Silicon wafer cleaning device

Abstract

The invention discloses a silicon wafer cleaning device, which belongs to the technical field of silicon wafer washing equipment and comprises a shell, the shell comprises a box plate, a bottom plate, a top plate and a side plate groove, the bottom of the box plate is connected with the bottom plate, the top of the box plate is fixedly connected with the top plate, a top groove is formed in the top of the top plate, and the side plate groove and a dustproof device are formed in two sides of the side edge of the box plate and close to a reaction device. The dustproof device comprises side baffles, a top baffle and a containing plate, the side baffles are slidably installed in the side plate grooves, the tops of the side baffles are fixedly connected with side connecting columns, the other faces of the side connecting columns are fixedly connected with side connecting rods, the top baffles are slidably installed in the top grooves, and the ends, close to the reaction device, of the top baffles are fixedly connected with top connecting rods; the top connecting rod penetrates through the end, close to the reaction device, of the top plate, the top baffle is slightly shorter than the top groove, and a containing plate is slidably installed in the top groove. According to the silicon wafer cleaning device, the reaction effect of cleaning liquid on silicon wafers is enhanced, defective products are reduced, and the qualified rate of the silicon wafers is greatly increased.

Description

Technical Field

[0001] The present invention relates to the field of silicon wafer rinsing equipment, and particularly to a silicon wafer cleaning device. Background Art

[0002] Silicon wafers in solar photovoltaic cell production must be strictly cleaned, as even trace amounts of contamination can cause device failure. After cutting, the surfaces of solar photovoltaic cell silicon wafers will have both organic and inorganic substances. The purpose of cleaning is to remove surface contamination impurities, which exist on the surface of solar photovoltaic silicon wafers in the form of atoms or ions, some in the form of thin films or particles. Organic contamination includes photoresist, organic solvent residues, synthetic wax, and oils or fibers brought by human contact with devices, tools, and utensils. Inorganic contamination includes heavy metals such as gold, copper, iron, and chromium, which seriously affect the minority carrier lifetime and surface conductance; alkali metals such as sodium cause serious leakage; particulate contamination includes silicon slag, dust, bacteria, microorganisms, organic colloidal fibers, etc., which can cause various defects.

[0003] Existing trays for rinsing silicon wafers in solar photovoltaics only have the function of loading wafers. When solar photovoltaic silicon wafers are cleaned in a cleaning solution, they cannot fully react with the solution. During the process of replacing the rinsing tank, dust is easily carried into the tray by the airflow and lands on the surface of the solar photovoltaic silicon wafers, affecting the yield. When the solar photovoltaic silicon wafers are taken out of the cleaning solution, the cleaning solution remaining on the surface of the solar photovoltaic silicon wafers cannot be well treated and is likely to remain on the surface of the solar photovoltaic silicon wafers after air drying, causing damage to them. Therefore, there is a great need for a silicon wafer cleaning device. Summary of the Invention

[0004] Aiming at the deficiencies of the prior art, the present invention provides a silicon wafer cleaning device, which enhances the cleaning effect of the cleaning solution on solar photovoltaic silicon wafers, avoids the situation of dust falling on the surface during the replacement of the rinsing tank of the tray, avoids the surface of solar photovoltaic silicon wafers being easily contaminated with the cleaning solution when taken out of the cleaning tank, reduces the probability of defective products, and greatly saves material and time costs.

[0005] To achieve the above object, the present invention is realized by the following technical solutions: A silicon wafer cleaning device includes a housing, the housing includes a box board, a bottom board, a top board and a side board groove. The bottom of the box board is connected to the bottom board, the top of the box board is fixedly connected to the top board, a top groove is opened at the top of the top board, and a side board groove is opened on one side of the two sides of the box board and one side is close to the reaction device. A dust-proof device, the dust-proof device includes a side baffle, a top baffle and a holding plate. The side baffle is slidably installed in the side board groove, a side connecting column is fixedly connected to the top of the side baffle, and a side connecting rod is fixedly connected to the other side of the side connecting column. The top baffle is slidably installed in the top groove, and a top connecting rod is fixedly connected to one end of the top baffle close to the reaction device. The top connecting rod penetrates through one end of the top board close to the reaction device. The top baffle is slightly shorter than the top groove, and a holding plate is slidably installed in the top groove. A reaction device, the reaction device includes a power column, the power column is sleeved in a connecting sleeve rod, the driving column is sleeved in another sleeve hole of the connecting sleeve rod, a sector block is movably installed at the top of the connecting sleeve rod, a disk is fixedly installed at one end of the driving column away from the power column, a rotating cylinder is sleeved in a long groove at the bottom of the disk, and the rotating cylinder is fixedly installed at the edge of the disk. The top of the sector block is meshed and connected with a stirring cross bar through a tooth. A vibration device, the vibration device includes a water collecting plate, a water pipe, a turbine, a rotating rod and a spring. The water collecting plate is installed at the middle position inside the cavity, a water pipe is connected to the converging part at the bottom of the water collecting plate, the other end of the water pipe is connected to the turbine, a fan blade is arranged inside the turbine and connected to the surface of the rotating rod, and rotating blocks are symmetrically installed at both ends of the rotating rod. The spring is installed on the bottom board below the rotating block.

[0006] Further, handles are installed on the top of both sides of the box board. The bottom of the box board is fixedly connected to the bottom board, the top of the box board is fixedly installed with the top board, a top groove is opened on the top board, a sliding horizontal groove is opened on one side of the two sides of the box board and one side is close to the reaction device, and a side board groove is opened on one side of the two sides of the box board and one side is close to the reaction device. An outlet is opened at the bottom of one side of the box board.

[0007] Further, a side baffle is slidably installed in the side board groove, a side connecting column is fixedly installed at the top of the side baffle, and a side connecting rod is fixedly installed at the other side of the side connecting column. A top baffle is slidably installed in the top groove. The top baffle is adapted to the top groove. After the top baffle is pulled into the top groove, it is in a closed state, which can gather the cleaning liquid in the housing and prevent it from splashing everywhere. At the same time, after pulling the side connecting rod on the side of the box board to close it, the whole housing is in a closed state, which can avoid dust entering the box and polluting the silicon wafer. The grooves on both sides of the holding plate can slidably hold the silicon wafer, which facilitates the method of holding the silicon wafer, saves labor costs, greatly reduces the generation of defective products, and improves production efficiency.

[0008] Further, a top connecting rod is fixedly connected to one end of the top baffle plate close to the reaction device. One end of the top connecting rod is fixedly connected to a pull ring. The top connecting rod is slidably installed through the corner of the top plate. A holding plate is slidably installed in the top groove. A top cross bar is fixedly connected to the top of the holding plate. Chute grooves are arranged inside both sides of the holding plate. A top pull handle is fixedly connected to the top of the top cross bar.

[0009] Further, a connecting sleeve rod is fixedly installed at the bottom of one side surface of the box plate close to the top connecting rod. A power column is sleeved in the sleeve ring of the connecting sleeve rod away from the box plate. A power ratchet is fixedly installed at one end of the power column close to the box plate. The power ratchet is meshed and connected with a driving ratchet. The driving ratchet is fixedly installed at one end of the driving column close to the power column.

[0010] Further, a driving column is sleeved in the sleeve ring of the connecting sleeve rod close to the box plate. A sector block is movably installed at the top of the sleeve ring of the connecting sleeve rod close to the box plate. The other end of the driving column is fixedly connected to a disc. A rotating cylinder is installed at the edge of the surface of the disc. The rotating cylinder is sleeved in the chute groove at the bottom of the sector block.

[0011] Further, the top of the sector block is meshed and connected with the rodent at the bottom of the stirring cross bar through a rodent. One end of the stirring connecting rod far away from the reaction device is fixedly connected with the stirring cross bar. When the reaction device works, the power rodent fixedly installed at the output end of the power column is meshed and connected with the driving rodent to rotate. The driving rodent drives the disc to rotate through the driving column. The rotating cylinder installed on the surface of the disc moves in the chute inside the sector block. The rodent at the top of the sector block drives the stirring cross bar to move reciprocally through meshing connection. The stirring rod fixedly installed on the upper surface of the stirring cross bar also moves reciprocally at the same time. The stirring rod is arranged in two opposing shapes, and there is a gap in the middle part of the stirring rod to facilitate the flow of the cleaning liquid, reducing the resistance of the cleaning liquid. The bent plate surfaces on both sides of the stirring rod strengthen the stirring degree of the cleaning liquid, enhancing the cleaning effect on the silicon wafer, preventing the cleaning liquid from precipitating in the shell and achieving a poor cleaning effect, strengthening the reaction effect of the cleaning liquid on the silicon wafer, saving time costs, and improving the cleaning speed. The upper surface of the stirring cross bar is fixedly installed with a stirring rod, and the bottom of the stirring rod is fixedly installed with a rubber head. The middle part of the upper surface of the stirring cross bar is fixedly installed with a semi-circular block. A shaking rod is rotatably installed inside the semi-circular block. The shaking rod shakes inside the semi-circular block when the stirring cross bar moves reciprocally. The top of the shaking rod is fixedly installed with a clamping head, and the upper end part of the shaking rod is fixedly installed with a cleaning cotton board. While the shaking of the shaking rod further strengthens the stirring effect of the cleaning liquid, during the reciprocating movement of the rubber head and the clamping head, the silicon wafer can be clamped and rotated, so that the entire surface of the silicon wafer is cleaned, preventing the generation of defective products due to poor cleaning effect in the chute. The cleaning cotton board further cleans the impurities on the surface of the silicon wafer during the shaking process, ensuring that there are no impurities remaining on the surface of the silicon wafer and enhancing the cleaning effect on the silicon wafer.

[0012] Further, a water collecting plate is fixedly installed in the middle of the box board cavity. The gathering part at the bottom of the water collecting plate is fixedly connected with a water pipe. The other end of the water pipe is fixedly installed with a turbine. The bottom of the turbine is fixedly connected with a water pipe. The end of the water pipe is connected to the water outlet.

[0013] Further, the fan blades arranged inside the turbine are installed on the surface of the rotating rod. Rotating blocks are symmetrically installed at both ends of the rotating rod. Springs are fixedly installed on the upper surface of the bottom plate directly below the rotating blocks. Collision blocks are fixedly installed at the tops of the springs. When the shell is lifted out of the cleaning liquid, the water in the shell moves through the turbine to make the rotating rod rotate. When the rotating rod rotates to the lowest position, it collides with the collision block. The collision block is fixedly connected to the bottom plate through a spring. Therefore, the vibration will accelerate the downward flow of the cleaning liquid remaining on the surface of the silicon wafer, preventing the cleaning liquid remaining on the surface of the silicon wafer after the silicon wafer is separated from the cleaning liquid from affecting the finished product.

[0014] Compared with the prior art, the beneficial effects of the present invention are: 1. A silicon wafer cleaning device of the present invention. After the top baffle is pulled into the top groove, it is in a closed state, which can gather the cleaning liquid in the shell and prevent it from splashing everywhere. At the same time, when the side connecting rod on the side of the box board is pulled to close it, the whole shell is in a closed state, which can avoid dust entering the box and contaminating the silicon wafers. The grooves on both sides of the placing plate can slidably hold the silicon wafers, which facilitates the method of holding the silicon wafers, saves labor costs, greatly reduces the generation of defective products, and improves production efficiency.

[0015] 2. A silicon wafer cleaning device of the present invention. When the reaction device is working, the power gear fixedly installed at the output end of the power column is meshed and connected with the driving gear to rotate. The driving gear drives the disc to rotate through the driving column. The rotating cylinder installed on the surface of the disc moves in the chute inside the sector block. The gear on the top of the sector block drives the stirring cross bar to reciprocate through meshing connection. The stirring rod fixedly installed on the upper surface of the stirring cross bar also reciprocates at the same time. The stirring rods are arranged in two opposing shapes, and there is a gap in the middle part of the stirring rods to facilitate the flow of the cleaning liquid, reduce the resistance of the cleaning liquid, and the bent plates on both sides of the stirring rods strengthen the stirring degree of the cleaning liquid, strengthen the cleaning effect on the silicon wafers, avoid the precipitation of the cleaning liquid in the shell and the failure to achieve a good cleaning effect, strengthen the reaction effect of the cleaning liquid on the silicon wafers, save time costs, and improve the cleaning speed. 3. A silicon wafer cleaning device of the present invention. While the shaking of the shaking rod further strengthens the stirring effect of the cleaning liquid, during the reciprocating movement of the rubber head and the clamping head, the silicon wafers can be clamped and rotated, so that all aspects of the silicon wafers are cleaned, avoiding the generation of defective products due to the failure to achieve a good cleaning effect in the chute. The cleaning cotton board further cleans the impurities on the surface of the silicon wafers during the shaking process to ensure that there are no impurities remaining on the surface of the silicon wafers, strengthening the cleaning effect on the silicon wafers.

[0016] 4. A silicon wafer cleaning device of the present invention. When the shell is lifted out of the cleaning liquid, the water in the shell moves through the turbine to make the rotating rod rotate. When the rotating rod rotates to the lowest position, it collides with the collision block. The collision block is fixedly connected to the bottom plate through a spring, so the vibration will accelerate the downward flow of the cleaning liquid remaining on the surface of the silicon wafers, preventing the residual cleaning liquid on the surface of the silicon wafers from affecting the finished product after the silicon wafers are separated from the cleaning liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is the overall structural schematic diagram of the present invention; Figure 2 is the structural schematic diagram of the shell of the present invention; Figure 3 is the structural schematic diagram of the vibration device of the present invention; Figure 4 is the structural schematic diagram of the placing plate of the present invention; Figure 5Schematic diagram of the top baffle structure of the present invention; Figure 6 Partial enlarged schematic diagram of the dust-proof device A of the present invention; Figure 7 Schematic diagram of the reaction device structure of the present invention; Figure 8 Partial enlarged schematic diagram of the reaction device B of the present invention; Figure 9 Partial enlarged schematic diagram of the reaction device C of the present invention.

[0018] In the figure: 1, housing; 2, dust-proof device; 3, reaction device; 4, vibration device; 11, box board; 12, handle; 13, bottom board; 14, top board; 141, top groove; 15, sliding horizontal groove; 16, side board groove; 17, water outlet; 21, side baffle; 22, side connecting column; 23, side connecting rod; 24, top baffle; 25, top connecting rod; 26, pull ring; 27, placing board; 271, top cross bar; 272, top pull handle; 31, power column; 32, power gear; 33, connecting sleeve rod; 34, driving gear; 35, driving column; 36, disc; 37, rotating cylinder; 38, sector block; 39, stirring connecting rod; 391, stirring cross bar; 392, stirring rod; 393, rubber head; 41, water collecting board; 42, water pipe; 43, turbine; 44, rotating rod; 441, rotating block; 45, spring; 451, collision block. Detailed implementation manners

[0019] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific implementation manners. The embodiments of the present invention are given for the purpose of illustration and description, and are not exhaustive or limit the present invention to the disclosed form. Many modifications and variations are obvious to those of ordinary skill in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention, and enable those of ordinary skill in the art to understand the present invention and thus design various embodiments with various modifications suitable for specific purposes.

[0020] Please refer to Figures 1-9 As shown, the present invention is a silicon wafer cleaning device, including a housing 1. The housing 1 includes a box board 11, a bottom board 13, a top board 14 and a side board groove 16. The bottom of the box board 11 is connected to the bottom board 13, the top of the box board 11 is fixedly connected to the top board 14, a top groove 141 is opened on the top of the top board 14, and a side board groove 16 is opened on both sides of the box board 11 and one side is close to the reaction device 3. Dust-proof device 2, the dust-proof device 2 includes side baffles 21, top baffle 24 and a holding plate 27. The side baffle 21 is slidably installed in the side plate groove 16. A side connecting column 22 is fixedly connected to the top of the side baffle 21. On the other side of the side connecting column 22, a side connecting rod 23 is fixedly connected. The top baffle 24 is slidably installed in the top groove 141. One end of the top baffle 24 close to the reaction device 3 is fixedly connected with a top connecting rod 25. The top connecting rod 25 penetrates through one end of the top plate 14 close to the reaction device 3. The top baffle 24 is slightly shorter than the top groove 141. A holding plate 27 is slidably installed in the top groove 141. Pull the side connecting rod 23 to drive the side connecting column 22 to slide the side baffle 21 into the side plate groove 16. The cleaning liquid can enter the housing 1 through the gap on the side to clean the solar photovoltaic silicon wafer. Push the pull ring 26 inward to drive the top connecting rod 25 to slide the top baffle 24 into the top groove 141. The cleaning liquid can enter the housing 1 from the top to clean the solar photovoltaic silicon wafer. When the cleaning is completed, pull the side connecting rod 23 to drive the side connecting column 22 to slide the side baffle 21 back, forming a closed space on both sides of the housing 1, preventing dust from entering and at the same time blocking the scattered outflow of the internal cleaning liquid, which is not easy to clean when splashing everywhere. Pull the pull ring 26 outward to drive the top connecting rod 25 to slide the top baffle 24 to close the top space, completely forming a closed space inside the housing 1, preventing the dust carried in the air from entering the inside of the housing 1, polluting the cleaned solar photovoltaic silicon wafer and at the same time collecting the internal water for the vibration device 4. Reaction device 3, the reaction device 3 includes a power column 31, a connecting sleeve rod 33, a driving column 35, a disc 36, a sector block 38 and a stirring connecting rod 39. The power column 31 is sleeved in the connecting sleeve rod 33. The driving column 35 is sleeved in another sleeve hole of the connecting sleeve rod 33. A sector block 38 is movably installed at the top of the connecting sleeve rod 33. One end of the driving column 35 away from the power column 31 is fixedly installed with a disc 36. A rotating cylinder 37 is sleeved in the long groove at the bottom of the disc 36. The rotating cylinder 37 is fixedly installed at the edge of the disc 36. The top of the sector block 38 is meshed and connected with the stirring connecting rod 39 through a ratchet. The power column 31 is connected to an external power source and rotates in the sleeve connecting rod 33. The power ratchet 32 at the output end of the power column 31 drives the driving ratchet 34 to rotate simultaneously through meshing connection. Since the driving ratchet 34 is fixedly installed at one end of the driving column 35 and the driving column 35 is sleeved in the sleeve connecting rod 33 for rotation, the disc 36 fixedly installed at the other end of the driving column 35 is also driven to rotate. The rotating cylinder 37 fixedly installed on the surface of the disc 36 slides in the sliding groove at the bottom of the sector block 38. When the disc 36 rotates, the rotation of the rotating cylinder 37 will drive the sliding groove at the bottom of the sector block 38 to move. Since the sector block 38 is rotatably sleeved at the top of the sleeve connecting rod 33, when the disc 36 drives the rotating cylinder 37 to rotate, the top of the sector block 38 makes a reciprocating motion. The ratchet at the top of the sector block 38 is meshed and connected with the ratchet at the bottom of the stirring connecting rod 39 to make it reciprocate. Vibration device 4, the vibration device 4 includes a water collecting plate 41, a water pipe 42, a turbine 43, a rotating rod 44 and a spring 45. The water collecting plate 41 is installed at the middle position inside the cavity. The bottom converging part of the water collecting plate 41 is connected with a water pipe 42. The other end of the water pipe 42 is connected with a turbine 43. A fan blade is arranged inside the turbine 43 and connected to the surface of the rotating rod 44. Rotating blocks 441 are symmetrically installed at both ends of the rotating rod 44. The spring 45 is installed on the bottom plate 13 below the rotating block 441. When the housing 1 is lifted, since the dust-proof device 2 is closed, a sealed space is formed inside the housing 1. The cleaning liquid inside is affected by gravity and moves downward and flows out from the connecting pipe 42 connected to the middle of the bottom of the water collecting plate 41. The cleaning liquid enters the turbine 43 from the water pipe 42. The fan blade inside the turbine 43 rotates after being impacted by the cleaning liquid. The fan blade inside the turbine 43 is fixedly connected to the surface of the rotating rod 44. When the fan blade inside the turbine 43 rotates, it drives the rotating rod 44 to rotate. The rotation of the rotating rod 44 drives the rotating block 441 fixedly installed on the surface to rotate. When the rotating block 441 rotates to the bottom, it collides with the collision block 451 to generate vibration. The collision block 451 is fixedly installed at the bottom of the housing 1 through the spring 45. The generated vibration shakes off the residual cleaning liquid on the surface of the solar photovoltaic silicon wafer. By utilizing the cleaning liquid inside to generate vibration, it accelerates the dropping of the cleaning liquid on the surface of the solar photovoltaic silicon wafer, avoids the damage caused by the residual cleaning liquid on the surface of the solar photovoltaic silicon wafer, reduces the generation of unqualified products, and ensures the qualification rate of the products.

[0021] Handles 12 are installed on both tops of the box board 11. The bottom of the box board 11 is fixedly connected with a bottom plate 13. The top of the box board 11 is fixedly installed with a top plate 14. A top groove 141 is opened on the top plate 14. One of the two sides of the box board 11 and the side close to the reaction device 3 is provided with a sliding horizontal groove 15. One of the two sides of the box board 11 and the side close to the reaction device 3 is provided with a side plate groove 16. An outlet 17 is opened at the bottom of one side of the box board 11.

[0022] A side baffle 21 is slidably installed in the side plate groove 16. A side connecting column 22 is fixedly installed at the top of the side baffle 21. A side connecting rod 23 is fixedly installed on the other side of the side connecting column 22. A top baffle 24 is slidably installed in the top groove 141. The top baffle 24 is adapted to the top groove 141. Push the side connecting rods 23 on both sides of the box board 11 to slide the side baffle 21 into the side plate groove 16. When the cleaning is completed, push the side connecting rods 23 on both sides to slide the side baffle 21 out of the side plate groove 16 to make both sides of the housing 1 in a closed state. Pull the pull ring 26 to slide the top baffle 24 out of the top groove 141 to make the top of the housing 1 in a closed state. Lift the housing through the handle 12.

[0023] One end of the top baffle 24 close to the reaction device 3 is fixedly connected with a top connecting rod 25. One end of the top connecting rod 25 is fixedly connected with a pull ring 26. The top connecting rod 25 is slidably installed through the corner of the top plate 14. A placing plate 27 is slidably installed in the top groove 141. A top cross bar 271 is fixedly connected to the top of the placing plate 27. Sliding grooves are arranged inside both sides of the placing plate 27. A top pull handle 272 is fixedly connected to the top of the top cross bar 271. Pull the pull ring 26 to slide the top baffle 24 into the top groove 141, lift the top pull handle 272 to draw out the placing plate 27, place the silicon wafers to be cleaned in the sliding grooves on both sides of the placing plate 27, and then put the placing plate 27 back into the housing 1.

[0024] A connecting sleeve rod 33 is fixedly installed at the bottom of one side surface of the box board 11 close to the top connecting rod 25. A power column 31 is sleeved in the sleeve ring of the connecting sleeve rod 33 far from the box board 11. A power gear 32 is fixedly installed at one end of the power column 31 close to the box board 11. The power gear 32 is meshed and connected with a driving gear 34. The driving gear 34 is fixedly installed at one end of the driving column 35 close to the power column 31. The end of the power column 31 far from the box board 11 is connected to an external power source for driving. Place the housing 1 in the cleaning liquid, connect the power column 31 to an external power source for rotation. The rotation of the power column 31 drives the driving gear 34 to rotate through meshing of gears. The driving gear 34 drives the driving column 35 to rotate. The rotation of the driving column 35 drives the disk 36 at the other end. The rotation of the disk 36 drives the sector block 38 to rotate through the rotation cylinder 37 sleeved in the sliding groove at the bottom of the sector block 38. The gear arranged at the top of the sector block 38 is meshed and connected with the gear at the bottom of the stirring connecting rod 39. The gear arranged at the top of the sector block 38 drives the stirring connecting rod 39 to perform a reciprocating motion through movement. The stirring rod 392 fixedly connected to the upper surface of the stirring connecting rod 39 stirs the cleaning liquid. The rubber head 393 at the bottom of the stirring rod 392 rotates the silicon wafers through friction.

[0025] The driving column 35 is rotatably sleeved in the sleeve ring of the connecting sleeve rod 33 close to the box board 11. The sector block 38 is rotatably sleeved at the top of the sleeve ring of the connecting sleeve rod 33 close to the box board 11. The other end of the driving column 35 is fixedly connected with a disk 36. A rotation cylinder 37 is fixedly installed at the surface edge of the disk 36. The rotation cylinder 37 is slidably sleeved in the sliding groove at the bottom of the sector block 38. When the driving column 35 rotates, it drives the disk 36 to rotate. The rotation of the disk 36 drives the rotation cylinder 37 at the surface edge to rotate. The rotation cylinder 37 slides in the sliding groove at the bottom of the sector block 38 to make the sector block 38 perform a reciprocating motion. Since the sector block 38 is rotatably sleeved in the socket connecting rod 33, when the sliding groove at the bottom performs a reciprocating motion, the top of the sector block 38 also performs a reciprocating motion at the same time, producing the effect of linkage between structures and providing the power condition for cleaning the solar silicon wafers.

[0026] The top of the sector block 38 is meshed and connected with the rodent at the bottom of the stirring connecting rod 39. One end of the stirring connecting rod 39 far away from the reaction device 3 is fixedly connected with a stirring cross bar 391. A stirring rod 392 is fixedly installed on the upper surface of the stirring cross bar 391. A rubber head 393 is fixedly installed at the bottom of the stirring rod 392. A semi-circular block 394 is fixedly installed in the middle of the upper surface of the stirring cross bar 391. A shaking rod 395 is rotatably installed inside the semi-circular block 394. A clamping head 396 is fixedly installed at the top of the shaking rod 395. A cleaning cotton board 397 is fixedly installed on the upper part of the shaking rod 395. The top of the sector block 38 makes the stirring connecting rod 39 perform reciprocating motion through meshing connection. The stirring connecting rod 39 makes the stirring cross bar 391 perform reciprocating motion through reciprocating motion. The two stirring rods 392 fixedly installed on the upper surface of the stirring cross bar 391 are arranged in an opposing shape. There is a gap in the middle part of the stirring rod 392 to facilitate the flow of the cleaning liquid, reduce the resistance of the cleaning liquid, and the curved plate surfaces on both sides of the stirring rod 392 strengthen the stirring degree of the cleaning liquid and enhance the cleaning effect on the silicon wafer. The rubber head 393 fixedly installed at the bottom of the stirring rod 392 clamps and rotates the solar photovoltaic silicon wafer to prevent the edge of the solar photovoltaic silicon wafer from not being well cleaned in the groove of the placing plate 27. The semi-circular block 394 fixedly installed on the upper surface of the middle part of the stirring cross bar 391 rotatably sleeved with a shaking rod 395. The shaking rod 395 reciprocates due to inertia. The clamping head 396 at the top of the shaking rod 395 also clamps and rotates the solar photovoltaic silicon wafer. The cleaning panel 397 fixedly installed on the surface of the shaking rod 395 below the clamping head 396 wipes and cleans the surface of the solar photovoltaic silicon wafer through shaking, enhancing the cleaning effect and avoiding the edge of the solar photovoltaic silicon wafer from not being well cleaned at the same time.

[0027] A water collecting plate 41 is fixedly installed in the middle of the cavity of the box board 11. A water flowing pipe 42 is fixedly connected to the gathering part at the bottom of the water collecting plate 41. The other end of the water flowing pipe 42 is fixedly installed with a turbine 43. A water flowing pipe 42 is fixedly connected to the bottom of the turbine 43. The end of the water flowing pipe 42 is connected to the water outlet 17.

[0028] The fan blades arranged inside the turbine 43 are installed on the surface of the rotating rod 44. Rotating blocks 441 are symmetrically installed at both ends of the rotating rod 44. A spring 45 is fixedly installed on the upper surface of the bottom plate 13 directly below the rotating block 441. A collision block 451 is fixedly installed at the top of the spring 45. The rotating block 441 is semi-circular. When the rotating block 441 rotates, the top of the collision block 451 generates vibration. The cleaning liquid in the housing 1 gathers towards the water collecting plate 41 under the influence of gravity. The cleaning liquid enters the turbine 43 through the water flowing pipe 42. The fan blades inside the turbine 43 drive the rotating rod 44 to rotate. The rotating block 441 arranged on the surface of the rotating rod 44 rotates and collides with the collision block 451 to generate vibration. The cleaning liquid inside the turbine 43 flows out from the water outlet 17 through another water flowing pipe 42 after passing through the fan blades.

[0029] Working principle: Pull the measuring connecting rod 23 to drive the side connecting column 22 to slide the side baffle 21 into the side plate groove 16. The cleaning liquid can enter the housing 1 through the gap on the side to clean the solar photovoltaic silicon wafer. Push the pull ring 26 inward to drive the top connecting rod 25 to slide the top baffle 24 into the top groove 141. The cleaning liquid can enter the housing 1 from the top to clean the solar photovoltaic silicon wafer. When the cleaning is completed, pull the measuring connecting rod 23 to drive the side connecting column 22 to slide the side baffle 21 back, forming a closed space on both sides of the housing 1 to prevent dust from entering and blocking the scattered outflow of the internal cleaning liquid, which is difficult to clean when splashing everywhere. Pull the pull ring 26 outward to drive the top connecting rod 25 to slide and close the top space, completely forming a closed space inside the housing 1 to prevent dust carried in the air from entering the inside of the housing 1, causing pollution to the cleaned solar photovoltaic silicon wafer and collecting the internal water for the vibration device 4. The power column 31 is connected to an external power source and rotates inside the socket connecting rod 33. The power gear 32 at the output end of the power column 31 drives the driving gear 34 to rotate simultaneously through meshing connection. Since the driving gear 34 is fixedly installed at one end of the driving column 35, the driving column 35 is sleeved inside the socket connecting rod 33 and rotates, and the disc 36 fixedly installed at the other end of the driving column 35 is also driven to rotate. The rotating cylinder 37 fixedly installed on the surface of the disc 36 slides and is sleeved in the bottom sliding groove of the sector block 38. When the disc 36 rotates, the rotation of the rotating cylinder 37 drives the movement of the sliding groove at the bottom of the sector block 38. The sector block 38 is rotatably sleeved on the top of the socket connecting rod 33. When the disc 36 drives the rotating cylinder 37 to rotate, the top of the sector block 38 moves reciprocally. The gear at the top of the sector block 38 engages with the gear at the bottom of the stirring connecting rod 39 to make it move reciprocally. When the housing 1 is lifted, due to the closure of the dust-proof device 2, a closed space is formed inside the housing 1, and the internal cleaning liquid moves downward under the influence of gravity and flows out from the connecting pipe 42 connected to the middle of the bottom of the water collecting plate 41. The cleaning liquid enters the turbine 43 from the flowing water pipe 42, and the fan blades inside the turbine 43 rotate after being impacted by the cleaning liquid. The fan blades inside the turbine 43 are fixedly connected to the surface of the rotating rod 44. When the fan blades inside the turbine 43 rotate, they drive the rotating rod 44 to rotate. The rotating rod 44 rotates to drive the rotating block 441 fixedly installed on its surface to rotate. When the rotating block 441 rotates to the bottom, it collides with the collision block 451 to generate vibration. The collision block 451 is fixedly installed at the bottom of the housing 1 through the spring 45. The generated vibration shakes off the remaining cleaning liquid on the surface of the solar photovoltaic silicon wafer, generates vibration by utilizing the internal cleaning liquid, accelerates the dropping of the cleaning liquid on the surface of the solar photovoltaic silicon wafer, avoids the damage caused by the remaining cleaning liquid on the surface of the solar photovoltaic silicon wafer, reduces the generation of unqualified products, and ensures the product qualification rate.

[0030] Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all embodiments. All other embodiments obtained by those of ordinary skill in the art and related fields based on the embodiments of the present invention without creative efforts shall fall within the scope of protection of the present invention. Structures, devices, and operation methods not specifically described and explained in the present invention shall be implemented by conventional means in the art unless otherwise specified and limited.

Claims

1. A silicon wafer cleaning device, characterized in that, It includes a housing (1), the housing (1) includes a box board (11), a bottom plate (13) is connected to the bottom of the box board (11), a top plate (14) is fixedly connected to the top of the box board (11), a top groove (141) is formed in the top of the top plate (14), and a side plate groove (16) is formed in one of the two sides of the box board (11) and close to the reaction device (3). A dust-proof device (2), the dust-proof device (2) includes a side baffle (21), a top baffle (24) and a holding plate (27), the side baffle (21) is slidably installed in the side plate groove (16), a side connecting column (22) is fixedly connected to the top of the side baffle (21), a side connecting rod (23) is fixedly connected to the other side of the side connecting column (22), the top baffle (24) is slidably installed in the top groove (141), a top connecting rod (25) is fixedly connected to one end of the top baffle (24) close to the reaction device (3), the top connecting rod (25) penetrates through one end of the top plate (14) close to the reaction device (3), the top baffle (24) is slightly shorter than the top groove (141), and a holding plate (27) is slidably installed in the top groove (141). A reaction device (3), the reaction device (3) includes a power column (31) and a driving column (35), the power column (31) is sleeved in a connecting sleeve rod (33), the driving column (35) is sleeved in another sleeve hole of the connecting sleeve rod (33), a sector block (38) is movably installed at the top of the connecting sleeve rod (33), a disc (36) is fixedly installed at one end of the driving column (35) away from the power column (31), a rotating cylinder (37) is sleeved in a long groove at the bottom of the disc (36), the rotating cylinder (37) is fixedly installed at the edge of the disc (36), and the top of the sector block (38) is meshed and connected with a stirring connecting rod (39) through a tooth. A vibration device (4), the vibration device (4) includes a water collecting plate (41), the water collecting plate (41) is installed at the middle position inside the box board (11), a water pipe (42) is connected to the converging place at the bottom of the water collecting plate (41), the other end of the water pipe (42) is connected to a turbine (43), a fan blade is arranged inside the turbine (43) and connected to the surface of a rotating rod (44), and rotating blocks (441) are symmetrically installed at both ends of the rotating rod (44).

2. The silicon wafer cleaning device according to claim 1, wherein: Handles (12) are installed on both tops of the box board (11), a bottom plate (13) is fixedly connected to the bottom of the box board (11), a top plate (14) is fixedly installed on the top of the box board (11), a top groove (141) is formed in the top plate (14), a sliding horizontal groove (15) is formed in one of the two sides of the box board (11) and close to the reaction device (3), a side plate groove (16) is formed in one of the two sides of the box board (11) and close to the reaction device (3), and a water outlet (17) is formed at the bottom of one side of the box board (11).

3. A silicon wafer cleaning device according to claim 2, characterized in that: A side baffle (21) is slidably installed in the side plate groove (16). A side connecting column (22) is fixedly installed at the top of the side baffle (21). A side connecting rod (23) is fixedly installed on the other side of the side connecting column (22). A top baffle (24) is slidably installed in the top groove (141), and the top baffle (24) is adapted to the top groove (141).

4. The silicon wafer cleaning device according to claim 3, characterized in that: One end of the top baffle (24) close to the reaction device (3) is fixedly connected to a top connecting rod (25). One end of the top connecting rod (25) is fixedly connected to a pull ring (26). The top connecting rod (25) is slidably installed through the corner of the top plate (14). A placing plate (27) is slidably installed in the top groove (141). A top cross bar (271) is fixedly connected to the top of the placing plate (27). Sliding grooves are arranged inside both sides of the placing plate (27). A top pull handle (272) is fixedly connected to the top of the top cross bar (271).

5. The wafer cleaning device according to claim 2, wherein: A connecting sleeve rod (33) is fixedly installed at the bottom of one side of the box plate (11) close to the top connecting rod (25). A power column (31) is sleeved in the sleeve ring of the connecting sleeve rod (33) far from the box plate (11). A power ratchet (32) is fixedly installed at one end of the power column (31) close to the box plate (11). The power ratchet (32) is meshed and connected with a driving ratchet (34), and the driving ratchet (34) is fixedly installed at one end of a driving column (35) close to the power column (31).

6. The wafer cleaning device according to claim 5, wherein: A driving column (35) is sleeved in the sleeve ring of the connecting sleeve rod (33) close to the box plate (11). A sector block (38) is movably installed at the top of the sleeve ring of the connecting sleeve rod (33) close to the box plate (11). The other end of the driving column (35) is fixedly connected to a disc (36). A rotating cylinder (37) is installed on the surface edge of the disc (36). The rotating cylinder (37) is sleeved in the bottom sliding groove of the sector block (38).

7. A silicon wafer cleaning device according to claim 6, characterized in that: The top of the sector block (38) is meshed and connected with the ratchet at the bottom of a stirring connecting rod (39) through a ratchet. One end of the stirring connecting rod (39) far from the reaction device (3) is fixedly connected to a stirring cross bar (391). A stirring rod (392) is fixedly installed on the upper surface of the stirring cross bar (391). A rubber head (393) is fixedly installed at the bottom of the stirring rod (392). A semi-circular block (394) is fixedly installed in the middle of the upper surface of the stirring cross bar (391). A shaking rod (395) is rotatably installed inside the semi-circular block (394). A clamping head (396) is fixedly installed at the top of the shaking rod (395). A cleaning cotton board (397) is fixedly installed at the upper end part of the shaking rod (395).

8. The silicon wafer cleaning device according to claim 2, wherein: A water collecting plate (41) is fixedly installed in the middle of the cavity of the box plate (11). A water flow pipe (42) is fixedly connected to the gathering part at the bottom of the water collecting plate (41). The other end of the water flow pipe (42) is fixedly installed with a turbine (43). The bottom of the turbine (43) is fixedly connected to the water flow pipe (42). The end of the water flow pipe (42) is connected to the water outlet (17).

9. The wafer cleaning device according to claim 8, wherein: The fan blades arranged inside the turbine (43) are mounted on the surface of the rotating rod (44). Rotating blocks (441) are symmetrically mounted at both ends of the rotating rod (44). A spring (45) is fixedly mounted on the upper surface of the bottom plate (13) directly below the rotating block (441). A collision block (451) is fixedly mounted at the top of the spring (45).

Images