Nanoimprint apparatus and method of imprinting

Abstract

The application provides a nano-imprinting device and an imprinting method for improving production efficiency, which can be applied to the field of micro-nano manufacturing technology. The nano-imprinting device comprises: at least two platforms, each of which is used for placing a substrate; a platform moving guide rail, which is provided with a predetermined position and is used for carrying the at least two platforms, so that the at least two platforms can move to or move out of the predetermined position along the platform moving guide rail, and only one platform is allowed to be located at the predetermined position at the same time; and an imprinting head, which is arranged at the opposite side of the predetermined position in the platform moving guide rail, is used for placing an imprinting template, and performs an imprinting operation on the substrate on the platform in the predetermined position by using the imprinting template. The embodiments of the application all have the advantage of improving the nano-imprinting efficiency.

Description

Technical Field

[0001] The present application relates to the field of micro-nano manufacturing technology, specifically to nanoimprint lithography technology, and more specifically to a nanoimprint device and an imprint method. Background Art

[0002] Nanoimprint lithography (NIL) is a high-resolution, low-cost micro-nanofabrication technology widely used in semiconductors, optical devices, biomedicine, and other fields. It achieves precise pattern transfer by directly replicating the nanostructures on an imprint template onto a substrate. Traditional nanoimprinting methods include hot stamping and UV-curing stamping.

[0003] Despite the numerous advantages of nanoimprint technology, traditional single-table nanoimprint equipment has some significant limitations. Existing single-table nanoimprint equipment has long production cycles, is difficult to meet the needs of large-scale production, and has low production efficiency. Summary of the Invention

[0004] In view of the above problems, the present application provides a nanoimprinting device and an imprinting method for improving production efficiency.

[0005] According to the first aspect of the present application, a nanoimprinting device is provided, comprising: at least two platforms, each platform being used to place a substrate; a platform moving guide rail, which is provided with a predetermined position and is used to carry at least two platforms, so that the at least two platforms can be moved to or out of the predetermined position along the platform moving guide rail, and only one platform is allowed to be at the predetermined position at the same time; and an imprinting head, which is arranged on the opposite side of the predetermined position in the platform moving guide rail, is used to place an imprinting template, and uses the imprinting template to perform an imprinting operation on the substrate on the platform at the predetermined position.

[0006] According to an embodiment of the present application, at least two platforms can move to or out of a predetermined position along the platform moving guide rail, including: at least two platforms can move to a predetermined position through the first part of the platform moving guide rail, and can move out of the predetermined position through the second part of the platform moving guide rail.

[0007] According to an embodiment of the present application, at least two platforms can be moved to or out of a predetermined position along the platform moving guide rail, including: at least one of the at least two platforms is moved to or out of the predetermined position through an independent part corresponding to the platform moving guide rail.

[0008] According to an embodiment of the present application, there are two platforms; the two platforms can be moved to or out of the predetermined position from the platform moving guide rail parts on different sides of the predetermined position.

[0009] According to an embodiment of the present application, the platform moving guide rail is a single guide rail, the predetermined position is located in the middle of the single guide rail, and the two platforms can be moved to or out of the predetermined position from the platform moving guide rail parts on both sides of the predetermined position.

[0010] According to an embodiment of the present application, the nanoimprinting device also includes: a gluing device, which is arranged on the opposite side of other positions on the platform moving guide rail that are different from the predetermined position, and the gluing device is used to perform gluing operations on a substrate on the platform that is not at the predetermined position.

[0011] According to an embodiment of the present application, the nanoimprinting device also includes: an automated control system; the automated control system includes a machine vision system and a controller; the machine vision system is used to capture an image of the substrate; and the controller is used to adjust the relative position of the imprint template and the substrate according to the image of the substrate.

[0012] According to an embodiment of the present application, the nanoimprinting device further includes: a detection and calibration module; the detection and calibration module is used to adjust the position parameters of the imprinting head according to the image of the substrate during the imprinting process.

[0013] The second aspect of the present application provides a nanoimprinting method, which is applied to the above-mentioned nanoimprinting equipment, including: placing a first platform at a predetermined position on a platform moving guide rail, and placing at least one second platform other than the first platform at a position other than the predetermined position on the platform moving guide rail, and performing an imprinting operation on a substrate on the first platform placed at the predetermined position; moving the first platform that has completed the imprinting operation out of the predetermined position, and moving any one of the at least one second platform to the predetermined position, and performing an imprinting operation on the substrate on the second platform placed at the predetermined position.

[0014] According to an embodiment of the present application, the first platform is placed at a predetermined position on the platform moving guide rail, and at least one second platform other than the first platform is placed at a position other than the predetermined position on the platform moving guide rail, and further includes: performing a wafer placement or glue application operation on at least one second platform.

[0015] In the embodiments of the present application, while one platform is performing imprinting, other platforms can be performing template loading, glue application, or unloading operations, allowing different platforms to perform imprinting operations at different times, thereby improving the production efficiency of the imprinting equipment. The embodiments of the present application have the advantage of improving nanoimprinting efficiency, overcoming the shortcomings of existing nanoimprinting equipment such as low production efficiency, high cost, and complex operation, and achieving rapid, high-quality batch production of nanostructures. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The above contents and other objects, features and advantages of the present application will become more apparent through the following description of the embodiments of the present application with reference to the accompanying drawings, in which:

[0017] Figure 1 A schematic diagram of the structure of a nanoimprinting device according to an embodiment of the present application is shown;

[0018] Figure 2 Schematically shows a structural diagram of a second nanoimprinting device according to an embodiment of the present application;

[0019] Figure 3 Schematically shows a structural diagram of a third nanoimprinting device according to an embodiment of the present application;

[0020] Figure 4 Schematically shows a structural diagram of a fourth nanoimprinting device according to an embodiment of the present application;

[0021] Figure 5 Schematically shows a structural diagram of a fifth nanoimprinting device according to an embodiment of the present application;

[0022] Figure 6 Schematically shows a structural diagram of a sixth nanoimprinting device according to an embodiment of the present application;

[0023] Figure 7 Schematically shows a seventh structure diagram of a nanoimprinting device according to an embodiment of the present application;

[0024] Figure 8 A schematic diagram showing a wafer 1 placed on an imprinting equipment platform 1 according to an embodiment of the present application is shown;

[0025] Figure 9 A schematic diagram of an imprinting device according to an embodiment of the present application showing a wafer 1 being sprayed with glue while a wafer 2 is placed on a platform 2 is shown;

[0026] Figure 10 A schematic diagram of an imprinting device according to an embodiment of the present application is shown in which wafer 1 is imprinted and wafer 2 is sprayed with glue at the same time;

[0027] Figure 11 A schematic diagram of a state in which the imprinting device according to an embodiment of the present application replaces wafer 1 with wafer 3 while wafer 2 is imprinting is shown;

[0028] Figure 12 A schematic diagram showing a state in which the imprinting device according to an embodiment of the present application replaces wafer 1 with wafer 3 while wafer 2 is imprinting another wafer; and

[0029] Figure 13 The figure schematically shows a flow chart of an imprinting method according to an embodiment of the present application.

[0030] It should be noted that, for the sake of clarity, in the drawings used to describe the embodiments of the present application, the sizes of the overall / local structures or overall / local areas may be enlarged or reduced, that is, these drawings are not drawn according to the actual scale. DETAILED DESCRIPTION

[0031] Hereinafter, embodiments of the present application will be described with reference to the accompanying drawings. However, it should be understood that these descriptions are exemplary only and are not intended to limit the scope of the present application. In the detailed description below, for ease of explanation, many specific details are set forth to provide a comprehensive understanding of the embodiments of the present application. However, it is apparent that one or more embodiments may also be implemented without these specific details. In addition, in the following description, descriptions of known structures and technologies are omitted to avoid unnecessarily confusing the concepts of the present application.

[0032] The terms used herein are only for describing specific embodiments and are not intended to limit the present application. The terms "comprise," "include," etc. used herein indicate the presence of features, steps, operations, and / or components, but do not exclude the presence or addition of one or more other features, steps, operations, or components.

[0033] All terms used herein (including technical and scientific terms) have the meanings commonly understood by those skilled in the art unless otherwise defined. It should be noted that the terms used herein should be interpreted as having a meaning consistent with the context of this specification and should not be interpreted in an idealized or overly rigid manner.

[0034] When expressions such as "at least one of A, B, and C, etc." are used, they should generally be interpreted in accordance with the meaning commonly understood by those skilled in the art (for example, "a system having at least one of A, B, and C" should include but is not limited to a system having A alone, B alone, C alone, A and B, A and C, B and C, and / or A, B, C, etc.).

[0035] In order to facilitate a better understanding of the concept of the embodiments of the present application and one or more specific implementation details, the terms involved in some embodiments of the present application are first explained as follows.

[0036] In nanoimprint technology, the substrate is the base material that carries the final nanostructure pattern and serves as the "receptor" of the imprinting process. It is typically a solid thin sheet with a certain degree of flatness and surface activity. Common materials include silicon wafers (wafers), glass, metal foil, polymer films, etc. The surface condition of the substrate (such as roughness and cleanliness) directly affects the transfer quality of the imprinted pattern. Pretreatment (such as coating with photoresist or functional layer) is often required before imprinting to enhance compatibility with the imprint template.

[0037] An imprint template is the "master" used for pattern transfer in nanoimprint technology. Its surface is pre-machined with a nanoscale or micrometer-scale pattern that complements the target structure. The template material must be hard, wear-resistant, and chemically stable to ensure pattern accuracy and reusability. Common materials include quartz, silicon, silicon nitride, nickel, and diamond-coated materials.

[0038] Existing nanoimprinting technology has at least the following problems: Nanoimprinting operations are usually carried out in a closed and clean environment to ensure process quality. The entire process is completed in a closed and clean environment to prevent external contamination from affecting the imprinting results. Existing single-table nanoimprinting equipment can only process one substrate or wafer at a time, resulting in a long production cycle and difficulty in meeting the needs of large-scale production. Due to low production efficiency, the manufacturing cost of each nanoimprinted product is also high. The imprinting operation requires frequent loading, imprinting and unloading of the imprinting template, which increases the possibility of manual intervention and errors. Frequent operations and complex process flows increase the maintenance cost of the equipment.

[0039] The embodiments of the present application provide a nanoimprinting device and an imprinting method, which can not only significantly improve production efficiency, but also reduce production costs, simplify operating procedures, and have good stability and reliability.

[0040] Figure 1 The figure schematically shows a structure diagram of a nanoimprinting device according to an embodiment of the present application.

[0041] like Figure 1 As shown, a nanoimprinting device of an embodiment of the present application includes: at least two platforms, each platform is used to place a substrate; a platform moving guide rail, which is provided with a predetermined position and is used to carry at least two platforms, so that at least two platforms can move to or out of the predetermined position along the platform moving guide rail, and only one platform is allowed to be at the predetermined position at the same time; and an imprinting head, which is arranged on the opposite side of the predetermined position in the platform moving guide rail, is used to place an imprinting template, and uses the imprinting template to perform an imprinting operation on the substrate on the platform at the predetermined position.

[0042] The embossing head of this embodiment can be located above the platform moving guide rail, and when the embossing head moves downward, the embossing operation on the substrate is realized. The embossing head can adjust the height and pressure as needed to adapt to different types of substrates and templates.

[0043] In this embodiment, the number of platforms can be N, where N is a positive integer greater than or equal to 2. The N platforms can be used to place substrates respectively. The N platforms can be reciprocated to or from predetermined positions via platform moving guide rails.

[0044] When the device of this embodiment is used to perform an imprint operation, taking a semiconductor wafer as an example, the specific process is described as follows.

[0045] 1) Open the window at the initial platform position and place the imprint template and pre-processed wafers 1, 2, ..., and N on platform 1, platform 2, ..., and platform N, respectively. Close the operation window. The machine vision system automatically identifies the wafer positions and adjusts the relative position of the imprint template and substrate. For example, the platform can be moved or rotated to achieve coarse adjustments, while the imprint head can be moved to fine-tune the relative position. These adjustments ensure better alignment during the imprint operation, resulting in a product that meets the desired requirements.

[0046] This embodiment also allows for different operation windows to be set for each platform to prevent cross-operation between platforms and to avoid prolonged exposure of products to air. For example, the window at platform 1 is opened, pre-processed wafer 1 is placed on platform 1, and the operation window is closed; the window at platform 2 is then opened, pre-processed wafer 2 is placed on platform 2, and the operation window is closed; ... and the window at platform N is then opened, pre-processed wafer N is placed on platform N, and the operation window is closed.

[0047] This embodiment also allows for the next step to proceed without waiting for wafer placement operations on all platforms to complete. For example, when platform 1 moves to the glue dispenser, the window on platform 2 is opened, and pre-processed wafer 2 is placed on platform 2. When platform 2 moves to the glue dispenser, the window on platform 3 is opened, and pre-processed wafer 3 is placed on platform 3. Similar operations are performed on the other platforms. When platform N-1 moves to the glue dispenser, the window on platform N is opened, and pre-processed wafer N is placed on platform N. Unless otherwise specified, in this embodiment, operations are generally performed sequentially according to the platform order.

[0048] 2) Move platform 1 to the glue dispenser. The device calculates the glue spraying parameters based on the imprinted pattern and dispenses glue accordingly. Then, move platform 2 to the glue dispenser. The device calculates the glue spraying parameters based on the imprinted pattern and dispenses glue accordingly. Perform similar operations on the other platforms, moving platform N to the glue dispenser. The device calculates the glue spraying parameters based on the imprinted pattern and dispenses glue accordingly. This step is performed in the same order as above and will not be repeated here.

[0049] The glue adding device can be, for example, a glue spraying device or a glue coating device, that is, the glue is added to any one of the interface surfaces of the substrate and the embossing template by spraying or smearing. Preferably, the glue can be a photosensitive glue.

[0050] Similarly, this embodiment may not require the gluing operation of all platforms to be completed before proceeding to the next step. For example, when platform 1 completes the gluing operation, it proceeds to step 3), platform 2 proceeds to step 2), and platform 4 proceeds to step 1).

[0051] 3) After applying glue, platform 1 is moved under the stamping head for stamping. Similarly, platform 2, ..., and platform N are moved under the stamping head for stamping. If multiple application and stamping operations are required on a single platform, two platforms can be grouped together, and each pair of platforms can be alternately applied and stamped. For example, platform 1 and platform 2 can be grouped together to set the process steps, which will not be detailed here.

[0052] 4) After platform 1 completes imprinting, a window is opened to move platform 1 out of the predetermined position and replace the wafer on platform 1. In this embodiment, after platform 1, platform 2, ..., platform N complete the imprinting operation, all platforms can be returned to their initial positions and the window opened to replace the wafer.

[0053] refer to Figure 1 In this embodiment, the two platforms can be reciprocated along the platform moving guide rail to or from the predetermined position. The so-called reciprocating movement to or from the predetermined position can be understood to include the following working methods.

[0054] Method 1: Platforms 1, 2, ..., and N are positioned at the far right of the nanoimprinting system before imprinting. During nanoimprinting, platforms 1, 2, ..., and N gradually move leftward to the designated position for imprinting. Platforms that have completed imprinting continue to move leftward, freeing up the designated position for the next platform to imprint. When all platforms have completed nanoimprinting, platforms 1, 2, ..., and N move rightward to their far right position, opening a window to swap wafers for the next batch of imprints. This forms a "reciprocating" movement to and from the designated positions.

[0055] Method 2: Platforms 1, 2, ..., and N are positioned at the far right of the nanoimprinting apparatus before imprinting. During nanoimprinting, platforms 1, 2, ..., and N gradually move leftward to the designated position for imprinting. The platform that has completed imprinting continues to move leftward, freeing up the designated position for the next platform to imprint. When a platform completes nanoimprinting, the wafer is replaced to the left of the designated position. When all platforms have completed imprinting and wafer replacement, the platforms move rightward, bringing each platform to its designated position in turn. Imprinting is then performed on platform N, then platform N-1, ..., platform 2, and finally platform 1, forming a "reciprocating" movement to and from the designated position.

[0056] The above two methods have different impacts on the design of nanoimprint equipment. For method 1, all platforms must complete nanoimprinting before platform 1, platform 2, ..., platform N can move to the rightmost side to open the window and replace the wafer. This improves production efficiency compared to existing technologies. For method 2, in order to complete wafer replacement and prepare for imprinting on the left side of the predetermined position, more operating windows, glue coating devices, and more operating space need to be designed. At the same time, since it is necessary to wait for other platforms to complete imprinting and replace wafers before the next batch of imprinting can be carried out, production efficiency is improved compared to existing technologies.

[0057] In this embodiment, when the platform 1 is performing the wafer replacement operation, the imprinting operation can be performed on the platform 2, the gluing operation can be performed on the platform 3, and the wafer placement operation can be performed on the platform 4.

[0058] In this embodiment, while one platform is performing imprinting, other platforms can be performing template loading, glue application, or unloading operations, allowing different platforms to perform imprinting operations at different times, thereby improving the production efficiency of the imprinting equipment. The embodiments of the present application have the advantage of improving nanoimprinting efficiency, overcoming the shortcomings of existing nanoimprinting equipment such as low production efficiency, high cost, and complex operation, and achieving rapid, high-quality batch production of nanostructures.

[0059] In some embodiments of the present application, at least two platforms can move to or out of a predetermined position along a platform moving guide rail, including: at least two platforms can move to a predetermined position through a first part of the platform moving guide rail, and can move out of a predetermined position through a second part of the platform moving guide rail.

[0060] Figure 2 The structure of a second nanoimprinting device according to an embodiment of the present application is schematically shown.

[0061] In the embodiments of the present application, a portion of the platform movement guide rail can be a portion of the guide rail that is integrally connected to the guide rail, or a separate and detachable guide rail segment. In the embodiments of the present application, all guide rails in the device are considered as a whole, and a section of the guide rail or a portion of a section of the guide rail is referred to as a portion, regardless of whether it is a separate guide rail segment.

[0062] like Figure 2 As shown, the platform motion guide rails of this embodiment include a first portion and a second portion. Platform 1, Platform 2, ..., and Platform N can be moved to or from a predetermined position via different portions of the platform motion guide rails. For example, before imprinting, Platform 1, Platform 2, ..., and Platform N are all located on the first portion of the platform motion guide rails. After Platform 1 completes the imprinting operation, it is moved out of the predetermined position via the second portion of the platform motion guide rails. Similarly, after Platform 2, ..., and Platform N-1 complete the imprinting operation, they are moved out of the predetermined position via the second portion of the platform motion guide rails.

[0063] In this embodiment, at least two platforms can be moved to a predetermined position by the first portion of the platform movement guide rail and moved out of the predetermined position by the second portion of the platform movement guide rail. This arrangement of this embodiment allows the platform that has completed the imprinting operation first to be moved out in a timely manner, preventing the substrate from being unable to be replaced due to the subsequent platform not completing the imprinting operation, thereby improving production efficiency.

[0064] In some embodiments of the present application, at least two platforms can be moved to or out of a predetermined position along a platform moving guide rail, including: at least one of the at least two platforms is moved to or out of the predetermined position through an independent part corresponding to the platform moving guide rail.

[0065] In this embodiment, reference Figure 2 , platform 2, ..., platform N moves to or out of the predetermined position through the first part of the platform moving guide rail; platform 1 moves to or out of the predetermined position through the second part of the platform moving guide rail. The first part of the platform moving guide rail and the second part of the platform moving guide rail can be two separate guide rail segments, or different parts of a guide rail. Platform 1 is on the second part of the platform moving guide rail before stamping, is at the predetermined position during stamping, and moves out of the predetermined position through the second part of the platform moving guide rail after the stamping operation is completed. Platform 2, ..., platform N is always on the first part of the platform moving guide rail before, during, and after the stamping operation. Platform 1 moves back and forth to or out of the predetermined position through the second part of the platform moving guide rail. Platform 2, ..., platform N moves back and forth to or out of the predetermined position through the first part of the platform moving guide rail.

[0066] This embodiment further enhances the production flexibility of platforms with separate platform motion guides by providing separate platform motion guides for some or all platforms. For example, after completing an imprint operation, platform 1 can continue to replace substrates, apply glue, and move to a predetermined position for further imprinting, regardless of the imprinting sequence of platforms 2, ..., and N. This embodiment enhances the operational flexibility and priority of platform 1. When platform 1 is performing high-priority or multiple imprint operations, it can be easily inserted into the production sequence of platforms 2, ..., and N. By providing separate platform motion guides for some or all platforms, the production flexibility of platforms with separate platform motion guides is enhanced.

[0067] In some embodiments of the present application, there are two platforms; the two platforms can be moved to or out of the predetermined position from the platform moving guide rail parts on different sides of the predetermined position.

[0068] Figure 3 The third nanoimprinting device structure according to the embodiment of the present application is schematically shown. Figure 3As shown, the equipment includes platform 1 and platform 2. The platform moving guide rail parts where platform 1 and platform 2 are located are at right angles in the plane of the platform moving guide rail. Platform 1 and platform 2 can respectively move to or out of the predetermined position along the platform moving guide rail parts where they are located to perform imprinting operations. For example, platform 1 moves to or out of the predetermined position along the platform moving guide rail part in the north-south direction, and performs imprinting when it moves to the predetermined position, and platform 2 moves to or out of the predetermined position along the platform moving guide rail part in the east-west direction. Specifically, after platform 1 completes wafer placement, it moves south to the predetermined position, and after completing imprinting, it moves out of the predetermined position to the north to replace the wafer. After platform 2 completes wafer placement and moves out of the predetermined position on platform 1, it moves west to the predetermined position, and after completing imprinting, it moves out of the predetermined position to the east to replace the wafer. In this way, platform 1 and platform 2 move to the predetermined positions alternately.

[0069] Figure 4 The fourth nanoimprinting device structure diagram according to the embodiment of the present application is schematically shown. Figure 4 As shown, the apparatus includes platform 1 and platform 2. The platform guide rails of platform 1 and platform 2 intersect and are parallel in the horizontal plane. The location where the two platform guide rails intersect is the predetermined position. Platform 1 can be moved to or from the predetermined position using the left platform guide rail, and platform 2 can be moved to or from the predetermined position using the right platform guide rail, for imprinting operations.

[0070] Each of the two workstations can simultaneously handle different tasks (such as loading, stamping, and unloading), allowing for parallel operation. Each workstation is equipped with an independent drive mechanism and control system to ensure precise and synchronized movement.

[0071] In this embodiment, there are two platforms, each of which moves on its own platform guide rail. This significantly reduces the impact of operations such as adding glue and replacing substrates on the two platforms. Furthermore, the staggered platform guide rails act as a limiter for platform movement. This embodiment reduces the number and complexity of mechanical components, thereby improving the reliability and durability of the equipment. The simplified mechanical structure reduces equipment failure rates, extends service life, reduces downtime, and enhances production continuity.

[0072] In some embodiments of the present application, the platform moving guide rail is a single guide rail, the predetermined position is located in the middle of the single guide rail, and the two platforms can move to or out of the predetermined position from the platform moving guide rail parts on both sides of the predetermined position.

[0073] Figure 5 The fifth nanoimprinting device structure according to the embodiment of the present application is schematically shown. Figure 5As shown, the equipment includes a single guide rail. A single guide rail can be understood as a complete, unsegmented rail. Platform 1 can move back and forth on one side of a predetermined position on the single guide rail to and from the predetermined position. Platform 2 can move back and forth on the other side of the predetermined position on the single guide rail to and from the predetermined position. Platforms 1 and 2 perform operations such as placing substrates, applying glue, and replacing substrates on their respective sides.

[0074] A single guide rail serves as the support and motion platform for the entire system. This design allows two workstations to move independently on the same platform rail. Compared to multi-platform systems, this reduces the number and complexity of mechanical components, lowering equipment failure rates and maintenance costs.

[0075] The single-rail design of this embodiment makes the equipment more compact, further reduces the number and complexity of mechanical components, and improves the reliability and durability of the equipment. The simplified mechanical structure reduces the equipment's failure rate, extends its service life, reduces downtime, and improves production continuity.

[0076] In some embodiments of the present application, the nanoimprinting device further includes: a gluing device, which is arranged on the opposite side of a position on the platform moving guide rail that is different from the predetermined position, and the gluing device is used to perform gluing operations on a substrate on the platform that is not at the predetermined position.

[0077] In this embodiment, there can be one or more glue adding devices.

[0078] Figure 6 The sixth nanoimprinting device structure diagram according to the embodiment of the present application is schematically shown. Figure 6 As shown, the position on the platform moving guide rail where the stamping head faces is the predetermined position. A glue adding device can be provided on the opposite side of a position on the platform moving guide rail other than the predetermined position. The glue adding device can be, for example, a glue spray head, glue dripping, glue coating, or other different glue adding methods.

[0079] In this embodiment, a glue spray head is provided as a glue application device. In this embodiment, a crossbeam can be provided, and the direction of the crossbeam can be consistent with the direction of the platform movable guide rail. Glue spray head 1 and glue spray head 2 are respectively provided at opposite ends of the crossbeam relative to the platform movable guide rail. The glue spray head can also be provided at other positions on the crossbeam relative to the platform movable guide rail and can be adjusted as needed. A dual glue spray system can be located outside the platform for glue spraying operations before imprinting. The dual glue spray system can be set to adjust the amount of glue sprayed according to different graphics.

[0080] When gluing is required, platform 1 or platform 2 moves along the platform moving guide rail to a position relative to glue spray head 1 or glue spray head 2, respectively, to perform glue spraying. In this embodiment, glue spray head 1 is provided for platform 1, and glue spray head 2 is provided for platform 2, so that the platforms can be moved along the platform moving guide rail to the glue spraying device for glue spraying, and the glue spraying operation can be completed independently on different sides of platform 1 and platform 2.

[0081] In this embodiment, the glue spraying device is located on the opposite side of the platform's moving guide rail, different from the predetermined position, to facilitate the platform's movement along the platform's moving guide rail to the glue spraying device for glue spraying. Furthermore, the provision of glue application devices for different side platforms eliminates the need for different platforms to be moved to a single position in the equipment for glue application, facilitating process design and improving production efficiency.

[0082] In some embodiments of the present application, the nanoimprinting device further includes: an automated control system; the automated control system includes a machine vision system and a controller; the machine vision system is used to capture an image of the substrate; and the controller is used to adjust the relative position of the imprint template and the substrate according to the image of the substrate.

[0083] Figure 7 The seventh nanoimprinting device structure according to the embodiment of the present application is schematically shown. Figure 7 As shown, the main body of the automated control system of the nanoimprinting equipment can be set on the crossbeam. The machine vision system is set at a position where it can capture the image of the substrate. In this embodiment, when there is a deviation in the placement of the substrate, based on the image of the substrate captured by the machine vision system, it is determined that the relative position of the imprint template and the substrate needs to be fine-tuned in the horizontal plane. The controller controls the motor to drive the platform to move or rotate to adjust the position of the imprint template. The controller can also control the motor to drive the imprint head to move to fine-tune the relative position of the imprint template and the substrate.

[0084] The automated control system can also be equipped with sensors to achieve automated operation and real-time monitoring. Advanced synchronous control algorithms ensure that the two workbenches move in unison, guaranteeing the accuracy and stability of the stamping.

[0085] In this embodiment, the machine vision system can capture images to grasp the status of the substrate in real time. The controller adjusts the relative position and direction of the template and the substrate accordingly, realizing closed-loop control and reducing manual intervention, thereby improving accuracy and efficiency.

[0086] In some embodiments of the present application, the nanoimprinting device further includes: a detection and calibration module; the detection and calibration module is used to adjust the position parameters of the imprinting head according to the image of the substrate during the imprinting process.

[0087] When multiple imprints are required on the same wafer, inspection and calibration operations are required after completing one imprint. Specifically, a machine vision system can be used to capture images of the substrate during the imprint process. The position parameters of the imprint head can be adjusted based on the image of the previous imprint to prevent overlap of the imprint patterns or excessive gaps between the imprint patterns. This embodiment uses the inspection and calibration module to capture the imprint pattern detected by the substrate, and then adjusts the position parameters of the imprint head based on the captured image to ensure that the imprint pattern meets the requirements during the imprint process, and that there is no overlap of the imprint patterns or excessive gaps between the imprint patterns, thereby improving accuracy and stability.

[0088] Based on the above nanoimprinting equipment method, this application also provides a nanoimprinting method. Figures 8 to 13 The method is described in detail.

[0089] In some embodiments of the present application, a nanoimprinting method includes: placing a first platform at a predetermined position on a platform moving guide rail, and placing at least one second platform other than the first platform at a position other than the predetermined position on the platform moving guide rail, and performing an imprinting operation on a substrate on the first platform placed at the predetermined position; moving the first platform that has completed the imprinting operation out of the predetermined position, and moving any one of the at least one second platform to the predetermined position, and performing an imprinting operation on the substrate on the second platform placed at the predetermined position.

[0090] In this embodiment, different platforms can be moved to and from predetermined positions via platform motion guides to perform imprinting operations. This allows for continuous imprinting operations on substrates on different platforms, improving nanoimprinting efficiency and overcoming the shortcomings of existing nanoimprinting equipment, such as low production efficiency, high cost, and complex operation, to enable rapid, high-quality batch manufacturing of nanostructures.

[0091] In some embodiments of the present application, the first platform is placed at a predetermined position on the platform moving guide rail, and at least one second platform other than the first platform is placed at a position other than the predetermined position on the platform moving guide rail, further comprising: performing a wafer placement or glue application operation on at least one second platform.

[0092] In this embodiment, while one platform is performing imprinting, other platforms can perform template loading, gluing or unloading operations, that is, different platforms can perform imprinting operations at different times, thereby improving the production efficiency of the imprinting equipment.

[0093] In this embodiment, while another platform is performing imprinting, the platform that has completed the imprinting operation can perform template loading, glue adding or unloading operations, that is, different platforms can perform imprinting operations at different times, thereby improving the production efficiency of the imprinting equipment.

[0094] The process of the nanoimprinting method using a single-guide-rail dual-stage nanoimprinting device of the present application is described as follows. Figure 13 A flow chart of an imprinting method according to an embodiment of the present application is schematically shown. Figure 13 As shown, the imprinting method includes the following steps.

[0095] 1) Platform 1 and Platform 2 are initialized.

[0096] 2) Place the wafer on platform 1.

[0097] Figure 8 FIG. 1 shows a schematic diagram of placing a wafer 1 on an imprinting device platform 1 according to an embodiment of the present application. Figure 8 As shown, the window at the platform 1 is opened, the pre-processed wafer 1 is placed on the platform 1, and the operation window is closed. The position and direction of the substrate are automatically identified by the machine vision system.

[0098] 3) Platform 1 moves to the glue spraying area and the wafer is placed on platform 2.

[0099] Figure 9 The schematic diagram of the imprinting device according to the embodiment of the present application is shown as follows: wafer 1 is sprayed with glue while wafer 2 is placed on platform 2. Figure 9 As shown, the imprinting equipment automatically moves platform 1 to glue head 1. The equipment calculates the glue spraying parameters based on the imprinted pattern and sprays glue according to these parameters. At the same time, the window at platform 2 is opened, the pre-processed wafer 2 is placed on platform 2, and the operation window is closed.

[0100] 4) Platform 1 moves to the embossing stage and platform 2 moves to the glue spraying stage.

[0101] Figure 10 The schematic diagram of the imprinting device according to the embodiment of the present application is shown as follows: wafer 1 is imprinted while wafer 2 is sprayed with glue. Figure 10 As shown, after the glue spraying is completed, the platform 1 moves to the bottom of the imprinting head for imprinting operation. At the same time, the imprinting equipment automatically moves the platform 2 to the glue spraying head 2 and sprays glue according to the same graphic glue spraying parameters.

[0102] 5) Platform 1 moves to the initial position to replace the wafer, and platform 2 moves to imprint.

[0103] Figure 11 A schematic diagram of a state in which the imprinting device according to an embodiment of the present application replaces wafer 1 with wafer 3 while imprinting wafer 2 is performed is shown. Figure 12 A schematic diagram of a state in which the imprinting device according to an embodiment of the present application replaces wafer 1 with wafer 3 while wafer 2 is imprinting another state is shown.

[0104] After the imprinting is completed, platform 1 moves to the initial position. Figure 11 As shown, open the window and replace wafer 1 with wafer 3, as shown in Figure 12At the same time, after the glue spraying is completed, the platform 2 moves to the bottom of the stamping head for stamping operation.

[0105] 6) Platform 1 moves to the glue spraying position, and platform 2 moves to the initial position to replace the wafer.

[0106] 7) Determine whether the loop has ended. If not, skip to step 4). If yes, skip to step 8.

[0107] 8) Platform 1 and Platform 2 complete the current imprinting operation and return to their respective initial positions.

[0108] The above operating platforms work alternately. During the stamping process, the synchronous control system ensures that the movements of the two workbenches are coordinated and consistent to avoid errors caused by time difference.

[0109] The single-guide-track, dual-stage nanoimprinting equipment of this embodiment can achieve the following effects.

[0110] 1) Significantly improve production efficiency:

[0111] Parallel operation: The single-track dual-table design enables template loading, stamping, and unloading processes to be carried out in parallel. While stamping is being performed on one workbench, the other workbench can be loading or unloading templates, thus significantly shortening the entire production cycle.

[0112] Fast switching: The fast switching between the two workstations reduces waiting time and further improves production efficiency. This efficient alternating operation mode significantly increases the number of impressions completed per unit time.

[0113] 2) Reduced manufacturing and maintenance costs: The single-rail design reduces the number and complexity of mechanical components, lowering equipment failure rates and maintenance costs. The compact design also saves valuable laboratory or production workshop space.

[0114] 3) Simplified Mechanical Structure, Improved Reliability: The single-rail design makes the equipment more compact, reduces the number and complexity of mechanical components, and improves its reliability and durability. The simplified mechanical structure reduces equipment failure rates, extends service life, reduces downtime, and improves production continuity.

[0115] Those skilled in the art will appreciate that the features described in the various embodiments of this application may be combined and / or coupled in various ways, even if such combinations or couplings are not explicitly described in this application. In particular, the features described in the various embodiments of this application may be combined and / or coupled in various ways without departing from the spirit and teachings of this application. All such combinations and / or couplings fall within the scope of this application.

Claims

1. A nanoimprinting device, characterized in that: include: at least two platforms, each of the platforms being used to place a substrate; a platform moving guide rail having a predetermined position and being used to carry the at least two platforms, so that the at least two platforms can be moved to or out of the predetermined position along the platform moving guide rail, and only one of the platforms is allowed to be in the predetermined position at the same time; the platform moving guide rail is a single guide rail, the predetermined position is located in the middle of the single guide rail, and the at least two platforms can be moved to or out of the predetermined position from the platform moving guide rail portions on both sides of the predetermined position; a gluing device, the gluing device being disposed on an opposite side of a position on the platform moving guide rail that is different from the predetermined position, and being used to perform a gluing operation on the substrate on the platform that is not at the predetermined position; as well as The imprint head is arranged at the opposite side of the predetermined position in the platform moving guide rail, and is used to place an imprint template and perform an imprint operation on the substrate on the platform at the predetermined position using the imprint template.

2. The device according to claim 1, characterized in that The at least two platforms can be moved to or out of the predetermined position along the platform moving guide rail, comprising: The at least two platforms can be moved to the predetermined position by a first portion of the platform moving guide rail, and can be moved out of the predetermined position by a second portion of the platform moving guide rail.

3. The device according to claim 1, characterized in that The at least two platforms can be moved to or out of the predetermined position along the platform moving guide rail, comprising: At least one of the at least two platforms is moved to or out of the predetermined position by an independent portion corresponding to the platform moving guide rail.

4. The device according to claim 3, characterized in that The number of the platforms is two.

5. The device according to any one of claims 1 to 4, characterized in that Also includes: Automatic control system; the automatic control system includes a machine vision system and a controller; The machine vision system is used to collect images of the substrate; The controller is used to adjust the relative position of the imprint template and the substrate according to the image of the substrate.

6. The device according to claim 5, characterized in that Also includes: Detection and calibration module; the detection and calibration module is used to adjust the position parameters of the imprint head according to the image of the substrate during the imprint process.

7. A nanoimprinting method, applied to the device according to any one of claims 1 to 6, characterized in that: include: Positioning a first platform at a predetermined position on a platform moving guide rail, positioning at least one second platform other than the first platform at a position on the platform moving guide rail different from the predetermined position, and performing an imprint operation on a substrate positioned on the first platform at the predetermined position; The first platform that has completed the imprinting operation is moved out of the predetermined position, and any one of the at least one second platform is moved to the predetermined position, and an imprinting operation is performed on the substrate placed on the second platform at the predetermined position.

8. The method according to claim 7, characterized in that The method of placing the first platform at a predetermined position on the platform moving guide rail and placing at least one second platform other than the first platform at another position on the platform moving guide rail different from the predetermined position further includes: performing a wafer placement or glue application operation on the at least one second platform.

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