Display panel, preparation method thereof and display device

Abstract

The invention discloses a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, an isolation structure, a light-emitting layer and a first electrode layer. The material of the third layer of the isolation structure comprises a conductive material, and part of the third layer protrudes towards the isolation opening relative to the first layer, so that the first electrode can be in lap joint with the protruding part of the third layer on one side in the first direction, and electric connection between the first electrode and the isolation structure is achieved. The material of the first layer comprises an insulating material, so that the light-emitting unit is prevented from overlapping with the first layer and being electrically connected with the isolation structure. And the light-emitting unit is separated from the third layer, so that the problems that a current leakage path is formed among the anode corresponding to the light-emitting unit, the light-emitting unit and the isolation structure due to the fact that the light-emitting unit is electrically connected with the isolation structure, part of current flows through the current leakage path during low brightness, and the low-brightness picture quality is poor can be solved.

Description

Technical Field

[0001] The present application relates to the field of display, and in particular to a display panel, a preparation method thereof, and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) and flat-panel display devices based on technologies such as Light Emitting Diode (LED) have been widely used in various consumer electronic products such as mobile phones, televisions, laptops, and desktop computers due to their advantages such as high image quality, power saving, thin body, and wide range of applications, becoming the mainstream display device.

[0003] In the traditional display panel manufacturing process, pixel patterning is typically achieved through a fine metal mask (FMM). FMM technology is mature and has extensive mass production experience. However, FMM technology also has issues such as limited precision, high development costs, and long development cycles. Fine metal mask-free technology eliminates the limitations of traditional OLED processes on display size, resolution, and other screen performance, offering the advantages of high performance, full-area sizing, and agile delivery. Patents CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A, and CN118660589A describe the fine metal mask-free technology for reference.

[0004] However, the performance of current OLED display products needs to be improved. Summary of the Invention

[0005] The embodiments of the present application provide a display panel, a method for manufacturing the same, and a display device, aiming to improve the performance of OLED display products.

[0006] A first aspect of the present application provides a display panel, comprising: a substrate; an isolation structure located on one side of the substrate, the isolation structure enclosing an isolation opening, the isolation structure comprising a first layer, a second layer located on the side of the first layer facing away from the substrate, and a third layer located on the side of the first layer facing the substrate, the orthographic projection of the first layer on the substrate being within the orthographic projection of the second layer on the substrate, and the orthographic projection of part of the third layer on the substrate being outside the orthographic projection of the first layer on the substrate, the material of the third layer comprising a conductive material, and the material of the first layer comprising an insulating material; a light-emitting layer located on one side of the substrate, the light-emitting layer comprising a light-emitting unit at least partially located at the isolation opening, the light-emitting unit being spaced from the third layer; a first electrode layer located on the side of the light-emitting layer facing away from the substrate, the first electrode layer comprising a first electrode located in the isolation opening, and the first electrode being electrically connected to the third layer on one side in the first direction.

[0007] According to a second aspect of the present application, a display panel is provided. The display panel includes: a substrate; an isolation structure located on one side of the substrate, the isolation structure enclosing an isolation opening, the isolation structure including a first layer, a second layer located on the side of the first layer facing away from the substrate, and a third layer located on the side of the first layer facing the substrate, the orthographic projection of the first layer on the substrate is located within the orthographic projection of the second layer on the substrate, the material of the third layer includes a conductive material, the material of the first layer includes an insulating material, the third layer includes a first sub-section and a second sub-section, the orthographic projection of the first sub-section on the substrate is located within the orthographic projection of the first layer on the substrate, the orthographic projection of the second sub-section on the substrate is located within the orthographic projection of the first layer on the substrate, and the orthographic projection of the second sub-section on the substrate is located within the orthographic projection of the first layer on the substrate. The second division is located on one side of the first division in the first direction; the light-emitting layer is located on one side of the substrate, the light-emitting layer includes a light-emitting unit at least partially located in the isolation opening, the light-emitting unit is spaced from the third layer, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the width of the second division corresponding to the first light-emitting unit in the first direction is the first width, the width of the second division corresponding to the second light-emitting unit in the first direction is the second width, and the first width is less than or equal to the second width; the first electrode layer is located on the side of the light-emitting layer away from the substrate, the first electrode layer includes a first electrode located in the isolation opening, and the first electrode is electrically connected to the second division.

[0008] An embodiment of a third aspect of the present application provides a method for manufacturing a display panel, including:

[0009] An isolation structure is prepared on the substrate, the isolation structure enclosing an isolation opening, the isolation structure comprising a first layer, a second layer located on a side of the first layer facing away from the substrate, and a third layer located on a side of the first layer facing the substrate, an orthographic projection of the first layer on the substrate being within an orthographic projection of the second layer on the substrate, and a portion of an orthographic projection of the third layer on the substrate being outside an orthographic projection of the first layer on the substrate, the third layer being made of a conductive material, and the first layer being made of an insulating material;

[0010] A light-emitting layer and a first electrode layer are prepared on a substrate. The light-emitting layer includes a light-emitting unit at least partially located in the isolation opening, and the light-emitting unit is spaced from the third layer. The first electrode layer includes a first electrode located in the isolation opening, and one side of the first electrode in the first direction is electrically connected to the third layer.

[0011] An embodiment of the fourth aspect of the present application provides a display device, which includes a display panel of any of the above embodiments or a display panel prepared by the method for preparing a display panel of any of the above embodiments.

[0012] According to an embodiment of the present application, the display panel includes a substrate, an isolation structure, a light-emitting layer, and a first electrode layer. The isolation structure includes a first layer, a second layer located on a side of the first layer facing away from the substrate, and a third layer located on a side of the first layer facing the substrate. The orthographic projection of the first layer on the substrate is located within the orthographic projection of the second layer on the substrate, and a portion of the orthographic projection of the third layer on the substrate is located outside the orthographic projection of the first layer on the substrate. The third layer, the first layer, and the second layer are stacked to form an isolation structure. The orthographic projection of the first layer located near the substrate is located within the orthographic projection of the second layer on the substrate. The area of the second layer is larger than that of the first layer. The second layer covers the surface of the first layer near the second layer. In this case, the first layer is recessed relative to the second layer in a direction away from the isolation opening. When preparing the light-emitting layer, a large drop is generated at the edge of the isolation structure, and the first layer is recessed relative to the second layer. The light-emitting layer is difficult to connect at the edge of the isolation structure, resulting in fracture. The fracture of the light-emitting layer forms disconnected light-emitting units, thereby reducing carrier crosstalk within the light-emitting layer and improving the display effect of the display panel. In addition, the light-emitting units can be prepared without the use of a precision mask, which can reduce the development and use of precision masks and reduce preparation costs. The material of the third layer includes a conductive material, and a portion of the third layer is arranged to protrude toward the isolation opening relative to the first layer, so that the first electrode can overlap with the protruding portion of the third layer on one side in the first direction, thereby realizing electrical connection between the first electrode and the isolation structure. The material of the first layer includes an insulating material, which prevents the light-emitting unit from overlapping with the first layer, resulting in electrical connection with the isolation structure. In addition, the light-emitting unit is spaced from the third layer, which can prevent the light-emitting unit from being electrically connected to the isolation structure, resulting in the formation of a leakage path between the anode corresponding to the light-emitting unit, the light-emitting unit, and the isolation structure. When the brightness is low, some current will flow through the leakage path, solving the problem of poor image quality at low brightness, thereby improving the display effect and performance of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Other features, objects and advantages of the present application will become more apparent by reading the following detailed description of non-limiting embodiments with reference to the accompanying drawings, in which the same or similar reference numerals represent the same or similar features and the accompanying drawings are not drawn to scale.

[0014] Figure 1is a partial cross-sectional view of a display panel provided in an embodiment of the present application;

[0015] Figure 2A is a partial top view of a display panel provided in an embodiment of the present application;

[0016] Figure 2B is a partial top view of a display panel provided in an embodiment of the present application;

[0017] Figure 3 is a partial cross-sectional view of a display panel in another embodiment;

[0018] Figure 4 is a partial cross-sectional view of a display panel in yet another embodiment;

[0019] Figure 5 is a partial cross-sectional view of a display panel in yet another embodiment;

[0020] Figure 6 is a partial cross-sectional view of a display panel in yet another embodiment;

[0021] Figure 7 is a partial cross-sectional view of a display panel in yet another embodiment;

[0022] Figure 8 is a partial top view of a display panel in another embodiment;

[0023] Figure 9 This is a flow chart of a method for manufacturing a display panel provided in an embodiment of the present application;

[0024] Figures 10 to 13 This is a diagram of the preparation process of a display panel provided in an embodiment of the present application.

[0025] Description of reference numerals:

[0026] 10. Display panel;

[0027] 100. Substrate;

[0028] 200, isolation structure; 201, first subsection; 202, second subsection; 210, first floor; 211, internal structure; 212, external structure; 220, second floor; 230, third floor; 231, first subsection; 232, second subsection; 240, isolation opening;

[0029] 300, light-emitting layer; 310, light-emitting unit; 311, first light-emitting unit; 312, second light-emitting unit; 313, third light-emitting unit; 320, first pixel column; 330, second pixel column; 340, third pixel column;

[0030] 400, first electrode layer; 410, first electrode; 411, first end; 412, second end;

[0031] 500, pixel definition layer; 510, pixel defining portion; 520, pixel opening; 530, second electrode;

[0032] H1, first distance; H2, second distance;

[0033] D1, first width; D2, second width; D3, third width;

[0034] X, first direction; Y, second direction. DETAILED DESCRIPTION

[0035] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain the present application and are not configured to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is merely to provide a better understanding of the present application by illustrating the examples of the present application.

[0036] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. In the absence of further limitations, the elements defined by the phrase "comprising..." do not exclude the presence of other identical elements in the process, method, article, or device comprising the elements.

[0037] It should be understood that when describing the structure of a component, when a layer or a region is referred to as being "on" or "over" another layer or region, it may mean that it is directly on the other layer or region, or that other layers or regions are included between it and the other layer or region. Furthermore, if the component is turned over, the layer or region will be "below" or "beneath" the other layer or region.

[0038] In related technologies, the light-emitting unit is electrically connected to the isolation structure, and the anode, light-emitting unit, and isolation structure are electrically connected. This is equivalent to a small resistor connected in parallel to the OLED device, forming a leakage path. Therefore, when the display panel is dimmed, some current will flow through this leakage path, resulting in poor image quality in low-light conditions.

[0039] In order to solve the problem of poor image quality at low brightness caused by leakage path, the embodiments of the present application provide a display panel, a preparation method thereof, and a display device. The following will describe various embodiments of the display panel, a preparation method thereof, and a display device with reference to the accompanying drawings.

[0040] The present invention provides a display panel in an embodiment, which may be an organic light emitting diode (OLED) display panel. Figure 1 and Figure 2A , Figure 1 is a partial cross-sectional view of a display panel provided in an embodiment of the present application; Figure 2A This is a partial top view of a display panel provided in an embodiment of the present application.

[0041] like Figure 1 and Figure 2A As shown, the first embodiment of the present application provides a display panel 10, which includes: a substrate 100; an isolation structure 200, which is located on one side of the substrate 100, and the isolation structure 200 encloses an isolation opening 240. The isolation structure 200 includes a first layer 210, a second layer 220 located on the side of the first layer 210 facing away from the substrate 100, and a third layer 230 located on the side of the first layer 210 facing the substrate 100. The orthographic projection of the first layer 210 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100, and the orthographic projection of part of the third layer 230 on the substrate 100 is located The first layer 210 is outside the orthographic projection of the substrate 100, the material of the third layer 230 includes a conductive material, and the material of the first layer 210 includes an insulating material; the light-emitting layer 300 is located on one side of the substrate 100, and the light-emitting layer 300 includes a light-emitting unit 310 at least partially located in the isolation opening 240, and the light-emitting unit 310 is separated from the third layer 230; the first electrode layer 400 is located on the side of the light-emitting layer 300 away from the substrate 100, and the first electrode layer 400 includes a first electrode 410 located in the isolation opening 240, and the first electrode 410 is electrically connected to the third layer 230 on one side in the first direction X.

[0042] According to the display panel 10 of the embodiment of the present application, the display panel 10 includes a substrate 100 , an isolation structure 200 , a light emitting layer 300 and a first electrode layer 400 . The isolation structure 200 includes a first layer 210, a second layer 220 located on the side of the first layer 210 facing away from the substrate 100, and a third layer 230 located on the side of the first layer 210 facing the substrate 100. The orthographic projection of the first layer 210 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100, and the orthographic projection of part of the third layer 230 on the substrate 100 is located outside the orthographic projection of the first layer 210 on the substrate 100. The third layer 230, the first layer 210 and the second layer 220 are stacked to form the isolation structure 200. The orthographic projection of the first layer 210 arranged close to the substrate 100 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100. The area of the second layer 220 is larger than the area of the first layer 210. The second layer 220 covers the surface of the first layer 210 close to the second layer 220. At this time, the first layer 210 is recessed relative to the second layer 220 in a direction away from the isolation opening 240. When preparing the light-emitting layer 300, a significant drop in height occurs at the edge of the isolation structure 200. Furthermore, the first layer 210 is recessed relative to the second layer 220, making it difficult for the light-emitting layer 300 to connect at the edge of the isolation structure 200, resulting in breakage. The breakage of the light-emitting layer 300 forms disconnected light-emitting units 310, thereby reducing carrier crosstalk within the light-emitting layer 300 and improving the display quality of the display panel 10. Furthermore, the light-emitting units 310 can be prepared without the use of a precision mask, reducing the development and use of precision masks and lowering manufacturing costs. The third layer 230 comprises a conductive material. A portion of the third layer 230 protrudes relative to the first layer 210 toward the isolation opening 240, enabling the first electrode 410 to overlap with the protruding portion of the third layer 230 on one side in the first direction X, thereby achieving electrical connection between the first electrode 410 and the isolation structure 200. The first layer 210 comprises an insulating material, preventing the light-emitting units 310 from overlapping with the first layer 210 and thereby electrically connecting to the isolation structure 200. Moreover, the light-emitting unit 310 is spaced from the third layer 230, which can avoid electrical connection between the light-emitting unit 310 and the isolation structure 200, resulting in the formation of a leakage path between the anode corresponding to the light-emitting unit 310, the light-emitting unit 310 and the isolation structure 200. When the brightness is low, part of the current will flow through the leakage path, solving the problem of poor image quality at low brightness, thereby improving the display effect and performance of the display panel 10.

[0043] The isolation structure 200 separates the first electrode layer 400 to form mutually spaced first electrodes 410 . The mutually spaced first electrodes 410 are electrically connected through the isolation structure 200 to form a full-surface electrode, thereby ensuring normal light emission of the light-emitting unit 310 .

[0044] There are many ways to configure the substrate 100. For example, the substrate 100 may include a substrate and an array substrate 100 disposed on the substrate. Alternatively, the substrate 100 is the substrate. Alternatively, the substrate 100 may include a buffer layer and a support plate on a side facing away from the substrate.

[0045] In some optional embodiments, the plurality of first electrodes 410 are electrically connected to the third layer 230 on the same side in the first direction X.

[0046] In these optional embodiments, all first electrodes 410 are electrically connected to the third layer 230 on the same side, which can unify the evaporation process direction. The third layer 230 serves as a connecting layer, and multiple first electrodes 410 are overlapped with it through the same side to form a more uniform current distribution path.

[0047] In some optional embodiments, the third layer 230 includes a first division 231 and a second division 232, the orthographic projection of the first division 231 on the substrate 100 is located within the orthographic projection of the first layer 210 on the substrate 100, the orthographic projection of the second division 232 on the substrate 100 is located outside the orthographic projection of the first layer 210 on the substrate 100, and the first electrode 410 is electrically connected to the second division 232.

[0048] In these optional embodiments, the first electrode 410 is electrically connected to the second portion 232 , thereby achieving electrical connection between the first electrode 410 and the isolation structure 200 .

[0049] Optionally, the light-emitting unit 310 is spaced from both the first subsection 231 and the second subsection 232. This prevents electrical connection between the light-emitting unit 310 and the isolation structure 200, which could lead to a leakage path between the anode corresponding to the light-emitting unit 310, the light-emitting unit 310, and the isolation structure 200. At low brightness, some current would flow through this leakage path, resulting in poor image quality at low brightness. This improves the display quality and performance of the display panel 10. Furthermore, the light-emitting unit 310 is spaced from the second subsection 232, allowing the first electrode 410 to effectively overlap the second subsection 232 without being blocked by the film layer of the light-emitting unit 310, thereby optimizing the overlap effect of the first electrode 410.

[0050] In some optional embodiments, the sidewall of the first layer 210 facing the isolation opening 240 is spaced apart from the sidewall of the first portion 231 facing the isolation opening 240 .

[0051] In these optional embodiments, the gap serves as a physical buffer to ensure that there is no direct contact between the first layer 210 and the first subsection 231 of the third layer 230, thereby preventing the light-emitting unit 310 from contacting the first subsection 231 to form a leakage path due to process errors.

[0052] Optionally, the second subsection 232 is located on one side of the first subsection 231 in the first direction X, so that the first electrode 410 on one side in the first direction X overlaps with the second subsection 232, thereby achieving electrical connection between the first electrode 410 on one side in the first direction X and the isolation structure 200.

[0053] In some optional embodiments, within the same isolation opening 240 , a second sub-portion 232 is provided on one side of the light emitting unit 310 in the first direction X.

[0054] In these alternative embodiments, the second subsection 232 is provided only on one side of the light-emitting unit 310 in the first direction X, and the second subsection 232 is not provided on the other side of the light-emitting unit 310 in the first direction X or on both sides of the light-emitting unit 310 in the second direction Y. This results in that the first electrode 410 overlaps the second subsection 232 on one side in the first direction X, and the light-emitting unit 310 is spaced apart from the second subsection 232. In locations where the second subsection 232 is not provided, even if the light-emitting unit 310 overlaps the isolation structure 200, no leakage path is formed. Alternatively, the second subsection 232 is provided on the other side of the light-emitting unit 310 in the first direction X and on both sides of the light-emitting unit 310 in the second direction Y. This results in that the light-emitting unit 310 does not overlap the third layer 230 on the other side in the first direction X or on both sides of the light-emitting unit 310 in the second direction Y, and thus no leakage path is formed.

[0055] Optionally, the isolation structure 200 has a first segment 201 and a second segment 202 arranged relative to each other in the second direction Y. The first segment 201 and the second segment 202 extend along the first direction X and are respectively located on both sides of the isolation opening 240 in the second direction Y. The first segment 201 and the second segment 202 are respectively located on both sides of the second section 232 in the second direction Y. The orthographic projection of the second section 232 on the substrate 100 is spaced from the orthographic projection of the first segment 201 on the substrate 100.

[0056] Optionally, the orthographic projection of the second portion 232 on the substrate 100 is spaced apart from the orthographic projection of the second segment 202 on the substrate 100 .

[0057] In some optional embodiments, in each third layer 230 , the second sub-portion 232 is located on the same side of the first sub-portion 231 in the first direction X.

[0058] In these optional embodiments, when the second divisions 232 are all located on the same side of the first division 231 in the first direction X, the first electrode 410 is evaporated in the same evaporation direction, and each first electrode 410 can overlap with the second division 232 on the same side to achieve electrical connection between the first electrode 410 and the isolation structure 200.

[0059] See also Figure 2B , Figure 2BThis is a partial top view of a display panel provided in an embodiment of the present application.

[0060] like Figure 2B As shown, optionally, some of the second divisions 232 among the plurality of second divisions 232 are located on one side of the first division 231 in the first direction X, and another part of the second divisions 232 are located on the other side of the first division 231 in the first direction X.

[0061] See also Figures 1 to 5 , Figure 3 is a partial cross-sectional view of a display panel in another embodiment; Figure 4 is a partial cross-sectional view of a display panel in yet another embodiment; Figure 5 FIG. 4 is a partial cross-sectional view of a display panel in yet another embodiment.

[0062] like Figures 1 to 5 As shown, in some optional embodiments, the light-emitting unit 310 includes a first light-emitting unit 311 and a second light-emitting unit 312, the width of the second section 232 corresponding to the first light-emitting unit 311 in the first direction X is a first width D1, and the width of the second section 232 corresponding to the second light-emitting unit 312 in the first direction X is a second width D2, and the first width D1 is less than or equal to the second width D2.

[0063] In these optional embodiments, during the etching process of the first light-emitting unit 311 prepared in the first pass, the second subsection 232 corresponding to the second light-emitting unit 312 may be partially removed due to etching. Increasing the width of the second subsection 232 of the second light-emitting unit 312 can reserve more overlapping area, ensuring a reliable connection between the first electrode 410 and the third layer 230, and avoiding overlapping failure due to etching.

[0064] In some optional embodiments, the light emitting unit 310 further includes a third light emitting unit 313 , and the width of the second portion 232 corresponding to the third light emitting unit 313 in the first direction X is a third width D3 , and the second width D2 is less than or equal to the third width D3 .

[0065] In these optional embodiments, during the etching process of the first light-emitting unit 311 fabricated in the first pass and the second light-emitting unit 312 fabricated in the second pass, the second subsection 232 corresponding to the third light-emitting unit 313 may be partially removed due to etching. Increasing the width of the second subsection 232 of the third light-emitting unit 313 can reserve more overlapping area, ensuring a reliable connection between the first electrode 410 and the third layer 230, and preventing overlapping failure due to etching.

[0066] Optionally, the first light emitting unit 311, the second light emitting unit 312, and the third light emitting unit 313 emit different colors. For example, the first light emitting unit 311 emits blue, the second light emitting unit 312 emits green, and the third light emitting unit 313 emits red.

[0067] In some optional embodiments, one side of the light emitting unit 310 in the first direction X is spaced apart from the third layer 230 , and the other side in the first direction X is overlapped with the first layer 210 .

[0068] In these optional embodiments, the light-emitting unit 310 is spaced from the third layer 230 on one side in the first direction X, thereby preventing the light-emitting unit 310 from being electrically connected to the isolation structure 200, which would result in a leakage path being formed between the anode corresponding to the light-emitting unit 310, the light-emitting unit 310, and the isolation structure 200. At low brightness, some current would flow through this leakage path, resulting in poor low-brightness image quality. The light-emitting unit 310 is overlapped with the first layer 210 on the other side in the first direction X. Since the material of the first layer 210 includes an insulating material, the light-emitting unit 310 cannot form a leakage path with the first layer 210 after being overlapped with the first layer 210. This avoids the problem of some current flowing through the leakage path at low brightness, resulting in poor low-brightness image quality.

[0069] Optionally, the light-emitting unit 310 is spaced from the first layer 210 on one side in the first direction X and overlaps with the first layer 210 on the other side in the first direction X. The light-emitting unit 310 overlaps with the first layer 210 on the other side in the first direction X. Since the material of the first layer 210 includes an insulating material, after the light-emitting unit 310 overlaps with the first layer 210, it cannot form a leakage path with the first layer 210, thereby avoiding the problem of partial current flowing through the leakage path at low brightness, resulting in poor image quality at low brightness. Optionally, the first electrode 410 overlaps with the third layer 230 on one side in the first direction X and is spaced from the third layer 230 on the other side in the first direction X, thereby achieving electrical connection between the first electrode 410 and the isolation structure 200.

[0070] Optionally, the first electrode 410 overlaps the third layer 230 on one side in the first direction X and is spaced from the first layer 210 on the other side in the first direction X. The light-emitting unit 310 is spaced from the third layer 230 on one side in the first direction X and overlaps the first layer 210 on the other side in the first direction X. The first electrode 410 is evaporated toward one side in the first direction X, and the light-emitting unit 310 is evaporated toward the other side in the first direction X. This allows for a better overlap between the first electrode 410 and the third layer 230, and no leakage path is formed when the light-emitting unit 310 overlaps the first layer 210. (See ). Figure 6 , Figure 6 FIG. 4 is a partial cross-sectional view of a display panel in another embodiment.

[0071] like Figure 6 As shown, in some optional embodiments, the first layer 210 includes an inner structure 211 and an outer structure 212 located on the inner structure 211 facing the isolation opening 240. The outer structure 212 is made of an insulating material. For example, the inner structure 211 is made of a conductive material. For example, the inner structure 211 is made of aluminum, and the outer structure 212 is made of aluminum oxide.

[0072] In these optional embodiments, the outer structure 212 is made of an insulating material. Even after the light-emitting unit 310 overlaps the outer structure 212 of the first layer 210, it cannot form a leakage path with the first layer 210. This prevents some current from flowing through the leakage path at low brightness, resulting in poor low-light image quality. During the manufacturing process, the exposed surface of the aluminum is oxidized to form the first layer 210, where the inner structure 211 is aluminum and the outer structure 212 is aluminum oxide.

[0073] Optionally, the light-emitting unit 310 is spaced from the external structure 212 on one side in the first direction X and overlaps the external structure 212 on the other side in the first direction X. Even after overlapping the external structure 212 of the first layer 210, the light-emitting unit 310 cannot form a leakage path with the first layer 210, thereby preventing some current from flowing through the leakage path at low brightness, resulting in poor low-brightness image quality. During the manufacturing process, the exposed surface of the aluminum is oxidized to form the first layer 210 with an internal structure 211 of aluminum and an external structure 212 of aluminum oxide.

[0074] See also Figure 7 , Figure 7 FIG. 4 is a partial cross-sectional view of a display panel in another embodiment.

[0075] like Figure 7 As shown, in some optional embodiments, the first electrode 410 has a first end 411 and a second end 412 arranged opposite to each other in the first direction X, the first end 411 is in contact with the isolation structure 200, and the second end 412 is spaced from the isolation structure 200, the distance between the first end 411 and the substrate 100 is a first distance H1, and the distance between the second end 412 and the substrate 100 is a second distance H2, and the first distance H1 is greater than or equal to the second distance H2.

[0076] The first end 411 and the second end 412 of the first electrode 410 refer to the end points or edges of the first electrode 410 closest to the isolation structure 200 in the first direction X.

[0077] In these optional embodiments, the first distance H1 is greater than or equal to the second distance H2, so that the first end 411 has a larger climbing height and a larger contact area with the third layer 230, thereby improving the overlapping effect between the first electrode 410 and the isolation structure 200 on one side of the first end 411, thereby reducing the overlapping impedance and the power consumption of the display panel 10.

[0078] In some optional embodiments, the orthographic projection of the first end 411 on the substrate 100 is located outside the orthographic projection of the light emitting unit 310 on the substrate 100 .

[0079] In these optional embodiments, the first electrode 410 directly contacts the third layer 230 on one side of the first end 411, avoiding the presence of the light-emitting unit 310 between the first electrode 410 and the third layer 230, resulting in failure of the overlap between the first electrode 410 and the isolation structure 200.

[0080] Optionally, the orthographic projection of the second end 412 on the substrate 100 is located within the orthographic projection of the light emitting unit 310 on the substrate 100 .

[0081] In these optional embodiments, the distance between the second end 412 and the isolation structure 200 is increased, and the first electrode 410 is further biased toward the first end 411 for vapor deposition, thereby further increasing the overlap area between the first electrode 410 and the third layer 230 on the first end 411 side, and improving the overlap effect between the first electrode 410 and the isolation structure 200 on the first end 411 side, thereby reducing the overlap impedance and the power consumption of the display panel 10. Figure 8 , Figure 8 FIG. 4 is a partial top view of a display panel in another embodiment.

[0082] like Figure 8 As shown, optionally, the light-emitting unit 310 includes a first light-emitting unit 311, a second light-emitting unit 312, and a third light-emitting unit 313. The plurality of first light-emitting units 311 are arranged in the second direction Y to form a first pixel column 320, the plurality of second light-emitting units 312 are arranged in the second direction Y to form a second pixel column 330, and the plurality of third light-emitting units 313 are arranged in the second direction Y to form a third pixel column 340. The first pixel columns 320, the second pixel columns 330, and the third pixel columns 340 are arranged alternately in the first direction X, and the first direction X intersects the second direction Y. This arrangement of the first light-emitting units 311, the second light-emitting units 312, and the third light-emitting units 313 provides a better display effect, a regular arrangement, and a simple manufacturing process.

[0083] In some optional embodiments, the display panel 10 further includes: a pixel definition layer 500 located on one side of the substrate 100 , the pixel definition layer 500 including a pixel defining portion 510 and a pixel opening 520 enclosed by the pixel defining portion 510 , the pixel opening 520 being connected to the isolation opening 240 .

[0084] In these optional embodiments, the pixel defining portion 510 of the pixel definition layer 500 encloses a pixel opening 520 to accommodate the light-emitting unit 310 and ensure normal light emission of the light-emitting unit 310. Furthermore, the pixel defining portion 510 defines the placement area of each light-emitting unit 310, thereby reducing color crosstalk between the light-emitting units 310.

[0085] In some optional embodiments, the display panel 10 further includes a second electrode 530 located between the substrate 100 and the light emitting unit 310 , and at least a portion of the second electrode 530 is exposed by the pixel opening 520 .

[0086] In these optional embodiments, one of the second electrode 530 and the first electrode 410 serves as the anode of the light-emitting unit 310, and the other serves as the cathode of the light-emitting unit 310. In the embodiment of the present application, the second electrode 530 serves as the anode of the light-emitting unit 310, and the first electrode 410 serves as the cathode of the light-emitting unit 310.

[0087] In some optional embodiments, the second layer 220 includes a conductive material or an insulating material.

[0088] In these optional embodiments, the second layer 220 comprises a conductive material, for example, a non-metallic conductive material or a metallic conductive material. When the second layer 220 is a non-metallic conductive material or an insulating material, the second layer 220 is difficult to etch during wet etching of the first layer 210 using an etchant, thereby making it easier for the first layer 210 to be recessed relative to the second layer 220. When both the first layer 210 and the second layer 220 are made of metal, the first layer 210 and the second layer 220 are made of different materials. The first layer 210 can be wet-etched using an etchant. By configuring the etchant, the etching rate of the second layer 220 can be lower than the etching rate of the first layer 210. Because the etching rate of the first layer 210 is higher, even though the second layer 220 will be etched to some extent during wet etching using the etchant, the first layer 210 will be etched faster, thereby making the first layer 210 recessed relative to the second layer 220.

[0089] Optionally, the light emitting layer 300 includes an electron injection layer (EIL), an electron transport layer (ETL), a light emitting material layer, a hole injection layer (HIL) and a hole transport layer (HTL).

[0090] like Figures 1 to 8As shown, the second embodiment of the present application provides a display panel 10, which includes: a substrate 100; an isolation structure 200, which is located on one side of the substrate 100, and the isolation structure 200 encloses an isolation opening 240. The isolation structure 200 includes a first layer 210, a second layer 220 located on the side of the first layer 210 facing away from the substrate 100, and a third layer 230 located on the side of the first layer 210 facing the substrate 100. The orthographic projection of the first layer 210 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100. The material of the third layer 230 includes a conductive material, and the material of the first layer 210 includes an insulating material. The third layer 230 includes a first sub-portion 231 and a second sub-portion 232. The orthographic projection of the first sub-portion 231 on the substrate 100 is located within the orthographic projection of the first layer 210 on the substrate 100, and the orthographic projection of the second sub-portion 232 on the substrate 100 is located between the first layer 210 and the substrate. Outside the orthographic projection of the board 100, the second division 232 is located on one side of the first division 231 in the first direction X; the light-emitting layer 300 is located on one side of the substrate 100, the light-emitting layer 300 includes a light-emitting unit 310 at least partially located in the isolation opening 240, the light-emitting unit 310 is spaced from the third layer 230, the light-emitting unit 310 includes a first light-emitting unit 311 and a second light-emitting unit 312, the width of the second division 232 corresponding to the first light-emitting unit 311 in the first direction X is a first width D1, the width of the second division 232 corresponding to the second light-emitting unit 312 in the first direction X is a second width D2, and the first width D1 is less than or equal to the second width D2; the first electrode layer 400 is located on the side of the light-emitting layer 300 away from the substrate 100, the first electrode layer 400 includes a first electrode 410 located in the isolation opening 240, and the first electrode 410 is electrically connected to the second division 232.

[0091] According to the display panel 10 of the embodiment of the present application, the display panel 10 includes a substrate 100, an isolation structure 200, a light-emitting layer 300, and a first electrode layer 400. The isolation structure 200 includes a first layer 210 and a second layer 220 located on a side of the first layer 210 facing away from the substrate 100. The first layer 210 and the second layer 220 are stacked to form the isolation structure 200. The orthographic projection of the first layer 210, which is located near the substrate 100, is located within the orthographic projection of the second layer 220 on the substrate 100. The area of the second layer 220 is larger than that of the first layer 210. The second layer 220 covers the surface of the first layer 210 near the second layer 220. At this time, the first layer 210 is recessed relative to the second layer 220 in a direction away from the isolation opening 240. When preparing the light-emitting layer 300, a large drop in height is generated at the edge of the isolation structure 200, and the first layer 210 is recessed relative to the second layer 220. The light-emitting layer 300 is difficult to connect at the edge of the isolation structure 200, resulting in breakage. The light-emitting layer 300 breaks to form mutually disconnected light-emitting units 310, thereby reducing carrier crosstalk within the light-emitting layer 300 and improving the display effect of the display panel 10. Furthermore, the light-emitting units 310 can be prepared without the use of a precision mask, which can reduce the development and use of precision masks and reduce preparation costs. The first electrode 410 is electrically connected to the second section 232 to achieve electrical connection between the first electrode 410 and the isolation structure 200. The material of the first layer 210 includes an insulating material to prevent the light-emitting unit 310 from overlapping with the first layer 210, resulting in electrical connection with the isolation structure 200. Moreover, the light-emitting unit 310 is spaced from the third layer 230, which can avoid electrical connection between the light-emitting unit 310 and the isolation structure 200, resulting in the formation of a leakage path between the anode corresponding to the light-emitting unit 310, the light-emitting unit 310 and the isolation structure 200. At low brightness, part of the current will flow through the leakage path, solving the problem of poor image quality at low brightness, thereby improving the display effect and performance of the display panel 10. During the etching process of the first light-emitting unit 311 prepared in the first step, the second division 232 corresponding to the second light-emitting unit 312 may be partially removed due to etching. Increasing the width of the second division 232 of the second light-emitting unit 312 can reserve more overlapping areas, ensure the reliable connection between the first electrode 410 and the third layer 230, and avoid overlapping failure due to etching.

[0092] See also Figures 1 to 13 , Figure 9 This is a flow chart of a method for manufacturing a display panel provided in an embodiment of the present application; Figures 10 to 13 This is a diagram of the preparation process of a display panel provided in an embodiment of the present application.

[0093] like Figures 1 to 13 As shown, an embodiment of the third aspect of the present application provides a method for manufacturing a display panel 10, comprising:

[0094] Step S01: preparing an isolation structure 200 on a substrate 100, the isolation structure 200 enclosing an isolation opening 240, the isolation structure 200 including a first layer 210, a second layer 220 located on a side of the first layer 210 facing away from the substrate 100, and a third layer 230 located on a side of the first layer 210 facing the substrate 100, the orthographic projection of the first layer 210 on the substrate 100 being within the orthographic projection of the second layer 220 on the substrate 100, and a portion of the orthographic projection of the third layer 230 on the substrate 100 being outside the orthographic projection of the first layer 210 on the substrate 100, the material of the third layer 230 including a conductive material, and the material of the first layer 210 including an insulating material;

[0095] Step S02: Prepare a light-emitting layer 300 and a first electrode layer 400 on the substrate 100, the light-emitting layer 300 includes a light-emitting unit 310 at least partially located in the isolation opening 240, the light-emitting unit 310 is separated from the third layer 230, and the first electrode layer 400 includes a first electrode 410 located in the isolation opening 240, and the first electrode 410 is electrically connected to the third layer 230 on one side in the first direction X.

[0096] According to the method for manufacturing the display panel 10 according to the embodiment of the present application, the isolation structure 200 is prepared through step S01 . The isolation structure 200 includes a first layer 210, a second layer 220 located on the side of the first layer 210 facing away from the substrate 100, and a third layer 230 located on the side of the first layer 210 facing the substrate 100. The orthographic projection of the first layer 210 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100, and the orthographic projection of part of the third layer 230 on the substrate 100 is located outside the orthographic projection of the first layer 210 on the substrate 100. The third layer 230, the first layer 210 and the second layer 220 are stacked to form the isolation structure 200. The orthographic projection of the first layer 210 arranged close to the substrate 100 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100. The area of the second layer 220 is larger than the area of the first layer 210. The second layer 220 covers the surface of the first layer 210 close to the second layer 220. At this time, the first layer 210 is recessed relative to the second layer 220 in a direction away from the isolation opening 240. The light-emitting layer 300 and the first electrode layer 400 are prepared in step S02. When preparing the light-emitting layer 300, a large drop in height is generated at the edge of the isolation structure 200, and the first layer 210 is recessed relative to the second layer 220. The light-emitting layer 300 is difficult to connect at the edge of the isolation structure 200, resulting in breakage. The light-emitting layer 300 breaks to form mutually disconnected light-emitting units 310, thereby reducing carrier crosstalk within the light-emitting layer 300 and improving the display effect of the display panel 10. The light-emitting units 310 can be prepared without the use of a precision mask, which can reduce the development and use of precision masks and reduce preparation costs. The material of the third layer 230 includes a conductive material. A portion of the third layer 230 is protruded relative to the first layer 210 toward the isolation opening 240, so that the first electrode 410 can overlap with the protruding portion of the third layer 230 on one side in the first direction X, thereby achieving electrical connection between the first electrode 410 and the isolation structure 200. The material of the first layer 210 includes an insulating material to prevent the light-emitting unit 310 from overlapping with the first layer 210 and thus being electrically connected to the isolation structure 200. Furthermore, the light-emitting unit 310 is spaced apart from the third layer 230 to prevent the light-emitting unit 310 from being electrically connected to the isolation structure 200, which would otherwise form a leakage path between the anode corresponding to the light-emitting unit 310, the light-emitting unit 310, and the isolation structure 200. At low brightness, some current would flow through this leakage path, thereby reducing the problem of poor low-brightness image quality. This improves the display effect and performance of the display panel 10.

[0097] In some optional embodiments, the step of preparing the isolation structure 200 on the substrate 100 includes:

[0098] A first isolation material layer is prepared on the substrate 100 and patterned to form a third layer 230 ;

[0099] A second isolation material layer and a third isolation material layer are prepared in sequence on the side of the third layer 230 facing away from the substrate 100, and the second isolation material layer and the third isolation material layer are patterned to form a first layer 210 and a second layer 220. The orthographic projection of the first layer 210 on the substrate 100 is located within the orthographic projection of the second layer 220 on the substrate 100, and the orthographic projection of part of the third layer 230 on the substrate 100 is located outside the orthographic projection of the first layer 210 on the substrate 100.

[0100] In these optional embodiments, after preparing the first isolation material layer and patterning the first isolation material layer to form the third layer 230, the first layer 210 and the second layer 220 are prepared. This allows the pattern shape of the third layer 230 and the positional relationship between the third layer 230 and the first layer 210 to be controlled so that the first subsection 231 of the third layer 230 is covered by the first layer 210 and the second subsection 232 is exposed by the isolation opening 240, thereby facilitating overlapping of the first electrode 410 and the second subsection 232.

[0101] In some optional embodiments, the steps of sequentially preparing a second isolation material layer and a third isolation material layer on a side of the third layer 230 facing away from the substrate 100 and patterning the second isolation material layer and the third isolation material layer include:

[0102] performing dry etching on the second isolation material layer and the third isolation material layer to remove portions of the second isolation material layer and the third isolation material layer;

[0103] wet etching the second isolation material layer to remove a portion of the second isolation material layer;

[0104] The second isolation material layer is oxidized to form a first layer 210 .

[0105] In these optional embodiments, after the dry etching and wet etching processes, the second isolation material layer is oxidized to form the first layer 210. The oxidation process causes the surface of the first layer 210, that is, the outer structure 212, to be an insulating material, for example, the outer structure 212 is aluminum oxide. Therefore, the light-emitting unit 310 overlaps the first layer 210 without forming a leakage path, thereby preventing leakage from the light-emitting unit 310 through the first layer 210.

[0106] Optionally, the second isolation material layer is oxidized using a plasma process to form the first layer 210. For example, the second isolation material layer is oxidized using oxygen plasma.

[0107] In some optional embodiments, the isolation opening 240 includes a first isolation opening, and the step of preparing the light-emitting layer 300 and the first electrode layer 400 on the substrate 100 includes:

[0108] A first light-emitting material layer, a first electrode material layer and a first packaging material layer are sequentially prepared on the substrate 100, and the first light-emitting material layer, the first electrode material layer and the first packaging material layer are patterned to form a first light-emitting unit 311, a first sub-electrode and a first packaging portion that are at least partially located within the first isolation opening.

[0109] In these optional embodiments, the first sub-electrode serves as the cathode of the first light-emitting unit 311, driving the first light-emitting unit 311 to emit light, and the first encapsulation unit encapsulates the first light-emitting unit 311 and the first sub-electrode. Patterning the first light-emitting material layer, the first electrode material layer, and the first encapsulation material layer includes dry etching, wet etching, and purging processes.

[0110] In some optional embodiments, in the step of sequentially preparing the first light-emitting material layer, the first electrode material layer, and the first encapsulation material layer on the substrate 100, the method includes:

[0111] Using a first evaporation source to evaporate a first luminescent material toward the other side in the first direction X to form a first luminescent material layer;

[0112] The first electrode material is evaporated toward one side in the first direction X using a second evaporation source to form a first electrode material layer.

[0113] In these optional embodiments, the first light-emitting material and the first electrode material are evaporated toward the other side and one side of the first direction X, respectively, so that the first light-emitting material layer is offset toward the other side of the first direction X, and the first electrode material layer is offset toward one side of the first direction X. The subsequently formed first light-emitting unit 311 can overlap with the first layer 210 of the isolation structure 200 on the other side of the first direction X, and the first sub-electrode can overlap with the third layer 230 of the isolation structure 200 on one side of the first direction X.

[0114] Optionally, the evaporation directions of the first evaporation source and the second evaporation source are located on both sides of a first reference line in the first direction X. The first reference line is perpendicular to the substrate 100, so that the first light-emitting material layer is offset toward the other side in the first direction X, and the first electrode material layer is offset toward one side in the first direction X. The subsequently formed first light-emitting unit 311 can overlap the first layer 210 of the isolation structure 200 on the other side in the first direction X, and the first sub-electrode can overlap the third layer 230 of the isolation structure 200 on one side in the first direction X. The first reference line is for reference only and does not limit the structure.

[0115] In some optional embodiments, the angle between the evaporation direction of the first evaporation source and the first reference line is 5° to 15°. For example, the angle between the evaporation direction of the first evaporation source and the first reference line is 5°, 8°, 12°, or 15°. The evaporation direction of the first evaporation source refers to the direction of the evaporation center axis of the first evaporation source.

[0116] In these optional embodiments, the angle between the evaporation direction of the first evaporation source and the first reference line is greater than or equal to 5°, which can improve the problem that the angle between the evaporation direction of the first evaporation source and the first reference line is too small, resulting in insufficient offset of the first luminescent material layer, and the first light-emitting unit 311 easily overlaps with the second section 232 of the third layer 230, forming a leakage path. The angle between the evaporation direction of the first evaporation source and the first reference line is less than or equal to 15°, which can improve the problem that the angle between the evaporation direction of the first evaporation source and the first reference line is too large, resulting in excessive offset of the first luminescent material layer and a reduction in the effective luminous area of the first light-emitting unit 311.

[0117] In some optional embodiments, the angle between the deposition direction of the second deposition source and the first reference line is 5° to 15°. For example, the angle between the deposition direction of the second deposition source and the first reference line is 5°, 8°, 12°, or 15°. The deposition direction of the second deposition source refers to the direction of the deposition center axis of the second deposition source.

[0118] In these optional embodiments, the angle between the deposition direction of the second evaporation source and the first reference line is greater than or equal to 5°, which can improve the problem that the angle between the deposition direction of the second evaporation source and the first reference line is too small, resulting in insufficient offset of the first electrode material layer and poor overlap between the first sub-electrode and the second portion 232 of the third layer 230. The angle between the deposition direction of the second evaporation source and the first reference line is less than or equal to 15°, which can improve the problem that the angle between the deposition direction of the second evaporation source and the first reference line is too large, resulting in excessive offset of the first electrode material layer and a reduction in the effective light-emitting area of the first light-emitting unit 311.

[0119] In some optional embodiments, the evaporation angle of the first evaporation source is 15° to 25°. For example, the evaporation angle of the first evaporation source is 15°, 18°, 20°, or 25°.

[0120] In these optional embodiments, the evaporation angle of the first evaporation source is greater than or equal to 15°, which can improve the problem that the evaporation angle of the first evaporation source is too small, resulting in low evaporation efficiency and poor evaporation effect of the first luminescent material. The evaporation angle of the first evaporation source is less than or equal to 25°, which can improve the problem that the evaporation angle of the first evaporation source is too large, resulting in a small film thickness of the first luminescent material layer and poor film forming effect.

[0121] In some optional embodiments, the evaporation angle of the second evaporation source is 15° to 25°. For example, the evaporation angle of the second evaporation source is 15°, 18°, 20°, or 25°.

[0122] In these optional embodiments, the evaporation angle of the second evaporation source is greater than or equal to 15°, which can improve the problem that the evaporation angle of the first evaporation source is too small, resulting in low evaporation efficiency and poor evaporation effect of the first electrode material. The evaporation angle of the second evaporation source is less than or equal to 25°, which can improve the problem that the evaporation angle of the second evaporation source is too large, resulting in a small film thickness of the first electrode material layer and poor film formation effect.

[0123] In some optional embodiments, the isolation opening 240 includes a second isolation opening spaced apart from the first isolation opening. After forming the first light-emitting unit 311, the first sub-electrode, and the first encapsulation portion at least partially within the first isolation opening, the following steps are included:

[0124] A second light-emitting material layer, a second electrode material layer and a second packaging material layer are sequentially prepared on the substrate 100, and the second light-emitting material layer, the second electrode material layer and the second packaging material layer are patterned to form a second light-emitting unit 312, a second sub-electrode and a second packaging portion that are at least partially located in the second isolation opening.

[0125] In these optional embodiments, the second sub-electrode serves as the cathode of the second light-emitting unit 312, driving the second light-emitting unit 312 to emit light, and the second encapsulation unit encapsulates the second light-emitting unit 312 and the second sub-electrode. Patterning the second light-emitting material layer, the second electrode material layer, and the second encapsulation material layer includes dry etching, wet etching, and purging processes.

[0126] In some optional embodiments, in the step of sequentially preparing the second light-emitting material layer, the second electrode material layer, and the second encapsulation material layer on the substrate 100, the method includes:

[0127] Using a third evaporation source to evaporate a second luminescent material toward the other side in the first direction X to form a second luminescent material layer;

[0128] The second electrode material is evaporated toward one side in the first direction X using a fourth evaporation source to form a second electrode material layer.

[0129] In these optional embodiments, the second light-emitting material and the second electrode material are evaporated toward the other side and one side of the first direction X, respectively, so that the second light-emitting material layer is offset toward the other side of the first direction X, and the second electrode material layer is offset toward one side of the first direction X. The subsequently formed second light-emitting unit 312 can overlap with the first layer 210 of the isolation structure 200 on the other side of the first direction X, and the second sub-electrode can overlap with the third layer 230 of the isolation structure 200 on one side of the first direction X.

[0130] Optionally, the evaporation directions of the third evaporation source and the fourth evaporation source are located on both sides of a second reference line in the first direction X. The second reference line is perpendicular to the substrate 100, so that the second light-emitting material layer is offset toward the other side in the first direction X, and the second electrode material layer is offset toward one side in the first direction X. The subsequently formed second light-emitting unit 312 can overlap the first layer 210 of the isolation structure 200 on the other side in the first direction X, and the second sub-electrode can overlap the third layer 230 of the isolation structure 200 on one side in the first direction X. The second reference line is for reference only and does not limit the structure.

[0131] In some optional embodiments, the angle between the deposition direction of the third deposition source and the second reference line is 5° to 15°. For example, the angle between the deposition direction of the third deposition source and the second reference line is 5°, 8°, 12°, or 15°. The deposition direction of the third deposition source refers to the direction of the deposition center axis of the third deposition source.

[0132] In these optional embodiments, the angle between the deposition direction of the third evaporation source and the second reference line is greater than or equal to 5°, which can improve the problem that the angle between the deposition direction of the third evaporation source and the second reference line is too small, resulting in insufficient offset of the second luminescent material layer, and the second light-emitting unit 312 easily overlaps with the second section 232 of the third layer 230, forming a leakage path. The angle between the deposition direction of the third evaporation source and the second reference line is less than or equal to 15°, which can improve the problem that the angle between the deposition direction of the third evaporation source and the second reference line is too large, resulting in excessive offset of the second luminescent material layer and a reduction in the effective light-emitting area of the second light-emitting unit 312.

[0133] In some optional embodiments, the angle between the deposition direction of the fourth deposition source and the second reference line is 5° to 15°. For example, the angle between the deposition direction of the fourth deposition source and the first reference line is 5°, 8°, 12°, or 15°. The deposition direction of the fourth deposition source refers to the direction of the deposition center axis of the fourth deposition source.

[0134] In these optional embodiments, the angle between the deposition direction of the fourth evaporation source and the second reference line is greater than or equal to 5°, which can improve the problem that the angle between the deposition direction of the fourth evaporation source and the second reference line is too small, resulting in insufficient offset of the second electrode material layer and poor overlap between the second sub-electrode and the second portion 232 of the third layer 230. The angle between the deposition direction of the fourth evaporation source and the second reference line is less than or equal to 15°, which can improve the problem that the angle between the deposition direction of the fourth evaporation source and the second reference line is too large, resulting in excessive offset of the second electrode material layer and a reduction in the effective light-emitting area of the second light-emitting unit 312.

[0135] In some optional embodiments, the evaporation angle of the third evaporation source is 15° to 25°. For example, the evaporation angle of the third evaporation source is 15°, 18°, 20°, or 25°.

[0136] In these optional embodiments, the evaporation angle of the third evaporation source is greater than or equal to 15°, which can improve the problem that the evaporation angle of the third evaporation source is too small, resulting in low evaporation efficiency and poor evaporation effect of the second luminescent material. The evaporation angle of the third evaporation source is less than or equal to 25°, which can improve the problem that the evaporation angle of the third evaporation source is too large, resulting in a small film thickness of the second luminescent material layer and poor film formation effect.

[0137] In some optional embodiments, the evaporation angle of the fourth evaporation source is 15° to 25°. For example, the evaporation angle of the fourth evaporation source is 15°, 18°, 20°, or 25°.

[0138] In these optional embodiments, the evaporation angle of the fourth evaporation source is greater than or equal to 15°, which can improve the problem that the evaporation angle of the fourth evaporation source is too small, resulting in low evaporation efficiency and poor evaporation effect of the second electrode material. The evaporation angle of the fourth evaporation source is less than or equal to 25°, which can improve the problem that the evaporation angle of the fourth evaporation source is too large, resulting in a small film thickness of the second electrode material layer and poor film formation effect.

[0139] In some optional embodiments, the isolation opening 240 includes a third isolation opening spaced apart from the first isolation opening and the second isolation opening. After forming the second light-emitting unit 312, the second sub-electrode, and the second encapsulation portion at least partially within the second isolation opening, the following steps are included:

[0140] A third light-emitting material layer, a third electrode material layer and a third packaging material layer are prepared in sequence on the substrate 100, and the third light-emitting material layer, the third electrode material layer and the third packaging material layer are patterned to form a third light-emitting unit 313, a third sub-electrode and a third packaging part that are at least partially located in the third isolation opening.

[0141] In these optional embodiments, the third sub-electrode serves as the cathode of the third light-emitting unit 313, driving the emission of the third light-emitting unit 313. The third encapsulation unit encapsulates the third light-emitting unit 313 and the third sub-electrode. Patterning the third light-emitting material layer, the third electrode material layer, and the third encapsulation material layer includes dry etching, wet etching, and purging processes.

[0142] In some optional embodiments, in the step of sequentially preparing a third light-emitting material layer, a third electrode material layer, and a third encapsulation material layer on the substrate 100, the method includes:

[0143] Using a fifth evaporation source to evaporate a third luminescent material toward the other side in the first direction X to form a third luminescent material layer;

[0144] A sixth evaporation source is used to evaporate the third electrode material toward one side in the first direction X to form a third electrode material layer.

[0145] In these optional embodiments, the third light-emitting material and the third electrode material are evaporated toward the other side and one side of the first direction X, respectively, so that the third light-emitting material layer is offset toward the other side of the first direction X, and the third electrode material layer is offset toward one side of the first direction X. The subsequently formed third light-emitting unit 313 can overlap with the first layer 210 of the isolation structure 200 on the other side of the first direction X, and the third sub-electrode can overlap with the third layer 230 of the isolation structure 200 on one side of the first direction X.

[0146] Optionally, the evaporation directions of the fifth evaporation source and the sixth evaporation source are located on both sides of a third reference line in the first direction X. The third reference line is perpendicular to the substrate 100, so that the third light-emitting material layer is offset toward the other side in the first direction X, and the third electrode material layer is offset toward one side in the first direction X. The subsequently formed third light-emitting unit 313 can overlap the first layer 210 of the isolation structure 200 on the other side in the first direction X, and the third sub-electrode can overlap the third layer 230 of the isolation structure 200 on one side in the first direction X. The third reference line is for reference only and does not limit the structure.

[0147] In some optional embodiments, the angle between the deposition direction of the fifth deposition source and the third reference line is 5° to 15°. For example, the angle between the deposition direction of the fifth deposition source and the third reference line is 5°, 8°, 12°, or 15°. The deposition direction of the fifth deposition source refers to the direction of the deposition center axis of the fifth deposition source.

[0148] In these optional embodiments, the angle between the deposition direction of the fifth evaporation source and the third reference line is greater than or equal to 5°, which can improve the problem that the angle between the deposition direction of the fifth evaporation source and the third reference line is too small, resulting in insufficient offset of the third luminescent material layer, and the third light-emitting unit 313 easily overlaps with the second section 232 of the third layer 230, forming a leakage path. The angle between the deposition direction of the fifth evaporation source and the third reference line is less than or equal to 15°, which can improve the problem that the angle between the deposition direction of the fifth evaporation source and the third reference line is too large, resulting in excessive offset of the third luminescent material layer and a reduction in the effective light-emitting area of the third light-emitting unit 313.

[0149] In some optional embodiments, the angle between the deposition direction of the sixth deposition source and the third reference line is 5° to 15°. For example, the angle between the deposition direction of the sixth deposition source and the third reference line is 5°, 8°, 12°, or 15°. The deposition direction of the sixth deposition source refers to the direction of the deposition center axis of the sixth deposition source.

[0150] In these optional embodiments, the angle between the deposition direction of the sixth evaporation source and the third reference line is greater than or equal to 5°, which can improve the problem that the angle between the deposition direction of the sixth evaporation source and the third reference line is too small, resulting in insufficient offset of the third electrode material layer and poor overlap between the third sub-electrode and the second section 232 of the third layer 230. The angle between the deposition direction of the sixth evaporation source and the third reference line is less than or equal to 15°, which can improve the problem that the angle between the deposition direction of the sixth evaporation source and the third reference line is too large, resulting in excessive offset of the third electrode material layer and a reduction in the effective light-emitting area of the third light-emitting unit 313.

[0151] In some optional embodiments, the evaporation angle of the fifth evaporation source is 15° to 25°. For example, the evaporation angle of the fifth evaporation source is 15°, 18°, 20°, or 25°.

[0152] In these optional embodiments, the evaporation angle of the fifth evaporation source is greater than or equal to 15°, which can improve the problem that the evaporation angle of the fifth evaporation source is too small, resulting in low evaporation efficiency and poor evaporation effect of the third luminescent material. The evaporation angle of the fifth evaporation source is less than or equal to 25°, which can improve the problem that the evaporation angle of the fifth evaporation source is too large, resulting in a small film thickness of the third luminescent material layer and poor film formation effect.

[0153] In some optional embodiments, the evaporation angle of the sixth evaporation source is 15° to 25°. For example, the evaporation angle of the sixth evaporation source is 15°, 18°, 20°, or 25°.

[0154] In these optional embodiments, the evaporation angle of the sixth evaporation source is greater than or equal to 15°, which can improve the problem that the evaporation angle of the sixth evaporation source is too small, resulting in low evaporation efficiency and poor evaporation effect of the third electrode material. The evaporation angle of the sixth evaporation source is less than or equal to 25°, which can improve the problem that the evaporation angle of the sixth evaporation source is too large, resulting in a small film thickness of the third electrode material layer and poor film formation effect.

[0155] Optionally, the second evaporation source, the fourth evaporation source and the sixth evaporation source are the same evaporation source.

[0156] The structural design in this embodiment can be applied to other display panels 10 , and the specific selection can be made based on actual conditions. This application does not impose any specific restrictions on it.

[0157] The embodiments of the fourth aspect of the present application further provide a display device, comprising the display panel 10 of any of the above-mentioned embodiments and the display panel 10 produced by the method for producing the display panel 10 of any of the above-mentioned embodiments. Since the display device provided by the embodiments of the third aspect of the present application comprises the display panel 10 of any of the above-mentioned embodiments and the display panel 10 produced by the method for producing the display panel 10 of any of the above-mentioned embodiments, the display device provided by the embodiments of the third aspect of the present application has the beneficial effects of the display panel 10 of any of the above-mentioned embodiments and the display panel 10 produced by the method for producing the display panel 10 of any of the above-mentioned embodiments, and no further details will be given here.

[0158] The display device in the embodiments of the present application includes but is not limited to mobile phones, personal digital assistants (PDAs), tablet computers, e-books, televisions, access control systems, smart landline phones, consoles, and other devices with display functions.

[0159] While the embodiments described above are not exhaustive, they do not limit the invention to the specific embodiments described. Clearly, numerous modifications and variations are possible based on the above description. These embodiments are selected and described in detail in this specification to better explain the principles and practical applications of the present invention, thereby enabling those skilled in the art to better utilize the present invention and its modifications. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A display panel, characterized in that: The display panel includes: substrate; an isolation structure located on one side of the substrate, the isolation structure enclosing an isolation opening, the isolation structure comprising a first layer, a second layer located on a side of the first layer facing away from the substrate, and a third layer located on a side of the first layer facing the substrate, the orthographic projection of the first layer on the substrate being within the orthographic projection of the second layer on the substrate, a portion of the orthographic projection of the third layer on the substrate being outside the orthographic projection of the first layer on the substrate, the third layer comprising a conductive material, and the first layer comprising an insulating material; a light-emitting layer located on one side of the substrate, the light-emitting layer comprising a light-emitting unit at least partially located in the isolation opening, the light-emitting unit being spaced apart from the third layer; The first electrode layer is located on a side of the light-emitting layer away from the substrate. The first electrode layer includes a first electrode located in the isolation opening. One side of the first electrode in the first direction is electrically connected to the third layer.

2. The display panel according to claim 1, wherein: The plurality of first electrodes are electrically connected to the third layer on the same side in the first direction.

3. The display panel according to claim 1, wherein The third layer includes a first sub-portion and a second sub-portion, wherein the orthographic projection of the first sub-portion on the substrate is located within the orthographic projection of the first layer on the substrate, and the orthographic projection of the second sub-portion on the substrate is located outside the orthographic projection of the first layer on the substrate, and the first electrode is electrically connected to the second sub-portion; Preferably, the light emitting unit is spaced apart from both the first subsection and the second subsection; Preferably, a side wall of the first layer facing the isolation opening is spaced apart from a side wall of the first portion facing the isolation opening.

4. The display panel according to claim 3, wherein: The second subsection is located on one side of the first subsection in the first direction; Preferably, in the same isolation opening, the light emitting unit is provided with the second sub-portion on one side in the first direction; Preferably, in each of the third layers, the second sub-portion is located on the same side of the first sub-portion in the first direction.

5. The display panel according to claim 3, wherein: The light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the width of the second subsection corresponding to the first light-emitting unit in the first direction is a first width, the width of the second subsection corresponding to the second light-emitting unit in the first direction is a second width, and the first width is less than or equal to the second width; Preferably, the light-emitting unit further includes a third light-emitting unit, the width of the second subsection corresponding to the third light-emitting unit in the first direction is a third width, and the second width is less than or equal to the third width; Preferably, the first light emitting unit, the second light emitting unit and the third light emitting unit emit different colors.

6. The display panel according to claim 1, wherein: One side of the light emitting unit in the first direction is spaced from the third layer, and the other side in the first direction is overlapped with the first layer.

7. The display panel according to claim 1, wherein: The first layer includes an inner structure and an outer structure located on the inner structure facing the isolation opening, wherein the material of the outer structure includes an insulating material; Preferably, the material of the internal structure includes a conductive material; Preferably, the material of the internal structure includes aluminum, and the material of the external structure includes aluminum oxide.

8. The display panel according to claim 1, wherein: The first electrode has a first end and a second end opposite to each other in the first direction, the first end contacts the isolation structure, the second end is spaced apart from the isolation structure, the first end is spaced apart from the substrate by a first distance, the second end is spaced apart from the substrate by a second distance, and the first distance is greater than or equal to the second distance; Preferably, the orthographic projection of the first end on the substrate is located outside the orthographic projection of the light emitting unit on the substrate; Preferably, the orthographic projection of the second end on the substrate is located within the orthographic projection of the light emitting unit on the substrate.

9. The display panel according to claim 1, wherein: The light-emitting unit includes a first light-emitting unit, a second light-emitting unit and a third light-emitting unit, wherein a plurality of the first light-emitting units are arranged in the second direction to form a first pixel column, a plurality of the second light-emitting units are arranged in the second direction to form a second pixel column, and a plurality of the third light-emitting units are arranged in the second direction to form a third pixel column. The first pixel column, the second pixel column and the third pixel column are alternately arranged in the first direction, and the first direction and the second direction intersect.

10. The display panel according to claim 1, wherein The display panel further includes: a pixel definition layer located on one side of the substrate, the pixel definition layer comprising a pixel defining portion and a pixel opening formed by the pixel defining portion, the pixel opening being in communication with the isolation opening; Preferably, the display panel further includes a second electrode located between the substrate and the light-emitting unit, and at least a portion of the second electrode is exposed by the pixel opening.

11. A display panel, characterized in that: The display panel includes: substrate; an isolation structure located on one side of the substrate, the isolation structure enclosing an isolation opening, the isolation structure comprising a first layer, a second layer located on a side of the first layer facing away from the substrate, and a third layer located on a side of the first layer facing the substrate, the orthographic projection of the first layer on the substrate being located within the orthographic projection of the second layer on the substrate, the material of the third layer comprising a conductive material, the material of the first layer comprising an insulating material, the third layer comprising a first subsection and a second subsection, the orthographic projection of the first subsection on the substrate being located within the orthographic projection of the first layer on the substrate, the orthographic projection of the second subsection on the substrate being located outside the orthographic projection of the first layer on the substrate, and the second subsection being located to one side of the first subsection in the first direction; a light-emitting layer located on one side of the substrate, the light-emitting layer including a light-emitting unit at least partially located in the isolation opening, the light-emitting unit being spaced apart from the third layer, the light-emitting unit including a first light-emitting unit and a second light-emitting unit, the second subsection corresponding to the first light-emitting unit having a first width in the first direction, the second subsection corresponding to the second light-emitting unit having a second width in the first direction, and the first width being less than or equal to the second width; The first electrode layer is located on a side of the light-emitting layer away from the substrate. The first electrode layer includes a first electrode located in the isolation opening. The first electrode is electrically connected to the second portion.

12. A method for preparing a display panel, characterized in that: include: An isolation structure is prepared on a substrate, the isolation structure enclosing an isolation opening, the isolation structure comprising a first layer, a second layer located on a side of the first layer facing away from the substrate, and a third layer located on a side of the first layer facing the substrate, the orthographic projection of the first layer on the substrate being within the orthographic projection of the second layer on the substrate, and a portion of the orthographic projection of the third layer on the substrate being outside the orthographic projection of the first layer on the substrate, the third layer comprising a conductive material, and the first layer comprising an insulating material; A light-emitting layer and a first electrode layer are prepared on the substrate, wherein the light-emitting layer includes a light-emitting unit at least partially located in the isolation opening, and the light-emitting unit is spaced from the third layer. The first electrode layer includes a first electrode located in the isolation opening, and one side of the first electrode in the first direction is electrically connected to the third layer.

13. The preparation method according to claim 12, characterized in that The steps of preparing an isolation structure on a substrate include: preparing a first isolation material layer on the substrate, and patterning the first isolation material layer to form a third layer; A second isolation material layer and a third isolation material layer are sequentially prepared on a side of the third layer facing away from the substrate, and the second isolation material layer and the third isolation material layer are patterned to form a first layer and a second layer, wherein the orthographic projection of the first layer on the substrate is located within the orthographic projection of the second layer on the substrate, and the orthographic projection of a portion of the third layer on the substrate is located outside the orthographic projection of the first layer on the substrate; Preferably, the steps of sequentially preparing a second isolation material layer and a third isolation material layer on a side of the third layer facing away from the substrate, and patterning the second isolation material layer and the third isolation material layer include: performing dry etching on the second isolation material layer and the third isolation material layer to remove a portion of the second isolation material layer and the third isolation material layer; performing wet etching on the second isolation material layer to remove a portion of the second isolation material layer; performing an oxidation treatment on the second isolation material layer to form a first layer; Preferably, the second isolation material layer is oxidized by a plasma process to form the first layer.

14. The preparation method according to claim 12, characterized in that The isolation opening includes a first isolation opening, and the step of preparing the light-emitting layer and the first electrode layer on the substrate includes: A first light-emitting material layer, a first electrode material layer and a first packaging material layer are prepared in sequence on the substrate, and the first light-emitting material layer, the first electrode material layer and the first packaging material layer are patterned to form a first light-emitting unit, a first sub-electrode and a first packaging portion that are at least partially located within the first isolation opening.

15. The preparation method according to claim 14, characterized in that In the step of sequentially preparing a first light-emitting material layer, a first electrode material layer, and a first encapsulation material layer on the substrate, the method includes: Using a first evaporation source to evaporate a first luminescent material toward the other side in the first direction to form a first luminescent material layer; using a second evaporation source to evaporate a first electrode material toward one side in the first direction to form a first electrode material layer; Preferably, the evaporation direction of the first evaporation source and the evaporation direction of the second evaporation source are located on both sides of a first reference line in the first direction, and the first reference line is perpendicular to the substrate; Preferably, the angle between the evaporation direction of the first evaporation source and the first reference line is 5° to 15°; Preferably, the angle between the evaporation direction of the second evaporation source and the first reference line is 5° to 15°; Preferably, the evaporation angle of the first evaporation source is 15° to 25°; Preferably, the evaporation angle of the second evaporation source is 15° to 25°.

16. The preparation method according to claim 14, characterized in that The isolation opening includes a second isolation opening spaced apart from the first isolation opening, and after forming a first light-emitting unit, a first sub-electrode, and a first encapsulation portion that are at least partially located within the first isolation opening, the method includes: A second light-emitting material layer, a second electrode material layer and a second packaging material layer are sequentially prepared on the substrate, and the second light-emitting material layer, the second electrode material layer and the second packaging material layer are patterned to form a second light-emitting unit, a second sub-electrode and a second packaging portion that are at least partially located within the second isolation opening.

17. The preparation method according to claim 16, characterized in that In the step of sequentially preparing a second light-emitting material layer, a second electrode material layer, and a second encapsulation material layer on the substrate, the method includes: Using a third evaporation source to evaporate a second luminescent material toward the other side in the first direction to form a second luminescent material layer; using a fourth evaporation source to evaporate a second electrode material toward one side in the first direction to form a second electrode material layer; Preferably, the evaporation direction of the third evaporation source and the evaporation direction of the fourth evaporation source are located on both sides of a second reference line in the first direction, and the second reference line is perpendicular to the substrate; Preferably, the angle between the evaporation direction of the third evaporation source and the second reference line is 5° to 15°; Preferably, the angle between the evaporation direction of the fourth evaporation source and the second reference line is 5° to 15°; Preferably, the evaporation angle of the third evaporation source is 15° to 25°; Preferably, the evaporation angle of the fourth evaporation source is 15° to 25°.

18. The preparation method according to claim 16, characterized in that The isolation opening includes a third isolation opening spaced apart from the first isolation opening and the second isolation opening, and after forming a second light-emitting unit, a second sub-electrode, and a second encapsulation portion at least partially located within the second isolation opening, the method includes: A third light-emitting material layer, a third electrode material layer and a third packaging material layer are prepared in sequence on the substrate, and the third light-emitting material layer, the third electrode material layer and the third packaging material layer are patterned to form a third light-emitting unit, a third sub-electrode and a third packaging part that are at least partially located within the third isolation opening.

19. The preparation method according to claim 18, characterized in that In the step of sequentially preparing a third light-emitting material layer, a third electrode material layer, and a third encapsulation material layer on the substrate, the method includes: using a fifth evaporation source to evaporate a third luminescent material toward the other side in the first direction to form a third luminescent material layer; using a sixth evaporation source to evaporate a third electrode material toward one side in the first direction to form a third electrode material layer; Preferably, the evaporation direction of the fifth evaporation source and the evaporation direction of the sixth evaporation source are located on both sides of a third reference line in the first direction, and the third reference line is perpendicular to the substrate; Preferably, the angle between the evaporation direction of the fifth evaporation source and the third reference line is 5° to 15°; Preferably, the angle between the evaporation direction of the sixth evaporation source and the third reference line is 5° to 15°; Preferably, the evaporation angle of the fifth evaporation source is 15° to 25°; Preferably, the evaporation angle of the sixth evaporation source is 15° to 25°.

20. A display device, characterized in that: A display panel comprising the display panel according to any one of claims 1 to 11 or a display panel prepared by the method for preparing a display panel according to any one of claims 12 to 19.

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