Automatic simulation method and device applied to semiconductor simulation software and medium

Abstract

According to the automatic simulation method and device applied to the semiconductor simulation software and the medium, when it is detected that the experiment user triggers the simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experiment user, and the process parameters required by the simulation are obtained in the interaction process, so that the simulation efficiency is improved. And then the EBL BEAMER simulation robot obtains and executes a corresponding simulation process according to the process parameters, and outputs a simulation result. According to the process, complex and difficult-to-remember operation steps are replaced by a robot for execution, the energy of researchers is saved, a plurality of repeated processes can be automatically and continuously executed, and parameter variables are automatically modified, so that the time for the researchers to wait for simulation calculation is eliminated, and the machine hour and the scientific research cost are saved; in addition, the automatic simulation method can also be combined with virtual simulation teaching of semiconductor equipment, software and hardware full-process digital teaching is achieved, and a traditional teaching mode is changed.

Description

Technical Field

[0001] The present application relates to the field of semiconductor electron beam lithography simulation technology, and in particular to an automated simulation method, device and medium applied to semiconductor simulation software. Background Art

[0002] At present, there are many software involved in the electron beam lithography process for the manufacture of micro-nano devices. Some are the operating software of the equipment provided by the equipment manufacturer, and some are simulation software, such as BEAMER, FDTD, Trace pro, MATLAB, etc. Among them, BEAMER software is a professional software for format conversion and simulation correction dedicated to electron beam exposure equipment, and TRACER and LAB software are also used in conjunction with it. TRACER is used to simulate the trajectory of electron movement and calculate the distribution of electron loss energy density. The LPSF file exported by it is used to simulate the distribution of electron energy absorbed by photoresist at different thicknesses in BEAMER software, while LAB can simulate the morphology (2D / 3D) of the photoresist structure after development. In addition, BEAMER software also has a unique proximity effect correction function, which can make the dose reasonably distributed and make the pattern morphology after exposure more perfect.

[0003] However, the operation of this software is very complicated and has a high threshold. Users need to have certain knowledge in the fields of optics, quantum mechanics, and statistics, and have experience in using electron beam lithography machines and drawing software. In addition, they need to have a deep understanding and practice of all the functions of the software before they can use it proficiently and flexibly. The learning cycle is usually long, and basic training usually takes about a week to understand the basic functions of the software. Actual use usually requires a long period of experience accumulation to be able to use some functions proficiently. If you want to be proficient in using the various functions of the software, you need to explore and combine the experimental situation to use it freely. This process requires more energy from scientific researchers; and the simulation calculation time is long, and scientific researchers need to wait for a process to be completed before entering the next process; in addition, for this complex professional software, it involves more process parameter settings and simulation mode selection, and it is necessary to adjust the relevant parameters in combination with actual experimental results. If you do not provide experience values, it will take a long time and many failures to explore the appropriate exposure dose and pattern correction parameters, which means that a lot of electron beam lithography equipment time will be consumed to verify and explore the reliability of the simulation results. However, electron beam lithography equipment is a high-precision semiconductor device with extremely high machine hours, which greatly increases the cost of scientific research. Summary of the invention

[0004] The purpose of the present application is to solve at least one of the above-mentioned technical defects, especially the technical defect that when conducting semiconductor simulation experiments in the prior art, simulation operations are performed manually, which not only consumes energy but also increases the cost of scientific research.

[0005] The present application provides an automated simulation method applied to semiconductor simulation software, the method comprising:

[0006] When it is detected that the experimental user triggers a simulation request, the EBL BEAMER simulation robot is called to interact with the experimental user, and the process parameters required for this simulation are obtained during the interaction;

[0007] After the EBL BEAMER simulation robot acquires and executes the corresponding simulation process according to the process parameters, the simulation result is output.

[0008] Optionally, calling the EBL BEAMER simulation robot to interact with the experimental user and obtaining the process parameters required for this simulation during the interaction includes:

[0009] Invoke the EBL BEAMER simulation robot to display the executable simulation process to the experimental user, and obtain the process name corresponding to the simulation process selected by the experimental user from the executable simulation processes;

[0010] After invoking the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experimental user, the process parameters input by the experimental user are received.

[0011] Optionally, after acquiring and executing a corresponding simulation process according to the process parameters by the EBL BEAMER simulation robot, outputting a simulation result includes:

[0012] After the EBL BEAMER simulation robot determines the software type and simulation process connected to this simulation according to the process parameters, the simulation process is executed according to the process parameters and the software type.

[0013] Optionally, when the process parameters are simplified version process parameters, the simulation process is executed by the EBL BEAMER simulation robot according to the process parameters and the software type, including:

[0014] The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported;

[0015] The EBL BEAMER simulation robot is connected to the BEAMER software, and the LPSF file is imported into the BEAMER software according to the process parameters and simulated, and then the layout format recognizable by the semiconductor machine is exported, and the distribution of the electron energy absorbed by the photoresist molecules under different thicknesses is simulated.

[0016] Optionally, when the process parameters are process parameters of the challenge version, the simulation process is executed by the EBL BEAMER simulation robot according to the process parameters and the software type, including:

[0017] The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported;

[0018] The EBL BEAMER simulation robot is connected to the BEAMER software, and the LPSF file is imported into the BEAMER software according to the process parameters and simulated, and then a layout format recognizable by a semiconductor machine is exported, and the distribution of electron energy absorbed by photoresist molecules under different thicknesses is simulated;

[0019] The EBL BEAMER simulation robot is connected to the LAB software, and the photoresist morphology after development is simulated in the LAB software according to the process parameters.

[0020] Optionally, the method further comprises:

[0021] During the process of the EBL BEAMER simulation robot executing the simulation process, the robot interacts with the experimental user according to the requirements of the simulation process or the user's requirements, and continues or cancels the execution of the simulation process according to the interaction result.

[0022] Optionally, when the simulation result is a photoresist morphology after development, the method further includes:

[0023] The EBL BEAMER simulation robot calculates a complete photoresist morphology diagram or a complete device morphology diagram based on the photoresist morphology, and provides reasonable suggestions for exposure parameter settings and layout corrections to the experimental user based on the morphology diagram and expert experience in the database.

[0024] The present application also provides an automated simulation device applied to semiconductor simulation software, comprising:

[0025] The simulation process determination module is used to call the EBL BEAMER simulation robot to interact with the experimental user when it is detected that the experimental user triggers a simulation request, and obtain the process parameters required for this simulation during the interaction process;

[0026] The simulation process execution module is used to obtain and execute the corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, and then output the simulation result.

[0027] The present application also provides a computer-readable storage medium, in which computer-readable instructions are stored. When the computer-readable instructions are executed by one or more processors, the one or more processors execute the steps of the automated simulation method applied to semiconductor simulation software as described in any of the above embodiments.

[0028] The present application also provides a computer device, comprising: one or more processors, and a memory;

[0029] The memory stores computer-readable instructions, and when the computer-readable instructions are executed by the one or more processors, the steps of the automated simulation method applied to semiconductor simulation software as described in any one of the above embodiments are performed.

[0030] It can be seen from the above technical solutions that the embodiments of the present application have the following advantages:

[0031] The automated simulation method, device and medium for semiconductor simulation software provided by the present application, when detecting that the experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction, and then obtain and execute the corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, and output the simulation results. This process uses the EBL BEAMER simulation robot to replace the complex and difficult to remember operation steps, thereby saving the energy of scientific researchers, and can automatically and continuously execute multiple repeated processes, automatically modify parameter variables, thereby eliminating the time for scientific researchers to wait for simulation calculations, and saving machine time and scientific research costs.

[0032] In detail, this application applies the process automation design of electron beam lithography simulation robot to the electron beam lithography process of micro-nano device manufacturing, upgrading the experiment from "manual operation + experience-driven" to a new paradigm of "automation + intelligence". Its design includes: 1) using RPA to replace manual completion of complex and difficult-to-remember basic software operations, such as: importing files, exporting and viewing results, format conversion, parameter setting, step execution, process design, drawing curves, etc.; 2) For operations that require technical experience and flexible design to perform, open operation permissions can be issued to advanced users through the setting of simulation processes, such as: appropriate beam selection, graphic morphology size inspection, custom mark design, etc.; 3) providing basic process parameter data reference and historical data query functions, with 3D simulation result analysis and professional process suggestion functions, for example: if the 3D structure is over-exposed, it will remind users to reduce the exposure dose, etc.; 4) using AI dialogue in the form of simple version and challenge version, users can choose suitable robots to replace operations according to their preferences and needs; 5) it can be combined with virtual simulation teaching of semiconductor equipment to realize digital teaching of the whole process of software and hardware, and transform the traditional teaching mode. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0034] Figure 1 A schematic diagram of a flow chart of an automated simulation method applied to semiconductor simulation software provided in an embodiment of the present application;

[0035] Figure 2 A first interactive page display diagram of the EBL BEAMER simulation robot interacting with an experimental user provided in an embodiment of the present application;

[0036] Figure 3 A second interactive page display diagram of the EBL BEAMER simulation robot interacting with an experimental user provided in an embodiment of the present application;

[0037] Figure 4 One of the page display diagrams provided in the embodiment of the present application when simulating the 3D morphology of the exposure of the pattern on the photoresist in the LAB;

[0038] Figure 5 Another page display diagram for simulating the 3D morphology of the exposure of a pattern on a photoresist in a LAB provided in an embodiment of the present application;

[0039] Figure 6 A distribution diagram of photoresist absorption energy displayed in LAB provided in an embodiment of the present application;

[0040] Figure 7 A schematic diagram of the structure of an automated simulation device applied to semiconductor simulation software provided in an embodiment of the present application;

[0041] Figure 8 A schematic diagram of the internal structure of a computer device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0042] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0043] In one embodiment, Figure 1 As shown, Figure 1 A flow chart of an automated simulation method applied to semiconductor simulation software provided in an embodiment of the present application; the present application provides an automated simulation method applied to semiconductor simulation software, the method may include:

[0044] S110: When it is detected that the experiment user triggers a simulation request, the EBL BEAMER simulation robot is called to interact with the experiment user, and the process parameters required for this simulation are obtained during the interaction.

[0045] In this step, if the experimental user wants to conduct a simulation experiment, he can log in to the corresponding automated simulation platform, which is equipped with a process editor for designing and editing automated processes. It generally supports visual process design by dragging components, and also supports programming design through scripting languages ​​such as Python. The specific design can be based on the actual situation and is not limited here. When the developer has designed the corresponding simulation process, it can be saved locally or on the server, and when the experimental user triggers a simulation request, the corresponding simulation process is called and executed locally or on the server according to the specific request content.

[0046] In addition, a control center is also set up in the automated simulation platform. The control center generally includes functions such as user management, role control, task scheduling, operation analysis, business analysis, security control, version control, and audit tracking. It also supports centralized deployment architecture, containerized deployment, encryption using national secret algorithms, multi-tenant architecture and tenant management, ARM architecture, and management of multiple types of robots.

[0047] In addition, the automated simulation platform also includes a robot runner, which is used to support the automatic execution of the process. Robots can generally be divided into three types, namely, front-end robots (also known as attended robots or user robots), back-end robots (also known as unattended robots or shared robots), and process discovery robots. The EBL BEAMER simulation robot in this application is a front-end robot. The EBL BEAMER simulation robot can interact with the experimental user before and during the simulation experiment, and perform subsequent experimental operations based on the interaction results, thereby effectively improving the quality of scientific research and equipment utilization.

[0048] Specifically, when the experimental user in this application needs to conduct a semiconductor simulation experiment, he can log in to the automated simulation platform. When the automated simulation platform in this application detects that the experimental user triggers a simulation request, it can call the EBLBEAMER simulation robot to interact with the experimental user and obtain the process parameters required for this simulation during the interaction. The process parameters here include but are not limited to parameter settings in different software, such as GDS file settings, sample settings, parameter settings, etc., which can be set according to the actual application scenario, and are not limited here; further, the process parameters of this application may include a simple version of the process parameters and a challenge version of the process parameters, wherein the simple version of the process parameters only implements basic functions, such as implementing simple size correction and dose correction, converting the layout format into a gpf format recognizable by EBL, etc., and the challenge version has more process parameters, thereby providing users with more flexible and comprehensive software functions, but users need to have certain experience.

[0049] It is understandable that although the simulation process of the Challenge Edition is automated, it has more steps than the Simple Edition and requires empirical judgment. If the layout does not need to be strictly corrected, the Simple Edition can be used; if you want to prepare high-precision, high-topography graphics or obtain simulation data results, you need to use the Challenge Edition. This process can be done by selecting the corresponding simulation process through the EBL BEAMER simulation robot, and setting the process parameters of the Challenge Edition according to the robot's prompts to conduct simulation experiments, thereby improving the user experience while improving the accuracy and reliability of the simulation results.

[0050] S120: After the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters, the simulation result is output.

[0051] In this step, the EBL BEAMER simulation robot is called through S110 to interact with the experimental user, and after obtaining the process parameters and input method required for this simulation during the interaction, the present application can also output the simulation results after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters and the input method.

[0052] Specifically, when the EBL BEAMER simulation robot obtains the process parameters required for this simulation, it can determine the corresponding simulation process based on the process parameters, and execute it by calling the simulation process locally or on the server. During this process, the EBL BEAMER simulation robot can also obtain process parameters according to experimental requirements, and can also adjust the simulation process according to user needs.

[0053] For example, when the experimental user selects the process parameters of the challenge version, the experimental user is more dependent on and has higher requirements for the simulation results, so all software functions will be opened to the experimental user. However, users who use the challenge version may not be familiar with the software or have rich EBL-related knowledge. If all manual intervention is used, the user will not be able to operate. At this time, prompts and selections can be configured for each functional module. The prompts explain the functions that this module can achieve and provide cases or basic parameters as a reference; the selections can choose autonomous operation or robot-assisted operation. If robot-assisted operation is selected, then except for the necessary steps of human intervention, the rest are completed automatically according to the usage experience entered by the developer, but only basic results can be viewed. If you want to customize the use or analysis, you can choose autonomous operation. The specific selection can be based on the actual situation and is not restricted here.

[0054] In addition, since software operation is a key part of semiconductor experiments, similar to semiconductor equipment training, there are problems such as complex operations that are difficult to remember, and easy to miss steps that lead to experimental failures. Virtual simulation scenarios can solve these problems. Virtual simulation has the advantages of online learning anytime and anywhere, good user experience, and interactive Q&A with robots to deepen memory. For example, after the user enters the EBL room in the virtual space, he can be prompted to complete the layout format conversion before using the equipment, click on the computer screen outside the room to enter the RPA operation interface of BEAMER, and the dialog box prompts to enter the experimental parameters and then perform simulation, and then operate step by step according to the designed automation process.

[0055] In addition to being used in training scenarios, the automated simulation method of this application can also be applied in the assessment phase. The advantage of using a virtual simulation system for training is that all knowledge and experience are pre-injected into the system, so it can be viewed at any time, which is extremely friendly to beginners. Through this humanized learning mode, beginners can practice repeatedly until they can take the exam. The advantage of taking the exam in a virtual system is that there will be prompts and historical records for the wrong places, which is convenient for reviewing and consolidating the practice and deepening the impression.

[0056] In the above embodiment, when it is detected that the experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction, and then output the simulation results after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters. This process uses the EBL BEAMER simulation robot to replace the complex and difficult to remember operation steps, thereby saving the energy of scientific researchers, and can automatically and continuously execute multiple repeated processes and automatically modify parameter variables, thereby eliminating the time for scientific researchers to wait for simulation calculations and saving machine time and scientific research costs.

[0057] Specifically, this application applies the process automation design of electron beam lithography simulation robot to the electron beam lithography process for micro-nano device manufacturing, upgrading the experiment from "manual operation + experience-driven" to a new paradigm of "automation + intelligence". Its design includes: 1) using RPA to replace manual completion of complex and difficult-to-remember basic software operations, such as: importing files, exporting and viewing results, format conversion, parameter setting, step execution, process design, drawing curves, etc.; 2) For operations that require technical experience and flexible design to perform, open operation permissions can be issued to advanced users through the setting of process parameters, such as: appropriate beam selection, graphic morphology size inspection, custom mark design, etc.; 3) providing basic process parameter data reference and historical data query functions, with 3D simulation result analysis and professional process suggestion functions, such as: 3D structure presents an over-exposure state, it will remind users to reduce the exposure dose, etc.; 4) using AI dialogue in the form of simple version and challenge version, users can choose a suitable robot to replace the operation according to their preferences and needs; 5) it can be combined with virtual simulation teaching of semiconductor equipment to realize digital teaching of the entire process of software and hardware, and transform the traditional teaching mode.

[0058] In one embodiment, in S110, calling the EBL BEAMER simulation robot to interact with the experimental user and obtaining the process parameters required for the simulation during the interaction may include:

[0059] S111: calling the EBL BEAMER simulation robot to display executable simulation processes to the experiment user, and obtaining a process name corresponding to a simulation process selected by the experiment user from the executable simulation processes.

[0060] S112: After invoking the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experiment user, the process parameters input by the experiment user are received.

[0061] In this embodiment, in the process of calling the EBL BEAMER simulation robot to interact with the experimental user, the executable simulation process can be displayed to the experimental user, and the experimental user can select the process name corresponding to the appropriate simulation process according to his own needs. In this way, after receiving the process name, the EBL BEAMER simulation robot can send a parameter setting reminder corresponding to the process name to the experimental user. At this time, the experimental user can configure the process parameters according to the prompt of the EBL BEAMER simulation robot and his own needs and submit them, so that the EBL BEAMER simulation robot can automatically execute the simulation process according to the process parameters.

[0062] In a specific implementation, Figure 2 , 3 As shown, Figure 2 This is a first interactive page display diagram of the EBL BEAMER simulation robot interacting with an experimental user provided in an embodiment of the present application. Figure 3 A second interactive page display diagram of the interaction between the EBLBEAMER simulation robot provided in the embodiment of the present application and the experimental user; Figure 2 In the simulation, the EBL BEAMER simulation robot can show the experimental users the executable simulation processes, such as the Tracer and Beamer creation processes. When the experimental user selects the process, the robot can pop up the following Figure 3 The dialog box shown in the figure reminds the experimental user of the process parameters that need to be set. The experimental user can enter the corresponding process parameters according to the robot's step-by-step reminders. Of course, the experimental user can also enter the experimental process to be run and all the process parameters involved in the simulation in advance through the robot's interactive dialog box. During this process, the robot will provide explanations to guide the user to fill in the parameters correctly. When the robot receives all the process parameters required for the simulation process entered by the experimental user, it can start running the simulation process.

[0063] In one embodiment, in S120, after the EBL BEAMER simulation robot acquires and executes the corresponding simulation process according to the process parameters, outputting the simulation result may include:

[0064] S121: After the EBL BEAMER simulation robot determines the software type and simulation process connected to this simulation according to the process parameters, the simulation process is executed according to the process parameters and the software type.

[0065] In this embodiment, after receiving the process parameters input by the experiment user, the EBL BEAMER simulation robot can execute the corresponding simulation process.

[0066] Specifically, in this application, the EBL BEAMER simulation robot can determine the software type and simulation process connected to this simulation according to the process name selected by the experimental user when entering the process parameters. For example, when the process parameters selected by the experimental user are the process parameters of the simple version, the software types connected to this simulation may include TRACER software and BEAMER software, and when the process parameters selected by the experimental user are the process parameters of the challenge version, the software types connected to this simulation may include TRACER software, BEAMER software and LAB software. The specific software type can be set according to the simulation type, and is not limited here.

[0067] In addition, since different software types correspond to different simulation processes, and when different process parameters are selected in this application, the corresponding simulation processes are also different. Therefore, after receiving the process parameters input by the experimental user, the EBL BEAMER simulation robot can determine the docking software type and simulation process according to the process parameters, and execute the simulation process according to the process parameters and software type input by the experimental user.

[0068] In one embodiment, when the process parameters are simplified process parameters, executing the simulation process according to the process parameters and the software type by the EBLBEAMER simulation robot in S121 may include:

[0069] S1211: The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported.

[0070] S1212: docking the EBL BEAMER simulation robot with the BEAMER software, importing the LPSF file into the BEAMER software according to the process parameters and simulating, exporting a layout format recognizable by a semiconductor machine, and simulating the distribution of electron energy absorbed by photoresist molecules at different thicknesses.

[0071] In this embodiment, when the process parameters are simplified version process parameters, it indicates that the user of the experiment only needs to perform basic operations. At this time, the EBL BEAMER simulation robot can be connected to the TRACER software, and the electron motion trajectory and electron loss energy density distribution are simulated in the TRACER software according to the process parameters, and the LPSF file is exported. Then, the LPSF file is imported into the BEAMER software and simulated, and then the layout format recognizable by the semiconductor machine is exported, and the distribution of electron energy absorbed by the photoresist molecules at different thicknesses is simulated.

[0072] In a specific implementation, Figure 3 As shown, after the EBL BEAMER simulation robot is connected to the TRACER software, the EBL BEAMER simulation robot can perform the following steps in the TRACER software according to the pre-input layer parameters:

[0073] (1) Key parameters such as substrate, photoresist, and electron beam energy are pre-set to guide users to enter;

[0074] (2) Automatically create a new simulation and check Save Trajectories to File to save the electron trajectory;

[0075] (3) The user is prompted to confirm whether to start the simulation and clicks Simulate to start the simulation.

[0076] (4) The LPSF file under the second to last thickness layer is automatically saved and can be automatically retrieved later.

[0077] Next, after the application is connected to the BEAMER software through the EBL BEAMER simulation robot, the EBL BEAMER simulation robot can perform the following steps in the BEAMER software according to the pre-entered Import file name and bias value:

[0078] (1) The parameters such as the file name for Import, the layer for Extract, the size for Bias, the LPSF file to be retrieved for PEC, and the file name for Export are placed in front to guide the user to enter;

[0079] (2) After automatically retrieving files, the standard process flow set by the administrator, and setting various parameters, the simulation begins and the layout format that can be recognized by semiconductor machines is exported, as well as the distribution of electron energy absorbed by photoresist molecules at different thicknesses is simulated.

[0080] In one embodiment, when the process parameters are process parameters of the challenge version, executing the simulation process according to the process parameters and the software type by the EBLBEAMER simulation robot in S122 may include:

[0081] S1223: The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported.

[0082] S1224: docking the EBL BEAMER simulation robot with the BEAMER software, importing the LPSF file into the BEAMER software according to the process parameters and simulating, exporting a layout format recognizable by a semiconductor machine, and simulating the distribution of electron energy absorbed by photoresist molecules at different thicknesses;

[0083] S1225: docking the EBL BEAMER simulation robot with the LAB software, and simulating the photoresist morphology after development in the LAB software according to the process parameters.

[0084] In the present embodiment, when the process parameters selected by the experimental user are the process parameters of the challenge version, it is shown that the experimental user wants to prepare a graph with high precision and high morphology requirements or obtain simulation data results. At this time, the application can increase the input step of the process parameters and the corresponding simulation process on the basis of the simulation process corresponding to the process parameters of the simplified version. Such as the application can continue to set the process parameters of the LAB software after setting the process parameters of the BEAMER software, so that after the EBL BEAMER simulation robot simulates the distribution of the photoresist molecules absorbing the electron energy under different thicknesses, the application can also be docked with the LAB software by the EBLBEAMER simulation robot, and simulate the photoresist morphology after development in the LAB software according to the process parameters. This process, relative to the simplified version, requires the experimental user to enter more parameter information, and increases more free choice space, and can realize more process correction functions.

[0085] For example, if Figure 4 As shown, Figure 4 One of the page display diagrams provided in the embodiment of the present application when simulating the 3D morphology of the exposure of the pattern on the photoresist in the LAB; Figure 4 In the simulation of the 3D morphology of the pattern exposed on the photoresist in LAB, in order to save time, a small part of the repeated structure will be selected in the area for simulation, and the effect can be seen. At this time, manual intervention is required to select the simulation area, so this step is open to the user in the challenge version.

[0086] like Figure 5As shown, Figure 5 Another page display diagram for simulating the 3D morphology of the exposure of a pattern on a photoresist in a LAB provided in an embodiment of the present application; Figure 5 In LAB, when simulating the 3D morphology of the pattern exposed on the photoresist, the more types of parameters can be selected, the closer it is to the actual situation. Even some material parameters can be manually entered into the material library of the software and then selected. Figure 5 Taking the material selection step as an example, the simple version only provides a few basic photoresists for selection. For experienced EBL users, they are familiar with the performance of various photoresists and need to use LAB simulation results to guide experiments and conduct detailed experimental research. Then they can use the challenge version with rich materials.

[0087] Furthermore, if Figure 6 As shown, Figure 6 A distribution diagram of photoresist absorption energy displayed in LAB provided in an embodiment of the present application; Figure 6 The distribution graph shown in can be used to analyze the relationship between energy and development morphology. Some operations are required in the analysis process, such as view conversion, intersection location selection, viewing range setting, etc. These are easier to understand and apply for people who have certain experience in using simulation software. Therefore, this step can be used as an optional option in the process parameter setting of the challenge version, and by replacing the conventional method of viewing and analyzing pictures with RPA, simple results can be automatically analyzed and prompts for the analysis results can be popped up. For users with particularly rich knowledge and experience, if they want to analyze more useful information, they can also independently select options in each module to try.

[0088] In one embodiment, the method may further include:

[0089] S130: When the EBL BEAMER simulation robot executes the simulation process, the robot interacts with the experimental user according to the requirements of the simulation process or the user's requirements, and continues or cancels the simulation process according to the interaction result.

[0090] In this embodiment, during the process of the EBL BEAMER simulation robot executing the simulation process, it can also interact with the experimental user according to the requirements of the simulation process or the user's requirements, and continue or cancel the execution of the simulation process according to the interaction result.

[0091] For example, during the running of the experimental process, some parameters need to be manually calculated and judged. The robot blocks the execution of the process. At this time, the robot can pop up the process parameter setting dialog box, and the user can fill in the corresponding parameters according to their own needs, click Save and Run or Skip to continue the process. For example: After completing a round of Beamer operations, if the user wants to try other parameters of Bias (size correction), he can update the parameters and run the above process again through the robot. Specifically, assuming that the experimental user in this application selected +0.01um Bias in the previous simulation, this simulation can be changed to Bias+0.02um. At this time, you only need to re-enter other variables in the dialog box after the end of the process or during the process to re-simulate the experiment.

[0092] In addition, the robot client will also prompt the links that require manual operation confirmation through a dialog box, and during manual operation, the mouse is only allowed to move in the interface area that needs to be operated, and the mouse cannot be moved to other areas. For example, when the user needs to view the layout information, he can choose different views as needed, such as by layer, by dose, etc. The user can choose the process independently. When a certain parameter is entered unreasonably and may cause a bug, it can also be resolved through the intervention of the administrator.

[0093] In one embodiment, when the simulation result is a photoresist morphology after development, the method may further include:

[0094] The EBL BEAMER simulation robot calculates a complete photoresist morphology diagram or a complete device morphology diagram based on the photoresist morphology, and provides reasonable suggestions for exposure parameter settings and layout corrections to the experimental user based on the morphology diagram and expert experience in the database.

[0095] In this embodiment, when the simulation result is the morphology of the photoresist after development, since the simulation area is usually a small part of the graphic, the EBL BEAMER simulation robot in this application can use AI technology and combine the simulated layout morphology to infer and form a complete morphology diagram of the photoresist, thereby providing users with a more intuitive morphology diagram. The process can also combine the expert experience in the database to provide reasonable suggestions for exposure parameter settings and layout corrections.

[0096] In addition, the application can also combine the actual calculation results with the simulation graphics database, and use AI technology to form a complete device morphology diagram, which contains the morphology information of the substrate layer and the photoresist layer. Then, the EBL BEAMER simulation robot can provide reasonable suggestions for exposure parameter settings and layout corrections based on the morphology diagram and combined with the expert experience in the database.

[0097] Furthermore, this application can also be combined with the process flow information in the user's experimental electronic record book to provide users with reasonable suggestions for the previous and next processes. For example: ① The electronic record book records the parameters of the user's previous glue coating. If it is judged that the glue is too thick, then the conventional dose exposure cannot be used in the exposure step, but the dose must be increased, or plasma bombardment is used for a few seconds in the next step to solve the above problem; ② If the simulated photoresist morphology is under-exposed, it may cause the bottom to be uneven during the next step of etching. At this time, the robot can suggest increasing the exposure dose or extending the development time, etc.

[0098] It is understandable that at the current stage, users have less data and the experience suggestions given are limited. In the future, this application can inject more model information and process suggestion information on this basis, and form a data analysis report, which can be provided to the instructor to understand the student's scientific research dynamics and review the authenticity of the scientific research results. It can also be combined with the intelligent system developed by NFF to combine personnel information and process information, so as to accurately provide users with reasonable suggestions, such as process steps, experimental time planning, etc.

[0099] It can be seen from the above description that the automated simulation method applied to semiconductor simulation software of the present application has significant improvements in many aspects, as follows:

[0100] 1) Reduce learning costs and simulate operations accurately: RPA can replace manual execution of complex and difficult-to-remember operation steps, saving the energy of scientific researchers. There is no need to spend time and effort on learning and practicing, and there is no need to worry about simulation failures caused by misoperation.

[0101] 2) Improve scientific research efficiency, and compress complex operations from hours to minutes: Eliminate the time waiting for simulation calculations, use AI to set multiple sets of experimental parameters, automatically execute multiple repeated processes in succession, and automatically modify parameter variables, without having to wait for a process to be calculated and then manually modify the parameters;

[0102] 3) Intelligent parameter optimization, reducing / replacing manual trial and error: RPA is combined with the AI ​​knowledge base to inject the experience and suggestions of experts, manufacturers and experienced operators in advance, and continuously update experimental data to provide users with reliable process suggestions and support, greatly shortening the process parameter exploration time, saving machine time and scientific research costs. AI can optimize multiple goals (such as performance, cost, time) at the same time and find the best combination of multiple goals;

[0103] 4) Intelligent data analysis and prediction, providing data insights and suggestions: Data can be traced back and analyzed, without the need for researchers to spend energy on memorizing, and historical data can be retrieved. Data analysis can be performed based on user-entered parameters, design processes, questions asked, simulation results, and other aspects to obtain valuable information and form a visual analysis report, which is equivalent to the user's electronic experimental record book; this function can also help users analyze experiments and accelerate the process of process development, thereby providing a more reliable basis and guidance for experiments;

[0104] 5) Flexible human-machine collaboration: The relevant parameters are set in the form of AI dialogue. The process is simple to operate and friendly to novices. Users can also gain more experience and knowledge by asking questions. After accumulating rich experience, users can also try the challenge version, which opens up more practical functions, thus helping to improve the authenticity and reliability of simulation results.

[0105] 6) Personalized teaching / training: It can be combined with virtual simulation teaching of semiconductor equipment to realize digital teaching of the entire software and hardware process and transform the traditional teaching mode; it uses RPA + AI and software simulation to create a personalized experimental teaching environment, and can automatically adjust the difficulty and sequence of experimental teaching content according to each user's learning progress and knowledge mastery;

[0106] 7) 24 / 7 execution: RPA can strictly follow the preset steps to operate the software 24 / 7, without manual supervision, and support nighttime or distributed simulation tasks, thereby greatly improving simulation efficiency;

[0107] 8) Cross-platform collaboration: Multiple software systems can be integrated in series, such as Tracer and LAB, to achieve data sharing and task collaboration;

[0108] 9) Cross-disciplinary collaboration: RPA+AI can help researchers transcend disciplinary boundaries and integrate knowledge and technology from different fields. For example, in multi-disciplinary research projects, RPA can deliver the latest experimental data in a timely manner, break down data silos, and ensure that all parties can analyze and make decisions based on the latest data.

[0109] 10) Multimodal interaction: RPA can combine multiple interaction methods such as AR, voice, gestures, etc. to guide users to complete complex operations;

[0110] 11) Establish predictive models and optimize experimental design: Extract data (parameters, results, experimental conditions) from historical simulation data to build knowledge graphs and predictive models. For example, when a new experiment is started, AI recommends relevant parameter settings or warns of potential conflicts. It can also determine the best parameter combination for various factors through optimization algorithms, provide new perspectives and directions, and improve the efficiency and effectiveness of the experiment.

[0111] The following is a description of an automated simulation device applied to semiconductor simulation software provided in an embodiment of the present application. The automated simulation device applied to semiconductor simulation software described below and the automated simulation method applied to semiconductor simulation software described above can be referenced to each other.

[0112] In one embodiment, Figure 7 As shown, Figure 7 A schematic diagram of the structure of an automated simulation device applied to semiconductor simulation software provided in an embodiment of the present application; the present application also provides an automated simulation device applied to semiconductor simulation software, including a simulation process determination module 210 and a simulation process execution module 220, specifically including the following:

[0113] The simulation process determination module 210 is used to call the EBL BEAMER simulation robot to interact with the experiment user when it is detected that the experiment user triggers a simulation request, and obtain the process parameters required for this simulation during the interaction process.

[0114] The simulation process execution module 220 is used to obtain and execute the corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, and then output the simulation result.

[0115] In the above embodiment, when it is detected that the experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction, and then output the simulation results after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters. This process uses the EBL BEAMER simulation robot to replace the complex and difficult to remember operation steps, thereby saving the energy of scientific researchers, and can automatically and continuously execute multiple repeated processes and automatically modify parameter variables, thereby eliminating the time for scientific researchers to wait for simulation calculations and saving machine time and scientific research costs.

[0116] Specifically, this application applies the process automation design of electron beam lithography simulation robot to the electron beam lithography process for micro-nano device manufacturing, upgrading the experiment from "manual operation + experience-driven" to a new paradigm of "automation + intelligence". Its design includes: 1) using RPA to replace manual completion of complex and difficult-to-remember basic software operations, such as: importing files, exporting and viewing results, format conversion, parameter setting, step execution, process design, drawing curves, etc.; 2) For operations that require technical experience and flexible design to perform, open operation permissions can be issued to advanced users through the setting of process parameters, such as: appropriate beam selection, graphic morphology size inspection, custom mark design, etc.; 3) providing basic process parameter data reference and historical data query functions, with 3D simulation result analysis and professional process suggestion functions, such as: 3D structure presents an over-exposure state, it will remind users to reduce the exposure dose, etc.; 4) using AI dialogue in the form of simple version and challenge version, users can choose a suitable robot to replace the operation according to their preferences and needs; 5) it can be combined with virtual simulation teaching of semiconductor equipment to realize digital teaching of the entire process of software and hardware, and transform the traditional teaching mode.

[0117] In one embodiment, the present application also provides a computer-readable storage medium, which stores computer-readable instructions. When the computer-readable instructions are executed by one or more processors, the one or more processors execute the steps of the automated simulation method applied to semiconductor simulation software as described in any of the above embodiments.

[0118] In one embodiment, the present application also provides a computer device, including: one or more processors, and a memory.

[0119] The memory stores computer-readable instructions, and when the computer-readable instructions are executed by the one or more processors, the steps of the automated simulation method applied to semiconductor simulation software as described in any one of the above embodiments are performed.

[0120] Indicatively, Figure 8 As shown, Figure 8 This is a schematic diagram of the internal structure of a computer device provided in an embodiment of the present application. The computer device 300 may be provided as a server. Figure 8The computer device 300 includes a processing component 302, which further includes one or more processors, and a memory resource represented by a memory 301 for storing instructions executable by the processing component 302, such as an application. The application stored in the memory 301 may include one or more modules, each corresponding to a set of instructions. In addition, the processing component 302 is configured to execute instructions to perform the automated simulation method applied to semiconductor simulation software of any of the above embodiments.

[0121] The computer device 300 may further include a power supply component 303 configured to perform power management of the computer device 300, a wired or wireless network interface 304 configured to connect the computer device 300 to a network, and an input / output (I / O) interface 305. The computer device 300 may operate based on an operating system stored in the memory 301, such as Windows Server TM, Mac OS X TM, Unix TM, Linux TM, Free BSD TM, or the like.

[0122] Those skilled in the art will understand that Figure 8 The structure shown in the figure is only a block diagram of a part of the structure related to the solution of the present application, and does not constitute a limitation on the computer device to which the solution of the present application is applied. The specific computer device may include more or fewer components than those shown in the figure, or combine certain components, or have a different arrangement of components.

[0123] Finally, it should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprises" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "including a..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0124] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The various embodiments can be combined as needed, and the same or similar parts can refer to each other.

[0125] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An automated simulation method applied to semiconductor simulation software, characterized in that: The method comprises: When it is detected that the experimental user triggers a simulation request, the EBL BEAMER simulation robot is called to interact with the experimental user, and the process parameters required for this simulation are obtained during the interaction; After the EBL BEAMER simulation robot acquires and executes the corresponding simulation process according to the process parameters, the simulation result is output.

2. The automated simulation method for semiconductor simulation software according to claim 1, characterized in that: The calling of the EBL BEAMER simulation robot to interact with the experimental user and obtain the process parameters required for this simulation during the interaction process includes: Invoke the EBL BEAMER simulation robot to display the executable simulation process to the experimental user, and obtain the process name corresponding to the simulation process selected by the experimental user from the executable simulation processes; After invoking the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experimental user, the process parameters input by the experimental user are received.

3. The automated simulation method for semiconductor simulation software according to claim 1, characterized in that: After the EBL BEAMER simulation robot acquires and executes the corresponding simulation process according to the process parameters, the simulation result is output, including: After the EBL BEAMER simulation robot determines the software type and simulation process connected to this simulation according to the process parameters, the simulation process is executed according to the process parameters and the software type.

4. The automated simulation method applied to semiconductor simulation software according to claim 3, characterized in that: When the process parameters are simplified process parameters, the simulation process is executed by the EBL BEAMER simulation robot according to the process parameters and the software type, including: The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported; The EBL BEAMER simulation robot is connected to the BEAMER software, and the LPSF file is imported into the BEAMER software according to the process parameters and simulated, and then the layout format recognizable by the semiconductor machine is exported, and the distribution of the electron energy absorbed by the photoresist molecules under different thicknesses is simulated.

5. The automated simulation method applied to semiconductor simulation software according to claim 3, characterized in that: When the process parameters are the process parameters of the challenge version, the simulation process is executed by the EBL BEAMER simulation robot according to the process parameters and the software type, including: The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported; The EBL BEAMER simulation robot is connected to the BEAMER software, and the LPSF file is imported into the BEAMER software according to the process parameters and simulated, and then a layout format recognizable by a semiconductor machine is exported, and the distribution of electron energy absorbed by photoresist molecules under different thicknesses is simulated; The EBL BEAMER simulation robot is connected to the LAB software, and the photoresist morphology after development is simulated in the LAB software according to the process parameters.

6. The automated simulation method for semiconductor simulation software according to claim 1, characterized in that: The method further comprises: During the process of the EBL BEAMER simulation robot executing the simulation process, the robot interacts with the experimental user according to the requirements of the simulation process or the user's requirements, and continues or cancels the execution of the simulation process according to the interaction result.

7. The automated simulation method applied to semiconductor simulation software according to any one of claims 1 to 6, characterized in that: When the simulation result is a photoresist morphology after development, the method further includes: The EBL BEAMER simulation robot calculates a complete photoresist morphology diagram or a complete device morphology diagram based on the photoresist morphology, and provides reasonable suggestions for exposure parameter settings and layout corrections to the experimental user based on the morphology diagram and expert experience in the database.

8. An automated simulation device applied to semiconductor simulation software, characterized in that: include: The simulation process determination module is used to call the EBL BEAMER simulation robot to interact with the experimental user when it is detected that the experimental user triggers a simulation request, and obtain the process parameters required for this simulation during the interaction process; The simulation process execution module is used to obtain and execute the corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, and then output the simulation result.

9. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer-readable instructions, and when the computer-readable instructions are executed by one or more processors, the one or more processors execute the steps of the automated simulation method applied to semiconductor simulation software as described in any one of claims 1 to 7.

10. A computer device, characterized in that: include: one or more processors, and memory; The memory stores computer-readable instructions, and when the computer-readable instructions are executed by the one or more processors, the steps of the automated simulation method applied to semiconductor simulation software as claimed in any one of claims 1 to 7 are performed.

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