Curable composition, film and display device

A photopolymerizable composition with specific silicon-based additives addresses the challenges of precise preparation and electrical interference in sealing applications, resulting in a low-dielectric, durable film for electronic devices with improved adhesion and reduced outgassing.

CN120322469APending Publication Date: 2025-07-15DONGJIN SEMICHEM CO LTD
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Patent Information

Application Number
CN202380083832.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2022-12-22
Filing Date
2023-11-02
Publication Date
2025-07-15

AI Technical Summary

Technical Problem

The existing curable compositions have problems with control accuracy and electrical interference during preparation and use, making it difficult to effectively block the invasion of external gas or moisture, affecting the performance and life of electronic devices.

Method used

Using a combination of photocurable monomer, photocuring initiator and silicon-based additive, the silicon-based additive includes a curable composition with a ratio of 2:6 to 6:2 to a curable composition, and aliphatic substituents, to prepare low viscosity films to improve the preparation process characteristics and curing properties.

Benefits of technology

It realizes a film with low gas volume and low dielectric constant, improves the durability and electrical performance of electronic devices, reduces electrical noise and electrical interference, and is suitable for inkjet printing and display device packaging.

✦ Generated by Eureka AI based on patent content.

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Abstract

One embodiment of the present invention provides a curable composition including a photocurable monomer, a photocuring initiator, and a silicon-based additive, in which the silicon-based additive includes a photocurable substituent and an aliphatic substituent, the ratio of the photocurable substituent to the aliphatic substituent being 2: 6 to 6: 2.
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Description

Technical Field

[0001] The present invention relates to a curable composition, a film, and a display device. Background Art

[0002] With the progress of technology, the applications of curable compositions have been continuously expanding according to their preparation characteristics and structural characteristics.

[0003] As an example, curable compositions are used in electronic devices such as semiconductor devices or display devices. As a specific example, curable compositions can be used to cover at least one area of a display device or encapsulate a display device.

[0004] On the other hand, for these display devices having organic light-emitting devices, the characteristics of the encapsulation portion that can block the inflow of external gases or moisture are very important, and curable compositions can also be effectively used for such encapsulation portions.

[0005] When a film using a curable composition is used for an encapsulation portion or various electronic devices, there are limitations in controlling precise preparation characteristics and electrical interference with adjacent components. Summary of the Invention

[0006] Problems to be Solved by the Invention

[0007] The present invention can provide a composition for curing, whose preparation process characteristics and various properties after curing are improved.

[0008] One object of the present invention is to provide a curable composition, which includes a photocurable monomer, a photoinitiator, and a silicon-based additive. Among them, the silicon-based additive includes a photocurable substituent and an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent is 2:6 to 6:2.

[0009] Another object of the present invention is to provide a film prepared using the curable composition.

[0010] Still another object of the present invention is to provide a display device including the film.

[0011] Means for Solving the Problems

[0012] To achieve the above object, an embodiment of the present invention provides a curable composition, which includes a photocurable monomer, a photoinitiator, and a silicon-based additive. Among them, the silicon-based additive includes a photocurable substituent and an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent is 2:6 to 6:2.

[0013] In an embodiment of the present invention, the silicon-based additive may include a siloxane structure.

[0014] In one embodiment of the present invention, the silicon-based additive may include a cage-shaped or ladder-shaped silicone structure.

[0015] In one embodiment of the present invention, the silicon-based additive may be the following Chemical Formula 1:

[0016] [Chemical Formula 1]

[0017] (RSiO 3 / 2 ) n ;

[0018] In Chemical Formula 1, n is an integer greater than or equal to 1, and R is a photocurable substituent or an aliphatic substituent. At this time, the ratio of the photocurable substituent to the aliphatic substituent may be 2:6 to 6:2.

[0019] In one embodiment of the present invention, the silicon-based additive may be the following Chemical Formula 2:

[0020] [Chemical Formula 2]

[0021]

[0022] In Chemical Formula 2, R is a photocurable substituent or an aliphatic substituent. At this time, the ratio of the photocurable substituent to the aliphatic substituent may be 2:6 to 6:2.

[0023] In one embodiment of the present invention, the photocurable substituent may include an acrylate structure, and the aliphatic substituent may be a C 1-20 alkyl group or a C 5-20 cycloalkyl group.

[0024] In one embodiment of the present invention, the photocurable monomer may include the following Chemical Formula 3:

[0025] [Chemical Formula 3]

[0026]

[0027] In Chemical Formula 3, R1 may be hydrogen or a C 1-5 alkyl group, and R2 may be a C 1-25 alkyl group or a C 3-25 cycloalkyl group.

[0028] In one embodiment of the present invention, the photocurable monomer is a heterogeneous photocurable monomer, and the weight ratio of the heterogeneous photocurable monomer may be 1:3 to 1:20.

[0029] In one embodiment of the present invention, the curable composition may further include a difunctional or more functional photocurable monomer.

[0030] In one embodiment of the present invention, the curable composition may further include a tackifier.

[0031] In one embodiment of the present invention, the viscosity of the curable composition may be from 10 cPs to 30 cPs.

[0032] In one embodiment of the present invention, the out-gas amount of the coating film prepared from the curable composition may be 100 ppm or less.

[0033] In one embodiment of the present invention, the dielectric constant of the coating film prepared from the curable composition may be less than 2.7ε r 。

[0034] Another embodiment of the present invention provides a thin film prepared using the curable composition.

[0035] Yet another embodiment of the present invention provides a display device including the thin film.

[0036] Advantages of the Invention

[0037] The composition according to the present invention is a low-viscosity, solvent-free composition, which is convenient for the inkjet process, has a low out-gas amount of the cured product, and can provide a low-dielectric organic thin film encapsulation composition having durability when forming a second inorganic film.

[0038] The composition of the present invention has improved preparation process characteristics, whereby various properties can be improved after curing. In addition, a thin film and a display device including the thin film can be easily realized by the composition of the present invention. Description of the Drawings

[0039] Figure 1 Schematic diagrams of a thin film prepared using the curable composition according to the present invention and a display device including the thin film.

[0040] Figure 2 An enlarged view of a thin film according to an embodiment of the present invention.

[0041] Figure 3 An enlarged view of a thin film according to another embodiment of the present invention.

[0042] Description of Reference Numerals

[0043] 10: Display device

[0044] 100: Substrate

[0045] 110: Display unit

[0046] 120: Thin film

[0047] 200: Inorganic film

[0048] 210: Organic film Detailed implementation manners

[0049] An embodiment of the present invention is shown in the accompanying drawings. However, the present creative concept can be embodied in many different forms and should not be construed as limited to the embodiments described in this specification. On the contrary, these embodiments are provided to make the present disclosure more comprehensive and complete, and to fully convey the scope of the present creative concept to those of ordinary skill in the art. The same reference numerals denote the same components.

[0050] The terms used in this specification are only for describing specific embodiments and are not intended to limit the present creative concept. Unless otherwise clearly indicated by the context, the singular forms used in this specification should be construed to include the plural forms of "at least one". "At least one" should not be construed as limited to the singular. As used herein, the term "and / or" includes any combination of one or more of the listed items. As used herein, the terms "comprises" and / or "comprising" specify the presence of the described features, regions, integers, steps, operations, components, and / or elements, but do not preclude the presence or addition of one or more other features, regions, integers, steps, operations, components, elements, and / or combinations thereof.

[0051] Unless otherwise clearly defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which this disclosure belongs. It should also be understood that terms defined in commonly used dictionaries should be construed to have a meaning consistent with the meaning in the context of the relevant art and this disclosure, and should not be construed as idealized or overly formal.

[0052] Although specific embodiments have been described, applicants or those skilled in the art may encounter alternatives, modifications, variations, improvements, and substantial equivalents that are currently unforeseen or cannot be foreseen. Therefore, the appended claims that have been filed and their possible modifications are intended to cover all such alternatives, modifications, variations, improvements, and substantial equivalents.

[0053] In the following embodiments, terms such as "first", "second", etc. are only used to distinguish different components and do not have any limiting meaning.

[0054] In the following embodiments, singular expressions include plural expressions unless otherwise clearly stated in the context.

[0055] In the drawings, for the sake of explanation, the dimensions of the components may be exaggerated or reduced. For example, the dimensions and thicknesses of the components shown in the drawings are arbitrarily shown only for the convenience of illustration, and the present invention is not limited to what is shown.

[0056] In the following embodiments, the x-axis, y-axis, and z-axis are not limited to the three axes in an orthogonal coordinate system, but can be interpreted in a broader sense including them. For example, the x-axis, y-axis, and z-axis can be orthogonal to each other, or can indicate different directions that are not orthogonal to each other.

[0057] In some embodiments, if other methods can be adopted, the execution order of a specific process can be different from the described order. For example, two consecutively described steps can be substantially carried out simultaneously, or can be carried out in the reverse order of the described order.

[0058] The curable composition according to an embodiment of the present invention may include a photocurable monomer, a photoinitiator, and a silicon-based additive.

[0059] The silicon-based additive may include a siloxane structure. If it is a siloxane structure, it has excellent thermal stability and good miscibility with other components, thus having the advantage of being easy to prepare the composition. The siloxane structure can be cage-type or ladder-type. Generally, cage-type siloxane has a more excellent dielectric constant than ladder-type siloxane, but the dielectric constant may vary depending on the type or ratio of the substituents on the siloxane.

[0060] According to an embodiment of the present invention, the silicon-based additive may be the following Chemical Formula 1:

[0061] [Chemical Formula 1]

[0062] (RSiO 3 / 2 ) n ;

[0063] In the Chemical Formula 1,

[0064] n can be an integer greater than or equal to 1, preferably an integer from 1 to 20, more preferably an integer from 5 to 10.

[0065] R can be a photocurable substituent or an aliphatic substituent.

[0066] The ratio of the photocurable substituent to the aliphatic substituent can be 2:6 to 6:2; 2:6 to 5:3; 2:6 to 4:4; 2:6 to 3:5; 3:5 to 6:2; 3:5 to 5:3; 3:5 to 4:4; 4:4 to 6:2; 4:4 to 5:3; or 5:3 to 6:2. Depending on the ratio of the substituents, the dielectric constant or the durability during the second film formation may change.

[0067] According to an embodiment of the present invention, the silicon-based additive may be the following Chemical Formula 2:

[0068] [Chemical Formula 2]

[0069]

[0070] In the formula (2),

[0071] R may be a photocurable substituent or an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent may be the same as that in the aforementioned formula (1), or may be modified as needed and applied, which will not be elaborated herein.

[0072] As used herein, the term “(meth)acrylic acid” refers to acrylic acid and / or methacrylic acid.

[0073] The photocurable substituent may include an acrylate structure, in which case the viscosity is low and the compatibility with other components is excellent. In addition, the acrylate may include at least one of a non-sulfur-based (meth)acrylate that does not contain sulfur, a non-aromatic (meth)acrylate that does not have an aromatic group, and an aromatic (meth)acrylate that has an aromatic group.

[0074] The non-aromatic (meth)acrylate may be a (meth)acrylate having a substituted or unsubstituted C 1-20 alkyl group. Specifically, the non-aromatic (meth)acrylate may be a (meth)acrylate having an unsubstituted straight-chain C 1-20 alkyl group, and more specifically, a mono(meth)acrylate having an unsubstituted straight-chain C 10-20 alkyl group. For example, the non-aromatic mono(meth)acrylate may include, but is not limited to, one or more of the following: decyl (meth)acrylate, undecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, tetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, heptadecyl (meth)acrylate, octadecyl (meth)acrylate, nonadecyl (meth)acrylate, arachidyl (meth)acrylate, stearyl (meth)acrylate, 2-octyl-1-dodecyl (meth)acrylate, isobornyl (meth)acrylate.

[0075] The aromatic (meth)acrylate may include a (meth)acrylate having an aromatic group. The aromatic (meth)acrylate may include a (meth)acrylate having a substituted or unsubstituted aromatic group. At this time, the “aromatic group” refers to a polycyclic aromatic group including a monocyclic or fused form, etc., or a form in which a monocyclic ring is connected by a σ bond. For example, the aromatic group may refer to a substituted or unsubstituted C 6-50 aryl group, a substituted or unsubstituted C 7-50 arylalkyl group, a substituted or unsubstituted C 3-50 heteroaryl group, a substituted or unsubstituted C3-50 One or more of heteroarylalkyls. More specifically, the aromatic group can be one or more of phenyl, biphenyl, terphenyl, quaterphenyl, naphthyl, anthracenyl, phenanthryl, chrycenyl, triphenylenyl, tetracenyl, pyrenyl, benzopyrenyl, pentacenyl, coronenyl, ovalenyl, corannulenyl, benzyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, triazinyl, quinolinyl, isoquinolinyl, quinoxalinyl, acridinyl, quinazolinyl, cinnolinyl, phthalazinyl, thiazolyl, benzothiazolyl, isoxazolyl, benzisoxazolyl, oxazolyl, benzoxazolyl, pyrazolyl, indazolyl, imidazolyl, benzimidazolyl, purinyl, thienyl, benzothienyl, furyl, benzofuryl, isobenzofuryl.

[0076] The aliphatic substituent, as an acyclic or cyclic non-aromatic carbon compound, can be C 1-20 alkyl or C 5-20 cycloalkyl. Preferably, in order to reduce the dielectric constant, it can be cycloalkyl, but is not particularly limited thereto.

[0077] The alkyl, unless otherwise clearly stated, can be straight-chain or branched-chain, and the number of carbon atoms is not particularly limited, but can be 1 to 40. According to one embodiment, the number of carbon atoms of the alkyl is 1 to 20. According to another embodiment, the number of carbon atoms of the alkyl is 1 to 10. According to yet another embodiment, the number of carbon atoms of the alkyl is 1 to 6. Specific examples of the alkyl include, but are not limited to, methyl, ethyl, propyl, n-propyl, isopropyl, butyl, n-butyl, isobutyl, tert-butyl, sec-butyl, 1-methylbutyl, 1-ethylbutyl, pentyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, hexyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, heptyl, n-heptyl, 1-methylhexyl, cyclopentylmethyl, cyclohexylmethyl, octyl, n-octyl, tert-octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, nonyl, 2,2-dimethylheptyl, 1-ethylpropyl, 1,1-dimethylpropyl, isohexyl, 2-methylpentyl, 4-methylhexyl, 5-methylhexyl, etc.

[0078] The number of carbon atoms of the cycloalkyl group may be 5 to 60, but is not particularly limited. According to one embodiment, the number of carbon atoms of the cycloalkyl group is 5 to 30. According to another embodiment, the number of carbon atoms of the cycloalkyl group is 5 to 20. Specifically, it includes but is not limited to cyclopropyl, cyclobutyl, cyclopentyl, 3-methylcyclopentyl, 2,3-dimethylcyclopentyl, cyclohexyl, 3-methylcyclohexyl, 4-methylcyclohexyl, 2,3-dimethylcyclohexyl, 3,4,5-trimethylcyclohexyl, 4-tert-butylcyclohexyl, cycloheptyl, cyclooctyl, etc.

[0079] Based on the total weight of the composition, the content of the silicon-based additive of Formula 1 or Formula 2 may be 5% to 15%; 6% to 15%; 7% to 15%; 8% to 15%; 9% to 15%; 5% to 14%; 6% to 14%; 7% to 14%; 8% to 14%; 9% to 14%; 5% to 13%; 6% to 13%; 7% to 13%; 8% to 13%; 9% to 13%; 5% to 12%; 6% to 12%; 7% to 12%; 8% to 12%; 9% to 12%; 5% to 11%; 6% to 11%; 7% to 11%; 8% to 11%; 9% to 11%; 5% to 10%; 6% to 10%; 7% to 10%; 8% to 10%; or 9% to 10%, by weight.

[0080] Based on the total weight of the curable composition, when the content of the silicon-based additive is 5% by weight to 15% by weight, it is easy to ensure the low dielectric properties of the cured product, and the photocuring of the curable composition becomes easy, so that a film can be formed efficiently.

[0081] On the other hand, the photocurable monomer may include the following Formula 3:

[0082] [Formula 3]

[0083]

[0084] In the Formula 3,

[0085] R1 is hydrogen or C 1-5 alkyl,

[0086] R2 may be C 1-25 alkyl or C 3-25 cycloalkyl. When R2 is alkyl, since its freezing point is higher than that in the straight-chain form, it will solidify at room temperature, resulting in reduced storage stability, and a higher content may be required to reduce the dielectric constant. Therefore, R2 is preferably cycloalkyl, but it can be modified to optimize effects such as the dielectric constant, and is not limited thereto.

[0087] The alkyl and cycloalkyl groups are the same as those in the above embodiments, or can be modified for application as needed, and specific descriptions are not repeated here. Additionally, an embodiment of Formula 3 can be the same as the description of the above acrylate, or can be modified for application as needed.

[0088] Based on the total weight of the composition, in weight %, the content of the photocurable monomer of Formula 3 can be 50% to 80%; 55% to 80%; 60% to 80%; 65% to 80%; 50% to 75%; 55% to 75%; 60% to 75%; 65% to 75%; 50% to 70%; 55% to 70%; 60% to 70%; or 65% to 70%.

[0089] Based on the total weight of the composition, when the content of the photocurable monomer is 50 wt% to 80 wt%, inkjet spraying can be easily performed, and the amount of gas leakage can be reduced.

[0090] To reduce the dielectric constant, the photocurable monomer can include a different photocurable monomer, and the weight % ratio of the different photocurable monomer can be 1:3 to 1:20; 1:5 to 1:20; 1:10 to 1:20; 1:15 to 1:20; 1:3 to 1:15; 1:5 to 1:15; 1:10 to 1:15; 1:3 to 1:10; or 1:5 to 1:10.

[0091] The different photocurable monomer can include a photocurable monomer in which R2 in Formula 3 is C 1-25 alkyl and a photocurable monomer in which R2 in Formula 3 is C 3-25 cycloalkyl.

[0092] In an embodiment of the present invention, a difunctional or more functional photocurable monomer can also be included.

[0093] The polyfunctional photocurable monomer can be the same as the photocurable monomer in the above embodiments, or can be modified for application as needed. Specifically, it can be trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane trimethacrylate, ethoxylated trimethylolpropane triacrylate, pentaerythritol trimethacrylate, pentaerythritol triacrylate, but is not limited thereto.

[0094] Based on the total weight of the composition, in % by weight, the content of the polyfunctional photocurable monomer can be 10% to 30%; 12% to 30%; 15% to 30%; 17% to 30%; 20% to 30%; 10% to 27%; 12% to 27%; 15% to 27%; 17% to 27%; 20% to 27%; 10% to 25%; 12% to 25%; 15% to 25%; 17% to 25%; 20% to 25%; 10% to 22%; 12% to 22%; 15% to 22%; 17% to 22%; 20% to 22%; 10% to 20%; 12% to 20%; 15% to 20%; or 17% to 20%.

[0095] Based on the total weight of the curable composition, in % by weight, when the content of the polyfunctional photocurable monomer is 10% to 30%, the inkjet ejection performance can be improved and the outgassing amount can be reduced.

[0096] On the other hand, any photocuring initiator capable of effectively promoting the photocrosslinking of the photocurable monomer and the polyfunctional photocurable monomer can be used.

[0097] As the photocuring initiator, acetophenone-based, benzophenone-based, thioxanthone-based, and benzoin-based initiators can be used. Further, a combination of two or more of these initiators can be used.

[0098] That is, the photocuring initiator can include a mixture of two or more photocuring initiators. When the photocuring initiator includes a mixture of two or more photocuring initiators, the effects of surface curing and deep curing can be achieved.

[0099] As specific photoinitiators, acetophenone, hydroxy dimethyl acetophenone, dimethylamino acetophenone, dimethoxy-2-phenyl acetophenone, 3-methyl-acetophenone, 2,2-dimethoxy-2-phenyl acetophenone, 2,2-ethoxy-2-phenyl acetophenone, 4-chronolocetophenone, 4,4-dimethoxy-acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4-hydroxycyclohexyl phenyl ketone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-propan-1-one, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl)ketone, benzophenone, p-phenyl benzophenone, 4,4-diamino benzophenone, 4,4'-diethylamino benzophenone, 4,4'-diethylaminobenzophenone), dichloro-benzophenone, anthraquinone, 2-methyl anthraquinone, 2-ethylanthraquinone, 2-t-butyl-anthraquinone, 2-amino-anthraquinone, 2-methyl thioxanthone, 2-ethyl thioxanthone, 2-chloro thioxanthone, 2,4-dimethyl thioxanthone, 2,4-diethyl thioxanthone, 2-isopropylthioxanthone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, diphenyl ketone, benzyldimethyl ketal, acetophenone dimethyl ketal, p-dimethylaminobenzoic acid ester, 4,6-trimethylbenzoyl diphenylphosphine oxide, phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, fluorene, triphenylamine, carbazole, etc.,

[0100] The trade names of the photoinitiators that can be used include darocur 1173, darocur 4265, darocur BP, darocur TPO, darocur MBF, irgacure184, irgacure 500, irgacure 2959, irgacure 754, irgacure 651, irgacure 369, irgacure 907, irgacure1300, irgacure 819, irgacure 2022, irgacure 2959, irgacure2100, irgacure 784, irgacure 250, etc. from IGM Resin Company. These can be used alone or in combination of two or more.

[0101] As an alternative embodiment, the photoinitiator can initiate photocuring by light with a wavelength of 300 nm to 400 nm, or 385 nm to 395 nm, such as UV light with the said wavelength.

[0102] As a specific example, the photoinitiator can be an initiator that initiates photocuring by a UV lamp within the wavelength range of 300 nm to 400 nm, or 385 nm to 395 nm, which is the wavelength range of the UV lamp used when forming the organic film encapsulation.

[0103] For example, the curable composition of one embodiment can include a thioxanthone-based initiator and a benzoin-based initiator.

[0104] More specifically, the organic film encapsulation composition of one embodiment can use phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide and 2-isopropylthioxanthone in combination.

[0105] Based on the total weight of the composition, the content of the photoinitiator can be 0.5% to 5%; 1% to 5%; 2% to 5%; 0.5% to 4.5%; 1% to 4.5%; 2% to 4.5%; 0.5% to 4%; 1% to 4%; 2% to 4%; 0.5% to 3%; 1% to 3%; 2% to 3%; 0.5% to 2.5%; 1% to 2.5%; or 2% to 2.5% by weight.

[0106] Based on the total weight of the composition, when the curable composition includes 0.5% to 5% by weight of the photoinitiator, photocuring can proceed smoothly and the gas evolution amount can be reduced.

[0107] In one embodiment of the present invention, a tackifier can also be included.

[0108] The tackifier is intended to improve the adhesion to ordinary bare glass or an inorganic layer.

[0109] In one embodiment, a silane-based substance can be used as the tackifier. A substance having a (meth)acrylate group can be used as the silane-based substance. For example, 3-(trimethoxysilyl)propyl Acrylate, 3-[diethoxy(methyl)silyl]propyl(meth)acrylate, 3-(trimethoxysilyl)propyl(meth)acrylate, 3-[tris(trimethylsilyloxy)silyl]propyl(meth)acrylate, 3-[dimethoxy(methyl)silyl]propyl(meth)acrylate, 3-(triallylsilyl)propyl acrylate, etc. can be used.

[0110] As other tackifiers, a tackifier having an amino group or a tackifier having a phosphate group, etc. can be used. As the tackifier having a phosphate group, bis[2-(methacryloyloxy)ethyl]phosphate, bis[2-(acryloyloxy)ethyl]phosphate, 2-Methacryloyloxyethyl acid phosphate, 2-acryloyloxyethyl acid phosphate, etc. can be used.

[0111] Based on the total weight of the composition, the content of the tackifier may be 0.1% to 3% by weight; 0.11% to 3% by weight; 0.12% to 3% by weight; 0.13% to 3% by weight; 0.14% to 3% by weight; 0.15% to 3% by weight; 0.16% to 3% by weight; 0.17% to 3% by weight; 0.18% to 3% by weight; 0.19% to 3% by weight; 0.2% to 3% by weight; 0.1% to 2% by weight; 0.11% to 2% by weight; 0.12% to 2% by weight; 0.13% to 2% by weight; 0.14% to 2% by weight; 0.15% to 2% by weight; 0.16% to 2% by weight; 0.17% to 2% by weight; 0.18% to 2% by weight; 0.19% to 2% by weight; 0.2% to 2% by weight; 0.1% to 1% by weight; 0.11% to 1% by weight; 0.12% to 1% by weight; 0.13% to 1% by weight; 0.14% to 1% by weight; 0.15% to 1% by weight; 0.16% to 1% by weight; 0.17% to 1% by weight; 0.18% to 1% by weight; 0.19% to 1% by weight; 0.2% to 1% by weight; 0.1% to 0.5% by weight; 0.11% to 0.5% by weight; 0.12% to 0.5% by weight; 0.13% to 0.5% by weight; 0.14% to 0.5% by weight; 0.15% to 0.5% by weight; 0.16% to 0.5% by weight; 0.17% to 0.5% by weight; 0.18% to 0.5% by weight; 0.19% to 0.5% by weight; or 0.2% to 0.5% by weight.

[0112] Based on the total weight of the curable composition, when including 0.1% to 3% by weight of the tackifier, sufficient adhesion of the photocured product to the inorganic layer can be ensured.

[0113] The viscosity of the curable composition according to an embodiment of the present invention may be 10 cPs to 30 cPs; 10 cPs to 25 cPs; 10 cPs to 20 cPs; 10 cPs to 15 cPs; 15 cPs to 30 cPs; 15 cPs to 25 cPs; 15 cPs to 20 cPs; or 20 cPs to 30 cPs. As described above, since the curable composition according to an embodiment of the present invention is a low-viscosity substance with a viscosity between 10 cPs and 30 cPs, the ejectability in the inkjet head can be ensured, and thus it can be formed by inkjet printing.

[0114] The outgassing amount of the coating film prepared using the curable composition according to an embodiment of the present invention may be 100 ppm or less; 90 ppm or less; 80 ppm or less; 70 ppm or less; 65 ppm or less; 60 ppm or less; or 30 ppm to 100 ppm. As described above, the outgassing amount of the coating film prepared using the curable composition according to an embodiment of the present invention is low, thereby effectively improving the performance and lifespan.

[0115] The dielectric constant of the coating film prepared using the curable composition according to an embodiment of the present invention may be less than 2.7ε r ; greater than or equal to 2.65εr ; greater than or equal to 2.6ε r ; or greater than or equal to 2.3ε r and less than 2.7ε r . Accordingly, the electrical noise generated in the display can be reduced, and touch misoperations can be reduced.

[0116] An embodiment of the present invention provides a film prepared using the curable composition and a display device including the film.

[0117] Figure 1 Illustrated is a film prepared using the curable composition and a display device including the film.

[0118] According to Figure 1 , the display device 10 may include a substrate 100 and a display unit 110, and the display unit 110 may be located on the substrate 100. The display unit 110 may have an organic light-emitting device, and the film 120 may cover at least one surface of the organic light-emitting device.

[0119] Figure 2 is an enlarged view of the film according to an embodiment.

[0120] According to Figure 2 , the film 120 may include an inorganic film 200 and an organic film 210, and the organic film 210 may include the curable composition.

[0121] Figure 3 is an enlarged view of the film according to an alternative embodiment.

[0122] According to Figure 3 , the film 120 may include an inorganic film 200 and an organic film 210. For ease of illustration, 2 inorganic films 200 and 2 organic films 210 are shown stacked in sequence, but the number or stacking order of the inorganic and organic films is not particularly limited.

[0123] As described above, using a film including the curable composition of the present invention in a display device can reduce the outgassing amount in the organic film, increase the adhesion in the inorganic film, and easily ensure the transparency characteristics of front emission. In addition, the ejection property of inkjet can be ensured through the low viscosity property, and noise can be effectively reduced through the low dielectric constant property. Specific Examples

[0125] Hereinafter, the present invention will be described in detail through Synthesis Examples, Examples, and Experimental Examples.

[0126] It should be noted that the following Synthesis Examples, Examples, and Experimental Examples are only used to specifically illustrate one aspect of the present invention, and the present invention is not limited thereto.

[0127] <Synthesis Example 1>

[0128] 19.35 g of hexyl trimethoxysilane, 23.28 g of methacryloxypropyl trimethoxysilane and 165 g of tetrahydrofuran were mixed and stirred. A solution prepared by mixing 0.5 g of cesium hydroxide solution (50 wt% in H2O) and 5 g of water was slowly added dropwise to this solution. The mixture was stirred at 75 °C for 6 hours. After cooling the reaction product, 1 g of acetic acid was added for neutralization. The organic layer was extracted with methylene chloride and water, and after removing water with magnesium sulfate, the solution was dried under reduced pressure to prepare a silsesquioxane with a cage structure having methacrylate and hexyl substituents. The GPC measurement results showed Mw 1635, Mn 1447, Mw / Mn 1.13, and the 1H NMR results confirmed that the ratio of the synthesized methacrylate to hexyl was 4.1:3.9.

[0129] <Synthesis Example 2>

[0130] A silsesquioxane with a cage structure having methacrylate and decyl substituents was prepared in the same manner as in Synthesis Example 1, except that 24.61 g of decyl trimethoxysilane was used instead of 19.35 g of hexyl trimethoxysilane. The GPC measurement results showed Mw 2460, Mn 2158, Mw / Mn 1.14, and the 1H NMR results confirmed that the ratio of the synthesized methacrylate to decyl was 3.95:4.05.

[0131] <Synthesis Example 3>

[0132] A cage-structured silsesquioxane with methacrylate and cyclohexyl substituents was prepared in the same manner as in Synthesis Example 1, except that 19.16 g of cyclohexyl trimethoxysilane was used instead of 19.35 g of hexyl trimethoxysilane. The GPC measurement results showed Mw 1670, Mn 1478, and Mw / Mn 1.13. The 1H NMR results confirmed that the ratio of the synthesized methacrylate to cyclohexyl was 4.02:3.98.

[0133] <Synthesis Example 4>

[0134] A cage-structured silsesquioxane with methacrylate and cyclohexyl substituents was prepared in the same manner as in Synthesis Example 1, except that 23.95 g of cyclohexyl trimethoxysilane and 17.46 g of methacryloxypropyl trimethoxysilane were used. The GPC measurement results showed Mw 1575, Mn 1355, and Mw / Mn 1.16. The 1H NMR results confirmed that the ratio of the synthesized methacrylate to cyclohexyl was 2.92:5.08.

[0135] <Synthesis Example 5>

[0136] A cage-structured silsesquioxane with methacrylate and cyclohexyl substituents was prepared in the same manner as in Synthesis Example 1, except that 14.37 g of cyclohexyl trimethoxysilane and 29.10 g of methacryloxypropyl trimethoxysilane were used. The GPC measurement results showed Mw 1758, Mn 1529, and Mw / Mn 1.15. The 1H NMR results confirmed that the ratio of the synthesized methacrylate to cyclohexyl was 4.87:3.13.

[0137] <Synthesis Example 6>

[0138] Except for using 28.74 g of cyclohexyl trimethoxysilane and 11.64 g of methacryloxypropyl trimethoxysilane, a cage-structured silsesquioxane with methacrylate and cyclohexyl substituents was prepared in the same manner as in Synthesis Example 1. The GPC measurement results showed Mw 1476, Mn 1189, and Mw / Mn 1.24. The 1H NMR results confirmed that the ratio of the synthesized methacrylate to cyclohexyl was 1.95:6.05.

[0139] <Synthesis Example 7>

[0140] Except for using 9.58 g of cyclohexyl trimethoxysilane and 34.92 g of methacryloxypropyl trimethoxysilane, a cage-structured silsesquioxane with methacrylate and cyclohexyl substituents was prepared in the same manner as in Synthesis Example 1. The GPC measurement results showed Mw 1848, Mn 1625, and Mw / Mn 1.14. The 1H NMR results confirmed that the ratio of the synthesized methacrylate to cyclohexyl was 6.02:1.98.

[0141] <Synthesis Example 8>

[0142] 23.95 g of cyclohexyl trimethoxysilane, 17.46 g of methacryloxypropyl trimethoxysilane and 20 g of tetrahydrofuran were mixed and stirred. A solution prepared by mixing 0.1 g of potassium carbonate and 11 g of water was slowly added dropwise to this solution. The mixture was stirred at room temperature for 96 hours. The organic layer was extracted with methylene chloride and water, and after removing water with magnesium sulfate, the solution was dried under reduced pressure to prepare a silsesquioxane having a ladder structure with methacrylate and cyclohexyl substituents. The GPC measurement results showed Mw 4326, Mn 3047, and Mw / Mn 1.42, and the 1H NMR results confirmed that the ratio of the synthesized methacrylate to cyclohexyl was 2.98:5.02.

[0143] <Example 1>

[0144] 6.27 g of 2-octyl-1-dodecanyl methacrylate was stirred with 0.5 g of isobornyl methacrylate, 2.0 g of trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 1, 0.2 g of phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-isopropylthioxanthone, and 0.02 g of bis[2-(methacryloyloxy)ethyl]phosphate to prepare a photocurable composition.

[0145] <Example 2>

[0146] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 2, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0147] <Example 3>

[0148] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 3, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0149] <Example 4>

[0150] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 4, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0151] <Example 5>

[0152] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 5, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0153] <Example 6>

[0154] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 8, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0155] <Example 7>

[0156] 6.77 g of 2-octyl-1-dodecanyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 4, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0157] <Example 8>

[0158] 5.77 g of 2-octyl-1-dodecanyl methacrylate, 1.0 g of Isobornyl methacrylate, 2.0 g of Trimethylolpropane trimethacrylate, 0.98 g of the silsesquioxane of Synthesis Example 4, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0159] <Example 9>

[0160] 6.27 g of Isostearyl methacrylate, 0.5 g of Isobornyl methacrylate, 0.98 g of the silsesquioxane of Synthesis Example 4, 2.0 g of Trimethylolpropane trimethacrylate, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropyl thioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0161] <Example 10>

[0162] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of dicyclopentanyl methacrylate, 0.98 g of the silsesquioxane of Synthesis Example 4, 2.0 g of trimethylolpropane trimethacrylate, 0.2 g of phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-isopropylthioxanthone, and 0.02 g of bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0163] <Comparative Example 1>

[0164] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of isobornyl methacrylate, 2.98 g of trimethylolpropane trimethacrylate, 0.2 g of phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-isopropylthioxanthone, and 0.02 g of bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0165] <Comparative Example 2>

[0166] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 0.98 g of the silsesquioxane of Synthesis Example 6, 2.0 g of Trimethylolpropanetrimethacrylate, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0167] <Comparative Example 3>

[0168] 6.27 g of 2-octyl-1-dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 0.98 g of the silsesquioxane of Synthesis Example 7, 2.0 g of Trimethylolpropanetrimethacrylate, 0.2 g of Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, 0.03 g of 2-Isopropylthioxanthone, and 0.02 g of Bis[2-(methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0169] <Reference Example 1>

[0170] 6.27 g of 2 - octyl - 1 - dodecanyl methacrylate, 0.5 g of Isobornyl methacrylate, 2.98 g of the silsesquioxane of Synthesis Example 4, 0.2 g of Phenylbis(2,4,6 - trimethylbenzoyl)phosphine oxide, 0.03 g of 2 - Isopropylthioxanthone, and 0.02 g of Bis[2 - (methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0171] <Reference Example 2>

[0172] 3.77 g of 2 - octyl - 1 - dodecanyl methacrylate, 3.0 g of Isobornyl methacrylate, 0.98 g of the silsesquioxane of Synthesis Example 4, 2.0 g of Trimethylolpropanetrimethacrylate, 0.2 g of Phenylbis(2,4,6 - trimethylbenzoyl)phosphine oxide, 0.03 g of 2 - Isopropylthioxanthone, and 0.02 g of Bis[2 - (methacryloyloxy)ethyl]phosphate were stirred to prepare a photocurable composition.

[0173] <Experimental Example 1> Measurement of Viscosity

[0174] The viscosities of the compositions prepared in the Examples, Comparative Examples, and Reference Examples were measured at 25°C using a Brookfield LVT viscometer.

[0175] The measurement results are shown in Table 1 below.

[0176] [Table 1]

[0177] Viscosity (cPs) Example 1 20 Example 2 21 Example 3 20 Example 4 19 Example 5 18 Example 6 25 Example 7 20 Example 8 17 Example 9 16 Example 10 19 Comparative Example 1 16 Comparative Example 2 20 Comparative Example 3 17 Reference Example 1 25 Reference Example 2 12

[0178] As shown in Table 1 above, since the curable composition according to the present invention is a low-viscosity substance with a viscosity between 10 cPs and 30 cPs, the ejectability in the inkjet head can be ensured, and thus it can be applied to be formed by inkjet printing.

[0179] <Experimental Example 2> Measurement of Gas Evolution

[0180] The compositions prepared in the examples, comparative examples, and reference examples were coated on bare glass to a thickness of 5 μm using a spin coater, and then irradiated with a 395 nm UV LED at 1000 mW / cm 2 to prepare a cured coating film. The obtained glass was cut into pieces of 1 cm × 6 cm, and then the gas evolution was analyzed using a purge and trap-gas chromatography / mass spectrometry (Purge&Trap GC / Mass, manufactured by JAI). Table 2 below shows the detailed analysis conditions, and Table 3 shows the experimental results.

[0181] [Table 2]

[0182]

[0183]

[0184] [Table 3]

[0185]

[0186]

[0187] As can be seen from Table 3 above, the gas evolution of the coating films prepared using the curable composition according to the present invention is mostly 100 ppm or less. Therefore, the performance and lifespan of electronic devices including the thin films prepared from the composition of the present invention can be improved. In addition, as described above, as an example, when the thin film of a display device includes an organic film prepared from the composition of the present invention, the performance and lifespan of the display device will be improved. As a specific example, the performance and lifespan characteristics of the organic light-emitting devices in the display portion of the display device can be easily improved.

[0188] <Experimental Example 3> Durability Analysis during the Second Inorganic Film Formation

[0189] When analyzing the durability during the second inorganic film formation, the following process was used to prepare the coating film: The compositions prepared in the examples, comparative examples, and reference examples were coated on a wafer to a thickness of about 8 μm using a spin coater, and then irradiated with a 395 nm UV LED at 1000 mW / cm 2Irradiation was carried out to prepare a coating film. An SiNx inorganic film was deposited on the obtained coating film by the PECVD process. The deposition conditions were as follows: SiH4 and NH3 gases, Power 5 kW, Pressure 0.8 Torr, compressive stress -500 MPa. After the process was executed, the surface of the organic film was measured using a profilometer (KLAP-7). When the Ra (average roughness) value was less than 5 nm, it was denoted as ◎, when it was between 5 nm and 20 nm, it was denoted as ○, and when it exceeded 20 nm, it was denoted as X. The results are shown in Table 4 below.

[0190] [Table 4]

[0191]

[0192]

[0193] As shown in Table 4 above, the coating film prepared from the curable composition according to the present invention did not produce wrinkles in most cases during the second film formation. Therefore, the thin film including the curable composition according to the present invention is in close contact with the inorganic film during the second film formation, does not produce wrinkles, and the thin film has excellent durability and other characteristics.

[0194] <Experimental Example 4> Measurement of Dielectric Constant

[0195] The compositions prepared in the examples, comparative examples, and reference examples were coated on a lower electrode (low-resistance wafer) with a thickness of about 8 μm using a spin coater, and then irradiated with 395 nm UV LED at 1000 mW / cm 2 to prepare a coating film. A metal mask with an electrode size of 3 mm × 3 mm was covered on the prepared coating film, and then an upper electrode (Pt) was coated using the sputter method. A frequency of 1 kHz to 1 MHz was applied to the formed upper and lower electrodes, and the change in capacitance was measured. (Using the Semiconductor Device Analyzer, B1500A of Agilent Corporation) In order to measure the dielectric constant, the actual thickness of the coating film was measured using a scanning electron microscope (SEM). The measurement results are shown in Table 5 below.

[0196] [Table 5]

[0197]

[0198]

[0199] As shown in Table 5 above, the dielectric constant varies depending on factors such as the siloxane structure of the silicon-based additive and the ratio of substituents. The dielectric constant of the coating film prepared from the curable composition of the present invention is less than 2.70ε in most cases. r . Therefore, the thin film including the curable composition according to the present invention can improve the electrical characteristics due to its lower dielectric constant. For example, it can easily reduce or prevent the electrical interference between adjacent components. As a specific example, it can reduce or prevent the electrical interference between the components involved in the transmission of electrical signals. In addition, as described above, when the thin film of the display device includes the organic film prepared from the curable composition of the present invention, it can reduce the electrical interference with other components such as the electrical devices included in the display device, thereby reducing the electrical noise generated in the display device.

[0200] In addition, as an alternative embodiment, when the touch member for identifying user touch is included in the display device or disposed adjacent to the display device, it can reduce or prevent the electrical interference between the touch member and the thin film, improve the precise control characteristics of the touch member, and thus improve the accuracy of the touch operation.

[0201] The above description of the present invention is for illustrative purposes only. Those skilled in the art should understand that the present invention can be easily modified into other specific forms without changing the technical idea or essential characteristics of the present invention. Therefore, it should be understood that the above embodiments should be considered exemplary in all aspects and not restrictive. For example, the components described as a single form can be implemented dispersedly, and similarly, the components described as dispersed can be implemented in a combined form.

[0202] The protection scope of the present invention shall be subject to the scope defined by the appended claims. All changes or modifications covered by the meaning and scope of the claims and their equivalent concepts shall be regarded as belonging to the protection scope of the present invention.

Claims

1. A curable composition, Among them, including: a photocurable monomer; a photoinitiator; and a silicon-based additive; the silicon-based additive includes a photocurable substituent and an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent is from 2:6 to 6:

2.

2. The curable composition according to claim 1, wherein, the silicon-based additive includes a siloxane structure.

3. The curable composition according to claim 2, wherein, the silicon-based additive includes a cage-type or ladder-type siloxane structure.

4. The curable composition according to claim 1, wherein, the silicon-based additive is the following Chemical Formula 1: [Chemical Formula 1] (RSiO 3 / 2 ) n ; In the Chemical Formula 1, n is an integer greater than or equal to 1, R is a photocurable substituent or an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent is from 2:6 to 6:

2.

5. The curable composition according to claim 1, wherein, the silicon-based additive is the following Chemical Formula 2: [Chemical Formula 2] In the Chemical Formula 2, R is a photocurable substituent or an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent is from 2:6 to 6:

2.

6. The curable composition according to claim 1, wherein, the photocurable substituent includes an acrylate structure, The aliphatic substituent is C 1-20 alkyl or C 5-20 cycloalkyl.

7. The curable composition according to claim 1, wherein, the photocurable monomer includes the following Chemical Formula 3: [Chemical Formula 3] In the Chemical Formula 3, R1 is hydrogen or C 1-5 alkyl group, R2 is C 1-25 alkyl or C 3-25 cycloalkyl.

8. The curable composition according to claim 1, wherein, the photocurable monomer is a heterogeneous photocurable monomer, and the weight ratio of the heterogeneous photocurable monomer is from 1:3 to 1:

20.

9. The curable composition according to claim 1, wherein, the curable composition further includes a difunctional or higher-functional photocurable monomer.

10. The curable composition according to claim 1, wherein, further including: a tackifier.

11. The curable composition according to claim 1, wherein, the viscosity of the curable composition is from 10 cPs to 30 cPs.

12. The curable composition according to claim 1, wherein, the outgassing amount of the coating film prepared from the curable composition is 100 ppm or less.

13. The curable composition according to claim 1, wherein, The dielectric constant of the coating film prepared from the curable composition is less than 2.7ε r .

14. A film prepared using the curable composition according to claim 1.

15. A display device including the film according to claim 14.