Platemaking method for combined two-piece cap with flat effect

Abstract

The invention discloses a platemaking method of a combined two-piece cap with a flat effect. The platemaking method comprises the following steps: determining a point where the bottom of the cap is matched with a neckline and determining a neck-shoulder co-location point; calculating the lodging amount F-G of the cap, and measuring the height of the cap C-E; determining vertical points O and P according to cap width; making a point S about 3cm away from the front neckline, and connecting the point S to make a cap opening; extracting the outer contour lines of the cap back piece and the cap front piece and the round cutting piece. The method is suitable for large-scale industrial production, and the production cost can be reduced; the two-piece type hat is attractive and functional, is suitable for daily wearing and outdoor activities, and is widely applied to hat ornaments in leisure and sports styles; and the structure drawing method is popular and easy to understand, easy to operate and convenient for popularization and promotion of the technology.

Description

Technical Field

[0001] The invention relates to the field of clothing design, in particular to a method for making a plate for a flat-effect fitted two-piece cap. Background Art

[0002] The two-piece hat is a classic hat structure design in the field of clothing. It is made of two pieces of cloth, usually including a front piece and a back piece, and presents a flat effect when squared. This design is widely used in various clothing, such as hoodies, sweaters, catwalk clothing, etc. However, the existing structures are all three-piece structures. The traditional three-piece hat has an additional piece of cloth, the splicing process is more complicated, and more sewing processes are required. The production cost is relatively high, and it is impossible to form a three-dimensional shape that conforms to the contour of the head when worn, and better fit the human head. It can also present a flat effect when laid flat. Therefore, there is an urgent need for a plate making method for a fitted two-piece hat that takes into account both beauty and functionality. Summary of the invention

[0003] Purpose of the invention: The purpose of the present invention is to provide a method for making a pattern of a two-piece cap that takes into account both aesthetics, functionality and flatness.

[0004] Technical solution: The method for making a plate of a flat-effect combined two-piece cap of the present invention comprises the following steps:

[0005] (1) Determine the point where the hat bottom meets the collar and the neck and shoulder points;

[0006] (2) Calculate the hat's lodging amount FG and measure the CE hat height;

[0007] (3) Make the cap width to determine the vertical points O and P;

[0008] (4) Make point S about 3 cm from the front collar and connect SI′ to make the cap opening;

[0009] (5) Extract the back piece and the front piece of the hat and smooth the outer contour of the pieces.

[0010] Furthermore, the step (1) includes extending the horizontal line of the front center and the neck-shoulder point, drawing a perpendicular line from the halfway point to the front collar arc to intersect at point B, drawing a tangent at point B so that BC=AB, drawing CD=CB from point C to make the back collar arc length, and rounding the arc of the hat bottom, and point C′ is the neck-shoulder point.

[0011] Furthermore, the step (2) includes making a cap height of 36 to 37 cm from point C′, making a vertical line DF=15 cm from D upward, and a vertical line FG=3 to 4 cm from point F, where FG is the lodging amount, connecting DF and extending the horizontal line of point E to point H.

[0012] Furthermore, the step (3) includes making the cap width 28 to 29 cm, dividing the line segment HI into two equal parts, taking HK=HJ, connecting KJ, making HL perpendicular to KJ, dividing HL into three equal parts, extending the second dividing point M by 5 to 6 cm to point N, and drawing perpendicular lines from point N to HJ and HK respectively, with the perpendicular points being O and P respectively.

[0013] Furthermore, the step (4) includes moving point I to the right and downward by 1 cm to obtain point I', moving point O to the right by 1 cm to obtain point, moving point O' upward by 1 cm to obtain point P', rounding O'I', re-rounding the arc of the hat bottom, making O'Q perpendicular to the arc of the hat bottom, making DR=5cm, connecting RP', so that RP'=O'Q, making point S about 3cm away from the front collar, and connecting SI' to form the hat brim.

[0014] Furthermore, the step (5) includes extracting the back piece and the front piece of the cap, rounding the outer contour lines of the cut pieces, and preparing a clean sample.

[0015] Furthermore, in step (5), a 1 cm seam allowance is placed on all sides of the prepared clean sample to obtain a rough sample.

[0016] Beneficial effects: Compared with the prior art, the present invention has the following significant advantages: the two-piece hat of the present invention is made of two pieces of cloth spliced ​​together, has a simple structure, and relatively few cutting and sewing processes, which makes its production process more efficient, suitable for large-scale industrial production, and helps to reduce production costs; and the two-piece hat is both aesthetically pleasing and functional, suitable for daily wear and outdoor activities, and is widely used in leisure and sports style hats; and the structural drawing method of the present application is easy to understand and easy to operate, which is convenient for the popularization and promotion of technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a flow chart of the present invention;

[0018] Figure 2 To determine the geometric diagram of the neck and shoulder joints;

[0019] Figure 3 A geometric diagram to determine the amount of hat lodging;

[0020] Figure 4 The geometric diagram for determining the vertical point;

[0021] Figure 5 It is the net sample drawing of the back piece and the front piece of the hat;

[0022] Figure 6 This is the finished hat picture. DETAILED DESCRIPTION

[0023] The technical solution of the present invention is further described below in conjunction with the accompanying drawings.

[0024] likeFigure 1 As shown, the present invention comprises the following steps:

[0025] (1) Determine the point where the hat bottom meets the collar and the neck and shoulder points;

[0026] like Figure 2 As shown, extend the horizontal line of the front center and the neck-shoulder point, draw a perpendicular line from the halfway point to the front collar arc to intersect at point B, draw a tangent at point B so that BC=AB, and draw CD=CB from point C to make the arc length of the back collar equal to the arc of the hat base. Point C′ is the same point as the neck and shoulder.

[0027] (2) Calculate the hat's lodging amount FG and measure the CE hat height;

[0028] like Figure 3 As shown, draw a cap height of 36 to 37 cm from point C′, draw a vertical line DF = 15 cm from D upwards, and draw a vertical line FG = 3 to 4 cm from point F. FG is the amount of lodging. Connect DF and extend it to the horizontal line of point E compared to point H.

[0029] (3) Make the cap width to determine the vertical points O and P;

[0030] like Figure 4 As shown, make the cap width 28-29cm, divide the line segment HI into two equal parts, take HK=HJ, connect KJ, make HL perpendicular to KJ, divide HL into three equal parts, extend the second dividing point M by 5-6cm to point N, draw perpendicular lines from point N to HJ and HK, and the perpendicular points are O and P respectively.

[0031] (4) Make point S about 3 cm from the front collar and connect SI′ to make the cap opening;

[0032] Move point I 1cm to the right and downward to get point I′, move point O 1cm to the right to get point, move point O′ up 1cm to get point P′, round out O′I′, re-round the arc of the hat base, make O′Q perpendicular to the arc of the hat base, make DR=5cm, connect RP′, make RP'=O′Q, make point S about 3cm away from the front collar, and connect SI′ to get the hat brim.

[0033] (5) Extract the back piece and the front piece of the hat and smooth the outer contour of the pieces.

[0034] like Figure 5 As shown, extract the back and front pieces of the hat, and cut the outer contour of the pieces to make a clean sample. Leave 1cm seam allowance on all sides to make a rough sample.

[0035] like Figure 6 As shown, (a) is a rear view of the finished hat, (b) is a side view, and (c) is a flat view.

[0036] The present invention determines the arc shapes of the back panel and the front panel of the cap. The Q point and the R point are approximately in the same position, ensuring that the difference between the arc of the cap bottom and the collar circumference of the garment body is within 0.6 cm, so that the finished cap shape presents a flat effect when squared. The cap shape made by the drafting method of the present invention has no bill and has strong functionality.

Claims

1. A method for making a pattern of a two-piece fitted hat with a flat effect, characterized in that, The steps include: (1) Determine the point where the hat bottom meets the collar and the neck and shoulder points; (2) Calculate the hat's lodging amount FG and measure the CE hat height; (3) Make the cap width to determine the vertical points O and P; (4) Make point S about 3 cm from the front collar and connect SI′ to make the cap opening; (5) Extract the back piece and the front piece of the hat and smooth the outer contour of the pieces.

2. The method for making a flat-effect fitted two-piece hat pattern according to claim 1, characterized in that, The step (1) comprises extending the horizontal line of the front center and the neck-shoulder point to intersect, drawing a perpendicular line from the halfway point to the front collar arc to intersect at point B, drawing a tangent line at point B so that BC=AB, drawing CD=CB from point C to make the back collar arc length round and straighten the hat bottom arc, and point C′ is the neck-shoulder point.

3. The method for making a pattern of a two-piece fitted cap with a flat effect according to claim 1, characterized in that, The step (2) includes making a cap height of 36 to 37 cm from point C′, making a vertical line DF=15 cm from D upward, making a vertical line FG=3N4 cm from point F, where FG is the lodging amount, connecting DF and extending the horizontal line of point E to point H.

4. The method for making a pattern of a two-piece fitted cap with a flat effect according to claim 1, characterized in that, The step (3) comprises making the cap width 28-29 cm, dividing the line segment HI into two equal parts, taking HK=HJ, connecting KJ, making HL perpendicular to KJ, dividing HL into three equal parts, extending the second dividing point M by 5-6 cm to point N, and drawing perpendicular lines from point N to HJ and HK, respectively, with the perpendicular points being O and P respectively.

5. The method for making a flat-effect two-piece cap pattern according to claim 1, characterized in that The step (4) comprises moving point I rightward and downward by 1 cm to obtain point I′, moving point O rightward by 1 cm to obtain point P′, rounding point O′I′, re-rounding the arc of the hat bottom, making O′Q perpendicular to the arc of the hat bottom, making DR=5 cm, connecting RP′ so that RP′=O′Q, making point S about 3 cm away from the front collar, and connecting SI′ to form the hat brim.

6. The method for making a pattern of a two-piece fitted cap with a flat effect according to claim 1, characterized in that, The step (5) includes extracting the back piece and the front piece of the cap, rounding the outer contour lines of the cut pieces, and making a clean sample.

7. The method for making a pattern of a two-piece fitted cap with a flat effect according to claim 6, characterized in that, In the step (5), a 1 cm seam allowance is placed around the prepared clean sample to obtain a rough sample.

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