UVW alignment platform control method and system

Abstract

The invention discloses a UVW alignment platform control method and system, and is applied to the field of precision control. The method is executed by a control device and comprises the steps that a platform is controlled to rotate multiple times to determine the position of a rotation center; controlling the platform to move to an alignment state; the pose of the platform in the alignment state and the positions of the two mark points in the alignment state are obtained; determining the pose of the template based on the positions of the two mark points in the alignment state and the position of the rotation center; acquiring the positions of the two mark points in a real-time state; based on the positions of the two mark points in the real-time state and the position of the rotation center, the pose of the platform in the real-time state is determined; determining the pose deviation of the platform based on the pose of the platform in the real-time state and the pose of the template; and controlling the platform to move to an alignment state according to the pose deviation. Therefore, the dependence on an upper computer is eliminated, so that the labor cost and the material cost are reduced, and the execution response speed of the platform is improved.

Description

Technical Field

[0001] This application relates to the field of precision control, and in particular to a UVW alignment platform control method and system. Background Technology

[0002] A UVW alignment platform is a multi-axis (usually three-axis orthogonal) precision motion system that achieves high-precision position alignment, attitude adjustment, or trajectory tracking of a target object through the coordinated motion of three linear axes: U, V, and W. Currently, most UVW alignment platform control solutions on the market rely on host computer software in conjunction with a vision CCD (Charge Coupled Device) for high-precision positioning. Platform positioning requires the host computer (such as an industrial PC) to perform image processing calculations, and then send the coordinates to a PLC (Programmable Logic Controller) or motion control card via a communication network. The PLC then executes the positioning.

[0003] However, the existing UVW alignment platform control scheme has the following drawbacks: it relies on the host computer control algorithm, requires supplier cooperation for debugging, and has high labor costs; the control equipment needs to be used with a host computer (such as an industrial computer), which increases material costs; and there is a delay in communication between the host computer and the PLC, which affects the execution response speed of the alignment platform. Summary of the Invention

[0004] The purpose of this invention is to provide a UVW alignment platform control scheme that does not rely on a host computer system.

[0005] Firstly, this application provides a UVW alignment platform control method. The method is executed by a control device and includes: controlling the alignment platform to rotate multiple times around a rotation center, and obtaining two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; determining the position of the rotation center based on the two sets of marker point positions; controlling the alignment platform to move to an alignment state, wherein the alignment state refers to the pose of the alignment platform being consistent with the pose of the template; acquiring the pose of the alignment platform in the alignment state; acquiring the positions of the two marker points in the alignment state through the vision system; determining the pose of the template based on the positions of the two marker points in the alignment state and the position of the rotation center; acquiring the positions of the two marker points in a real-time state through the vision system; determining the pose of the alignment platform in the real-time state based on the positions of the two marker points in the real-time state and the position of the rotation center; determining the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template; and controlling the alignment platform to move to the alignment state according to the pose deviation.

[0006] In some embodiments, the vision system includes a first camera and a second camera, wherein the first camera is used to acquire the position of marker point A among the two marker points, and the second camera is used to acquire the position of marker point B among the two marker points. Controlling the alignment platform to rotate multiple times around the rotation center includes controlling the alignment platform to rotate three times around the rotation center. Determining the position of the rotation center based on the set of positions of the two marker points includes: determining a first position (Xa, Ya) of the rotation center using a three-point circle method based on the three positions of marker point A acquired by the first camera; and determining a second position (Xb, Yb) of the rotation center using a three-point circle method based on the three positions of marker point B acquired by the second camera.

[0007] In some embodiments, the pose of the template is determined in the following manner: TeachX=((Xc-Xa)+(Xd-Xb)) / 2 TeachY=((Yc-Ya)+(Yd-Yb)) / 2 TeachR=arctan(((Yc-Ya)-(Yd-Yb)) / ((Xc-Xa)-(Xd-Xb))) Wherein, (Xc, Yc) represents the position of marker point A acquired by the first camera in the alignment state, (Xd, Yd) represents the position of marker point B acquired by the second camera in the alignment state, and (TeachX, TeachY, TeachR) represents the pose of the template.

[0008] The pose of the alignment platform in the real-time state is determined in the following manner: RealX = ((Xna - Xa) + (Xnb - Xb)) / 2 RealY = ((Yna - Ya) + (Ynb - Yb)) / 2 RealR=arctan(((Yna-Ya)-(Ynb-Yb)) / ((Xna-Xa)-(Xnb-Xb))) Wherein, (Xna, Yna) represents the position of marker point A acquired by the first camera in the real-time state, (Xnb, Ynb) represents the position of marker point B acquired by the second camera in the real-time state, and (RealX, RealY, RealR) represents the pose of the alignment platform in the real-time state.

[0009] In some embodiments, the pose deviation is determined in the following manner: ΔR = RealR - TeachR ΔX=RealX-((TeachX*cos(ΔR)-TeachY*sin(ΔR)) ΔY=RealY-((TeachX*sin(ΔR)+TeachY*cos(ΔR)) Where ΔR represents the angular deviation, ΔX represents the positional deviation in the X direction, and ΔY represents the positional deviation in the Y direction.

[0010] The corrected poses (ResultX, ResultY, ResultR) of the alignment platform satisfy the following: ResultX = Xo + ΔX ResultY = Yo + ΔY ResultR = Ro + ΔR Wherein, (Xo, Yo, Ro) represents the pose of the alignment platform in the alignment state.

[0011] In some embodiments, the relative push amounts of each axis required for the alignment platform to rotate about the rotation center by an angle δθ satisfy the following: ΔX1=Rcos(δθ+θX1)-Rcos(θX1) ΔX2=Rcos(δθ+θX2)-Rcos(θX2) ΔY=Rsin(δθ+θY)-Rsin(θY) Where ΔX1 represents the relative push amount of the V-axis, ΔX2 represents the relative push amount of the W-axis, ΔY represents the relative push amount of the U-axis, θX1 represents the angle parameter of the V-axis, θX2 represents the angle parameter of the W-axis, θY represents the angle parameter of the U-axis, and R represents the radius of the three-point circle formed by the rotation centers of each axis. In order to control the alignment platform to move to the alignment state according to the pose deviation, the target positions (X1, X2, Y) of each axis of the alignment platform satisfy: X1 = ΔX1 + x X² = -(ΔX² + x) Y=ΔY-y Where (x, y) are the coordinates of the alignment platform after center correction, and the relative push amounts ΔX1, ΔX2, ΔY are determined based on the angle deviation in the pose deviation.

[0012] Secondly, this application provides a UVW alignment platform control system. The system is implemented in a control device and includes a rotation parameter determination module, a reference pose determination module, a real-time pose determination module, a pose deviation determination module, and a control module.

[0013] The rotation parameter determination module is used to: control the alignment platform to rotate multiple times around the rotation center, and obtain two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; and determine the position of the rotation center based on the two sets of marker point positions.

[0014] The reference pose determination module is used to: control the alignment platform to move to the alignment state, wherein the alignment state refers to the pose of the alignment platform being consistent with the pose of the template; acquire the pose of the alignment platform in the alignment state; obtain the position of the two marker points in the alignment state through the vision system; and determine the pose of the template based on the position of the two marker points in the alignment state and the position of the rotation center.

[0015] The real-time pose determination module is used to: obtain the positions of the two marker points in real-time through the vision system; and determine the pose of the alignment platform in real-time based on the positions of the two marker points in real-time and the position of the rotation center.

[0016] The pose deviation determination module is used to determine the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template.

[0017] The control module is used to: control the alignment platform to move to the alignment state according to the pose deviation.

[0018] Thirdly, this application provides a computer-readable storage medium. The computer storage medium stores a computer program that, when executed on a control device, causes the control device to perform the UVW alignment platform control method as described in the first aspect.

[0019] Fourthly, this application provides a computer program product. When the computer program product is run on a control device, it causes the control device to perform the UVW alignment platform control method as described in the first aspect.

[0020] The technical solution provided in this application has the following advantages compared with the prior art: (1) All control algorithms are executed by the control equipment, eliminating the dependence on the host computer system, thereby reducing labor and material costs; (2) The control algorithm is executed by the control device, which also improves the execution response speed of the positioning platform. Attached Figure Description

[0021] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0022] Figure 1 A flowchart of the UVW alignment platform control method provided in the embodiments of this application.

[0023] Figure 2 This is a schematic diagram of the rotation of the alignment platform.

[0024] Figure 3 This is a schematic diagram comparing the pose of the alignment platform in its initial and real-time states.

[0025] Figure 4 This is a schematic diagram comparing the pose of the alignment platform in alignment state and real-time state.

[0026] Figure 5 A schematic diagram showing the angle to be set for the rotation of a point around a fixed point.

[0027] Figure 6 This is a schematic diagram of the alignment platform parameters.

[0028] Figure 7 A block diagram of the UVW alignment platform control system provided in an embodiment of this application.

[0029] Figure 8 This is a schematic diagram of the composition of the control device provided in the embodiments of this application. Detailed Implementation

[0030] To better understand the above-mentioned objectives, features, and advantages of this application, embodiments of this application will be further described below. It should be noted that, unless otherwise specified, the embodiments and features described herein can be combined with each other.

[0031] Numerous specific details are set forth in the following description to provide a thorough understanding of this application, but this application may also be implemented in other ways than those described herein. Clearly, the embodiments described in the specification are only a portion of, and not all, of the embodiments of this application.

[0032] Figure 1 A flowchart illustrating the UVW alignment platform control method provided in this application embodiment. Figure 1 As shown, process 100 includes the following steps.

[0033] Steps 112 and 114 are used to determine the position of the rotation center of the alignment platform.

[0034] Step 112 involves controlling the alignment platform to rotate multiple times around the rotation center, and obtaining two sets of marker point positions corresponding to the two marker points on the alignment platform through the vision system. Each set of marker point positions includes the position of the corresponding marker point after each rotation.

[0035] In some embodiments, the vision system includes two cameras (e.g., two CCD cameras), wherein each camera is used to acquire the position of one of the two marker points. For example, referencing Figure 2 The two marker points are symmetrically set on the diagonal of the alignment platform. One camera is responsible for capturing the positions A1, A2, and A3 of one of the marker points A, and the other camera is responsible for capturing the positions B1, B2, and B3 of the other marker point B.

[0036] Step 114: Determine the position of the rotation center based on the two sets of marked point positions.

[0037] In some embodiments, the alignment platform can be controlled to rotate three times around the rotation center. Correspondingly, the three positions of each marker point can be obtained through a vision system. That is, each set of marker points includes the three positions (e.g., coordinates) of the corresponding marker point. Furthermore, the position of the rotation center (i.e., the center of the circle) can be solved using the three-point circle method. Specifically, the three coordinates from each set of marker points are substituted into the standard equation of a circle to obtain three equations, thus establishing a system of equations. Solving the system of equations determines the coordinates of the circle center, i.e., the position of the rotation center corresponding to that set of marker points. In addition, the rotation radius, i.e., the radius of the circle, can also be solved using the three-point circle method.

[0038] In some embodiments, reference Figure 2 When a vision system includes two cameras (such as a CCD camera), the position of the rotation center and the rotation radius corresponding to that camera are obtained using the three-point circle method based on the coordinates of three points (A1, A2, A3 or B1, B2, B3) acquired by each camera. For example, based on the three positions of marker point A acquired by one of the cameras (denoted as the first camera), the first position (i.e., the center coordinates) and the first rotation radius are determined to be (Xa, Ya) and Ra, respectively. Based on the three positions of marker point B acquired by the other camera (called the second camera), the second position (i.e., the center coordinates) and the second rotation radius are determined to be (Xb, Yb) and Rb, respectively.

[0039] Steps 122 to 128 are used to determine the pose of the template. The template refers to the reference object to be aligned; alignment means moving the alignment platform until its pose matches that of the template.

[0040] Step 122: Control the alignment platform to move to the alignment state.

[0041] In this application, the alignment state refers to the alignment platform's pose being consistent with the template's pose. Step 122 can be implemented manually, for example, by the control device having a touchscreen, where the user inputs control commands through the control interface on the touchscreen to control the alignment platform to move to the alignment state.

[0042] Step 124: Obtain the pose of the alignment platform in the alignment state.

[0043] For ease of description, the pose of the alignment platform in the alignment state is denoted as (Xo, Yo, Ro). In this application, the pose is expressed through the XYR coordinate system (see reference...). Figure 6 The three-dimensional coordinate representation is shown below, where the X coordinate (e.g., Xo) represents the position in the X direction, the Y coordinate (e.g., Yo) represents the position in the Y direction, and the R coordinate (e.g., Ro) represents the rotation angle (i.e., attitude).

[0044] Step 126: Obtain the positions of the two marker points in the alignment state through the vision system.

[0045] Step 128: Determine the pose of the template based on the positions of the two marker points in the alignment state and the position of the rotation center. The pose of the template is the pose of the alignment platform in the alignment state.

[0046] In some embodiments, the pose of the template is determined in the following manner: TeachX=((Xc-Xa)+(Xd-Xb)) / 2 (1) TeachY=((Yc-Ya)+(Yd-Yb)) / 2 (2) TeachR=arctan(((Yc-Ya)-(Yd-Yb)) / ((Xc-Xa)-(Xd-Xb))) (3) Where (Xc, Yc) represents the position of marker point A acquired by the first camera in the alignment state, (Xd, Yd) represents the position of marker point B acquired by the second camera in the alignment state; (TeachX, TeachY, TeachR) represents the pose of the template, (TeachX, TeachY) are the coordinates of the template center, and TeachR represents the template pose.

[0047] Steps 132 and 134 are used to determine the pose of the alignment platform in the real-time state (also known as the current state).

[0048] Step 132: Obtain the positions of the two marker points in real time using a vision system.

[0049] Step 134: Determine the pose of the alignment platform in real-time based on the positions of the two marker points and the position of the rotation center.

[0050] refer to Figure 3 To distinguish them, the positions of the two marker points in the initial state are denoted as A and B, and the positions of the two marker points in the real-time state are denoted as A' and B'. (Reference) Figure 6 In the initial state, the origin of the XYR coordinate system is the rotation center of the alignment platform. The X1 and X2 axes (i.e., the V and W axes) of the alignment platform are parallel to the X direction of the XYR coordinate system, and the Y axis (i.e., the U axis) of the alignment platform is parallel to the Y direction of the XYR coordinate system. Figure 3 In the diagram, the cross mark indicates the center of the alignment platform (i.e., the rotation center), and the coordinates of the alignment platform center can be taken as the position of the alignment platform.

[0051] Referring to the foregoing embodiments, the pose of the alignment platform in real-time can be determined in the following manner: RealX=((Xna-Xa)+(Xnb-Xb)) / 2 (4) RealY=((Yna-Ya)+(Ynb-Yb)) / 2 (5) RealR = arctan(Δy / Δx) =arctan(((Yna-Ya)-(Ynb-Yb)) / ((Xna-Xa)-(Xnb-Xb))) (6) Where (Xna, Yna) represents the position of marker point A acquired by the first camera in real time, (Xnb, Ynb) represents the position of marker point B acquired by the second camera in real time, and (RealX, RealY, RealR) represents the pose of the alignment platform in real time.

[0052] Step 140: Determine the pose deviation of the alignment platform based on the pose of the alignment platform in real time and the pose of the template.

[0053] refer to Figure 4 To distinguish them, the positions of the two marker points in the alignment state are denoted as A and B, and the positions of the two marker points in the real-time state are denoted as A' and B'. Figure 4 As mentioned earlier, the cross mark indicates the center of the alignment platform (which is also the rotation center), and the coordinates of the center of the alignment platform can be taken as the position of the alignment platform.

[0054] refer to Figure 5 Given A(x0, y0) and B(x1, y1), where A is the center of a circle and B is a point on the circumference, and point B rotates about the center A by an angle α to reach point C. Then, C(x2, y2) satisfies: x2=(x1-x0)cosα-(y1-y0)sinα+x0 (7) y2=(x1-x0)sinα+(y1-y0)cosα+y0 (8) In some embodiments, by applying formulas (7) and (8), the pose deviation can be determined as follows: ΔR = RealR - TeachR (9) ΔX=RealX-((TeachX*cos(ΔR)-TeachY*sin(ΔR)) (10) ΔY=RealY-((TeachX*sin(ΔR)+TeachY*cos(ΔR)) (11) Where ΔR represents the angular deviation, ΔX represents the positional deviation in the X direction, and ΔY represents the positional deviation in the Y direction.

[0055] The pose (ResultX, ResultY, ResultR) after alignment platform correction satisfies: ResultX = Xo + ΔX (12) ResultY = Yo + ΔY (13) ResultR = Ro + ΔR (14) Where (Xo, Yo, Ro) represents the pose of the alignment platform in the alignment state.

[0056] Step 150: Control the alignment platform to move to the alignment state according to the pose deviation.

[0057] In some embodiments, reference Figure 6 The relative push amounts of each axis required for the alignment platform to rotate around the rotation center by an angle δθ satisfy: ΔX1=Rcos(δθ+θX1)-Rcos(θX1) (15) ΔX2=Rcos(δθ+θX2)-Rcos(θX2) (16) ΔY=Rsin(δθ+θY)-Rsin(θY) (17) Wherein, ΔX1 represents the relative push amount of the V-axis (also known as the X1-axis), ΔX2 represents the relative push amount of the W-axis (also known as the X2-axis), ΔY represents the relative push amount of the U-axis (also known as the Y-axis), θX1 represents the angle parameter of the V-axis (X1-axis), θX2 represents the angle parameter of the W-axis (X2-axis), θY represents the angle parameter of the U-axis (Y-axis), and R represents the radius of the three-point circle formed by the rotation centers of each axis. Figure 6 In the diagram, the V-axis (i.e., the X1 axis) is located in the upper right of the platform, the W-axis (X2 axis) is located in the lower left of the platform, and the U-axis (i.e., the V axis) is located in the upper left of the platform. The angle parameter of each entity axis (U / V / W) is the rotation angle of the line connecting its rotation center and the rotation center of the alignment platform in the XYR coordinate system.

[0058] In order to control the alignment platform to move to the alignment state according to the pose deviation, the target positions (X1, X2, Y) of each axis of the alignment platform must satisfy: X1 = ΔX1 + x (18) X2 = -(ΔX2 + x) (19) Y = ΔY - y (20) Where (x, y) are the coordinates of the alignment platform after center correction, and the relative push amounts ΔX1, ΔX2, ΔY are determined based on the angle deviation in the pose deviation. That is, in formulas (15) to (17), the rotation angle δθ is taken as the angle deviation ΔR in the XYR coordinate system.

[0059] Figure 7 This is a block diagram of the UVW alignment platform control system provided in an embodiment of this application. System 200 is implemented in a control device. Figure 7 As shown, the system 200 includes a rotation parameter determination module 210, a reference pose determination module 220, a real-time pose determination module 230, a pose deviation determination module 240, and a control module 250.

[0060] The rotation parameter determination module 210 is used to: control the alignment platform to rotate multiple times around the rotation center, and obtain two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; and determine the position of the rotation center based on the two sets of marker point positions.

[0061] The reference pose determination module 220 is used to: control the alignment platform to move to the alignment state, wherein the alignment state refers to the pose of the alignment platform being consistent with the pose of the template; acquire the pose of the alignment platform in the alignment state; obtain the position of the two marker points in the alignment state through the vision system; and determine the pose of the template based on the position of the two marker points in the alignment state and the position of the rotation center.

[0062] The real-time pose determination module 230 is used to: obtain the positions of the two marker points in real-time through the vision system; and determine the pose of the alignment platform in real-time based on the positions of the two marker points in real-time and the position of the rotation center.

[0063] The pose deviation determination module 240 is used to: determine the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template.

[0064] The control module 250 is used to: control the alignment platform to move to the alignment state according to the pose deviation.

[0065] For more details about System 200 and its modules, please refer to [link / reference]. Figure 1 And its related descriptions.

[0066] Figure 8 This is a schematic diagram illustrating the composition of the control device provided in an embodiment of this application. Figure 8 As shown, the control device 800 includes a processor 810 and a memory 820. The memory 810 stores a computer program. When the processor 820 executes the computer program, it implements the UVW alignment platform control method provided in the embodiments of this application. In some embodiments, the control device 800 is a PLC.

[0067] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to the process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0068] The above descriptions are merely embodiments of this application, which enable those skilled in the art to understand and implement this application. Various modifications to the embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments described herein, but is to be accorded the widest scope consistent with the principles and features disclosed herein.

Claims

1. A UVW alignment platform control method, characterized in that, The method is executed by a control device and includes: The alignment platform is controlled to rotate around the rotation center multiple times, and a vision system is used to obtain two sets of marker point positions corresponding to two marker points on the alignment platform, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; the position of the rotation center is determined based on the two sets of marker point positions. The alignment platform is controlled to move to the alignment state, which means that the pose of the alignment platform is consistent with the pose of the template; the pose of the alignment platform in the alignment state is obtained; the positions of the two marker points in the alignment state are obtained through the vision system; the pose of the template is determined based on the positions of the two marker points in the alignment state and the position of the rotation center. The positions of the two marker points in real time are obtained through the vision system; based on the positions of the two marker points in real time and the position of the rotation center, the pose of the alignment platform in real time is determined. Based on the pose of the alignment platform in the real-time state and the pose of the template, the pose deviation of the alignment platform is determined. The alignment platform is controlled to move to the alignment state based on the pose deviation.

2. The method according to claim 1, characterized in that, The vision system includes a first camera and a second camera, wherein the first camera is used to acquire the position of marker point A among the two marker points, and the second camera is used to acquire the position of marker point B among the two marker points; The control of the alignment platform to rotate multiple times around the rotation center includes: Control the alignment platform to rotate three times around the rotation center; Determining the position of the rotation center based on the two sets of marker positions includes: Based on the three positions of marker point A acquired by the first camera, the first position (Xa, Ya) of the rotation center is determined by the three-point circle method; Based on the three positions of marker point B acquired by the second camera, the second position (Xb, Yb) of the rotation center is determined by the three-point circle method.

3. The method according to claim 2, characterized in that, The pose of the template is determined in the following manner: TeachX=((Xc-Xa)+(Xd-Xb)) / 2 TeachY=((Yc-Ya)+(Yd-Yb)) / 2 TeachR=arctan(((Yc-Ya)-(Yd-Yb)) / ((Xc-Xa)-(Xd-Xb))) Wherein, (Xc, Yc) represents the position of marker point A acquired by the first camera in the alignment state, (Xd, Yd) represents the position of marker point B acquired by the second camera in the alignment state, and (TeachX, TeachY, TeachR) represents the pose of the template; The pose of the alignment platform in the real-time state is determined in the following manner: RealX = ((Xna - Xa) + (Xnb - Xb)) / 2 RealY = ((Yna - Ya) + (Ynb - Yb)) / 2 RealR=arctan(((Yna-Ya)-(Ynb-Yb)) / ((Xna-Xa)-(Xnb-Xb))) Wherein, (Xna, Yna) represents the position of marker point A acquired by the first camera in the real-time state, (Xnb, Ynb) represents the position of marker point B acquired by the second camera in the real-time state, and (RealX, RealY, RealR) represents the pose of the alignment platform in the real-time state.

4. The method according to claim 3, characterized in that, The pose deviation is determined in the following manner: ΔR = RealR - TeachR ΔX=RealX-((TeachX*cos(ΔR)-TeachY*sin(ΔR)) ΔY=RealY-((TeachX*sin(ΔR)+TeachY*cos(ΔR)) Where ΔR represents the angular deviation, ΔX represents the positional deviation in the X direction, and ΔY represents the positional deviation in the Y direction; The corrected poses (ResultX, ResultY, ResultR) of the alignment platform satisfy the following: ResultX = Xo + ΔX ResultY = Yo + ΔY ResultR = Ro + ΔR Wherein, (Xo, Yo, Ro) represents the pose of the alignment platform in the alignment state.

5. The method according to claim 1, characterized in that, The relative push amounts of each axis required for the alignment platform to rotate around the rotation center by an angle δθ satisfy the following: ΔX1=Rcos(δθ+θX1)-Rcos(θX1) ΔX2=Rcos(δθ+θX2)-Rcos(θX2) ΔY=Rsin(δθ+θY)-Rsin(θY) Where ΔX1 represents the relative push amount of the V-axis, ΔX2 represents the relative push amount of the W-axis, ΔY represents the relative push amount of the U-axis, θX1 represents the angle parameter of the V-axis, θX2 represents the angle parameter of the W-axis, θY represents the angle parameter of the U-axis, and R represents the radius of the three-point circle formed by the rotation centers of each axis. In order to control the alignment platform to move to the alignment state according to the pose deviation, the target positions (X1, X2, Y) of each axis of the alignment platform satisfy: X1 = ΔX1 + x X² = -(ΔX² + x) Y=ΔY-y Where (x, y) are the coordinates of the alignment platform after center correction, and the relative push amounts ΔX1, ΔX2, ΔY are determined based on the angle deviation in the pose deviation.

6. A UVW alignment platform control system, characterized in that, The system is implemented in a control device, which includes a rotation parameter determination module, a reference pose determination module, a real-time pose determination module, a pose deviation determination module, and a control module. The rotation parameter determination module is used to: control the alignment platform to rotate multiple times around the rotation center, and obtain two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; and determine the position of the rotation center based on the two sets of marker point positions. The reference pose determination module is used to: control the alignment platform to move to the alignment state, wherein the alignment state refers to the pose of the alignment platform being consistent with the pose of the template; acquire the pose of the alignment platform in the alignment state; obtain the position of the two marker points in the alignment state through the vision system; and determine the pose of the template based on the position of the two marker points in the alignment state and the position of the rotation center. The real-time pose determination module is used to: obtain the positions of the two marker points in real-time through the vision system; and determine the pose of the alignment platform in real-time based on the positions of the two marker points in real-time and the position of the rotation center. The pose deviation determination module is used to: determine the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template; The control module is used to: control the alignment platform to move to the alignment state according to the pose deviation.

7. A control device, characterized in that, It includes a processor and a memory, wherein the memory stores a computer program, and when the processor executes the computer program, it implements the UVW alignment platform control method as described in any one of claims 1 to 5.

8. The control device according to claim 7, characterized in that, The control device is a PLC.

9. A computer-readable storage medium, characterized in that, The computer storage medium stores a computer program, which, when run on the control device, causes the control device to execute the UVW alignment platform control method as described in any one of claims 1 to 5.

10. A computer program product, characterized in that, When the computer program product is run on the control device, the control device performs the UVW alignment platform control method as described in any one of claims 1 to 5.

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