and providing magnetic force to control starting of the nanoimprinting process. According to the method, the vacuum magnetic force means is used for assisting in nanoimprint, the structural defects of collapse, insufficient filling and the like generated when a high-aspect-ratio structure is machined through a conventional nanoimprint means can be overcome, and reliable nanoimprint machining of the high-precision and high-aspect-ratio structure is achieved.

Description

Technical Field

[0001] The present invention relates to the technical field of nanoimprinting, and in particular to a vacuum magnetic force assisted nanoimprinting device. Background Art

[0002] With the rapid development of micro-nano processing technology, various micro-nano structure forming technologies are constantly emerging. Among them, nanoimprint technology has been widely used in the fields of micro energy storage, micro-nano optics and flexible electronics due to its efficient processing capabilities and ultra-high resolution advantages. The basic principle of nanoimprint technology is to use thermoplastic polymers or silicon-based materials as templates to prepare the required micron or nanometer scale structure on their surface, and then use high temperature hot pressing to copy the micro-nano structure on the template to the target material.

[0003] However, when existing nanoimprinting equipment is processing high aspect ratio structures, due to the narrow and deep structural characteristics of such micro-nano structures, the air remaining in the structural gaps on the template cannot be completely discharged in the extremely short time of the nanoimprinting process, resulting in structural defects such as collapse and insufficient filling in the imprinted structure. Summary of the invention

[0004] In view of the above problems, the present invention proposes a vacuum magnetic-assisted nanoimprinting device, which places the entire imprinting process in a vacuum environment to avoid the generation of bubble defects caused by air during imprinting in common imprinting equipment. At the same time, magnetic force is used as the imprinting working switch and imprinting power source in a vacuum environment, solving the problem of inconvenient operation in a vacuum environment.

[0005] The vacuum magnetic assisted nanoimprinting device comprises a support unit, a positioning unit, and a vacuum magnetic unit. During operation, the device releases the magnetic switch of the vacuum magnetic unit, uses the positioning unit and the support unit to ensure that the soft mold and the nanoimprinting adhesive are aligned and bonded, and uses magnetic force to tightly press the two together, thereby realizing the transfer of the microstructure from the soft film to the nanoimprinting adhesive. The support unit includes a support table and a fixed block; the fixed block is placed on the support table and the sides overlap; the support unit is used to adjust the position of the lower substrate during imprinting; The positioning unit includes a guide rail, a positioning block and a slider; the positioning block is located on the upper surface of the guide rail and the side surface overlaps with the slider; the outer protrusion of the slider overlaps with the inner wall grooves of the guide rail and the positioning block; during operation, the positioning unit aligns the slider with the guide rail through the positioning block, and then releases the magnetic switch to make the slider move vertically downward along the grooves of the positioning block and the guide rail under the combined action of magnetic force and gravity; the positioning unit is used to adjust the position of the upper soft film substrate during imprinting and ensure the accuracy of imprinting; The vacuum magnetic unit includes a vacuum box and magnets inside and outside it; the inner and outer magnets are placed on the inner and outer sides of the upper wall of the vacuum box respectively; during operation, the vacuum magnetic unit removes the magnets outside the vacuum box, so that the internal magnets and the slider move vertically downward along the guide rail, and finally tightly press the soft mold and the adhesive substrate; the vacuum magnetic unit is used to maintain the vacuum environment during imprinting and provide magnetic force to control the start of the nanoimprint process.

[0006] In some embodiments, the support unit further includes a heat table, on which a lower substrate is placed, the support table is connected below the heat table, the vertical position of the heat table is adjusted by the height of the support table, the side of the heat table is connected to a fixed block, and the horizontal position of the heat table is positioned by the fixed block.

[0007] In some embodiments, the guide rail and the positioning block of the positioning unit are integrated or separated, the soft film substrate is fixedly connected to the bottom of the slider, and the movement of the slider is limited by the cooperation of the guide rail and the positioning block.

[0008] In some embodiments, the vacuum magnetic unit further includes a vacuum pump and a controller. The vacuum pump is connected to the vacuum box via an air path. The controller is fixedly connected to the vacuum box. The controller can adjust the gas pressure and vacuum degree inside the vacuum box.

[0009] In some embodiments, the above device further includes an ultraviolet irradiation unit, and the ultraviolet irradiation unit is used to cure the nanoimprint glue.

[0010] In some embodiments, the method for using the vacuum magnetic-assisted nanoimprinting apparatus includes: S1: placing the hot stage on the support stage of the support unit in the vacuum box, with the side contacting with the fixing block to fix the hot stage; fixing the substrate with nanoimprint glue on the lower substrate, and placing the lower substrate on the upper surface of the hot stage with the nanoimprint glue facing upward; fixing the transparent substrate with the soft film on the upper soft film substrate, and fixing the upper soft film substrate on the slider of the positioning unit with the soft film facing downward; placing the inner and outer magnets of the vacuum magnetic unit on the inner and outer sides of the upper wall of the vacuum box respectively, fixing the inner and outer magnets by magnetic force, and fixing the slider with the upper soft film substrate under the inner magnet; fitting the edge of the slider with the positioning block to realize the positioning of the slider, and adjusting the position of the lower substrate so that the upper soft film substrate and the lower substrate are in corresponding positions; S2: The vacuum box is maintained at a vacuum degree of 1~4×10-2 Pa through a vacuum pump and a controller; the magnet outside the vacuum box is removed, so that the slider with the upper soft film substrate is limited by the positioning block and the guide rail and moves downward. During the movement, the soft film contacts the nanoimprint adhesive, completing the replication of the structure on the soft film to the nanoimprint adhesive; S3: restore the standard atmospheric pressure in the vacuum box through the vacuum pump and the controller, open the vacuum box, take out the hot stage and the lower substrate, upper soft film substrate, slider, and inner magnet placed thereon; S4: remove the fixedly connected slider and the inner magnet, align the ultraviolet irradiation unit with the upper soft film substrate, and use the ultraviolet light emitted by the ultraviolet irradiation unit to pass through the upper soft film substrate and the transparent base to cure the nanoimprint adhesive; S5: Move the upper soft film substrate upward to separate the soft film from the nanoimprint adhesive, completing the demolding process.

[0011] Furthermore, the above-mentioned hot stage always maintains 80~120℃ during operation, the material of the lower substrate is one of the hard magnetic materials such as alloy permanent magnet material, ferrite permanent magnet material, etc., and the upper soft film substrate is a hollow structure with light passing through the middle area, and the material of the upper soft film substrate is one of the hard magnetic materials such as alloy permanent magnet material, ferrite permanent magnet material, etc.

[0012] Furthermore, the magnet is one of hard magnetic materials such as alloy permanent magnet material, ferrite permanent magnet material, etc., the nanoimprint glue is one of SUN-1621N-500cp, PS01 or PS02, the soft film has a high aspect ratio structure, the high aspect ratio structure is a microstructure with a ratio of structure width to structure depth greater than 3:1 and a structure accuracy of 100 nm~10 μm, and the material of the soft film is one of PDMS, PMMA, PVA, PET, PVC, PTFE, PC or PUA.

[0013] Furthermore, the ultraviolet light of the ultraviolet irradiation unit is g-line ultraviolet light or i-line ultraviolet light, the irradiation mode of the ultraviolet irradiation unit is parallel light irradiation, and the irradiation time of the ultraviolet irradiation unit is 20 s to 2 min, so that during the curing process of the nanoimprint adhesive, the upper soft film substrate and the lower substrate are attracted by magnetic force so that the soft film and the nanoimprint adhesive are always kept in close contact.

[0014] Furthermore, the method of moving the upper soft film substrate upward is manually controlled or mechanically operated.

[0015] The vacuum magnetic force assisted nanoimprinting device proposed in the present invention places the entire imprinting process in a vacuum environment through a vacuum box and a vacuum pump, thereby eliminating the bubble defects caused by air during the imprinting process. At the same time, a magnet is used as a release switch. After the magnet outside the box is removed, the magnet inside the box vertically falls along the guide rail with the slider, the soft film substrate, and the soft film. When it contacts the substrate with nanoimprinting glue, the soft film and the substrate with nanoimprinting glue are tightly fitted through the attraction between the inner magnet and the lower substrate, thereby realizing the transfer of microstructures, and the imprinting force can be regulated by adjusting the structural size of the inner magnet. In view of the problems existing in the processing of high-aspect ratio structures by existing nanoimprinting equipment, the device of the present invention utilizes a vacuum environment and magnetic force assisted imprinting, which can effectively solve the problems of bubble defects and the like that occur when the structure is prepared by nanoimprinting, and obtain a high-aspect ratio structure with complete morphology. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to make the content of the present invention clearer, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work, among which: Figure 1 A schematic diagram of the support unit structure of a vacuum magnetic-assisted nanoimprinting device provided by the present invention.

[0017] Figure 2 A schematic structural diagram of a positioning unit of a vacuum magnetic-assisted nanoimprinting device provided by the present invention.

[0018] Figure 3 A schematic diagram of the structure of a vacuum magnetic unit of a vacuum magnetic-assisted nanoimprinting device provided by the present invention.

[0019] Figure 4 The present invention provides a working process of a vacuum magnetic-assisted nanoimprinting device.

[0020] Figure 5 This is the imprinting result of the existing nanoimprint equipment.

[0021] Figure 6 This is an imprinting result of a vacuum magnetic-assisted nanoimprinting device provided by the present invention.

[0022] Reference numerals: 1 is a support unit, 11 is a support table, and 12 is a fixing block; 2 is a positioning unit, 21 is a guide rail, 22 is a positioning block, and 23 is a slider; 3 is a vacuum magnetic unit, 31 is a vacuum box, and 32 is a magnet; 4 is a hot stage; 5 is a lower substrate; 6 is an upper soft film substrate; 7 is an ultraviolet irradiation unit. DETAILED DESCRIPTION

[0023] In order to understand the features and technical contents of the embodiments of the present invention in more detail, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0024] In the specification, claims and the above-mentioned drawings of the embodiments of the present invention, the terms "first", "second", etc. are used to distinguish similar objects, rather than to describe a specific order or sequence. It should be understood that, where appropriate, the data represented by these terms are interchangeable to adapt to different application scenarios of the embodiments of the present invention. In addition, the terms "including" and "having" and any variations thereof are intended to express a non-exclusive inclusion relationship, that is, in addition to the elements explicitly listed, other elements that are not explicitly listed may also be included.

[0025] In the embodiments of the present invention, the terms "upper", "lower", "inside", "middle", "outside", "front", "back" and the like are used to indicate the orientation or positional relationship based on the drawings. These terms are intended to more clearly describe the embodiments of the present invention and their specific application scenarios, and are not intended to limit the relevant devices, elements or components to follow a specific orientation or construction method. In addition, in addition to indicating orientation or positional relationships, these terms may also have other meanings. For example, "upper" may indicate an attachment or connection relationship in certain contexts. For those of ordinary skill in the art, they should be able to accurately understand the actual meanings of these terms in the embodiments of the present invention according to the specific context.

[0026] In addition, the terms "set", "connect" and "fix" should be understood in a broad sense in the embodiments of the present invention. Specifically, "connection" not only covers fixed connection and detachable connection, but also includes integral structure; it can be a mechanical connection or an electrical connection, it can be a direct connection, it can also be an indirect connection through an intermediate medium, and even refers to the direct connection between two devices, elements or components. Similarly, "set" and "fix" should also be understood flexibly according to the specific context. For ordinary technicians in this field, they can accurately judge the specific meanings of these terms in the embodiments of the present invention according to the specific circumstances.

[0027] Combination Figure 1-Figure 3 As shown, an embodiment of the present invention proposes a vacuum magnetic-assisted nanoimprinting device, comprising a support unit 1, a positioning unit 2, and a vacuum magnetic unit 3, wherein the support unit 1 comprises a support table 11 and a fixing block 12, for adjusting the position of the lower substrate during imprinting; the positioning unit 2 comprises a guide rail 21, a positioning block 22 and a slider 23, for adjusting the position of the upper soft film substrate during imprinting and ensuring the accuracy of imprinting; the vacuum magnetic unit 3 comprises a vacuum box 31 and magnets 32 inside and outside the vacuum box, for maintaining the vacuum environment during imprinting and providing magnetic force to control the start of the nanoimprinting process.

[0028] Furthermore, the support unit 1 also includes a heating table, on which a lower substrate is placed. The lower part of the heating table is connected to a support table 11, and the vertical position of the heating table is adjusted by the height of the support table 11. The side of the heating table is connected to a fixed block 12, and the horizontal position of the heating table is positioned by the fixed block 12.

[0029] Furthermore, the guide rail 21 and the positioning block 22 of the positioning unit 2 are integrated or separated, the soft film substrate 6 is fixedly connected to the bottom of the slider 23, and the movement of the slider 23 is limited by the cooperation of the guide rail 21 and the positioning block 22.

[0030] Furthermore, the vacuum magnetic unit 3 also includes a vacuum pump and a controller. The vacuum pump is connected to the vacuum box 31 through an air path. The controller is fixedly connected to the vacuum box 31 . The controller can adjust the gas pressure and vacuum degree inside the vacuum box 31 .

[0031] Furthermore, the vacuum magnetic-assisted nanoimprinting device obtained in the embodiment of the present invention further includes an ultraviolet irradiation unit 7, and the ultraviolet irradiation unit 7 is used to cure the nanoimprinting glue.

[0032] Combination Figure 4 As shown, a vacuum magnetic-assisted nanoimprinting device according to an embodiment of the present invention includes: S1: Place the hot stage on the support stage 11 of the support unit 1 in the vacuum box 31, with the side contacting the fixed block 12 to fix the hot stage, connect the hot stage power supply and set the temperature to 110°C. Fix the substrate with nanoimprint glue on the lower substrate 5, which is a hard ferrite in the ferrite permanent magnet material, and place the lower substrate 5 on the upper surface of the hot stage with the nanoimprint glue facing upward. Fix the pre-treated transparent substrate with PDMS soft template on the upper soft film substrate 6 with the thermal release tape, and fix the upper soft film substrate 6 on the slider 23 of the positioning unit 2 with the soft film facing downward. Place the inner and outer magnets 32 of the vacuum magnetic unit 3 on the inner and outer sides of the upper wall of the vacuum box 31 respectively, fix the inner and outer magnets 32 by magnetic force, and fix the slider 23 with the upper soft film substrate 6 under the inner magnet 32. Fit the edge of the slider 23 with the positioning block 22 to achieve the positioning of the slider 23, so that the upper soft film substrate 6 and the lower substrate 5 are in corresponding positions.

[0033] S2: The vacuum box 31 is maintained at a vacuum degree of 4×10-2 Pa through the vacuum pump and the controller. The outer magnet 32 ​​of the vacuum box 31 is removed, and the slider 23 with the upper soft film substrate 6 is limited by the positioning block 22 and the guide rail 21 and moves downward. During the movement, the soft film contacts the nanoimprint adhesive, and the replication of the structure on the soft film to the nanoimprint adhesive is completed through the attraction between the magnet 32 ​​and the lower substrate 5.

[0034] S3: The vacuum box 31 is restored to standard atmospheric pressure through the vacuum pump and the controller, the vacuum box 31 is opened, and the hot stage 4 and the lower substrate 5, the upper soft film substrate 6, the slider 23, and the inner magnet 32 ​​placed thereon are taken out.

[0035] S4: Remove the slider 23 and the inner magnet 32 ​​that are fixedly connected, align the ultraviolet irradiation unit 7 with the upper soft film substrate 6, and use the g-line ultraviolet light emitted by it to penetrate the upper soft film substrate 6 and the transparent base with a hollow middle area, and irradiate the nanoimprint adhesive with parallel light for 60 seconds to solidify the nanoimprint adhesive. During this process, the upper soft film substrate 6 and the lower substrate 5 are attracted by magnetic force so that the soft film and the nanoimprint adhesive are always kept in close contact.

[0036] S5: Move the upper soft film substrate 6 upward to separate the soft film from the nanoimprint adhesive, thus completing the demoulding process.

[0037] The vacuum magnetic-assisted nanoimprinting device obtained in the embodiment of the present invention places the entire imprinting process in a vacuum environment through a vacuum box and a vacuum pump, thereby eliminating the bubble defects caused by air during the imprinting process. At the same time, a magnet is used as a release switch. When the magnet outside the box is removed, the magnet inside the box falls vertically along the guide rail with the slider, the soft film substrate, and the soft film. When it contacts the substrate with nanoimprint glue, the soft film is tightly fitted with the substrate with nanoimprint glue through the attraction between the inner magnet and the lower substrate, realizing the transfer of the microstructure, and the imprinting force can be regulated by adjusting the structural size of the inner magnet. In view of the problems existing in the existing nanoimprinting equipment when processing high-aspect ratio structures, the device of the present invention uses a vacuum environment and magnetic-assisted imprinting to effectively solve the problems of bubble defects and the like that occur when the structure is prepared by nanoimprinting, and obtains a high-aspect ratio structure with a complete morphology.

[0038] The above embodiments are merely examples for clearly illustrating the present invention and are not limitations of the implementation methods. Those skilled in the art should understand that the scope of the present invention includes but is not limited to the above embodiments. Various changes made to the present invention in other forms without departing from the spirit or basic features of the present invention are all included in the protection scope of the present invention.

Claims

1. A vacuum magnetic-assisted nanoimprinting device, characterized in that: The device comprises a support unit, a positioning unit and a vacuum magnetic unit; the outer side of the support unit is connected to the inner side of the positioning unit and is placed together on the inner bottom surface of the vacuum magnetic unit; the device places the entire imprinting process in a vacuum environment to avoid structural defects caused by air bubbles during imprinting, and uses magnetic force as an imprinting working switch and an imprinting power source in a vacuum environment; during operation, the device releases the magnetic switch of the vacuum magnetic unit, ensures that the soft mold and the nanoimprint adhesive are aligned and bonded with the help of the positioning unit and the support unit, and uses magnetic force to tightly press the two together, thereby realizing the transfer of the microstructure from the soft film to the nanoimprint adhesive; wherein, The support unit comprises a support table and a fixed block; the fixed block is placed on the support table with the sides overlapping; the support unit is used to adjust the position of the lower substrate during imprinting; The positioning unit comprises a guide rail, a positioning block and a slider; the positioning block is located on the upper surface of the guide rail and the side surface overlaps with the slider; the outer protrusion of the slider overlaps with the inner wall groove of the guide rail and the positioning block; during operation, the positioning unit aligns the slider with the guide rail through the positioning block, and then releases the magnetic switch to make the slider move vertically downward along the groove of the positioning block and the guide rail under the combined action of magnetic force and gravity; the positioning unit is used to adjust the position of the upper soft film substrate during imprinting and ensure the accuracy of imprinting; The vacuum magnetic unit includes a vacuum box and magnets inside and outside the vacuum box; the inner and outer magnets are respectively placed on the inner and outer sides of the upper wall of the vacuum box; during operation, the vacuum magnetic unit removes the magnets outside the vacuum box, so that the internal magnets and the slider move vertically downward along the guide rail, and finally the soft mold is tightly pressed against the adhesive substrate; the vacuum magnetic unit is used to maintain the vacuum environment during imprinting and provide magnetic force to control the start of the nanoimprinting process.

2. The vacuum magnetic-assisted nanoimprinting device according to claim 1, characterized in that: The support unit also includes a heating stage, a lower substrate is placed on the heating stage, the lower side of the heating stage is connected to the support stage, the vertical position of the heating stage is adjusted by the height of the support stage, the side of the heating stage is connected to a fixing block, and the horizontal position of the heating stage is positioned by the fixing block.

3. The vacuum magnetic-assisted nanoimprinting device according to claim 1, characterized in that: The guide rail and the positioning block of the positioning unit are integrated or separated, the lower side of the slider is fixedly connected to the soft film substrate, and the movement of the slider is limited by the cooperation of the guide rail and the positioning block.

4. The vacuum magnetic-assisted nanoimprinting device according to claim 1, characterized in that: The vacuum magnetic unit also includes a vacuum pump and a controller. The vacuum pump is connected to the vacuum box through an air path. The controller is fixedly connected to the vacuum box. The controller can adjust the gas pressure and vacuum degree inside the vacuum box.

5. The vacuum magnetic-assisted nanoimprinting device according to claim 1, characterized in that: The device also includes an ultraviolet irradiation unit, which is used to cure the nano-imprint glue.

6. The vacuum magnetic-assisted nanoimprinting device according to any one of claims 1 to 5, characterized in that: The method of using the device includes: S1: placing the hot stage on the support stage of the support unit in the vacuum box, with the side contacting with the fixing block to fix the hot stage; fixing the substrate with nanoimprint glue on the lower substrate, and placing the lower substrate on the upper surface of the hot stage with the nanoimprint glue facing upward; fixing the transparent substrate with the soft film on the upper soft film substrate, and fixing the upper soft film substrate on the slider of the positioning unit with the soft film facing downward; placing the inner and outer magnets of the vacuum magnetic unit on the inner and outer sides of the upper wall of the vacuum box respectively, fixing the inner and outer magnets by magnetic force, and fixing the slider with the upper soft film substrate under the inner magnet; fitting the edge of the slider with the positioning block to realize the positioning of the slider, so that the upper soft film substrate and the lower substrate are in corresponding positions; S2: The vacuum box is maintained at a vacuum degree of 1×10 -2 ~4×10 -2 Pa; remove the magnet outside the vacuum box, so that the slider with the upper soft film substrate is limited by the positioning block and the guide rail and moves downward. During the movement, the soft film contacts the nano-imprint adhesive, completing the replication of the structure on the soft film to the nano-imprint adhesive; S3: restore the standard atmospheric pressure in the vacuum box through the vacuum pump and the controller, open the vacuum box, take out the hot stage and the lower substrate, upper soft film substrate, slider, and inner magnet placed thereon; S4: remove the fixedly connected slider and the inner magnet, align the ultraviolet irradiation unit with the upper soft film substrate, and use the ultraviolet light emitted by the ultraviolet irradiation unit to pass through the upper soft film substrate and the transparent base to cure the nanoimprint adhesive; S5: Move the upper soft film substrate upward to separate the soft film from the nanoimprint adhesive, completing the demolding process.

7. The vacuum magnetic-assisted nanoimprinting device according to claim 6, characterized in that: The heating stage is always kept at 80-120°C during operation. The material of the lower substrate is one of hard magnetic materials such as alloy permanent magnet material, ferrite permanent magnet material, etc. The upper soft film substrate is a hollow structure with light passing through the middle area. The material of the upper soft film substrate is one of hard magnetic materials such as alloy permanent magnet material, ferrite permanent magnet material, etc.

8. The vacuum magnetic-assisted nanoimprinting device according to claim 6, characterized in that: The magnet is one of hard magnetic materials such as alloy permanent magnet material, ferrite permanent magnet material, etc., the nanoimprint glue is one of SUN-1621N-500cp, PS01 or PS02, the soft film has a high aspect ratio structure, the high aspect ratio structure is a microstructure with a ratio of structure width to structure depth greater than 3:1 and a structure accuracy of 100 nm~10 μm, and the material of the soft film is one of PDMS, PMMA, PVA, PET, PVC, PTFE, PC or PUA.

9. The vacuum magnetic-assisted nanoimprinting device according to claim 6, characterized in that: The ultraviolet light of the ultraviolet irradiation unit is g-line ultraviolet light or i-line ultraviolet light, the irradiation mode of the ultraviolet irradiation unit is parallel light irradiation, the irradiation time of the ultraviolet irradiation unit is 20 s to 2 min, and in the process of curing the nanoimprint adhesive, the upper soft film substrate and the lower substrate are attracted by magnetic force so that the soft film and the nanoimprint adhesive are always kept in close contact.

10. The vacuum magnetic-assisted nanoimprinting device according to claim 6, characterized in that: The method of moving the upper soft film substrate upward is manual control or mechanized operation.

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