Purification device for processing high-purity silicon tetrachloride

Abstract

The invention relates to the technical field of silicon tetrachloride processing, and discloses a purification device for high-purity silicon tetrachloride processing, which comprises a base, a heating frame is inserted into the top of the base, a treatment frame is fixedly connected to the inner wall of the heating frame, a heating device is fixedly connected to the surface of the treatment frame, and a support is fixedly connected to the bottom of the base. The top of the inner wall of the support is fixedly connected with a hydraulic rod, the bottom of the hydraulic rod is fixedly connected with the top of the heating frame, and the inner wall of the support is fixedly connected with an air pump. After a silicon tetrachloride raw material is placed in the processing frame, the heating device is started to start operation, heat generated by the heating device can be transmitted into the processing frame through the processing frame to heat the silicon tetrachloride raw material, water vapor generated after the silicon tetrachloride raw material is heated can float upwards, and the air pump is started to start operation; suction force generated by the air pump can enter the treatment frame through the round pipe, water vapor is sucked into the bent pipe, and the water vapor flows in the bent pipe.

Description

Technical Field

[0001] The invention relates to the technical field of silicon tetrachloride processing, in particular to a purification device for processing high-purity silicon tetrachloride. Background Art

[0002] Silicon tetrachloride is an inorganic compound that is a colorless or light yellow fuming liquid at room temperature with a pungent odor and significant hygroscopicity. The production of silicon tetrachloride involves multiple fields such as silicon ore mining, silicon powder purification, and the chlor-alkali industry. With the development of global semiconductor technology and optical fiber communication technology, the silicon tetrachloride industry has ushered in a golden period of rapid growth. Silicon tetrachloride has unique properties and a wide range of applications.

[0003] When silicon tetrachloride is used in other fields, it needs to be purified. Currently, distillation is mostly used to purify silicon tetrachloride. When using distillation to purify silicon tetrachloride, it needs to be heated to vaporize it. The vaporized silicon tetrachloride will float to the inside of the condensing device to complete the condensation operation, but a large amount of water vapor will adhere to the inside of the heating device, resulting in some water vapor unable to enter the inside of the condensing device to complete the condensation operation, affecting the purification of silicon tetrachloride. Summary of the Invention

[0004] The object of the present invention is to provide a purification device for processing high-purity silicon tetrachloride to solve the problems raised in the above background technology.

[0005] To solve the above technical problems, the present invention is achieved through the following technical solutions:

[0006] The present invention provides a purification device for processing high-purity silicon tetrachloride, comprising a base, a heating rack plugged into the top of the base, a processing rack fixedly connected to the inner wall of the heating rack, a heating device fixedly connected to the surface of the processing rack, a bracket fixedly connected to the bottom of the base, a hydraulic rod fixedly connected to the top of the inner wall of the bracket, the bottom of the hydraulic rod fixedly connected to the top of the heating rack, an air pump fixedly connected to the inner wall of the bracket, and a condensing component provided on the surface of the heating rack;

[0007] The condensing component includes a circular tube, the end of the circular tube is fixedly connected to the surface of the heating rack, a positioning ring is fixedly connected to the surface of the circular tube, the bottom of the positioning ring is connected to a curved tube, the lower surface of the curved tube is connected to the storage rack, the bottom of the storage rack is hinged with a sealing door, the inner wall of the curved tube is fixedly connected to a sieve plate, the upper surface of the curved tube is fixedly connected to a condensing pipe, the surface of the condensing pipe is fixedly connected to a condensing device, the top of the base is fixedly connected to a processing rack, a sealing component is provided inside the circular tube, a feeding component is provided on the inner wall of the curved tube, and a stirring component is provided inside the processing rack.

[0008] Furthermore, the end of the circular tube passes through the heating rack and is connected to the interior of the processing rack. The curved pipe is located below the circular tube. The end of the curved pipe away from the positioning ring is connected to the air inlet end of the air pump. The sieve plate is located at the end of the curved pipe close to the air pump. The condenser is located below the circular tube.

[0009] Furthermore, the sealing component includes a fixing ring, the surface of the fixing ring is fixedly connected to the inner wall of the circular tube, an air inlet hole is opened on the surface of the fixing ring, a positioning groove is opened on the end of the fixing ring away from the air inlet hole, a sealing block is inserted into the inner wall of the air inlet hole, the surface of the sealing block is fixedly connected to a positioning plate, the surface of the positioning plate is fixedly connected to the telescopic rod, the end of the positioning plate close to the telescopic rod is fixedly connected to a spring, the inner wall of the circular tube is fixedly connected to a circular hole frame, the top of the positioning ring is fixedly connected to an electric telescopic frame, the telescopic end of the electric telescopic frame is fixedly connected to a connecting rod, and the end of the connecting rod away from the electric telescopic frame is fixedly connected to the end of the telescopic rod.

[0010] Furthermore, the surface of the positioning plate contacts the inner wall of the positioning groove, the end of the spring away from the positioning plate is fixedly connected to the surface of the circular hole frame, the surface of the telescopic rod is slidably connected to the inner wall of the circular hole frame, and the end of the telescopic rod away from the positioning plate passes through the circular tube and extends to the outer end of the circular tube.

[0011] Furthermore, the blanking component includes a conical frame, the end of the conical frame is fixedly connected to the inner wall of the bent pipe, the top of the conical frame is fixedly connected to an elastic spring, the top of the elastic spring is fixedly connected to a conical ring, the top of the conical ring is fixedly connected to an extrusion rod, the top of the extrusion rod is fixedly connected to a triangular plate, the bottom of the telescopic rod is fixedly connected to a pressure plate, and the surface of the conical ring is fixedly connected to a synchronization rod.

[0012] Furthermore, the upper surface of the triangular plate extends to the inside of the circular tube, the surface of the conical ring contacts the inner wall of the curved tube, and there are multiple conical rings, which are fixedly connected by a synchronization rod.

[0013] Furthermore, the inner wall of the conical ring is conically configured, the top of the conical frame is conically configured, the bottom of the pressure plate contacts the bottom of the inner wall of the circular tube, and the conical ring is located inside the condenser tube.

[0014] Furthermore, the stirring component includes a turntable, the surface of which is fixedly connected to a mixing plate, the top of the turntable is fixedly connected to a spring rod, the top of the spring rod is fixedly connected to a limit plate, the top of the limit plate is fixedly connected to a rotating rod, the top of the rotating rod is rotatably connected to the top of the inner wall of the heating rack, the surface of the rotating rod is fixedly connected to an engaging frame, the surface of the engaging frame is engaged with an engaging plate, the surface of the engaging plate is fixedly connected to a push rod, and the end of the push rod away from the engaging plate is fixedly connected to the lower surface of the pressure plate.

[0015] Furthermore, the bottom of the turntable, the bottom of the mixing plate and the bottom of the inner wall of the processing frame are in contact, and one end of the push rod away from the engaging plate passes through the fixing ring and extends to the inside of the circular tube.

[0016] The present invention has the following beneficial effects:

[0017] The present invention places silicon tetrachloride raw materials inside a processing rack, starts a heating device to start operation, heat generated by the heating device is transmitted to the inside of the processing rack through the processing rack to heat the silicon tetrachloride raw materials, water vapor generated after the silicon tetrachloride raw materials are heated floats upward, starts an air pump to start operation, suction generated by the air pump enters the inside of the processing rack through a circular pipe and sucks the water vapor into the inside of a curved pipe, when the water vapor flows inside the curved pipe, starts a condensing device to start operation, cold air generated by the condensing device is transmitted to the surface of the curved pipe through a condensing pipe, the condensing pipe can condense the water vapor when it flows inside the curved pipe, the condensed water vapor slides to the inside of the storage rack to complete the purification treatment of the silicon tetrachloride raw materials, and the suction generated by the air pump can guide the water vapor into the inside of the processing rack, thereby preventing a large amount of water vapor from adhering to the inside of the processing rack and causing waste of silicon tetrachloride raw materials.

[0018] When the air pump of the present invention starts to work, the electric telescopic frame is started to push the connecting rod to move, and the connecting rod pulls the telescopic rod to extend when moving. After the telescopic rod starts to extend, the positioning plate will use the elasticity of the spring to push the sealing block to separate from the inner wall of the air inlet, so that the suction force generated by the air pump can enter the interior of the processing frame to collect water vapor. When the electric telescopic frame retracts, the electric telescopic frame pushes the telescopic rod to shrink to the limit through the connecting rod, and the telescopic rod can push the positioning plate to insert the sealing block into the interior of the air inlet to seal the round tube, so that when the processing frame starts to heat the silicon tetrachloride raw material, the hot air can be gathered inside the processing frame to improve the heating efficiency.

[0019] According to the present invention, after the sealing block is separated from the air inlet, the electric telescopic frame can push the telescopic rod to move synchronously when extending and contracting. When the telescopic rod moves, it pushes the triangular plate to move downward through the pressure plate. When the triangular plate moves downward, it pushes the conical ring to move inside the curved pipe through the extrusion rod. When the conical ring moves, it can process the water vapor on the inner wall of the curved pipe, so that the condensed water vapor can quickly slide to the inside of the storage rack for collection. When the pressure plate is separated from the triangular plate, the conical ring will move upward by utilizing the elasticity of the elastic spring, and the conical ring can move up and down inside the curved pipe to scrape off the water vapor, thereby improving the purification efficiency of the silicon tetrachloride raw material.

[0020] The pressure plate of the present invention drives the meshing plate to move through the push rod when moving, the meshing plate drives the meshing frame to rotate when moving, the meshing frame drives the limiting disk to rotate through the rotating rod when rotating, and the limiting disk drives the mixing plate to rotate through the connection between the elastic rod and the rotating disk when rotating. The mixing plate stirs the silicon tetrachloride raw material when rotating, and the silicon tetrachloride raw material is heated evenly through stirring, thereby improving the purification efficiency of the silicon tetrachloride raw material.

[0021] Of course, any product implementing the present invention does not necessarily need to achieve all of the advantages described above at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0023] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0024] Figure 2 Schematic diagram of the support structure of the present invention;

[0025] Figure 3 This is a schematic cross-sectional structural diagram of the heating rack of the present invention;

[0026] Figure 4 This is a schematic diagram of the overall structure of the condensing component of the present invention;

[0027] Figure 5 This is a schematic diagram of the overall structure of the sealing component of the present invention;

[0028] Figure 6 For the present invention Figure 5 A magnified schematic diagram of part A in FIG;

[0029] Figure 7 This is a schematic diagram of the overall structure of the blanking component of the present invention;

[0030] Figure 8 This is a schematic diagram of the overall structure of the stirring component of the present invention;

[0031] Figure 9 For the present invention Figure 8 An enlarged schematic diagram of part B in FIG.

[0032] In the accompanying drawings, the components represented by the reference numerals are as follows:

[0033] Figure 1: Heating rack; 2: Hydraulic rod; 3: Bracket; 4: Air pump; 5: Processing rack; 6: Heating device; 7: Condensation unit; 8: Sealing unit; 9: Unloading unit; 10: Stirring unit; 11: Base; 20: Processing rack; 21: Round tube; 22: Positioning ring; 23: Condensation tube; 24: Bend tube; 25: Condensation unit; 26: Sealing door; 27: Storage rack; 28: Sieve plate; 30: Electric telescopic rack; 31: Linking rod; 32: , telescopic rod; 33, round hole frame; 34, spring; 35, fixing ring; 36, air inlet; 37, positioning groove; 38, positioning plate; 39, sealing block; 40, triangular plate; 41, extrusion rod; 42, conical ring; 43, synchronization rod; 44, elastic spring; 45, conical frame; 46, pressure plate; 50, turntable; 51, mixing plate; 52, elastic rod; 53, push rod; 54, limit plate; 55, rotating rod; 56, engagement plate; 57, engagement frame. DETAILED DESCRIPTION

[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0035] See also Figures 1-9 As shown, the present invention is a purification device for processing high-purity silicon tetrachloride, comprising a base 11, a heating rack 1 is plugged into the top of the base 11, a processing rack 5 is fixedly connected to the inner wall of the heating rack 1, a heating device 6 is fixedly connected to the surface of the processing rack 5, a bracket 3 is fixedly connected to the bottom of the base 11, a hydraulic rod 2 is fixedly connected to the top of the inner wall of the bracket 3, the bottom of the hydraulic rod 2 is fixedly connected to the top of the heating rack 1, an air pump 4 is fixedly connected to the inner wall of the bracket 3, and a condensing component 7 is provided on the surface of the heating rack 1;

[0036] The condensation component 7 includes a circular tube 21, the end of the circular tube 21 is fixedly connected to the surface of the heating rack 1, a positioning ring 22 is fixedly connected to the surface of the circular tube 21, the bottom of the positioning ring 22 is connected to a curved tube 24, the lower surface of the curved tube 24 is connected to a storage rack 27, the bottom of the storage rack 27 is hinged with a sealing door 26, the inner wall of the curved tube 24 is fixedly connected to a sieve plate 28, the upper surface of the curved tube 24 is fixedly connected to a condensing pipe 23, the surface of the condensing pipe 23 is fixedly connected to a condensing device 25, the top of the base 11 is fixedly connected to the processing rack 20, the inside of the circular tube 21 is provided with a sealing component 8, the inner wall of the curved tube 24 is provided with a unloading component 9, and the inside of the processing rack 5 is provided with a stirring component 10.

[0037] The end of the circular tube 21 passes through the heating rack 1 and is interconnected with the interior of the processing rack 5. After the silicon tetrachloride raw material is placed inside the processing rack 20, the heating device 6 is started to start operation. The heat generated by the heating device 6 is transmitted to the interior of the processing rack 20 through the processing rack 5 to heat the silicon tetrachloride raw material. The water vapor generated after the silicon tetrachloride raw material is heated will float upward, and the air pump 4 is started to start operation. The suction generated by the air pump 4 will enter the interior of the processing rack 5 through the circular tube 21 and suck the water vapor into the interior of the bent pipe 24. When the water vapor flows inside the bent pipe 24, the condensing device 25 is started to start operation, and the cold water generated by the condensing device 25 The gas is transmitted to the surface of the curved pipe 24 through the condenser 23. When the water vapor flows inside the curved pipe 24, the condenser 23 can condense it. The condensed water vapor will slide into the inside of the storage rack 27 to complete the purification of the silicon tetrachloride raw material. The suction generated by the air pump 4 can guide the water vapor into the inside of the processing rack 5, avoiding a large amount of water vapor adhering to the inside of the processing rack 5 and causing waste of silicon tetrachloride raw material. The curved pipe 24 is located below the circular pipe 21, and the end of the curved pipe 24 away from the positioning ring 22 is connected to the air inlet end of the air pump 4. The sieve plate 28 is located at the end of the curved pipe 24 close to the air pump 4, and the condenser pipe 23 is located below the circular pipe 21.

[0038] The sealing component 8 includes a fixing ring 35, the surface of the fixing ring 35 is fixedly connected to the inner wall of the circular tube 21, an air inlet hole 36 is opened on the surface of the fixing ring 35, a positioning groove 37 is opened at the end of the fixing ring 35 away from the air inlet hole 36, a sealing block 39 is inserted into the inner wall of the air inlet hole 36, a positioning plate 38 is fixedly connected to the surface of the sealing block 39, a telescopic rod 32 is fixedly connected to the surface of the positioning plate 38, a spring 34 is fixedly connected to the end of the positioning plate 38 close to the telescopic rod 32, a circular hole frame 33 is fixedly connected to the inner wall of the circular tube 21, the top of the positioning ring 22 is fixedly connected to the electric telescopic frame 30, the telescopic end of the electric telescopic frame 30 is fixedly connected to the connecting rod 31, and the end of the connecting rod 31 away from the electric telescopic frame 30 is fixedly connected to the end of the telescopic rod 32.

[0039] The surface of the positioning plate 38 contacts the inner wall of the positioning groove 37. When the air pump 4 of the present invention starts to work, the electric telescopic frame 30 is started to push the connecting rod 31 to move. When the connecting rod 31 moves, the telescopic rod 32 is pulled to extend. After the telescopic rod 32 starts to extend, the positioning plate 38 uses the elasticity of the spring 34 to push the sealing block 39 to separate from the inner wall of the air inlet 36, so that the suction force generated by the air pump 4 can enter the interior of the processing frame 5 to collect water vapor. When the electric telescopic frame 30 retracts, the electric telescopic frame 30 pushes the telescopic rod 32 through the connecting rod 31. After 32 contracts to the limit, the telescopic rod 32 can push the positioning plate 38 to insert the sealing block 39 into the interior of the air inlet 36 to seal the circular tube 21, so that when the processing rack 5 starts to heat the silicon tetrachloride raw material, the hot air can be gathered inside the processing rack 5 to improve the heating efficiency. The end of the spring 34 away from the positioning plate 38 is fixedly connected to the surface of the circular hole rack 33, and the surface of the telescopic rod 32 is slidably connected to the inner wall of the circular hole rack 33. The end of the telescopic rod 32 away from the positioning plate 38 passes through the circular tube 21 and extends to the outer end of the circular tube 21.

[0040] The blanking component 9 includes a conical frame 45, the end of which is fixedly connected to the inner wall of the bent pipe 24, the top of the conical frame 45 is fixedly connected to an elastic spring 44, the top of the elastic spring 44 is fixedly connected to a conical ring 42, the top of the conical ring 42 is fixedly connected to an extrusion rod 41, the top of the extrusion rod 41 is fixedly connected to a triangular plate 40, the bottom of the telescopic rod 32 is fixedly connected to a pressure plate 46, and the surface of the conical ring 42 is fixedly connected to a synchronization rod 43.

[0041] The upper surface of the triangular plate 40 extends to the interior of the circular tube 21. In the present invention, when the sealing block 39 is separated from the air inlet 36, the electric telescopic frame 30 can push the telescopic rod 32 to move synchronously when extending and contracting. When the telescopic rod 32 moves, it pushes the triangular plate 40 downward through the pressure plate 46. When the triangular plate 40 moves downward, it pushes the conical ring 42 to move inside the curved tube 24 through the extrusion rod 41. When the conical ring 42 moves, it can process the water vapor on the inner wall of the curved tube 24 so that the condensed water vapor can quickly slide to the inside of the storage rack 27 for collection. When the pressure plate 46 is separated from the triangular plate 40, the conical ring 42 will use the elasticity of the elastic spring 44 to move upward. The conical ring 42 can move up and down inside the curved tube 24 to scrape off the water vapor, thereby improving the purification efficiency of the silicon tetrachloride raw material. The surface of the conical ring 42 contacts the inner wall of the curved tube 24. There are multiple conical rings 42, and the multiple conical rings 42 are fixedly connected by the synchronization rod 43.

[0042] The inner wall of the conical ring 42 is conical, the top of the conical frame 45 is conical, the bottom of the pressure plate 46 contacts the bottom of the inner wall of the circular tube 21 , and the conical ring 42 is located inside the condenser 23 .

[0043] The stirring component 10 includes a turntable 50, the surface of which is fixedly connected to a mixing plate 51, the top of which is fixedly connected to a spring rod 52, the top of which is fixedly connected to a limiting plate 54, the top of which is fixedly connected to a rotating rod 55, the top of which is rotatably connected to the top of the inner wall of the heating rack 1, the surface of the rotating rod 55 is fixedly connected to an engaging frame 57, the surface of the engaging frame 57 is engaged with an engaging plate 56, the surface of the engaging plate 56 is fixedly connected to a push rod 53, and the end of the push rod 53 away from the engaging plate 56 is fixedly connected to the lower surface of the pressure plate 46.

[0044] The bottom of the turntable 50 and the bottom of the mixing plate 51 are in contact with the bottom of the inner wall of the processing frame 20. The pressure plate 46 of the present invention drives the meshing plate 56 to move through the push rod 53 when moving. The meshing plate 56 drives the meshing frame 57 to rotate when moving. The meshing frame 57 drives the limit plate 54 to rotate through the rotating rod 55 when rotating. The limit plate 54 drives the mixing plate 51 to rotate through the connection between the spring rod 52 and the turntable 50 when rotating. The mixing plate 51 stirs the silicon tetrachloride raw material when rotating. The stirring allows the silicon tetrachloride raw material to be heated evenly, thereby improving the purification efficiency of the silicon tetrachloride raw material. The end of the push rod 53 away from the meshing plate 56 passes through the fixed ring 35 and extends to the inside of the circular tube 21.

[0045] When in use, after placing the silicon tetrachloride raw material inside the processing rack 20, start the heating device 6 to start operation, the heat generated by the heating device 6 will be transmitted to the inside of the processing rack 20 through the processing rack 5 to heat the silicon tetrachloride raw material, and the water vapor generated after the silicon tetrachloride raw material is heated will float upward, start the air pump 4 to start operation, the suction generated by the air pump 4 will enter the inside of the processing rack 5 through the circular tube 21 and suck the water vapor into the inside of the bend 24, when the water vapor flows inside the bend 24, start the condensing device 25 to start operation, the cold air generated by the condensing device 25 is transmitted to the surface of the bend 24 through the condensing pipe 23, and the condensing pipe 23 can condense the water vapor when it flows inside the bend 24. The air pump 4 generates a suction force that can guide the water vapor into the interior of the processing rack 5, thereby preventing a large amount of water vapor from adhering to the interior of the processing rack 5 and causing waste of the silicon tetrachloride raw material. When the air pump 4 starts to work, the electric telescopic rack 30 is started to push the connecting rod 31 to move. The connecting rod 31 pulls the telescopic rod 32 to extend when moving. After the telescopic rod 32 starts to extend, the positioning plate 38 uses the elasticity of the spring 34 to push the sealing block 39 to separate from the inner wall of the air inlet 36, so that the suction force generated by the air pump 4 can enter the interior of the processing rack 5 to collect the water vapor. When the electric telescopic rack 30 retracts, the electric telescopic rack 30 pushes the telescopic rod 32 to retract to the limit through the connecting rod 31. The telescopic rod 32 can push the positioning plate 38 to insert the sealing block 39 into the interior of the air inlet 36 to seal the circular tube 21, so that when the processing rack 5 starts to heat the silicon tetrachloride raw material, the hot air can be gathered inside the processing rack 5 to improve the heating efficiency. When the sealing block 39 is separated from the air inlet 36, the electric telescopic rack 30 can push the telescopic rod 32 to move synchronously when extending and contracting. When the telescopic rod 32 moves, it pushes the triangular plate 40 downward through the pressure plate 46. When the triangular plate 40 moves downward, it pushes the conical ring 42 to move inside the curved pipe 24 through the squeezing rod 41. When the conical ring 42 moves, it can process the water vapor on the inner wall of the curved pipe 24, so that the condensed water vapor can quickly slide to the inner side of the storage rack 27. When the pressure plate 46 is separated from the triangular plate 40, the conical ring 42 will move upward by utilizing the elasticity of the elastic spring 44, and the conical ring 42 can move up and down inside the bend pipe 24 to scrape off the water vapor, thereby improving the purification efficiency of the silicon tetrachloride raw material. When the pressure plate 46 moves, the meshing plate 56 is driven to move by the push rod 53. When the meshing plate 56 moves, the meshing frame 57 is driven to rotate. When the meshing frame 57 rotates, the limiting plate 54 is driven to rotate by the rotating rod 55. When the limiting plate 54 rotates, the mixing plate 51 is driven to rotate by the connection between the elastic rod 52 and the turntable 50. When the mixing plate 51 rotates, the silicon tetrachloride raw material is stirred. By stirring, the silicon tetrachloride raw material is heated evenly, thereby improving the purification efficiency of the silicon tetrachloride raw material.

[0046] The preferred embodiments of the present invention disclosed above are intended only to help illustrate the present invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the present invention to the specific embodiments described. Obviously, many modifications and variations are possible based on the content of this specification. These embodiments are selected and described in detail in this specification to better explain the principles and practical applications of the present invention, thereby enabling those skilled in the art to better understand and utilize the present invention. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A purification device for processing high-purity silicon tetrachloride, comprising a base (11), characterized in that: The top of the base (11) is plugged with a heating rack (1), the inner wall of the heating rack (1) is fixedly connected to a processing rack (5), the surface of the processing rack (5) is fixedly connected to a heating device (6), the bottom of the base (11) is fixedly connected to a bracket (3), the top of the inner wall of the bracket (3) is fixedly connected to a hydraulic rod (2), the bottom of the hydraulic rod (2) is fixedly connected to the top of the heating rack (1), the inner wall of the bracket (3) is fixedly connected to an air pump (4), and the surface of the heating rack (1) is provided with a condensing component (7); The condensation component (7) comprises a circular tube (21), the end of the circular tube (21) is fixedly connected to the surface of the heating rack (1), the surface of the circular tube (21) is fixedly connected to a positioning ring (22), the bottom of the positioning ring (22) is connected to a curved tube (24), the lower surface of the curved tube (24) is connected to a storage rack (27), the bottom of the storage rack (27) is hinged with a sealing door (26), the inner wall of the curved tube (24) is fixedly connected to a sieve plate (28), the upper surface of the curved tube (24) is fixedly connected to a condensing pipe (23), the surface of the condensing pipe (23) is fixedly connected to a condensing device (25), the top of the base (11) is fixedly connected to a processing rack (20), the interior of the circular tube (21) is provided with a sealing component (8), the inner wall of the curved tube (24) is provided with a feeding component (9), and the interior of the processing rack (5) is provided with a stirring component (10).

2. A purification device for high-purity silicon tetrachloride processing according to claim 1, characterized in that: The end of the circular tube (21) passes through the heating rack (1) and is connected to the interior of the processing rack (5); the curved tube (24) is located below the circular tube (21); the end of the curved tube (24) away from the positioning ring (22) is connected to the air inlet end of the air pump (4); the sieve plate (28) is located at the end of the curved tube (24) close to the air pump (4); and the condenser (23) is located below the circular tube (21).

3. A purification device for high-purity silicon tetrachloride processing according to claim 2, characterized in that: The sealing component (8) includes a fixing ring (35), the surface of the fixing ring (35) is fixedly connected to the inner wall of the circular tube (21), an air inlet (36) is provided on the surface of the fixing ring (35), a positioning groove (37) is provided on one end of the fixing ring (35) away from the air inlet (36), a sealing block (39) is inserted into the inner wall of the air inlet (36), a positioning plate (38) is fixedly connected to the surface of the sealing block (39), and the surface of the positioning plate (38) is fixedly connected to the inner wall of the circular tube (21). A telescopic rod (32) is fixedly connected to the positioning plate (38), one end of the positioning plate (38) close to the telescopic rod (32) is fixedly connected to a spring (34), the inner wall of the circular tube (21) is fixedly connected to a circular hole frame (33), the top of the positioning ring (22) is fixedly connected to an electric telescopic frame (30), the telescopic end of the electric telescopic frame (30) is fixedly connected to a connecting rod (31), and the end of the connecting rod (31) away from the electric telescopic frame (30) is fixedly connected to the end of the telescopic rod (32).

4. A purification device for high-purity silicon tetrachloride processing according to claim 3, characterized in that: The surface of the positioning plate (38) contacts the inner wall of the positioning groove (37), the end of the spring (34) away from the positioning plate (38) is fixedly connected to the surface of the circular hole frame (33), the surface of the telescopic rod (32) is slidably connected to the inner wall of the circular hole frame (33), and the end of the telescopic rod (32) away from the positioning plate (38) passes through the circular tube (21) and extends to the outer end of the circular tube (21).

5. A purification device for high-purity silicon tetrachloride processing according to claim 4, characterized in that: The blanking component (9) comprises a conical frame (45), the end of the conical frame (45) is fixedly connected to the inner wall of the bent pipe (24), the top of the conical frame (45) is fixedly connected to an elastic spring (44), the top of the elastic spring (44) is fixedly connected to a conical ring (42), the top of the conical ring (42) is fixedly connected to an extrusion rod (41), the top of the extrusion rod (41) is fixedly connected to a triangular plate (40), the bottom of the telescopic rod (32) is fixedly connected to a pressure plate (46), and the surface of the conical ring (42) is fixedly connected to a synchronization rod (43).

6. A purification device for high-purity silicon tetrachloride processing according to claim 5, characterized in that: The upper surface of the triangular plate (40) extends to the interior of the circular tube (21), and the surface of the conical ring (42) contacts the inner wall of the curved tube (24). There are multiple conical rings (42), and the multiple conical rings (42) are fixedly connected by a synchronization rod (43).

7. A purification device for high-purity silicon tetrachloride processing according to claim 6, characterized in that: The inner wall of the conical ring (42) is conically arranged, the top of the conical frame (45) is conically arranged, the bottom of the pressure plate (46) contacts the bottom of the inner wall of the circular tube (21), and the conical ring (42) is located inside the condenser (23).

8. A purification device for high-purity silicon tetrachloride processing according to claim 7, characterized in that: The stirring component (10) comprises a turntable (50), the surface of the turntable (50) is fixedly connected to a mixing plate (51), the top of the turntable (50) is fixedly connected to a spring rod (52), the top of the spring rod (52) is fixedly connected to a limiting plate (54), the top of the limiting plate (54) is fixedly connected to a rotating rod (55), the top of the rotating rod (55) is rotatably connected to the top of the inner wall of the heating frame (1), the surface of the rotating rod (55) is fixedly connected to an engaging frame (57), the surface of the engaging frame (57) is engaged with an engaging plate (56), the surface of the engaging plate (56) is fixedly connected to a push rod (53), and the end of the push rod (53) away from the engaging plate (56) is fixedly connected to the lower surface of the pressure plate (46).

9. A purification device for high-purity silicon tetrachloride processing according to claim 8, characterized in that: The bottom of the turntable (50), the bottom of the mixing plate (51) and the bottom of the inner wall of the processing frame (20) are in contact, and the end of the push rod (53) away from the engaging plate (56) passes through the fixing ring (35) and extends to the inside of the circular tube (21).

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