Film substrate layer processing system and composite foil production system

Abstract

The invention discloses a thin film base material layer processing system and a composite foil production system.The thin film base material layer processing system comprises a chemical micro-etching device, and the chemical micro-etching device is at least used for micro-etching the surface of a thin film base material layer. The composite foil production system comprises a thin film base material layer processing system, a foil generation device and a composite device which are sequentially distributed from upstream to downstream, and the foil generation device is at least used for generating a foil layer; and the compounding device is used for compounding the base material layer and the foil layer to obtain the composite foil. Based on the composite foil production system, the production process can be simplified, the control difficulty can be reduced, and the corresponding equipment cost and production cost can be reduced; and the production efficiency and the mass production can be conveniently improved. Comprising a film pretreatment process, and can improve the stability of the whole system, reduce the cost and the like based on a film substrate layer processing system. The produced composite foil or composite current collector can be improved in multiple aspects, including stability, mechanical property, uniformity and the like.

Description

Technical Field

[0001] The present invention relates to the technical field of composite foil materials, and more specifically, to a processing system for a thin film substrate layer and a production system for composite foil materials. Background Art

[0002] Composite foil materials can balance energy density, safety, and battery cost, and have been used as lithium battery materials in new energy, energy storage, and other fields. In common current production methods of composite foil materials, such as the production of composite copper foils, it is common to use methods such as chemical vapor deposition and magnetron sputtering to deposit a metal foil layer on a substrate layer. Although such production methods can obtain composite current collectors with good quality, however, the operation of such production methods is difficult, there are many factors limiting efficiency, and it is difficult to achieve mass production; moreover, the produced composite current collectors may still have problems such as insufficient adhesion stability, insufficient composite uniformity, or insufficient mechanical properties. And for the production equipment, systems, etc. corresponding to such common production methods, they are usually relatively complex and expensive; for example, the equipment corresponding to the deposition process, etc., has high construction costs and production costs, and there are many unstable factors in the overall system production process. In addition, in the prior art, in order to enhance the adhesion stability, the thin film substrate layer is often subjected to corona pretreatment; the composite foil material production system also includes such a corona pretreatment system, but such a pretreatment system also has problems such as equipment costs and unstable pretreatment processes, such as temperature, humidity, etc. will significantly affect the pretreatment effect. Further exacerbating the instability and other deficiencies of the overall composite foil material production system.

[0003] Therefore, there is an urgent need in the prior art for a new processing system for a thin film substrate layer and a production system for composite foil materials, which can stably process, simplify the production process, reduce the corresponding equipment costs, and facilitate mass production. Summary of the Invention

[0004] The present invention aims to overcome at least one of the above deficiencies of the prior art, and provides a processing system for a thin film substrate layer and a production system for composite foil materials, which have a simple structure, a stable corresponding processing and production process, and are convenient for obtaining a thin film substrate and corresponding composite foil materials with stable adhesion performance.

[0005] The technical solution adopted by the present invention is a processing system for a thin film substrate layer, including: a chemical micro-etching device, and the chemical micro-etching device is at least used for micro-etching the surface of the thin film substrate layer. Further, it is at least used for chemically micro-etching the surface of the thin film substrate layer. Further, the chemical micro-etching device includes an etching space, a thin film substrate layer loading mechanism, and a chemical treatment agent applying mechanism. The thin film substrate layer loading mechanism guides the thin film substrate layer to the etching space, and the chemical micro-etching liquid applying mechanism located in the etching space applies a chemical treatment agent to the surface of the thin film substrate layer; the loading mechanism can be a transmission device, such as a transmission roller, a conveyor belt, etc.

[0006] Further, the chemical micro-etching device applies a chemical treatment agent to micro-etch the surface of the substrate layer; the chemical micro-etching device includes a roll coating device, a spraying device, and / or an immersion device. Further, a corresponding accommodation space for the chemical treatment agent is included.

[0007] Further, it includes a roll coating device, a spraying device, and an immersion device. Further still, at least a plurality of branch guide rollers are provided upstream of the chemical micro-etching device, and the plurality of branch guide rollers are used to respectively guide the film to the roll coating device, the spraying device, or the immersion device. Multiple application methods of routes can be provided.

[0008] The micro-etching processing device of the present application can adopt a roll body structure, a spraying structure, or an immersion tank structure, or a combination of two or more of them; in the specific use process, it can also be combined with different requirements, and a diversion guide roller combination for guiding to different chemical micro-etching device structures can be provided in front of the chemical micro-etching device. Different from common methods such as corona treatment, the present application uses a chemical treatment agent as the main component for chemical micro-etching, so it only needs to be applied to the surface of the substrate layer. And roll coating, spraying, or immersion can all effectively cover the liquid on the substrate layer, so as to perform micro-etching. Therefore, it does not require a complex application process, is easy to operate, and can effectively ensure that all positions on the surface of the substrate layer are micro-etched.

[0009] Further, it further includes a residue removal device, which is arranged downstream of the chemical micro-etching device; the residue removal device includes a squeezing device, a blowing device, and / or a drying device. Through the residue removal device, most of the liquid components that no longer continue to act can be removed, and by controlling the etching degree, it is also convenient for subsequent processing and compounding processes. Further still, a scraper device is also arranged upstream of the residue removal device, which is used to initially scrape off some components that no longer continue to act, etc., so as to improve the efficiency of removing the remaining liquid components that no longer continue to act subsequently.

[0010] Another object of the present application is to provide a composite foil production system, including: a film substrate layer processing system, a foil generating device, and a compounding device, which are distributed in sequence from upstream to downstream as described above, wherein the foil generating device is at least used to generate a foil layer; the compounding device compounds the substrate layer and the foil layer to obtain a composite foil.

[0011] Through the chemical micro-etching device, a chemical treatment agent is used to micro-etch the substrate layer, which enhances the adhesion of the substrate layer surface while avoiding the impact on the mechanical strength of the substrate layer. Then, the substrate layer passing through the chemical micro-etching device is pressed onto the foil layer on the foil generating device under the action of the composite device, thereby realizing the composite of the substrate layer and the foil layer, and being guided away from the cathode roller after the composite, that is, using the composite substrate layer to drive the peeling of the foil layer from the cathode roller. With the continuous unwinding of the substrate layer and the composite and guiding away of the substrate layer and the foil layer, the corresponding composite foil can be generated. The substrate layer can be a substrate layer with sticky outer surface itself. Based on the composite foil production system of the present application, the production process can be simplified, the operation difficulty can be reduced, and the corresponding equipment cost can be lowered; and it is convenient to improve the production efficiency and mass production. At the same time, the production system of the present application improves the adhesion of the substrate layer based on chemical micro-etching pretreatment and ensures the mechanical properties, so the corresponding composite foil has good adhesion stability and mechanical properties. Also, because a liquid treatment agent is applied to the surface of the substrate layer for pretreatment and the foil layer is generated separately and then composite, both the substrate layer and the foil layer have the uniformity of treatment, such as the surface of the substrate layer is treated by the treatment agent, and the thickness of the generated foil layer is uniform, and the corresponding composite foil is also significantly improved in terms of the uniformity of the composite. Compared with the prior art of forming a foil layer by magnetron sputtering on a thin film substrate layer, the quality is more controllable. That is, based on the production system of the present application, it is convenient to simplify the production process, reduce the production cost, and facilitate mass production; the composite foil or composite current collector obtained by production can take into account multiple aspects of improvement, including stability, mechanical properties, and uniformity, etc.

[0012] Further, the foil generating device includes a tank for accommodating electrolyte and a rotatable cathode roller, and part of the cathode roller can be immersed in the electrolyte to form a foil layer on the surface of the cathode roller.

[0013] Further, the composite device includes a pressure roller combination and a guiding roller; the pressure roller combination and the cathode roller surface are configured such that with the cathode roller surface as the support surface, the pressure roller combination presses down the substrate layer and the foil layer to obtain a composite foil; the guiding roller is used to pull the composite foil away from the cathode roller surface. Further, the pressure roller combination is formed by two or more pressure roller assemblies, the pressure roller assembly includes a pressure roller and a telescopic mechanism connected to the pressure roller; and at least one of the pressure roller assemblies in the pressure roller combination is arranged circumferentially along the foil generating device; further, the pressure roller combination includes three pressure roller assemblies.

[0014] Further, a gluing device is further included, and the gluing device is arranged between the thin film substrate layer processing system and the foil generating device, and the gluing device is configured to coat an adhesive layer on the surface of the thin film after passing through the thin film substrate layer processing system.

[0015] In addition to attaching with a substrate layer that has its own adhesiveness, in order to make a transition, provide an attachment surface, or enhance the bonding performance, a glue solution can also be applied to the surface of the substrate layer through a gluing device, so that after a glue layer is formed subsequently, it can be laminated with the foil layer. The glue layer can significantly improve the lamination stability and tightness between the substrate layer and the foil layer. And since the surface performance of the substrate layer has been improved through micro-etching treatment, both sides of the glue layer can be closely attached, so that the substrate layer and the foil layer are closely attached as a whole. After a glue layer is formed through a simple gluing device, the lamination of the substrate layer and the foil layer can be achieved, thus connecting the two processes of separately processing the substrate layer and separately generating the foil layer to form a complete production process. It can effectively reduce the equipment cost and facilitate improving the subsequent lamination effect and efficiency. It should be noted that since the substrate layer has undergone chemical micro-etching, when the gluing device applies the glue solution to the surface of the substrate layer, as the glue solution forms a glue layer, the side close to the substrate layer will form an interlocking state with the micro-etched depressions and other positions of the substrate layer; at this time, a glue layer that is more compatible with the foil layer can be used for the glue layer. In addition to the adhesiveness of the glue layer itself, the interlocking on one side and the affinity on the other side are respectively utilized to improve the overall bonding strength of the composite foil.

[0016] Further, a curing device is also included. The curing device is arranged downstream of the gluing device and is configured to cure the glue layer on the surface of the film; the film passes through the film substrate layer processing system, the gluing device, the curing device in sequence and then reaches the lamination device. The curing device facilitates the rapid curing of the glue solution, and the preliminary curing enables the glue solution to form a glue layer. Then it is laminated with the foil layer in a relatively stable cured state.

[0017] Further, an unwinding device and a winding device are also included; the unwinding device is at least used for unwinding the substrate layer; the winding device is at least used for winding the composite foil layer; after the substrate layer is unwound from the unwinding device, it reaches between the composite device and the foil generating device through the film substrate layer processing system, and the formed composite foil is wound by the winding device. Through the cooperation of the unwinding device and the winding device, it is convenient to keep the substrate layer in a certain stretched state, and then laminate with as spread-out a surface as possible to enhance the adhesion of the composite foil.

[0018] Further, a material transfer mechanism is also included, which is used to transfer and install the composite foil on the winding device to the unwinding device; and adjust the unwinding of the composite foil so that the un-laminated side faces the foil generating device when reaching the composite device. Further, the material transfer mechanism can be a manipulator. When only one-side lamination is realized in the process of unwinding to winding of the composite foil production system of the present application, when double-side lamination needs to be realized, it can be transferred to the initial unwinding position through the material transfer mechanism, and the other un-laminated side is used as the side to be laminated for unwinding and lamination, so that double-side lamination can be realized by repeating twice based on the single-layer lamination production structure. More specifically, when using the material transfer mechanism, it can be applied to the production process of composite current collectors.

[0019] Furthermore, it is applied in the production of composite current collectors. Based on the composite foil production system described in this application, it is beneficial to produce composite current collectors with stable composites and good mechanical properties. And the corresponding production process has multiple advantages such as high efficiency and high process controllability.

[0020] Furthermore, the substrate layer is a PET film, PP film, PI film, PE film, PVC film, PBT film, PC film, PS film, ABS film, PA film, PASF film, PVDF film, PEDOT film, PANI film, and PPy film; that is, it includes films corresponding to PET (polyethylene terephthalate), pp (polypropylene), PI (polyimide), PE (polyethylene), PVC (polyvinyl chloride), PBT (polybutylene terephthalate), PC (polycarbonate), PS (polystyrene), ABS (ternary copolymer of acrylonitrile (A)-butadiene (B)-styrene (S)), PA (polyamide), PASF (polyarylsulfone), PVDF (polyvinylidene fluoride), PEDOT (poly(3,4-ethylenedioxythiophene)), PANI (polyaniline), and PPy (polypyrrole).

[0021] Another object of this application is to provide a composite current collector production line, including the aforementioned composite foil production system.

[0022] Furthermore, it includes more than two of the aforementioned composite foil production systems; the composite foil production system includes an unwinding device, a film substrate layer processing system, a foil generating device, a composite device, and a winding device distributed from upstream to downstream; the winding device of the upstream adjacent composite foil production system forms the unwinding device of the downstream adjacent composite foil production system; and two composite foil production systems respectively composite a foil layer on one side of the substrate layer, and jointly composite foil layers on both sides of the substrate layer.

[0023] When the composite foil generation system realizes single-sided composite, at this time, by setting more than two composite foil production systems and using the upstream winding device as the unwinding device of the downstream adjacent composite foil production system, the single-sided composite foil can be used as the unwinding material, and then the composite foil generation process can be repeated for the uncomposite side for composite. Thus, bilateral composite of the substrate layer is realized based on two composite foil production systems.

[0024] Another object of this application is to provide a battery production line, including the aforementioned composite foil production system; and / or, the aforementioned composite current collector production line. In addition to being used alone for composite foil production or composite current collector production, it can also be used as a part of the battery production line, so as to cooperate with the production of other materials and downstream processing to realize the production of batteries.

[0025] Compared with the prior art, the beneficial effects of the present application are as follows: Based on the composite foil material production system described in the present application, the production process can be simplified, the operation difficulty can be reduced, and the corresponding equipment cost and production cost can be lowered; moreover, it is convenient to improve production efficiency and achieve mass production. Including the micro-etching process of film pretreatment, the overall system stability can also be improved and the cost can be reduced based on the film substrate layer processing system. The produced composite foil material or composite current collector can achieve improvements in multiple aspects, including stability, mechanical properties, uniformity, and so on. Specifically regarding the device arrangement of the composite foil material production system, the substrate layer and the foil layer can be separately processed or produced. In addition to the improvement of the product by the aforementioned separate processing, the relative independence of each layer process is also enhanced, and the stability and maintainability of the overall composite foil material production system are improved; at the same time, the coupling of two processes is achieved in the composite stage, and the composite effect is ensured, making the overall system efficient and flexible. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 FIG. 1 is a schematic structural diagram (I) of the film substrate processing layer system of the present application.

[0027] Figure 2 FIG. 2 is a schematic structural diagram (II) of the film substrate processing layer system of the present application.

[0028] Figure 3 FIG. 3 is a schematic structural diagram (III) of the film substrate processing layer system of the present application.

[0029] Figure 4 FIG. 4 is a schematic structural diagram (IV) of the film substrate processing layer system of the present application.

[0030] Figure 5 FIG. 5 is a schematic structural diagram (V) of the film substrate processing layer system of the present application.

[0031] Figure 6 FIG. 6 is a schematic structural diagram of the composite foil material production system according to Embodiment 2 of the present application.

[0032] Figure 7 FIG. 7 is a schematic structural diagram of the composite foil material production system according to Embodiment 3 of the present application.

[0033] BRIEF DESCRIPTION OF THE DRAWINGS: Film substrate layer processing system 100, branch guiding roller 101, chemical micro-etching device 110, residue removal device 120, unwinding device 1100, composite device 1200, pressure roller combination 1210, guiding and separating roller 1220, foil material generating device 1300, cathode roller 1310, electrolytic cell 1320, passivation device 1400, winding device 1500, glue coating device 1600, pre-curing device 1700. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0034] The accompanying drawings of the present invention are only for illustrative purposes and should not be construed as limiting the present invention. To better illustrate the following embodiments, some components in the drawings may be omitted, enlarged or reduced, which does not represent the dimensions of the actual product; for those skilled in the art, it is understandable that some well-known structures and their descriptions in the drawings may be omitted.

[0035] The technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings and specific embodiments. However, those skilled in the art will understand that the following described embodiments are some embodiments of the present invention, rather than all embodiments, and are only used to illustrate the present invention and should not be regarded as limiting the scope of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present invention. For those conditions not specified in the embodiments, they are carried out according to the conventional conditions or the conditions recommended by the manufacturer. The reagents or instruments not specified by the manufacturer can be obtained as conventional products through commercial purchase. Embodiment 1

[0036] This embodiment discloses a processing system 100 for a thin film substrate layer, including: a chemical micro-etching device 110, and the chemical micro-etching device 110 is at least used for micro-etching the surface of the thin film substrate layer. In this embodiment, it is at least used for chemically micro-etching the surface of the thin film substrate layer. The chemical micro-etching device 110 includes an etching space, a thin film substrate layer loading mechanism, and a chemical treatment agent application mechanism. The thin film substrate layer loading mechanism guides the thin film substrate layer to the etching space, and the chemical micro-etching liquid application mechanism located in the etching space applies a chemical treatment agent to the surface of the thin film substrate layer.

[0037] In this embodiment, the chemical micro-etching device 110 applies a chemical treatment agent to micro-etch the surface of the substrate layer; the chemical micro-etching device 110 includes a roll coating device, a spraying device, and / or an immersion device. Among them, a corresponding chemical treatment agent accommodation space should be included. One of the roll coating device, the spraying device, or the immersion device can be selected to apply the chemical treatment agent, such as Figures 1 to 3 the shown immersion device, roll coating device, and spraying device. In addition, this system can also include a roll coating device, a spraying device, and an immersion device at the same time. Then, at least multiple branch guide rollers 101 are provided upstream of the chemical micro-etching device 110, and the multiple branch guide rollers 101 are used to respectively guide the thin film to the roll coating, spraying, or immersion device, such as Figure 4 shown. That is, multiple application methods are provided. In addition, multi-stage application can also be realized, such as Figure 5 shown, the chemical treatment agent is applied through the immersion device and the spraying device respectively, and then enters the residue removal device 120.

[0038] In this embodiment, the film substrate layer processing system 100 further includes a residue removal device 120, which is disposed downstream of the chemical micro-etching device 110; the residue removal device 120 includes a squeezing device, a blowing device, and / or a drying device. The squeezing device, the blowing device, and the drying device can be freely selected according to needs to cooperate with the chemical micro-etching device selected upstream. For example, Figures 1 to 3 as shown in the drying device, the squeezing device, and the blowing device corresponding to the residue removal device 120 in. Through the residue removal device 120, the components that no longer act can be removed, avoiding their continuous etching and the impact on lamination, and facilitating subsequent processing and lamination processes. In addition, in order to improve the discharge efficiency, a scraper device can also be disposed upstream of the residue removal device 120 for initially scraping off part of the residual chemical treatment agent.

[0039] That is, in the production direction, the film is unrolled and sequentially passes through the chemical micro-etching device 110 and the residue removal device 120 and then is wound up. And when the scraper device is provided, it sequentially passes through the chemical micro-etching device 110, the scraper device, and the residue removal device 120 and then is wound up. Embodiment 2

[0040] This embodiment discloses a composite foil production system, such as Figure 6 as shown, including: the film substrate layer processing system 100, the foil generation device 1300, and the lamination device 1200 of the foregoing Embodiment 1 that are distributed in sequence from upstream to downstream. Among them, the foil generation device 1300 is at least used to generate a foil layer; the lamination device 1200 laminates the substrate layer and the foil layer to obtain a composite foil.

[0041] It further includes an unwinding device 1100 and a winding device 1500; the unwinding device 1100 is at least used to unwind the substrate layer; the winding device 1500 is at least used to wind up the composite foil layer; after the substrate layer is unwound from the unwinding device 1100, it reaches between the lamination device 1200 and the foil generation device 1300 through the film substrate layer processing system 100, and a composite foil is formed and wound up by the winding device 1500.

[0042] That is, during the production process, it can be understood that the unwound film enters the film substrate layer processing system 100, and then the film after chemical micro-etching reaches the lamination device 1200. At the same time, the foil generation device 1300 has formed a foil layer; then the film continues to be transmitted to between the lamination device 1200 and the foil generation device, and under the action of the lamination device 1200, it is laminated with the foil layer on the foil generation device 1300 to obtain a composite foil. In addition, after obtaining the composite foil, a passivation device 1400 storing a passivation solution and the like can be used to further process the composite foil.

[0043] In this embodiment, the foil material generating device 1300 includes an electrolytic cell 1320 for containing electrolyte and a rotatable cathode roller 1310. A part of the cathode roller 1310 can be immersed in the electrolyte to form a foil layer on the surface of the cathode roller 1310. When the foil layer is a copper foil or the like, the foil material generating device 1300 can adopt a foil making machine in the prior art.

[0044] The composite device 1200 includes a pressure roller combination 1210 and a guiding roller 1220; the pressure roller combination 1210 and the surface of the cathode roller 1310 are configured such that with the surface of the cathode roller 1310 as the supporting surface, the pressure roller combination 1210 presses down on the base material layer and the foil layer to obtain a composite foil material; the guiding roller 1220 is used to pull the composite foil material away from the surface of the cathode roller 1310. The pressure roller combination 1210 is formed by two or more pressure roller assemblies, and the pressure roller assembly includes a pressure roller and a telescopic mechanism connected to the pressure roller; and the pressure roller assemblies in at least one pressure roller combination 1210 are arranged circumferentially along the foil material generating device.

[0045] In this embodiment, the base material layer is a PET film, a PP film, a PI film, a PE film, a PVC film, a PBT film, a PC film, a PS film, an ABS film, a PA film, a PASF film, a PVDF film, a PEDOT film, a PANI film, and a PPy film. Embodiment 3

[0046] This embodiment discloses a composite foil material production system, as Figure 7 shown. The difference from Embodiment 2 is only that this embodiment further includes a coating device 1600, which is arranged between the thin film base material layer processing system 100 and the foil material generating device. The coating device 1600 is configured to coat an adhesive layer on the surface of the thin film after passing through the thin film base material layer processing system 100. It further includes a pre-curing device 1700, which is arranged downstream of the coating device 1600 and is configured to cure the adhesive layer on the surface of the thin film; the thin film passes through the thin film base material layer processing system 100, the coating device 1600, and the pre-curing device 1700 in sequence and then reaches the composite device 1200. That is, in cooperation with the on-line chemical micro-etching in the foregoing Embodiment 2, for some thin films that have no or weak self-adhesion, this embodiment can cooperate with on-line coating of adhesive to realize the subsequent composite process. Embodiment 4

[0047] This embodiment discloses a composite foil material production system. The difference from Embodiment 2 or Embodiment 3 is only that it further includes a material transfer mechanism for transferring and installing the composite foil material on the winding device 1500 to the unwinding device 1100; and adjusting the unwinding of the composite foil material so that the uncomposite side faces the foil material generating device 1300 when reaching the composite device 1200. The material transfer mechanism can be a manipulator.

[0048] If single-sided lamination is achieved during the process from unwinding to winding in the composite foil production system of Example 2 or 3, when double-sided lamination needs to be achieved, it can be transferred to the initial unwinding position through the material transfer mechanism, and the other un-laminated side is used as the side to be laminated for unwinding and lamination, so that double-sided lamination can be achieved by repeating the production structure of single-layer lamination twice. More specifically, when using the material transfer mechanism, it can be applied to the production process of composite current collectors. Example 5

[0049] This example discloses the application of the foregoing Example 2, Example 3 or Example 4 in the production of composite current collectors. Based on the composite foil production system described in this application, it is beneficial to produce composite current collectors with stable lamination and good mechanical properties. And the corresponding production process has multiple advantages such as high efficiency and high process controllability. Example 6

[0050] This example discloses a composite current collector production line, including the composite foil production system of the foregoing Example 2 or Example 3.

[0051] And in this example, two or more of the above-mentioned composite foil production systems can be included; the composite foil production system includes an unwinding device 1100, a thin film substrate layer processing system 100, a foil generating device 1300, a lamination device 1200, and a winding device 1500 distributed from upstream to downstream; the winding device 1500 of the upstream adjacent composite foil production system forms the unwinding device 1100 of the downstream adjacent composite foil production system; and the two composite foil production systems laminate foil layers on both sides of the substrate layer respectively.

[0052] When the composite foil generation system achieves single-sided lamination, at this time, by setting two or more consecutive composite foil production systems and using the upstream winding device 1500 as the unwinding device 1100 of the downstream adjacent composite foil production system, the single-sided laminated foil can be used as the unwinding material, and then the composite foil generation process can be repeated for the un-laminated side for lamination. Double-sided lamination of the substrate layer can be achieved based on two composite foil production systems. Example 7

[0053] This example discloses a battery production line, including the composite foil production system of Example 2 or Example 3 as described above; and / or, the composite current collector production line of the foregoing Example 6. In addition to being used for composite foil production or composite current collector production alone, it can also be used as a part of the battery production line, so as to cooperate with the production of other materials and downstream processing to realize the production of batteries.

[0054] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the technical solutions of the present invention, rather than limitations on the specific implementation manners of the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the claims of the present invention shall be included within the protection scope of the claims of the present invention.

Claims

1. A processing system for a thin film substrate layer, characterized in that, Comprising: A chemical micro-etching device, which is at least used for micro-etching the surface of a thin film substrate layer.

2. The thin film substrate layer processing system according to claim 1, characterized in that, The chemical micro-etching device applies a chemical treatment agent to micro-etch the surface of the substrate layer; the chemical micro-etching device includes a roll coating device, a spraying device, and / or an immersion device.

3. The thin film substrate layer processing system according to claim 2, wherein It further includes a residue removal device, which is arranged downstream of the chemical micro-etching device; the residue removal device includes a squeezing device, a blowing device, and / or a drying device.

4. A composite foil production system, characterized in that, Comprising: A thin film substrate layer processing system, a foil generating device, and a laminating device as described in any one of claims 1 to 3, which are distributed in sequence from upstream to downstream, wherein the foil generating device is at least used for generating a foil layer; the laminating device laminates the substrate layer and the foil layer to obtain a composite foil.

5. The composite foil production system according to claim 4, characterized in that, The foil generating device includes a tank for containing electrolyte and a rotatable cathode roll, and part of the cathode roll can be immersed in the electrolyte to form a foil layer on the surface of the cathode roll; and / or, the laminating device includes a pressure roll combination and a guiding roll; the pressure roll combination and the surface of the cathode roll are configured such that with the surface of the cathode roll as the supporting surface, the pressure roll combination presses down the substrate layer and the foil layer to obtain a composite foil; the guiding roll is used to pull the composite foil away from the surface of the cathode roll; and / or, it further includes an adhesive coating device, which is arranged between the thin film substrate layer processing system and the foil generating device, and the adhesive coating device is configured to coat an adhesive layer on the surface of the thin film after passing through the thin film substrate layer processing system.

6. The composite foil production system according to claim 5, characterized in that, It further includes a curing device, which is arranged downstream of the adhesive coating device and is configured to cure the adhesive layer on the surface of the thin film; the thin film passes through the thin film substrate layer processing system, the adhesive coating device, and the curing device in sequence and then reaches the laminating device.

7. The composite foil production system according to any one of claims 4 to 6, characterized in that, It further includes an unwinding device and a winding device; the unwinding device is at least used for unwinding the substrate layer; the winding device is at least used for winding the composite foil layer; after the substrate layer is unwound from the unwinding device, it passes through the thin film substrate layer processing system and reaches between the laminating device and the foil generating device to form a composite foil, which is wound by the winding device.

8. The composite foil production system according to claim 7, characterized in that, It further includes a material transfer mechanism, which is used to transfer and install the composite foil on the winding device to the unwinding device; and adjust the unwinding of the composite foil so that the un-laminated side faces the foil generating device when reaching the laminating device.

9. The composite foil production system according to any one of claims 1 to 8, characterized in that, Application in the production of composite current collectors; and / or, the substrate layer is a PET film, a PP film, a PI film, a PE film, a PVC film, a PBT film, a PC film, a PS film, an ABS film, a PA film, a PASF film, a PVDF film, a PEDOT film, a PANI film, and a PPy film.

10. A composite current collector production line, characterized in that, Comprising the composite foil production system as described in any one of claims 4 to 9.

11. The composite current collector production line according to claim 10, characterized in that, Comprising two or more of the above-mentioned composite foil production systems; the composite foil production system includes an unwinding device, a thin film substrate layer processing system, a foil generating device, a laminating device, and a winding device, which are distributed from upstream to downstream; the winding device of the upstream adjacent composite foil production system forms the unwinding device of the downstream adjacent composite foil production system; and the two composite foil production systems laminate foil layers on different sides of the substrate layer respectively.

12. A battery production line, characterized in that, Including the composite foil production system according to any one of claims 4 to 9; and / or, the composite current collector production line according to any one of claims 10 to 11.

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