Method, system and medium for optimizing the coating magnetic properties of rare earth magnetic materials

Abstract

The application discloses a rare earth magnetic material plating magnetic optimization method, system and medium, relates to the technical field of metal material surface plating, and the method comprises the following steps: obtaining a historical plating magnetic database of the same kind of magnetic material of the rare earth magnetic material, the historical plating magnetic database contains multiple groups of plating data sets; extracting predetermined plating magnetic indexes such as corrosion resistance and saturation magnetization, and obtaining target magnetic index parameters by traversing in target plating data sets; obtaining a target plating magnetic index by combining arbitrary predetermined weight weighting calculation of any magnetic index; obtaining the historical optimal plating process parameter by optimizing the maximum target plating magnetic index; and optimizing the plating magnetic treatment of the rare earth magnetic material according to the historical optimal plating process parameter. The application solves the technical problem that the plating mode of the rare earth magnetic material is difficult to comprehensively balance the multiple magnetic related performances thereof, and the material magnetism cannot reach the optimal state, achieves the technical effect of optimizing the plating effect of the rare earth magnetic material and improving the comprehensive magnetic performance thereof.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of metal material surface plating, in particular to a plating magnetic optimization method, system and medium for rare earth magnetic materials. BACKGROUND

[0002] The plating of rare earth magnetic materials is crucial for optimizing their magnetic properties and directly affects the application effect of the materials in various devices. In the prior art, the plating of rare earth magnetic materials relies on empirical process parameter settings, and the composition of the plating solution, the plating time and other parameters are adjusted by traditional trial and error methods to optimize the magnetism. These methods can play a certain role in simple scenarios, but as the performance requirements of magnetic materials increase, they expose limitations in complex application scenarios. The traditional method does not systematically integrate historical data, making it difficult to comprehensively balance multiple magnetic indicators such as corrosion resistance and saturation magnetization, resulting in suboptimal material magnetism after plating and difficulty in meeting the performance requirements of high-precision devices for magnetic materials. SUMMARY

[0003] The present application provides a plating magnetic optimization method, system and medium for rare earth magnetic materials, which solves the technical problem that the plating method for rare earth magnetic materials cannot comprehensively balance multiple magnetic performance related properties, and cannot make the material magnetism optimal.

[0004] In a first aspect, the present application provides a plating magnetic optimization method for rare earth magnetic materials, the method comprising: obtaining a historical plating magnetism database of similar magnetic materials of rare earth magnetic materials, wherein the historical plating magnetism database comprises multiple sets of plating data sets; extracting any magnetic indicator in a predetermined plating layer magnetic indicator, and traversing the any magnetic indicator in a target plating data set to obtain a target magnetic indicator parameter, wherein the predetermined plating layer magnetic indicator at least includes corrosion resistance, saturation magnetization, coercive force and Curie temperature, and the target plating data set refers to any one of the multiple sets of plating data sets; combining any predetermined weight of the any magnetic indicator to perform weighted calculation on the target magnetic indicator parameter to obtain a target plating magnetism index; performing optimization analysis with the maximum target plating magnetism index as the target to obtain a historical optimal plating process parameter; and performing plating magnetic optimization processing on the rare earth magnetic materials according to the historical optimal plating process parameter.

[0005] In a second aspect of the present application, a plating magnetic optimization system for rare earth magnetic materials is provided, and the system comprises: a historical plating magnetic database acquisition module configured to acquire a historical plating magnetic database of similar magnetic materials of the rare earth magnetic materials, wherein the historical plating magnetic database comprises a plurality of plating data sets; a target magnetic index parameter acquisition module configured to extract any magnetic index in predetermined plating layer magnetic indexes, and to traverse the target plating data set with the any magnetic index, to obtain a target magnetic index parameter, wherein the predetermined plating layer magnetic indexes at least include corrosion resistance, saturation magnetization, coercivity and Curie temperature, and the target plating data set refers to any one of the plurality of plating data sets; a target plating magnetic index acquisition module configured to perform weighted calculation on the target magnetic index parameter in combination with any predetermined weight of the any magnetic index, to obtain a target plating magnetic index; a historical optimal plating process parameter acquisition module configured to perform optimization analysis with the target plating magnetic index maximum as a target, to obtain a historical optimal plating process parameter; and a plating magnetic optimization execution module configured to perform plating magnetic optimization processing on the rare earth magnetic materials according to the historical optimal plating process parameter.

[0006] In a third aspect of the present application, a computer readable storage medium is provided, and the medium stores a computer program, which, when executed by a processor, implements the plating magnetic optimization method for rare earth magnetic materials provided in the present application.

[0007] The one or more technical solutions provided in the present application have at least the following technical effects or advantages:

[0008] In the present application, the historical plating magnetic data of similar magnetic materials of the rare earth magnetic materials is acquired, the magnetic index is extracted and the parameter is traversed, the plating magnetic index is obtained through weighted calculation, the historical optimal process parameter is obtained through optimization with the index maximum as a target, and the target optimal plating process parameter is determined through incremental optimization through a process increment strategy, so that the rare earth magnetic materials are subjected to plating processing, the plating magnetic property of the rare earth magnetic materials is effectively optimized, the plating effect of the rare earth magnetic materials is optimized, and the technical effect of improving the comprehensive magnetic property is achieved. BRIEF DESCRIPTION OF DRAWINGS

[0009] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative effort.

[0010] Figure 1 FIG. 1 is a flowchart of the plating magnetic optimization method for rare earth magnetic materials provided in the embodiments of the present application.

[0011] Figure 2 is a structural schematic diagram of a plating magnetic optimization system of a rare earth magnetic material provided by the embodiment of the present application.

[0012] Legend: historical plating magnetic database acquisition module 1, target magnetic index parameter acquisition module 2, target plating magnetic index acquisition module 3, historical optimal plating process parameter acquisition module 4, and plating magnetic optimization execution module 5. DETAILED DESCRIPTION

[0013] The present application provides a plating magnetic optimization method, system and medium for rare earth magnetic materials, which is used to solve the technical problem that the plating method of rare earth magnetic materials is difficult to comprehensively balance multiple magnetic properties, and the material magnetism cannot reach the optimal state.

[0014] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of protection of the present application.

[0015] It should be noted that the terms "first", "second", etc. in the specification and the above drawings of the present application are used to distinguish similar objects, and do not necessarily mean a specific order or sequence. It should be understood that the data thus used can be interchanged under appropriate circumstances, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or server including a series of steps or units does not have to be limited to those steps or units clearly listed, but can include other steps or modules that are not clearly listed or inherent to these processes, methods, products or devices.

[0016] Embodiment one, as shown in the figure, a plating magnetic optimization method of a rare earth magnetic material, wherein the method comprises: Figure 1

[0017] Step A100: acquiring a historical plating magnetic database of the same kind of magnetic material of the rare earth magnetic material, wherein the historical plating magnetic database includes multiple sets of plating data sets.

[0018] In the embodiments of the present application, the rare earth magnetic material is a magnetic material containing rare earth metal elements and transition metal elements, and the types and proportions of metal elements are the key to distinguish the same kind of magnetic material. Through a specific plating process, the corrosion resistance, saturation magnetization, coercive force, Curie temperature and other magnetic properties can be optimized.

[0019] ​Specifically, before obtaining the historical plating magnetic database of the same kind of magnetic material of the rare earth magnetic material, first of all, the metal element composition of the target rare earth magnetic material is determined. For example, if the target material contains rare earth metal elements Sm, Dy in a ratio of 4:1 and transition metal elements Co, Cu in a ratio of 9:1, and the total proportion of rare earth metal elements is 25% and the total proportion of transition metal elements is 75%, then the same kind of magnetic material is selected as the benchmark.

[0020] Subsequently, the existing magnetic material plating records are traversed, and the metal element types and proportions of the magnetic material in the records are checked one by one. If a certain historical magnetic material contains Sm, Dy, Co, but lacks Cu, or the proportion of Sm and Dy is 3:2, which does not conform to the same standard, it will be excluded; only the magnetic material that contains Sm, Dy, Co, Cu and the proportion of each element is completely consistent with the target material is determined as the same kind of magnetic material.

[0021] For the selected same kind of magnetic material, collect its corresponding plating data set. Each data set needs to include specific plating process parameters, such as metal salt concentration in plating solution, reducing agent concentration, plating time, etc., and corresponding magnetic index parameters, such as corrosion resistance, saturation magnetization, coercivity, Curie temperature, etc. By collecting multiple plating data sets, a historical plating magnetic database containing multiple different process parameters and corresponding magnetic indexes is finally established.

[0022] By selecting the same kind of magnetic material and collecting multiple plating data sets, a historical plating magnetic database is established, which provides consistent and comparable basic data for subsequent extraction of magnetic index parameters and optimization analysis, ensuring the effectiveness of the subsequent optimization steps.

[0023] Step A200: Extract any magnetic index in the predetermined plating layer magnetic index, and traverse the target magnetic index parameter in the target plating data set, wherein the predetermined plating layer magnetic index at least includes corrosion resistance, saturation magnetization, coercivity and Curie temperature, and the target plating data set refers to any one of the multiple plating data sets.

[0024] Optionally, when processing the plating magnetic optimization of the rare earth magnetic material, first select any one from the predetermined plating layer magnetic index, wherein the predetermined plating layer magnetic index at least includes corrosion resistance, saturation magnetization, coercivity and Curie temperature, and the corresponding acquisition and quantification method is shown in Table 1. For example, the corrosion resistance index can be selected first, at which time the quantification method of the index needs to be determined, such as using the corrosion rate (unit: mm / year) in a specific corrosion environment as the measurement standard.

[0025] Table 1: Acquisition and quantification method of predetermined plating layer magnetic index

[0026]

[0027] Next, any one of the multiple sets of plating data is selected as a target plating data set. Assuming that the plating process parameters corresponding to the target plating data set are: metal salt concentration 30 g / L, reducing agent concentration 10 g / L, stabilizer concentration 5 g / L, rare earth salt concentration 2 g / L, and plating time 15 minutes. In the target plating data set, the magnetic index data corresponding to the above process parameters are recorded. At this time, the target plating data set needs to be traversed to find the specific value corresponding to corrosion resistance, for example, the corrosion resistance parameter under the process of this set of plating data set is 0.02 mm / year.

[0028] If the saturation magnetization is selected as any magnetic index, the same target plating data set is traversed. The saturation magnetization is usually in units of Tesla (T). After traversal, the saturation magnetization parameter corresponding to the process parameters in the target plating data set is 1.1 T. Similarly, if the coercivity or Curie temperature is selected, the corresponding target magnetic index parameters such as 800 kA / m and 370°C can also be obtained by traversing the same target plating data set.

[0029] By determining any magnetic index and traversing the target plating data set, the corresponding target magnetic index parameters are obtained, which provides specific quantifiable basic data for subsequent weighted calculation, and ensures the accuracy of the plating magnetic index calculation.

[0030] Step A300: Weighted calculation of the target magnetic index parameters combined with any predetermined weight of any magnetic index, to obtain a target plating magnetic index.

[0031] In an embodiment of the present application, before the weighted calculation, any predetermined weight of any magnetic index is first determined. These any predetermined weights can be set by those skilled in the art according to the actual application scene of rare earth magnetic materials, for example, in magnetic materials used for precision motors, the influence of saturation magnetization and coercivity is more significant, and each can be given a weight of 0.3, and corrosion resistance and Curie temperature each can be given a weight of 0.2; if used in high temperature environment equipment, the weight of Curie temperature can be increased to 0.4, and the weights of the remaining three are each 0.2.

[0032] Subsequently, the target magnetic index parameters obtained are retrieved, each magnetic index of the target magnetic index parameters has its original measurement data, and the units and ranges of these data are different, such as corrosion rate (mm / year) for corrosion resistance and Tesla (T) for saturation magnetization. In order to enable different indexes to be weighted calculated, they need to be converted to a unified scale, and the standardization step is as follows:

[0033] First, the value range of the original measurement data and historical data of each magnetic index needs to be determined. The minimum value corresponding to the worst performance (standardized value of 0) and the maximum value corresponding to the optimal performance (standardized value of 100) are included. For indexes such as saturation magnetization, coercivity, and Curie temperature, which have better performance with larger values, subtract the actual data from the minimum value, divide by the difference between the maximum value and the minimum value, and then multiply by 100 to get the standardized value. For indexes such as corrosion resistance, which have better performance with smaller values (such as corrosion rate), subtract the actual data from the maximum value, divide by the difference between the maximum value and the minimum value, and then multiply by 100 to get the standardized value. In this way, specific data with different units and ranges are converted into standardized values of 0-100.

[0034] Assume that the parameters corresponding to a target plating data set are: corrosion resistance standardized value 90, saturation magnetization standardized value 85, coercivity standardized value 90, and Curie temperature standardized value 80, with a full score of 100.

[0035] According to the set weights, the calculation process for the precision electric field scenario is: 90x0.2 + 85x0.3 + 90x0.3 + 80x0.2 = 18 + 25.5 + 27 + 16 = 86.5. This result is the target plating magnetic index corresponding to the target plating data set. If the weights for high-temperature environment are used, the calculation is 90x0.2 + 85x0.2 + 90x0.2 + 80x0.4 = 18 + 17 + 18 + 32 = 85, thus obtaining the corresponding target plating magnetic index.

[0036] By combining the predetermined weights of each magnetic index and performing weighted calculation on the target magnetic index parameters, the target plating magnetic index is obtained, which realizes the comprehensive quantification of multiple magnetic properties and provides a unified and comparable evaluation standard for subsequent optimization analysis targeting maximum index.

[0037] Step A400: Perform optimization analysis targeting maximum target plating magnetic index to obtain historical optimal plating process parameters.

[0038] Specifically, arrange the target plating data sets in descending order according to the target plating magnetic index to obtain a data set sequence, and take the plating process parameters of the first data set as the historical optimal plating process parameters. The specific steps are detailed in A410-A420.

[0039] Step A500: Perform plating magnetic optimization processing on the rare earth magnetic material according to the historical optimal plating process parameters.

[0040] Specifically, first, the rare earth magnetic material is pretreated, and impurities such as oil stains and oxide layers on the surface are removed through ultrasonic cleaning to ensure that the surface of the rare earth magnetic material is clean and to provide a good substrate for subsequent plating. It is assumed that the obtained historical optimal plating process parameters are: metal salt NiCl2concentration 45 g / L, reducing agent H2BO3concentration 20 g / L, stabilizer sodium citrate concentration 8 g / L, and rare earth salt LaCl3concentration 5 g / L, and the plating time is 20 minutes.

[0041] Subsequently, the plating solution is configured according to the above process parameters, and each component is added to deionized water in proportion and stirred until completely dissolved. The pH value of the plating solution is adjusted to a predetermined range, such as 5.5-6.0. The pretreated rare earth magnetic material is placed in the plating tank to ensure that it is completely immersed in the plating solution. The plating equipment is started, the temperature of the plating solution is controlled at 50°C, a stable current is passed, and the plating operation is performed for 20 minutes according to the above historical optimal plating time.

[0042] After plating is completed, the rare earth magnetic material is taken out of the plating tank, the surface is rinsed with deionized water to remove residual plating solution, and then placed in a drying box to dry at 80°C for 30 minutes to form a uniform and complete plating layer. After that, the treated rare earth magnetic material is detected for magnetic indicators, and the corrosion resistance corrosion rate, saturation magnetization, coercive force, and Curie temperature are measured. All indicators are better than the plating results without using the process parameters.

[0043] By pretreating, configuring the plating solution, plating operation, and post-processing according to the historical optimal plating process parameters, the quality of the plating layer of the rare earth magnetic material is effectively improved, and the comprehensive magnetic properties are optimized.

[0044] Further, step A100 in the method provided by the embodiment of the application comprises:

[0045] A110: The same kind of magnetic material refers to a magnetic material that is identical to the types and proportions of metal elements in the rare earth magnetic material, and the metal elements include rare earth metal elements and transition metal elements.

[0046] Specifically, when plating the rare earth magnetic material for magnetic optimization, the metal element composition of the target rare earth magnetic material needs to be determined first. It is assumed that the target rare earth magnetic material contains rare earth metal elements La and Nd in a ratio of 3:7 and transition metal elements Fe and Co in a ratio of 8:2, and the total proportion of rare earth metal elements is 30%, and the total proportion of transition metal elements is 70%.

[0047] Subsequently, in the process of collecting historical plating magnetic data, it is necessary to screen the existing different types of magnetic materials. The types of metal elements of these magnetic materials are checked one by one to confirm whether La, Nd, Fe and Co are contained at the same time; the proportions of each element are checked again to determine whether the proportion of La and Nd is 3:7, the proportion of Fe and Co is 8:2, and the total proportion of rare earth metal elements and transition metal elements is 3:7.

[0048] For example, if a certain historical magnetic material contains the above four elements, but the proportion of La and Nd is 2:8, even if other conditions are met, it will be excluded due to inconsistent element proportions; if a certain magnetic material lacks the transition metal element Co and only contains Fe, it will also be screened out. Only the magnetic material that completely meets the consistency of the types and proportions of metal elements with the target material will be included in the historical plating magnetic database of the same type of magnetic material.

[0049] Through the above screening steps, the data in the historical database is ensured to have high consistency and comparability with the target rare earth magnetic material, providing a reliable data basis for subsequent optimization of plating process parameters based on historical data, and further ensuring the accuracy of the optimized plating magnetic results.

[0050] Further, the step A400 in the method provided by the embodiment of the application comprises:

[0051] A410: arranging the target plating data sets in descending order according to the target plating magnetic index to obtain a data set sequence.

[0052] A420: obtaining the first data set in the data set sequence, and taking the plating process parameters in the first data set as the historical optimal plating process parameters.

[0053] Optionally, a plurality of target plating data sets are first determined, each target plating data set comprising a corresponding target plating magnetic index and specific plating process parameters. For example, it is assumed that there are six target plating data sets, and their corresponding target plating magnetic indices are 82, 90, 86, 93, 88 and 85, respectively, and each data set records specific process parameters such as the proportion of metal salts in the plating solution, the concentration of reducing agents, and the plating time.

[0054] Next, the six target plating data sets are arranged in descending order according to the target plating magnetic index. The positions of the data sets are adjusted in the order from large to small index, and the index of the data set sequence obtained after arrangement is 93, 90, 88, 86, 85 and 82, respectively. The position of each target plating data set in the data set sequence is determined by the size of its target plating magnetic index, and the target plating data set with a larger index is located at the front.

[0055] Afterwards, the first target plating dataset in the dataset sequence is extracted, i.e. the target plating dataset with index 93 in the above dataset sequence. The plating process parameters recorded in the target plating dataset, such as the concentration of rare earth salt in the plating solution, the concentration of stabilizer, the plating duration, etc., are determined as the historical optimal plating process parameters.

[0056] By arranging the target plating datasets in descending order of the magnetic index and selecting the process parameters of the first dataset, the historical optimal plating process parameters are quickly determined, which provides a direct and effective reference basis for the plating magnetic optimization of rare earth magnetic materials.

[0057] Further, the step A500 in the method provided by the embodiment of the application comprises:

[0058] A510: extracting any process index in the predetermined plating process index.

[0059] A520: matching any process parameter corresponding to the any process index in the historical optimal plating process parameters.

[0060] A530: calling a process increment strategy to incrementally process the any process parameter to obtain an any parameter domain.

[0061] A540: assembling an incremental optimization space based on the any parameter domain, and taking the plating magnetic prediction index as an optimization evaluation index to incrementally optimize the historical optimal plating process parameters to obtain target optimal plating process parameters.

[0062] A550: performing plating magnetic optimization processing on the rare earth magnetic material according to the target optimal plating process parameters.

[0063] Specifically, first, when extracting any process index in the predetermined plating process index, the plating solution component set containing metal salt, reducing agent, etc. is obtained, and the plating solution preparation process index set is formed based on the types and proportions thereof, and then the plating duration and the index set are taken as the predetermined plating process index. The specific steps are described in detail in A511-A513.

[0064] Before parameter matching, the specific content of the historical optimal plating process parameters determined needs to be determined. For example, the historical optimal plating process parameters include: the metal salt in the plating solution is nickel sulfate and cobalt chloride, the proportion is 5:2; the reducing agent is sodium hypophosphite, the proportion is 100%; the stabilizer is potassium sodium tartrate, the proportion is 100%; the rare earth salt is praseodymium nitrate, the proportion is 100%, and the plating duration is 22 minutes. These parameters jointly constitute the complete historical optimal process parameters.

[0065] Subsequently, any one of the predetermined plating process indicators is selected. For example, if the selected any process indicator is the type and proportion of metal salt, the corresponding content is searched in the historical optimal plating process parameters, and the specific type of metal salt is extracted from the above example as nickel sulfate and cobalt chloride, and the proportion of the two is 5:2, which is used as the any process parameter corresponding to the any process indicator.

[0066] If the selected any process indicator is the plating time, the specific value of the plating time, 22 minutes, is directly located in the historical optimal plating process parameters, and the value is determined as the corresponding any process parameter. Similarly, if the type of reducing agent is selected as the any process indicator, the type of reducing agent is matched to sodium hypophosphite.

[0067] Next, when the process increment strategy is used to incrementally process the any process parameter, if the any process parameter is the type of plating solution component, a type-based increment plan is extracted, and the corresponding predetermined same type component set is called as the any parameter domain of the parameter. The specific steps are described in detail in A531-A532. If the any process parameter is the proportion of the plating solution component or the plating time, a numerical value type increment plan is extracted, and its neighborhood is obtained as the any parameter domain of the parameter. The specific steps are described in detail in A533-A534.

[0068] Then, based on the any parameter domain, an increment optimization space is established, the process parameter is used as the independent variable, and the magnetic index parameter is used as the dependent variable for correlation analysis, a process factor set and a coefficient set are established, the plating magnetic index of the increment parameter is predicted and optimized, and the target optimal plating process parameter is obtained. The specific steps are described in detail in A541-A546.

[0069] When the rare earth magnetic material is subjected to plating magnetic optimization processing according to the target optimal plating process parameter, the rare earth magnetic material needs to be pretreated first. An alkaline cleaning solution, such as 5% sodium hydroxide solution, is used to clean the surface of the magnetic material to remove surface-attached oil stains, dust and other impurities. The cleaning time is controlled within 10 minutes, and then deionized water is used to rinse to neutralization. Then, 10% dilute hydrochloric acid is used for activation treatment for 3 minutes to remove the surface oxide layer and improve the adhesion between the plating layer and the substrate. After the treatment, the magnetic material is rinsed with deionized water and dried.

[0070] The pretreated rare earth magnetic material enters the plating stage, and the plating solution needs to be configured strictly according to the target optimal process parameter. For example, if the proportion of nickel sulfate and cobalt chloride of the metal salt in the target optimal plating process parameter is 3.3:1, the reducing agent concentration is 16 g / L, and the pH value is 5.8, the corresponding mass of nickel sulfate, cobalt chloride and reducing agent is accurately weighed, dissolved in deionized water in turn, and the pH value of the plating solution is adjusted to 5.8 with dilute sulfuric acid or sodium hydroxide solution after stirring uniformly. The plating solution is allowed to stand for 30 minutes until it is stable.

[0071] Meanwhile, the plating equipment parameters are set according to the optimal plating time (for example, 22 minutes) and temperature (for example, 50 DEG C). The plating bath temperature is heated to 50 DEG C and kept constant, the temperature fluctuation range is controlled within ±1 DEG C, the pretreated rare earth magnetic material is hung on the plating rack and immersed in the plating solution, and it is ensured that the surface of the rare earth magnetic material is completely contacted with the plating solution; if it is an electrolytic plating process, the power supply needs to be connected and the current density is adjusted to the optimal value, and the timing is started, and the parameters are kept stable within 22 minutes.

[0072] During the plating process, the plating solution temperature, pH value and current density are tracked in real time through the online monitoring system, and once the parameters deviate, for example, the temperature rises to 52 DEG C, the online monitoring system automatically starts the adjustment mechanism, for example, the cooling device is started, to ensure that the parameters are always within the optimal range. After the plating is completed, the rare earth magnetic material is immediately taken out of the plating solution, rinsed with deionized water for 3 times to remove the residual plating solution on the surface, and then placed in an 80 DEG C oven for drying for 30 minutes, to obtain the preliminarily optimized plated rare earth magnetic material.

[0073] Finally, the magnetic index of the optimized rare earth magnetic material is detected, the saturation magnetization and the coercive force are measured by using a magnetic performance tester, the corrosion resistance is evaluated by a salt spray test, and the index data before and after the optimization are compared, to verify the effectiveness and effect of the optimization effect.

[0074] By strictly implementing the steps of pretreatment, plating solution configuration, parameter control, post-treatment and performance detection, the target optimal plating process parameters are converted into actual operation, and finally the plating magnetism of the rare earth magnetic material is significantly improved.

[0075] Further, the step A510 in the method provided by the embodiment of the application includes:

[0076] A511: acquiring a plating solution component set, wherein the plating solution component set at least includes a metal salt, a reducing agent, a stabilizer and a rare earth salt.

[0077] A512: forming a plating solution preparation process index set based on the type and proportion of the metal salt, the type and proportion of the reducing agent, the type and proportion of the stabilizer and the type and proportion of the rare earth salt.

[0078] A513: taking the plating time and the plating solution preparation process index set as the predetermined plating process index.

[0079] In the embodiment of the application, the predetermined plating process index is the plating time and the plating solution preparation process index set formed based on the type and proportion of the metal salt, the type and proportion of the reducing agent, the type and proportion of the stabilizer and the type and proportion of the rare earth salt.

[0080] Specifically, when extracting the predetermined plating process indicators, the plating solution component set needs to be obtained first. This step collects various components required in the plating process, including at least metal salt, reducing agent, stabilizer, and rare earth salt. Specifically, the metal salt is a compound that provides plating metal ions, serving as the source of plating metal in plating and providing the basis for forming a metal plating layer on the surface of rare earth magnetic materials; the reducing agent can reduce metal ions in the plating solution to metal elements, promote the deposition of metal ions on the material surface, and ensure the formation of the plating layer; the stabilizer can inhibit unnecessary chemical reactions in the plating solution, prevent spontaneous precipitation of metal ions, maintain the stability and uniformity of the plating solution, and ensure the quality of the plating layer; the rare earth salt contains rare earth elements and can participate in the formation of the plating layer, helping to improve the magnetic properties, corrosion resistance, and other properties of the plating layer, and enhancing the overall plating effect of the rare earth magnetic material.

[0081] When selecting metal salt, reducing agent, stabilizer, and rare earth salt, the target of plating and the magnetic requirements of the material should be considered, and the same type of component in the historical optimal process should be given priority. The metal salt should be selected to provide the required metal ions for the plating layer and have good compatibility with the rare earth magnetic material; the reducing agent should be able to efficiently reduce metal ions to metal elements to ensure uniform deposition of the plating layer; the stabilizer should be selected to inhibit impurity reactions in the plating solution and maintain the stability of the plating solution; the rare earth salt should be selected from rare earth element compounds that help improve the material's corrosion resistance, saturation magnetization, and other magnetic indicators, and can be selected based on the predetermined component set in the process increment strategy.

[0082] For example, the metal salt can be selected from nickel sulfate and copper sulfate, the reducing agent can be selected from sodium hypophosphite, the stabilizer can be selected from sodium citrate, and the rare earth salt can be selected from lanthanum chloride. These components together form the basic composition of the plating solution.

[0083] Next, the plating solution preparation process indicator set is formed based on the types and proportions of the above components. Assuming that the ratio of nickel sulfate to copper sulfate in the metal salt is 4:1; the reducing agent is only sodium hypophosphite, with a proportion of 100%; the stabilizer is only sodium citrate, with a proportion of 100%; and the rare earth salt is only lanthanum chloride, with a proportion of 100%. These types of information and specific proportions together form the plating solution preparation process indicator set, which is used to regulate the preparation process of the plating solution.

[0084] Finally, the plating duration is included, and the plating solution preparation process indicator set is used as the predetermined plating process indicator. For example, the plating duration is set to a range of 15-25 minutes, combined with the previously formed plating solution preparation process indicator set, to completely define the key process indicators that need to be focused on during the plating process.

[0085] By obtaining the plating solution components, forming the plating solution preparation process indicator set, and including the plating duration, the specific content of the predetermined plating process indicators is clear, providing a clear and operable basis for subsequent matching of process parameters and incremental processing.

[0086] Further, the step A530 in the method provided by the embodiments of the present application comprises:

[0087] A531: If the arbitrary process parameter is a plating solution component type, extract a type-specific increment plan in the process increment strategy.

[0088] A532: According to the type-specific increment plan, retrieve a predetermined same-type component set corresponding to the plating solution component type, and take the predetermined same-type component set as the arbitrary parameter domain of the arbitrary process parameter.

[0089] Specifically, when processing the plating solution component type, first determine which type of plating solution component the current arbitrary process parameter is. For example, if the type of metal salt in the historical optimal plating process parameter is nickel sulfate, then the arbitrary process parameter at this time is the type of metal salt, nickel sulfate.

[0090] Subsequently, a type-specific increment plan for the type-specific parameter in the process increment strategy is retrieved. The type-specific increment plan is an adjustment scheme for different plating solution component types prepared by a person skilled in the art, which clearly divides the same-type replacement range of each type of component: for example, for the type of metal salt, the plan lists other types of metal salt similar in function to the current metal salt, such as copper sulfate, nickel chloride, etc. for the type of reducing agent, if sodium hypophosphite is currently used, the plan will include sodium borohydride, hydrazine hydrate, etc. for the types of stabilizer and rare earth salt, the plan will also list same-type components matching their properties, such as sodium tartrate for the current sodium citrate as a stabilizer, and praseodymium nitrate for the current lanthanum chloride as a rare earth salt. Through this preset, the type-specific increment plan can provide a clear replaceable component range for each type of plating solution component.

[0091] Then, according to the type-specific increment plan, a predetermined same-type component set corresponding to the current plating solution component type is further retrieved. Taking the type of metal salt, nickel sulfate, as an example, the corresponding predetermined same-type component set can include copper sulfate, nickel chloride, nickel nitrate, etc., which are all metal salts and suitable for similar plating systems; if the current parameter is the type of reducing agent, sodium hypophosphite, then the corresponding predetermined same-type component set can include sodium borohydride, hydrazine hydrate, etc. with similar functions.

[0092] Finally, the retrieved predetermined same-type component set is determined as the arbitrary parameter domain of the arbitrary process parameter. For example, the arbitrary parameter domain of the type of metal salt is {copper sulfate, nickel chloride, nickel nitrate}, and the arbitrary parameter domain of the type of reducing agent is {sodium borohydride, hydrazine hydrate}.

[0093] By determining the type parameter of the plating solution composition, calling the type increment plan and obtaining the corresponding predetermined same type composition set, an arbitrary parameter domain of the parameter is formed, which provides a clear range and basis for subsequent increment optimization space construction and more accurate process optimization.

[0094] Further, step A530 in the method provided by the embodiment of the application comprises:

[0095] A533: If the arbitrary process parameter is the plating solution composition ratio or the plating time length, a numerical increment plan in the process increment strategy is extracted.

[0096] A534: A neighborhood of the plating solution composition ratio or the plating time length is obtained according to the numerical increment plan, and the neighborhood of the plating solution composition ratio or the plating time length is taken as the arbitrary parameter domain of the arbitrary process parameter.

[0097] In one embodiment, when the arbitrary process parameter is the plating solution composition ratio or the plating time length, the specific type and value of the current arbitrary process parameter need to be determined first. For example, if the arbitrary process parameter is the ratio of nickel sulfate to cobalt chloride in the plating solution 3:1, or the plating time length is 20 minutes, the corresponding processing flow needs to be started for this type of numerical parameter.

[0098] Subsequently, a preset numerical increment plan in the process increment strategy is called. The preset numerical increment plan is a preset adjustment scheme in the process increment strategy for the plating solution composition ratio and the plating time length, which is a numerical parameter. The core of the numerical increment plan is to determine the specific adjustment rule of each type of numerical parameter: for the plating solution composition ratio, such as the ratio of nickel sulfate to cobalt chloride in the metal salt, the proportion of the reducing agent in the plating solution, etc., the numerical increment plan sets a specific floating ratio range, for example, 5%-15% up and down, and the specific value is determined by the technical personnel in the field according to the historical optimization experience or experimental data; for the plating time length, the numerical increment plan sets a fixed floating interval, for example, 2-5 minutes up and down, to ensure that the adjusted time length is still within the reasonable process range. The acquisition of this type of numerical increment plan is based on the historical process data of rare earth magnetic material plating, a large number of experimental verification results and the process optimization experience in the industry, which is pre-integrated and stored in the process increment strategy system. When the numerical process parameter needs to be incrementally processed, it can be directly extracted and called from the strategy.

[0099] Then, according to the numerical increment plan, the neighborhood of the parameter is calculated and obtained. Taking the ratio of nickel sulfate to cobalt chloride in the metal salt 3:1 as an example, according to the 10% floating calculation, its neighborhood can include 2.7:1, 3:0.9, 3.3:1, 3:1.1, etc. If the parameter is the plating time length of 20 minutes, according to the 3-minute floating calculation, its neighborhood is the interval of 17 minutes to 23 minutes.

[0100] Finally, the calculated neighborhood is determined as the arbitrary parameter domain of the arbitrary process parameter. For example, the arbitrary parameter domain of the metal salt ratio is {2.7:1, 3:0.9, 3.3:1, 3:1.1}, and the arbitrary parameter domain of the plating duration is [17 minutes, 23 minutes].

[0101] By specifying the numerical parameter type, calling the corresponding incremental plan, and calculating the neighborhood, the arbitrary parameter domain is formed, which provides a specific and controllable range for subsequent incremental optimization space and more precise process parameter optimization.

[0102] Further, the step A540 in the method provided by the embodiment of the application includes:

[0103] A541: taking the target plating process parameter in the target plating data set as an independent variable.

[0104] A542: taking the target magnetic index parameter as a dependent variable.

[0105] A543: performing correlation analysis on the independent variable and the dependent variable to obtain a correlation analysis result.

[0106] A544: establishing an arbitrary process factor set of the arbitrary magnetic index based on the correlation analysis result, and the arbitrary process factor set corresponds to an arbitrary factor coefficient set.

[0107] A545: obtaining a first incremental plating process parameter in the incremental optimization space, and combining the arbitrary process factor set and the arbitrary factor coefficient set to perform plating magneticity prediction on the first incremental plating process parameter to obtain a first prediction index.

[0108] A546: performing incremental optimization analysis with the maximum first prediction index as a target to obtain the target optimal plating process parameter.

[0109] Optionally, when the incremental optimization space is established based on the arbitrary parameter domain, the foregoing obtained arbitrary parameter domain needs to be integrated. These parameter domains can include a predetermined same type component set of plating solution component types (such as same type substitutes of metal salts), a neighborhood of plating solution component ratios (such as a range of floating up and down of a certain ratio), and a neighborhood of plating duration (such as an interval of floating up and down of a certain duration). All possible parameters in these parameter domains are combined to form a set containing multiple incremental process parameters, that is, an incremental optimization space, which provides a range for subsequent optimization.

[0110] In the incremental optimization space, firstly, the relationship between the variables is analyzed: the plating process parameters in the target plating data set, such as the type and proportion of metal salt, the concentration of reducing agent, and the plating time, are taken as independent variables, and the corresponding target magnetic index parameters, such as corrosion resistance, saturation magnetization, coercive force, and Curie temperature, are taken as dependent variables, to establish the basis for correlation analysis between the two.

[0111] Then, correlation analysis is performed on the independent variables and dependent variables, and appropriate statistical methods are selected according to the parameter types: for numerical process parameters such as metal salt proportion and plating time, and numerical magnetic indicators such as saturation magnetization and coercive force, Pearson correlation coefficient method is used to calculate the ratio of covariance and standard deviation product of the two data, to get a coefficient reflecting the degree of linear correlation, ranging from -1 to 1, the closer the absolute value of the coefficient is to 1, the stronger the linear correlation between the process parameter and the magnetic indicator; for type parameters such as reducing agent type and stabilizer type, and indicators such as corrosion resistance, point two column correlation or chi-square test can be used, and after converting the type parameters into virtual variables (such as a reducing agent type is recorded as 1, and others are recorded as 0), the correlation coefficient is calculated, or the deviation between the actual observation value and the theoretical expected value is tested to determine whether the change in the category is significantly related to the change in the indicator. During the process, the paired data of each process parameter and the corresponding magnetic indicator should be sorted out to ensure the completeness and matching of the data, and then the selected statistical formula is calculated, and finally the coefficient value or the significance level is obtained to determine the strength of the influence of each process parameter on the magnetic indicator, and the correlation analysis result is formed.

[0112] Based on the correlation analysis result, an arbitrary process factor set corresponding to each arbitrary magnetic index is established: the process parameters with strong correlation with the arbitrary magnetic index are selected as the main factors, and the corresponding coefficients are assigned to each factor according to the strength of the correlation, the stronger the correlation, the larger the coefficient, to quantify the influence weight of each process parameter on the magnetic index, and form the arbitrary process factor set and the corresponding arbitrary factor coefficient set.

[0113] Subsequently, the first incremental plating process parameter is selected from the incremental optimization space, and the arbitrary process factor set and the arbitrary factor coefficient set established above are combined to predict the plating magnetism under the incremental parameter through a pre-set calculation model, to get a first prediction index that comprehensively reflects each magnetic index, which is used to measure the optimization effect of the incremental parameter.

[0114] Among them, the preset calculation model is a weighted comprehensive prediction model based on the correlation between process factors and magnetic indicators. Its construction process is as follows: first, based on the correlation analysis results of the independent variable and the dependent variable, the process parameters that have a significant impact on each magnetic indicator are screened as an arbitrary process factor set, and each factor is assigned a corresponding weight according to the strength of the correlation, that is, an arbitrary factor coefficient set, and the size of the coefficient is positively correlated with the strength of the correlation; then, a predetermined weight is set for each magnetic indicator to reflect the importance of different indicators. The input of the model includes the first incremental plating process parameters in the incremental optimization space, the corresponding arbitrary process factor set and the arbitrary factor coefficient set. The output is the first prediction index obtained by calculation: first, for each magnetic indicator, the corresponding process factor and coefficient are weighted to obtain a single indicator prediction value; then, combined with the predetermined weights of each magnetic indicator, the single indicator prediction value is comprehensively weighted and summed, and finally the first prediction index reflecting the overall plating magnetic optimization effect is obtained.

[0115] Finally, with the goal of maximizing the first prediction index, the above prediction analysis is performed one by one on all incremental plating process parameters in the incremental optimization space, the prediction index corresponding to each parameter is compared, and the incremental plating process parameter with the largest prediction index is screened out and determined as the target optimal plating process parameter.

[0116] By establishing an incremental optimization space, analyzing variable correlations, quantifying the impact of process factors, predicting evaluation indexes and ultimately optimizing, we achieved fine-tuning of the historically optimal process parameters, thereby obtaining the target optimal process parameters that can further improve the magnetic properties of rare earth magnetic material plating.

[0117] In summary, the method for optimizing the plating magnetic properties of rare earth magnetic materials provided in the embodiments of the present application has the following technical effects:

[0118] The present application obtains a historical plating magnetic database of similar magnetic materials of rare earth magnetic materials, extracts predetermined plating magnetic indicators, which include at least corrosion resistance, saturation magnetization intensity, coercive force and Curie temperature, and then traverses to obtain target magnetic index parameters, combines them with predetermined weights for weighted calculation to obtain target plating magnetic index, obtains historical optimal plating process parameters through optimization analysis, and then obtains target optimal plating process parameters through incremental optimization and processes them, thereby optimizing the plating magnetic properties of rare earth magnetic materials, making the plating magnetic optimization effect of rare earth magnetic materials more accurate and reliable, and achieving the technical effect of optimizing the plating effect of rare earth magnetic materials and improving their comprehensive magnetic properties.

[0119] Example 2, as Figure 2 As shown, based on the same inventive concept as the aforementioned embodiment 1, the embodiment of the present application provides a plating magnetic optimization system for rare earth magnetic materials, the system comprising:

[0120] A historical plating magnetic database acquisition module 1 is configured to acquire a historical plating magnetic database of a same kind of magnetic material of the rare earth magnetic material, wherein the historical plating magnetic database comprises a plurality of plating data sets.

[0121] A target magnetic index parameter acquisition module 2 is configured to extract any magnetic index in a predetermined plating layer magnetic index, and traverse the any magnetic index in a target plating data set to obtain a target magnetic index parameter, wherein the predetermined plating layer magnetic index at least comprises corrosion resistance, saturation magnetization, coercive force and Curie temperature, and the target plating data set refers to any one of the plurality of plating data sets.

[0122] A target plating magnetic index acquisition module 3 is configured to perform weighted calculation on the target magnetic index parameter by combining any predetermined weight of the any magnetic index to obtain a target plating magnetic index.

[0123] A historical optimal plating process parameter acquisition module 4 is configured to perform optimization analysis with the maximum target plating magnetic index as the target to obtain a historical optimal plating process parameter.

[0124] A plating magnetic optimization execution module 5 is configured to perform plating magnetic optimization processing on the rare earth magnetic material according to the historical optimal plating process parameter.

[0125] Further, the historical plating magnetic database acquisition module 1 is configured to perform the following steps:

[0126] The same kind of magnetic material refers to a magnetic material with the same kind and proportion of metal elements as those in the rare earth magnetic material, and the metal elements include rare earth metal elements and transition metal elements.

[0127] Further, the historical optimal plating process parameter acquisition module 4 is configured to perform the following steps:

[0128] The target plating data set is arranged in descending order according to the target plating magnetic index to obtain a data set sequence; a first data set in the data set sequence is acquired, and a plating process parameter in the first data set is taken as the historical optimal plating process parameter.

[0129] Further, the plating magnetic optimization execution module 5 is configured to perform the following steps:

[0130] extracting any process index in the predetermined plating process index; matching any process parameter corresponding to the any process index in the historical optimal plating process parameter; calling the process increment strategy to incrementally process the any process parameter to obtain an any parameter domain; based on the any parameter domain, assembling an increment optimization space, and taking a plating magnetic prediction index as an optimization evaluation index to incrementally optimize the historical optimal plating process parameter to obtain a target optimal plating process parameter; and performing plating magnetic optimization processing on the rare earth magnetic material according to the target optimal plating process parameter.

[0131] Further, the plating magnetic optimization execution module 5 is configured to perform the following steps:

[0132] obtaining a plating solution component set, wherein the plating solution component set at least includes a metal salt, a reducing agent, a stabilizer and a rare earth salt; based on the types and proportions of the metal salt, the types and proportions of the reducing agent, the types and proportions of the stabilizer and the types and proportions of the rare earth salt, forming a plating solution preparation process index set; and taking a plating time length and the plating solution preparation process index set as the predetermined plating process index.

[0133] Further, the plating magnetic optimization execution module 5 is configured to perform the following steps:

[0134] If the any process parameter is a plating solution component type, extracting a sub-type increment plan in the process increment strategy; according to the sub-type increment plan, calling a predetermined same-type component set corresponding to the plating solution component type, and taking the predetermined same-type component set as the any parameter domain of the any process parameter.

[0135] Further, the plating magnetic optimization execution module 5 is configured to perform the following steps:

[0136] If the any process parameter is a plating solution component proportion or a plating time length, extracting a numerical value type increment plan in the process increment strategy; according to the numerical value type increment plan, obtaining a neighborhood of the plating solution component proportion or the plating time length, and taking the neighborhood of the plating solution component proportion or the plating time length as the any parameter domain of the any process parameter.

[0137] Further, the plating magnetic optimization execution module 5 is configured to perform the following steps:

[0138] The target plating process parameters in the target plating data set are taken as independent variables, the target magnetic index parameters are taken as dependent variables, correlation analysis is performed on the independent variables and the dependent variables to obtain a correlation analysis result, an arbitrary process factor set of the arbitrary magnetic index is established based on the correlation analysis result, and the arbitrary process factor set corresponds to an arbitrary factor coefficient set; a first incremental plating process parameter in the incremental optimization space is obtained, and the first incremental plating process parameter is subjected to plating magnetic property prediction in combination with the arbitrary process factor set and the arbitrary factor coefficient set to obtain a first prediction index; and the first prediction index is taken as a target for incremental optimization analysis to obtain the target optimal plating process parameter.

[0139] In embodiment three, the application further provides a computer readable storage medium, which can be used to store software programs, computer executable programs and modules, such as program instructions / modules corresponding to the plating magnetic property optimization method of the rare earth magnetic material in the embodiments of the application, so as to realize the plating magnetic property optimization method of the rare earth magnetic material.

[0140] It should be understood that the embodiments disclosed in the application and the above description can enable those skilled in the art to implement the application. Meanwhile, the application is not limited to the part of the embodiments mentioned above, and it should be understood that those skilled in the art can still modify the technical solutions recorded in the foregoing embodiments or make equivalent replacement to some technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the application, and should be included in the protection scope of the application.

Claims

1. A method for optimizing the plating magnetic properties of rare earth magnetic materials, characterized in that: include: Acquire a historical plating magnetic database of similar magnetic materials of the rare earth magnetic material, wherein the historical plating magnetic database includes multiple sets of plating data sets; Extracting any magnetic index from the predetermined magnetic indexes of the coating, and traversing the arbitrary magnetic index in the target coating data set to obtain a target magnetic index parameter, wherein the predetermined magnetic index of the coating at least includes corrosion resistance, saturation magnetization, coercive force, and Curie temperature, and the target coating data set refers to any one of the multiple sets of coating data sets; performing weighted calculation on the target magnetic index parameter in combination with any predetermined weight of the arbitrary magnetic index to obtain a target plating magnetic index; Performing optimization analysis with the maximum target plating magnetic index as the goal to obtain historical optimal plating process parameters; Performing a plating magnetic optimization process on the rare earth magnetic material according to the historical optimal plating process parameters; Wherein, after the rare earth magnetic material is subjected to the plating magnetic optimization treatment according to the historical optimal plating process parameters, the method further includes: Extracting any process index from predetermined plating process indexes; Matching any process parameter corresponding to the arbitrary process indicator in the historical optimal plating process parameters; Retrieving a process increment strategy to perform incremental processing on the arbitrary process parameters to obtain an arbitrary parameter domain; An incremental optimization space is established based on the arbitrary parameter domain, and the plating magnetic prediction index is used as an optimization evaluation index to perform incremental optimization on the historical optimal plating process parameters to obtain the target optimal plating process parameters; Performing a plating magnetic optimization process on the rare earth magnetic material according to the target optimal plating process parameters; Wherein, extracting any process index among the predetermined plating process indexes includes: Obtaining a plating solution component set, wherein the plating solution component set at least includes a metal salt, a reducing agent, a stabilizer, and a rare earth salt; forming a set of process indicators for preparing a plating solution based on the type and ratio of the metal salt, the type and ratio of the reducing agent, the type and ratio of the stabilizer, and the type and ratio of the rare earth salt; Using the plating time and the plating solution preparation process index set as the predetermined plating process index; The process increment strategy is called to perform incremental processing on the arbitrary process parameters to obtain an arbitrary parameter domain, including: If the arbitrary process parameter is the type of plating solution component, extracting the type-based incremental plan in the process incremental strategy; Retrieving a predetermined set of similar components corresponding to the types of plating solution components according to the type-based incremental plan, and using the predetermined set of similar components as the arbitrary parameter domain of the arbitrary process parameter; The process increment strategy is called to perform incremental processing on the arbitrary process parameters to obtain an arbitrary parameter domain, including: If the arbitrary process parameter is a plating solution component ratio or a plating time, extracting a numerical incremental plan in the process incremental strategy; The neighborhood of the plating solution component ratio or the plating time is obtained according to the numerical incremental plan, and the neighborhood of the plating solution component ratio or the plating time is used as the arbitrary parameter domain of the arbitrary process parameter.

2. The method for optimizing the plating magnetic properties of rare earth magnetic materials according to claim 1, wherein: The same type of magnetic material refers to a magnetic material having the same type and ratio of metal elements as those in the rare earth magnetic material, and the metal elements include rare earth metal elements and transition metal elements.

3. The method for optimizing the plating magnetic properties of rare earth magnetic materials according to claim 1, wherein: An optimization analysis is performed with the maximum target plating magnetic index as the goal to obtain the historical optimal plating process parameters, including: Arranging the target plating data set in descending order based on the target plating magnetic index to obtain a data set sequence; A first data set in the data set sequence is obtained, and the plating process parameters in the first data set are used as the historical optimal plating process parameters.

4. The method for optimizing the plating magnetic properties of rare earth magnetic materials according to claim 1, wherein: An incremental optimization space is established based on the arbitrary parameter domain, and the plating magnetic prediction index is used as the optimization evaluation index to perform incremental optimization on the historical optimal plating process parameters to obtain the target optimal plating process parameters, including: Using the target plating process parameters in the target plating data set as independent variables; Taking the target magnetic index parameter as a dependent variable; Performing a correlation analysis on the independent variable and the dependent variable to obtain a correlation analysis result; An arbitrary process factor set of the arbitrary magnetic index is formed based on the correlation analysis result, and the arbitrary process factor set corresponds to an arbitrary factor coefficient set; Obtaining a first incremental plating process parameter in the incremental optimization space, and predicting plating magnetism of the first incremental plating process parameter by combining the arbitrary process factor set and the arbitrary factor coefficient set to obtain a first prediction index; An incremental optimization analysis is performed with the goal of maximizing the first prediction index to obtain the target optimal plating process parameters.

5. A plating magnetic optimization system for rare earth magnetic materials, characterized in that: The system for implementing the method for optimizing the plating magnetic properties of rare earth magnetic materials according to any one of claims 1 to 4 comprises: A historical plating magnetic database acquisition module is used to acquire a historical plating magnetic database of similar magnetic materials of the rare earth magnetic material, wherein the historical plating magnetic database includes multiple sets of plating data sets; a target magnetic index parameter acquisition module, configured to extract any magnetic index from predetermined coating magnetic indexes, and traverse the arbitrary magnetic index in a target coating data set to obtain target magnetic index parameters, wherein the predetermined coating magnetic index includes at least corrosion resistance, saturation magnetization, coercive force, and Curie temperature, and the target coating data set refers to any one of the multiple coating data sets; a target plating magnetic index acquisition module, configured to perform weighted calculation on the target magnetic index parameter in combination with any predetermined weight of the arbitrary magnetic index to obtain the target plating magnetic index; A historical optimal plating process parameter acquisition module is used to perform optimization analysis with the maximum target plating magnetic index as the goal, and obtain the historical optimal plating process parameters; The plating magnetic optimization execution module is used to perform plating magnetic optimization processing on the rare earth magnetic material according to the historical optimal plating process parameters.

6. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the program is executed by a processor, the method for optimizing the plating magnetic properties of a rare earth magnetic material according to any one of claims 1 to 4 is implemented.

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