Semiconductor polishing process chemical cleaning solution treatment recycling apparatus

Abstract

The application relates to the field of semiconductor technology and discloses a semiconductor grinding process chemical cleaning solution treatment circulating recovery equipment, which comprises a treatment cylinder, a partition plate fixedly connected in the inside of the treatment cylinder, a control processor and a gas pump fixedly installed on the upper surface of the treatment cylinder, an air inlet pipe fixedly connected with the air inlet of the gas pump and a gas supply pipe fixedly connected with the air outlet of the gas pump. The temperature of the nearby wastewater is first increased by the heater, the volume is expanded, the density is reduced, the wastewater becomes lighter than the cold wastewater above and moves upward, the cold wastewater above is pushed to the left side of the treatment cylinder, the wastewater at the bottom is extruded by the wastewater at the left side and contacts the heater, so that the circulating flow of the wastewater is formed, the added flocculating agent is driven to flow, is fully mixed when passing through multiple fan-shaped plates, and the problems that the mixed volume is too large and the water content is high caused by the uneven distribution of the flocculating agent added into the wastewater are solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor technology, and in particular to a semiconductor polishing process chemical cleaning solution treatment and recycling equipment. BACKGROUND

[0002] In recent years, the semiconductor industry has shown great market potential and development prospects. In the process of converting semiconductor wafers into final products with various functions, the wafers must be polished and cut according to product specifications and size requirements. In this process, in order to ensure the cleanliness of the wafer, water is used for cleaning, thereby generating a large amount of wastewater. This polishing and cutting wastewater mainly contains suspended particulate matter and cleaning agent components, which are characterized by high suspended matter concentration, fine particles that are difficult to precipitate, turbid water, and relatively complex treatment due to poor biochemical properties and the fact that it is usually weakly alkaline.

[0003] The current semiconductor polishing process chemical cleaning solution treatment and recycling device, when adding flocculants to the treatment cylinder, the flocculants fall below the feed position, resulting in a mixture of solid particles near the feed position and flocculants that is too large, and the liquid in the mixture is difficult to discharge, which makes the moisture content of the mixture high, resulting in a decrease in the amount of water recycled. Due to the large amount of liquid, the flocculants are difficult to mix uniformly with the liquid after entering the treatment cylinder, and if a powerful stirring device is provided, the mixture of solid particles and flocculants will be dispersed, affecting the flocculation effect. Therefore, how to effectively solve the uniform distribution of flocculants and improve the recycling rate of liquid is a key problem to be solved at present. SUMMARY

[0004] The present application provides a semiconductor polishing process chemical cleaning solution treatment and recycling equipment, which has the advantages of uniform distribution of flocculants and improvement of liquid recycling rate, to solve the problem of flocculants falling at the addition position, resulting in a mixture of solid particles near the addition position and flocculants that is too large.

[0005] To achieve the above-mentioned purpose, the following technical scheme is adopted: a semiconductor polishing process chemical cleaning solution treatment and recycling equipment, comprising a treatment cylinder, a partition plate is fixedly connected inside the treatment cylinder, a control processor and a gas pump are fixedly installed on the upper surface of the treatment cylinder, an air inlet of the gas pump is fixedly connected with an air inlet pipe, an air outlet of the gas pump is fixedly connected with a gas supply pipe, a cylinder cover is movably installed on the top of the treatment cylinder, and a heater is arranged on the right side of the partition plate;

[0006] The telescopic rod is rotatably installed with a rotating plate at the telescopic end, the front end bottom surface of the rotating plate is fixedly connected with a push rod, and the bottom end of the push rod is movably installed with a sealing sleeve;

[0007] The upper surface of the material distribution mechanism is provided with a feeding pipe, and the top end of the feeding pipe is communicated with a material cylinder.

[0008] The mixing mechanism is arranged on the left side of the inside of the treatment cylinder, and the left side of the mixing mechanism is provided with a flow rate monitor.

[0009] Preferably, the material distribution mechanism includes a column, the inside of the column is provided with a material distribution cavity, the bottom of the material distribution cavity is communicated with a plurality of short pipes, the inside of the short pipe is fixedly connected with a fixed ring, the inside of the fixed ring is provided with a plurality of through holes, the upper and lower surfaces of the fixed ring are fixedly connected with springs, and the middle part of the fixed ring is slidably connected with an I-shaped rod.

[0010] Preferably, the mixing mechanism includes a shaft body, the middle part of the shaft body is provided with an air channel, the curved surface of the shaft body is fixedly connected with a plurality of fan-shaped plates, the inside of the fan-shaped plate is provided with a fan-shaped cavity, the lower curved surface of the fan-shaped plate is provided with a plurality of exhaust holes, the edges of the two lowest fan-shaped plates are fixedly connected with a connecting ring, and the lower part of the connecting ring is provided with a limiting ring.

[0011] Preferably, the heater is fixedly connected with the inner wall of the treatment cylinder, the telescopic rod is fixedly connected with the upper surface of the treatment cylinder, the material cylinder is fixedly connected with the upper surface of the treatment cylinder, the flow rate monitor is fixedly connected with the inner wall of the treatment cylinder, and the feeding pipe is fixedly connected with the treatment cylinder.

[0012] Preferably, the upper spring is fixedly connected with the top end of the I-shaped rod, the lower spring is fixedly connected with the bottom end of the I-shaped rod, and the sealing ring is fixedly connected with the inner wall of the short pipe.

[0013] Preferably, the fan-shaped cavity is communicated with the air channel, and the limiting ring, the two middle fan-shaped plates and the upper and lower fan-shaped plates are arranged vertically.

[0014] Preferably, the distance between the partition plates and the top and bottom of the treatment cylinder is equal, and the column is fixedly connected with the air supply pipe.

[0015] Preferably, the limiting ring is fixedly connected with the treatment cylinder and the partition plate, the fixed ring is in contact with the treatment cylinder and the partition plate, and the air passage is in communication with the air supply pipe; the above structure can supply air to the inside of the air supply pipe during work, the gas enters the air passage, then enters the fan-shaped cavity and is discharged from the exhaust hole, the discharged gas pushes the wastewater to flow downward, further promoting the flow of the wastewater in the treatment cylinder, and the bubbles discharged from the exhaust hole can help disperse the flocculating agent.

[0016] Preferably, the upper portion of the fixed ring is provided with an inner chamfer, and the sealing sleeve is matched with the barrel; the above structure can prevent the precipitate from falling above the fixed ring during work, and make the sealing between the sealing sleeve and the barrel good.

[0017] Preferably, the lower surface of the column body is flush with the upper surface of the partition plate, and the heater is located below the middle of the partition plate; the above structure can heat the cleaning wastewater in the treatment cylinder during work, the temperature of the wastewater near the heater is first increased, the volume is expanded, the density is reduced, and the wastewater becomes lighter than the cold wastewater above, so as to move upward, so that a sufficient amount of cold water can enter the left side of the treatment cylinder.

[0018] The beneficial effects of the present application are as follows:

[0019] 1、The present application heats the cleaning wastewater in the treatment cylinder through the work of the heater, the temperature of the wastewater near the heater is first increased, the volume is expanded, the density is reduced, and the wastewater becomes lighter than the cold wastewater above, so as to move upward, which pushes the cold wastewater above to the left side of the treatment cylinder, and the wastewater at the bottom is extruded by the wastewater at the left side, so as to be in contact with the heater, thereby forming a circulating flow of the wastewater, so as to drive the added flocculating agent to flow, which is fully mixed when passing through multiple fan-shaped plates, and meanwhile, the mixture formed by the solid particles and the flocculating agent is prevented from being dispersed, thereby solving the problems of uneven distribution of the flocculating agent added into the wastewater and the large volume and high water content of the mixture caused by the uneven distribution.

[0020] 2、The present application monitors the flow rate of wastewater through the flow rate monitor, when the wastewater flows, the signal is transmitted to the control processor, at the same time, the flow rate monitor monitors the flow rate of wastewater and transmits the signal to the control processor, so as to control the shortening amount of the telescopic rod per unit time according to the flow rate of wastewater, the telescopic rod shortening drives the rotating plate, the push rod and the sealing sleeve to move downward, pushes the flocculating agent into the discharge pipe and the distribution cavity, and finally adds the flocculating agent into the wastewater, so that the flocculating agent is mixed more uniformly. At the same time, after the addition of the flocculating agent is completed, the inside of the barrel will suck in the wastewater and then discharge, so as to discharge the residual flocculating agent into the wastewater.

[0021] 3、The present application supplies air to the inside of the air supply pipe through the work of the air pump, the gas enters the airway, then enters the fan-shaped cavity and is discharged from the exhaust hole, the discharged gas pushes the wastewater to flow downward, further promotes the flow of wastewater in the treatment cylinder, and the bubbles discharged from the exhaust hole can help to disperse the flocculating agent, so that it is more uniformly distributed in the entire wastewater, thereby promoting the effective collision and aggregation between particles in the wastewater to form larger and more stable flocculating bodies. BRIEF DESCRIPTION OF DRAWINGS

[0022] The accompanying drawings, which constitute a part of this specification, illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure in a clear and concise manner.

[0023] The present disclosure can be understood more clearly with reference to the following detailed description in conjunction with the accompanying drawings, in which:

[0024] Figure 1 is a schematic view of the appearance of the present application;

[0025] Figure 2 is a semi-partial schematic view of the treatment cylinder of the present application;

[0026] Figure 3 is a semi-partial schematic view of the barrel of the present application;

[0027] Figure 4 is Figure 3 is an enlarged schematic view of position A in the above figure;

[0028] Figure 5 is a semi-partial schematic view of the column body of the present application;

[0029] Figure 6 is Figure 5 is an enlarged schematic view of position B in the above figure;

[0030] Figure 7 is a semi-partial schematic view of the shaft body of the present application.

[0031] Wherein: 1, processing cylinder; 2, partition; 3, control processor; 4, air pump; 5, air inlet pipe; 6, air supply pipe; 7, telescopic rod; 8, rotating plate; 9, push rod; 10, sealing sleeve; 11, distributing mechanism; 111, cylinder; 112, distributing cavity; 113, short pipe; 114, fixed ring; 115, through hole; 116, spring; 117, I-beam; 118, sealing ring; 12, blanking pipe; 13, barrel; 14, mixing mechanism; 141, shaft; 142, airway; 143, sector plate; 144, sector cavity; 145, exhaust hole; 146, connecting ring; 147, limiting ring; 15, flow rate monitor; 16, cylinder cover; 17, heater. DETAILED DESCRIPTION

[0032] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of the present application.

[0033] Please refer to Figures 1-7 , discloses a semiconductor polishing process chemical cleaning solution treatment recycling equipment, including processing cylinder 1, the inside of processing cylinder 1 is fixedly connected with partition 2, the upper surface of processing cylinder 1 is fixedly installed with control processor 3, air pump 4, the air inlet of air pump 4 is fixedly connected with air inlet pipe 5, the air outlet of air pump 4 is fixedly connected with air supply pipe 6, the top of processing cylinder 1 is movably installed with cylinder cover 16, the right side of partition 2 is provided with heater 17;

[0034] Telescopic rod 7, the telescopic end of telescopic rod 7 is rotatably installed with rotating plate 8, the front end bottom surface of rotating plate 8 is fixedly connected with push rod 9, the bottom end of push rod 9 is movably installed with sealing sleeve 10;

[0035] Distributing mechanism 11, distributing mechanism 11 is provided with blanking pipe 12 on the upper surface, the top end of blanking pipe 12 is communicated with barrel 13;

[0036] Mixing mechanism 14, mixing mechanism 14 is arranged inside the left side of processing cylinder 1, flow rate monitor 15 is arranged on the left side of mixing mechanism 14.

[0037] Wherein, distributing mechanism 11 includes cylinder 111, distributing cavity 112 is formed in the inside of cylinder 111, a plurality of short pipes 113 are communicated with the bottom of distributing cavity 112, fixed ring 114 is fixedly connected in the inside of short pipe 113, a plurality of through holes 115 are formed in the inside of fixed ring 114, springs 116 are fixedly connected on the upper and lower surfaces of fixed ring 114, I-beam 117 is slidably connected with the middle part of fixed ring 114, sealing rings 118 are arranged on the top end and the bottom end of I-beam 117.

[0038] The role is, through the flow rate monitor 15 will monitor the flow rate of wastewater, when the wastewater flow, will signal to the control processor 3, while the flow rate monitor 15 monitors the flow rate of wastewater, and signal to the control processor 3, so as to control the telescopic rod 7 unit time according to the flow rate of wastewater shortening amount, telescopic rod 7 shortening will drive the rotating plate 8, push rod 9 and sealing sleeve 10 downward movement, push flocculant into the discharge pipe 12, distribution chamber 112, ultimately into the wastewater, further make flocculant mixed more evenly. At the same time after the flocculant is added, the inside of the barrel 13 will suck in wastewater and discharge, so as to discharge the residual flocculant into the wastewater.

[0039] Among them, the mixing mechanism 14 includes shaft body 141, the middle part of the shaft body 141 is provided with air channel 142, the curved surface of the shaft body 141 is fixedly connected with a plurality of sector plates 143, the inside of the sector plate 143 is provided with sector cavity 144, the lower curved surface of the sector plate 143 is provided with a plurality of exhaust holes 145, the edges of the two lowermost sector plates 143 are fixedly connected with connecting ring 146, the lower part of the connecting ring 146 is provided with limiting ring 147.

[0040] Among them, the heater 17 is fixedly connected with the inner wall of the processing cylinder 1, the telescopic rod 7 is fixedly connected with the upper surface of the processing cylinder 1, the barrel 13 is fixedly connected with the upper surface of the processing cylinder 1, the flow rate monitor 15 is fixedly connected with the inner wall of the processing cylinder 1, the discharge pipe 12 is fixedly connected with the processing cylinder 1;

[0041] The role is, through the heater 17 work, the cleaning liquid wastewater in the processing cylinder 1 is heated, the temperature of the wastewater near the heater 17 will rise first, the volume expands, the density decreases, becomes lighter than the cold wastewater above, so as to move upward, will push the cold wastewater above to the left side of the processing cylinder 1, while the wastewater at the bottom is extruded by the left side of the wastewater, so as to contact with the heater 17, thereby forming the circulating flow of the wastewater, so as to drive the added flocculant to follow the flow, when passing through a plurality of sector plates 143, the mixture formed by the solid particles and the flocculant will be fully mixed, at the same time, the problem that the mixture volume is too large and the water content is high caused by the uneven distribution of the flocculant added into the wastewater is solved.

[0042] Among them, the upper spring 116 is fixedly connected with the top end of the I-shaped rod 117, the lower spring 116 is fixedly connected with the bottom end of the I-shaped rod 117, the sealing ring 118 is fixedly connected with the inner wall of the short pipe 113, the sector cavity 144 is communicated with the air channel 142, the limiting ring 147, the two sector plates 143 in the middle are vertically arranged with the sector plates 143 above and below, the distance between the partition plate 2 and the top and bottom of the processing cylinder 1 is equal, the cylinder 111 is fixedly connected with the air supply pipe 6;

[0043] The role is, through the air pump 4 work, to the inside of the air supply pipe 6 supply air, gas will enter the airway 142, then into the fan-shaped cavity 144 and from the exhaust hole 145, the exhaust gas will push the wastewater to flow down, further promote the wastewater flow in the treatment cylinder 1 inside, and the exhaust hole 145 exhaust bubble can help to disperse flocculant, so that it is more evenly distributed in the entire wastewater, in turn, to promote the effective collision and aggregation between particles in wastewater, forming larger, more stable flocculation body.

[0044] Wherein, the limiting ring 147 and the treatment cylinder 1, the baffle 2 are fixedly connected, the fixed ring 114 and the treatment cylinder 1, the baffle 2 are in contact, the airway 142 and the air supply pipe 6 are in communication, the upper portion of the fixed ring 114 is provided with inner chamfer, the sealing sleeve 10 and the barrel 13 are adapted;

[0045] The role is to prevent the sediment from falling on the upper side of the fixed ring 114, so that the sealing property between the sealing sleeve 10 and the barrel 13 is good.

[0046] Wherein, the lower surface of the column body 111 is flush with the upper surface of the baffle 2, the heater 17 is located in the lower middle of the baffle 2;

[0047] The role is that the heater 17 works, the cleaning liquid wastewater in the treatment cylinder 1 is heated, the temperature of the wastewater near the heater 17 will first increase, the volume expands, the density decreases, becomes lighter than the cold wastewater above, so as to move upwards, so that it can move enough amount of cold water to enter the left side of the treatment cylinder 1.

[0048] Working principle:

[0049] Open the cylinder cover 16, add an appropriate amount of cleaning liquid wastewater to the inside of the treatment cylinder 1, so that the liquid level of the cleaning liquid wastewater is above the upper surface of the baffle 2, the telescopic rod 7 is in the longest state, at this time the sealing sleeve 10 will be separated from the barrel 13, rotate the rotating plate 8, drive the push rod 9 and the sealing sleeve 10 on one side, according to the amount of cleaning liquid wastewater added, add the required solid flocculant or liquid flocculant to the inside of the barrel 13, rotate the rotating plate 8 to make the push rod 9 and the sealing sleeve 10 located directly above the barrel 13;

[0050] When the heater 17 is working, the cleaning liquid waste water inside the processing cylinder 1 is heated, the temperature of the waste water near the heater 17 will first increase, the volume will expand, the density will decrease, and it will become lighter than the cold waste water above, so it will move upwards and push the cold waste water above to the left side of the processing cylinder 1, and the waste water at the bottom will be squeezed by the waste water on the left side, so that it will come into contact with the heater 17, thereby forming a circulating flow of waste water, at the same time, the air pump 4 is working, supplying air to the inside of the air supply pipe 6, the gas will enter the air channel 142, then enter the fan-shaped cavity 144 and be discharged from the exhaust hole 145, the discharged gas will push the waste water to flow downward, further promoting the flow of waste water inside the processing cylinder 1, and the flow rate monitor 15 will monitor the flow rate of the waste water, when the waste water flows, it will send a signal to the control processor 3, and the control processor 3 will control the telescopic rod 7 to shorten, the faster the flow rate of the waste water, the more the telescopic rod 7 will shorten per unit time, and vice versa.

[0051] The shortening of the telescopic rod 7 will drive the rotating plate 8, the push rod 9 and the sealing sleeve 10 to move downward, after the sealing sleeve 10 enters the inside of the barrel 13, it will push the flocculating agent into the discharge pipe 12, the distribution cavity 112, and then into the short pipe 113, when the flocculating agent comes into contact with the upper surface of the I-shaped rod 117, it will push the I-shaped rod 117 to move downward, thereby opening the distribution cavity 112 to the inside of the processing cylinder 1, so as to discharge the flocculating agent into the waste water, the flocculating agent entering the waste water will flow with the waste water, when passing through multiple fan-shaped plates 143, each fan-shaped plate 143 will divide the waste water and the flocculating agent into smaller parts and promote the contact between them, and as the waste water and the flocculating agent move along the length direction of the fan-shaped plate 143, this division and recombination process is repeated continuously, thereby achieving efficient mixing effect; in the process, the existence of gas bubbles can help to disperse the flocculating agent, so that it is more evenly distributed in the entire waste water, thereby promoting effective collision and aggregation between particles in the waste water to form larger and more stable flocculating bodies;

[0052] When the flocculating agent inside the barrel 13 is completely discharged, the telescopic rod 7 will be elongated, the I-shaped rod 117 will move upward, the waste water will be opened to the distribution cavity 112, so as to suck the waste water into the inside of the distribution cavity 112, the discharge pipe 12 and the barrel 13, and then discharge the waste water in the distribution cavity 112, the discharge pipe 12 and the barrel 13, thereby completing the accurate addition of the flocculating agent, then the heater 17 and the air pump 4 stop working, waiting for the particles in the waste water to precipitate to the bottom of the processing cylinder 1, thereby completing the treatment of the waste water.

[0053] It should be noted that the above examples are only used to illustrate the technical solutions of the present application but not limit the present application. Although the present application is described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present application can be modified or equivalently replaced, without departing from the spirit and scope of the technical solutions of the present application, which should be covered in the scope of the claims of the present application.

Claims

1. A device for treating and recycling chemical cleaning solutions in semiconductor grinding processes, characterized in that, include: A processing cylinder (1) is provided with a partition (2) fixedly connected inside the processing cylinder (1). A control processor (3) and an air pump (4) are fixedly installed on the upper surface of the processing cylinder (1). An air inlet pipe (5) is fixedly connected to the air inlet of the air pump (4). An air supply pipe (6) is fixedly connected to the air outlet of the air pump (4). A cylinder cover (16) is movably installed on the top of the processing cylinder (1). A heater (17) is provided on the right side of the partition (2). Telescopic rod (7), the telescopic end of which is rotatably mounted with a rotating plate (8), the bottom surface of the front end of the rotating plate (8) is fixedly connected with a push rod (9), and the bottom end of the push rod (9) is movably mounted with a sealing sleeve (10). The material distribution mechanism (11) has a feeding pipe (12) on its upper surface, and the top end of the feeding pipe (12) is connected to a material cylinder (13). A mixing mechanism (14) is located on the left side inside the processing cylinder (1), and a flow rate monitor (15) is located on the left side of the mixing mechanism (14). The material distribution mechanism (11) includes a column (111), and a material distribution chamber (112) is provided inside the column (111). The bottom of the material distribution chamber (112) is connected to a plurality of short tubes (113). A fixing ring (114) is fixedly connected inside the short tubes (113). A plurality of through holes (115) are provided inside the fixing ring (114). Springs (116) are fixedly connected to the upper and lower surfaces of the fixing ring (114). An I-shaped rod (117) is slidably connected to the middle of the fixing ring (114). A sealing ring (118) is provided at the top and bottom of the I-shaped rod (117). The mixing mechanism (14) includes a shaft (141), an air passage (142) is provided in the middle of the shaft (141), a plurality of fan-shaped plates (143) are fixedly connected to the curved surface of the shaft (141), a fan-shaped cavity (144) is provided inside the fan-shaped plate (143), a plurality of exhaust holes (145) are provided on the lower curved surface of the fan-shaped plate (143), and a connecting ring (146) is fixedly connected to the edges of the two lowest fan-shaped plates (143), and a limit ring (147) is provided below the connecting ring (146). The heater (17) is fixedly connected to the inner wall of the processing cylinder (1), the telescopic rod (7) is fixedly connected to the upper surface of the processing cylinder (1), the material cylinder (13) is fixedly connected to the upper surface of the processing cylinder (1), the flow rate monitor (15) is fixedly connected to the inner wall of the processing cylinder (1), and the feed pipe (12) is fixedly connected to the processing cylinder (1). The upper spring (116) is fixedly connected to the top end of the I-shaped rod (117), the lower spring (116) is fixedly connected to the bottom end of the I-shaped rod (117), and the sealing ring (118) is fixedly connected to the inner wall of the short tube (113). The sector cavity (144) is connected to the airway (142), and the limiting ring (147) has two sector plates (143) in the middle that are perpendicular to the upper and lower sector plates (143). The shortening of the telescopic rod (7) will cause the rotating plate (8), push rod (9) and sealing sleeve (10) to move downward. After the sealing sleeve (10) enters the inside of the material cylinder (13), it will push the flocculant into the feed pipe (12) and the distribution chamber (112), and then into the short pipe (113). When the flocculant comes into contact with the upper surface of the I-shaped rod (117), it will push the I-shaped rod (117) to move downward. The telescopic rod (7) will extend, causing the I-shaped rod (117) to move upward, so that the wastewater can be connected to the distribution chamber (112), thereby drawing the wastewater into the distribution chamber (112), the discharge pipe (12) and the inside of the material cylinder (13).

2. The semiconductor grinding process chemical cleaning solution treatment and recycling equipment according to claim 1, characterized in that, The partition (2) is spaced at the same distance from the top and bottom of the processing cylinder (1), and the column (111) is fixedly connected to the air supply pipe (6).

3. The semiconductor grinding process chemical cleaning solution treatment and recycling equipment according to claim 2, characterized in that, The limiting ring (147) is fixedly connected to the processing cylinder (1) and the partition (2), the fixing ring (114) is in contact with the processing cylinder (1) and the partition (2), and the air passage (142) is connected to the air supply pipe (6).

4. The semiconductor grinding process chemical cleaning solution treatment and recycling equipment according to claim 3, characterized in that, The upper part of the fixing ring (114) is provided with an inner chamfer, and the sealing sleeve (10) is adapted to the material cylinder (13).

5. The semiconductor grinding process chemical cleaning solution treatment and recycling equipment according to claim 4, characterized in that, The lower surface of the column (111) is flush with the upper surface of the partition (2), and the heater (17) is located in the middle and lower part of the partition (2).

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