Achromatic and athermalized laser direct writing photoetching objective lens
By designing achromatic, thermal-free laser direct-write lithography objective lens, and using specific lens components and lens parameters, the problem of existing lithography objective lens drifting in the lower focus surface of high-power light sources is solved, achieving efficient lithography process and compatibility with PCB ink models.
Patent Information
- Application Number
- CN202510477900.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-16
- Publication Date
- 2025-06-06
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
Existing lithographic objectives cannot withstand high-power light sources, causing focal surface drift, exceeding the lens depth range, resulting in poor exposure.
Anachromatic, thermal-free laser direct-write lithography objective lens is designed, using specific lens components and parallel flat plate sealed glass to meet specific lens parameters and conditions to support 100-120 watts of light source power and achieve focal-free surface drift.
The focal-free surface drift under high-power light sources is achieved, the working efficiency of the lithography machine is improved, and compatibility with the production of PCB ink models is enhanced.
Smart Images
Figure CN120103583A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of optical systems, and in particular to an achromatic, athermal laser direct-writing lithography objective lens. Background Art
[0002] In recent years, with the continuous improvement of chip integration, the new maskless laser direct writing lithography technology based on digital micromirror device (DMD) has attracted widespread attention. DMD has the advantages of short response time, high resolution and high optical efficiency. Laser direct writing lithography technology reduces the difficulty and cost of traditional lithography technology in making and processing masks, simplifies the cumbersome process flow of lithography technology, and improves the working efficiency of lithography machines. On the one hand, it is necessary to improve its compatibility with PCB ink models, which depends on the spectral range that the lithography objective lens can be compatible with. At present, the mainstream lithography objective lens works in the range of 405±10nm. On the other hand, laser direct writing lithography needs to further improve its working efficiency. In order to further increase the working efficiency of lithography, it is necessary to increase the light source power to 100-120 watts to shorten the exposure time and speed up the scanning speed.
[0003] However, in the prior art, existing photolithography objective lenses cannot withstand high-power light sources and will produce focal plane drift of hundreds of microns or even millimeters, exceeding the depth of field of the lens and causing poor exposure. Summary of the invention
[0004] The purpose of the present invention is to provide an achromatic, athermal laser direct writing lithography objective lens, aiming to solve the technical problem that the lithography objective lens in the prior art cannot withstand high-power light sources, will produce focal plane drift of hundreds of microns or even millimeters, exceed the depth of field of the lens, and cause poor exposure.
[0005] To achieve the above-mentioned purpose, the present invention adopts an achromatic, athermal laser direct writing lithography objective lens, comprising a lens assembly, a parallel plate sealing glass A and a parallel plate sealing glass B, wherein the lens assembly is arranged between the parallel plate sealing glass A and the parallel plate sealing glass B, and the lens assembly, the parallel plate sealing glass A and the parallel plate sealing glass B are all located in a lens barrel;
[0006] The lens assembly includes a spherical lens A, a spherical lens B, a spherical lens C, a spherical lens D, a spherical lens E, a spherical lens F, a spherical lens G, a spherical lens H, a spherical lens I, a spherical lens J and a spherical lens K. The spherical lens A is located on a side of the parallel plate sealing glass A close to the parallel plate sealing glass B, the spherical lens B is located between the spherical lens A and the spherical lens C, the spherical lens D is located between the spherical lens C and the spherical lens E, the spherical lens F is located between the spherical lens E and the spherical lens G, the spherical lens H is located between the spherical lens G and the spherical lens I, the spherical lens J is located between the spherical lens I and the spherical lens K, and the parallel plate sealing glass B is located on a side of the spherical lens K away from the spherical lens J.
[0007] The spherical lens A has a front surface curvature radius greater than 0, curving toward the aperture, and a rear surface curvature radius less than 0, curving away from the aperture;
[0008] The spherical lens B has a front surface curvature radius greater than 0, curving toward the aperture, and a rear surface curvature radius less than 0, curving away from the aperture;
[0009] The curvature radii of the front and rear surfaces of the spherical lens C are both less than 0, and are both curved away from the aperture stop.
[0010] The front surface curvature radius of the spherical lens D is greater than 0 and is curved toward the aperture, and the rear surface curvature radius is less than 0 and is curved away from the aperture;
[0011] The spherical lens E has a front surface curvature radius greater than 0, curving toward the aperture, and a rear surface curvature radius less than 0, curving away from the aperture;
[0012] The front surface curvature radius of the spherical lens F is less than 0 and is curved away from the aperture stop, and the rear surface curvature radius is greater than 0 and is curved toward the aperture stop.
[0013] Wherein, the radii of curvature of the front and rear surfaces of the spherical lens G are both greater than 0, and are both curved away from the aperture stop;
[0014] The radii of curvature of the front and rear surfaces of the spherical lens H are both less than 0, and are both curved toward the aperture stop;
[0015] The radii of curvature of the front and rear surfaces of the spherical lens 1 are both less than 0, and are both curved toward the aperture.
[0016] Wherein, the radii of curvature of the front and rear surfaces of the spherical lens J are both less than 0, and are both curved toward the aperture stop;
[0017] The radii of curvature of the front and rear surfaces of the spherical lens K are both less than 0, and are both curved toward the aperture stop.
[0018] The lens magnification of the achromatic, athermal laser direct writing lithography objective lens is M=2.67 times, the object side NA is 0.09, and the diameter of the object side target surface is 24.6 mm.
[0019] The telecentricity of the achromatic, athermal laser direct writing lithography objective lens is less than 0.1 degrees, and the lens distortion is less than 0.01%.
[0020] The invention satisfies the following conditions:
[0021] 0.005 <f1 / f<0.06 (1)
[0022] 0.005 <f5 / f<0.05 (2)
[0023] -0.05 <f6 / f<-0.005 (3)
[0024] -0.2 <f7 / f<-0.01 (4)
[0025] -0.02 <f8 / f<-0.001 (5)
[0026] In the above conditional formula, f is the focal length of the entire lens, f1 is the focal length of lens 1, f5 is the focal length of lens 5, f6 is the focal length of lens 6, f7 is the focal length of lens 7, and f8 is the focal length of lens 8.
[0027] The present invention discloses an achromatic and athermal laser direct writing lithography objective lens. When used specifically, the spectral range is 365-435nm, the light source power supported is 100-120 watts, the lens magnification is M=2.67 times, the object NA is 0.09, the diameter of the object target surface is 24.6mm, the lens telecentricity is <0.1 degree, and the lens distortion is less than 0.01%. The spectral range is 365-435nm, the light source power supported is 100-120 watts, the lens magnification is M=2.67 times, the object NA is 0.09, the diameter of the object target surface is 24.6mm, the lens telecentricity is <0.1 degree, and the lens distortion is less than 0.01%. The spectral range is 365-435nm, the light source power supported is 100-120 watts, the lens magnification is M=2.67 times, the object NA is 0.09, the diameter of the object target surface is 24.6mm, the lens telecentricity is <0.1 degree, and the lens distortion is less than 0.01%. The chromatic aberration is compatible with the spectral range of 365nm-435nm, and the compatibility with the PCB ink model is improved. Moreover, athermalization can be achieved, and there is no focal plane drift when the light source power reaches 100-120 watts, which greatly improves the working efficiency of the lithography machine.
[0028] This solves the technical problem in the prior art that the lithography objective lens cannot withstand high-power light sources, causing focal plane drift at the level of hundreds of microns or even millimeters, exceeding the depth of field of the lens and causing poor exposure. BRIEF DESCRIPTION OF THE DRAWINGS
[0029] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0030] Figure 1 It is a schematic structural diagram of the achromatic, athermal laser direct writing lithography objective lens of the present invention.
[0031] Figure 2 It is a schematic structural diagram of embodiment 1 of the present invention.
[0032] Figure 3 It is a schematic diagram of the aberration curve of Example 1 of the present invention.
[0033] Figure 4 It is a schematic structural diagram of embodiment 2 of the present invention.
[0034] Figure 5 It is a schematic diagram of the aberration curve of Example 2 of the present invention.
[0035] Figure 6 It is a schematic structural diagram of embodiment 3 of the present invention.
[0036] Figure 7 It is a schematic diagram of the aberration curve of Example 3 of the present invention.
[0037] 1-parallel plate sealing glass A, 2-parallel plate sealing glass B, 3-spherical lens A, 4-spherical lens B, 5-spherical lens C, 6-spherical lens D, 7-spherical lens E, 8-spherical lens F, 9-spherical lens G, 10-spherical lens H, 11-spherical lens I, 12-spherical lens J, 13-spherical lens K, 14-aperture, 15-DMD, 16-exposure surface. DETAILED DESCRIPTION
[0038] Embodiments of the present invention are described in detail below. Examples of the embodiments are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, but should not be construed as limiting the present invention.
[0039] See also Figure 1 , Figure 1 It is a schematic structural diagram of the achromatic, athermal laser direct writing lithography objective lens of the present invention.
[0040] The present invention provides an achromatic, athermal laser direct writing lithography objective lens, comprising a lens assembly, a parallel plate sealing glass A1 and a parallel plate sealing glass B2, wherein the lens assembly is arranged between the parallel plate sealing glass A1 and the parallel plate sealing glass B2, and the lens assembly, the parallel plate sealing glass A1 and the parallel plate sealing glass B2 are all located in a lens barrel;
[0041] The lens assembly includes a spherical lens A3, a spherical lens B4, a spherical lens C5, a spherical lens D6, a spherical lens E7, a spherical lens F8, a spherical lens G9, a spherical lens H10, a spherical lens I11, a spherical lens J12 and a spherical lens K13. The spherical lens A3 is located on a side of the parallel plate sealing glass A1 close to the parallel plate sealing glass B2. The spherical lens B4 is located between the spherical lens A3 and the spherical lens C5. The spherical lens D6 is located between the spherical lens C5 and the spherical lens E7. The spherical lens F8 is located between the spherical lens E7 and the spherical lens G9. The spherical lens H10 is located between the spherical lens G 9 and the spherical lens I11, the spherical lens J12 is located between the spherical lens I11 and the spherical lens K13, and the parallel flat plate sealing glass B2 is located on a side of the spherical lens K13 away from the spherical lens J12.
[0042] Furthermore, the front surface curvature radius of the spherical lens A3 is greater than 0, and is curved toward the aperture 14, and the rear surface curvature radius is less than 0, and is curved away from the aperture 14; the front surface curvature radius of the spherical lens B4 is greater than 0, and is curved toward the aperture 14, and the rear surface curvature radius is less than 0, and is curved away from the aperture 14; the front and rear surface curvature radii of the spherical lens C5 are both less than 0, and are both curved away from the aperture 14.
[0043] Among them, the front surface curvature radius of the spherical lens D6 is greater than 0, and it is curved toward the aperture 14, and the rear surface curvature radius is less than 0, and it is curved away from the aperture 14; the front surface curvature radius of the spherical lens E7 is greater than 0, and it is curved toward the aperture 14, and the rear surface curvature radius is less than 0, and it is curved away from the aperture 14; the front surface curvature radius of the spherical lens F8 is less than 0, and it is curved away from the aperture 14, and the rear surface curvature radius is greater than 0, and it is curved toward the aperture 14.
[0044] At the same time, the front and rear surface curvature radii of the spherical lens G9 are both greater than 0, and are both curved away from the aperture 14; the front and rear surface curvature radii of the spherical lens H10 are both less than 0, and are both curved toward the aperture 14; the front and rear surface curvature radii of the spherical lens I11 are both less than 0, and are both curved toward the aperture 14.
[0045] Moreover, the radii of curvature of the front and rear surfaces of the spherical lens J12 are both less than 0, and both are curved toward the aperture 14 ; the radii of curvature of the front and rear surfaces of the spherical lens K13 are both less than 0, and both are curved toward the aperture 14 .
[0046] Again, the lens magnification M of the achromatic, athermal laser direct writing lithography objective lens is 2.67 times, the object side NA is 0.09, and the object side target surface size diameter is 24.6 mm. The lens telecentricity of the achromatic, athermal laser direct writing lithography objective lens is <0.1 degrees, and the lens distortion is less than 0.01%.
[0047] For this specific implementation, when used specifically, the spectral range is 365-435nm, the light source power supported is 100-120 watts, the lens magnification is M=2.67 times, the object NA=0.09, the object target surface size is 24.6mm in diameter, the lens telecentricity is <0.1 degrees, and the lens distortion is less than 0.01%. The spectral range is 365-435nm, the light source power supported is 100-120 watts, the lens magnification is M=2.67 times, the object NA=0.09, the object target surface size is 24.6mm in diameter, the lens telecentricity is <0.1 degrees, and the lens distortion is less than 0.01%. It can be achromatically compatible with the 365nm-435nm spectral range, improving its compatibility with the production of PCB ink models. It can also achieve athermalization, with no focal plane drift when the light source power reaches 100-120 watts, greatly improving the working efficiency of the lithography machine.
[0048] This solves the technical problem in the prior art that the lithography objective lens cannot withstand high-power light sources, causing focal plane drift at the level of hundreds of microns or even millimeters, exceeding the depth of field of the lens and causing poor exposure.
[0049] Embodiment 1:
[0050] See also Figure 2 and Figure 3 , Figure 2 is a schematic structural diagram of Embodiment 1 of the present invention, Figure 3 It is a schematic diagram of the aberration curve of Example 1 of the present invention.
[0051] In this embodiment, the design spectrum range is 365-435nm, the supported light source power is 100-120 watts, the lens magnification M=2.67 times, the object NA=0.09, the object target surface diameter is 24.6mm, the lens telecentricity is <0.1 degrees, and the lens distortion is less than 0.01%. The detailed lens parameters of Example 1 are shown in Table 1:
[0052] Table 1 Detailed lens parameters of Example 1
[0053]
[0054]
[0055] Embodiment 2:
[0056] See also Figure 4 and Figure 5 , Figure 4 is a schematic diagram of the structure of Embodiment 2 of the present invention, Figure 5 It is a schematic diagram of the aberration curve of Example 2 of the present invention.
[0057] In this embodiment, the design spectrum range is 365-435nm, the supported light source power is 100-120 watts, the lens magnification M=2.67 times, the object NA=0.09, the object target surface diameter is 24.6mm, the lens telecentricity is <0.1 degrees, and the lens distortion is less than 0.01%. The detailed lens parameters of Example 2 are shown in Table 2:
[0058] Table 2 Detailed lens parameters of Example 2
[0059]
[0060]
[0061] Embodiment 3:
[0062] See also Figure 6 and Figure 7 , Figure 6 is a schematic structural diagram of Embodiment 3 of the present invention, Figure 7 It is a schematic diagram of the aberration curve of Example 3 of the present invention.
[0063] In this embodiment, the design spectrum range is 365-435nm, the supported light source power is 100-120 watts, the lens magnification M=2.67 times, the object NA=0.09, the object target surface diameter is 24.6mm, the lens telecentricity is <0.1 degrees, and the lens distortion is less than 0.01%. The detailed lens parameters of Example 3 are shown in Table 3:
[0064] Table 3 Detailed lens parameters of Example 3
[0065]
[0066]
[0067] The above three embodiments all satisfy the conditions (1)-(5)
[0068]
[0069] The achromatic and athermal laser direct writing lithography objective lens of the present invention has a spectral range of 365-435nm, supports a light source power of 100-120 watts, a lens magnification of M=2.67 times, an object NA=0.09, an object target surface diameter of 24.6mm, a lens telecentricity of <0.1 degree, and a lens distortion of less than 0.01%. The spectral range is 365-435nm, supports a light source power of 100-120 watts, a lens magnification of M=2.67 times, an object NA=0.09, an object target surface diameter of 24.6mm, a lens telecentricity of <0.1 degree, and a lens distortion of less than 0.01%. The achromatic and athermal compatible spectral range of 365nm-435nm is improved, and its compatibility with the production of PCB ink models is improved. Moreover, athermalization can be achieved, and there is no focal plane drift when the light source power reaches 100-120 watts, which greatly improves the working efficiency of the lithography machine.
[0070] What is disclosed above is only a preferred embodiment of the present invention, and it certainly cannot be used to limit the scope of rights of the present invention. Ordinary technicians in this field can understand that all or part of the processes of the above embodiment and equivalent changes made according to the claims of the present invention still fall within the scope of the invention.
Claims
1. An achromatic, athermal laser direct writing lithography objective lens, characterized in that: The lens assembly comprises a parallel flat plate sealing glass A and a parallel flat plate sealing glass B, wherein the lens assembly is arranged between the parallel flat plate sealing glass A and the parallel flat plate sealing glass B, and the lens assembly, the parallel flat plate sealing glass A and the parallel flat plate sealing glass B are all located in a lens barrel; The lens assembly includes a spherical lens A, a spherical lens B, a spherical lens C, a spherical lens D, a spherical lens E, a spherical lens F, a spherical lens G, a spherical lens H, a spherical lens I, a spherical lens J and a spherical lens K. The spherical lens A is located on a side of the parallel plate sealing glass A close to the parallel plate sealing glass B, the spherical lens B is located between the spherical lens A and the spherical lens C, the spherical lens D is located between the spherical lens C and the spherical lens E, the spherical lens F is located between the spherical lens E and the spherical lens G, the spherical lens H is located between the spherical lens G and the spherical lens I, the spherical lens J is located between the spherical lens I and the spherical lens K, and the parallel plate sealing glass B is located on a side of the spherical lens K away from the spherical lens J.
2. The achromatic, athermal laser direct writing lithography objective lens according to claim 1, characterized in that: The spherical lens A has a front surface curvature radius greater than 0, curving toward the aperture, and a rear surface curvature radius less than 0, curving away from the aperture; The spherical lens B has a front surface curvature radius greater than 0, curving toward the aperture, and a rear surface curvature radius less than 0, curving away from the aperture; The curvature radii of the front and rear surfaces of the spherical lens C are both less than 0, and are both curved away from the aperture stop.
3. The achromatic, athermal laser direct writing lithography objective lens according to claim 2, characterized in that: The front surface curvature radius of the spherical lens D is greater than 0 and is curved toward the aperture, and the rear surface curvature radius is less than 0 and is curved away from the aperture; The spherical lens E has a front surface curvature radius greater than 0, curving toward the aperture, and a rear surface curvature radius less than 0, curving away from the aperture; The front surface curvature radius of the spherical lens F is less than 0 and is curved away from the aperture stop, and the rear surface curvature radius is greater than 0 and is curved toward the aperture stop.
4. The achromatic, athermal laser direct writing lithography objective lens according to claim 3, characterized in that: The radii of curvature of the front and rear surfaces of the spherical lens G are both greater than 0, and are both curved away from the aperture stop; The radii of curvature of the front and rear surfaces of the spherical lens H are both less than 0, and are both curved toward the aperture stop; The radii of curvature of the front and rear surfaces of the spherical lens 1 are both less than 0, and are both curved toward the aperture.
5. The achromatic, athermal laser direct writing lithography objective lens according to claim 4, characterized in that: The radii of curvature of the front and rear surfaces of the spherical lens J are both less than 0, and are both curved toward the aperture stop; The radii of curvature of the front and rear surfaces of the spherical lens K are both less than 0, and are both curved toward the aperture stop.
6. The achromatic, athermal laser direct writing lithography objective lens according to claim 5, characterized in that: The lens magnification of the achromatic, athermal laser direct writing lithography objective lens is M=2.67 times, the object side NA=0.09, and the diameter of the object side target surface size is 24.6 mm.
7. The achromatic, athermal laser direct writing lithography objective lens according to claim 5, characterized in that: The telecentricity of the achromatic, athermal laser direct-writing lithography objective lens is less than 0.1 degrees, and the lens distortion is less than 0.01%.