Sealing coating, method of preparation and use

Abstract

The application discloses a sealing coating, a preparation method and application. The sealing coating is attached to an alloy base body, and the sealing coating comprises a metal bonding layer and a composite structure ceramic layer which are sequentially deposited on the alloy base body. The composite structure ceramic layer comprises columnar structures and particles filled in gaps of the columnar structures. The columnar structures and the particles filled in the gaps of the columnar structures independently comprise one or more of YSZ and rare earth zirconate. The porosity of the composite structure ceramic layer is 22% to 40%. The sealing coating has high porosity, low surface Rockwell hardness and high friction coefficient, and the sealing coating has excellent wear resistance. The preparation method of the sealing coating adopts a plasma physical vapor deposition technology, and the process flow is simple.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of seal coating, and relates to a seal coating, a preparation method and application. BACKGROUND

[0002] In advanced aero-engines, the high-pressure turbine outer ring high-temperature abradable seal coating plays an important role in improving engine working efficiency, reducing oil consumption and prolonging the service life of components. A large number of studies have shown that the seal coating can reduce the gap between the turbine blade and the casing, improve the engine efficiency and reduce the oil consumption. Moreover, since the seal coating is ground as a sacrificial layer to protect the turbine blade during service, the seal coating should have good wear resistance, sufficient strength and erosion resistance to ensure that it will not be damaged by external erosion.

[0003] Zirconium-based ceramic materials have great development potential in the field of ceramic-based seal coatings due to their excellent thermal stability, high thermal expansion coefficient and other advantages. However, due to the high hardness and fracture toughness of zirconium-based ceramic materials, their structure cannot guarantee excellent friction and wear performance under low porosity conditions, and the porosity of current zirconium-based ceramic materials is relatively low. SUMMARY

[0004] In view of the problem of low porosity of the current seal coating, a seal coating, a preparation method and application are provided.

[0005] The application provides a seal coating, which is attached to an alloy substrate, and the seal coating comprises a metal bonding layer and a composite structure ceramic layer deposited on the alloy substrate in sequence,

[0006] The composite structure ceramic layer comprises columnar structures and particles filled in the gaps of the columnar structures, and the columnar structures and the particles filled in the gaps of the columnar structures each independently contain one or more of YSZ particles and rare earth zirconate particles;

[0007] The porosity of the composite structure ceramic layer is 22% to 40%.

[0008] In some embodiments, the provided seal coating satisfies one or more of the following characteristics:

[0009] (1) The volume ratio of the columnar structures in the composite structure ceramic layer is 40% to 60%;

[0010] (2) The volume ratio of the particles in the composite structure ceramic layer is 40% to 60%.

[0011] In some embodiments, the provided seal coating satisfies one or more of the following characteristics:

[0012] (1) the width of the columnar structure in the composite structure ceramic layer is 10 μm-40 μm;

[0013] (2) the average particle size of the particles in the composite structure ceramic layer is 0.5 μm-10 μm;

[0014] (3) the thickness of the composite structure ceramic layer is 100 μm-500 μm.

[0015] In some embodiments, the provided sealing coating, the metal bonding layer satisfies one or more of the following characteristics:

[0016] (1) the thickness of the metal bonding layer is 30 μm-120 μm;

[0017] (2) the material of the metal bonding layer is any one of MCrAlY or NiPtAl, the M element in MCrAlY includes one or more of Ni and Co.

[0018] In some embodiments, the provided sealing coating satisfies one or more of the following characteristics:

[0019] (1) the porosity of the composite structure ceramic layer is 30%-40%;

[0020] (2) the surface Rockwell hardness of the sealing coating is 50 HR15Y-65 HR15Y;

[0021] (3) the average friction and wear coefficient of the sealing coating under a load of 2N is 0.650-0.800.

[0022] In some embodiments, a preparation method of a sealing coating is provided, comprising the following steps:

[0023] providing an alloy substrate and depositing a metal material on one side of the alloy substrate and performing vacuum heat treatment to obtain a metal bonding layer;

[0024] depositing a ceramic material on the side of the metal bonding layer away from the alloy substrate by using a plasma physical vapor deposition method to obtain the composite structure ceramic layer;

[0025] the composite structure ceramic layer comprises columnar structures and particles filled in the gaps of the columnar structures, and the columnar structures and the particles filled in the gaps of the columnar structures each independently contain one or more of YSZ particles or rare earth zirconate particles;

[0026] the porosity of the composite structure ceramic layer is 22%-40%.

[0027] In some embodiments, the provided preparation method of a sealing coating satisfies one or more of the following characteristics:

[0028] (1) the vacuum degree of the plasma physical vapor deposition is 1 mbar ~ 9 mbar;

[0029] (2) the current of the plasma physical vapor deposition is 1400 A ~ 2000 A;

[0030] (3) the power of the plasma physical vapor deposition is 40 kW ~ 65 kW;

[0031] (4) the preheating temperature of the ceramic material in the plasma physical vapor deposition process is 600 ℃ ~ 800 ℃;

[0032] (5) the average particle size D50 of the YSZ particles is 20 μm ~ 100 μm;

[0033] (6) the average particle size D50 of the rare earth zirconate particles is 10 μm ~ 50 μm;

[0034] (7) the working gas used in the plasma physical vapor deposition includes argon and helium, the flow rate of the helium is 20 L / min ~ 60 L / min, and the flow rate of the argon is 20 L / min ~ 60 L / min;

[0035] (8) the total powder feeding rate of the plasma physical vapor deposition is 32 g / min ~ 60 g / min;

[0036] (9) the distance between the metal bonding layer and the spray gun in the plasma physical vapor deposition process is 1200 mm ~ 1600 mm.

[0037] In some embodiments, the preparation method of the sealing coating satisfies one or more of the following features:

[0038] (1) the alloy substrate is pretreated, and the metal material is deposited on the surface of the pretreated alloy substrate;

[0039] (2) the method for depositing the metal material on the surface of the alloy substrate is selected from one or more of multi-arc ion plating, electron beam physical vapor deposition and electroplating-embedded infiltration;

[0040] (3) the metal material includes any one of MCrAlY or NiPtAl, and M of the MCrAlY includes at least one of Ni and Co;

[0041] (4) the temperature of the vacuum heat treatment is 900 ℃ ~ 1100 ℃;

[0042] (5) the time of the vacuum heat treatment is 2 h ~ 5 h;

[0043] (6) the vacuum degree of the vacuum heat treatment is (2x10 -5 ) mbar~ (9x10 -5 ) mbar;

[0044] (7) the sealing coating is prepared.

[0045] In some embodiments, the provided method for preparing the sealing coating, the prepared sealing coating satisfies one or more of the following characteristics:

[0046] (1) the volume ratio of the columnar structure in the composite structure ceramic layer is 40%~60%;

[0047] (2) the volume ratio of the particle in the composite structure ceramic layer is 40%~60%;

[0048] (3) the porosity of the composite structure ceramic layer is 30%~40%;

[0049] (4) the surface Rockwell hardness of the sealing coating is 50HR15Y~65HR15Y;

[0050] (5) the average friction and wear coefficient of the sealing coating under a load of 2N is 0.650~0.800;

[0051] (6) the width of the columnar structure in the composite structure ceramic layer is 10μm~40μm;

[0052] (7) the average particle size of the particle in the composite structure ceramic layer is 0.5μm~10μm;

[0053] (8) the thickness of the composite structure ceramic layer is 100μm~500μm;

[0054] (9) the thickness of the metal bonding layer is 30μm~120μm;

[0055] (10) the material of the metal bonding layer is any one of MCrAlY or NiPtAl, the M element in MCrAlY includes at least one of Ni and Co.

[0056] In some embodiments, the provided sealing coating and the sealing coating prepared by the provided method are applied in manufacturing an aero-engine component.

[0057] The sealing coating provided contains a composite structure ceramic layer, and the sealing coating has high porosity, low surface Rockwell hardness and high friction coefficient due to the columnar structure in the composite structure ceramic layer and the particles filled in the gaps between the columnar structures, which means that the sealing coating provided has more excellent wear resistance. The preparation method of the sealing coating provided adopts plasma physical vapor deposition technology, and the process flow is simple. Compared with the traditional atmospheric plasma spraying sealing coating, the sealing coating does not need to add pore-forming agents (polyesters) to obtain a abradable loose porous structure. BRIEF DESCRIPTION OF DRAWINGS

[0058] In order to more clearly illustrate the technical solutions in the embodiments and examples of the present application, more completely understand the present application and its beneficial effects, the drawings needed to be used in the description of the embodiments or examples will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0059] Figure 1 The cross-sectional morphology of the sealing coating in Example 1 is shown in Figure 1.

[0060] Figure 2 The cross-sectional morphology of the sealing coating in Comparative Example 1 is shown in Figure 2.

[0061] Figure 3 The cross-sectional morphology of the sealing coating in Comparative Example 2 is shown in Figure 3.

[0062] Figure 4 The cross-sectional morphology of the sealing coating in Comparative Example 3 is shown in Figure 4.

[0063] Figure 5 The cross-sectional morphology of the sealing coating in Comparative Example 4 is shown in Figure 5. DETAILED DESCRIPTION

[0064] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the related drawings. The preferred embodiments of the present application are shown in the drawings. However, the present application can be realized in many different forms and is not limited to the embodiments described herein. On the contrary, these embodiments are provided to make the disclosure of the present application more thorough and comprehensive.

[0065] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present application belongs. The terminology used in the specification of the present application is only for the purpose of describing specific embodiments and is not intended to limit the present application. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0066] The terms or phrases used in the present application have the following meanings unless otherwise stated or contradicted:

[0067] The selection scope of the terms "and / or", "or / and", "and / or" used in the present application includes any one of two or more relevant listed items, and also includes any and all combinations of relevant listed items, which includes any two relevant listed items, any more relevant listed items, or all relevant listed items. It should be noted that when at least two conjunctions selected from "and / or", "or / and", "and / or" are combined to connect at least three items, it should be understood that in the present application, the technical solution undoubtedly includes the technical solution connected by "logical and", and also undoubtedly includes the technical solution connected by "logical or". For example, "A and / or B" includes three parallel solutions of A, B, and "combination of A and B".

[0068] In the present application, "multiple", "various", "multiple times", "multiple" and the like refer to more than two or equal to two in number without specific limitation. For example, "one or more" means one or more than two.

[0069] In the present application, "combination thereof", "any combination thereof", "any combination thereof" and the like include all suitable combinations of any two or more listed items.

[0070] In the present application, "suitable combination", "suitable manner", "any suitable manner" and the like are "suitable" as long as the technical solutions of the present application can be implemented, the technical problems of the present application can be solved, and the expected technical effects of the present application can be achieved.

[0071] In the present application, "preferably", "better", "better", "suitable" only describe the better effect of the implementation mode or embodiment, and it should be understood that it does not constitute a limitation on the protection scope of the present application.

[0072] In the present application, "further", "more further", "particularly" and the like are used to describe the purpose, indicating the difference in content, but should not be understood as a limitation on the protection scope of the present application.

[0073] In the present application, "optionally", "optional", "optional" means optional, that is, selected from two parallel solutions of "have" or "have". If there are multiple "optional" in a technical solution, unless otherwise stated, and there is no contradiction or mutual restriction, each "optional" is independent.

[0074] In the present application, the terms "first", "second", "third", "fourth" and the like in the "first aspect", "second aspect", "third aspect", "fourth aspect" and the like are only used for the purpose of description, and cannot be understood as indicating or implying relative importance or quantity, nor can it be understood as implicitly indicating the importance or quantity of the indicated technical features. Moreover, "first", "second", "third", "fourth" and the like only serve the purpose of non-exhaustive enumeration description, and should be understood as not constituting a closed limitation on the quantity.

[0075] In the present application, the technical features described in an open manner include both the closed technical solution consisting of the listed features and the open technical solution containing the listed features.

[0076] In the present application, with respect to a numerical interval (i.e. a numerical range), if no special instructions are given, the optional numerical distribution within the above-mentioned numerical interval is considered to be continuous, and includes the two numerical end points (i.e. the minimum value and the maximum value) of the numerical range and every numerical value between the two numerical end points. If no special instructions are given, when the numerical interval only points to the integers within the numerical interval, including the two end point integers of the numerical range and every integer between the two end points, in this document, it is equivalent to directly listing each integer, for example, t is an integer selected from 1-10, which means that t is any one integer selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10. In addition, when multiple ranges are provided to describe a feature or a characteristic, these ranges can be combined. In other words, unless otherwise indicated, the ranges disclosed herein should be understood to include any and all sub-ranges therein.

[0077] In the present application, the temperature parameter, if not specifically limited, allows both constant temperature treatment and variation within a certain temperature range. It should be understood that the constant temperature treatment allows the temperature to fluctuate within the accuracy range controlled by the instrument. It is allowed to fluctuate within the range of, for example, ±5℃, ±4℃, ±3℃, ±2℃, ±1℃.

[0078] In the present application, % (w / w) and wt% both represent weight percentage, % (v / v) refers to volume percentage, and % (w / v) refers to mass volume percentage.

[0079] In the present application, "room temperature" generally refers to 5℃-30℃, preferably 25±5℃.

[0080] In the present application, "columnar structure" refers to a columnar crystal structure formed by vapor deposition in the tissue.

[0081] In this application, "YSZ" refers to zirconium oxide doped with the rare earth element yttrium, i.e., yttrium-stabilized zirconium oxide (Y2O3-stabilized ZrO2). The doping amount of yttrium oxide is 6wt% to 8wt%, which can be adjusted according to the application requirements.

[0082] Currently, the main methods for preparing sealing coatings are atmospheric plasma spraying and plasma physical vapor deposition. With the continuous increase in the service temperature of aero-engine components, traditional sealing coating materials such as NiAl and MCrAlY fail more rapidly under high-temperature service conditions, impairing blade performance. Therefore, ceramic-based sealing coatings have been proposed to replace traditional alloy materials. Y₂O₃-stabilized ZrO₂ (YSZ) has great potential in the field of ceramic-based sealing coatings due to its excellent thermal stability and high coefficient of thermal expansion.

[0083] The lamellar structure of YSZ prepared by atmospheric plasma spraying has poor adhesion to the substrate. The porosity of the dense lamellar structure needs to be maintained by creating pores with polyester powder, which makes the coating more porous. Furthermore, due to the high hardness and fracture toughness of YSZ itself, the low porosity structure cannot guarantee its excellent tribological properties.

[0084] In some embodiments, a sealing coating is provided, which is adhered to an alloy substrate. The sealing coating includes a metal bonding layer and a composite ceramic layer sequentially deposited on the alloy substrate.

[0085] The composite ceramic layer includes columnar structures and particles filling the gaps between the columnar structures. The columnar structures and the particles filling the gaps between the columnar structures each independently contain one or more of YSZ particles and rare earth zirconate particles.

[0086] The porosity of the composite ceramic layer is 22%~40%.

[0087] In some embodiments, the porosity of the provided sealing coating composite ceramic layer can be 22% to 40% or 30% to 40%. For example, the porosity of the composite ceramic layer can be 22%, 23%, 24%, 25%, 26%, 27%, 28%, 29%, 30%, 31%, 32%, 33%, 34%, 35%, 36%, 37%, 38%, 39%, 40%, or any range of two of the aforementioned values.

[0088] The provided sealing coating features a composite ceramic layer comprising nanoparticles and microparticles. These particles primarily grow through nucleation to form columnar structures, which, together with the particles, constitute the composite structure. During growth, these columnar structures are broken up by the particles, resulting in shorter, feather-like columnar structures. The columnar structures in the provided sealing coating are sparsely distributed and have high porosity. The nanoparticles and microparticles filling the gaps between the columnar structures provide good wear resistance, and the resulting columnar structures exhibit high strain tolerance and excellent thermal conductivity. The high porosity and low Rockwell hardness of the composite ceramic layer in the provided sealing coating contribute to superior wear resistance.

[0089] In some embodiments, the volume ratio of columnar structures in the composite ceramic layer in the provided sealing coating is 40% to 60%. For example, the volume ratio of columnar structures in the composite ceramic layer can be 40%, 41%, 42%, 43%, 44%, 45%, 46%, 47%, 48%, 49%, 50%, 51%, 52%, 53%, 54%, 55%, 56%, 57%, 58%, 59%, 60%, or any range of two of the aforementioned values.

[0090] In some embodiments, the volume ratio of particles in the composite ceramic layer in the provided sealing coating is 40% to 60%. For example, the volume ratio of particles in the composite ceramic layer can be 40%, 41%, 42%, 43%, 44%, 45%, 46%, 47%, 48%, 49%, 50%, 51%, 52%, 53%, 54%, 55%, 56%, 57%, 58%, 59%, 60%, or any range of two of the aforementioned values.

[0091] In some embodiments, the width of the columnar structure in the composite ceramic layer of the provided sealing coating is 10μm to 40μm. For example, the width of the columnar structure in the composite ceramic layer can be 10μm, 15μm, 20μm, 25μm, 30μm, 35μm, 40μm, or any range of two of the aforementioned values.

[0092] In some embodiments, the average particle size of the particles in the composite ceramic layer of the sealing coating is 0.5 μm to 10 μm, for example, 0.5 μm, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, or any combination of the two aforementioned values.

[0093] In some embodiments, the thickness of the composite ceramic layer in the provided sealing coating is 100μm to 500μm, for example, 100μm, 200μm, 300μm, 400μm, 500μm, or any combination of the two aforementioned values.

[0094] In some embodiments, the thickness of the metal bonding layer in the provided sealing coating is 30 μm to 120 μm, for example, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, or any range of two of the aforementioned values.

[0095] In some embodiments, the sealing coating provided includes a metal adhesive layer made of either MCrAlY or NiPtAl, where the M element in MCrAlY includes one or more of Ni and Co. In some embodiments, the MCrAlY composition comprises 40-6 wt% Ni, 15-25 wt% Co, 16-27 wt% Cr, 5-10 wt% Al, and 0.05-2 wt% Y. In some embodiments, the NiPtAl composition comprises 40-60 mol% Ni, 34-46 mol% Al, and 4-20 mol% Pt.

[0096] In some embodiments, the sealing coating has a surface Rockwell hardness of 50HR15Y to 65HR15Y, for example, 50HR15Y, 51HR15Y, 52HR15Y, 53HR15Y, 54HR15Y, 55HR15Y, 56HR15Y, 57HR15Y, 58HR15Y, 59HR15Y, 60HR15Y, 61HR15Y, 62HR15Y, 63HR15Y, 64HR15Y, 65HR15Y, or any range of two of the aforementioned values.

[0097] In some embodiments, the sealing coating has an average coefficient of friction and wear of 0.650 to 0.800 under a load of 2N, for example, 0.650, 0.660, 0.670, 0.680, 0.690, 0.700, 0.710, 0.720, 0.730, 0.740, 0.750, 0.760, 0.770, 0.780, 0.790, 0.800, or any range of two of the aforementioned values.

[0098] In some embodiments, a method for preparing a sealing coating is provided, comprising the following steps:

[0099] An alloy substrate is provided, and a metallic material is deposited on one side of the alloy substrate and subjected to vacuum heat treatment to obtain a metallic bonding layer;

[0100] A composite ceramic layer was obtained by depositing ceramic material on the side of the metal binder layer away from the alloy substrate using plasma physical vapor deposition.

[0101] The composite ceramic layer includes columnar structures and particles filling the gaps between the columnar structures. The columnar structures and the particles filling the gaps between the columnar structures each independently contain one or more of YSZ particles or rare earth zirconate particles.

[0102] The porosity of the composite ceramic layer is 22%~40%.

[0103] Plasma physical vapor deposition (PPVD) is used to prepare composite ceramic layers in sealing coatings. This is achieved by adding a certain amount of particulate phase between the columnar vapor phase structures in the composite structure, thus obtaining good wear resistance. The columnar structures act as a framework, providing a certain level of strength. Obtaining a composite ceramic layer with both columnar structures and inter-column particles results in sealing coatings with superior wear resistance.

[0104] In some embodiments, the vacuum degree of plasma physical vapor deposition in the provided sealing coating preparation method is 1 mbar to 9 mbar, for example, 1 mbar, 2 mbar, 3 mbar, 4 mbar, 5 mbar, 6 mbar, 7 mbar, 8 mbar, 9 mbar, or any range of two of the aforementioned values.

[0105] In some embodiments, the plasma physical vapor deposition current in the provided method for preparing the sealing coating is 1400A to 2000A, for example, 1400A, 1500A, 1600A, 1700A, 1800A, 1900A, 2000A, or any combination of the aforementioned values.

[0106] In some embodiments, the plasma physical vapor deposition power in the provided method for preparing the sealing coating is 40kW to 65kW, for example, 40kW, 45kW, 50kW, 55kW, 60kW, 65kW, or any combination of the aforementioned values.

[0107] In some embodiments, in the provided method for preparing the sealing coating, the preheating temperature of the ceramic material during plasma physical vapor deposition is 600°C to 800°C, for example, 600°C, 700°C, 800°C, or any combination of the aforementioned values.

[0108] In some embodiments, in the provided method for preparing the sealing coating, the average particle size D50 of the YSZ particles is 20μm to 100μm, for example, 20μm, 30μm, 40μm, 50μm, 60μm, 70μm, 80μm, 90μm, 100μm, or any range of two of the aforementioned values.

[0109] In some embodiments, in the provided method for preparing the sealing coating, the average particle size D50 of the rare earth zirconate particles is 10 μm to 50 μm, for example, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, or any combination of the two aforementioned values.

[0110] In some embodiments, the working gases used in the plasma physical vapor deposition method for preparing the sealing coating include argon and helium, with a helium flow rate of 20 L / min to 60 L / min and an argon flow rate of 20 L / min to 60 L / min.

[0111] In some embodiments, the total powder feed rate of the plasma physical vapor deposition in the provided method for preparing the sealing coating is 32 g / min to 60 g / min, for example, 32 g / min, 33 g / min, 34 g / min, 35 g / min, 36 g / min, 37 g / min, 38 g / min, 39 g / min, 40 g / min, 41 g / min, 42 g / min, 43 g / min, 44 g / min, 45 g / min, 46 g / min, 47 g / min, 48 g / min, 49 g / min, 50 g / min, 51 g / min, 52 g / min, 53 g / min, 54 g / min, 55 g / min, 56 g / min, 57 g / min, 58 g / min, 59 g / min, 60 g / min, or any range of two of the aforementioned values.

[0112] In some embodiments, in the provided method for preparing the sealing coating, the distance between the metal bonding layer and the spray gun during plasma physical vapor deposition is 1200mm to 1600mm, for example, 1200mm, 1300mm, 1400mm, 1500mm, 1600mm, or any range of two of the aforementioned values.

[0113] By adjusting process parameters such as powder feed rate and spraying distance in plasma physical vapor deposition, a composite ceramic layer with both columnar structures and intercolumnar particles was obtained. This composite ceramic layer has high porosity and a high content of intercolumnar particles, primarily nanoparticles. The resulting sealing coating exhibits superior wear resistance.

[0114] In some embodiments, the method for preparing the sealing coating involves pretreating the alloy substrate and depositing a metallic material on the surface of the pretreated alloy substrate.

[0115] In some embodiments, the method for preparing the sealing coating is selected from one or more of the following: multi-arc ion plating, electron beam physical vapor deposition, and electroplating-embedding infiltration.

[0116] In some embodiments, the metal material used in the method for preparing the sealing coating includes either MCrAlY or NiPtAl, where M in MCrAlY includes at least one of Ni and Co. In some embodiments, the composition of MCrAlY includes 40-6 wt% Ni, 15-25 wt% Co, 16-27 wt% Cr, 5-10 wt% Al, and 0.05-2 wt% Y. In some embodiments, the composition of NiPtAl includes 40-60 mol% Ni, 34-46 mol% Al, and 4-20 mol% Pt.

[0117] In some embodiments, the vacuum heat treatment temperature in the provided method for preparing the sealing coating is 900°C to 1100°C, for example, 900°C, 1000°C, 1100°C, or any combination of the two aforementioned values.

[0118] In some embodiments, the vacuum heat treatment time in the provided method for preparing the sealing coating is 2h to 5h, for example, 2h, 3h, 4h, 5h, or any combination of the two aforementioned values.

[0119] In some embodiments, the vacuum degree of the provided sealing coating preparation method is (2×10⁻⁶) / 2.5 Ω·cm. -5 )mbar~(9×10 -5 ) mbar, for example, (2×10 -5 ) mbar, (3×10 -5 ) mbar, (4×10 -5 ) mbar, (5×10 -5 ) mbar, (6×10 -5 ) mbar, (7×10 -5 ) mbar, (8×10 -5 ) mbar, (9×10 -5 )mbar, or a range consisting of any two of the aforementioned values.

[0120] In some embodiments, the sealing coating is prepared by the provided method for preparing the sealing coating.

[0121] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a columnar structure in the composite ceramic layer with a volume ratio of 40% to 60%.

[0122] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a particle volume ratio of 40% to 60% in the composite ceramic layer.

[0123] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a porosity of 30% to 40% for the composite ceramic layer.

[0124] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a surface Rockwell hardness of 50HR15Y to 65HR15Y.

[0125] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has an average friction and wear coefficient of 0.650 to 0.800 under a load of 2N.

[0126] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a columnar structure in the composite ceramic layer with a width of 10 μm to 40 μm.

[0127] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has an average particle size of 0.5 μm to 10 μm in the composite ceramic layer.

[0128] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a composite ceramic layer thickness of 100 μm to 500 μm.

[0129] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a metal bonding layer thickness of 30 μm to 120 μm.

[0130] In some embodiments, the sealing coating prepared by the provided sealing coating preparation method has a metal bonding layer made of either MCrAlY or NiPtAl, wherein the M element in MCrAlY includes at least one of Ni and Co.

[0131] In some embodiments, at least one of the sealing coating and the sealing coating prepared by the preparation method is provided for use in the manufacture of aero-engine components.

[0132] By adjusting the parameters of the plasma physical vapor deposition spraying process, more solid particles were added to the columnar structure. After testing, it was found that the surface Rockwell hardness of the prepared sealing coating decreased, the porosity increased, and the friction coefficient was higher. This means that this structure has better wear resistance and is a promising structure for wearable sealing coatings.

[0133] In some embodiments, a turbine outer ring is provided, the surface of which is provided with at least one of the aforementioned sealing coating and the sealing coating prepared by the aforementioned preparation method.

[0134] The following are specific embodiments, which describe the disclosure of this application in more detail. These embodiments are merely illustrative, as various modifications and variations within the scope of the disclosure of this application will be apparent to those skilled in the art. Unless otherwise stated, all reagents used in the embodiments are commercially available or synthesized by conventional methods and can be used directly without further processing, and the instruments used in the embodiments are also commercially available. Unless otherwise specified, the raw materials used in the following experiments are all commercially available.

[0135] Example 1

[0136] S1: Select an IC21 high-temperature alloy substrate of size as the alloy substrate. Pre-treat the high-temperature alloy substrate by sequentially polishing the surface of the high-temperature alloy substrate with SiC sandpaper of 80#, 240#, 400#, 600# and 800#. The surface roughness of the substrate after polishing is Ra≤1μm. The polished substrate is then ultrasonically cleaned in acetone, anhydrous ethanol and deionized water in sequence. The cleaning time for each step is 3min~5min. After cleaning, the substrate is dried and then sandblasted to increase the surface roughness of the high-temperature alloy substrate (Ra≤1μm).

[0137] S2: A NiCrAlY metal bond layer was prepared on the surface of a pretreated high-temperature alloy substrate using a multi-arc ion plating method. First, the target was sputter-cleaned at a bias voltage of -450V, a current of 110A, and a cleaning time of 5 min. Then, an overload deposition was performed at a bias voltage of -30V, a current of 180A, a duty cycle of 60%, and a deposition time of 40 min. Finally, the high-temperature alloy substrate with the prepared metal bond layer was subjected to vacuum heat treatment to improve the arc-connecting force at a temperature of 1050℃ for 3 h, with a vacuum degree of 2×10⁻⁶. -5 The treated sample was cooled to room temperature in the furnace and then removed. The sample surface was polished with SiC sandpaper until the roughness Ra < 1 μm. The polished sample was then ultrasonically cleaned with acetone, anhydrous ethanol, and deionized water in sequence and then dried.

[0138] S3: Place the high-temperature alloy sample with a metallic bonding layer in the fixture, then fix the fixture on the sample stage of the plasma physical vapor deposition equipment. Set the spraying control program for the spray gun on the robot; add YSZ powder to powder feeders 1 and 2; clean the spraying chamber and check that the spray gun and sample stage have returned to their original positions; close the equipment door, check the equipment's airtightness, and then turn on the vacuum pump to evacuate. When the vacuum level drops below 0.1 mbar, fill the chamber with argon gas to a vacuum level of 130 mbar; ignite the arc, wait for the arc to stabilize, then evacuate to below 2 mbar, and start the robot control program to move the sample stage to a distance of 1600 mm from the spray gun. Adjust the spray gun height so that the jet can completely cover the sample; proceed step by step. Increase the spray gun current to 1900A, set the helium flow rate to 30L / min, the argon flow rate to 65L / min, and the spraying power to 60kW. Preheat the sample to 800℃ using plasma jet. Turn on the powder feeder heating to raise the temperature inside the powder feeder chamber to 60℃. Open the powder feeding gas path, set it to four powder feeding ports, adjust the powder carrier gas flow rate to 8L / min, the powder feeding amount per port to 5g / min, the spraying time to 5min, and the deposited coating thickness to approximately 200μm. Close the powder feeding gas path, gradually reduce the spray gun current and plasma gas flow rate, and fill the chamber with argon gas until the vacuum degree reaches 60mbar. Turn off the gun and extinguish the arc. Continue filling the chamber with argon gas until the atmospheric pressure inside and outside the chamber is balanced, and then remove the sample.

[0139] Comparative Example 1

[0140] S1: Select an IC21 high-temperature alloy substrate of size as the alloy substrate. Pre-treat the high-temperature alloy substrate by sequentially polishing the surface of the high-temperature alloy substrate with SiC sandpaper of 80#, 240#, 400#, 600# and 800#. The surface roughness of the substrate after polishing is Ra≤1μm. The polished substrate is then ultrasonically cleaned in acetone, anhydrous ethanol and deionized water in sequence. The cleaning time for each step is 3min~5min. After cleaning, the substrate is dried and then sandblasted to increase the surface roughness of the high-temperature alloy substrate (Ra≤1μm).

[0141] S2: A NiCrAlY metal bonding layer was prepared on the surface of a pretreated high-temperature alloy substrate using a multi-arc ion plating method. First, the target was sputter-cleaned at a bias voltage of -450V, a current of 110A, and a cleaning time of 5 min. Then, an overload deposition was performed at a bias voltage of -30V, a current of 180A, a duty cycle of 60%, and a deposition time of 40 min. Finally, the high-temperature alloy substrate from which the metal bonding layer was prepared was subjected to vacuum heat treatment to improve the arc-connecting force at a temperature of 1050℃ for 3 h, with a vacuum degree of 2×10⁻⁶. -5The treated sample was cooled to room temperature in the furnace and then removed. The sample surface was polished with SiC sandpaper until the roughness Ra < 1 μm. The polished sample was then ultrasonically cleaned with acetone, anhydrous ethanol, and deionized water in sequence and then dried.

[0142] S3: Place the high-temperature alloy sample with a metallic bonding layer in the fixture, then fix the fixture on the sample stage of the plasma physical vapor deposition equipment. Set the spraying control program for the spray gun on the robot; add YSZ powder to powder feeders 1 and 2; clean the spraying chamber and check that the spray gun and sample stage have returned to their original positions; close the equipment door, check the equipment's airtightness, and then turn on the vacuum pump to evacuate. When the vacuum level drops below 0.1 mbar, fill the chamber with argon gas to a vacuum level of 130 mbar; ignite the arc, wait for the arc to stabilize, then evacuate to below 2 mbar, and start the robot control program to move the sample stage to a distance of 800 mm from the spray gun. Adjust the spray gun height so that the jet can completely cover the sample; gradually... Increase the spray gun current to 1900A, set the helium flow rate to 30L / min, the argon flow rate to 65L / min, and the spraying power to 60kW. Preheat the sample to 800℃ using the plasma jet. Turn on the powder feeder heating to raise the temperature inside the powder feeder chamber to 60℃. Open the powder feeding gas path and set it to four powder feeding ports. Adjust the powder carrier gas flow rate to 8L / min, the powder feeding amount per port to 5g / min, the spraying time to 5min, and the deposited coating thickness to approximately 300μm. Close the powder feeding gas path, gradually reduce the spray gun current and plasma gas flow rate, and fill the chamber with argon gas until the vacuum degree reaches 60mbar. Turn off the gun and extinguish the arc. Continue to fill the chamber with argon gas until the atmospheric pressure inside and outside the chamber is balanced, and then remove the sample.

[0143] Comparative Example 2

[0144] S1: Select an IC21 high-temperature alloy substrate of size as the alloy substrate. Pre-treat the high-temperature alloy substrate by sequentially polishing the surface of the high-temperature alloy substrate with SiC sandpaper of 80#, 240#, 400#, 600# and 800#. The surface roughness of the substrate after polishing is Ra≤1μm. The polished substrate is then ultrasonically cleaned in acetone, anhydrous ethanol and deionized water in sequence. The cleaning time for each step is 3min~5min. After cleaning, the substrate is dried and then sandblasted to increase the surface roughness of the high-temperature alloy substrate (Ra≤1μm).

[0145] S2: A NiPtAl metal bonding layer was prepared on the surface of the pretreated high-temperature alloy substrate using electroplating and vapor-phase aluminizing methods. The Pt electroplating solution was prepared with the following composition: diammonium platinum nitrite (Pt(NH3)2(NO2)2) 10 g / L and sodium dihydrogen phosphate (NaH2PO4·2H2O) 50 g / L. The plating solution was heated to 100℃, and the high-temperature alloy substrate was placed in the Pt electroplating solution with a current set to 0.9-1.1 mA / mm. 2 Electroplating time was 60 min, and the thickness of the electroplated Pt layer was 3-5 μm. Aluminizing was then performed using a vapor-phase method, with a heating time of 150 min, a holding temperature of 1070℃, a holding time of 6 h, and a cooling time of 150 min, ultimately yielding a NiPtAl metal bond layer with a thickness of 30-50 μm.

[0146] S3: Place the high-temperature alloy sample with a metallic bonding layer in the fixture, then fix the fixture on the sample stage of the plasma physical vapor deposition equipment. Set the spraying control program for the spray gun on the robot; add YSZ powder to powder feeders 1 and 2; clean the spraying chamber and check that the spray gun and sample stage have returned to their original positions; close the equipment door, check the equipment's airtightness, and then turn on the vacuum pump to evacuate. When the vacuum level drops below 0.1 mbar, fill the chamber with argon gas to a vacuum level of 130 mbar; ignite the arc, wait for the arc to stabilize, then evacuate to below 2 mbar, and start the robot control program to move the sample stage to a distance of 800 mm from the spray gun. Adjust the spray gun height so that the jet can completely cover the sample; gradually... Increase the spray gun current to 1900A, set the helium flow rate to 30L / min, the argon flow rate to 65L / min, and the spraying power to 60kW. Preheat the sample to 800℃ using the plasma jet. Turn on the powder feeder heating to raise the temperature inside the powder feeder chamber to 60℃. Open the powder feeding gas path and set it to four powder feeding ports. Adjust the powder carrier gas flow rate to 8L / min, the powder feeding amount per port to 5g / min, the spraying time to 5min, and the deposited coating thickness to approximately 300μm. Close the powder feeding gas path, gradually reduce the spray gun current and plasma gas flow rate, and fill the chamber with argon gas until the vacuum degree reaches 60mbar. Turn off the gun and extinguish the arc. Continue to fill the chamber with argon gas until the atmospheric pressure inside and outside the chamber is balanced, and then remove the sample.

[0147] Comparative Example 3

[0148] S1: Select an IC21 high-temperature alloy substrate of size as the alloy substrate. Pre-treat the high-temperature alloy substrate by sequentially polishing the surface of the high-temperature alloy substrate with SiC sandpaper of 80#, 240#, 400#, 600# and 800#. The surface roughness of the substrate after polishing is Ra≤1μm. The polished substrate is then ultrasonically cleaned in acetone, anhydrous ethanol and deionized water in sequence. The cleaning time for each step is 3min~5min. After cleaning, the substrate is dried and then sandblasted to increase the surface roughness of the high-temperature alloy substrate (Ra≤1μm).

[0149] S2: A NiPtAl metal bonding layer was prepared on the surface of the pretreated high-temperature alloy substrate using electroplating and vapor-phase aluminizing methods. The Pt electroplating solution was prepared with the following composition: diammonium platinum nitrite (Pt(NH3)2(NO2)2) 10 g / L and sodium dihydrogen phosphate (NaH2PO4·2H2O) 50 g / L. The plating solution was heated to 100℃, and the high-temperature alloy substrate was placed in the Pt electroplating solution with a current set to 0.9-1.1 mA / mm. 2 Electroplating time was 60 min, and the thickness of the electroplated Pt layer was 3-5 μm. Aluminizing was then performed using a vapor-phase method, with a heating time of 150 min, a holding temperature of 1070℃, a holding time of 6 h, and a cooling time of 150 min, ultimately yielding a NiPtAl metal bond layer with a thickness of 30-50 μm.

[0150] S3: Place the high-temperature alloy sample with a metallic bonding layer in the fixture, then fix the fixture on the sample stage of the plasma physical vapor deposition equipment. Set the spraying control program for the spray gun on the robot; add YSZ powder to powder feeders 1 and 2; clean the spraying chamber and check that the spray gun and sample stage have returned to their original positions; close the equipment door, check the equipment's airtightness, and then turn on the vacuum pump to evacuate. When the vacuum level drops below 0.1 mbar, fill the chamber with argon gas to a vacuum level of 130 mbar; ignite the arc with the spray gun, wait for the arc to stabilize, then evacuate to below 2 mbar, and start the robot control program to move the sample stage to a distance of 1000 mm from the spray gun. Adjust the spray gun height so that the jet can completely cover the sample; proceed step by step. Increase the spray gun current to 1900A, set the helium flow rate to 30L / min, the argon flow rate to 65L / min, and the spraying power to 60kW. Preheat the sample to 800℃ using plasma jet. Turn on the powder feeder heating to raise the temperature inside the powder feeder chamber to 60℃. Open the powder feeding gas path, set it to four powder feeding ports, adjust the powder carrier gas flow rate to 8L / min, the powder feeding amount per port to 5g / min, the spraying time to 5min, and the deposited coating thickness to approximately 400μm. Close the powder feeding gas path, gradually reduce the spray gun current and plasma gas flow rate, and fill the chamber with argon gas until the vacuum degree reaches 60mbar. Turn off the gun and extinguish the arc. Continue filling the chamber with argon gas until the atmospheric pressure inside and outside the chamber is balanced, and then remove the sample.

[0151] Comparative Example 4

[0152] The preparation method of Comparative Example 4 is similar to that of Comparative Example 1, except that the process parameters of plasma physical vapor deposition are different. The plasma gas flow rate and current magnitude are changed, with a helium flow rate of 60 L / min and an argon flow rate of 30 L / min. A composite structure with columnar structure and inter-column particles is obtained. The spraying distance is changed to 1200 mm, the spraying time is 5 min, the spraying current is 1900 A, and the powder feed port is changed to dual feed, with a powder feed rate of 5 g / min per feed port. The resulting coating has a different structural morphology from the example.

[0153] Characterization and effect testing of the products in the examples and comparative examples

[0154] The sealing coatings of Example 1 and Comparative Examples 1-4 were tested as follows:

[0155] 1. The porosity of the sealing coating was detected by metallographic method. The cross-section of the coating was observed under a scanning electron microscope (GeminiSEM 300, Zeiss). Five images of the microstructure at a certain distance were selected at 1000x magnification. The porosity was measured using ImageJ software. The average value of the five images was taken as the porosity of the coating. The detection results are shown in Table 1. Figure 1This is a cross-sectional topography of the sealing coating in Example 1. Figure 2 This is a cross-sectional morphology diagram of the sealing coating in Comparative Example 1. Figure 3 This is a cross-sectional morphology diagram of the sealing coating in Comparative Example 2. Figure 4 This is a cross-sectional morphology diagram of the sealing coating in Comparative Example 3. Figure 5 This is a cross-sectional morphology diagram of the sealing coating in Comparative Example 4.

[0156] 2. The width of the columnar structure in the composite ceramic layer of the sealing coating was detected by metallographic method. The cross-sectional microstructure was observed under a scanning electron microscope (GeminiSEM 300, Zeiss). The width of the columnar structure, the thickness of the ceramic layer and the thickness of the adhesive layer were measured by using ImageJ software with a scale. The detection results are shown in Table 1.

[0157] 3. The hardness of the sealing coating was tested using the following method: The surface hardness of the samples was tested according to GB 8640-88 "Metal Thermal Spray Coating Surface Rockwell Hardness Test Method". The testing equipment was a fully automatic (micro) surface Rockwell hardness tester. The test parameters were: load 15N, loading time 5s, and number of sample points ≥3. The test results are shown in Table 2.

[0158] 4. Using a UMT-5 sliding friction and wear tester, with Si3N4 ceramic balls as the friction head, a reciprocating friction and wear test was conducted at a frequency of 5Hz and a load of 2N to determine the wear resistance of the wear-resistant sealing coating. The test results are shown in Table 2.

[0159] 5. The proportion of columnar structures and particles in the sealing coating was determined using metallographic methods. The cross-sectional microstructure was observed under a scanning electron microscope (GeminiSEM 300, Zeiss). Using ImageJ software, five different regions spaced 1 mm apart in the image were selected for area statistics. , The test results are shown in Table 2.

[0160] Table 1 Sealing Coating Thickness, Porosity, and Column Width

[0161]

[0162] Table 2. Seal Coating Particle Proportion and Performance Test Data

[0163]

[0164] contrast Figure 1 and Figures 2-4It can be seen that the microstructure of Example 1 is significantly different from that of Comparative Examples 1 to 4. The columnar structure of the sealing coating in Example 1 is more sparsely distributed and wider, with more particles filling the spaces between the columns. This multiphase composite structure possesses both excellent scrapability and erosion resistance, meeting the comprehensive performance requirements of the sealing coating.

[0165] The morphology of the coatings was characterized by metallographic analysis. Table 1 shows the thickness of the sealing coatings in the examples and comparative examples, including the thickness of the ceramic layer and the adhesive layer. The porosity of the ceramic layer and the width of the columnar structure were also statistically analyzed. The coating of Example 1 exhibits higher porosity and greater columnar structure width, indicating that the process conditions significantly increased the number of intercolumnar particles.

[0166] As shown in Table 2, the sealing coating in Example 1 contains 47.7% particles, which is higher than the sealing coatings in Comparative Examples 1 to 4. The sealing coating in Example 1 has a lower surface Rockwell hardness and a higher coefficient of friction. The lower surface Rockwell hardness makes the coating easier to scrape, while the higher coefficient of friction provides excellent wear resistance.

[0167] The above-described embodiments are merely illustrative of the implementation methods of the present invention, but should not be construed as limiting the scope of the present invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the protection scope of the present invention.

[0168] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0169] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention should be determined by the appended claims, and the specification and drawings can be used to interpret the content of the claims.

Claims

1. A sealing coating, characterized in that, The sealing coating is adhered to the alloy substrate, and the sealing coating comprises: a metal bonding layer and a composite structure ceramic layer sequentially deposited on the alloy substrate. The composite ceramic layer includes columnar structures and particles filling the gaps between the columnar structures, wherein the columnar structures and the particles filling the gaps between the columnar structures each independently contain one or more of YSZ and rare earth zirconates. The columnar structure accounts for 51% to 59% of the volume of the composite ceramic layer; The volume ratio of the particles in the composite ceramic layer is 41%~49%; The porosity of the composite ceramic layer is greater than 35% and less than or equal to 40%. The method for preparing the sealing coating includes the following steps: An alloy substrate is provided, and a metallic material is deposited on one side of the alloy substrate and subjected to vacuum heat treatment to obtain a metallic bonding layer; The composite ceramic layer is obtained by depositing ceramic material on the side of the metal bonding layer away from the alloy substrate using plasma physical vapor deposition.

2. The sealing coating according to claim 1, characterized in that, It meets one or more of the following characteristics: (1) The volume ratio of the columnar structure in the composite ceramic layer is 51%~55%; (2) The volume ratio of the particles in the composite ceramic layer is 45%~49%.

3. The sealing coating according to claim 1, characterized in that, It meets one or more of the following characteristics: (1) The width of the columnar structure in the composite ceramic layer is 10μm~40μm; (2) The average particle size of the particles in the composite ceramic layer is 0.5 μm to 10 μm; (3) The thickness of the composite ceramic layer is 100μm~500μm.

4. The sealing coating according to any one of claims 1 to 3, characterized in that, The metal bonding layer satisfies one or more of the following characteristics: (1) The thickness of the metal bonding layer is 30μm~120μm; (2) The metal bonding layer is made of either MCrAlY or NiPtAl, and the M element in MCrAlY includes one or more of Ni and Co.

5. The sealing coating according to any one of claims 1 to 3, characterized in that, It meets one or more of the following characteristics: (1) The porosity of the composite ceramic layer is greater than 35% and less than or equal to 36%; (2) The surface Rockwell hardness of the sealing coating is 50HR15Y~65HR15Y; (3) The average friction and wear coefficient of the sealing coating under a load of 2N is 0.650~0.

800.

6. A method for preparing a sealing coating, characterized in that, Includes the following steps: An alloy substrate is provided, and a metallic material is deposited on one side of the alloy substrate and subjected to vacuum heat treatment to obtain a metallic bonding layer; A composite ceramic layer is obtained by depositing ceramic material on the side of the metal bonding layer away from the alloy substrate using plasma physical vapor deposition. The composite ceramic layer includes a columnar structure and particles filling the gaps between the columnar structures. The columnar structure and the particles filling the gaps between the columnar structures each independently contain one or more of YSZ particles or rare earth zirconate particles. The porosity of the composite ceramic layer is greater than 35% and less than or equal to 40%. The columnar structure accounts for 51% to 59% of the volume of the composite ceramic layer; The volume ratio of the particles in the composite ceramic layer is 41%~49%; In the plasma physical vapor deposition process, the distance between the metal bonding layer and the spray gun is 1500mm~1600mm.

7. The preparation method according to claim 6, characterized in that, It meets one or more of the following characteristics: (1) The vacuum degree of the plasma physical vapor deposition is 1 mbar to 9 mbar; (2) The current of the plasma physical vapor deposition is 1400A~2000A; (3) The power of the plasma physical vapor deposition is 40kW~65kW; (4) The preheating temperature of the ceramic material during the plasma physical vapor deposition process is 600℃~800℃; (5) The average particle size D50 of the YSZ particles is 20μm~100μm; (6) The average particle size D50 of the rare earth zirconate particles is 10 μm to 50 μm; (7) The working gas used in the plasma physical vapor deposition includes argon and helium, the flow rate of helium is 20L / min~60L / min, and the flow rate of argon is 20L / min~60L / min; (8) The total powder feeding rate of the plasma physical vapor deposition is 32 g / min to 60 g / min.

8. The preparation method according to claim 6, characterized in that, It meets one or more of the following characteristics: (1) Pre-treat the alloy matrix; deposit the metal material on the surface of the pre-treated alloy matrix; (2) The method of depositing metallic material on the surface of the alloy substrate is selected from one or more of multi-arc ion plating, electron beam physical vapor deposition, and electroplating-embedding infiltration; (3) The metallic material includes either MCrAlY or NiPtAl, wherein M in MCrAlY includes at least one of Ni and Co; (4) The temperature of the vacuum heat treatment is 900℃~1100℃; (5) The vacuum heat treatment time is 2h~5h; (6) The vacuum degree of the vacuum heat treatment is (2×10) -5 )mbar~(9×10 -5 )mbar.

9. The preparation method according to any one of claims 6 to 8, characterized in that, The prepared sealing coating satisfies one or more of the following characteristics: (1) The volume ratio of the columnar structure in the composite ceramic layer is 51%~55%; (2) The volume ratio of the particles in the composite ceramic layer is 45%~49%; (3) The porosity of the composite ceramic layer is greater than 35% and less than or equal to 36%; (4) The surface Rockwell hardness of the sealing coating is 50HR15Y~65HR15Y; (5) The average friction and wear coefficient of the sealing coating under a load of 2N is 0.650~0.800; (6) The width of the columnar structure in the composite ceramic layer is 10 μm to 40 μm; (7) The average particle size of the particles in the composite ceramic layer is 0.5 μm to 10 μm; (8) The thickness of the composite ceramic layer is 100μm~500μm; (9) The thickness of the metal bonding layer is 30μm~120μm; (10) The metal bonding layer is made of either MCrAlY or NiPtAl, and the M element in MCrAlY includes at least one of Ni and Co.

10. The use of at least one of the sealing coatings according to any one of claims 1 to 5 and the sealing coatings prepared by the preparation method according to any one of claims 6 to 9 in the manufacture of aero-engine components.

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