A chemical vapor deposition apparatus and method for processing semiconductor silicon carbide coatings.

Abstract

This invention relates to the field of deposition apparatus technology, and in particular to a chemical vapor deposition apparatus and method for processing semiconductor silicon carbide coatings. The apparatus includes an operating table, inside which is a reaction tank for processing materials. A sealing cap is provided on the top of the reaction tank to seal it. Several sprayers for processing materials are also located inside the reaction tank. A flipping mechanism is provided inside the reaction tank to rotate or protect the sprayers. A translation mechanism for moving the sprayers is also provided between the sealing cap and the flipping mechanism. This invention, through the cooperation of the flipping mechanism, adjusting mechanism, electro-hydraulic rod, fixing rod, and sealing cap, reduces the risk of collision or scratching between materials and sprayers, thereby effectively protecting the safety of personnel and materials and avoiding damage caused by accidental contact. Simultaneously, it ensures that the exhaust pipes of the sprayers remain clean, extending the service life of the equipment.

Description

Technical Field

[0001] This invention relates to the field of deposition apparatus technology, and in particular to a chemical vapor deposition apparatus and method for processing semiconductor silicon carbide coatings. Background Technology

[0002] Silicon carbide is an important wide-bandgap semiconductor material with many excellent properties and is widely used in the semiconductor field. When processing silicon carbide, chemical vapor deposition equipment is generally used. Chemical vapor deposition equipment is an analytical instrument used in the field of statistics. It is a new technology that uses physical and chemical processes that occur in the gas phase to change the surface composition of the workpiece and form a metal or compound coating with special properties on the surface.

[0003] In existing chemical vapor deposition (CVD) equipment, the sprayer's outlet pipe is generally positioned above the material. To ensure the quality of the coating on the material surface, the distance between the sprayer and the material is usually shortened. However, when handling the material, the worker's limbs or the processed material may accidentally come into contact with the sprayer, which can easily damage the processed material and contaminate the sprayer's outlet pipe. Therefore, we propose a chemical vapor deposition apparatus and method for processing semiconductor silicon carbide coatings. Summary of the Invention

[0004] To overcome the shortcomings of the prior art, the present invention provides a chemical vapor deposition apparatus and method for processing semiconductor silicon carbide coatings.

[0005] To solve the above-mentioned technical problems, the present invention provides the following technical solution:

[0006] A chemical vapor deposition apparatus for processing silicon carbide coatings for semiconductors includes an operating table. Inside the operating table is a reaction vessel for processing materials. A sealing cap is provided on the top of the reaction vessel to seal it. Inside the reaction vessel are several sprayers for processing the materials. Inside the reaction vessel is a tilting mechanism that drives the sprayers to tilt or protect them. The tilting mechanism can move the sprayers to the front of the materials during processing and to store them when the materials are being picked up or put away. Between the sealing cap and the tilting mechanism is a translation mechanism that moves the sprayers to the side of the materials during picking up or putting away.

[0007] As a preferred embodiment of the present invention, the flipping mechanism includes an electro-hydraulic rod and a support plate disposed inside the reaction tank. The electro-hydraulic rod is fixed to the bottom of the inner wall of the reaction tank, and the support plate is fixed to the middle of the inner wall of the reaction tank. A storage plate for storing materials is disposed outside the output shaft of the electro-hydraulic rod, and a fixing rod is also fixed to the outer wall of the output shaft of the electro-hydraulic rod. A positioning ring is disposed between the storage plate and the reaction tank, and an adjustment mechanism is disposed between the positioning ring and the sprayer. The number of adjustment mechanisms is equal to the number of sprayers, and the number of sprayers is at least two. The output shaft of the electro-hydraulic rod passes through the support plate and is connected to the storage plate. The end of the fixing rod away from the electro-hydraulic rod is fixed to the bottom of the sealing cover. The output shaft of the electro-hydraulic rod drives the fixing rod to move upward, the fixing rod drives the sealing cover to move upward, and the sealing cover drives the adjustment mechanism to flip the sprayer upward, so that the air outlet pipe of the sprayer rotates to the side closer to the sealing cover, thereby preventing people from contacting the air outlet pipe of the sprayer when storing materials and contaminating the air outlet pipe of the sprayer.

[0008] In a preferred embodiment of the present invention, the adjusting mechanism includes a height plate mounted on a positioning ring. A top plate is fixed to the end of the height plate away from the electro-hydraulic rod. A guide plate is positioned below the top plate. A lifting rod is positioned between the top plate and the guide plate. A guide post is fixed to the side of the guide plate away from the lifting rod, and a groove is formed in the middle of the guide plate. The end of the lifting rod away from the top plate is fixed to a sprayer. A through hole adapted to the lifting rod is formed in the middle of the top plate. The air outlet pipe of the sprayer is located at the end of the sprayer away from the guide post. A limiting groove adapted to the guide post is formed on the side of the sprayer near the guide plate. The side of the guide post away from the guide plate is inserted into the limiting groove. The lifting rod is L-shaped, and the groove is C-shaped. Both ends of the chute are provided with slots, which are connected to the chute. The end of the lifting rod away from the top plate is inserted into the slot, and the end of the lifting rod away from the top plate passes through the slot and is fixed to the sprayer. The top of the lifting rod passes through the through hole and is fixed to the bottom of the sealing cover. When the sealing cover moves upward, the sealing cover drives the lifting rod to move upward, so that the lifting rod moves along the inside of the slot. The lifting rod drives the sprayer to move upward. When the lifting rod moves to the chute and continues to move upward, the lifting rod and the chute cooperate to drive the sprayer to rotate counterclockwise around the axis of the guide column, so that the end of the sprayer with the air outlet pipe rotates from the bottom of the guide plate to the top of the guide plate, and moves the end of the sprayer with the air outlet pipe away from the material.

[0009] As a preferred embodiment of the present invention, a connecting rod is rotatably installed at the end of the top plate away from the height plate. The bottom of the connecting rod is fixed to the top of the guide plate, and a protective frame is fixed at the end of the top plate away from the height plate. A protective cavity is opened on the side of the protective frame near the guide plate. When the sprayer rotates counterclockwise, the end of the sprayer with the discharge port rotates into the interior of the protective cavity, and the discharge port of the sprayer is protected by the protective cavity.

[0010] As a preferred embodiment of the present invention, the storage plate has several material trays in the middle for storing materials. Each material tray has a push rod fixed to its bottom. The end of the push rod away from the material tray is fixed to the output shaft of an electric hydraulic rod. The storage plate has several positioning grooves that fit the material trays. A wedge block is fixed to the outer wall of the material tray. The inner wall of the positioning groove has a wedge groove that fits the wedge block. The output shaft of the electric hydraulic rod drives the push rod to move upward, which in turn drives the material tray to move upward, reducing the distance between the material tray and the top of the reaction vessel. This facilitates the loading and unloading of materials. The wedge block and the wedge groove cooperate to limit the movement of the material tray, preventing it from shaking during lifting and lowering.

[0011] As a preferred embodiment of the present invention, the translation mechanism includes a threaded rod rotatably installed in the sealing cover, a nut screwed to the bottom of the threaded rod, a diagonal rod hinged between the nut and the lifting rod, an extension frame fixed to the outer wall of the positioning ring, a moving groove adapted to the height plate being opened at the top of the extension frame, the number of extension frames being equal to the number of sprayers, the bottom of the threaded rod penetrating the sealing cover and screwed to the nut, and a baffle fixed to the bottom of the threaded rod, the bottom of the nut contacting the top of the baffle.

[0012] As a preferred embodiment of the present invention, a collar is provided on the outside of the nut, a locking rod is provided between the nut and the sealing cover, a sliding column is fixed on the top of the lifting rod, a groove is provided at the bottom of the sealing cover to facilitate the movement of the sliding column, an arc-shaped limiting block is fixed on the top of the height plate, the number of the limiting blocks is equal to the number of sprayers, and several limiting blocks are connected end to end to form a ring, the locking rod is set as Z-shaped, the two ends of the inclined rod are respectively hinged to the sliding column and the nut, the nut is provided with an installation groove that matches the locking rod, rotating the threaded rod, the locking rod limits the nut, through the cooperation of the threaded rod and the nut, the nut moves vertically up and down along the outer wall of the threaded rod, the nut drives the inclined rod to move, the inclined rod pushes the sliding column to move along the inner wall of the groove, the sliding column drives the lifting rod to move through the lifting rod, the lifting rod drives the height plate to move through the top plate, so that the height plate moves along the moving groove to the side away from the positioning ring, the lifting rod drives the sprayer to the side away from the positioning ring, so that the sprayer moves to the oblique upper part of the material tray.

[0013] A method of using a chemical vapor deposition apparatus for processing semiconductor silicon carbide coatings includes the following steps:

[0014] S1. Open the sealing cover, put the material to be processed into the inside of the reaction vessel, and then place the material on the loading tray;

[0015] S2. Rotate the threaded rod, which, in conjunction with the nut, drives the inclined rod to move. The inclined rod then drives the adjustment mechanism to move, and the adjustment mechanism moves the sprayer to directly above the material tray.

[0016] S3. When the sealing cover is closed, the electro-hydraulic rod enters the interior of the storage plate through the push rod. At the same time, the electro-hydraulic rod drives the adjustment mechanism to rotate the sprayer, so that the end of the sprayer with the air outlet pipe rotates to the bottom of the guide plate.

[0017] S4. The sprayer is controlled via the control panel to process the material inside the material tray.

[0018] Compared with the prior art, the beneficial effects that this invention can achieve are:

[0019] This invention, through the cooperation of a flipping mechanism, an adjusting mechanism, an electro-hydraulic rod, a fixing rod, and a sealing cover, rotates the air outlet pipe of the sprayer to the side closer to the sealing cover. This effectively reduces the risk of material colliding or scratching with the sprayer, thereby protecting the safety of personnel and materials and avoiding damage caused by accidental contact. At the same time, it also ensures that the air outlet pipe of the sprayer is always kept clean, preventing contamination or damage during material storage, thus extending the service life of the equipment and improving work efficiency.

[0020] This invention, through the cooperation of a translation mechanism, a diagonal bar, a lifting bar, and a sliding column, moves the sprayer to an angle above the material, ensuring that neither the sprayer nor the protective frame obstructs the material, thus providing ample space for workers, greatly facilitating the storage and operation of materials, and also providing convenience for the daily maintenance of the sprayer. This effectively improves the efficiency and convenience of equipment maintenance, reduces maintenance costs, and ensures the efficient operation of the spraying work.

[0021] This invention protects the sprayer through a protective cavity in the protective frame, effectively blocking external debris and preventing it from entering the sprayer's air outlet pipe. Even during frequent material loading and unloading, the air outlet pipe remains clean and unobstructed, thereby improving the reliability and service life of the equipment and reducing maintenance costs caused by debris entering the equipment.

[0022] This invention reduces the distance between the material tray and the top of the reaction vessel by using a combination of a storage plate, a loading tray, and an electro-hydraulic rod, providing operators with more convenient close-range observation conditions, allowing the processed materials to be carefully inspected, thereby ensuring precise control of material quality.

[0023] This invention uses a wedge block and a wedge groove to limit the movement of the material tray, preventing it from shaking during lifting and lowering, ensuring stable and reliable operation, and thus improving the operating accuracy and safety of the equipment.

[0024] This invention uses a Z-shaped locking rod to limit the nut, preventing excessive movement of the nut and thus avoiding dead points in the linkage mechanism consisting of the sliding column, diagonal rod, and nut. This ensures stable and flexible normal operation, guaranteeing the reliability and efficiency of the equipment. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0026] Figure 2 This is a schematic diagram of the sealing cap of the present invention;

[0027] Figure 3 This is a schematic cross-sectional view of the reaction vessel of the present invention;

[0028] Figure 4 This is a schematic diagram of the flipping mechanism of the present invention;

[0029] Figure 5 This is a schematic diagram of the structure of the fixing rod of the present invention;

[0030] Figure 6 This is a schematic diagram of the structure of the guide plate of the present invention;

[0031] Figure 7 This is a schematic diagram of the top plate of the present invention;

[0032] Figure 8 This is a schematic diagram of the connecting rod of the present invention;

[0033] Figure 9 This is a schematic diagram of the structure of the guide post of the present invention;

[0034] Figure 10 This is a schematic diagram of the height plate of the present invention;

[0035] Figure 11 This is a schematic diagram of the translation mechanism of the present invention;

[0036] Figure 12 For the present invention Figure 3 A magnified schematic diagram of the local structure at point A;

[0037] Figure 13 This is a schematic diagram of the positioning ring of the present invention;

[0038] Figure 14 This is a schematic diagram of the structure of the nut of the present invention;

[0039] Figure 15 This is a schematic diagram of the material storage plate of the present invention.

[0040] The components include: 1. Operating platform; 2. Sealing cover; 3. Reaction tank; 4. Tilting mechanism; 5. Translation mechanism; 6. Sprayer; 401. Electro-hydraulic rod; 402. Bearing plate; 403. Positioning ring; 404. Fixing rod; 405. Height plate; 406. Diagonal rod; 407. Top plate; 408. Protective frame; 409. Guide plate; 410. Lifting rod; 411. Sliding column; 412. Connecting rod; 413. Guide column; 414. Push rod; 415. Storage plate; 416. Material tray; 417. Extension frame; 501. Threaded rod; 502. Collar; 503. Nut; 504. Clamping rod. Detailed Implementation

[0041] To make the technical means, creative features, and achieved objectives and effects of this invention easier to understand, the invention is further described below with reference to specific embodiments. However, the following embodiments are merely preferred embodiments of this invention and not all of them. Other embodiments obtained by those skilled in the art based on the embodiments described herein without creative effort are all within the protection scope of this invention. Unless otherwise specified, the experimental methods in the following embodiments are conventional methods, and the materials and reagents used in the following embodiments are commercially available unless otherwise specified.

[0042] Example: The present invention provides, as follows Figure 1 , Figure 2 and Figure 3 The apparatus and method for chemical vapor deposition of semiconductor silicon carbide coatings shown include an operating table 1, a reaction tank 3 for processing materials is provided inside the operating table 1, a sealing cover 2 is provided on the top of the reaction tank 3 to seal it, and a plurality of sprayers 6 for processing materials are also provided inside the reaction tank 3.

[0043] As can be seen from the above, when in use, open the sealing cover 2, put the material to be processed into the inside of the reaction tank 3, close the sealing cover 2, and control the sprayer 6 through the operating table 1 to process the material inside the reaction tank 3.

[0044] refer to Figure 3 , Figure 4 and Figure 5As shown, the reaction tank 3 is equipped with a tilting mechanism 4 that drives the sprayer 6 to tilt or protect it. The tilting mechanism 4 includes an electric hydraulic rod 401 and a support plate 402 installed inside the reaction tank 3. The electric hydraulic rod 401 is fixed to the bottom of the inner wall of the reaction tank 3, and the support plate 402 is fixed to the middle of the inner wall of the reaction tank 3. A storage plate 415 for storing materials is installed outside the output shaft of the electric hydraulic rod 401, and a fixing rod 404 is also fixed to the outer wall of the output shaft of the electric hydraulic rod 401. A positioning ring 403 is installed between the storage plate 415 and the reaction tank 3, and an adjustment mechanism is installed between the positioning ring 403 and the sprayer 6. (See reference) Figure 5 , Figure 6 and Figure 7 As shown, the adjustment mechanism includes a height plate 405 mounted on a positioning ring 403. A top plate 407 is fixed to the end of the height plate 405 away from the electro-hydraulic rod 401. A guide plate 409 is located below the top plate 407. A lifting rod 410 is positioned between the top plate 407 and the guide plate 409. (Refer to...) Figure 8 and Figure 9 As shown, a guide post 413 is fixed on the side of the guide plate 409 away from the lifting rod 410, and a sliding groove is provided in the middle of the guide plate 409. The end of the lifting rod 410 away from the top plate 407 is fixed to the sprayer 6.

[0045] The flipping mechanism 4 can drive the sprayer 6 to move to the front of the material during material processing and store the sprayer 6 when picking up or putting down the material. The number of adjusting mechanisms is equal to the number of sprayers 6, and the number of sprayers 6 is at least two. The output shaft of the electric hydraulic rod 401 passes through the bearing plate 402 and is connected to the storage plate 415. The end of the fixing rod 404 away from the electric hydraulic rod 401 is fixed to the bottom of the sealing cover 2. The output shaft of the electric hydraulic rod 401 drives the fixing rod 404 to move upward. The fixing rod 404 drives the sealing cover 2 to move upward. The sealing cover 2 drives the adjusting mechanism to flip the sprayer 6 upward, so that the air outlet pipe of the sprayer 6 rotates to the side close to the sealing cover 2, thereby preventing people from contacting the air outlet pipe of the sprayer 6 when storing materials and contaminating the air outlet pipe of the sprayer 6.

[0046] The top plate 407 has a through hole in the middle that matches the lifting rod 410. The air outlet pipe of the sprayer 6 is located at the end of the sprayer 6 away from the guide post 413. A limiting groove matching the guide post 413 is opened on the side of the sprayer 6 near the guide plate 409. The side of the guide post 413 away from the guide plate 409 is inserted into the limiting groove. The lifting rod 410 is L-shaped, and the slide is C-shaped. Both ends of the slide are provided with slots that are connected to the slide. The end of the lifting rod 410 away from the top plate 407 is inserted into the slot, and the end of the lifting rod 410 away from the top plate 407 passes through the slot and is connected to the sprayer. The sprayer 6 is fixed in place. The top of the lifting rod 410 passes through the through hole and is fixed to the bottom of the sealing cover 2. When the sealing cover 2 moves upward, the sealing cover 2 drives the lifting rod 410 to move upward, so that the lifting rod 410 moves along the inside of the slot. The lifting rod 410 drives the sprayer 6 to move upward. When the lifting rod 410 moves to the slide and continues to move upward, the lifting rod 410 and the slide cooperate to drive the sprayer 6 to rotate counterclockwise around the axis of the guide column 413, so that the end of the sprayer 6 with the air outlet pipe rotates from the bottom of the guide plate 409 to the top of the guide plate 409, and moves the end of the sprayer 6 with the air outlet pipe away from the material.

[0047] refer to Figure 10 As shown, a connecting rod 412 is rotatably mounted on the end of the top plate 407 away from the height plate 405. The bottom of the connecting rod 412 is fixed to the top of the guide plate 409. A protective frame 408 is fixed on the end of the top plate 407 away from the height plate 405. A protective cavity is opened on the side of the protective frame 408 near the guide plate 409. When the sprayer 6 rotates counterclockwise, the end of the sprayer 6 with the discharge port rotates into the interior of the protective cavity, and the discharge port of the sprayer 6 is protected by the protective cavity.

[0048] refer to Figure 3 and Figure 4 As shown, the storage plate 415 has several material trays 416 in the middle for storing materials. Each material tray 416 has a push rod 414 fixed to its bottom. The end of the push rod 414 away from the material tray 416 is fixed to the output shaft of the electric hydraulic rod 401. The storage plate 415 has several positioning grooves that match the material trays 416. The outer wall of the material tray 416 is fixed with a wedge block. The inner wall of the positioning groove has a wedge groove that matches the wedge block. The output shaft of the electric hydraulic rod 401 drives the push rod 414 to move upward. The push rod 414 drives the material tray 416 to move upward, reducing the distance between the material tray 416 and the top of the reaction tank 3, thus facilitating the loading and unloading of materials. The wedge block and the wedge groove cooperate to limit the material tray 416 and prevent the material tray 416 from shaking during lifting.

[0049] When the processed material needs to be removed, the electric hydraulic rod 401 drives the sealing cover 2 upward via the fixed rod 404. The sealing cover 2 drives the lifting rod 410 upward, causing the lifting rod 410 to move along the inside of the slot. The lifting rod 410 drives the sprayer 6 upward. When the lifting rod 410 moves to the slide and continues to move upward, the guide column 413 cooperates with the limiting groove to limit the inclined rod 406. The lifting rod 410 cooperates with the slide to drive the sprayer 6 to rotate counterclockwise around the axis of the guide column 413. The end of the sprayer 6 with the air outlet pipe rotates from the bottom of the guide plate 409 to the top of the guide plate 409, so that the sprayer 6 moves into the protective cavity of the protective frame 408, moving the end of the sprayer 6 with the air outlet pipe away from the material. The end of the lifting rod 410 away from the top plate 407 is fixed to the sprayer 6.

[0050] refer to Figure 11 , Figure 12 and Figure 13 As shown, a translation mechanism 5 for moving the sprayer 6 is also provided between the sealing cover 2 and the flipping mechanism 4. The translation mechanism 5 includes a threaded rod 501 rotatably installed in the sealing cover 2. A nut 503 is screwed to the bottom of the threaded rod 501. A diagonal rod 406 is hinged between the nut 503 and the lifting rod 410. An extension frame 417 is also fixed to the outer wall of the positioning ring 403. The top of the extension frame 417 is provided with a moving groove that matches the height plate 405. The translation mechanism 5 can move the sprayer 6 to the side of the material when the material is picked up or put down. The number of extension frames 417 is equal to the number of sprayers 6. The bottom of the threaded rod 501 passes through the sealing cover 2 and is screwed to the nut 503. A baffle is fixed to the bottom of the threaded rod 501. The bottom of the nut 503 contacts the top of the baffle.

[0051] refer to Figure 14 and Figure 15As shown, a collar 502 is also provided on the outside of the nut 503. A locking rod 504 is provided between the nut 503 and the sealing cover 2. A sliding column 411 is fixed on the top of the lifting rod 410. A groove is provided at the bottom of the sealing cover 2 to facilitate the movement of the sliding column 411. An arc-shaped limiting block is also fixed on the top of the height plate 405. The number of limiting blocks is equal to the number of sprayers 6, and several limiting blocks are connected end to end to form a ring. The locking rod 504 is Z-shaped. The two ends of the inclined rod 406 are respectively hinged to the sliding column 411 and the nut 503. An installation groove adapted to the locking rod 504 is provided on the nut 503. Rotate the threaded rod 501, the locking rod 504 04. Limit the nut 503. The threaded rod 501 cooperates with the nut 503, so that the nut 503 moves vertically up and down along the outer wall of the threaded rod 501. The nut 503 drives the inclined rod 406 to move. The inclined rod 406 pushes the sliding column 411 to move along the inner wall of the groove. The sliding column 411 drives the lifting rod 410 to move through the lifting rod 410. The lifting rod 410 drives the height plate 405 to move through the top plate 407, so that the height plate 405 moves along the moving groove to the side away from the positioning ring 403. The lifting rod 410 drives the sprayer 6 to move to the side away from the positioning ring 403, so that the sprayer 6 moves to the oblique upper part of the material tray 416.

[0052] Rotating threaded rod 501 and clamping rod 504 limit the nut 503. Through the cooperation of threaded rod 501 and nut 503, the nut 503 moves vertically up and down along the outer wall of threaded rod 501. Nut 503 drives inclined rod 406 to move. Inclined rod 406 pushes sliding column 411 to move along groove. Sliding column 411 drives lifting rod 410 to move. Lifting rod 410 drives height plate 405 to move through top plate 407. Height plate 405 moves along moving groove to the side away from positioning ring 403. Top plate 407 drives protective frame 408 to move, so that protective frame 408 and sprayer 6 remain relatively stationary. Lifting rod 410 drives sprayer 6 to the side away from positioning ring 403. Sprayer 6 moves to the oblique upper part of material tray 416, so that sprayer 6 moves to the oblique upper part of material, preventing sprayer 6 and protective frame 408 from obstructing material.

[0053] A method of using a chemical vapor deposition apparatus for processing semiconductor silicon carbide coatings, characterized by comprising the following steps:

[0054] S1. When it is necessary to process the material, open the sealing cover 2, put the material into the reaction tank 3, and then place the material inside the loading tray 416.

[0055] S2. Rotating threaded rod 501 and clamping rod 504 limit the nut 503. Through the cooperation of threaded rod 501 and nut 503, the nut 503 moves vertically up and down along the outer wall of threaded rod 501. The nut 503 drives the inclined rod 406 to move. The inclined rod 406 pushes the sliding column 411 to move along the groove. The sliding column 411 drives the lifting rod 410 to move. The lifting rod 410 drives the height plate 405 to move through the top plate 407. The height plate 405 moves along the moving groove to one side of the positioning ring 403. The top plate 407 drives the protective frame 408 to move, so that the protective frame 408 and the sprayer 6 remain relatively stationary. The lifting rod 410 drives the sprayer 6 to move to one side of the positioning ring 403, so that the sprayer 6 moves to the front of the material.

[0056] S3. The electric hydraulic rod 401 drives the sealing cover 2 to move downward through the fixed rod 404. The sealing cover 2 drives the lifting rod 410 to move downward, so that the lifting rod 410 moves along the inside of the slot. The lifting rod 410 drives the sprayer 6 to move downward. When the lifting rod 410 moves to the slide and continues to move upward, the guide column 413 cooperates with the limiting groove to limit the inclined rod 406. The lifting rod 410 cooperates with the slide to drive the sprayer 6 to rotate clockwise around the axis of the guide column 413. The end of the sprayer 6 with the air outlet pipe rotates from the top of the guide plate 409 to the bottom of the guide plate 409, so that the sprayer 6 moves to the outside of the protective cavity of the protective frame 408. The end of the sprayer 6 with the air outlet pipe is brought close to the material, so that the sealing cover 2 seals the reaction tank 3.

[0057] S4. The sprayer 6 is controlled by the control panel 1 to process the material inside the material tray 416.

[0058] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited thereto. Various changes can be made within the scope of knowledge possessed by those skilled in the art without departing from the spirit of the present invention.

Claims

1. A chemical vapor deposition apparatus for processing semiconductor silicon carbide coatings, comprising an operating table, a reaction vessel for processing materials disposed inside the operating table, a sealing cap for sealing the top of the reaction vessel, and a plurality of sprayers for processing materials disposed inside the reaction vessel, characterized in that, The reaction vessel is equipped with a flipping mechanism inside, which drives the sprayer to flip or protect it. The flipping mechanism can drive the sprayer to move to the front of the material when processing the material, and to store the sprayer when picking up or putting down the material. A translation mechanism is also provided between the sealing cover and the flipping mechanism to move the sprayer. The translation mechanism can move the sprayer to the side of the material when picking up or putting down the material. The flipping mechanism includes an electric hydraulic rod and a support plate installed inside the reaction tank. A storage plate for storing materials is installed outside the output shaft of the electric hydraulic rod. A positioning ring is installed between the storage plate and the reaction tank. An adjustment mechanism is installed between the positioning ring and the sprayer. The adjustment mechanism includes a height plate disposed on the positioning ring, and a top plate is fixed to the end of the height plate away from the electric hydraulic rod. A connecting rod is rotatably installed at the end of the top plate away from the height plate. The bottom of the connecting rod is fixed to the top of the guide plate. A protective frame is fixed at the end of the top plate away from the height plate. A protective cavity is opened on the side of the protective frame close to the guide plate. A guide plate is provided below the top plate, and a lifting rod is provided between the top plate and the guide plate. A guide column is fixed on the side of the guide plate away from the lifting rod, and a sliding groove is provided in the middle of the guide plate. The end of the lifting rod away from the top plate is fixed to the sprayer. The translation mechanism includes a threaded rod rotatably installed in the sealing cover, a nut screwed to the bottom of the threaded rod, a diagonal rod hinged between the nut and the lifting rod, and an extension frame fixed to the outer wall of the positioning ring, with a moving groove adapted to the height plate on the top of the extension frame. The nut is also provided with a collar on the outside, a locking rod is provided between the nut and the sealing cover, a sliding column is fixed at the top of the lifting rod, and a groove is provided at the bottom of the sealing cover to facilitate the movement of the sliding column.

2. The chemical vapor deposition apparatus for processing semiconductor silicon carbide coatings according to claim 1, characterized in that, The electro-hydraulic rod is fixed to the bottom of the inner wall of the reaction vessel, the bearing plate is fixed to the middle of the inner wall of the reaction vessel, and a fixing rod is also fixed to the outer wall of the output shaft of the electro-hydraulic rod.

3. The chemical vapor deposition apparatus for processing semiconductor silicon carbide coatings according to claim 2, characterized in that, The storage plate has several material trays in the middle for storing materials. Each material tray has a push rod fixed to its bottom. The end of the push rod away from the material tray is fixed to the output shaft of the electric hydraulic rod. The storage plate has several positioning grooves that match the material trays. The outer wall of the material tray is fixed with a wedge block. The inner wall of the positioning groove has a wedge groove that matches the wedge block.

4. The method of using the chemical vapor deposition apparatus for semiconductor silicon carbide coating processing according to claim 3, characterized in that, Includes the following steps: S1. Open the sealing cover, put the material to be processed into the inside of the reaction vessel, and then place the material on the loading tray; S2. Rotate the threaded rod, which, in conjunction with the nut, drives the inclined rod to move. The inclined rod then drives the adjustment mechanism to move, and the adjustment mechanism moves the sprayer to directly above the material tray. S3. When the sealing cover is closed, the electro-hydraulic rod enters the interior of the storage plate through the push rod. At the same time, the electro-hydraulic rod drives the adjustment mechanism to rotate the sprayer, so that the end of the sprayer with the air outlet pipe rotates to the bottom of the guide plate. S4. The sprayer is controlled via the control panel to process the material inside the material tray.

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