Coil assembly, plasma generating device and coating equipment

Abstract

The invention relates to the technical field of plasmas, and discloses a coil assembly, a plasma generating device and coating equipment. Wherein the coil assembly comprises at least one conjugate coil unit and is used for providing an excitation magnetic field under the driving of a radio frequency power supply, so that gas to be treated is ionized into plasma; wherein each conjugate coil unit is composed of two radio frequency coils which are connected in parallel, and the two radio frequency coils are symmetrically arranged and wound in opposite directions, so that the directions of currents flowing through the two radio frequency coils are the same. Therefore, the interference between the coils is reduced, the plasma uniformity is improved, and the device can be suitable for large-size plasma equipment.

Description

Technical Field

[0001] The present application relates to the field of plasma technology, and in particular, to a coil assembly, a plasma generating device, and a coating device. Background Art

[0002] Currently, with the development of semiconductor coating technology, plasma generating devices have become an important processing equipment, which are widely used in processes such as thin film deposition, etching, and surface treatment. Among them, inductively coupled plasma (ICP) is a low-temperature and high-density plasma source, and radio frequency discharge is carried out through an inductance coil. The coupling element of the inductively coupled plasma generating device uses an inductively coupled radio frequency coil, which provides an excitation magnetic field to a coating device under the drive of a radio frequency power supply to ionize reaction gases to form plasma.

[0003] In the process of implementing the embodiments of the present disclosure, it is found that there are at least the following problems in the related art:

[0004] The coils of the plasma generating device in the related art usually have small sizes. If it is necessary to increase the size of the coil, generally, the method of increasing the number of turns or the turn pitch of the coil or the method of parallel connection of multiple coils is adopted in the related art. However, the method of increasing the number of turns or the turn pitch often has technical problems such as the load of a single power supply, impedance, and uneven plasma formation. At the same time, the method of parallel connection of multiple coils often has technical problems such as mutual interference between coils and also causes uneven plasma formation.

[0005] It should be noted that the information disclosed in the above background art section is only used to enhance the understanding of the background of the present application, and thus may include information that does not constitute the prior art known to those of ordinary skill in the art. Summary of the Invention

[0006] To have a basic understanding of some aspects of the disclosed embodiments, a simple summary is given below. The summary is not a general review, nor is it intended to identify key / important constituent elements or delineate the protection scope of these embodiments, but rather serves as a preface to the subsequent detailed description.

[0007] The embodiments of the present disclosure provide a coil assembly, a plasma generating device, and a coating device to be applicable to large-size plasma devices, and while extending the service life of the devices, improve the uniformity of gas plasma formation, etc.

[0008] In some embodiments, the coil assembly includes at least one conjugate coil unit configured to provide an excitation magnetic field under the drive of a radio frequency power supply to ionize a gas to be processed into plasma. Each conjugate coil unit is composed of two radio frequency coils connected in parallel, and the two radio frequency coils are symmetrically arranged and wound in opposite directions so that the current directions in the two radio frequency coils are the same.

[0009] Optionally, a common coil segment is disposed between the two radio frequency coils. The two radio frequency coils respectively start from both ends of the common coil segment and are spirally wound in opposite directions, i.e., clockwise and counterclockwise.

[0010] Optionally, the conjugate coil unit further includes: a power feed-in terminal disposed at the common coil segment or at the end of the radio frequency coil located at the winding center after spiral winding; a grounding terminal. When the power feed-in terminal is disposed at the common coil segment, the grounding terminal is disposed at the end of the radio frequency coil located at the winding center after spiral winding; when the power feed-in terminal is disposed at the end of the radio frequency coil located at the winding center after spiral winding, the grounding terminal is disposed at the common coil segment.

[0011] Optionally, when there are multiple conjugate coil units, the multiple conjugate coil units are arranged in an array. The power feed-in terminals of the multiple conjugate coil units are connected in parallel or in series, and the grounding terminals of the multiple conjugate coil units are connected in parallel or grounded separately.

[0012] Optionally, current flows into each conjugate coil unit through the power feed-in terminal, and the current directions in two adjacent coil segments of the radio frequency coil are the same, while the current direction in the common coil segment is opposite.

[0013] Optionally, the coil assembly further includes a protective coating disposed on the surface of each radio frequency coil.

[0014] In some embodiments, the plasma generating device includes: a framework including an adjacent plasma chamber and a coil chamber. The plasma chamber is configured to accommodate and ionize a gas to be processed, and the coil chamber is configured to accommodate the coil assembly as described in the present application; a dielectric plate disposed on the framework and located between the plasma chamber and the coil chamber for separating the plasma chamber and the coil chamber.

[0015] Optionally, the plasma generating device further includes: a coil fixing plate disposed in the coil chamber and spaced apart from the dielectric plate. The coil assembly is mounted on the side of the coil fixing plate facing the dielectric plate; a flange disposed at one end of the framework close to the coil assembly for sealing the coil chamber.

[0016] Optionally, the plasma generating device further includes: a vacuum pumping system disposed outside the coil chamber for independently pumping the coil chamber through a vacuum pumping port formed on the side wall of the coil chamber.

[0017] Optionally, the plasma generating device further includes: a vacuum gauge disposed outside the coil chamber for detecting the vacuum state inside the coil chamber.

[0018] Optionally, the plasma generating device further includes: a gas distribution plate disposed at an end of the skeleton and adjacent to the dielectric plate. The gas distribution plate is of a frame structure, and a plurality of air inlets are distributed along the inner wall of the frame structure, so that the gas to be processed enters the plasma chamber through the plurality of air inlets and flows through the surface of the dielectric plate.

[0019] Optionally, the plasma generating device further includes: an air inlet pipeline, which includes a branch pipeline disposed along the side wall of the plasma chamber. The branch pipeline is communicated with the plurality of air inlets of the gas distribution plate, so that the gas to be processed enters the plasma chamber uniformly from the side of the plasma chamber after passing through the air inlet pipeline and the gas distribution plate.

[0020] Optionally, the plasma generating device further includes: a grid assembly disposed on a side of the gas distribution plate away from the dielectric plate, including a screen grid, an accelerating grid, and a decelerating grid. The screen grid, the accelerating grid, and the decelerating grid are sequentially connected to the positive electrode, the negative electrode, and the ground of the grid assembly.

[0021] Optionally, the plasma generating device further includes: a matcher for matching a radio frequency power supply and coupling the coil assembly; an adjustable capacitor module connected to the matcher for adjusting the capacitance of the matcher.

[0022] Optionally, the plasma generating device further includes: a cooling assembly disposed along the coil assembly, the matcher, and / or the flange of the plasma generating device respectively for cooling the coil assembly, the matcher, and / or the flange.

[0023] Optionally, the plasma generating device further includes: a magnetic confinement assembly disposed around the skeleton for controlling the movement path of the plasma after the gas to be processed is ionized by forming a magnetic field.

[0024] In some embodiments, the coating device includes the coil assembly or the plasma generating device as described in the present disclosure.

[0025] The coil assembly, the plasma generating device, and the coating device provided by the embodiments of the present disclosure can achieve the following technical effects:

[0026] The coil is composed of at least one conjugate coil unit, and each of the conjugate coil units is composed of two radio frequency coils connected in parallel. The two radio frequency coils are symmetrically arranged and wound in opposite directions so that the current directions flowing through the two radio frequency coils are the same. In this way, it can be applied to large-sized plasma devices, that is, by increasing the number of conjugate coil units, the overall size of the coil can be increased without changing the number of turns or the pitch of the coil itself, and the interference between the coils can be reduced and the uniformity of plasma generation can be improved while meeting the starting requirements.

[0027] The above general description and the following description are only exemplary and explanatory and are not used to limit this application. Description of the Drawings

[0028] One or more embodiments are exemplarily illustrated by corresponding drawings. These exemplary illustrations and the drawings do not constitute limitations on the embodiments. Elements with the same reference numerals in the drawings are shown as similar elements. The drawings do not constitute a scale limitation, and among them:

[0029] Figure 1 is a cross-sectional view of a plasma generating device provided by an embodiment of the present disclosure;

[0030] Figure 2 is a main view axonometric drawing of a plasma generating device provided by an embodiment of the present disclosure;

[0031] Figure 3 is a rear view axonometric drawing of a plasma generating device provided by an embodiment of the present disclosure;

[0032] Figure 4 is another main view axonometric drawing of a plasma generating device provided by an embodiment of the present disclosure;

[0033] Figure 5 is a front view of a plasma generating device provided by an embodiment of the present disclosure;

[0034] Figure 6 is a rear view of a plasma generating device provided by an embodiment of the present disclosure;

[0035] Figure 7 is an assembly structure schematic diagram of a coil assembly provided by an embodiment of the present disclosure;

[0036] Figure 8 is another assembly structure schematic diagram of a coil assembly provided by an embodiment of the present disclosure;

[0037] Figure 9 is a part schematic diagram of a conjugate coil unit provided by an embodiment of the present disclosure.

[0038] Reference numerals:

[0039] 1 - Skeleton; 2 - Plasma chamber; 3 - Coil chamber; 4 - Conjugate coil unit; 41 - Radio frequency coil; 42 - Common coil segment; 43 - Power feed-in terminal; 44 - Ground terminal; 45 - Winding center; 5 - Dielectric plate; 6 - Coil fixing plate; 7 - Flange; 8 - Vacuum pumping system; 9 - Vacuum gauge; 10 - Gas homogenizing plate; 11 - Inlet pipeline; 12 - Branch pipeline; 13 - Air inlet; 14 - Grid assembly; 15 - Matcher; 16 - Tunable capacitor module; 17 - Magnetic confinement assembly; 18 - Cooling assembly; Detailed implementation manners

[0040] In order to be able to understand the features and technical content of the embodiments of the present disclosure in more detail, the implementation of the embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. The accompanying drawings are for reference and illustration purposes only and are not intended to limit the embodiments of the present disclosure. In the following technical description, for the sake of explanation, numerous details are provided to provide a thorough understanding of the disclosed embodiments. However, one or more embodiments may still be implemented without these details. In other cases, well-known structures and devices may be shown in a simplified manner to simplify the drawings.

[0041] In the embodiments of the present disclosure, terms such as "first", "second", etc. in the specification, claims and the above-mentioned drawings are used to distinguish similar objects and do not necessarily need to be used to describe a specific order or sequence. It should be understood that such data can be interchanged under appropriate circumstances so as to implement the embodiments of the present disclosure described herein. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion.

[0042] In the embodiments of the present disclosure, the orientation or positional relationship indicated by terms such as "upper", "lower", "inner", "middle", "outer", "front", "rear", etc. is based on the orientation or positional relationship shown in the accompanying drawings. These terms are mainly used to better describe the embodiments of the present disclosure and their implementations, and are not intended to limit that the indicated devices, elements or components must have a specific orientation or be constructed and operated in a specific orientation. And, in addition to being able to represent the orientation or positional relationship, some of the above terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in the embodiments of the present disclosure can be understood according to specific circumstances.

[0043] In addition, the terms "arranged", "connected", and "fixed" should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or there can be internal communication between two devices, components, or parts. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present disclosure can be understood according to specific circumstances.

[0044] Unless otherwise specified, the term "plurality" means two or more.

[0045] In the embodiments of the present disclosure, the character " / " indicates that the objects before and after are in an "or" relationship. For example, A / B means: A or B.

[0046] The term "and / or" is an associative relationship describing an object, indicating that there can be three relationships. For example, A and / or B means: A or B, or, A and B.

[0047] It should be noted that, without conflict, the embodiments in the embodiments of the present disclosure and the features in the embodiments can be combined with each other.

[0048] Combined Figures 1 to 3 As shown, the embodiments of the present disclosure provide a plasma generating device, including a framework 1, a dielectric plate 5, a coil fixing plate 6, and a flange 7. Among them, the framework 1 includes an adjacent plasma chamber 2 and a coil chamber 3. The plasma chamber 2 is used to accommodate and plasmaize the gas to be processed, and the coil chamber 3 is used to accommodate the coil assembly. The dielectric plate 5 is arranged on the framework 1 and located between the plasma chamber 2 and the coil chamber 3, and is used to separate the plasma chamber 2 and the coil chamber 3. The coil fixing plate 6 is arranged in the coil chamber 3 and is spaced apart from the dielectric plate 5 relatively. The coil assembly of the present application is installed on the side of the coil fixing plate 6 facing the dielectric plate 5. The flange 7 is arranged at one end of the framework 1 close to the coil assembly and is used to seal the coil chamber 3.

[0049] That is to say, the coil chamber 3 of the present application refers to the space between the dielectric plate 5 and the flange 7. This space is subjected to vacuum treatment and sealed by the dielectric plate 5 and the flange 7. Therefore, the gas to be processed will not flow through the coil chamber 3 but will be ionized in the plasma chamber 2. In this way, the vacuum environment can improve the service life of various devices in the coil chamber, especially the coil assembly. In this regard, the plasma generating device of the present application further includes a vacuum pumping system 8 and a vacuum gauge 9. Among them, the vacuum pumping system 8 is arranged outside the coil chamber 3, preferably on the skeleton 1 or the flange 7, and is used to independently evacuate the coil chamber 3 through a vacuum pumping port formed on the side wall of the coil chamber 3. The vacuum gauge 9 is arranged outside the coil chamber 3, preferably on the skeleton 1 or the flange 7 and adjacent to the vacuum pumping system 8, and is used to detect the vacuum state in the coil chamber 3.

[0050] In an embodiment of the application, in combination with Figures 4 to 6 As shown, the plasma generating device of the present application further includes a gas distribution plate 10, an intake pipeline 11, and a grid assembly 14. Among them, the gas distribution plate 10 is arranged at the end of the skeleton 1 and is adjacent to the dielectric plate 5. Specifically, the gas distribution plate 10 is of a frame structure, and a plurality of intake ports 13 are distributed along the inner wall of the frame structure, so that the gas to be processed enters the plasma chamber 2 through the plurality of intake ports 13 and flows through the surface of the dielectric plate 5. The intake pipeline 11 of the present application includes a branch pipeline 12 arranged along the side wall of the plasma chamber 2. The branch pipeline 12 is communicated with the plurality of intake ports 13 of the gas distribution plate 10, so that after the gas to be processed passes through the intake pipeline 11 and the gas distribution plate 10, it uniformly enters the plasma chamber 2 from the side of the plasma chamber 2 and moves in the direction of the grid assembly 14 after being ionized, so as to output plasma gas. The grid assembly 14 of the present application is arranged on the side of the gas distribution plate 10 away from the dielectric plate 5, that is, the plasma chamber 2 of the present application refers to the space formed between the grid assembly 14 and the dielectric plate 5, surrounded by the gas distribution plate 10 and the skeleton 1. The grid assembly 14 includes a screen grid, an accelerating grid, and a decelerating grid. The screen grid, the accelerating grid, and the decelerating grid are sequentially connected to the positive electrode, the negative electrode, and the ground of the grid assembly 14.

[0051] Specifically, by arranging the gas distribution plate 10 at the end face of the ion chamber framework 1, it is beneficial to the disassembly, cleaning, maintenance and modular upgrade of the gas distribution plate 10. The intake pipeline 11 includes a branch pipeline 12 arranged along the side wall of the plasma chamber 2, and the branch pipeline 12 communicates with a plurality of intake ports 13 of the gas distribution plate 10. The intake ports 13 are used to convey the gas to be processed into the plasma chamber 2. After the gas to be processed is ionized into plasma, it leaves the plasma chamber 2 via the grid assembly 14. That is, by arranging the intake pipeline 11 beside the plasma generating device and separately arranging the gas distribution plate 10 for the gas to be processed to enter, the gas to be processed enters the gas distribution plate 10 from the intake pipeline 11 and then enters the plasma chamber 2. The multi-layer functions of the grid assembly 14 are equivalent to the usage of the grid of the radio frequency ion source and can play a role in controlling the ion beam. The potential of the screen grid is a positive bias voltage, which has the function of electrostatic shielding, preventing capacitance coupling between grids and accelerating ionization. The function of the acceleration grid is to focus ions with a negative bias voltage and perform forward acceleration. The function of the deceleration grid is to provide a ground potential protection. The accelerated ions decelerate after passing through the acceleration grid and exit from the grid with an ion energy approximately equal to the beam voltage.

[0052] In this way, the plasma generating device of the present application, with the grid assembly 14, already meets the usage requirements of most plasma-enhanced atomic layer deposition equipment. At the same time, by adding an external magnetic field in cooperation with the grid assembly 14, the movement speed of the plasma (charged particles) can be controlled. Thus, the substrate temperature with different requirements can be controlled, avoiding uniformity differences or high-temperature substrate damage caused by different temperature requirements. In addition, based on the structure of the radio frequency coil 41 with a specific arrangement in the present application, the flow field generated by the plasma via the gas distribution plate 10 is also relatively uniform. Further, by integrating the constraint effect of the magnetic confinement assembly 17, a uniform and effective plasma region can be obtained. At the same time, by configuring the connection mode between the intake pipeline 11 and the gas distribution plate 10, it is possible to achieve intake from the side of the plasma chamber 2, and through the combined use of the gas distribution plate 10 and the grid assembly 14, the uniformity of gas plasma generation is jointly improved.

[0053] In an embodiment of the application, in combination with Figures 1 to 6As shown, the plasma generating device of the present application further includes a matcher 15, an adjustable capacitor module 16, a magnetic confinement component 17, and a cooling component 18. Among them, the matcher 15 can be arranged on the skeleton 1 or the flange 7 for matching the RF power supply and coupling the coil assembly. The adjustable capacitor module 16 is connected to the matcher 15 for adjusting the capacitance of the matcher 15. The magnetic confinement component 17 of the present application is arranged around the skeleton 1 for controlling the movement path of the plasma after the plasma generation of the gas to be processed by forming a magnetic field. The cooling component 18 of the present application is respectively arranged along the coil, the matcher 15, and / or the flange 7 of the plasma generating device for cooling the coil, the matcher 15, and / or the flange 7. Preferably, the cooling component 18 can be a cooling water circulation pipeline, and the inlet and outlet of the cooling water are arranged on the matcher 15, the coil, and the flange 7. As an embodiment, as Figure 3 , 6 shown, the cooling component 18 is arranged on the flange 7.

[0054] Meanwhile, in combination with Figures 7 to 9 shown, the embodiment of the present disclosure further provides a coil assembly. The coil includes at least one conjugate coil unit 4 for providing an excitation magnetic field under the drive of an RF power supply to ionize the gas to be processed into plasma. Among them, each conjugate coil unit 4 is composed of two RF coils 41 connected in parallel. The two RF coils 41 are symmetrically arranged and wound in opposite directions so that the current directions flowing through the two RF coils 41 are the same. Specifically, a common coil section 42 is arranged between the two RF coils 41. The two RF coils 41 respectively start from both ends of the common coil section 42 and are spirally wound in opposite directions in a relative manner. For example, one end of one of the two RF coils 41 is connected to one end of the common coil section 42, and the other end is spirally wound in a clockwise direction. One end of the other RF coil 41 among the two RF coils 41 is connected to the other end of the common coil section 42, and the other end is spirally wound in a counterclockwise direction. After the two RF coils 41 are wound, they are both located on the same side of the common coil section 42, thereby forming a conjugate coil unit 4.

[0055] In the related art, the mosquito coil structure of a conventional coil is generally made of a square tube, and the size is often small, which cannot be adapted to large-size coating equipment for mass production. If the size of the coil is increased by increasing the number of turns or the pitch of the coil, the impedance of the coil will increase, making it difficult to meet the plasma ignition requirements or requiring a new matcher to be reconfigured.

[0056] In this regard, the plasma generating device provided by the embodiments of the present disclosure is adopted. By providing at least one conjugate coil unit 4, and each conjugate coil unit 4 is composed of two radio frequency coils 41 connected in parallel. The two radio frequency coils 41 are symmetrically arranged and wound in opposite directions, so that the current directions flowing through the two radio frequency coils 41 are the same. In this way, it can meet the requirements of a large-sized plasma generating device. That is, when it is necessary to increase the size of the plasma generating device, the number of conjugate coil units 4 can be increased, so that without changing the number of turns or the pitch of the radio frequency coil 41 itself, the overall size of the coil is increased, thereby increasing the energy radiation area of the charged particles generated and released by the radio frequency coil 41. At the same time, at least one conjugate coil unit 4 can meet the starting requirements and has a lower cost compared to manufacturing a large-sized coil. For example, if one radio frequency coil 41 can use 5000W, two radio frequency coils 41 connected in parallel can also use 5000W, so that the starting requirements for double the size area can be met.

[0057] In an embodiment of the present application, the conjugate coil unit 4 of the present application further includes a power supply feeding end 43 and a grounding end 44. Among them, the power supply feeding end 43 is arranged at the common coil section 42 or the end of the radio frequency coil 41 located at the winding center 45 after spiral winding. The winding center 45 refers to the central position of the spiral structure of the radio frequency coil 41. Correspondingly, as shown in Figure 9 When the power supply feeding end 43 is arranged at the common coil section 42, the grounding end 44 is arranged at the end of the radio frequency coil 41 located at the winding center 45 after spiral winding. And, as shown in Figure 8 When the power supply feeding end 43 is arranged at the end of the radio frequency coil 41 located at the winding center 45 after spiral winding, the grounding end 44 is arranged at the common coil section 42. That is to say, the present application does not specifically limit the specific positions of the power supply feeding end 43 and the grounding end 44, but only limits the relative positions of the two, so that those skilled in the art can set them as needed.

[0058] In a practical application, as shown in Figure 8 and Figure 9 When there are multiple (for example, two or more) conjugate coil units 4, the multiple conjugate coil units 4 are arranged in an array manner. The array manner includes a linear arrangement or a pairwise symmetric arrangement, etc. The power supply feeding ends 43 of the multiple conjugate coil units 4 are connected in parallel or in series, and the grounding ends 44 of the multiple conjugate coil units 4 are connected in parallel or grounded separately. In this way, referring to Figure 8 and Figure 9As shown by the current direction in [description], the current flows into each conjugate coil unit 4 through the power supply feed-in terminal 43, and the current directions in two adjacent coil segments of the RF coil 41 flowing through the conjugate coil unit 4 are the same. Here, it not only refers to the same current direction in the adjacent coil segments between the two RF coils 5 in a single conjugate coil unit 4, but also includes the same current direction in the coil segments of any adjacent RF coils in any two adjacent conjugate coil units 4. That is, after the arrangement and combination of multiple conjugate coil units 4, the same current direction can be achieved between any adjacent coil segments. This prevents the interference problem between coils caused by the opposite current directions between adjacent coil segments. In addition, the current directions in the common coil segments 42 are opposite. When in use, when one conjugate coil unit 4 can meet the starting requirements, multiple conjugate coil units 4 can also meet the starting requirements under the same power conditions.

[0059] Preferably, in combination with Figure 7 As shown, a protective coating is provided on the surface of each RF coil 41. The protective coating can effectively reduce the resistance of the RF coil 41, improve the conductivity, enhance the antioxidant and anti-corrosion properties, thereby improving the use efficiency of the RF coil 41, and further effectively increasing the ionization rate, and improving the conductivity and service life of the RF coil 41. For example, a coating of gold or silver material can be optionally provided on the surface of the RF coil 41. In addition, after the surface of the RF coil 41 is coated for protection, if it is exposed to a humid or corrosive environment, it is prone to oxidation and corrosion, and the conductivity decreases. Vacuum pumping can remove oxygen and water vapor in the air, reduce the oxidation reaction, and thus extend the service life of the RF coil 41.

[0060] In addition, the embodiments of the present disclosure provide a coating device, including a plasma generating device or a coil assembly as described in this application.

[0061] The above description and the drawings fully illustrate the embodiments of the present disclosure so that those skilled in the art can practice them. Other embodiments may include structural and other changes. The embodiments only represent possible variations. Unless explicitly required, the individual components and functions are optional, and the order of operations can vary. Parts and features of some embodiments can be included in or replace parts and features of other embodiments. The embodiments of the present disclosure are not limited to the structures already described and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present disclosure is only limited by the appended claims.

Claims

1. A coil assembly, characterized in that: It includes at least one conjugate coil unit, which is used to provide an excitation magnetic field under the drive of a radio frequency power supply so that the gas to be treated is ionized into plasma; wherein each of the conjugate coil units is composed of two radio frequency coils connected in parallel, and the two radio frequency coils are symmetrically arranged and wound in opposite directions so that the currents flowing through the two radio frequency coils have the same direction.

2. The coil assembly according to claim 1, characterized in that: A common coil section is arranged between the two radio frequency coils. The two radio frequency coils are spirally wound in opposite directions in a clockwise and counterclockwise direction respectively, with two ends of the common coil section as starting points.

3. The coil assembly according to claim 2, characterized in that: The conjugate coil unit further includes: A power supply feed-in terminal is arranged at the end of the common coil segment or the RF coil located at the winding center after spiral winding; A grounding end, when the power feeding end is arranged at the common coil segment, the grounding end is arranged at the end of the RF coil located at the winding center after spiral winding; when the power feeding end is arranged at the end of the RF coil located at the winding center after spiral winding, the grounding end is arranged at the common coil segment.

4. The coil assembly according to claim 3, characterized in that: When there are multiple conjugate coil units, the multiple conjugate coil units are arranged in an array, wherein the power feeding ends of the multiple conjugate coil units are connected in parallel or in series, and the grounding ends of the multiple conjugate coil units are connected in parallel or are grounded separately.

5. The coil assembly according to claim 1 or 4, characterized in that: The current flows into each of the conjugate coil units through the power supply feeding end, and the current flowing through two adjacent coil segments of the radio frequency coil has the same direction, and the current flowing through the shared coil segment has the opposite direction.

6. The coil assembly according to claim 1, characterized in that: Also includes: A protective coating is disposed on the surface of each of the radio frequency coils.

7. A plasma generating device, characterized in that: include: A frame, comprising a plasma chamber and a coil chamber arranged adjacent to each other, wherein the plasma chamber is used to contain and plasmatize a gas to be treated, and the coil chamber is used to contain the coil assembly according to any one of claims 1 to 6; The dielectric plate is arranged on the frame and located between the plasma chamber and the coil chamber, and is used to separate the plasma chamber and the coil chamber.

8. The plasma generating device according to claim 7, characterized in that: Also includes: A coil fixing plate is arranged in the coil chamber and is spaced apart from the dielectric plate, and the coil assembly is installed on a side of the coil fixing plate facing the dielectric plate; A flange is arranged at one end of the frame close to the coil assembly and is used for sealing the coil chamber.

9. The plasma generating device according to claim 8, characterized in that: Also includes: The vacuum pumping system is arranged outside the coil chamber and is used for independently vacuuming the coil chamber through a vacuum pumping port formed on the side wall of the coil chamber.

10. The plasma generating device according to claim 9, characterized in that: Also includes: The vacuum gauge is arranged outside the coil chamber and is used to detect the vacuum state in the coil chamber.

11. The plasma generating device according to claim 7, characterized in that: Also includes: The gas uniformizing plate is arranged at the end of the skeleton and adjacent to the dielectric plate, wherein the gas uniformizing plate is a frame-type structure, and a plurality of gas inlets are distributed along the inner wall of the frame-type structure, so that the gas to be processed enters the plasma chamber through the plurality of gas inlets and flows through the surface of the dielectric plate.

12. The plasma generating device according to claim 11, characterized in that: Also includes: An air inlet pipeline, the air inlet pipeline includes a branch pipeline arranged along the side wall of the plasma chamber, and the branch pipeline is connected to the multiple air inlets of the air uniforming plate, so that the gas to be processed passes through the air inlet pipeline and the air uniforming plate and enters the plasma chamber evenly from the side of the plasma chamber.

13. The plasma generating device according to claim 11, characterized in that: Also includes: The grid assembly is arranged on the side of the uniform air plate away from the dielectric plate, and comprises a screen grid, an acceleration grid and a deceleration grid, which are sequentially connected to the positive pole, the negative pole and the ground of the grid assembly.

14. The plasma generating device according to any one of claims 7 to 12, characterized in that: Also includes: A matcher, used for matching the radio frequency power supply and coupling the coil assembly; The adjustable capacitance module is connected to the matcher and is used to adjust the capacitance of the matcher.

15. The plasma generating device according to claim 14, characterized in that: Also includes: The cooling components are respectively arranged along the coil component, the matcher and / or the flange of the plasma generating device, and are used to cool the coil component, the matcher and / or the flange.

16. The plasma generating device according to any one of claims 7 to 12, characterized in that: Also includes: The magnetic confinement assembly is arranged around the frame and is used to control the movement path of the plasma after the gas to be processed is plasmatized by forming a magnetic field.

17. A coating device, characterized in that: The method comprises the coil assembly according to any one of claims 1 to 6 or the plasma generating device according to any one of claims 7 to 16.

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