Piezoelectric element polarization device

Abstract

The invention discloses piezoelectric element polarization equipment, and relates to the technical field of piezoelectric element polarization, the piezoelectric element polarization equipment comprises a turntable and a loading mechanism, a feeding and discharging station, a preheating station and an electrode station are sequentially distributed in the circumferential direction of the turntable along a first direction, and the loading mechanism is fixed on the periphery of the turntable. The loading mechanism is configured to load piezoelectric elements, and the rotating disc is configured to drive the loading mechanism to rotate in the first direction, so that the piezoelectric elements can traverse all stations distributed in the circumferential direction of the rotating disc. According to the technical scheme provided by the invention, compact layout of the piezoelectric element polarization equipment is realized, so that the requirement of the piezoelectric element polarization equipment on an installation site is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of piezoelectric element polarization, and in particular to a piezoelectric element polarization device. Background Art

[0002] In the manufacturing process of piezoelectric components, polarization is a key step in determining their piezoelectric performance. This typically requires heating the component to near the Curie temperature, applying a high-voltage DC electric field, and then slowly cooling it. Existing automated polarization equipment often uses a chain-driven feed mechanism, which poses a significant challenge, requiring a large installation space. Summary of the Invention

[0003] The main purpose of the present invention is to provide a piezoelectric element polarization device, aiming to achieve a compact layout of the piezoelectric element polarization device, thereby reducing its requirements on the installation site.

[0004] To achieve the above-mentioned purpose, the piezoelectric element polarization device proposed in the present invention includes: A turntable, wherein a loading and unloading station, a preheating station, and a polarization station are sequentially distributed along a first direction on the circumference of the turntable; and A loading mechanism is fixed to the periphery of the turntable, the loading mechanism is configured to load a piezoelectric element, and the turntable is configured to drive the loading mechanism to rotate along the first direction so that the piezoelectric element can traverse each station distributed around the turntable.

[0005] In one embodiment, the preheating station is equipped with a preheating box, which has two passages relatively distributed in the first direction and avoidance openings at both ends respectively connected to the two passages, the passages and the avoidance openings are used to avoid the loading mechanism, and the preheating box is provided with a sealing brush covering the avoidance openings and the passages.

[0006] In one embodiment, the preheating box is arranged above the turntable and spaced apart from the turntable, the avoidance opening is arranged on the lower side of the preheating box, and the loading mechanism includes a mounting bracket protruding above the turntable, and the avoidance opening is used to avoid the mounting bracket.

[0007] In one embodiment, the preheating box is in an arc shape extending along the first direction.

[0008] In one embodiment, the preheating box is connected to a heating gas source.

[0009] In one embodiment, the loading mechanism includes a first polarization device, a plurality of positioning holes are provided on the upper side of the first polarization device, one of the positioning holes is used to load one of the piezoelectric elements, the first polarization device has a first probe extending upward into the positioning hole, the polarization position is installed with a second polarization device, the second polarization device has a second probe extending downward.

[0010] In one embodiment, the piezoelectric element polarization equipment also includes an insulation box installed at the polarization station, the insulation box is connected to a heating gas source, the insulation box includes a first box shell and a second box shell spliced ​​along the up and down directions, the first box shell can be raised and lowered, and the second polarization equipment is fixedly installed on the first box shell.

[0011] In one embodiment, the first probe has a fixed needle head, the cross section of the needle head is adapted to the cross section of the piezoelectric element, the needle head is provided with a plurality of claws corresponding to one piezoelectric element, the second polarization device is configured with a plurality of second probes, and the second probes are configured as elastic probes.

[0012] In one embodiment, cooling stations are further distributed in the circumferential direction of the turntable, and the loading and unloading stations, the preheating station, the polarization station and the cooling station are distributed in sequence along the first direction.

[0013] In one embodiment, a plurality of the loading mechanisms are distributed circumferentially of the turntable. When one loading mechanism is stationed at the loading and unloading station, a plurality of the loading mechanisms are correspondingly stationed at the preheating station, and a loading mechanism is correspondingly stationed at each of the polarization station and the cooling station.

[0014] In one embodiment, a feed bin and a feed device are provided upstream of the turntable, and a discharge bin and a discharge device are provided downstream of the turntable.

[0015] In one embodiment, the piezoelectric element polarization device further includes a positioning device, wherein the positioning device can form a positioning groove for positioning and fitting the piezoelectric element; The positioning device includes a first positioning device located downstream of the feeding bin and upstream of the turntable, and the feeding device includes a first feeding device and a second feeding device, the first feeding device is used to transfer the piezoelectric element from the feeding bin to the first positioning device, and the second feeding device is used to transfer the piezoelectric element from the first positioning device to the loading mechanism of the loading and unloading station; And / or, the positioning device includes a second positioning device located downstream of the turntable and upstream of the discharge bin, and the discharge device includes a first discharge device and a second discharge device, the first discharge device is used to transfer the polarized components from the loading mechanism of the loading and unloading station to the second positioning device, and the second discharge device is used to transfer the polarized components from the second positioning device to the discharge bin.

[0016] In the technical solution of the present invention, the functional stations are arranged in an orderly manner along the circumference of the turntable, and the orderly flow between the stations is achieved through the continuous or intermittent rotation of the turntable. Thanks to the closed characteristics of the circular layout, the loading and unloading stations have both loading and unloading functions, serving as both the starting point and the end point of the processing cycle, thus achieving a high degree of integration of the stations and effectively reducing the total number of stations, which is conducive to reducing the overall volume of the equipment and reducing equipment costs. Compared with the linear station arrangement adopted by the traditional chain-driven feeding method, the circumferential layout of this solution significantly improves the space utilization efficiency, makes the equipment structure more compact, greatly reduces the floor area, and reduces the space requirements for the installation site. At the same time, the turntable-type continuous or quasi-continuous operation mode improves the smoothness of the process connection, which is conducive to improving the polarization efficiency and product consistency. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying any creative work.

[0018] Figure 1 A schematic top view of an embodiment of a piezoelectric element polarization device provided by the present invention; Figure 2 for Figure 1 A schematic structural diagram of the piezoelectric element polarization device from another perspective; Figure 3 for Figure 2 A partial enlarged view of point A in the middle; Figure 4 for Figure 2 A partial enlarged view of point B in the middle; Figure 5 for Figure 2 A partial enlarged view of point C in the middle; Figure 6 A schematic diagram of the partial structure of an embodiment of a piezoelectric element polarization device provided by the present invention; Figure 7 For Figure 6 A structural diagram after removing part of the structure; Figure 8 for Figure 6 A schematic structural diagram of an embodiment of a preheating box; Figure 9 for Figure 8 Schematic diagram of the structure of the preheating box after removing the sealing brush; Figure 10 for Figure 6 A schematic diagram of the structure of the device at the intermediate polarization position; Figure 11 for Figure 10 Schematic diagram of the cross-section structure along DD; Figure 12 for Figure 6 Schematic diagram of the assembly structure of the first-stage chemical equipment; Figure 13 for Figure 12 Schematic diagram of the explosion structure of the first-stage chemical equipment; Figure 14 for Figure 12 Schematic diagram of the cross-sectional structure of the first-stage chemical equipment; Figure 15 for Figure 14 A partial enlarged view of the portion to the left of the middle dotted line; Figure 16 for Figure 13 A schematic structural diagram from the perspective of the first probe in FIG. Figure 17 for Figure 13 Schematic diagram of the structure of the first probe from another perspective.

[0019] Description of Figure Numbers: 1. Loading and unloading station; 2. Preheating station; 3. Polarization station; 4. Cooling station; 10. Turntable; 11. Avoidance hole; 20. Loading mechanism; 21. Mounting bracket; 22. First pole assembly; 30. Preheating box; 31. Passage; 32. Avoidance; 40. Second polarization equipment; 41. Second probe; 50. Insulation box; 51. First box shell; 52. Second box shell; 60. Cooling box; 71. Mounting table; 72. Support frame; 721. Support arm; 73. Sealing brush; 801, first positioning device; 802, second positioning device; 81, positioning groove; 82, tooling plate; 91. Feed bin; 92. First feed device; 93. Second feed device; 94. Discharge bin; 95. First discharge device; 96. Second discharge device; 100, backing plate; 110, clearance hole; 111, third hole section; 112, fourth hole section; 113, second step surface; 200, circuit board; 210, mounting hole; 300, positioning plate; 310, positioning hole; 311, first hole section; 312, second hole section; 313, first step surface; 400 , first probe; 410 , needle head; 411 , claw head; 420 , needle body; 430 , third step surface; 440 , vent hole.

[0020] The purpose, features and advantages of the present invention will be further described with reference to the accompanying drawings and in conjunction with the embodiments. DETAILED DESCRIPTION

[0021] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0022] It should be noted that if the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative position relationship, movement status, etc. between the various components under a certain specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0023] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only for descriptive purposes and cannot be understood as indicating or suggesting their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features limited to "first" and "second" may explicitly or implicitly include at least one of such features. In addition, if "and / or" or "and / or" appears in the full text, its meaning includes three parallel solutions. Taking "A and / or B" as an example, it includes solution A, solution B, or solutions that satisfy both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in this field to implement. When the combination of technical solutions is mutually contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0024] The present invention provides a piezoelectric element polarization device.

[0025] See also Figures 1 to 3 and Figure 6 In one embodiment of the present invention, the piezoelectric element polarization device includes: A turntable 10, wherein a loading and unloading station 1, a preheating station 2, and a polarization station 3 are sequentially distributed on the circumference of the turntable 10 along a first direction; and The loading mechanism 20 is fixed to the periphery of the turntable 10. The loading mechanism 20 is configured to load piezoelectric elements. The turntable 10 is configured to drive the loading mechanism 20 to rotate along the first direction so that the piezoelectric elements can traverse each station distributed circumferentially of the turntable 10.

[0026] Specifically, taking a processing cycle as an example, the starting position of the loading mechanism 20 is the loading and unloading station 1, at which the unpolarized piezoelectric elements will be transferred to the loading mechanism 20, that is, the loading process is performed at the loading and unloading station 1. Then, the turntable 10 rotates, and the loading mechanism 20 loaded with the unpolarized elements arrives at the preheating station 2, where the unpolarized elements are heated by corresponding means to approach the Curie temperature in preparation for polarization. Then, the turntable 10 continues to rotate, and the preheated unpolarized elements are driven by the loading mechanism 20 to the polarization station 3, where a DC high-voltage electric field is applied to achieve directional polarization of the piezoelectric properties. The loading mechanism 20 brings the polarized piezoelectric elements loaded thereon back to the loading and unloading station 1, where the polarized elements will be transferred from the loading mechanism 20, that is, the unloading process is performed at the loading and unloading station 1, thus completing a processing cycle. It can be understood that after the polarized components are transferred, the loading mechanism 20 will continue to stay at the loading and unloading station 1, waiting for the loading of unpolarized components, and then perform the loading process at the loading and unloading station 1.

[0027] In the technical solution of the present invention, the functional stations are arranged in an orderly manner along the circumference of the turntable 10, and the orderly flow between the stations is achieved through the continuous or intermittent rotation of the turntable 10. Thanks to the closed characteristics of the circular layout, the loading and unloading station 1 has both loading and unloading functions, serving as both the starting point and the end point of the processing cycle, achieving a high degree of integration of the stations, effectively reducing the total number of stations, and helping to reduce the overall volume of the equipment and reduce equipment costs. Compared with the linear station arrangement adopted by the traditional chain-driven feeding method, the circumferential layout of this solution significantly improves the space utilization efficiency, makes the equipment structure more compact, greatly reduces the floor area, and reduces the space requirements for the installation site. At the same time, the turntable-type continuous or quasi-continuous operation mode improves the smoothness of the process connection, which is conducive to improving the polarization efficiency and product consistency.

[0028] In one embodiment, see Figure 6, a cooling station 4 is also distributed around the circumference of the turntable 10, and the loading and unloading station 1, the preheating station 2, the polarization station 3, and the cooling station 4 are sequentially distributed along the first direction. That is, the polarized piezoelectric element first passes through the cooling station 4 and then reaches the loading and unloading station 1 for unloading. Specifically, after the loading mechanism 20 carries the polarized piezoelectric element out of the polarization station 3, it rotates with the turntable 10 into the cooling station 4. During this process, the piezoelectric element is slowly and evenly cooled from near the Curie temperature in a controlled cooling environment (such as forced air cooling or a natural cooling channel). This cooling process is a key component of the polarization process, which helps to stabilize the electric domain orientation and improve the consistency and reliability of the piezoelectric performance. Integrating the cooling station 4 into the circumferential process chain of the turntable 10 realizes the integrated continuous operation of the entire process from loading, preheating, polarization to cooling, avoids the mid-transfer of the polarized element, reduces heat loss and external interference, and improves the closed-loop nature and automation of the process. At the same time, the orderly arrangement of the cooling stations 4 maintains the symmetry and rhythm matching of the layout of the turntable 10, which is conducive to the smooth operation of the equipment and the improvement of production capacity.

[0029] In other embodiments, the cooling station 4 can be located downstream of the loading and unloading station 1. This means that after polarization, the components are unloaded onto an external conveyor or buffer area before undergoing independent cooling. This approach is suitable for applications requiring longer cooling cycles or specialized environmental control, offering greater process flexibility. Both arrangements can be flexibly selected based on actual production cycle and space requirements, ensuring optimal balance between efficiency, performance, and equipment adaptability.

[0030] Specifically, the cooling station 4 is provided with a cooling box 60, which allows ambient air or other temperature gas to pass through the cooling box 60 for forced convection heat exchange with the piezoelectric element. The cooling box 60 needs to have a passage for the loading mechanism 20 to pass through. To ensure the cooling effect and prevent external airflow interference or internal wind leakage, the opening of the passage can be sealed with a sealing brush 73. In other embodiments, the piezoelectric element can also be cooled by liquid cooling or other methods.

[0031] In one embodiment, see Figure 7, a plurality of the loading mechanisms 20 are distributed in the circumferential direction of the turntable 10. When one loading mechanism 20 stays at the loading and unloading station 1, a plurality of the loading mechanisms 20 correspondingly stay at the preheating station 2, and a loading mechanism 20 correspondingly stays at the polarization station 3 and the cooling station 4. The layout design in this embodiment fully considers the differences in the time required for each process stage. The preheating process usually takes a long time, and it is necessary to ensure that the piezoelectric element is fully and evenly heated to near the Curie temperature. Therefore, multiple loading mechanisms 20 are set at the preheating station 2 for simultaneous heating, which is equivalent to extending the residence time of the effective heating zone, meeting the process thermal response requirements, and avoiding the overall beat reduction due to excessive residence time at a single station. The polarization and cooling processes are relatively short in time, and each is equipped with a loading mechanism 20 to meet the process cycle matching and achieve beat balance between processes.

[0032] The multiple loading mechanisms 20 are distributed on the turntable 10, and the turntable 10 adopts an intermittent rotation mode, which can realize an efficient operation mode of "multi-station parallel processing and single-station sequential flow". Specifically, the time interval of the turntable 10 rotation can meet the requirements of unloading the polarized components and loading the unpolarized components at the loading and unloading station 1, as well as the requirements of the piezoelectric components completing polarization at the polarization station 3 and cooling at the cooling station 4. The piezoelectric components entering the preheating station 2 require the turntable 10 to rotate multiple times before leaving, so that they can be heated for a long time at the preheating station 2, which is beneficial to ensuring the heating effect of the piezoelectric components. Among them, the number of loading mechanisms 20 corresponding to the preheating station 2 can be 2 or 3 or 4 or 5, etc., which can be set according to actual needs.

[0033] In one embodiment, see Figures 6 to 9 The preheating station 2 is equipped with a preheating box 30, which has two passages 31 relatively distributed in the first direction and avoidance openings 32 at both ends respectively connected to the two passages 31. The passages 31 and the avoidance openings 32 are used to avoid the loading mechanism 20. The preheating box 30 is provided with a sealing brush 73 covering the avoidance openings 32 and the passages 31.

[0034] It can be understood that the avoidance opening 32 is opened in the wall of the preheating box 30 and is connected to the inner cavity of the preheating box 30. When the turntable 10 drives the loading mechanism 20 to rotate to the preheating station 2, the loading mechanism 20 enters the preheating box 30 from the side opening 31. The piezoelectric element carried by it then enters the inner cavity of the preheating box 30. Under the action of the hot air circulation system or the built-in heating element, it is evenly heated to a temperature close to the Curie temperature, completing the preheating preparation before polarization. During the process of the loading mechanism 20 passing through the interior of the preheating box 30, the avoidance opening 32 provides sufficient space for its movement path to avoid interference with the movement of the loading mechanism 20 and ensure smooth operation. After heating is completed, the loading mechanism 20 leaves the preheating box 30 from the other side opening 31 and continues to rotate to the next station.

[0035] In the non-passing state, the sealing brush 73 effectively blocks the passage 31 and the avoidance opening 32 through its fine and soft brush structure, significantly reducing the overflow of hot air in the box and inhibiting the intrusion of external cold air, thereby maintaining the uniformity and stability of the temperature field in the preheating box 30, improving the efficiency of thermal energy utilization, and reducing energy consumption. When the loading mechanism 20 passes through, the sealing brush 73 can be flexibly pushed open, allowing the relevant structure to pass smoothly, and the movement resistance generated is extremely small, which does not affect the continuous operation of the turntable 10. At the same time, the sealing brush 73 can still maintain close contact with the relevant structure under the action of elastic recovery, and continues to provide a certain degree of sealing effect during the dynamic process, further enhancing the thermal insulation performance. This sealing structure takes into account both thermal efficiency and movement reliability, which is conducive to improving the stability and consistency of the polarization process.

[0036] Specifically, the preheating box 30 is connected to a heating gas source, which generates high-temperature gas that is passed into the preheating box 30. Correspondingly, ventilation channels are provided at multiple locations within the preheating box 30 to evenly distribute the high-temperature gas within the preheating box 30, thereby ensuring a uniform temperature field within the preheating box 30. The heating gas source may be a combination of a blower and a heating device, or a gas compression device.

[0037] In one embodiment, please refer to Figures 6 to 9 The preheating box 30 is located above the turntable 10 and spaced apart from the turntable 10. The escape opening 32 is located on the lower side of the preheating box 30. The loading mechanism 20 includes a mounting bracket 21 protruding from the upper side of the turntable 10. The escape opening 32 is used to avoid the mounting bracket 21. It should be noted that the up and down directions mentioned in the present invention are all referenced to the ground. The direction toward the ground is downward, that is, the side of the relevant structure facing the ground corresponds to its lower side, and the direction away from the ground is upward, that is, the side of the relevant structure facing away from the ground corresponds to its upper side.

[0038] In this embodiment, the preheating box 30 does not need to wrap around the turntable 10. The turntable 10 is located outside the preheating box 30, effectively avoiding the long-term thermal effects of high temperature on the turntable 10 body and drive components, thereby improving the stability and service life of the equipment. At the same time, it also avoids the heat waste caused by the preheating box 30 heating the turntable 10. The volume of the mounting bracket 21 is relatively small, and the height ratio of the mounting bracket 21 entering the preheating box 30 can be controlled by controlling the protruding height of the mounting bracket 21 and the distance between the preheating box 30 and the turntable 10, which is conducive to improving the efficiency of heat energy utilization and reducing energy consumption. In other embodiments, the outer periphery of the turntable 10 can also be inserted into the preheating box 30 from the avoidance opening 32. In this case, the avoidance opening 32 is used to avoid the turntable 10.

[0039] In one embodiment, see Figure 6 , the preheating box 30 is in the shape of an arc extending along the first direction. In this way, the arc structure of the preheating box 30 is highly matched with the rotational motion trajectory of the turntable 10, ensuring that the loading mechanism 20 operates smoothly and without interference during the crossing process. Among them, the central angle corresponding to the preheating box 30 is preferably greater than 90 degrees, and can be less than 180 degrees or greater than 180 degrees. In other words, the preheating box 30 occupies a larger angular range in the circumferential direction of the turntable 10, thereby extending the effective residence time of the loading mechanism 20 and the piezoelectric element it carries in the preheating box 30. Since the polarization process requires the elements to be uniformly heated to a temperature close to the Curie temperature and maintained for a sufficient time to achieve thermal equilibrium, a longer preheating time is the key to ensuring the polarization quality. By providing a large-angle arc preheating box 30, the heating stroke is significantly extended without increasing the overall size of the equipment, so that multiple loading mechanisms 20 can be in the preheating area at the same time, realizing batch continuous heating, and improving thermal energy utilization efficiency and process stability. In other embodiments, the central angle corresponding to the preheating box 30 may also be less than or equal to 90 degrees, so as to meet the preheating requirements.

[0040] In one embodiment, see Figure 6 and Figure 12The loading mechanism 20 includes a first polarization device 22, a plurality of positioning holes 310 are provided on the upper side of the first polarization device 22, and one of the positioning holes 310 is used to load the piezoelectric element. The first polarization device 22 has a first probe 400 extending upward into the positioning hole 310, and the polarization position 3 is installed with a second polarization device 40, and the second polarization device 40 has a second probe 41 extending downward. It can be understood that when the loading mechanism 20 rotates with the turntable 10 and is positioned at the polarization position 3, the first polarization device 22 is located directly below the second polarization device 40, and the two are precisely aligned in the vertical direction. At this time, the piezoelectric element is clamped between the first probe 400 and the second probe 41, and its lower surface is in reliable contact with the first probe 400 in the first polarization device 22, and its upper surface is in close contact with the second probe 41 extending downward from the second polarization device 40, forming a stable upper and lower electrode connection. The DC high voltage output by the high-voltage power supply is input through the second probe 41, passes through the piezoelectric element body, and is then output through the first probe 400, forming a complete polarization current loop. In other embodiments, the polarization station 3 may also be equipped with two polarization devices distributed in the upper and lower directions.

[0041] In one embodiment, see Figure 6 、 Figure 10 and Figure 11 The piezoelectric element polarization equipment also includes an insulation box 50 mounted on the polarization station 3. The insulation box 50 is connected to a heating gas source and comprises a first housing 51 and a second housing 52 joined vertically. The first housing 51 is configured to be raised and lowered, and the second polarization equipment 40 is fixedly mounted on the first housing 51. This allows high-temperature gas to be introduced into the insulation box 50, maintaining the temperature of the piezoelectric element and ensuring the polarization effect. In other embodiments, a heating lamp may also be installed at the polarization station 3.

[0042] It is understood that before the loading mechanism 20 rotates to the polarization station 3, the first housing 51 should be raised to avoid interference with the loading mechanism 20 and the second probe 41 and the piezoelectric element. After the loading mechanism 20 reaches the polarization station 3, the first housing 51 is lowered until the first housing 51 and the second housing 52 are joined, and the second probe 41 abuts the upper surface of the piezoelectric element. In other embodiments, the second polarization device 40 can also be arranged in a liftable manner within the thermal insulation box 50.

[0043] It should be noted that the side of the lower box shell should be provided with a passage for avoiding the entry and exit of the loading mechanism 20. In order to improve the insulation effect of the insulation box 50, a sealing brush 73 can be provided to cover the passage and at the same time cover the joint seam between the first box shell 51 and the second box shell 52.

[0044] In one embodiment, the first probe 400 has a fixed needle head 410, the cross-section of the needle head 410 is adapted to the cross-section of the piezoelectric element, and the needle head 410 is provided with a plurality of claws 411; corresponding to one of the piezoelectric elements, the second polarization device 40 is configured with a plurality of second probes 41, and the second probes 41 are configured as elastic probes.

[0045] Specifically, the first probe 400 on the lower side is fixedly arranged on the first polarization device 22 of the loading mechanism 20, and the size of its needle 410 is adapted to the size of the piezoelectric element, that is, relatively close, and can provide good support for the piezoelectric element through multiple claws 411, and form multi-point distributed contact for the piezoelectric element, significantly reducing the risk of local contact failure caused by slight unevenness, oxidation or contamination on the surface of the piezoelectric element. Even if individual claws 411 fail to be fully conductive, the remaining claws 411 can still maintain effective electrical connection, thereby greatly improving the overall conduction yield, effectively avoiding the problem of insufficient or uneven polarization caused by poor contact, and is conducive to improving the polarization yield of the piezoelectric element; the second probe 41 on the upper side is configured as a retractable elastic probe, which can be compressed axially when in contact with the piezoelectric element. By adaptively deforming multiple second probes 41 at different positions of the same piezoelectric element, it is ensured that each second probe 41 can maintain a close fit with the upper surface of the piezoelectric element, ensuring that the high-voltage electric field is stably applied during the entire polarization process.

[0046] In other embodiments, the first probe 400 and the second probe 41 may both be configured as elastic probes.

[0047] In one embodiment, see Figure 2 and Figure 3 The piezoelectric element polarization equipment is provided with a mounting platform 71, on which a turntable 10 is rotatably mounted. A clearance hole 11 is provided in the center of the turntable 10. A support frame 72 is inserted upward through the clearance hole 11 and fixedly connected to the mounting platform 71. The support frame 72 includes a plurality of support arms 721 radially distributed along the circumference, which are used to provide structural support for the relevant equipment of at least one of the preheating station 2, the polarization station 3, and the heat preservation station. By arranging the support arms 721 in the space inside the turntable 10, the idle space in the center of the turntable 10 is fully utilized, avoiding the additional occupation of the peripheral installation area, and effectively improving space utilization.

[0048] Specifically, the lower shell of the insulation box 50 is supported by a support arm 721, and the preheating box 30 is supported by multiple support arms 721. A support structure can be further provided on the outer peripheral side of the turntable 10 to support the outer peripheral side of the preheating box 30. Combined with the support of the support arm 721 on the inner peripheral side of the preheating box 30, the installation stability of the preheating box 30 can be guaranteed, which is beneficial to suppressing the deformation or displacement of the box body of the preheating box 30 caused by equipment operation vibration or thermal expansion and contraction, ensuring the relative position accuracy between the preheating box 30 and the loading mechanism 20, and ensuring the fitting effect of the sealing brush 73 and the smoothness of the loading mechanism 20 passing through the avoidance channel.

[0049] In one embodiment, see Figures 12 to 15 The first polarization device 22 includes a backing plate 100, a circuit board 200, and a positioning plate 300 stacked in sequence along the second direction. The positioning plate 300 is provided with a plurality of positioning holes 310. The positioning holes 310 are located on a side away from the circuit board 200 for placing the piezoelectric element. A plurality of first probes 400 are mounted on the circuit board 200 and electrically connected to the circuit of the circuit board 200. The first probes 400 include needles 410. The needles 410 of the plurality of first probes 400 are inserted into the plurality of positioning holes 310 in a one-to-one correspondence. The needles 410 are provided with a plurality of claws 411 on a side away from the circuit board 200. It can be understood that the backing plate 100 is mounted on the mounting bracket 21. The second direction is the direction away from the mounting bracket 21, i.e., the upward direction. The piezoelectric element can be a piezoelectric ceramic, a ferroelectric single crystal, or a ferroelectric polymer. The stacked backing plate 100, the circuit board 200, and the positioning plate 300 can be fixed by fasteners.

[0050] By providing a laminated structure comprising a pad 100, a circuit board 200, and a positioning plate 300, the pad 100 provides support, the positioning plate 300 limits the relative position between the needle tip 410 of the first probe 400 and the piezoelectric element to be polarized, and an external power source is applied through the circuit board 200, that is, a voltage can be applied to the piezoelectric element through the first probe 400. The multiple positioning holes 310 on the positioning plate 300 align the multiple piezoelectric elements with the needle tips 410 of the multiple first probes 400, ensuring that each first probe 400 is precisely aligned with the corresponding piezoelectric element, thereby ensuring that all prongs 411 can abut against the piezoelectric element. The pad 100 can directly or indirectly provide support for the first probe 400 in the second direction, ensuring that all prongs 411 on the first probe 400 are at the same height, thereby ensuring that all prongs 411 can synchronously and evenly apply pressure when contacting the piezoelectric element.

[0051] The claw head 411 should be a conical structure, and its tip is used to contact the surface of the piezoelectric element. The conical tip design can form a higher unit area pressure when applying contact pressure, which helps to pierce the oxide layer or contaminants that may exist on the surface of the piezoelectric element, achieve direct conductive contact between conductors, and effectively reduce the overall contact resistance, ensure the stable application of the high-voltage electric field, and improve the reliability and uniformity of the polarization process. Among them, the claw head 411 can be a cone or a polygonal cone structure such as a triangular pyramid or a square pyramid. Multiple claw heads 411 can be distributed in a rectangular array on the surface of the needle head 410, or they can be arranged in multiple annular arrays.

[0052] In one embodiment, see Figure 15 The positioning hole 310 includes a first hole section 311 and a second hole section 312 connected by a first step surface 313. The cross-section of the first hole section 311 is larger than the cross-section of the second hole section 312. When both the first hole section 311 and the second hole section 312 are configured as circular holes, the diameter of the first hole section 311 is larger than the diameter of the second hole section 312. The first hole section 311 is used to accommodate the piezoelectric element, and the needle 410 is inserted into the second hole section 312. That is, in the second direction, the second hole section 312 and the first hole section 311 are distributed sequentially. The first hole section 311 is located on the side facing away from the circuit board 200. After the piezoelectric element is placed, it can be supported by the first step surface 313. In particular, during polarization processing, the piezoelectric element will also be subjected to pressure from the probe of another tool on this side. The support of the piezoelectric element by the first step surface 313 can well ensure the structural stability of the piezoelectric element, thereby ensuring the reliability and process consistency of the polarization process. In other embodiments, the piezoelectric element itself may form a step structure to match the positioning hole 310 .

[0053] In one embodiment, the height of the first probe 400 is less than or equal to 4 mm. It is understood that the height of the first probe 400 is also its extension length along the second direction. When the height of the first probe 400 is within this range, the conductive path can be shortened, the structural rigidity and bending resistance of the first probe 400 can be enhanced, and during the polarization process of applying a high-voltage electric field, the first probe 400 can withstand mechanical pressure and electric field force, and is not prone to bending, tilting or vibrating under pressure, thereby ensuring the stability and verticality of the contact between the first probe 400 and the piezoelectric element, avoiding uneven or offset contact pressure due to deformation of the first probe 400, ensuring the polarization yield of the piezoelectric element, and also helping to increase the service life of the first probe 400. At the same time, it is also beneficial to reduce the thickness of the polarization equipment and reduce the space occupied by the polarization equipment. Among them, the height of the first probe 400 is preferably greater than or equal to 1 mm. That is, the height of the first probe 400 can be 1 mm, 1.5 mm, 2 mm, 2.5 mm, 3 mm, 3.5 mm, 4 mm, etc. In other embodiments, the height of the first probe 400 may also be 0.8 mm, 4.5 mm, 5 mm, 5.5 mm, etc.

[0054] In one embodiment, the outer periphery of the first probe 400 is circular, and the cross-sectional diameter of the needle 410 is 5 mm to 8 mm. This ensures that the needle 410 has sufficient structural strength to support the multiple prongs 411 while providing sufficient surface area for distributing a larger number of prongs 411, thereby ensuring the polarization yield of the piezoelectric element and the service life of the first probe 400. The cross-sectional diameter of the needle 410 can be 5 mm, 5.5 mm, 6 mm, 6.5 mm, 7 mm, 7.5 mm, 8 mm, etc.

[0055] In other embodiments, the outer contour of the first probe 400 may also be configured as a polygon or an ellipse, and the diameter of the cross section of the needle 410 may also be 4 mm, 4.5 mm, 8.5 mm, 9 mm, etc. The outer contour shape of the first probe 400, mainly the outer contour shape of the needle 410, may be adapted to the outer contour shape of the piezoelectric element, and the shape of the cross-sectional contour of the positioning hole 310 may also be adapted accordingly, and is not limited to a circular shape, but may also be a polygonal shape, and the size may also be adapted to ensure the polarization effect.

[0056] In one embodiment, the number of claws 411 corresponding to the needle 410 is greater than or equal to 10. In this way, a high-density array of claws 411 can be formed, which is conducive to forming a dense conductive network on the surface of the piezoelectric element after contacting the piezoelectric element. Even if there are tiny particles, local oxidation or slight warping on the surface of the piezoelectric element, a large number of redundant contact points can ensure the stable introduction of current, greatly improving the uniformity and integrity of the electric field application, and helping to improve the polarization yield of the piezoelectric element. Among them, the number of claws 411 on a needle 410 can be 10, 15, 20, 25, 30, etc. In other embodiments, it can also be configured as 8, 35, 40, etc.

[0057] In one embodiment, see Figures 15 to 17 The first probe 400 is provided with a vent hole 440 extending along the second direction, and the pad 100 is provided with a plurality of clearance holes 110 extending along the second direction. A vent hole 440 of the first probe 400 is correspondingly connected to a clearance hole 110. After the piezoelectric element enters the high-temperature gas environment, the side of the piezoelectric element facing away from the pad 100 can naturally be exposed outside the positioning hole 310, and is easily heated by the high-temperature gas. After the high-temperature gas passes through the clearance hole 110, the vent hole 440, and the second hole section 312 of the positioning hole 310 in sequence, it can reach the side of the piezoelectric element close to the pad 100, thereby heating this side of the piezoelectric element. In this way, the piezoelectric element can be heated evenly and efficiently. Furthermore, in the process of flowing through the vent hole 440, the high-temperature gas also heats the first probe 400, making the first probe 400 itself a heat conduction medium. This not only helps maintain a stable temperature at the interface between the first probe 400 and the piezoelectric element, reducing temperature gradients caused by heat loss, but also improves thermal uniformity across the entire contact area, preventing localized overcooling or overheating, further ensuring consistent polarization quality. In other embodiments, the related structures of the first polarization assembly 22 (such as the backing plate 100 and the positioning plate 300) can also be configured with highly thermally conductive materials to more efficiently transfer heat from the high-temperature gas to the piezoelectric element.

[0058] In one embodiment, see Figure 15 The relief hole 110 includes a third hole segment 111 and a fourth hole segment 112 connected by a second step surface 113. The cross-section of the third hole segment 111 is larger than the cross-section of the fourth hole segment 112. The first probe 400 is inserted into the third hole segment 111 and is spaced apart from the second step surface 113. The vent hole 440 is opposite to the fourth hole segment 112.

[0059] It is understood that the third and fourth hole segments 111 and 112 are configured to correspond to the shape of the first probe 400, being circular holes. The diameter of the third hole segment 111 is larger than that of the fourth hole segment 112, thereby forming an annular second step surface 113 at their junction. The claw 411 is disposed at one end of the first probe 400, while the other end of the first probe 400 is inserted into the third hole segment 111 and spaced apart from the second step surface 113. The vent 440 and the fourth hole segment 112 are disposed opposite each other, thereby interconnecting. High-temperature gas flows through the fourth hole segment 112 into the vent 440, thereby entering the interior of the first probe 400. The high-temperature gas can also enter the third hole segment 111, surrounding the circumference of the distal end of the first probe 400 and effectively heating the first probe 400. In other embodiments, the end face of the first probe 400 may directly abut the second step surface 113.

[0060] In one embodiment, the diameter of the vent hole 440 is 1.5 mm to 2.5 mm. Specifically, the vent hole 440 is configured as a circular hole with a relatively smooth inner wall, thereby avoiding excessive resistance to the flow of the high-temperature gas. The diameter of the vent hole 440 is within the range of this embodiment, ensuring sufficient high-temperature gas supply flow and efficiency, thereby ensuring the polarization efficiency and effect of the voltage element. The diameter of the vent hole 440 can be 1.5 mm, 2 mm, or 2.5 mm. In other embodiments, it can also be 1.2 mm, 2.8 mm, or 3 mm, etc.

[0061] In one embodiment, the needle 410 is fixed to the circuit board 200. That is, the first probe 400 is configured as a fixed first probe 400. In this way, the first polarization device 22 can be arranged below the piezoelectric element. After the claw 411 contacts the piezoelectric element, the supporting force of the pad 100 can be transmitted to the piezoelectric element through the needle 410, thereby playing a role in supporting the piezoelectric element. In this way, not only is the positional stability of the first probe 400 during the power-on and heating process ensured, but also the warping or deformation of the piezoelectric element due to local uneven force or insufficient support is avoided, which helps to maintain a good electrical contact state and improve the reliability and process consistency of the polarization process. In other embodiments, the first probe 400 can also be set as an elastic first probe 400, that is, the needle 410 is connected to the needle body 420 or the circuit board 200 through an elastic structure such as a spring.

[0062] In one embodiment, see Figures 15 to 17The first probe 400 also includes a needle body 420. The needle body 420 and the claw head 411 are respectively arranged on opposite sides of the needle head 410. The needle body 420, the needle head 410 and the claw head 411 are integrally formed. The circuit board 200 is provided with a plurality of mounting holes 210. A first probe 400 is correspondingly inserted into a mounting hole 210 through its needle body 420 and fixed to the mounting hole 210 by welding. In this embodiment, the first probe 400 adopts an integrated molding process to ensure that the needle body 420, the needle head 410 and the claw head 411 are continuous in structure and uniform in material, eliminating the thermal resistance, poor electrical contact and mechanical weak points that may be generated by separate connections. This overall structure has excellent electrical conductivity, thermal conductivity and mechanical strength, and is particularly suitable for high temperature and high pressure polarization environments. The needle body 420 is inserted into the mounting hole 210 of the circuit board 200 and secured by soldering. The first probe 400 can thus connect to the circuit diagram on the circuit board 200 through solder, not only achieving a low-resistance electrical connection but also forming a secure mechanical anchor, preventing the first probe 400 from loosening or shifting due to thermal expansion and contraction or gas flow impact. In other embodiments, the first probe 400 may not be provided with the needle body 420, and the needle tip 410 may be directly mounted on the circuit board 200.

[0063] In one embodiment, the needle body 420 and the needle head 410 are connected by a third step surface 430, and the third step surface 430 abuts the side of the circuit board 200 facing away from the pad 100. When the outer periphery of the first probe 400 is circular, the needle body 420 and the needle head 410 are both cylindrical, and the third step surface 430 at the connection between the two is also correspondingly annular. The third step surface 430 can abut the surface of the circuit board 200, or a step surface can be provided within the mounting hole 210 to abut the third step surface 430, thereby providing a precise axial positioning reference for the first probe 400. After welding and fixing, the contact surface between the third step surface 430 and the circuit board 200 becomes an additional support surface, which helps to disperse the thermal stress and mechanical loads borne by the first probe 400 during operation, thereby improving the installation stability of the first probe 400 and the reliability of the overall tooling structure.

[0064] In one embodiment, the height ratio of the needle head 410 to the needle body 420 is 0.3 to 0.5. Maintaining this height ratio, i.e., the needle head 410 is lower, significantly reduces the risk of bending deformation and stress concentration in the needle head 410, improves the overall rigidity and fatigue resistance of the first probe 400, and ensures long-term reliability. Furthermore, the needle body 420 is taller, providing sufficient insertion depth, allowing the first probe 400 to securely fit through the needle body 420 and the mounting hole 210 of the circuit board 200, the clearance hole 110 of the backing plate 100, and other structures. A sufficiently strong solder joint is formed between the needle body 420 and the circuit board 200, and the backing plate 100 can also reliably support the first probe 400 through the abutment between the second step surface 113 and the end face of the needle body 420. The height ratio of the needle head 410 to the needle body 420 can be 0.3, 0.35, 0.4, 0.45, or 0.5. In other embodiments, the height ratio may also be 0.2, 0.25, 0.55, or 0.6.

[0065] In one embodiment, the diameter ratio of the cross-section of the needle tip 410 to the cross-section of the needle body 420 is 1.1 to 1.5. That is, the thickness of the needle tip 410 and the needle body 420 are relatively uniform. This helps maintain the structural stability of the first probe 400. Furthermore, the third step surface 430 formed at the connection between the two can be of an appropriate size, thereby ensuring reliable contact between the third step surface 430 and the circuit board 200. Specifically, this diameter ratio can be 1.1, 1.2, 1.3, 1.4, or 1.5. In other embodiments, this diameter ratio can also be 1.05, 1.6, or 1.7.

[0066] In one embodiment, see Figure 1 and Figure 2 , a feed bin 91 and a feed device are provided upstream of the turntable 10, and a discharge bin 94 and a discharge device are provided downstream of the turntable 10. The feed bin 91 is used to place the components to be polarized, and the feed device is used to transfer the components to be polarized from the feed bin 91 to the loading mechanism 20 of the loading and unloading station 1 of the turntable 10; the discharge bin 94 is used to place the polarized components, and the discharge device is used to transfer the polarized components from the loading mechanism 20 of the loading and unloading station 1 of the turntable 10 to the discharge bin 94. It should be noted that the upstream and downstream mentioned in the present invention are based on the sequence of the production process of the piezoelectric elements, and do not limit the relative positions of the relevant devices. The relevant structures can be distributed around the turntable 10, or can be distributed linearly with the turntable 10.

[0067] Furthermore, the piezoelectric element polarization apparatus includes a positioning device that forms a positioning groove 81 for the piezoelectric element to align with. The positioning device can be used during the feeding or unloading process to position the piezoelectric element through the positioning groove 81, thereby ensuring that the piezoelectric element remains stable during transportation, so that it can be reliably placed in the correct position at each workstation, ensuring the reliable execution of related processes.

[0068] In one embodiment, see Figure 2 and Figure 4 The positioning device includes a first positioning device 801 located downstream of the feeding bin 91 and upstream of the turntable 10, and the feeding device includes a first feeding device 92 and a second feeding device 93. The first feeding device 92 is used to transfer the piezoelectric element from the feeding bin 91 to the first positioning device 801, and the second feeding device 93 is used to transfer the piezoelectric element from the first positioning device 801 to the loading mechanism 20 of the loading and unloading station 1. It can be understood that after the unpolarized components are transported, the relative position of the piezoelectric components may be offset or misaligned. The first positioning device 801 can be provided with two tooling plates 82, and the two tooling plates 82 are spliced ​​together to form a positioning groove 81. When the first feeding device 92 transports the piezoelectric components, a certain distance can be maintained between the two tooling plates 82 so that the piezoelectric components can be located within the range of the positioning groove 81. Then the two tooling plates 82 move toward each other and splice together to form the positioning groove 81, which can push the piezoelectric components so that they fall into place in the positioning groove 81. After that, the piezoelectric components picked up by the second feeding device 93 can be accurately positioned in the positioning hole 310 on the upper side of the loading mechanism 20.

[0069] In one embodiment, see Figure 2 and Figure 5 The positioning device includes a second positioning device 802 located downstream of the turntable 10 and upstream of the discharge bin 94. The discharge device includes a first discharge device 95 and a second discharge device 96. The first discharge device 95 is used to transfer the polarized components from the loading mechanism 20 of the loading and unloading station 1 to the second positioning device 802, and the second discharge device 96 is used to transfer the polarized components from the second positioning device 802 to the discharge bin 94. The second positioning device 802 can meet the positioning requirements of the piezoelectric components by forming a plurality of holes in the tooling plate 82 to form positioning grooves 81. In addition, when discharging, the polarized components are first transferred to the second positioning device 802 by the first discharge device 95, which can play a buffering role.

[0070] The above description is merely an exemplary embodiment of the present invention and does not limit the scope of protection of the present invention. Any equivalent structural transformation made by using the contents of the present invention description and drawings under the technical concept of the present invention, or directly / indirectly applied in other related technical fields, is included in the scope of protection of the present invention.

Claims

1. A piezoelectric element polarization device, characterized in that: include: A turntable, wherein a loading and unloading station, a preheating station, and a polarization station are sequentially distributed along a first direction on the circumference of the turntable; as well as A loading mechanism is fixed to the periphery of the turntable, the loading mechanism is configured to load a piezoelectric element, and the turntable is configured to drive the loading mechanism to rotate along the first direction so that the piezoelectric element can traverse each station distributed around the turntable.

2. The piezoelectric element polarization device according to claim 1, wherein The preheating station is equipped with a preheating box, which has two passages relatively distributed in the first direction and avoidance openings at both ends respectively connected to the two passages, the passages and the avoidance openings are used to avoid the loading mechanism, and the preheating box is provided with a sealing brush covering the avoidance openings and the passages.

3. The piezoelectric element polarization device according to claim 2, wherein: The preheating box is arranged above the turntable and spaced apart from the turntable, the avoidance opening is arranged on the lower side of the preheating box, the loading mechanism includes a mounting bracket protruding above the turntable, and the avoidance opening is used to avoid the mounting bracket; And / or, the preheating box is in an arc shape extending along the first direction; And / or, the preheating box is connected to a heating gas source.

4. The piezoelectric element polarization device according to claim 1, wherein The loading mechanism includes a first polarization device, a plurality of positioning holes are provided on the upper side of the first polarization device, one of the positioning holes is used to load one of the piezoelectric elements, the first polarization device has a first probe extending upward into the positioning hole, the polarization position is installed with a second polarization device, the second polarization device has a second probe extending downward.

5. The piezoelectric element polarization device according to claim 4, wherein: The piezoelectric element polarization equipment also includes an insulation box installed at the polarization station, the insulation box is connected to a heating gas source, and the insulation box includes a first box shell and a second box shell spliced ​​along the up and down directions. The first box shell can be raised and lowered, and the second polarization equipment is fixedly installed on the first box shell.

6. The piezoelectric element polarization device according to claim 4, wherein: The first probe has a fixed needle head, the cross section of the needle head is adapted to the cross section of the piezoelectric element, and the needle head is provided with a plurality of claws; Corresponding to one of the piezoelectric elements, the second polarization device is configured with a plurality of second probes, and the second probes are configured as elastic probes.

7. The piezoelectric element polarization device according to claim 1, wherein Cooling stations are further distributed in the circumferential direction of the turntable, and the loading and unloading stations, the preheating station, the polarization station and the cooling station are distributed in sequence along the first direction.

8. The piezoelectric element polarization device according to claim 7, wherein: There are multiple loading mechanisms distributed around the turntable. When one loading mechanism is stationed at the loading and unloading station, multiple loading mechanisms are correspondingly stationed at the preheating station, and one loading mechanism is correspondingly stationed at the polarization station and the cooling station.

9. The piezoelectric element polarization device according to any one of claims 1 to 8, wherein: A feeding bin and a feeding device are provided upstream of the turntable, and a discharging bin and a discharging device are provided downstream of the turntable.

10. The piezoelectric element polarization device according to claim 9, wherein The piezoelectric element polarization device further includes a positioning device, wherein the positioning device can form a positioning groove for positioning and matching the piezoelectric element; The positioning device includes a first positioning device located downstream of the feeding bin and upstream of the turntable, and the feeding device includes a first feeding device and a second feeding device, the first feeding device is used to transfer the piezoelectric element from the feeding bin to the first positioning device, and the second feeding device is used to transfer the piezoelectric element from the first positioning device to the loading mechanism of the loading and unloading station; And / or, the positioning device includes a second positioning device located downstream of the turntable and upstream of the discharge bin, and the discharge device includes a first discharge device and a second discharge device, the first discharge device is used to transfer the polarized components from the loading mechanism of the loading and unloading station to the second positioning device, and the second discharge device is used to transfer the polarized components from the second positioning device to the discharge bin.

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