Manufacturing process of touch display screen with high barrier rate effect

Abstract

The invention belongs to the technical field of touch display screens, and particularly relates to a manufacturing process of a touch display screen with a high barrier rate effect. According to the preparation method, the indium tin oxide, the titanium oxide, the triallyl cyanurate, the triallyl isocyanurate, the hexadecyl trimethyl ammonium chloride, the ammonium perfluorooctanoate and the water are specifically combined to prepare the high-resistance film, and the high-resistance film has a relatively high surface resistance value. When the high-resistance film is applied to the touch display screen, the rejection rate of the touch display screen is improved, the anti-interference performance of the touch display screen is improved, and better product experience is provided for customers.

Description

Technical Field

[0001] The present invention belongs to the technical field of touch display screens, and particularly relates to a manufacturing process of a touch display screen with a high barrier rate effect. Background Art

[0002] A high resistance film, also known as a high-resistance film or a high-impedance film, is a thin film material with a relatively high resistivity. It has advantages such as preventing static electricity accumulation, improving touch control accuracy, preventing electromagnetic interference, and reducing power consumption. Therefore, when it is applied to touch screens, display panels, and other electronic devices, it can significantly improve the performance and reliability of the corresponding products, thereby giving users a good experience.

[0003] The high resistance film on the surface of the in-cell touch screen is a functional film with a high barrier rate and is the key to improving the performance of the touch screen. However, the performance of high resistance films prepared from different raw materials and processes varies. For example, the high resistance film prepared by using the magnetron sputtering process in Chinese Patent CN 116240508 A has excellent performance, but the preparation process is relatively cumbersome, which is not conducive to the rapid development of the touch screen industry. Summary of the Invention

[0004] The purpose of the present invention is to provide a manufacturing process of a touch display screen with a high barrier rate effect, which has the characteristics of simplicity, speed, and high barrier rate.

[0005] The present invention provides a high resistance film with a high barrier rate effect. The high resistance film includes a substrate and a slurry; the slurry includes raw materials in the following mass percentages:

[0006] 15%-17% of indium tin oxide, 5%-6% of titanium oxide, 5%-7% of triallyl cyanurate, 5%-7% of triallyl isocyanurate, 14%-20% of cetyl trimethyl ammonium chloride, 1%-5% of ammonium perfluorooctanoate, and the balance of water.

[0007] Preferably, the slurry includes raw materials in the following mass percentages:

[0008] 16% of indium tin oxide, 6% of titanium oxide, 7% of triallyl cyanurate, 5% of triallyl isocyanurate, 20% of cetyl trimethyl ammonium chloride, 1% of ammonium perfluorooctanoate, and the balance of water.

[0009] The present invention provides a preparation method of the high resistance film described in the above technical solution, including the following steps:

[0010] Indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate are sequentially added to water, and stirred evenly to obtain a slurry;

[0011] The slurry is sprayed on a substrate, and leveling, drying, and baking are sequentially performed to obtain a high-resistance film.

[0012] Preferably, the parameters of the spraying include: a pressure of 1.4 - 4.32 MPa.

[0013] Preferably, air shearing is accompanied during the leveling process; the parameters of the air shearing include: a pressure of 2.8 - 6.7 MPa, a wind speed of 35 - 55 m / s, and a nozzle angle of 30° - 42°.

[0014] Preferably, the parameters of the baking include: a temperature of 150 - 180 °C and a time of 25 - 45 min.

[0015] Preferably, the thickness of the high-resistance film is 10 - 15 nm.

[0016] The present invention provides an application of the high-resistance film described in the above technical solution in the preparation of a product with a high barrier rate.

[0017] Preferably, the product includes: a touch display screen.

[0018] The present invention provides a touch display screen with a high barrier rate effect, including the high-resistance film described in the above technical solution.

[0019] Beneficial effects:

[0020] The present invention provides a high-resistance film with a high barrier rate effect. The high-resistance film includes a substrate and a slurry; the slurry includes raw materials in the following mass percentages: 15% - 17% of indium tin oxide, 5% - 6% of titanium oxide, 5% - 7% of triallyl cyanurate, 5% - 7% of triallyl isocyanurate, 14% - 20% of cetyltrimethylammonium chloride, 1% - 5% of ammonium perfluorooctanoate, and the balance of water. By specifically combining the above raw materials, the high-resistance film has a relatively high surface resistance value, excellent antistatic and anti-interference effects.

[0021] Based on the above technical advantages, the present invention provides an application of the above high-resistance film in the preparation of a touch display screen with a high barrier rate. By using the high-resistance film provided by the present invention, it is beneficial to improve the barrier rate of the touch display screen, increase the anti-interference performance of the touch screen display, and give customers a better product experience. Specific embodiments

[0022] In the present invention, unless otherwise specified, the raw materials and methods used are all conventional selections.

[0023] To further illustrate the present invention, the solutions provided by the present invention will be described in detail below in conjunction with embodiments, but they should not be construed as limiting the scope of protection of the present invention.

[0024] Example 1

[0025] A touch display screen with a high barrier rate effect is prepared as follows:

[0026] (1) The slurry includes raw materials in the following mass percentages: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0027] (2) Prepare a high-resistance film:

[0028] Add indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate to water in sequence, and stir evenly to obtain a slurry;

[0029] Spray the slurry evenly on the substrate under the condition of a pressure of 1.4 MPa, and then perform air-knife cutting on the substrate. The pressure of the air-knife cutting is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30°, to obtain the substrate after air-knife cutting;

[0030] Dry and bake the substrate after air-knife cutting. The baking temperature is 150 °C and the time is 30 min to obtain a high-resistance film with a thickness of 10 nm.

[0031] (3) After cleaning the surface of the high-resistance film in (2), prepare it into a touch display screen by a conventional method.

[0032] Example 2

[0033] A touch display screen with a high barrier rate effect is prepared as follows:

[0034] (1) The slurry includes raw materials in the following mass percentages: 15% indium tin oxide, 6% titanium oxide, 5% triallyl cyanurate, 5% triallyl isocyanurate, 18% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using polyethylene terephthalate (PET) as the substrate;

[0035] (2) Prepare a high-resistance film:

[0036] Add indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate to water in sequence, and stir evenly to obtain a slurry;

[0037] The slurry is evenly sprayed on the substrate under the condition of a pressure of 1.4 MPa, and then the substrate is subjected to air knife cutting. The pressure of the air knife cutting is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30°, obtaining the substrate after air knife cutting;

[0038] The substrate after air knife cutting is dried and baked. The baking temperature is 150 °C and the time is 30 min, obtaining a high-resistance film with a thickness of 10 nm.

[0039] (3) After cleaning the surface of the high-resistance film in (2), it is fabricated into a touch display screen by a conventional method.

[0040] Example 3

[0041] A touch display screen with a high barrier rate effect is prepared as follows:

[0042] (1) The slurry includes the following raw materials by mass percentage: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0043] (2) Prepare the high-resistance film:

[0044] Indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate are successively added to water and stirred evenly to obtain the slurry;

[0045] The slurry is evenly sprayed on the substrate under the condition of a pressure of 1.4 MPa, and then the substrate is subjected to air knife cutting. The pressure of the air knife cutting is 5.5 MPa, the wind speed is 40 m / s, and the nozzle angle is 30°, obtaining the substrate after air knife cutting;

[0046] The substrate after air knife cutting is dried and baked. The baking temperature is 150 °C and the time is 30 min, obtaining a high-resistance film with a thickness of 15 nm.

[0047] (3) After cleaning the surface of the high-resistance film in (2), it is fabricated into a touch display screen by a conventional method.

[0048] Comparative Example 1

[0049] A touch display screen with a high barrier rate effect is prepared as follows:

[0050] (1) The slurry includes the following raw materials by mass percentage: 16% tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0051] (2) Preparation of a high-resistance film:

[0052] Tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate are successively added to water, and the mixture is stirred evenly to obtain a slurry;

[0053] The slurry is evenly sprayed on a substrate under the condition of a pressure of 1.4 MPa, and then the substrate is subjected to air shearing. The air-shearing pressure is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30°, to obtain a substrate after air shearing;

[0054] The substrate after air shearing is dried and baked. The baking temperature is 150 °C and the time is 30 min, to obtain a high-resistance film with a thickness of 10 nm.

[0055] (3) After cleaning the surface of the high-resistance film in (2), it is prepared into a touch display screen by a conventional method.

[0056] Comparative Example 2

[0057] A touch display screen with a high barrier rate effect, and the preparation method is as follows:

[0058] (1) The slurry includes raw materials in the following mass percentages: 16% indium tin oxide, 6% titanium oxide, 12% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0059] (2) Preparation of a high-resistance film:

[0060] Indium tin oxide, titanium oxide, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate are successively added to water, and the mixture is stirred evenly to obtain a slurry;

[0061] The slurry is evenly sprayed on a substrate under the condition of a pressure of 1.4 MPa, and then the substrate is subjected to air shearing. The air-shearing pressure is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30°, to obtain a substrate after air shearing;

[0062] The substrate after air shearing is dried and baked. The baking temperature is 150 °C and the time is 30 min, to obtain a high-resistance film with a thickness of 10 nm.

[0063] (3) After cleaning the surface of the high-resistance film in (2), it is prepared into a touch display screen by a conventional method.

[0064] Comparative Example 3

[0065] A touch display screen with a high barrier rate effect, and the preparation method is as follows:

[0066] (1) The slurry comprises raw materials in the following mass percentages: 20% indium tin oxide, 6% titanium oxide, 10% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 8% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0067] (2) Preparing a high-resistance film:

[0068] Add indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate into water in sequence, and stir evenly to obtain the slurry;

[0069] Spray the slurry evenly on the substrate under the condition of a pressure of 1.4 MPa, and then perform air-knife cutting on the substrate. The pressure of the air-knife cutting is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30° to obtain the substrate after air-knife cutting;

[0070] Dry and bake the substrate after air-knife cutting. The baking temperature is 150 °C and the time is 30 min to obtain a high-resistance film with a thickness of 10 nm.

[0071] (3) After cleaning the surface of the high-resistance film in (2), prepare it into a touch display screen by a conventional method.

[0072] Comparative Example 4

[0073] A touch display screen with a high barrier rate effect is prepared as follows:

[0074] (1) The slurry comprises raw materials in the following mass percentages: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0075] (2) Preparing a high-resistance film:

[0076] Add indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate into water in sequence, and stir evenly to obtain the slurry;

[0077] Spray the slurry evenly on the substrate under the condition of a pressure of 1.4 MPa, and then perform air-knife cutting on the substrate. The pressure of the air-knife cutting is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30° to obtain the substrate after air-knife cutting;

[0078] Dry and bake the substrate after air-knife cutting. The baking temperature is 150 °C and the time is 30 min to obtain a high-resistance film with a thickness of 10 nm.

[0079] (3) After cleaning the surface of the high-resistance film in (2), it is fabricated into a touch display screen by a conventional method.

[0080] Comparative Example 5

[0081] A touch display screen with a high barrier rate effect is prepared as follows:

[0082] (1) The slurry includes raw materials in the following mass percentages: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 20% cetyltrimethylammonium chloride, and the balance water; using conductive glass as the substrate;

[0083] (2) Prepare the high-resistance film:

[0084] Add indium tin oxide, titanium oxide, triallyl cyanurate, and cetyltrimethylammonium chloride to water in sequence, and stir evenly to obtain a slurry;

[0085] Spray the slurry evenly on the substrate under the condition of a pressure of 1.4 MPa, and then perform air-knife cutting on the substrate. The pressure of the air-knife cutting is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30°, to obtain the substrate after air-knife cutting;

[0086] Dry and bake the substrate after air-knife cutting. The baking temperature is 150 °C and the time is 30 min to obtain a high-resistance film with a thickness of 10 nm.

[0087] (3) After cleaning the surface of the high-resistance film in (2), it is fabricated into a touch display screen by a conventional method.

[0088] Comparative Example 6

[0089] A touch display screen with a high barrier rate effect is prepared as follows:

[0090] (1) The slurry includes raw materials in the following mass percentages: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0091] (2) Prepare the high-resistance film:

[0092] Add indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate to water in sequence, and stir evenly to obtain a slurry;

[0093] Spray the slurry evenly on the substrate under the condition of a pressure of 1.4 MPa, and then perform air-knife cutting on the substrate. The pressure of the air-knife cutting is 2.8 MPa, the wind speed is 35 m / s, and the nozzle angle is 30°, to obtain the substrate after air-knife cutting;

[0094] The substrate after air shearing is dried and baked at a temperature of 150 °C for 30 min to obtain a high-resistance film with a thickness of 10 nm.

[0095] (3) After cleaning the surface of the high-resistance film in (2), it is fabricated into a touch display screen by a conventional method.

[0096] Comparative Example 7

[0097] A touch display screen with a high barrier rate effect is prepared as follows:

[0098] (1) The slurry includes the following raw materials by mass percentage: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0099] (2) Prepare the high-resistance film:

[0100] Indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, and ammonium perfluorooctanoate are sequentially added to water and stirred evenly to obtain a slurry;

[0101] The slurry is evenly sprayed on the substrate under the condition of a pressure of 1.4 MPa, and then the substrate is air-sheared. The air-shearing pressure is 8 MPa, the wind speed is 60 m / s, and the nozzle angle is 30° to obtain the substrate after air shearing;

[0102] The substrate after air shearing is dried and baked at a temperature of 150 °C for 30 min to obtain a high-resistance film with a thickness of 5 nm.

[0103] (3) After cleaning the surface of the high-resistance film in (2), it is fabricated into a touch display screen by a conventional method.

[0104] Comparative Example 8

[0105] A touch display screen with a high barrier rate effect is prepared as follows:

[0106] (1) The slurry includes the following raw materials by mass percentage: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% cetyltrimethylammonium chloride, 1% ammonium perfluorooctanoate, and the balance water; using conductive glass as the substrate;

[0107] (2) Prepare the high-resistance film:

[0108] Indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride and ammonium perfluorooctanoate were successively added to water, and the mixture was stirred evenly to obtain a slurry;

[0109] The slurry was evenly sprayed on the substrate under the condition of a pressure of 5 MPa, and then the substrate was subjected to air knife cutting. The pressure of the air knife cutting was 2.8 MPa, the wind speed was 35 m / s, and the nozzle angle was 30°, to obtain the substrate after air knife cutting;

[0110] The substrate after air knife cutting was dried and baked. The baking temperature was 150 °C and the time was 20 min, to obtain a high-resistance film with a thickness of 20 nm.

[0111] (3) After cleaning the surface of the high-resistance film in (2), it was prepared into a touch display screen by a conventional method.

[0112] Application Example 1

[0113] The resistance and light transmittance of the high-resistance films in Test Examples 1-3 and Comparative Examples 1-8 were measured, and the results are shown in Table 1.

[0114] Table 1 Resistance and light transmittance of high-resistance films in different treatments

[0115]

[0116]

[0117] Combined with the data in Table 1, it can be seen that compared with the high-resistance films prepared in Comparative Examples 1-8, the high-resistance films prepared in Examples 1-3 have a higher surface resistance, specifically (8.4 - 8.9)×10 8 Ω / cm 2 , while the highest surface resistance of the high-resistance films in the comparative examples is only 7.8×10 8 Ω / cm 2 ; at the same time, the high-resistance films in Examples 1-3 have good light transmittance, that is, good display effect. It can be seen that the high-resistance film prepared by the present invention has excellent surface resistance and display effect.

[0118] Application Example 2

[0119] The high-resistance films in Examples 1-3 and Comparative Examples 1-8 were respectively immersed in water for 5 d and placed in an environment of 50 °C for 5 d, and then the resistance of each high-resistance film was measured. The results are shown in Table 2.

[0120] Table 2 Influence of different treatments on the resistance of high-resistance films (unit: Ω / cm 2 )

[0121] Treatment Soaking in water Standing at 50°C Example 1 <![CDATA[5.2×10 8 > <![CDATA[5.0×10 8 > Example 2 <![CDATA[4.8×10 8 > <![CDATA[5.1×10 8 > Example 3 <![CDATA[5.3×10 8 > <![CDATA[4.7×10 8 > Comparative Example 1 <![CDATA[2.1×10 8 > <![CDATA[2.0×10 8 > Comparative Example 2 <![CDATA[1.8×10 8 > <![CDATA[2.0×10 8 > Comparative Example 3 <![CDATA[3.5×10 8 > <![CDATA[1.7×10 8 > Comparative Example 4 <![CDATA[5×10 7 > <![CDATA[4.3×10 7 > Comparative Example 5 <![CDATA[1.5×10 8 > <![CDATA[1.9×10 8 > Comparative Example 6 <![CDATA[2.3×10 8 > <![CDATA[3.8×10 8 <!-- 6 -->]]> Comparative Example 7 <![CDATA[4.1×10 8 > <![CDATA[3.2×10 8 > Comparative Example 8 <![CDATA[3.8×10 8 > <![CDATA[2.4×10 8 >

[0122] Combined with the data in Table 2, it can be seen that compared with the high-resistance films prepared in Comparative Examples 1-8, the high-resistance films prepared in Examples 1-3 can still maintain a relatively high surface resistance after being soaked in water and treated at 50 °C. It can be seen that the high-resistance film prepared by the present invention can adapt to different environments and has excellent anti-resistance performance.

[0123] Application Example 3

[0124] The response times of the touch displays in Examples 1-3 and Comparative Examples 1-8 were measured, and the results are shown in Table 3.

[0125] Table 3 Response times of each touch display in different treatments (unit: s)

[0126] Treatment Response time Example 1 0.12 Example 2 0.11 Example 3 0.11 Comparative Example 1 0.14 Comparative Example 2 0.15 Comparative Example 3 0.14 Comparative Example 4 0.16 Comparative Example 5 0.14 Comparative Example 6 0.13 Comparative Example 7 0.16 Comparative Example 8 0.15

[0127] Combined with the data in Table 3, it can be seen that compared with the touch displays prepared in Comparative Examples 1-8, the touch displays prepared in Examples 1-3 have a shorter response time after being touched, only 0.11 - 0.12 s; while the touch displays in the comparative examples have a longer response time after being touched. It can be seen that after adopting the technical solution provided by the present invention, the anti-interference performance of the touch display is more excellent and the barrier rate is higher.

[0128] In summary, after the present invention specifically combines indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, cetyltrimethylammonium chloride, ammonium perfluorooctanoate and water to prepare a high-resistance film, it has a relatively high surface resistance value. Applying it to a touch display is beneficial to improving the barrier rate of the touch display, increasing the anti-interference performance of the touch screen display, and giving customers a better product experience.

[0129] Although the above embodiments have made a detailed description of the present invention, they are only a part of the embodiments of the present invention, not all embodiments. People can also obtain other embodiments without creative efforts based on these embodiments, and these embodiments all belong to the protection scope of the present invention.

Claims

1. A high-resistance film having a high barrier effect, characterized in that: The high resistance film comprises a substrate and a slurry; the slurry comprises the following raw materials in percentage by mass: 15%-17% indium tin oxide, 5%-6% titanium oxide, 5%-7% triallyl cyanurate, 5%-7% triallyl isocyanurate, 14%-20% hexadecyltrimethylammonium chloride, 1%-5% ammonium perfluorooctanoate and the balance water.

2. The high resistance film according to claim 1, characterized in that: The slurry includes the following raw materials in percentage by weight: 16% indium tin oxide, 6% titanium oxide, 7% triallyl cyanurate, 5% triallyl isocyanurate, 20% hexadecyltrimethylammonium chloride, 1% ammonium perfluorooctanoate and the balance water.

3. The method for preparing a high resistance film according to claim 1 or 2, characterized in that: The steps include: Indium tin oxide, titanium oxide, triallyl cyanurate, triallyl isocyanurate, hexadecyltrimethylammonium chloride and ammonium perfluorooctanoate are added to water in sequence, and stirred evenly to obtain a slurry; The slurry is sprayed on a substrate, and leveling, drying and baking are performed in sequence to obtain a high-resistance film.

4. The preparation method according to claim 3, characterized in that: The spraying parameters include: pressure of 1.4-4.32 MPa.

5. The preparation method according to claim 3, characterized in that: The leveling process is accompanied by wind shear; the parameters of the wind shear include: pressure of 2.8-6.7MPa, wind speed of 35-55m / s, and nozzle angle of 30°-42°.

6. The preparation method according to claim 3, characterized in that: The baking parameters include: temperature of 150-180° C. and time of 25-45 min.

7. The preparation method according to claim 3, characterized in that: The thickness of the high resistance film is 10-15 nm.

8. Use of the high-resistance film according to claim 1 in the preparation of high-barrier rate products.

9. The use according to claim 8, characterized in that: The product includes: a touch display screen.

10. A touch display screen with high barrier effect, characterized in that: Comprising the high resistance film according to claim 1 or 2.

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