Liquid crystal panel, preparation method thereof and display device

Abstract

The embodiment of the invention provides a liquid crystal panel, a preparation method thereof and a display device. The liquid crystal panel comprises a liquid crystal layer, an array substrate and a color film substrate, wherein the array substrate and the color film substrate are arranged on the two sides of the liquid crystal layer; the array substrate comprises a first color resistance layer, the color film substrate comprises a second color resistance layer, the arrangement mode of color resistance blocks in the first color resistance layer is the same as the arrangement mode of color resistance blocks in the second color resistance layer, and the positions of the color resistance blocks in the first color resistance layer correspond to the positions of the color resistance blocks in the second color resistance layer; wherein the first color resistance layer and the second color resistance layer are matched with each other so as to reduce scattered light and improve the contrast ratio of the liquid crystal panel. According to the liquid crystal panel, the preparation method of the liquid crystal panel and the display device, the first color resistance layer is correspondingly arranged at the position, corresponding to the second color resistance layer of the color film substrate, of one side of the array substrate, scattered light can be effectively weakened, then the dark state brightness is reduced, and finally the contrast ratio is remarkably improved.

Description

Technical Field

[0001] The present application belongs to the field of display technology, and in particular, relates to a liquid crystal panel and a preparation method thereof, and a display device. Background Art

[0002] In today's display technology, oxide IPS (In-Plane Switching) LCD (Liquid Crystal Display) is widely used in various electronic devices. Among them, contrast is a key optical indicator of oxide IPS LCD image quality, which has a decisive influence on the clarity, detail performance, and grayscale level of the picture. A higher contrast can make the picture present richer colors and more delicate details, bringing a better visual experience to users.

[0003] However, there are many challenges in improving the contrast of oxide IPS LCDs. To achieve a higher contrast, it is necessary to achieve a higher white state brightness and a lower black state brightness. In existing technologies, due to the structural characteristics of the display screen, such as the scattering of the array substrate and liquid crystal, light leakage occurs in the dark state, which makes it impossible to effectively reduce the dark state brightness, thus affecting the improvement of contrast.

[0004] Therefore, how to improve the contrast of oxide IPS LCD has become an important issue to be solved urgently in this field. Summary of the invention

[0005] In view of this, the embodiments of the present application provide a liquid crystal panel and a method for manufacturing the same, and a display device to solve the technical problem that the contrast ratio of the existing oxide IPS LCD is not high enough.

[0006] In a first aspect, an embodiment of the present application provides a liquid crystal panel, comprising a liquid crystal layer and an array substrate and a color filter substrate disposed on both sides of the liquid crystal layer;

[0007] The array substrate includes a first color resist layer, the color filter substrate includes a second color resist layer, the arrangement of the color resist blocks in the first color resist layer is the same as the arrangement of the color resist blocks in the second color resist layer, and the positions of the color resist blocks in the first color resist layer correspond to the positions of the color resist blocks in the second color resist layer;

[0008] Wherein, the first color resist layer and the second color resist layer cooperate with each other to reduce scattered light.

[0009] In some embodiments, the first color resist layer includes a plurality of color resist blocks arranged in an array, wherein the colors of the plurality of color resist blocks include red, green and blue;

[0010] Any one of the above three colors of the color resist blocks is used to filter the light of the other two colors and allow the light of the same color as the color resist block to pass through.

[0011] In some embodiments, the color resist blocks in each column of the array have the same color.

[0012] In some embodiments, the color resist blocks in adjacent rows of the same column in the array have different colors.

[0013] In some embodiments, the array substrate further includes:

[0014] A first substrate;

[0015] A common electrode layer located on one side of the first substrate;

[0016] A pixel electrode layer provided on the side of the first color resist layer away from the first substrate, and the pixel electrode layer is disposed at intervals, and the first color resist layer is located between the common electrode layer and the pixel electrode layer; and

[0017] A first planarization layer provided on the side of the first color resist layer and the pixel electrode layer away from the first substrate.

[0018] In some embodiments, the color filter substrate includes:

[0019] A second substrate;

[0020] A black matrix provided on the side of the second substrate close to the second color resist layer;

[0021] A second planarization layer provided on the side of the second color resist layer away from the second substrate.

[0022] In some embodiments, an alignment layer is provided on the side of the liquid crystal layer close to the color filter substrate, and the alignment layer is used to control the initial alignment direction of the liquid crystal molecules in the liquid crystal layer.

[0023] In some embodiments, an alignment protection layer is provided on the side of the liquid crystal layer close to the array substrate to prevent the liquid crystal material in the liquid crystal layer from entering the array substrate.

[0024] In a second aspect, an embodiment of the present application provides a method for manufacturing a liquid crystal panel, including:

[0025] Manufacturing an array substrate and a color filter substrate;

[0026] Filling a liquid crystal material on the array substrate to form a liquid crystal layer;

[0027] Pairing the color filter substrate with the array substrate to form a liquid crystal panel.

[0028] In some embodiments, the preparation of the array substrate includes:

[0029] Providing a first substrate;

[0030] Successively preparing a gate layer, a gate insulating layer, an oxide semiconductor layer, a source / drain layer, and a first passivation inorganic layer on one side of the first substrate;

[0031] Preparing a common electrode layer on the side of the first passivation inorganic layer away from the first substrate, and preparing a first color resist layer on the side of the common electrode layer away from the first substrate.

[0032] In some embodiments, the preparation of the first color resist layer on one side of the common electrode layer includes: the first color resist layer includes a plurality of color resist blocks arranged in an array, and the colors of the plurality of color resist blocks include three colors: red, green, and blue;

[0033] Among them, the position of the red color resist block corresponds to the red color resist block in the second color resist layer, the position of the green color resist block corresponds to the green color resist block in the second color resist layer, and the position of the blue color resist block corresponds to the blue color resist block in the second color resist layer.

[0034] In a third aspect, an embodiment of the present application provides a display device, including the liquid crystal panel described in the first aspect or the liquid crystal panel prepared by the preparation method described in the second aspect.

[0035] The liquid crystal panel provided by the embodiment of the present application, by providing a first color resist layer in the array substrate, and the position of the first color resist layer is correspondingly arranged with the position of the second color resist layer in the color filter substrate, and the arrangement manner is also the same. In this way, the first color resist layer initially filters the light of the backlight source, and then when passing through the second color resist layer, light of different colors will be blocked by the color resist layer, and only light of the same color as the color resist block in the color resist layer is allowed to pass through, weakening the scattered light, thereby reducing the leakage light brightness caused by the scattering of the array substrate and the liquid crystal layer in the dark state, and thus improving the overall contrast of the display screen and the picture quality.

[0036] The preparation method of the liquid crystal panel provided by the embodiment of the present application, due to the thickness adjustment design of the color resist layer, can ensure that the size of the color gamut and the transmittance are at the same level as the traditional solution, and the color resist layer located on the array substrate side also acts as a dielectric layer, reducing the preparation process of the passivation dielectric layer; finally, due to the reduction of the photo-alignment layer in the preparation process of the traditional oxide IPS LCD and the addition of the color resist layer on the array substrate side and the planar protection layer above the pixel electrode, the flatness can be effectively improved, ensuring the alignment ability of the alignment film to the liquid crystal. It has strong compatibility. The color filter substrate is prepared according to the process of a normal IPS LCD display screen, and only the preparation link of the color resist layer on the array substrate side is added, without large-scale modification of the existing production process, which is convenient for popularization and application in the existing production line, reducing the production cost and technical threshold.

[0037] Since the display device provided by the embodiment of the present application has the liquid crystal panel described above, it naturally has all the beneficial effects described above. In this way, the contrast of the display device can be improved, and the improvement of the contrast has greatly improved the clarity, detail performance, and gray level of the picture, bringing a better visual experience to the user. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings in the following description are only some embodiments of the embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0039] Figure 1 is a schematic structural diagram of a liquid crystal panel in the prior art;

[0040] Figure 2 is a schematic structural diagram of the liquid crystal panel provided by the embodiment of the present application;

[0041] Figure 3 is a schematic arrangement structure diagram of the first color resist layer or the second color resist layer in the liquid crystal panel provided by the embodiment of the present application Figure 1 ;

[0042] Figure 4 is a schematic arrangement structure diagram of the first color resist layer or the second color resist layer in the liquid crystal panel provided by the embodiment of the present application Figure 2 ;

[0043] Figure 5 is a partial schematic structural diagram of the liquid crystal panel provided by the embodiment of the present application;

[0044] Figure 6 is a schematic structural diagram of the array substrate in the liquid crystal panel provided by the embodiment of the present application;

[0045] Figure 7 is a schematic structural diagram of the color filter substrate in the liquid crystal panel provided by the embodiment of the present application;

[0046] Figure 8 is a schematic structural diagram of the light path of the liquid crystal panel provided by the embodiment of the present application.

[0047] Among them, the reference numerals in the drawings:

[0048] 10. Liquid crystal layer; 100. Alignment layer; 101. Alignment protection layer;

[0049] 20. Array substrate; 200. First color resist layer; 21. First substrate; 22. Gate; 23. Gate insulating layer; 24. Data transmission layer; 25. First inorganic insulating layer; 26. Common electrode layer; 27. Pixel electrode layer; 28. First planarization layer;

[0050] 30. Color filter substrate; 300. Second color resist layer; 31. Second substrate; 32. Black matrix; 33. Second planarization layer. Detailed implementation manners

[0051] In the following description, for the purpose of illustration rather than limitation, specific details such as specific system architectures, technologies, etc. are presented to thoroughly understand the embodiments of the present application. However, those skilled in the art should clearly understand that the embodiments of the present application can also be implemented in other embodiments without these specific details. In other cases, detailed descriptions of well-known systems, devices, circuits, and methods are omitted to avoid unnecessary details from interfering with the description of the embodiments of the present application.

[0052] It should also be understood that the term "and / or" used in the specification of the embodiments of the present application and the appended claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes these combinations.

[0053] It should be noted that when an element is referred to as "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0054] It should be understood that the orientation or positional relationships indicated by the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationships shown in the drawings, and are only for the convenience of describing the embodiments of the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus cannot be understood as a limitation to the embodiments of the present application.

[0055] In addition, in the description of the specification of the embodiments of the present application and the appended claims, the terms "first", "second", "third", etc. are only used for distinguishing descriptions, and cannot be understood as indicating or implying relative importance.

[0056] As used in the description of the embodiments of the present application, references to "some embodiments" or "some embodiments" etc. mean that in one or more embodiments of the embodiments of the present application, specific features, structures or characteristics described in connection with that embodiment are included. Thus, statements such as "in some embodiments", "in some embodiments", "in other some embodiments", "in still other some embodiments" etc. that appear in different places in this specification do not necessarily all refer to the same embodiment, but mean "one or more but not all embodiments", unless otherwise specifically emphasized. The terms "comprising", "including", "having" and their variants all mean "including but not limited to", unless otherwise specifically emphasized. "A plurality" means two or more.

[0057] As Figure 1 shown, currently, a conventional liquid crystal panel includes a liquid crystal layer 10 and an array substrate 20 and a color filter substrate 30 disposed on both sides of the liquid crystal layer 10. The color filter substrate 30 includes color filters for generating colors to display colors. However, due to factors such as scattering of the array substrate 20 and the liquid crystal in the liquid crystal panel, there is a light leakage phenomenon in the dark state, so that the dark state brightness cannot be effectively reduced, and further the improvement of the contrast is affected.

[0058] Based on this, in the embodiments of the present application, a first color resist layer 200 is correspondingly disposed on the side of the array substrate 20 at a position corresponding to the color filters of the color filter substrate 30. Through this unique structural design, the scattered light inside the liquid crystal display can be effectively weakened, and then the dark state brightness can be reduced, and finally a significant improvement in the contrast of the display can be achieved.

[0059] In a first aspect of the embodiments of the present application, a liquid crystal panel is provided. As Figure 2 shown, the liquid crystal panel includes a liquid crystal layer 10 and an array substrate 20 and a color filter substrate 30 disposed on both sides of the liquid crystal layer 10;

[0060] The array substrate 20 includes a first color resist layer 200, and the color filter substrate 30 includes a second color resist layer 300. The arrangement pattern of the color resist blocks in the first color resist layer 200 is the same as the arrangement pattern of the color resist blocks in the second color resist layer 300, and the positions of the color resist blocks in the first color resist layer 200 correspond to the positions of the color resist blocks in the second color resist layer 300;

[0061] Wherein, the first color resist layer 200 and the second color resist layer 300 cooperate with each other to reduce scattered light and improve the contrast of the liquid crystal panel.

[0062] The liquid crystal panel provided by the embodiment of the present application sets a first color filter layer 200 in the array substrate 20, and the position of the first color filter layer 200 is correspondingly set with the position of the second color filter layer 300 in the color film substrate 30, and the arrangement modes are also the same. In this way, the first color filter layer 200 initially filters the light of the backlight, and then when passing through the second color filter layer 300, lights of different colors will be blocked by the color filter layer, and only the light with the same color as the color filter block in the color filter layer is allowed to pass through, weakening the scattered light, thereby reducing the leakage light brightness caused by the scattering of the array substrate 20 and the liquid crystal layer 10 in the dark state, and thus improving the overall contrast of the display screen and the picture quality.

[0063] It should be noted that the second color filter layer 300 in the color film substrate 30 can also be called an RGB color filter, which includes red, green, and blue sub-pixels and combines to form a color display. Similarly, the first color filter layer 200 in the array substrate 20 is essentially also an RGB color filter. Through the cooperation of the two color filter layers, the light of the backlight is first filtered by the first color filter layer 200 in the array substrate 20, and only the light with the same color as the red, green, and blue sub-pixels on the first color filter layer 200 is allowed to transmit light. When passing through the second color filter layer 300, lights of different colors (i.e., scattered light) will be blocked, and the normally direct light will be emitted to form a color display. In this way, the scattered light inside the display can be effectively weakened, thereby reducing the dark state brightness, and finally improving the contrast of the display and enhancing the picture display quality.

[0064] In the application, the arrangement mode of the color filter blocks in the second color filter layer 300 is the same as that of the color filter blocks in the first color filter layer 200. In other words, the first color filter layer 200 and the second color filter layer 300 can also be called color filters. The color filter has color filter blocks of three colors (red, green, and blue), which can also be called sub-pixels. Generally speaking, the color filter blocks on the second color filter layer 300 in the color film substrate 30 are arranged in a matrix manner, and the color filter blocks in the first color filter layer 200 in the array substrate 20 are also arranged in a matrix manner.

[0065] In the application, the position of the color filter blocks in the first color filter layer 200 corresponds to the position of the color filter blocks in the second color filter layer 300. It means that the width of the color filter blocks in the first color filter layer 200 is relative to the width of the color filter blocks in the second color filter layer 300, where the width refers to the length or width direction of the liquid crystal panel; further, the relative position of the two also includes: along the thickness direction of the liquid crystal panel, the color filter blocks in the first color filter layer 200 coincide with the color filter blocks in the second color filter layer 300.

[0066] In some embodiments, as Figures 2 to 4 shown, the first color filter layer 200 includes a plurality of color filter blocks arranged in an array, and the colors of the plurality of color filter blocks include three colors: red, green, and blue;

[0067] The color resistance blocks of any one of the above three colors are used to filter the light of the other two colors and allow the light of the same color as the color resistance block to pass through. That is, the red color resistance blocks in the first color resistance layer 200 only allow red light to pass through and filter out green and blue light; the green color resistance blocks in the first color resistance layer 200 only allow green light to pass through and filter out red and blue light; the blue color resistance blocks in the first color resistance layer 200 only allow blue light to pass through and filter out red and green light. Similarly, the color resistance blocks in the second color resistance layer 300 also follow the same principle.

[0068] In some embodiments, the arrangement of the color resistance blocks in the first color resistance layer 200 includes: the color resistance blocks in each column of the array are of the same color; similarly, the arrangement of the color resistance blocks in the second color resistance layer 300 is the same as that of the color resistance blocks in the first color resistance layer 200.

[0069] Furthermore, the arrangement of the color resistance blocks in the first color resistance layer 200 includes: the color resistance blocks in adjacent rows in the same column of the array are of different colors, and the arrangement of the color resistance blocks in the second color resistance layer 300 is the same as that of the color resistance blocks in the first color resistance layer 200. Specifically, it can be the arrangement shown in Figure 3 and Figure 4 where R represents a red color resistance block, G represents a green color resistance block, and B represents a blue color resistance block.

[0070] In some embodiments, as shown in Figure 5 and Figure 6 the array substrate 20 further includes a first substrate 21, a common electrode layer 26, a pixel electrode layer 27, and a first planarization layer 28;

[0071] The common electrode layer 26 is located on one side of the first substrate 21;

[0072] The pixel electrode layer 27 is disposed on the side of the first color resistance layer 200 away from the first substrate 21, and the pixel electrode layer 27 is spaced apart. The first color resistance layer 200 is located between the common electrode layer 26 and the pixel electrode layer 27;

[0073] The first planarization layer 28 is disposed on the side of the first color resistance layer 200 and the pixel electrode layer 27 away from the first substrate 21.

[0074] In an application, the first substrate 21 is usually a transparent glass substrate, serving as the physical support of the entire array substrate 20, providing mechanical strength and rigidity. Soda-lime glass (ordinary LCD) or borosilicate glass (high-end display screen) is usually selected. The common electrode layer 26 and the pixel electrode layer 27 jointly act to form a driving electric field to drive the deflection of liquid crystal molecules. In the IPS technology, the common electrode and the pixel electrode are located on the same substrate to form a horizontal electric field. The common electrode layer 26 and the pixel electrode layer 27 are made of a transparent conductive material (such as indium tin oxide ITO). In an IPS screen, the pixel electrode is designed as a comb-shaped electrode =, which is arranged in an interleaved manner with the common electrode. The first planarization layer 28 is used to cover the uneven electrode layer below, providing a smooth surface for the upper structure (such as the alignment layer 100). Usually, an organic material (such as photoresist, polyimide) or an inorganic material (SiN x / SiO2) is selected.

[0075] In an application, such as Figure 5 and Figure 6 shown, the array substrate 20 further includes a gate 22, a gate insulating layer 23 provided on the first substrate 21, a first inorganic insulating layer 25 provided on the gate insulating layer 23, and a data transmission layer 24 provided between the gate insulating layer 23 and the first inorganic insulating layer 25. Among them, the gate 22 serves as the control terminal of the thin-film transistor, receiving a scan signal to control the on / off state of the transistor. The gate insulating layer 23 is used to isolate the gate 22 from the subsequent semiconductor layer to prevent short circuits; as a capacitive dielectric, it jointly forms a storage capacitor with the gate 22 and the semiconductor layer to maintain the stability of the pixel voltage. Cooperating with the gate insulating layer 23, a capacitive structure is formed to store charges to maintain the pixel voltage. The data transmission layer 24 is used for the transmission of data signals, transmitting the grayscale voltage signals from the driving circuit to the source of each pixel. It is usually fabricated on the same layer as the source and the drain to form the input / output terminal of the thin-film transistor.

[0076] In some embodiments, such as Figure 7 shown, the color filter substrate 30 includes a second substrate 31, a black matrix 32, and a second planarization layer 33, wherein a second color resist layer 300 is provided on the second substrate 31;

[0077] The black matrix 32 is provided on one side of the second substrate 31 close to the second color resist layer 300; specifically, the black matrix 32 is disposed between the second substrate 31 and the second color resist layer 300. Further, the black matrix 32 is disposed between adjacent two color resist blocks in the second color resist layer 300; the black matrix serves as the color boundary between the R, G, and B sub-pixels, which can block the scattered light randomly and prevent color mixing between the R / G / B sub-pixels and prevent ambient light from irradiating the array substrate channel to generate leakage current.

[0078] The second planarization layer 33 is provided on one side of the second color resist layer 300 away from the second substrate 31.

[0079] In an application, the second substrate 31 serves as a physical support for the color filter substrate 30, providing mechanical strength and light transmittance. It needs to match the thickness of the glass substrate of the array substrate 20 to ensure the fitting accuracy. Usually, high light transmittance glass (such as soda-lime glass or borosilicate glass) is selected as the material. The black matrix 32, also known as the photoresist BM layer (Black Matrix Layer), plays the role of optical isolation. The black matrix covers the non-pixel area in a grid pattern, preventing backlight leakage and color crosstalk between adjacent sub-pixels (R / G / B). It defines the pixel boundaries, precisely divides the positions of each sub-pixel, and improves the aperture ratio (the ratio of the light-transmitting area). It enhances the contrast, reduces the interference of stray light, and improves the dark state performance. The second planarization layer 33 planarizes the surface of the layer structure. By covering the uneven surfaces of the color resist layer and the BM layer, it provides a smooth base surface for the subsequent structure. It protects the color resist layer and prevents damage to the color filter during subsequent processes.

[0080] In some embodiments, as Figure 8 shown, an alignment layer 100 is provided on the side of the liquid crystal layer 10 close to the color filter substrate 30. The alignment layer 100 is used to control the initial alignment direction of the liquid crystal molecules in the liquid crystal layer 10. The material of the alignment layer 100 is polyimide, and its main function is to align the liquid crystal molecules. It guides the liquid crystal molecules to align in a preset direction (such as horizontal, vertical, or inclined) through physical or chemical means. It stabilizes the liquid crystal layer 10, prevents the random distribution of liquid crystal molecules, and ensures the response consistency during electric field driving. It improves the display performance, optimizes the viewing angle and contrast, and reduces problems such as uneven display.

[0081] In some embodiments, as Figure 8 shown, an alignment protection layer 101 is provided on the side of the liquid crystal layer 10 close to the array substrate 20 to prevent the liquid crystal material in the liquid crystal layer 10 from entering the array substrate 20. The alignment protection layer 101 mainly protects the array substrate 20 from being eroded by the liquid crystal material. Ions or organic components in the liquid crystal material may penetrate into the array substrate 20, resulting in the degradation of transistor performance (such as threshold voltage drift). The alignment protection layer 101 acts as a chemical barrier to isolate the liquid crystal from the circuit of the thin film transistor. It prevents electrochemical migration and avoids the migration of metal ions (such as Na + , K + ) in the liquid crystal to the electrodes of the thin film transistor, causing short circuits or leakage. It optimizes the alignment stability of the liquid crystal molecules and planarizes the surface. There are metal protrusions such as data lines / scan lines on the surface of the array substrate 20, and the alignment protection layer 101 can fill the unevenness and provide a planarized surface.

[0082] The liquid crystal panel provided by the embodiments of the present application, as Figure 8As shown, when the light emitted by the backlight source reaches the side of the array substrate 20 of the liquid crystal panel and passes through the green color resist block, the main light intensity band is in the green band, forming primary green light. After the main light passes through the green color resist block on the side of the color filter substrate 30, green pixels can be displayed. Part of the light is scattered in different film layers, and the scattered light enters the red and blue color resist blocks respectively and is effectively weakened and eliminated; thus, the purpose of reducing the intensity of the scattered light in the dark state is achieved. Similarly, the scattered light of the backlight light after entering the red and blue color resist blocks on the side of the array substrate 20 will also be weakened.

[0083] The embodiment of the present application also provides a method for manufacturing a liquid crystal panel, including:

[0084] S10. Prepare an array substrate and a color filter substrate;

[0085] S20. Fill a liquid crystal material on the array substrate to form a liquid crystal layer;

[0086] S30. Set the color filter substrate and the array substrate in a cell to form a liquid crystal panel.

[0087] For the method for manufacturing a liquid crystal panel provided by the embodiment of the present application, S10 is to prepare an array substrate and a color filter substrate. The array substrate is mainly responsible for driving and controlling each pixel, while the color filter substrate processes colors. The quality of these two substrates directly affects the display effect, such as resolution and color accuracy. High-precision driving and color reproduction can be achieved because high-precision lithography technology is used in the manufacturing process to ensure that the circuits and filters of each pixel are accurate. Then there is S20 to fill the liquid crystal material. The injection method and uniformity of the liquid crystal material will affect the response speed and contrast. If the filling is uniform, the liquid crystal molecules are arranged neatly, and the response is faster and the contrast is higher under the action of an electric field. The problem of light leakage will also be reduced, especially in a dark scene, a purer black is displayed. Next is the cell setting in S30. This step requires precise alignment of the two substrates to ensure that the positions of the pixels and filters match. If the alignment is inaccurate, color deviation or image blurring may occur. Therefore, the effect of the cell setting improves the display consistency and viewing angle. For example, the in-plane switching (IPS) wide viewing angle technology is achieved by adjusting the structure between the substrates, so that the color change of the screen is small when the user views the screen from different angles.

[0088] In some embodiments, in step S10, preparing the array substrate includes:

[0089] S11. Provide a first substrate;

[0090] S12. Sequentially prepare a gate layer, a gate insulating layer, an oxide semiconductor layer, a source / drain layer, and a first passivation inorganic layer on one side of the first substrate; these layer structures are the basis for constructing the circuit on the array substrate side and provide support for the subsequent preparation of the first color resist layer and other functional layers.

[0091] S13. Prepare a common electrode layer on the side of the first passivation inorganic layer away from the first substrate, and prepare a first color resist layer on the side of the common electrode layer away from the first substrate. Prepare the common electrode layer and prepare the first color resist layer at the positions corresponding to the red, green, and blue pixels. Through processes such as photolithography and development, the color resist is accurately prepared at the target position. The first color resist layer can also serve as a dielectric layer, thus reducing the preparation process of the traditional passivation inorganic dielectric layer.

[0092] In applications, due to the thickness adjustment design of the color resist layer, it can ensure that the size of the color gamut and transmittance is at the same level as the traditional solution. And the color resist layer on the array substrate side also acts as a dielectric layer at the same time, reducing the preparation process of the passivation dielectric layer; finally, due to the reduction of the photo-alignment layer in the preparation process of the traditional oxide IPS LCD, and the addition of the color resist layer on the array substrate side and the planar protection layer above the pixel electrode, the flatness can be effectively improved, and the alignment ability of the alignment film to the liquid crystal can be ensured. It has strong compatibility. The color filter substrate is prepared according to the process of a normal IPS LCD display screen, only adding the preparation link of the color resist layer on the 20 side of the array substrate, without large-scale modification of the existing production process, which is convenient for popularization and application in the existing production line, reducing the production cost and technical threshold.

[0093] In some embodiments, preparing the first color resist layer on one side of the common electrode layer includes: the first color resist layer includes a plurality of color resist blocks arranged in an array, and the colors of the plurality of color resist blocks include three colors: red, green, and blue;

[0094] Among them, the position of the red color resist block corresponds to the red color resist block in the second color resist layer, the position of the green color resist block corresponds to the green color resist block in the second color resist layer, and the position of the blue color resist block corresponds to the blue color resist block in the second color resist layer. In other words, the second color resist layer is the color filter in the color filter substrate, and the three-color resist blocks correspond to the three-color sub-pixels. And the red color resist block in the first color resist layer needs to be correspondingly arranged with the red sub-pixel, the green color resist block needs to be correspondingly arranged with the green sub-pixel, and the blue color resist block needs to be correspondingly arranged with the blue sub-pixel.

[0095] In applications, the preparation steps of the array substrate include:

[0096] Process 1, form the gate electrode and the scan line.

[0097] Adopt physical vapor deposition coating to deposit a metal layer on the glass substrate; spin-coat a photoresist to cover the metal layer. Expose and develop, and define the shapes of the gate and scan line through patterning. Wet etching is used to remove the metal not protected by the photoresist to form the gate electrode and the scan line. Its function is to define the control end (gate) and the scan signal transmission line of the array substrate, and control the switching timing of the transistor.

[0098] Process 2, fabricate the gate insulating layer, semiconductor layer, and ohmic contact layer.

[0099] Chemical vapor deposition coating is adopted, and sequential deposition is carried out for the gate insulating layer, amorphous silicon semiconductor layer, and N+ doped layer (high-concentration phosphorus-doped a-Si for ohmic contact). Lithography and dry etching are used to define the semiconductor region through Process 2, and dry etching is used to remove the excess material, leaving the channel region in the array substrate. The gate insulating layer is used to isolate the gate from the semiconductor layer to form a capacitive structure. The semiconductor layer is used to form the conductive channel of the array substrate to control the carrier migration. The N+ layer can reduce the contact resistance between the source / drain electrode and the semiconductor.

[0100] In Process 3, the source / drain electrodes, data lines, and channels are fabricated.

[0101] Physical vapor deposition coating is adopted to deposit a metal layer. Lithography and wet etching are used to pattern the source / drain electrodes and data line patterns using the process, and the metal layer is wet-etched. N+ etching is carried out to dry-etch the N+ layer in the channel region to expose the intrinsic a-Si, forming a conductive channel. The source / drain electrodes are used to connect the data lines and input / output signals to the pixel electrodes. The data lines are used to transmit grayscale voltage signals. The channel can ensure the TFT switching characteristics (high on-state current, low off-state leakage) through N+ etching.

[0102] In Process 4, the protective insulating layer and vias are fabricated.

[0103] Chemical vapor deposition is used to deposit the protective insulating layer. Lithography and dry etching are used to define the via positions through Process 4, and the insulating layer is etched to the surface of the drain electrode to form a connection channel for the pixel electrode. The protective insulating layer is used to prevent the TFT circuit from being affected by moisture, corrosion, and mechanical damage. The via provides an electrical connection path for the pixel electrode.

[0104] In Process 5, the pixel electrode is formed.

[0105] Physical vapor deposition coating is adopted to sputter an indium tin oxide transparent conductive layer. Lithography and wet etching are used to pattern the indium tin oxide transparent conductive layer using Process 5 to form the pixel electrode (comb-shaped electrode in IPS). The pixel electrode and the common electrode form a horizontal electric field or a vertical electric field to drive the liquid crystal molecules to deflect.

[0106] In Process 6, the common electrode is fabricated.

[0107] Physical vapor deposition coating is adopted to sputter an indium tin oxide transparent conductive layer. Lithography and etching are used to define the common electrode pattern through Process 6, which is designed to be staggered with the pixel electrode (IPS) or cover the entire area (VA). The common electrode provides a reference voltage and cooperates with the pixel electrode to control the arrangement of liquid crystal molecules.

[0108] The embodiment of the present application also provides a display device (not shown in the figure), including the liquid crystal panel described in the first aspect or the liquid crystal panel prepared by the preparation method described in the second aspect.

[0109] Due to the above-mentioned liquid crystal panel, it naturally has all the beneficial effects described above. In this way, the contrast of the display device can be improved. The improvement of the contrast has greatly improved the clarity, detail performance, and gray level of the picture, bringing a better visual experience to users.

[0110] In the above embodiments, the descriptions of the respective embodiments have their own emphases. For parts not detailed or recorded in a certain embodiment, reference may be made to the relevant descriptions of other embodiments.

[0111] The above-described embodiments are only used to illustrate the technical solutions of the embodiments of the present application, and are not intended to limit them; although the embodiments of the present application have been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements on some of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application, and should all be included in the protection scope of the embodiments of the present application.

Claims

1. A liquid crystal panel, characterized in that: It includes a liquid crystal layer and an array substrate and a color film substrate arranged on both sides of the liquid crystal layer; The array substrate includes a first color resist layer, the color filter substrate includes a second color resist layer, the arrangement of the color resist blocks in the first color resist layer is the same as the arrangement of the color resist blocks in the second color resist layer, and the positions of the color resist blocks in the first color resist layer correspond to the positions of the color resist blocks in the second color resist layer; Wherein, the first color resist layer and the second color resist layer cooperate with each other to reduce scattered light.

2. The liquid crystal panel according to claim 1, wherein: The first color resist layer includes a plurality of color resist blocks arranged in an array, wherein the colors of the plurality of color resist blocks include three colors: red, green and blue; The color block of any one of the above three colors is used to filter the light of the other two colors and allow the light of the same color as the color of the color block to pass through.

3. The liquid crystal panel according to claim 2, wherein: The color of the color blocks located in each column of the array is the same; And / or, the colors of the color-resist blocks in adjacent rows in the same column of the array are all different.

4. The liquid crystal panel according to claim 1, wherein: The array substrate further includes: a first substrate; A common electrode layer, located on one side of the first substrate; a pixel electrode layer, which is disposed on a side of the first color resist layer away from the first substrate, and the pixel electrode layers are arranged at intervals, and the first color resist layer is located between the common electrode layer and the pixel electrode layer; and The first planar layer is disposed on a side of the first color resist layer and the pixel electrode layer away from the first substrate.

5. The liquid crystal panel according to claim 1, wherein: The color film substrate comprises: a second substrate; A black matrix, disposed on a side of the second substrate close to the second color resist layer; The second planar layer is disposed on a side of the second color resist layer away from the second substrate.

6. The liquid crystal panel according to any one of claims 1 to 5, characterized in that: An alignment layer is provided on one side of the liquid crystal layer close to the color filter substrate, and the alignment layer is used to control the initial arrangement direction of the liquid crystal molecules in the liquid crystal layer; And / or, an alignment protection layer is provided on a side of the liquid crystal layer close to the array substrate to prevent liquid crystal material in the liquid crystal layer from entering the array substrate.

7. A method for preparing a liquid crystal panel, characterized in that: include: preparing an array substrate and a color film substrate; Filling liquid crystal material on the array substrate to form a liquid crystal layer; The color filter substrate and the array substrate are arranged in a cell-mounted manner to form a liquid crystal panel.

8. The preparation method according to claim 7, characterized in that: The preparation of the array substrate comprises: providing a first substrate; On one side of the first substrate, a gate layer, a gate insulating layer, an oxide semiconductor layer, a source / drain electrode layer and a first passivation inorganic layer are sequentially prepared; A common electrode layer is formed on a side of the first passivation inorganic layer away from the first substrate, and a first color resist layer is formed on a side of the common electrode layer away from the first substrate.

9. The preparation method according to claim 8, characterized in that: The step of preparing a first color resist layer on one side of the common electrode layer comprises: the first color resist layer comprises a plurality of color resist blocks arranged in an array, wherein the colors of the plurality of color resist blocks comprise three colors: red, green and blue; The position of the red color resist block corresponds to the red color resist block in the second color resist layer, the position of the green color resist block corresponds to the green color resist block in the second color resist layer, and the position of the blue color resist block corresponds to the blue color resist block in the second color resist layer.

10. A display device, characterized in that: A liquid crystal panel comprising the liquid crystal panel according to any one of claims 1 to 6 or a liquid crystal panel made by the preparation method according to any one of claims 7 to 9.

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