Isolation assembly, upper electrode arrangement, and semiconductor processing apparatus
By designing gas channels and clean gas supply in the isolation components, the problem of particulate contamination caused by deposits on the isolation sleeves was solved, enabling the clean and stable operation of semiconductor processing equipment.
CN120656916BActive Publication Date: 2026-07-24BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
- Filing Date
- 2024-03-14
- Publication Date
- 2026-07-24
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Figure CN120656916B_ABST
Abstract
The application provides an isolating assembly, an upper electrode device and a semiconductor processing equipment. The isolating assembly is used for electrically insulating a first electrode part and a second electrode part in the semiconductor processing equipment, and comprises an isolating main body, wherein a gas passage for transmitting a cleaning gas is arranged in the isolating main body, the gas passage has at least one gas outlet, and the at least one gas outlet is located on at least one specified surface of the isolating main body, so that the specified surface is purged or the adhesion on the specified surface is removed, and the adhesion of the plasma on the specified surface is reduced by using the cleaning gas, thereby solving the particle problem caused by the adhesion on the surface of the isolating main body.
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