Substrate processing apparatus, method for controlling substrate processing apparatus, and substrate transfer apparatus

Abstract

The invention provides a substrate processing apparatus, a control method of the substrate processing apparatus, and a substrate conveying apparatus. The substrate processing apparatus includes a transfer robot having two robot hands, and a control unit. The upper and lower supporting intervals of the two supporting surfaces of the two manipulators are set to be consistent with the upper and lower loading intervals of the two loading surfaces of the two substrate loading tables. The control unit performs a first robot advancing operation that advances the first robot, delivers the substrate to the first substrate mounting table, and performs a first robot retreating operation that retreats the first robot. The control unit performs a second robot advancing operation that advances the second robot, receives the second substrate from the second substrate mounting table, and performs a second robot retreating operation that retreats the second robot. The control unit causes the first robot backward movement and the second robot forward movement to be performed in parallel.

Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus for processing a substrate, a control method for the substrate processing apparatus, and a substrate transport apparatus. Examples of substrates include semiconductor substrates, substrates for FPDs (Flat Panel Displays), glass substrates for photomasks, optical disc substrates, magnetic disk substrates, ceramic substrates, and solar cell substrates. Examples of FPDs include liquid crystal displays and organic EL (electroluminescence) displays. Background Art

[0002] The substrate processing apparatus includes a coating block, a developing block, and an interface block arranged horizontally in a row (see, for example, Japanese Patent Application Laid-Open No. 2009-010291). Each of the coating block, the developing block, and the interface block includes a substrate transfer robot. For example, a loading platform (loading unit) is provided between the coating block and the developing block. The loading platform is used to transfer substrates between a first substrate transfer robot in the coating block and a second substrate transfer robot in the developing block.

[0003] For example, three pins are provided on the upper surface of the mounting table (see, for example, Japanese Patent Application Laid-Open No. 2020-053428). The substrate transport robot includes two manipulators arranged in two upper and lower layers (see, for example, Japanese Patent Application Laid-Open No. 2019-068057). Summary of the Invention

[0004] Problems to be solved by the invention

[0005] The conventional substrate transport robot places the first substrate on the transfer stage and receives the second substrate from the return stage as follows. In addition, the lower robot currently holds the first substrate, and the upper robot does not hold the second substrate.

[0006] First, the substrate transport robot advances its lower arm and uses it to place the first substrate on the transfer stage. The lower arm, no longer supporting the first substrate, then retracts. The substrate transport robot then raises its upper arm to a predetermined height to receive the second substrate from the return stage. The substrate transport robot then advances its upper arm and uses it to receive the second substrate from the return stage. The upper arm, still holding the second substrate, then retracts.

[0007] However, such an operation may be time-consuming, and thus the substrate transport efficiency may not meet the user's requirements.

[0008] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate processing apparatus, a method for controlling a substrate processing apparatus, and a substrate transport apparatus capable of improving substrate transport efficiency.

[0009] Solutions to Problems

[0010] The present invention adopts the following structure to achieve such a purpose. That is, the substrate processing device of the present invention processes the substrate, and is characterized by comprising: a first substrate transport robot, which has a first manipulator and a second manipulator arranged vertically, and can transfer the substrate relative to the first and second loading tables arranged vertically by moving the first manipulator and the second manipulator; and a control unit, wherein the first manipulator is configured to support a first substrate in a horizontal posture, and the second manipulator is configured to support a second substrate in a horizontal posture, and the upper and lower support intervals between the substrate support surface of the first manipulator and the substrate support surface of the second manipulator are set to be consistent with the upper and lower loading intervals between the loading surface of the substrate on the first loading table and the loading surface of the substrate on the second loading table, and the control unit performs the first manipulator forward movement to make the first manipulator supporting the first substrate move toward the first loading table, By relatively lifting and lowering the first robot and the first loading platform, the first substrate is delivered to the first loading platform by the first robot, and then the first robot retreat action is performed to retreat the first robot from the first loading platform. In addition, the second robot advance action is performed to advance the second robot toward the second loading platform. By relatively lifting and lowering the second robot and the second loading platform, the second substrate is received from the second loading platform by the second robot, and then the second robot retreat action is performed to retreat the second robot supporting the second substrate from the second loading platform. The control unit performs either a process of performing the first robot retreat action and the second robot advance action in parallel or a process of performing the first robot advance action and the second robot retreat action in parallel.

[0011] In the substrate processing apparatus of the present invention, the vertical support spacing between the two support surfaces of the first and second manipulators is set to coincide with the vertical loading spacing between the two loading surfaces of the first and second loading tables. For example, the first manipulator's retracting motion, which causes the first manipulator to retract after placing the first substrate on the first loading table, and the second manipulator's forward motion, which causes the second manipulator to advance to receive the second substrate from the second loading table, are performed in parallel. This shortens the total time from the start of the first manipulator's retracting motion to the completion of the second manipulator's forward motion. Consequently, substrate transport efficiency can be improved.

[0012] In addition, the above-mentioned substrate processing device is preferably further provided with: a processing block, which performs pre-set processing on multiple substrates individually; and an interface block, which is connected to the above-mentioned processing block and carries substrates in and out relative to an external device, and the above-mentioned first substrate transport robot is arranged in the above-mentioned interface block, and the above-mentioned first substrate transport robot carries out substrate transfer relative to the above-mentioned first loading platform and the above-mentioned second loading platform arranged on the above-mentioned external device.

[0013] In recent years, the processing efficiency of external devices has been continuously improved. Therefore, there is a concern that the external device may wait for the interface block to transport the substrate. Therefore, for example, it is considered to increase the number of substrate transport robots used to transport substrates to and from the external device. However, from the perspective of cost and space, this is not preferred. According to the present invention, the support interval between the first manipulator and the second manipulator of the substrate transport robot of the interface block is set to be consistent with the loading interval between the first loading platform and the second loading platform of the external device. Therefore, the substrate transport efficiency of the substrate transport robot of the interface block can be improved. As a result, the occurrence of the situation where the external device waits for the interface block to transport the substrate can be prevented.

[0014] In the substrate processing apparatus described above, an example of the external device is an exposure device, which can prevent the exposure device from waiting for the interface block to transfer the substrate.

[0015] In the substrate processing apparatus, the control unit may, for example, cause the first robot to move backward and the second robot to move forward in parallel. This improves substrate transfer efficiency during the series of operations, from delivering the first substrate to the first stage to retrieving the substrate from the second stage.

[0016] In addition, the above-mentioned substrate processing device is preferably further provided with: a first processing block, which performs a predetermined first processing on multiple substrates individually; a second processing block, which performs a predetermined second processing on the above-mentioned multiple substrates individually; the above-mentioned first loading table and the above-mentioned second loading table, which are arranged vertically at the boundary between the above-mentioned first processing block and the above-mentioned second processing block; and a second substrate transfer robot, which has a third robot and a fourth robot arranged vertically, and transfers substrates relative to the above-mentioned first loading table and the above-mentioned second loading table by moving the above-mentioned third robot and the above-mentioned fourth robot, the above-mentioned first substrate transfer robot is arranged in the above-mentioned first processing block, and the above-mentioned second substrate transfer robot is arranged in the above-mentioned second processing block, the above-mentioned third robot is configured to support the above-mentioned first substrate in a horizontal posture, and the above-mentioned fourth robot is configured to support a third substrate in a horizontal posture, and the upper and lower second support intervals between the substrate supporting surface of the above-mentioned third robot and the substrate supporting surface of the above-mentioned fourth robot are set to be equal to the upper and lower second support intervals between the loading surface of the substrate supported by the above-mentioned first loading table and the loading surface of the substrate supported by the above-mentioned second loading table. The above-mentioned loading intervals above and below the loading surface of the substrate are consistent, and the above-mentioned control unit performs a third robot forward movement to make the above-mentioned third robot advance toward the above-mentioned first loading platform, and by making the above-mentioned third robot and the above-mentioned first loading platform relatively rise and fall, the above-mentioned third robot is used to receive the above-mentioned first substrate from the above-mentioned first loading platform, and then performs a third robot backward movement to make the above-mentioned third robot supporting the above-mentioned first substrate retreat from the above-mentioned first loading platform. In addition, the fourth robot forward movement is performed to make the above-mentioned fourth robot supporting the above-mentioned third substrate advance toward the above-mentioned second loading platform, and by making the above-mentioned fourth robot and the above-mentioned second loading platform relatively rise and fall, the above-mentioned fourth robot is used to deliver the above-mentioned third substrate to the above-mentioned second loading platform, and then, performs a fourth robot backward movement to make the above-mentioned fourth robot retreat from the above-mentioned second loading platform. The above-mentioned control unit performs either one of the processes of making the above-mentioned third robot retreat movement and the above-mentioned fourth robot advance movement in parallel and the process of making the above-mentioned fourth robot retreat movement and the above-mentioned third robot advance movement in parallel.

[0017] The first and second loading tables are located at the boundary between the first and second processing blocks. Furthermore, the first substrate transfer robot in the first processing block and the second substrate transfer robot in the second processing block access the first and second loading tables. This improves the efficiency of transporting substrates placed via the first and second loading tables by both the first and second substrate transfer robots.

[0018] In addition, in the control method of the substrate processing device of the present invention, the substrate processing device processes the substrate, and the control method of the substrate processing device is characterized in that the above-mentioned substrate processing device is provided with a first substrate transporting robot, and the first substrate transporting robot has a first manipulator and a second manipulator arranged vertically, and by moving the above-mentioned first manipulator and the above-mentioned second manipulator, the substrate can be transferred relative to the first and second loading tables arranged vertically, the above-mentioned first manipulator is configured to support a first substrate in a horizontal posture, and the above-mentioned second manipulator is configured to support a second substrate in a horizontal posture, and the upper and lower supporting intervals between the substrate supporting surfaces of the above-mentioned first manipulator and the substrate supporting surfaces of the above-mentioned second manipulator are set to be consistent with the upper and lower loading intervals between the loading surfaces of the substrate on the above-mentioned first loading table and the loading surfaces of the substrate on the above-mentioned second loading table, and the above-mentioned control method comprises: moving the above-mentioned first manipulator supporting the above-mentioned first substrate toward the above-mentioned first loading table. A first robot advancing process; a first loading process of delivering the first substrate to the first loading table by the first robot by relatively lifting and lowering the first robot and the first loading table; a first robot retreating process of retreating the first robot from the first loading table after the first loading process; a second robot advancing process of advancing the second robot toward the second loading table; a first receiving process of receiving the second substrate from the second loading table by the second robot and the second loading table; and a second robot retreating process of retreating the second robot supporting the second substrate from the second loading table after the first receiving process, performing either a process in which the first robot retreating process and the second robot advancing process are performed in parallel or a process in which the first robot advancing process and the second robot retreating process are performed in parallel.

[0019] The control unit performs a first robot movement to move the first robot supporting the first substrate toward the first loading platform and the second robot supporting the second substrate. By relatively lifting and lowering the first robot and the first loading platform, the first substrate is delivered to the first loading platform by the first robot, and then the first robot retreats the first robot from the first loading platform. In addition, the second robot advances the second robot toward the second loading platform. By relatively lifting and lowering the second robot and the second loading platform, the second substrate is received from the second loading platform by the second robot, and then the second robot retreats the second robot supporting the second substrate from the second loading platform. The control unit performs either a process of performing the first robot retreat movement and the second robot advance movement in parallel or a process of performing the first robot advance movement and the second robot retreat movement in parallel.

[0020] Effects of the Invention

[0021] According to the substrate processing apparatus, the control method of the substrate processing apparatus, and the substrate transporting apparatus of the present invention, the transport efficiency of the substrate can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a top view showing the substrate processing apparatus of the embodiment.

[0023] Figure 2 It is a longitudinal sectional view showing a substrate processing apparatus according to an embodiment.

[0024] Figure 3 It is along Figure 1 A longitudinal sectional view of the interface block when viewed along arrow Q.

[0025] Figure 4 It is a side view showing two transfer robots and two substrate placement tables.

[0026] Figure 5It is a plan view showing two manipulators and an advance and retreat portion of each transfer robot in the coating process block and the development process block.

[0027] Figure 6 This is a top view of the transport robot showing the interface block.

[0028] Figure 7 It is a side view showing the transport robot of the interface block and two substrate mounting tables of the exposure device.

[0029] Figure 8 This is a flowchart for explaining the operation of the substrate processing apparatus.

[0030] Figures 9A to 9D It is a diagram for explaining the operation of the transfer robot.

[0031] Figures 10A to 10C It is a side view for explaining the operation of the transfer robot of the coating process block.

[0032] Figures 11A to 11C It is a side view for explaining the operation of the transfer robot of the coating process block.

[0033] Figures 12A to 12C It is a side view for explaining the operation of the transport robot of the development processing block.

[0034] Figures 13A to 13C It is a side view for explaining the operation of the transport robot of the development processing block.

[0035] Figures 14A to 14C This is a side view for explaining the operation of the transport robot of the interface block.

[0036] Figures 15A to 15C This is a side view for explaining the operation of the transport robot of the interface block.

[0037] Figure 16 1 is a diagram for explaining the effects of the embodiment.

[0038] In the picture:

[0039] 1—substrate processing device, 3—coating processing block, 4—development processing block, 5—interface block, EXP—exposure device, TR1, TR2, TR3, TR4—transfer robot, PS2, PS7, PS31, PS32—substrate loading table, 39, 40 (39A, 40A, 39B, 40B)—manipulator, JK1, JK2—support interval, SF1, SF2—support surface, CK1, CK2—loading interval, PF1, PF2—loading surface, TR8—transfer robot, 57, 58—manipulator , 71—loading unit, 81—control unit, 83—storage unit, FW1—forward movement of the first robot, FW2—forward movement of the second robot, FW3—forward movement of the third robot, FW4—forward movement of the fourth robot, BW1—backward movement of the first robot, BW2—backward movement of the second robot, BW3—backward movement of the third robot, BW4—backward movement of the fourth robot, PL1, PL2—loading movement, RE1, RE2—receiving movement, W (W7, W8, W9, W11, W12)—substrate. DETAILED DESCRIPTION

[0040] Hereinafter, embodiments of the present invention will be described.

[0041] [Example]

[0042] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Figure 1 It is a top view showing the substrate processing apparatus 1 according to the embodiment. Figure 2 It is a longitudinal sectional view showing the substrate processing apparatus 1 . Figure 3 It is along Figure 1 A longitudinal sectional view of the interface block 5 when viewed along the arrow Q.

[0043] In this specification, for the sake of convenience, the direction in which the coating treatment block 3 and the development treatment block 4 are arranged is referred to as the "front-back direction X". The front-back direction X is horizontal. The direction in the front-back direction X, for example, from the development treatment block 4 toward the coating treatment block 3, is referred to as the "front". The direction opposite to the front is referred to as the "rear". The horizontal direction perpendicular to the front-back direction X is referred to as the "width direction Y". One direction of the "width direction Y" is appropriately referred to as the "right". The direction opposite to the right is referred to as the "left". The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z". In each figure, the front, back, right, left, top, and bottom are appropriately shown for reference.

[0044] <1. Structure of Substrate Processing Apparatus>

[0045] Reference Figure 1 、 Figure 2The substrate processing apparatus 1 processes a substrate. The substrate processing apparatus 1 forms a resist film on a substrate W and develops the exposed substrate W. The substrate processing apparatus 1 includes an indexer block 2 , a coating processing block 3 , a developing processing block 4 , and an interface block 5 .

[0046] The indexer block 2, coating block 3, development block 4, and interface block 5 are arranged in a row in this order toward the rear (in the front-to-back direction X). An exposure device EXP is provided adjacent to the interface block 5 as an external device. The exposure device EXP is an external device to the substrate processing apparatus 1.

[0047] The coating treatment block 3 corresponds to the first treatment block and the development treatment block of the present invention. The development treatment block 4 corresponds to the second treatment block and the development treatment block of the present invention.

[0048] <1-1. Indexer Block Structure>

[0049] For example, four carrier mounting racks 7 are provided on the front surface of the indexer block 2. The four carrier mounting racks 7 are arranged along the width direction Y. A carrier C is mounted on each of the four carrier mounting racks 7. The carrier C stores a plurality of substrates W (e.g., 25) arranged at predetermined intervals (e.g., 10 mm). For example, a FOUP (Front Open Unified Pod) is used as the carrier C, but this is not limited to this. Each substrate is, for example, a circular substrate with a diameter of 300 mm. When substrates are not specifically distinguished, they are referred to as "substrates W."

[0050] The indexer block 2 includes an indexer robot IR. The indexer robot IR includes a manipulator 9 that supports a substrate W in a horizontal position. The indexer robot IR moves the manipulator 9 in the horizontal direction (front-back direction X and width direction Y) and the vertical direction Z, and also rotates the manipulator 9 about the vertical axis. The indexer robot IR transports substrates W between four trays C mounted on four tray mounting racks 7 and four substrate mounting stages PS1, PS8, PS11, and PS18, described later. The indexer robot IR is driven by an electric motor.

[0051] <1-2. Structure of the coating treatment block>

[0052] The coating block 3 performs a predetermined coating process (first process) on multiple (e.g., 25) substrates W. The coating block 3 is connected to the indexer block 2. In other words, the coating block 3 is positioned adjacent to and behind the indexer block 2. The coating block 3 includes a coating layer 3A and a coating layer 3B stacked in a vertical direction Z. Furthermore, the coating layer 3A is positioned above the coating layer 3B.

[0053] The two coating layers 3A and 3B each include a transport space 11, multiple liquid processing units 13, multiple processing units 15, and a transport robot TR1 (TR2). The coating layer 3B has a substantially similar structure to the coating layer 3A. Therefore, the structure of the upper coating layer 3A will be described as a representative example.

[0054] like Figure 1 As shown, the transfer space 11 extends in the front-rear direction X. The liquid processing units 13 and the processing units 15 are arranged along the front-rear direction X in which the transfer space 11 extends. The liquid processing units 13 are arranged to face the processing units 15 across the transfer space 11 .

[0055] The plurality of liquid processing units 13 are, for example, composed of four liquid processing units 13, two of which are arranged along the front-back direction X and two layers of which are arranged along the vertical direction Z. The plurality of liquid processing units 13 include a coating unit BARC and a coating unit RESIST. The coating unit BARC forms an antireflection film on the main surface of the substrate W. The coating unit RESIST forms a resist film on the main surface (i.e., the antireflection film) of the substrate W.

[0056] Each coating unit BARC and RESIST includes a holding and rotating unit 17, a nozzle 19, and a nozzle moving unit 21. The holding and rotating unit 17 includes a rotary chuck that holds a substrate W in a horizontal position and an electric motor that rotates the rotary chuck about a vertical axis passing through the center of the substrate W. The rotary chuck holds the substrate W, for example, by vacuum suction. The nozzle 19 supplies a coating liquid to the upper surface of the substrate W held by the holding and rotating unit 17. The coating liquid is a liquid for forming an anti-reflective film or a photoresist liquid. The nozzle moving unit 21 moves the nozzle 19 to any position. The nozzle moving unit 21 includes, for example, an electric motor.

[0057] The plurality of processing units 15 may be configured, for example, by providing three processing units 15 in the front-back direction X and five processing units 15 in the vertical direction Z. The plurality of processing units 15 may include a cooling unit CP and a heating and cooling unit PHP. The plurality of processing units 15 may also include an edge exposure unit (not shown) for performing exposure processing on the periphery of the substrate W.

[0058] The cooling unit CP cools the substrate W. The heating and cooling unit PHP continuously performs heating (baking) and cooling. The cooling unit CP and the heating and cooling unit PHP include a plate 23 on which the substrate W is mounted. The plate 23 is heated by a heater such as an electric heater. The plate 23 is cooled by a water-cooled circulation mechanism or Peltier elements, for example.

[0059] The transport robots TR1 and TR2 are located inside the coating processing block 3. Figure 2As shown, a transfer robot TR1 is provided in the transfer space 11 of the upper coating treatment layer 3A. A transfer robot TR2 is provided in the transfer space 11 of the lower coating treatment layer 3B. Details of the transfer robots TR1 and TR2 will be described later.

[0060] <1-3. Structure of Development Block>

[0061] The development block 4 performs a predetermined development process (second process) on a plurality of substrates W (e.g., 25 substrates) individually. The development block 4 is connected to the coating block 3. In other words, the development block 4 is arranged adjacent to the rear of the coating block 3. The development block 4 includes a development layer 4A and a development layer 4B stacked along the vertical direction Z. In addition, the development layer 4A is arranged above the development layer 4B. In addition, the development layer 4A and the coating layer 3A are arranged at the same level (height position). Similarly, the development layer 4B and the coating layer 3B are arranged at the same level.

[0062] The two development processing layers 4A and 4B each include a transfer space 25, multiple liquid processing units 27, multiple processing units 29, a first stacking unit 31, and a transfer robot TR3 (TR4). The development processing layer 4B has a substantially similar structure to the development processing layer 4A. Therefore, the structure of the upper development processing layer 4A will be described as a representative example.

[0063] like Figure 1 As shown, the transfer space 25 extends in the front-rear direction X. The liquid processing units 27 and the processing units 29 are arranged along the front-rear direction X in which the transfer space 25 extends. The liquid processing units 27 are arranged to face the processing units 29 across the transfer space 25 .

[0064] Liquid processing units 27 are composed of, for example, four liquid processing units 27 arranged in two layers in the longitudinal direction X and in two layers in the vertical direction Z. Liquid processing units 27 include developing units DEV that develop substrates W exposed by exposure device EXP.

[0065] The developing unit DEV includes a holding rotary unit 17, a nozzle 33, and a nozzle moving unit 35. The nozzle 33 supplies a developer to the upper surface of the substrate W held by the holding rotary unit 17. The nozzle moving unit 35 moves the nozzle 33 to an arbitrary position. The nozzle moving unit 35 includes, for example, an electric motor.

[0066] The plurality of processing units 29 may be configured, for example, as a total of ten processing units 29, two of which are arranged in the front-back direction X and five of which are arranged in the vertical direction Z. The plurality of processing units 29 include heating units HP and cooling units CP. The heating units HP heat the substrate W. The heating units HP include a plate 23 and a heater such as an electric heater.

[0067] The first stacking unit 31 is provided in a partition adjacent to the conveying space 25 and the interface block 5. Figure 3 As shown, the first stacking section 31 of the upper development processing layer 4A includes one or more heating and cooling units PHP and substrate stages PS3 and PS6. In the development processing layer 4A, the one or more heating and cooling units PHP and substrate stages PS3 and PS6 are stacked in the vertical direction Z. The substrate stages PS3 and PS6 are arranged one above the other.

[0068] Furthermore, the first stacking section 31 of the lower development processing layer 4B includes one or more heating and cooling units PHP and substrate stages PS13 and PS16. In the development processing layer 4B, the one or more heating and cooling units PHP and substrate stages PS13 and PS16 are stacked in the vertical direction Z. Each of the substrate stages PS3, PS6, PS13, and PS16 holds a substrate W.

[0069] The transport robots TR3 and TR4 are arranged inside the development processing block 4. Figure 2 As shown, a transfer robot TR3 is installed in the transfer space 25 of the upper development processing layer 4A. A transfer robot TR4 is installed in the transfer space 25 of the lower development processing layer 4B. Details of the transfer robots TR3 and TR4 will be described later. The types and numbers of the liquid processing units 13 and 27 and the processing units 15 and 29 can be changed as needed.

[0070] <1-4. Details of the substrate mounting table and transfer robot>

[0071] The substrate processing apparatus 1 further includes eight substrate stages PS1, PS2, PS7, PS8, PS11, PS12, PS17, and PS18. The substrate stages PS1 and PS8 are provided at the boundary between the indexer block 2 and the upper coating treatment layer 3A. The substrate stages PS11 and PS18 are provided at the boundary between the indexer block 2 and the lower coating treatment layer 3B.

[0072] Substrate stages PS2 and PS7 are positioned one above the other at the boundary between the upper coating layer 3A and the upper developing layer 4A. Substrate stages PS12 and PS17 are positioned one above the other at the boundary between the lower coating layer 3B and the lower developing layer 4B. The four substrate stages PS2, PS7, PS12, and PS17 are arranged along the vertical direction Z. Substrate stage PS7 is positioned higher than substrate stage PS2. Furthermore, substrate stage PS17 is positioned higher than substrate stage PS12.

[0073] A substrate W is placed on each of the eight substrate stages PS1, PS2, PS7, PS8, PS11, PS12, PS17, and PS18. Each of the eight substrate stages PS1, PS2, PS7, PS8, PS11, PS12, PS17, and PS18 includes, for example, a stage member 37 and three support pins PN (see FIG. Figure 4 ). In addition, the substrate mounting stages PS3, PS6, PS13, PS16 and the substrate mounting stage PS5 described later are also configured in the same manner.

[0074] Reference Figure 2 、 Figure 4 、 Figure 5 . Figure 4 It is a side view showing two transfer robots TR1 and TR3 and two substrate stages PS2 and PS7. Figure 5 It is a plan view showing two manipulators 39 and 40 of the respective transfer robots TR1 , TR2 , TR3 , and TR4 in the coating process block 3 and the developing process block 4 , and an advancing and retreating unit 43 .

[0075] Each of the four transfer robots TR1, TR2, TR3, and TR4 includes two manipulators 39 and 40 positioned one above the other, and each manipulator 39 and 40 is movable. This allows for transferring substrates W to and from, for example, substrate stages PS2 and PS7 positioned one above the other. Furthermore, each of the four transfer robots TR1 to TR4 includes manipulator support units 41A and 41B, an advance / retract unit 43, a rotation unit 45, a horizontal movement unit 47, and a vertical movement unit 48.

[0076] The two robots 39 and 40 are respectively configured to support a substrate W in a horizontal position. Figure 5 As shown, each robot 39, 40 includes a C-shaped robot body 49 and a plurality (e.g., three or four) of support members 51 provided on the robot body 49. The plurality of support members 51 are, for example, arranged on the inner periphery of the C-shaped portion of the robot body 49. The plurality of support members 51 support the peripheral edge of the substrate W from the lower surface side of the substrate W. The robot 40 is arranged at a higher position than the robot 39.

[0077] like Figure 5 As shown by arrow AR1, the advance / retract unit 43 supports the manipulator 39 via the manipulator support portion 41A so that it can move linearly. Furthermore, the advance / retract unit 43 supports the manipulator 40 via the manipulator support portion 41B so that it can move linearly. The advance / retract unit 43 advances and retracts the two manipulators 39 and 40, respectively. The advance / retract unit 43 includes, for example, two electric motors, two lead screw shafts, and two guide rails.

[0078] The rotating portion 45 rotates the advancing and retreating portion 43 around a vertical axis AX1 passing through the advancing and retreating portion 43. This allows the orientations of the two manipulators 39 and 40, the manipulator support portions 41A and 41B, and the advancing and retreating portion 43 to be changed integrally.

[0079] The horizontal moving portion 47 moves the rotating portion 45 in the front-to-back direction X. Furthermore, the vertical moving portion 48 moves the horizontal moving portion 47 in the vertical direction Z. In other words, the horizontal moving portion 47 and the vertical moving portion 48 move the rotating portion 45 in the front-to-back direction X and the vertical direction Z (two-dimensional directions). This allows the two manipulators 39 and 40, the manipulator support portions 41A and 41B, and the advancing and retreating portion 43 to move integrally in the front-to-back direction X and the vertical direction Z. Furthermore, the rotating portion 45, the horizontal moving portion 47, and the vertical moving portion 48 each include, for example, an electric motor.

[0080] Here, while referring to Figure 4 , while explaining the relationship between the support gap JK1 and the loading gap CK1. The support gap JK1 is the vertical distance (in the vertical direction Z) between the two support surfaces SF1 and SF2 of the two manipulators 39 and 40 of the two transfer robots TR1 and TR3, respectively. Furthermore, the support surface SF1 is the surface of the manipulator 39, for example, including the front end of the three support members 51. Furthermore, the support surface SF2 is the surface of the manipulator 40, for example, including the front end of the three support members 51. Each support surface SF1 and SF2 supports the substrate W.

[0081] In contrast, the placement gap CK1 is the vertical distance between the two placement surfaces PF1 and PF2 of the two substrate placement tables PS2 and PS7. The placement surface PF1 is the surface of the substrate placement table PS2 that includes the tips of the three support pins PN. The placement surface PF2 is the surface of the substrate placement table PS7 that includes the tips of the three support pins PN. Each placement surface PF1 and PF2 is the surface on which the substrate W is placed.

[0082] In this embodiment, the support interval JK1 between the two manipulators 39 and 40 of the two upper transfer robots TR1 and TR3 is set to coincide with the placement interval CK1 between the two substrate stages PS2 and PS7. Similarly, the support interval JK1 between the two manipulators 39 and 40 of the two lower transfer robots TR2 and TR4 is also set to coincide with the placement interval CK1 between the two substrate stages PS12 and PS17.

[0083] The substrate stages PS2 and PS12 correspond to the first stage of the present invention. The substrate stages PS7 and PS17 correspond to the second stage of the present invention. The four transfer robots TR1 to TR4 correspond to the first substrate transfer robots of the present invention.

[0084] Furthermore, when the transport robot TR1 (TR2) corresponds to the first substrate transport robot of the present invention, the transport robot TR3 (TR4) corresponds to the second substrate transport robot of the present invention. Accordingly, the manipulators 39 and 40 of the transport robot TR1 (TR2) correspond to the first and second manipulators of the present invention, and the manipulators 39 and 40 of the transport robot TR3 (TR4) correspond to the third and fourth manipulators of the present invention. Furthermore, the support gap JK1 between the manipulators 39 and 40 of the transport robot TR1 (TR2) corresponds to the support gap of the present invention. The support gap JK1 between the manipulators 39 and 40 of the transport robot TR3 (TR4) corresponds to the second support gap of the present invention.

[0085] <1-5. Interface Block (IF Block) Structure>

[0086] Reference Figures 1 to 3 The interface block 5 carries substrates W in and out of the exposure apparatus EXP, which is an external device. The interface block 5 is connected to the development processing block 4. In other words, the interface block 5 is arranged adjacent to the rear of the development processing block 4. The interface block 5 includes two transfer robots TR7 and TR8 and a second lamination unit 53.

[0087] The two transfer robots TR7 and TR8 are provided inside the interface block 5. The two transfer robots TR7 and TR8 are arranged along the width direction Y (see Figure 1 Specifically, the transfer robot TR7 is arranged behind the first stacking unit 31. The transfer robot TR8 is arranged on the left of the transfer robot TR7.

[0088] The second stacking unit 53 is arranged between the two transfer robots TR7 and TR8. Figure 3 As shown, the second stacking unit 53 includes one or more substrate stages PS-CP, a substrate stage PS5, and a buffer BF. The one or more substrate stages PS-CP, PS5, and buffer BF are stacked in the vertical direction Z. The substrate stages PS-CP are cooling stages. The buffer BF temporarily accommodates substrates W.

[0089] The transport robot TR7 is capable of transporting substrates W between the two first stacking sections 31 (one or more heating and cooling units PHP and substrate stages PS3, PS6 (PS13, PS16)) of the two development processing layers 4A and 4B and the second stacking section 53 (one or more substrate stages PS-CP, substrate stage PS5, and buffer BF). The transport robot TR7 includes two manipulators 55 and 56. The two manipulators 55 and 56 each support a substrate W in a horizontal position. The transport robot TR7 moves the two manipulators 55 and 56 in the horizontal direction (front-back direction X and width direction Y) and the vertical direction Z, and also rotates the manipulators 55 and 56 around the vertical axis.

[0090] <1-6. Details of the transport robot accessing the exposure device>

[0091] Reference Figure 1 、 Figure 6 、 Figure 7 . The transport robot TR8 transports the substrate W between the second stacking section 53 (one or more substrate stages PS-CP and substrate stage PS5) and the exposure device EXP. The transport robot TR8 is configured as a horizontal multi-joint robot. The transport robot TR8 includes two manipulators 57 and 58 arranged one above the other, and moves the two manipulators 57 and 58 independently. In this way, the substrate W can be transferred to and from the substrate stages PS31 and PS32 of each loading section 71 of the exposure device EXP. The transport robot TR8 also includes two multi-joint arms 59 and 60 and a lifting section 63.

[0092] The two robots 57 and 58 are each configured to support a substrate W in a horizontal position. The robot 58 is arranged at a higher position than the robot 57. Each robot 57 and 58 is configured like the two robots 39 and 40 of the transport robot TR1. Figure 6 、 Figure 7 In the figure, the duplicated structures are denoted by the same symbols as those of the four transfer robots TR1 to TR4.

[0093] The front end of the multi-jointed arm 59 is connected to the manipulator 57 via the manipulator support portion 41A. The front end of the multi-jointed arm 60 is connected to the manipulator 58 via the manipulator support portion 41B. The manipulator 57 is rotatable about a vertical axis relative to the end of the multi-jointed arm 59. Similarly, the manipulator 58 is also rotatable about a vertical axis relative to the front end of the multi-jointed arm 60. In addition, the base ends of the two multi-jointed arms 59 and 60 are each connected to the lifting unit 63 so as to be rotatable about a vertical axis. The lifting unit 63 raises and lowers the two manipulators 57 and 58 via the two multi-jointed arms 59 and 60.

[0094] The lifting unit 63 may be configured to rotate the two manipulators 57 and 58 about the vertical axis AX2 via the two multi-jointed arms 59 and 60. Alternatively, the lifting unit 63 may be configured to move in the width direction Y via a horizontal moving unit (not shown). Furthermore, the two multi-jointed arms 59 and 60 and the lifting unit 63 each include an electric motor.

[0095] The transport robot TR8 carries the substrate W in and out of the exposure device EXP as an external device. Figure 1 、 Figure 7 As shown in FIG, the exposure apparatus EXP includes two placement units 71 and a transfer robot 73. The two placement units 71 include two substrate stages PS31 and PS32 arranged along the vertical direction Z, respectively.

[0096] Specifically, two substrate stages PS31 and PS32 are provided within the exposure apparatus EXP. Each of the two substrate stages PS31 and PS32 includes a stage member 37 and three support pins PN, similar to the substrate stage PS2. The substrate stage PS32 is positioned higher than the substrate stage PS31. A transfer robot 73 transfers pre-exposure substrates W from the two loading sections 71 to the exposure processing area, and also transfers post-exposure substrates W from the exposure processing area to the two loading sections 71. The exposure processing area includes a worktable for holding the substrates W in a horizontal position.

[0097] The loading interval CK2 is the upper and lower interval between the two loading surfaces PF1 and PF2 of the two substrate loading tables PS31 and PS32. In addition, the support interval JK2 is the upper and lower interval between the two supporting surfaces SF1 and SF2 of the two robots 57 and 58. The support interval JK2 of the two robots 57 and 58 is set in a manner consistent with the loading interval CK2 of the two substrate loading tables PS31 and PS32. Figure 4 The support intervals CK1 shown can be the same or different. Figure 4 The support intervals JK1 shown can be the same or different.

[0098] <1-7. Control Unit>

[0099] like Figure 1 As shown, the substrate processing apparatus 1 includes a control unit 81 and a storage unit 83. The control unit 81 controls the various components of the substrate processing apparatus 1. The control unit 81 includes one or more processors, such as a central processing unit (CPU). The storage unit 83 includes, for example, at least one of a ROM (Read-Only Memory), a RAM (Random-Access Memory), and a hard disk. The storage unit 83 stores computer programs required to control the various components of the substrate processing apparatus 1.

[0100] <2. Operation of Substrate Processing Apparatus>

[0101] Next, the operation of the substrate processing apparatus 1 will be described. Figure 8 This is a flowchart illustrating an example of a processing step in substrate processing apparatus 1. The processing of coating treated layer 3B and developing treated layer 4B is similar to the processing of coating treated layer 3A and developing treated layer 4A. Therefore, the processing of coating treated layer 3A and developing treated layer 4A will be described as a representative example.

[0102] [Step S01] Transferring a substrate from a carrier

[0103] Reference Figure 1 The external carrier transport robot transports the carrier C to any one of the four carrier loading shelves 7. The indexer robot IR of the indexer block 2 takes out a substrate W from the carrier C mounted on the carrier loading shelf 7. The indexer robot IR transports the substrate W to, for example, the substrate loading shelf PS1 of the substrate stages PS1 and PS11. In addition, the indexer robot IR sequentially transports, for example, 25 substrates W stored in the carrier C to any one of the substrate loading shelves PS1 and PS11.

[0104] [Step S02] Operation of coating treatment block

[0105] The transport robot TR1 includes robots 39A and 40A as robots 39 and 40. The transport robot TR1 transports the substrate W to the development processing layer 4A side while performing the exchange operation of the two substrates W using the robots 39A and 40A. Figures 9A to 9D In the figure, the four substrates W are distinguished as substrates W1, W2, W3, and W4.

[0106] Reference Figure 9A Both robots 39A and 40A are not supporting the substrate W. The transport robot TR1 receives the substrate W1 from the substrate stage PS1 using the robot 39A, for example. The transport robot TR1 then moves the robots 39A and 40A and the advance / retract unit 43 to the vicinity of the cooling unit CP, which is the next transport destination.

[0107] Reference Figure 9B. The cooling unit CP completes the cooling process on the substrate W2. The transport robot TR1 receives the substrate W2 using the manipulator 40A, and then places (delivers) the substrate W1 supported by the manipulator 39A to the cooling unit CP. In this way, the substrate W1 possessed by the transport robot TR1 and the substrate W2 possessed by the cooling unit CP can be replaced. That is, the substrate W2 is received from a pre-set position and the substrate W is placed at the position. Then, the transport robot TR1 moves the manipulators 39A, 40A and the advance and retreat unit 43 to the vicinity of the coating unit BARC, which is the next transport destination.

[0108] Reference Figure 9C The coating unit BARC finishes forming the anti-reflection film on the substrate W3. The transport robot TR1 receives the substrate W3 using the manipulator 39A, and then places the substrate W2 supported by the manipulator 40A on the coating unit BARC. In this way, the substrate W2 possessed by the transport robot TR1 and the substrate W3 possessed by the coating unit BARC can be replaced. Then, the transport robot TR1 moves the manipulators 39A, 40A, and the advance and retreat unit 43 to the vicinity of the heating and cooling unit PHP, which is the next transport destination.

[0109] Reference Figure 9D . The heating and cooling unit PHP completes the baking and cooling processes on the coated substrate W4. The transport robot TR1 receives the substrate W4 using the manipulator 40A, and then places the substrate W3 supported by the manipulator 39A on the heating and cooling unit PHP. In this way, the substrate W3 possessed by the transport robot TR1 and the substrate W4 possessed by the heating and cooling unit PHP can be replaced. Then, the transport robot TR1 moves the manipulators 39A, 40A and the advance and retreat unit 43 to the vicinity of the cooling unit CP, which is the next transport destination.

[0110] Then, the substrate W is sequentially transported to the cooling unit CP, the coating unit RESIST, the heating and cooling unit PHP, and the cooling unit CP. Figures 9B to 9D As described above, the transport robot TR1 sequentially transports the substrates W to the cooling unit CP, the coating unit RESIST, the heating and cooling unit PHP, and the cooling unit CP while exchanging two substrates W. The coating unit RESIST forms a resist film on the main surface of the substrate W.

[0111] TR1 transport robot pair Figure 8After two substrates W are exchanged in the cooling unit CP indicated by the arrow AR2, the robot 39A supports the substrates W that have been cooled in the cooling unit CP. The transport robot TR1 then moves the robots 39A, 40A, and the advance / retract unit 43 toward the vicinity of the substrate stage PS2, which is the next transport destination. Specifically, the transport robot TR1 positions the lower robot 39A opposite the substrate stage PS2 and the upper robot 40A opposite the substrate stage PS7.

[0112] Here, refer to Figures 10A to 11C , the operation of the transport robot TR1 is explained. Figures 10A to 11C as well as Figures 12A to 13C In the figure, substrates W are divided into substrates W7, W8, and W9. Furthermore, substrate stage PS2 is used for transporting substrates W from coating treatment layer 3A to development treatment layer 4A. Furthermore, substrate stage PS7 is used for returning substrates W from development treatment layer 4A to coating treatment layer 3A.

[0113] Reference Figure 10A The robot arm 39A of the transport robot TR1 supports the substrate W7 on which the resist film is formed by the coating process. In addition, the substrate W8 after the development process on the development process layer 4A is placed on the substrate stage PS7.

[0114] Reference Figure 10B First, the advance / retract unit 43 of the transport robot TR1 advances the robot arm 39A, which is supporting the substrate W7, toward the substrate stage PS2 (first robot advance motion FW1). As a result, the substrate W7 supported by the robot arm 39A is moved to a position above the three support pins PN of the substrate stage PS2 without contact with the three support pins PN. In other words, the robot arm 39A moves toward the upper surface of the substrate stage PS2.

[0115] Reference Figure 10C Afterwards, the transport robot TR1 delivers the substrate W7 to the substrate mounting table PS2 via the manipulator 39A (mounting action PL1). Specifically, the vertical moving unit 48 of the transport robot TR1 causes the manipulators 39A, 40A, and the advance / retreat unit 43 to slightly lower as a whole. This allows the substrate W7 supported by the manipulator 39A to be placed at the tips of the three support pins PN. Furthermore, the manipulator 40A descends together with the manipulator 39A.

[0116] Reference Figure 11AAfterwards, the transport robot TR1's advance / retract unit 43 retracts the robot 39A from (the upper surface side of) the substrate stage PS2 (first robot retreat operation BW1). Furthermore, while performing this first robot retreat operation BW1, the transport robot TR1's advance / retract unit 43 advances the robot 40A, which is not supporting the substrate W, toward the substrate stage PS7 (second robot advance operation FW2). In other words, the transport robot TR1 performs the first robot retreat operation BW1 and the second robot advance operation FW2 simultaneously.

[0117] The support interval JK1 of the manipulators 39A and 40A of the transfer robot TR1 is consistent with the placement interval CK1 of the substrate placement tables PS2 and PS7 (see Figure 4 ). Therefore, the robot 40A can be moved toward the upper surface side of the substrate mounting table PS7 without contacting the substrate mounting table PS7 and the substrate W8 on the substrate mounting table PS7. In addition, by performing the first robot backward movement BW1 and the second robot forward movement FW2 in parallel, it is possible to efficiently perform the following operations. Figures 10B to 11C As shown, a series of operations are performed to place the substrate W7 on the substrate stage PS2 and receive the substrate W8 from the substrate stage PS7.

[0118] In addition, Figure 11A In the process, the robot hand 40A enters between the lower surface of the substrate W8 and the upper surface of the stage member 37 of the substrate stage PS7.

[0119] Reference Figure 11B Afterwards, the transport robot TR1 receives the substrate W8 from the substrate stage PS7 using the manipulator 40A (receiving operation RE1). Specifically, the vertical moving unit 48 of the transport robot TR1 slightly raises the manipulators 39A, 40A, and the advancing and retreating unit 43 as a whole. This allows the manipulator 40A to support the substrate W8.

[0120] Reference Figure 11C . Afterwards, the advance and retreat portion 43 of the transport robot TR1 causes the manipulator 40A supporting the substrate W8 to retreat from the substrate stage PS7 (second manipulator retreat action BW2). Afterwards, the transport robot TR1 transports the substrate W8 received by the manipulator 40A to the substrate stage PS8 (refer to step S06 described later). Afterwards, the transport robot TR1 receives the substrate W8 from the substrate stage PS1 again (refer to step S06 described later). Figure 9A ).

[0121] [Step S03] Operation of the Development Processing Block

[0122] The transport robot TR3 of the development processing layer 4A includes robots 39B and 40B as robots 39 and 40. Figures 12A to 13CThe operation of the transfer robot TR3 will be described.

[0123] Reference Figure 12A The transport robot TR3 moves the manipulators 39B, 40B, and the advance / retract unit 43 to the vicinity of the substrate stage PS2. The transport robot TR3 positions the lower manipulator 39B opposite to the substrate stage PS2, and positions the upper manipulator 40B opposite to the substrate stage PS7. The substrate W7 transported by the transport robot TR1 is positioned on the substrate stage PS2. Furthermore, the manipulator 40B of the transport robot TR3 is positioned to support the substrate W9 after development processing.

[0124] Reference Figure 12B First, the advance / retract unit 43 of the transport robot TR3 moves the robot arm 40B supporting the substrate W9 forward toward the substrate stage PS7 (fourth robot advance motion FW4). As a result, the substrate W9 supported by the robot arm 40B moves to a position above the three support pins PN of the substrate stage PS7 without contact with the three support pins PN of the substrate stage PS7.

[0125] Reference Figure 12C Afterwards, the transport robot TR3 delivers the substrate W9 to the substrate mounting table PS7 via the manipulator 40B (mounting operation PL2). Specifically, the vertical moving unit 48 of the transport robot TR3 slightly lowers the manipulators 39B, 40B, and the advance / retreat unit 43 as a whole. This allows the substrate W9 supported by the manipulator 40B to be placed on the front ends of the three support pins PN of the substrate mounting table PS7.

[0126] Reference Figure 13A Afterwards, the transport robot TR3's advance / retract unit 43 retracts the robot 40B from the substrate stage PS7 (fourth robot retreat operation BW4). Furthermore, while performing the fourth robot retreat operation BW4, the transport robot TR3's advance / retract unit 43 advances the robot 39B, which is not supporting the substrate W, toward the substrate stage PS2 (third robot forward operation FW3). In other words, the transport robot TR3 performs the fourth robot retreat operation BW4 and the third robot forward operation FW3 simultaneously.

[0127] The support interval JK1 of the manipulators 39B and 40B of the transfer robot TR3 is consistent with the placement interval CK1 of the substrate placement tables PS2 and PS7 (see Figure 4 ). Therefore, the robot 39B can be moved to the upper surface side of the substrate mounting table PS2 without contacting the substrate mounting table PS2 and the substrate W7 on the substrate mounting table PS2. In addition, by performing the fourth robot backward movement BW4 and the third robot forward movement FW3 in parallel, it is possible to efficiently perform Figures 12B to 13C a series of actions.

[0128] Reference Figure 13B Afterwards, the transport robot TR3 receives the substrate W7 from the substrate stage PS2 using the manipulator 39B (receiving operation RE2). Specifically, the vertical moving unit 48 of the transport robot TR3 slightly raises the manipulators 39B, 40B, and the advance / retract unit 43 as a whole. This allows the manipulator 39B to support the substrate W7.

[0129] Reference Figure 13C After that, the forward and backward part 43 of the transport robot TR3 moves the robot 39B supporting the substrate W7 back from the substrate stage PS2 (third robot back movement BW3). After that, the transport robot TR3 moves the robots 39B, 40B and the forward and backward part 43 to the vicinity of the substrate stage PS3 (refer to Figure 3 ). Thereafter, the transport robot TR3 places the substrate W7 on the substrate stage PS3 via the robot arm 39B, and receives the substrate W after the exposure process from the substrate stage PS6 via the robot arm 40B.

[0130] [Step S04] Operation of the interface block

[0131] Reference Figures 1 to 3 The transport robot TR7 of the interface block 5 receives a substrate W (W7) from the substrate stage PS3 using one of its two manipulators 55 and 56, and transports the substrate W to the substrate stage PS-CP. The transport robot TR8 then receives the substrate W from the substrate stage PS-CP and carries it out to the exposure unit EXP, while also carrying in a substrate W that has undergone exposure processing.

[0132] While referring to Figures 14A to 15C , while explaining the details of the transport robot TR8. Figures 14A to 15C In FIG, the substrate W is divided into substrates W11 and W12.

[0133] Reference Figure 14A First, the lift unit 63 of the transport robot TR8 moves the manipulators 57 and 58 in the vertical direction Z, thereby moving the manipulator 57 near the substrate mounting table PS-CP. The transport robot TR8 then advances and elevates the manipulator 57, thereby receiving the substrate W11 from the substrate mounting table PS-CP using the manipulator 57. The transport robot TR8 then retracts the manipulator 57, which is supporting the substrate W11.

[0134] Reference Figure 14BAfterwards, the transport robot TR8 moves the robots 57, 58, etc. in the vertical direction Z, thereby moving the robot 57 to the vicinity of the substrate stage PS31, one of the two placement units 71 in the exposure device EXP. Specifically, the transport robot TR8 positions the lower robot 57 opposite the substrate stage PS31, and positions the upper robot 58 opposite the substrate stage PS32.

[0135] The substrate stage PS31 is used for transferring the substrate W from the interface block 5 to the exposure device EXP. The substrate stage PS32 is used for returning the substrate W from the exposure device EXP to the interface block 5. Figure 14B In FIG, it is assumed that the substrate W12 after the exposure process by the exposure device EXP is placed on the substrate stage PS32. It is assumed that the robot 57 supports the substrate W11, and the robot 58 does not support the substrate W.

[0136] Reference Figure 14C The multi-jointed arm 59 of the transport robot TR8 then advances the robot arm 57, which is supporting the substrate W11, toward the substrate stage PS31 (first robot advance motion FW1). As a result, the substrate W11 supported by the robot arm 57 moves to a position above the three support pins PN of the substrate stage PS31. The lifting unit 63 of the transport robot TR8 then slightly lowers the robots 57, 58, and the like as a whole, allowing the robot arm 57 to place the substrate W11 on the substrate stage PS31 (placement motion PL1).

[0137] Reference Figure 15A Afterwards, the multi-jointed arm 59 of the transport robot TR8 retracts the robot 57 from the substrate stage PS31 (first robot retracting motion BW1). Furthermore, while performing this first robot retracting motion BW1, the multi-jointed arm 60 of the transport robot TR8 advances the robot 58, which is not supporting the substrate W, toward the substrate stage PS32 (second robot forwarding motion FW2). In other words, the transport robot TR8 performs the first robot retracting motion BW1 and the second robot forwarding motion FW2 simultaneously.

[0138] The support interval JK2 of the manipulators 57 and 58 of the transfer robot TR8 is consistent with the placement interval CK2 of the substrate placement tables PS31 and PS32 (see Figure 7 ). Therefore, the robot 57 can be moved back while the robot 58 is moved forward without contacting the substrate stage PS32 or the like. That is, by performing the first robot backing motion BW1 and the second robot forward motion FW2 in parallel, the robot 57 can be moved forward efficiently. Figures 14C to 15BAs shown, the substrate W11 is placed on the substrate stage PS31 of the exposure apparatus EXP, and a series of operations of receiving the substrate W12 from the substrate stage PS32 are performed.

[0139] Reference Figure 15B Afterwards, the lifting unit 63 of the transport robot TR8 slightly raises the manipulators 57, 58, etc. integrally, and the manipulator 58 receives the substrate W12 from the substrate stage PS32 (receiving action RE1). The multi-jointed arm 60 of the transport robot TR8 then retracts the manipulator 58, which is supporting the substrate W12, from the substrate stage PS32 (second manipulator retraction action BW2).

[0140] Reference Figure 15C The lifting unit 63 of the transport robot TR8 then moves the manipulators 57 and 58 in the vertical direction Z, moving the manipulator 58 near the substrate stage PS5. The multi-jointed arm 60 of the transport robot TR8 then advances and lowers the manipulator 58, allowing the manipulator 58 to place the substrate W12 on the substrate stage PS5. The transport robot TR8 then retracts the manipulator 58, which is no longer supporting the substrate W.

[0141] Afterwards, if Figure 14A As shown, the transport robot TR8 again receives the substrate W from the substrate stage PS-CP using the robot arm 57. Furthermore, the transport robot 73 of the exposure apparatus EXP receives the substrate W11 from the substrate stage PS31 and transports it to the exposure processing area for exposure processing. The transport robot 73 then transports the exposed substrate W11 from the exposure processing area to the substrate stage PS32.

[0142] Reference Figures 1 to 3 The transport robot TR7 of the interface block 5 receives the substrate W from the substrate stage PS5 using one of the two manipulators 55 and 56, and transports the substrate W to the heating and cooling unit PHP of the first stacking section 31 (see Figure 3 The heating and cooling unit PHP performs a post-exposure baking process on the substrate W. Thereafter, the transport robot TR7 transports the substrate W from the heating and cooling unit PHP to the substrate stage PS6 of the first stacking unit 31 .

[0143] [Step S05] Operation of the Development Processing Block

[0144] The transport robot TR3 receives the substrate W from the substrate stage PS6 using one of the manipulators 39B and 40B. Figures 9B to 9DAs shown, the two substrates W are sequentially transported to the cooling unit CP, the developing unit DEV, the heating unit HP, and the cooling unit CP while performing the replacement operation of the two substrates W. The developing unit DEV develops the substrates W. The heating unit HP bakes the developed substrates W.

[0145] The transport robot TR3 receives the substrate W after the development process from the cooling unit CP through the upper robot arm 40B. Figures 12A to 13C As shown, the transport robot TR3 performs a series of operations of placing the substrate W ( W9 ) on the substrate stage PS7 and receiving the substrate W ( W7 ) from the substrate stage PS2 .

[0146] [Step S06] Operation of coating treatment block

[0147] Afterwards, if Figures 10A to 11C As shown, the transport robot TR1, which applies the processed layer 3A, performs a series of operations, placing a substrate W (W7) on the substrate stage PS2 and then receiving a substrate W (W8) from the substrate stage PS7. The transport robot TR1's horizontal moving unit 47 and vertical moving unit 48 then move the manipulators 39A and 40A, along with the advance and retreat unit 43, toward the vicinity of the substrate stage PS8. The transport robot TR1 then transfers the substrate W (W8) to the substrate stage PS8.

[0148] [Step S07] Transferring the substrate to the tray

[0149] The indexer robot IR of the indexer block 2 receives a substrate W from one of the substrate mounting stages PS8 and PS18 and returns the substrate W to a carrier C mounted on the carrier mounting rack 7. When the 25 substrates W after coating, exposure, and development are returned to the carrier C, an external carrier transport robot transports the carrier C from the carrier mounting rack 7 to the next destination.

[0150] According to this embodiment, substrate stages PS2 and PS7 are arranged at two different height positions. The vertical support gap JK1 between the two support surfaces SF1 and SF2 of robots 39 and 40 (or robots 57 and 58) is set to coincide with the vertical placement gap CK1 between the two placement surfaces PF1 and PF2 of substrate stages PS2 and PS7. Furthermore, for example, a first robot retracting motion BW1, which retracts robot 39 after delivering a substrate W to substrate stage PS2, and a second robot advancing motion FW2, which advances robot 40 to receive a substrate W from substrate stage PS7, are performed in parallel.

[0151] While referring to Figure 16The effects of this embodiment will be described below. In conventional operations, the first robot forward motion FW1, the placement motion PL1, the first robot backward motion BW1, the lifting and lowering motions of robots 39 and 40 (or robots 57 and 58), the second robot forward motion FW2, the receiving motion RE1, and the second robot backward motion BW2 are performed sequentially. Specifically, the first robot backward motion BW1 and the second robot forward motion FW2 are not performed in parallel, and the lifting and lowering motions of robots 39 and 40 are performed between them.

[0152] In contrast, in this embodiment, for example, the support interval JK1 between the robots 39 and 40 is aligned with the placement interval CK1 between the substrate stages PS2 and PS7. Furthermore, the first robot retracting motion BW1 and the second robot advancing motion FW2 are performed in parallel. Consequently, the total time from the start of the first robot retracting motion BW1 to the completion of the second robot advancing motion FW2 can be shortened. Consequently, the efficiency of substrate W transport can be improved in the series of operations from delivering the substrate W to the substrate stage PS2 to receiving the substrate W from the substrate stage PS7.

[0153] Furthermore, substrate stages PS2 and PS7 are provided at the boundary between the coating process block 3 and the developing process block 4. Furthermore, the transfer robot TR1 of the coating process block 3 and the transfer robot TR3 of the developing process block 4 access the substrate stages PS2 and PS7. Therefore, the transfer efficiency of substrates W placed by the transfer robots TR1 and TR3 via the substrate stages PS2 and PS7 can be improved.

[0154] In addition, in recent years, the processing efficiency of the exposure device EXP has been continuously improved. Therefore, there is a concern that the exposure device EXP may wait for the interface block 5 to transport the substrate W. Therefore, for example, it is considered to increase the number of transport robots TR8 used to transport the substrate W to the exposure device EXP and to transport the substrate W from the exposure device EXP. However, from the perspective of cost and space, this is not preferred. According to this embodiment, the support interval JK2 of the manipulators 57 and 58 of the transport robot TR8 of the interface block 5 is set to be consistent with the loading interval CK2 of the substrate loading tables PS31 and PS32 of the external exposure device EXP. Therefore, the efficiency of transporting the substrate W of the transport robot TR8 of the interface block 5 can be improved. As a result, the occurrence of a situation where the exposure device EXP waits for the interface block 5 to transport the substrate W can be prevented.

[0155] The present invention is not limited to the above-described embodiment, and can be implemented with the following modifications.

[0156] (1) In the above-described embodiment, each transport robot TR1 and TR8 performs the first robot backward motion BW1 and the second robot forward motion FW2 in parallel. In other words, the substrate W is delivered before the substrate W is received. Alternatively, the substrate W is received before the substrate W is delivered. In this case, each transport robot TR1 and TR8 performs the first robot forward motion FW1 and the second robot backward motion BW2 in parallel.

[0157] (2) In the above-described embodiment and modification (1), the transport robot TR3 performs the fourth robot backward movement BW4 and the third robot forward movement FW3 in parallel. That is, the substrate W is delivered before the substrate W is received. Alternatively, the substrate W is received before the substrate W is delivered. In this case, the transport robot TR3 performs the third robot backward movement BW3 and the fourth robot forward movement FW4 in parallel.

[0158] (3) In the above-described embodiment and various modifications, substrate stage PS2 is disposed below substrate stage PS7. Alternatively, substrate stage PS2 may be disposed above substrate stage PS7. In this case, for example, transfer robot TR1 delivers substrate W to substrate stage PS2 using upper robot arm 40A and receives substrate W from substrate stage PS7 using lower robot arm 39A. Similarly, substrate stage PS31 may be disposed above substrate stage PS32.

[0159] (4) In the above-described embodiment and various modifications, the support interval JK1 between the manipulators 39A and 40A of the transport robot TR1 is set to coincide with the placement interval CK1 between the substrate stages PS2 and PS7. Alternatively, the support interval JK1 between the manipulators 39A and 40A may be set to coincide with the placement interval CK1, as required. In this case, for example, the transport robot TR1 does not perform the first manipulator backward motion BW1 and the second manipulator forward motion FW2 in parallel.

[0160] (5) In the above-described embodiment and various modifications, the support interval JK1 between the manipulators 39B and 40B of the transport robot TR3 is set to coincide with the placement interval CK1 between the substrate placement tables PS2 and PS7. Alternatively, the support interval JK1 between the manipulators 39B and 40B may be set to coincide with the placement interval CK1, as required. In this case, for example, the transport robot TR1 does not perform the fourth manipulator backward movement BW4 and the third manipulator forward movement FW3 in parallel.

[0161] (6) In the above-described embodiment and various modifications, the support interval JK2 between the manipulators 57 and 58 of the transport robot TR8 is set to coincide with the placement interval CK2 between the substrate placement tables PS31 and PS32. Alternatively, the support interval JK2 between the manipulators 57 and 58 may be set to coincide with the placement interval CK2, as required. In this case, for example, the transport robot TR8 does not perform the first manipulator backward movement BW1 and the second manipulator forward movement FW2 in parallel.

[0162] (7) In the above-described embodiment and various modifications, the support interval JK1 between the manipulators 39B and 40B of the transport robot TR3 may be set to coincide with the placement interval between the substrate stages PS3 and PS6 of the first stacking unit 31. In this case, the transport robot TR3 may simultaneously move the manipulator 39B backward and the manipulator 40B forward after delivering the substrate W to the substrate stage PS3.

[0163] (8) In the above-described embodiment and modifications, for example, each of the substrate stages PS2, PS3, PS6, PS7, PS31, and PS32 includes the stage member 37 and the three support pins PN. However, the structure of the substrate stage is not limited thereto.

[0164] (9) In the above-described embodiment and various modifications, the interface block 5 includes a single transfer robot TR7 for transferring substrates W between the first stacking unit 31 and the second stacking unit 53 (e.g., substrate stages PS-CP and PS5). Alternatively, the number of transfer robots TR7 may be multiple (e.g., two).

[0165] (10) In the above-described embodiment and various modifications, the interface block 5 may also include at least one of a heating and cooling unit PHP, a pre-exposure cleaning unit (back surface cleaning unit), and a post-exposure cleaning unit. In this case, the pre-exposure cleaning unit and the post-exposure cleaning unit may each include, for example, a holding and rotating unit for holding the substrate W and a nozzle for discharging a cleaning liquid onto the substrate W. The holding and rotating unit includes a rotary chuck and an electric motor. The pre-exposure cleaning unit cleans the back surface of the substrate W using a brush. The back surface of the substrate W is the surface opposite to the surface on which, for example, a component is formed.

[0166] (11) In the above-described embodiment and various modifications, the coating process block 3 and the developing process block 4 are provided between the indexer block 2 and the interface block 5. Alternatively, only one of the coating process block 3 and the developing process block 4 may be provided between the indexer block 2 and the interface block 5. Furthermore, three or more process blocks may be provided between the indexer block 2 and the interface block 5.

[0167] (12) In the above-described embodiment and various modifications, for example, in the placement operation PL1 and the receiving operation RE1, the transport robot TR1 raises and lowers the manipulators 39A, 40A, etc. integrally. Alternatively, in the placement operation PL1 and the receiving operation RE1, the substrate stages PS2 and PS7 may be raised and lowered by, for example, an electric motor. The same applies to the substrate stages PS31 and PS32.

[0168] (13) In the above-described embodiment and various modifications, each of the transfer robots TR1 to TR4 moves the manipulators 39 and 40 via the advance / retract unit 43. Alternatively, as in the transfer robot TR8, the transfer robots TR1 to TR4 may move the manipulators 39 and 40 using two multi-jointed arms in place of the advance / retract unit 43. Furthermore, as in the transfer robot TR1, the transfer robot TR8 may move the manipulators 57 and 58 using a advance / retract unit in place of the two multi-jointed arms 59 and 60.

Claims

1. A substrate processing device for processing a substrate, characterized in that: have: a first substrate transfer robot having a first manipulator and a second manipulator disposed one above the other, and capable of transferring substrates to and from a first loading table and a second loading table disposed one above the other by moving the first manipulator and the second manipulator; as well as Control Department, The first robot is configured to support a first substrate in a horizontal position. The second robot is configured to support a second substrate in a horizontal position. The vertical support interval between the substrate supporting surface of the first robot and the substrate supporting surface of the second robot is set to be consistent with the vertical loading interval between the loading surface of the substrate on the first loading table and the loading surface of the substrate on the second loading table. As for the above-mentioned control unit, performing a first robot advancing motion to move the first robot supporting the first substrate toward the first mounting table; By relatively moving the first robot and the first mounting table up and down, the first robot delivers the first substrate to the first mounting table, and then performing a first robot retreating action to retreat the first robot from the first mounting platform, In addition, the second robot advances toward the second mounting platform. By relatively moving the second robot and the second mounting table up and down, the second robot receives the second substrate from the second mounting table, and then performing a second robot retreating operation to retreat the second robot supporting the second substrate from the second mounting table, The control unit performs either a step of causing the first robot to move backward and the second robot to move forward in parallel, or a step of causing the first robot to move forward and the second robot to move backward in parallel.

2. The substrate processing apparatus according to claim 1, wherein: Also features: a processing block that performs predetermined processing on each of the plurality of substrates; and An interface block is connected to the processing block and is used to carry substrates in and out of external devices. The first substrate transport robot is provided on the interface block. The first substrate transfer robot transfers a substrate to and from the first mounting table and the second mounting table provided on the external device.

3. The substrate processing apparatus according to claim 2, wherein: The external device is an exposure device.

4. The substrate processing apparatus according to any one of claims 1 to 3, wherein: The control unit causes the first robot to move backward and the second robot to move forward in parallel.

5. The substrate processing apparatus according to claim 1, wherein: Also features: a first processing block for individually performing a predetermined first processing on the plurality of substrates; a second processing block for individually performing a predetermined second processing on the plurality of substrates; The first loading platform and the second loading platform are arranged on the boundary between the first processing block and the second processing block; as well as The second substrate transfer robot includes a third robot and a fourth robot disposed above and below, and transfers the substrate to and from the first loading platform and the second loading platform by moving the third robot and the fourth robot. The first substrate transport robot is provided in the first processing block. The second substrate transport robot is provided in the second processing block. The third robot is configured to support the first substrate in a horizontal position. The fourth robot is configured to support a third substrate in a horizontal position. The second supporting distance between the substrate supporting surface of the third robot and the substrate supporting surface of the fourth robot is set to be consistent with the above-mentioned loading distance between the loading surface of the first loading table supporting the substrate and the loading surface of the second loading table supporting the substrate. As for the above-mentioned control unit, Performing a third robot forward movement to move the third robot toward the first mounting platform, By relatively moving the third robot and the first mounting table up and down, the third robot receives the first substrate from the first mounting table, and then performing a third robot retreating operation to retreat the third robot supporting the first substrate from the first mounting table, In addition, the fourth robot arm supporting the third substrate is moved forward toward the second mounting table. By relatively moving the fourth robot and the second mounting table up and down, the third substrate is delivered to the second mounting table by the fourth robot, and then, Performing a fourth robot retreat action to retreat the fourth robot from the second mounting platform, The control unit performs one of a step of causing the third robot to move backward and a step of causing the fourth robot to move forward in parallel, and a step of causing the fourth robot to move backward and a step of causing the third robot to move forward in parallel.

6. A method for controlling a substrate processing apparatus, wherein the substrate processing apparatus processes a substrate, wherein the method for controlling the substrate processing apparatus is characterized by: The substrate processing apparatus includes a first substrate transfer robot having a first manipulator and a second manipulator arranged vertically, and can transfer substrates to and from a first loading platform and a second loading platform arranged vertically by moving the first manipulator and the second manipulator. The first robot is configured to support a first substrate in a horizontal position. The second robot is configured to support a second substrate in a horizontal position. The vertical support interval between the substrate supporting surface of the first robot and the substrate supporting surface of the second robot is set to be consistent with the vertical loading interval between the loading surface of the substrate on the first loading table and the loading surface of the substrate on the second loading table. The above control method has the following features: a first robot advancing step of moving the first robot supporting the first substrate toward the first mounting table; A first placement step of delivering the first substrate to the first placement table by the first robot arm by relatively moving the first robot arm and the first placement table up and down; a first robot retreating step of retreating the first robot from the first loading platform after the first loading step; a second robot advancing step of moving the second robot toward the second mounting platform; a first receiving step of receiving the second substrate from the second mounting table by the second robot arm by relatively moving the second robot arm and the second mounting table upward and downward; and After the first receiving step, a second robot retreating step is performed to retreat the second robot supporting the second substrate from the second mounting table. Either one of a process in which the first robot retreating process and the second robot advancing process are performed in parallel or a process in which the first robot advancing process and the second robot retreating process are performed in parallel is performed.

7. A substrate transporting device for transporting a substrate, characterized in that: have: a first substrate transfer robot having a first manipulator and a second manipulator disposed one above the other, and capable of transferring substrates to and from a first loading table and a second loading table disposed one above the other by moving the first manipulator and the second manipulator; as well as Control Department, The first robot is configured to support a first substrate in a horizontal position. The second robot is configured to support a second substrate in a horizontal position. The vertical support interval between the substrate supporting surface of the first robot and the substrate supporting surface of the second robot is set to be consistent with the vertical loading interval between the loading surface of the substrate on the first loading table and the loading surface of the substrate on the second loading table. As for the above-mentioned control unit, performing a first robot advancing motion to move the first robot supporting the first substrate toward the first mounting table; By relatively moving the first robot and the first mounting table up and down, the first robot delivers the first substrate to the first mounting table, and then performing a first robot retreating action to retreat the first robot from the first mounting platform, In addition, the second robot advances toward the second mounting platform. By relatively moving the second robot and the second mounting table up and down, the second robot receives the second substrate from the second mounting table, and then performing a second robot retreating operation to retreat the second robot supporting the second substrate from the second mounting table, The control unit performs either a step of causing the first robot to move backward and the second robot to move forward in parallel, or a step of causing the first robot to move forward and the second robot to move backward in parallel.

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