Gluing system, photoresist pump and control method of photoresist pump

Abstract

The invention discloses a gluing system, a photoresist pump and a control method thereof, the gluing system comprises a buffer device, a gluing device, a filter, an on-off valve assembly, a configuration flow channel and an exhaust flow channel, the configuration flow channel is provided with a glue inlet and a glue outlet, the exhaust flow channel is provided with an exhaust port, a buffer storage cavity is communicated with the glue inlet, a gluing cavity is communicated with the glue outlet, and the buffer storage cavity is communicated with the glue outlet. According to the gluing system, the photoresist pump and the control method of the photoresist pump, the filter is arranged between the gluing cavity and the photoresist outlet provided with the flow channel, and when the filter generates negative pressure in the gluing cavity to achieve input of photoresist in the gluing cavity, the filter is arranged between the gluing cavity and the photoresist outlet provided with the flow channel. The photoresist input into the gluing cavity through the configured flow channel is not hindered by the filter, so that bubbles are prevented from being separated out after the medium-viscosity photoresist flows through the filter, and the influence of the bubbles on the subsequent gluing process is reduced.

Description

Technical Field

[0001] This application relates to the field of semiconductor fabrication technology, and in particular to a coating system, a photoresist pump, and a control method thereof. Background Technology

[0002] Photolithography is a core step in chip manufacturing. In actual production, photolithography machines are usually directly connected to coating and developing equipment. The photoresist pump, as the core component of the coating and developing machine, is mainly used to provide photoresist to the wafer surface and works in conjunction with the controller to precisely control parameters such as coating amount, coating speed, coating accuracy, and backfill speed.

[0003] In the photoresist coating process, the precision of the photoresist pump directly affects the thickness of the photoresist film on the wafer surface. Simultaneously, the high cleanliness of the photoresist pump prevents contamination of the wafer surface by particles and air bubbles. Currently, the filter of the photoresist pump is typically placed at the front end of the coating chamber. When medium-viscosity photoresist is backfilled, the resist solution is obstructed by the filter membrane, making it difficult to pass through. This causes air bubbles to precipitate and remain in the pipeline. When these air bubbles are coated onto the wafer surface with the resist solution, they cause uneven film thickness and pattern distortion, affecting the coating precision. Summary of the Invention

[0004] The technical problem to be solved by this application is to provide a coating system, a photoresist pump and a control method thereof, so as to avoid the generation of air bubbles in the photoresist during the retraction process and improve the coating accuracy.

[0005] To achieve the above objectives, this application provides the following technical solution.

[0006] This application provides an adhesive application system, including a buffer device, an adhesive dispensing device, a filter, an on / off valve assembly, a configuration flow channel, and an exhaust flow channel; The configured flow channel has an inlet and an outlet, the exhaust flow channel has an exhaust outlet, the buffer device includes a buffer chamber, and the glue dispensing device includes a glue dispensing chamber and a driving device. The buffer chamber, the glue-applying chamber, and the filter are all connected to the configured flow channel and can all exhaust through the exhaust port of the exhaust flow channel. The driving device can adjust the pressure in the glue-applying chamber to realize the photoresist delivery of the configured flow channel and the gas delivery of the exhaust flow channel. The on / off valve assembly is used to open or close the configured flow channel and the exhaust flow channel. The buffer chamber is connected to the glue inlet, the glue dispensing chamber is connected to the glue outlet, and the filter is disposed between the glue dispensing chamber and the glue outlet.

[0007] In some embodiments, a bubble sensor is also included for monitoring the bubble content in the buffer chamber, and / or a pressure sensor for monitoring the pressure in the glue dispensing chamber.

[0008] In some embodiments, the configured flow channel includes a glue-feeding channel, a glue-discharge channel, a glue-transition channel, and a glue-return channel that can be opened and closed respectively by an on / off valve assembly; One end of the glue feeding channel is configured as the glue inlet, and the other end is connected to the buffer chamber. One end of the glue discharging channel is configured as the glue outlet, and the other end is connected to the glue discharging chamber. The glue transition channel is connected to the buffer chamber and the glue discharging chamber respectively, and is used for photoresist transport between the buffer chamber and the glue discharging chamber. One end of the glue return channel is connected to the glue feeding channel, and the other end is connected to the glue discharging channel. The filter is installed on the glue dispensing channel, and the photoresist flowing through the filter can be output to the glue inlet through the glue return channel.

[0009] In some embodiments, the exhaust flow path includes a first exhaust passage, a second exhaust passage, and a third exhaust passage that can be opened and closed respectively by an on / off valve assembly; One end of the first exhaust channel is configured as the exhaust port, and the other end is connected to the buffer chamber. The third exhaust channel is connected to the filter and the first exhaust channel respectively. The second exhaust channel is connected to the buffer chamber and the glue-applying chamber respectively, and is used for gas transportation between the buffer chamber and the glue-applying chamber.

[0010] In some embodiments, the on / off valve assembly includes a first control valve, a second control valve, a third control valve, a fourth control valve, a fifth control valve, a sixth control valve, and a seventh control valve, respectively used to control the opening and closing of the glue feeding channel, the glue return channel, the first exhaust channel, the third exhaust channel, the second exhaust channel, the glue transition channel, and the glue discharge channel; The glue return channel is connected to the inlet end of the first control valve, the third exhaust channel is connected to the outlet end of the third control valve, and the seventh control valve is located between the glue application chamber and the filter.

[0011] This application provides a photoresist pump that employs any of the above-described coating systems, including a power component, a photoresist pump assembly fixedly connected to the power component, and a filter fixedly connected to the photoresist pump assembly; The power assembly includes a mounting frame and a drive device fixedly connected to the mounting frame. The glue pump assembly includes a pump body and an on / off valve assembly disposed on the pump body. The pump body is provided with a buffer chamber, a glue dispensing chamber, and a flow channel and an exhaust flow channel.

[0012] In some embodiments, the on / off valve assembly includes a valve plate fixedly mounted on the pump body, and a pneumatic diaphragm sandwiched between the valve plate and the pump body. The valve plate is provided with at least one valve groove and a working gas passage communicating with the valve groove. The pump body is provided with an opening and closing pipeline corresponding to the position of the valve groove and communicating with the configured flow channel. The valve groove, the working gas passage, and the opening and closing pipeline constitute a first control valve, a second control valve, a third control valve, a fourth control valve, a fifth control valve, a sixth control valve, and a seventh control valve. The on / off valve assembly also includes an opening / closing control component for outputting vacuum air or compressed air to the working gas channel. When vacuum air is output into the working gas channel, the pneumatic diaphragm is located in the valve groove to open the opening / closing pipeline at the corresponding position. When compressed air is output into the working gas channel, the pneumatic diaphragm is in contact with the pump body to close the opening / closing pipeline.

[0013] In some embodiments, the drive device includes a stepper motor, a folding diaphragm, and a plunger core; The folding diaphragm is connected to the pump body, and part of the folding diaphragm can extend into the glue-applying chamber. One end of the plunger core is fixedly connected to the inner end face of the folding diaphragm, and the other end is fixedly connected to the telescopic end of the stepper motor. When the plunger core extends, it can drive the folding diaphragm to extend into the glue-applying cavity; when it retracts, it can drive the folding diaphragm to fold inward and outward and retract.

[0014] In some embodiments, a bubble sensor is also included for monitoring the bubble content in the buffer cavity, and / or a pressure sensor is included for monitoring the pressure in the glue dispensing cavity; The pressure sensor is fixedly mounted on the pump body and located at the opening of the glue dispensing chamber. This application provides a control method for the adhesive application system described in any of the above claims, comprising: The photoresist is sequentially introduced into the coating chamber through the injection port and buffer chamber via the configured flow channels; Open the exhaust channel and expel air bubbles from the buffer chamber and the glue application chamber through the exhaust port; The photoresist in the coating chamber is passed through a flow filter via a configured flow channel and discharged through the outlet.

[0015] This application has at least the following beneficial effects: 1. The filter is placed between the dispensing chamber and the dispensing outlet of the flow channel. When the filter generates negative pressure in the dispensing chamber to enable the input of photoresist into the dispensing chamber, the photoresist input into the dispensing chamber through the flow channel is not obstructed by the filter, thereby avoiding the precipitation of bubbles in medium viscosity photoresist after passing through the flow filter, and thus reducing the impact of bubbles on subsequent coating processes. 2. The configuration flow channel and exhaust flow channel are set inside the pump body, which greatly improves the stability of the device and extends its service life. The opening and closing of the configuration flow channel and exhaust flow channel are controlled by the on-off valve assembly, thereby performing the backfilling and distribution of photoresist. The device has a high degree of integration and is easy to deploy in different application scenarios. 3. The pressure sensor is located at the opening of the glue dispensing chamber, which enables more accurate pressure detection and thus improves the glue dispensing precision. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of the photoresist pump according to an embodiment of this application; Figure 2 This is an exploded view of the structure of the "resin pump assembly" in the photoresist pump of this application embodiment; Figure 3 This is an exploded view of the structure of the "resin pump assembly" in the photoresist pump of this application embodiment; Figure 4 This is a schematic diagram of the "driving device" in the photoresist pump of this application embodiment; Figure 5 This is a schematic diagram of the internal structure of the "power component" in the photoresist pump according to an embodiment of this application; Figure 6 This is a schematic diagram showing the interaction between the "electromagnetic valve assembly" and the "first valve plate" in the photoresist pump of this application embodiment; Figure 7 This is a schematic diagram of the "mounting bracket" portion in the photoresist pump of this application embodiment; Figure 8 This is a schematic diagram of the structure of the "first valve plate" in the photoresist pump of this application embodiment; Figure 9 This is a schematic diagram showing the cooperation between the "pump body" and the "second valve plate" in the photoresist pump of this application embodiment; Figure 10 This is a schematic diagram of the layout of the adhesive application system according to an embodiment of this application.

[0017] Figure Labels Power assembly - 100, mounting frame - 110, motor cover - 120, mounting base - 130, motor drive module - 140, solenoid valve assembly - 150, throttling connector - 160, cable connector - 170, network port - 180, control air connector - 190, glue pump assembly - 200, pump body - 210, fluid input channel - 211, fluid output channel - 212, buffer chamber - 220, glue dispensing chamber - 230, glue dispensing sealing ring - 231, protective cover - 232, Pressure Sensor - 233, Limit Ring - 234, Limit Plate - 235, Pump Cover - 240, Mounting Hole - 241, Connector Module - 250, Conveying Connector - 251, Locking Ring - 252, Connector Nut - 253, Sealing Cover - 260, Bubble Sensor - 271, Mounting Groove - 272, First Cover Plate - 273, Second Cover Plate - 274, First Valve Plate - 281, Second Valve Plate - 282, Pneumatic Diaphragm - 283, Opening / Closing Sealing Ring - 2 84. Control sealing ring - 285. Valve groove - 286. Control air transmission channel - 287. Control air input channel - 288. Control air action channel - 289. Filter connector - 290. Filter - 300. Mounting bracket - 310. Drive device - 400. Stepper motor - 410. Fixing block - 420. First clamping block - 431. Second clamping block - 432. Clamping block - 440. Connecting piece - 450. Expansion pin - 460. Plunger core - 47 0. Folding film - 480, First control valve - 510, Second control valve - 520, Third control valve - 530, Fourth control valve - 540, Fifth control valve - 550, Sixth control valve - 560, Seventh control valve - 570, Glue feeding channel - 610, First exhaust channel - 620, Second exhaust channel - 621, Third exhaust channel - 622, Glue discharge channel - 630, Glue transition channel - 640, Glue return channel - 650. Detailed Implementation

[0018] The technical solutions of the embodiments of this application will be clearly described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application are within the scope of protection of this application.

[0019] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0020] The coating system, photoresist pump, and control method provided in this application will be described in detail below with reference to the accompanying drawings and through specific embodiments and application scenarios.

[0021] In semiconductor lithography, the "backfilling" of the photoresist pump refers to the operation of using negative pressure to draw a small amount of photoresist back into the dispensing chamber after the quantitative spraying of photoresist is completed. The core purpose of this process is to eliminate air bubbles in the fluid system and maintain stable colloid pressure.

[0022] In existing photoresist pumps, the filter membrane is placed before the coating chamber. During the backfilling process, medium-viscosity photoresist has difficulty passing through the filter membrane, which easily leads to the precipitation of air bubbles and affects the coating accuracy.

[0023] Example 1 like Figure 10 As shown in the figure, this application provides an adhesive application system, including a buffer device, an adhesive applicator, a filter 300, an on / off valve assembly, a configuration flow channel, and an exhaust flow channel.

[0024] The configuration flow channel has an inlet and an outlet for photoresist, the exhaust flow channel has an exhaust port, the buffer device includes a buffer chamber 220, the dispensing device includes a dispensing chamber 230 and a drive device 400. The buffer chamber 220, the dispensing chamber 230 and the filter 300 are all connected to the configuration flow channel and can all exhaust through the exhaust port of the exhaust flow channel. The drive device 400 can adjust the pressure in the dispensing chamber 230 to realize the photoresist delivery in the configuration flow channel and the gas delivery in the exhaust flow channel. The on / off valve assembly is used to open or close the configuration flow channel and the exhaust flow channel.

[0025] The buffer chamber 220 is connected to the glue inlet of the flow channel, the glue dispensing chamber 230 is connected to the glue outlet of the flow channel, and the filter 300 is disposed between the glue dispensing chamber 230 and the glue outlet of the flow channel.

[0026] Understandably, photoresist can enter the buffer chamber 220 through the inlet of the flow channel. When the drive device 400 performs photoresist delivery through the flow channel, the photoresist in the buffer chamber 220 can enter the coating chamber 230. The photoresist in the coating chamber 230 can be filtered by the filter 300 and discharged from the outlet of the flow channel, thereby completing the coating action.

[0027] In this embodiment, the above-mentioned coating system is used, with the filter 300 placed between the coating chamber 230 and the outlet of the configured flow channel. When the filter 300 generates negative pressure in the coating chamber 230 to achieve the input of photoresist into the coating chamber 230, the photoresist input into the coating chamber 230 through the configured flow channel is not obstructed by the filter 300, thereby avoiding the precipitation of bubbles in medium viscosity photoresist after passing through the flow filter 300, and thus reducing the impact of bubbles on subsequent coating processes.

[0028] In one implementation, such as Figure 10 As shown, it also includes a bubble sensor 271 for monitoring the bubble content in the buffer chamber 220, and / or a pressure sensor 233 for monitoring the pressure in the glue dispensing chamber 230.

[0029] Understandably, the bubble sensor 271 can obtain the bubble content parameter in the buffer chamber 220. After the control unit of the on / off valve assembly obtains the bubble content parameter, it will compare the bubble content parameter with a predetermined threshold. When the obtained bubble content parameter exceeds the predetermined threshold, the on / off valve assembly will control the opening and closing of the exhaust channel, that is, by opening the exhaust channel to exhaust the buffer chamber 220. At the same time, the pressure sensor 233 can obtain the pressure parameter in the glue application chamber 230. After obtaining the pressure parameter in the glue application chamber 230, the control unit of the drive device 400 can control the drive device 400 to regulate the pressure of the glue application chamber 230, thereby achieving precise control of the pressure in the glue application chamber 230, and thus achieving the glue application accuracy of the glue application system.

[0030] In one implementation, such as Figure 10 As shown, the flow channel configuration includes a glue-feeding channel 610, a glue-discharge channel 630, and a glue-transition channel 640, which can be opened and closed respectively by an on / off valve assembly.

[0031] One end of the photoresist feeding channel 610 is configured as the inlet for the flow channel and the other end is connected to the buffer chamber 220. One end of the photoresist discharging channel 630 is configured as the outlet for the flow channel and the other end is connected to the photoresist chamber 230. The photoresist transition channel 640 is connected to both the buffer chamber 220 and the photoresist chamber 230 and is used for photoresist transport between the buffer chamber 220 and the photoresist chamber 230.

[0032] The filter 300 is installed on the glue dispensing channel 630.

[0033] Understandably, when the driving device 400 establishes a negative pressure in the coating chamber 230, the photoresist can enter the buffer chamber 220 through the coating feed channel 610, and at the same time, the photoresist in the buffer chamber 220 can enter the coating chamber 230 through the coating transition channel 640. When the driving device 400 establishes a positive pressure in the coating chamber 230, the photoresist in the coating chamber 230 can be discharged through the coating discharge channel 630. At the same time, the photoresist discharged through the coating discharge channel 630 will pass through the flow filter 300, thereby achieving the filtration of the photoresist.

[0034] It should be noted that the outlet of the flow channel is connected to the coating nozzle (not shown in the figure), and an on / off back suction valve (not shown in the figure) is also provided between the outlet of the flow channel and the coating nozzle. The photoresist discharged through the flow channel can be output to the process surface through the coating nozzle to perform the coating operation.

[0035] In one implementation, such as Figure 10 As shown, the configuration flow channel also includes a glue return channel 650 that can be opened and closed by an on / off valve assembly.

[0036] The photoresist passing through the flow filter 300 is connected to the glue inlet of the glue inlet channel 610 at one end and to the glue outlet channel 630 at the other end. The photoresist passing through the flow filter 650 can be output to the glue inlet of the glue inlet channel 610 through the photoresist return channel 650.

[0037] Understandably, the photoresist discharged from the dispensing chamber 230, after being filtered by the filter 300, flows back to the inlet of the dispensing feed channel 610 through the dispensing return channel 650, which can ensure the cleanliness of the flow channel and further improve the dispensing effect.

[0038] In one implementation, such as Figure 10 As shown, the exhaust flow path includes a first exhaust passage 620, a second exhaust passage 621, and a third exhaust passage 622 that can be opened and closed respectively by an on / off valve assembly.

[0039] One end of the first exhaust channel 620 is configured as the exhaust port of the exhaust flow channel, and the other end is connected to the buffer chamber 220. The third exhaust channel 622 is connected to the filter 300 and the first exhaust channel 620 respectively. The second exhaust channel 621 is connected to the buffer chamber 220 and the glue application chamber 230 respectively, and is used for gas transportation between the buffer chamber 220 and the glue application chamber 230.

[0040] Understandably, when the drive device 400 establishes positive pressure in the dispensing chamber 230, the air bubbles in the dispensing chamber 230 can enter the buffer chamber 220 through the second exhaust channel 621, and at the same time, the air bubbles in the buffer chamber 220 can be discharged through the first exhaust channel 620. The air bubbles precipitated by the photoresist after passing through the flow filter 300 can be discharged through the third exhaust channel 622 and the first exhaust channel 622, thereby realizing the removal of air bubbles in the dispensing system.

[0041] In one implementation, such as Figure 10 As shown, the on / off valve assembly includes a first control valve 510 for controlling the opening and closing of the glue feeding channel 610, a second control valve 520 for controlling the opening and closing of the glue return channel 650, a third control valve 530 for controlling the opening and closing of the first exhaust channel 620, a fourth control valve 540 for controlling the opening and closing of the third exhaust channel 622, a fifth control valve 550 for controlling the opening and closing of the second exhaust channel 621, a sixth control valve 560 for controlling the opening and closing of the glue transition channel 640, and a seventh control valve 570 for controlling the opening and closing of the glue discharge channel 630.

[0042] The glue return channel 650 is connected to the inlet end of the first control valve 510, the third exhaust channel 622 is connected to the outlet end of the third control valve 530, and the seventh control valve 570 is located between the glue application chamber 230 and the filter 300.

[0043] Understandably, the first control valve 510 controls the input of photoresist into the buffer chamber 220, the second control valve 520 controls the output of photoresist through the flow filter 300 to the inlet of the coating feed channel 610, the third control valve 530, the fourth control valve 540 and the fifth control valve 550 are used to control the exhaust of the exhaust channel, the sixth control valve 560 is used to control the photoresist transport between the buffer chamber 220 and the coating chamber 230, and the seventh control valve 570 is used to control the transport of photoresist in the coating chamber 230 to the filter 300.

[0044] Example 2 The existing photoresist pumps have their tubing located outside the pump, which poses a risk of tubing detachment during assembly and use, affecting the normal operation of the pump.

[0045] like Figures 1 to 9 As shown, this application provides a photoresist pump that uses the coating system in Embodiment 1 above, including a power component 100, a photoresist pump assembly 200 fixedly connected to the power component 100, and a filter 300 fixedly connected to the photoresist pump assembly 200.

[0046] The power assembly 100 includes a mounting frame 110 and a drive device 400 fixedly connected to the mounting frame 110. The glue pump assembly 200 includes a pump body 210 and an on / off valve assembly fixedly mounted on the pump body 210. The pump body 210 is provided with a buffer chamber 220, a glue dispensing chamber 230, and a configuration flow channel and an exhaust flow channel.

[0047] Among them, three connector modules 250 are fixedly installed on the pump body 210. The three pump bodies 210 are respectively connected to the glue inlet and glue outlet of the configured flow channel and the exhaust port of the exhaust flow channel.

[0048] In this embodiment, a photoresist pump as described above is used, with the configuration flow channel and exhaust flow channel located inside the pump body 210, which greatly improves the stability of the device and extends its service life. The opening and closing control of the configuration flow channel and exhaust flow channel is realized through the on / off valve assembly, thereby performing the backfilling and distribution of photoresist. The device has a high degree of integration and is easy to arrange in different application scenarios.

[0049] In one implementation, such as Figure 2 , Figure 3 As shown, the buffer chamber 220 and the glue dispensing chamber 230 are disposed inside the pump body 210 and their openings are located on the same side of the pump body 210. The glue pump assembly 200 also includes a pump cover 240 which is fixedly disposed on the pump body 210 and is used to seal the opening of the buffer chamber 220 and the opening of the glue dispensing chamber 230.

[0050] In one implementation, such as Figure 2 , Figure 3 As shown, a sealing cover 260 is embedded in the opening of the buffer cavity 220, and the pump cover 240 abuts against the end face of the sealing cover 260 away from the buffer cavity 220.

[0051] In one implementation, such as Figure 2 , Figure 3 As shown, the pressure sensor 233 is fixedly mounted on the pump body 210 and located at the opening of the glue dispensing chamber 230.

[0052] Understandably, the pressure sensor 233 is positioned at the opening of the glue dispensing chamber 230 to enable more accurate pressure detection, thereby improving the glue dispensing precision.

[0053] In one implementation, such as Figure 2 , Figure 3 As shown, a protective cover 232 is embedded in the opening of the glue-applying chamber 230, and a pressure sensor 233 is fixedly installed inside the protective cover 232. A glue-applying sealing ring 231 is press-fitted between the protective cover 232 and the opening of the glue-applying chamber 230.

[0054] A mounting hole 241 is provided through the pump cover 240. A limiting ring 234 is threadedly connected inside the mounting hole 241. The limiting ring 234 abuts against the end of the pressure sensor 233 away from the glue-applying cavity 230. A limiting plate 235 is also threadedly connected inside the mounting hole 241. The limiting plate 235 abuts against the end of the limiting ring 234 away from the pressure sensor 233.

[0055] In one implementation, such as Figure 2 , Figure 3 As shown, the bubble sensor 271 is fixedly mounted on the pump body 210 and can monitor the bubble content in the buffer chamber 220.

[0056] In one implementation, such as Figure 2 , Figure 3 As shown, the pump body 210 is provided with a mounting groove 272, and the bubble sensor 271 is embedded in the mounting groove 272 with its sensing end extending into the buffer cavity 220.

[0057] A first cover plate 273 and a second cover plate 274 fixedly connected to the first cover plate 273 are also fixedly provided on the pump body 210. The first cover plate 273 abuts against the end of the bubble sensor 271 away from the buffer chamber 220 to fix the bubble sensor 271 on the pump body 210.

[0058] In one implementation, such as Figure 2 , Figure 3 As shown, the connector module 250 includes a delivery connector 251, a locking ring 252, and a connector nut 253.

[0059] The delivery connector 251 is inserted into the pump body 210 and fixedly connected to the pump body 210 through the locking ring 252. The connector nut 253 is threadedly connected to the end of the delivery connector 251 away from the pump body 210.

[0060] In one implementation, such as Figure 2 , Figure 3 , Figure 8 , Figure 9 As shown, the on / off valve assembly includes a first valve plate 281 and a second valve plate 282 fixedly mounted on the pump body 210, and a pneumatic diaphragm 283 respectively sandwiched between the first valve plate 281, the second valve plate 282 and the pump body 210.

[0061] The first valve plate 281 and the second valve plate 282 are respectively provided with at least one valve groove 286 and a working gas passage communicating with the valve groove 286. The pump body 210 is provided with multiple opening and closing pipelines corresponding to the positions of the valve groove 286 and communicating with the configured flow channel.

[0062] The valve groove 286, the working gas passage, and the opening and closing pipeline constitute the first control valve 510, the second control valve 520, the third control valve 530, the fourth control valve 540, the fifth control valve 550, the sixth control valve 560, and the seventh control valve 570.

[0063] The opening and closing pipeline includes a fluid input channel 211 and a fluid output channel 212. The on / off valve assembly also includes an opening and closing control component for outputting vacuum air or compressed gas to the working gas channel. When the opening and closing control component outputs vacuum air to the working gas channel, the pneumatic diaphragm 283 is located in the valve groove 286, which opens the opening and closing pipeline at the corresponding position, that is, the fluid input channel 211 and the fluid output channel 212 at that position are connected. When the opening and closing control component outputs compressed air or nitrogen to the working gas channel, the pneumatic diaphragm 283 is in contact with the pump body 210, so that the fluid input channel 211 and the fluid output channel 212 are blocked and closed, thereby closing the opening and closing pipeline.

[0064] Understandably, the valve groove 286 is made of modified material to ensure that gas will not pass through the valve groove 286 under high pressure, thereby ensuring the cleanliness of the photoresist inside the glue pump assembly 200.

[0065] In one implementation, such as Figure 8 , Figure 9 As shown, the working gas passage includes a control gas transmission channel 287, a control gas input channel 288, and a control gas working channel 289 disposed on the first valve plate 281 and the second valve plate 282.

[0066] The control gas action channel 289 is connected to the control gas transmission channel 287 and the control gas input channel 288, and is also connected to the valve groove 286 at the corresponding position.

[0067] It is understood that the opening and closing control component can output vacuum or compressed air to the control air input channel 288 of the first valve plate 281, thereby realizing the opening and closing control of the corresponding opening and closing pipeline through the control air action channel 289. The first valve plate 281 and the second valve plate 282 are connected through the control air transmission channel 287, that is, vacuum or compressed air can be delivered to the second valve plate 282 through the control air transmission channel 287, and the action gas is discharged through the control air input channel 288 of the second valve plate 282.

[0068] In one implementation, such as Figure 2 As shown, an opening and closing sealing ring 284 for sealing the opening and closing pipeline is sandwiched between the pneumatic diaphragm 283 and the pump body 210, and / or a control sealing ring 285 for sealing the control air transmission channel 287 is sandwiched between the pneumatic diaphragm 283 and the pump body 210.

[0069] In one implementation, such as Figure 5 , Figure 6 As shown, the opening and closing control assembly includes a solenoid valve group 150 and a throttle connector 160, which are fixedly mounted on the mounting frame 110 and interconnected. The solenoid valve group 150 provides vacuum or compressed air to the on / off valve assembly. The throttle connector 160 delivers gas to the working gas channel through a hose (not shown in the figure), ensuring the opening and closing control of the configuration flow channel and the exhaust flow channel, thereby ensuring the accurate opening and closing of each valve in the on / off valve assembly. If the valve opens too early, there will not be enough pressure to form a columnar fluid, and the photoresist will drip from the nozzle tip. If the valve opens too late, the flow rate will be affected, with too much liquid flowing at the beginning and too little liquid flowing at the end, directly affecting the uniformity of the photoresist coated on the wafer surface. At the same time, the throttle connector 160 can ensure that the switching action of each valve in the on / off valve assembly is smooth during the opening and closing process, and the smooth and slow opening and closing action can ensure that the pressure in the configuration flow channel and the exhaust flow channel does not change suddenly, thereby ensuring the coating accuracy.

[0070] In one implementation, such as Figure 5 As shown, the opening and closing control assembly also includes two control air connectors 190 fixedly mounted on the mounting frame 110. The two control air connectors 190 are used to output vacuum air or compressed air to the solenoid valve assembly 150, respectively.

[0071] In one implementation, such as Figure 7 As shown, a mounting bracket 310 is fixedly provided on the pump body 210, and the filter 300 is fixedly provided on the mounting bracket 310.

[0072] The pump body 210 is fixedly provided with a filter connector 290 that communicates with the configuration flow channel or the exhaust flow channel, and the filter 300 communicates with the configuration flow channel and the exhaust flow channel through the filter connector 290.

[0073] In one implementation, such as Figure 4 As shown, the drive device 400 includes a stepper motor 410, a folding diaphragm 480, and a plunger core 470. The folding diaphragm 480 is connected to the pump body 210, and a portion of the folding diaphragm 480 can extend into the glue-applying chamber 230. One end of the plunger core 470 is fixedly connected to the inner end face of the folding diaphragm 480. By extending the plunger core 470, the folding diaphragm 480 extends into the glue-applying chamber 230, thereby establishing a negative pressure in the glue-applying chamber 230, i.e., supplying glue into the glue-applying chamber. Photoresist is introduced; by retracting the plunger core 470, the folded film 480 is folded back inward and outward, thereby creating positive pressure in the coating cavity 230, which discharges the photoresist from the coating cavity 230; the other end of the plunger core 470 is connected to the stepper motor 410 through the connector 450. The stepper motor 410 is fixedly mounted on the mounting frame 110 and can provide power to the plunger core 470 to extend and retract the folded film 480, which is used to perform photoresist backfilling and dispensing.

[0074] In one implementation, such as Figure 4 As shown, the drive device 400 also includes a lifting pin 460. The inner end face of the folding diaphragm 480 is provided with a first positioning hole. One end of the plunger core 470 is provided with a second positioning hole corresponding to the first positioning hole. The lifting pin 460 is connected to the first positioning hole and the second positioning hole. When the folding diaphragm 480 is extended and retracted, the folding diaphragm 480 will not rotate with the plunger core 470, thereby ensuring the stability of the output state of the drive device 400.

[0075] In one implementation, such as Figure 4 As shown, the drive device 400 also includes a fixing block 420, a first clamping block 431, a second clamping block 432, and a pressing block 440. The stepper motor 410 is fixedly connected to the mounting frame 110 through the fixing block 420. The telescopic end of the stepper motor 410 is fixedly connected to the connector 450. The first clamping block 431 and the second clamping block 432 are both fixedly connected to the fixing block 420, and the first clamping block 431 and the second clamping block 432 cooperate to form a telescopic channel. The telescopic channel is adapted to the plunger core 470, and the plunger core 470 can pass through the telescopic channel, thereby ensuring stability during telescopic movement.

[0076] The first clamping block 431 and the second clamping block 432 are fixedly connected to the pressing block 440 at the ends away from the fixing block 420. The pressing block 440 is provided with a through hole corresponding to the telescopic channel. The pressing block 440 is fixedly connected to the pump body 210. A portion of the folding diaphragm 480 is located in the through hole of the pressing block 440, and the diameter of the fixed end of the folding diaphragm 480 is larger than the diameter of the through hole of the pressing block 440. The fixed end of the folding diaphragm 480 is located close to the telescopic channel, and a portion of the folding diaphragm 480 can extend into the glue-applying cavity 230 through the through hole of the pressing block 440.

[0077] In one implementation, such as Figure 5 As shown, the power assembly 100 also includes a motor cover 120 that is fixedly mounted on the mounting frame 110 and covers the stepper motor 410.

[0078] In one implementation, such as Figure 5 As shown, a motor drive module 140 electrically connected to the stepper motor 410 is also fixed on the mounting frame 110.

[0079] In one implementation, such as Figure 5 As shown, the power assembly 100 also includes a mounting base 130 fixedly mounted on the mounting frame 110, and a cable connector 170 and a network port 180 are fixedly mounted on the mounting base 130.

[0080] Example 3 This application provides a control method for the coating system in Embodiment 1 above, or the photoresist pump in Embodiment 2 above, comprising: Step S1: The photoresist is sequentially introduced from the inlet and buffer cavity 220 into the coating cavity 230 through the configured flow channel; Step S2: Open the exhaust channel and discharge the air bubbles in the buffer chamber 220 and the glue application chamber 230 through the exhaust port; Step S3: The photoresist in the dispensing chamber 230 is passed through the flow filter 300 and discharged through the dispensing port.

[0081] In this embodiment of the application, the above-mentioned control method is adopted so that the photoresist in the coating chamber 230 is discharged after passing through the flow filter 300, thereby avoiding the obstruction of medium viscosity photoresist when the filter 300 is placed in front, and avoiding the precipitation of air bubbles in the photoresist to affect the coating effect.

[0082] In one embodiment, in step S1, the configured flow channels include a glue feeding channel 610, a glue discharging channel 630, a glue transition channel 640, and a glue return channel 650; the exhaust flow channels include a first exhaust channel 620, a second exhaust channel 621, and a third exhaust channel 622; and the on / off valve assembly includes a first control valve 510, a second control valve 520, a third control valve 530, a fourth control valve 540, a fifth control valve 550, a sixth control valve 560, and a seventh control valve 570; initially, all control valves in the pipeline are in the closed state by default.

[0083] Step S1 includes: When there are air bubbles in the buffer chamber 220, the control unit of the on / off valve assembly opens the first control valve 510 and the sixth control valve 560, and closes the other valves. The drive device 400 establishes a negative pressure in the glue application chamber 230 to draw the photoresist in the buffer chamber 220 back into the glue application chamber 230. The bubble content parameter in the buffer chamber 220 can be obtained by the bubble sensor 271. The bubble content parameter obtained by the bubble sensor 271 is sent to the control unit of the on / off valve assembly, thereby executing the opening and closing control of each control valve.

[0084] Step S2 includes: The bubble sensor 271 detects the bubble content parameter in the buffer chamber 220. When the control unit of the on / off valve assembly determines that the bubble content parameter exceeds a predetermined threshold, it executes the opening and closing control of each control valve. That is, when there are bubbles in the buffer chamber 220, after the back-pull is completed, the control unit of the on / off valve assembly opens the third control valve 530 and the fifth control valve 550, and closes the other valves. The drive device 400 establishes positive pressure in the glue-applying chamber 230 to discharge the bubbles in the buffer chamber 220 and the glue-applying chamber 230 through the exhaust port. It is understandable that the above steps S1-S2 are the initialization phase.

[0085] Repeat steps S1-S2 until there are no more air bubbles in the buffer cavity 220, then proceed with the backfilling stage.

[0086] In one implementation, a backfilling stage is included before step S3, which may specifically include: The control unit of the on / off valve assembly opens the first control valve 510 and the sixth control valve 560, while closing all other valves. The drive device 400 establishes a negative pressure in the coating chamber 230 to draw the photoresist in the buffer chamber 220 back into the coating chamber 230. After the liquid extraction stops, the control unit of the on / off valve assembly opens the seventh control valve 570 and closes all other valves. The drive device 400 establishes positive pressure in the glue-applying chamber 230 until the pressure in the glue-applying chamber 230 reaches the predetermined value, and then the backfilling ends.

[0087] It is understandable that the pressure inside the glue-applying chamber 230 can be obtained through the pressure sensor 233, and the pressure parameters are sent to the control unit of the drive device 400, thereby realizing the pressure control of the glue-applying chamber 230 by the drive device 400.

[0088] In one embodiment, step S3 includes an adhesive application stage, which may specifically include: The control unit of the on / off valve assembly opens the seventh control valve 570 and closes all other valves. The drive device 400 establishes positive pressure in the dispensing chamber 230, and the photoresist is discharged through the dispensing port after passing through the flow filter 300.

[0089] In one implementation, step S3 is followed by an exhaust stage, which may specifically include: The bubble sensor 271 performs real-time detection of the buffer chamber 220. The control unit of the on / off valve assembly analyzes the bubble content parameter fed back by the bubble sensor 271 to determine whether the bubble content parameter exceeds a predetermined threshold. If it exceeds the threshold, it is determined that there are bubbles in the buffer chamber 220; otherwise, it is determined that there are no bubbles in the buffer chamber 220. The control unit of the on / off valve assembly performs the following actions based on whether there are bubbles in the buffer chamber 220: When there are no air bubbles in the buffer chamber 220, the control unit of the on / off valve assembly opens the seventh control valve 570 and the second control valve 520, and closes all other valves. The drive device 400 establishes positive pressure in the dispensing chamber 230, and the photoresist flows back to the dispensing port through the seventh control valve 570, the filter 300 and the second control valve 520. When there are air bubbles in the buffer chamber 220, the control unit of the on / off valve assembly opens the third control valve 530 and the fifth control valve 550, while closing all other valves. The drive device 400 establishes positive pressure in the glue-applying chamber 230, and the air bubbles in the buffer chamber 220 and the glue-applying chamber 230 are discharged from the exhaust port. After the positive pressure in the glue-applying chamber 230 is established, if the air bubble content parameter fed back by the air bubble sensor 271 does not exceed the predetermined threshold, the control unit of the shut-off valve assembly determines that the air bubbles in the buffer chamber 220 have been discharged, and the backfilling stage begins. If the air bubble content parameter fed back by the air bubble sensor 271 exceeds the predetermined threshold, the control unit of the shut-off valve assembly determines that there are still air bubbles in the buffer chamber 220, and the initialization stage begins.

[0090] It is understandable that the pressure control of the drive device 400 in the glue-applying chamber 230 can be achieved by the extension and retraction of the folding diaphragm 480. That is, by controlling the extension and retraction of the folding diaphragm 480, different values ​​of positive or negative pressure can be established in the glue-applying chamber 230.

[0091] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element. Furthermore, it should be noted that the scope of the methods and apparatuses in the embodiments of this application is not limited to performing functions in the order shown or discussed, but may also include performing functions substantially simultaneously or in the reverse order, depending on the functions involved. For example, the described methods may be performed in a different order than described, and various steps may be added, omitted, or combined. Additionally, features described with reference to certain examples may be combined in other examples.

[0092] The embodiments of this application have been described above with reference to the accompanying drawings. However, this application is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of this application without departing from the spirit and scope of the claims, and all of these forms are within the protection scope of this application.

Claims

1. An adhesive application system, characterized in that, Includes buffer devices, glue application devices, filters, on / off valve assemblies, configuration flow channels, and exhaust flow channels; The configured flow channel has an inlet and an outlet, the exhaust flow channel has an exhaust outlet, the buffer device includes a buffer chamber, and the glue dispensing device includes a glue dispensing chamber and a driving device. The buffer chamber, the glue-applying chamber, and the filter are all connected to the configured flow channel and can all exhaust through the exhaust port of the exhaust flow channel. The driving device can adjust the pressure in the glue-applying chamber to realize the photoresist delivery of the configured flow channel and the gas delivery of the exhaust flow channel. The on / off valve assembly is used to open or close the configured flow channel and the exhaust flow channel. The buffer chamber is connected to the glue inlet, the glue dispensing chamber is connected to the glue outlet, and the filter is disposed between the glue dispensing chamber and the glue outlet.

2. The adhesive application system according to claim 1, characterized in that, It also includes a bubble sensor for monitoring the bubble content in the buffer chamber, and / or a pressure sensor for monitoring the pressure in the glue dispensing chamber.

3. The adhesive application system according to claim 1, characterized in that, The configured flow channel includes a glue-feeding channel, a glue-discharge channel, a glue-transition channel, and a glue-return channel that can be opened and closed respectively by the on / off valve assembly. One end of the glue feeding channel is configured as the glue inlet, and the other end is connected to the buffer chamber. One end of the glue discharging channel is configured as the glue outlet, and the other end is connected to the glue discharging chamber. The glue transition channel is connected to the buffer chamber and the glue discharging chamber respectively, and is used for photoresist transport between the buffer chamber and the glue discharging chamber. One end of the glue return channel is connected to the glue feeding channel, and the other end is connected to the glue discharging channel. The filter is installed on the glue dispensing channel, and the photoresist flowing through the filter can be output to the glue inlet through the glue return channel.

4. The adhesive application system according to claim 3, characterized in that, The exhaust flow path includes a first exhaust channel, a second exhaust channel, and a third exhaust channel that can be opened and closed respectively by an on / off valve assembly; One end of the first exhaust channel is configured as the exhaust port, and the other end is connected to the buffer chamber. The third exhaust channel is connected to the filter and the first exhaust channel respectively. The second exhaust channel is connected to the buffer chamber and the glue-applying chamber respectively, and is used for gas transportation between the buffer chamber and the glue-applying chamber.

5. The adhesive application system according to claim 4, characterized in that, The on / off valve assembly includes a first control valve, a second control valve, a third control valve, a fourth control valve, a fifth control valve, a sixth control valve, and a seventh control valve, which are used to control the opening and closing of the glue feeding channel, the glue return channel, the first exhaust channel, the third exhaust channel, the second exhaust channel, the glue transition channel, and the glue discharge channel. The glue return channel is connected to the inlet end of the first control valve, the third exhaust channel is connected to the outlet end of the third control valve, and the seventh control valve is located between the glue application chamber and the filter.

6. A photoresist pump, characterized in that, The adhesive application system according to any one of claims 1 to 5 includes a power component, an adhesive pump assembly fixedly connected to the power component, and a filter fixedly connected to the adhesive pump assembly; The power assembly includes a mounting frame and a drive device fixedly connected to the mounting frame. The glue pump assembly includes a pump body and an on / off valve assembly disposed on the pump body. The pump body is provided with a buffer chamber, a glue dispensing chamber, and a flow channel and an exhaust flow channel.

7. A photoresist pump according to claim 6, characterized in that, The on / off valve assembly includes a valve plate fixedly mounted on the pump body, and a pneumatic diaphragm sandwiched between the valve plate and the pump body. The valve plate is provided with at least one valve groove and a working gas passage communicating with the valve groove. The pump body is provided with an opening and closing pipeline corresponding to the position of the valve groove and communicating with the configured flow channel. The valve groove, the working gas passage, and the opening and closing pipeline constitute a first control valve, a second control valve, a third control valve, a fourth control valve, a fifth control valve, a sixth control valve, and a seventh control valve. The on / off valve assembly also includes an opening / closing control component for outputting vacuum air or compressed air to the working gas channel. When vacuum air is output into the working gas channel, the pneumatic diaphragm is located in the valve groove to open the opening / closing pipeline at the corresponding position. When compressed air is output into the working gas channel, the pneumatic diaphragm is in contact with the pump body to close the opening / closing pipeline.

8. A photoresist pump according to claim 6 or 7, characterized in that, The driving device includes a stepper motor, a folding diaphragm, and a plunger core; The folding diaphragm is connected to the pump body, and part of the folding diaphragm can extend into the glue-applying chamber. One end of the plunger core is fixedly connected to the inner end face of the folding diaphragm, and the other end is fixedly connected to the telescopic end of the stepper motor. When the plunger core extends, it can drive the folding diaphragm to extend into the glue-applying cavity; when it retracts, it can drive the folding diaphragm to fold inward and outward and retract.

9. A photoresist pump according to claim 6 or 7, characterized in that, It also includes a bubble sensor for monitoring the bubble content in the buffer cavity, and / or a pressure sensor for monitoring the pressure in the glue dispensing cavity; The pressure sensor is fixedly mounted on the pump body and located at the opening of the glue dispensing chamber.

10. A control method, characterized in that, The adhesive application system according to any one of claims 1 to 5 comprises: The photoresist is sequentially introduced into the coating chamber through the injection port and buffer chamber via the configured flow channels; Open the exhaust channel and expel air bubbles from the buffer chamber and the glue application chamber through the exhaust port; The photoresist in the coating chamber is passed through a flow filter via a configured flow channel and discharged through the outlet.

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