Transport system, article manufacturing method, transport method, computer program product, and storage medium

Abstract

The invention provides a transport system, an article manufacturing method, a transport method, a computer program product, and a storage medium. In a device provided with an air curtain in a passage connecting a transfer chamber and a processing chamber, mixing of an atmosphere is suppressed when an object to be processed is moved between the transfer chamber and the processing chamber. The present invention is provided with: a transport chamber; a processing device for processing the object to be conveyed; a passage connecting the transfer chamber and the processing device; an air curtain mechanism for forming an air curtain in the passage; a conveyance mechanism that moves the object to be conveyed from the conveyance chamber to the processing device via the passage; and a control unit. The passage is provided with an ejection mechanism that ejects gas in the region where the gas curtain is formed and a suction mechanism that sucks gas at a position closer to the processing device than the region where the gas curtain is formed, and the suction mechanism is driven when the tip of the object to be conveyed is closer to the processing device than the region where the gas curtain is formed. The ejection mechanism is driven when the rear end of the conveyed object is located in the area where the air curtain is formed.

Description

Technical Field

[0001] The present invention relates, for example, to a transfer system that moves a transfer object such as a substrate between a transfer chamber and a processing device, etc. Background Art

[0002] In the manufacture of electronic devices such as semiconductors, flat panel displays, and solar cells, processing devices that perform various processes such as etching, film formation, drying, cleaning, firing, ashing, and surface treatment are used. In the processing chamber of these processing devices, for example, in order to process an object to be processed such as a substrate, it is necessary to maintain a specified gas atmosphere with extremely high purity.

[0003] When loading an object to be processed into the processing chamber or unloading it from the processing chamber, if external gas mixes into the gas atmosphere in the processing chamber, the purity of the atmosphere gas in the processing chamber decreases, which may hinder the processing. Therefore, a load lock chamber is arranged in the transfer path for loading the object to be processed into the processing device or in the transfer path for unloading the object to be processed from the processing device, and the atmosphere of the load lock chamber is replaced corresponding to the atmosphere of the destination during loading or unloading.

[0004] However, a transfer system equipped with a load lock chamber not only has a large device configuration and high cost, but also takes a long time for atmosphere replacement, so there is a problem that the manufacturing speed of electronic devices decreases.

[0005] Patent Document 1 describes the following method: A gas curtain mechanism and an exhaust treatment mechanism are arranged in the transfer path of the object to be processed to suppress the mixing of outside air into the atmosphere of the processing chamber.

[0006] Prior Art Documents

[0007] Patent Documents

[0008] Patent Document 1: Japanese Patent Application Laid-Open No. 2008-262781 Summary of the Invention

[0009] Problems to be Solved by the Invention

[0010] In the method described in Patent Document 1, when loading a transfer object from the transfer chamber to the processing chamber via the transfer path, sometimes a relatively large amount of the atmosphere of the transfer path mixes into the processing chamber. Therefore, sometimes the purity of the atmosphere in the processing chamber decreases, and the target processing cannot be appropriately performed in the processing chamber.

[0011] In addition, when moving the processed transfer object from the processing chamber to the transfer chamber via the transfer path, sometimes a relatively large amount of the process gas in the processing chamber mixes into the atmosphere of the transfer path. If the process gas in the processing chamber mixes into the atmosphere of the gas curtain in the transfer path, sometimes the process gas may further mix from the atmosphere of the gas curtain to the atmosphere of the transfer chamber.

[0012] Generally speaking, the atmosphere in the transfer chamber is adjusted to prevent the deterioration of substrates and other objects to be processed. However, if the process gas in the processing chamber is mixed in, the object to be transferred may deteriorate during its stay in the transfer chamber, which is an undesirable situation. In addition, the gas used as the air curtain is generally recycled. However, if a relatively large amount of process gas is mixed in, the purification process to restore the purity will take time, thus sometimes reducing the manufacturing speed of electronic devices.

[0013] Therefore, the following technology is expected: in a device having an air curtain in the passage connecting the transfer chamber and the processing chamber, when moving the object to be processed (transfer object) between the transfer chamber and the processing chamber, it is possible to suppress the mixing of the atmosphere of one of the transfer chamber or the processing chamber into the other.

[0014] Solution to the problem

[0015] A first aspect of the present invention is a transfer system, characterized in that the transfer system includes: a transfer chamber in which a first atmosphere circulates; a processing device that processes an object to be transferred in a second atmosphere having a composition different from the first atmosphere; a passage that connects the transfer chamber and the processing device; an air curtain mechanism that forms an air curtain in the passage, the air curtain being used to suppress the mixing of the first atmosphere in the transfer chamber and the second atmosphere in the processing device; a transfer mechanism that moves the object to be transferred through the passage along a first direction from the transfer chamber toward the processing device or along a second direction from the processing device toward the transfer chamber; and a control unit. In the passage, there are arranged: a first suction mechanism that suctions gas in an area where the air curtain is formed; a first ejection mechanism that ejects gas in an area where the air curtain is formed; a second suction mechanism that suctions gas at a position closer to the processing device than the area where the air curtain is formed; and a second ejection mechanism that ejects gas at a position closer to the processing device than the area where the air curtain is formed. When the object to be transferred passes through the passage, the control unit drives at least one of the first suction mechanism, the first ejection mechanism, the second suction mechanism, and the second ejection mechanism according to the direction in which the transfer mechanism moves the object to be transferred and the position of the object to be transferred.

[0016] In addition, a second aspect of the present invention is a conveying method that uses a conveying system. The conveying system includes: a conveying chamber in which a first atmosphere circulates; a processing device that processes an object to be conveyed in a second atmosphere having a composition different from that of the first atmosphere; a passage that connects the conveying chamber and the processing device; an air curtain mechanism that forms an air curtain in the passage, the air curtain being used to inhibit mixing of the first atmosphere in the conveying chamber and the second atmosphere in the processing device; a conveying mechanism that moves the object to be conveyed through the passage along a first direction from the conveying chamber toward the processing device or along a second direction from the processing device toward the conveying chamber; and a control unit. In the passage, there are arranged: a first suction mechanism that suctions gas in an area where the air curtain is formed; a first ejection mechanism that ejects gas in an area where the air curtain is formed; a second suction mechanism that suctions gas at a position closer to the processing device than the area where the air curtain is formed; and a second ejection mechanism that ejects gas at a position closer to the processing device than the area where the air curtain is formed. The control unit is characterized in that when the object to be conveyed passes through the passage, the control unit drives at least one of the first suction mechanism, the first ejection mechanism, the second suction mechanism, and the second ejection mechanism according to the direction in which the conveying mechanism moves the object to be conveyed and the position of the object to be conveyed.

[0017] In addition, a third aspect of the present invention is a conveying system, characterized in that the conveying system includes: a conveying chamber in which a first atmosphere circulates; a processing device that processes an object to be conveyed in a second atmosphere having a composition different from that of the first atmosphere; a passage that connects the conveying chamber and the processing device; an air curtain mechanism that forms an air curtain in the passage, the air curtain being used to inhibit mixing of the first atmosphere in the conveying chamber and the second atmosphere in the processing device; a conveying mechanism that moves the object to be conveyed from the conveying chamber toward the processing device through the passage; and a control unit. In the passage, there are arranged an ejection mechanism that ejects gas in an area where the air curtain is formed and a suction mechanism that suctions gas at a position closer to the processing device than the area where the air curtain is formed. When the front end of the object to be conveyed is at a position closer to the processing device than the area where the air curtain is formed, the control unit drives the suction mechanism. When the rear end of the object to be conveyed is in the area where the air curtain is formed, the control unit drives the ejection mechanism.

[0018] In addition, a fourth aspect of the present invention is a transfer system, characterized in that the transfer system includes: a transfer chamber in which a first atmosphere circulates; a processing device that processes an object to be transferred in a second atmosphere having a composition different from that of the first atmosphere; a passage that connects the transfer chamber and the processing device; an air curtain mechanism that forms an air curtain in the passage, the air curtain being used to inhibit the mixing of the first atmosphere in the transfer chamber and the second atmosphere in the processing device; a transfer mechanism that moves the object to be transferred from the processing device to the transfer chamber via the passage; and a control unit. In the passage, a suction mechanism that sucks gas in a region where the air curtain is formed and a jet mechanism that jets gas at a position closer to the processing device than the region where the air curtain is formed are arranged. When the front end of the object to be transferred is in the region where the air curtain is formed, the control unit drives the suction mechanism, and when the rear end of the object to be transferred is at a position closer to the processing device than the region where the air curtain is formed, the control unit drives the jet mechanism.

[0019] Effects of the Invention

[0020] According to the present invention, in a device in which a passage connecting a transfer chamber and a processing chamber is provided with an air curtain, when moving an object to be processed (transfer object) between the transfer chamber and the processing chamber, it is possible to inhibit the atmosphere of one of the transfer chamber or the processing chamber from mixing into the other. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic cross-sectional view for explaining a passage included in a transfer device according to Embodiment 1.

[0022] Figure 2 It is a schematic top view showing the configuration of a manufacturing device for an electronic device according to Embodiment 1.

[0023] Figure 3 It is a schematic diagram for explaining atmosphere gas linked to a substrate near the front end or the rear end of the substrate when the substrate as a transfer body moves.

[0024] Figure 4 It is a flowchart showing the order of a transfer process of transferring a substrate from a transfer chamber to a processing unit via a passage in Embodiment 1.

[0025] Figure 5 It is a schematic diagram showing the positional relationship of each part when the front end of a substrate moving in the A direction is detected by a sensor.

[0026] Figure 6 It is a schematic diagram showing the positional relationship of each part when the rear end of a substrate moving in the A direction is detected by a sensor.

[0027] Figure 7 is a flowchart showing the order of the transfer process of transferring a substrate from the processing unit to the transfer chamber via a passage in Embodiment 1.

[0028] Figure 8 is a schematic diagram showing the positional relationship of each part at the timing when the front end of the substrate moving in the A' direction is detected by the sensor.

[0029] Figure 9 is a schematic diagram showing the positional relationship of each part at the timing when the rear end of the substrate moving in the A' direction is detected by the sensor.

[0030] Figure 10 is a flowchart showing the order of the transfer process of transferring a substrate from the transfer chamber to the processing unit via a passage in Embodiment 2.

[0031] Figure 11 is a schematic diagram showing the positional relationship of each part at the timing when the front end of the substrate moving in the A direction reaches the suction start position.

[0032] Figure 12 is a schematic diagram showing the positional relationship of each part at the timing when the rear end of the substrate moving in the A direction reaches the ejection start position.

[0033] Figure 13 is a flowchart showing the order of the transfer process of transferring a substrate from the processing unit to the transfer chamber via a passage in Embodiment 2.

[0034] Figure 14 is a schematic diagram showing the positional relationship of each part at the timing when the front end of the substrate moving in the A' direction reaches the suction start position.

[0035] Figure 15 is a schematic diagram showing the positional relationship of each part at the timing when the rear end of the substrate moving in the A' direction reaches the ejection start position. Detailed Embodiments

[0036] The transfer device and the like as an embodiment of the present invention will be described with reference to the accompanying drawings. In addition, the following embodiments are illustrative examples. For example, the configuration of the detailed parts can be appropriately changed by those skilled in the art within the scope not departing from the concept of the present invention. In addition, in the accompanying drawings referred to in the following description of the embodiments, unless otherwise specified, elements denoted by the same reference numerals have the same functions. In the drawings, when there are multiple identical elements, the labeling and description of the reference numerals may sometimes be omitted.

[0037] In addition, the accompanying drawings may be schematically represented for convenience of illustration and description. Therefore, the shape, size, arrangement, etc. of the elements described in the accompanying drawings are not necessarily strictly consistent with the actual objects.

[0038] In addition, in the following description, for example, when it is denoted as the +X direction, it means the same direction as the direction pointed by the arrow of the X-axis in the illustrated coordinate system. When it is denoted as the -X direction, it means the direction opposite by 180 degrees to the direction pointed by the arrow of the X-axis in the illustrated coordinate system. In addition, when it is simply denoted as the X direction, regardless of the difference in the orientation pointed by the arrow of the X-axis in the illustration, it means the direction parallel to the X-axis. The same applies to other axes other than the X-axis.

[0039] [Embodiment 1]

[0040] Figure 2 It is a schematic top view showing the configuration of a manufacturing apparatus 100 for an electronic device including the transfer device according to Embodiment 1. In the following description, in order to clarify the positional relationship, the X-axis direction, Y-axis direction, and Z-axis direction that are orthogonal to each other are defined, and the +Z direction is set as the vertically upward direction. The manufacturing apparatus 100 is, for example, an apparatus for manufacturing a substrate used for a display device.

[0041] The manufacturing apparatus 100 can be configured to include, for example, a film forming apparatus that forms an organic film on a substrate 11. The organic film can be, for example, any one of a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer of an organic EL element (OLED). The process of manufacturing an organic EL element may include a step of forming an organic film such as a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer on the substrate by applying a solution containing a functional material.

[0042] The process of forming an organic film on the substrate 11 may include: a cleaning step of cleaning the substrate 11; a coating step of coating a film forming solution on the substrate 11, for example, by an inkjet method; a drying step of drying the coated film forming solution to form a dry film; and a firing step of firing the dry film. The film forming solution may be a solution containing a solute and a solvent for forming an organic film.

[0043] The manufacturing apparatus 100 includes processing units 62 to 67 and a processing unit 3, which respectively perform any of the above steps. In addition, the manufacturing apparatus 100 may include: a gate 61 for loading a substrate from outside the apparatus or unloading a substrate to outside the apparatus; and a load lock chamber 60 for shielding the atmosphere outside and inside the apparatus during loading or unloading.

[0044] The gate 61, processing units 62 to 67, and processing unit 3 are arranged so as to surround the transfer chamber 1. The manufacturing apparatus 100 includes a transfer mechanism 10 for transferring the substrate 11 from the transfer chamber 1 to the gate 61 or any of the processing units, or for transferring the substrate 11 from the gate 61 or any of the processing units to the transfer chamber 1. As the transfer mechanism 10, for example, a transfer robot having an articulated robot hand can be used, and the transfer robot includes a mechanism for rotating the robot hand toward the gate 61 or any of the processing units. In order to prevent the substrate 11 from deteriorating in the transfer chamber 1, the main component of the atmosphere in the transfer chamber 1 is an inert gas (e.g., N2), and preferably a high-purity inert gas atmosphere containing 90% or more of the inert gas by volume ratio is used.

[0045] The processing units 62 to 67 and the processing unit 3 are respectively processing apparatuses for processing a substrate (object to be transferred). The processing units 62 to 67 and the processing unit 3 can be respectively any one of a cleaning apparatus for cleaning the substrate 11, a coating apparatus for coating a film-forming solution as an organic film raw material on the substrate 11, a drying apparatus for drying the coated film-forming solution, and a firing apparatus for firing the dried film-forming solution. These processing units (processing apparatuses) may include a processing chamber for maintaining an atmosphere suitable for the processing performed by each of them. That is, the manufacturing apparatus 100 can be a substrate manufacturing apparatus in a multi-chamber form.

[0046] For example, as the atmosphere in the processing chambers of the cleaning apparatus, coating apparatus, and firing apparatus, clean dry air (hereinafter referred to as CDA, CDA atmosphere, etc.) that can be supplied at a relatively low cost can be appropriately used. Particularly in a process that requires an appropriate amount of oxygen such as firing, CDA can be appropriately used. The atmosphere of these processing apparatuses can use an atmosphere having a higher oxygen content than the atmosphere of the transfer chamber 1. In addition, for example, regarding the drying apparatus, in order to adjust the drying rate of the coated film-forming solution, an atmosphere containing an appropriate amount of solvent vapor or the like can be appropriately used. As will be described later, in the present embodiment, among the passages connecting each processing unit and the transfer chamber 1, an air curtain is provided at least in the passage 4 connecting the processing unit 3 and the transfer chamber 1 to suppress the mixing of the atmosphere of the processing unit 3 and the atmosphere of the transfer chamber 1.

[0047] The manufacturing apparatus 100 may further include a control unit 20. The control unit 20 may be constituted by hardware such as an FPGA (Field Programmable Gate Array), for example. It may also be constituted by a PLD (Programmable Logic Device) or an ASIC (Application Specific Integrated Circuit). Alternatively, the control unit 20 may be constituted by a general-purpose or special-purpose computer embedded with a program (software), or may be constituted by a combination of all or a part of the foregoing.

[0048] The control unit 20 may include a CPU, an I / O interface, and a computer-readable storage medium. As the computer-readable storage medium, a non-transitory storage medium that stores a processing program executed by the CPU or parameters required for processing execution, etc. may be used. As the non-transitory storage medium, for example, a floppy disk, an optical disc, an optical magnetic disk, a magnetic tape, a USB memory, an SSD, etc. may be used. In addition, the information processing apparatus included in the control unit 20 may include a rewritable storage medium (such as a RAM) that provides a storage area required for processing such as arithmetic operations.

[0049] The control unit 20 controls the operations of various parts of the manufacturing apparatus 100, including the transfer mechanism 10, the processing units 62 to 67, the processing unit 3, and elements (to be described later) provided in the path 4 connecting the transfer chamber 1 and the processing unit 3. In the computer-readable non-transitory storage medium included in the control unit 20, a control program for causing the manufacturing apparatus 100 to execute the manufacturing of the substrate for the organic EL display device, including the transfer operation according to the present embodiment, is stored.

[0050] (Path connecting the transfer chamber and the processing unit)

[0051] Figure 1 It is a schematic cross-sectional view for explaining the path 4 included in the transfer apparatus according to Embodiment 1. Figure 1 It is along Figure 2 A partial cross-sectional view of the manufacturing apparatus 100 cut along the D-D line indicated by a one-dot chain line in the figure. Here, the processing unit 3 may be, for example, a firing apparatus that heats a substrate in a CDA atmosphere containing oxygen, but the processing unit 3 may also be a cleaning apparatus, a coating apparatus, or the like.

[0052] The atmosphere in the transfer chamber 1 is an atmosphere having a composition containing an inert gas with a volume ratio of 90% or more, and the atmosphere in the processing unit 3 (processing apparatus) is an atmosphere having a composition containing a larger volume ratio of oxygen than the atmosphere in the transfer chamber 1. That is, the compositions of the atmosphere in the transfer chamber 1 and the atmosphere in the processing unit 3 are different from each other.

[0053] The transfer chamber 1 and the processing unit 3 are connected by a passage 4 defined by airtight peripheral components. The internal space of the passage 4 surrounded by the peripheral components has a size that allows the substrate 11 held by the transfer mechanism 10 to pass through.

[0054] Figure 1 The state is shown in which the transfer mechanism 10 moves the substrate 11 in the A direction (+X direction) in order to transfer the substrate 11 from the transfer chamber 1 to the processing unit 3. As will be described later, when moving the substrate 11 from the processing unit 3 to the transfer chamber 1, the transfer mechanism 10 can move the substrate 11 in the A' direction (-X direction).

[0055] The transfer chamber 1 is provided with a gas supply mechanism (not shown) that supplies and circulates a high-concentration inert gas (e.g., N2), and the composition of the atmosphere in the transfer chamber 1 is adjusted to highly purely contain the inert gas. The processing unit 3 is provided with a CDA supply mechanism (not shown) that supplies CDA, and the atmosphere in the chamber of the processing unit 3 is adjusted to be filled with CDA.

[0056] In the passage 4 connecting the transfer chamber 1 and the processing unit 3, there are provided an air curtain ejection port (not shown) and an air curtain suction port (not shown) for forming an air curtain 2 through which a high-concentration inert gas (e.g., N2) flows. The air curtain 2 is always formed in the passage 4 whether the substrate 11 is present or not, so as to suppress the mixing of the atmosphere in the transfer chamber 1 and the atmosphere in the processing unit 3. The gas forming the air curtain 2 is preferably a gas containing 90% or more of an inert gas by volume ratio and is recycled. In the air curtain 2, a gas containing 90% or more of an inert gas is circulated in the same manner as in the transfer chamber 1, but in the transfer chamber 1, it is necessary to stably maintain the inert gas with high purity compared to the air curtain 2. Therefore, the atmosphere in the transfer chamber 1 and the atmosphere in the air curtain 2 are preferably supplied through different gas circulation systems.

[0057] In the present embodiment, in the passage 4, a sensor 41, gas inlets / outlets 31a and 31b, gas inlets / outlets 21a and 21b, and a sensor 42 are provided in sequence from the transfer chamber 1 side toward the processing unit 3 side.

[0058] Sensors 41 and 42 are arranged at specified positions in passage 4 to detect the position of substrate 11 as the object to be transported. In the present embodiment, sensor 41 is arranged closer to transfer chamber 1 than any of gas inlets / outlets 31a, 31b, 21a, and 21b. Sensor 41 is configured to detect whether the front end or the rear end of substrate 11 reaches a specified position inside air curtain 2 when substrate 11 is moved in the A direction from transfer chamber 1 toward processing unit 3. Further, sensor 42 is arranged closer to processing unit 3 than any of gas inlets / outlets 31a, 31b, 21a, and 21b. Sensor 42 is configured to detect whether the front end or the rear end of substrate 11 reaches a specified position outside air curtain 2 when substrate 11 is moved in the A' direction from processing unit 3 toward transfer chamber 1. For sensors 41 and 42, an optical sensor or an ultrasonic sensor can be used, for example. However, as long as it is a detection mechanism capable of detecting the position of substrate 11 as the object to be transported, it is not limited to the exemplified sensors, and it can also be a camera capable of capturing moving images, for example. Further, the sensors do not necessarily have to be provided in passage 4.

[0059] The detection signals of sensors 41 and 42 are sent to control unit 20. As will be described later, control unit 20 controls the inflow and outflow of gas at gas inlets / outlets 31a, 31b, 21a, and 21b based on the notified detection results.

[0060] Each gas inlet / outlet is configured to be able to select, based on an instruction from control unit 20, whether to eject a high-concentration inert gas (e.g., N2) to a specified position in passage 4, whether to suck the atmosphere at a specified position in passage 4, or whether to neither eject nor suck but close. Among them, gas inlets / outlets 31a and 31b as the first gas inlets / outlets are arranged at positions closer to processing unit 3 in the region where air curtain 2 flows stably, specifically, near the end of air curtain 2 on the processing unit 3 side. Gas inlets / outlets 21a and 21b as the second gas inlets / outlets are arranged on the processing unit 3 side compared to the region where air curtain 2 flows stably.

[0061] Each gas inlet / outlet is connected to an inert gas supply mechanism and a suction mechanism such as a vacuum pump via an electromagnetic valve capable of switching or opening / closing the path. Control unit 20 can, for example, close each gas inlet / outlet, eject an inert gas from the gas inlet / outlet to passage 4, or suck and discharge the atmosphere of passage 4 from the gas inlet / outlet by controlling the operation of the electromagnetic valve.

[0062] Figure 3This is a schematic diagram for explaining the linkage between the atmospheric gas and the substrate 11 near the front end or rear end of the substrate when the substrate 11 as the transported body moves in the passage 4. For example, when the substrate 11 is moved in the A direction (+X direction) to move the substrate 11 from the transport chamber 1 to the processing unit 3, there is a region 51 near the front end of the substrate 11 when viewed in the moving direction, where the gas mass is pushed out by the substrate 11. In addition, there is a region 52 near the rear end of the substrate 11 when viewed in the moving direction, where the gas mass is carried (attracted) by the substrate 11 due to the pressure drop.

[0063] In addition, for example, when the substrate 11 is moved in the A' direction (-X direction) in order to move the substrate 11 from the processing section 3 to the transfer chamber 1, there is a region 52 near the front end of the substrate 11 when viewed in the moving direction, where the gas mass is pushed out. In addition, there is a region 51 near the rear end of the substrate 11 when viewed in the moving direction, where the gas mass is carried (attracted) by the substrate 11 due to the pressure drop. In this embodiment, the control section 20 uses the gas inlet and outlet 31a to the gas inlet and outlet 21b to appropriately control the flow of gas in the passage 4, and suppresses the gas mass in the region 51 or the region 52 that is linked to the substrate 11 from being carried and mixed into the chamber atmosphere to be moved. When the substrate 11 is moved from the transfer chamber 1 to the processing section 3 and when the substrate 11 is moved from the processing section 3 to the transfer chamber 1, a high concentration of inert gas (for example, N2) can be stably circulated, especially in the transfer chamber 1.

[0064] (Control when moving substrates from the transfer chamber to the processing unit)

[0065] Figure 4 1 is a flowchart showing the procedure of a transfer process of transferring the substrate 11 from the transfer chamber 1 to the processing unit 3 via the passage 4. Each step of the process is executed by the control unit 20 controlling each part of the manufacturing apparatus 100.

[0066] When the transport process starts, in step S201, the control unit 20 controls the transport mechanism 10 to move the substrate 11 from the transport chamber 1 to the processing unit 3. The sensors 41 and 42 start to detect whether the substrate 11 exists at each detection point, and then send the detection results to the control unit. Under the control of the control unit 20, the gas curtain 2 is stably formed before the transport process starts, and the four gas inlets and outlets 31a to 21b are all closed.

[0067] In step S202 , when the sensor 41 detects that the front end of the substrate 11 has reached the vicinity of the end of the air curtain 2 , the sensor 41 sends this information to the control unit 20 . Figure 5It is a schematic diagram showing the positional relationship of each part when the front end of the substrate 11 moving in the A direction at a speed V1 is detected by the sensor 41. When viewed in the A direction as the traveling direction, at the front end of the substrate 11, the region 51 for ejecting the air mass exists within a range of length L2. That is, the substrate 11 moves toward the processing unit 3 while causing the region 51 for ejecting the inert gas of the air curtain 2 to accompany the front end side.

[0068] In step S203, the control unit 20 determines, for example, using a software timer, whether the first specified time (suction start setting time T1) has elapsed after the front end of the substrate 11 is detected by the sensor 41. The suction start setting time T1 can be set, for example, to satisfy the following formula 1 and formula 2. However, it is set such that T1 ≥ 0.

[0069] Formula 1

[0070]

[0071] Formula 2

[0072]

[0073] (V1: Conveying speed, L1: Distance from the sensor 41 to the gas inlets 21a and the gas inlets 21b, L2: Width of the region 51, β1: Delay time until a stable air flow state is achieved)

[0074] When the control unit 20 determines that the suction start setting time T1 has not elapsed (step S203: No), it stands by while repeatedly executing step S203 in a loop.

[0075] If the control unit 20 determines that the suction start setting time T1 has elapsed (step S203: Yes), it proceeds to step S204 and starts suction of gas from the gas inlets 21a and the gas inlets 21b.

[0076] In the next step S205, the control unit 20 determines, for example, using a software timer, whether the second specified time (suction end setting time T2) has elapsed. The suction end setting time T2 can be set, for example, to satisfy the following formula 3. However, it is set such that T2 ≥ 0.

[0077] Formula 3

[0078]

[0079] When the control unit 20 determines that the suction end setting time T2 has not elapsed (step S205: No), it repeatedly executes step S205 in a loop.

[0080] If the control unit 20 determines that the suction end setting time T2 has elapsed (step S205: Yes), it proceeds to step S206 and stops sucking gas from the gas inlets 21a and the gas outlets 21b.

[0081] In the present embodiment, through the above suction operation, when the substrate 11 moves toward the processing unit 3 via the inert gas curtain 2, the air mass (inert gas) in the area 51 linked to the front end side of the substrate 11 is sucked and discharged from the gas inlets 21a and the gas outlets 21b. Therefore, it is possible to prevent the inert gas of the curtain 2 from being introduced into the processing unit 3 and mixed into the atmosphere (e.g., CDA) of the processing unit 3.

[0082] In the next step S207, if the sensor 41 detects that the rear end of the substrate 11 has passed, the control unit 20 is sent this information. Figure 6 FIG. is a schematic diagram showing the positional relationship of the respective parts at the timing when the sensor 41 detects that the rear end of the substrate 11 moving in the A direction at the speed V1 has passed. When viewed in the A direction as the traveling direction, at the rear end portion of the substrate 11, the area 52 carrying the air mass due to the pressure reduction during movement exists in the range of the length L5. That is, the substrate 11 moves toward the processing unit 3 while causing the area 52 carrying the inert gas of the curtain 2 to follow the rear end side.

[0083] In step S208, the control unit 20 determines, for example, using a software timer, whether the third specified time (spray start setting time T3) has elapsed after the sensor 41 detects the passage of the rear end portion of the substrate 11. The spray start setting time T3 can be set, for example, to satisfy the following formulas 4 and 5. However, it is set such that T3 ≥ 0.

[0084] Formula 4

[0085]

[0086] Formula 5

[0087]

[0088] (V1: Conveying speed, L3: Distance from the sensor 41 to the gas inlets 31a and the gas outlets 31b, L5: Width of the area 52, β3: Delay time until a stable air flow state is achieved)

[0089] When the control unit 20 determines that the spray start setting time T3 has not elapsed (step S208: No), it stands by while repeatedly executing step S208 in a loop.

[0090] When the control unit 20 determines that the ejection start set time T3 has elapsed (step S208: Yes), it proceeds to step S209 and starts ejecting gas (e.g., the same gas as the air curtain 2) from the gas inlets / outlets 31a and 31b.

[0091] In the next step S210, the control unit 20 determines whether the fourth specified time (ejection end set time T4) has elapsed, for example, using a software timer. The ejection end set time T4 can be set, for example, to satisfy the following arithmetic expression 6. However, it is set such that T4 ≥ 0.

[0092] Arithmetic Expression 6

[0093]

[0094] When the control unit 20 determines that the ejection end set time T4 has not elapsed (step S210: No), it repeatedly executes step S210 in a loop.

[0095] When the control unit 20 determines that the ejection end set time T4 has elapsed (step S210: Yes), it proceeds to step S211 and stops ejecting gas from the gas inlets / outlets 31a and 31b.

[0096] In the present embodiment, through the above ejection operation, when the substrate 11 moves from the transfer chamber 1 to the processing unit 3 via the inert gas air curtain 2, inert gas is ejected from the gas inlets / outlets 31a and 31b. Therefore, the pressure drop occurring on the rear end side of the substrate 11 can be alleviated. As a result, the linkage (attraction) of the gas mass (inert gas) in the region 52 can be alleviated, and it is possible to prevent the inert gas of the air curtain 2 from being introduced into the processing unit 3 and mixed into the atmosphere (e.g., CDA) of the processing unit 3. In this way, when the substrate 11 is transferred into the processing unit 3, in step S212, the control unit 20 ends the transfer process of the substrate 11.

[0097] (Control when moving the substrate from the processing unit to the transfer chamber)

[0098] Figure 7 It is a flowchart showing the sequence of the transfer process of transferring the substrate 11 from the processing unit 3 to the transfer chamber 1 via the passage 4. Each step of the process is executed by controlling each part of the manufacturing apparatus 100 by the control unit 20.

[0099] When the transfer process starts, in step S301, the control unit 20 controls the transfer mechanism 10 to move the substrate 11 from the processing unit 3 towards the transfer chamber 1. The sensors 41 and 42 start detecting whether there is a substrate 11 at each detection point, and then send the detection results to the control unit. Through the control of the control unit 20, the air curtain 2 is stably formed before the transfer process starts, and all four gas inlets / outlets 31a to 31b are closed.

[0100] In step S302, if the sensor 42 detects the arrival of the front end of the substrate 11, the information is sent to the control unit 20. Figure 8 It is a schematic diagram showing the positional relationship of each part at the timing when the sensor 42 detects the front end of the substrate 11 moving in the A' direction at a speed V2. When viewed in the A' direction as the traveling direction, in the front end portion of the substrate 11, the region 51 for pushing out the air mass exists within a range of length L12. That is, the substrate 11 moves towards the transfer chamber 1 while causing the region 51 for pushing out the atmosphere gas (e.g., CDA) of the processing unit 3 to accompany the front end side.

[0101] In step S303, the control unit 20 determines, for example, using a software timer, whether the fifth specified time (suction start setting time T11) has elapsed after the front end portion of the substrate 11 is detected by the sensor 42. The suction start setting time T11 can be set, for example, to satisfy the following formulas 7 and 8. However, it is set such that T11 ≥ 0.

[0102] Formula 7

[0103]

[0104] Formula 8

[0105]

[0106] (V2: transfer speed, L11: distance from the sensor 42 to the gas inlets / outlets 31a and 31b, L12: width of the region 51, β11: delay time until the stable air flow state is achieved)

[0107] When the control unit 20 determines that the suction start setting time T11 has not elapsed (step S303: No), it stands by while repeatedly executing step S303 cyclically.

[0108] If the control unit 20 determines that the suction start setting time T11 has elapsed (step S303: Yes), it proceeds to step S304 and starts gas suction from the gas inlets / outlets 31a and 31b.

[0109] In the next step S305, the control unit 20 determines whether the sixth specified time (suction end setting time T12) has elapsed, for example, using a software timer. The suction end setting time T12 can be set, for example, to satisfy the following arithmetic expression 9. However, it is set such that T12 ≥ 0.

[0110] Arithmetic expression 9

[0111]

[0112] (V2: Conveying speed, L12: Width of area 51)

[0113] When the control unit 20 determines that the suction end setting time T12 has not elapsed (step S305: No), it repeatedly executes step S305 in a loop.

[0114] If the control unit 20 determines that the suction end setting time T12 has elapsed (step S305: Yes), it proceeds to step S306 and stops the gas suction from the gas inlets / outlets 31a and 31b.

[0115] In the present embodiment, through the above suction operation, when the substrate 11 moves via the inert gas curtain 2, the air mass (atmosphere gas of the processing unit 3) in the area 51 linked to the front end side of the substrate 11 is sucked and discharged from the gas inlets / outlets 31a and 31b. Therefore, it is possible to prevent the atmosphere gas of the processing unit 3 from being introduced into the transfer chamber 1 and mixed into the atmosphere (e.g., N2) of the transfer chamber 1.

[0116] In the next step S307, if the sensor 42 detects that the rear end of the substrate 11 has passed, it sends this information to the control unit 20. Figure 9 FIG. is a schematic diagram showing the positional relationship of each part at the timing when the sensor 42 detects that the rear end of the substrate 11 moving in the A' direction at a speed V2 has passed. When viewed in the A' direction as the traveling direction, at the rear end portion of the substrate 11, the area 52 that carries (sucks) the air mass due to the pressure reduction during movement exists in the range of the length L15. That is, the substrate 11 moves toward the transfer chamber 1 while causing the area 52 that carries the atmosphere gas of the processing unit 3 to follow the rear end side.

[0117] In step S308, the control unit 20 determines whether the seventh specified time (spray start setting time T13) has elapsed after the sensor 42 detects the passage of the rear end portion of the substrate 11, for example, using a software timer. The spray start setting time T13 can be set, for example, to satisfy the following arithmetic expressions 10 and 11. However, it is set such that T13 ≥ 0.

[0118] Arithmetic expression 10

[0119]

[0120] Arithmetic expression 11

[0121]

[0122] (V2: Conveying speed, L13: Distance from sensor 42 to gas inlets / outlets 21a and 21b, L15: Width of area 52, β13: Delay time until a stable air flow state is achieved)

[0123] When the control unit 20 determines that the ejection start setting time T13 has not elapsed (step S308: No), it waits while repeatedly executing step S308 in a loop.

[0124] If the control unit 20 determines that the ejection start setting time T13 has elapsed (step S308: Yes), it proceeds to step S309 and starts ejecting gas (e.g., gas of the same type as air curtain 2) from gas inlets / outlets 21a and 21b.

[0125] In the next step S310, the control unit 20 determines, for example, using a software timer, whether the 8th specified time (ejection end setting time T14) has elapsed. The ejection end setting time T14 can be set, for example, to satisfy the following arithmetic expression 12. However, it is set such that T14 ≥ 0.

[0126] Arithmetic expression 12

[0127]

[0128] When the control unit 20 determines that the ejection end setting time T14 has not elapsed (step S310: No), it repeatedly executes step S310 in a loop.

[0129] If the control unit 20 determines that the ejection end setting time T14 has elapsed (step S310: Yes), it proceeds to step S311 and stops ejecting gas from gas inlets / outlets 21a and 21b.

[0130] In this embodiment, through the above ejection operation, when the substrate 11 moves toward the processing unit 3 via the air curtain of the inert gas, inert gas is ejected from gas inlets / outlets 21a and 21b. Thus, the pressure drop occurring at the rear end side of the substrate 11 can be alleviated. As a result, the linkage of the air mass in area 52 is alleviated, and it is possible to prevent the atmosphere gas of the processing unit 3 from being introduced into the transfer chamber 1 and mixed into the atmosphere (e.g., N2) of the transfer chamber 1. In this way, when the substrate 11 is loaded into the transfer chamber 1, in step S312, the control unit 20 ends the transfer process of the substrate 11.

[0131] [Embodiment 2]

[0132] A manufacturing apparatus for an electronic device having the transfer device according to Embodiment 2 will be described. For matters common to Embodiment 1, the description will be simplified or omitted.

[0133] In Embodiment 1, sensors 41 and 42 for detecting the position of the substrate are provided in the passage 4, and the control unit 20 controls the inflow and outflow of gas at the four gas inlets and outlets based on the detection results notified from the sensors. In the present embodiment, instead of the sensors 41 and 42, a position sensor of the robot hand included in the transfer mechanism 10 is used to detect the position of the front end or the rear end of the substrate 11 as the object to be transferred, and the detection result is sent to the control unit 20.

[0134] (Control when moving the substrate from the transfer chamber to the processing unit)

[0135] Figure 10 It is a flowchart showing the order of the transfer process of transferring the substrate 11 from the transfer chamber 1 to the processing unit 3 via the passage 4. Each step of the process is executed by controlling each part of the manufacturing apparatus 100 by the control unit 20.

[0136] When the transfer process starts, in step S401, the control unit 20 controls the transfer mechanism 10 to start moving the substrate 11 from the transfer chamber 1 toward the processing unit 3. The position sensor included in the transfer mechanism 10 starts measuring the position of the robot hand holding the substrate 11, and then sends the detection result to the control unit. By the control of the control unit 20, the air curtain 2 is stably formed before the transfer process starts, and all four gas inlets and outlets 31a to 21b are closed.

[0137] In step S402, the control unit 20 determines whether the front end of the substrate 11 has reached the suction start position R1 based on the detection result of the position sensor included in the transfer mechanism 10. Figure 11 It is a schematic diagram showing the positional relationship of each part when the front end of the substrate 11 moving in the A direction at a speed V1 reaches the suction start position R1. When viewed in the A direction as the traveling direction, in the front end portion of the substrate 11, the region 51 for pushing out the air mass exists within a range of length L2. That is, the substrate 11 moves toward the processing unit 3 while causing the region 51 of the inert gas that pushes out the air curtain 2 to accompany the front end side.

[0138] The suction start position R1 is located at a position shifted by G1 toward the transfer chamber 1 side compared to the position where the front end of the substrate 11 overlaps with the gas inlets and outlets 21a and 21b. G1 can be set as in the following equation 13. However, it is set that G1 ≥ 0.

[0139] Equation 13

[0140] G1 = L2 + β1 × V1

[0141] (V1: Conveying speed, L2: Width of area 51, β1: Delay time until a stable air flow state is achieved)

[0142] When the control unit 20 determines that the front end of the substrate 11 has not reached the suction start position R1 (step S402: No), it stands by while repeatedly executing step S402 in a loop.

[0143] If the control unit 20 determines that the front end of the substrate 11 has reached the suction start position R1 (step S402: Yes), it proceeds to step S403 and starts sucking gas from the gas inlets / outlets 21a and 21b.

[0144] Next, in step S404, the control unit 20 determines whether the front end of the substrate 11 has reached the suction end position R2 based on the detection result of the position sensor provided in the conveying mechanism 10. The suction end position R2 is at a position where the front end of the substrate 11 overlaps with the gas inlets / outlets 21a and 21b.

[0145] When the control unit 20 determines that the front end of the substrate 11 has not reached the suction end position R2 (step S404: No), it stands by while repeatedly executing step S404 in a loop.

[0146] If the control unit 20 determines that the front end of the substrate 11 has reached the suction end position R2 (step S404: Yes), it proceeds to step S405 and ends the gas suction from the gas inlets / outlets 21a and 21b.

[0147] In the present embodiment, through the above suction operation, when the substrate 11 moves toward the processing unit 3 via the inert gas curtain 2, the air mass (inert gas) in the area 51 linked to the front end side of the substrate 11 is sucked and discharged from the gas inlets / outlets 21a and 21b. Thus, it is possible to prevent the inert gas of the curtain 2 from being carried into the processing unit 3 and mixed into the atmosphere (e.g., CDA) of the processing unit 3.

[0148] In the next step S406, the control unit 20 determines whether the rear end of the substrate 11 has reached the ejection start position R3 based on the detection result of the position sensor provided in the conveying mechanism 10. Figure 12 FIG. is a schematic diagram showing the positional relationship of each part at the timing when the rear end of the substrate 11 moving in the A direction at a speed V1 reaches the ejection start position R3. When viewed in the A direction as the traveling direction, in the rear end portion of the substrate 11, the area 52 carrying (sucking) the air mass exists within the range of the length L5. That is, the substrate 11 moves toward the processing unit 3 while causing the area 52 carrying the inert gas of the curtain 2 to follow the rear end side.

[0149] The ejection start position R3 is a position shifted by G2 closer to the transfer chamber 1 side compared to the position where the rear end of the substrate 11 overlaps with the gas inlets / outlets 31a and 31b. G2 can be set as in the following formula 14. However, it is set such that G2 ≥ 0.

[0150] Formula 14

[0151] G2 = β1 × V1

[0152] (V1: transfer speed, β1: delay time until a stable air flow state is achieved)

[0153] When the control unit 20 determines that the rear end of the substrate 11 has not reached the ejection start position R3 (step S406: No), it stands by while repeatedly executing step S406 in a loop.

[0154] If the control unit 20 determines that the rear end of the substrate 11 has reached the ejection start position R3 (step S406: Yes), it proceeds to step S407 and starts ejecting gas (e.g., the same gas as the air curtain 2) from the gas inlets / outlets 31a and 31b.

[0155] In the next step S408, the control unit 20 determines whether the rear end of the substrate 11 has reached the ejection end position R4 based on the detection result of the position sensor provided in the transfer mechanism 10. The ejection end position R4 is a position shifted by L5 (the width of the region 52) closer to the processing unit 3 side compared to the position where the rear end of the substrate 11 overlaps with the gas inlets / outlets 31a and 31b.

[0156] When the control unit 20 determines that the rear end of the substrate 11 has not reached the ejection end position R4 (step S408: No), it stands by while repeatedly executing step S408 in a loop.

[0157] If the control unit 20 determines that the rear end of the substrate 11 has reached the ejection end position R4 (step S408: Yes), it proceeds to step S409 and ends the ejection of gas (e.g., the same gas as the air curtain 2) from the gas inlets / outlets 31a and 31b.

[0158] In the present embodiment, through the above ejection operation, when the substrate 11 moves toward the processing unit 3 via the inert gas air curtain 2, inert gas is ejected from the gas inlets / outlets 31a and 31b. Thus, the pressure drop occurring on the rear end side of the substrate 11 can be alleviated. As a result, the linkage of the gas mass (inert gas) in the region 52 can be alleviated, and it is possible to prevent the inert gas of the air curtain 2 from being carried into the processing unit 3 and mixing into the atmosphere (e.g., CDA) of the processing unit 3. In this way, when the substrate 11 is carried into the processing unit 3, in step S410, the control unit 20 ends the transfer process of the substrate 11.

[0159] (Control when moving the substrate from the processing unit to the transfer chamber)

[0160] Figure 13 This is a flowchart showing the order of the transfer process of transferring the substrate 11 from the processing unit 3 to the transfer chamber 1 via the passage 4. Each step of the process is executed by controlling each part of the manufacturing apparatus 100 by the control unit 20.

[0161] When the transfer process starts, in step S501, the control unit 20 controls the transfer mechanism 10 to start moving the substrate 11 from the processing unit 3 toward the transfer chamber 1. The position sensor provided in the transfer mechanism 10 starts measuring the position of the robot hand holding the substrate 11, and then sends the detection result to the control unit. Through the control of the control unit 20, the air curtain 2 is stably formed before the transfer process starts, and all four gas inlets / outlets 31a to 31b are closed.

[0162] In step S502, the control unit 20 determines whether the front end of the substrate 11 has reached the suction start position R11 based on the detection result of the position sensor provided in the transfer mechanism 10. Figure 14 This is a schematic diagram showing the positional relationship of each part when the front end of the substrate 11 moving in the A' direction at the speed V2 reaches the suction start position R11. When viewed in the A' direction as the traveling direction, in the front end portion of the substrate 11, the region 51 that pushes out the air mass exists within the range of the length L12. That is, the substrate 11 moves toward the transfer chamber 1 while causing the region 51 that pushes out the atmosphere gas of the processing unit 3 to accompany the front end side.

[0163] The suction start position R11 is a position shifted by G11 toward the processing unit 3 side compared to the position where the front end of the substrate 11 overlaps with the gas inlets / outlets 31a and 31b. G11 can be set as in the following formula 15. However, it is set that G11 ≥ 0.

[0164] Formula 15

[0165] G11 = L12 + β11 × V2

[0166] (V2: transfer speed, L12: width of the region 51, β11: delay time until the stable air flow state is achieved)

[0167] When the control unit 20 determines that the front end of the substrate 11 has not reached the suction start position R11 (step S502: NO), it stands by while repeatedly executing step S502 cyclically.

[0168] If the control unit 20 determines that the front end of the substrate 11 has reached the suction start position R11 (step S502: Yes), it proceeds to step S503 and starts sucking gas from the gas inlets / outlets 31a and 31b.

[0169] Next, in step S504, the control unit 20 determines whether the front end of the substrate 11 has reached the suction end position R12 based on the detection result of the position sensor included in the transfer mechanism 10. The suction end position R12 is a position where the front end of the substrate 11 overlaps with the gas inlets / outlets 31a and 31b.

[0170] When the control unit 20 determines that the front end of the substrate 11 has not reached the suction end position R12 (step S504: No), it stands by while repeatedly executing step S504 in a loop.

[0171] If the control unit 20 determines that the front end of the substrate 11 has reached the suction end position R12 (step S504: Yes), it proceeds to step S505 and ends the suction of gas from the gas inlets / outlets 31a and 31b.

[0172] In the present embodiment, through the above suction operation, when the substrate 11 moves into the transfer chamber 1 via the inert gas curtain 2, the air mass (the atmosphere of the processing unit 3) in the area 51 linked to the front end side of the substrate 11 is sucked and discharged from the gas inlets / outlets 31a and 31b. Thus, it is possible to prevent the atmosphere of the processing unit 3 (e.g., CDA) from being introduced into the transfer chamber 1 and mixed into the atmosphere of the transfer chamber 1 (e.g., N2).

[0173] In the next step S506, the control unit 20 determines whether the rear end of the substrate 11 has reached the ejection start position R13 based on the detection result of the position sensor included in the transfer mechanism 10. Figure 15 FIG. is a schematic diagram showing the positional relationship of each part at the timing when the rear end of the substrate 11 moving in the A' direction at a speed V2 reaches the ejection start position R13. When viewed in the A' direction as the traveling direction, in the rear end portion of the substrate 11, the area 52 carrying the air mass exists in the range of the length L15. That is, the substrate 11 moves into the transfer chamber 1 while causing the area 52 carrying the atmosphere gas of the processing unit 3 to follow the rear end side.

[0174] The ejection start position R13 is a position shifted by G12 toward the processing unit 3 compared to the position where the rear end of the substrate 11 overlaps with the gas inlets / outlets 21a and 21b. G12 can be set as in the following formula 16. However, it is set that G12 ≥ 0.

[0175] Formula 16

[0176] G12 = β13 × V2

[0177] (V2: Conveyor speed, β13: Delay time until a stable air flow state is achieved)

[0178] When the control unit 20 determines that the rear end of the substrate 11 has not reached the ejection start position R13 (step S506: No), it stands by while repeatedly executing step S506 in a loop.

[0179] If the control unit 20 determines that the rear end of the substrate 11 has reached the ejection start position R13 (step S506: Yes), it proceeds to step S507 and starts ejecting gas (e.g., the same gas as the air curtain 2) from the gas inlets / outlets 21a and 21b.

[0180] In the next step S508, the control unit 20 determines whether the rear end of the substrate 11 has reached the ejection end position R14 based on the detection result of the position sensor provided in the conveying mechanism 10. The ejection end position R14 is a position shifted by L15 (the width of the region 52) toward the conveying chamber 1 compared to the position where the rear end of the substrate 11 overlaps with the gas inlets / outlets 21a and 21b.

[0181] When the control unit 20 determines that the rear end of the substrate 11 has not reached the ejection end position R14 (step S508: No), it stands by while repeatedly executing step S508 in a loop.

[0182] If the control unit 20 determines that the rear end of the substrate 11 has reached the ejection end position R14 (step S508: Yes), it proceeds to step S509 and ends the ejection of gas (e.g., the same gas as the air curtain 2) from the gas inlets / outlets 21a and 21b.

[0183] In the present embodiment, through the above ejection operation, when the substrate 11 moves into the conveying chamber 1 via the inert gas air curtain 2, inert gas is ejected from the gas inlets / outlets 21a and 21b. Thus, the pressure drop occurring on the rear end side of the substrate 11 can be alleviated. As a result, the linkage of the air mass in the region 52 (the atmosphere gas of the processing unit 3) can be alleviated, and it is possible to suppress the atmosphere gas of the processing unit 3 from being introduced into the conveying chamber 1 and mixed into the atmosphere (e.g., N2) of the conveying chamber 1.

[0184] In this way, when the substrate 11 is carried into the processing unit 3, in step S510, the control unit 20 ends the conveyance process of the substrate 11.

[0185] [Other Embodiments]

[0186] In addition, the present invention is not limited to the embodiments described above, and various modifications can be made within the technical concept of the present invention. For example, all or a part of the above-described different embodiments can be combined and implemented.

[0187] For example, Figure 2 Shown is a so-called cluster manufacturing system in which a plurality of processing devices are radially arranged around a transfer chamber, but the application of the transfer system according to the present invention is not limited to the cluster manufacturing system. It is also no problem even if it is applied to a so-called in-line manufacturing system in which the transfer chamber and the processing chamber are linearly arranged.

[0188] In the above-described embodiment, an example is shown in which the substrate 11 as an object to be transferred can move in both the A direction (the direction from the transfer chamber to the processing device) and the A' direction (the direction from the processing device to the transfer chamber) in the passage 4. However, for example, in an in-line manufacturing system, the devices can be connected in series such as the first transfer chamber - the first passage - the processing device - the second passage - the second transfer chamber to form a system. In this case, in the first passage, the substrate only moves in the direction from the first transfer chamber to the processing device, and in the second passage, the substrate only moves in the direction from the processing device to the second transfer chamber. The present invention can also be implemented in such a system. That is, for the first passage, the same device configuration and control method as in the case of moving the substrate in the A direction in the above-described embodiment are implemented, and for the second passage, the same device configuration and control method as in the case of moving the substrate in the A' direction in the above-described embodiment are implemented.

[0189] Specifically, provided are: a first transfer chamber having a first atmosphere circulation; a processing device that processes an object to be transferred in a second atmosphere different from the first atmosphere; and a first passage that connects the first transfer chamber and the processing device. Further, provided are: a curtain mechanism that forms a curtain for suppressing the mixing of the first atmosphere in the first transfer chamber and the second atmosphere in the processing device in the first passage; a transfer mechanism that moves the object to be transferred from the first transfer chamber to the processing device through the first passage; and a control unit.

[0190] And, in the first passage, provided are: a jetting mechanism that jets a gas in a region where the curtain is formed; and a suction mechanism that sucks the gas at a position closer to the processing device than the region where the curtain is formed.

[0191] When the object to be transferred is not present in the first passage, the control unit does not drive the suction mechanism nor the jetting mechanism. In the first passage, when the front end of the object to be transferred is at a position closer to the processing device than the region where the curtain is formed, the control unit drives the suction mechanism, and when the rear end of the object to be transferred is in the region where the curtain is formed, the control unit drives the jetting mechanism.

[0192] In addition, a processing device for processing an object to be conveyed in a second atmosphere is provided; a second conveyance chamber in which a third atmosphere different from the second atmosphere circulates; and a second passage connecting the processing device and the second conveyance chamber. Further, an air curtain mechanism for forming an air curtain for suppressing mixing of the third atmosphere in the second conveyance chamber and the second atmosphere in the processing device in the second passage is provided; a conveyance mechanism for moving the object to be conveyed from the processing chamber to the second conveyance chamber through the second passage; and a control unit.

[0193] Moreover, an attracting mechanism for attracting gas in a region where the air curtain is formed and an ejecting mechanism for ejecting gas at a position closer to the processing device than the region where the air curtain is formed are arranged in the second passage.

[0194] When the object to be conveyed is not present in the second passage, the control unit neither drives the attracting mechanism nor the ejecting mechanism. In the second passage, when the front end of the object to be conveyed is in the region where the air curtain is formed, the control unit drives the attracting mechanism, and when the rear end of the object to be conveyed is at a position closer to the processing device than the region where the air curtain is formed, the control unit drives the ejecting mechanism.

[0195] In addition, in Embodiment 1, a sensor provided in the passage is used to detect the position of the substrate as the object to be conveyed, and in Embodiment 2, the position of the substrate as the object to be conveyed is detected based on the operation information of the conveyance mechanism. For example, a sensor provided in the passage may be used to detect the position of the front end of the substrate, and the position of the rear end of the substrate may be detected based on the operation information of the conveyance mechanism. Conversely, a sensor provided in the passage may be used to detect the position of the rear end of the substrate, and the position of the front end of the substrate may be detected based on the operation information of the conveyance mechanism. Or, the control unit may also detect the positions of the front end and the rear end of the substrate based on both the detection result of the sensor provided in the passage and the operation information of the conveyance mechanism.

[0196] In addition, an example in which a total of four gas inlets / outlets 31a to 21b are arranged, two on each of the front side and the back side of the surface of the substrate 11 in the passage 4, is shown, but the arrangement method of the gas inlets / outlets is not limited to this example. For example, a different number of four gas inlets / outlets may be provided. In addition, instead of the gas inlets / outlets capable of gas ejection and suction, an ejection port capable of gas ejection and a suction port capable of gas suction may be separately provided.

[0197] In addition, in the above example, regarding the rear end portion of the substrate as the object to be conveyed, gas is ejected into the region of low pressure generated at the rear end portion of the moving substrate to suppress the pressure drop and suppress the linkage of the gas. However, the embodiment of the present invention is not limited thereto. For example, instead of or together with the above-described gas ejection operation, at a position further advanced in the traveling direction at the rear end portion of the substrate, a process of sucking the gas linked to the rear end of the substrate by the suction mechanism may be performed. Regarding the suction mechanism for sucking the rear end of the substrate, the suction mechanism that performs the suction operation on the front end portion of the substrate may be used in common. In this way, the mixing of the atmosphere can be suppressed by using only one suction mechanism.

[0198] An article manufacturing method of manufacturing an article by moving a substrate as an object to be conveyed into a processing chamber and processing the substrate using the conveyance system according to any of the above embodiments is also included in the embodiments of the present invention.

[0199] The present invention can also be achieved by the following processing: supplying a program that implements one or more functions of the embodiment to a system or a device via a network or a storage medium, and reading and executing the program by one or more processors in a computer of the system or the device. In addition, it can also be achieved by a circuit (for example, ASIC) that implements one or more functions.

[0200] Description of Reference Numerals

[0201] 1... conveyance chamber, 2... air curtain, 3... processing unit, 4... passage, 10... conveyance mechanism, 11... substrate, 20... control unit, 21a, 21b... gas inlets / outlets, 31a, 31b... gas inlets / outlets, 41... sensor, 42... sensor, 51, 52... regions, 60... load lock chamber, 61... gate, 62 to 67... processing units.

Claims

1. A conveying system, characterized in that: The above-mentioned conveying system includes: A conveying chamber in which a first atmosphere circulates; A processing device that processes the object to be conveyed in a second atmosphere having a component different from the first atmosphere; A passage that connects the above-mentioned conveying chamber and the above-mentioned processing device; An air curtain mechanism that forms an air curtain in the above-mentioned passage, and the air curtain is used to suppress the mixing of the first atmosphere in the above-mentioned conveying chamber and the second atmosphere in the above-mentioned processing device; A conveying mechanism that moves the above-mentioned object to be conveyed through the above-mentioned passage along a first direction from the above-mentioned conveying chamber to the above-mentioned processing device or along a second direction from the above-mentioned processing device to the above-mentioned conveying chamber; and A control unit, In the above-mentioned passage, there are arranged: A first suction mechanism that suctions gas in the area where the above-mentioned air curtain is formed; A first ejection mechanism that ejects gas in the area where the above-mentioned air curtain is formed; A second suction mechanism that suctions gas at a position closer to the above-mentioned processing device than the area where the above-mentioned air curtain is formed; and A second ejection mechanism that ejects gas at a position closer to the above-mentioned processing device than the area where the above-mentioned air curtain is formed, When the above-mentioned object to be conveyed passes through the above-mentioned passage, the above-mentioned control unit drives at least one of the above-mentioned first suction mechanism, the above-mentioned first ejection mechanism, the above-mentioned second suction mechanism, and the above-mentioned second ejection mechanism according to the moving direction of the above-mentioned object to be conveyed by the above-mentioned conveying mechanism and the position of the above-mentioned object to be conveyed.

2. The conveying system according to claim 1, characterized in that: When the above-mentioned conveying mechanism moves the above-mentioned object to be conveyed in the above-mentioned first direction, When the front end of the above-mentioned object to be conveyed is at a position closer to the above-mentioned processing device than the area where the above-mentioned air curtain is formed, the above-mentioned control unit drives the above-mentioned second suction mechanism, When the rear end of the above-mentioned object to be conveyed is within the area where the above-mentioned air curtain is formed, the above-mentioned control unit drives the above-mentioned first ejection mechanism.

3. The conveying system according to claim 1, characterized in that: When the above-mentioned conveying mechanism moves the above-mentioned object to be conveyed in the above-mentioned second direction, When the front end of the above-mentioned object to be conveyed is within the area where the above-mentioned air curtain is formed, the above-mentioned control unit drives the above-mentioned first suction mechanism, When the rear end of the above-mentioned object to be conveyed is at a position closer to the above-mentioned processing device than the area where the above-mentioned air curtain is formed, the above-mentioned control unit drives the above-mentioned second ejection mechanism.

4. The conveying system according to claim 1, characterized in that: A sensor for detecting the position of the above-mentioned object to be conveyed and notifying the above-mentioned control unit is arranged in the above-mentioned passage.

5. The conveying system according to claim 1, characterized in that: The above-mentioned conveying mechanism notifies the above-mentioned control unit of the position of the above-mentioned object to be conveyed in the above-mentioned passage.

6. The conveying system according to any one of claims 1 to 5, characterized in that: The above-mentioned first atmosphere contains an inert gas with a volume ratio of 90% or more, The above-mentioned second atmosphere contains oxygen with a volume ratio larger than that of the above-mentioned first atmosphere.

7. The conveying system according to any one of claims 1 to 5, characterized in that: The above-mentioned air curtain is formed by circulating a gas containing an inert gas with a volume ratio of 90% or more.

8. The conveying system according to any one of claims 1 to 5, characterized in that The first suction mechanism and the first ejection mechanism are connected to the passage via a common gas inlet and outlet.

9. The conveying system according to any one of claims 1 to 5, characterized in that The second suction mechanism and the second ejection mechanism are connected to the passage via a common gas inlet and outlet.

10. A conveying system, characterized in that The conveying system includes: A conveying chamber in which a first atmosphere circulates; A processing device that processes the object to be conveyed in a second atmosphere having a component different from the first atmosphere; A passage that connects the conveying chamber and the processing device; An air curtain mechanism that forms an air curtain in the passage, and the air curtain is used to inhibit the mixing of the first atmosphere in the conveying chamber and the second atmosphere in the processing device; A conveying mechanism that moves the object to be conveyed from the conveying chamber to the processing device via the passage; and A control unit, In the passage, an ejection mechanism that ejects gas in a region where the air curtain is formed and a suction mechanism that suctions gas at a position closer to the processing device than the region where the air curtain is formed are arranged, When the front end of the object to be conveyed is at a position closer to the processing device than the region where the air curtain is formed, the control unit drives the suction mechanism, When the rear end of the object to be conveyed is in the region where the air curtain is formed, the control unit drives the ejection mechanism.

11. A conveying system, characterized in that The conveying system includes: A conveying chamber in which a first atmosphere circulates; A processing device that processes the object to be conveyed in a second atmosphere having a component different from the first atmosphere; A passage that connects the conveying chamber and the processing device; An air curtain mechanism that forms an air curtain in the passage, and the air curtain is used to inhibit the mixing of the first atmosphere in the conveying chamber and the second atmosphere in the processing device; A conveying mechanism that moves the object to be conveyed from the processing device to the conveying chamber via the passage; and A control unit, In the passage, a suction mechanism that suctions gas in a region where the air curtain is formed and an ejection mechanism that ejects gas at a position closer to the processing device than the region where the air curtain is formed are arranged, When the front end of the object to be conveyed is in the region where the air curtain is formed, the control unit drives the suction mechanism, When the rear end of the object to be conveyed is at a position closer to the processing device than the region where the air curtain is formed, the control unit drives the ejection mechanism.

12. An article manufacturing method, characterized in that The article manufacturing method uses the conveying system according to any one of claims 1 to 11 to move the object to be conveyed to the processing device and process the object to be conveyed.

13. A conveying method that uses a conveying system, The conveying system includes: A conveying chamber in which a first atmosphere circulates; A processing device that processes an object to be conveyed in a second atmosphere having a composition different from that of the first atmosphere described above; A passage that connects the conveyance chamber and the processing device; An air curtain mechanism that forms an air curtain in the passage, and the air curtain is used to inhibit the mixing of the first atmosphere in the conveyance chamber and the second atmosphere in the processing device; A conveyance mechanism that moves the object to be conveyed through the passage along a first direction from the conveyance chamber toward the processing device or along a second direction from the processing device toward the conveyance chamber; and A control unit, In the passage, there are arranged: A first suction mechanism that suctions gas in the region where the air curtain is formed; A first ejection mechanism that ejects gas in the region where the air curtain is formed; A second suction mechanism that suctions gas at a position closer to the processing device than the region where the air curtain is formed; and A second ejection mechanism that ejects gas at a position closer to the processing device than the region where the air curtain is formed, It is characterized in that, When the object to be conveyed passes through the passage, the control unit drives at least one of the first suction mechanism, the first ejection mechanism, the second suction mechanism, and the second ejection mechanism according to the direction in which the conveyance mechanism moves the object to be conveyed and the position of the object to be conveyed.

14. The conveyance method according to claim 13, wherein When the conveyance mechanism moves the object to be conveyed in the first direction, When the front end of the object to be conveyed is at a position closer to the processing device than the region where the air curtain is formed, the control unit drives the second suction mechanism, When the rear end of the object to be conveyed is within the region where the air curtain is formed, the control unit drives the first ejection mechanism.

15. The conveyance method according to claim 13, wherein When the conveyance mechanism moves the object to be conveyed in the second direction, When the front end of the object to be conveyed is within the region where the air curtain is formed, the control unit drives the first suction mechanism, When the rear end of the object to be conveyed is at a position closer to the processing device than the region where the air curtain is formed, the control unit drives the second ejection mechanism.

16. The conveyance method according to claim 13, wherein A sensor arranged in the passage detects the position of the object to be conveyed and notifies the control unit.

17. The conveyance method according to claim 13, wherein The conveyance mechanism notifies the control unit of the position of the object to be conveyed in the passage.

18. The conveyance method according to any one of claims 13 to 17, wherein The first atmosphere contains an inert gas with a volume ratio of 90% or more, The second atmosphere contains oxygen with a volume ratio larger than that of the first atmosphere.

19. The conveyance method according to any one of claims 13 to 17, wherein The air curtain is formed by circulating a gas containing an inert gas with a volume ratio of 90% or more.

20. The conveying method according to any one of claims 13 to 17, characterized in that the first suction mechanism and the first ejection mechanism are connected to the passage via a common gas inlet / outlet.

21. The conveying method according to any one of claims 13 to 17, characterized in that the second suction mechanism and the second ejection mechanism are connected to the passage via a common gas inlet / outlet.

22. A computer program product, comprising a control program, characterized in that, The control program is for causing the control unit to execute each process of the conveying method according to any one of claims 13 to 21.

23. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores the computer program product according to claim 22.

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