Cleaning system

Abstract

The invention discloses a cleaning system. The cleaning system comprises cleaning equipment and a base station; the cleaning equipment comprises an equipment body, a first filtering assembly, a first connector and a second connector. The first connector is used for enabling water flowing through the first filtering assembly to flow out of the first containing space in the cleaning process; the second interface is used for allowing water flow to enter the first filtering assembly in the cleaning process; water flow in a first flow direction generated in the cleaning process sequentially flows through the first opening, the first filtering assembly and the first connector; the base station comprises a base station body and a third interface, and the third interface is suitable for being butted with the first opening or the second interface; water flow in the second flow direction generated in the self-cleaning process sequentially flows through the first connector, the first filtering assembly, the first opening and the third connector; the cleaning system further comprises a power assembly, and in the self-cleaning process, the first connector communicates with a water source so as to provide water flow in the second flow direction. According to the cleaning system, the first filtering assembly does not need to be manually washed and cleaned, and the use convenience of a user is improved.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of underwater cleaning, in particular to a cleaning system. BACKGROUND

[0002] The cleaning device is used for cleaning the pool, swimming pool and the like. When the dust box in the cleaning device needs to be cleaned or maintained, the user needs to take out the cleaning device from the water and take out the dust box for manual flushing and cleaning, thereby causing inconvenience to the user. SUMMARY

[0003] The present disclosure provides a cleaning system to solve the problem that the existing cleaning device needs to be taken out from the water by the user and the dust box needs to be taken out for flushing and cleaning, thereby causing inconvenience to the user.

[0004] To solve the above technical problems, the present disclosure provides a cleaning system, which comprises a cleaning device and a base station; the cleaning device comprises: a device body having a first accommodating space; a first filter assembly at least partially arranged in the first accommodating space, the first filter assembly having a first opening suitable for water flow; a first interface in fluid communication with the first accommodating space, so as to allow the water flow passing through the first filter assembly to flow out of the first accommodating space during cleaning; a second interface in fluid communication with the first accommodating space, suitable for being matched with the first opening to allow the water flow to enter the first filter assembly during cleaning; wherein the cleaning process generates a water flow in a first flow direction, and the water flow in the first flow direction flows through the first opening, the first filter assembly and the first interface in sequence; the base station comprises: a base station body; a third interface arranged on the base station body, suitable for being matched with the first opening or the second interface, so as to allow the water flow to flow from the first filter assembly to the base station body during self-cleaning; wherein the self-cleaning process generates a water flow in a second flow direction, and the water flow in the second flow direction flows through the first interface, the first filter assembly, the first opening and the third interface in sequence; the cleaning system further comprises a power assembly for forming the water flow in the second flow direction during self-cleaning; wherein, during self-cleaning, the first interface is in communication with a water source to provide the water flow in the second flow direction.

[0005] During self-cleaning, the second interface or the first opening is sealed and matched with the third interface.

[0006] The cleaning system further comprises a second accommodating space at least partially arranged in the base station body and a second filter assembly at least partially arranged in the second accommodating space, the second filter assembly comprising a second opening in communication with the third interface, and the power assembly is used to guide the water flow to flow through the first interface, the first filter assembly, the first opening, the third interface and the second opening in sequence, and then enter the second filter assembly.

[0007] The second filter assembly comprises a filter bag which is arranged in the base station body in a detachable manner.

[0008] The cleaning system further comprises a fifth interface arranged on the base station body and in fluid communication with the second filter assembly for allowing water flow through the second filter assembly to flow out of the base station body during the self-cleaning process.

[0009] The cleaning device further comprises a fourth interface arranged on the first accommodating space, and the fourth interface and the fifth interface are connected during the self-cleaning process. The power assembly is configured to guide the water flow to circulate in the first accommodating space and the second accommodating space, and the first interface is in a closed state.

[0010] During the self-cleaning process, the fifth interface is connected with the first interface, and the second interface or the first opening is connected with the third interface. The power assembly is configured to guide the water flow to circulate in the first accommodating space and the second accommodating space.

[0011] The cleaning system further comprises a fifth interface arranged on the base station body for allowing water flow to flow out of the base station body during the self-cleaning process.

[0012] The fifth interface is configured to be connected with a pool skimming assembly. The pool skimming assembly comprises a pool skimming body and a skimming filter assembly arranged at least partially in the pool skimming body. During the self-cleaning process, the fifth interface and the skimming filter assembly are in communication. The power assembly is configured to guide the water flow of the second flow direction to flow through the fifth interface into the skimming filter assembly and flow out of the skimming filter assembly. Alternatively, the fifth interface is connected with an external sewage pipeline. During the self-cleaning process, the power assembly is configured to guide the water flow of the second flow direction to flow through the fifth interface into the external sewage pipeline.

[0013] The first accommodating space is a substantially closed space, and the first filter assembly is a filter screen structure. During the cleaning process, the water flow of the first flow direction flows through the first filter assembly, the first accommodating space, and then flows out of the cleaning device from the first interface. During the self-cleaning process, the water flow of the second flow direction flows through the first interface, the first accommodating space, the first filter assembly, and the first opening in sequence.

[0014] The power assembly comprises one of the following: a base station suction member arranged on the base station body, a main water pump arranged on the cleaning device, or an external suction member arranged outside the base station and the cleaning device.

[0015] The power assembly comprises a main water pump arranged on the cleaning device. The main water pump comprises a first working mode and a second working mode. During the cleaning process, the main water pump is in the first working mode. During the self-cleaning process, the main water pump is in the second working mode.

[0016] When the cleaning device is connected with the base station, the base station is configured to charge the cleaning device or replace the battery of the cleaning device. The charging mode comprises at least one of wireless charging or electrode sheet charging.

[0017] To solve the above technical problems, the present disclosure provides a cleaning system, comprising a cleaning device and a base station; the cleaning device comprises: a device body having a first accommodating space; a first filter assembly at least partially arranged in the first accommodating space, the first filter assembly having a first opening suitable for water flow to pass through; a first interface in fluid communication with the first accommodating space, so as to allow water flow passing through the first filter assembly to flow out of the first accommodating space during a cleaning process; and a second interface in fluid communication with the first accommodating space, suitable for being matched with the first opening to allow water flow to enter the first filter assembly during the cleaning process; wherein the cleaning process generates water flow in a first flow direction, and the water flow in the first flow direction sequentially flows through the first opening, the first filter assembly, and the first interface; the base station comprises: a base station body; and a third interface arranged on the base station body, suitable for being matched with the first opening or the second interface, so as to allow water flow to flow from the first filter assembly to the base station body during a self-cleaning process; wherein the cleaning device further comprises a fourth interface in fluid communication with the first accommodating space; the self-cleaning process generates water flow in a second flow direction, and the water flow in the second flow direction sequentially flows through the fourth interface, the first filter assembly, the first opening, and the third interface; the cleaning system further comprises a power assembly, in the self-cleaning process, the fourth interface is in communication with a water source to provide water flow in the second flow direction; and in the cleaning process, the fourth interface is in a closed state and the first interface is in an open state, in the self-cleaning process, the fourth interface is in an open state and the first interface is in a closed state.

[0018] To solve the above technical problems, the present disclosure provides a cleaning system, comprising a cleaning device and a base station; the cleaning device comprises: a device body having a first accommodating space; a first filter assembly at least partially arranged in the first accommodating space, the first filter assembly having a first opening suitable for water flow to pass through; a first interface in fluid communication with the first accommodating space, so as to allow water flow passing through the first filter assembly to flow out of the first accommodating space during a cleaning process; and a second interface in fluid communication with the first accommodating space, suitable for being matched with the first opening to allow water flow to enter the first filter assembly during the cleaning process; wherein the cleaning process generates water flow in a first flow direction, and the water flow in the first flow direction sequentially flows through the first opening, the first filter assembly, and the first interface; the base station comprises: a base station body; and a third interface arranged on the base station body, suitable for being matched with the first opening or the second interface, so as to allow water flow to flow from the first filter assembly to the base station body during a self-cleaning process; wherein the cleaning device further comprises a fourth interface in fluid communication with the first accommodating space; the self-cleaning process generates water flow in a second flow direction, and the water flow in the second flow direction sequentially flows through the fourth interface, the first filter assembly, the first opening, and the third interface; the cleaning system further comprises a power assembly, in the self-cleaning process, the fourth interface is in communication with a water source to provide water flow in the second flow direction; and in the cleaning process, the fourth interface is in a closed state and the first interface is in an open state, in the self-cleaning process, the fourth interface is in an open state and the first interface is in a closed state.

[0019] The beneficial effect of the present disclosure is that, unlike the prior art, the present disclosure provides a cleaning system comprising a cleaning device and a base station or other device interfaced therewith, whereby the cleaning device can achieve effective cleaning of the garbage collected in the cleaning device without being fished out. On the one hand, automatic cleaning of the area to be cleaned and automatic cleaning of the dust box of the cleaning device are achieved, improving the intelligence of the cleaning system; on the other hand, the traditional cleaning device cleaning requires manual attendance or operation, and the user only needs to select the operation steps through the remote control or terminal or completely through the automatic processing steps of the machine to achieve the automatic cleaning of the cleaning device, improving the user experience. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure, the drawings needed in the embodiment description will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present disclosure, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0021] Figure 1 is a structural schematic diagram of an embodiment of the cleaning system of the present disclosure;

[0022] Figure 2 is a sectional view schematic diagram of an embodiment of the cleaning system of the present disclosure;

[0023] Figure 3 is a sectional view schematic diagram of the cleaning device in the cleaning system of the present disclosure;

[0024] Figure 4 is a structural diagram of an embodiment of the cleaning system of the present disclosure.

[0025] Corresponding reference signs: 100, cleaning system; 10, cleaning device; 11, device body; 12, first accommodating space; 13, first filter assembly; 14, first interface; 15, second interface; 16, fourth interface; 17, main water pump; 20, base station; 21, base station body; 22, second accommodating space; 23, third interface; 24, second filter assembly; 241, filter bag; 26, fifth interface; 27, base station suction member; 30, underwater pipeline member. DETAILED DESCRIPTION

[0026] The technical solutions in the embodiments of the present disclosure will be described clearly and completely below in combination with the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only some embodiments of the present disclosure, not all embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present disclosure.

[0027] Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the disclosure. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are they necessarily mutually exclusive of one another. As will be apparent to those of ordinary skill in the art, embodiments described herein can be combined with other embodiments.

[0028] The cleaning system provided by the present disclosure will be described in detail below in conjunction with embodiments.

[0029] Please refer to Figure 1 , Figure 2 and Figure 3 , Figure 1 is a structural schematic diagram of an embodiment of the cleaning system of the present disclosure; Figure 2 is a sectional schematic diagram of an embodiment of the cleaning system of the present disclosure; Figure 3 is a sectional schematic diagram of a cleaning device in the cleaning system of the present disclosure. The present disclosure provides a cleaning system 100. The cleaning system 100 comprises a cleaning device 10 and a base station 20. The cleaning device 10 is used to clean dirt such as stains and suspended matters in areas such as pools and swimming pools. The cleaning device 10 can be but is not limited to an underwater cleaning device or a water surface cleaning device. The underwater cleaning device is used to clean underwater dirt and the like. The water surface cleaning device is used to clean water surface dirt and the like. The cleaning device 10 can be but is not limited to a pool cleaning robot, a swimming pool cleaning robot and the like, which are not limited herein. The base station 20 can be but is not limited to a device for sucking in garbage in the cleaning device 10, a device for charging the cleaning device 10 and a device for storing the cleaning device 10 and the like, which are not limited herein. The base station 20 is used to be installed on a pool wall, a pool bottom or a shore of a pool, a swimming pool and the like.

[0030] The cleaning device 10 comprises a device body 11, a first filter assembly 13, a first interface 14, a second interface 15, and a main water pump 17. The device body 11 has a first accommodating space 12. The first accommodating space 12, the first filter assembly 13, the first interface 14, and the second interface 15 are all arranged on the device body 11. The first accommodating space 12 provides a mounting position for the first filter assembly 13. The first filter assembly 13 is arranged at least partially in the first accommodating space 12. That is, the first filter assembly 13 can be arranged partially in the first accommodating space 12. Alternatively, the first filter assembly 13 is arranged entirely in the first accommodating space 12. The first filter assembly 13 serves as a filter assembly for filtering dirt in water. The first filter assembly 13 can be a flexible filter bag or formed by arranging a filter screen on a rigid frame. The first interface 14 is in fluid communication with the first accommodating space 12 to allow water flowing through the first filter assembly 13 to flow out of the first accommodating space 12 during the cleaning process of the cleaning device 10. The second interface 15 is in fluid communication with the first accommodating space 12. The second interface 15 is adapted to sealingly engage with the first opening to allow water to flow into the first filter assembly 13 during the cleaning process of the cleaning device 10. When the first filter assembly 13 is placed in the first accommodating space 12, the first opening arranged on the first filter assembly 13 is substantially sealingly engaged with the first interface 14 arranged on the cleaning device 10, so that water flowing through the first opening cannot directly flow into the first accommodating space 12 or water cannot leak from the first accommodating space 12 through the second interface 15. During the cleaning process of the cleaning device 10, the main water pump 17 generates a first flow direction water flow X, which sequentially flows through the first opening, the first filter assembly 13, and the first interface 14. That is, the dust-carrying water flow flows into the first filter assembly 13 from the first opening and flows out after being filtered by the first filter assembly 13. Under the action of the above-mentioned first flow direction water flow X, the first filter assembly 13 can filter dirt in water, thereby cleaning the pool, the swimming pool, or the like.

[0031] The base station 20 comprises a base station body 21 and a third interface 23. The third interface 23 is arranged on the base station body 21. The third interface 23 is adapted to engage with the first opening or the second interface 15 to allow water to flow from the first filter assembly 13 to the base station body 21 during the self-cleaning process of the cleaning device 10. The self-cleaning process of the cleaning device 10 generates a second flow direction water flow Y. The second flow direction water flow Y sequentially flows through the first interface 14, the first filter assembly 13, the first opening or the second interface 15, the third interface 23, and then flows to the base station body 21.

[0032] The cleaning system 100 further comprises a power assembly (not shown in the figure). The power assembly forms the second flow direction water flow Y during the self-cleaning process. During the self-cleaning process of the cleaning device 10, the first interface 14 is in communication with a water source to provide the second flow direction water flow Y. The above-mentioned water source can be water in the pool, the swimming pool, or the like.

[0033] During the cleaning process of the cleaning device 10, the second interface 15 is used for water inlet, and the first interface 14 is used for water outlet. The water flow X in the first flow direction flows through the second interface 15 or the first opening, the first filter assembly 13 and the first interface 14 in sequence. During the self-cleaning process of the cleaning device 10, the first interface 14 is used for water inlet. The first interface 14 is at least partially below the water surface, or the first interface 14 is connected to the pool through a conduit. The second interface 15 is used for water outlet. The first opening or the second interface 15 is connected to the third interface 23. The water flow Y in the second flow direction flows through the first interface 14, the first filter assembly 13, the first opening or the second interface 15 and the third interface 23 in sequence. The self-cleaning process of the cleaning device 10 is at least partially performed in water. At the same time, the path of the water flow X in the first flow direction and the path of the water flow Y in the second flow direction at least partially overlap, and the power assembly guides the water to at least pass through the first interface 14 and the first filter assembly 13, wherein the water can flush the inside and the side wall of the first filter assembly 13 to clean the dirt on the inside and the side wall of the first filter assembly 13. Then, the dirt in the water moves to the base body 21 through the first opening or the second interface 15 and the third interface 23 or is discharged to the sewage pool through the base body 21.

[0034] Therefore, the user can automatically clean the dirt collected in the first filter assembly 13 without manually fishing out the cleaning device 10 for manual flushing and cleaning, and can also effectively clean the side wall and the like of the first filter assembly 13, and at most only needs to clean the base station 20. In the above manner, on the one hand, the cleaning of the area to be cleaned (such as the pool or the swimming pool area) and the automatic cleaning of the first filter assembly 13 of the cleaning device 10 are realized, and the intelligence of the cleaning system 100 is improved; on the other hand, the traditional cleaning device 10 cleaning needs manual attendance or operation, and the user only needs to select the operation steps through the remote control or the terminal or completely through the automatic processing steps of the cleaning system 100 to realize the automatic cleaning of the cleaning device 10, thereby improving the user experience.

[0035] During the self-cleaning process of the cleaning device 10, the dirt discharged from the first filter assembly 13 can continue to flow along the first opening or the second interface 15 and the third interface 23 to the base body 21 with the water flow. Alternatively, during the self-cleaning process of the cleaning device 10, the dirt discharged from the first filter assembly 13 can continue to move to the base body 21 along the first opening or the second interface 15 and the third interface 23 under the action of air pressure. The length of the water flow path or the air pressure path can be determined according to actual needs, which is not limited herein.

[0036] The number of the first interfaces 14 can be one, two or more. When the number of the first interfaces 14 is two, the two first interfaces 14 can be arranged in different ways. For example, during the cleaning process, one of the first interfaces 14 is in the open state and the other first interface 14 is in the closed state, and the water flow X in the first flow direction flows through the first opening, the first filter assembly and the first interface 14 in sequence, and then flows out of the cleaning device 10. During the self-cleaning process, one of the first interfaces 14 is in the closed state and the other first interface 14 is in the open state, and the water flow in the second flow direction flows through the other first interface 14, the first filter assembly 13, the first opening and the third interface 23 in sequence. Of course, in other embodiments, the number of the first interfaces 14 can be three, four or the like, which can be determined according to actual conditions.

[0037] Alternatively, during the cleaning process, one of the first interfaces 14 is in the open state, and the one first interface 14 is the outlet through which the water flows out of the cleaning device during the cleaning process, and at least one of the other first interfaces 14 is in the closed state. During the self-cleaning process, at least two of the first interfaces 14 are in the open state. The first containing space 12 is a relatively closed space, one of the first interfaces 14 is arranged on one side of the first containing space 12, and at least one of the other first interfaces 14 is arranged on the other side of the first containing space 12. The water source enters the first containing space 12 from at least two of the first interfaces 14, and the water flows from the opposite sides of the first containing space 12 to wash the outer wall of the first filter assembly 13, which can more effectively remove the garbage (such as small algae) adhered to the inner wall of the filter screen of the first filter assembly 13.

[0038] It should be noted that the two first interfaces 14 can be both outlets of the cleaning device 10. Alternatively, one of the two first interfaces 14 is an outlet of the cleaning device 10. Alternatively, neither of the two first interfaces 14 is an outlet of the cleaning device 10, i.e., the two first interfaces 14 are different from the outlet of the cleaning device 10. The number and purpose of the first interfaces 14 can be limited according to actual conditions.

[0039] The number of the second interfaces 15 can be one, two or three, etc. The number of the third interfaces 23 can be one, two or three, etc. The number of the second interfaces 15 and the number of the third interfaces 23 can be the same or different, and the number can be determined according to actual needs, which is not limited herein. When the number of the second interfaces 15 is one, the second interface 15 is disconnected with the third interface 23 during the cleaning process of the cleaning device 10. The second interface 15 can have the water inlet function in addition to the water outlet function. That is, the second interface 15 can also be the water inlet (not shown in the figure) of the cleaning device 10, which is used to suck the dirt in the water source into the first filter assembly 13. The second interface 15 and the water inlet of the cleaning device can be the same. The water flow X of the first flow direction flows through the water inlet or the second interface 15 of the cleaning device 10, the first filter assembly 13, the first filter assembly 13 and the first interface 14 in sequence. By setting the water inlet of the cleaning device 10 as the second interface 15, the cleaning device 10 can not only meet the cleaning process and the self-cleaning process at the same time, but also does not need to increase the structure and reduce the cost. Because different types of cleaning devices 10 must have a water inlet, the base station 20 can meet different types of cleaning devices 10, thereby improving the general performance of the base station 20 and facilitating the popularization and use of the base station 20.

[0040] When the number of the second interfaces 15 is two, one of the second interfaces 15 is the water inlet of the cleaning device 10, and the other second interface 15 is the self-cleaning outlet during the self-cleaning process. That is, the second interface 15 and the water inlet of the cleaning device 10 can be different. During the cleaning process of the cleaning device 10, the water flow X of the first flow direction flows through the water inlet of the cleaning device 10, the first filter assembly 13, the first filter assembly 13 and the first interface 14 in sequence, and the self-cleaning outlet is closed at this time. During the self-cleaning process of the cleaning device 10, the self-cleaning outlet is connected with the third interface 23. The water flow Y of the second flow direction flows through the first interface 14, the first filter assembly 13, the first filter assembly 13, the self-cleaning outlet and the third interface 23 in sequence, and the water inlet of the cleaning device 10 is closed at this time. Although the second interface 15 and the water inlet of the cleaning device 10 are different, the path of the water flow X of the first flow direction and the path of the water flow Y of the second flow direction are at least partially overlapped. It should be noted that the two second interfaces 15 can both be the water inlets of the cleaning device 10, and the self-cleaning outlet is different from the two second interfaces 15. Alternatively, one of the two second interfaces 15 is the water inlet of the cleaning device 10, and the other second interface 15 is the self-cleaning outlet. Alternatively, the two second interfaces 15 are both self-cleaning outlets, and the self-cleaning outlet is different from the water inlet of the cleaning device 10. The number and the use of the second interfaces 15 can be limited according to actual conditions.

[0041] In some embodiments, during the self-cleaning process of the cleaning device 10, the second interface 15 or the first opening is in sealed docking with the third interface 23, not only reducing the risk of leakage of dirt between the second interface 15 or the first opening and the third interface 23, avoiding the re-entry of dirt into the pool, pool, and other areas; but also reducing the risk of liquid leakage between the second interface 15 or the first opening and the third interface 23, ensuring the stability of the water flow, thereby improving the self-cleaning effect of the cleaning device 10.

[0042] The sealed docking form between the second interface 15 or the first opening and the third interface 23 described above can be that a sealing soft rubber ring is arranged on the third interface 23. Alternatively, the sealed docking form can be that a sealing soft rubber ring is arranged at the end of the first opening or the second interface 15. Alternatively, the sealed docking form can be that a sealing soft rubber ring is arranged on the third interface 23 and the end of the first opening or the second interface 15. When the second interface 15 or the first opening and the third interface 23 form the above docking posture, the sealing soft rubber ring plays a role in preventing water flow from leaking at the docking position.

[0043] During the sealed docking process of the second interface 15 or the first opening and the third interface 23, the second interface 15 and the third interface 23 are at least partially located below the water surface. By locating the second interface 15 and the third interface 23 at least partially below the water surface, the water flow path can be increased, making it easier for dirt in the water to enter the base station 20, thereby improving the self-cleaning effect of the cleaning device 10.

[0044] Please continue to refer to Figures 1 to 3 In some embodiments, the cleaning system 100 includes a second filter assembly 24. The second filter assembly 24 plays a filtering role for filtering the dust-carrying water flow entering the base station 20. The second filter assembly 24 can be arranged in at least one of the base station 20, outside the base station 20, and a pool skimming assembly (not shown in the figure). For example, the second filter assembly 24 can be arranged in the base station 20 and outside the base station 20 at the same time. Alternatively, the second filter assembly 24 can be arranged in the base station 20 and the pool skimming assembly at the same time. Alternatively, the second filter assembly 24 can be arranged in the base station 20, outside the base station 20, and the pool skimming assembly at the same time. The second filter assembly 24 can also be other combinations, which will not be described here.

[0045] The above-mentioned arrangement position and number of the second filter assembly 24 can be determined according to the actual situation, which is not limited here. By arranging the above-mentioned second filter assembly 24, the cleaning system 100 can facilitate the filtration of dirt entering the base station 20, facilitate the user to take out the second filter assembly 24 from the base station 20, and flush or throw away the dirt in the second filter assembly 24, etc., thereby improving the use experience. Optionally, the second filter assembly 24 is detachably arranged in at least one of the base station 20, outside the base station 20, and the pool skimming assembly, facilitating the detachable and installation of the second filter assembly 24.

[0046] In one embodiment, the cleaning system 100 further comprises a second accommodating space 22 disposed at least partially in the base body 21 and a second filter assembly 24 disposed at least partially in the second accommodating space 22. The second accommodating space 22 provides a mounting position for the second filter assembly 24. The second filter assembly comprises a second opening. The second opening of the second filter assembly 24 is in communication with the third interface 23. The power assembly is configured to direct the water flow to sequentially flow through the first interface 14, the first filter assembly 13, the first opening, the third interface 23 and the second opening, and into the second filter assembly 24. That is, the dirt in the cleaning device 10 enters the second filter assembly 24 through the third interface 23 and the second opening, and is filtered by the second filter assembly 24. Compared with manually cleaning the first filter assembly 13 of the cleaning device 10, the user only needs to clean the second filter assembly 24, thereby improving the convenience of use.

[0047] The mesh number of the second filter assembly 24 described above needs to be greater than or equal to that of the first filter assembly 13, so that the dirt is retained in the second filter assembly 24, thereby improving the filtering performance of the second filter assembly 24. The second filter assembly 24 comprises a filter screen structure. The filter screen structure comprises a filter box (not shown in the figure) and a filter screen (not shown in the figure). The filter screen is disposed on the filter box. Alternatively, the second filter assembly 24 comprises a filter bag 241. The second filter assembly 24 can be determined according to actual needs, which is not limited herein.

[0048] For example, the second filter assembly 24 comprises a filter bag 241, and the second filter assembly 24 is disposed in the base station 20. That is, the filter bag 241 is detachably mounted in the base body 21. An installation plate (not shown in the figure) is disposed at the inlet of the filter bag 241. The opening of the installation plate corresponds to the inlet of the filter bag 241. By mounting the installation plate into the second accommodating space 22, the opening of the installation plate corresponds to the third interface 23 in the second accommodating space 22.

[0049] The filter bag 241 can include a first filter water inlet (not shown in the figure) and a first filter water outlet (not shown in the figure). The power assembly is used to guide the water flow to pass through the third interface 23, the first filter water inlet, the filter bag 241, and then flow out from the first filter water outlet. The first filter water outlet can be the outer wall of the entire filter bag 241. Through the cooperation of the power assembly and the filter bag 241, the filter bag 241 can filter the dirt in the water. When it is necessary to clean the dirt in the water, the filter bag 241 can be taken out from the base station 20 for cleaning. In other embodiments, the filter bag 241 can also be arranged outside the base station 20 and in the pool skimming assembly, and the installation and filtering principle is the same as above, which will not be repeated here. When the filter bag 241 is away from or close to the water surface, the cleaning system 100 can also include an automatic drying assembly. The automatic drying assembly is used to dry the dirt in the filter bag 241, so as to reduce the odor caused by long-term non-cleaning of the filter bag 241.

[0050] In an embodiment, the cleaning system 100 further includes a fifth interface 26. The fifth interface 26 is arranged on the base station body 21. The fifth interface 26 is in flow communication with the second filter assembly 24, so as to guide the water flow passing through the second filter assembly 24 to flow out of the base station body 21 during the self-cleaning process of the cleaning device 10. Through the cooperation of the second filter assembly 24 and the fifth interface 26, the dirt in the water is filtered by the second filter assembly 24, and then the water flow is discharged from the fifth interface 26. The water flow discharged from the fifth interface 26 can be discharged into an external sewage system or a pool, a swimming pool or the like, or discharged through an external sewage pipeline, which is not limited here.

[0051] Please refer to Figure 4 , Figure 4 is a structural diagram of an embodiment of the cleaning system of the present disclosure. In combination with Figures 1 to 4 In an embodiment, the cleaning device 10 includes a fourth interface 16 arranged on the first accommodating space 12. During the self-cleaning process of the cleaning device 10, the fourth interface 16 is docked with the fifth interface 26, and the second interface 15 is docked with the third interface 23. The power assembly is used to guide the water flow to circulate in the first accommodating space 12 and the second accommodating space 22; at the same time, the first interface 14 is in a closed state. During the self-cleaning process of the cleaning device 10, the first interface 14 is in a closed state. That is, the first accommodating space 12, the first filter assembly 13, the second interface 15, the third interface 23, the second accommodating space 22, the second filter assembly 24, the fifth interface 26, the fourth interface 16, and the first accommodating space 12 form a closed internal circulation, which improves the self-cleaning effect of the cleaning device 10. The fourth interface 16 can be provided with a valve member (not shown in the figure) in an openable and closable manner. The valve member can be opened according to actual needs.

[0052] In another embodiment, the cleaning device 10 comprises a fourth interface 16 arranged on the first accommodating space 12. During the self-cleaning process of the cleaning device 10, the fourth interface 16 and the fifth interface 26 are docked; at the same time, the second interface 15 and the third interface 23 are docked. The power assembly is used to guide the water flow to circulate in the first accommodating space 12 and the second accommodating space 22; at the same time, the first interface 14 is in an open state. During the self-cleaning process of the cleaning device 10, the first interface 14 is in an open state. That is, in addition to the above-mentioned first accommodating space 12, first filter assembly 13, second interface 15, third interface 23, second accommodating space 22, second filter assembly 24, fifth interface 26, fourth interface 16 and first accommodating space 12 form an internal circulation, the power assembly can also guide the water to flow from the first interface 14 into the first accommodating space 12, which is used to supplement the water flow for the self-cleaning process, which can ensure the stability of the water flow during the self-cleaning process. At the same time, the water flow flowing into the first accommodating space 12 from the first interface 14 can also form an impact on the outer wall of the first filter assembly 13, which is beneficial to clean the attached garbage on the inner wall of the first filter assembly 13. Through the above-mentioned water circulation, the water flow rate is increased, and the self-cleaning effect of the cleaning device 10 is improved.

[0053] The above-mentioned cleaning system 100 comprises an underwater pipe 30. One end of the underwater pipe 30 is in communication with the fourth interface 16, and the other end is in communication with the fifth interface 26. The docking positions of the second interface 15 and the third interface 23 and the docking positions of the fourth interface 16 and the fifth interface 26 can be located on the same docking surface of the cleaning device 10 and the base station 20, or can be located on different docking surfaces. When the docking positions between the fourth interface 16 and the fifth interface 26 and the docking positions between the second interface 15 and the third interface 23 are located on different docking surfaces, the fourth interface 16 and the fifth interface 26 can be communicated through the underwater pipe 30, realizing the above-mentioned closed loop waterway, and improving the self-cleaning effect of the cleaning device 10.

[0054] In another embodiment, during the self-cleaning process of the cleaning device 10, the fifth interface 26 is docked with the first interface 14. The second interface 15 or the first opening is docked with the third interface 23. The power assembly is used to guide the water flow to circulate in the first accommodating space 12 and the second accommodating space 22. That is, the first interface 14, the first accommodating space 12, the first filter assembly 13, the first opening or the second interface 15, the third interface 23, the second accommodating space 22, the second filter assembly 24, the fifth interface 26 and the first interface 14 form a closed internal circulation, which improves the self-cleaning effect of the cleaning device 10.

[0055] In some embodiments, the cleaning system 100 further comprises a fifth interface 26 disposed on the base station body 21 for water flow to flow out of the base station body 21 during the self-cleaning process of the cleaning apparatus 10. The fifth interface 26 is in communication with the second accommodating space 22. The dirt and the like in the water sucked from the cleaning apparatus 10 are directly discharged out of the base station 20 through the fifth interface 26. The water flow discharged from the fifth interface 26 can be discharged into an external sewage system or an external sewage pipe or a skimmer assembly, etc., which are not limited herein.

[0056] In an embodiment, the cleaning system 100 further comprises a second filter assembly 24 disposed outside the base station 20. The second filter assembly 24 is in communication with the fifth interface 26. The second filter assembly 24 can be disposed in a sewage system or a sewage pipe. That is, the dirt in the water is discharged from the fifth interface 26 through the second filter assembly 24. Compared with manually cleaning the first filter assembly 13 of the cleaning apparatus 10, the user only needs to clean the second filter assembly 24, thereby improving the convenience of use.

[0057] In a specific embodiment, the fifth interface 26 is used to connect with a skimmer assembly. The skimmer assembly comprises a skimmer body (not shown in the figure) and a skimmer filter assembly (not shown in the figure). The skimmer filter assembly is at least partially disposed in the skimmer body. During the self-cleaning process of the cleaning apparatus 10, the fifth interface 26 is in communication with the skimmer filter assembly. When the cleaning apparatus 10 needs to be self-cleaned, the cleaning apparatus 10 moves to be docked with the skimmer assembly, that is, the fifth interface 26 is docked with the water inlet of the skimmer assembly, and the power assembly guides the second water flow Y to flow through the fifth interface 26 into the skimmer filter assembly and is discharged from the skimmer filter assembly. The skimmer filter assembly is the second filter assembly 24 which is disposed outside the base station 20 and at least partially disposed in the skimmer body.

[0058] The skimmer assembly can be a part of the pool infrastructure. By using the base station 20 in combination with the skimmer assembly, not only the relevant structures in the skimmer assembly can be utilized, but also the installation and use of the second filter assembly 24 can be reduced, and the number of times of cleaning dirt can also be reduced, and only the skimmer filter assembly needs to be cleaned.

[0059] In another specific embodiment, the fifth interface 26 is directly connected with an external sewage pipe. During the self-cleaning process of the cleaning apparatus 10, the power assembly is used to guide the second water flow Y to flow through the fifth interface 26 into the external sewage pipe.

[0060] In some embodiments, the first accommodating space 12 is a substantially closed space. The first filtering assembly 13 is a filter screen structure. The filter screen structure can include a filter box and a filter screen. During the cleaning process, the water flow X in the first flow direction flows through the first filtering assembly 13, the first accommodating space 12, and then out of the cleaning device 10 from the first interface 14. That is, the water flow can flow through the second interface 15 or the first opening, the first filtering assembly 13, the inside of the first filtering assembly 13, between the first filtering assembly 13 and the first accommodating space 12, and then out of the cleaning device 10 from the first interface 14.

[0061] During the self-cleaning process, the water flow Y in the second flow direction flows through the first interface 14, the first accommodating space 12, the first filtering assembly 13, and the first opening. That is, the water flow can flow through the first interface 14, the first accommodating space 12, and the first filtering assembly 13, the inside of the first filtering assembly 13, the first opening, or the second interface 15.

[0062] Please continue to refer to Figures 1 to 4 In some embodiments, the power assembly includes one of the following: a base station suction member 27 provided on the base station body 21, a main water pump 17 provided on the cleaning device 10, an external suction member provided outside the base station 20 and the cleaning device 10, etc. The setting position and number of the power assembly can be determined according to actual conditions. For example, the power assembly can be provided in at least one of the base station 20, outside the base station 20, the skimming filtering assembly, and the cleaning device 10. Through the power assembly, the water flow rate can be improved, thereby improving the self-cleaning effect of the cleaning device 10. For example, the power assembly can be provided in the base station 20. Alternatively, the power assembly can be provided outside the base station 20. Alternatively, the power assembly can be provided in the pool skimming assembly. Alternatively, the power assembly can be provided in the cleaning device 10. Alternatively, the power assembly can be provided in the base station 20 and the pool skimming assembly at the same time. Alternatively, the power assembly can be provided outside the base station 20 and the pool skimming assembly at the same time. Alternatively, the power assembly can be provided in the base station 20, outside the base station 20, the pool skimming assembly, and the cleaning device 10. The power assembly can also be other combinations, which are not described herein.

[0063] When the power assembly is provided in the base station 20, the power assembly can be the base station suction member 27. When the power assembly is provided outside the base station 20, the power assembly can be an external suction member (not shown in the figure). When the power assembly is provided in the pool skimming assembly, the power assembly can be a skimming suction member (not shown in the figure). When the power assembly is provided in the cleaning device 10, the power assembly can be the main water pump 17. The setting position and number of the power assembly described above can be determined according to actual needs, which are not limited herein. Regardless of the base station suction member 27, the external suction member, the skimming suction member, the main water pump 17, etc., can all provide driving force to make the water flow in the water flow Y in the second flow direction, so that dirt and the like enter the base station 20.

[0064] As a specific embodiment, the base station 20 comprises a base station suction member 27. The base station suction member 27 is disposed on the base station body 21. The base station suction member 27 is in communication with the third interface 23. The base station suction member 27 is a power component. The base station suction member 27 is used to guide the water flow to smoothly enter the base station 20 through the third interface 23. The base station suction member 27 can be a base station suction pump (not shown in the figure).

[0065] As another specific embodiment, the cleaning system 100 comprises an external suction member. The external suction member is disposed outside the base station 20. The external suction member is in communication with the third interface 23 through an external pipeline member (not shown in the figure). The external suction member is a power component. The external suction member is used to guide the water flow to smoothly enter the base station 20 through the third interface 23. The external suction pump can be an external suction pump (not shown in the figure). The external suction pump can be a pool pump, a swimming pool pump, etc. The external pipeline member is used to connect the external suction member and the third interface 23. The external pipeline member can be an external pipeline.

[0066] As another specific embodiment, the cleaning system 100 comprises a swimming pool skimming component. The swimming pool skimming component comprises a swimming pool skimming body and a skimming suction member. The skimming suction member is disposed in the swimming pool skimming body. The skimming suction member is a power component. The third interface 23 is in communication with the skimming suction member through a base station pipeline member (not shown in the figure). The skimming suction member is used to guide the water flow and provide suction force to smoothly enter the swimming pool skimming component through the third interface 23 and the base station pipeline member. The skimming suction member can be a skimming suction pump. The swimming pool skimming component can be another cleaning device specially used for cleaning water surface garbage. By using the swimming pool skimming component, the cost can be reduced and the utilization rate of the device can be improved. The base station pipeline member is used to connect the third interface 23 and the skimming suction member. The base station pipeline member can be a base station pipeline.

[0067] As another specific embodiment, the cleaning device 10 comprises a main water pump 17. The power component comprises the main water pump 17 disposed in the cleaning device 10. The main water pump 17 comprises a first working mode and a second working mode. During the cleaning process of the cleaning device 10, the main water pump 17 is in the first working mode, for example, the main water pump 17 rotates forward, and the main water pump 17 is used to form a first flow direction water flow X. During the self-cleaning process of the cleaning device 10, the main water pump 17 is in the second working mode, for example, the main water pump 17 rotates reversely, and the main water pump 17 is used to form a second flow direction water flow Y. The main water pump 17 in the cleaning device 10 is a power component, which can realize driving force by its own structure, can reduce cost, and the entire cleaning system 100 can realize the cleaning process of the cleaning device 10 and the self-cleaning process of the cleaning device 10 by one main water pump 17.

[0068] The cleaning system 100 described above only includes a power assembly. When the cleaning system 100 does not include the second filter assembly 24, the dirt in the base station 20 can be directly discharged into an external dirt discharge pipeline (not shown in the figure) or a pool skimming assembly. The external dirt discharge pipeline can be an external sewer pipeline (not shown in the figure) or a pool dirt discharge pipeline (not shown in the figure), etc.

[0069] In a specific embodiment, the base station 20 is not provided with a base station pipeline. The dirt water path in the base station 20 is the third interface 23, and / or the fifth interface 26, the power assembly, and the external dirt discharge pipeline. The power assembly can be arranged in the base station 20, and in this case, the power assembly can be a base station suction member 27. Alternatively, the power assembly can be arranged outside the base station 20, and in this case, the power assembly can be an external suction member.

[0070] In another specific embodiment, the base station 20 is provided with a base station pipeline. The power assembly is arranged outside the base station 20. The dirt water path in the base station 20 is the third interface 23, the base station pipeline, the fifth interface 26, the external suction member, and the external dirt discharge pipeline.

[0071] In another alternative specific embodiment, the base station 20 is provided with a base station pipeline. The power assembly is arranged in the base station 20. The dirt water path in the base station 20 is the third interface 23, the base station pipeline, the base station suction member 27, the fifth interface 26, and the external dirt discharge pipeline.

[0072] The base station 20 described above can be directly connected to an external pool skimming assembly. Since the pool skimming assembly has a skimming filter assembly and a skimming suction member, the second filter assembly 24 and other power assemblies can be arranged in or outside the base station 20 according to actual needs.

[0073] In a specific embodiment, the base station 20 is not provided with the second filter assembly 24, and the base station 20 is provided with a power assembly. In this case, the dirt water path in the base station 20 is the third interface 23, the base station suction member 27, the fifth interface 26, and the pool skimming assembly. That is, the dirt filtering is realized by the skimming filter assembly in the pool skimming assembly.

[0074] In another specific embodiment, the base station 20 is not provided with the second filter assembly 24 and the base station suction member 27. In this case, the dirt water path in the base station 20 is the third interface 23, and / or the fifth interface 26, the pool skimming assembly, and the skimming suction member. Alternatively, the dirt water path in the base station 20 is the third interface 23, and / or the base station pipeline, the fifth interface 26, the pool skimming assembly, and the skimming suction member.

[0075] In another alternative embodiment, the second filter assembly 24 is provided in the base station 20. The base station 20 is provided with a base station suction member 27. At this time, the dirty water path in the base station 20 is the third interface 23, the second filter assembly 24, the base station suction member 27, the fifth interface 26, and the pool skimming assembly.

[0076] In another alternative embodiment, the second filter assembly 24 is provided in the base station 20. The base station 20 is not provided with the base station suction member 27. At this time, the dirty water path in the base station 20 is the third interface 23, the second filter assembly 24, the fifth interface 26, the pool skimming assembly, and the skimming suction member.

[0077] In another embodiment, the cleaning device 10 can be directly docked with the pool skimming assembly. The second interface 15 or the first opening on the cleaning device 10 is directly docked with the pool skimming assembly, and the dirty water is filtered through the skimming filter assembly, etc. The power assembly can be the main water pump 17 of the cleaning device 10 or the skimming suction member in the pool skimming assembly. The second flow direction of the water flow Y is the first filter assembly 13, the second interface 12 / first opening, the pool skimming assembly inlet, and the skimming filter assembly.

[0078] Of course, in other embodiments, the second filter assembly 24 and the power assembly can also be combined in other forms, which will not be described here.

[0079] In some embodiments, when the cleaning device 10 detects that the first filter assembly 13 is clogged or full or receives a preset instruction, the base station 20 dirty water recycling program instruction is started. After the cleaning device 10 moves to the base station 20, the second interface 15 of the cleaning device 10 is docked with the third interface 23 of the base station 20. At this time, the self-cleaning process of the cleaning device 10 is used to form the second flow direction of the water flow Y. The second flow direction of the water flow Y in the base station 20 is related to the setting position of the power assembly, whether there is a second filter assembly 24, the setting position of the second filter assembly 24, etc., which will not be described here.

[0080] It should be noted that when the second interface 15 is the water inlet of the cleaning device 10, a first cover plate (not shown in the figure) that can be opened and closed is provided at the second interface 15. When the cleaning device 10 is in the cleaning process, the first cover plate is opened in the first direction to guide the water flow in the first direction to flow into the first filter assembly 13. When the cleaning device 10 is in the self-cleaning process, the first cover plate is opened in the second direction to guide the water flow in the second direction to flow out of the second interface 15. The first direction and the second direction are opposite. The above-mentioned first cover plate can open the second interface 15 in the first direction or in the second direction under the main water pump 17, or the mechanical structure, or the electrical control.

[0081] In one embodiment, the first cover plate is opened in the first direction or the second direction by the negative pressure when the suction force of the main water pump 17 reaches a certain threshold value. In one embodiment, the mechanical structure can be a counterweight (not shown in the figure) movably arranged on the first cover plate. The counterweight is adapted to open the first cover plate in the first direction when the cleaning device 10 is in the cleaning process, and is adapted to open the first cover plate in the second direction when the cleaning device 10 is in the self-cleaning process. In one embodiment, the electric control structure can be a driving member (not shown in the figure) connected with the first cover plate. When receiving the cleaning instruction or the self-cleaning instruction, the driving member directly drives the first cover plate to open the first cover plate in the first direction or the second direction.

[0082] When the second interface 15 is different from the water inlet of the cleaning device 10, the first cover plate can be movably connected at the water inlet. The second cover plate (not shown in the figure) can be movably connected at the second interface 15. When the cleaning device 10 is in the cleaning process, the first cover plate is opened and the second cover plate is closed. When the cleaning device 10 is in the self-cleaning process, the first cover plate can be opened or closed, and the second cover plate is opened.

[0083] In some embodiments, the cleaning system 100 comprises an in-place detection mechanism (not shown in the figure). The in-place detection mechanism is used to detect whether the second filter assembly 24 is in place. When the second filter assembly 24 is not in place, the in-place detection mechanism transmits the signal to the cleaning system 100 for controlling the power assembly to stop working. When the second filter assembly 24 is in place, the in-place detection mechanism transmits the signal to the cleaning system 100 for controlling the power assembly to move, so as to realize the self-cleaning process of the cleaning device 10. In addition, the in-place detection mechanism is connected with an audible and visual member (not shown in the figure). When the second filter assembly 24 is not in place, the audible and visual member generates a prompt sound and gives an alarm, etc.

[0084] In some embodiments, the cleaning device 10 is provided with an in-place detection mechanism of the first filter assembly 13. When it is detected that the first filter assembly 13 is not in place or is not installed in place, the main water pump 17 of the cleaning device 10 cannot start the cleaning process.

[0085] In some embodiments, the base station 20 is configured to charge the cleaning device 10 or replace the battery of the cleaning device 10 when the cleaning device 10 is docked with the base station 20, wherein the charging includes at least one of wireless charging or electrode pad charging. That is, the charging includes one of wireless charging, electrode pad charging, or both. Specifically, the cleaning device 10 is provided with a first electrical connection (not shown in the figure). The base station 20 is provided with a second electrical connection (not shown in the figure). When the cleaning device 10 is docked with the base station 20, the first electrical connection and the second electrical connection are electrically connected to charge the cleaning device 10. The first electrical connection and the second electrical connection can be treated with a corrosion-resistant coating to reduce corrosion or rust in a humid environment.

[0086] The second electrical connection described above can be movable in the vertical direction of the base station body 21, and the position of the second electrical connection can be adjusted to make the docking of the first electrical connection and the second electrical connection more accurate. The first electrical connection described above can be a first charging electrode pad (not shown in the figure). The second electrical connection can be a second charging electrode pad (not shown in the figure). Alternatively, the first electrical connection can be a wireless charging coil (not shown in the figure). The second electrical connection can be a wireless receiving coil (not shown in the figure).

[0087] The present disclosure provides a cleaning system 100. The present disclosure provides a cleaning system 100. The cleaning system 100 includes a cleaning device 10 and a base station 20. The cleaning device 10 includes a device body 11, a first filter assembly 13, a first interface 14, and a second interface 15. The device body 11 has a first accommodating space 12. The first accommodating space 12, the first filter assembly 13, the first interface 14, and the second interface 15 are all arranged in the device body 11. The first accommodating space 12 provides a mounting position for the first filter assembly 13. The first filter assembly 13 is at least partially arranged in the first accommodating space 12. That is, the first filter assembly 13 can be partially arranged in the first accommodating space 12, or the first filter assembly 13 can be entirely arranged in the first accommodating space 12. The first filter assembly 13 functions to filter dirt in water. The first interface 14 is in fluid communication with the first accommodating space 12 to allow water flowing through the first filter assembly 13 to flow out of the first accommodating space 12 during the cleaning process of the cleaning device 10. The second interface 15 is in fluid communication with the first accommodating space 12. The second interface 15 is adapted to be docked with the first opening to allow water to flow into the first filter assembly 13 during the cleaning process of the cleaning device 10. The cleaning device 10 generates a first flow direction water flow X during the cleaning process, and the first flow direction water flow X sequentially flows through the second interface 15 or the first opening, the first filter assembly 13, and the first interface 14. Under the action of the first flow direction water flow X described above, the first filter assembly 13 can filter dirt in water, thereby cleaning an area such as a pool or a swimming pool.

[0088] The base station 20 comprises a base station body 21 and a third interface 23. The third interface 23 is disposed on the base station body 21. The third interface 23 is adapted to interface with the first opening or the second interface 15 to allow the water flow from the first filter assembly 13 to the base station body 21 during the self-cleaning process of the cleaning device 10.

[0089] The cleaning device 10 further comprises a fourth interface 16. The fourth interface 16 is in flow communication with the first housing space 12. During the self-cleaning process of the cleaning device 10, the second flow direction water flow Y is generated. The second flow direction water flow Y sequentially flows through the fourth interface 16, the first filter assembly 13, the first opening or the second interface 15 and the third interface 23.

[0090] The cleaning system 100 further comprises a power assembly (not shown). The power assembly is configured to generate the second flow direction water flow Y during the self-cleaning process. During the cleaning process of the cleaning device 10, the fourth interface 16 is in a closed state. The first interface 14 is in an open state. During the self-cleaning process of the cleaning device 10, the fourth interface 16 is in an open state and the first interface 14 is in a closed state. The fourth interface 16 can be a water inlet during the self-cleaning process of the cleaning device 10. When the fourth interface 16 is in the open state, the fourth interface 16 is in communication with a water source to provide the second flow direction water flow Y. The water source can be water in a pool, a swimming pool or the like.

[0091] During the cleaning process of the cleaning device 10, the second interface 15 is configured to receive water and the first interface 14 is configured to discharge water. The first flow direction water flow X sequentially flows through the second interface 15 or the first opening, the first filter assembly 13 and the first interface 14. During the self-cleaning process of the cleaning device 10, the fourth interface 16 is configured to receive water and the fourth interface 16 is at least partially below the water surface. The second interface 15 is configured to discharge water. The first opening or the second interface 15 is in communication with the third interface 23. The second flow direction water flow Y sequentially flows through the fourth interface 16, the first filter assembly 13, the first opening or the second interface 15 and the third interface 23. The self-cleaning process of the cleaning device 10 is at least partially performed in water. Meanwhile, the first flow direction water flow X path and the second flow direction water flow Y path at least partially overlap. The power assembly is configured to direct water to at least flow through the first filter assembly 13. The water is configured to flush the inside and the sidewall of the first filter assembly 13 to clean dirt on the inside and the sidewall of the first filter assembly 13. The dirt in the water is then moved to the base station body 21 through the first opening or the second interface 15 and the third interface 23.

[0092] Thus, the user can effectively clean the dirt collected in the first filter assembly 13 and clean the inner side wall of the first filter assembly 13 without manually fishing out the cleaning device 10 for manual flushing and cleaning, and at most only needs to clean the base station 20. In the above manner, on the one hand, the cleaning of the area to be cleaned (such as a pool or a swimming pool) and the automatic cleaning of the first filter assembly 13 of the cleaning device 10 are realized, and the intelligence of the cleaning system 100 is improved; on the other hand, the traditional cleaning device 10 cleaning needs manual attendance or operation, and the user only needs to select the operation steps through the remote control or the terminal or completely through the automatic processing steps of the cleaning system 100 to realize the automatic cleaning of the cleaning device 10, and the user experience is improved.

[0093] It should be noted that the position and manner of setting the second filter assembly 24 in the cleaning system 100, the position and manner of setting the power assembly, and the like in the present embodiment can be the same as those in the above-mentioned embodiments of the cleaning system 100, and will not be described herein.

[0094] The present disclosure provides a cleaning system 100. The cleaning system 100 includes a cleaning device 10 and a base station 20. The cleaning device 10 includes a device body 11, a first filter assembly 13, a first interface 14, and a second interface 15. The device body 11 has a first accommodating space 12. The first accommodating space 12, the first filter assembly 13, the first interface 14, and the second interface 15 are all arranged on the device body 11. The first accommodating space 12 provides a mounting position for the first filter assembly 13. The first filter assembly 13 is at least partially arranged in the first accommodating space 12. That is, the first filter assembly 13 can be partially arranged in the first accommodating space 12, or the first filter assembly 13 can be entirely arranged in the first accommodating space 12. The first filter assembly 13 serves as a filter assembly for filtering dirt in water. The first interface 14 is in fluid communication with the first accommodating space 12 to allow the water flow passing through the first filter assembly 13 to flow out of the first accommodating space 12 during the cleaning process of the cleaning device 10. The second interface 15 is in fluid communication with the first accommodating space 12. The second interface 15 is suitable for being docked with the first opening to allow the water flow to enter the first filter assembly 13 during the cleaning process of the cleaning device 10. The cleaning device 10 generates a first flow direction water flow X during the cleaning process. The first flow direction water flow X sequentially flows through the second interface 15 or the first opening, the first filter assembly 13, and the first interface 14. Under the action of the above-mentioned first flow direction water flow X, the first filter assembly 13 can filter the dirt in the water, thereby cleaning the pool, swimming pool, and the like.

[0095] The base station 20 comprises a base station body 21 and a third interface 23. The third interface 23 is disposed on the base station body 21. The third interface 23 is adapted to interface with the first opening or the second interface 15 to allow water flow from the first filter assembly 13 to the base station body 21 during the self-cleaning process of the cleaning apparatus 10.

[0096] The first filter assembly 13 further comprises a third opening. The third opening is adapted to allow water flow into the first filter assembly 13 during the self-cleaning process. The self-cleaning process of the cleaning apparatus 10 generates a second water flow Y. The second water flow Y flows through the first interface 14, the third opening, the first filter assembly 13, the first opening or the second interface 15 and the third interface 23 in sequence.

[0097] The cleaning system 100 further comprises a power assembly (not shown). The power assembly is configured to generate the second water flow Y during the self-cleaning process. During the self-cleaning process of the cleaning apparatus 10, the third opening is in communication with a water source to provide the second water flow Y. The third opening is in an open state and the first interface is in a closed state. Water flows into the third opening and out of the first opening. The self-cleaning process is configured to remove dirt from the first filter assembly 13. During the cleaning process of the cleaning apparatus 10, the third opening is in a closed state. The water source can be water from a pool, a swimming pool or the like.

[0098] During the cleaning process of the cleaning apparatus 10, the second interface 15 is configured to allow water to enter. The first interface 14 is configured to allow water to exit. The first water flow X flows through the second interface 15 or the first opening, the first filter assembly 13 and the first interface 14 in sequence. During the self-cleaning process of the cleaning apparatus 10, the first interface 14 is configured to allow water to enter. The first interface 14 is at least partially submerged in water. The second interface 15 is configured to allow water to exit. The first opening or the second interface 15 is in communication with the third interface 23. The second water flow Y flows through the first interface 14, the third opening, the first filter assembly 13, the first opening or the second interface 15 and the third interface 23 in sequence. The self-cleaning process of the cleaning apparatus 10 is at least partially performed in water. The path of the first water flow X and the path of the second water flow Y at least partially overlap. The power assembly is configured to direct water to flow through the first filter assembly 13. The water is configured to flush dirt from the interior and the sidewall of the first filter assembly 13. The dirt is then removed from the interior and the sidewall of the first filter assembly 13 through the first opening or the second interface 15, the third interface 23 and into the base station body 21.

[0099] Therefore, the user can automatically clean the dirt collected in the first filter assembly 13 and effectively clean the inner side wall of the first filter assembly 13 without manually fishing out the cleaning device 10 for manual flushing and cleaning, and at most only needs to clean the base station 20. In the above manner, on the one hand, the cleaning of the area to be cleaned (such as a pool or a swimming pool) and the automatic cleaning of the first filter assembly 13 of the cleaning device 10 are realized, and the intelligence of the cleaning system 100 is improved; on the other hand, the traditional cleaning device 10 cleaning needs manual attendance or operation, and the user only needs to select the operation steps through the remote control or the terminal or completely through the automatic processing steps of the cleaning system 100 to realize the automatic cleaning of the cleaning device 10, and the user experience is improved.

[0100] The first opening is provided with an openable and closable first cover plate. The first cover plate can open or close the first opening in an active and passive manner. The third opening is provided with an openable and closable third cover plate. The third cover plate can open or close the third opening in an active and passive manner. The active manner can be that a driving member directly drives the corresponding cover plate to open or close the opening. The passive manner can be that the corresponding cover plate is driven to open or close the opening by water pressure. For example, due to the water pressure, the first cover plate can open the first opening during the cleaning process; the third cover plate can close the third opening. Due to the water pressure, the first cover plate can open the first opening during the self-cleaning process; the third cover plate can open the third opening.

[0101] It should be noted that the position and arrangement of the second filter assembly 24 in the cleaning system 100, the position and arrangement of the power assembly, and the like in the embodiments of the cleaning system 100 described above can be the same as those in the embodiments of the cleaning system 100, and will not be described here.

[0102] The terms "first", "second", "third" in the disclosure are only for descriptive purposes, and cannot be understood as indicating the number of the technical features indicated. Therefore, the features limited by "first", "second", "third" can explicitly or implicitly include at least one of the features. All directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the disclosure are only used to explain the relative positional relationship, movement condition, etc. between components in a certain posture (as shown in the drawings), and if the certain posture changes, the directional indications also change accordingly. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but can optionally include steps or units not listed, or can optionally include other steps or units inherent to the process, method, product or device.

[0103] The above merely describes the embodiments of the present disclosure, and does not limit the patent scope of the present disclosure, and any equivalent structure or equivalent process transformation made by using the content of the present disclosure and the drawings, or directly or indirectly applied to other related technical fields, are also included in the patent protection scope of the present disclosure.

Claims

1. A cleaning system comprising a cleaning device and a base station; The cleaning equipment comprises: The device body has a first accommodating space; a first filter assembly, at least partially disposed in the first accommodating space, the first filter assembly having a first opening suitable for water to flow through; a first interface in fluid communication with the first accommodating space to allow water flowing through the first filter assembly to flow out of the first accommodating space during a cleaning process; a second interface, in fluid communication with the first accommodating space, adapted to engage with the first opening to allow water to flow into the first filter assembly during a cleaning process; The cleaning process generates a water flow in a first direction, and the water flow in the first direction flows through the first opening, the first filter assembly, and the first interface in sequence; It is characterized in that the base station includes: Base station body; a third interface, provided on the base station body, adapted to interface with the first opening or the second interface to allow water to flow from the first filter assembly to the base station body during a self-cleaning process; The self-cleaning process generates a water flow in a second direction, and the water flow in the second direction flows through the first interface, the first filter component, the first opening, and the third interface in sequence; The cleaning system further includes a power assembly to form a water flow along the second flow direction during a self-cleaning process; wherein, during the self-cleaning process, the first interface is connected to a water source to provide a water flow along the second flow direction.

2. The cleaning system according to claim 1, characterized in that During the self-cleaning process, the second interface or the first opening is sealed and docked with the third interface.

3. The cleaning system according to claim 1, wherein: The cleaning system also includes a second accommodating space at least partially disposed in the base station body and a second filter assembly at least partially disposed in the second accommodating space, the second filter assembly including a second opening, the second opening being connected to the third interface, and the power assembly being used to guide the water flow to flow through the first interface, the first filter assembly, the first opening, the third interface and the second opening in sequence, and enter the second filter assembly.

4. The cleaning system according to claim 3, characterized in that The second filter assembly includes a filter bag, and the filter bag is detachably arranged in the base station body.

5. The cleaning system according to claim 3, characterized in that The cleaning system further includes a fifth interface, which is provided on the base station body and is in fluid communication with the second filter assembly to allow water flowing through the second filter assembly to flow out of the base station body during the self-cleaning process.

6. The cleaning system according to claim 5, characterized in that The cleaning device further includes a fourth interface provided on the first accommodating space, and during the self-cleaning process, the fourth interface and the fifth interface are connected; The power assembly is used to guide water to circulate in the first accommodating space and the second accommodating space, and the first interface is in a closed state.

7. The cleaning system according to claim 5, characterized in that During the self-cleaning process, the fifth interface is docked with the first interface, the second interface or the first opening is docked with the third interface, and the power component is used to guide the water flow to circulate in the first accommodating space and the second accommodating space.

8. The cleaning system according to claim 1, wherein: The cleaning system further includes a fifth interface, which is provided on the base station body to allow water to flow out of the base station body during the self-cleaning process.

9. The cleaning system according to claim 8, characterized in that The fifth interface is used to connect to a swimming pool skimmer assembly, wherein the swimming pool skimmer assembly includes a swimming pool skimmer body and a skimmer filter assembly at least partially disposed within the swimming pool skimmer body. During the self-cleaning process, the fifth interface is communicated with the skimmer filter assembly, and the power assembly is used to guide the water flow in the second flow direction to flow through the fifth interface into the skimmer filter assembly and out of the skimmer filter assembly. Alternatively, the fifth interface is connected to an external sewage pipe, and during the self-cleaning process, the power component is used to guide the water flow in the second flow direction to flow through the fifth interface into the external sewage pipe.

10. The cleaning system according to claim 1, wherein: The first accommodating space is a substantially enclosed space, and the first filter assembly is a filter structure; during the cleaning process, water in the first flow direction sequentially flows through the first filter assembly, the first accommodating space, and then flows out of the cleaning device from the first interface; During the self-cleaning process, the water in the second flow direction flows through the first interface, the first accommodating space, the first filter assembly, and the first opening in sequence.

11. The cleaning system according to claim 1, wherein: The power assembly includes one of the following: A base station suction member provided on the base station body, a main water pump provided on the cleaning device, or an external suction member provided outside the base station and the cleaning device.

12. The cleaning system according to claim 1, wherein: The power assembly includes a main water pump provided on the cleaning device, and the main water pump includes a first working mode and a second working mode; during the cleaning process, the main water pump is in the first working mode; during the self-cleaning process, the main water pump is in the second working mode.

13. The cleaning system according to claim 1, wherein: When the cleaning device is docked with the base station, the base station is used to charge the cleaning device or replace the battery of the cleaning device, wherein the charging method includes at least one of wireless charging and electrode sheet charging.

14. A cleaning system comprising a cleaning device and a base station; The cleaning equipment comprises: The device body has a first accommodating space; a first filter assembly, at least partially disposed in the first accommodating space, the first filter assembly having a first opening suitable for water to flow through; a first interface in fluid communication with the first accommodating space to allow water flowing through the first filter assembly to flow out of the first accommodating space during a cleaning process; a second interface, in fluid communication with the first accommodating space, adapted to engage with the first opening to allow water to flow into the first filter assembly during a cleaning process; The cleaning process generates a water flow in a first direction, and the water flow in the first direction flows through the first opening, the first filter assembly, and the first interface in sequence; It is characterized in that the base station includes: Base station body; a third interface, provided on the base station body, adapted to interface with the first opening or the second interface to allow water to flow from the first filter assembly to the base station body during a self-cleaning process; Wherein, the cleaning device further includes a fourth interface, which is in fluid communication with the first accommodating space; The self-cleaning process generates water flow in a second direction, and the water flow in the second direction flows through the fourth interface, the first filter assembly, the first opening, and the third interface in sequence; The cleaning system also includes a power component. During the self-cleaning process, the fourth interface is connected to the water source to provide water flow along the second flow direction; and during the cleaning process, the fourth interface is in a closed state and the first interface is in an open state. During the self-cleaning process, the fourth interface is in an open state and the first interface is in a closed state.

15. A cleaning system comprising a cleaning device and a base station; The cleaning equipment comprises: The device body has a first accommodating space; a first filter assembly, at least partially disposed in the first accommodating space, the first filter assembly having a first opening suitable for water to flow through; a first interface in fluid communication with the first accommodating space to allow water flowing through the first filter assembly to flow out of the first accommodating space during a cleaning process; a second interface, in fluid communication with the first accommodating space, adapted to engage with the first opening to allow water to flow into the first filter assembly during a cleaning process; The cleaning process generates a water flow in a first direction, and the water flow in the first direction flows through the first opening, the first filter assembly, and the first interface in sequence; It is characterized in that the base station includes: Base station body; a third interface, provided on the base station body, adapted to interface with the first opening or the second interface to allow water to flow from the first filter assembly to the base station body during a self-cleaning process; Wherein, the first filter assembly further comprises a third opening adapted to allow water to flow into the first filter assembly during the self-cleaning process; The self-cleaning process generates water flow in a second direction, and the water flow in the second direction flows through the third opening, the first filter assembly, the first opening, and the third interface in sequence; The cleaning system further includes a power assembly to form a water flow along the second flow direction during the self-cleaning process; During the self-cleaning process, the third opening is connected to the water source to provide water flow along the second flow direction; and during the cleaning process, the third opening is in a closed state, and during the self-cleaning process, the third opening is in an open state.

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