Optical proximity correction method and device, electronic equipment and medium

Abstract

The invention provides an optical proximity correction method and device, electronic equipment and a medium, and relates to the technical field of semiconductors. The method comprises the steps of obtaining a design layout; any one through hole graph in the design layout is used as a target through hole graph, and an adjacent graph closest to the target through hole graph is determined; determining a first target edge of the target through hole graph and a second target edge of the adjacent graph; determining a target compensation table from a plurality of compensation tables according to an edge position relationship between the first target edge and the second target edge; each compensation table comprises a corresponding relation between different distances and different compensation values; the compensation values corresponding to the same distance in the plurality of compensation tables are different; determining a target compensation value from a target compensation table according to the distance between the first target edge and the second target edge; and moving the first target edge towards the direction of the second target edge by the distance of the target compensation value to obtain a developed target graph of the target through hole graph. According to the invention, a smooth compensation value can be provided for the graph, and the chip performance is ensured.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to an optical proximity correction method, device, electronic device, and medium. Background Art

[0002] When a mask is used to expose a wafer, the diffraction and interference of light may cause a deviation between the actual pattern after exposure and etching and the pattern of the design layer.

[0003] To solve this technical problem, semiconductor Fabs perform optical proximity correction (OPC) on the initial design layout. During the OPC process on the hole layer (CT or via), a bias table is usually used in the OPC correction solution to compensate for the design layer shape, thereby obtaining the target graphic layer after development.

[0004] However, in the existing OPC correction process, when using a compensation table to compensate for two staggered patterns, a sudden change in the compensation value may occur, causing a sudden change in the generated target pattern layer after development, thereby affecting chip performance. Summary of the Invention

[0005] The purpose of this application is to address the deficiencies in the above-mentioned prior art and provide an optical proximity correction method, device, electronic device and medium to provide a smooth compensation value for graphics and ensure chip performance.

[0006] To achieve the above objectives, the technical solutions adopted in the embodiments of the present application are as follows: In a first aspect, an embodiment of the present application provides an optical proximity correction method, the method comprising: obtaining a design layout, the design layout comprising a plurality of through-hole graphics; taking any through-hole graphic in the design layout as a target through-hole graphic, and determining the through-hole graphic closest to the target through-hole graphic as a neighboring graphic; determining a first target edge of the target through-hole graphic and a second target edge of the neighboring graphic, the first target edge and the second target edge being the edges of the graphic closest to the target through-hole graphic and the neighboring graphic, respectively; determining a target compensation table from a plurality of compensation tables based on an edge position relationship between the first target edge and the second target edge; each compensation table comprising: a correspondence between different distances and different compensation values; in the plurality of compensation tables, the compensation values ​​corresponding to the same distance are different; determining a target compensation value from the target compensation table based on the distance between the first target edge and the second target edge; moving the first target edge toward the second target edge by the distance of the target compensation value to obtain a target graphic after development of the target through-hole graphic.

[0007] In a second aspect, an embodiment of the present application further provides an optical proximity correction device, the device comprising: a layout acquisition module for acquiring a design layout, the design layout comprising multiple through-hole patterns; a pattern determination module for taking any through-hole pattern in the design layout as a target through-hole pattern and determining the through-hole pattern closest to the target through-hole pattern as a neighboring pattern; a target edge determination module for determining a first target edge of the target through-hole pattern and a second target edge of the neighboring pattern, the first target edge and the second target edge being the closest pattern edges between the target through-hole pattern and the neighboring pattern, respectively; a compensation table determination module for determining a target compensation table from multiple compensation tables based on an edge position relationship between the first target edge and the second target edge; the compensation table comprising: a correspondence between different distances and different compensation values; in multiple compensation tables, the same distance corresponds to different compensation values; a compensation value determination module for determining a target compensation value from the target compensation table based on the distance between the first target edge and the second target edge; and a compensation module for moving the first target edge toward the second target edge by the distance of the target compensation value to obtain a target pattern of the target through-hole pattern after development.

[0008] In a third aspect, an embodiment of the present application further provides an electronic device comprising: a processor, a storage medium and a bus, wherein the storage medium stores program instructions executable by the processor. When the electronic device is running, the processor communicates with the storage medium via the bus, and the processor executes the program instructions to perform the steps of the optical proximity correction method as described in any one of the first aspects.

[0009] In a fourth aspect, an embodiment of the present application further provides a computer-readable storage medium, on which a computer program is stored. When the computer program is executed by a processor, the steps of the optical proximity correction method as described in any one of the first aspects are executed.

[0010] The optical proximity correction method, device, electronic device and medium provided by the present application determine the nearest adjacent graphic for each target through-hole graphic, and determine the first target edge and the second target edge that are closest to the adjacent graphic. For the multiple edge position relationships between each edge of the through-hole graphic and other edges, multiple compensation tables corresponding to multiple edge position relationships are provided. The compensation values ​​corresponding to the same distance in the multiple compensation tables are different. According to the edge position relationship between the first target edge and the second target edge, each edge position relationship has a corresponding compensation table. The compensation values ​​corresponding to the same distance in the multiple compensation tables are different. By searching for the nearest edge for each edge, the edge position relationship between the nearest edge and each edge is determined, and the compensation value of each edge of the through-hole graphic is determined from the target compensation table corresponding to the edge position relationship. By providing multiple compensation tables with gradient changes, the problem of sudden changes in compensation values ​​of staggered through-hole graphics during the OPC correction process is solved, so that the change of the target graphic generated by the through-hole graphic with critical position setting is smoother, preventing sudden changes in the target graphic after development, and ensuring chip performance. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Figure 1 Schematic diagram for compensation of existing through-hole layer Figure 1 ; Figure 2 Schematic diagram for compensation of existing through-hole layer Figure 2 ; Figure 3 Schematic diagram for compensation of existing through-hole layer Figure 3 ; Figure 4 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 1 ; Figure 5 A search diagram provided for an embodiment of the present application; Figure 6 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 2 ; Figure 7 Schematic diagram of through-hole layer compensation provided in the embodiment of the present application Figure 1 ; Figure 8 Schematic diagram of through-hole layer compensation provided in the embodiment of the present application Figure 2 ; Figure 9 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 3 ; Figure 10 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 4 ; Figure 11A schematic diagram of the relationship between the positions of various graphics of two test graphics provided in an embodiment of the present application; Figure 12 A schematic diagram of a test pattern provided in an embodiment of the present application; Figure 13 A schematic structural diagram of an optical proximity correction device provided in an embodiment of the present application; Figure 14 A schematic diagram of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0012] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments.

[0013] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for protection, but merely represents selected embodiments of the present application. All other embodiments obtained by persons of ordinary skill in the art based on the embodiments in the present application without creative work are within the scope of protection of the present application.

[0014] In the description of this application, it should be noted that if the terms "upper", "lower", etc. appear, the orientation or side position relationship indicated is based on the orientation or side position relationship shown in the accompanying drawings, or is the orientation or side position relationship in which the product of the application is usually placed when used. It is only for the convenience of describing this application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it cannot be understood as a limitation on this application.

[0015] In addition, the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchangeable where appropriate, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0016] It should be noted that, in the absence of conflict, the features in the embodiments of this application can be combined with each other.

[0017] Semiconductor Fab factories perform OPC correction on the initial design layout to obtain a mask pattern. The mask is used to perform After Develop Inspection (ADI) to form a photoresist pattern. The photoresist pattern is then etched after development (AEI) to form a developed pattern.

[0018] The compensation table generally compensates the graphics of the design layer with different values ​​according to the critical dimension (CD) of the graphics and the distance (Space) between the graphics, which is used to compensate for the influence of etching and other factors under different CD and Space.

[0019] In the process of OPC for the through-hole layer (CT or Via), a bias table is usually used in the OPC correction scheme to compensate for the design layer shape, thereby obtaining the target graphic layer after development (ADI target layer). The target graphic layer after development is the ideal graphic layer expected to be formed in the ADI stage, and is the key intermediate state connecting the design layout and the final etched graphic.

[0020] When compensating for the through-hole layer pattern, the edge that needs to be compensated is usually extended by a certain value, and then the extended edge is searched for the nearest edge in the direction outside the pattern to determine the distance between the two edges. Then, based on the size of the distance, the corresponding compensation value is selected from the compensation table to obtain the developed target (ADI target) of the edge.

[0021] For example, Table 1 is an existing compensation table. Figure 1 Schematic diagram for compensation of existing through-hole layer Figure 1 ,like Figure 1 As shown in the figure, the initial extension value of the right side of pattern 1 is 0nm (i.e., opposite extended 0). The nearest edge is searched from the right side toward the outside of pattern 1, i.e., the right side of pattern 2. Based on the distance of 100nm between the right side of pattern 1 and the left side of pattern 2, the corresponding compensation value is determined to be 10nm from the compensation table. Then, the right side of pattern 1 is moved to the right by 10nm. The same compensation method is used for the other edges of pattern 1 and each edge of pattern 2. Figure 1 The red box shown in the figure is the developed target after the corresponding pattern compensation.

[0022] Table 1 An existing compensation table

[0023] It should be noted that the correspondence between the distance and the compensation value shown in Table 1 is the correspondence between the distance range and the compensation value. When the distance is greater than or equal to 100nm and less than 200nm, the compensation value is 10nm; when the distance is greater than or equal to 200nm and less than 500nm, the compensation value is 12nm; when the distance is greater than or equal to 500nm and less than 1000nm, the compensation value is 15nm; when the distance is greater than 1000nm, the compensation value is 20nm.

[0024] Figure 2 Schematic diagram for compensation of existing through-hole layer Figure 2 ,like Figure 2 As shown, there are two staggered patterns in the design layout, such as Figure 2 As shown in (a), when the initial extension value of the right side of pattern 1 is 0nm, there is a projection between the right side of pattern 1 and the left side of pattern 2, that is, the right side of pattern 1 can be projected to the left side of pattern 2, and the left side of pattern 2 can also be projected to the right side of pattern 1. In this case, according to the distance 100nm between the right side of pattern 1 and the left side of pattern 2, the corresponding compensation value is determined to be 10nm from the compensation table, and the right side of pattern 1 is moved to the right by 10nm. If the nearest edge found by the left side of pattern 2 is the right side of pattern 1, the left side of pattern 2 is also moved to the left by 10nm. After compensation, the distance between the two sides becomes 80nm.

[0025] like Figure 2 As shown in Figure (b), when the initial extension value of the right side of pattern 1 is 0, there is no projection between the right side of pattern 1 and the left side of pattern 2. That is, the right side of pattern 1 has no projection on the left side of pattern 2, and the left side of pattern 2 has no projection on the right side of pattern 1. In other words, when the projection distance of one side on the other is less than or equal to a preset value (e.g., 0), the compensation value corresponding to the maximum distance value in the compensation table is used as the compensation value for the right side of pattern 1 and the left side of pattern 2. For example, if the maximum distance value of 1000 in Table 1 corresponds to a compensation value of 20 nm, the right side of pattern 1 is shifted to the right by 20 nm. Similarly, if the left side of pattern 2 has no projection on the right side of pattern 1, the left side of pattern 2 is shifted to the left by 20 nm, and the distance between the two sides after compensation becomes 60 nm.

[0026] Figure 3Schematic diagram for compensation of existing through-hole layer Figure 3 ,like Figure 3 As shown, there are two staggered patterns in the design layout, such as Figure 3 As shown in (a), for example, when the right side of pattern 1 is extended by the initial extension value (e.g., 20 nm, opposite extended 0.02), there is a projection between the right side of pattern 1 and the left side of pattern 2, that is, the right side of pattern 1 can be projected onto the left side of pattern 2, and the left side of pattern 2 can also be projected onto the right side of pattern 1. In this case, based on the distance of 100 nm between the right side of pattern 1 and the left side of pattern 2, the corresponding compensation value is determined to be 10 nm from the compensation table. Then, the right side of pattern 1 is moved 10 nm to the right, and the left side of pattern 2 is moved 10 nm to the left. After compensation, the distance between the two sides becomes 80 nm.

[0027] like Figure 3 As shown in (b), when the initial extension value of the right side of pattern 1 is 20, there is no projection between the right side of pattern 1 and the left side of pattern 2, that is, the right side of pattern 1 has no projection on the left side of pattern 2, and the left side of pattern 2 has no projection on the right side of pattern 1. In this case, the compensation value of 20nm corresponding to the maximum distance value in the compensation table is used as the compensation value for the right side of pattern 1 and the left side of pattern 2, that is, the right side of pattern 1 is moved 20nm to the right, and the left side of pattern 2 is moved 20nm to the left. After compensation, the distance between the two sides becomes 60nm.

[0028] It can be seen that Figure 2 (a) and Figure 2 The two figures in (b) Figure 3 (a) and Figure 3 A slight design change in the two patterns in (b) results in a significant change in the post-development target after OPC. The compensation value suddenly changes from the minimum 10nm in the compensation table to the maximum 20nm. This step-like change not only fails to meet the requirements of the designer and process integration engineer (PIE) for the post-development target change trend, but may also cause unexpected changes in capacitance or resistance, ultimately affecting chip performance.

[0029] Based on the problems existing in the above-mentioned prior art, the present application intends to provide an optical proximity correction method, device, electronic device and medium, which solves the problem of sudden changes in compensation values ​​of staggered through-hole patterns during the OPC correction process by providing multiple compensation tables with gradient changes, so that the changes in the target pattern after development generated by the through-hole pattern with critical position settings are smoother, preventing sudden changes in the target pattern after development and ensuring chip performance.

[0030] The specific implementation of the optical proximity correction method, device, electronic device and medium provided in this application is described below with reference to embodiments.

[0031] Figure 4 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 1 ,like Figure 4 As shown, the method may include: S101. Obtain a design layout, where the design layout includes a plurality of through-hole patterns.

[0032] In this embodiment, the design layout is the physical layout of the chip design, which may include geometric figures of structures such as transistors, interconnect lines, and through holes. The through holes are divided into contact holes (CT) between the active layer and the metal layer and through holes (via) between the metal layers. The geometric figures corresponding to the through holes are the through hole figures.

[0033] S102 , taking any through-hole pattern in the design layout as a target through-hole pattern, and determining a through-hole pattern closest to the target through-hole pattern as a neighboring pattern.

[0034] In this embodiment, for each through-hole pattern in the design layout, when the through-hole pattern is developed and etched, the developed pattern is affected by the surrounding through-hole patterns, resulting in a deviation between the developed pattern and the through-hole pattern in the design layout. Therefore, OPC correction needs to be performed on the through-hole pattern first.

[0035] During the OPC correction process, it is necessary to perform OPC correction on multiple through-hole patterns in the design layout to obtain the target pattern after development.

[0036] Specifically, any through-hole pattern among the plurality of through-hole patterns is used as a target through-hole pattern, and other through-hole patterns are searched around the target through-hole pattern, and a through-hole pattern closest to the target through-hole pattern is determined as a neighboring pattern.

[0037] In some embodiments, each edge of the target through-hole pattern may be used as a boundary, and the nearest edge may be searched toward the outside of each edge to determine the through-hole pattern corresponding to the nearest edge as the adjacent pattern.

[0038] Specifically, the design layout is divided into two sides, the target through-hole pattern is located on the inside of the boundary, and the other side is outside the boundary. The outside of each side is the side of each side that does not have the target through-hole pattern. For example, if an edge is the right side of the target through-hole pattern, the outside of the edge is the right side of the edge. If the edge is the upper side of the target through-hole pattern, the outside of the edge is the top of the edge.

[0039] Search the entire design layout for the nearest edge outside the boundary to determine whether there is a nearest edge outside the boundary. If there is a nearest edge outside the boundary, determine that the through-hole pattern corresponding to the nearest edge is the adjacent pattern.

[0040] In some embodiments, Figure 5 The search diagram provided in the embodiment of this application is as follows: Figure 5 As shown, the adjacent graphics corresponding to the nearest edge can be searched in sequence on the right side of the target through-hole graphic and the outside of the multi-segment extension line of the right side.

[0041] S103 , determining a first target edge of the target through-hole pattern and a second target edge of the adjacent pattern, where the first target edge and the second target edge are the closest edges between the target through-hole pattern and the adjacent pattern, respectively.

[0042] In this embodiment, if the target through-hole pattern has the nearest adjacent patterns in multiple directions, then for the target through-hole pattern and any adjacent pattern, the pattern edges closest to the target through-hole pattern and the adjacent pattern are determined to be the first target edge of the target through-hole pattern and the second target edge of the adjacent pattern, respectively.

[0043] In some embodiments, the first target edge of the target through-hole pattern can be determined based on the position of the adjacent pattern relative to the target through-hole pattern. For example, if the adjacent pattern is located on the right side of the target through-hole pattern, the right side of the target through-hole pattern is determined as the first target edge.

[0044] The graphic edge of the adjacent graphic is searched in a direction perpendicular to the first target edge and its extension line, and the graphic edge first searched is determined to be the second target edge of the adjacent graphic that is closest to the first target edge.

[0045] like Figure 5 As shown in (a), the second target edge closest to the first target edge is searched outside the first target edge.

[0046] like Figure 5 As shown in (b), the second target edge closest to the target edge is searched outside the first extension line of the first target edge.

[0047] like Figure 5 As shown in (c), the second target edge closest to the target edge is searched outside the second extension line of the first target edge.

[0048] S104. Determine a target compensation table from multiple compensation tables based on the edge position relationship between the first target edge and the second target edge; each compensation table includes a correspondence between distances and compensation values. In multiple compensation tables, the same distance corresponds to different compensation values.

[0049] In this embodiment, the first target edge is extended, and the first target edge and its extension line are divided into multiple line segments, each line segment has a unique corresponding compensation table, and the edge position relationship between the first target edge and the second target edge is: the overlapping relationship between the projection of the second target edge and the multiple line segments, according to the overlapping relationship between the projection of the second target edge and the multiple line segments, the target line segment that overlaps with the projection of the second target edge and is closest to the target through-hole pattern is determined from the multiple line segments, and the target compensation table is determined according to the compensation table corresponding to the target line segment.

[0050] For example, Figure 5 As shown in (b), when the initial extension value is 0 nm, the first target side corresponds to the compensation table Bias table 1, and the first extension line of the first target side (for example Figure 5 (b) 0nm~5nm) corresponds to the compensation table Biastable2, the second extension line of the first target edge (e.g. Figure 5 (5nm~10nm in (b)) corresponds to compensation table Biastable3.... It can be seen that the second target edge does not have a projection overlapping relationship with the first target edge, but has a projection overlapping relationship with the first extension line of the first target edge. The compensation table Bias table2 corresponding to the first extension line is determined to be the target compensation table.

[0051] For example, Figure 5 As shown in (c), when the initial extension value is 5nm, the first target edge and the first extension line (e.g. Figure 5 (c) 0nm~5nm) corresponds to the compensation table Bias table1, the second extension line of the first target edge (e.g. Figure 5 (c) corresponds to the compensation table Bias table 2, the third extension line of the first target edge (e.g. Figure 5 (c) (10nm~15nm) corresponds to compensation table Bias table3.... It can be seen that the second target edge has no projective overlap with the first target edge and the first extension line, but has a projective overlap with the second extension line of the first target edge. The compensation table Bias table2 corresponding to the second extension line is determined to be the target compensation table.

[0052] Each edge position relationship or line segment has a pre-created compensation table. Each compensation table records a one-to-one correspondence between multiple distances and multiple compensation values. In each compensation table, the greater the distance between two edges, the greater the compensation value. Across multiple compensation tables, for the same distance, the further the line segment is from the first target edge in the direction of its length, the greater the compensation value.

[0053] In some embodiments, when the distance between two edges is greater than a preset distance threshold, the compensation values ​​in the multiple compensation tables may be equal.

[0054] For example, the multiple distances are 100nm, 200nm, 500nm and 1000nm respectively. In the first compensation table, the compensation values ​​corresponding to the multiple distances are 10nm, 12nm, 15nm, and 20nm respectively. In the second compensation table, the compensation values ​​corresponding to the multiple distances are 12nm, 14nm, 18nm, and 20nm respectively. That is, when the distance is greater than or equal to 1000nm, the compensation values ​​in the multiple compensation tables are equal.

[0055] S105 : Determine a target compensation value from a target compensation table according to the distance between the first target edge and the second target edge.

[0056] In this embodiment, after the target compensation table is determined, according to the distance between the first target side and the second target side, a compensation value corresponding to the distance is determined from the target compensation table as a target compensation value.

[0057] In this way, it can be ensured that when the target through-hole pattern and other patterns are interlaced, the extension line of the first target edge of the target through-hole pattern can always be projected onto the second target edge of the other pattern, ensuring that the second target edge has a corresponding target compensation table, without using the maximum compensation value in the existing unique compensation table.

[0058] S106 , moving the first target edge toward the second target edge by a distance of the target compensation value to obtain a developed target pattern of the target through-hole pattern.

[0059] In this embodiment, the first target edge is controlled to move toward the second target edge by a distance corresponding to the target compensation value. After the target compensation value is determined for each edge of the target through-hole pattern using the above-mentioned S103-S105 method, each edge is controlled to move outward by a distance corresponding to the target compensation value to obtain a target pattern after development of the target through-hole pattern.

[0060] The optical proximity correction method provided by the above embodiment determines the nearest neighboring graphic for each target through-hole graphic, and determines the first target edge and the second target edge that are closest to the target through-hole graphic and the neighboring graphic. For the various edge position relationships between each edge of the through-hole graphic and other edges, multiple compensation tables corresponding to multiple edge position relationships are provided. The compensation values ​​corresponding to the same distance in the multiple compensation tables are different. According to the edge position relationship between the first target edge and the second target edge, the compensation value of each edge of the through-hole graphic is determined from the target compensation table corresponding to the edge position relationship. By providing multiple compensation tables with gradient changes, the problem of sudden changes in compensation values ​​of staggered through-hole graphics during the OPC correction process is solved, so that the change of the target graphic after development generated by the through-hole graphic with critical position setting is smoother, preventing sudden changes in the target graphic after development, and ensuring chip performance.

[0061] In one possible implementation, Figure 6 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 2 ,like Figure 6 As shown, the process of determining the target compensation table from multiple compensation tables according to the edge position relationship between the first target edge and the second target edge in S104 may include: S201: Use a first target edge and a preset extension line of the first target edge as projection line segments, and project toward a second target edge.

[0062] S202: Determine whether the projection line segment and the second target edge have projection overlap.

[0063] S203: If the projection line segment and the second target edge have a projection overlap, determine a corresponding target compensation table according to the projection overlap relationship between the projection line segment and the second target edge.

[0064] In this embodiment, the first target edge and the preset extension line of the first target edge are used as projection line segments, and the projection line segments are divided into multiple line segments. Each line segment corresponds to a compensation table, and projection is performed on the multiple line segments to the second target edge to determine whether the multiple line segments have projection overlap with the second target edge.

[0065] In this embodiment, if there is at least one line segment among the multiple line segments that has a projection overlap with the second target edge, the line segment with the shortest extension value relative to the first target edge is determined from the at least one line segment as the target line segment, and the compensation table corresponding to the target line segment is determined as the target compensation table.

[0066] For example, the second target edge has a projective overlapping relationship with three line segments, and the lengths of the three line segments are all 5 nm. Among them, the extension value of the first line segment relative to the first target edge is 5 nm, the extension value of the second line segment relative to the first target edge is 10 nm, and the extension value of the third line segment relative to the first target edge is 15 nm. The compensation table corresponding to the first line segment is determined to be the target compensation table.

[0067] In some embodiments, multiple projection positions are set on the first target edge and multiple extension lines. The projection positions can correspond to the two endpoints of the first target edge and the end endpoint of each extension line, or can be multiple discrete points on the first target edge and the multiple extension lines. The multiple discrete points on each line segment must at least include the endpoint of each line segment, wherein the extension line only includes the end endpoint, and the first endpoint is counted as the end endpoint of the previous adjacent line segment.

[0068] Starting with the first projection position on the first target edge, project toward the second target edge in sequence, determining the first projection point generated on the second target edge. After generating the first projection point, no further projections are performed on the second target edge through the remaining projection positions. Projection involves drawing a perpendicular line from the projection position to the second target edge. If the perpendicular line intersects the second target edge, that intersection is determined as the projection point.

[0069] For example, if the projection position on the first target edge does not have a projection point on the second target edge, the projection position on the first extension line is projected to the second target edge to determine whether the projection position on the first extension line has a projection point on the second target edge, and so on, until the first projection point is generated on the second target edge.

[0070] The projection position of the first projection point is determined to be the target projection position, the line segment where the target projection position is located is determined to be the target line segment, and the compensation table corresponding to the target line segment is determined to be the target compensation table.

[0071] For example, Figure 7 Schematic diagram of through-hole layer compensation provided in the embodiment of the present application Figure 1 , Figure 7 correspond Figure 2 As shown in the case of projection with an initial extension value of 0, Figure 7 As shown, the first target edge is projected onto the second target edge. If the first target edge does not have a projection point on the second target edge ( Figure 2 (b) Project the first extension line of the first target edge (e.g., extended by 5 nm) onto the second target edge, generate a projection point on the second target edge, and determine the second compensation table Bias table 2 corresponding to the first extension line as the target compensation table.

[0072] Figure 8Schematic diagram of through-hole layer compensation provided in the embodiment of the present application Figure 2 , Figure 8 correspond Figure 3 The projection is performed when the initial extension value is 20 nm. Figure 8 As shown, when the first target edge and the first extension line have no projection points on the second target edge ( Figure 3 (b) Project the second extension line of the first extension line onto the second target edge, generate a projection point on the second target edge, and determine the second compensation table Bias table2 corresponding to the second extension line as the target compensation table.

[0073] Furthermore, the process of determining the corresponding target compensation table according to the projection overlap relationship between the projected line segment and the second target edge in S203 may include: If the second line segment on the projected line segment overlaps with the second target edge, the second compensation table corresponding to the first compensation table and the second line segment is determined to be the corresponding target compensation table, and the second line segment is an extended line segment away from the first target edge on the preset extension line.

[0074] The process of determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side in S105 may include: Determine a first compensation value from a first compensation table; determine a second compensation value from a second compensation table according to a distance between the first target side and the second target side; and determine a target compensation value according to the first compensation value and the second compensation value.

[0075] In this embodiment, the first target edge and its preset extension line are divided into multiple line segments, the first line segment includes at least the first target edge, and may also include the first extension line of the first target edge, wherein the first extension line is an extension line of the preset extension line of the first target edge that is adjacent to the first target edge, and the second line segment is the remaining line segment of the first target edge and its preset extension line excluding the first line segment, that is, the second line segment may include the entire preset extension line, or may only include the extension line of the preset extension line excluding the first extension line.

[0076] If adopted Figure 2 The initial extension value is 0nm, the first line segment is the first target edge, and the second line segment is the preset extension line of the first target edge; if the initial extension value is 0nm, the first line segment is the first target edge, and the second line segment is the preset extension line of the first target edge; Figure 3 The compensation is performed for the case where the initial extension value is 20 nm. The first line segment is the first target edge and the first extension line. The second line segment is the extension line of the other segments connected to the first extension line of the first target edge, that is, the extension line of the preset extension line excluding the first extension line.

[0077] In this embodiment, in the first compensation table Bias table 1 corresponding to the first line segment, the greater the distance between the first target edge and the second target edge, the greater the compensation value, and the compensation value in the first compensation table Bias table 1 is greater than 0.

[0078] The compensation tables corresponding to the other line segments in the multi-segment line segment excluding the first line segment are used to compensate for the maximum compensation value in the first compensation table. The compensation values ​​corresponding to the various distances in the other compensation tables are values ​​less than or equal to 0, and the larger the distance value, the larger the compensation value.

[0079] Since the greater the distance between two graphics, the greater the value that can be compensated for the graphics, therefore, under the same distance value, the smaller the extension value from the first target edge, the smaller the compensation value of the compensation table.

[0080] If there is no projection overlap between the first line segment (the first target edge or the first target edge and its first segment extension) and the second target edge, that is, the target through-hole pattern and the adjacent patterns corresponding to the second target edge are completely intertwined and do not have any projection overlap, the maximum compensation value corresponding to the infinite distance in the first compensation table is determined to be the first compensation value.

[0081] Then, the compensation table corresponding to the extended line segment in the second line segment that overlaps with the projection of the second target edge and has the shortest extension value relative to the first target edge is determined as the second compensation table. According to the distance between the first target edge and the second target edge, the second compensation value is determined from the second compensation table, and the second compensation value is a negative value.

[0082] The target compensation value is calculated according to the sum of the first compensation value and the second compensation value, so as to achieve the mitigation of the first compensation value and avoid a sudden change in compensation for the first target edge due to the intersection of the two graphics.

[0083] For example, Table 2 is the compensation table Bias table 2, and Table 3 is the compensation table Bias table 3. Compensation table Biastable 2 corresponds to a first target edge extension of 0-5 nm, and compensation table Bias table 3 corresponds to a first target edge extension of 5-10 nm.

[0084] Table 2 Bias table2

[0085] Table 3 Bias table 3

[0086] like Figure 5As shown in (b), if the initial extension value is 0nm, the first line segment is the first target edge, corresponding to the first compensation table Bias table 1, the second line segment is the preset extension line, and the second line segment includes the first extension line, the second extension line, and the third extension line. The first extension line corresponds to the second compensation table Bias table 2, the second extension line corresponds to the second compensation table Biastable 3, and the third extension line corresponds to the second compensation table Bias table 4. If the second target edge overlaps with the projection of the first extension line of the first target edge, the first compensation value is determined to be 20nm from the compensation table Bias table 1 corresponding to Table 1. Based on the distance of 100nm between the first target edge and the second target edge, the second compensation value is determined to be -8nm from the second compensation table Bias table 2. The target compensation value of the first target edge is 20nm + (-8nm) = 12nm, that is, the first target edge is extended from the original Figure 2 (b) or Figure 3 The compensation value of 20nm shown in (b) suddenly changes to Figure 7 The compensation value shown is 12nm, which is consistent with Figure 2 (a) or Figure 3 The change is only 2nm compared to the 10nm shown in (a). After the first target edge and the second target edge are compensated in the above way, the distance between the two edges changes from the original 60nm after the sudden compensation to 76nm, which is Figure 2 (a) or Figure 3 The change compared to the 80nm shown in (a) is only 4nm.

[0087] Similarly, if the second target edge overlaps with the projection of the second extended line of the first target edge, the first compensation value is determined to be 20 nm from the compensation table Bias table 1 corresponding to Table 1. Based on the distance of 100 nm between the first target edge and the second target edge, the second compensation value is determined to be -6 nm from the third compensation table Bias table 3. Therefore, the target compensation value for the first target edge is 20 nm + (-6 nm) = 14 nm.

[0088] like Figure 5 (c) If the initial extension value is 5nm (or Figure 820nm as shown), the first line segment is the first target edge and the first extension line, corresponding to the first compensation table Bias table 1, the second line segment includes the second extension line, the third extension line, and the fourth extension line. The second extension line corresponds to the second compensation table Bias table 2, the third extension line corresponds to the second compensation table Bias table 3, and the fourth extension line corresponds to the second compensation table Bias table 4. If the second target edge overlaps with the second extension line of the first target edge, the first compensation value is determined to be 20nm from the compensation table Bias table 1 corresponding to Table 1. Based on the distance of 100nm between the first target edge and the second target edge, the second compensation value is determined to be -8nm from the second compensation table Bias table 2. The target compensation value for the first target edge is 20nm + (-8nm) = 12nm, that is, the first target edge is 12nm from the original Figure 2 (b) or Figure 3 The compensation value of 20nm shown in (b) suddenly changes to Figure 8 The compensation value shown is 12nm, which is consistent with Figure 2 (a) or Figure 3 The change is only 2nm compared to the 10nm shown in (a). After the first target edge and the second target edge are compensated in the above way, the distance between the two edges changes from the original 60nm after the sudden compensation to 76nm, which is Figure 2 (a) or Figure 3 The change compared to the 80nm shown in (a) is only 4nm.

[0089] It can be seen that after compensating the target edge using the above method, even if the graphics corresponding to the two edges change from a smaller interleaving distance (with projection) to a larger interleaving distance (without projection), the distance between the compensated developed target graphics will not change suddenly.

[0090] In some embodiments, as Figure 5 As shown, the second line segment is divided into multiple extension lines, each extension line corresponds to a compensation table. The shorter the length of the multiple extension lines, that is, the more line segments the preset extension line is divided into, the more corresponding compensation tables there are, and the smoother the changes between the compensation values ​​in different compensation tables at the same distance.

[0091] Furthermore, the process of determining the target compensation table from the plurality of compensation tables according to the edge position relationship between the first target edge and the second target edge in S104 may include: If the projected line segment does not overlap with the second target edge, the first compensation table is determined to be the target compensation table.

[0092] The process of determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side in S105 may include: The target compensation value is determined according to the maximum compensation value in the first compensation table.

[0093] In this embodiment, when the second target side has no projection overlap with all line segments of the first target side and their extension lines, it is determined that the adjacent pattern is far enough away from the target through-hole pattern, and the situation where there is no projection is changed from the situation where there is no projection to the critical situation where there is no projection. At this time, using the maximum compensation value in the first compensation table as the target compensation value of the first target side is not a sudden change in the compensation value, but a normal compensation value. Therefore, there is no need to use the compensation values ​​in other compensation tables to slow down the maximum compensation value in the first compensation table.

[0094] In another possible implementation, Figure 9 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 3 ,like Figure 9 As shown, the process of determining the target compensation table from multiple compensation tables according to the edge position relationship between the first target edge and the second target edge in S104 may include: S301: Acquire multiple compensation search areas from a first target edge to a second target edge in a design layout, wherein the multiple compensation search areas are distributed in an extension direction of the length of the first target edge, and each compensation search area corresponds to a compensation table.

[0095] S302: Determine a target compensation search area where a preset marking point on the second target edge is located from multiple compensation search areas.

[0096] S303: Determine the compensation table corresponding to the target compensation search area as the target compensation table.

[0097] In this embodiment, if Figure 5 (b) and Figure 5 As shown in (c), multiple compensation search areas are set from the first target side to the second target side of the target through-hole pattern. The multiple compensation search areas are arranged sequentially in the direction of the side length extension of the first target side. For example, if the first target side is the right side or left side of the target through-hole pattern, the multiple compensation search areas are arranged sequentially in the vertical direction. If the first target side is the upper side or lower side of the target through-hole pattern, the multiple compensation search areas are arranged sequentially in the horizontal direction. This solution is described using a rectangular target through-hole pattern as an example. The target through-hole pattern can also be other polygonal shapes, and this solution does not impose any restrictions on this.

[0098] In some embodiments, the width of the first compensation search area among the plurality of compensation search areas is greater than or equal to the length of the first target side, so that the first compensation search area at least covers the outer area corresponding to the first target side of the target through-hole pattern in the width direction, and the other compensation search areas are arranged in sequence next to the first compensation search area on the extension line of the first target side. Figure 5As shown in (b), the width of the first compensation search area is equal to the length of the first target side. Figure 5 As shown in (c), the width of the first compensation search area is greater than the length of the first target side.

[0099] Each compensation search area corresponds to a pre-created compensation table for each line segment. Each compensation table records a one-to-one correspondence between multiple distances and multiple compensation values. In each compensation table, the greater the distance between two edges, the greater the compensation value. For multiple compensation search areas, for the same distance, the farther the compensation search area is in the direction of the edge length, the greater the compensation value.

[0100] A preset mark point is set at the endpoint of the second target edge. After searching for the nearest second target edge, a compensation search area where the preset mark point is located is determined as the target compensation search area, and the compensation table corresponding to the target compensation search area is the target compensation table.

[0101] Since the second target edge has two endpoints, the marking point on the endpoint closest to the first target edge is used as the preset marking point.

[0102] For example, Figure 5 (b) and Figure 5 As shown in (c), the yellow dot is the preset marking point of the second target edge. The preset marking point is located in the compensation search area corresponding to the first green box, corresponding to the compensation table Bias table2.

[0103] In some embodiments, according to the position of the second target edge in the design layout, a compensation search area closest to the first target edge is determined from the compensation search area where the second target edge is located as the target compensation search area.

[0104] Specifically, the nearest edge can be searched for outside the first target edge and its multiple extension lines in sequence. If the nearest edge is found outside the first target edge, the compensation search area corresponding to the first target edge is determined to be the target compensation search area. If the nearest edge is not found outside the first target edge, the nearest edge is searched outside the first extension line at both ends of the first target edge. If the nearest edge is found outside the first extension line, the compensation search area corresponding to the first extension line is determined to be the target compensation search area. If the nearest edge is not found outside the first extension line, the nearest edge is searched outside the second extension line at both ends of the first target edge. The multiple extension lines extend sequentially along both ends of the first target edge, and each extension line has a unique corresponding compensation search area.

[0105] In other embodiments, multiple projection positions on the first target edge and its extension line are sequentially projected onto the second target edge to determine the first projection point generated on the second target edge, and the compensation search area where the projection point is located is determined as the target compensation search area.

[0106] Specifically, starting with the first projection position on the first target side, projection is performed sequentially toward the second target side to determine the first projection point generated on the second target side. After the first projection point is generated, no further projection is performed toward the second target side through the remaining projection positions. Projection involves drawing a perpendicular line from the projection position as the origin to the second target side. If the perpendicular line intersects the second target side, the intersection is determined as the projection point.

[0107] For example, if the projection position on the first target edge does not have a projection point on the second target edge, the projection position on the first extension line is projected to the second target edge to determine whether the projection position on the first extension line has a projection point on the second target edge, and so on, until the first projection point is generated on the second target edge.

[0108] According to the position of the first projection point and the coverage of the multiple compensation search areas, the compensation search area where the first projection point is located is determined as the target compensation search area.

[0109] In some embodiments, the process of determining the compensation table corresponding to the target compensation search area as the target compensation table may include: Determine whether the target compensation search area is the first compensation search area, where the first compensation search area is the compensation search area from the first target edge and the first line segment on the preset extension line of the first target edge to the second target edge; if the target compensation search area is not the first compensation search area, determine that the first compensation table corresponding to the first compensation search area and the second compensation table corresponding to the target compensation search area are the target compensation tables.

[0110] Specifically, if Figure 2 The initial extension value 0nm shown in the figure is used to confirm the preset mark point. The first line segment is the first target edge, and the width of the first compensation search area is equal to the length of the first target edge. Figure 3 If the initial extension value shown is greater than 0 nm for projection or confirmation of the preset mark point, the first line segment is the first target edge and the first segment extension line, the width of the first compensation search area is greater than the side length of the first target edge, and the width of the first compensation search area is equal to the sum of the side length of the first target edge and the first segment extension value.

[0111] The other compensation search areas are all search areas corresponding to the extension line of the first target side extended by a certain distance.

[0112] In the first compensation table Bias table 1 of the first compensation search area, the larger the distance value is, the larger the compensation value is. The compensation value in the first compensation table Bias table 1 is greater than 0 nm.

[0113] The compensation table of other compensation search areas is used to compensate the maximum compensation value in the first compensation table. The compensation value corresponding to each distance in the compensation table of other compensation search areas is less than or equal to 0 nm, and the larger the distance value, the larger the compensation value.

[0114] Since the greater the distance between two graphics, the greater the value that can be compensated for the graphics, therefore, at the same distance, the compensation value in the compensation table corresponding to the compensation search area closer to the first compensation search area is smaller.

[0115] In some embodiments, the greater the number of compensation search areas other than the first compensation search area, the more corresponding compensation tables are, and the smoother the changes between compensation values ​​in different compensation tables at the same distance.

[0116] Determine whether the target compensation search area is the first compensation search area. If the target compensation search area is other compensation search areas, it means that the preset mark point of the second target edge is not within the first compensation search area, that is, the target through-hole pattern and the adjacent pattern are completely intertwined, and determine that the maximum compensation value corresponding to the infinite distance in the first compensation table is the first compensation value.

[0117] Then, a second compensation value corresponding to the distance between the first target edge and the second target edge is determined from a second compensation table corresponding to the target compensation search area, where the second compensation value is a negative value.

[0118] The target compensation value is calculated according to the sum of the first compensation value and the second compensation value, so as to achieve the mitigation of the first compensation value and avoid a sudden change in compensation for the first target edge due to the intersection of the two graphics.

[0119] Furthermore, the further away from the first compensation search area, the shorter the lengths of the other compensation search areas.

[0120] In this embodiment, the further away from the first compensation search area, the shorter the lengths of the other compensation search areas are, so that the coverage of each compensation search area decreases in sequence.

[0121] In some embodiments, the method may further include: If the preset marking point is not within the multiple compensation search areas, the first compensation table is determined to be the target compensation table.

[0122] The process of determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side in S105 may include: The target compensation value is determined according to the maximum compensation value in the first compensation table.

[0123] In this embodiment, if the preset marking points of the second target edge are not within multiple compensation search areas, it is determined that the distance between the adjacent graphics and the target through-hole graphics is far enough, rather than the situation with projection becoming a critical situation without projection. At this time, using the maximum compensation value in the first compensation table as the target compensation value of the first target edge is not a sudden change in the compensation value, but a normal compensation value. Therefore, there is no need to use the compensation values ​​in the compensation tables of other compensation search areas to slow down the maximum compensation value in the first compensation table.

[0124] The optical proximity correction method provided in the above embodiment adjusts the maximum compensation value according to the compensation values ​​in other compensation tables when the compensation value suddenly changes due to the interlacing of the target through-hole pattern and other patterns, so as to alleviate the problem of sudden change in compensation value caused by the interlaced placement of patterns.

[0125] In a possible implementation, the above S105 determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side may include: According to the distance between the first target side and the second target side and the size of the target through-hole pattern, a target compensation value is determined from a compensation table of the target compensation search area. The compensation table includes a correspondence between pattern size, distance and compensation value.

[0126] In this embodiment, as shown in Tables 1 to 3, each compensation table includes a one-to-one correspondence between the graphic size, distance, and compensation value. The target compensation value uniquely corresponding to the size of the target through-hole graphic and the distance between the first target edge and the second target edge can be determined from the compensation table of the target compensation search area.

[0127] In one possible implementation, Figure 10 Schematic diagram of the process of the optical proximity correction method provided in the embodiment of the present application Figure 4 ,like Figure 10 As shown, before determining the target compensation value from the compensation table of the target compensation search area according to the distance between the first target edge and the second target edge in the above S103, the method may further include: S401. Design two test patterns with multiple pattern position relationships, where the multiple pattern position relationships indicate that the horizontal distance and / or vertical distance between the two test patterns are different.

[0128] In this embodiment, two test patterns are placed and designed so that the two test patterns can be placed in a variety of graphic position relationships. The various graphic position relationships include: placing the two test patterns with different horizontal distances and the same vertical distance, and placing the two test patterns with the same horizontal distance and different vertical distances.

[0129] The vertical distance is the distance between the bottom edges of the two test patterns in the vertical direction, and the horizontal distance is the distance between two adjacent side edges of the two test patterns in the horizontal direction.

[0130] For example, Figure 11 A schematic diagram of the relationship between the positions of various graphics of two test graphics provided in the embodiment of the present application, such as Figure 11 As shown, each row is two test patterns placed with different horizontal distances and the same vertical distance, and each column is two test patterns placed with the same horizontal distance and different vertical distances.

[0131] S402 , exposing and etching the mask corresponding to each test pattern to obtain a test photoresist pattern and a test developed pattern corresponding to each test pattern.

[0132] In this embodiment, the mask of each test pattern is exposed and developed to obtain a test photoresist pattern of each test pattern, and the test photoresist pattern of each test pattern is developed to obtain a developed test pattern of each test pattern.

[0133] S403 , calculating a compensation value according to the size of the test photoresist pattern corresponding to each test pattern and the size of the pattern after test development.

[0134] In this embodiment, the size of the test photoresist pattern corresponding to each test pattern under various pattern position relationships (ADI CD data) and the size of the test developed pattern corresponding to each test pattern under various pattern position relationships (AEI CD data) are collected.

[0135] It should be noted that although this solution is described using two test patterns with various pattern position relationships, it can also be viewed as a group of multiple test patterns, with each group of test patterns having a different horizontal distance and / or vertical distance.

[0136] According to the size of the test photoresist pattern corresponding to each test pattern and the size of the test pattern after development, the average value of the difference between the two sizes is calculated to obtain the compensation value corresponding to each test pattern.

[0137] S404 , grouping multiple compensation values ​​according to the vertical distance between two test patterns with various pattern position relationships to obtain a group of compensation values ​​for each edge position relationship.

[0138] In this embodiment, each test pattern has a unique vertical distance and horizontal distance with its corresponding test pattern. A correspondence is established between the vertical distance, horizontal distance, and compensation value of each test pattern. Multiple compensation values ​​are first grouped according to the vertical distance. Each group of compensation values ​​corresponds to a certain vertical distance range. The vertical distance range will serve as an extension line of the side of the test pattern to determine the width of the corresponding compensation search range.

[0139] In some embodiments, when multiple compensation values ​​are grouped according to vertical distance, the vertical distance range corresponding to one group of compensation values ​​needs to be greater than or equal to the length of the vertically extending side of the test pattern, and the vertical distance range is equal to the width of the first line segment or the first compensation search area.

[0140] S405 , grouping and calculating each set of compensation values ​​according to the horizontal distance between two test patterns with various pattern position relationships, to obtain a compensation table corresponding to each compensation search area.

[0141] In this embodiment, after the multiple compensation values ​​are grouped according to the vertical distance, the vertical distance of each group of compensation values ​​is no longer considered, and the horizontal distance of each compensation value in each group of compensation values ​​is divided to obtain multiple horizontal distance ranges. The compensation values ​​contained in each horizontal distance range are calculated to obtain a unique compensation value corresponding to each horizontal distance range. According to the compensation values ​​corresponding to the multiple horizontal distance ranges, a compensation table corresponding to the line segment or compensation search area of ​​the vertical distance range is generated.

[0142] The compensation values ​​included in each horizontal distance range may be calculated in the following manners: average value calculation, median value calculation, and mode value calculation (ie, the value that appears the most times).

[0143] In some embodiments, Figure 11 In the test pattern, each test pattern will only affect one side of another test pattern. In the actual design layout, there may be other patterns on each side of each pattern. Figure 11 In each test case, a large number of periodically arranged holes are used as test patterns.

[0144] For example, Figure 12 A schematic diagram of a test pattern provided in an embodiment of the present application, such as Figure 12 As shown, for Figure 11 For each combination of horizontal distance and vertical distance in the , multiple test patterns are arranged within a preset length range, wherein each test pattern at the center position has the same horizontal distance and vertical distance as the test patterns adjacent to it on all four sides, and the test patterns adjacent to it on all four sides are used to ensure that the environment of each test pattern at the center position is consistent in all directions.

[0145] Perform ADI and AEI on the periodically arranged test patterns, measure the size of each test pattern at the center after ADI and after AEI, and determine multiple compensation values ​​for the horizontal and vertical distances. The preset length range can be 5-10 nm.

[0146] The optical proximity correction method provided in the above embodiment designs two test patterns with multiple pattern position relationships, calculates compensation values ​​based on the test photoresist pattern and the test developed pattern of the test pattern, and generates a compensation table for multiple compensation search areas, so that the through-hole layer is smoothly compensated based on the compensation table for multiple compensation search areas.

[0147] Based on the optical proximity correction method provided by the above-mentioned scheme, gradient compensation of the through-hole layer is realized, ensuring the continuous gradient of the target graphics after development generated for the critical situation of the staggered graphics; smooth compensation can make the graphics distribution in different areas of the wafer more uniform, reduce the differences between different batches at different locations, and better meet the needs of designers and process integrators for post-development targets, so that the change trend between the post-development target and the design graphics is as close as possible, reducing the probability of tape-out failure caused by sudden changes in the post-development target, reducing the risk of mask remake, and avoiding the generation of mask remake costs as much as possible.

[0148] Based on the above method embodiment, the embodiment of the present application also provides an optical proximity correction device. Figure 13 A schematic diagram of the structure of the optical proximity correction device provided in an embodiment of the present application is shown in FIG. Figure 13 As shown, the device includes: a layout acquisition module 501 for acquiring a design layout, the design layout including multiple through-hole patterns; a pattern determination module 502 for taking any through-hole pattern in the design layout as a target through-hole pattern and determining the through-hole pattern closest to the target through-hole pattern as an adjacent pattern; a target edge determination module 503 for determining a first target edge of the target through-hole pattern and a second target edge of the adjacent pattern, the first target edge and the second target edge being the closest pattern edges between the target through-hole pattern and the adjacent pattern, respectively; a compensation table determination module 504 for determining a target compensation table from multiple compensation tables based on an edge position relationship between the first target edge and the second target edge; the compensation table including: a correspondence between different distances and different compensation values; in multiple compensation tables, the same distance corresponds to different compensation values; a compensation value determination module 505 for determining a target compensation value from the target compensation table based on the distance between the first target edge and the second target edge; and a compensation module 506 for moving the first target edge toward the second target edge by a distance of the target compensation value to obtain a target pattern after development of the target through-hole pattern.

[0149] Optionally, the compensation table determination module 504 is specifically used to use the first target edge and the preset extension line of the first target edge as the projection line segment, and project it onto the second target edge; determine whether the projection line segment and the second target edge have a projection overlap; if the projection line segment and the second target edge have a projection overlap, determine the corresponding target compensation table according to the projection overlap relationship between the projection line segment and the second target edge.

[0150] Optionally, the compensation table determination module 504 is specifically used to determine that if there is a projection overlap between the second line segment on the projection line segment and the second target edge, the second compensation table corresponding to the first compensation table and the second line segment is the corresponding target compensation table, and the second line segment is an extended line segment on the preset extension line away from the first target edge; the compensation value determination module 505 is specifically used to determine the first compensation value from the first compensation table; determine the second compensation value from the second compensation table according to the distance between the first target edge and the second target edge; and determine the target compensation value according to the first compensation value and the second compensation value.

[0151] Optionally, the compensation table determination module 504 is specifically used to determine the first compensation table as the target compensation table if the projected line segment and the second target edge have no projection overlap; the compensation value determination module 505 is specifically used to determine the target compensation value according to the maximum compensation value in the first compensation table.

[0152] Optionally, the compensation table determination module 504 is specifically used to obtain multiple compensation search areas from the first target edge to the second target edge in the design layout, and the multiple compensation search areas are distributed along the extension direction of the side length of the first target edge, and each compensation search area corresponds to a compensation table; determine the target compensation search area where the preset mark point on the second target edge is located from the multiple compensation search areas; and determine the compensation table corresponding to the target compensation search area as the target compensation table.

[0153] Optionally, the compensation table determination module 504 is specifically used to determine whether the target compensation search area is the first compensation search area, where the first compensation search area is the compensation search area from the first target edge and the first line segment on the preset extension line of the first target edge to the second target edge; if the target compensation search area is not the first compensation search area, determine that the first compensation table corresponding to the first compensation search area and the second compensation table corresponding to the target compensation search area are the target compensation tables.

[0154] Optionally, the compensation value determination module 505 is specifically configured to determine a target compensation value from a target compensation table according to the distance between the first target edge and the second target edge and the size of the target through-hole pattern. The compensation table includes a correspondence between pattern size, distance and compensation value.

[0155] The above-mentioned device is used to execute the method provided in the above-mentioned embodiment. Its implementation principle and technical effect are similar and will not be repeated here.

[0156] The above modules can be one or more integrated circuits configured to implement the above methods, such as one or more application-specific integrated circuits (ASICs), one or more microprocessors, or one or more field programmable gate arrays (FPGAs). For example, when a module is implemented by scheduling program code through a processing element, the processing element can be a general-purpose processor, such as a central processing unit (CPU) or other processor that can call program code. For another example, these modules can be integrated together and implemented in the form of a system-on-a-chip (SOC).

[0157] Figure 14 A schematic diagram of an electronic device provided in an embodiment of the present application, such as Figure 14 As shown, the electronic device 600 includes: a processor 601, a storage medium 602, and a bus. The storage medium 602 stores program instructions executable by the processor 601. When the electronic device 600 is running, the processor 601 and the storage medium 602 communicate via the bus, and the processor 601 executes the program instructions to perform the above method embodiment. The specific implementation methods and technical effects are similar and will not be repeated here.

[0158] Optionally, the present application further provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is run by a processor, the above method embodiment is executed.

[0159] In the several embodiments provided in this application, it should be understood that the disclosed devices and methods can be implemented in other ways. For example, the device embodiments described above are merely schematic. For example, the division of the units is merely a logical function division. In actual implementation, there may be other division methods, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or units, which can be electrical, mechanical or other forms.

[0160] The units described as separate components may or may not be physically separate, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed across multiple network units. Some or all of these units may be selected to achieve the purpose of this embodiment according to actual needs.

[0161] In addition, the functional units in the various embodiments of the present application may be integrated into a single processing unit, or each unit may exist physically separately, or two or more units may be integrated into a single unit. The aforementioned integrated units may be implemented in the form of hardware or in the form of hardware plus software functional units.

[0162] The above-mentioned integrated unit implemented in the form of a software functional unit can be stored in a computer-readable storage medium. The above-mentioned software functional unit is stored in a storage medium and includes a number of instructions for causing a computer device (which can be a personal computer, server, or network device, etc.) or a processor (English: processor) to perform some steps of the method described in each embodiment of the present application. The aforementioned storage medium includes: USB flash drives, mobile hard drives, read-only memory (English: Read-Only Memory, abbreviated: ROM), random access memory (English: Random Access Memory, abbreviated: RAM), magnetic disks or optical disks, and other media that can store program code.

[0163] The above are only specific embodiments of the present application, but the scope of protection of this application is not limited to them. Any changes or substitutions that can be easily conceived by any person skilled in the art within the technical scope disclosed in this application should be included in the scope of protection of this application. Therefore, the scope of protection of this application should be based on the scope of protection of the claims.

Claims

1. An optical proximity correction method, characterized in that: The method comprises: Acquire a design layout, wherein the design layout includes a plurality of through-hole patterns; Taking any through-hole pattern in the design layout as a target through-hole pattern, and determining a through-hole pattern closest to the target through-hole pattern as a neighboring pattern; Determine a first target edge of the target through-hole pattern and a second target edge of the adjacent pattern, wherein the first target edge and the second target edge are respectively the closest pattern edges between the target through-hole pattern and the adjacent pattern; Determining a target compensation table from a plurality of compensation tables based on a positional relationship between the first target side and the second target side; each compensation table including a correspondence between different distances and different compensation values; wherein the same distance in the plurality of compensation tables corresponds to different compensation values; determining a target compensation value from the target compensation table according to a distance between the first target edge and the second target edge; The first target side is moved toward the second target side by a distance of the target compensation value to obtain a developed target pattern of the target through-hole pattern.

2. The method according to claim 1, wherein The step of determining a target compensation table from a plurality of compensation tables according to the edge position relationship between the first target edge and the second target edge includes: Taking the first target edge and a preset extension line of the first target edge as projection line segments, and projecting toward the second target edge; Determining whether the projected line segment and the second target edge have a projection overlap; If the projected line segment and the second target edge have a projection overlap, a corresponding target compensation table is determined according to the projection overlap relationship between the projected line segment and the second target edge.

3. The method according to claim 2, characterized in that The determining of a corresponding target compensation table according to the projection overlap relationship between the projected line segment and the second target edge includes: If a second line segment on the projected line segment overlaps with the second target edge, determining that the first compensation table and the second compensation table corresponding to the second line segment are the corresponding target compensation table, and the second line segment is an extended line segment on the preset extension line away from the first target edge; Determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side includes: determining a first compensation value from the first compensation table; determining a second compensation value from the second compensation table according to the distance between the first target edge and the second target edge; A target compensation value is determined according to the first compensation value and the second compensation value.

4. The method according to claim 2, characterized in that The determining of a target compensation table from a plurality of compensation tables according to the edge position relationship between the first target edge and the second target edge further includes: If the projected line segment and the second target edge do not have a projection overlap, determining the first compensation table as the target compensation table; Determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side includes: The target compensation value is determined according to the maximum compensation value in the first compensation table.

5. The method according to claim 1, wherein The step of determining a target compensation table from a plurality of compensation tables according to the edge position relationship between the first target edge and the second target edge includes: Acquire multiple compensation search areas from the first target edge to the second target edge in the design layout, wherein the multiple compensation search areas are distributed along the direction of the extension of the length of the first target edge, and each compensation search area corresponds to one of the compensation tables; Determine a target compensation search area where a preset marking point on the second target edge is located from the multiple compensation search areas; A compensation table corresponding to the target compensation search area is determined as a target compensation table.

6. The method according to claim 5, wherein The determining the compensation table corresponding to the target compensation search area as the target compensation table includes: Determining whether the target compensation search area is a first compensation search area, where the first compensation search area is a compensation search area from the first target edge and a first line segment on a preset extension line of the first target edge to the second target edge; If the target compensation search area is not the first compensation search area, a first compensation table corresponding to the first compensation search area and a second compensation table corresponding to the target compensation search area are determined as target compensation tables.

7. The method according to claim 1, wherein Determining the target compensation value from the target compensation table according to the distance between the first target side and the second target side includes: The target compensation value is determined from the target compensation table according to the distance between the first target side and the second target side and the size of the target through-hole pattern. The compensation table includes a correspondence between pattern size, distance and compensation value.

8. An optical proximity correction device, characterized in that: The device comprises: A layout acquisition module is used to acquire a design layout, wherein the design layout includes a plurality of through-hole patterns; a pattern determination module, configured to take any through-hole pattern in the design layout as a target through-hole pattern, and determine a through-hole pattern closest to the target through-hole pattern as a neighboring pattern; a target edge determination module, configured to determine a first target edge of the target through-hole pattern and a second target edge of the adjacent pattern, wherein the first target edge and the second target edge are respectively the closest pattern edges between the target through-hole pattern and the adjacent pattern; a compensation table determination module, configured to determine a target compensation table from a plurality of compensation tables based on the edge position relationship between the first target edge and the second target edge; the compensation table including: a correspondence between different distances and different compensation values; in the plurality of compensation tables, the same distance corresponds to different compensation values; a compensation value determining module, configured to determine a target compensation value from the target compensation table according to the distance between the first target edge and the second target edge; The compensation module is configured to move the first target edge toward the second target edge by a distance of the target compensation value to obtain a developed target pattern of the target through-hole pattern.

9. An electronic device, characterized in that: include: A processor, a storage medium and a bus, wherein the storage medium stores program instructions executable by the processor. When the electronic device is running, the processor and the storage medium communicate via the bus, and the processor executes the program instructions to perform the steps of the optical proximity correction method according to any one of claims 1 to 7.

10. A computer-readable storage medium, characterized in that The storage medium stores a computer program, which, when executed by a processor, executes the steps of the optical proximity correction method according to any one of claims 1 to 7.

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