Upper surface layer spraying and cleaning mechanism for crystal silicon plate processing

Abstract

The invention discloses an upper surface layer spraying and cleaning mechanism for crystalline silicon plate processing, and relates to the technical field of crystalline silicon plate cleaning, the upper surface layer spraying and cleaning mechanism comprises a working frame, a conveying device and a cleaning assembly are arranged on the working frame, the cleaning assembly comprises fixing frames fixedly connected to the working frame, and adjusting holes are formed in the two fixing frames; adjusting blocks are slidably connected to the interiors of the two adjusting holes, a servo motor is fixedly connected to one adjusting block, an output shaft of the servo motor is fixedly connected with a rotating shell, two cleaning brushes are rotatably connected to the rotating shell, each cleaning brush comprises bristles and a rotating shaft, and two driving motors are fixedly connected to the rotating shell; output shafts of the two driving motors are fixedly connected with rotating shafts of the two cleaning brushes correspondingly. The two cleaning brushes are switched, and compared with an existing mode that a single cleaning brush washes the crystal silicon plate for a long time, the situation that the polluted cleaning brush continuously cleans the crystal silicon plate, and consequently the follow-up crystal silicon plate is subjected to secondary pollution can be avoided, and the cleaning effect is guaranteed.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of crystalline silicon plate cleaning, in particular to an upper surface layer spraying cleaning mechanism for crystalline silicon plate processing. BACKGROUND

[0002] As the core component of photovoltaic cells, the surface cleanliness of crystalline silicon plates directly affects light absorption efficiency and power generation performance. According to industry standards, even small contaminants (such as silicon powder, oil stains, and particulate matter) can significantly reduce the conversion efficiency of crystalline silicon plates. Therefore, surface cleaning is a critical process during the processing of crystalline silicon plates. In the existing crystalline silicon plate processing, a spraying and rolling brush integrated device is used. The device sprays cleaning agents through a spraying system and mechanically wipes the surface of the crystalline silicon plate with a rotating brush roll at the bottom to remove residual contaminants on the surface of the crystalline silicon plate.

[0003] However, the existing rolling brush structure continuously contacts contaminants during long-term operation, causing contaminants to accumulate at the root of the brush, which can lead to secondary transfer of contaminants and result in incomplete cleaning of subsequent crystalline silicon plates. In addition, the crystalline silicon plate is located below the rolling brush, and the position of the rolling brush is usually fixed. This fixed design lacks the ability to adapt to changes in the thickness of the crystalline silicon plate. When processing crystalline silicon plates of different thicknesses, the contact pressure and gap between the rolling brush and the crystalline silicon plate cannot be adjusted, which may result in insufficient cleaning pressure or excessive pressure on the crystalline silicon plate. SUMMARY

[0004] To solve the above technical problems, the present application provides an upper surface layer spraying cleaning mechanism for crystalline silicon plate processing.

[0005] The technical solution is as follows: An upper surface layer spraying cleaning mechanism for crystalline silicon plate processing, comprising a workbench, a conveying device is arranged on the workbench, and a cleaning assembly is also arranged on the workbench; The cleaning assembly comprises two fixed seats fixedly connected to the two sides of the workbench, two fixed frames are fixedly connected to the two fixed seats, two adjusting holes are formed in the two fixed frames, an adjusting block is slidably connected to the inside of each adjusting hole, a servo motor is fixedly connected to one of the adjusting blocks, a through hole is formed in the middle of each adjusting block, the output shaft of the servo motor passes through the through hole of the adjusting block and is fixedly connected to a rotating shell, two cleaning brushes are rotatably connected to the rotating shell, the cleaning brush comprises bristles and a rotating shaft, two drive motors are fixedly connected to the rotating shell, and the output shafts of the two drive motors are fixedly connected to the rotating shafts of the two cleaning brushes. The rotating shell is provided with a cleaning assembly, which comprises a drain groove arranged in the middle of the rotating shell, a baffle fixedly connected to the middle of the groove wall of the drain groove, the baffle dividing the drain groove into two parts not communicated with each other, a connecting pipe fixedly connected to the drain groove on the side of the rotating shell away from the servo motor, and a drain pipe rotatably connected to the end of the connecting pipe away from the rotating shell.

[0006] Further, the rotating shell comprises two semicircular hollow core columns connected with each other, one of the two semicircular hollow core columns is open upward, and the other is open downward, and the bristles of the cleaning brush are exposed from the lower opening of the rotating shell.

[0007] Further, the output shaft of the servo motor and the outer surface of the connecting pipe are both fixedly connected with a pushing disc, the top of the fixed frame is fixedly connected with two fixed sleeves at both ends, two lifting frames are slidingly connected to the two fixed sleeves, a lifting cover is fixedly connected between the two lifting frames, the lifting cover and one of the semicircular hollow core columns of the rotating shell can be combined into a complete hollow core column, and a water delivery pipe is fixedly connected to the top of the lifting cover.

[0008] Further, the inside of the lifting cover is fixedly connected with a plurality of scrapers arranged in a linear array.

[0009] Further, the drain groove is composed of a transverse through groove and a plurality of vertical through holes, the through groove is located at the connecting position of the two semicircular hollow core columns of the rotating shell, the through holes are communicated with the through groove, and the through holes are communicated with the two semicircular hollow core columns.

[0010] Further, two V-shaped grooves are arranged on each of the two pushing discs, the two V-shaped grooves are spaced apart by 180°, one side groove wall of the V-shaped groove is a vertical edge, and the other side groove wall is an inclined edge, the two lifting frames are both L-shaped, and the bottom of each of the two lifting frames is arranged in a circular arc shape.

[0011] Further, an adjusting assembly is fixedly connected to each of the two fixed frames, the adjusting assembly comprises two fixed blocks fixedly connected to the outer surface of the fixed frame, two fixed blocks are arranged on each end of the fixed frame, a rotating hole is arranged in each of the fixed blocks, a threaded rod is rotatably connected in the rotating holes of the two fixed blocks, a handle is rotatably connected to the top end of the threaded rod after the top end of the threaded rod passes through the rotating hole of the top fixed block, the handle is L-shaped, a limiting groove block is fixedly connected to the top of the fixed frame, one end of the handle away from the threaded rod can be clamped with the limiting groove block, an adjusting block passes through the adjusting hole, the two fixed blocks are located on one side of the adjusting block passing through the adjusting hole, a through hole is arranged in the end of the adjusting block passing through the adjusting hole, a nut is fixedly installed in the through hole, and the threaded rod is threadedly connected with the nut.

[0012] As described above, the beneficial effects of the upper surface layer spray cleaning mechanism for processing crystalline silicon plates in the application are as follows: The two cleaning brushes are switched, compared with the single cleaning brush of the prior art, the cleaning effect of the silicon wafer is guaranteed, and the silicon wafer is prevented from being polluted by the polluted cleaning brush. The two cleaning brushes are switched, compared with the single cleaning brush of the prior art, the cleaning effect of the silicon wafer is guaranteed, and the silicon wafer is prevented from being polluted by the polluted cleaning brush. The height of the cleaning brush is adjusted by the adjusting assembly, the cleaning pressure of the cleaning brush on the silicon wafer is adjusted, and the effectiveness of the cleaning brush on the silicon wafer is guaranteed. BRIEF DESCRIPTION OF DRAWINGS

[0013] Figure 1 It is a three-dimensional schematic view of the overall components of the application; Figure 2 It is a three-dimensional schematic view of the overall components of the application; Figure 3 It is a three-dimensional schematic view of the overall components of the application; Figure 4 It is a three-dimensional schematic view of the overall components of the application; Figure 5 It is a three-dimensional schematic view of the overall components of the application; Figure 4 It is an enlarged schematic view of the components at A in the application; Figure 6 It is a three-dimensional schematic view of the overall components of the application; Figure 7 It is a three-dimensional schematic view of the overall components of the application; Figure 8 It is a three-dimensional schematic view of the overall components of the application; Figure 9 It is a three-dimensional schematic view of the overall components of the application; Figure 10 It is a three-dimensional schematic view of the overall components of the application; Figure 11 It is a three-dimensional schematic view of the overall components of the application; Figure 7 It is an enlarged schematic view of the components at B in the application.

[0014] The reference numerals in the application are: 1, workbench; 2, conveying device; 3, silicon wafer; Cleaning assembly: 41, fixed seat; 42, fixed frame; 43, adjusting hole; 44, adjusting block; 45, servo motor; 46, rotating shell; 47, cleaning brush; 48, driving motor; Cleaning assembly: 51, drainage groove; 52, baffle; 53, connecting pipe; 54, drain pipe; 55, pushing disc; 56, fixed sleeve; 57, lifting frame; 58, lifting cover; 59, water delivery pipe; 510, scraper plate; Adjusting assembly: 61, fixed block; 62, threaded rod; 63, handle; 64, limiting groove block. DETAILED DESCRIPTION

[0015] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, and not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor fall within the scope of protection of the present application.

[0016] The embodiments provided by the present application will be described in detail below: As Figures 1 to 5 and Figures 7 to 9 shown, a top layer spraying cleaning mechanism for processing crystalline silicon plates comprises a workbench 1, the workbench 1 is provided with a conveying device 2 for conveying crystalline silicon plates 3, the conveying device 2 can be a common synchronous belt conveying line, and the workbench 1 is provided with two sets of cleaning assemblies for cleaning the crystalline silicon plates 3.

[0017] Each set of cleaning assemblies comprises two fixed seats 41 fixedly connected on both sides of the workbench 1 by bolts, two fixed frames 42 fixedly connected on the two fixed seats 41, adjusting holes 43 formed in the two fixed frames 42, adjusting blocks 44 slidably connected in the two adjusting holes 43, the adjusting blocks 44 capable of moving up and down in the adjusting holes 43. One of the adjusting blocks 44 is fixedly connected with a servo motor 45, through holes are formed in the middle portions of the two adjusting blocks 44, the output shaft of the servo motor 45 passes through the through hole in the adjusting block 44 close to the servo motor 45, a rotating shell 46 is fixedly connected to the output shaft of the servo motor 45, two cleaning brushes 47 are rotatably connected to the rotating shell 46, the two cleaning brushes 47 are each composed of bristles and a rotating shaft, two driving motors 48 are fixedly connected to the side of the rotating shell 46 close to the servo motor 45 by bolts, and the output shafts of the two driving motors 48 are fixedly connected to the rotating shafts of the two cleaning brushes 47 respectively.

[0018] It should be noted that, referring to Figure 1 , two sets of cleaning assemblies are provided with a spraying device (not shown) above, for spraying cleaning agent to the top layer of the crystalline silicon plates 3.

[0019] AsFigure 3 and Figure 8 As shown in FIG. 6, the rotating shell 46 comprises two connected semicircular hollow columns, the openings of the two semicircular hollow columns are opposite, one opening faces upward and the other opening faces downward, and the bristles of the cleaning brush 47 are exposed from the lower opening of the rotating shell 46.

[0020] Specifically, when the crystalline silicon plate 3 is cleaned, the rinsing device is started, the rinsing device sprays the cleaning agent downward, and the conveying device 2 is started at the same time as the driving motor 48, as shown in FIG. 5, the conveying device 2 moves from left to right, and the output shaft of the driving motor 48 drives the cleaning brush 47 to rotate, at this time, the crystalline silicon plate 3 moves from left to right following the conveying device 2, and the crystalline silicon plate 3 passing through the bottom of the cleaning brush 47 is washed by the rotating cleaning brush 47, and the upper surface of the crystalline silicon plate 3 can be cleaned by the cleaning brush 47 cooperating with the rinsing device. Figure 1

[0021] When one cleaning brush 47 is used for a period of time, contaminants will continue to accumulate at the root of the bristles of the cleaning brush 47, in order to avoid secondary pollution, the two cleaning brushes 47 are exchanged, so that the other clean cleaning brush 47 performs the cleaning work, specifically, as shown in FIG. 7, the servo motor 45 is started, the output shaft of the servo motor 45 drives the rotating shell 46 to rotate counterclockwise by one hundred and eighty degrees, the rotating shell 46 drives the cleaning brush 47 to rotate counterclockwise synchronously, and then the top cleaning brush 47 rotates to the bottom and the bottom cleaning brush 47 rotates to the top. By exchanging the positions of the two cleaning brushes 47, compared with the existing single cleaning brush 47 which cleans the crystalline silicon plate 3 for a long time, the subsequent cleaned crystalline silicon plate 3 can be prevented from being polluted again due to the long-time contact of the cleaning brush 47 with the contaminated crystalline silicon plate 3. The interval time for exchanging the two cleaning brushes 47 can be set according to the actual situation, and the interval time for exchanging is the starting interval time of the servo motor 45, and the output shaft of the servo motor 45 rotates 180° each time. Figure 6 As shown in FIG. 7, the servo motor 45 is started, the output shaft of the servo motor 45 drives the rotating shell 46 to rotate counterclockwise by one hundred and eighty degrees, the rotating shell 46 drives the cleaning brush 47 to rotate counterclockwise synchronously, and then the top cleaning brush 47 rotates to the bottom and the bottom cleaning brush 47 rotates to the top. By exchanging the positions of the two cleaning brushes 47, compared with the existing single cleaning brush 47 which cleans the crystalline silicon plate 3 for a long time, the subsequent cleaned crystalline silicon plate 3 can be prevented from being polluted again due to the long-time contact of the cleaning brush 47 with the contaminated crystalline silicon plate 3. The interval time for exchanging the two cleaning brushes 47 can be set according to the actual situation, and the interval time for exchanging is the starting interval time of the servo motor 45, and the output shaft of the servo motor 45 rotates 180° each time.

[0022] Figures 1 to 10 ​​As shown, the rotating shell 46 is provided with a cleaning assembly for cleaning the bristles of the two cleaning brushes 47, the cleaning assembly comprising a drainage groove 51 opened in the middle of the rotating shell 46, the drainage groove 51 being located at the connecting position of the two semicircular hollow core columns of the rotating shell 46, the drainage groove 51 being composed of a transverse through groove and a plurality of vertical through holes, the through holes being communicated with the through groove, and the through holes being communicated with the two semicircular hollow core columns. The middle of the groove wall of the drainage groove 51 is fixedly connected with a baffle 52, the side of the rotating shell 46 away from the servo motor 45 is fixedly connected with a connecting pipe 53, and the end of the connecting pipe 53 away from the rotating shell 46 is rotatably connected with a drainage pipe 54. The output shaft of the servo motor 45 and the outer surface of the connecting pipe 53 are both fixedly connected with a pushing disc 55, the top of the fixed frame 42 is fixedly connected with two fixed sleeves 56, two lifting frames 57 are slidably connected on the two fixed sleeves 56, and the two lifting frames 57 are fixedly connected with a lifting cover 58 through bolts. The top of the lifting cover 58 is fixedly connected with a water delivery pipe 59, and the inside of the lifting cover 58 is provided with a plurality of scrapers 510 arranged in a linear array.

[0023] It should be noted that the baffle 52 divides the drainage groove 51 into two parts, and the two parts are not communicated, the end of the baffle 52 close to the connecting pipe 53 extends to the inside of the connecting pipe 53, so as to avoid that the sewage is directly discharged downward into the semicircular hollow core column at the bottom of the rotating shell 46 during the sewage discharge process, and guide the sewage to flow into the connecting pipe 53. The connecting pipe 53 is communicated with the transverse through groove of the drainage groove 51, the end of the connecting pipe 53 away from the rotating shell 46 penetrates through the through hole of the adjacent adjusting block 44, and the drainage pipe 54 can be connected with a sewage collection tank, so as to collect the sewage for centralized treatment.

[0024] Two V-shaped grooves are opened on the two pushing discs 55, the two V-shaped grooves are spaced 180° apart, one side groove wall of the V-shaped groove is a vertical edge, and the other side groove wall is an inclined edge, so that when the lifting frame 57 enters the V-shaped groove of the pushing disc 55, the lifting frame 57 can quickly enter the groove from one side of the vertical edge, and the lifting frame 57 can slide out of the inclined edge of the V-shaped groove. The two lifting frames 57 are both L-shaped, and the bottom of the lifting frame 57 is arranged in a circular arc shape, so as to facilitate sliding in the V-shaped groove of the pushing disc 55. The shape of the lifting cover 58 is similar to that of the semicircular hollow core column of the rotating shell 46, that is, the lifting cover 58 and one semicircular hollow core column of the rotating shell 46 can be combined into a complete hollow core column. The water delivery pipe 59 is composed of a plurality of vertical pipes and a horizontal pipe communicated with all the vertical pipes, the vertical pipes of the water delivery pipe 59 are communicated with the inside of the lifting cover 58, and one end of the horizontal pipe of the water delivery pipe 59 is connected with a water delivery pump.

[0025] Specifically, in the process of rotating the above-mentioned rotating shell 46, the rotating shell 46 drives the connecting pipe 53 to rotate synchronously, referring to Figure 9 and Figure 10As shown, the rotation of the output shaft of the servo motor 45 and the connecting pipe 53 will drive the two pushing discs 55 to rotate synchronously counterclockwise. When the pushing discs 55 rotate counterclockwise, the bottom of the lifting frame 57 will slide along the inclined edge of the V-shaped groove on the top of the pushing disc 55 to the outer circumferential surface of the pushing disc 55, and the pushing disc 55 will push the lifting frame 57 to move upward in the fixed sleeve 56. The lifting frame 57 will drive the lifting cover 58 to move upward synchronously. Therefore, when the rotating shell 46 drives the cleaning brush 47 to be replaced, the lifting cover 58 will be separated from the half-circular hollow core column on the top of the rotating shell 46, that is, the lifting cover 58 will not block the replacement of the two cleaning brushes 47 driven by the rotating shell 46. After the rotating shell 46 rotates by 180 degrees, that is, after the cleaning brush 47 originally located at the bottom is moved to the top by the rotating shell 46, the pushing disc 55 also rotates by 180 degrees. The V-shaped groove on the top of the pushing disc 55 is aligned with the lifting frame 57. Under the action of gravity, the lifting frame 57 moves downward in the fixed sleeve 56 and is inserted into the V-shaped groove. The lifting cover 58 also moves downward and combines with the half-circular hollow core column of the rotating shell 46 to form a closed full-circular hollow core column. At this time, the cleaning brush 47 rotated to the top is located in the full-circular hollow core column, and the cleaning brush 47 is cleaned in the closed space. The water pump sprays water into the closed space formed by the lifting cover 58 and the half-circular hollow core column of the rotating shell 46 through the water delivery pipe 59. At this time, the driving motor 48 is not closed, and the output shaft of the driving motor 48 drives the cleaning brush 47 to rotate. The water sprayed during the rotation of the cleaning brush 47 cleans the cleaning brush 47 comprehensively by 360 degrees. In summary, through the switchable two cleaning brushes 47, one of them can clean the crystalline silicon plate 3, and the other cleaning brush 47 can clean itself. Compared with the existing cleaning method that needs to stop the machine to clean the cleaning brush 47, this method can realize the automatic cleaning of the cleaning brush 47 without stopping the machine, improve the cleaning efficiency, avoid the accumulation of dirt on the cleaning brush 47, ensure that the cleaning brush 47 can keep clean when cleaning the crystalline silicon plate 3, reduce the situation that the crystalline silicon plate 3 needs to be reworked due to incomplete cleaning caused by dirt on the cleaning brush 47, and thus improve the cleaning quality of the crystalline silicon plate 3.

[0026] It should be noted that the bristles on the cleaning brush 47 will contact the scraper 510 in the lifting cover 58 during the rotation of the cleaning brush 47. The scraper 510 can scrape off the dirt on the cleaning brush 47 and flush the dirt into the drain groove 51 under the action of water flow. The scraper 510 ensures that the cleaning brush 47 can be cleaned more effectively. The sewage in the inside of the drain groove 51 is guided by the baffle 52 to flow into the inside of the connecting pipe 53 and finally discharged to the sewage collection tank through the drain pipe 54.

[0027] As shown in FIG. 6, the cleaning brush 47 is in the form of a full-circular hollow core column, and the lifting cover 58 is in the form of a full-circular hollow core column. The two full-circular hollow core columns are combined to form a full-circular hollow core column. Figures 8 to 11As shown, the two fixed frames 42 are fixedly connected with adjusting assemblies for adjusting the cleaning pressure of the cleaning brush 47 on the crystalline silicon plate 3, the adjusting assembly comprises a fixed block 61 fixedly connected to the outer surface of the fixed frame 42, each fixed frame 42 is provided with two fixed blocks 61 at both ends, the fixed block 61 is provided with a rotating hole, and the rotating holes of the two fixed blocks 61 are jointly and rotatably connected with a threaded rod 62, the top end of the threaded rod 62 is rotatably connected with a handle 63 after penetrating out of the rotating hole of the top fixed block 61, the handle 63 is L-shaped, the top of the fixed frame 42 is fixedly connected with a limiting groove block 64, and the end of the handle 63 away from the threaded rod 62 can be clamped with the limiting groove block 64.

[0028] It should be noted that one end of the adjusting block 44 penetrates out of the adjusting hole 43, the two fixed blocks 61 are located on one side of the adjusting block 44 penetrating out of the adjusting hole 43, a through hole is formed in the end of the adjusting block 44 penetrating out of the adjusting hole 43, and a nut is fixedly installed in the through hole.

[0029] For crystalline silicon plates 3 of different thicknesses, the height of the cleaning brush 47 needs to be adjusted, so as to adjust the cleaning pressure of the cleaning brush 47 on the crystalline silicon plate 3. Specifically, the two handles 63 are turned over by one hundred and eighty degrees, so that the two handles 63 are not clamped with the limiting groove block 64, then the two handles 63 are held and rotated, so that the two handles 63 drive the two threaded rods 62 to rotate on the fixed blocks 61. At this time, the two threaded rods 62 will cooperate with the threaded holes on the two adjusting blocks 44, so that the two adjusting blocks 44 move up and down in the corresponding adjusting holes 43. The up-and-down movement of the two adjusting blocks 44 also drives the servo motor 45 and the connecting pipe 53 to move up and down synchronously, and then the connecting pipe 53 and the servo motor 45 drive the rotating shell 46 to move up and down at the same time, and the up-and-down movement of the rotating shell 46 drives the cleaning brush 47 to move up and down synchronously, so as to adjust the cleaning pressure of the cleaning brush 47 on the crystalline silicon plate 3, and ensure the effectiveness of the cleaning brush 47 on the crystalline silicon plate 3.

[0030] When the up-and-down position of the cleaning brush 47 is adjusted, the handle 63 is turned over again, so that the handle 63 is clamped with the limiting groove block 64 again. The clamping of the handle 63 and the limiting groove block 64 makes the threaded rod 62 unable to rotate again, and then the positions of the adjusting block 44, the servo motor 45, the connecting pipe 53, the rotating shell 46 and the cleaning brush 47 are locked, so as to fix the position of the cleaning brush 47 after the adjustment is completed. The handle 63 after turning over needs to correspond to the position of the limiting groove block 64 to be clamped, if the positions do not correspond, the handle 63 needs to be slightly rotated, so that the handle 63 can be clamped with the limiting groove block 64 after turning over. The pitch of the threaded rod 62 is small, and slightly rotating the threaded rod 62 will not greatly affect the height of the cleaning brush 47.

[0031] It should be noted that when the servo motor 45 and the connecting pipe 53 move downward, the two pushing plates 55 also move downward, and under the action of gravity, the lifting frame 57 moves downward on the fixed sleeve 56 to abut against the pushing plate 55, and the lifting cover 58 also moves downward synchronously, so that the lifting cover 58 can always contact the semicircular hollow core column at the top of the rotating shell 46.

[0032] The above only describes the preferred embodiments of the present application and is not used to limit the present application, and any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A top layer spraying and cleaning mechanism for processing a crystalline silicon plate, comprising a work frame (1), wherein a conveying device (2) is arranged on the work frame (1), characterized in that, The work frame (1) is further provided with a cleaning assembly; The cleaning assembly comprises two fixed seats (41) fixedly connected to the two sides of the work frame (1), two fixed frames (42) fixedly connected to the two fixed seats (41), two adjusting holes (43) formed in the two fixed frames (42), two adjusting blocks (44) slidably connected to the two adjusting holes (43), one of the two adjusting blocks (44) fixedly connected with a servo motor (45), a through hole formed in the middle of the other adjusting block (44), a rotating shell (46) fixedly connected to the output shaft of the servo motor (45) through the through hole of the adjusting block (44), two cleaning brushes (47) rotatably connected to the rotating shell (46), the cleaning brush (47) comprising bristles and a rotating shaft, two drive motors (48) fixedly connected to the rotating shell (46), and the output shafts of the two drive motors (48) fixedly connected with the rotating shafts of the two cleaning brushes (47). The rotating shell (46) is provided with a cleaning assembly, the cleaning assembly comprises a drainage groove (51) formed in the middle of the rotating shell (46), a baffle (52) fixedly connected to the middle of the groove wall of the drainage groove (51), the baffle (52) divides the drainage groove (51) into two parts that are not communicated with each other, a connecting pipe (53) fixedly connected to the side of the rotating shell (46) away from the servo motor (45) and communicated with the drainage groove (51), and a drain pipe (54) rotatably connected to the end of the connecting pipe (53) away from the rotating shell (46).

2. The upper surface layer spray cleaning mechanism for processing a crystalline silicon plate according to claim 1, characterized by The rotating shell (46) comprises two connected semicircular hollow columns, one of the two semicircular hollow columns has an upward opening and the other has a downward opening, and the bristles of the cleaning brush (47) are exposed from the downward opening of the rotating shell (46).

3. The upper surface layer spray cleaning mechanism for processing a crystalline silicon plate according to claim 2, characterized by The output shaft of the servo motor (45) and the outer surface of the connecting pipe (53) are fixedly connected with a pushing disc (55), the top of the fixed frame (42) is fixedly connected with a fixed sleeve (56), the two fixed sleeves (56) are slidably connected with a lifting frame (57), the two lifting frames (57) are fixedly connected with a lifting cover (58), the lifting cover (58) and one of the semicircular hollow columns of the rotating shell (46) can be combined into a complete hollow column, and the top of the lifting cover (58) is fixedly connected with a water delivery pipe (59).

4. The upper surface layer spray cleaning mechanism for processing a crystalline silicon plate according to claim 3, characterized by The inside of the lifting cover (58) is fixedly connected with a plurality of scrapers (510) arranged in a linear array.

5. The upper surface layer spray cleaning mechanism for processing a crystalline silicon plate according to claim 3, characterized by The drainage groove (51) is composed of a horizontal through groove and a plurality of vertical through holes, the through groove is located at the connection position of the two semicircular hollow columns of the rotating shell (46), the through holes are communicated with the through groove, and the through holes are communicated with the two semicircular hollow columns.

6. The upper surface layer spray cleaning mechanism for processing a crystalline silicon plate according to claim 3, characterized by Two V-shaped grooves are formed in each of the two pushing discs (55), the two V-shaped grooves are spaced 180° apart, one side groove wall of the V-shaped groove is a vertical edge and the other side groove wall is an inclined edge, the two lifting frames (57) are L-shaped, and the bottom of each of the two lifting frames (57) is arc-shaped.

7. The upper surface layer spray cleaning mechanism for processing a crystalline silicon plate according to Claim 1, characterized by Two fixed frames (42) are fixedly connected with adjusting assemblies, the adjusting assembly comprises two fixed blocks (61) fixedly connected to the outer surface of the fixed frame (42), two fixed blocks (61) are arranged at the two ends of each fixed frame (42), a rotating hole is formed in each fixed block (61), a threaded rod (62) is rotatably connected in the rotating holes of the two fixed blocks (61), a handle (63) is rotatably connected to the top end of the threaded rod (62) and extends out of the rotating hole of the top fixed block (61), the handle (63) is L-shaped, a limiting slot block (64) is fixedly connected to the top of the fixed frame (42), one end of the handle (63) away from the threaded rod (62) can be clamped with the limiting slot block (64), one end of the adjusting block (44) extends out of the adjusting hole (43), the two fixed blocks (61) are located on the side of the adjusting block (44) extending out of the adjusting hole (43), a through hole is formed in the end of the adjusting block (44) extending out of the adjusting hole (43), a nut is fixedly installed in the through hole, and the threaded rod (62) is in threaded connection with the nut.

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