Silicon wafer projection stepping type collimation large lens photoetching light path structure

Abstract

The invention relates to the technical field of photoetching equipment, and discloses a silicon wafer projection stepping type collimating large lens photoetching light path structure which comprises a UV-LED multi-lamp light source module, a compound eye front collimating lens group, a light equalizing module and a reflector assembly which are correspondingly arranged in sequence, a collimating large lens, a mask, a multiplying power mirror assembly and a photoetching workbench are sequentially arranged in the reflecting light direction of the reflecting mirror assembly, and a silicon wafer fixing structure for fixing a silicon wafer is arranged on the photoetching workbench. The device is simple in structure, high in precision, high in applicability, low in cost and capable of effectively meeting use of small enterprises or research and development institutions.

Description

Technical Field

[0001] The invention relates to the technical field of photolithography equipment, and in particular to a silicon wafer projection step-by-step collimating large lens photolithography optical path structure. Background Art

[0002] When performing photolithography on the surface of silicon wafers, the light source of different equipment is generally a mercury lamp, which has a short service life; photolithography equipment is large in size, complex in structure, and expensive, and is generally purchased by large new companies. When purchasing equipment for smaller companies or R&D institutions, a large amount of funds and a large area of ​​high-requirement site are required, which puts great pressure on costs and has a low frequency of use. Therefore, existing photolithography equipment is not very suitable for smaller companies or R&D institutions. Summary of the invention

[0003] The invention provides a silicon wafer projection step-by-step collimating large lens photolithography optical path structure, which solves the technical problems of existing photolithography equipment being large in size, complex in structure and high in cost.

[0004] The technical solution adopted by the present invention to solve the technical problem is: a silicon wafer projection step-by-step collimating large lens lithography optical path structure, including a UV-LED multi-lamp light source module, a compound eye front collimating lens group, a uniform light module and a reflector assembly arranged in sequence, the reflector assembly is sequentially provided with a collimating large lens, a mask, a magnification mirror assembly and a lithography workbench in the direction of reflected light, and the lithography workbench is provided with a silicon wafer fixing structure for fixing the silicon wafer. The structure is simple, high in precision, strong in applicability, and low in cost, and can effectively meet the needs of small enterprises or research and development institutions.

[0005] Furthermore, the compound eye collimating lens group includes at least two coaxial and co-directional compound eye collimating lenses, which effectively focus the light emitted by the UV-LED multi-lamp light source module into parallel light and propagate it to the light-homogenizing module with high precision.

[0006] Furthermore, the light averaging module includes a coaxially arranged micro-cylindrical mirror array and a condenser, and the micro-cylindrical mirror array is located near the collimating lens group in front of the compound eye. After passing through the light averaging module, the light becomes a uniform light spot with a divergent angle, and becomes the required uniform light field distribution.

[0007] Furthermore, the reflector assembly reflects the light passing through the light-homogenizing module vertically to the collimating large lens. The structure is simple, the angle is fixed and easy to set, the installation difficulty is reduced and the maintenance is convenient.

[0008] Furthermore, the photolithography workbench is a movable transparent photolithography workbench, and the structure can be adjusted according to actual conditions, making it more applicable.

[0009] Furthermore, the magnification lens assembly is a microscope assembly, which can significantly reduce costs.

[0010] Furthermore, a switching drive mechanism is provided on the UV-LED multi-light source module, a plurality of light source fixing structures driven by the switching drive mechanism are located on the switching drive mechanism, and a plurality of UV-LED light sources are respectively arranged on the plurality of light source fixing structures. The fixing positions of the plurality of UV-LED light sources can be interchanged, and the applicability is better.

[0011] Furthermore, a manual adjustment mechanism for driving the silicon wafer fixing structure to move towards the magnification lens assembly and move in a direction perpendicular to the axis of the magnification lens assembly is provided on the lithography workbench. An automatic adjustment drive mechanism for driving the silicon wafer fixing structure to move towards the magnification lens assembly and move in a direction perpendicular to the axis of the magnification lens assembly is provided on the manual adjustment mechanism. The automatic adjustment drive mechanism is connected to a workbench control module and is controlled by the workbench control module to move. The manual adjustment mechanism and the automatic adjustment drive mechanism can be used in combination or separately, with high precision and strong applicability.

[0012] Furthermore, the magnification lens assembly includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens that are sequentially arranged on the same axis. The third lens, the fourth lens, and the fifth lens are all double-sided convex lenses. The first lens and the second lens are both single-sided convex lenses and the corresponding sides of the first lens and the second lens are convex. The sixth lens and the seventh lens are both single-sided convex lenses and the corresponding sides of the first lens and the second lens are convex. The structure is simple, achieving a magnification reduction effect, and the cost is relatively low while ensuring accuracy. Description of the Drawings

[0013] Figure 1 It is a schematic structural diagram of the present invention.

[0014] The marks in the figure are: UV-LED multi-light source module 100, compound eye front collimating lens group 200, light homogenizing module 300, mirror assembly 400, collimating large lens 500, mask 600, magnification lens assembly 700, lithography workbench 800. Detailed Embodiments

[0015] The present invention will be further described below in conjunction with the drawings and specific embodiments.

[0016] As Figure 1A projection stepper collimating large lens lithography optical path structure for silicon wafers is shown, which includes a UV-LED multi-light source module 100, a pre-compound-eye collimating lens group 200, a light homogenizing module 300, and a mirror assembly 400 arranged in sequence. A collimating large lens 500, a mask 600, a magnification lens assembly 700, and a lithography workbench 800 are arranged in sequence in the light reflection direction of the mirror assembly 400. A silicon wafer fixing structure for fixing the silicon wafer is arranged on the lithography workbench 800. In specific implementation, the UV-LED multi-light source module 100 emits ultraviolet light, and the ultraviolet light is focused into parallel light after passing through the pre-compound-eye collimating lens group 200 and propagates to the light homogenizing module 300. The parallel light becomes uniform light with a divergence angle after passing through the light homogenizing module 300 to form the required uniform light field distribution, and then the mirror assembly 400 reflects the light to the collimating large lens 500. The light becomes parallel light after passing through the collimating large lens 500 and passes through the mask 600. The light becomes a light spot with the pattern of the mask 600 after passing through the mask 600 and enters the magnification lens assembly 700. The light spot with the pattern of the mask 600 is reduced after entering the magnification lens assembly 700 and is projected onto the silicon wafer fixed on the lithography workbench 800 for lithography. The structure is simple, with high precision, strong applicability, and low cost, and can effectively meet the use requirements of small enterprises or research institutions.

[0017] On the basis of the above, as Figure 1 shown, the pre-compound-eye collimating lens group 200 includes at least two coaxial and co-directionally arranged pre-compound-eye collimating lenses. It can effectively focus the light emitted by the UV-LED multi-light source module 100 into parallel light and propagate it to the light homogenizing module 300, with high precision.

[0018] On the basis of the above, as Figure 1 shown, the light homogenizing module 300 includes a micro-cylindrical mirror array and a condenser lens arranged coaxially. The micro-cylindrical mirror array is located on the side close to the pre-compound-eye collimating lens group 200. The light becomes a uniform light spot with a divergence angle after passing through the light homogenizing module 300, forming the required uniform light field distribution.

[0019] On the basis of the above, as Figure 1 shown, the mirror assembly 400 reflects the light passing through the light homogenizing module 300 in the vertical direction to the collimating large lens 500. The structure is simple, the angle is fixed and easy to set, reducing the installation difficulty and facilitating maintenance.

[0020] On the basis of the above, as Figure 1 shown, the lithography workbench 800 is a displaceable transparent lithography workbench. The silicon wafer fixing structure can be arranged on one of the two sides of the lithography workbench 800, or can be set on both sides. The structure can be adjusted according to the actual situation, with stronger applicability.

[0021] On the basis of the above, as Figure 1As shown, the magnification lens assembly 700 is a microscope group, which can greatly reduce the cost.

[0022] On the basis of the above, as Figure 1 shown, a switching drive mechanism is provided on the UV-LED multi-light source module 100, a plurality of light source fixing structures driven by the switching drive mechanism are located on the switching drive mechanism, and a plurality of UV-LED light sources are respectively arranged on the plurality of light source fixing structures. The fixing positions of the plurality of UV-LED light sources can be interchanged, and the applicability is better.

[0023] On the basis of the above, as Figure 1 shown, a manual adjustment mechanism for driving the movement of the silicon wafer fixing structure in the direction towards the magnification lens assembly 700 and the movement in the direction perpendicular to the axis of the magnification lens assembly 700 is provided on the lithography workbench 800. An automatic adjustment drive mechanism for driving the movement of the silicon wafer fixing structure in the direction towards the magnification lens assembly 700 and the movement in the direction perpendicular to the axis of the magnification lens assembly 700 is provided on the manual adjustment mechanism. The automatic adjustment drive mechanism is connected to a workbench control module and is controlled by the workbench control module to move. In a specific implementation, the manual adjustment mechanism is a high-precision displacement adjustment mechanism, and the high-precision movement is adjusted by rotating a column, which is the same as the adjustment method of a micrometer and can achieve the precision of a micrometer; the automatic adjustment drive mechanism is a combined mechanism of a plurality of high-precision linear motors, and the movement precision is not less than 10um. The manual adjustment mechanism and the automatic adjustment drive mechanism can be used in cooperation or separately, with high precision and strong applicability.

[0024] On the basis of the above, as Figure 1 shown, the magnification lens assembly 700 includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens that are sequentially arranged on the same axis. The third lens, the fourth lens, and the fifth lens are all double-sided convex lenses. The first lens and the second lens are both single-sided convex lenses and the corresponding surfaces of the first lens and the second lens are convex. The sixth lens and the seventh lens are both single-sided convex lenses and the corresponding surfaces of the first lens and the second lens are convex. The structure is simple, achieving a magnification reduction effect, and having a relatively low cost while ensuring accuracy.

[0025] In the specific embodiments described above, the purpose, technical solutions, and beneficial effects of the present invention have been further described in detail. It should be understood that the above are only specific embodiments of the present invention and are not used to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.

Claims

1. A lithography optical path structure of a silicon wafer projection stepping collimation large lens, characterized in that: The invention comprises a UV-LED multi-lamp light source module (100), a compound eye collimating lens group (200), a light averaging module (300) and a reflector assembly (400) which are arranged in sequence and in correspondence with each other; the reflector assembly (400) is provided with a collimating large lens (500), a mask (600), a magnification lens assembly (700) and a photolithography workbench (800) in the direction of reflected light; and the photolithography workbench (800) is provided with a silicon wafer fixing structure for fixing a silicon wafer.

2. The lithography optical path structure of a silicon wafer projection step collimating large lens according to claim 1, wherein: The compound eye front collimating lens group (200) comprises at least two compound eye front collimating lenses arranged coaxially and in the same direction.

3. A lithography optical path structure of a large lens for silicon wafer projection step collimation according to claim 1, characterized in that: The light-homogenizing module (300) comprises a coaxially arranged micro-cylindrical mirror array and a condenser, wherein the micro-cylindrical mirror array is located on a side close to the collimating lens group (200) in front of the compound eye.

4. A lithography optical path structure of a silicon wafer projection step collimation large lens according to claim 1, characterized in that: The reflector assembly (400) reflects the light passing through the light-homogenizing module (300) in a vertical direction onto the large collimating lens (500).

5. A lithography optical path structure of a silicon wafer projection step collimating large lens according to claim 1, characterized in that: The photolithography workbench (800) is a displaceable transparent photolithography workbench.

6. A lithography optical path structure of a silicon wafer projection step collimating large lens according to claim 1, characterized in that: The magnifying lens assembly (700) is a microscope assembly.

7. A lithography optical path structure of a silicon wafer projection step collimating large lens according to claim 1, characterized in that: The UV-LED multi-lamp light source module (100) is provided with a switching drive mechanism, a plurality of light source fixing structures located on the switching drive mechanism and driven thereby, and a plurality of UV-LED light sources respectively arranged on the plurality of light source fixing structures.

8. A lithography optical path structure of a silicon wafer projection step collimation large lens according to claim 1, characterized in that: The photolithography workbench (800) is provided with a manual adjustment mechanism for driving the silicon wafer fixed structure to move towards the magnification mirror assembly (700) and to move in a direction perpendicular to the axis of the magnification mirror assembly (700); the manual adjustment mechanism is provided with an automatic adjustment drive mechanism for driving the silicon wafer fixed structure to move towards the magnification mirror assembly (700) and to move in a direction perpendicular to the axis of the magnification mirror assembly (700); the automatic adjustment drive mechanism is connected to a workbench control module and its movement is controlled by the workbench control module.

9. A lithography optical path structure of a silicon wafer projection step collimating large lens according to claim 6, characterized in that: The magnification mirror assembly (700) comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens which are arranged in sequence on the same axis, wherein the third lens, the fourth lens and the fifth lens are double-sided convex lenses, the first lens and the second lens are single-sided convex lenses and the corresponding side of the first lens and the second lens is convex, and the sixth lens and the seventh lens are single-sided convex lenses and the corresponding side of the first lens and the second lens is convex.

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