Metal microwave discharge spectrum continuous monitoring system and method

Abstract

The invention provides a metal microwave discharge spectrum continuous monitoring system and method, and belongs to the technical field of spectrum monitoring. The system comprises a microwave radiation unit used for generating and transmitting microwave signals, and the microwave radiation unit comprises a microwave generator and a microwave transmission device; the discharge reaction cavity is made of a material with high temperature resistance, corrosion resistance and good microwave permeability, and is used for accommodating a metal sample and preventing harmful substances from leaking; the optical signal acquisition unit comprises a multi-channel photosensitive sensor array and is used for acquiring optical signals generated by metal discharge in real time; the optical resistance conversion unit is designed based on an optical resistance principle and is used for converting the optical signal into a resistance signal; and the data acquisition and processing unit is connected with the optical resistance conversion unit and is used for acquiring the resistance signal and converting the resistance signal into spectral data. The optical resistance conversion technology is utilized, the defects of the existing monitoring technology are overcome, and continuous and accurate monitoring of the metal microwave discharge spectrum is achieved.

Description

Technical Field

[0001] The present invention relates to a continuous monitoring system and method for metal microwave discharge spectra, belonging to the technical field of spectral monitoring. Background Art

[0002] When metal materials are irradiated by microwaves, a discharge phenomenon occurs, accompanied by the generation of unique spectra. These discharge spectra not only contain information about the physical mechanism of the interaction between microwaves and metals, but also show important application values in many fields such as material surface modification, thin film deposition, and trace element analysis. However, there are still many challenges in the current discharge spectrum monitoring technology.

[0003] Some existing discharge spectrum monitoring devices have limitations in function and cannot achieve continuous monitoring. This results in the difficulty of accurately capturing the dynamic changes of spectra during the discharge process, thereby restricting the in-depth development of related research and applications. In addition, some monitoring methods are insufficient in adapting to complex experimental environments and are easily interfered by external factors, resulting in poor data accuracy and stability.

[0004] In view of these deficiencies in the prior art, it is particularly important to develop a system and method that can continuously and accurately monitor the metal microwave discharge spectra. Such a system can not only provide comprehensive and reliable data support for the research on the physical mechanism of the interaction between microwaves and metals, but also play an important role in many fields such as materials science, plasma physics, and analytical chemistry, promoting the progress of related research and industrial production technologies. Summary of the Invention

[0005] The purpose of the present invention is to provide a continuous monitoring system and method for metal microwave discharge spectra, which uses the photoresistance conversion technology to overcome the deficiencies of the existing monitoring technology and achieve continuous and precise monitoring of the metal microwave discharge spectra.

[0006] To achieve the above object, the present invention is realized through the following technical solutions: A continuous monitoring system for metal microwave discharge spectra, comprising: A microwave radiation unit for generating and transmitting microwave signals, the microwave radiation unit comprising a microwave generator and a microwave transmission device; A discharge reaction chamber made of a material with high temperature resistance, corrosion resistance, and good microwave permeability, for accommodating metal samples and preventing the leakage of harmful substances; An optical signal acquisition unit comprising a multi-channel photosensitive sensor array for real-time acquisition of optical signals generated by metal discharge; A photoresistance conversion unit designed based on the photoresistance principle for converting optical signals into resistance signals, the conversion unit comprising a signal conditioning circuit, and the signal conditioning circuit comprising an amplification module, a filtering module, and an AD conversion module; A data acquisition and processing unit, connected to the optoelectronic resistance conversion unit, for collecting resistance signals and converting them into spectral data. The data processing unit is configured to perform the following operations: quantize the analog resistance signal into a digital signal through an analog-to-digital conversion module, convert the quantized digital signal into a binary string using direct binary coding, and analyze and record spectral characteristic parameters based on the resistance-spectral intensity mapping model.

[0007] Preferably, the signal conditioning circuit in the optoelectronic resistance conversion unit satisfies the following conditions: The amplification module adopts a non-inverting amplifier structure, and the amplification factor is determined by the formula, and The specific formula is as follows: , where represents the feedback resistance, represents the input resistance; The cut-off frequency of the filtering module satisfies where is the sampling rate of the data acquisition and processing unit.

[0008] Preferably, the AD conversion module uses a 12-bit ADC, the reference voltage is 5V, and the output sampling rate is 100Hz; Quantization step: , the quantization value is: , the maximum quantization error is: ; where represents the analog signal array, represents the reference voltage, represents the number of bits of the ADC.

[0009] Preferably, the sampling rate of the data acquisition and processing unit satisfies where is the highest frequency of the filtered signal.

[0010] Preferably, the data acquisition and processing unit includes a microcontroller, an analog-to-digital conversion chip, a display module, and a data storage module, and the microcontroller, the analog-to-digital conversion chip, the display module, and the data storage module are integrated; Among them, the display module and the data storage module are used to display spectral characteristic parameters and dynamic waveform diagrams generated by the matplotlib library in real time; the analog-to-digital conversion chip is connected to the optoelectronic resistance conversion unit to convert the collected resistance signal into a digital signal; the microcontroller has a built-in light intensity-spectral mapping model and dynamically extracts spectral characteristic parameters through machine learning algorithms.

[0011] Preferably, the data acquisition and processing unit further includes an alarm module, and the alarm module triggers an audible and visual alarm when the spectral intensity exceeds a preset threshold.

[0012] Preferably, the optical signal acquisition unit includes a multi-channel photosensitive sensor array, the multi-channel photosensitive sensor array includes photosensitive resistors with different spectral responses, and is integrated at the observation window of the discharge reaction chamber.

[0013] Preferably, the passband width and the center frequency of the filtering module decrease as the distance from the observation window increases, so as to ensure high-quality acquisition of optical signals within the sampling radius range.

[0014] A method for continuously monitoring the spectrum of metal microwave discharge includes the following steps: Build a continuous monitoring system for the spectrum of metal microwave discharge, initialize the parameters of the microwave generator, and set the frequency and power; Place the metal sample in the discharge reaction chamber, and start the microwave generator to excite the metal discharge; Capture the discharge optical signal in real time through the optical signal acquisition unit, and convert it into a resistance signal through the optical resistance conversion unit; Perform quantization processing on the resistance signal, specifically including: converting the analog signal into a digital signal; encoding the digital signal into a binary string with a specified number of digits; Generate a spectral response curve based on the quantized data, extract dynamic spectral characteristic parameters, and display and store them in real time.

[0015] The advantages of the present invention are as follows: The present invention utilizes the optical resistance conversion technology and the data acquisition and processing system to successfully realize the continuous monitoring of the spectrum of metal microwave discharge. This ability enables the system to capture the dynamic changes of the spectrum during the discharge process in real time, providing valuable real-time data support for in-depth research on the discharge mechanism and process control. High-sensitivity optical sensors and high-precision resistance measurement modules are adopted, significantly improving the accuracy of optical signal acquisition and resistance signal measurement. This design ensures the accuracy and reliability of the spectral data, providing a solid foundation for subsequent data analysis and research. The discharge reaction chamber is made of special materials and has good high-temperature resistance and corrosion resistance. This design enables the system to operate stably in complex experimental and industrial production environments, greatly expanding its application range. Whether in high-temperature, high-pressure or strongly corrosive environments, the system can maintain excellent performance.

[0016] In summary, the continuous monitoring system and method for the spectrum of metal microwave discharge of the present invention not only solve the limitations of the prior art, but also show significant advantages in multiple aspects, providing strong technical support for research and production in related fields. Description of the Drawings

[0017] The accompanying drawings are used to provide a further understanding of the present invention and form a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation to the present invention.

[0018] Figure 1 It is a schematic diagram of the method flow of the present invention. Detailed implementation manners

[0019] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0020] Embodiment 1 As Figure 1 shown, a continuous monitoring system for metal microwave discharge spectroscopy includes: A microwave radiation unit for generating and transmitting microwave signals, and the microwave radiation unit includes a microwave generator and a microwave transmission device.

[0021] A discharge reaction chamber made of a material with high temperature resistance, corrosion resistance and good microwave permeability, for accommodating metal samples and preventing leakage of harmful substances.

[0022] An optical signal acquisition unit, including a multi-channel photosensitive sensor array, for real-time acquisition of optical signals generated by metal discharge.

[0023] As a refinement of the above embodiment, the optical signal acquisition unit includes a multi-channel photosensitive sensor array, and the multi-channel photosensitive sensor array includes photosensitive resistors with different spectral responses and is integrated at the observation window of the discharge reaction chamber.

[0024] A photoresistance conversion unit designed based on the photoresistance principle for converting optical signals into resistance signals. The conversion unit includes a signal conditioning circuit, and the signal conditioning circuit includes an amplification module, a filtering module and an AD conversion module.

[0025] As a refinement of the above embodiment, the signal conditioning circuit in the photoresistance conversion unit satisfies the following conditions: The amplifier circuit adopts a non-inverting amplifier structure, and the amplification factor is determined by the formula, and is as follows: , where represents the feedback resistor, represents the input resistor.

[0026] Usually represents the voltage amplification factor, which describes the ratio of the output voltage to the input voltage and reflects the amplification ability of the circuit to the input voltage signal. Generally, it is the feedback resistor. In a negative feedback amplifier circuit, it plays a role in feeding back a part of the output signal to the input end, and stabilizes the performance of the circuit such as the gain by adjusting the feedback amount. Is the input resistance, which represents the load effect of the amplifier circuit on the signal source. The larger the input resistance, the smaller the influence on the signal source, and the more effectively the input signal can be obtained.

[0027] The cut-off frequency of the filtering module Satisfies , where Is the sampling rate of the data acquisition and processing unit.

[0028] Specifically, the AD conversion module uses a 12-bit ADC, the reference voltage is 5V, and the output sampling rate is 100Hz; Quantization step: , the quantization value is: , the maximum quantization error is: ; where Represents the analog signal array, Represents the reference voltage, Represents the number of bits of the ADC.

[0029] The passband width and center frequency of the filtering module decrease as the distance from the observation window increases, which is used to ensure the high-quality acquisition of the optical signal within the sampling radius.

[0030] The data acquisition and processing unit, connected to the photoresistor conversion unit, is used to collect the resistance signal and convert it into spectral data. The data processing unit is configured to perform the following operations: quantize the analog resistance signal into a digital signal through the analog-to-digital conversion module, convert the quantized digital signal into a binary string using direct binary coding, and analyze and record the spectral characteristic parameters based on the resistance-spectral intensity mapping model.

[0031] As a refinement of the above embodiment, the sampling rate of the data acquisition and processing unit Satisfies , where Is the highest frequency of the filtered signal.

[0032] Specifically, the data acquisition and processing unit includes a microcontroller, an analog-to-digital conversion chip, a display module, and a data storage module, and the microcontroller, the analog-to-digital conversion chip, the display module, and the data storage module are integrated together; Among them, the display module and the data storage module are used to display the spectral characteristic parameters in real time and generate dynamic waveform diagrams through the matplotlib library; the analog-to-digital conversion chip is connected to the photoresistor conversion unit and is used to convert the collected resistance signal into a digital signal; the microcontroller has a built-in light intensity-spectral mapping model and dynamically extracts spectral characteristic parameters through machine learning algorithms.

[0033] The data acquisition and processing unit further includes an alarm module, and the alarm module triggers an audible and visual alarm when the spectral intensity exceeds a preset threshold.

[0034] Embodiment 2 A method for continuous monitoring of metal microwave discharge spectrum includes the following steps: S1: Build a continuous monitoring system for metal microwave discharge spectrum, initialize the parameters of the microwave generator, and set the frequency and power.

[0035] As a refinement of the above embodiment, connect the microwave generator, the microwave transmission device to the discharge reaction chamber to ensure that the microwave signal can be smoothly transmitted to the reaction chamber. Install the optical signal acquisition unit at a suitable position in the discharge reaction chamber so that it can fully collect the optical signals generated by metal discharge. Connect the optical signal acquisition unit to the photoresistor conversion unit to ensure that the optical signal can be accurately transmitted to the conversion unit. Finally, connect the photoresistor conversion unit to the data acquisition and processing unit to complete the construction of the system.

[0036] S2: Place the metal sample in the discharge reaction chamber and start the microwave generator to excite metal discharge.

[0037] S3: Real-time capture the discharge optical signal through the optical signal acquisition unit and convert it into a resistance signal through the photoresistor conversion unit.

[0038] S4: Quantize the resistance signal, specifically including: converting the analog signal into a digital signal; encoding the digital signal into a binary string with a specified number of digits.

[0039] S5: Generate a spectral response curve based on the quantized data, extract dynamic spectral characteristic parameters and display and store them in real time.

[0040] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A continuous monitoring system for metal microwave discharge spectroscopy, characterized in that, Comprising: A microwave radiation unit for generating and transmitting microwave signals, the microwave radiation unit including a microwave generator and a microwave transmission device; A discharge reaction chamber made of a material with high temperature resistance, corrosion resistance and good microwave permeability, for accommodating a metal sample and preventing leakage of harmful substances; An optical signal acquisition unit including a multi-channel photosensitive sensor array for real-time acquisition of optical signals generated by metal discharge; An optical resistance conversion unit designed based on the principle of optical resistance for converting optical signals into resistance signals, the conversion unit including a signal conditioning circuit, and the signal conditioning circuit including an amplification module, a filtering module and an AD conversion module; A data acquisition and processing unit connected to the optical resistance conversion unit for acquiring resistance signals and converting them into spectral data, and the data processing unit is configured to perform the following operations: quantizing the analog resistance signal into a digital signal through an analog-to-digital conversion module, converting the quantized digital signal into a binary string using direct binary coding, and analyzing and recording spectral characteristic parameters based on a resistance-spectral intensity mapping model.

2. The metal microwave discharge spectral continuous monitoring system according to claim 1, characterized in that The signal conditioning circuit in the optical resistance conversion unit satisfies the following conditions: The amplification module adopts a non-inverting amplifier structure, and the amplification factor is determined by a formula, and , and the specific formula is as follows: ， Among them, represents the feedback resistor, represents the input resistor; Cut-off frequency of the filtering module Meet , where is the sampling rate of the data acquisition and processing unit.

3. The metal microwave discharge spectral continuous monitoring system according to claim 1, characterized in that The AD conversion module uses a 12-bit ADC, with a reference voltage of 5V and an output sampling rate of 100Hz; Quantization step size: , quantization value is: , maximum quantization error is: ; wherein, represents an analog signal array, represents a reference voltage, represents the number of bits of the ADC.

4. The metal microwave discharge spectral continuous monitoring system according to claim 2, characterized in that, The sampling rate of the data acquisition and processing unit satisfies , where is the highest frequency of the filtered signal.

5. The metal microwave discharge spectral continuous monitoring system according to claim 1, characterized in that The data acquisition and processing unit includes a microcontroller, an analog-to-digital conversion chip, a display module and a data storage module, and the microcontroller, the analog-to-digital conversion chip, the display module and the data storage module are integrated together; Wherein, the display module and the data storage module are used for real-time display of spectral characteristic parameters and a dynamic waveform diagram generated through the matplotlib library; the analog-to-digital conversion chip is connected to the optical resistance conversion unit for converting the acquired resistance signal into a digital signal; the microcontroller has an optical intensity-spectral mapping model built in, and dynamically extracts spectral characteristic parameters through a machine learning algorithm.

6. The metal microwave discharge spectral continuous monitoring system according to claim 5, wherein The data acquisition and processing unit further includes an alarm module, and the alarm module triggers an audible and visual alarm when the spectral intensity exceeds a preset threshold.

7. The metal microwave discharge spectral continuous monitoring system according to claim 1, characterized in that, The optical signal acquisition unit includes a multi-channel photosensitive sensor array, and the multi-channel photosensitive sensor array includes photosensitive resistors with different spectral responses and is integrated at the observation window of the discharge reaction chamber.

8. The metal microwave discharge spectral continuous monitoring system according to claim 1, wherein The passband width and center frequency of the filtering module shorten as the distance from the observation window increases, for ensuring high-quality acquisition of optical signals within the sampling radius.

9. A method for continuous monitoring of metal microwave discharge spectroscopy, characterized in that Including the following steps: Build the system as described in any one of claims 1-8, initialize the parameters of the microwave generator, and set the frequency and power; Place the metal sample in the discharge reaction chamber, and start the microwave generator to excite metal discharge; Real-time capture the discharge optical signal through the optical signal acquisition unit, and convert it into a resistance signal through the optical resistance conversion unit; Perform quantization processing on the resistance signal, specifically including: converting the analog signal into a digital signal; encoding the digital signal into a binary string with a specified number of digits; Generate a spectral response curve based on the quantized data, extract dynamic spectral characteristic parameters and display and store them in real time.

10. A computer-readable storage medium, characterized in that, A computer program is stored thereon, and when the program is executed by a processor, it implements the method for continuous monitoring of metal microwave discharge spectrum as described in claim 9 above.

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