Manufacturing method of liquid crystal lens

Abstract

The invention discloses a manufacturing method of a liquid crystal lens. The manufacturing method comprises the following steps: 1) manufacturing a first substrate; 2) manufacturing a second substrate; and (3) manufacturing the first substrate and pasting the first substrate and the second substrate to form the box. The polarization direction of polarized light emitted by a traditional LCD is changed, a 1 / 2 wave plate and a polaroid attached to the LENS are omitted, the cost is reduced, and the lighting effect is improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of liquid crystal display, and particularly relates to a method for manufacturing a liquid crystal lens. Background Art

[0002] In the process of implementing the present invention, the inventor found that the prior art has at least the following problems:

[0003] Based on the polarization axis angle of the original polarizer in the LCD, a half-wave plate and a polarizer (the polarization axis of this polarizer needs to be consistent with the long axis direction of the liquid crystal molecules in the liquid crystal lens) are added above it. This method requires the use of a half-wave plate and a polarizer, increasing the cost; and the superimposed use of the half-wave plate and the polarizer will reduce the light efficiency.

[0004] CN104360560A - Method for manufacturing a liquid crystal lens, liquid crystal lens and stereoscopic display device, discloses a method for manufacturing a liquid crystal lens, including: electrically driving the liquid crystal molecules in the liquid crystal layer to deflect to form a liquid crystal lens unit with a gradient refractive index; curing the liquid crystal lens unit that meets preset conditions to form the liquid crystal lens, and it also cannot solve the above technical problems. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a method for manufacturing a liquid crystal lens, which changes the polarization direction of the polarized light emitted by the traditional LCD, eliminates the use of a half-wave plate and the polarizer attached to the LENS, reduces the cost, and improves the light efficiency.

[0006] To solve the above technical problem, the technical solution adopted by the present invention is: a method for manufacturing a liquid crystal lens, including the following steps:

[0007] 1) Manufacturing the first substrate; 2) Manufacturing the second substrate; 3) Pasting and assembling the first substrate and the second substrate.

[0008] The above step 1) includes the following steps: a) Cleaning the first substrate; b) Forming the gate; c) Depositing the insulating layer and the semiconductor layer; d) Forming the source and the drain; e) Depositing the passivation layer and forming vias; f) Depositing the transparent electrode.

[0009] The above step 2) includes the following steps: g) Cleaning the first substrate; h) Forming the black matrix; i) Forming the color filter layer; j) Depositing the protective layer; k) Forming the ITO electrode.

[0010] The above step 3) includes the following steps: i) Cleaning the CF / TFT glass; m) Coating the alignment layer on the CF / TFT glass; n) Aligning the alignment layer; o) Spreading the Spacer; p) Dropping the liquid crystal; r) Vacuum pairing and laminating; s) Attaching the polarizer.

[0011] In the above step a), the glass substrate is cleaned with a cleaning solution to remove surface dust, oil, and impurities, and then dehydrated and spin-dried; in the above step b), a layer of metal is sputtered on the glass substrate, and the materials include titanium, aluminum, molybdenum, chromium, and their mixtures; then a photoresist is coated, and through processes of exposure, development, etching, and resist stripping, a gate wiring pattern is formed; in the above step c), PECVD film formation: using plasma-enhanced chemical vapor deposition technology, a silicon nitride film, an undoped amorphous silicon film, and a phosphorus-doped N-type amorphous silicon film are sequentially deposited; SiNx serves as an insulating layer, a-Si serves as a semiconductor layer, and N+a-Si serves as an ohmic contact layer; a photoresist is coated on N+a-Si and a-Si, and through exposure, development, etching, and resist stripping, an a-Si pattern of the TFT part is formed.

[0012] In the above step d), a layer of metal is sputtered on the silicon island, and the materials are the same as those of the gate, including Mo / Al / Mo or a multilayer material; a photoresist is coated on the metal material, and through exposure, development, etching, and resist stripping, source and drain patterns are formed; at the same time, the connection between N+a-Si and the source-drain electrodes is cut off through an etching process; in the above step e), PECVD deposition of a passivation layer: using PECVD technology, a layer of silicon nitride is deposited as a passivation layer to protect the thin-film transistor, signal lines, and gate lines; through photolithography and dry etching processes, vias are formed on the passivation layer to expose leads and parts to be connected, realizing electrical connection between different layers; in the above step f), an indium tin oxide thin film is sputtered on the passivation layer, and ITO is a transparent conductive thin film; through photolithography and wet etching processes, the ITO is patterned to form pixel electrodes.

[0013] In the above step g), the glass substrate is soaked, sprayed, and scrubbed with deionized water, organic solvents, and a special cleaning agent to remove surface dust, oil, and impurities, and then dried with high-purity nitrogen to obtain a clean and pollution-free surface; in the above step h), a black matrix is formed on the substrate through a photolithography process; first, a photoresist is coated, and through mask exposure and development, the photoresist forms a shape corresponding to the black matrix pattern, and then the unprotected area is removed through etching to form a black matrix for isolating pixels of different colors and improving display contrast; in the above step i), fine pigments with uniform particles are divided into three colors: red, green, and blue, and dispersed in a transparent photosensitive resin; then they are successively formed into R, G, and B color patterns through coating, exposure, and development processes; for each color, the steps of coating photoresist, exposure, and development are repeated to form precise color patterns.

[0014] In the above step j), a protective film is deposited on the color filter layer using chemical vapor deposition or physical vapor deposition technology; in the above step k), an indium tin oxide thin film is formed on the substrate using a sputtering method, and then the ITO is patterned through photolithography and etching processes to form ITO electrodes.

[0015] In the above step (i), a cleaning solution is used to remove contaminants and foreign matters on the CF / TFT glass substrate, and then it is dried. In the above step (m), an alignment film is coated on two glass substrates. In the APR plate printing method, under the action of pressure, the PI solution is extruded through a nozzle and sprayed onto a doctor roll / doctor blade, and then evenly transferred to an anilox roll and a plate cylinder by rotation. Finally, the PI solution is evenly transferred from the APR printing plate on the plate cylinder to the CF substrate or the TFT substrate. In the above step (n), the coated alignment film is subjected to an alignment treatment so that the liquid crystal molecules are "anchored" by the aligned alignment film and oriented, giving the liquid crystal molecules a specific pretilt angle. The rubbing angle is designed according to the tilt angle of the LC Lens Slit. If the tilt angle of the LC Lens Slit is θ, the alignment angle is correspondingly changed to θ + 45°. In the above step (o), a TFT-LCD with a corresponding cell thickness is designed according to different liquid crystals. At this time, spacers with corresponding particle sizes are selected and sprayed onto the substrate at a density of 10 - 60 pieces per square millimeter.

[0016] In the above step (p), a sealant is coated on the CF color filter substrate to seal the two substrates together. In the above step (q), liquid crystal is dropped onto the TFT array substrate. After dropping, its molecules are arranged according to the requirements of the alignment film. In the above step (r), the TFT array substrate with liquid crystal dropped and the CF color filter substrate coated with the sealant are aligned and bonded in a vacuum chamber, and then cured by UV curing and thermal curing to cure the sealant and form a complete Cell cell. In the above step (s), according to the LC Lens Slit angle determined in step (n) being θ, at this time, the polarization axis angle of the lower polarizer is selected as θ + 90°, and the polarization axis angle of the upper polarizer is θ.

[0017] One of the technical solutions in the above technical solution has the following advantages or beneficial effects: changing the polarization direction of the polarized light emitted by the traditional LCD, eliminating the use of a 1 / 2 wave plate and the polarizer attached to the LENS, reducing costs and improving light efficiency. Description of the Drawings

[0018] Figure 1 It is a schematic structural diagram of the manufacturing method of the liquid crystal lens provided in the embodiment of the present invention;

[0019] Figure 2 is Figure 1 the LCD-VA structural schematic diagram of the manufacturing method of the liquid crystal lens;

[0020] Figure 3 is Figure 1 the LCD-IPS structural schematic diagram of the manufacturing method of the liquid crystal lens; Detailed Embodiments

[0021] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0022] Embodiment 1

[0023] See Figures 1 to 3 , a manufacturing method of a liquid crystal lens, comprising the following steps: 1) First substrate manufacturing; 2) Second substrate manufacturing; 3) Bonding and cell formation of the first substrate and the second substrate. Change the polarization direction of the polarized light emitted by the traditional LCD, eliminate the use of a 1 / 2 wave plate and the polarizer attached to the LENS, reduce costs, and improve light efficiency.

[0024] The above step 1) includes the following steps: a) Cleaning the first substrate; b) Forming a gate; c) Depositing an insulating layer and a semiconductor layer; d) Forming a source and a drain; e) Depositing a passivation layer and forming vias; f) Depositing a transparent electrode.

[0025] The above step 2) includes the following steps: g) Cleaning the first substrate; h) Forming a black matrix; i) Forming a color filter layer; j) Depositing a protective layer; k) Forming an ITO electrode.

[0026] The above step 3) includes the following steps: i) Cleaning the CF / TFT glass; m) Coating an alignment layer on the CF / TFT glass; n) Aligning the alignment layer; o) Spreading spacers; p) Dropping liquid crystal; r) Vacuum pairing and bonding; s) Attaching a polarizer.

[0027] In the above step a), the glass substrate is cleaned with a cleaning solution to remove surface dust, oil stains and impurities, and then dehydrated and spin-dried; in the above step b), a layer of metal is sputtered on the glass substrate, and the materials include titanium, aluminum, molybdenum, chromium and their mixtures; then a photoresist is coated, and a gate wiring pattern is formed through processes such as exposure, development, etching and resist stripping; in the above step c), PECVD film formation: Using plasma-enhanced chemical vapor deposition technology, a silicon nitride film, an undoped amorphous silicon film and a phosphorus-doped N-type amorphous silicon film are sequentially deposited; SiNx is used as the insulating layer, a-Si is used as the semiconductor layer, and N+a-Si is used as the ohmic contact layer; a photoresist is coated on N+a-Si and a-Si, and the a-Si pattern of the TFT part is formed through exposure, development, etching and resist stripping.

[0028] In the above step d), a layer of metal is sputtered on the silicon island. The material is the same as that of the gate, including Mo / Al / Mo or a multi-layer material. A photoresist is coated on the metal material, and source and drain patterns are formed through exposure, development, etching, and resist stripping. At the same time, the connection between N+a-Si and the source-drain electrodes is cut off through an etching process. In the above step e), a passivation layer is deposited by PECVD: a layer of silicon nitride is deposited as the passivation layer by PECVD technology to protect the thin-film transistor, signal lines, and gate lines. Through photolithography and dry etching processes, vias are formed in the passivation layer to expose the leads and the parts to be connected, realizing electrical connection between different layers. In the above step f), an indium tin oxide thin film is sputtered on the passivation layer. ITO is a transparent conductive thin film. Through photolithography and wet etching processes, the ITO is patterned to form pixel electrodes.

[0029] In the above step g), the glass substrate is soaked, sprayed, and brushed with deionized water, organic solvents, and a special cleaning agent to remove dust, oil, and impurities on the surface, and then dried with high-purity nitrogen to obtain a clean and pollution-free surface. In the above step h), a black matrix is formed on the substrate through a photolithography process: first, a photoresist is coated, and after mask exposure and development, the photoresist forms a shape corresponding to the black matrix pattern. Then, the unprotected areas are removed through etching to form the black matrix, which is used to isolate pixels of different colors and improve the display contrast. In the above step i), fine pigments with uniform particles are divided into three colors: red, green, and blue, and dispersed in a transparent photosensitive resin. Then, they are successively formed into R, G, and B color patterns through coating, exposure, and development process methods. Each color repeats the steps of coating photoresist, exposure, and development to form precise color patterns.

[0030] In the above step j), a protective film is deposited on the color filter layer by chemical vapor deposition or physical vapor deposition technology. In the above step k), an indium tin oxide thin film is formed on the substrate by sputtering, and then the ITO is patterned through photolithography and etching processes to form an ITO electrode.

[0031] In the above step (i), a cleaning solution is used to remove contaminants and foreign matters on the CF / TFT glass substrate, and then it is dried. In the above step (m), an alignment film is coated on two glass substrates. In the APR plate printing method, under the action of pressure, the PI solution is extruded through a nozzle and sprayed onto a doctor roll / doctor blade, and then evenly transferred to an anilox roll and a plate cylinder by rotation. Finally, the PI solution is evenly transferred from the APR printing plate on the plate cylinder to the CF substrate or the TFT substrate. In the above step (n), the coated alignment film is subjected to an alignment treatment so that the liquid crystal molecules are "anchored" by the aligned alignment film and oriented, making the liquid crystal molecules have a specific pretilt angle. The rubbing angle is designed according to the tilt angle of the LC Lens Slit. If the tilt angle of the LC Lens Slit is θ, the alignment angle is correspondingly changed to θ + 45°. In the above step (o), a TFT-LCD with a corresponding cell thickness is designed according to different liquid crystals. At this time, spacers with corresponding particle sizes are selected and sprayed onto the substrate at a density of 10 - 60 pieces per square millimeter.

[0032] In the above step (p), a sealant is coated on the CF color filter substrate to seal the two substrates together. In the above step (q), liquid crystal is dropped onto the TFT array substrate. After dropping, its molecules are arranged according to the requirements of the alignment film. In the above step (r), the TFT array substrate with liquid crystal dropped thereon and the CF color filter substrate coated with the sealant are aligned and bonded in a vacuum chamber, and then cured by UV curing and thermal curing to cure the sealant and form a complete Cell cell. In the above step (s), according to the LC Lens Slit angle determined in step (n) being θ, at this time, the polarization axis angle of the lower polarizer is selected as θ + 90°, and the polarization axis angle of the upper polarizer is θ.

[0033] In order to achieve a better light splitting effect of the liquid crystal lens, it is necessary to ensure that the direction of the outgoing polarized light of the LCD is consistent with the long axis direction of the liquid crystal molecules in the liquid crystal lens. The structure of the LENS (liquid crystal lens) is as Figure 1 shown. Slit width: designed to drive the liquid crystal and present an approximate parabolic equivalent refractive index curve; Slit tilt angle: designed according to the lens pitch and the severity of moiré; Lens pitch: can be designed according to the actual size of the LCD sub-pixel; Liquid crystal cell thickness: 18 - 25 um is acceptable.

[0034] This design eliminates the insulating layer compared with the traditional structure, further reducing the production cost. Moreover, the peripheral circuit is made of ITO & metal layer, further reducing the impedance, and can further reduce the power consumption on the basis of improving the display effect.

[0035] The tilt angle of the LENS (liquid crystal lens) slit is θ, and the angle corresponding to the long axis of the liquid crystal molecules is θ. Therefore, the rubbing angle of the liquid crystal lens is θ. At this time, in order to achieve a better 3D display effect, it is necessary to ensure that the polarization direction of the outgoing polarized light of the LCD is consistent with the direction of the long axis of the liquid crystal molecules in the LENS (liquid crystal lens).

[0036] The proposed structure is as follows: change the polarization direction of the outgoing polarized light of the traditional LCD, eliminate the use of the 1 / 2 wave plate and the polarizer attached to the LENS, reduce costs, and improve light efficiency.

[0037] As Figure 2 shown, when the display mode of the LCD display screen is selected as VA:

[0038] It is only necessary to change the polarization axis of the polarizer on the LCD to θ, the polarization axis of the lower polarizer to θ + 90°, and change the alignment angle to θ + 45°, then the display can achieve a better 3D display effect. Alignment, lens angle, polarizer angle.

[0039] The red arrow represents the angle of the polarization axis of the upper polarizer, and the green arrow represents the angle of the polarization axis of the upper polarizer.

[0040] The range of the polarization angle θ of the outgoing light is in the interval (0°, 90°), which is within the scope of patent protection

[0041] As Figure 3 shown, when the display mode of the LCD display screen is selected as IPS:

[0042] It is only necessary to change the polarization axis of the polarizer on the LCD to θ, the polarization axis of the lower polarizer to θ + 90°, and then change the alignment angle to θ + 90°. After completing the above configuration, the display can achieve a better 3D display effect.

[0043] The red arrow represents the angle of the polarization axis of the upper polarizer, and the green arrow represents the angle of the polarization axis of the upper polarizer.

[0044] The range of the polarization angle θ of the outgoing light is in the interval (0°, 90°), which is within the scope of patent protection.

[0045] After adopting the above scheme, change the polarization direction of the outgoing polarized light of the traditional LCD, eliminate the use of the 1 / 2 wave plate and the polarizer attached to the LENS, reduce costs, and improve light efficiency.

[0046] Embodiment 2

[0047] The proposed structure of the liquid crystal lens is as follows: change the polarization direction of the outgoing polarized light of the traditional LCD, eliminate the use of the 1 / 2 wave plate and the polarizer attached to the LENS, reduce costs, and improve light efficiency.

[0048] As Figure 2As shown, when the display mode of the LCD display screen is selected as VA:

[0049] It is only necessary to change the polarization axis of the upper polarizer on the LCD to θ, the polarization axis of the lower polarizer to θ + 90°, and change the alignment angle to θ + 45°, then the display can achieve a better 3D display effect. Alignment, lens angle, and polarizer angle.

[0050] The red arrow represents the angle of the polarization axis of the upper polarizer, and the green arrow represents the angle of the polarization axis of the upper polarizer.

[0051] The range of the polarization angle θ of the outgoing light is in the interval (0°, 90°), which is within the scope of patent protection.

[0052] Such as Figure 3 As shown, when the display mode of the LCD display screen is selected as IPS:

[0053] It is only necessary to change the polarization axis of the upper polarizer on the LCD to θ, the polarization axis of the lower polarizer to θ + 90°, and then change the alignment angle to θ + 90°. After completing the above configuration, the display can achieve a better 3D display effect.

[0054] The red arrow represents the angle of the polarization axis of the upper polarizer, and the green arrow represents the angle of the polarization axis of the upper polarizer.

[0055] The range of the polarization angle θ of the outgoing light is in the interval (0°, 90°), which is within the scope of patent protection.

[0056] A method for manufacturing a liquid crystal lens includes the following steps:

[0057] Process flow for manufacturing the first substrate:

[0058] First step: Cleaning the glass substrate:

[0059] Clean the glass substrate with a special cleaning solution to remove surface dust, oil, and impurities, and then dehydrate and spin-dry to ensure that the substrate surface is clean and smooth.

[0060] Second step: Forming the gate (Gate Metal):

[0061] Sputter a layer of metal on the glass substrate, the material is usually titanium (Ti), aluminum (Al), molybdenum (Mo), chromium (Cr), and their mixtures; then coat with photoresist, and form the gate wiring pattern through processes such as exposure, development, etching, and resist stripping.

[0062] Third step: Depositing the insulating layer and semiconductor layer:

[0063] PECVD Film Deposition: Using the plasma-enhanced chemical vapor deposition (PECVD) technique, a silicon nitride (SiNx) film, an undoped amorphous silicon (a-Si) film, and a phosphorus-doped N-type amorphous silicon (N+a-Si) film are deposited in sequence. SiNx serves as the insulating layer, a-Si serves as the semiconductor layer, and N+a-Si serves as the ohmic contact layer.

[0064] Apply photoresist on N+a-Si and a-Si, and form the a-Si pattern of the TFT part through exposure, development, etching, and resist stripping.

[0065] Step 4: Form Source and Drain (Source / Drain Metal):

[0066] Sputter a layer of metal on the silicon island, and the material is similar to that of the gate, such as a multi-layer material like Mo / Al / Mo. Apply photoresist on the metal material, and form the source and drain patterns through exposure, development, etching, and resist stripping. At the same time, cut off the connection between N+a-Si and the source-drain electrodes through the etching process to prevent leakage.

[0067] Step 5: Deposit the Passivation Layer and Form Via Holes:

[0068] PECVD Deposit the Passivation Layer: Use the PECVD technique to deposit a layer of silicon nitride (p-SiNx) as the passivation layer to protect the thin-film transistor, signal lines, and gate lines. Through photolithography and dry etching processes, form via holes on the passivation layer to expose the leads and the parts that need to be connected, realizing electrical connection between different layers.

[0069] Step 6: Deposit the Transparent Electrode (ITO):

[0070] Sputter indium tin oxide (ITO) thin film on the passivation layer. ITO is a transparent conductive thin film. Pattern the ITO through photolithography and wet etching processes to form pixel electrodes.

[0071] Manufacturing Process Flow of the Second Substrate:

[0072] Step 1: Substrate Cleaning:

[0073] Soak, spray, and brush the glass substrate with deionized water, organic solvents, and special cleaning agents to remove dust, oil, and other impurities on the surface, and then dry it with high-purity nitrogen to obtain a clean and pollution-free surface.

[0074] Step 2: Formation of the Black Matrix:

[0075] The black matrix is formed on the substrate through a photolithography process. First, a photoresist is coated, followed by mask exposure and development to make the photoresist form a shape corresponding to the black matrix pattern. Then, the unprotected areas by the photoresist are removed through etching to form the black matrix, which is used to isolate pixels of different colors and improve the display contrast.

[0076] Step 3: Formation of the color filter layer:

[0077] Uniform fine pigments (average particle size less than 0.1μm), usually in three colors of red (R), green (G), and blue (B), are dispersed in a transparent photosensitive resin. Then, they are successively formed into R, G, and B color patterns through coating, exposure, and development processes. For each color, steps such as photoresist coating, exposure, and development need to be repeated to form precise color patterns.

[0078] Step 4: Deposition of the protective layer: A protective film is deposited on the color filter layer, usually using techniques such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). The protective film can improve the abrasion resistance, moisture resistance, and corrosion resistance of the color filter, protecting the color filter layer from the influence of the external environment.

[0079] Step 5: Formation of the ITO electrode:

[0080] Indium tin oxide (ITO) thin film is formed on the substrate using methods such as sputtering, and then the ITO is patterned through photolithography and etching processes to form the ITO electrode. The ITO electrode is used to provide an electric field for the liquid crystal cell and control the orientation of liquid crystal molecules, thereby realizing image display.

[0081] Cell formation process flow:

[0082] Step 1: Cleaning of the CF / TFT glass:

[0083] Special cleaning liquid is used to remove contaminants and foreign matters on the CF / TFT glass substrate, and then drying is carried out to improve the adhesion and airtightness between the alignment film and the glass substrate.

[0084] Step 2: Coating of the alignment film on the CF / TFT glass:

[0085] The alignment film (polyimide, abbreviated as PI) is coated on two glass substrates. The APR plate printing method is adopted. Under the action of pressure, the PI liquid is extruded through the nozzle and sprayed on the doctor roll / doctor blade, and is evenly transferred to the anilox roll and plate cylinder through rotation, and finally the PI liquid is evenly transferred to the CF substrate or TFT substrate by the APR printing plate on the plate cylinder.

[0086] Step 3: Alignment of the alignment film:

[0087] The aligned film that has been coated is subjected to alignment treatment so that the liquid crystal molecules are "anchored" by the aligned film after alignment and oriented, giving the liquid crystal molecules a certain pretilt angle (the rubbing angle is designed according to the tilt angle of the LC Lens Slit. If the tilt angle of the LC Lens Slit is θ, the alignment angle is correspondingly changed to θ + 45°).

[0088] Step 4: Spacer Dispersion:

[0089] A TFT-LCD with a corresponding cell thickness is designed according to different liquid crystals. At this time, spacers with corresponding particle sizes are selected and sprayed onto the substrate at a density of 10 - 60 pieces per square millimeter.

[0090] Step 5: Sealant Coating: Sealant is coated on the CF color filter substrate to seal the two substrates together to prevent liquid crystal leakage and play a role in fixing and supporting.

[0091] Step 6: Liquid Crystal Droplet Injection:

[0092] Liquid crystal is dropped onto the TFT array substrate. Liquid crystal is an intermediate state substance between liquid and solid. After being dropped, its molecules need to be arranged according to the requirements of the aligned film.

[0093] Step 7: Vacuum Alignment and Lamination:

[0094] The TFT array substrate with liquid crystal dropped and the CF color filter substrate coated with sealant are aligned and laminated in a vacuum chamber to ensure that the two substrates are accurately aligned, and then cured by UV and heat to cure the sealant and form a complete Cell cell.

[0095] Step 8: Polarizer Attachment;

[0096] According to Step 3, the LC Lens Slit angle is determined to be θ. At this time, the polarization axis angle of the lower polarizer is selected to be θ + 90°, and the polarization axis angle of the upper polarizer is θ.

[0097] After adopting the above scheme, the polarization direction of the polarized light emitted by the traditional LCD is changed, eliminating the use of the 1 / 2 wave plate and the polarizer attached to the LENS, reducing costs and improving light efficiency.

[0098] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by terms such as "coaxial", "bottom", "one end", "top", "middle", "the other end", "upper", "one side", "top", "inner", "front", "center", "both ends", etc. is the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present invention.

[0099] In the present invention, unless otherwise clearly stipulated and defined, terms such as "installation", "setting", "connection", "fixation", "rotation connection", etc. shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements or the interaction relationship between two elements. Unless otherwise clearly defined, for those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0100] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A method for manufacturing a liquid crystal lens, characterized in that: The steps include: 1) Making a first substrate; 2) Making a second substrate; 3) Making the first substrate and pasting the second substrate into a box.

2. The method for manufacturing a liquid crystal lens according to claim 1, wherein: The above step 1) includes the following steps: a) cleaning the first substrate; b) forming a gate; c) depositing an insulating layer and a semiconductor layer; d) forming a source and a drain; e) depositing a passivation layer and forming a via hole; and f) depositing a transparent electrode.

3. The method for manufacturing a liquid crystal lens according to claim 2, wherein: The above step 2) includes the following steps: g) cleaning the first substrate; h) forming a black matrix; i) forming a color filter layer; j) depositing a protective layer; k) forming an ITO electrode.

4. The method for manufacturing a liquid crystal lens according to claim 3, wherein: The above step 3) includes the following steps: i) CF / TFT glass cleaning; m) CF / TFT glass alignment film coating; n) alignment film alignment; o) Spacer spreading; p) liquid crystal dripping; r) vacuum assembly bonding; s) polarizer attachment.

5. The method for manufacturing a liquid crystal lens according to claim 4, wherein: In the above step a), a cleaning solution is used to clean the glass substrate to remove dust, oil and impurities on the surface, and then the substrate is dehydrated and dried; in the above step b), a layer of metal is sputtered on the glass substrate, and the materials include titanium, aluminum, molybdenum, chromium and a mixture thereof; then a photoresist is applied, and a gate wiring pattern is formed through exposure, development, etching and debonding processes; in the above step c), PECVD film formation: using plasma enhanced chemical vapor deposition technology, silicon nitride film, non-doped amorphous silicon film and phosphorus-doped N-type amorphous silicon film are deposited in sequence; SiNx is used as an insulating layer, a-Si is used as a semiconductor layer, and N+a-Si is used as an ohmic contact layer; photoresist is applied on N+a-Si and a-Si, and an a-Si pattern of the TFT part is formed through exposure, development, etching and debonding.

6. The method for manufacturing a liquid crystal lens according to claim 5, wherein: In the above step d), a layer of metal is sputtered on the silicon island, and the material is the same as that of the gate, including Mo / Al / Mo or a composite material; a photoresist is coated on the metal material, and a source and drain pattern is formed through exposure, development, etching and debonding; at the same time, the connection between the N+a-Si and the source and drain electrodes is cut off through an etching process; in the above step e), a passivation layer is deposited by PECVD: a layer of silicon nitride is deposited as a passivation layer using PECVD technology to protect the thin film transistor, signal line and gate line; a via is formed on the passivation layer through photolithography and dry etching processes to expose the lead and the part to be connected, so as to realize the electrical connection between different layers; in the above step f), an indium tin oxide film is sputtered on the passivation layer, and ITO is a transparent conductive film; Through photolithography and wet etching processes, ITO is patterned to form pixel electrodes.

7. The method for manufacturing a liquid crystal lens according to claim 6, wherein: In the above step g), the glass substrate is immersed, sprayed and scrubbed with deionized water, an organic solvent and a special cleaning agent to remove dust, oil and impurities on the surface, and then blown dry with high-purity nitrogen to obtain a clean and pollution-free surface; in the above step h), a black matrix is ​​formed on the substrate by a photolithography process; First, photoresist is applied, and then exposed and developed through a mask to form the photoresist into a shape corresponding to the black matrix pattern. Then, the area not protected by the photoresist is removed by etching to form a black matrix for isolating pixels of different colors and improving display contrast. In the above step i), fine pigments with uniform particles are divided into three colors: red, green and blue, and dispersed in a transparent photosensitive resin. Then, they are sequentially coated, exposed and developed to form R, G and B three-color patterns in sequence. The steps of coating photoresist, exposing and developing are repeated for each color to form an accurate color pattern.

8. The method for manufacturing a liquid crystal lens according to claim 7, wherein: In the above step j), a protective film is deposited on the color filter layer by chemical vapor deposition or physical vapor deposition technology; in the above step k), an indium tin oxide film is formed on the substrate by sputtering, and then the ITO is patterned by photolithography and etching processes to form an ITO electrode.

9. The method for manufacturing a liquid crystal lens according to claim 8, wherein: In the above step i), a cleaning liquid is used to remove pollutants and foreign matter on the CF / TFT glass substrate, and then the substrate is dried; in the above step m), an alignment film is coated on two glass substrates, and an APR printing method is used. Under pressure, the PI liquid is extruded and sprayed on the doctor roller / doctor blade through a nozzle, and then evenly transferred to the anilox roller and the plate body by rotation. Finally, the APR printing plate on the plate body evenly transfers the PI liquid to the CF substrate or TFT substrate; in the above step n), the coated alignment film is subjected to an alignment treatment, so that the liquid crystal molecules are "anchored" and oriented by the aligned alignment film, so that the liquid crystal molecules have a specific pre-tilt angle; the rubbing angle is designed according to the tilt angle of the LC Lens Slit. If the tilt angle of the LC Lens Slit is θ, the alignment angle is correspondingly changed to θ+45°; in the above step o), according to the TFT-LCD with a corresponding cell thickness of different liquid crystal designs, a spacer with a corresponding particle size is selected at this time and sprayed on the substrate at a density of 10 to 60 particles / square millimeter.

10. The method for manufacturing a liquid crystal lens according to claim 9, wherein: In the above step p), a sealing glue is applied on the CF color film substrate to seal the two substrates together; in the above step q), liquid crystal is dripped on the TFT array substrate; after dripping, its molecules are arranged according to the requirements of the alignment film; in the above step r), the TFT array substrate dripped with liquid crystal and the CF color film substrate coated with the sealing glue are aligned and bonded in a vacuum chamber, and then the sealing glue is cured by UV curing and thermal curing to form a complete Cell box; in the above step s), according to step n), the lower LC Lens Slit angle is determined to be θ, and at this time, the polarization axis angle of the lower polarizer is selected to be θ+90°, and the polarization axis angle of the upper polarizer is selected to be θ.

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