Plasma generator, low-temperature plasma activated water preparation device and use method of low-temperature plasma activated water preparation device

Abstract

The invention relates to the technical field of plasma activated water preparation, in particular to a plasma generator, a low-temperature plasma activated water preparation device and a use method of the low-temperature plasma activated water preparation device. The plasma generator comprises a water bin and an ionization bin, gas is ionized for the first time in the ionization bin and then enters the water bin to be ionized for the second time, and a two-stage ionization mechanism is formed. The low-temperature plasma activated water preparation device comprises an air conditioning system, an air inlet of the air conditioning system is connected with an air pump, and an air outlet of the air conditioning system is connected with an air inlet of a plasma generator; a water inlet of the plasma generator is connected with the water pump; a water outlet of the plasma generator is connected with a water inlet in the reaction bin, and a water outlet in the reaction bin is connected with a water drainage valve through a pipeline; an exhaust port of the plasma generator is connected with an aeration port in the bottom of the reaction bin, and an exhaust port of the reaction bin is connected with a tail gas treatment device.

Description

Technical Field

[0001] The invention relates to the technical field of plasma activated water preparation, and in particular to a plasma generator, a low-temperature plasma activated water preparation device and a use method thereof. Background Art

[0002] Low-temperature plasma activated water technology has shown broad application prospects in agricultural sterilization, medical disinfection, food processing and other fields in recent years due to its high efficiency and environmental protection. Traditional plasma activated water preparation mostly adopts single gas discharge or direct liquid phase discharge, which has bottlenecks such as low efficiency of active substance generation, insufficient gas utilization, and high energy consumption. Existing equipment usually separates gas ionization from water treatment, resulting in short life of active particles and limited mass transfer efficiency; at the same time, by-products such as ozone and nitrogen oxides generated by gas discharge lack effective treatment, which can easily cause secondary pollution. In addition, the structural design of conventional devices does not fully consider the synergistic enhancement mechanism of gas-liquid two-phases, and most equipment adopts the same cavity continuous treatment mode, resulting in unstable activated water concentration and limited treatment scale.

[0003] In current technology, although some studies have attempted to improve the activation effect through multi-stage discharge or gas-liquid mixed phase treatment, there are generally problems such as unreasonable electrode structure design (such as parallel plate electrodes are prone to local overheating) and unscientific dielectric layer configuration (affecting discharge uniformity). Especially in devices where water is used as a conductive medium to participate in discharge, the energy loss is often large due to insufficient contact area between the electrode and water, and there is a lack of effective control over the bubble dynamics behavior, making it difficult to achieve stable and efficient gas-liquid interface discharge. In addition, traditional tail gas treatment mostly uses independent purification units, which do not fully utilize the secondary reaction potential of residual active gases, resulting in waste of resources. Therefore, it is urgent to develop a low-temperature plasma activated water preparation system that integrates gas precision control, step ionization enhancement, gas-liquid synergistic reaction and tail gas recycling to break through the bottleneck of existing technologies and improve the quality of activated water and process economy. Summary of the invention

[0004] In view of the problems existing in the prior art, the present invention provides a low-temperature plasma activated water preparation device.

[0005] The present invention is achieved through the following technical solutions: A plasma generator comprises a water chamber and an ionization chamber; The ionization chamber is cylindrical, and comprises a first dielectric layer and a second dielectric layer, a ground electrode is arranged between the first dielectric layer and the second dielectric layer, a high-voltage electrode is arranged in a cavity surrounded by the second dielectric layer, the ground electrode and the first dielectric layer, and one end of the high-voltage electrode is serrated; An end cap is provided at one end of the ionization chamber away from the water chamber, and an air inlet is provided on the end cap; the air inlet is connected to the cavity formed by the high-voltage electrode and the first dielectric layer; The ionization chamber and the water chamber are connected, the water chamber is welded on the ground electrode of the ionization chamber, and the ionization chamber is located in the middle and upper part of the water chamber.

[0006] The water tank is in a rectangular shape, with a water inlet and an exhaust port at the top and a drain port at the bottom; The air inlet is used to introduce the mixed gas to be ionized, the water inlet is used to introduce water into the water tank, the drain outlet is used to discharge the activated water, and the exhaust port is used to discharge the residual active gas.

[0007] Furthermore, the first dielectric layer and the ground electrode have the same length, and the high-voltage electrode is 1-5 cm shorter than the ground electrode.

[0008] Furthermore, the high-voltage electrode and the ground electrode are made of conductive materials; and the first dielectric layer and the second dielectric layer are made of insulating materials.

[0009] The ionization chamber of the present invention is designed to be cylindrical to ensure uniform electric field distribution, avoid local discharge overheating problems that are prone to occur in parallel plate electrodes, and improve discharge stability. A ground electrode is arranged between the first dielectric layer (inner layer) and the second dielectric layer (outer layer) to form double insulation protection. The serrated end of the high-voltage electrode enhances the ionization intensity. By utilizing the electric field concentration principle and the tip discharge effect, it is easier to break through the gas in the bubble to generate corona discharge or micro-arc discharge, significantly improving the ionization efficiency at the gas-liquid interface and promoting the efficient generation of active particles. The ionization chamber is integrated with the water chamber, and the gas directly enters the water chamber after the initial ionization in the ionization chamber, contacts with water in the form of bubbles, and expands the gas-liquid reaction interface. The water chamber wall is welded to the ground electrode, so that the water becomes an extended conductor of the ground electrode, forming a closed loop, reducing the corrosion risk of the electrode directly contacting the water, and optimizing the discharge energy transfer by utilizing the conductive properties of the water body. The air inlet is connected to the ionization chamber cavity to ensure that the gas is evenly distributed around the high-voltage electrode and avoid local airflow dead corners.

[0010] A low-temperature plasma activated water preparation device, comprising a gas conditioning system, a reaction chamber, a plasma generator, a tail gas treatment device, a water pump, and an air pump; The air inlet of the gas conditioning system is connected to the air pump through an air pipe, the gas is sucked into the gas conditioning system through the air pump, and the gas ratio is adjusted by the gas conditioning system; the gas outlet of the gas conditioning system is connected to the air inlet of the plasma generator through a pipeline; The water inlet of the plasma generator is connected to the water pump through a pipeline; The drain outlet of the plasma generator is connected to the water inlet on the reaction chamber through a pipeline, and the drain outlet in the reaction chamber is connected to the drain valve through a pipeline; The exhaust port of the plasma generator is connected to the aeration port at the bottom of the reaction chamber through a pipeline, and the exhaust port of the reaction chamber is connected to the tail gas treatment device through a pipeline.

[0011] Furthermore, the low-temperature plasma activated water preparation device comprises a shell, which is divided into an upper and lower layer and separated by a partition; At the upper part of the shell, two vertical plates are installed between the partition and the top plate of the shell, and the first epoxy resin plate and the second epoxy resin plate are fixed to the front and rear of the two vertical plates, the plasma generator is fixed on the first epoxy resin plate, and the plasma power supply is fixed on the second epoxy resin plate; below the plasma generator, an air pump is installed on the partition; Below the partition, two horizontal plates are installed between the side walls of the shell, a reaction chamber is fixed on the horizontal plates, an air conditioning system is installed on the bottom plate of the shell, and a water pump is installed behind the air conditioning system; above the reaction chamber, an exhaust gas treatment device is installed on the partition; an exhaust gas decomposition catalyst is placed in the exhaust gas treatment device.

[0012] Furthermore, a blower is installed on the upper side wall of the shell.

[0013] A method for using a low-temperature plasma activated water preparation device comprises the following steps: (1) After starting up, start the gas conditioning system first, and continuously pass the gas in the right proportion into the plasma generator; (2) The water pump injects water into the water inlet of the water tank of the plasma generator. When the water level is higher than the horizontal plane where the highest point of the ground electrode is located, the plasma power supply supplies power to the plasma generator; (3) The gas is ionized for the first time in the space between the inner wall of the first dielectric layer and the outer wall of the high-voltage electrode, and is injected into the water tank to form bubbles in the water; (4) Since the water in the water tank is in contact with the ground electrode through the water tank wall, and water is a conductor, the electric field at the jagged end of the high-voltage electrode will break through the bubbles and discharge to the water, forming a second ionization; (5) During the continuous ionization, ordinary water is converted into plasma activated water and flows into the reaction chamber through the drain port, and the residual active gas is discharged to the aeration device at the bottom of the reaction chamber through the exhaust port; (6) After the activated water in the reaction chamber reacts again with the residual active gas, the high-concentration activated water is discharged to the outside through the drain valve.

[0014] (7) A tail gas discharge port is provided on the top of the reaction chamber, which is connected to the tail gas treatment device, and the treated tail gas is discharged into the atmosphere.

[0015] Beneficial technical effects of the present invention: (1) Stepped ionization to enhance the generation of active substances The two-stage ionization mechanism is formed by combining the primary ionization of the gas in the ionization chamber (gas phase discharge) with the secondary ionization of the bubbles in the water chamber (gas-liquid interface discharge). The sawtooth high-voltage electrode design enhances the electric field breakdown efficiency, significantly improves the generation efficiency of active particles and gas utilization, and breaks through the technical bottleneck of low efficiency of the traditional single discharge mode.

[0016] (2) The present invention innovatively integrates the water chamber and the ionization chamber, using water as a conductor to contact the ground electrode to expand the gas-liquid contact area. The residual active gas reacts with the activated water through the reaction chamber to achieve gas-liquid two-phase synergistic enhanced mass transfer, ensuring the stability of the activated water concentration and the scalability of the treatment scale.

[0017] (3) The present invention further treats the tail gas from the reaction chamber through a tail gas treatment device, and renders the by-products such as ozone and nitrogen oxides that have not been completely reacted harmless, thereby reducing secondary pollution.

[0018] (4) The present invention adopts a cylindrical ionization chamber structure in which the electrode is wrapped with a dielectric layer, and optimizes the length of the high-voltage electrode (1-5 cm shorter than the ground electrode), which effectively avoids the problem of local overheating and ensures discharge uniformity.

[0019] (5) The modular shell layout (upper and lower layers, fixed with epoxy resin plates) of the present invention enhances the compactness and anti-electromagnetic interference capability of the equipment and reduces energy loss. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 is a schematic diagram of the structure of a plasma generator; Figure 2 is a cross-sectional schematic diagram of a plasma generator; Figure 3 This is a schematic diagram of the external structure of a low-temperature plasma activated water preparation device; Figure 4 This is a schematic diagram of the internal structure of a low-temperature plasma activated water preparation device; Figure 5 This is the internal front view of the low-temperature plasma activated water preparation device; Figure 6 This is the internal rear view of the low-temperature plasma activated water preparation device; Figure 7 It is a schematic diagram of the structure of the shell of the low-temperature plasma activated water preparation device; Figure 8 is a bottom view of a plasma generator; In the figure: 1. plasma generator, 2. water tank, 3. ionization tank, 4. first dielectric layer, 5. second dielectric layer, 6. ground electrode, 7. high voltage electrode, 8. end cover, 9. air inlet, 10. water inlet, 11. exhaust port, 12. drain port, 13. gas conditioning system, 14. reaction tank, 15. tail gas treatment device, 16. water pump, 17. air pump, 18. shell, 19. partition, 20. vertical plate, 21. first epoxy resin plate, 22. second epoxy resin plate, 23. plasma power supply, 24. blower, 25. horizontal plate. DETAILED DESCRIPTION

[0021] The present invention will be further described below in conjunction with the accompanying drawings.

[0022] See also Figure 1-2 8. A plasma generator 1 includes a rectangular water tank 2 and a cylindrical ionization tank 3; the ionization tank 3 is designed to be cylindrical to ensure uniform electric field distribution, avoid local discharge overheating problems easily caused by parallel plate electrodes, and improve discharge stability.

[0023] The ionization chamber 3 comprises a first dielectric layer 4 and a second dielectric layer 5, wherein the first dielectric layer 4 and the second dielectric layer 5 are made of insulating materials, such as quartz glass. The water chamber 2 is made of conductive materials, such as stainless steel.

[0024] A ground electrode 6 is disposed between the first dielectric layer 4 and the second dielectric layer 5 to form double insulation protection. A high voltage electrode 7 is disposed in the cavity surrounded by the second dielectric layer 5, the ground electrode 6 and the first dielectric layer 4. The high voltage electrode 7 and the ground electrode 6 are made of conductive materials, such as stainless steel.

[0025] One end of the high-voltage electrode 7 is serrated; the serrated end of the high-voltage electrode 7 enhances the ionization intensity and utilizes the electric field concentration principle and the tip discharge effect, making it easier to break through the gas in the bubble to generate corona discharge or micro-arc discharge, significantly improving the ionization efficiency at the gas-liquid interface and promoting the efficient generation of active particles.

[0026] The first dielectric layer 4 and the ground electrode 6 have the same length, and the high-voltage electrode 7 is 1-5 cm shorter than the ground electrode. The first dielectric layer 4 and the ground electrode 6 have the same length, ensuring that the dielectric layer completely covers the surface of the ground electrode 6 to form a continuous insulation barrier. This design allows the ground electrode 6 to be wrapped in the dielectric layer as a whole, eliminating the exposed area at the edge of the electrode, avoiding non-uniform discharge such as edge arc caused by edge electric field distortion during high-voltage discharge, and ensuring uniform electric field distribution in the ionization chamber 3.

[0027] The length of the high-voltage electrode 7 is 1-5 cm shorter than that of the ground electrode 6, so that its serrated discharge end is always within the coverage of the ground electrode 6 and the dielectric layer. This design limits the exposed length of the end of the high-voltage electrode 7 beyond the dielectric layer, avoids air breakdown or local tip discharge caused by the electrode end being out of the protection of the dielectric layer, and reduces invalid energy loss.

[0028] The end of the ionization chamber 3 away from the water tank 2 is provided with an end cover 8, and the end cover 8 is provided with an air inlet 9; the air inlet 9 is connected to the cavity formed by the high-voltage electrode 7 and the first dielectric layer 4, so that the gas can be evenly distributed when entering, avoiding excessive or insufficient local airflow, which leads to uneven discharge. The gas enters the annular cavity between the high-voltage electrode 7 and the first dielectric layer 4 axially from the air inlet 9 of the end cover 8 of the ionization chamber 3, forcing the gas to flow in a spiral along the outer wall of the high-voltage electrode 7. This path design prolongs the residence time of the gas near the sawtooth end of the high-voltage electrode 7 in the strong electric field area, ensuring that it enters the water tank 2 after being fully ionized, thereby improving the gas activation efficiency.

[0029] The ionization chamber 3 and the water chamber 2 are connected, and the water chamber 2 is welded on the ground electrode 6 of the ionization chamber 3. The ionization chamber 3 is located in the middle and upper part of the water chamber 2. The gas activated by the ionization chamber 3 enters the water chamber 2 through the through hole, and naturally floats up to form a uniform micro bubble group due to the density difference, greatly expanding the gas-liquid reaction interface, promoting the dissolution and diffusion of active particles into water, and greatly improving the mass transfer efficiency by 40%.

[0030] During the rising process, the microbubbles are broken down by the electric field at the sawtooth end of the high-voltage electrode 7 in the water tank 2, triggering gas-liquid interface discharge and liquid phase conduction discharge, generating additional active species, achieving gas-liquid two-phase cascade activation, and breaking through the concentration bottleneck of single gas phase discharge.

[0031] The water tank 2 is provided with a water inlet 10 and an exhaust port 11 at the top, and a drain port 12 at the bottom; the air inlet 9 is used to introduce the mixed gas to be ionized, the water inlet 10 is used to introduce water into the water tank 2, the drain port 12 is used to discharge the activated water, and the exhaust port 11 is used to discharge the residual active gas.

[0032] See also Figure 3-6A low-temperature plasma activated water preparation device includes a gas conditioning system 13, a reaction chamber 14, a plasma generator 1, an exhaust gas treatment device 15, a water pump 16, and an air pump 17; the air inlet 9 of the gas conditioning system 13 is connected to the air pump 17 through an air pipe, the gas is sucked into the gas conditioning system 13 through the air pump 17, and the gas ratio is adjusted by the gas conditioning system 13; the gas outlet of the gas conditioning system 13 is connected to the gas inlet 9 of the plasma generator 1 through a pipeline; the gas conditioning system 13 mixes oxygen and nitrogen in a specific ratio. The mixed gas is connected to the gas inlet 9 of the plasma activated water generator through a pipeline. The water inlet 10 of the plasma generator 1 is connected to the water pump 16 through a pipeline; the drain outlet 12 of the plasma generator 1 is connected to the water inlet 10 on the reaction chamber 14 through a pipeline, and the water outlet in the reaction chamber 14 is connected to the drain valve through a pipeline; the exhaust port 11 of the plasma generator 1 is connected to the aeration port at the bottom of the reaction chamber 14 through a pipeline, and the gas outlet of the reaction chamber 14 is connected to the exhaust gas treatment device 15 through a pipeline.

[0033] See also Figure 7 The low-temperature plasma activated water preparation device includes a shell 18, which is divided into an upper and lower layer and separated by a partition 19; the shell 18 is separated into an upper and lower layer by the partition 19 to achieve physical isolation between the upper layer of the electrical system and the lower layer of the fluid system, thereby avoiding the risk of circuit short circuit caused by water vapor leakage and reducing the impact of electromagnetic interference on the control module.

[0034] At the upper part of the shell 18, two vertical plates 20 are installed between the partition 19 and the top plate of the shell 18, and the first epoxy resin plate 21 and the second epoxy resin plate 22 are fixed to the front and rear of the two vertical plates 20, and the plasma generator 1 is fixed on the first epoxy resin plate 21, and the plasma power supply 23 is fixed on the second epoxy resin plate; the first epoxy resin plate 21 and the second epoxy resin plate 22 serve as mounting substrates for the plasma generator 1 and the plasma power supply 23, and their high insulation can effectively isolate the electromagnetic interference generated by high-voltage discharge to prevent the risk of leakage; at the same time, they can withstand the active gases such as NOx, O 3 Corrosion, prolonging the life of the equipment. Below the plasma generator 1, an air pump 17 is installed on the partition 19.

[0035] Below the partition 19, two horizontal plates 25 are installed between the side walls of the shell 18, and the reaction chamber 14 is fixed on the horizontal plates 25. The gas conditioning system 13 is installed on the bottom plate of the shell 18, and the water pump 16 is installed behind the gas conditioning system 13. Above the reaction chamber 14, an exhaust gas treatment device 15 is installed on the partition 19; the exhaust gas decomposition catalyst is placed in the exhaust gas treatment device 15. The exhaust gas treatment device 15 is located above the reaction chamber 14, and utilizes the natural rising characteristics of the gas to make the incompletely reacted active gases such as O 3The gas directly enters the processing device through the exhaust port 11 at the top of the reaction chamber 14 without the need for additional power drive, and the harmless gas after catalytic decomposition can be quickly discharged from the shell 18.

[0036] The upper layer uses double vertical plates 20 + epoxy resin plates to fix the plasma generator 1 and the plasma power supply 23, and the lower layer uses double horizontal plates 25 to support the reaction chamber 14, forming a three-dimensional frame structure to enhance the overall mechanical strength and resist vibration and impact during the operation of the equipment. A blower 24 is installed on the upper side wall of the housing 18 for heat dissipation.

[0037] The method for using the low-temperature plasma activated water preparation device comprises the following steps: S1, after starting up, start the gas conditioning system 13, and continuously introduce the gas in a well-proportioned manner into the plasma generator 1; S2, the water pump 16 injects water into the water inlet 10 of the water tank 2 of the plasma generator 1, and after the water level is higher than the horizontal plane where the highest point of the ground electrode is located, the plasma power supply 23 supplies power to the plasma generator 1; S3, the gas is ionized for the first time in the space between the inner wall of the first dielectric layer 4 and the outer wall of the high-voltage electrode 7, and is injected into the water tank 2 to form bubbles in the water; S4, because the water in the water tank 2 contacts the ground electrode 6 through the wall of the water tank 2, and water is a conductor, the electric field at the sawtooth end of the high-voltage electrode 7 will break through the bubbles and discharge to the water, forming a second ionization; S5. During continuous ionization, ordinary water is converted into plasma activated water and flows into the reaction chamber 14 through the drain port 12, and the residual active gas is discharged to the aeration device at the bottom of the reaction chamber 14 through the exhaust port 11; S6, after the activated water in the reaction chamber 14 reacts with the residual active gas again, the high-concentration activated water is discharged to the outside through the drain valve; S7. A tail gas discharge port is provided on the top of the reaction chamber 14, and the discharge port is connected to the tail gas treatment device 15, and the treated tail gas is discharged into the atmosphere.

Claims

1. A plasma generator, characterized in that: It comprises a water chamber (2) and an ion chamber (3); The ionization chamber (3) is cylindrical and comprises a first dielectric layer (4) and a second dielectric layer (5); a ground electrode (6) is provided between the first dielectric layer (4) and the second dielectric layer (5); a high-voltage electrode (7) is provided in a cavity surrounded by the second dielectric layer (5), the ground electrode (6) and the first dielectric layer (4); one end of the high-voltage electrode (7) is serrated; An end cover (8) is provided at one end of the ionization chamber (3) away from the water chamber (2), and an air inlet (9) is provided on the end cover (8); the air inlet (9) is in communication with a cavity formed by the high-voltage electrode (7) and the first dielectric layer (4); The ionization chamber (3) and the water chamber (2) are connected, the water chamber (2) is welded to the ground electrode (6) of the ionization chamber (3), and the ionization chamber (3) is located in the middle and upper part of the water chamber (2); The water tank (2) is in the shape of a rectangular parallelepiped, with a water inlet (10) and an air outlet (11) provided at the top, and a water outlet (12) provided at the bottom; The air inlet (9) is used to introduce the mixed gas to be ionized, the water inlet (10) is used to introduce water into the water tank (2), the water outlet (12) is used to discharge the activated water, and the air outlet (11) is used to discharge the residual active gas.

2. The plasma generator according to claim 1, characterized in that: The first dielectric layer (4) and the ground electrode (6) have the same length, and the high-voltage electrode (7) is 1-5 centimeters shorter than the ground electrode (6).

3. The plasma generator according to claim 1, characterized in that: The high-voltage electrode (7) and the ground electrode (6) are made of conductive materials; and the first dielectric layer (4) and the second dielectric layer (5) are made of insulating materials.

4. A low-temperature plasma activated water preparation device, characterized in that: It comprises an atmosphere conditioning system (13), a reaction chamber (14), the plasma generator (1) according to claim 1, an exhaust gas treatment device (15), a water pump (16), and an air pump (17); The air inlet (9) of the gas conditioning system (13) is connected to the air pump (17) via an air pipe, the gas is sucked into the gas conditioning system (13) via the air pump (17), and the gas ratio is adjusted using the gas conditioning system (13); the gas outlet of the gas conditioning system (13) is connected to the air inlet (9) of the plasma generator (1) via a pipeline; The water inlet (10) of the plasma generator (1) is connected to a water pump (16) via a pipeline; The water outlet (12) of the plasma generator (1) is connected to the water inlet (10) on the reaction chamber (14) through a pipeline, and the water outlet in the reaction chamber (14) is connected to the water drain valve through a pipeline; The exhaust port (11) of the plasma generator (1) is connected to the aeration port at the bottom of the reaction chamber (14) via a pipeline, and the gas outlet of the reaction chamber (14) is connected to the tail gas treatment device (15) via a pipeline.

5. The low-temperature plasma activated water preparation device according to claim 4, characterized in that: The low-temperature plasma activated water preparation device comprises a shell (18), wherein the shell (18) is divided into an upper and lower layer, which are separated by a partition (19); At the upper part of the shell (18), two vertical plates (20) are installed between the partition (19) and the top plate of the shell (18); a first epoxy resin plate (21) and a second epoxy resin plate (22) are fixed to the front and rear of the two vertical plates (20); a plasma generator (1) is fixed to the first epoxy resin plate (21), and a plasma power supply (23) is fixed to the second epoxy resin plate; below the plasma generator (1), an air pump (17) is installed on the partition (19); Two horizontal plates (25) are installed between the side walls of the shell (18) below the partition (19), a reaction chamber (14) is fixed on the horizontal plates (25), an air conditioning system (13) is installed on the bottom plate of the shell (18), and a water pump (16) is installed behind the air conditioning system (13); an exhaust gas treatment device (15) is installed on the partition (19) above the reaction chamber (14); an exhaust gas decomposition catalyst is placed in the exhaust gas treatment device (15).

6. The low-temperature plasma activated water preparation device according to claim 5, characterized in that: A blower (24) is mounted on the upper side wall of the housing (18).

7. A method for using the low-temperature plasma activated water preparation device as claimed in any one of claims 4 to 6, characterized in that: The steps include: S1. After starting up, start the gas conditioning system (13) and continuously introduce the gas in a properly adjusted ratio into the plasma generator (1); S2, the water pump (16) injects water into the water inlet (10) of the water tank (2) of the plasma generator (1), and after the water level is higher than the horizontal plane where the highest point of the ground electrode is located, the plasma power supply (23) supplies power to the plasma generator (1); S3, the gas is ionized for the first time in the space between the inner wall of the first dielectric layer (4) and the outer wall of the high-voltage electrode (7), and is injected into the water tank (2), forming bubbles in the water; S4. Since the water in the water tank (2) contacts the ground electrode (6) through the wall of the water tank (2), and the water is a conductor, the electric field at the sawtooth end of the high-voltage electrode (7) will break through the air bubble and discharge to the water, thus forming a second ionization; S5. During continuous ionization, ordinary water is converted into plasma activated water and flows into the reaction chamber (14) through the drain port (12), and the residual active gas is discharged to the aeration device at the bottom of the reaction chamber (14) through the exhaust port (11); S6, after the activated water in the reaction chamber (14) reacts with the residual active gas again, the high-concentration activated water is discharged to the outside through the drain valve; S7. A tail gas discharge port is provided on the top of the reaction chamber (14), and the tail gas discharge port is connected to the tail gas treatment device (15), and the treated tail gas is discharged into the atmosphere.

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