Anti-reflection film and preparation method and application thereof

Abstract

The invention relates to an anti-reflection film and a preparation method and application thereof. The anti-reflection film comprises a transparent optical adhesive layer, a film body base material, a hardened layer, an anti-reflection layer and an anti-fingerprint layer which are sequentially arranged in a stacked mode. The anti-reflection layer comprises a first inorganic layer, a first organic layer and a second organic layer which are stacked in sequence; or the anti-reflection layer comprises a third organic layer, a second inorganic layer and a fourth organic layer which are stacked in sequence; the refractive index of the first organic layer is greater than that of the first inorganic layer; the refractive index of the first inorganic layer is greater than that of the second organic layer; the refractive index of the second inorganic layer is greater than that of the third organic layer; the refractive index of the third organic layer is larger than that of the fourth organic layer. According to the anti-reflection film, the structure of the anti-reflection layer is designed, and the relation of the refractive index of the anti-reflection layer is limited, so that the anti-reflection film can reduce reflected light of a screen, and the transmittance of the anti-reflection film does not change after the anti-reflection film is bent for 20000 times.

Description

Technical Field

[0001] The present invention relates to the technical field of optical thin film preparation, and particularly to an antireflection film, a preparation method thereof, and an application thereof. Background Art

[0002] For foldable mobile phones, foldable computers, and some other flexible wearable electronic devices, an antireflection film with excellent antireflection and antiscratch performance and good bending resistance has good application prospects. The antireflection film can significantly reduce the reflection on the screen surface, improve the clarity and visibility of the display effect, and at the same time can relieve eye fatigue and improve user comfort. The preparation of such an antireflection film usually involves an optical interference film, which is composed of a single layer, two layers, or more than two layers of optical thin films. Through special optical design and material selection, the absorption of visible light of different wavelengths is achieved, thereby achieving the effect of reducing reflection.

[0003] CN118483774A provides an antireflection film and a preparation method thereof. The antireflection film includes a base film, a hard coating, and a low-refractive-index layer arranged in a stacked manner in sequence. It has good scratch resistance and wear resistance. After 200,000 bends, there is no peeling, cracking, etc. on the film surface, and at the same time, the average reflectivity can be reduced to less than 2%, and the structure is relatively simple. However, compared with dry preparation, the adhesion between the coatings of this purely wet-prepared antireflection film is relatively poor, the wear resistance is poor, and the average reflectivity and the lowest reflectivity limit value are relatively high.

[0004] The antireflection film provided by CN115793111A includes a substrate and a microstructure layer. The microstructure layer includes a plurality of microstructures arranged at intervals. There are concave holes between adjacent microstructures. By setting the aperture and depth of the concave holes to be less than the optical wavelength, the light wave cannot recognize the microstructures, so the refractive index shows a gradient change along the vertical direction of the microstructures, forming a refractive index transition layer, thereby reducing the reflection phenomenon caused by the sharp change in refractive index. However, the design process of such microstructures is relatively cumbersome and difficult to be applied industrially, and the concave holes between the microstructures may cause a decrease in the wear resistance of the antireflection film.

[0005] CN221124912U provides a broadband ultra-low antireflection optical thin film, which uses a variety of inorganic materials for dozens of layers of coating, and achieves an ultra-low antireflection effect in the visible light range through a relatively simple process. This purely dry multi-layer film design has a short cycle and good antireflection effect. However, the design of this dozens-of-layers coating process has high requirements for coating materials, high costs, low efficiency in large-scale industrial production, and certain requirements for the temperature resistance of the substrate during evaporation coating; in addition, the multi-stack inorganic materials with a relatively high thickness have relatively large stress during the bending process and are not suitable for application on foldable screens.

[0006] In summary, it is necessary to develop an anti-reflection film and a preparation method thereof, and prepare an anti-reflection film with good adhesion between coatings, good wear resistance, good anti-reflection effect and good bending resistance through a simple and low-cost method. Summary of the Invention

[0007] To solve the above technical problems, the present invention provides an anti-reflection film, a preparation method thereof and an application thereof. By defining the materials of each layer in the anti-reflection film and designing the structure of its anti-reflection layer, the anti-reflection film can reduce the reflected light of the screen and improve the imaging quality during use.

[0008] To achieve this purpose, the present invention adopts the following technical solutions:

[0009] In a first aspect, the present invention provides an anti-reflection film, which includes a transparent optical adhesive layer, a film substrate, a hardening layer, an anti-reflection layer and an anti-fingerprint layer that are sequentially stacked;

[0010] The anti-reflection layer includes a first inorganic layer, a first organic layer and a second organic layer that are sequentially stacked; or, the anti-reflection layer includes a third organic layer, a second inorganic layer and a fourth organic layer that are sequentially stacked;

[0011] Wherein, the refractive index of the first organic layer is greater than that of the first inorganic layer;

[0012] The refractive index of the first inorganic layer is greater than that of the second organic layer;

[0013] The refractive index of the second inorganic layer is greater than that of the third organic layer;

[0014] The refractive index of the third organic layer is greater than that of the fourth organic layer.

[0015] The present invention provides a transparent optical adhesive layer on one side of the film substrate, so that the anti-reflection film can be attached to the surface of the flexible screen to protect the screen. At the same time, a hardening layer, an anti-reflection layer and an anti-fingerprint layer are sequentially stacked on the other side of the film substrate. Among them, the hardening layer can improve the hardness, flatness and scratch resistance of the film substrate, the anti-reflection layer can improve the transmittance of the film substrate to visible light and reduce the reflectivity, and the anti-fingerprint layer can improve the scratch resistance and stain resistance of the anti-reflection film. At the same time, setting the anti-fingerprint layer can reduce the scattering and interference of light on the screen, and can effectively resist the wear during the daily use of the screen, making the screen surface smoother, with a comfortable feel and not easy to scratch, thereby improving the touch experience of the user.

[0016] Meanwhile, by designing the structure of the anti-reflection layer, according to the principles of optical thin film design and the principle of destructive interference of light, the refractive indices of the anti-reflection layer with a three-layer structure are arranged in a middle, high, and low order from bottom to top, so that when only a transparent optical adhesive layer, a film substrate, a hardening layer, an anti-reflection layer, and an anti-fingerprint layer are stacked, the reflectivity of the anti-reflection film for visible light in the 380-780 nm band can be reduced to less than 1%, the reflectivity for visible light in the 500-700 nm band can be reduced to less than 0.5%, and the lowest reflectivity can be reduced to less than 0.3%, effectively achieving the effect of anti-reflection and increasing transmittance.

[0017] Preferably, the anti-reflection film of the present invention is only composed of a transparent optical adhesive layer, a film substrate, a hardening layer, an anti-reflection layer, and an anti-fingerprint layer stacked in sequence, without additionally providing other film layers.

[0018] As a preferred technical solution of the present invention, the material of the transparent optical adhesive layer includes any one or at least two combinations of solid optical adhesive (Optically Clear Adhesive, OCA), liquid optical adhesive (Optically Clear Resin, OCR), or ultraviolet (Ultraviolet, UV) curable optical adhesive. Typical but non-limiting combinations include: the combination of OCA and OCR, the combination of OCA and UV curable optical adhesive, the combination of OCR and UV curable optical adhesive, and the combination of OCA, OCR, and UV curable optical adhesive.

[0019] Preferably, the visible light transmittance of the transparent optical adhesive layer > 90%, for example, it can be 91%, 92%, 93%, 94%, or 95%, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable.

[0020] Preferably, the thickness of the transparent optical adhesive layer is 20-50 μm, for example, it can be 20 μm, 30 μm, 40 μm, or 50 μm, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable.

[0021] Preferably, the material of the film body substrate includes any one or a combination of at least two of Tri-Acetate Cellulose (TAC), Polycarbonate (PC), Poly(methyl methacrylate) (PMMA), Polystyrene (PS), Thermoplastic Polyurethane (TPU), Polyethylene terephthalate (PET), or Polyimide (PI). Typical but non-limiting combinations include: the combination of TAC and PC, the combination of TAC and PMMA, the combination of TAC and PS, the combination of TAC and TPU, the combination of TAC and PET, the combination of TAC and PI, the combination of TAC, PC, and PMMA, the combination of TAC, PC, and PS, the combination of TAC, PC, and TPU, the combination of TAC, PC, and PET, the combination of TAC, PC, and PI, the combination of TAC, PC, PMMA, and PS, the combination of TAC, PC, PMMA, and TPU, the combination of TAC, PC, PMMA, and PET, the combination of TAC, PC, PMMA, and PI, the combination of TAC, PC, PMMA, PS, and TPU, the combination of TAC, PC, PMMA, PS, and PET, the combination of TAC, PC, PMMA, PS, and PI, the combination of TAC, PC, PMMA, PS, TPU, and PET, the combination of TAC, PC, PMMA, PS, TPU, and PI, the combination of TAC, PC, PMMA, PS, TPU, PET, and PI.

[0022] Preferably, the visible light transmittance of the film body substrate > 90%, for example, it can be 90.5%, 91%, 91.5%, 92%, 92.5%, or 93%, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable.

[0023] Preferably, the haze value of the film body substrate < 1%, for example, it can be 0.1%, 0.3%, 0.5%, 0.7%, or 0.9%, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable.

[0024] Preferably, the thickness of the film body substrate is 25 - 125 μm, for example, it can be 25 μm, 40 μm, 50 μm, 60 μm, 75 μm, 100 μm, or 125 μm, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable, and preferably 40 - 60 μm.

[0025] Preferably, the material of the film body substrate is TAC.

[0026] As a preferred technical solution of the present invention, the material of the hardening layer includes acrylic resin.

[0027] Preferably, the acrylic resin includes any one or a combination of at least two of epoxy acrylate, polyester acrylate, silicone acrylate, and polyurethane acrylate. Typical but non-limiting combinations include: a combination of epoxy acrylate and polyester acrylate, a combination of epoxy acrylate and silicone acrylate, a combination of epoxy acrylate and polyurethane acrylate, a combination of polyester acrylate and silicone acrylate, a combination of polyester acrylate and polyurethane acrylate, a combination of silicone acrylate and polyurethane acrylate, a combination of epoxy acrylate, polyester acrylate, and silicone acrylate, a combination of epoxy acrylate, polyester acrylate, and polyurethane acrylate, a combination of epoxy acrylate, silicone acrylate, and polyurethane acrylate, a combination of polyester acrylate, silicone acrylate, and polyurethane acrylate, and a combination of epoxy acrylate, polyester acrylate, silicone acrylate, and polyurethane acrylate.

[0028] Preferably, the thickness of the hardening layer is 2 - 5 μm, for example, it can be 2 μm, 3 μm, 4 μm, or 5 μm, but is not limited to the listed values, and other unlisted values within the above numerical range are equally applicable.

[0029] Preferably, the hardness of the hardening layer is 1 - 3H, for example, it can be 1H, 2H, or 3H, but is not limited to the listed values, and other unlisted values within the above numerical range are equally applicable.

[0030] As a preferred technical solution of the present invention, the refractive index of the first organic layer is 0.2 - 0.3 greater than the refractive index of the first inorganic layer. For example, it can be 0.2, 0.22, 0.24, 0.26, 0.28, or 0.3, but is not limited to the listed values, and other unlisted values within the above numerical range are equally applicable.

[0031] Preferably, the refractive index of the first inorganic layer is 0.2 - 0.4 greater than the refractive index of the second organic layer. For example, it can be 0.2, 0.25, 0.3, 0.35, or 0.4, but is not limited to the listed values, and other unlisted values within the above numerical range are equally applicable.

[0032] Preferably, the refractive index of the second inorganic layer is 0.2 - 0.3 greater than the refractive index of the third organic layer. For example, it can be 0.2, 0.22, 0.24, 0.26, 0.28, or 0.3, but is not limited to the listed values, and other unlisted values within the above numerical range are equally applicable.

[0033] Preferably, the refractive index of the third organic layer is 0.4 - 0.5 greater than that of the fourth organic layer. For example, it can be 0.4, 0.42, 0.44, 0.46, 0.48, or 0.5, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0034] The present invention further defines the difference in refractive index between the layers in the antireflection layer, enabling the antireflection film to reduce the reflected light of the screen, improve the imaging quality, and ensuring that the transmittance of the antireflection film remains unchanged after 20,000 bends.

[0035] Preferably, the material of the first inorganic layer includes Al 2 O 3 .

[0036] Preferably, the material of the second inorganic layer includes TiO 2 , ZnO, ZrO 2 or Nb 2 O 5 or any combination of at least two of them. Typical but non - limiting combinations include: the combination of TiO 2 and ZnO, the combination of TiO 2 and ZrO 2 , the combination of TiO 2 and Nb 2 O 5 , the combination of ZnO and ZrO 2 , the combination of ZnO and Nb 2 O 5 , the combination of ZrO 2 and Nb 2 O 5 , the combination of TiO 2 , ZnO and ZrO 2 , the combination of TiO 2 , ZnO and Nb 2 O 5 , the combination of TiO 2 , ZrO 2 and Nb 2 O 5 , the combination of ZnO, ZrO 2 and Nb 2 O 5 , the combination of TiO 2 , ZnO, ZrO 2 and Nb 2 O 5 .

[0037] Preferably, the refractive index of the first inorganic layer is 1.6 - 1.7. For example, it can be 1.6, 1.62, 1.64, 1.66, 1.68, or 1.7, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0038] According to the optical design principle of the three-layer thin film and the principle of destructive interference of light, the refractive index of the first inorganic layer material is limited to 1.6 - 1.7. Among inorganic materials with high light transmittance in the visible light range, only amorphous Al 2 O 3 exists. Therefore, the material of the first inorganic layer can only be selected as Al 2 O 3 .

[0039] Preferably, the thickness of the first inorganic layer is 50 - 90 nm. For example, it can be 50 nm, 60 nm, 70 nm, 80 nm, or 90 nm, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0040] Preferably, the refractive index of the second inorganic layer is 2.0 - 2.1. For example, it can be 2.0, 2.02, 2.04, 2.06, 2.08, or 2.1, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0041] Preferably, the thickness of the second inorganic layer is 120 - 130 nm. For example, it can be 120 nm, 122 nm, 124 nm, 126 nm, 128 nm, or 130 nm, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0042] The present invention limits the thickness of the triple layer in the antireflection layer and sets an antireflection layer structure composed of a triple-layer optical thin film of λ / 4 - λ / 2 - λ / 4 (λ is the optical thickness, and the light corresponding to the wavelength is its optical thickness) using the principle of destructive interference of light, so as to obtain an antireflection film with a significant antireflection and antireflection-enhancing effect. On this basis, the physical thickness is adjusted and optimized to further improve the antireflection and antireflection-enhancing effect.

[0043] Preferably, the materials of the first organic layer and the third organic layer each independently include a composite of an acrylic monomer and ZrO 2 nanoparticles.

[0044] Preferably, the materials of the second organic layer and the fourth organic layer each independently include a composite of a fluoropolymer and / or a photocurable resin and SiO 2 nanoparticles.

[0045] The fluoropolymer is a copolymer composed of tetrafluoroethylene and 2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxolane in a certain molar ratio. The fluoropolymer used in this invention has a molar ratio of tetrafluoroethylene to 2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxolane of 13:87.

[0046] The photocurable resin includes any one or a combination of at least two of acrylic resin, epoxy resin, or silane resin. Typical but non-limiting combinations include: a combination of acrylic resin and epoxy resin, a combination of acrylic resin and silane resin, a combination of epoxy resin and silane resin, and a combination of acrylic resin, epoxy resin, and silane resin.

[0047] Preferably, the refractive index of the first organic layer is 1.8 - 1.9. For example, it can be 1.8, 1.82, 1.84, 1.86, 1.88, or 1.9, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0048] Preferably, the thickness of the first organic layer is 135 - 160 nm. For example, it can be 135 nm, 140 nm, 145 nm, 150 nm, 155 nm, or 160 nm, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0049] Preferably, the refractive index of the second organic layer is 1.3 - 1.4. For example, it can be 1.3, 1.32, 1.34, 1.36, 1.38, or 1.4, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0050] Preferably, the thickness of the second organic layer is 80 - 110 nm. For example, it can be 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 105 nm, or 110 nm, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0051] Preferably, the refractive index of the third organic layer is 1.8 - 1.9. For example, it can be 1.8, 1.82, 1.84, 1.86, 1.88, or 1.9, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0052] Preferably, the thickness of the third organic layer is 130 - 150 nm. For example, it can be 130 nm, 135 nm, 140 nm, 145 nm, or 150 nm, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0053] Preferably, the refractive index of the fourth organic layer is 1.3 - 1.4, for example, it can be 1.3, 1.32, 1.34, 1.36, 1.38 or 1.4, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable.

[0054] Preferably, the thickness of the fourth organic layer is 80 - 100 nm, for example, it can be 80 nm, 85 nm, 90 nm, 95 nm or 100 nm, but is not limited to the listed values, and other unlisted values within the above value range are equally applicable.

[0055] In the present invention, the total thickness of the anti-reflection layer is in the range of 200 - 400 nm, which can reduce the reflected light of the screen with almost no impact on the overall thickness of the screen, making the screen still clearly visible under strong light irradiation, improving the readability of the screen; at the same time, by reducing the interference of reflected light, the anti-reflection film can enhance the contrast of the screen, making the colors more vivid and accurate, and providing a better visual experience; moreover, the anti-reflection film can relieve eye fatigue and improve the comfort of the user; further, the anti-reflection film has the performance of anti-reflection and light transmittance enhancement, and can weaken the visibility effect of the folding marks of the folding screen.

[0056] As a preferred technical solution of the present invention, a first inorganic-organic coupling agent is included between the first inorganic layer and the first organic layer.

[0057] Preferably, a second inorganic-organic coupling agent is included between the second inorganic layer and the third organic layer.

[0058] Preferably, a third inorganic-organic coupling agent is included between the second inorganic layer and the fourth organic layer.

[0059] In the present invention, an inorganic-organic coupling agent is provided between the inorganic layer and the organic layer. One end of the inorganic-organic coupling agent has a group connecting to the organic layer, and the other end has a group connecting to the inorganic layer. The use of the inorganic-organic coupling agent can increase the interfacial bonding strength between the inorganic layer and the organic layer, reduce the difference in properties between the inorganic layer and the organic layer materials, improve compatibility, and reduce stress concentration. When the inorganic layer and the organic layer are in direct contact, voids, cracks and other defects are likely to occur at the interface, affecting the overall performance of the material. The inorganic-organic coupling agent can fill the tiny voids at the interface, form a uniform transition layer, and reduce defects.

[0060] Preferably, the materials of the first inorganic-organic coupling agent, the second inorganic-organic coupling agent and the third inorganic-organic coupling agent are independently silane coupling agents and / or aluminate coupling agents.

[0061] Preferably, the refractive indices of the first inorganic-organic coupling agent, the second inorganic-organic coupling agent, and the third inorganic-organic coupling agent are each independently 1.4 - 1.6. For example, they can be 1.4, 1.45, 1.5, 1.55, or 1.6, but are not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0062] Preferably, the thicknesses of the first inorganic-organic coupling agent, the second inorganic-organic coupling agent, and the third inorganic-organic coupling agent are each independently 2 - 5 nm. For example, they can be 2 nm, 3 nm, 4 nm, or 5 nm, but are not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0063] Preferably, the silane coupling agent includes any one or a combination of at least two of an amino-silane coupling agent, an epoxy-silane coupling agent, or a methacryloxy coupling agent. Typical but non-limiting combinations include: a combination of an amino-silane coupling agent and an epoxy-silane coupling agent, a combination of an amino-silane coupling agent and a methacryloxy coupling agent, a combination of an epoxy-silane coupling agent and a methacryloxy coupling agent, and a combination of an amino-silane coupling agent, an epoxy-silane coupling agent, and a methacryloxy coupling agent.

[0064] Preferably, the aluminate coupling agent includes any one or a combination of at least two of an isopropoxy aluminate stearate coupling agent, a coordination-type aluminate coupling agent, or a phosphate-modified aluminate coupling agent. Typical but non-limiting combinations include: a combination of an isopropoxy aluminate stearate coupling agent and a coordination-type aluminate coupling agent, a combination of an isopropoxy aluminate stearate coupling agent and a phosphate-modified aluminate coupling agent, a combination of a coordination-type aluminate coupling agent and a phosphate-modified aluminate coupling agent, and a combination of an isopropoxy aluminate stearate coupling agent, a coordination-type aluminate coupling agent, and a phosphate-modified aluminate coupling agent.

[0065] As a preferred technical solution of the present invention, the material of the anti-fingerprint layer includes perfluoropolyether fluorosilane and a coupling agent.

[0066] Preferably, the refractive index of the anti-fingerprint layer is 1.4 - 1.6. For example, it can be 1.4, 1.45, 1.5, 1.55, or 1.6, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0067] Preferably, the thickness of the anti-fingerprint layer is 5 - 15 nm. For example, it can be 5 nm, 7 nm, 9 nm, 10 nm, 12 nm, 14 nm, or 15 nm, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0068] Preferably, the coupling agent includes a vinyl silane coupling agent and / or an alkyl silane coupling agent.

[0069] In a second aspect, the present invention provides a method for preparing an antireflection film according to the first aspect, the preparation method comprising:

[0070] Coating a hardening coating, an antireflection layer, and an anti-fingerprint layer in sequence on one side surface of a film substrate, and coating a transparent optical adhesive layer on the other side surface of the film substrate to obtain the antireflection film;

[0071] Wherein, the antireflection layer includes a first inorganic layer, a first organic layer, and a second organic layer which are stacked in sequence; or, the antireflection layer includes a third organic layer, a second inorganic layer, and a fourth organic layer which are stacked in sequence;

[0072] The formation methods of the first organic layer, the second organic layer, the third organic layer, and the fourth organic layer are each independently a wet method;

[0073] The formation methods of the first inorganic layer and the second inorganic layer are each independently a dry method.

[0074] In the present invention, a hardening coating, an antireflection layer, and an anti-fingerprint layer are coated in sequence on one side surface of a film substrate, and a transparent optical adhesive layer is coated on the other side surface of the film substrate, then the antireflection film can be obtained. The preparation method of the present invention is simple, easy to operate, and has good application prospects.

[0075] Meanwhile, in the process of preparing the antireflection film of the present invention, the advantages of the dry method and the wet method are utilized to the greatest extent, and their disadvantages are avoided. The inorganic layer is prepared by the dry method. The inorganic layer prepared by the dry method usually has high density and stability, good film layer uniformity and wear resistance, and precise thickness control. At the same time, the organic layer is prepared by the wet method. The organic layer prepared by the wet method can achieve large-scale production through continuous coating and drying processes. The combination of the dry and wet methods can make the prepared antireflection film not only have good antireflection effect, bending performance, and mechanical properties, but also improve production efficiency and reduce costs. For the antireflection film prepared by the pure wet method, although the elongation at break is adjustable, the substrate has good ductility, and the production continuity is good, but it is difficult to control the coating thickness accurately. Multilayer coating fluctuations may produce rainbow patterns, poor interlayer adhesion, and poor wear resistance. The antireflection film prepared by the pure dry method generally uses a roll-to-roll process, and the film layer is plated by magnetron sputtering. The deposition thickness is uniform and accurate, and multilayer deposition can be carried out. However, coating on a flexible substrate is prone to stress, which is not conducive to its bending performance, and the production efficiency is low.

[0076] Furthermore, compared with the antireflection layer with an inorganic layer-inorganic layer-organic layer structure, the antireflection layer with a second inorganic layer-third organic layer-fourth organic layer structure prepared by the present invention has two organic layers and only one bottom inorganic layer, which can better reduce the bending stress caused by the double inorganic layers, improve the bending resistance of the antireflection film, and enable the antireflection film to be better applied in the field of flexible displays. In addition, replacing the inorganic layer in the middle layer with an organic layer can effectively reduce the preparation cost of the antireflection film and increase the possibility of commercial use. Moreover, the interfacial bonding force between the two upper organic layers is enhanced, which is better than the interfacial bonding force between an inorganic layer and an organic layer or between inorganic layers.

[0077] As a preferred technical solution of the present invention, the dry method includes any one or a combination of at least two of magnetron sputtering, atomic layer deposition, or electron beam evaporation. Typical but non-limiting combinations include: a combination of magnetron sputtering and atomic layer deposition, a combination of magnetron sputtering and electron beam evaporation, a combination of atomic layer deposition and electron beam evaporation, and a combination of magnetron sputtering, atomic layer deposition, and electron beam evaporation.

[0078] Preferably, the wet method includes any one or a combination of at least two of spin coating, dip coating, or blade coating. Typical but non-limiting combinations include: a combination of spin coating and dip coating, a combination of spin coating and blade coating, a combination of dip coating and blade coating, and a combination of spin coating, dip coating, and blade coating.

[0079] Preferably, the evaporation temperature of the electron beam evaporation method is 80-120 °C, for example, it can be 80 °C, 90 °C, 100 °C, 110 °C, or 120 °C, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0080] Preferably, the evaporation time of the electron beam evaporation method is 20-40 min, for example, it can be 20 min, 25 min, 30 min, 35 min, or 40 min, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0081] Preferably, the vacuum pressure of the electron beam evaporation method is 2×10 -6 -4×10 -6 mbar, for example, it can be 2×10 -6 mbar, 2.5×10 -6 mbar, 3×10 -6 mbar, 3.5×10 -6 mbar, or 4×10 -6 mbar, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0082] Preferably, the deposition rate of the electron beam evaporation method is 30-60 mA / s. For example, it can be 30 mA / s, 40 mA / s, 50 mA / s, or 60 mA / s, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0083] Preferably, the sputtering power of the magnetron sputtering method is 80-120 W. For example, it can be 80 W, 90 W, 100 W, 110 W, or 120 W, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0084] Preferably, the sputtering pressure of the magnetron sputtering method is 6-10 mtorr. For example, it can be 6 mtorr, 7 mtorr, 8 mtorr, 9 mtorr, or 10 mtorr, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0085] Preferably, the sputtering time of the magnetron sputtering method is 7000-8000 s. For example, it can be 7000 s, 7200 s, 7400 s, 7600 s, 7800 s, or 8000 s, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0086] Preferably, the reaction temperature of the atomic layer deposition method is 100°C - 150°C (in a vacuum environment). For example, it can be 100°C, 110°C, 120°C, 130°C, 140°C, or 150°C, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0087] Preferably, the N 2 purge flow rate of the atomic layer deposition method is 300-500 mL / min. For example, it can be 300 mL / min, 350 mL / min, 400 mL / min, 450 mL / min, or 500 mL / min, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0088] Preferably, the time of the atomic layer deposition method is 1 h - 3 h. For example, it can be 1 h, 1.5 h, 2 h, 2.5 h, or 3 h, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0089] Preferably, the volume of the organic solution in the spin coating method is 60-100 μL. For example, it can be 60 μL, 70 μL, 80 μL, 90 μL, or 100 μL, but is not limited to the listed values. Other unlisted values within the above numerical range are equally applicable.

[0090] Preferably, the spinning time in the spin coating method is 15 - 45 s. For example, it can be 15 s, 20 s, 25 s, 30 s, 35 s, 40 s or 45 s, but it is not limited to the listed values. Other unlisted values within the above value range are equally applicable.

[0091] Preferably, the spinning speed in the spin coating method is 2000 - 4000 rpm. For example, it can be 2000 rpm, 2500 rpm, 3000 rpm, 3500 rpm or 4000 rpm, but it is not limited to the listed values. Other unlisted values within the above value range are equally applicable.

[0092] As a preferred technical solution of the present invention, the preparation method includes the following steps:

[0093] (1) Coat a hardening coating on one side surface of the film substrate, and coat a transparent optical adhesive layer on the other side surface of the film substrate;

[0094] (2) Deposit a first inorganic layer on the surface of the hardening coating away from the film substrate using a dry method, and sequentially form a first organic layer and a second organic layer on the surface of the first inorganic layer away from the hardening coating using a wet method to obtain the anti-reflection layer; or, form a third organic layer on the surface of the hardening coating away from the film substrate using the wet method, then deposit a second inorganic layer on the surface of the third organic layer away from the hardening coating using the dry method, and then form a fourth organic layer on the surface of the second inorganic layer away from the third organic layer using the wet method to obtain the anti-reflection layer;

[0095] (3) Coat an anti-fingerprint layer on the anti-reflection layer to obtain the anti-reflection film.

[0096] In a third aspect, the present invention provides an application of the anti-reflection film according to the first aspect in the field of flexible displays.

[0097] The anti-reflection film prepared by the present invention can reduce the reflectivity of the screen, improve the visibility of the screen. At the same time, by reducing the reflection light interference, the anti-reflection film can enhance the contrast of the screen, make the colors more vivid and accurate, and provide a better visual experience; and the anti-reflection film can relieve eye fatigue and improve the comfort of the user; further, the anti-reflection film has the performance of anti-reflection and light transmittance enhancement, and can weaken the visibility effect of the folding marks of the folding screen, so that the anti-reflection film has a wide application in the field of flexible displays.

[0098] Compared with the prior art, the present invention has at least the following beneficial effects:

[0099] (1) The antireflection film of the present invention can reduce the reflected light of the screen, improve the imaging quality, and ensure that the transmittance of the antireflection film remains unchanged after 20,000 bends. The reflectivity of the antireflection film can be controlled within 2.4%, and the transmittance can reach 93.5%.

[0100] (2) By combining the wet and dry methods to prepare the antireflection film, the present invention can endow the antireflection film not only with good antireflection effect and bending performance, but also with improved production efficiency and reduced production cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0101] Figure 1 is a schematic structural diagram of the antireflection film provided in Embodiment 1 of the present invention.

[0102] Figure 2 is a schematic structural diagram of the antireflection layer provided in Embodiment 1 of the present invention.

[0103] Figure 3 is a schematic structural diagram of the antireflection layer provided in Embodiment 2 of the present invention.

[0104] Wherein, 1 - transparent optical adhesive layer; 2 - film substrate; 3 - hardening layer; 4 - antireflection layer; 5 - anti-fingerprint layer; 411 - third organic layer; 412 - second inorganic layer; 413 - fourth organic layer; 421 - first inorganic layer; 422 - first organic layer; 423 - second organic layer. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0105] The technical solutions of the present invention will be further described below with reference to the drawings and specific embodiments. However, the following examples are only simple examples of the present invention and do not represent or limit the scope of the protection of the present invention. The scope of protection of the present invention shall be subject to the claims.

[0106] The fluoropolymer used in the following examples is a copolymer composed of tetrafluoroethylene and 2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxolane in a molar ratio of 13:87.

[0107] Embodiment 1

[0108] This embodiment provides an antireflection film, as Figure 1 shown. The antireflection film includes a transparent optical adhesive layer 1, a film substrate 2, a hardening layer 3, an antireflection layer 4, and an anti-fingerprint layer 5 that are sequentially stacked. Among them, the material of the transparent optical adhesive layer 1 is OCA (3M8146-3), the visible light transmittance is 93%, and the thickness is 40 μm; the material of the film substrate 2 is TAC, the visible light transmittance is 92%, the haze value is 0.5%, and the thickness is 50 μm; the material of the hardening layer 3 is epoxy acrylate (RY1101), the hardness is 3H, and the thickness is 3 μm; the structure of the antireflection layer 4 is as Figure 2As shown, the anti-reflection layer 4 includes a third organic layer 411, a second inorganic layer 412, and a fourth organic layer 413 that are sequentially stacked. At the same time, an inorganic-organic coupling agent is provided between the second inorganic layer and the third organic layer and the fourth organic layer respectively. That is, the anti-reflection layer 4 includes a composite of acrylic monomer and ZrO 2 nanoparticles (NH741), epoxy group silane coupling agent (KH-560), TiO 2 , epoxy group silane coupling agent (KH-560), and a composite of acrylic resin and SiO 2 nanoparticles (JR-AR-965). Among them, the refractive index of the composite of acrylic monomer and ZrO 2 nanoparticle composite is 1.8 and the thickness is 140 nm. The refractive index of the epoxy group silane coupling agent is 1.5 and the thickness is 5 nm. The refractive index of TiO 2 is 2.0 and the thickness is 125 nm. The refractive index of the composite of acrylic resin and SiO 2 nanoparticles is 1.33 and the thickness is 90 nm. The anti-fingerprint layer is composed of perfluoropolyether fluorosilane and alkyl silane coupling agent. The refractive index of the anti-fingerprint layer is 1.45 and the thickness is 10 nm.

[0109] This embodiment also provides a method for preparing the anti-reflection film, and the preparation method includes:

[0110] (1) Coating epoxy acrylate on one side surface of the TAC film substrate, and coating an OCA transparent optical adhesive layer on the other side surface of the TAC film substrate;

[0111] (2) Using the spin coating method to form a composite layer of acrylic monomer and ZrO 2 nanoparticles on the surface of the epoxy acrylate away from the TAC film substrate. During the spin coating process, the volume of the composite of acrylic monomer and ZrO 2 nanoparticles is 100 μL, the spin coating time is 30 s, and the spin coating speed is 3000 rpm. Then, coat the epoxy group silane coupling agent on the surface of the composite layer of acrylic monomer and ZrO 2 nanoparticles away from the epoxy acrylate, and then use the magnetron sputtering method to deposit a TiO 2 layer on the surface of the epoxy group silane coupling agent. During the magnetron sputtering process, the sputtering power is 100 W, the sputtering pressure is 8 mtorr, and the sputtering time is 7200 s. Then, coat the epoxy group silane coupling agent on the surface of the TiO 2 layer away from the epoxy group silane coupling agent, and then use the spin coating method to form a composite layer of acrylic resin and SiO 2 nanoparticles on the surface of the epoxy group silane coupling agent. During the spin coating process, the acrylic resin and SiO 2The volume of the composite of nanoparticles is 100 μL, the spin-coating time is 30 s, and the spin-coating speed is 3000 rpm to obtain the antireflection layer;

[0112] (3) Coat an anti-fingerprint layer on the antireflection layer to obtain the antireflection film.

[0113] Example 2

[0114] This example provides an antireflection film, which includes a transparent optical adhesive layer, a film substrate, a hardening layer, an antireflection layer, and an anti-fingerprint layer stacked in sequence. Among them, the material of the transparent optical adhesive layer is OCA (3M8146-5), the visible light transmittance is 91%, the thickness is 20 μm, the material of the film substrate is PI, the visible light transmittance is 90.5%, the haze value is 0.1%, the thickness is 40 μm, the material of the hardening layer is epoxy acrylate (RY1101), the hardness is 1H, the thickness is 5 μm, and the structure of the antireflection layer is as Figure 3 shown. The antireflection layer includes a first inorganic layer 421, a first organic layer 422, and a second organic layer 423 stacked in sequence. At the same time, an inorganic-organic coupling agent is provided between the first inorganic layer 421 and the first organic layer 422, that is, the antireflection layer includes Al 2 O 3 , epoxy group silane coupling agent (KH-560), acrylic monomer and ZrO 2 nanoparticle composite (NH741), epoxy resin and SiO 2 nanoparticle composite (JR-AR970). Among them, the refractive index of Al 2 O 3 is 1.6, the thickness is 70 nm, the refractive index of the epoxy group silane coupling agent is 1.5, the thickness is 2 nm, the refractive index of the acrylic monomer and ZrO 2 nanoparticle composite is 1.8, the thickness is 135 nm, the refractive index of the epoxy resin and SiO 2 nanoparticle composite is 1.34, the thickness is 100 nm, the anti-fingerprint layer is composed of perfluoropolyether fluorosilane and alkyl silane coupling agent, and the refractive index of the anti-fingerprint layer is 1.45, the thickness is 10 nm.

[0115] This example also provides a preparation method of the antireflection film, and the preparation method includes:

[0116] (1) Coat epoxy acrylate on one side surface of the PI film substrate, and coat the OCA transparent optical adhesive layer (3M8146-5) on the other side surface of the PI film substrate;

[0117] (2) Use electron beam evaporation to deposit Al on the surface of the epoxy acrylate far from the PI film substrate to form 2 O3 layer, during the electron beam evaporation process, the vacuum pressure is 3×10 -6 mbar, the evaporation temperature is 100 °C, the evaporation time is 30 min, and the deposition rate is 45 mA / s. Then, an epoxy group silane coupling agent is coated on the surface of the Al 2 O 3 layer away from the surface of the epoxy acrylate. A composite of acrylic monomer and ZrO 2 nanoparticles is formed on the surface of the epoxy group silane coupling agent using the spin coating method. During the spin coating process, the volume of the composite of acrylic monomer and ZrO 2 nanoparticles is 100 μL, the spin coating time is 30 s, and the spin coating speed is 3000 rpm. Then, a composite of epoxy resin and SiO 2 nanoparticles is formed using the spin coating method. During the spin coating process, the volume of the composite of epoxy resin and SiO 2 nanoparticles is 60 μL, the spin coating time is 45 s, and the spin coating speed is 2000 rpm, obtaining the anti-reflection layer;

[0118] (3) An anti-fingerprint layer is coated on the anti-reflection layer to obtain the anti-reflection film.

[0119] Example 3

[0120] This example provides an anti-reflection film. The anti-reflection film includes a transparent optical adhesive layer, a film body substrate, a hardening layer, an anti-reflection layer, and an anti-fingerprint layer that are sequentially stacked. Among them, the material of the transparent optical adhesive layer is OCA (5608BN), the visible light transmittance is 95%, and the thickness is 50 μm. The material of the film body substrate is PET, the visible light transmittance is 92%, the haze value is 0.9%, and the thickness is 60 μm. The material of the hardening layer is organosilicon acrylate resin (Silok8000), the hardness is 2H, and the thickness is 2 μm. The anti-reflection layer includes a first inorganic layer 421, a first organic layer 422, and a second organic layer 423 that are sequentially stacked. At the same time, an inorganic-organic coupling agent is provided between the first inorganic layer 421 and the first organic layer 422, that is, the anti-reflection layer includes Al 2 O 3 , epoxy group silane coupling agent (KH-560), composite of acrylic monomer and ZrO 2 nanoparticles (NH741), and fluorine-containing polymer (AF2400). Among them, the refractive index of Al 2 O 3 is 1.7 and the thickness is 70 nm. The refractive index of the epoxy group silane coupling agent is 1.4 and the thickness is 5 nm. The composite of acrylic monomer and ZrO 2The refractive index of the nanoparticle composite is 1.9 and the thickness is 150 nm. The refractive index of the fluoropolymer is 1.3 and the thickness is 80 nm. The anti-fingerprint layer is composed of perfluoropolyether fluorosilane and an alkylsilane coupling agent. The refractive index of the anti-fingerprint layer is 1.6 and the thickness is 5 nm.

[0121] This embodiment also provides a method for preparing the antireflection film, and the preparation method includes:

[0122] (1) Coating an organosilicon acrylic resin on one side surface of the PET film substrate, and coating an OCA transparent optical adhesive layer (5608BN) on the other side surface of the PET film substrate;

[0123] (2) Using atomic layer deposition to deposit an Al 2 O 3 layer on the surface of the organosilicon acrylic resin away from the PET film substrate. The reaction temperature of the atomic layer deposition method is 120 °C (in a vacuum environment), the N 2 purge flow rate is 400 mL / min, the deposition time is 2.5 h. Then, coat an epoxy group silane coupling agent on the surface of the Al 2 O 3 layer away from the organosilicon acrylate, and then use spin coating to form an acrylic monomer and ZrO 2 nanoparticle composite layer on the surface of the epoxy group silane coupling agent. During the spin coating process, the volume of the acrylic monomer and ZrO 2 nanoparticle composite is 60 μL, the spin coating time is 15 s, the spin coating speed is 2000 rpm, and use spin coating to form a fluoropolymer layer on the surface of the acrylic monomer and ZrO 2 nanoparticle composite layer. During the spin coating process, the volume of the fluoropolymer is 100 μL, the spin coating time is 45 s, the spin coating speed is 4000 rpm, to obtain the antireflection layer;

[0124] (3) Coating an anti-fingerprint layer on the antireflection layer to obtain the antireflection film.

[0125] Example 4

[0126] This example provides an antireflection film, which is different from Example 1 only in that, except that the thickness of the film substrate is adjusted from 50 μm to 25 μm, the rest are the same as those in Example 1.

[0127] Example 5

[0128] This example provides an antireflection film, which is different from Example 1 only in that, except that the thickness of the film substrate is adjusted from 50 μm to 125 μm, the rest are the same as those in Example 1.

[0129] Example 6

[0130] This embodiment provides an antireflection film. The difference from Embodiment 1 is only that, except that the antireflection layer includes a composite of acrylic monomer and ZrO 2 nanoparticles (NH741), TiO 2 , acrylic resin and a composite of SiO 2 nanoparticles (JR-AR-965), that is, between the second inorganic layer and the third organic layer and between the second inorganic layer and the fourth organic layer, no inorganic-organic coupling agent is provided, and the rest are the same as in Embodiment 1.

[0131] Embodiment 7

[0132] This embodiment provides an antireflection film. The difference from Embodiment 1 is only that, except that the refractive index of the composite of acrylic monomer and ZrO 2 nanoparticles (NH741) is adjusted from 1.8 to 1.5, that is, the refractive index of the third organic layer is 0.17 greater than that of the fourth organic layer, and the refractive index of the second inorganic layer is 0.5 greater than that of the third organic layer, and the rest are the same as in Embodiment 1.

[0133] Comparative Example 1

[0134] This comparative example provides an antireflection film. The difference from Embodiment 1 is only that, except that the refractive index of the composite of acrylic monomer and ZrO 2 nanoparticles (NH741) is adjusted from 1.8 to 1.5, and the refractive index of the composite of acrylic resin and SiO 2 nanoparticles (JR-AR-965) is adjusted from 1.33 to 1.6, that is, the refractive index of the third organic layer is less than that of the fourth organic layer, and the rest are the same as in Embodiment 1.

[0135] Comparative Example 2

[0136] This comparative example provides an antireflection film. The difference from Embodiment 2 is only that, except that the refractive index of the composite of acrylic monomer and ZrO 2 nanoparticles (NH741) is adjusted from 1.8 to 1.5, and the refractive index of the composite of epoxy resin and SiO 2 nanoparticles (JR-AR970) is adjusted from 1.34 to 1.6, that is, the refractive index of the first organic layer is less than that of the second organic layer, and the refractive index of the first organic layer is less than that of the first inorganic layer, and the rest are the same as in Embodiment 2.

[0137] Comparative Example 3

[0138] This comparative example provides an antireflection film. The difference from Embodiment 1 is only that, except that in step (2) TiO 2The method for forming the layer was adjusted from magnetron sputtering to spin coating. Except that the volume of the solution during spin coating was 80 μL, the spin coating time was 30 s, and the spin coating speed was 3000 rpm, the rest was the same as in Example 1.

[0139] Comparative Example 4

[0140] This comparative example provides an antireflection film. The difference from Example 1 is only that, except that the antireflection film includes a transparent optical adhesive layer, a film substrate, an antireflection layer, a hardening layer, and an anti-fingerprint layer stacked in sequence, the rest is the same as in Example 1.

[0141] Comparative Example 5

[0142] This comparative example provides an antireflection film. The difference from Example 2 is only that, except that the antireflection layer includes a first organic layer and a second organic layer stacked in sequence, that is, it does not include the first inorganic layer, the rest is the same as in Example 2.

[0143] Comparative Example 6

[0144] This comparative example provides an antireflection film. The difference from Example 1 is only that, except that the antireflection layer includes a third organic layer and a second inorganic layer stacked in sequence, that is, it does not include the fourth organic layer, the rest is the same as in Example 1.

[0145] Comparative Example 7

[0146] This comparative example provides an antireflection film. The difference from Example 1 is only that, except that the antireflection layer includes a second inorganic layer and a fourth organic layer stacked in sequence, that is, it does not include the third organic layer, the rest is the same as in Example 1.

[0147] Comparative Example 8

[0148] This comparative example provides an antireflection film. The difference from Example 1 is only that, except that the antireflection layer includes a third organic layer, a fourth organic layer, and a second inorganic layer stacked in sequence, the rest is the same as in Example 1.

[0149] The average reflectance and average transmittance of the antireflection films provided in Examples 1-7 and Comparative Examples 1-8 were measured under perpendicular incidence using the ultraviolet integrating sphere diffuse reflection accessory of an ultraviolet / visible / near-infrared spectrophotometer, and the bending performance of the antireflection films was tested using a bending platform.

[0150] Table 1

[0151] Average reflectance (%) Average transmittance (%) Average transmittance (%) after 20,000 bends Example 1 2.4 93.5 93.5 Example 2 1.0 93.5 93.5 Example 3 1.0 93.5 93.5 Example 4 2.4 93.5 92.5 Example 5 2.4 93.5 92.5 Example 6 2.4 93.5 92.5 Example 7 5 90 90 Comparative Example 1 6 88 88 Comparative Example 2 10 85 80 Comparative Example 3 4.4 90.5 90.5 Comparative Example 4 9 86 86 Comparative Example 5 4.5 90 90 Comparative Example 6 9 85.5 85.5 Comparative Example 7 2.8 91.8 91.8 Comparative Example 8 23 71.5 71.5

[0152] It can be seen from the test results that:

[0153] (1) It can be seen from Examples 1 to 5 that by designing the structure of the antireflection layer according to the optical thin film design principle and the principle of destructive interference of light, the refractive indices of the three-layer antireflection layer are stacked in the order of medium, high, and low from bottom to top, so that the reflectivity of the antireflection film can be controlled within 2.4%, the average transmittance can reach 93.5%, and the transmittance of the antireflection film does not change or changes slightly after 20,000 bends.

[0154] (2) It can be seen from Example 1 and Example 6 that in the antireflection layer of the antireflection film in Example 1, an inorganic-organic coupling agent is provided between the second inorganic layer and the third organic layer, and between the second inorganic layer and the fourth organic layer. The average transmittance of the prepared antireflection film is 93.5%, and the average transmittance does not change after 20,000 bends. In Example 6, no inorganic-organic coupling agent is provided between the second inorganic layer and the third organic layer, and between the second inorganic layer and the fourth organic layer in the antireflection layer of the antireflection film. The average transmittance of the prepared antireflection film is 93.5%, and the average transmittance decreases to 92.5% after 20,000 bends. This shows that by adding an inorganic-organic coupling agent between the inorganic layer and the organic layer in the present invention, the use of the inorganic-organic coupling agent can increase the interfacial bonding strength between the inorganic layer and the organic layer, reduce the difference in properties between the inorganic layer and the organic layer materials, improve compatibility, and reduce stress concentration, so that the average transmittance of the antireflection film does not change after bending.

[0155] (3) It can be seen from Example 1 and Example 7 that in the antireflection layer of the antireflection film in Example 1, the refractive index of the second inorganic layer is 0.2 greater than that of the third organic layer; the refractive index of the third organic layer is 0.47 greater than that of the fourth organic layer. The average reflectivity of the prepared antireflection film is 2.4%, and the average transmittance is 93.5%. In Example 7, in the antireflection layer of the antireflection film, the refractive index of the second inorganic layer is 0.5 greater than that of the third organic layer; the refractive index of the third organic layer is 0.17 greater than that of the fourth organic layer. The average reflectivity of the prepared antireflection film is 5%, and the average transmittance is 90%. This shows that by defining the refractive index relationship of the three-layer structure in the antireflection layer in the present invention, better antireflection and light transmittance enhancement technical effects can be achieved.

[0156] (4) It can be seen from Example 1 and Comparative Example 1, and Example 2 and Comparative Example 2 that by designing the relationship between the refractive indices of each layer in the antireflection layer in the present invention, an antireflection film with better antireflection and light transmittance enhancement can be obtained.

[0157] (5) It can be seen from Example 1 and Comparative Example 3 that in the process of preparing the antireflection film of the present invention, the dry method and the wet method are combined. The inorganic layer is prepared by the dry method, and the organic layer is prepared by the wet method, which can enable the prepared antireflection film to have better antireflection and light transmittance enhancement technical effects.

[0158] (6) It can be seen from Example 1 and Comparative Example 4 that by limiting the placement order of the materials of each layer of the antireflection film of the present invention, the antireflection layer is arranged between the hardening layer and the fingerprint-resistant layer, so that the antireflection film has better antireflection and light transmittance enhancement technical effects.

[0159] (7) It can be seen from Example 2 and Comparative Example 5, Example 1 and Comparative Examples 6-8 that by designing the structure of the antireflection layer of the present invention, the antireflection layer has a three-layer film structure, and it is limited that the three-layer film structure contains two organic layers and one inorganic layer. At the same time, the setting order of the organic layer and the inorganic layer is limited, so that the antireflection film has better antireflection and light transmittance enhancement technical effects.

[0160] In summary, by combining the dry and wet methods to prepare the antireflection film, the present invention can make the antireflection film not only have good antireflection effect and bending performance, but also improve production efficiency and reduce production cost. The reflectivity of the prepared antireflection film can be controlled within 2.4%, and the transmittance can reach 93.5%.

[0161] The applicant declares that the above description is only the specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention fall within the protection scope and the disclosure scope of the present invention.

Claims

1. An anti-reflection film, characterized in that: The anti-reflection film comprises a transparent optical adhesive layer, a film substrate, a hardening layer, an anti-reflection layer and an anti-fingerprint layer which are stacked in sequence; The anti-reflection layer comprises a first inorganic layer, a first organic layer, and a second organic layer which are sequentially stacked; or the anti-reflection layer comprises a third organic layer, a second inorganic layer, and a fourth organic layer which are sequentially stacked; Wherein, the refractive index of the first organic layer is greater than the refractive index of the first inorganic layer; The refractive index of the first inorganic layer is greater than the refractive index of the second organic layer; The refractive index of the second inorganic layer is greater than the refractive index of the third organic layer; The refractive index of the third organic layer is greater than the refractive index of the fourth organic layer.

2. The anti-reflection film according to claim 1, characterized in that: The material of the transparent optical adhesive layer includes any one of OCA, OCR, and UV curing optical adhesive, or a combination of at least two thereof; Preferably, the visible light transmittance of the transparent optical adhesive layer is greater than 90%; Preferably, the thickness of the transparent optical adhesive layer is 20-50 μm; Preferably, the material of the film substrate includes any one or a combination of at least two of TAC, PC, PMMA, PS, TPU, PET or PI; Preferably, the visible light transmittance of the film substrate is >90%; Preferably, the haze value of the film substrate is <1%; Preferably, the thickness of the film substrate is 25-125 μm, preferably 40-60 μm; Preferably, the material of the film substrate is TAC.

3. The anti-reflection film according to claim 1 or 2, characterized in that: The material of the hardened layer includes acrylic resin; Preferably, the acrylic resin includes any one or a combination of at least two of epoxy acrylate, polyester acrylate, silicone acrylate and polyurethane acrylate; Preferably, the thickness of the hardened layer is 2-5 μm; Preferably, the hardness of the hardened layer is 1-3H.

4. The anti-reflection film according to any one of claims 1 to 3, characterized in that: The refractive index of the first organic layer is 0.2-0.3 greater than the refractive index of the first inorganic layer; Preferably, the refractive index of the first inorganic layer is 0.2-0.4 greater than the refractive index of the second organic layer; Preferably, the refractive index of the second inorganic layer is 0.2-0.3 greater than the refractive index of the third organic layer; Preferably, the refractive index of the third organic layer is 0.4-0.5 greater than the refractive index of the fourth organic layer; Preferably, the material of the first inorganic layer includes Al2O3; Preferably, the material of the second inorganic layer includes any one of TiO2, ZnO, ZrO2 or Nb2O5 or a combination of at least two thereof; Preferably, the refractive index of the first inorganic layer is 1.6-1.7; Preferably, the thickness of the first inorganic layer is 50-90 nm; Preferably, the refractive index of the second inorganic layer is 2.0-2.1; Preferably, the thickness of the second inorganic layer is 120-130 nm; Preferably, the materials of the first organic layer and the third organic layer each independently include a composite of acrylic monomer and ZrO2 nanoparticles; Preferably, the materials of the second organic layer and the fourth organic layer each independently include a composite of a fluorine-containing polymer and / or a photocurable resin and SiO2 nanoparticles; Preferably, the refractive index of the first organic layer is 1.8-1.9; Preferably, the thickness of the first organic layer is 135-160 nm; Preferably, the refractive index of the second organic layer is 1.3-1.4; Preferably, the thickness of the second organic layer is 80-110 nm; Preferably, the refractive index of the third organic layer is 1.8-1.9; Preferably, the thickness of the third organic layer is 130-150 nm; Preferably, the refractive index of the fourth organic layer is 1.3-1.4; Preferably, the thickness of the fourth organic layer is 80-100 nm.

5. The anti-reflection film according to any one of claims 1 to 4, characterized in that: A first inorganic-organic coupling agent is included between the first inorganic layer and the first organic layer; Preferably, a second inorganic-organic coupling agent is included between the second inorganic layer and the third organic layer; Preferably, a third inorganic-organic coupling agent is included between the second inorganic layer and the fourth organic layer; Preferably, the materials of the first inorganic-organic coupling agent, the second inorganic-organic coupling agent and the third inorganic-organic coupling agent are independently silane coupling agents and / or aluminate coupling agents; Preferably, the refractive index of the first inorganic-organic coupling agent, the second inorganic-organic coupling agent and the third inorganic-organic coupling agent is independently 1.4-1.6; Preferably, the thickness of the first inorganic-organic coupling agent, the second inorganic-organic coupling agent and the third inorganic-organic coupling agent is independently 2-5 nm; Preferably, the silane coupling agent includes any one of an aminosilane coupling agent, an epoxysilane coupling agent or a methacryloxy coupling agent, or a combination of at least two thereof; Preferably, the aluminate coupling agent includes any one of an isopropoxy aluminate stearate coupling agent, a coordination aluminate coupling agent or a phosphate-modified aluminate coupling agent, or a combination of at least two thereof.

6. The anti-reflection film according to any one of claims 1 to 5, characterized in that: The material of the anti-fingerprint layer includes perfluoropolyether fluorosilane and a coupling agent; Preferably, the refractive index of the anti-fingerprint layer is 1.4-1.6; Preferably, the thickness of the anti-fingerprint layer is 5-15 nm; Preferably, the coupling agent includes a vinyl silane coupling agent and / or an alkyl silane coupling agent.

7. A method for preparing an anti-reflection film according to any one of claims 1 to 6, characterized in that: The preparation method comprises: A hardening coating, an anti-reflection layer and an anti-fingerprint layer are sequentially coated on one side of the film substrate, and a transparent optical adhesive layer is coated on the other side of the film substrate to obtain the anti-reflection film; Wherein, the anti-reflection layer comprises a first inorganic layer, a first organic layer and a second organic layer which are sequentially stacked; or, the anti-reflection layer comprises a third organic layer, a second inorganic layer and a fourth organic layer which are sequentially stacked; The first organic layer, the second organic layer, the third organic layer and the fourth organic layer are each independently formed by a wet process; The first inorganic layer and the second inorganic layer are each independently formed by a dry process.

8. The preparation method according to claim 7, characterized in that: The dry method includes any one of magnetron sputtering, atomic layer deposition or electron beam evaporation, or a combination of at least two thereof; Preferably, the wet method includes any one of spin coating, dip coating or blade coating, or a combination of at least two of them.

9. The preparation method according to claim 7 or 8, characterized in that: The preparation method comprises the following steps: (1) coating a hardening coating on one surface of the film substrate, and coating a transparent optical adhesive layer on the other surface of the film substrate; (2) using a dry method to deposit a first inorganic layer on a surface of the hardened coating layer away from the film substrate, and using a wet method to sequentially form a first organic layer and a second organic layer on a surface of the first inorganic layer away from the hardened coating layer to obtain the anti-reflection layer; or using the wet method to form a third organic layer on a surface of the hardened coating layer away from the film substrate, and then using the dry method to deposit a second inorganic layer on a surface of the third organic layer away from the hardened coating layer, and then using the wet method to form a fourth organic layer on a surface of the second inorganic layer away from the third organic layer to obtain the anti-reflection layer; (3) coating an anti-fingerprint layer on the anti-reflection layer to obtain the anti-reflection film.

10. Use of the anti-reflection film according to any one of claims 1 to 6 in the field of flexible display.

Images