Workpiece processing equipment for processing workpiece by using microwaves and method for processing workpiece by using microwaves

Abstract

The workpiece handling device (1) comprises a signal amplification assembly (2) which is designed to amplify a radio frequency signal (5). The amplified radiofrequency signal (7) can be output to a resonator (8), into which a workpiece (9) to be processed can be inserted. According to the invention, a measuring device (10) and a processing device (11) are provided, said processing device (11) being designed to determine the resonance frequency (12) by means of the measuring device (10) generated in the resonator (8). The processing device (11) is further trained to follow a variation of the resonant frequency (12) during operation. The processing device (11) is intended to compare the path (28) of the offset of the resonant frequency (12) with a stored path (27) associated with the workpiece and to output a status message (13) corresponding to the progress of the process.

Description

Technical Field

[0001] The invention relates to a workpiece processing device for processing a workpiece using microwaves and a method for processing a workpiece using microwaves. Background Art

[0002] In microwave treatment, the workpiece to be treated is treated by applying electromagnetic waves in the microwave frequency range. The frequency range is in the range of 300 MHz to 300 GHz. The workpiece to be treated can include liquid, solid or gaseous workpieces with dielectric properties that allow microwaves to be fully or partially absorbed, such as aqueous suspensions, agricultural or chemical products, plasma-forming gases, etc. For this purpose, the workpiece to be treated is placed in a treatment chamber of a resonator, in which the microwaves propagate. The resonator here refers to a resonator into which one or more workpieces to be treated are introduced for microwave treatment and into which the microwave power of the microwave treatment is conducted, and which is designed so that microwave resonance can be formed inside it.

[0003] In addition, surface treatment of workpieces, such as etching or deposition of material layers, chemical or thermochemical treatments are also part of microwave processing. The workpiece to be processed can also be heated and thus dried or melted.

[0004] Such a processing device is known, for example, from US Pat. No. 9,860,941 B2.

[0005] The disadvantage of US 9,860,941 B2 is that the process progress during microwave treatment is not completely clear.

[0006] It is therefore an object of the present invention to create a workpiece processing device and a corresponding process by means of which workpieces can be treated with microwaves and the course of the process can be determined more precisely. Summary of the invention

[0007] This problem is solved by a workpiece processing device for treating workpieces with microwaves according to claim 1 and a method according to claim 30. Claims 2 to 29 describe advantageous further training of the workpiece handling device.

[0008] The workpiece handling device comprises a signal amplification component for generating a microwave signal for processing a workpiece. The frequency of the microwave signal is preferably 300 MHz to 300 GHz. Preferably, the microwave signal has a frequency of 2 GHz to 10 GHz. Preferably, the radio frequency (RF) signal has exactly one frequency, for example 2.5 GHz, and is also preferably unmodulated. The signal amplification component comprises an amplifier stage, which is intended to amplify the radio frequency signal. The signal amplification device comprises a signal output, which is used to output the amplified radio frequency signal. A resonator can be connected to the signal output terminal, and the workpiece to be processed is inserted therein. The provided amplified radio frequency signal acts as a microwave on the workpiece to be processed in the resonator. The workpiece handling device also includes a measuring device and a processing device. The processing device is preferably a processor, such as a microcontroller, and / or a programmable logic device, such as an FPGA, which is an abbreviation for a field programmable gate array. The processing device may also include an integrated memory and / or an external memory. The processing device is intended to use a measuring device to determine a specific frequency of the workpiece, in particular a resonant frequency generated in the resonator. In addition, the processing device is intended to track changes in the specific frequency of the workpiece during operation, in particular the resonant frequency. "History" here refers to frequency data arranged in chronological order. This data generates a graphical representation over time so that when combined it forms a curve. For example, studies have shown that during the operation of workpiece handling equipment, the resonant frequency changes. If the workpiece dries or melts, for example, the workpiece ε relative permittivity changes. This also changes the resonant frequency within the resonator, for example. Other identifiable workpiece-specific frequencies also change as a result. Preference is given to workpieces whose dimensions do not change during the microwave processing. These dimensions are therefore preferred. The free volume in the resonator therefore does not change during the processing. The handling equipment is also trained to compare the course of the shift in the workpiece-specific frequencies (in particular the resonant frequency) with the stored workpiece-dependent courses in order to output a status message corresponding to the progress of the process based on this comparison.

[0009] "Workpiece-specific frequency", in particular "resonant frequency", refers to the frequency given by a resonator including the workpiece. Since usually only the properties of the workpiece change, and not the properties of the resonator, the term "workpiece-specific frequency" is appropriate.

[0010] Due to the workpiece handling device according to the invention, targeted statements about the progress of the process can be made in a particularly effective manner while the workpieces are being processed. For many workpieces, such as foils, it is difficult to make statements after the process has been completed because the workpieces cool down very quickly. By determining and storing the workpiece-related route for each workpiece, simple measures can be taken to check whether the workpiece-specific frequencies (especially the resonant frequencies) change when the current workpiece is processed in the same way as the stored workpiece-specific frequencies (especially the resonant frequencies). Deviations therefrom can be output immediately, i.e. in real time.

[0011] In advantageous training sessions, the status message includes a progress bar that shows how far the workpiece has been machined. In addition, the status message includes a percentage display that shows how far the workpiece has been machined. In addition, the status message includes a time display that shows how long the machining of the workpiece has taken and / or how long machining is still required. This means that the operator of the workpiece handling system can directly view the current process status.

[0012] In advantageous training sessions, status messages indicate changes in the state of the resonator and / or the workpiece to be processed. Changes in state include, in particular, changes in temperature and / or changes in the state of the material and / or changes in the state of drying and / or changes in humidity. This enables the operator of the workpiece processing system to immediately draw conclusions about the amount of residual moisture in the workpiece. Depending on the evaporated moisture, workpiece-specific frequencies, in particular the resonant frequency, change. By recording this change, the current process progress can be measured very precisely.

[0013] In an advantageous training course, the status message comprises an error indicator if the deviation during the tracking of the deviation of the workpiece-specific frequency, in particular the resonant frequency, relative to the stored workpiece-related course reaches or exceeds a predetermined threshold value. The deviation may in particular comprise a deviation of the workpiece-specific frequency, in particular the resonant frequency. If the changing workpiece-specific frequency, in particular the resonant frequency, no longer corresponds to the stored workpiece-specific frequency, in particular the resonant frequency, which should occur during the course, a corresponding error indicator can be output. For example, if the stored workpiece-related data comprise a frequency change of the resonant frequency from 2.5 GHz to 2.52 GHz, while the resonant frequency only varies between 2.5 GHz and 2.51 GHz, an error conclusion can be drawn and a corresponding error indicator can be issued. Furthermore, the deviation can also comprise a time-varying deviation, in which the workpiece-specific frequency, in particular the resonant frequency, varies. For example, if the stored workpiece-related data comprise a frequency change of the resonant frequency from 2.5 GHz to 2.52 GHz within 30 seconds, and the resonant frequency varies from 2.5 GHz to 2.52 GHz within 15 seconds, an error conclusion can be drawn and a corresponding error indicator can be issued.

[0014] For example, the status message can be displayed on a computer screen connected to the processing facility. The status message can also be transmitted to a remote computer system. For example, the remote computer system can include a smartphone, a tablet, a laptop and / or a PC. The remote computer system can call up a website that displays the status message or start a corresponding application that calls up the status message. The status message is in particular a visual output. In addition, the status message can also be output acoustically. This is particularly true for error indicators.

[0015] In an advantageous further training, the processing device is trained to control the amplifier stage to increase the amplification of the RF signal and / or the level of the amplified RF signal if the tracking process of the deviation of the workpiece-specific frequency, in particular the tracking process of the resonant frequency, occurs slower than the stored workpiece-dependent progress. For example, if the course changes 30% slower than the stored workpiece-related historical record, the power of the amplified RF signal can be increased by 30%. In addition or alternatively, the processing device is designed to control the amplifier stage to reduce the amplification of the RF signal and / or the level of the amplified RF signal if the tracking process of the deviation of the workpiece-specific frequency, in particular the tracking process of the resonant frequency, occurs faster in time than the stored workpiece-dependent progress. For example, if the speed of change of the route is 30% faster than the stored workpiece-related historical record, the output can be reduced by 30%.

[0016] In an advantageous further training course, the processing device is trained to switch off the amplifier platform, for example to switch off the supply voltage, and / or the deviation during the tracking of the deviation of the workpiece-specific frequency, in particular the resonant frequency, compared to the stored workpiece-related courses, reaches or exceeds a predetermined threshold value, and / or to reduce their amplification in this way. If the workpiece-specific frequency, in particular the resonant frequency, increases by only 2 MHz, while the workpiece-specific frequency, in particular the resonant frequency, increases by 3 MHz, then the corresponding threshold value may be reached or exceeded. Furthermore, if the change of the workpiece-specific frequency, in particular the resonant frequency, occurs within 30 seconds and, for the workpiece currently being processed, has occurred after 20 seconds, then the corresponding threshold value may be reached or exceeded. In addition or alternatively, the processing device is designed to generate a control signal and transmit it to the signal generator device, wherein the control signal causes the signal generator device to stop generating the radio frequency signal of the amplified radio frequency signal. The signal generator device can be part of the workpiece handling device or can be located outside the workpiece handling device. In this case, the workpiece handling device will include a corresponding radio frequency signal input port for the radio frequency signal.

[0017] In an advantageous further development, a measuring device is provided which is trained to measure the forward power in the direction of the resonator and to measure the reverse power of the resonator. Preferably, the forward power of the amplified radio frequency signal transmitted in the direction of the resonator is measured. The power of the reflected part of the amplified radio frequency signal from the resonator can also be measured. This is the reverse power. The processing device is trained to determine the workpiece-specific frequency, in particular the resonant frequency, from the measured forward power and the measured reverse power.

[0018] In an advantageous further training, the measuring device comprises a first directional coupler, wherein the first directional coupler is trained to record the forward power. The measuring device also preferably comprises a second directional coupler, wherein the second directional coupler is designed to record the reverse power. The first and / or second directional coupler is preferably built on a printed circuit board. The forward power and the reverse power can be digitized by corresponding A / D converters. These A / D converters can be part of the measuring device or the processing device.

[0019] In a favorable further training, the workpiece-specific frequency is the ratio between the forward power and the reverse power within a given range. In a favorable training course, the ratio between the forward power and the reverse power is at most or less than 5% of the maximum value of the maximum value at the resonant frequency. This means that the maximum power can be transferred to the resonator. In this operating state, the reflection from the resonator back to the signal amplification component is minimal. During microwave processing, the workpiece ε relative dielectric constant changes and the ratio of forward power to reverse power also changes. By changing the frequency of the RF signal, this ratio can be maximized again in favor of the forward power. Many processes can obtain adequate results even if the ratio between forward power and reverse power is within a given range, especially at or less than 5% of the maximum value.

[0020] In an advantageous further training, the measuring device is trained to measure the forward power and the reverse power of the amplified RF signal. If a second amplified RF signal is fed to a resonator, which contains a frequency different from the frequency of the RF signal, the measuring device can also be designed to measure the forward power and the reverse power of the second amplified RF signal. It can then be determined whether the frequency of the amplified RF signal corresponds to a corresponding workpiece-specific frequency, in particular the resonant frequency, and whether the frequency of the second amplified RF signal corresponds to a workpiece-specific frequency, in particular the resonant frequency. If both amplified RF signals are fed to different connections of the resonator, the workpiece-specific frequencies, in particular the resonant frequencies of the corresponding amplified RF signals, may differ because the local power supplies of the resonator are different and different modes are formed.

[0021] In an advantageous training, the processing device is trained to follow the course of changes in the workpiece-specific frequency, in particular the resonant frequency, during operation by controlling the signal generator device so that it continuously changes the frequency of the radio frequency signal. A frequency of the radio frequency signal is maintained in which the ratio between the forward power and the reverse power is at most or less than 5% of the maximum value. The frequency can be changed according to a stored history associated with the workpiece. In principle, it is also conceivable that the signal generator device increases and / or decreases the frequency by a certain frequency value, for example less than 10 Hz, 100 Hz, 1 kHz, 10 kHz, 10 kHz, 1 MHz or less than 100 MHz, and checks whether the ratio between the forward power and the reverse power improves in favor of the forward power with the newly set frequency. If this is the case, the newly set frequency can be maintained. Otherwise, the previous frequency is maintained. The new frequency can be set for a short time before the test, in particular less than 200 ms, 100 ms, 50 ms, 10 ms or less than 1 ms. This process can be repeated regularly, in particular within 50 ms, 100 ms, 500 ms, 1 second, 2 seconds.

[0022] In an advantageous further training, the measuring device is intended to measure the forward power and the reverse power of a radio frequency measuring signal, which signal can be fed to the resonator in addition to the amplified radio frequency signal. The power of the radio frequency measuring signal is less than the power of the amplified radio frequency signal, so that the frequency of the radio frequency measuring signal is different from the frequency of the amplified radio frequency signal. The radio frequency measuring signal is only used to determine the specific frequency of the workpiece, in particular the resonant frequency, and is not particularly used for microwave processing of the workpiece. The radio frequency measuring signal can be fed to the resonator via the same connection, through which the amplified radio frequency signal is also provided. The radio frequency measuring signal can also be fed to the resonator via another connection. Preferably, the processing device is designed to track the process of the deviation of the specific frequency of the workpiece, in particular the resonant frequency, by controlling the signal generator device during operation so that it continuously changes the frequency of the radio frequency measuring signal. The frequency of the radio frequency measuring signal is maintained, in which the ratio between the forward power and the reverse power is at most or less than 5% of the maximum value. For example, the change can be made based on a stored workpiece-related history. In addition, it is also possible to increase and / or decrease the frequency regularly and then check whether the newly set frequency has a change in the ratio of the forward power to the reverse power in favor of the forward power of the radio frequency measuring signal. In this case, the newly set frequency will be maintained for a period of time. The processing device is further trained to drive the signal generator device so that the signal generator device increases or decreases the frequency of the radio frequency signal to approximately the same extent as the radio frequency measurement signal, i.e. in particular to the same frequency value. If the radio frequency measurement signal is increased by 1 kHz to achieve a better forward power and reverse power ratio, thereby favoring the forward power, the frequency of the radio frequency signal may also be increased by 1 kHz. The measurement signal may allow or specify an offset of less than 20%, 10% or less than 5% of the radio frequency signal. The frequencies of the radio frequency signal and the radio frequency measurement signal are preferably less than 1 kHz, 10 kHz, 100 kHz, 1 MHz or preferably less than 10 MHz.

[0023] In an advantageous embodiment, the amplifier stage of the signal amplification component comprises one or more signal amplifiers arranged in series. These may be transistors, for example. The one or more signal amplifiers arranged in series are intended to amplify radio frequency signals.

[0024] In an advantageous further development, the amplifier stage of the signal amplification component comprises a plurality of signal amplifiers arranged in parallel, wherein the plurality of signal amplifiers arranged in parallel are designed to amplify the radio frequency signal in parallel and output it simultaneously to a plurality of signal outputs. The signal amplifier may be designed in the form of a transistor.

[0025] In an advantageous training, if the workpiece processing device comprises a resonator, some or all of the signal outputs can be connected to different inputs of the resonator. This allows a particularly uniform electric field to be generated within the resonator. Furthermore, a combiner arrangement can be provided, by which some or all of the signal outputs can be connected to a common input of the resonator. Such a combiner arrangement can be single-stage or multi-stage.

[0026] In an advantageous training, the amplifier stage of the signal amplification assembly is designed to amplify a second radio frequency signal generated by the signal generator device, for example, the second radio frequency signal has a frequency different from the frequency of the radio frequency signal. This allows exciting more modes in the resonator. The second amplified radio frequency signal may have the same power as the amplified radio frequency signal. The second amplified radio frequency signal may also have a power less than or greater than the amplified radio frequency signal.

[0027] In an advantageous embodiment, the signal amplification assembly comprises a second amplifier stage, which is intended to amplify a second radio frequency signal generated by the signal generator device, for example, wherein the second radio frequency signal has a frequency different from the frequency of the radio frequency signal. The first amplifier stage and the second amplifier stage may be identical or of different construction.

[0028] In an advantageous training, the second amplified RF signal can be fed to an input on the same resonator as the amplified RF signal. If the RF signal and the second RF signal use different amplifier levels, a combiner arrangement can be used to combine the two amplified RF signals and feed them to the same input of the resonator.

[0029] In a beneficial training session, the processing facility is trained to generate and transmit an initial frequency control signal to the signal generator device. The first frequency control signal includes a frequency preset that causes the signal generator device to generate an RF signal at a specified frequency and output it to the signal amplification array. This allows the frequency of the RF signal to be changed on the fly, preferably very quickly, to a desired target value where the ratio between forward power and reverse power is maximized in favor of forward power, or less than 5% of the maximum value.

[0030] In a beneficial training, the processing facility is trained to generate a second frequency control signal and transmit it to the signal generator device. The second frequency control signal includes a frequency preset that causes the signal generator device to generate a second radio frequency signal at a specified frequency and output it to the signal amplification array. This allows the frequency of the second radio frequency signal to be changed on the job, preferably very quickly to a desired target value, for which the ratio between forward power and reverse power is maximized in favor of the forward power, or less than 5% of the maximum value.

[0031] In a favorable training course, the processing facility is trained to change the frequency of the operating RF signal and the second RF signal according to the first and second frequency control signals. This can stimulate the operation of more modes. It also ensures that the ratio between the forward power and the reverse power is maximized to support the forward power, or less than 5% of the maximum value.

[0032] In an advantageous training, the processing device is trained to control the signal generator device so that it changes the frequency of the radio frequency signal so that the frequency corresponds to a specific frequency (especially a resonant frequency) of the current workpiece or deviates from this frequency by less than 10%. This allows a particularly large power to be transmitted to the resonator for microwave processing.

[0033] In an advantageous further development, a radio frequency signal input connection is provided, via which the HF signal from the signal generator device can be fed to the workpiece processing device. There may also be further radio frequency signal input connectors for feeding a second radio frequency signal and / or a radio frequency measurement signal. The radio frequency measurement signal can also be fed directly to the resonator. Additionally or optionally, the workpiece processing device comprises a signal generator device, a signal generator device comprising a signal generator and a signal generator device designed to generate a radio frequency signal. The signal generator can also be designed to generate a second radio frequency signal and / or a radio frequency measurement signal. Alternatively, other signal generators can be used to generate the second radio frequency signal and / or the radio frequency measurement signal. These other signal generators preferably belong to the signal generator device.

[0034] In an advantageous embodiment, the workpiece processing device comprises a resonator, wherein the signal amplification component is electrically connected to the resonator, in particular via a cable or a waveguide.

[0035] In an advantageous training, the signal amplification component is intended to amplify a second radio frequency signal, the signal comprising a frequency different from the frequency of the radio frequency signal. The resonator comprises a first input at which the amplified radio frequency signal is fed to the resonator. The resonator also comprises a second input at which the second amplified radio frequency signal is fed to the resonator.

[0036] In an advantageous further development, the resonator comprises a positioner, wherein the positioner consists of mounting elements, such as screws and / or clamps or jaws, which are arranged in such a way that the workpiece can only be inserted into the resonator in a permitted orientation and / or angular position. This ensures that the workpiece can only be inserted into the resonator in a precisely defined orientation, so that the comparison of the displacement course of a workpiece-specific frequency, in particular the resonance frequency, with a stored workpiece-dependent course is not influenced by different orientations of the workpiece in the resonator.

[0037] The method according to the present invention is used to perform microwave processing on a workpiece having a workpiece handling device. In particular, the workpiece handling device is constructed according to one of the previous embodiments, wherein a microwave signal can be generated from a fed radio frequency signal by a signal amplification device. In a first process step, the workpiece to be processed is inserted into a resonator. In a second process step, the radio frequency signal is amplified and fed to the resonator. In a third process step, the workpiece-specific frequency generated in the resonator is determined, in particular the resonant frequency. In a fourth process step, the change process of the workpiece-specific frequency (in particular the resonant frequency) is tracked. In a fifth process step, the offset process of the workpiece-specific frequency (in particular the resonant frequency) is compared with a stored workpiece-related process, and a status message corresponding to the process progress is output. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Various embodiments of the present invention are described below by way of examples in conjunction with the accompanying drawings. The same objects have the same reference numerals. The corresponding figures in the accompanying drawings show in detail:

[0039] Figure 1 , 2 , 3, 4: Various embodiments of a workpiece handling device with a resonator;

[0040] Figure 5 : The ratio between reverse power and forward power;

[0041] Figure 6 , 7 : Changes in resonant frequency before and after microwave treatment;

[0042] Figure 8 : Progress of resonant frequency during microwave processing;

[0043] Fig. 9 : An embodiment of an amplifier stage of a signal amplification component having a plurality of signal amplifiers arranged in series;

[0044] Fig.10 : An embodiment of the amplifier stages of the signal amplification component, wherein the signal amplifiers are arranged in parallel; and

[0045] Fig.11 : A method of machining a workpiece using a workpiece handling device. DETAILED DESCRIPTION

[0046] Figure 1An embodiment of a workpiece handling device 1 is shown. The workpiece handling device 1 comprises a signal amplification component 2. The signal amplification component 2 comprises an amplifier stage 3 and a signal amplifier 4. The signal amplification component 2 is intended to amplify a radio frequency signal 5. The signal amplification device comprises a signal output 6 (Signal output) for outputting an amplified radio frequency signal 7 (amplified RF signal). Preferably, the signal amplifier 4 has a transistor, which preferably still operates within its linear range. Basically, the signal amplification component 2 can still include an attenuation device 30, 31 to attenuate the radio frequency signal 5 or the amplified radio frequency signal 7 by an adjustable value so that it includes a predetermined signal power.

[0047] The resonator 8 is connected to the signal output 6. A workpiece 9 to be machined can be inserted into the resonator 8.

[0048] Furthermore, the workpiece handling device 1 comprises a measuring device 10 and a processing device 11. The processing device 11 is designed to determine a workpiece-specific frequency, in particular a resonant frequency 12, such as Figure 5 As shown, it is generated in the resonator 8 by the measuring device 10. The processing device 11 is further trained to follow the deviation trajectory 28, for example Figure 8 As shown, during the operation of the workpiece processing device 1, the workpiece-specific frequency, in particular the resonant frequency 12, is shifted. The processing device 11 is designed to compare the shift trajectory 28 of the workpiece-specific frequency (in particular the resonant frequency 12) with the stored workpiece-dependent process 27, such as Figure 8 As shown, a status message 13 corresponding to the progress of the process is output.

[0049] The status message 13 may be output on a computer screen 14 , for example, which is connected to the processing device 11 .

[0050] The processing device 11 can be designed to control the amplifier stage 3 in such a way that it increases the amplification of the radio frequency signal 5 if the deviation trajectory 28 of the workpiece-specific frequency, in particular the resonant frequency 12, is slower in time than the stored workpiece-dependent process 27. If the deviation trajectory 28 of the workpiece-specific frequency, in particular the resonant frequency 12, occurs faster in time than the stored workpiece-dependent process 27, this will reduce the amplification of the radio frequency signal 5.

[0051] The workpiece handling device 1 further comprises a radio frequency signal input port 15, through which a radio frequency signal 5 from a signal generator device 16 can be fed into the workpiece handling device 1. Figure 1 In the embodiment of the invention, the signal generator device 16 is not part of the workpiece handling device 1. However, the workpiece handling device 1 may comprise the signal generator device 16. In order to generate the radio frequency signal 5, the signal generator device 16 comprises a first signal generator 17.

[0052] The processing device 11 is designed to drive the signal generator device 16 in such a way that the frequency of the radio frequency signal 5 is changed to a specific frequency specification. Preferably, the frequency of the radio frequency signal 5 should correspond to a specific frequency of the current workpiece, in particular the resonant frequency 12, which is generated in the resonator 8 or deviates from it by less than 10%. To this end, the processing device 11 can generate an initial frequency control signal and transmit it to the signal generator device 16. The first frequency control signal can include the frequency specification. Based on the frequency specification, the signal generator device 16 can generate a radio frequency signal 5 of a specified frequency and output it to the signal amplification component 2.

[0053] The processing device 11 is designed to shut down or control the amplifier stage 3 so that it reduces the gain of the radio frequency signal 5 after successful processing of the workpiece 9 and / or to generate and transmit a control signal to the signal generator device 16, which causes the signal generator device 16 to stop generating the radio frequency signal 5. The same action can also be performed if the deviation of the deviation trajectory 28 of the workpiece-specific frequency, in particular the resonant frequency 12, reaches or exceeds a predetermined threshold value compared to the stored workpiece-related process 27. For example, if Figure 8 shown.

[0054] For example, the measuring device 10 is designed to measure the forward power P in the direction of the resonator 8. fwd and measure the reverse power P from resonator 8 bwd The processing device 11 is then trained to calculate the forward power P according to the measured forward power P fwd And the measured reverse power P bwd Determine the workpiece-specific frequencies, in particular the resonant frequency 12. In particular, the forward power P fwd and reverse power P bwd Measured by the amplified RF signal 7.

[0055] In principle, it is also conceivable to generate a radio frequency measurement signal and feed it to the resonator 8. The forward power and the reverse power of the radio frequency measurement signal can then be measured by the measuring device 10. Changes in the workpiece-specific frequencies of the radio frequency measurement signal, in particular the resonance frequency 12, also correspond to the progress of the process.

[0056] At the resonant frequency 12, the forward power P fwd and reverse power P fwd With forward power P fwd The ratio is not greater than or less than 5% of the maximum value. In this case, almost no power from the resonator 8 is reflected back to the signal amplification device 2.

[0057] The measuring device 10 preferably comprises a first directional coupler 10a and a second directional coupler 10b. The first directional coupler 10a is designed to measure the forward power P of the amplified radio frequency signal 7.fwd The second directional coupler 10b is designed to measure the reverse power P of the amplified radio frequency signal 7. bwd .

[0058] The processing device 11 is designed to track the deviation trajectory 28 of the workpiece specific frequency (especially the resonant frequency 12) during operation by controlling the signal generator device 16 so that the signal generator device 16 continuously changes the frequency of the radio frequency signal 5. In this case, the frequency of the radio frequency signal 5 can be maintained, wherein the forward power P fwd and reverse power P bwd The ratio between them is favorable for the forward power P fwd Maximum or less than 5% of the maximum value.

[0059] Preferably, a circulator 25 is also provided. The circulator 25 is preferably located between the signal amplification component 2 and the measuring device 10. It is intended to convert the reverse power P bwd The circulator 25 is dissipated into the sump 26 so that it does not meet the signal amplification device 2. The second directional coupler 10b can also be located between the circulator 25 and the sump 26. Instead, the circulator 25 should continue to be designed in such a way that it conducts the amplified radio frequency signal 7 from the signal amplification device 2 to the resonator 8.

[0060] Figure 2 Another embodiment of the workpiece handling device 1 is shown. Figure 1 In contrast, the signal generator device 16 is part of the workpiece handling device 1 .

[0061] An example of the field distribution of the electric field (E-field) 18 in the resonator 8 is also shown. Darker areas indicate that the field strength of the electric field 18 is higher than in lighter areas. The field distribution looks different for different resonant frequencies 12 and / or different workpieces 9 to be processed. The field distribution also changes as the process proceeds. In this way, areas with higher field strengths of the electric field 18 can be created where areas with lower field strengths were found a few seconds ago.

[0062] Further, an embodiment of a status message 13 is shown. The status message 13 includes a progress bar which shows the extent to which the workpiece 9 has been processed. The status message 13 also includes a percentage display which shows the extent to which the workpiece 9 has been processed. In this embodiment, the processing has been completed at 48% of the final state.

[0063] Figure 3 Another embodiment of the workpiece handling device 1 is shown. Figure 2 On the contrary, status message 13 comprises a time display, shows how long the processing of workpiece 9 has been carried out and / or how long the processing needs.In the present embodiment, the processing of workpiece 9 has been carried out for 20 seconds, and it is estimated that 45 seconds are also needed.

[0064] In principle, it is also conceivable that the status message 13 indicates a change in state in the resonator 8 and / or a change in state of the workpiece 9 to be processed. The change in state may be a change in temperature, a change in the state of the material, a change in the state of drying and / or a change in humidity. Figure 3 It shows that a temperature change of 60K has occurred.

[0065] Furthermore, the signal generator device 16 comprises a second signal generator 21, which is designed to generate a second radio frequency signal 19. The signal amplification array 2 in this embodiment comprises a second amplifier stage 22, into which the second radio frequency signal 19 is fed, and which is designed to amplify the second radio frequency signal 19.

[0066] The signal amplification array 2 further comprises a second signal output 23, where the second amplified radio frequency signal 20 is output. Figure 3 The middle dotted lines are the test leads and control lines of the second RF signal 19 .

[0067] Further, the resonator 8 in this embodiment comprises a first input 8a and a second input 8b. The first input 8a is fed to the amplified radio frequency signal 7. The second amplified radio frequency signal 20 or the radio frequency measurement signal is fed to the second input 8b. This excites different modes in the resonator 8. It can be seen that the field distribution of the electric field 18 has changed and other areas with higher field strength have been added.

[0068] The processing device 11 is designed to generate a second frequency control signal and transmit it to the signal generator device 16 and internally to the second signal generator 21. The second frequency control signal includes a frequency preset that causes the signal generator device 16 to generate a second radio frequency signal 19 at a predetermined frequency and output it to the signal amplification component 2.

[0069] The processing device 11 is designed to continuously and independently change the frequencies of the radio frequency signal 5 and the second radio frequency signal 19 during operation by means of the first and second frequency control signals.

[0070] If the signal generator device 16 generates a radio frequency measurement signal instead of the second radio frequency signal 19, the radio frequency measurement signal can bypass the signal amplification device 2 and be fed directly to the second input 8 b of the resonator 8. It is also conceivable that the radio frequency measurement signal is fed to the second input 8 b of the resonator 8 via the signal amplification device 2, so that the amplification of the radio frequency measurement signal is kept to a minimum or switched off by the signal amplification device 2.

[0071] In principle, the measuring device 10 measures the forward power P from one of the two amplified radio frequency signals 7, 20. fwd and reverse power P bwdIn this embodiment, the measuring device 10 further includes a third directional coupler 10c and a fourth directional coupler 10d. The third directional coupler 10c is designed to measure the forward power P of the second amplified RF signal 20. fwd_2 The fourth directional coupler 10d is designed to measure the reverse power P of the second amplified RF signal 20. bwd_2 The processing device 11 is further designed to, based on the second amplified radio frequency signal 20P bwd_2 Forward power P fwd_2 and reverse power to determine the resonant frequency 12.

[0072] In principle, it is also conceivable that the amplifier stage 3 of the signal amplification device 2 simultaneously amplifies the radio frequency signal 5 and the second radio frequency signal 19. In this case, the amplifier stage 3 prefers to work broadband, or the frequencies of the radio frequency signal 5 and the second radio frequency signal 19 are so close to each other that both radio frequency signals 5, 19 can be amplified by the amplifier stage 3 without distortion.

[0073] Figure 4 Another embodiment of the workpiece handling device 1 is shown. Figure 3 As shown, Figure 4 The signal generator device 16 in the embodiment comprises a first signal generator (Signal Generator) 17 and a second signal generator 21. The first signal generator 17 is intended to generate a radio frequency signal 5. The second signal generator 21 is designed to generate a second radio frequency signal 19 or a radio frequency measurement signal. The signal amplification component 2 comprises an amplifier stage 3 and a second amplifier stage 22. The amplifier stage 3 is intended to amplify the radio frequency signal 5 and output it as an amplified radio frequency signal 7 to the signal output 6. The second amplifier stage 22 is designed to amplify the second radio frequency signal 19 and output it as a second amplified radio frequency signal 20 at the second signal output terminal 23.

[0074] The workpiece handling device 1 comprises a combiner device 24. The signal output 6 and the second signal output 23 are connected to the combiner device 24 and to a common input 24a of the resonator 8 via a combiner assembly 8. The measuring device 10 is located at the common connection between the combiner device 24 and the resonator 8 and is capable of measuring the amplified radio frequency signal 7 and / or the second amplified radio frequency signal 20 in terms of forward power and reverse power. In principle, the measuring device 10 can still have a filter arrangement to measure only the amplified radio frequency signals 7, 20 or both amplified radio frequency signals 7, 20, respectively.

[0075] Figure 4A status message 13 is also displayed, including an error indicator. The error indicator indicates that a deviation of a deviation trajectory 28 of a workpiece-specific frequency, particularly a resonant frequency 12, has reached or exceeded a predetermined threshold value compared to a stored workpiece-dependent process 27. Such a deviation may include a deviation of a workpiece-specific frequency, particularly a resonant frequency 12, or a deviation in a time course during which a workpiece-specific frequency, particularly a resonant frequency 12, changes.

[0076] Basically, a first signal generator 17 can be used which is designed to generate all RF signals 5,19, ie the RF signal 5, the second RF signal 19 and the RF measurement signal. However, it is preferred to use separate first signal generators 17,21 to generate the respective RF signals 5,19.

[0077] Figure 5 S-parameter measurements of the parameter S11 are shown. This represents the amount of reverse power within a certain frequency range. It can be seen that different resonances can be formed in the resonator 8. Where the reverse power is low, a particularly high proportion of the amplified RF signal 7 is transmitted to the resonator. At these points, the ratio of the forward power to the reverse power of the amplified RF signal 7 is at most or less than 5% of the maximum value, with the maximum value being shifted towards the forward power. Possible resonant frequencies 12 are plotted, whereby the processing device 11 is designed to control the signal generator device 6 in such a way that it generates a radio frequency signal 5 having a corresponding resonant frequency 12.

[0078] Figure 6 Shows Figure 5 1. The enlarged portion of the dotted line area in FIG. 1. In the present embodiment, the resonant frequency 12 is 2.5 GHz. In addition, if the signal generator device 16 generates a radio frequency signal 5 having a frequency corresponding to the resonant frequency 12, a field distribution of the electric field 18 occurs as shown in the figure. This field distribution of the electric field 18 may occur at the beginning of microwave processing. Processing the workpiece 9 may cause a shift in the resonant frequency 12 and a change in the magnetic field distribution of the electric field 18, such as Figure 7 shown.

[0079] Figure 7 The end of the microwave processing of the workpiece is shown. The resonant frequency has shifted to 2.505 GHz. The processing facility 11 is designed to track this shift trajectory 28 of the resonant frequency 12 in operation. To this end, the training processing device 11 generates an initial frequency control signal and transmits it to the signal generator device 16, wherein the first frequency control signal includes a frequency specification for causing the signal generator device 16 to generate a radio frequency signal 5 of a specified frequency and transmit it to the signal amplification component 2. The frequency specification corresponds to the current value of the changed resonant frequency 12 or differs from it by less than 10%.

[0080] Figure 8An example of a stored workpiece-dependent course 27 of a resonance frequency 12 is shown, the diagram showing the change in frequency f over time t. This stored workpiece-dependent course 27 is represented by a solid line. The subsequent deviation trajectory 28 of the resonance frequency 12 is shown together with the measuring device 10 on a dashed line. Starting from a certain time t0, the deviation trajectory 28 of the resonance frequency 12 begins to deviate from the stored workpiece-dependent course 27. This frequency deviation Δf reaches or exceeds a threshold value at a certain point in time. In this case, the frequency of the deviation trajectory 28 of the resonance frequency 12 increases too much. In this case, a status message 13 is preferred, which includes an error indicator.

[0081] Fig. 9 An embodiment of an amplifier stage 3 of a signal amplification array 2 is shown. In this case, the signal amplification component 2 comprises a plurality of signal amplifiers 4 arranged in series, which are designed for amplifying the radio frequency signal 5 or the second radio frequency signal 19 .

[0082] Fig.10 An embodiment of an amplifier stage 3 of a signal amplification array 2 is shown, in which signal amplifiers 4 are arranged in parallel. Several signal amplifiers 4 arranged in parallel are intended to amplify radio frequency signals 5 in parallel and to output them selectively to a plurality of signal outputs 6, 23. These signal outputs 6, 23 are combined in a Fig.10 Before this, the RF signal 5 can be separated from the splitter array 29 and fed to the corresponding signal amplifier 4.

[0083] Fig.11 A flow chart of a method for processing a workpiece 9 using a workpiece processing fixture 1 is shown. In particular, the workpiece handling device 1 is constructed according to one of the above-described embodiments, wherein a microwave signal can be generated from a provided radio frequency signal 5 by a signal amplification device 2. In a first process step S1, the workpiece 9 to be processed is inserted into the resonator 8. In a second process step S2, the radio frequency signal 5 is amplified and fed to the resonator 8. In a third process step S3, a workpiece-specific frequency, in particular a resonant frequency 12 generated in the resonator 8, is determined. In a fourth process step S4, a deviation trajectory 28 of the workpiece-specific frequency, in particular the resonant frequency 12, is followed. In a fifth process step S5, the deviation trajectory 28 of the workpiece-specific frequency (in particular the resonant frequency 12) is compared with a stored workpiece-related process 27, and a status message 13 corresponding to the process progress is issued.

[0084] The invention is not limited to the exemplary embodiments. Within the framework of the invention, all described and / or illustrated features can be combined with one another as desired.

Claims

1. A workpiece processing device (1) having a signal amplification component (2) for generating a microwave signal for processing a workpiece (9), Features: The signal amplification component (2) comprises an amplifier stage (3) which is designed to amplify a radio frequency signal (5) into an amplified radio frequency signal (7); The signal amplification component (2) comprises a signal output terminal (6) for outputting an amplified radio frequency signal (7), wherein the signal output terminal (6) can be connected to a resonator (8), and the signal output terminal (6) can be inserted into a workpiece (9) to be processed; The signal amplification component (2) comprises a measuring device (10) and a processing device (11), wherein the processing device (11) is designed to determine a specific frequency of the workpiece generated in the resonator (8), in particular a resonant frequency (12), by means of the measuring device (10); The processing device (11) is further trained to follow the deviation (28) of the workpiece specific frequency, in particular the resonant frequency (12), during operation; The processing device (11) is trained to compare the deviation trajectory (28) of the workpiece-specific frequency, in particular the resonant frequency (12), with the stored workpiece-related process (27) and is further trained to output a status message (13) corresponding to the progress of the process.

2. A workpiece processing device (1) according to claim 1, Features: The status message (13) includes a progress bar showing the extent to which the workpiece (9) has been processed; or The status message (13) includes a percentage display showing the extent to which the workpiece (9) has been machined; or The status message (13) contains a time display showing how long the processing of the workpiece (9) has been carried out and / or how long the processing is still required.

3. The workpiece processing device (1) according to claim 1 or 2, Features: The status message (13) indicates a change in the status of the resonator (8) and / or the workpiece (9) to be processed.

4. The workpiece processing device (1) according to claim 3, Features: A status change includes at least one of the following changes: a) Temperature changes; b) changes in the state of matter; c) Changes in drying state; d) Changes in humidity.

5. A workpiece processing device (1) according to any one of the preceding claims, Features: If the deviation trajectory (28) of the workpiece-specific frequency, in particular the resonant frequency (12), compared to a stored workpiece-dependent process (27) reaches or exceeds a predetermined threshold value, the status message (13) contains an error indicator.

6. The workpiece processing device (1) according to claim 5, Features: The offsets include at least one of the following offsets: a) Deviation of workpiece-specific frequencies, especially the resonant frequency (12); b) A time-dependent deflection trajectory (28) in which workpiece-specific frequencies, in particular the resonant frequency (12), change.

7. A workpiece processing device (1) according to any one of the preceding claims, Features: Handling equipment (11) is trained to: a) controlling the amplifier stage (3) in such a way as to increase the amplification of the radio frequency signal (5) and / or the level of the amplified radio frequency signal (7) if the deviation trajectory (28) of a workpiece-specific frequency, in particular the resonant frequency (12), is slower in time than a stored progression associated with the workpiece; or b) The manner in which the amplifier stage (3) is controlled if the workpiece-specific frequency deviation trajectory (28), in particular the resonance frequency (12), occurs faster in time than the stored workpiece-dependent process (27).

8. A workpiece processing device (1) according to any one of the preceding claims, Features: Processing facilities (11) receive training to: a) After successfully machining the workpiece (9); or b) if the deviation trajectory (28) of a workpiece-specific frequency, in particular a resonant frequency (12), reaches or exceeds a predetermined threshold value compared to a stored workpiece-related process (27), Amplifier Stage (3): i) disable; or ii) in a manner that reduces amplification; or Handling equipment (11) is trained to: a) After successfully machining the workpiece (9); or b) if the deviation trajectory (28) of a workpiece-specific frequency, in particular a resonant frequency (12), reaches or exceeds a predetermined threshold value compared to a stored workpiece-related process (27), A control signal is generated and transmitted to the signal generator device (16), wherein the control signal causes the signal generator device (16) to stop generating the radio frequency signal (5) and / or the amplified radio frequency signal (7).

9. A workpiece processing device (1) according to any one of the preceding claims, Features: The measuring device (10) is used to measure the forward power in the direction of the resonator (8) and to measure the reverse power from the resonator (8); The processing device (11) is trained to determine the workpiece-specific frequency, in particular the resonant frequency (12), based on the measured forward power and the measured reverse power.

10. The workpiece processing device (1) according to claim 9, Features: The measuring device (10) comprises a first directional coupler (10A), wherein the first directional coupler (10A) is designed to detect forward power; The measuring device (10) comprises a second directional coupler (10B), wherein the second directional coupler (10B) is designed to record reverse power.

11. The workpiece processing device (1) according to claim 9 or 10, Features: For a workpiece-specific frequency, in particular the resonant frequency (12), the ratio between the forward power and the reverse power is within a given range, in particular a maximum value or less than 5% of the maximum value.

12. A workpiece processing device (1) according to any one of the preceding claims, Features: The measuring device (10) is designed to measure the forward power and the reverse power of the amplified radio frequency signal (7).

13. A workpiece processing device (1) according to any one of the preceding claims, Features: The processing device (11) is designed to follow the deviation trajectory (28) of the workpiece specific frequency (12) during operation, by controlling the signal generator device (16) so that the signal generator device (16) continuously changes the frequency of the radio frequency signal (5), maintaining the frequency of the radio frequency signal (5), wherein the ratio between the forward power and the reverse power is a maximum value of the maximum value or less than 5% of the maximum value, and is far away from the maximum value.

14. The workpiece processing device (1) according to any one of claims 9 to 13, Features: The measuring device (10) is designed to measure the forward power and the reverse power of a radio frequency measurement signal which, in addition to the amplified radio frequency signal (7), can be fed to the resonator (8), wherein the power of the radio frequency measurement signal is less than the power of the amplified radio frequency signal (7) and the frequency of the radio frequency measurement signal is different from the frequency of the amplified radio frequency signal (7).

15. The workpiece processing device (1) according to claim 14, Features: During operation, the processing device (11) is designed to follow the deviation trajectory (28) of the workpiece-specific frequency (12) by controlling the signal generator device (16) so that the signal generator device (16) continuously changes the frequency of the radio frequency measurement signal, maintaining the frequency of the radio frequency measurement signal, the ratio between the forward power and the reverse power of which is away from the maximum value by a predetermined range, in particular a maximum value or less than 5% of the maximum value; In particular, the processing device (11) is further trained to control the signal generator device (16) such that the signal generator device (16) increases or decreases the frequency of the radio frequency signal (5) to approximately the same extent as the radio frequency measurement signal.

16. Workpiece processing device (1) according to any one of the preceding claims, Features: The amplifier stage (3) of the signal amplification device (2) comprises one or more signal amplifiers (4) arranged in series, wherein the one or more signal amplifiers (4) arranged in series are designed to amplify radio frequency signals (5).

17. A workpiece processing device (1) according to any one of the preceding claims, Features: The amplifier stage (3) of the signal amplification device (2) comprises a plurality of signal amplifiers (4) arranged in parallel, wherein the plurality of signal amplifiers (4) arranged in parallel are designed to amplify radio frequency signals (5) in parallel and output them to a plurality of signal output terminals (6, 23).

18. The workpiece processing device (1) according to claim 17, Features: Some or all of the signal outputs (6, 23) may be connected to different inputs (8a, 8b) of the resonator (8); or A combiner device (24) is provided, through which part or all of the signal outputs (6, 23) can be connected to a common input (24A) of the resonator (8).

19. A workpiece processing device (1) according to any one of the preceding claims, Features: The amplifier stage (3) of the signal amplification device (2) is designed to amplify a second radio frequency signal (19), wherein the second radio frequency signal (19) has a frequency different from the frequency of the radio frequency signal (5).

20. The workpiece processing device (1) according to any one of claims 1 to 18, Features: The signal amplification device (2) comprises a second amplifier stage (3) which is designed to amplify a second radio frequency signal (19), wherein the second radio frequency signal (19) has a frequency different from the frequency of the radio frequency signal (5).

21. The workpiece processing device (1) according to claim 19 or 20, Features: The second amplified radio frequency signal (20) should be fed to the input (8a) of the same resonator (8a) as the amplified radio frequency signal (7); or The second amplified radio frequency signal (20) may be fed to another input (8b) of the resonator (8).

22. Workpiece processing device (1) according to any one of the preceding claims, Features: The processing device (11) is designed to generate an initial frequency control signal and transmit it to a signal generator device (16), wherein the first frequency control signal includes frequency specifications for causing the signal generator device (16) to generate a radio frequency signal (5) of the specified frequency and output it to the signal amplification device (2).

23. A workpiece processing device (1) according to any one of the preceding claims, Features: The processing device (11) is designed to generate a second frequency control signal and transmit it to the signal generator device (16), wherein the second frequency control signal includes frequency specifications for causing the signal generator device (16) to generate a second radio frequency signal (19) with a specified frequency and output it to the signal amplification device (2).

24. Workpiece processing device (1) according to claims 22 and 23, Features: The processing device (11) is trained to use the first and second frequency control signals to change the frequency of the radio frequency signal (5) and the second radio frequency signal (19) during operation.

25. Workpiece processing device (1) according to any one of the preceding claims, Features: The processing device (11) is designed to control the signal generator device (16) in such a way that it changes the frequency of the radio frequency signal (5) so that it corresponds to a specific frequency of the current workpiece, in particular the resonant frequency (12) or deviates from this frequency by less than 10%.

26. Workpiece processing device (1) according to any one of the preceding claims, Features: Providing a radio frequency signal input port (15), through which a radio frequency signal (5) from a signal generator device (16) can be sent to the workpiece processing device (1); or A signal generator device (16) is provided, wherein the signal generator device (16) comprises a first signal generator (17), and the signal generator device (16) is designed to generate the radio frequency signal (5).

27. A workpiece processing device (1) according to any one of the preceding claims, Features: A resonator (8) is provided, wherein the signal amplification device (2) is electrically connected to the resonator (8).

28. The workpiece processing device (1) according to claim 27, Features: The signal amplification device (2) is designed to amplify a second radio frequency signal (19), the second radio frequency signal (19) comprising a frequency different from the frequency of the radio frequency signal (5); The resonator (8) comprises a first input (8a), wherein the amplified radio frequency signal (7) can be fed to the resonator (8) at its first input (8a); The resonator (8) comprises a second input (8b), wherein a second amplified radio frequency signal (20) can be fed to the resonator (8) at its second input (8b).

29. Workpiece processing device (1) according to claim 27 or 28, Features: The resonator (8) comprises a positioner, wherein the positioner comprises a mounting element arranged in such a way that the workpiece (9) can only be inserted into a permitted orientation and / or angular position.

30. A method for processing a workpiece (9) by means of a workpiece processing device (1), the processing device (1) having a signal amplification device (2) for generating a microwave signal, comprising the following method steps: Inserting a workpiece (9) to be processed into the resonator (8); amplifying the radio frequency signal (5) and feeding the amplified radio frequency signal (7) into the resonator (8), determining a workpiece-specific frequency, in particular a resonant frequency (12) occurring in the resonator (8); Tracking the deviation trajectory (28) of a specific frequency of the workpiece, in particular the resonant frequency (12); The deviation trajectory (28) of the workpiece-specific frequencies, in particular the resonant frequency (12), is compared with a stored workpiece-dependent process (27) and a status message (13) corresponding to the progress of the process is issued.

Images