Fluorescent x-ray analysis device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- RIGAKU CORP
- Filing Date
- 2024-08-30
- Publication Date
- 2026-06-12
Smart Images

Figure CN120641744B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a fluorescence X-ray analysis device. Background Technology
[0002] Fluorescent X-ray analysis devices are known as apparatuses for analyzing the elements contained in a sample. These devices irradiate the sample with X-rays once and analyze the sample based on the intensity and energy of the emitted fluorescent X-rays. To prevent contamination of the device by the sample, a simplified fluorescent X-ray analysis device is also known, which uses a diaphragm membrane to separate the sample chamber from the irradiation chamber. For example, Patent Document 1 discloses an X-ray detection device in which an X-ray-transmitting membrane is fixed in an unfolded state to prevent bending, folding, or twisting, and this sample carrier is positioned between the sample chamber and the irradiation chamber.
[0003] Existing technical documents
[0004] Patent documents
[0005] Patent Document 1: Japanese Patent Application Publication No. 2014-38035 Summary of the Invention
[0006] The problem that the invention aims to solve
[0007] When analyzing light elements in a sample, the attenuation of X-rays due to the atmosphere is significant. Therefore, it is necessary to replace the X-ray beam path with helium or create a vacuum, but helium is sometimes difficult to supply or obtain. When the sample is liquid, it cannot be placed in a vacuum, so the irradiation chamber must be kept in an atmospheric state to create a vacuum. However, the X-ray detection device in Patent Document 1 does not consider the pressure difference that occurs between the surface and back of the X-ray-transmitting membrane. Therefore, when performing measurements under conditions where a pressure difference exists between the surface and back of the X-ray-transmitting membrane, countermeasures such as reducing the size of the circular through-hole on the sample holder or making the through-hole a mesh are necessary. However, since the X-ray irradiation unit irradiates the sample at an angle, if this countermeasure is taken, the X-rays will be blocked by the sample holder, resulting in a smaller area of X-rays irradiating the sample. In this case, the intensity of the fluorescent X-rays to be detected decreases, leading to reduced analytical accuracy or increased measurement time.
[0008] The present invention was proposed in view of the above-mentioned problems, and its purpose is to provide a fluorescence X-ray analysis device, which has a partition membrane between the sample chamber and the irradiation chamber to improve the analysis accuracy and shorten the measurement time by preventing the intensity of the fluorescence X-ray to be detected from decreasing.
[0009] Technical solutions for solving the problem
[0010] (1) A fluorescence X-ray analysis apparatus according to one aspect of the present disclosure has a sample chamber for configuring a sample and an irradiation chamber separated from the sample chamber by means of a partition, characterized in that it comprises: an X-ray source disposed in the irradiation chamber and irradiating X-rays obliquely toward an opening provided in a partition wall between the sample chamber and the irradiation chamber; a window frame member formed of a material that transmits X-rays, holding a partition membrane that forms part of the partition and disposed within the opening provided in the partition wall; and a film support member having an elongated hole through which the X-rays pass, disposed adjacent to the partition membrane on the irradiation chamber side and supporting the partition membrane from the irradiation chamber side, the film support member being configured such that the elongated hole is parallel to the optical axis of the X-rays in a top view from the sample chamber side toward the irradiation chamber side.
[0011] (2) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that it also has a slit disposed in the optical path of the fluorescence X-ray, which is composed of a plurality of parallel plates arranged at a predetermined interval, the plurality of parallel plates being arranged parallel to the elongated aperture in a top view from the sample chamber side toward the irradiation chamber side.
[0012] (3) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized by having an opening through which the X-rays pass from the irradiation chamber to the sample chamber, and having a window frame retaining member disposed in the sample chamber and supporting the outer edge of the thin film support member from below.
[0013] (4) Another aspect of the fluorescence X-ray analysis apparatus of the present disclosure is characterized in that the thin film support member has a fitting portion at a position in contact with the window frame retaining member, and the window frame retaining member has a fitting portion at a position in which it fits with the fitting portion when the thin film support member is configured such that the elongated hole is parallel to the optical axis of the X-ray in a top view from the sample chamber side toward the irradiation chamber side.
[0014] (5) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that the thin film support component is formed of resin.
[0015] (6) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that the thin film support component is formed of PEEK or PTFE.
[0016] (7) Another aspect of the fluorescent X-ray analysis apparatus of this disclosure is characterized in that at least the portion of the thin film support member that is irradiated by X-rays is formed of a resin coated with aluminum.
[0017] (8) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that the thickness of the thin film support member is 1 mm or more.
[0018] (9) Another aspect of the fluorescence X-ray analysis apparatus of the present disclosure is characterized in that the thin film support member has a plurality of the elongated holes arranged side by side in a direction orthogonal to the optical axis of the X-ray in a top view from the sample chamber side toward the irradiation chamber side.
[0019] (10) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that the width of the elongated aperture is more than four times the spacing between adjacent elongated apertures.
[0020] (11) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that the length of the elongated aperture is more than four times its width.
[0021] (12) Another aspect of the fluorescence X-ray analysis apparatus of this disclosure is characterized in that the thin film support component is formed of metal.
[0022] The effects of the invention
[0023] According to this disclosure, analytical accuracy can be improved and measurement time can be shortened by preventing a decrease in the intensity of the fluorescent X-rays to be detected. Attached Figure Description
[0024] Figure 1 This is a schematic diagram showing a fluorescence X-ray analysis apparatus.
[0025] Figure 2 This is a diagram showing the cross-section of the sample stage.
[0026] Figure 3 These are the top, side, and bottom views of the membrane support component.
[0027] Figure 4 From Figure 1 The projection of viewpoint A toward the direction of the arrow.
[0028] Figure 5 From Figure 1 The projection of viewpoint A toward the direction of the arrow.
[0029] Figure 6 From Figure 1 The projection of viewpoint B in the direction of the arrow. Detailed Implementation
[0030] Hereinafter, preferred embodiments (hereinafter referred to as embodiments) for implementing this disclosure will be described with reference to the accompanying drawings. Figure 1 This is a schematic diagram showing the fluorescence X-ray analysis apparatus 100. (See diagram below.) Figure 1As shown, the fluorescence X-ray analysis apparatus 100 has a sample chamber 102 in which a sample 118 is disposed, and an irradiation chamber 106 separated from the sample chamber 102 by means of a partition. The sample chamber 102 and the irradiation chamber 106 are separated by a partition including a partition wall 104 to prevent gas from moving relative to each other. An opening is provided in the partition wall 104 to allow X-rays to pass from the irradiation chamber 106 to the sample chamber 102.
[0031] The irradiation chamber 106 is equipped with an X-ray source 108 that emits X-rays, a slit 110, a spectrometer 111 that splits fluorescent X-rays, and a detector 112 that detects the fluorescent X-rays split by the spectrometer 111. The X-ray source 108 is disposed in the irradiation chamber 106 and irradiates X-rays at an angle toward an opening provided in the partition wall 104 between the sample chamber 102 and the irradiation chamber 106. The X-ray source 108 irradiates a sample 118 disposed in the sample cell 116 with X-rays through this opening. Fluorescent X-rays are emitted from the X-ray-irradiated sample 118. The slit 110 is disposed in the optical path of the fluorescent X-rays and consists of a plurality of parallel plates 402 arranged at predetermined intervals (see reference 110). Figure 4 A Sola slit is constructed. A spectrometer 111 separates fluorescent X-rays of a specified wavelength from the fluorescent X-rays passing through the slit 110. A detector 112 is positioned at the incident location of the fluorescent X-rays and detects the fluorescent X-rays separated by the spectrometer 111. The detector 112, for example, is a proportional counter tube, which measures the fluorescent X-rays and outputs a pulse signal. A counter (not shown) obtains the intensity of the fluorescent X-rays by counting the pulse signals output from the detector 112. Sample 118 is analyzed based on the intensity of the fluorescent X-rays.
[0032] also, Figure 1 This diagram illustrates the positional relationships of the X-ray source 108, slit 110, beam splitter 111, and detector 112 along the x-axis and z-axis, all located on the same xz plane. However, since detector 112 is positioned at the incident location of the dispersed fluorescent X-rays, its position along the y-axis differs from that of the X-ray source 108, slit 110, and beam splitter 111.
[0033] A sample stage 114 is provided in the sample chamber 102, and a sample cell 116 is disposed on the sample stage 114. The interior of the sample chamber 102 can be filled with helium or atmospheric gas. According to the present invention, the sample 118 can be measured regardless of whether it is placed in a helium environment or an atmospheric environment. Hereinafter, the case where the sample 118 is placed in an atmospheric environment will be described as the simplest case of the measurement method. In addition, the sample 118 can be a liquid or a solid (including powder). The case where the sample 118 is a liquid will be described below. The liquid sample is disposed in the sample cell 116. The sample cell 116 is cylindrical in shape, and its bottom surface is sealed with a sample holding film. The liquid sample is disposed on the sample holding film. In addition, the upper surface of the sample cell 116 can also be sealed with other films to prevent the sample 118 from overflowing. The sample stage 114 includes a window frame holding member, a window frame member 208, a film support member 210, and a cover member 212. Figure 2 This is a diagram showing the cross-section of the sample stage 114.
[0034] The window frame retaining member has an opening that allows X-rays to pass from the irradiation chamber 106 through the sample chamber 102, and is disposed in the sample chamber 102, supporting the outer edge 306 of the thin film support member 210 and the outer edge of the window frame member 208 from below. Specifically, the window frame retaining member has a lower retaining member 202 and an upper retaining member 204. The lower retaining member 202 and the upper retaining member 204 have openings that allow X-rays to pass from the irradiation chamber 106 through the sample chamber 102.
[0035] The lower retaining member 202 is a member disposed in contact with the upper part of the partition wall 104. Viewed from its upper and lower surfaces, the lower retaining member 202 has a generally circular outer edge and a circular opening at a position corresponding to the opening provided on the partition wall 104. The opening of the lower retaining member 202 has a shape corresponding to the area excluding the outer edge portion 306 (described later) of the film support member 210. Furthermore, as... Figure 2 As shown, the lower retaining member 202 has a step corresponding to the outer edge of the film support member 210. Furthermore, the lower retaining member 202 has a fitting portion 304 that engages with the film support member 210 (see reference). Figure 3 The film support member 210 is configured such that its outer edge is located on the step of the lower retaining member 202, and the portion other than the outer edge is located in the opening of the lower retaining member 202, and is engaged with the engagement portion 206 of the lower retaining member 202 by the engagement portion 304. Thus, the lower retaining member 202 supports the outer edge 306 of the film support member 210.
[0036] Furthermore, the lower retaining member 202 supports the window frame member 208 disposed on the upper side of the membrane support member 210. For example... Figure 2As shown, the lower retaining member 202 has a step corresponding to the outer edge of the curved portion of the window frame member 208. The lower retaining member 202 has an O-ring at the location of this step. When the window frame member 208 is positioned on the lower retaining member 202, the O-ring engages with the curved portion of the window frame member 208. Thus, an airtight seal is formed between the window frame member 208 and the lower retaining member 202.
[0037] The upper retaining member 204 is a component that is configured to contact the lower retaining member 202 from above. Viewed from its upper and bottom surfaces, the upper retaining member 204 has a generally circular outer edge and a circular opening with the same central location as the opening in the lower retaining member 202, but with a larger diameter. The upper retaining member 204 has an O-ring at the point where it contacts the lower retaining member 202. Together with the lower retaining member 202, the upper retaining member 204 supports the window frame component 208.
[0038] The window frame member 208 is formed of an X-ray-permeable material, holds the partition film 214, which forms part of the partition, and is disposed within an opening provided in the partition wall 104. Specifically, the window frame member 208 is formed of an X-ray-permeable material, holds the partition film 214, which forms another part of the partition, and is disposed within an opening of the window frame retaining member. The window frame member 208 has an inner film retaining member and an outer film retaining member in an annular shape. The window frame member 208 is disposed within the opening of the window frame retaining member while the partition film 214 is held by the inner and outer film retaining members. The partition film 214 located within this opening forms part of the partition.
[0039] The thin film support member 210 has an elongated hole 302 for X-rays to pass through, is disposed adjacent to the diaphragm membrane 214 on the irradiation chamber 106 side, and supports the diaphragm membrane 214 from the irradiation chamber 106 side. Figure 3 These are top (top), side (center), and bottom (bottom) views of the membrane support member 210. In the side view, the position of the elongated hole 302 is indicated by dashed lines. Viewed from the top and bottom surfaces, the outer edge of the membrane support member 210 is approximately circular. Figure 3 As shown, the film support member 210 may be provided with a thin outer edge portion 306 that contacts the upper surface of the lower retaining member 202. For example, viewed from the upper and lower surfaces, the film support member 210 is a circular shape with a diameter of 30 mm, excluding the outer edge portion 306.
[0040] The thin film support member 210 is formed with a thickness that allows for negligible deformation caused by the pressure difference between the sample chamber 102 and the irradiation chamber 106. Specifically, for example, the thickness of the thin film support member 210 is 1 mm or more, preferably 2 mm or more. The outer edge portion 306, which contacts the upper surface of the lower retaining member 202, has a thickness of 0.5 mm. The portion of the thin film support member 210 other than the outer edge portion 306 has a shape corresponding to the opening shape of the lower retaining member 202.
[0041] The film support member 210 has a fitting portion 304 at the position where it contacts the window frame retaining member. Specifically, for example, the film support member 210 has two holes on the surface of its outer edge 306 (the side that contacts the lower retaining member 202). Figure 3 In this case, the fitted portion 304 is a through hole, but it can also be a non-through hole or a groove. Even without the outer edge portion 306, a cutout can be provided around it. When the film support member 210 has the outer edge portion 306, it is positioned on the lower retaining member 202 such that the portion outside the outer edge portion 306 is located at the opening of the lower retaining member 202, and the outer edge is located on the step of the lower retaining member 202. In this case, the film support member 210 is configured such that the two holes (fitted portions 304) engage with the protrusions (fitted portions 206) of the lower retaining member 202.
[0042] The film support member 210 has a plurality of elongated holes 302. For example, the film support member 210 has five elongated holes 302 with a narrow shape. The length of the elongated hole 302 is preferably more than four times its width, and the width of the elongated hole 302 is preferably more than four times the spacing between adjacent elongated holes 302. For example, each elongated hole 302 is formed to have the same width but is the largest within the film support member 210 except for the outer edge 306. Therefore, each elongated hole 302 is longer closer to the center. Figure 3 In the example shown, the lengths of the elongated holes 302 from the inside out are 26 mm, 24 mm, and 17 mm, respectively. The width of each elongated hole 302 is the same, 4 mm. The spacing between adjacent elongated holes 302 (the width of the beam) is 0.5 mm.
[0043] The portion between adjacent elongated holes 302 of the film support member 210 (hereinafter, conveniently referred to as the beam portion) supports the septum membrane 214. When multiple elongated holes 302 are connected to form a large opening, the septum membrane 214 is supported only by the outer edge 306 of the film support member 210. When the sample chamber 102 is at atmospheric pressure and the irradiation chamber 106 is under vacuum, the septum membrane 214 may break due to the large force applied to it. However, as shown in this disclosure, by forming a structure in which the film support member 210 has multiple elongated holes 302, the septum membrane 214 can be supported by the beam portion.
[0044] Furthermore, the thicker the thin film support member 210, the longer the length of the elongated aperture 302 is preferably formed. For example, it is preferable that the ratio of the length of the elongated aperture 302 to the thickness of the thin film support member 210 (thickness / length) is greater than the ratio of the x-component to the z-component of the optical axis of the X-ray emitted from the X-ray source (z-component / x-component). Specifically, as described above, when the thickness of the central portion of the thin film support member 210 is 3.4 mm, if the length of the elongated aperture 302 is 26 mm, it is possible to prevent X-rays from being blocked by the thin film support member 210.
[0045] The thin film support member 210 is formed of resin. Specifically, for example, the thin film support member 210 is formed of polyetheretherketone (PEEK) or polytetrafluoroethylene (PTFE). When the thin film support member 210 is made of metal, interference lines are generated, and some elements cannot be analyzed. By forming the thin film support member 210 with a resin that does not easily generate interference lines, samples containing elements that cause interference lines can be analyzed. Furthermore, when the thin film support member 210 is formed of resin, the portion other than the outer edge 306 is preferably 2 mm or more thick.
[0046] Furthermore, the portion of the thin-film support member 210 that is at least exposed to X-rays can also be formed of an aluminum-coated resin. Specifically, for example, aluminum can be sprayed onto the portion of the thin-film support member 210 formed of PEEK or PTFE other than the outer edge 306. This further reduces interference lines caused by impurities contained within the resin.
[0047] Furthermore, the thin film support member 210 can also be formed of metal. Specifically, for example, the thin film support member 210 can also be formed of stainless steel (SUS) or a metal such as titanium. By forming the thin film support member 210 with metal, mechanical strength can be improved and deformation caused by the pressure difference between the irradiation chamber 106 and the sample chamber 102 can be suppressed.
[0048] The cover component 212 seals the space where the sample cell 116 is located. Specifically, as... Figure 2 As shown, the cover member 212 has a shape that covers the space where the sample pool 116 is disposed, and is disposed in contact with the upper retaining member 204 of the window frame retaining member. The cover member 212 has an O-ring at the position where it contacts the upper retaining member 204.
[0049] Next, the orientation of the plate with the elongated hole 302 and the slit 110 will be explained. Figure 4 This is from the state where the cover component 212, sample cell 116, and window frame component 208 have been removed. Figure 1The projection of viewpoint A in the direction of the arrow. Figure 5 This refers to the state after removing the cover component 212, sample cell 116, window frame component 208, film support component 210, and window frame support component. Figure 1 The projection of viewpoint A in the direction of the arrow. Figure 6 This refers to the state after removing the cover component 212, sample cell 116, window frame component 208, and window frame support component. Figure 1 The projection of viewpoint B in the direction of the arrow. Furthermore, in Figure 6 In the diagram, the portion of the slit 110 other than the parallel plate 402 and the detector 112 are omitted, and the X-ray source 108, the slit 110 and the beam splitter 111 arranged below the partition wall 104 are indicated by dashed lines.
[0050] The optical axis 602 of the X-rays emitted from the X-ray source 108 is inclined relative to the surface of the irradiated sample 118 (i.e., the xy plane containing the sample holding film). The optical axis 602 of the X-rays is contained in the xz plane. That is, the optical axis 602 of the X-rays contains x-axis and z-axis components, but not y-component.
[0051] The thin film support member 210 is configured such that the elongated aperture 302 is parallel to the X-ray optical axis 602 in a top view (viewed in the -z direction) from the sample chamber 102 side toward the irradiation chamber 106 side. That is, the thin film support member 210 is configured such that the elongated aperture 302 is along the x-axis direction. Furthermore, in the top view from the sample chamber 102 side toward the irradiation chamber 106 side, the plurality of elongated apertures 302 are arranged side by side in a direction orthogonal to the X-ray optical axis 602. That is, the thin film support member 210 is configured such that the plurality of elongated apertures 302 are arranged side by side along the y-axis direction.
[0052] The thin-film support member 210 has a specified thickness, and the X-ray optical axis 602 includes an x-axis component. Therefore, a portion of the X-rays is blocked by the beam portion of the thin-film support member 210 (the X-ray optical path interferes with the beam portion). However, by arranging the elongated aperture 302 along the x-axis direction, the interference between the X-ray optical path and the beam portion can be minimized.
[0053] Furthermore, the slit 110 is configured such that a plurality of parallel plates 402 are parallel to the elongated aperture 302 in a top view from the sample chamber 102 side toward the irradiation chamber 106 side. Figure 4 The depth of the elongated hole 302 shows the connection with Figure 5 The slit 110 is part of a plurality of parallel plates 402 arranged in the same direction as the elongated hole 302 shown. That is, the slit 110 is arranged in such a way that the plurality of parallel plates 402 are arranged along the x-axis direction.
[0054] like Figure 6As shown, X-rays emitted from X-ray source 108 pass through elongated aperture 302 and irradiate the sample 118 at irradiation position 600. Fluorescent X-rays emitted from sample 118 are split into beam splitter 111 through elongated aperture 302 and slit 110 and then incident on detector 112. At this time, elongated aperture 302 is parallel to the optical axis 602 of the X-rays in a top view from the sample chamber 102 side toward the irradiation chamber 106 side. In other words, thin film support member 210 is configured such that elongated aperture 302 is along the intersection (xz plane) of the plane containing the optical axis 602 of X-rays emitted from X-ray source 108 and the optical axis 604 of fluorescent X-rays 604 of fluorescent X-rays 604 formed by slit 110 and the plane (xy plane) formed by thin film support member 210. Furthermore, fitting portion 206 and fitted portion 304 are arranged in this configuration relationship. That is, when the thin film support member 210 is configured such that the elongated aperture 302 is parallel to the X-ray optical axis 602 in a top view from the sample chamber 102 side toward the irradiation chamber 106 side, the window frame retaining member has a fitting portion 206 in the position where it is fitted with the fitting portion 304. Therefore, the user can easily configure the thin film support member 210 so that the elongated aperture 302 is parallel to the X-ray optical axis 602.
[0055] The fluorescent X-rays generated by sample 118 have no particular directionality. However, because the elongated aperture 302 is arranged along the x-axis, a portion of the fluorescent X-rays with the y-component is blocked by the beam (the X-ray path interferes with the beam). Furthermore, in Figure 6 The optical axis 604 of the fluorescent X-rays passing through the slit 110 is described in the diagram. Because a portion of the fluorescent X-rays with the y-component is blocked by the beam, the fluorescent X-rays without the y-component reaching the irradiation chamber 106 have a higher intensity than those with the y-component. By arranging the slit 110 so that the multiple parallel plates 402 are parallel to the elongated aperture 302, the intensity of the fluorescent X-rays incident on the detector 112 can be increased.
[0056] Furthermore, the film support member 210 is formed of a material that is less susceptible to X-ray degradation (e.g., thermoplastic resins such as polyetheretherketone), but it is preferable to replace it at regular intervals. According to this disclosure, when replacing the film support member 210, the film support member 210 can be easily configured as described above.
[0057] This disclosure can be applied to any type of fluorescence X-ray analysis device 100, including wavelength-dispersive and energy-dispersive types. Furthermore, it is not limited to the embodiments described above and various modifications can be made. The structure of the fluorescence X-ray analysis device 100 described above is an example and is not limited thereto. It can also be replaced with structures that are substantially the same as those shown in the above embodiments, structures that perform the same function, or structures that achieve the same purpose. For example, although the shape of the thin film support member has been described as circular, it can also be polygonal or other shapes.
[0058] Explanation of reference numerals in the attached figures
[0059] 100 Fluorescence X-ray analysis device, 102 Sample chamber, 104 Partition wall, 106 Irradiation chamber, 108 X-ray source, 110 Slit, 112 Detector, 114 Sample stage, 116 Sample cell, 118 Sample, 202 Lower holding component, 204 Upper holding component, 206 Fitting part, 208 Window frame component, 210 Thin film support component, 212 Cover component, 214 Partition membrane, 302 Elongated hole, 304 Fitted part, 306 Outer edge, 402 Parallel plate, 600 Irradiation position, 602 Optical axis of X-ray, 604 Optical axis of fluorescence X-ray.
Claims
1. A fluorescence X-ray analysis apparatus, comprising a sample chamber for preparing a sample and an irradiation chamber separated from the sample chamber by means of a partition, characterized in that, have: An X-ray source is disposed in the irradiation chamber and irradiates X-rays at an angle toward an opening provided in the partition wall between the sample chamber and the irradiation chamber; A window frame component, formed of a material that allows the X-rays to pass through, retains a diaphragm membrane that forms part of the diaphragm and is disposed within an opening provided in the diaphragm wall; as well as A thin-film support member, having an elongated hole for the X-rays to pass through, is disposed adjacent to the septum membrane on the irradiation chamber side and supports the septum membrane from the irradiation chamber side. The thin film support member is configured such that the elongated hole is parallel to the optical axis of the X-ray in a top view from the sample chamber side toward the irradiation chamber side.
2. The fluorescence X-ray analysis apparatus according to claim 1, characterized in that, It also has a slit, which is arranged in the optical path of the fluorescent X-ray, and is composed of a plurality of parallel plates arranged at predetermined intervals. The plurality of parallel plates are configured to be parallel to the elongated aperture in a top view from the sample chamber side toward the irradiation chamber side.
3. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, It has an opening that allows the X-rays to pass from the irradiation chamber to the sample chamber, and a window frame retaining member disposed in the sample chamber and supporting the outer edge of the thin film support member from below.
4. The fluorescence X-ray analysis apparatus according to claim 3, characterized in that, The film support member has a fitting portion at the position where it contacts the window frame retaining member. The window frame retaining member has an engaging portion at the position where it engages with the engaging portion when the thin film support member is configured such that the elongated hole is parallel to the optical axis of the X-ray in a top view from the sample chamber side toward the irradiation chamber side.
5. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, The thin film support component is formed of resin.
6. The fluorescence X-ray analysis apparatus according to claim 5, characterized in that, The thin-film support component is formed of PEEK or PTFE.
7. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, At least the portion of the thin-film support member that is irradiated by X-rays is formed of resin coated with aluminum.
8. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, The thickness of the thin film support component is 1 mm or more.
9. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, The thin film support component has a plurality of the elongated holes. In a top view from the sample chamber side toward the irradiation chamber side, the plurality of elongated holes are arranged side by side in a direction orthogonal to the optical axis of the X-rays.
10. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, The width of the elongated hole is more than four times the spacing between adjacent elongated holes.
11. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, The length of the elongated hole is more than four times its width.
12. The fluorescence X-ray analysis apparatus according to claim 1 or 2, characterized in that, The thin-film support component is made of metal.